TW505933B - Laminated body, capacitor, electronic part, and method and device for manufacturing the laminated body, capacitor, and electronic part - Google Patents
Laminated body, capacitor, electronic part, and method and device for manufacturing the laminated body, capacitor, and electronic part Download PDFInfo
- Publication number
- TW505933B TW505933B TW090108375A TW90108375A TW505933B TW 505933 B TW505933 B TW 505933B TW 090108375 A TW090108375 A TW 090108375A TW 90108375 A TW90108375 A TW 90108375A TW 505933 B TW505933 B TW 505933B
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- Taiwan
- Prior art keywords
- film
- thin film
- metal
- metal thin
- laminated body
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/232—Terminals electrically connecting two or more layers of a stacked or rolled capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
505933 經濟部智慧財產局員Η消費合作社印製 ΚΙ __ Β7____ 五、發明說明(/ ) [技術領域] _ 本發明係關於積層有樹脂薄膜與金屬薄膜之積層體、 以及使用該積層體所得之電容器與電子零件。又,本發明 係關於在製造上述積層體、電容器以及電子零件時適於使 用之製造方法以及製造裝置。 [背景技術] 以積層樹脂薄膜之製程與積層金屬薄膜之製程爲一單 位,在周旋之支撐體上反覆進行,藉以製造出由樹脂薄膜 與金屬薄膜所交互積層之積層體的方法、以及由所得之積 層體獲得電容器等之電子零件的方法,已揭諸於例如日本 專利特開平10-237623號公報等之中。 以下利用圖式說明樹脂薄膜與金屬薄膜之積層體的製 造方法之一例。^ 圖22係以示意的方式表示以往之用以實施_層體之製 造方法的製造裝置之一例的槪略截面圖。 於圖22中,915係真空槽,916係用以將真空槽915 之內部維持在既定之真空度的真空栗,911係設置在真空 槽915內、往圖中之箭頭方向旋轉之圓筒形狀的容器輥 (cp roller),912係樹脂薄膜形成裝置,913係圖案化材料 賦予裝置,914係金屬薄膜形成裝置,917係圖案材料去除 裝置,918係樹脂硬化裝置,919係表面處理裝置, 920a,920b係將金屬薄膜形成區域區隔成不同區域的隔壁, 922係設於隔壁920a,920b之開口,923係除非必要時否貝[] 爲了防止金屬薄膜之形成而關閉開口 922所用之遮蔽板。 3 (請先閱讀背面之注意事項再填寫本頁) ·· 訂-------- 線丨 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(1) 樹脂薄膜形成裝置912爲了形成樹脂薄膜,乃加熱樹 脂材料使其氣化或霧化,朝向容器輥911之外周面放出。 容器輥911由於被冷卻到既定之溫度,樹脂材料乃冷卻而 於容器輥911之外周面堆積成膜狀。 堆積之樹脂材料可依所需情形而藉由樹脂硬化裝置 918照射電子束或紫外線等來硬化處理成爲既定之硬度。 接著,所形成之樹脂薄膜,可依必要性藉表面處理裝 置919施以氧等離子體處理等,使得樹脂薄膜表面活性化 〇 圖案化材料賦予裝置913係一種藉由稱爲油式圖案化 (oil patterning)的做法在金屬薄膜形成邊緣部(也可說是非 金屬帶),而將金屬薄膜圖案化成既定之形狀的裝置。於樹 脂薄膜上事先形成薄薄的圖案化材料之後> 藉由蒸鍍等來 形成金屬薄膜,則在圖案化材料上不會形成金虐薄膜,而 會形成邊緣部。以此方式所形成之金屬薄膜,係在空出圖 案化部分的狀態下所形成,而可形成擁有既定圖案之金屬 薄膜。圖案化材料係在圖案化材料賦予裝置913內氣化, 於既定之位置朝著容器輥911之外周面從形成之微細孔放 出.。微細孔通常係以大致平行於容器輥911之旋轉軸方向 的方式來隔著既定間隔配置複數個。藉此’形成金屬薄膜 之面會被先薄薄地塗佈上呈複數帶狀的圖案化材料。 之後,採用金屬薄膜形成裝置914 ’藉蒸鍍等來形成 金屬薄膜。 之後,藉由圖案化材料去除裝置917來去除.殘餘之圖 4 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 IAW------- 丨訂---------線丨----------------------- $張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 5丨 5丨 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(;) 案化材料。 . 依據以上之製造裝置900,在讓遮蔽板923退開而開 放開口 922的狀態下,在旋轉之容器輥911之外周面上, 可製造出由樹脂薄膜形成裝置912所形成之樹脂薄膜以及 由金屬薄膜形成裝置914所形成之金屬薄膜所交互積層而 得之積層體。又,若遮蔽板923遮蔽著開口 922的狀態下 ,於旋轉之容器輥911之外周面上,可製造出由樹脂薄膜 形成裝置912所形成之樹脂薄膜連續積層所得之積層體。 又,在容器輥911旋轉的同時,使得圖案化材料賦予裝置 913移動(例如往返移動)於與容器輥911之旋轉軸呈平行之 方向上,可形成邊緣部位置不同的金屬薄膜。 以上述方式,在容器輥911之外周面上形成由金屬薄 膜與樹脂薄膜所構成之圓筒狀之多層積層體,之後,將積 層體自半徑方向切斷,從容器輥911取下,進存平板加壓 ,而可得到例如圖23之積層體母元件930。於圖23中, 931係金屬薄膜,932係樹脂薄膜,933係邊緣部(金屬薄 膜之非形成區域),箭頭938係一致於容器輥911之外周面 的前進方向。圖23之積層體母元件930係於容器輥911上 依,序積層出層936a、層935a、層934、層935b、層936b 所製造者。此處,層936a,936b係關起遮蔽板923僅連續 地積層樹脂薄膜所得之層,層934與層935a,935b係退開 遮蔽板923而交互地積層金屬薄膜931與樹脂薄膜932所 得之層。又,層934係容器輥911每旋轉一次即變更圖案 化材料之附著位置而稹層者。 5 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) -· I n -I n I n n f ϋ ·1 n I ϋ n ϋ I n 1· n 1· I ϋ n I I I I n n ϋ ϋ ϋ ϋ I H ϋ I- 505933 A7 B7 五、發明說明(+ ) 將該積層體母元件930例如自切斷面939a,939b切斷 ,於切斷面939a形成外部電極,藉此,可得到多數之圖 24所示之晶片電容器940。於圖24中,941a,941b係與金 屬薄膜做電氣連接所形成之外部電極。 以上述方法所得之電容器,由於作爲電介質層之樹脂 薄膜的厚度非常地薄,乃成爲小型、大容量之電容器。 惟,上述方法所進行之電容器等之電子零件的製造中 存在著以下問題。 * 首先,自切斷面939a,939b切斷積層體母元件930之 時,一定會切斷金屬薄膜931。切斷係以例如刀具做裁剪 來進行。此時在切斷面會發生金屬薄膜931之毛邊或切屑 。由於上述方式所得之樹脂薄膜、金屬薄膜極薄,金屬薄 膜931之毛邊或切屑有時會造成挾持樹脂薄膜的上下金屬 薄膜彼此的短路。此乃成爲所得之電容器之耐處、絕緣電 阻之降低的原因。 又,爲了切斷金屬薄膜,乃需要遠遠超過切斷樹脂薄 膜之大的切斷力。從而,一旦切斷條件不適當,會因爲切 斷金屬薄膜造成切斷面附近之積層體變形、或是金屬薄膜 受,.到拉扯而於積層體內部發生金屬薄膜之破裂。積層體之 外形的變形在作爲電子零件來使用之時會降低組裝至電路 基板之際的組裝性。又,金屬薄膜在積層體內部之破裂會 導致電子零件之特性的惡化、良率的下降。 再者,切斷金屬薄膜意味著金屬薄膜會露出於切斷面 、。一旦金屬薄膜露出切斷面,金屬薄膜會從切斷面進行氧 6 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -· 1 n n I— n n n 一 -0, I n ϋ— n ϋ n Hi I I 1 n n n n ϋ n n I ϋ ϋ I— n 1 n n I n n n n . 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(r) 化或生鏽等之腐蝕。一旦作爲電極來作用之金屬薄膜受到 腐触,所得之電子零件的可靠度會顯著地降低。爲了防止 此種現象,有必要於切斷面施以樹脂塗佈等之包裝處理., 此將導致製程數目的增加與成本的上升。505933 Printed by a member of the Intellectual Property Bureau of the Ministry of Economic Affairs and a Consumer Cooperative, printed Κ_ _ Β7 ____ V. Description of Invention (/) [Technical Field] _ This invention relates to a laminated body having a resin film and a metal film laminated, and a capacitor and Electronic parts. The present invention also relates to a manufacturing method and a manufacturing apparatus suitable for use in manufacturing the multilayer body, the capacitor, and the electronic component. [Background Art] Taking the process of laminated resin film and the process of laminated metal film as a unit, iteratively carried out on a circular support to produce a laminated body composed of a resin film and a metal film alternately laminated, and a method A method for obtaining an electronic component such as a capacitor from a laminated body has been disclosed in, for example, Japanese Patent Laid-Open No. 10-237623. An example of a method for manufacturing a laminated body of a resin film and a metal film will be described below with reference to drawings. ^ FIG. 22 is a schematic cross-sectional view showing an example of a conventional manufacturing apparatus for implementing a manufacturing method of a layered body. In FIG. 22, 915 is a vacuum tank, 916 is a vacuum pump for maintaining the inside of the vacuum tank 915 at a predetermined vacuum degree, and 911 is a cylindrical shape installed in the vacuum tank 915 and rotating in the direction of the arrow in the figure. Container roller (cp roller), 912 series resin film forming device, 913 series patterning material applying device, 914 series metal film forming device, 917 series pattern material removing device, 918 series resin hardening device, 919 series surface treatment device, 920a 920b is a partition wall that separates the area where the metal thin film is formed into different areas, 922 is provided at the opening of the 920a, 920b, and 923 is a shield plate used to close the opening 922 to prevent the formation of the metal film, unless necessary . 3 (Please read the notes on the back before filling out this page) ·· Order -------- Line 丨 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 5 DESCRIPTION OF THE INVENTION (1) In order to form a resin film, a resin film forming device 912 heats a resin material to vaporize or atomize it, and releases it toward the outer peripheral surface of the container roller 911. Since the container roller 911 is cooled to a predetermined temperature, the resin material is cooled, and the film is deposited on the outer peripheral surface of the container roller 911. The stacked resin material can be hardened to a predetermined hardness by irradiating the resin hardening device 918 with an electron beam or ultraviolet rays according to a required situation. Next, the formed resin film may be subjected to an oxygen plasma treatment or the like by a surface treatment device 919 as necessary, so that the surface of the resin film is activated. The patterning material imparting device 913 is a type of oil patterning (oil). Patterning) is a device that forms an edge portion (also referred to as a non-metal band) on a metal thin film, and patterns the metal thin film into a predetermined shape. After forming a thin patterned material on the resin film in advance > forming a metal thin film by evaporation or the like, a gold film is not formed on the patterned material, but an edge portion is formed. The metal thin film formed in this way is formed in a state where the patterned portion is vacated, and a metal thin film having a predetermined pattern can be formed. The patterned material is vaporized in the patterned material applying device 913, and is released from the formed fine holes toward the outer peripheral surface of the container roller 911 at a predetermined position. The fine holes are generally arranged at a predetermined interval so as to be substantially parallel to the direction of the rotation axis of the container roller 911. Thus, the surface where the metal thin film is formed is thinly coated with a patterned material having a plurality of band shapes. Thereafter, a metal thin film forming apparatus 914 'is used to form a metal thin film by vapor deposition or the like. After that, it is removed by a patterned material removal device 917. Residual Figure 4 (Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs IAW ------- 丨 Order --------- line 丨 ----------------------- $ Zhang scale is applicable to China National Standard (CNS) A4 specification (210 X 297 (Mm) 5 丨 5 丨 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (;) Case materials. According to the manufacturing device 900 described above, the resin film formed by the resin film forming device 912 and the resin film formed by the resin film forming device 912 can be manufactured on the outer peripheral surface of the rotating container roller 911 with the shielding plate 923 retracted and the opening 922 opened. A laminated body obtained by alternately laminating metal thin films formed by a metal thin film forming device 914. In addition, when the shielding plate 923 covers the opening 922, a laminated body obtained by continuously laminating the resin film formed by the resin film forming device 912 on the outer peripheral surface of the rotating container roller 911 can be manufactured. In addition, when the container roller 911 is rotated, the patterning material applying device 913 is moved (e.g., reciprocated) in a direction parallel to the rotation axis of the container roller 911 to form metal thin films having different positions of the edge portions. In the above manner, a cylindrical multilayer laminate composed of a metal film and a resin film is formed on the outer peripheral surface of the container roll 911, and then the laminate is cut from the radial direction, removed from the container roll 911, and stored. The flat plate is pressurized to obtain, for example, the laminated body mother element 930 of FIG. 23. In Fig. 23, the 931 series metal film, the 932 series resin film, the 933 series edge portion (non-formation area of the metal film), and the arrow 938 are aligned with the advancing direction of the outer peripheral surface of the container roller 911. The laminated body mother element 930 of FIG. 23 is manufactured on the container roll 911, and the layers 936a, 935a, 934, 935b, and 936b are sequentially laminated. Here, the layers 936a and 936b are layers obtained by continuously laminating the shielding film 923 only with the resin film, and the layers 934 and 935a and 935b are layers obtained by alternately laminating the metal film 931 and the resin film 932 with the shielding plate 923 retracted . In addition, the layer 934 is a layer in which the container roller 911 changes the position at which the patterning material is adhered each time the container roller 911 is rotated. 5 This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling this page)-· I n -I n I nnf ϋ · 1 n I ϋ n ϋ I n 1 · n 1 · I ϋ n IIII nn ϋ ϋ ϋ ϋ IH ϋ I- 505933 A7 B7 V. Description of the invention (+) The laminated body element 930 is cut from the cut surface 939a, 939b, for example. An external electrode is formed in the cross-section 939a, whereby a large number of chip capacitors 940 shown in FIG. 24 can be obtained. In Fig. 24, 941a and 941b are external electrodes formed by making electrical connection with a metal thin film. The capacitor obtained by the above method has a very small thickness as a resin film as a dielectric layer, and thus becomes a small-sized, large-capacity capacitor. However, the following problems exist in the manufacture of electronic parts such as capacitors by the above method. * First, when the multilayer body element 930 is cut from the cut surfaces 939a and 939b, the metal thin film 931 must be cut. The cutting is performed by, for example, cutting with a cutter. At this time, burrs or chips of the metal film 931 may occur on the cut surface. Since the resin film and the metal film obtained in the above manner are extremely thin, burrs or chips of the metal film 931 may cause a short circuit between the upper and lower metal films holding the resin film. This is the reason for the reduction in the resistance and insulation resistance of the obtained capacitor. Further, in order to cut a metal thin film, a cutting force far exceeding a cutting force of a resin film is required. Therefore, if the cutting conditions are not appropriate, the laminated body near the cut surface may be deformed due to the cutting of the metallic thin film, or the metallic thin film may be subjected to pulling and the metallic thin film may be broken inside the laminated body. Deformation of the outer shape of the laminated body when used as an electronic component reduces the assemblability when assembled on a circuit board. In addition, the cracking of the metal thin film inside the laminated body causes deterioration of the characteristics of the electronic component and a decrease in the yield. Furthermore, cutting the metal thin film means that the metal thin film is exposed on the cut surface. Once the metal film is exposed to the cut surface, the metal film will be oxygenated from the cut surface. 6 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-· 1 nn I— nnn a-0, I n ϋ— n ϋ n Hi II 1 nnnn ϋ nn I ϋ ϋ I— n 1 nn I nnnn. Printed by Employee Consumer Cooperative 505933 A7 B7 V. Description of the invention (r) Corrosion caused by rusting or rusting. Once the metal film acting as an electrode is corroded, the reliability of the obtained electronic parts is significantly reduced. In order to prevent this phenomenon, it is necessary to apply a packaging treatment such as resin coating to the cut surface. This will lead to an increase in the number of processes and an increase in cost.
又,金$屬薄膜露出於切斷面的狀態下,。例如組裝至電 路基板之際,有時所露出之金屬薄膜會附著有焊料而發生 短路。爲了防止此現象,於組裝時必須特別考慮此情形, 而成爲組裝上的限制。 I 再者,爲了形成與金屬薄膜做電氣連接之外部電極, 切斷金屬薄膜使其露出乃爲不可避免之事。惟,未預定形 成外部電極的切斷面則以不要切斷金屬薄膜爲佳,或是不 使金屬薄膜露出於切斷面爲佳。 又,圖24之電容器係以1個晶片構成」個電容器元件 。從而,若需對電路基板搭載複數之電容器時;會需要對 應數量的電容器,此將導致組裝面積之小型化受到妨礙, 又製程數量會增加。又,爲了高速驅動半導體晶片,減少 .半導體晶片與周邊元件之連接長度爲有效的做法,惟一旦 搭載多數之電容器,電路長度勢必變長,此會妨礙訊號處 理的高速化。 [發明之揭示] 本發明之目的係解決上述習知所遭遇之問題的一部分 或全部。 [關於第I發明] 第I發明之目的在於提供一種積層體、電容器以及該 7 ϋ張尺度適用7國國家標準(CNS)A4規格(210 X 297公釐)" ' ------------------訂---------線" (請先閱讀背面之注意事項再填寫本頁) 505933 A7 ___B7 五、發明說明(έ) 等之製造方法與製造裝_,其可儘可能地避免金屬薄膜之 切斷,儘可能地避免金屬薄膜自切斷面露出。又,以提供 一種在一個元件內含有複數之電容器、與其他之元件的複 合化容易的電容器列及其製造方法、製造裝置爲目的。 第I發’明爲了達成上述目的乃具以下構成。 本第I發明之第1積層體,係由複數之樹脂薄膜與複 數之金屬薄膜所積層而得者;其特徵在於’前述金屬薄膜 之端部並未露出於前述積層體之外部‘;前述樹脂薄膜之至 少1層具有在積層方向之貫通孔;透過前述貫通孔讓上下 之前述金屬薄膜做電氣連接;前述金屬薄膜之至少1層可 經由前述貫通孔而取出電極到外部。 依據該第1積層體,由於金屬薄膜之端部未露出於前 述積層體之外部,不易發生金屬薄膜之腐蝕等。又,由於 在製造過程中未切斷金屬薄膜,可抑制於金屬#膜之切if 時所遭遇的問題(例如金屬薄膜之毛邊或切屑、金屬薄膜之 破裂、積層體之變形等)。又,由於金屬薄膜可經由貫通孔^ 而取出電極到外部,乃可提供作爲電子零件使用之積層體y 0 .又,本第I發明之第2積層體,係由複數之樹脂薄膜In addition, the gold thin film is in a state where the cut surface is exposed. For example, when assembling to a circuit board, solder may adhere to the exposed metal thin film and cause a short circuit. In order to prevent this phenomenon, special consideration must be given to this situation during assembly, which becomes an assembly limitation. I Furthermore, in order to form an external electrode which is electrically connected to the metal thin film, it is inevitable to cut the metal thin film and expose it. However, it is preferable that the cut surface where the external electrode is not formed is not cut, or the metal film is not exposed on the cut surface. The capacitor shown in FIG. 24 is composed of one capacitor element. Therefore, if a plurality of capacitors need to be mounted on a circuit board, a corresponding number of capacitors will be required, which will hinder the miniaturization of the assembly area and increase the number of processes. In addition, in order to drive the semiconductor wafer at high speed, it is effective to reduce the connection length between the semiconductor wafer and peripheral components. However, once a large number of capacitors are mounted, the circuit length will inevitably become longer, which will hinder the speed of signal processing. [Disclosure of the invention] The object of the present invention is to solve part or all of the problems encountered in the above-mentioned conventional knowledge. [About the first invention] The object of the first invention is to provide a multilayer body, a capacitor, and the 7-sheet standard applicable to the 7 national standards (CNS) A4 specifications (210 X 297 mm) " '------ ------------ Order --------- line " (Please read the precautions on the back before filling this page) 505933 A7 ___B7 V. Description of the invention The manufacturing method and the manufacturing device can avoid cutting of the metal film as much as possible, and prevent the metal film from being exposed from the cut surface as much as possible. It is also an object of the present invention to provide a capacitor array including a plurality of capacitors in one element and a capacitor that can be easily combined with other elements, a method of manufacturing the same, and a manufacturing apparatus. The first issue 'states that in order to achieve the above-mentioned object, it has the following constitution. The first laminated body of the first invention is obtained by laminating a plurality of resin films and a plurality of metal films; it is characterized in that 'the end portion of the aforementioned metal film is not exposed to the outside of the aforementioned laminated body'; the aforementioned resin At least one layer of the film has through-holes in the lamination direction; the metal films above and below are electrically connected through the through-holes; at least one layer of the metal films can take out electrodes to the outside through the through-holes. According to this first laminated body, since the end portion of the metal thin film is not exposed to the outside of the aforementioned laminated body, corrosion of the metal thin film and the like are unlikely to occur. In addition, since the metal thin film is not cut during the manufacturing process, problems encountered when cutting the metal #film (such as burrs or chips of the metal thin film, cracking of the metal thin film, deformation of the laminated body, etc.) can be suppressed. In addition, since the metal thin film can take out an electrode to the outside through the through hole ^, it can provide a laminated body y 0 used as an electronic part. Moreover, the second laminated body of the first invention is made of a plurality of resin films.
