TW506024B - Semiconductor device - Google Patents
Semiconductor device Download PDFInfo
- Publication number
- TW506024B TW506024B TW090101994A TW90101994A TW506024B TW 506024 B TW506024 B TW 506024B TW 090101994 A TW090101994 A TW 090101994A TW 90101994 A TW90101994 A TW 90101994A TW 506024 B TW506024 B TW 506024B
- Authority
- TW
- Taiwan
- Prior art keywords
- lead
- trapezoidal
- point
- bonding
- bent
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 43
- 235000012431 wafers Nutrition 0.000 claims description 26
- 230000002079 cooperative effect Effects 0.000 claims description 5
- 238000005452 bending Methods 0.000 abstract description 12
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0657—Stacked arrangements of devices
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49575—Assemblies of semiconductor devices on lead frames
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
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- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
- Lead Frames For Integrated Circuits (AREA)
Description
506024 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(/ ) 【發明所屬之技術領域】 本發明’關於積層複數個半導體晶片的半導體裝置。 【習知技術】 半導體裝置,最近被要求更大容量、高機能、高集積 化。爲因應該要求,已提供一封裝體,其藉由積層並搭載 複數個半導體晶片,以提高構裝密度。如此般來提高構裝 密度之封裝體中,爲防止因所鄰接之引線彼此之接觸及樹 脂封裝時之模製所引起之引線彎曲等而產生引線間短路的 事故,必須將引線之上下間隔取寬。 經積層之半導體晶片之墊側的引線部分,必須取相當 程度之上下間隔。然而,導線架之引腳側之引線部分,因 引腳結合點位於平面上,故引線之上下間隔必然變窄。因 此以往,例如特開平11 一204720號公報等所示,將導線架 之朝鄰接引腳的結合點從第2結合位置挪開。 【發明所欲解決之課題】 上述習知技術,因將引腳之結合點從第2結合位置挪 開來進行結合,故半導體裝置變大。又若結合距離變長, 則會發生由於引線之下垂所引起之引線短路。 本發明之課題,係在於提供:能圖謀小型化,同時即 使結合距離變長,不發生引線短路的半導體裝置。 【用以解決課題之手段】 爲解決上述課題本發明之第1手段,其特徵在於:將 複數個半導體晶片積層固定於導線架,將半導體晶片之第 1接合點與導線架之引腳之第2結合點間以梯形環狀之引 4 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ----------:---裝· ----—訂----------線-----AWI (請先閱讀背面之注意事項再填寫本頁) 506024 A7 B7 五、發明說明(>) 線連接,該梯形環狀之引線係由··從第1結合點豎立之頸 部高度,連接於該頸部高度之梯痕部,連接於該梯形部、 往第2結合點之方向傾斜而結合於該第2結合點之傾斜部 所構成環狀;在最上位之引線以外之引線之前述傾斜部, 至少在最下位之引線形成彎曲部。 爲解決上述課題本發明之第2手段,其特徵在於:將 複數個半導體晶片積層固定於導線架,在半導體晶片之第 1結合點與導線架之引腳之第2結合點間以梯形環狀之引 線連接,該梯形環狀之引線係由:從第1結合點豎立之頸 部高度,連接於該頸部高度之梯形部,連接於該梯形部、 往第2結合點之方向傾斜而結合於該第2結合點之傾斜部 所構成環狀;最上位之引線以外之引線之前述傾斜部,係 形成有第3彎曲部,並由連結第2彎曲部(梯形部與傾斜部 之連接部)及前述第3彎曲部之傾斜角大的梯形部側傾斜部 、以及連結前述第3彎曲部與第2接合點而傾斜角比前述 梯形部側傾斜部小之引腳側傾斜部所構成;前述第2彎曲 部中,下方之第2彎曲部最離遠第2結合點,越往上方之 第2彎曲部越靠第2結合點側;又從下方之梯形部側傾斜 部至上方之梯形部側傾斜部,越往上位之傾斜部傾斜角越 大,從下方之引腳側傾斜部至上方之引腳側傾斜部,越往 上位之傾斜部傾斜角越大。 