TW548353B - Process and device for the production of a single - Google Patents
Process and device for the production of a single Download PDFInfo
- Publication number
- TW548353B TW548353B TW087120906A TW87120906A TW548353B TW 548353 B TW548353 B TW 548353B TW 087120906 A TW087120906 A TW 087120906A TW 87120906 A TW87120906 A TW 87120906A TW 548353 B TW548353 B TW 548353B
- Authority
- TW
- Taiwan
- Prior art keywords
- ring
- single crystal
- patent application
- heating device
- melt
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
經濟部中央標準局員工消費合作社印製 548353 A7 B7 五、發明説明(1 ) 本發明相闞於藉由融體抽拉單晶體以製造半導體材料 單晶體之一種方法及一種裝置,其中該融體係容納在一坩 堝内且係藉坩堝周圍之旁側加熱器加熱。 此種製造單晶體之方法係稱為左科拉斯基法且係 經常研究之目摞。業已習知的是,成長中單晶體内若干特 殊缺點之影響視抽拉速率V及單晶體與融體間相界處之軸 向溫度梯度G而定。若抽拉單晶體期間之情況能滿足V/ G〈 Ccrit (C crit 係一常數)之條件,將形成許多稱作大 凹痕之填隙缺點(杜恩伯格,安孟合著,電化學學會學報, 第143卷,第5期(1996))。該類缺點(M下稱作L-缺點)將 大幅損及進一步加工單晶體Μ製造功能性電子分件之產率 。由上述條件可清楚地顯示,為避免L-缺點之發生,應試 圖儘可能提高抽拉速率。 但抽拉單晶體時,經發琨:若單晶體成長之方式變化 不大,抽拉速率僅能增加至某一程度。特別是,成長速率 過高時,單晶體開始喪失預期之圓柱形成長且以不完全呈 圓形成長,亦即形成對應其晶體取向之平面晶體面,Μ取 代圓柱形側表面。再者,若成長並非完全圓形,在經抽拉 之材料内產生晶體結晶格子缺點之風險則增加,因而導致 該材料不能再使用。 本發明顯示一種方法用Μ拖延由圓柱型成長過渡至不 完全11Μ成長直至成長速率達到高於現行者為止。 本發明相鬮於一種藉由融體抽拉單晶體Μ製造半導體 材料單晶體之方法,該融體係容納在一坩堝内且係藉坩渦 - 3 - 本紙張尺度適用中國國家檩準(CNS ) Α4規格(210X297公釐) (讀先閱鍊背面之注意事項再填寫本頁) •1^^· 訂 548353 Α7 Β7 五、發明説明(2 ) 周圍之旁側加熱器加熱,其中於圍繞單晶體之環型區域内 ,藉圍繞單晶體且位於融體上方之環型加熱裝置,該融體 得Μ進一步加熱。 該方法更便於製造實際上無L-缺點之圓柱形單晶體。 用其製造大直徑(例如:直徑200公厘、300公厘或400公厘) 矽單晶體特別有利。 為實施該方法,特建議一種裝置,其中圍繞單晶體之 環型加熱裝置係配置在融體上方,其所釋出之輻射能係用 Μ加熱圍鐃單晶體之環型區域之融體。 有利的是,該環型加熱裝置係適當地配置在單晶體上 方,俾單晶體與加熱裝置間之距離小於加熱裝置與坩堝壁 間之距雛。若加熱裝置與單晶體間之距離儘可能小至僅3 公分,將特別合意。若加熱裝置係固定在一絕熱型防熱護 罩(該護罩可防止單晶體接受旁側加熱器之熱輻射能)之下 緣上則更為合意。應謹慎從事的是,加熱裝置僅係用以加 熱融體,並非單晶體。所Μ,假若適當,單晶體與加熱裝 置間應設置絕熱型防熱護罩。環型加熱裝置與融體表面間 之距離Μ10至20公厘為佳。 經濟部中央標準局員工消費合作社印製 (請先閲氟背面之注意事項再填寫本頁) 環型加熱裝置係於單晶體周圍之近-表面區域内加熱融 體。所以在單晶體與坩堝間之融體中產生一陡峭軸向溫度 梯度,Μ促使單晶體之圓柱型成長。 該環型加熱裝置更可用Μ提供製造融體所需之部分能 源並縮短熔化半導體材料所需之時間。若旁側加熱器及( 假若適當)及底部加熱器(配置在坩堝下方)之熱源減少, 一 4 - 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) 548353 A7 B7 五、發明説明(3 ) Μ環型加熱器進一步加熱融體亦屬合意。如此可防止坩渦 材料(通常係石英玻璃且易遭熱融體侵襲)提前腐蝕。坩堝 腐蝕速率之減緩有助於提昇單#型半導體材料之產率。 再者,由於其熱慣性低,該環型加熱裝置亦可合意地 用Μ實施迅速能源控制,進而影響徑向成長及抽拉速率。 因此直徑及抽拉速率之變動可大幅減低。 在另一具體實施例中,藉改變熱源,該環型加熱裝置 係用Μ控制融體及晶體中之氧含量。增加環型裝置之熱源 可促使SiO自融體表面蒸發,而旁側加熱器及(隨意地)底 加熱器之熱源則減少,因而降低石英玻璃之腐蝕作用。所 以,融體内之氧濃度減低且混入晶體之氧減少。 藉助於附圖,玆將本發明作更詳细說明如下,其中 圖1係概略顯示本發明之第一個具體實施例。 圖2係概略顯示本發明之第二個且較為合意之具體實 施例。 經濟部中央標準局員工消費合作社印製 (請先閲讒背面之注意事項再填寫本頁) 依照圖1所示本發明之具體實施例,位於融體2上方 之環型加熱裝置(反射器)1係固定在一絕熱器3之下方且 將熱輻射能反射至融體。該反射器係配置在單晶體周圍且 距單晶體4甚近。藉助於所反射之熱輻射能,該融體得以 在單晶體周圍之環型區域内加熱。 如圖2所示,該環型加熱裝置亦可設計成為一有效加 熱器5。該有效加熱器可能係一電阻加熱器(例如:由石墨 或钼製成)或一由射頻交流電操作之感應加熱器。後者最 好是由高溫下安定且導電性高之材料(例如:钼、_或钽) -5 一 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 548353 A7 B7 五、發明説明(4 ) 所組成,或經設計成一水冷式銅管或銀管。 圖式簡單說明: 圖1 :本發明「製造單晶體裝萱」之第一個具體實施例 圖2 :本發明「製造單晶體裝置」之第二個且較為合意之 具體實施例 各元件編號: 1 環型加熱裝置(反射器) 2 融體 3 絕熱器 4 單晶體 5 有效加熱器 (請先閱讒背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 6 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)
Claims (1)