I 與複數之金屬薄膜所積層而得者;其特徵在於,前述樹脂 薄膜之至少1層的周圍一部分具有缺口部;透過前述缺口 部讓上下之前述金屬薄膜做電氣連接;前述金屬薄膜之至 少1層可經由前述缺口部而取出電極到外部。 依據該第2積層體,由於金屬薄膜可經由缺口部而取 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公爱) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -· I I I I I I I .ιδ]· — - — — · — — 1 — — — — — — — — — — — I — — I — — — — — — — · 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(q ) 出電極到外部,乃可提供.作爲電子零件使用之積層體。 於上述第2積層體中,較佳的情形爲:前述樹脂薄膜 呈大致矩形狀,在前述樹脂薄膜之形成有前述缺口部之邊 的以外之邊,前述金屬薄膜係後退形成。依據此較佳之構 成,由於金^屬薄膜之端部係自樹脂薄膜之端部後退而形成 ,可減少露出於積層體之外部的金屬薄膜。是以’不易發 生金屬薄膜之腐飩等。又,由於在製造過程中未切斷金屬 薄膜,可抑制於金屬薄膜之切斷時所遭遇的問題(例如金屬 薄膜之毛邊或切屑、金屬薄膜之破裂、積層體之變形等)。 其次,本第I發明之第1電容器,係使用由複數之樹 脂薄膜與複數之金屬薄膜所積層之積層體而得者;其特徵 在於,前述金屬薄膜之端部並未露出於前述積層體之外部 ;前述樹脂薄膜之至少1層具有在積層方佝之貫通孔;透 過前述貫通孔讓前述金屬薄膜以每隔1層即成等電位的 方式做電氣連接;等電位連接之前述金屬薄膜,係經由前 述貫通孔而取出電極到外部。 依據該第1電容器,由於金屬薄膜之端部未露出於前 述積層體之外部,乃不易發生金屬薄膜之腐蝕等。又,由 於在製造過程中未切斷金屬薄膜,可抑制於金屬薄膜之切 斷時所遭遇的問題(例如金屬薄膜之毛邊或切屑、金屬薄膜 之破裂、積層體之變形等)。又,由於每隔1層做連接之金 屬薄膜可與外部做電氣連接,樹脂薄膜乃得以行使成爲電 介質層之電容器的功能。又,由於電極取出係經由形成於 樹脂薄膜之貫通孔來進行,可減少基板組裝時之組裝面積 9 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------------41^--------訂—------^線 (請先閱讀背面之注意事項再填寫本頁) 505933 A7 B7 五、發明說明(?) ,實現高密度組裝。 . (請先閱讀背面之注意事項再填寫本頁) 又,本第I發明之第2電容器,係使用由複數之樹脂 薄膜與複數之金屬薄膜所積層之積層體而得者;其特徵在 於,前述樹脂薄膜之至少1層在周圍的一部分具有缺口部 :透過前述缺口部讓前述金屬薄膜以每隔1層即成爲等電 位的方式做電氣連接;等電位連接之前述金屬薄膜’係經 由前述缺口部而取出電極到外部。 依據該第2電容器,由於每隔1層做連接之金屬薄膜 可與外部做電氣連接,樹脂薄膜乃得以行使成爲電介質層 之電容器的功能。又,由於電極取出係經由形成於樹脂薄 膜之缺口部來進行,可減少基板組裝時之組裝面積’實現 高密度組裝。 於上述第2電容器中,較佳爲:前述樹脂薄膜呈大致 矩形狀,在前述樹脂薄膜之形成有前述缺口部έ邊的以外 之邊,前述金屬薄膜係後退形成。依據該較佳構成,由於 金屬薄膜之端部係自樹脂薄膜之端部所後退形成者,可減 少露出於積層體之外部的金屬薄膜。是以,乃不易發生金 屬薄膜之腐鈾等。又,由於在製造過程中切斷之金屬薄膜 經濟部智慧財產局員工消費合作社印製 減少,可抑制於金屬薄膜之切斷時所遭遇的問題(例如金屬 /· · 薄膜之毛邊或切屑、金屬薄膜之破裂、積層體之變形等)。 其次,依據本第I發明之積層體之第1製造方法,係 用以製造由樹脂薄膜與金屬薄膜所交互積層之積層體;其 特徵在於,具有:在前述樹脂薄膜之形成區域內,讓前述 金屬薄膜形成爲較前述樹脂薄膜之形成面積爲小.,且每當 10 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱3 505933 A7 B7 五、發明說明(7 ) 形成1層之金屬薄膜時,.即變更前述金屬薄膜之形成位置 ,使得樹脂薄膜與金屬薄膜交互積層之製程;形成用以貫 通前述樹脂薄膜與金屬薄膜之貫通孔之製程;以及,對前 述貫通孔塡充導電性材料,使得前述金屬薄膜之至少一部 分與前述導電性材料做電氣連接之製程。 又,本第I發明之積層體之第2製造方法,係以形成 樹脂薄膜之製程、形成金屬薄膜之製程、以及在既定位置 形成可貫通前述樹脂薄膜與金屬薄膜之貫通孔之製程爲一 單位,在支撐體上反覆進行此單位製程,以使得前述樹脂 薄膜與前述金屬薄膜交互積層爲積層體;其特徵在於,在 前述樹脂薄膜之形成區域內,讓前述金屬薄膜形成爲較前 述樹脂薄膜之形成面積爲小,且每當形成1層之金屬薄膜 時,即變更前述金屬薄膜之形成位置;並且,在積層方向 連續形成前述貫通孔,對前述連續之貫通孔塡充導電性材 料,使得前述金屬薄膜之至少一部分與前述導電性材料做 電氣連接。 又,本第I發明之積層體之第3製造方法,係以形成 樹脂薄膜之製程、於前述樹脂薄膜形成貫通孔之製程、以 及在前述樹脂薄膜上形成金屬薄膜之製程爲一單位,在支 / 撐體上反覆進行此單位製程,以使得前述樹脂薄膜與前述 金屬薄膜交互積層爲積層體;其特徵在於,在前述樹脂薄 膜之形成區域內,讓前述金屬薄膜形成爲較前述樹脂薄膜 之形成面積爲小,且每當形成1層之金屬薄膜時,即變更 前述金屬薄膜之形成位置;並且,藉由對形成有前述金屬 π 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 · I I I I I I I 一SJ11111111 ^^ — — — — — — — — — — — — — — — — — — 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(p ) 薄膜之區域內形成前述貫;通孔,使得積層方向之複數之前 述金屬薄膜透過前述貫通孔做電氣連接。 依據該第1〜第3之製造方法,可有效率地製造本第I 發明之上述積層體。 其次,本第I發明之電容器之第1製造方法,其特徵 在於,具有:在樹脂薄膜之形成區域內,讓金屬薄膜形成 爲較前述樹脂薄膜之形成面積爲小,且每當形成1層之金 屬薄膜時,即變更前述金屬薄膜之形成位置,來交互積層 樹脂薄膜與金屬薄膜之製程;形成可貫通前述樹脂薄膜與 金屬薄膜之貫通孔之製程;以及,對前述貫通孔塡充導電 係材料,讓前述金屬薄膜每隔1層即做第氣連接之製程。 又,本第I發明之電容器之第2製造方法,係以積層 樹脂薄膜之製程、形成金屬薄膜之製程、以及在既定位置 形成可貫通前述樹脂薄膜與金屬薄膜之貫通孔έ製程爲一 單位,在支撐體上反覆進行此單位製程,以製造電容器; 其特徵在於,在前述樹脂薄膜之形成區域內,讓前述金屬 •薄膜形成爲較前述樹脂薄膜之形成面積爲小,且每當形成 1層之金屬薄膜時,即變更前述金屬薄膜之形成位置;並 耳,在積層方向連續形成前述貫通孔,對前述連續之貫通 孔塡充導電性材料,使得前述金屬薄膜每隔1層做電氣連 接。 又,本第I發明之電容器之第3製造方法,係以形成 樹脂薄膜之製程、於前述樹脂薄膜形成貫通孔之製程、以 及在前述樹脂薄膜上形成金屬薄膜之製程爲一單位,在支 12 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) --------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) ⑽933 ⑽933 經濟部智慧財產局員工消費合作社印製 A7 —____B7__ 五、發明說明(") 撐體上反覆進行此單位製程,以製造電容器;其特徵在於 ’在前述樹脂薄膜之形成區域內,讓前述金屬薄膜形成爲 車父則述樹脂薄膜之形成面積爲小,且每當形成1層之金屬 薄膜時,即變更前述金屬薄膜之形成位置;並且,藉由對 形成有前述淦屬薄膜之區域內形成前述貫通孔,使得前述 金屬薄f吴透過則述貝通孔每隔1層做電氣連接。 依據該第1〜第3之製造方法,可有效率地製造本第J 發明之上述電容器。 ^ 其次,本第I發明之積層體之第1製造裝置,其具有 :周旋之支撐體;在前述支撐體對向配置之金屬薄膜形成 裝置與樹脂薄膜形成裝置;以及,收容前述支撐體與形成 裝置之真空槽;其特徵在於,在前述金屬薄膜形成裝§乏 下游側、前述樹脂薄膜形成裝置之上游側‘,具有金屬薄膜 加工用之雷射圖案化裝置。· 依據該第1製造裝置,可輕易地獲得具有所需之邊緣 部的金屬薄膜。是以,藉由使用此種製造裝置,可高效率 地製造本第I發明之積層體。 又’本第I發明之積層體之第2製造裝置,其具有: 興旋之支撐體;在前述支撐體對向配置之金屬薄膜形成裝 置與樹脂薄膜形成裝置;以及,收容前述支撐體與形成裝 置之真空槽;其特徵在於’係進一步具有:孔加工用之雷 射加工裝置’用以形成積層方向之孔;以及,油劑賦予裝 置’其位在前述樹脂薄膜形成裝置之下游側、前述金屬薄 膜形成裝置之上游側,用以對樹脂薄膜上賦予油劑。 13 本紙張尺度適用中國國豕標準(CNS)A4規格(21〇 X 297公爱) ---------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(p ) 依據該第2製造裝單,藉由使用孔加工用之雷射加工 裝置,可加工出貫通樹脂薄膜(以及金屬薄膜)之貫通孔(以 及第2貫通孔)。又,可藉由油劑賦予裝置獲得具有所需邊 緣部之金屬薄膜。是以,藉由使用此製造裝置,可有效率 地製造本第4發明之積層體。 又,本第I發明之積層體之第3製造裝置,其具有: 周旋之支撐體;在前述支撐體對向配置之金屬薄膜形成裝 置與樹脂薄膜形成裝置;以及,收容前述支撐體與形成裝 置之真空槽;其特徵在於,在前述樹脂薄膜形成裝置之下 游側、前述金屬薄膜形成裝置之上游側,具有對樹脂薄膜 上賦予油劑之油劑賦予裝置;前述油劑賦予裝置,具有至 少一對之噴嘴(配置著微細孔)。 依據該第3製造裝置,可藉由油劑賦=予裝置獲得具有 所需邊緣部之金屬薄膜。尤其,油劑賦予裝置真有至少— 對之噴嘴、可讓噴嘴個別獨立移動,而可輕易地獲得形成 有大致格子狀之邊緣部的金屬薄膜。是以,藉由使用該製 造裝置可有效率地製造本第I發明之積層體。 又,本第I發明之積層體之第4製造裝置,其具有: 辦旋之支撐體;在前述支撐體對向配置之金屬薄膜形成裝 置與樹脂薄膜形成裝置;以及,收容前述支撐體與形成裝 置之真空槽;其特徵在於,係進一步具有:孔加工用之雷 射加工裝置,用以形成積層方向之孔;油劑賦予裝置,設 於前述樹脂薄膜形成裝置之下游側、前述金屬薄膜形成裝 置之上游側,對樹脂薄膜上賦予油劑;以及,金屬薄膜加 14 • i n n l I n ϋ n n i n I · 1 n n n n n n n n n ϋ n ϋ I 1 (請先閱讀背面之注意事項再填寫本頁} 一適 度 尺 張 紙 本 97 2 X 10 2 /fv 格 規 4 A S) N (C· 準 標 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(η 工用之雷射圖案化裝置,.設於前述金屬薄膜形成裝慶之下 游側、前述樹脂薄膜形成裝置之上游側。 依據該第4製造裝置,藉由使用孔加工用之雷射加工 裝置,可加工出貫通樹脂薄膜(以及金屬薄膜)之貫通孔(以 及第2貫逋孔)。又,可藉由所具之油劑賦予裝置與雷射圖 案化裝置,獲得具有所需邊緣部之金屬薄膜。是以,籍_ 使用此製造裝置,可有效率地製造本第I發明之積餍體θ。 [關於第Π發明] ‘ 第Π發明之目的在於提供一種積層體之製造方法,_ 考慮到儘可能地避免金屬薄膜之切斷。又,第π發明$自\ 的在於提供一種電子零件之製造方法,其考慮到減少在卩彡 成外部電極之切斷面以外的切斷面將金屬薄膜切斷之If 再者,第π發明之目的在於提供一種電子零件,其在未开彡 成外部電極之切斷面並未露出金屬薄膜。.‘ " 第Π發明爲了達成上述目的乃具以下構成。 亦即,有關本第Π發明之積層體之製造方法,具有: 形成樹脂薄膜之製程;以及,藉由真空程序堆積金屬材半斗 來形成金屬薄膜之製程;藉由在周旋之支撐體上進行道@ 戰.程,於前述支撐體上製造出含有樹脂薄膜與金屬薄膜@ 積層體;其特徵在於,前述金屬薄膜係藉由在前述支擦H 之移動方向所形成之第1非金屬帶、在與前述支撐體; 動方向呈大致直角方向上所形成之第2非金屬帶而分害 大致矩形狀。 藉此,沿非金屬帶往積層方向切斷,可減低切斷金屬 15 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ---------------------訂---------線 2清先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(A ) 薄膜的可能性。從而,可防止因切斷金屬薄膜所產生之毛 邊或切屑造成之金屬薄膜彼此的短路。又,可防止因金屬 薄膜之切斷阻力所造成之積層體的變形或金屬薄膜的破裂 。再者’由於可防止金屬薄膜露出於切斷面,乃可防止金 屬薄膜之腐蝕,又,可減少作爲電子零件組裝時所受之限 制。 又,有關本第Π發明之電子零件之製造方法,係在周 旋之支撐體上進行:形成樹脂薄膜之製程;以及,藉由真 空程序堆積金屬材料來形成金屬薄膜之製程;藉此,於前 述支撐體上製造出含有樹脂薄膜與金屬薄膜的積層體之後 ,將前述積層體往積層方向切斷,形成外部電極來製造電 子零件;其特徵在於,形成於支撐體上之前述金屬薄膜, 係藉由在前述支撐體之移動方向所形成之第1非金屬帶、 在與前述支撐體之移動方向呈大致直角方向上^形成之第 2非金屬帶來分割爲大致矩形狀;前述切斷之至少一部份 係沿著前述非金屬帶之至少一部份來進行。 藉此,沿非金屬帶往積層方向切斷,可減低切斷金屬 薄膜的可能性。從而,可防止因切斷金屬薄膜所產生之毛 導或切屑造成之金屬薄膜彼此的短路。又,可防止因金屬 薄膜之切斷阻力所造成之積層體的變形或金屬薄膜的破裂 。再者,由於可防止金屬薄膜露出於切斷面,乃可防止金 屬薄膜之腐蝕,又,可減少作爲電子零件組裝時所受之限 制。 又,有關本第Π發明之第1電子零件,其具有··積層 16 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------------—丨丨—-訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(丨ί) 體,係由樹脂薄膜與金屬薄膜分別至少2層所積層而得者 :以及,電極,係於前述積層體之積層方向以外之方向的 側面之一部分,以與前述金屬薄膜做電氣連接的方式所形 成者;其特徵在於,前述積層體之未形成電極之側面未露 出前述金屬薄膜。 又,有關本第Π發明之第2電子零件,係對於由樹脂 薄膜與金屬薄膜分別至少2層所積層而得之積層體自積層 方向切斷,並以在切斷面之一部分與俞述金屬薄膜做電氣 連接的方式來形成電極;其特徵在於,未形成前述電極之 切斷面,前述金屬薄膜並未露出。 依據上述第1,第2之電子零件,由於未形成電極之面 未露出金屬薄膜,乃可防止金屬薄膜之腐飩,又,可減少 組裝時所受之限制。 [圖式之簡單說明] . 圖1A〜圖1E所不係使用本發明之實施形態A —1之積 層體所得之晶片電容器的槪略構成’圖1A爲前視方向截 .面圖,圖1B係右側視圖,圖1C係俯視圖,圖1D係在圖 1A之D — D線自箭頭方向所見之截面圖’圖1E係在圖1A 之E—E線自箭頭方向所見之截面圖。 :圖2所示係本發明之實施形態A— 1之將電容器組裝 於電路基板上之狀態的槪略側視圖° 圖3A〜圖3E所不係使用本發明之實施形態A —2之積 層體所得之晶片電容器的槪略構成’圖3A爲前視方向截 面圖,圖3B係右側視圖,圖3C係底視圖’ ® 3D係在圖 17 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ---I--1---------I I I I ^ · I------- (請先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員Η消費合作社印製 k A7 _____B7 _ 五、發明說明(丨b) 3A之D—D線自箭頭方肉所見之截面圖,圖3E係在圖3A 之E — E線自箭頭方向所見之截面圖。 圖4A所示係實施形態A— 3之電容器(電容器列)之槪 略構成俯視圖,圖4B所示係將圖4A之電容器組裝於電路 基板之例的惻視圖。 圖5A〜圖5E所示係使用本發明之實施形態A— 4之積 層體所得之晶片電容器的槪略構成,圖5A爲前視方向截 面圖,圖5B係右側視圖,圖5C係俯‘視圖,圖5D係在圖 5A之D — D線自箭頭方向所見之截面圖,圖5E係在圖5A 之E-E線自箭頭方向所見之截面圖。 圖6A與圖6B所示係將本發明之實施形態A—4之電 容器組裝於電路基板上之狀態的槪略側視圖。 圖7A〜圖7E所示係使用本發明之實施形態A— 5之積 層體所得之晶片電容器的槪略構成,圖7A爲命視方向截 面圖,圖7B係右側視圖,圖7C係底視圖,圖7D係在圖 7A之D—D線自箭頭方向所見之截面圖,圖7E係在圖7A 之E — E線自箭頭方向所見之截面圖。. 圖8係用以實施本發明之實施形態B— 1之積層體之 製造方法所採製造裝置之一例的槪略截面圖。 L : 圖9A與圖9B所示係圖案化材料賦予裝置之槪略構成 圖,圖9A係自容器輥所見之前視圖,圖9B係圖9A之 B—B線的截面圖。 - 圖10係藉由一對之圖案化材料賦予裝置於容器輥之外 周面上形成之圖案化材料之條紋圖案的一例之展開圖。 18 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) --— — — — — — —--I · I I I 1 I 1 I ^ ·11111111 IAW1 (請先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明() 圖u係於實施形態B—1之容器輕的外周面上形成之 積層體的展開俯視圖。 圖12所示係實施與本發明之實施形態B—4相關之積 層體之製造方法所用之製造裝置之一例的槪略截面圖。 圖13所示係實施與本發明之實施形態8一5相關之積 層體之製造方法所用之製造裝置之一例的槪略截面圖。 圖14所示係實施與本發明之實施形態B一6相關之積 層體之製造方法所用之製造裝置之一柄1的主要構成要素之 槪略截面圖。 圖15所示係實施與本發明之實施形態C—1相關之積 層體之製造方法所用之積層體之製造裝置之一例的槪略截 面圖。 圖16A〜圖16D所示係藉由本發明之實施形態C—1所 得之積層體母元件之一例的圖,圖16A爲前f見齒,圖16B 係俯視圖圖16C係在圖16A之I 一 I線自箭頭方向所見 之截面圖,圖16D係在圖16A之Π-Π線自箭頭方向所見 •之截面圖。 圖17所示係藉本發明之實施形態C—1所得之晶片霉 容器之一例的槪略立體圖。 ( 圖18所示係實施與本發明之實施形態C一2相關之積 層體之製造方法所用之積層體之製造裝置之一例的槪略截 面圖。 - 圖19係與本發明之實施形態C一2相關之積層體之製 造裝置的圖案化材料賦予裝置之一例的前視圖。 19 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) n n n 1 n ϋ n n n n n n ϋ ·ϋ n ϋ— n n 一 δ,I n n n n I —1 n I (請先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(β) 圖20係自正面來看圖19之圖案化材料賦予裝置之噴 嘴頭的部分放大圖。 圖2丨係在圖20之瓜一瓜線之自箭頭方向所見之微細 孔的部分截面圖。 圖22係示意地顯示用以實施以往之積層體之製造方法 所用之製造裝置的一例之槪略截面圖。 圖23所示係藉由圖22之製造裝置所得之積層體母元 件之槪略構成立體圖。 圖24所示係以往之晶片電容器之槪略構成立體圖。 [用以實施發明之最佳形態] [關於第I發明] 以下參照圖式具體說明第I發明。 A.關於積層體以及電容器 說明第I發明之積層體以及電容器之實施形>J。 (實施形態1 一 1) 圖1A〜圖1E所示係使用本發明之實施形態A— 1之積 層體所得之晶片電容器的槪略構成’圖1A爲前視方向截 面圖,圖1B係右側視圖,圖1C係俯視圖,圖id係在圖 1今之D-D線自箭頭方向所見之截面圖,圖1E係在圖1A 之E — E線自前頭方向所見之截面圖。圖中係以示意的方 式來顯示積層構成,各種尺寸、積層數等與實際之積層數 是顯著地不同的。 本實施形態之積層體10,形成位置不同之金屬薄膜 lla,llb係交互地積層著,金屬薄膜11a與金屬薄膜nb之 20 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) --------I ----i -------訂 * -------- (請先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(β ) 間則積層著樹脂薄膜12。金屬薄膜lla,llb之形成區域係 較樹脂薄膜12之形成區域爲小,金屬薄膜lla,llb之端部 並未露出積層體10之外周面。貫通於積層體10之積層方 向的兩個貫通孔13a,13b係隔離形成。就與金屬薄膜間的 關係來說,V側之貫通孔13a僅貫通金屬薄膜11a,另一 側之貫通孔13b僅貫通金屬薄膜lib。於兩貫通孔13a,13b 中塡充著導電性材料14a,14b。導電性材料14a係與金屬薄 膜11a做電氣連接,但與金屬薄膜lib呈現絕緣。又導電 性材料14b係與金屬薄膜lib做電氣連接,但與金屬薄膜 11a呈現絕緣。 然後,若以露出於積層體10之上面或下面的導電性材 料14a,14b作爲電極取出部(取出電極),分別賦予不同電位 的話,可構成一以金屬薄膜lla,llb爲電極、樹脂薄膜12 爲電介質層之電容器。 .^ 露出外表面之導電性材料14a,14b之上,也可形成由 金、銀、鋁、銅、焊料、導電性膠、導電性高分子等所構 •成之電極端子(突起(凸塊)電極)。 圖2係表示將圖1A〜圖1E所示之電容器10組裝於電 路,基板17上之狀態的槪略側視圖。係將塡充於貫通孔 13a,13b之導電性材料14a,14b上所形成之電極端子15與 電路基板17上之電極端子19加以連接。就圖24所示之以 往的晶片電容器940之情形而言,由於電極941a,941b係 形成於側面,乃需要大於自晶片電容器940之上方所見的 投影面積來作爲組裝面積。相對於此,就本實施形態之電 21 本紙張尺度適用中國國家標準(CNS)A4規格(210>< 297公楚1 一 * ---I------------1 丨 ί 訂--I---I--I^w— (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(y) 容器而言,由於取出電極係形成於下面,所需之組裝面積 乃與自電容器10之上方所見的投影面積大致相同。從而, 可獲致更高密度之組裝。 在圖2中,雖於導電性材料14a,14b上形成電極端子 15,讓電極端子15與電路基板17上之電極端子19連接, 惟亦可不設置電極端子15而直接讓導電性材料14a,14b與 電路基板17上之電極端子19直接連接。 在圖1A〜圖1E中,雖對貫通於積層方向之貫通孔 13a,13b塡充導電性材料14a,14b,使其可從上下面之任一 面取出電極,惟亦可不使得貫通孔13a,13b貫通,而是僅 自上下面之其中一面形成非貫通孔,然後塡充導電性材料 ,藉此,成爲僅於單面形成取出電極之電容器。 在圖1A〜圖1E中,雖以電容器用之積層體爲例來說 明,但除了電容器之用途以外,尙可使用在例釦線圏、瀘 波器、積層電路基板等方面。此時,可依據所需之用途來 變更積層構成、金屬薄膜與取出電極的連接形態。 •(實施形態A — 2) 圖3A〜圖3E所示係使用本發明之實施形態A— 2之積 _體所得之晶片電容器的槪略構成,圖3A爲前視方向截 面圖,圖3B係右側視圖,·圖3C係底視圖,圖3D係在圖 3A之D — D線自箭頭方向所見之截面圖,圖3E係在圖3A 之E — E線自箭頭方向所見之截面圖。圖中係以示意的方 式來顯示積層構成,各種尺寸、積層數等與實際之積層數 是顯著地不同的。 22 <^尺度適用中國國家標準(CNS)A4規格(210 X 297公釐^ "" ----I--------·丨丨丨丨丨丨丨訂--------- (請先閱讀背面之注意事項再填寫本頁) 505933 A7 B7 五、發明說明( >丨) 本實施形態之積層ft 20,形成位置不同之金屬薄膜 21a,21b係交互地積層著,金屬薄膜21a與金屬薄膜21b之 間則積層著樹脂薄膜12。金屬薄膜21a,21b之形成區域係 較樹脂薄膜22之形成區域爲小,金屬薄膜21a,21b之端部 並未露出積層體20之外周面。於各樹脂薄膜22,貫通於 積層方向的兩個貫通孔23a,23b係隔離形成。貫通孔23a 係形成於金屬薄膜21a之形成區域內、金屬薄膜21b之形 成區域外,透過塡充於貫通孔23a內乏金屬薄膜21a的材 料與上下積層之金屬薄膜21a做電氣連接。又,貫通孔 23b係形成於金屬薄膜21b之形成區域內、金屬薄膜21a 之形成區域外,透過塡充於貫通孔23b內之金屬薄膜21b 的材料與上下積層之金屬薄膜21b做電氣連接。藉此,金 屬薄膜21a與金屬薄膜21b呈現絕緣。於最下層之金屬薄 膜21a,21b之下的貫通孔23a,23b係塡充著卖金屬薄膜 21a,21b爲同樣的材料。於最上層之金屬薄膜21a,21b之上 的貫通孔23a,23b依所需可塡充導電性材料24a,24b。 於是,若以積層體20之下面的貫通孔23a,23b內的金 屬薄膜21a,21b材料或是積層體20上面的貫通孔23a,23b 內,的導電性材料24a,24b作爲電極取出部(取出電極),分別 賦予不同電位的話,可構成一以金屬薄膜21a,21b爲電極 、樹脂薄膜22爲電介質層之電容器。 露出外表面之貫通孔23a,23b內的金屬薄膜材料以及/ 或是導電性材料24a,24b之上,也可形成由金、銀、銘、 銅、焊料、導電性膠、導電性高分子等所構成之電極端子( 23 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) · 1 I--III · I I 1---- · 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明( >工) 突起(凸塊)電極)。 . 本實施形態之電容器也與實施形態A—1相同,能以 圖2的方式來組裝,而可成爲高密度組裝。 在圖3A〜圖3E中,雖設置貫通於積層方向之貫通孔 23a,23b,便其可從上下面之任一面取出電極,惟貫通孔 23a,23b亦可不貫通至上面(亦即,於最上層之金屬薄膜 21a,2lb之上的樹脂層不設置貫通孔),而是僅於下面形成 取出電極,以此構成電容器。 / 在圖3A〜圖3E中,雖以電容器用之積層體爲例來說 明,但除了電容器之用途以外,尙可使用在例如線圈、濾 波器、積層電路基板等方面。此時,可依據所需之用途來 變更積層構成、金屬薄膜與取出電極的連接形態。 (實施形態A—3) : 圖4A所示係實施形態A— 3之電容器(電运器列)之槪 略構成俯視圖,圖4B所示係將圖4A之電容器組裝於電路 基板之例的側視圖。 如圖4A所示,電容器列30之獨立作爲電容器機能之 電容器要素36係在縱橫方向配置成格子點狀。各電容器要 素.36具有與實施形態A—i或A—2所記載之電容器爲相 同之構成。亦即,各電容器要素36係由樹脂薄膜與金屬薄 膜31 a,3 lb進行交互積層所構成。各金屬薄膜31 a,3 lb係分 別連接於一對之取出電極35a,35b。 於電容器要素36之非形成區域可依所需形成貫通電極 37。貫通電極37係對電容器列3〇往厚度方向貫通所成的 24 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -------------ί I 1 I I I 1 I---— I — —Αν— C請先閱讀背面之注意事項再填寫本頁} 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(4) 貫通孔(第2貫通孔)38內塡充導電性材料39所構成者。貫 通電極37係與構成電容器要素36之各金屬薄膜31a,31b 呈絕緣狀態。 於取出電極35a,35b以及貫通電極37上亦可形成由金 、銀、銘、葡、焊料、導電性膠、導電性高分子等所構成 之電極端子(突起(凸塊)電極)。 圖4B係顯示組裝例。於電路基板41上積層著電容器 列30、以及丨合載有半導體晶片45之載件46。電路基板41 所具之電極端子42係與電容器列30之電容器要素36的取 出電極上所形成之電極端子35’連接著。又,電路基板41 之其他的電極端子42係與形成於電容器列30之貫通電極 37上的電極端子37’連接著,其透過貫通電極37與載件 46之電極端子47連接,並進一步與半導體晶片45連接著 ♦ 〇 一旦以上述方式讓電容器要素36在同一面上複數個分 離來構成所形成電容器列,相較於配置分離獨立之各個電 容器的情況,可減少組裝面積。再者,即使將複數之電容 器要素集積於一個元件內,由於構成各個電容器要素之電 極,(金屬薄膜)呈獨立情況,幾乎不會發生電容器要素之相 互干涉,也不易產生浮動容量。 再者,一旦於電容器列內形成貫通電極37,則可於電 容器列之上載置其他的電子零件(上述之例爲半導體晶片 45)而透過貫通電極37讓基板41與電子零件進行電氣連接 。於是,除了可減少組裝面積’也由於可在載置之電子零 25 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) --------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(外) 件的附近配置電容器,乃能以高頻驅動該電子零件。 又,也可讓電容器列30、載件46、以及搭載其上之 半導體晶片45收容於一個封裝體內來構成半導體集積電路 40。依據該半導體集積電路40,可將用以發揮個別之機能 的半導體零拌當作1單元來使用,所以相較於個別地組裝 半導體零件,能簡化組裝製程。 又,複數之絕緣性基板透過既定之配線圖案層來積層 、各配線圖案層透過形成於絕緣性基板之厚度方向的通孔 來連接之多層配線基板中,可將上述電容器列30當作絕緣 性基板(具備通孔)的一部分來使用。依據此構成,可在多 層配線基板中收容電容器要素等,相較於在基板表面組裝 電容器等之情況,可大幅地縮小組裝面積,也可簡略組裝 製程。 (實施形態A—4) . 圖5A〜圖5E所示係使用本發明之實施形態A-4之積 層體所得之晶片電容器的槪略構成,圖5A爲前視方向截 .面圖,圖5B係右側視圖,圖5C係俯視圖,圖5D係在圖 5A之D — D線自箭頭方向所見之截面圖,圖5E係在圖5A 之.E — E線自箭頭方向所見之截面圖。圖中係以示意的方 式來顯示積層構成,各種尺寸、積層數等與實際之積層數 是顯著地不同的。 本實施形態之積層體50,形成位置不同之金屬薄膜 5la,51b係交互地積層著,金屬薄膜51a與金屬薄膜51b之 間則積層著樹脂薄膜52。於積層體50之周圍面的兩處, 26 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ! I--— — I ——丨丨丨丨-----丨丨丨訂.丨丨丨丨丨丨丨 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明() 連續於積層方向之缺口部.53a,53b係隔離形成。在圖5A〜 圖5E中,缺口部53a,53b係在對向之2側面形成爲大致半 圓筒形狀。其與金屬薄膜的關係爲’ 一側之缺口部53a僅 切入金屬薄膜51a,另一側之缺口部53b僅切入金屬薄膜 51b。於兩缺;口部53a,53b中係塡充著導電性材料54a,54b 。導電性材料54a係與金屬薄膜51a呈電氣連接,而與金 屬薄膜51b呈絕緣狀態。又導電性材料54b係與金屬薄膜 51b呈電氣連接,而與金屬薄膜51a呈絕緣狀態。金屬薄 膜51a,51b係形成於較樹脂薄膜52之形成區域爲小的區域 內,使得除了形成缺口部53a,53b之兩側面以外其餘的兩 側面並未露出金屬薄膜51a,51b。 於是,若將積層體50之形成有缺口部53a,53b之露出 於2側面與上下面之導電性材料54a,54b當作電極取出部( 取出電極),分別賦予不同電位,則可構成U金屬薄膜 51a,51b鎵電極、樹脂薄膜52爲電介質層之電容器。 於本實施形態中,若具有與實施形態A— 1之電容器 .相同的靜電容量之情況,可進一步小型化。 在露出於上下面以及側面之導電性材料54a,54b之上 ,也可形成由金、銀、鋁、銅、焊料、導電性膠、導電性 高分子等所構成之電極端子(突起(凸塊)電極)。 圖6A,圖6B係顯示將圖5A〜圖5E所示之電容器50組 裝於電路基板57上之狀態的槪略側視圖。 圖6A係將塡充於缺口部53a,53b之導電性材料 54a,54b上所形成之電極端子55與電路基板57上之電極端 27 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) III — — — — — — — — — «— — — — — I— « — — — — — — I— (請先閱讀背面之注意事項再填寫本頁) 505933 A7 _____ B7 五、發明說明(“) 子59加以連接的情形。將本實施形態之電容器以圖6A的 方式來組裝時’相較於組裝圖24所示之以往的晶片電容器 940 ’不僅可減少組裝面積,即便是相較於組裝實施形態 、一 1之電容器的情形,也可進一步減少組裝面積,可獲致 高密度組裝” 圖6B所示係不形成電極端子55而於電路基板57上 直接設置電容器50,使得露出於側面之導電性材料 54a,54b與配置於電容器50之周邊的逾極端子59藉由焊料 等之導電性材料58來連接的情形。藉由採用此種組裝方法 ,可降低組裝高度。又,由於導電性材料58係附著於電容 器50之側面,即使組裝時發生導電性材料58對於電容器 50之附著不良,也可輕易地加以修正。 在圖6A中,雖於導電性材料54a,54b上形成電極端子 55,將電極端子55與電路基板57上之電極端芋59做連接 ,惟亦可不設置電極端子55而讓導電性材料54a,54b與電 路基板57上之電極端子59直接連接。 在圖5A〜圖5E中,雖對貫通於積層方向所形成之缺 口部53a,53b塡充導電性材料54a,54b,使其可從上下面以 及對向之2側面之任一面取出電極,惟亦可不使得缺口部 / 53a,53b貫通,而是僅自上下面之其中一面形成非貫通之缺 口部,然後對其塡充導電性材料,藉此’成爲取出電極之 形成面僅於上下方向之其中一面之電容器。 - 在圖5A〜圖5E中,雖以電容器用之積層體爲例來說 明,但除了電容器之用途以外,尙可使用在例如線圈、濾 28 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 一5JI n I I n H ϋ H I n n n n n ϋ I n ϋ ϋ I ϋ n n n n ϋ n 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(>7) 波器、積層電路基板等方面。此時,可依據所需之用途來 變更積層構成、金屬薄膜與取出電極的連接形態。 又,缺口部53a,53b之形成位置也非限定於圖5Α〜圖 • 5E之例子。