【發明之實施形態】 以圖1說明本發明之第1實施形態。在具有引腳1之 導線架2,積層搭載3個半導體晶片3A,3B,3C。在此, 5 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) --裝 訂.---------線-- 經濟部智慧財產局員工消費合作社印製 506024 A7 B7 五、發明說明(3) 導線架2與半導體晶片3A,半導體晶片3A與3B,半導體 晶片3B與3C,各係以未圖示之i著片或接著劑固定。在 半導體晶片3A,3B,3C之電極之第1結合點4A,4B,4C 及引腳1之第2結合點5A,5B,5C,以未圖示之引線結合 裝置將引線6A,6B,6C連接爲梯形環狀。又,第2結合 點5A,5B,5C之位置,係沿相對於各引腳1之直角方向 排列成直線狀。 引線6A,6B,6C,係呈下列形狀··由將形成於插通 在未圖示之打線裝置毛細管之引線之前端的球體,接合於 第1接合點4A,4B,4C而豎立之頸部高度7A,7B,7C, 連接於該頸部高度7A,7B,7C之梯形部8A,8B,8C,及 連接於該梯形部8A,8B,8C傾斜於第2結合點5A,5B, 5C之方向而結合於該第2結合點5A,5B,5C之傾斜部9A ,9B,9C所形成。 在頸部高度7A,7B,7C與梯形部8A,8B ’ 8C之連 接部,形成第1彎曲部15A,15B,15C,在梯形部8A ’ 8B ,8C與傾斜部9A,9B,9C之連接部,形成第2彎曲部 16A,16B,16C。最上位之引線6C之傾斜部9C以外之引 線6A,6B之傾斜部9A,9B,係由傾斜角大之梯形部側傾 斜部17A,17B,及傾斜角比該梯形部側傾斜部17A ’ 17B 小之引腳側傾斜部18A,18B所形成,在梯形部側傾斜部 17A,17B與引腳側傾斜部18A,18B之連接部’形成第3 彎曲部19A,19B。 第2彎曲部16A,16B,16C,第2彎曲部16A最離遠 6 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) i裝 訂---------線----- 經濟部智慧財產局員工消費合作社印製 506024 A7 B7 五、發明說明(f) 於第2接合點5A,第2彎曲部16B,16C依序挪移於第2 結合點5B,5C,且以依序變高之务式形成。梯形部側傾斜 部17A,17B,傾斜部9C之傾斜角,形成爲梯形部側傾斜 部17A最小,梯形部側傾斜部17B,傾斜部9C依序變大。 又引腳側傾斜部18A,18B,傾斜部9C之傾斜角,形成爲 引腳側傾斜部18A最小,引腳側傾斜部18B,傾斜部9C依 序變大。 如上所述梯形環狀之引線6A,6B,例如能以特開平 10—199916號公報所示之引線結合方法形成。又梯形環狀 之引線6C,則能以在前述公報作爲習知技術所列舉之引線 結合方法形成。 如上所述,引線6A,6B,6C之第2彎曲部16A,16B ,16C,下方之第2彎曲部16A最離遠於第2結合點5A, 越上方之第2彎曲部16B,16C越靠第2結合點5B,5C側 ,又梯形部側傾斜部17A,17B,傾斜部9C之傾斜角,依 序變大,又引腳側傾斜部18A,18B,傾斜部9C之傾斜角 ,亦依序變大。因此,即使第2結合點5A,5B,5C呈直 線狀,因第2結合點5A,5B,5C側之引腳側傾斜部18A ,18B,傾斜部9C之間隔變寬,故能防止引線6A,6B, 6C同伴之接觸及灌注樹脂時之造模所引起之引線6A,6B ,6C之彎曲等。即,第2結合點5A,5B,5C之位置能沿 相對於各引腳1之直角方向排列成直線狀,故能圖謀半導 體裝置之小型化。又即使結合距離變長亦不會發生引線短 路。 7 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) -丨裝 —訂---------線----- 經濟部智慧財產局員工消費合作社印製 506024