- 548353 A8 B8 C8 D8 六、申請專利範圍 6.如申請專利範圍第5項之裝置,其中該環型加熱裝置 係一朝向融體反射熱輻射能之反射器。 7·如申請專利範圍第5項之裝置,其中該環型加熱裝置 係一朝向融體放射熱輻射能之電阻加熱器。 8.如申請專利範圍第5項之裝置,其中該環型加熱裝置 係一感應加熱器,並以電磁感應方式加熱圍繞單晶體之環 型區域内之融體。 9·如申請專利範圍第5、6、7或8項之裝置,其中該環 型護罩係固定在一防熱護罩之下緣以防止單晶體受熱。 10·如申請專利範圍第5項之裝置,其中單晶體與環型加 熱裝置間具有絕熱效果。 11·如申請專利範圍第1項之方法,其中係藉調整環型加 熱裝置之熱源連同旁侧加熱器及底部加熱器之熱源以改變 成長中晶體内之氧含量。 (請先閱讀背面之注意事項再填寫本頁) 訂i:-------線一 經濟部智慧財產局員工消費合作社印製 8_ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19756613A DE19756613A1 (de) | 1997-12-18 | 1997-12-18 | Verfahren und Vorrichtung zur Herstellung eines Einkristalls |
Publications (1)
Publication Number | Publication Date |
---|---|
TW548353B true TW548353B (en) | 2003-08-21 |
Family
ID=7852572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087120906A TW548353B (en) | 1997-12-18 | 1998-12-16 | Process and device for the production of a single |
Country Status (6)
Country | Link |
---|---|
US (2) | US6132507A (zh) |
EP (1) | EP0926270B1 (zh) |
JP (1) | JP3066742B2 (zh) |
KR (1) | KR100297575B1 (zh) |
DE (2) | DE19756613A1 (zh) |
TW (1) | TW548353B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1346086A2 (en) * | 2000-11-30 | 2003-09-24 | MEMC Electronic Materials, Inc. | Process for controlling thermal history of vacancy-dominated, single crystal silicon |
US20040055527A1 (en) * | 2000-11-30 | 2004-03-25 | Makoto Kojima | Process for controlling thermal history of vacancy-dominated, single crystal silicon |
US6481894B1 (en) * | 2001-02-23 | 2002-11-19 | Lord Corporation | Pitch bearing |
CN1327041C (zh) * | 2002-11-12 | 2007-07-18 | Memc电子材料有限公司 | 用于生长单晶锭的拉晶机和方法 |
US7063743B2 (en) * | 2003-04-11 | 2006-06-20 | Sumitomo Mitsubishi Silicon Corporation | Apparatus and method for pulling single crystal |
DE102009056638B4 (de) | 2009-12-02 | 2013-08-01 | Siltronic Ag | Verfahren zum Ziehen eines Einkristalls aus Silizium mit einem Abschnitt mit gleich bleibendem Durchmesser |
DE102011079284B3 (de) | 2011-07-15 | 2012-11-29 | Siltronic Ag | Ringförmiger Widerstandsheizer zum Zuführen von Wärme zu einem wachsenden Einkristall |
DE102016209008B4 (de) | 2016-05-24 | 2019-10-02 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe aus einkristallinem Silizium, Vorrichtung zur Herstellung einer Halbleiterscheibe aus einkristallinem Silizium und Halbleiterscheibe aus einkristallinem Silizium |
CN111321458A (zh) * | 2018-12-13 | 2020-06-23 | 上海新昇半导体科技有限公司 | 加热式导流筒 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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US2852420A (en) * | 1956-06-28 | 1958-09-16 | Rauland Corp | Method of manufacturing semiconductor crystals |
FR1316707A (fr) * | 1961-12-22 | 1963-02-01 | Radiotechnique | Perfectionnements aux dispositifs d'obtention de monocristaux par tirage |
JPS5836998A (ja) * | 1981-08-26 | 1983-03-04 | Toshiba Ceramics Co Ltd | 単結晶シリコン引上装置 |
US4597969A (en) * | 1982-04-05 | 1986-07-01 | Merck Sharp & Dohme | Stabilization of unstable drugs or food supplements |
US4597949A (en) * | 1983-03-31 | 1986-07-01 | Massachusetts Institute Of Technology | Apparatus for growing crystals |