例如,也可不是形成於對向之2側面,而是形 成於4個角落當中的2處。 (實施形態A — 5) 圖7A〜圖7E所示係使用本發明之實施形態A— 5之積 層體所得之晶片電容器的槪略構成,圖7A爲前視方向截 面圖,圖7B係右側視圖,圖7C係底視圖,圖7D係在圖 7A之D — D線自箭頭方向所見之截面圖,圖7E係在圖7A 之E — E線自箭頭方向所見之截面圖。圖中係以示意的方 式來顯示積層構成,各種尺寸、積層數等與實際之積層數 是顯著地不同的。 . 本實施形態之積層體60,形成位置不同之金屬薄膜 61a,61b 交互地積層著,金屬薄膜61a與金屬薄膜61b之 間則積層著樹脂薄膜62。於各樹脂薄膜62之周圍面的兩 處’連續於積層方向之缺口部63a,63b係隔離形成。在圖 7A〜圖7E中,缺口部63a,63b係在對向之2側面形成爲大 致·半圓筒形狀。缺口部63a係形成於金屬薄膜61a之形成 區域內、金屬薄膜61b之形成區域外,透過塡充於缺口部 63a內之金屬薄膜61a的材料與上下積層之金屬薄膜61a 做電氣連接。X,缺口部63b係形成於金屬讎61b之形 成區域內、金屬薄膜61a之形成區域外,透過塡充於缺口 部63b內之金屬讎6lb的材料與上下積層之金顧膜 29 (請先閱讀背面之注意事項再填寫本頁) ·· 訂,丨 λ丨·丨丨 本紙張尺度適用中國國家標準(CNS)A4規格(210^7^^ 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(4) 61b做電氣連接。藉此,金屬薄膜61a與金屬薄膜61b呈 現絕緣。於最下層之金屬薄膜61a,61b之下的缺口部 63a,63b係塡充著與金屬薄膜61a,61b爲同樣的材料。於最 上層之金屬薄膜61a,61b之上的缺口部63a,63b依所需可塡 充導電性材枰6如,6仆。金屬薄膜61a,61b係形成於較樹脂 薄膜62之形成區域爲小的區域內,使得除了形成缺口部 63a,63b之兩側面以外其餘的兩側面並未露出金屬薄膜 61a,61b 〇 於是,若將形成有缺口部63a,63b之露出於2側面與 上下面之金屬薄膜材料或導電性材料64a,64b當作電極取 出部(取出電極),分別賦予不同電位,則可構成以金屬薄 膜61a,61b爲電極、樹脂薄膜62爲電介質層之電容器。 在露出於上下面之缺口部63a,63b內的金屬薄膜材料 以及/或是導電性材料64a,64b上,也可形成由金、銀、鋁 、銅、焊料、導電性膠、導電性高分子等所構成之電極端 子(突起(凸塊)電極)。 在本實施形態之電容器也與實施形態A—4同樣,能 以圖6A,圖6B的方式來組裝,得到同樣的效果。 .在圖7A〜圖7E中,雖於最上層之金屬薄膜61a,61b上 / 也形成缺口部63a,63b,對其塡充導電性材料64a,64b,而 可從上面取出電極,惟最上層之金屬薄膜61a,61b之上的 缺口部也可不要。 _ 在圖7A〜圖7E中,雖以電容器用之積層體爲例來說 明,但除了電容器之用途以外,尙可使用在例如線圏、濾 30 (請先閱讀背面之注意事項再填寫本頁) # 訂i 線丨# 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 經濟部智慧財產局員工消費合作社印製 505933 A7 _____B7__:__ 五、發明說明(”) 波器、積層電路基板等方面。此時,可依據所需之用途來 變更積層構成、金屬薄膜與取出電極的連接形態。 又’缺口部63a,63b之形成位置也非限定於圖7A〜圖 7E之例子。例如,也可不是形成於對向之2側面,而是形 成於4個角琴當中的2處。 B·關於積層體以及電容器之製造方法以及製造裝置 其次,說明在上述A項所說明之積層體以及電容器之 製造方法與製造裝置。 : 本第I發明之製造積層體以及電容器之基本的製程係 由:①於支撐體上交互地積層樹脂薄膜與金屬薄膜之製程( 交互積層製程)②將所得之積層體(積層體母元件)自既定位 置往積層方向切斷之製程(切斷分離製程)所構成。 於交互積層製程所積層之金屬薄膜係被圖案化成既定 形狀。爲了將金屬薄膜圖案化,可藉由①於金屬薄膜之積 層前賦予既定形狀之油劑的油式圖案化法;或是②於金屬 薄膜之積層後對積層之金屬薄膜照射雷射光以去除金屬薄 •膜材料之雷射圖案化法;或是③前述兩種方式的組合;來 達成。 實施形態A—1(圖1A〜圖1E)所示之貫通孔13a,13b之 形成以及導電性材料14a,14b的塡充、實施形態A — 4(圖 5A〜圖5E)所示之缺口部53a,53b之形成以及導電性材料 54a,54b的塡充、以及實施形態A — 3(圖4A,圖4B)所示之 貫通電極37之形成,可在上述交互積層製程結束後切斷分 離製程開始之前’以雷射光等在積層方向形成孔.,接著對 31 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁)It is obtained by laminating a plurality of metal thin films with a plurality of metal thin films; characterized in that a part of the surroundings of at least one layer of the resin film has a notch portion; the upper and lower metal films are electrically connected through the notch portion; The layer can take out the electrode to the outside through the notch. According to the second laminated body, because the metal film can be taken through the notch, the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 x 297 public love) (Please read the precautions on the back before filling this page) Ministry of Economy Printed by the Intellectual Property Bureau's Consumer Cooperatives-· IIIIIII .ιδ] · —-— — • — — 1 — — — — — — — — — — — — — — — — — — — • Intellectual Property of the Ministry of Economic Affairs Printed by the Bureau's Consumer Cooperatives 505933 A7 B7 V. Description of Invention (q) The electrodes are provided to the outside, which can be provided as a laminated body used for electronic parts. In the second laminated body, it is preferable that the resin film has a substantially rectangular shape, and the metal thin film is formed by receding on a side of the resin film other than a side where the notch is formed. According to this preferred configuration, since the end portion of the metal film is formed by retracting from the end portion of the resin film, the metal film exposed to the outside of the laminated body can be reduced. This is because corrosion of the metal film is not likely to occur. In addition, since the metal thin film is not cut during the manufacturing process, problems encountered when the metal thin film is cut (such as burrs or chips of the metal thin film, cracking of the metal thin film, deformation of the laminated body, etc.) can be suppressed. Secondly, the first capacitor of the first invention is obtained by using a laminated body composed of a plurality of resin films and a plurality of metal films; characterized in that the end portion of the metal film is not exposed on the laminated body. Outside; at least one layer of the resin film has through holes in the laminated square; through the through holes, the metal film is electrically connected at every other layer to become equipotential; the metal film of the equipotential connection is The electrodes are taken out to the outside through the through holes. According to this first capacitor, since the end portion of the metal thin film is not exposed to the outside of the laminated body, corrosion of the metal thin film and the like are unlikely to occur. In addition, since the metal thin film is not cut during the manufacturing process, problems encountered when the metal thin film is cut (such as burrs or chips of the metal thin film, cracking of the metal thin film, deformation of the laminated body, etc.) can be suppressed. In addition, since the metal film connected at every other layer can be electrically connected to the outside, the resin film can function as a capacitor of the dielectric layer. In addition, the electrode extraction is performed through the through holes formed in the resin film, which can reduce the assembly area when the substrate is assembled. 9 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ----- ------- 41 ^ -------- Order ------- ^ line (Please read the notes on the back before filling in this page) 505933 A7 B7 V. Description of the invention (?) To achieve high-density assembly. (Please read the precautions on the back before filling out this page.) The second capacitor of the first invention is obtained by using a laminated body composed of a plurality of resin films and a plurality of metal films; At least one layer of the resin film has a notch at a part of the periphery: through the notch, the metal film is electrically connected so that every other layer becomes an equipotential; the metal film of the equipotential connection is through the notch Remove the electrode to the outside. According to this second capacitor, since the metal thin film connected at every other layer can be electrically connected to the outside, the resin thin film can function as a capacitor of the dielectric layer. In addition, since the electrode extraction is performed through the notch formed in the resin film, it is possible to reduce the assembly area at the time of substrate assembly 'and achieve high-density assembly. In the second capacitor described above, it is preferable that the resin film has a substantially rectangular shape, and the metal film is formed backward with respect to a side of the resin film in which the notched portion is formed. According to this preferred configuration, since the end portion of the metal thin film is formed by retracting from the end portion of the resin film, the metal thin film exposed to the outside of the laminated body can be reduced. Therefore, uranium decay and the like of metal thin films are not easy to occur. In addition, because the metal film that is cut in the manufacturing process is reduced by the consumer cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, it can reduce the problems encountered when cutting the metal film (such as metal / · · burrs or chips of the film, metal Film rupture, laminate deformation, etc.). Secondly, the first manufacturing method of the laminated body according to the first invention is used to manufacture a laminated body that is alternately laminated with a resin film and a metal film, and is characterized in that: in the formation area of the resin film, the foregoing The metal thin film is formed to have a smaller area than the aforementioned resin thin film, and the Chinese National Standard (CNS) A4 specification (210 X 297 Public Love 3 505933 A7 B7) is applicable for every 10 paper sizes. 5. Description of the invention (7) Formation 1 In the case of a layer of metal film, that is, a process of changing the formation position of the foregoing metal film so that the resin film and the metal film are alternately laminated; a process of forming a through hole for penetrating the resin film and the metal film; and the through hole 对A process in which a conductive material is filled so that at least a part of the metal thin film is electrically connected to the conductive material. In addition, the second manufacturing method of the laminated body of the first invention is a process of forming a resin film and forming a metal thin film. The manufacturing process and the process of forming a through hole that can penetrate the resin film and the metal film at a predetermined position are one unit. This unit process is repeatedly performed on the support so that the resin film and the metal film are alternately laminated into a laminate; it is characterized in that the metal film is formed to have a larger area than the resin film in the formation area of the resin film. It is small, and the formation position of the metal thin film is changed each time one layer of metal thin film is formed; and the through-holes are continuously formed in the lamination direction, and the continuous through-holes are filled with a conductive material to make the metal thin film At least a part of it is electrically connected to the conductive material. In addition, the third manufacturing method of the laminated body of the first invention is a process of forming a resin film, a process of forming a through hole in the resin film, and a process of forming the resin film. The process of forming a metal film is one unit, and the unit process is repeatedly performed on a support / support so that the resin film and the metal film are alternately laminated into a laminate; it is characterized in that in the area where the resin film is formed, The area of the metal thin film is larger than the area of the resin thin film. Whenever one layer of metal thin film is formed, the formation position of the aforementioned metal thin film is changed; and, by forming the aforementioned metal π on this paper, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applied (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs · IIIIIII-SJ11111111 ^^ — — — — — — — — — — — — — — — — 505933 Ministry of Economic Affairs Printed by the Intellectual Property Bureau employee consumer cooperative A7 B7 V. Description of the invention (p) The aforementioned through holes are formed in the area of the thin film, so that a plurality of the aforementioned metal thin films in the lamination direction are electrically connected through the through holes. The third manufacturing method can efficiently manufacture the laminated body of the first invention. Next, the first method of manufacturing a capacitor according to the first invention is characterized in that the metal thin film is formed to have a smaller area than the formation area of the resin thin film in the area where the resin thin film is formed. In the case of a metal thin film, the formation position of the aforementioned metal thin film is changed to alternately laminate the resin film and the metal thin film; a process of forming a through hole penetrating the resin thin film and the metal thin film; and filling the through hole with a conductive material , Let the aforementioned metal thin film be used as the first gas connection process every other layer. In addition, the second manufacturing method of the capacitor of the first invention is based on a process of laminating a resin film, a process of forming a metal film, and a process of forming a through hole penetrating the resin film and the metal film at a predetermined position. This unit process is repeatedly performed on a support to manufacture a capacitor. It is characterized in that the metal film is formed to have a smaller area than the resin film formation area in the formation area of the resin film, and one layer is formed each time When the metal thin film is formed, the formation position of the metal thin film is changed; and the through holes are continuously formed in the lamination direction, and the continuous through holes are filled with a conductive material so that the metal thin film is electrically connected at every other layer. The third method of manufacturing the capacitor of the first invention is a process of forming a resin film, a process of forming a through hole in the resin film, and a process of forming a metal film on the resin film as a unit. This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) -------------------- Order --------- line (Please read the precautions on the back before filling out this page) ⑽933 ⑽933 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 —____ B7__ 5. Description of the Invention (") This unit process is repeated on the support to manufacture capacitors; It is characterized in that 'the formation area of the resin film is small in the formation area of the resin film, and the formation position of the resin film is changed every time a metal film of one layer is formed; In addition, the through-holes are formed in a region where the metal thin film is formed, so that the metal thin holes f are transmitted through the through-holes to be electrically connected at every other layer. According to the first to third manufacturing methods, the above capacitor of the Jth invention can be efficiently manufactured. ^ Secondly, the first manufacturing apparatus for a laminated body according to the first invention includes: a support body that rotates; a metal thin film forming device and a resin thin film forming device that are arranged opposite to the support body; and the support body and the forming body are housed. The vacuum tank of the device is characterized in that a laser patterning device for metal thin film processing is provided on the downstream side of the metal thin film forming device and upstream of the resin thin film forming device. • According to this first manufacturing apparatus, a metal thin film having a desired edge portion can be easily obtained. Therefore, by using such a manufacturing apparatus, the laminated body of the first invention can be manufactured efficiently. The second manufacturing apparatus of the laminated body of the first invention includes: a supporting body that is rotating; a metal thin film forming device and a resin thin film forming device that are arranged opposite to the supporting body; and the supporting body and the forming body are housed. The vacuum tank of the device is characterized in that 'the system further has: a laser processing device for hole processing' for forming a hole in a lamination direction; and an oil application device 'which is located downstream of the resin film forming device and The upstream side of the metal film forming device is used to apply an oil agent to the resin film. 13 This paper size applies to China National Standard (CNS) A4 specification (21〇X 297 public love) --------------------- Order ------ --- line (please read the precautions on the back before filling this page) 505933 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (p) According