五、發明說明(f) ---------------裝 (請先閱讀背面之注意事項再填寫本頁) 圖2至圖6,係顯示本發明之第2至第6實施形態。 以下,對與前述第1實施形態相幽或相當部分使用同一符 號,而省略其詳細說明。 •線- 圖2,係顯示本發明之第2實施形態。圖1,係就適用 在引線6A,6B,6C形成爲俯視不交叉之情形說明。圖2, 係顯不引線6A對引線6B,6C形成爲俯視交叉之情形。在 該情形,亦與前述第1實施形態同樣,引線6A,6B,6C 之第2彎曲部16A,16B,16C,下方之第2彎曲部16A最 離遠第2結合點5A,越往上方之第2彎曲部16B,16C越 靠第2結合點5B,5C側,又梯形部側傾斜部17A,17B, 傾斜部9C之傾斜角,依序變大,又引腳側傾斜部18A, 18B,傾斜部9C之傾斜角,亦依序變大。因此,即使第2 結合點5A、5B、5C之位置沿相對於各引腳1之直角方向 排列成直線狀,因第2結合點5A,5B,5C側之引腳側傾 斜部18A,18B,傾斜部9C之間隔變寬,故能獲得與圖1 之第1實施形態同樣之效果。 經濟部智慧財產局員工消費合作社印製 圖3及圖4,係顯示本發明之第3至第4實施形態。 圖1及圖2,係就適用於積層3個半導體晶片3A,3B,3C 者之情形說明。圖3及圖4,係顯示適用於積層2個半導 體晶片3A,3C者之情形。該情形,亦引線6A,6C之第 2彎曲部16A,16C,下方之第2彎曲部16A最離遠第2結 合點5A,越往上方之第2彎曲部16C越靠第2結合點5C 側,又梯形部側傾斜部17A,傾斜部9C之傾斜角,依序變 大,又引腳側傾斜部18A,傾斜部9C之傾斜角,亦依序變 8 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 經濟部智慧財產局員工消費合作社印製 506024 _____B7__ 五、發明說明(t)) 大。因此,即使第2結合點5A,5C之位置沿相對於各引 腳1之直角方向排列成直線狀,g第2結合點5A,5C側 之引腳側傾斜部18A,傾斜部9C之間隔變寬,故能獲得與 圖1之第1實施形態同樣之效果。即,所積層之半導體晶 片3A ’ 3B ’ 3C · · ·之數目,不限定於前述之3個或2個 ,即使是4個以上亦能同樣適用。 圖5及圖6,係顯示本發明之第5至第6實施形態。 在圖1及圖2,係僅圖示對各半導體晶片3A,3B,3C各有 1個第1結合點4A,4B,4C,僅圖示對應其第1結合點4A ,4B,4C之引腳1。然而,一般,各半導體晶片3A,3B ,3C之第1結合點4A,4B,4C,係順沿各半導體晶片3A ,:3B,3C之各邊複數設置,對應各自之第1結合點4A, 4B,4C設置引腳1。圖5及圖6,係作爲1例,顯示適用 於在半導體晶片3A除沿各邊之第1結合點4A以外具有第 1結合點4A1者之情形。
該情形亦與第1實施形態同樣,引線6A,6A1,6B, 6C之第2彎曲部16A,16A1,16B,16C,下方之第2彎 曲部16A最離遠第2結合點5A,越往上方之第2彎曲部 16A1,16B,16C越靠第2結合點5A :l,5B,5C側,又梯 形部側傾斜部17A,17A1,17B,傾斜部9C及引腳側傾斜 部18A,18A1,18B,.傾斜部9C之傾斜角,依序變大。因 此,即使第2結合點5A,5A1,5B,5C之位置沿相對於各 引腳1之直角方向排列成直線狀,因第2結合點5A,5A1 ,5B,5C側之引腳側傾斜部18A,18A1,18B,傾斜部9C 9 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁)
506024 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(^)) 之間隔變寬,故能獲得與圖1之第1實施形態同樣之效果 。圖中,19A1係顯示引線6A1之窠3彎曲部。 又,在上述各實施形態,雖在最上位之引線6C以外 之引線6A,6A1,6B之傾斜部9A,9A1,9B,全部形成第 3彎曲點19A,19A1,19B,但至少在最下位之引線6A形 成第3結合點19A,亦具有效果。 【發明之效果】 本發明,因將複數個半導體晶片積層固定於導線架, 將半導體晶片之第1結合點與導線架之引腳之第2結合點 間以梯形環狀之引線連接,該梯形環狀之引線係由:從第 1結合點豎立之頸部高度,連接於該頸部高度之梯形部, 連接於該梯形部,傾斜於第2結合點之方向,而結合於該 第2結合點之傾斜部三者所構成,在最上位之引線以外之 引線之前述傾斜部,至少在最下位引線形成彎曲部,故能 圖謀半導體裝置之小型化,同時即使結合距離變長亦不會 發生引線短路。 【圖式之簡單說明】 圖1,係顯示本發明之半導體裝置之第1實施形態, (a)係前視說明圖,(b)係俯視說明圖。 圖2,係顯示本發明之半導體裝置之第2實施形態, ⑻係前視說明圖,(b)係俯視說明圖。 圖3,係顯示本發明之半導體裝置之第3實施形態, (a)係前視說明圖,(b)係俯視說明圖。 圖4,係顯示本發明之半導體裝置之第4實施形態, 10 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 丨裝 -{ ·ϋ ί 1· 一 οτ I n ί I n n I— n I d n m n . 506024 A7 B7 五、發明說明(/ ) ⑷係前視說明圖,(b)係俯視說明圖。 圖5,係顯示本發明之半導體'裝置之第 ⑷係前視說明圖,(b)係俯視說明圖。 圖6,係顯示本發明之半導體裝置之第 (a)係前視說明圖,(b)係俯視說明圖。 【符號說明】 實施形態 實施形態 1 引腳 2 導線架 3A 3B, 3C 半導體晶片 4A 4A1 ,4B, ,4C 第1結合點 5A 5A1 ,5B, ,5C 第2結合點 6A 6A1 ,6B, -6C 引線 7A 7A1 ,7B, 、1C 頸部高度 8A 8A1 ,8B, ^ 8C 梯形部 9A 9A1 ,9B, -9C 傾斜部 經濟部智慧財產局員工消費合作社印製 15A,15A1,15B 16A,16A:i,16B 17A,17A:l,17B 18A,18Α;ί,18B 19Α,19Α卜 19Β
