TW546711B - Structure of light irradiation portion of light-irradiation-type heating apparatus and light-irradiation-type heating apparatus - Google Patents
Structure of light irradiation portion of light-irradiation-type heating apparatus and light-irradiation-type heating apparatus Download PDFInfo
- Publication number
- TW546711B TW546711B TW090126789A TW90126789A TW546711B TW 546711 B TW546711 B TW 546711B TW 090126789 A TW090126789 A TW 090126789A TW 90126789 A TW90126789 A TW 90126789A TW 546711 B TW546711 B TW 546711B
- Authority
- TW
- Taiwan
- Prior art keywords
- cooling air
- lamp
- mirror
- light
- light irradiation
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000397555A JP2002198321A (ja) | 2000-12-27 | 2000-12-27 | 光照射式加熱装置の光照射部の構造及び光照射式加熱装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW546711B true TW546711B (en) | 2003-08-11 |
Family
ID=18862669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW090126789A TW546711B (en) | 2000-12-27 | 2001-10-29 | Structure of light irradiation portion of light-irradiation-type heating apparatus and light-irradiation-type heating apparatus |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20020079798A1 (ja) |
| EP (1) | EP1220300A2 (ja) |
| JP (1) | JP2002198321A (ja) |
| KR (1) | KR20020053712A (ja) |
| TW (1) | TW546711B (ja) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4969732B2 (ja) * | 2001-03-14 | 2012-07-04 | 東京エレクトロン株式会社 | 加熱装置、熱処理装置及びランプ冷却方法 |
| JP4720154B2 (ja) * | 2004-11-19 | 2011-07-13 | ウシオ電機株式会社 | フラッシュランプ発光装置 |
| JP5920188B2 (ja) * | 2012-11-26 | 2016-05-18 | 信越半導体株式会社 | 加熱装置 |
| JP6299635B2 (ja) * | 2015-03-12 | 2018-03-28 | 信越半導体株式会社 | 気相成長装置及び気相成長装置に用いるリフレクタ |
| US11255606B2 (en) * | 2015-12-30 | 2022-02-22 | Mattson Technology, Inc. | Gas flow control for millisecond anneal system |
-
2000
- 2000-12-27 JP JP2000397555A patent/JP2002198321A/ja active Pending
-
2001
- 2001-10-29 TW TW090126789A patent/TW546711B/zh active
- 2001-11-30 KR KR1020010075255A patent/KR20020053712A/ko not_active Application Discontinuation
- 2001-12-17 EP EP01129994A patent/EP1220300A2/en not_active Withdrawn
- 2001-12-27 US US10/026,803 patent/US20020079798A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20020079798A1 (en) | 2002-06-27 |
| EP1220300A2 (en) | 2002-07-03 |
| KR20020053712A (ko) | 2002-07-05 |
| JP2002198321A (ja) | 2002-07-12 |
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