to the second manufacturing order, use the hole processing The laser processing device can be used to process through holes (and second through holes) through resin films (and metal films). Further, a metal thin film having a desired edge portion can be obtained by an oil application device. Therefore, by using this manufacturing apparatus, the laminated body of the fourth invention can be efficiently manufactured. In addition, the third manufacturing apparatus for a laminated body according to the first invention includes: a support body that is rounded; a metal thin film forming device and a resin thin film forming device that are arranged opposite to the support; and the support and the forming device are housed. A vacuum tank; characterized in that an oil agent applying device for applying an oil agent to the resin film is provided on a downstream side of the resin film forming device and an upstream side of the metal film forming device; the oil agent applying device has at least one To the nozzle (fine holes are arranged). According to the third manufacturing apparatus, a metal thin film having a desired edge portion can be obtained by the oil agent applying apparatus. In particular, there is at least an oil application device. For the nozzles, the nozzles can be individually moved independently, and a metal film having a substantially grid-like edge portion can be easily obtained. Therefore, the laminated body of the first invention can be efficiently produced by using the manufacturing apparatus. In addition, the fourth manufacturing apparatus of the laminated body of the first invention includes: a supporting body for rotating; a metal thin film forming device and a resin thin film forming device arranged opposite to the supporting body; and the supporting body and the forming body are accommodated. The vacuum tank of the device is characterized in that it further includes: a laser processing device for hole processing to form holes in the lamination direction; an oil application device provided on the downstream side of the resin film forming device and the metal film forming On the upstream side of the device, add oil to the resin film; and add 14 to the metal film • innl I n ϋ nnin I · 1 nnnnnnnnn ϋ n ϋ I 1 (Please read the precautions on the back before filling this page} A moderate ruler Sheet of paper 97 2 X 10 2 / fv Grid 4 AS) N (C · Standard 505933 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (η Laser patterning device for industrial use. It is provided on the downstream side of the metal thin film forming apparatus and on the upstream side of the resin thin film forming apparatus. According to the fourth manufacturing apparatus, laser processing for hole processing is used. This device can process through-holes (and second through-holes) that penetrate resin films (and metal films). In addition, it can obtain the required edge portion by its own oil application device and laser patterning device. The metal thin film. Therefore, by using this manufacturing device, the accumulated body θ of the first invention can be efficiently produced. [About the Π invention] 'The purpose of the Π invention is to provide a method for manufacturing a laminated body, _ It is considered to avoid the cutting of the metal film as much as possible. In addition, the invention of π is to provide a method for manufacturing electronic parts, which takes into consideration the reduction of the cutting surface other than the cutting surface of the external electrode. If the metal thin film is cut off Furthermore, the object of the π invention is to provide an electronic component whose metal thin film is not exposed on the cut surface of the external electrode which has not been opened. '&Quot; The Π invention aims to achieve the above object That is, the method for manufacturing a laminated body according to the present invention includes: a process for forming a resin film; and a method for forming a metal thin film by stacking metal material halves by a vacuum process. Cheng; by conducting Dao @ 战. 程 on the supporting body of the circle, a resin film and a metal film @ laminated body are produced on the aforementioned support body; characterized in that the aforementioned metal thin film is formed by rubbing the H The first non-metallic band formed in the moving direction is in a rectangular shape with the second non-metallic band formed in a substantially right-angle direction with the support body; the movement direction is approximately rectangular. By this, the non-metallic band is cut along the direction of the laminate. Cut, can reduce the cut metal 15 This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm) --------------------- Order- -------- Line 2 should first read the precautions on the back and then fill out this page) 505933 Employees' Cooperatives of Intellectual Property Bureau of the Ministry of Economic Affairs printed A7 B7 V. Invention possibility (A) Film possibility. Therefore, short-circuits between the metal films due to burrs or chips generated by cutting the metal films can be prevented. In addition, it is possible to prevent deformation of the laminate or cracking of the metal film due to the cutting resistance of the metal film. Furthermore, since the metal thin film can be prevented from being exposed on the cut surface, the metal thin film can be prevented from being corroded, and restrictions on the assembly as electronic parts can be reduced. In addition, the manufacturing method of the electronic component according to the present invention is performed on a supporting body: a process of forming a resin film; and a process of forming a metal film by depositing a metal material by a vacuum process; After producing a laminated body containing a resin film and a metal thin film on a support, the aforementioned laminated body is cut in the direction of the lamination to form an external electrode to manufacture an electronic component; the metal thin film formed on the support is borrowed The first non-metallic belt formed in the moving direction of the support body and the second non-metallic belt formed in a direction substantially orthogonal to the moving direction of the support body are divided into a substantially rectangular shape; A portion is performed along at least a portion of the aforementioned non-metallic strip. Thereby, cutting along the non-metallic tape in the direction of the lamination can reduce the possibility of cutting the metal thin film. Therefore, short-circuits between the metal films due to the hairs or chips generated by cutting the metal films can be prevented. In addition, it is possible to prevent deformation of the laminate or cracking of the metal film due to the cutting resistance of the metal film. Furthermore, since the metal thin film can be prevented from being exposed on the cut surface, the metal thin film can be prevented from being corroded, and restrictions on the assembly as electronic parts can be reduced. In addition, regarding the first electronic component of the Π invention, it has a stack of 16 paper sizes that are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------------ — 丨 丨 —-Order --------- (Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau Staff Consumer Cooperative of the Ministry of Economic Affairs 505933 A7 B7 V. Description of Invention (丨 ί) Is obtained by laminating at least two layers of a resin film and a metal film respectively; and, an electrode is formed on a part of a side surface in a direction other than the lamination direction of the laminated body and is electrically connected to the metal thin film Or; characterized in that the metal thin film is not exposed on the side of the laminated body on which the electrodes are not formed. In addition, the second electronic component of the present invention is cut from a laminated layer obtained by laminating at least two layers of a resin film and a metal film, respectively, and cuts off a part of the cut surface with Yu Shu metal. The thin film is electrically connected to form an electrode; it is characterized in that the cut surface of the electrode is not formed, and the metal thin film is not exposed. According to the above-mentioned first and second electronic parts, since the metal thin film is not exposed on the surface where the electrodes are not formed, the metal thin film can be prevented from being corroded, and restrictions on assembly can be reduced. [Brief description of the drawings]. Figures 1A to 1E are not schematic structures of a chip capacitor obtained by using the laminated body of the embodiment A-1 of the present invention. 'Figure 1A is a cross-sectional view of the front view. Surface view, Figure 1B It is a right side view, FIG. 1C is a top view, and FIG. 1D is a cross-sectional view seen from the direction of the arrow D-D of FIG. 1A. FIG. 1E is a cross-sectional view seen from the direction of the arrow E-E of FIG. 1A. : Fig. 2 is a schematic side view showing a state in which a capacitor is assembled on a circuit board according to Embodiment A-1 of the present invention. Figs. 3A to 3E do not use the laminated body of Embodiment A-2 of the present invention. The schematic structure of the obtained chip capacitor is shown in FIG. 3A, which is a cross-sectional view in the front direction, FIG. 3B is a right side view, and FIG. 3C is a bottom view. ® 3D is in FIG. 17 X 297 mm) --- I--1 --------- IIII ^ · I ------- (Please read the notes on the back before filling this page) 505933 Intellectual Property of the Ministry of Economic Affairs Printed by the bureau member / consumer cooperative k A7 _____B7 _ V. Description of the invention (丨 b) A cross-section view of the D-D line of 3A seen from the arrow cube, Figure 3E is a cross-section seen from line E-E of Figure 3A from the direction of the arrow Illustration. FIG. 4A is a plan view showing a schematic configuration of a capacitor (capacitor row) according to Embodiment A-3, and FIG. 4B is a front view showing an example in which the capacitor of FIG. 4A is assembled on a circuit board. 5A to 5E are schematic structures of a chip capacitor obtained by using a multilayer body according to Embodiment A-4 of the present invention. FIG. 5A is a sectional view in a front view, FIG. 5B is a right side view, and FIG. 5C is a top view. FIG. 5D is a cross-sectional view seen from the direction of the arrow along line D-D in FIG. 5A, and FIG. 5E is a cross-sectional view seen from the direction of arrow from line EE of FIG. 5A. 6A and 6B are schematic side views showing a state where the capacitor of the embodiment A-4 of the present invention is assembled on a circuit board. 7A to 7E are schematic structures of a chip capacitor obtained by using the laminated body of Embodiment A-5 of the present invention. FIG. 7A is a cross-sectional view in the front view, FIG. 7B is a right side view, and FIG. 7C is a bottom view. FIG. 7D is a cross-sectional view seen from the direction of the arrow along the line D-D of FIG. 7A, and FIG. 7E is a cross-sectional view seen from the direction of the arrow along line E-E of FIG. 7A. FIG. 8 is a schematic cross-sectional view of an example of a manufacturing apparatus used to implement a method for manufacturing a laminated body according to Embodiment B-1 of the present invention. L: Fig. 9A and Fig. 9B are schematic diagrams of a patterning material applying device, Fig. 9A is a front view seen from a container roll, and Fig. 9B is a cross-sectional view taken along line B-B of Fig. 9A. -Fig. 10 is a developed view of an example of a stripe pattern of a patterned material formed on the outer peripheral surface of a container roll by a pair of patterned material imparting devices. 18 This paper size is in accordance with China National Standard (CNS) A4 (210 x 297 mm) --- — — — — — —-I · III 1 I 1 I ^ · 11111111 IAW1 (Please read the precautions on the back first (Fill in this page again) 505933 Printed by A7 B7, Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs 5. Description of the invention () Figure u is an expanded plan view of a layered body formed on the light outer surface of the container of embodiment B-1. Fig. 12 is a schematic cross-sectional view showing an example of a manufacturing apparatus used for carrying out a method for manufacturing a laminated body according to Embodiment B-4 of the present invention. Fig. 13 is a schematic cross-sectional view showing an example of a manufacturing apparatus used for carrying out a method for manufacturing a laminated body according to Embodiments 8 to 5 of the present invention. Fig. 14 is a schematic cross-sectional view of the main components of the handle 1 which is one of the manufacturing apparatuses used in the method for manufacturing the laminated body related to the embodiment B-6 of the present invention. Fig. 15 is a schematic cross-sectional view showing an example of a manufacturing apparatus for a laminated body used for carrying out a method for manufacturing a laminated body related to Embodiment C-1 of the present invention. FIGS. 16A to 16D are diagrams showing an example of a laminated body element obtained by Embodiment C-1 of the present invention. FIG. 16A is a front view, FIG. 16B is a top view, and FIG. 16C is a view of FIG. 16A. A cross-sectional view seen from the direction of the arrow along the line, FIG. 16D is a cross-sectional view seen from the direction of the arrow from the Π-Π line of FIG. 16A. Fig. 17 is a schematic perspective view showing an example of a wafer mold container obtained by the embodiment C-1 of the present invention. (Figure 18 is a schematic cross-sectional view of an example of a multilayer manufacturing device used to implement a method for manufacturing a laminated body related to Embodiment C-2 of the present invention.-Figure 19 is a first embodiment of the present invention 2 Front view of an example of a patterned material-imparting device for a related multilayer manufacturing device. 