15C 16C 第1彎曲部 第2彎曲部 梯形部側傾斜部 引腳側傾斜部 第3彎曲部 11 -------r I -------. ----—訂.丨丨 ------I ------- (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
Claims (1)
- 506024 A8 B8 C8 D8 六、申請專利範圍 1、 一種半導體裝置,其特徵係:將複數個半導體晶片 積層固定於導線架,將半導體晶片之第1結合點與導線架 之引腳之第2結合點間以梯形環狀之引線連接,該梯形環 狀之引線係由·從第1結合點暨JJL之頸部筒度,連接於該 頸部高度之梯形部,及連接於該梯形部、往第2結合點之 方向傾斜而結合於該第2接合點之傾斜部三者所構成; 在最上位引線以外的引線之前述傾斜部,至少在最下 位之引線形成彎曲部。 2、 一種半導體裝置,其特徵係:將複數個半導體晶片 積層固定於導線架,將半導體晶片之第1結合點與導線架 之引腳之第2結合點間以梯形環狀之引線連接,該梯形環 狀之引線係由:從第1結合點豎立之頸部高度,連接於該 頸部高度之梯形部,及連接於該梯形部、往第2結合點之 方向傾斜而結合於該第2接合點之傾斜部三者所構成; 最上位引線以外的引線之前述傾斜部,係形成有第3 彎曲部,並由連結第2彎曲部(梯形部與傾斜部之連接部) 及則述第3彎曲部之傾斜角大的梯形部側傾斜部、以及連 結前述第3彎曲部與第2結合點之傾斜角比前述梯形部側 傾斜部小之引腳側傾斜部所形成; 前述第2彎曲部中,下方之第2彎曲部最離遠第2結 合點,越往上方之第2彎曲部越靠第2結合點側; 又從下方之梯形部側傾斜部至上方之梯形部側傾斜部 ,越往上位之傾斜部其傾斜角越大,從下方之引腳側傾斜 部至上方之引腳側傾斜部,越往上位之傾斜部其傾斜角越 1 本紙張尺度適用中國國家標準(CNS)A4規袼(210 X 297公釐) ------------^---裝·* (請先閱讀背面之注意事項再填寫本頁) 訂: -線 經濟部智慧財產局員工消費合作社印製 506024 A8 B8 C8 D8 六、申請專利範圍 大 ---I---J------. IAW----— 訂-丨 I (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
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JP2000165557A JP3370646B2 (ja) | 2000-06-02 | 2000-06-02 | 半導体装置 |
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TW506024B true TW506024B (en) | 2002-10-11 |
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TW090101994A TW506024B (en) | 2000-06-02 | 2001-02-01 | Semiconductor device |
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US (1) | US20010054759A1 (zh) |
JP (1) | JP3370646B2 (zh) |
KR (1) | KR20010110080A (zh) |
TW (1) | TW506024B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6483736B2 (en) | 1998-11-16 | 2002-11-19 | Matrix Semiconductor, Inc. | Vertically stacked field programmable nonvolatile memory and method of fabrication |
US8575719B2 (en) | 2000-04-28 | 2013-11-05 | Sandisk 3D Llc | Silicon nitride antifuse for use in diode-antifuse memory arrays |
AU2001286432A1 (en) | 2000-08-14 | 2002-02-25 | Matrix Semiconductor, Inc. | Dense arrays and charge storage devices, and methods for making same |