JPS6027684A (ja) * | 1983-07-26 | 1985-02-12 | Fujitsu Ltd | 単結晶製造装置 |
JPS62119189A (ja) * | 1985-11-19 | 1987-05-30 | Toshiba Corp | 単結晶の製造装置 |
JP2686460B2 (ja) * | 1990-03-12 | 1997-12-08 | 住友シチックス株式会社 | 単結晶製造方法 |
US5260037A (en) * | 1990-03-12 | 1993-11-09 | Osaka Titanium Co., Ltd. | Apparatus for producing silicon single crystal |
US5137699A (en) * | 1990-12-17 | 1992-08-11 | General Electric Company | Apparatus and method employing interface heater segment for control of solidification interface shape in a crystal growth process |
US5132091A (en) * | 1990-12-17 | 1992-07-21 | General Electric Company | Apparatus and method employing focussed radiative heater for control of solidification interface shape in a crystal growth process |
JP2509477B2 (ja) * | 1991-04-20 | 1996-06-19 | コマツ電子金属株式会社 | 結晶成長方法及び結晶成長装置 |
WO1993000462A1 (en) * | 1991-06-24 | 1993-01-07 | Komatsu Electronic Metals Co., Ltd. | Device for pulling up single crystal |
JPH0627684A (ja) * | 1992-07-10 | 1994-02-04 | Tokyo Ohka Kogyo Co Ltd | リソグラフィー用リンス液及びそれを用いた半導体デバイスの製造方法 |
JP3207573B2 (ja) * | 1993-01-05 | 2001-09-10 | ワッカー・エヌエスシーイー株式会社 | 単結晶体の製造方法及びその装置 |
DE69533114T2 (de) * | 1995-12-08 | 2005-06-09 | Shin-Etsu Handotai Co., Ltd. | Verfahren und vorrichtung zur herstellung von einkristallen |
JP3892496B2 (ja) * | 1996-04-22 | 2007-03-14 | Sumco Techxiv株式会社 | 半導体単結晶製造方法 |
DE19622664A1 (de) * | 1996-06-05 | 1997-12-11 | Wacker Siltronic Halbleitermat | Verfahren und Vorrichtung zur Herstellung von Einkristallen |
SG64470A1 (en) * | 1997-02-13 | 1999-04-27 | Samsung Electronics Co Ltd | Methods of manufacturing monocrystalline silicon ingots and wafers by controlling pull rate profiles in a hot zone furnace and ingots and wafers manufactured thereby |
DE19711922A1 (de) * | 1997-03-21 | 1998-09-24 | Wacker Siltronic Halbleitermat | Vorrichtung und Verfahren zum Ziehen eines Einkristalls |
-
1997
- 1997-12-18 DE DE19756613A patent/DE19756613A1/de not_active Withdrawn
-
1998
- 1998-11-20 JP JP10331219A patent/JP3066742B2/ja not_active Expired - Lifetime
- 1998-12-04 US US09/206,061 patent/US6132507A/en not_active Expired - Lifetime
- 1998-12-08 EP EP98123048A patent/EP0926270B1/de not_active Expired - Lifetime
- 1998-12-08 DE DE59803424T patent/DE59803424D1/de not_active Expired - Lifetime
- 1998-12-16 TW TW087120906A patent/TW548353B/zh not_active IP Right Cessation
- 1998-12-16 KR KR1019980055305A patent/KR100297575B1/ko not_active IP Right Cessation
-
2000
- 2000-03-07 US US09/520,290 patent/US6238477B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR19990063097A (ko) | 1999-07-26 |
EP0926270A1 (de) | 1999-06-30 |
JP3066742B2 (ja) | 2000-07-17 |
KR100297575B1 (ko) | 2001-10-26 |
US6238477B1 (en) | 2001-05-29 |
DE59803424D1 (de) | 2002-04-25 |
EP0926270B1 (de) | 2002-03-20 |
JPH11228285A (ja) | 1999-08-24 |
US6132507A (en) | 2000-10-17 |
DE19756613A1 (de) | 1999-07-01 |
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