19 This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm) nnn 1 n ϋ nnnnnn ϋ · ϋ n ϋ — Nn a δ, I nnnn I —1 n I (Please read the notes on the back before filling out this page) 505933 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (β) Figure 20 is from the front Look at a partially enlarged view of the nozzle head of the patterning material applying device of Fig. 19. Fig. 2 is a partial cross-sectional view of the fine hole seen from the direction of the arrow of the melon-melon line of Fig. 20. Fig. 22 is a schematic display for Fig. 23 is a schematic cross-sectional view of an example of a manufacturing apparatus used to implement a conventional manufacturing method of a laminated body. Fig. 23 is a perspective view of a schematic structure of a laminated body mother element obtained by the manufacturing apparatus of Fig. 22. To A perspective view of a conventional chip capacitor is constructed. [The best form for implementing the invention] [About the first invention] The following describes the first invention specifically with reference to the drawings. A. Multilayer and capacitor And the embodiment of the capacitor > J. (Embodiment 1-1) Fig. 1A to Fig. 1E are schematic structures of a chip capacitor obtained by using the laminated body of Embodiment A-1 of the present invention. Fig. 1A is a front view. 1B is a right side view, FIG. 1C is a top view, FIG. 1D is a cross-sectional view seen from the direction of the arrow DD line in FIG. 1 and FIG. 1E is a cross-section seen from the front direction of the line E-E in FIG. 1A The figure shows the laminated structure in a schematic way, and the size and number of laminated layers are significantly different from the actual laminated number. The laminated body 10 of this embodiment interacts with metal films 11a and 11b at different positions. Laminated by layers, metal film 11a and metal film nb 20 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -------- I ---- i ---- --- Order * -------- (Please read the notes on the back before (Write this page) 505933 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 5. The description of the invention (β) is laminated with the resin film 12. The area where the metal films 11a and 11b are formed is smaller than the area where the resin film 12 is formed The ends of the metal thin films 11a and 11b do not expose the outer peripheral surface of the laminated body 10. The two through holes 13a, 13b penetrating through the laminated direction of the laminated body 10 are formed separately. In terms of the relationship with the metal thin film, V The through hole 13a on one side penetrates only the metal thin film 11a, and the through hole 13b on the other side penetrates only the metal thin film 11b. Conductive materials 14a and 14b are filled in the two through holes 13a and 13b. The conductive material 14a is electrically connected to the metal thin film 11a, but is insulated from the metal thin film lib. The conductive material 14b is electrically connected to the metal thin film lib, but is insulated from the metal thin film 11a. Then, if the conductive material 14a, 14b exposed on the upper or lower surface of the laminated body 10 is used as an electrode extraction portion (removal electrode) and different potentials are respectively applied, a metal thin film 11a, 11b can be configured as an electrode, and a resin thin film 12 Capacitor for the dielectric layer. . ^ On the exposed conductive materials 14a and 14b, electrode terminals (protrusions (bumps) made of gold, silver, aluminum, copper, solder, conductive glue, conductive polymer, etc. can also be formed. )electrode). Fig. 2 is a schematic side view showing a state where the capacitor 10 shown in Figs. 1A to 1E is assembled on a circuit board 17; The electrode terminals 15 formed on the conductive materials 14a and 14b filled with the through holes 13a and 13b and the electrode terminals 19 on the circuit board 17 are connected. In the case of the conventional chip capacitor 940 shown in FIG. 24, since the electrodes 941a and 941b are formed on the side, it is necessary to use a larger projected area as seen from above the chip capacitor 940 as the assembly area. On the other hand, the paper size of this embodiment is 21 Chinese paper standard (CNS) A4 (210 > < 297 公 楚 1 一 * --- I ------------ 1 丨 Order --I --- I--I ^ w-- (Please read the precautions on the back before (Fill in this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs's Consumer Cooperatives 505933 A7 B7 V. Description of the invention (y) For the container, since the take-out electrode system is formed below, the required assembly area is the same as that seen from above the capacitor 10. The projected area is approximately the same. Thereby, higher density assembly can be obtained. In FIG. 2, although the electrode terminals 15 are formed on the conductive materials 14 a and 14 b, and the electrode terminals 15 are connected to the electrode terminals 19 on the circuit board 17, the conductive materials 14 a and 14 b may be directly provided without the electrode terminals 15. It is directly connected to the electrode terminal 19 on the circuit board 17. In FIGS. 1A to 1E, although the through-holes 13a and 13b penetrating in the lamination direction are filled with conductive materials 14a and 14b so that the electrodes can be taken out from either of the upper and lower surfaces, the through-holes 13a and 13b may not be made A through hole is formed by forming a non-through hole only from one of the upper and lower surfaces, and then filled with a conductive material, thereby becoming a capacitor in which a take-out electrode is formed on only one side. In Figs. 1A to 1E, although a laminated body for a capacitor is taken as an example, in addition to the application of the capacitor, it can be used in the example of a buckle wire, a microwave, and a laminated circuit board. In this case, the laminated structure and the connection form of the metal thin film and the extraction electrode can be changed depending on the intended application. • (Embodiment A-2) Figures 3A to 3E show the schematic structure of a chip capacitor obtained by using the product of Embodiment A-2 of the present invention. Figure 3A is a cross-sectional view in the front direction, and Figure 3B is a Right side view, FIG. 3C is a bottom view, FIG. 3D is a cross-sectional view seen from the direction of arrow D-D in FIG. 3A, and FIG. 3E is a cross-sectional view seen from line of arrow E-E in FIG. 3A. In the figure, the laminated structure is shown in a schematic way. Various sizes and the number of laminated layers are significantly different from the actual laminated number. twenty two & ^ Dimensions apply Chinese National Standard (CNS) A4 specifications (210 X 297 mm ^ " " ---- I -------- · 丨 丨 丨 丨 丨 丨 Order ---- ----- (Please read the precautions on the back before filling this page) 505933 A7 B7 V. Description of the invention (> 丨) The laminated ft 20 of this embodiment forms the metal thin films 21a and 21b at different positions. It is laminated, and the resin film 12 is laminated between the metal thin film 21a and the metal thin film 21b. The formation area of the metal thin films 21a and 21b is smaller than that of the resin thin film 22, and the ends of the metal thin films 21a and 21b are not exposed. The outer peripheral surface of the body 20. In each resin film 22, two through holes 23a, 23b penetrating in the lamination direction are formed separately. The through holes 23a are formed in the formation area of the metal thin film 21a and outside the formation area of the metal thin film 21b. The material filled with the depleted metal film 21a in the through hole 23a is electrically connected to the metal film 21a laminated on top and bottom through the through hole 23a. The through hole 23b is formed in the formation area of the metal thin film 21b and outside the formation area of the metal thin film 21a. Of the metal thin film 21b filled in the through hole 23b The material is electrically connected to the metal film 21b laminated on top and bottom. Thus, the metal film 21a and the metal film 21b are insulated. The through holes 23a and 23b under the metal film 21a and 21b at the bottom layer are filled with the metal film 21a. 21b is the same material. The through holes 23a and 23b on the uppermost metal films 21a and 21b can be filled with conductive materials 24a and 24b as required. Therefore, if the through holes 23a under the laminated body 20 are used The metal thin films 21a, 21b in 23b or the conductive materials 24a, 24b in the through holes 23a, 23b on the laminated body 20 are used as electrode extraction portions (removal electrodes). If different potentials are respectively provided, it can constitute a The metal thin films 21a and 21b are electrodes, and the resin thin film 22 is a capacitor having a dielectric layer. The metal thin film materials and / or the conductive materials 24a and 24b in the through holes 23a and 23b exposed on the outer surface may be formed of gold, Electrode terminals made of silver, copper, solder, conductive adhesive, conductive polymer, etc. (23 paper sizes are applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the back Please fill in this page for further information) · 1 I--III · II 1 ---- · Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Employee Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by 505933 A7 B7 5. (Work) protrusion (bump) electrode). The capacitor of this embodiment is also the same as that of embodiment A-1, and can be assembled in the manner shown in FIG. 2, and can be assembled with high density. In FIGS. 3A to 3E, although through-holes 23a and 23b penetrating in the lamination direction are provided, the electrodes can be taken out from any one of the upper and lower surfaces, but the through-holes 23a and 23b may not penetrate to the upper surface (that is, the most The resin layer above the upper metal thin film 21a, 2lb does not have a through hole), but a take-out electrode is formed only on the lower side to form a capacitor. / In FIGS. 3A to 3E, although a laminated body for a capacitor is taken as an example, in addition to the use of a capacitor, it can be used in, for example, a coil, a filter, and a laminated circuit board. In this case, the laminated structure and the connection form of the metal thin film and the extraction electrode can be changed depending on the intended application. (Embodiment A-3): FIG. 4A is a plan view of a schematic configuration of a capacitor (electrical train line) according to Embodiment A-3, and FIG. 4B is a side view of an example in which the capacitor of FIG. 4A is assembled on a circuit board view. As shown in FIG. 4A, the capacitor elements 36 independently of the capacitor row 30 function as capacitor functions. The capacitor elements 36 are arranged in a lattice pattern in the vertical and horizontal directions. Each capacitor element .36 has the same configuration as the capacitors described in Embodiments A-i or A-2. That is, each of the capacitor elements 36 is composed of a resin thin film and a metal thin film 31 a, 3 lb which are alternately laminated. Each of the metal thin films 31a, 3lb is connected to a pair of extraction electrodes 35a, 35b, respectively. A through-electrode 37 may be formed in a non-formed region of the capacitor element 36 as required. The penetrating electrode 37 is 24 formed by penetrating the capacitor row 30 in the thickness direction. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ------------- ί I 1 III 1 I ---— I — —Αν— C Please read the notes on the back before filling out this page} 505933 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (4) Through hole ( The second through hole) 38 is formed by filling a conductive material 39 therein. The through electrode 37 is insulated from each of the metal thin films 31a and 31b constituting the capacitor element 36. Electrode terminals (protrusion (bump) electrodes) made of gold, silver, inscription, Portuguese, solder, conductive paste, conductive polymer, etc. may also be formed on the extraction electrodes 35a, 35b and the through electrode 37. FIG. 4B shows an example of assembly. A capacitor array 30 and a carrier 46 on which a semiconductor wafer 45 is mounted are stacked on the circuit substrate 41. The electrode terminal 42 of the circuit board 41 is connected to an electrode terminal 35 'formed on the extraction electrode of the capacitor element 36 of the capacitor row 30. Further, the other electrode terminals 42 of the circuit board 41 are connected to electrode terminals 37 ′ formed on the through electrodes 37 of the capacitor row 30, and are connected to the electrode terminals 47 of the carrier 46 through the through electrodes 37 and further to the semiconductor The chip 45 is connected. Once the capacitor element 36 is separated by a plurality of capacitor elements 36 on the same surface to form a capacitor row, the assembly area can be reduced compared to the case where separate capacitors are arranged separately. Furthermore, even if a plurality of capacitor elements are integrated in one element, since the electrodes constituting each capacitor element (metal thin film) are independent, there is almost no mutual interference between capacitor elements, and floating capacity is not easy to occur. Furthermore, once the through-electrode 37 is formed in the capacitor row, other electronic components (semiconductor wafer 45 in the above example) can be placed on the capacitor row, and the substrate 41 and the electronic component can be electrically connected through the through-electrode 37. Therefore, in addition to reducing the assembly area, it can also be placed on the electronic paper. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------------- ------- Order --------- line (please read the notes on the back before filling in this page) 505933 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of Invention (External ) Capacitors are placed near the components to drive the electronic components at high frequencies. Further, the semiconductor integrated circuit 40 may be constructed by accommodating the capacitor array 30, the carrier 46, and the semiconductor wafer 45 mounted thereon in a single package. According to the semiconductor integrated circuit 40, a semiconductor chip for exerting individual functions can be used as one unit, so that the assembly process can be simplified compared to individually assembling semiconductor components. In addition, in a multilayer wiring substrate in which a plurality of insulating substrates are laminated through a predetermined wiring pattern layer, and each wiring pattern layer is connected through a through-hole formed in the thickness direction of the insulating substrate, the above-mentioned capacitor array 30 may be used as insulation. Part of the substrate (equipped with through holes). According to this configuration, capacitor elements and the like can be accommodated in a multi-layer wiring board, which can greatly reduce the assembly area and simplify the assembly process compared to the case of assembling capacitors on the substrate surface. (Embodiment A-4). Figs. 5A to 5E show a schematic configuration of a chip capacitor obtained by using a multilayer body according to Embodiment A-4 of the present invention. Fig. 5A is a cross-sectional view of the front view. It is a right side view, FIG. 5C is a top view, FIG. 5D is a cross-sectional view seen from the direction of the arrow D-D of FIG. 5A, and FIG. 5E is a cross-sectional view seen from the direction of the arrow E-E of FIG. 5A. In the figure, the laminated structure is shown in a schematic way. Various sizes and the number of laminated layers are significantly different from the actual laminated number. In the laminated body 50 of this embodiment, metal thin films 5la, 51b at different positions are laminated alternately, and a resin thin film 52 is laminated between the metal thin films 51a and 51b. At two places around the laminated body 50, 26 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)! I ----I ---- 丨 丨 丨 ----- 丨丨 丨 Order. 