TWD199479S - 半導體製造裝置用離子遮蔽器 - Google Patents

半導體製造裝置用離子遮蔽器

Info

Publication number
TWD199479S
TWD199479S TW108300479F TW108300479F TWD199479S TW D199479 S TWD199479 S TW D199479S TW 108300479 F TW108300479 F TW 108300479F TW 108300479 F TW108300479 F TW 108300479F TW D199479 S TWD199479 S TW D199479S
Authority
TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
ion shield
shield
article
Prior art date
Application number
TW108300479F
Other languages
English (en)
Chinese (zh)
Inventor
Yutaka Kouzuma
Michiaki Kobayashi
Kazuyuki Hirozane
Nobuya MIYOSHI
Kohei Kawamura
Hiroyuki Kobayashi
Original Assignee
日商日立全球先端科技股份有限公司
Hitachi High-Technologies Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司, Hitachi High-Technologies Corporation filed Critical 日商日立全球先端科技股份有限公司
Publication of TWD199479S publication Critical patent/TWD199479S/zh

Links

TW108300479F 2018-07-24 2019-01-24 半導體製造裝置用離子遮蔽器 TWD199479S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-16191F JP1624795S (fr) 2018-07-24 2018-07-24

Publications (1)

Publication Number Publication Date
TWD199479S true TWD199479S (zh) 2019-09-01

Family

ID=65359095

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108300479F TWD199479S (zh) 2018-07-24 2019-01-24 半導體製造裝置用離子遮蔽器

Country Status (3)

Country Link
US (1) USD901407S1 (fr)
JP (1) JP1624795S (fr)
TW (1) TWD199479S (fr)

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JP1678330S (fr) * 2020-05-27 2021-02-01
USD942667S1 (en) * 2020-09-30 2022-02-01 Shenzhen Uvled Optical Technology Co., Ltd. Ultraviolet sanitizing recessed downlight
JP1704964S (ja) * 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング
JP1700629S (fr) * 2021-04-26 2021-11-29

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Also Published As

Publication number Publication date
USD901407S1 (en) 2020-11-10
JP1624795S (fr) 2019-02-18

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