JP2002124626A (ja) * | 2000-10-16 | 2002-04-26 | Hitachi Ltd | 半導体装置 |
US7352199B2 (en) * | 2001-02-20 | 2008-04-01 | Sandisk Corporation | Memory card with enhanced testability and methods of making and using the same |
US6843421B2 (en) | 2001-08-13 | 2005-01-18 | Matrix Semiconductor, Inc. | Molded memory module and method of making the module absent a substrate support |
US6525953B1 (en) | 2001-08-13 | 2003-02-25 | Matrix Semiconductor, Inc. | Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication |
US6624485B2 (en) | 2001-11-05 | 2003-09-23 | Matrix Semiconductor, Inc. | Three-dimensional, mask-programmed read only memory |
US6731011B2 (en) | 2002-02-19 | 2004-05-04 | Matrix Semiconductor, Inc. | Memory module having interconnected and stacked integrated circuits |
JP3888438B2 (ja) * | 2002-02-25 | 2007-03-07 | セイコーエプソン株式会社 | 半導体装置及びその製造方法、回路基板並びに電子機器 |
US6853049B2 (en) | 2002-03-13 | 2005-02-08 | Matrix Semiconductor, Inc. | Silicide-silicon oxide-semiconductor antifuse device and method of making |
US6933223B1 (en) * | 2004-04-15 | 2005-08-23 | National Semiconductor Corporation | Ultra-low loop wire bonding |
JP2008034567A (ja) * | 2006-07-27 | 2008-02-14 | Fujitsu Ltd | 半導体装置及びその製造方法 |
KR100843441B1 (ko) * | 2007-01-02 | 2008-07-03 | 삼성전기주식회사 | 멀티칩 패키지 |
JP5595694B2 (ja) | 2009-01-15 | 2014-09-24 | パナソニック株式会社 | 半導体装置 |
US9478495B1 (en) | 2015-10-26 | 2016-10-25 | Sandisk Technologies Llc | Three dimensional memory device containing aluminum source contact via structure and method of making thereof |
-
2000
- 2000-06-02 JP JP2000165557A patent/JP3370646B2/ja not_active Expired - Fee Related
-
2001
- 2001-02-01 TW TW090101994A patent/TW506024B/zh not_active IP Right Cessation
- 2001-03-10 KR KR1020010012426A patent/KR20010110080A/ko not_active Application Discontinuation
- 2001-06-01 US US09/871,870 patent/US20010054759A1/en not_active Abandoned
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JP2001345339A (ja) | 2001-12-14 |
JP3370646B2 (ja) | 2003-01-27 |
KR20010110080A (ko) | 2001-12-12 |
US20010054759A1 (en) | 2001-12-27 |
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