丨 丨 丨 丨 丨 丨 丨 (Please read the notes on the back before filling in this page) Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 505933 A7 B7 V. Description of the invention .53a, 53b are isolated. In Figs. 5A to 5E, the cutout portions 53a, 53b are formed in a substantially semi-cylindrical shape on the two opposing sides. The relationship with the metal thin film is that the notched portion 53a on one side is cut into only the metal thin film 51a, and the notched portion 53b on the other side is cut into only the metal thin film 51b. In the two gaps; the mouth portions 53a, 53b are filled with conductive materials 54a, 54b. The conductive material 54a is electrically connected to the metal thin film 51a, and is insulated from the metal thin film 51b. The conductive material 54b is electrically connected to the metal thin film 51b, and is in an insulated state from the metal thin film 51a. The metal thin films 51a, 51b are formed in a smaller area than the area where the resin film 52 is formed, so that the metal thin films 51a, 51b are not exposed on the two sides except for the two sides where the notch portions 53a, 53b are formed. Therefore, if the conductive material 54a, 54b of the laminated body 50 formed with the notched portions 53a and 53b exposed on the two sides and the upper and lower surfaces is used as electrode extraction portions (removal electrodes), respectively, different potentials can be formed to form U metal. The thin film 51a, 51b gallium electrodes, and the resin thin film 52 are capacitors having a dielectric layer. In this embodiment, if the capacitor has the same capacitance as that of the capacitor A of Embodiment A-1, it can be further downsized. Electrode terminals (protrusions (bumps)) composed of gold, silver, aluminum, copper, solder, conductive paste, conductive polymer, etc. may be formed on the conductive materials 54a, 54b exposed on the upper and lower surfaces and the side surfaces. )electrode). Figs. 6A and 6B are schematic side views showing a state where the capacitors 50 shown in Figs. 5A to 5E are mounted on a circuit board 57. Figs. Fig. 6A is an electrode terminal 55 formed on a conductive material 54a, 54b filled with notches 53a, 53b and an electrode terminal 27 on a circuit substrate 57. This paper is in accordance with China National Standard (CNS) A4 (210 X 297 mm) III — — — — — — — — — — — — — — — — — — — — — — — I— (Please read the notes on the back before filling out this page) 505933 A7 _____ B7 V. Description of the invention ("") when the sub-59 is connected. When the capacitor of this embodiment is assembled as shown in Fig. 6A, "compared to the conventional chip capacitor 940 shown in Fig. 24, the assembly area can be reduced, even if it is Compared with the case of assembling the capacitors of the first embodiment, the assembly area can be further reduced, and high-density assembly can be obtained. As shown in FIG. 6B, the capacitor 50 is directly provided on the circuit substrate 57 without forming the electrode terminal 55, so that it is exposed. When the conductive materials 54a and 54b on the side surfaces and the terminal 59 disposed on the periphery of the capacitor 50 are connected by a conductive material 58 such as solder. By using this assembly method, the assembly height can be reduced. Further, since the conductive material 58 is attached to the side surface of the capacitor 50, even if a poor adhesion of the conductive material 58 to the capacitor 50 occurs during assembly, it can be easily corrected. In FIG. 6A, although the electrode terminal 55 is formed on the conductive materials 54a and 54b, and the electrode terminal 55 is connected to the electrode terminal 59 on the circuit substrate 57, the electrode terminal 55 may not be provided and the conductive material 54a may be provided. 54b is directly connected to the electrode terminal 59 on the circuit substrate 57. In FIGS. 5A to 5E, although the notch portions 53a and 53b formed through the lamination direction are filled with conductive materials 54a and 54b so that the electrodes can be taken out from the upper and lower surfaces and from any of the two opposite sides, It is also possible not to make the cutouts / 53a, 53b penetrate, but to form a non-perforated cutout from only one of the top and bottom surfaces, and then fill it with a conductive material, thereby 'becoming the formation surface of the extraction electrode only in the up and down direction. One side of the capacitor. -In Figures 5A to 5E, although the laminated body for capacitors is taken as an example, in addition to the use of capacitors, it can be used in coils and filters, for example. This paper size is applicable to China National Standard (CNS) A4 specifications ( 210 X 297 public love) (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy 5JI n II n H ϋ HI nnnnn ϋ I n ϋ ϋ I ϋ nnnn ϋ n 505933 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of Invention (> 7). In this case, the laminated structure and the connection form of the metal thin film and the extraction electrode can be changed depending on the intended application. The formation positions of the notches 53a and 53b are not limited to the examples shown in FIGS. 5A to 5E. For example, it may not be formed on the two opposite sides, but may be formed on two of the four corners. (Embodiment A-5) FIGS. 7A to 7E are schematic structures of a chip capacitor obtained by using the laminated body of Embodiment A-5 of the present invention. FIG. 7A is a cross-sectional view in the front direction, and FIG. 7B is a right side view. FIG. 7C is a bottom view, FIG. 7D is a cross-sectional view seen from the direction of arrow D-D of FIG. 7A, and FIG. 7E is a cross-sectional view seen from line of arrow E-E of FIG. 7A. In the figure, the laminated structure is shown in a schematic way. Various sizes and the number of laminated layers are significantly different from the actual laminated number. In the multilayer body 60 of this embodiment, metal films 61a and 61b at different positions are alternately laminated, and a resin film 62 is laminated between the metal film 61a and the metal film 61b. The notches 63a, 63b which are continuous in the lamination direction at two places on the peripheral surface of each resin film 62 are formed by being separated. In Figs. 7A to 7E, the cutout portions 63a and 63b are formed in a substantially semi-cylindrical shape on the two opposite sides. The notch portion 63a is formed in the formation area of the metal thin film 61a and outside the formation area of the metal thin film 61b. The material of the metal thin film 61a filled in the notch portion 63a is electrically connected to the upper and lower metal thin films 61a. X, the notch portion 63b is formed in the formation area of the metal 雠 61b and outside the formation area of the metal thin film 61a, and the material 雠 6lb filled with the metal 雠 6lb in the notch portion 63b and the upper and lower stacked metal film 29 are read (read first Note on the back, please fill in this page again) ·· Order, 丨 λ 丨 · 丨 丨 This paper size applies to China National Standard (CNS) A4 specifications (210 ^ 7 ^^ 505933 A7 B7 Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs V. Description of the invention (4) 61b is used for electrical connection. As a result, the metal film 61a is insulated from the metal film 61b. The notches 63a and 63b below the metal film 61a and 61b are filled with the metal film 61a. 61b is the same material. The notches 63a, 63b on the uppermost metal films 61a, 61b can be filled with conductive materials as required. For example, the metal films 61a, 61b are formed of more resin. The formation area of the thin film 62 is in a small area, so that the metal thin films 61a and 61b are not exposed on the two sides except the two sides where the notched portions 63a and 63b are formed. Therefore, if the notched portions 63a and 63b are formed and exposed on 2 side and up and down The metal thin film material or conductive material 64a, 64b on the surface is used as an electrode extraction portion (removal electrode), and different potentials are applied to each other, so that a capacitor having metal thin films 61a and 61b as electrodes and a resin thin film 62 as a dielectric layer can be formed. Metal thin film materials and / or conductive materials 64a, 64b in the upper and lower notch portions 63a, 63b can also be formed of gold, silver, aluminum, copper, solder, conductive glue, conductive polymers, etc. The structure of the electrode terminal (protrusion (bump) electrode). The capacitor in this embodiment can be assembled in the same manner as in Fig. 6A and Fig. 6A, and the same effect can be obtained. Fig. 7A ~ In FIG. 7E, although the notch portions 63a, 63b are also formed in / on the uppermost metal thin films 61a, 61b, they are filled with conductive materials 64a, 64b, and the electrodes can be taken out from above, but the uppermost metal thin films 61a, The notch above 61b is not necessary. _ In Figs. 7A to 7E, although the laminated body for capacitors is used as an example, in addition to the purpose of the capacitor, 尙 can be used in, for example, wire 圏, filter 30 (please First read the back Please fill in this page again for the matters needing attention) # 定 i 线 丨 # This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) Printed by the Employees' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 505933 A7 _____B7__: __ V. Invention Explain (") wave device, laminated circuit board, etc. At this time, the laminated structure and the connection form of the metal film and the extraction electrode can be changed according to the required application. The formation positions of the notches 63a and 63b are not limited to this. Examples of FIGS. 7A to 7E. For example, it may not be formed on the two opposite sides, but may be formed on two of the four corner pianos. B. Method and device for manufacturing multilayer body and capacitor Next, the method and device for manufacturing the multilayer body and capacitor described in the above item A will be described. : The basic manufacturing process of the laminated body and capacitor of the first invention is: ① a process of alternately laminating a resin film and a metal film on a support (a cross-lamination process) ② a laminated body (laminate body) It consists of a process (cut-off process) of cutting from a predetermined position to the direction of lamination. The metal thin films laminated in the cross-lamination process are patterned into a predetermined shape. In order to pattern the metal thin film, ① an oil-type patterning method in which a predetermined shape of an oil agent is given before the metal thin film is laminated; or ② after the metal thin film is laminated, the laminated metal thin film is irradiated with laser light to remove the metal Laser patterning of thin film materials; or ③ a combination of the two aforementioned methods; Formation of through-holes 13a, 13b shown in Embodiment A-1 (Figures 1A to 1E), filling of conductive materials 14a, 14b, and cutout portions shown in Embodiment A-4 (Figures 5A to 5E) Formation of 53a, 53b, filling of conductive materials 54a, 54b, and formation of penetrating electrode 37 shown in Embodiment A-3 (FIG. 4A, FIG. 4B), the separation process can be cut off after the above-mentioned cross-lamination process is completed Before the start, 'holes were formed in the stacking direction with laser light, etc., and then the Chinese national standard (CNS) A4 specification (210 X 297 mm) was applied to 31 paper sizes (please read the precautions on the back before filling this page)
-· ϋ I ί I ϋ I n I n I I ϋ n ϋ ϋ I n n n n n n n n ϋ I ϋ I ϋ n 1· ϋ n ϋ ϋ ϋ n ϋ I 505933 Α7 Β7 經濟部智慧財產局員工消費合作社印製 五、發明說明(?。) 該孔塡充導電性材料來達成。或是,亦可於交互積層製程 中,每當積層樹脂薄膜以及/或是金屬薄膜時,照射雷射光 等將既定位置之樹脂薄膜以及金屬薄膜去除,在積層方向 形成連續孔,於交互積層製程結束後,對所得之貫通孔塡 充導電性材科·。 又,實施形態A — 2(圖3A〜圖3E)所示之貫通樹脂薄膜 21a,21b之貫通孔23a,23b之形成、實施形態A—5(圖7A〜 圖7E)所示之形成於樹脂薄膜61a,61l/之缺口部63a,63b的 形成,係在交互積層製程中,於樹脂薄膜積層後、金屬薄 膜積層前,僅將新積層之樹脂薄膜的既定位置以雷射光等 去除而於樹脂薄膜形成貫通孔,之後積層金屬薄膜,即可 透過該貫通孔將上下之金屬薄膜彼此加以連接。 本第I發明之製造方法與製造裝置可對上述各種方法 做取捨選擇,組合得到複數之實施形態。以下:舉出代表 之實施形態。 (實施形態B — 1) 圖8係用以實施本發明之實施形態B—1之積層體之 製造方法所採製造裝置之一例的槪略截面圖。在本實施形 態.係以油式圖案化法進行金屬薄膜之圖案化,於交互積層 f 製程結束後使用雷射加工裝置進行貫通孔或缺口部之形成 〇 於圖8中,100係本實施形態之製造裝置,115係真 空槽,116係用以將真空槽115之內部維持在既定之真空 度的真空泵,111係設置在真空槽Π5內、往圖.中之箭頭 32 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公ϋ ^ (請先閱讀背面之注意事項再填寫本頁) # 訂·— •線丨-- 505933 A7 B7 五、發明說明(;丨) 111a方向旋轉之圓筒形狀的容器輥,ι12係樹脂薄膜形成 裝置,130a,130b係圖案化材料賦予裝置(噴嘴),U4係金 屬薄膜形成裝置(金屬材料供給源),117係圖案化材料去除 裝置,118係樹脂硬化裝置,119係表面處理裝置,12〇係 將金屬薄膜形成區域區隔成不同區域的隔壁,121係設於 隔壁120之開口,123係除非必要時否則爲了防止金屬薄 膜之形成而往移動方向123a之方向移動來開關開口 ι21所 用之遮蔽板,125係雷射加工裝置,127係等離子體照射裝 置。 藉由旋轉容器輥111,可在容器輥111之外周面上形 成:由樹脂薄膜形成裝置112所形成之樹脂薄膜以及由金 屬薄膜形成裝置114所形成之金屬薄膜交互積層出之積層 體。 & 此時,利用一對之圖案化材料賦予裝置l〗0a,130b, 於金屬薄膜之形成前對樹脂薄膜表面賦予既定形狀之圖案 化油劑,藉此,可形成被圖案化成任意形狀之金屬薄膜。 圖案化材料賦予裝置130a與圖案化材料賦予裝置 13 0b之基本構成是同樣的。圖9A,圖9B所示係圖案化材 料,賦予裝置(噴嘴)130a,130b之槪略構成圖。圖9A係自容 器輥111側所見之前視圖,圖9B係圖9A之B—B線的截 面圖。在圖9A中,箭頭111b係表示容器輥111之外周面 的移動方向。 _ 圖案化材料賦予裝置130a,130b具有:用以保持液體 狀態之圖案化材料(油劑)137之儲存槽134、以及用以保持 33 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 · ϋ n ϋ I n · n n ϋ n n ϋ n I I h ϋ ϋ n I n n n I I— an in n 1_1 in n 1 n -ϋ ·ϋ n n - 505933 A7 B7 五、發明說明(八) 氣化之圖案化材料的模穴133。儲存槽134與模穴133係 藉由連結路135所連接。面向容器輕丨丨丨之對向面132上 形成有與模穴133連接之複數(在圖9A,9B係五個)的微細 孔131。複數之微細孔131係與容器輥m之移動方向 111b大致平;行而隔著既定距離以等間隔的方式來配置。圖 案化材料賦予裝置130a,130b係被加熱到圖案化材料(油劑 )137之氣化溫度以上,儲存槽134內之圖案化材料137乃 氣化而移動到模穴133,自微細孔131往容器輥ill之外 周面放出。所放出之圖案化材料會在容器輥U1之外周面 液化,形成圖案化材料之液膜。 圖8所示之本實施形態之製造裝置中,一對之圖案化 材料賦予裝置130a,130b可分別與容器輥111之旋轉軸方 向呈大致平行(與容器輥111之外周面的移·動方向111b呈 大致直角方向)來往返移動。於是,由圖案化材料賦予裝置 130a在容器輥111之外周面上所形成之複數條的圖案化材 料之條紋與由圖案化材料賦予裝置130b在容器輥in乏外 •周面上所形成之複數條的圖案化材料之條紋呈現交叉。 經濟部智慧財產局員工消費合作社印製 圖10所示係藉由一對之圖案化材料賦予裝置 13.0a,130b於容器輥111之外周面上形成之圖案化材料之條 紋圖案的一例之展開圖。箭頭11 lb表不谷器輥111之外周 面的移動方向。實線138a表示藉由圖案化材料賦予裝置 130a在容器輥111之外周面上所形成之5條的圖案化材料 之條紋,虛線138b表示藉由圖案化材料賦予裝置i3〇b在 容器輥111之外周面上所形成之5條的圖案化材料之條紋 34 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(π ) 。如圖示般,藉由讓一對之圖案化材料賦予裝置130a,l3〇b 分別以與容器輥111之旋轉軸方向大致平行、在既定速度 下同步地往返移動,在容器輥111之外周面上形成圖案化 材料之格子狀的賦予圖案。尤其,若使得圖案化材料賦予 裝置130a,咋〇b之移動速度與容器輥111之外周面的移動 速度大致相同,則由各圖案化材料賦予裝置130a,130b所 形成之條紋與移動方向111b所成之角度可設定成大致45 度。結果,可得到條紋138a,138b爲大致直交之格子狀的 賦予圖案。 之後,一旦以金屬薄膜形成裝置114形成金屬薄膜, 由於已賦予圖案化材料之部分未形成金屬薄膜,乃可形成 圖案化成爲格子狀之矩形狀的金屬薄膜。 進一步,控制圖案化材料賦予裝置130a,130b的移動 ’使得容器輥111旋轉1次後所形成之格子狀_案的形成 位置與前次之格子狀圖案的形成位置不爲同一位置、較佳 爲形成於與條紋138a,138b之一者呈平行位移既定量之位 置。然後,再次控制圖案化材料賦予裝置130a,130b的移 動,使得又旋轉1次後所形成之格子狀圖案的形成位置與 前;.次之形成位置不一致但與前前次之形成位置一致。藉此 ,可讓格子狀邊緣部圖案偏移既定量之2種的金屬薄膜經 由樹脂薄膜交互地積層。再者,挾持樹脂薄膜之金屬薄膜 ,係以保留既定之對向部分的方式來挪移圖案位置。該對 向部分係形成電容器之靜電容量形成區域。 雷射加工裝置125係朝向容器輥111之外周面照射雷 35 (請先閱讀背面之注音?事項再填寫本頁) · --ϋ ·ϋ n _ϋ n H 一嫌OJ· n n n n an ϋ i 線丨攀 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(w) 射光。雷射加工裝置125係具備未予圖示之掃描裝置,可 對容器輥111之旋轉軸方向以及/或是外周面的行進方向的 任意位置,沿容器輥111之外周面的接近法線方向照射雷 射光。在本實施形態,於容器輥111之外周面上形成由樹 脂薄膜與金囑薄膜所成之交互積層體之後,一邊旋轉容器 輥111、一邊與該旋轉同步讓雷射光照射既定位置。來自 雷射加工裝置125之雷射光可將樹脂薄膜與金屬薄膜兩者 加以加熱•熔融(部分情況甚至會出現蒸發)來去除。從而 ’可形成貫通於積層體之積層方向的貫通孔。作爲可將樹 脂薄膜與金屬薄膜雙方加工之雷射光源,雖由樹脂薄膜材 料 '金屬薄膜材料以及該等之厚度所決定,惟一般可採用 例如C02雷射、YAG雷射、準分子雷射、綠光雷射等。 等離子體照射裝置127係在雷射加工裝置125之下游 側面向容器輥111之外周面所設置。作爲等離午體,可使 用氧等離子體、氬等離子體、氮等離子體等,惟從雷射加 工面之淸淨化速度來考量,則以氧等離子體爲佳。 以下,說明有關採用圖8所示之裝置之交互積層製程 〇 ,真空槽115之內部係藉由真空泵116減壓到例如2X 10 Pa左右。 容器輥111之外周面較佳係冷卻至-20〜-40°c、更佳爲 冷卻至-10〜10 °C。旋轉速度可自由設定,一般爲 15〜l〇〇rpm,周速較佳爲10〜300m/min。 樹脂薄膜形成裝置112係使得樹脂薄膜材料加熱氣化 36 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) · — — — — — — — 線丨# 505933 A7 B7 五、發明說明(β) 或霧化而朝容器輥111之外周面放出。樹脂薄膜材料在容 器輥111之外周面上被冷卻形成液膜。 合 (請先閱讀背面之注音?事項再填寫本頁} 作爲樹脂薄膜材料只要能以上述方式堆積形成薄膜 則無特別之限定,可依據所得之積層體的用途來適宜決定 ,其中以反摩性單體樹脂爲佳。例如,以丙燦酸目旨樹脂戌 是乙烯基樹脂爲主成分者爲佳,具體上以多官能(甲基 烯酸酯單體、多官能乙烯基酯單體爲佳,其中,環戊〜燦 二甲醇二丙烯酸酯、環己烷二甲醇二乙烯基醚單體等戌是 將該等取代烴基所成之單體,從電氣特性、耐熱性、安= 性等之觀點來看乃爲所希望者。此處所謂之「主成分疋 意指上述成分在樹脂薄膜材料中含有90重量%以上。」 堆積所成之樹脂薄膜材料可依所需藉由樹脂硬化裝置 118進行硬化處理到所希望之硬化度。作爲硬化處理欢^ 線· 經濟部智慧財產局員工消費合作社印製 舉出將樹脂薄膜材料聚合以及/或是交聯之處理;作爲樹月匕 硬化裝置4可使用例如電子束照射裝置、紫外線照射 、或是熱硬化裝置等。硬化處理之程度可依據製造之積層 體的特性而適宜變更,例如硬化度達50〜95%、進一步達 50〜75%之硬化處理爲佳。又,本發明之硬化度之定義,係 叫紅外線分光光度計求出C=0基之吸光度與C=C基 (16000CIXT1)之比,來求出各個單體與硬化物之比値,以1 減掉減少量吸光度所得者。 所形成之樹脂薄膜可依所需藉由表面處理裝置119進 行表面處理。例如,在氧環境氣氛下進行放電處理或紫外 線照射處理等,使樹脂薄膜表面活性化來提昇其與金屬薄 37 冢紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 一 505933 A7 B7 五、發明說明(4) 膜之接著性。 _ 其次,藉由一對之圖案化材料賦予裝置130a,130b, 對樹脂薄膜上賦予如圖1〇所示之格子狀圖案的圖案化材料 。形成薄薄的圖案化材料之後’藉由蒸鍍等來形成金屬薄 膜,則於圖寧化材料上不會形成金屬薄膜,而是形成邊緣 部。如此,便可形成出擁有所需圖案之金屬薄膜。 作爲所使用之圖案化材料’以擇自酯系油劑、二元醇 系油劑、氟系油劑、以及烴系油劑所構成群中之至少一種 的油劑爲佳。更佳爲酯系油劑、二元醇系油劑、氟系油劑 ,特佳爲氟系油劑。若使用上述以外之圖案化材料,有時 會發生積層表面之粗糙、樹脂薄膜與金屬薄膜之針孔、金 屬薄膜之形成交界部分之不安定化等之問題。 賦予圖案化材料之後,藉由金屬薄膜形成裝置114來 積層金屬薄膜。作爲金屬薄膜之積層方法,可便用蒸鍍、 濺鍍、離子植入等眾知的真空程序方法,在本發明中,基 於以高生產性來獲致耐濕性優之膜的觀點,以採用蒸鍍、 尤其是電子束蒸鍍爲佳。 作爲金屬薄膜之材料,可使用鋁、銅、鋅、鎳、鐵、 銘,.、矽、鎵或是該等之化合物、或是該等之氧化物、或是 該等之化合物的氧化物等。其中,從接著性與經濟性的觀 點來看以鋁爲佳。又,在金屬薄膜中亦可含有上述以外之 其他成分。又,金屬薄膜也可非限於一種,例如可藉由混 入A1層與Cu層來補強特性,有時也依據使用條件來謀求 高性能化。又,要終止金屬薄膜的形成時,係以遮蔽板 38 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) .· 經濟部智慧財產局員工消費合作社印製 訂· — -- ------I Aw- III —----- 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(37 ) 123來關閉開口 121。 之後,藉由圖案化材料去除裝置117將剩餘之圖案化 材料去除。圖案化材料之大部分在金屬薄膜之形成之際已 蒸發消失掉,但一部分在金屬薄膜之積層後也會殘存。殘 存之圖案化材料會發生積層表面之粗糙、樹脂薄膜與金屬 薄膜之針孔(積層鬆動)、金屬薄膜之形成交界部分之不安 定化等之問題。圖案化材料之去除方法並無特別之限定, 可依據所使用之圖案化材料來選擇,例如可藉由光照射或 電熱加熱器所進行之加熱去除,等離子體照射、離子照射 '電子照射所進行之分解去除等。 依據以上之製造裝置100,在開口 121呈開放的狀態 下,於旋轉之容器輥111的外周面上,製造出由樹脂薄膜 形成裝置112所形成之樹脂薄膜與由金屬薄膜形成裝置 Η4所形成之金屬薄膜父互積層所得之積層體,又,在關 閉開口 124的狀態下,於旋轉之容器輥111的外周面上, 製造出由樹脂薄膜形成裝置112所形成之樹脂薄膜連續積 •層所得之積層體。 再者,如上所述,藉由與容器輥ill之旋轉同步來控 制,圖案化材料賦予裝置130a,130b之往返移動,可讓金屬 薄膜之格子狀邊緣部圖案之位置隔著樹脂薄膜交互地以2 種方式來變化。 於樹脂薄膜與金屬薄膜之積層結束後,在容器輥111 之外周面上積層著積層體的狀態下,使用雷射加工裝置 125於積層體形成貫通孔。具體而言,一邊旋轉容器輥111 39 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 訂i -線丨鬌--------------------- 505933 經濟部智慧財產局員X消費合作社印製 A7 B7 五、發明說明(β) 、一邊與該旋轉同步來掃描雷射光,對既定位置照射雷射 光。 於貫通孔形成後,以等離子體照射裝置127對貫通孔 內壁面照射等離子體爲佳。藉由對貫通孔內壁面進行等離 子體處理’零出於內壁面之樹脂薄膜材料會被去除,來增 加金屬薄膜之露出量。結果,於之後對貫通孔內塡充導電 性材料之際,可提升導電性材料與金屬薄膜之電氣連接之 可靠度。 ‘ 圖11係於容器輥111的外周面上形成之積層體的展 開俯視圖。於圖11中箭頭111b所示係容器輥111之外周 面的移動方向。 被圖案化成大致格子狀之金屬薄膜31a與金屬薄膜 31b係透過樹脂薄膜交互積層。金屬薄膜31a之大致格子 狀的邊緣部圖案與金屬薄膜31b之大致格子狀的邊緣部圖 案係幾乎相同,兩圖案係以使得金屬薄膜31a與金屬薄膜 31b在積層方向具有既定之重疊部分的方式而錯開形成。 金屬薄膜31a與金屬薄膜31b之重疊部分係形成作爲電容 器使用時之靜電容量形成區域。 積層方向之貫通孔33a係形成於貫通金屬薄膜31a但 未貫通金屬薄膜31b之位置。又,積層方向之貫通孔33b 係形成於貫通金屬薄膜31b但未貫通金屬薄膜31a之位置 〇 將積層體自容器輥111剝離,進行平板加壓之後,對 貫通孔33a,33b塡充導電性材料(例如含有金屬粒子之眾知 40 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) : " -------------·------- 1 ^---------^ ----------------- (請先閱讀背面之注意事項再填寫本頁) 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(?丨) 的導電性樹脂)來得到積層體母元件。 其次’進行切斷分離製程。沿著未形成金屬薄膜 3la,31b之邊緣部、也就是在切斷面71a,71b往積層方向來 ,切斷。藉此’可得到實施形態A —·1(圖1八〜圖1£)所示之積 層體。 、 如上所述,依據本實施形態,切斷面71a,71b並不含 金屬薄膜31a,31b之形成區域。亦即,由於未切斷金屬薄 膜31a,31b,不會發生切斷金屬薄膜之時所出現的毛邊或切 屑。又,由於未切斷金屬薄膜,僅需小的切斷力即可,又 ’於切斷時不易發生積層體之變形、金屬薄膜之破裂。又 ’由於金屬薄膜未露出於切斷面,即使不施以包裝也不易 發生金屬薄膜的腐触。 又,由於貫通孔33a,33b之形成係以雷射加工裝置 I25來進行,於加工時並未對金屬薄膜或樹脂簿膜附加機 械性外力。從而,也不會發生積層體之變形或金屬薄膜之 破裂。 又’依所需情形,當然也可在上述所得之積層體的外 表面施以包裝或著色。 · 於上述過程中,也可在交互積層製程之最初階段與最 後階段,關閉開口 121,形成僅讓樹脂薄膜連續地積層之 既定厚度之保護層。 於上述過程中,若取代切斷面71a,改以平行於切斷 面71a ’以通過貫通孔33a與貫通孔33b之個別大致中心 的面爲切斷面的話,可得到實施形態A_4(圖5A〜圖5E)所 41 (請先閱讀背面之注意事項再填寫本頁) · 訂i -線丨·丨 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公釐) 505933 A7 B7 五、發明說明(Μ ) 示之積層體。此時,在該切斷面雖切斷金屬薄膜31a,31b, 但由於切斷面內含有缺口部53a,53b、邊緣部,所以實際之 金屬薄膜3 la,3 lb之切斷面積減少了。又,在另一側之切 斷面71b則並未切斷金屬薄膜31a,3lb。從而,相較於以往 之電容器製靖方法之分離切斷製程,可減少金屬薄膜之切 斷面積。是以,可減少切斷金屬薄膜之時所出現的毛邊或 切屑的發生。又,僅需小的切斷力即可,又,於切斷時不 易發生積層體之變形、金屬薄膜之破裂。又,由於金屬薄 膜未露出於缺口部53a,53b之形成面以外之周圍面,乃不 易發生金屬薄膜的腐蝕。 再者,要獲得實施形態A—3(圖4A)所示之電容器列( 以電容器要素36作爲實施形態A— 1之電容器的實施形態) 只要採以下做法即可。亦即,於上述中,對於未形成金屬 薄膜31a,3lb之邊緣部區域內之既定位置也依薷要來形成 貫通孔(第」貫通孔),在該第2貫通孔也同樣地塡充導電 性材料,形成貫通電極。之後,以不致切斷金屬薄膜 31a,31b的方式來切斷邊緣部區域。此時同樣地,由於並未 切斷金屬薄膜31a,31b,乃不會發生在切斷金屬薄膜之時所 出現的毛邊或切屑。又,由於並未切斷金屬薄膜’僅需小 的切斷力即可,又,於切斷時不易發生積層體之變形、金 屬薄膜之破裂。又,由於金屬薄膜未露出於切斷面,即使 未施以包裝乃不易發生金屬薄膜的腐鈾。 _ (實施形態B —2) 在本實施形態,與上述之實施形態B— 1有以下不同 42 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) .· 經濟部智慧財產局員工消費合作社印製 — — — — — — — — — I — — — — — — — — — — — — — — — — — — — — — 505933 A7 B7 五、發明說明() 之處。亦即,在實施形態B—1中,係於交互積層製程之結 束後’以雷射加工裝置125照射雷射光於積層體中形成貫 通孔,但在本實施形態B—2則是在交互積層製程中照射雷 射光。 具體而零,對於藉由容器輥111之一次旋轉所新積層 之樹脂薄膜與金屬薄膜藉由雷射加工裝置125來照射雷射 光而去除既定位置之樹脂薄膜與金屬薄膜。藉由隨著容器 輥Π1之旋轉來同步掃描雷射光,可‘使得積層方向之雷射 光的照射位置一致。如此般,可在積層方向形成連續的孔 ,於是可形成在積層方向之貫通孔。形成貫通孔之時,只 要對樹脂薄膜之未形成金屬薄膜的區域照射雷射光,加工 出貫通電極用之貫通孔(第2貫通孔)即可。 於本實施形態也同樣地,以等離子體照射裝置127來 進行貫通孔內壁面之等離子體處理爲所希望的=等離子體 處理可在交互積層製程中隨時來進行,或是在交互積層製 程後來進行。 在本實施形態,藉由在交互積層製程內之既定時期停 止雷射加工裝置125所進行之孔加工,可輕易地形成非貫 _.孔。例如,若形成在積層體之上層以及/或是下層僅連續 積層著樹脂薄膜所得之保護層時,若不對上下任一之保護 層部分進行孔加工,則可得到取出電極僅於上下面的其中 一面形成之電容器。 除了上述以外,其餘係與實施形態B—1同樣。 (實施形態B — 3) 43 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公爱) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 n 1 ϋ 1 n n I^OJi n n I n m ϋ n I n 1 n n n n n ·ϋ n ϋ I n n n n ·ϋ ϋ ϋ ϋ n ϋ n I - 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(w) 在本實施形態,下面所述係與實施形態B〜2 處。亦即’在本實施形態Β—3中’係使用具有:可去除樹 脂薄膜但不能去除金屬薄膜之特性的雷射加工裝®。丨乍胃 具有上述特性之雷射光源,係取決於樹脂薄膜材料以及金 屬薄膜材料Μ可使用例如co2雷射等之波長較長的Μ身寸。 在交互積層製程中,依序積層由金屬薄膜形成裝置 II4所形成之金屬薄膜、由樹脂薄膜形成裝置112所形成 之樹脂薄膜之後,使用雷射加工裝置125對既定之位置照 射雷射光。由雷射加工裝置125所提供之雷射光會去除樹 脂薄膜而在照射位置形成貫通樹脂薄膜的貫通孔。當樹脂 薄膜之下存在著金屬薄膜之時,只要將雷射功率控制到既 定値以下,雷射光對於該金屬薄膜即無任何的作用。之後 ,若對含有形成於樹脂薄膜之貫通孔的區域形成金屬薄膜 ,則樹脂薄膜之上下的金屬薄膜可透過該貫通孔來做連接 〇 - 與實施形態Β—1、Β—2同樣,每旋轉一次容器輥111 時即變化金屬薄膜之格子狀邊緣部圖案位置。藉由相對於 每一層都變化之金屬薄膜之格子狀圖案位置來適宜地設定 形,.成於樹脂薄膜之貫通孔的位置,則可得到隔著一層的金 屬薄膜以形成於樹脂薄膜之貫通孔來連接之積層體母元件 〇 將該積層體母元件與實施形態Β—1、Β—2同樣自圖 11之切斷面71a,71b切斷。藉此,可得到實施形態Α—2( 圖3A〜圖3E)所示之積層體。又,若取代切斷面71a,改以 44 (請先閱讀背面之注意事項再填寫本頁) ·---- 訂丨 -線丨#丨丨 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(0) 平行於切斷面71a,以通過貫通孔33a與貫通孔33b之個 別大致中心的面爲切斷面,可得到實施形態A—5(圖7A〜 圖7E)所示之積層體。 在本實施形態,於交互積層製程中,在樹脂薄膜形成 貫通孔之後\,係形成金屬薄膜來對貫通孔內塡充金屬薄膜 材料。是以,金屬薄膜透過形成於樹脂薄膜之貫通孔來依 序連接,乃無須如實施形態B— 1、B—2般對貫通孔塡充 導電性材料。惟,當在積層體母元件的上表層之樹脂薄膜 形成孔,而於該孔之底部露出金屬薄膜之情形下,以與該 金屬薄膜做連接的方式對該孔塡充導電性材料爲佳。藉此 ,透過塡充之導電性材料,可容易地進行電極取出。 又,在交互積層製程中,對未形成金屬薄膜之區域照 射雷射光來形成貫通孔(第2貫通孔),讓該貫通孔連續於 積層方向。藉此,可得到積層體母元件(具有未貪通金屬薄 膜的貫通孔)。一旦與實施形態B—1 _、B—2同樣,對該貫 通孔塡充導電性材料,然後自邊緣部區域來切斷的話,可 得到具備實施形態A—3所示之貫通電極的電容器列(以電 容器要素36作爲實施形態A—2之電容器的實施形態)。 在本實施形態中也同樣地,較佳係於交互積層製程中 使用等離子體照射裝置127對貫通孔內壁面進行等離子體 處理。 在本實施形態,也可與實施形態B—4同樣,在交互 積層製程內之既定時期停止雷射加工裝置125所進行之孔 加工。例如,形成在積層體之上層以及/或是下層僅連續積 45 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ~ (請先閱讀背面之注意事項再填寫本頁) .· 訂-· 線丨# 505933 A7 B7 五、發明說明( 層著樹脂薄膜所得之保護層時,若不對上下任一之保護層 部分進行孔加工,則可得到取出電極面僅於上下面的其中 一面之電容器。 除了上述以外,其餘係與實施形態B—2同樣。 (實施形態B — 4) 本實施形態B—4,使用雷射光之雷射圖案化法來進行 金屬薄膜之圖案化的方面,係與藉由油式圖案化法來進行 之上述實施形態B—1〜B — 3不同。 圖12所示係實施與本發明之實施形態B—4相關之積 層體之製造方法所用之製造裝置之一例的槪略截面圖。與 圖8爲同一構成要素之部分係賦予同一符號而省略其說明 〇 在本實施形態中,係取代於實施形態B—1〜B-3之用 於金屬薄膜的圖案化所使用之圖案化材.料’賦予裝置 130a,130b-以及圖案化材料去除裝置117(參照圖8),改使 用雷射圖案化裝置140。雷射圖案化裝置140係設置於金 ,屬薄膜形成裝置114之下游側、樹脂薄膜形成裝置112之 上游側。 .於金屬薄膜形成後,使用雷射圖案化裝置140對金屬 薄膜表面照射雷射光,將所照射到之地方的金屬薄膜予以 加熱•熔融(部分情況甚至會出現蒸發)來去除,而形成邊 緣部。 - 自雷射圖案化裝置140所發射的雷射光,與來自雷射 加工裝置125的雷射光不同,具有:僅對金屬薄膜作用、 46 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 - I I n n ϋ n n 一δν I ϋ n ϋ I I ϋ n I I I n n I n n n n I ϋ ϋ n n n n I I I ϋ n n n ' 505933 A7 B7 五、發明說明(时) 而對於樹脂薄膜則沒有任何作用的特性。作爲具有相關特 性之雷射光源,係取決於樹脂薄膜材料以及金屬薄膜材料 ,例如以 YAG(Yttrium Aluminum Garnet)雷射、綠光雷射 、準分子雷射等之波長較短的雷射光。長波長雷射光會在 金屬薄膜表·面受到反射。又,雷射光源之輸出可依據所欲 去除之金屬薄膜的種類、厚度來適宜地選擇。. 雷射光可依據所希望的邊緣部之形狀圖案來照射。隨 邊緣部之形狀圖案的不同,也可使用複數之雷射光源。例 如’若金屬薄膜被圖案化成爲具有格子狀邊緣部的情形, 則可採以下的做法。以稜鏡將來自第1雷射光源的光往與 容器輥111之旋轉軸呈平行方向分割成複數,朝向容器輥 111之外周面照射,形成複數條在容器輥111之外周面的 行進方向連續之帶狀邊緣部。以眾知的方法讓來自第2雷 射光源的光與上述第1雷射光源所形成之帶狀邊緣部交叉 來掃描。, 若如本實施形態般以雷射圖案化法來進行金屬薄膜之 圖案化,可輕易地做出任意形狀之圖案。又,在實施形態 B— 1〜B — 3之油式圖案化法中,係相對於容器輥111之外 周,面的行進方向形成斜的邊緣部,但本實施形態之雷射圖 案化法則可在與容器輥111之外周面的行進方向呈平行方 向以及直角方向來形成邊緣部。 伴隨容器輥111之旋轉,藉雷射圖案化裝置140圖寒 化成爲格子狀之金屬薄膜上係藉由樹脂薄膜形成裝置112 來積層樹脂薄膜,進一步於其上藉金屬薄膜形成裝置114 47 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) · 經濟部智慧財產局員工消費合作社印製 一5J· n 1 1 n ϋ 1 I ϋ n n i n n n n ϋ ϋ n I n ϋ ϋ n ϋ ϋ n n 505933 A7 B7 五、發明說明(w) 來積層金屬薄膜。之後,雖再度藉由雷射圖案化裝置140 將表層之金屬薄膜圖案化成爲格子狀,但此時之格子狀圖 案的形成位置相對於前次之格子狀圖案的形成位置係偏移 既定量來形成。然後,再次令容器輥111旋轉一次,讓相 對於金屬薄所形成之格子狀圖案的形成位置對於前次之 格子狀圖案形成位置偏移既定量,且與前前次之格子狀圖 案形成位置爲同一位置。藉此,可讓格子狀圖案位置偏移 既定量之2種的金屬薄膜經由樹脂薄膜交互地積層。 藉此,可在容器輥111之外表面上獲得與圖11所示 者爲词樣的積層體。其中,在本實施形態,也如上所述般 ,容器輥111之外周面之行進方向111b與格子狀圖案方向 的相對關係並不限於圖11所示者。 除上所述以外,其餘與實施形態B— 1〜B — 3之任一同 樣,可得到實施形態A—1,A—2,A—4,A—5所示之積層體( 或電容器>、或是實施形態A—3所示之電容器列。 (實施形態B—5) 本實施形態B—5,同時兼用油式圖案化法以及雷射圖 案化法來進行金屬薄膜之圖案化的方面,係與藉由油式圖 案化法來進行之上述實施形態B—1〜B — 3、以及藉由雷射 圖案化法來進行之實施形態B—4分別不同。 圖13所示係實施與本發明之實施形態B—5相關之積 層體之製造方法所用之製造裝置之一例的槪略截面圖。與 圖8、圖12爲同一構成要素之部分係賦予同一符號而省略 其說明。 48 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) ·· 經濟部智慧財產局員工消費合作社印製 訂---------^1#----------------------- 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(π) 在本實施形態中,圖案化材料賦予裝置142係設置於 樹脂薄膜形成裝置112之下游側、金屬薄膜形成裝置114 之上游側。圖案化材料賦予裝置142係採油式圖案化法形 成複數之帶狀邊緣部。又,雷射圖案化裝置140係設置於 金屬薄膜形曄裝置114之下游側、樹脂薄膜形成裝置112 之上游側。雷射圖案化裝置140係藉由雷射圖案化法形成 邊緣部,該邊緣部與圖案化材料賦予裝置142所形成之帶 狀的邊緣部呈交叉。 " 圖案化材料賦予裝置142之朝向容器輥111之外周面 所形成之微細孔係在與容器輥111之外周面的行進方向呈 直角方向隔著既定間隔配置複數個。在圖案化材料賦予裝 置142內氣化之圖案化材料係自該微細孔放出,附著到容 器輥ill上所積層之樹脂薄膜上,形成與容器輥111之外 周面的行進方向呈平行的複數之帶狀液膜。‘ 之後4若藉由金屬薄膜形成裝置114積層金屬薄膜, 則形成對應於圖案化材料之液膜部分的帶狀之邊緣部。 接著,使用雷射圖案化裝置140,讓雷射光以交叉於 上述帶狀邊緣部的方式進行掃描來照射金屬薄膜,形成邊 緣.部。藉此,可形成圖案化成爲既定之格子狀的金屬薄膜 〇 於本實施形態也同樣地,讓某一層之金屬薄膜的格子 狀圖案的形成位置,相對於隔著其下之樹脂薄膜所形成之 金屬薄膜之格子狀圖案的形成位置偏移既定量,且與更下 方之隔著樹脂薄膜所形成之金屬薄膜之格子狀圖案的形成 49 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ' ~~ (請先閱讀背面之注意事項再填寫本頁) .· -ϋ -ϋ n n n n 一一OJI n I ϋ I ϋ in •線丨Φ 505933 A7 B7 五、發明說明(Μ ) 位置一致。亦即,格子狀圖案位置錯開既定量之2種類的 金屬薄膜係隔著樹脂薄膜交互地積層。爲了實現此積層, 可採以下的方式。作爲第1方法,係當容器輥111旋轉一 次則讓圖案化材料賦予裝置142沿容器輥lu之旋轉軸方 向移動既定釁,接著旋轉一次後再回到原來的位置,也就 是進行所謂的往返運動。或者是,作爲第2方法,也可當· 容器輥111旋轉一次,即讓雷射圖案化裝置14〇所產生之 雷射光的照射位置沿與該掃描方向呈直角的方向偏移既定 量’而在下一旋轉後回到原來之位置。 藉此,可於容器輥111之外表面上得到與圖11所示 者爲同樣的積層體。其中,在本實施形態,金屬薄膜之格 子狀圖案之縱橫其中一者之邊緣部的方向係一致於容器輥 111之外周面的掃描方向111b。又,藉由·讓圖案化材料賦 予裝置I42往與容器輥111之旋轉軸方向呈平荇的方向移 動,或是調整雷射圖案化裝置140所產生之雷射光的掃描 條件,也可將金屬薄膜之格子狀圖案的邊緣部方向設定成 與容器輥111之外周面的行進方向111b做任意角度的交叉 。邊緣部之方向的設定,係考量設備規模以及所使用之雷 射/的掃描速度等來決定。 除上所述以外,其餘與實施形態B—1〜B — 3之任一同 樣,可得到實施形態A— 1,A—2,A—4,A—5所示之積層體( 或電容器)、或是實施形態A—3所示之電容器列。 (實施形態B — 6) 在本實施形態B—6,係取代實施形態B—1〜B — 5所 50 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -------------Φ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製-· Ϋ I ί I ϋ I n I n II ϋ n ϋ ϋ I nnnnnnnn ϋ I ϋ I ϋ n 1 · ϋ n ϋ ϋ ϋ n ϋ I 505933 Α7 Β7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Explanation (?.) This hole is filled with conductive material. Alternatively, in the interactive lamination process, whenever the resin film and / or the metal film are laminated, the laser light is irradiated to remove the resin film and the metal film at a predetermined position, and continuous holes are formed in the lamination direction. After completion, the obtained through hole was filled with a conductive material section. In addition, the formation of the through-holes 23a, 23b of the through resin films 21a, 21b shown in Embodiment A-2 (FIGS. 3A to 3E), and the formation of the resin shown in Embodiment A-5 (FIGS. 7A to 7E) The formation of the notches 63a and 63b of the films 61a and 61l / is performed in the interactive lamination process. After the resin film is laminated and before the metal film is laminated, only the predetermined position of the newly laminated resin film is removed by laser light and the like. The thin film forms a through hole, and then a metal thin film is laminated, and the upper and lower metal thin films can be connected to each other through the through hole. The manufacturing method and manufacturing apparatus of the first invention can choose between the various methods described above and combine to obtain a plurality of embodiments. The following is a list of representative embodiments. (Embodiment B-1) Fig. 8 is a schematic cross-sectional view showing an example of a manufacturing apparatus used to implement a method for manufacturing a laminated body according to Embodiment B-1 of the present invention. In this implementation form. The metal thin film is patterned by the oil patterning method, and the laser processing device is used to form the through-holes or notches after the cross-lamination f process is completed. In FIG. 8, 100 is a manufacturing device of this embodiment, 115 Department of vacuum tank, 116 is a vacuum pump used to maintain the inside of the vacuum tank 115 at a predetermined degree of vacuum, 111 is set in the vacuum tank Π5, to the figure. Arrow in the middle 32 This paper size is applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) ^ (Please read the precautions on the back before filling out this page) # Order · — • Line 丨-505933 A7 B7 V. Description of the invention (; 丨) Cylindrical container roller rotating in 111a direction, ι12 series resin film forming device, 130a, 130b series patterning material applying device (nozzle), U4 series metal film forming device (metal material supply source), 117 series patterned material removal device, 118 series resin hardening device, 119 series surface treatment device, 120 series partition wall that separates metal film forming area into different areas, 121 series openings in partition wall 120, 123 series unless necessary Otherwise, in order to prevent the formation of the metal film, the shielding plate for opening ι21 is opened and closed by moving in the moving direction 123a, 125 laser processing equipment, 127 plasma irradiation device. By rotating the container roller 111, the container roller 111 can be used. Formed on the outer peripheral surface: The resin film formed by the resin film forming device 112 and the metal film formed by the metal film forming device 114 are alternately laminated. Laminated body. At this time, a pair of patterning material applying devices 10a and 130b are used to give a patterned oiling agent of a predetermined shape to the surface of the resin film before the formation of the metal film, thereby forming a patterned film. Metal film of any shape. The basic structure of the patterning material applying device 130a is the same as that of the patterning material applying device 130b. The patterning materials shown in Figs. 9A and 9B are the same as those of the device (nozzle) 130a and 130b. 9A is a front view seen from the side of the container roller 111, and FIG. 9B is a cross-sectional view taken along the line BB of FIG. 9A. In FIG. 9A, the arrow 111b indicates the moving direction of the outer peripheral surface of the container roller 111. _ Pattern The chemical material imparting devices 130a and 130b have: a storage tank 134 for the patterned material (oil agent) 137 to maintain the liquid state, and 33 paper sizes that are applicable to China National Standard (CNS) A4 (210 X 297) (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs · · n ϋ I n · nn ϋ nn ϋ n II h ϋ I n I nnn II— an in n 1_1 in n 1 n -ϋ · ϋ nn-505933 A7 B7 V. Description of the invention (8) Mold cavity 133 of vaporized patterned material. The storage tank 134 and the mold cavity 133 are connected by a connecting path 135. It is light facing the container 丨 丨 丨Opposite faces 132 are formed with a plurality of micro holes 131 (five in Figs. 9A and 9B) connected to the mold cavity 133. The plurality of micro holes 131 are substantially flat with the moving direction 111b of the container roller m; The predetermined distances are arranged at regular intervals. The patterning material applying devices 130a and 130b are heated to a temperature higher than the vaporization temperature of the patterning material (oil agent) 137. The patterning material 137 in the storage tank 134 is vaporized and moves to the cavity 133, from the fine holes 131 to The outer surface of the container roll ill is released. The released patterning material will liquefy on the outer peripheral surface of the container roller U1, forming a liquid film of the patterning material. In the manufacturing apparatus of this embodiment shown in FIG. 8, the pair of patterned material applying apparatuses 130 a and 130 b may be respectively substantially parallel to the rotation axis direction of the container roll 111 (the direction of movement and movement of the outer peripheral surface of the container roll 111). 111b is moving at approximately a right angle). Thus, the plurality of stripes of the patterned material formed on the outer peripheral surface of the container roller 111 by the patterned material applying device 130a and the plurality of the pattern formed on the outer peripheral surface of the container roller by the patterned material applying device 130b. The stripes of the patterned material of the strips appear crossed. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs.Figure 10 shows the device is provided with a pair of patterned materials.13. 0a, 130b is an expanded view of an example of a striped pattern of a patterned material formed on the outer peripheral surface of the container roll 111. The arrow 11 lb indicates the moving direction of the outer peripheral surface of the valley roller 111. The solid line 138a indicates five stripes of the patterned material formed on the outer peripheral surface of the container roll 111 by the patterning material imparting device 130a, and the dotted line 138b indicates the pattern of the container roll 111 by the patterning material imparting device i30b. 5 strips of patterned material formed on the outer surface 34 This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 public love) 505933 A7 B7 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Description (π). As shown in the figure, a pair of patterning material applying devices 130a and 130b are respectively reciprocated at a predetermined speed in parallel with the rotation axis direction of the container roller 111 at a predetermined speed. A grid-like pattern is formed on the patterned material. In particular, if the moving speed of the patterning material applying devices 130a and 咋 b is made substantially the same as the moving speed of the outer peripheral surface of the container roll 111, the stripes formed by each of the patterning material applying devices 130a and 130b and the moving direction 111b are formed. The angle can be set to approximately 45 degrees. As a result, it is possible to obtain a pattern in which the stripes 138a and 138b have a substantially orthogonal grid pattern. Thereafter, once the metal thin film is formed by the metal thin film forming device 114, since the metal thin film is not formed in the portion to which the patterning material has been applied, a rectangular metal thin film patterned into a grid shape can be formed. Further, the movement of the patterning material applying devices 130a and 130b is controlled so that the formation position of the lattice pattern formed after the container roller 111 is rotated once is not the same position as the formation position of the previous lattice pattern, preferably It is formed at a position shifted by a predetermined amount in parallel with one of the stripes 138a and 138b. Then, again control the movement of the patterning material imparting device 130a, 130b, so that the position of the grid-like pattern formed after one rotation is the same as before; The next formation position is inconsistent but consistent with the previous formation position. Thereby, the two kinds of metal thin films with the grid-like edge portion pattern shifted from the predetermined amount can be alternately laminated through the resin thin film. Furthermore, the metal film holding the resin film moves the pattern position in such a manner as to retain a predetermined facing portion. The opposing portion forms a capacitance forming area of the capacitor. The laser processing device 125 is irradiated with a lightning 35 toward the outer surface of the container roller 111 (please read the note on the back? Matters before filling out this page) · --ϋ · ϋ n _ϋ n H I think OJ · nnnn an ϋ i line 丨The paper size of this paper applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 505933 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of invention (w) Radiation. The laser processing device 125 includes a scanning device (not shown), and can irradiate the container roller 111 at any position in the direction of the rotation axis and / or the traveling direction of the outer peripheral surface in the direction close to the normal direction of the outer peripheral surface of the container roller 111. laser. In this embodiment, after forming an interactive laminate composed of a resin film and a gold film on the outer peripheral surface of the container roll 111, the container roll 111 is rotated and the laser light is irradiated to a predetermined position in synchronization with the rotation. The laser light from the laser processing device 125 can heat and melt both the resin film and the metal film (in some cases, even evaporation) can be removed. Thereby, a through hole penetrating through the layered direction of the layered body can be formed. As a laser light source that can process both resin film and metal film, although it is determined by the thickness of the resin film material, the metal film material, and the thickness thereof, generally, for example, C02 laser, YAG laser, excimer laser, Green laser and so on. The plasma irradiation device 127 is provided on the downstream side of the laser processing device 125 toward the outer peripheral surface of the container roll 111. As the plasmon, an oxygen plasma, an argon plasma, a nitrogen plasma, etc. can be used, but an oxygen plasma is preferable in consideration of the purification rate of the laser processing surface. In the following, the interactive lamination process using the device shown in FIG. 8 will be described. The inside of the vacuum tank 115 is reduced to about 2 × 10 Pa by the vacuum pump 116, for example. The outer peripheral surface of the container roll 111 is preferably cooled to -20 to -40 ° C, and more preferably to -10 to 10 ° C. The rotation speed can be set freely, generally 15 to 100 rpm, and the peripheral speed is preferably 10 to 300 m / min. The resin film forming device 112 is used to heat and vaporize the resin film material. 36 This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling out this page). — — — — — — — 线 丨 # 505933 A7 B7 V. Description of the invention (β) or atomize and release it toward the outer peripheral surface of the container roll 111. The resin film material is cooled on the outer peripheral surface of the container roll 111 to form a liquid film. (Please read the note on the back? Matters before filling out this page} As a resin film material, there is no particular limitation as long as it can be deposited in the above manner to form a film. It can be appropriately determined according to the purpose of the obtained laminated body, and the antifriction Monomeric resins are preferred. For example, acrylic resins are preferred as the main component of vinyl resins, and more specifically polyfunctional (methacrylate monomers and polyfunctional vinyl ester monomers are preferred). Among them, cyclopentadiene ~ can dimethanol diacrylate, cyclohexanedimethanol divinyl ether monomers and the like are monomers formed by replacing these hydrocarbon groups, from electrical characteristics, heat resistance, safety, etc. It is desirable from a viewpoint. The "main component" herein means that the above-mentioned components are contained in the resin film material in an amount of 90% by weight or more. The resin film material formed by stacking can be used by a resin curing device 118 as required. The hardening process is performed to a desired degree of hardening. As a hardening process, it is printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. The hardening device 4 can be, for example, an electron beam irradiation device, an ultraviolet irradiation device, or a thermal hardening device, etc. The degree of the hardening treatment can be appropriately changed according to the characteristics of the laminated body to be manufactured, for example, the degree of hardening is 50 to 95%, and further 50 to 50%. A hardening treatment of 75% is better. In addition, the definition of the hardening degree of the present invention is called an infrared spectrophotometer to find the ratio of the absorbance of C = 0 group to the C = C group (16000CIXT1) to find the individual monomers and The ratio of the hardened material is obtained by subtracting the reduced absorbance by 1. The formed resin film can be surface-treated by a surface treatment device 119 as required. For example, discharge treatment or ultraviolet irradiation treatment in an oxygen atmosphere , Activate the surface of the resin film to improve its paper thickness with the metal sheet. Applicable to China National Standard (CNS) A4 (210 X 297 mm). 505933 A7 B7. 5. Description of the invention (4) Adhesion of the film. _ Next, a pair of patterning material applying devices 130a and 130b are used to apply a patterning material with a grid pattern as shown in FIG. 10 to the resin film. A thin patterning material is formed. After the metal film is formed by evaporation or the like, the metal film is not formed on the Tuning material, but the edge portion is formed. In this way, a metal film having a desired pattern can be formed. As the pattern used The chemical material is preferably an oil agent selected from at least one of the group consisting of an ester-based oil agent, a glycol-based oil agent, a fluorine-based oil agent, and a hydrocarbon-based oil agent. More preferably, it is an ester-based oil agent, two Alcohol-based oil agents and fluorine-based oil agents are particularly preferred as fluorine-based oil agents. If patterning materials other than the above are used, the surface of the laminate may be rough, pinholes of resin films and metal films, and metal films may be formed. Problems such as instability at the interface. After the patterning material is applied, the metal thin film is laminated by the metal thin film forming device 114. As a method of laminating the metal thin film, vapor deposition, sputtering, ion implantation, and the like are known. In the present invention, in the present invention, from the viewpoint of obtaining a film having excellent moisture resistance with high productivity, it is preferable to use vapor deposition, especially electron beam vapor deposition. As the material of the metal film, aluminum, copper, zinc, nickel, iron, inscription, etc. can be used. , Silicon, gallium or these compounds, or their oxides, or their oxides. Among them, aluminum is preferred from the viewpoint of adhesiveness and economy. The metal thin film may contain other components than those described above. Moreover, the metal thin film may not be limited to one type. For example, the A1 layer and the Cu layer may be mixed to enhance the characteristics, and high performance may be achieved depending on the use conditions. In addition, to stop the formation of the metal thin film, use the shielding sheet 38. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) (please read the precautions on the back before filling out this page). · Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs · —------- I Aw- III —----- 505933 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (37 ) 123 to close the opening 121. After that, the remaining patterning material is removed by the patterning material removing device 117. Most of the patterned material has evaporated and disappeared when the metal thin film was formed, but a part of it remains after the metal thin film is laminated. Residual patterned materials can cause problems such as rough surface of the laminate, pinholes of the resin film and metal film (the laminate is loose), and instability of the boundary portion of the metal film. The method of removing the patterned material is not particularly limited, and it can be selected according to the patterned material used. For example, it can be removed by light irradiation or heating by an electric heater, plasma irradiation, ion irradiation, or electron irradiation. Decomposition and removal. According to the above manufacturing apparatus 100, the resin film formed by the resin film forming apparatus 112 and the metal film forming apparatus Η4 are manufactured on the outer peripheral surface of the rotating container roll 111 with the opening 121 opened. The laminated body obtained by superimposing the metal thin film and the laminated body is produced by continuously laminating the resin film formed by the resin film forming device 112 on the outer peripheral surface of the rotating container roll 111 with the opening 124 closed. Laminated body. Furthermore, as described above, by controlling the rotation synchronously with the rotation of the container roller ill, the back and forth movement of the patterning material imparting devices 130a and 130b allows the position of the grid-like edge portion pattern of the metal thin film to be alternately applied through the resin thin film. 2 ways to change. After the lamination of the resin film and the metal film is completed, a laminated body is laminated on the outer peripheral surface of the container roll 111, and a laser processing device 125 is used to form a through hole in the laminated body. Specifically, while rotating the container roller 111 39, the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page) Order i-line 丨 线- ------------------- 505933 Member of the Intellectual Property Bureau of the Ministry of Economy X Consumer Cooperative printed A7 B7 V. Description of the invention (β), while scanning the laser light in synchronization with the rotation, Laser light is irradiated to a predetermined position. After the through-holes are formed, it is preferable that the inner wall surface of the through-holes is irradiated with plasma by a plasma irradiation device 127. By performing a plasma treatment on the inner wall surface of the through-hole ', the resin film material from the inner wall surface will be removed to increase the exposed amount of the metal film. As a result, when a conductive material is filled in the through hole later, the reliability of the electrical connection between the conductive material and the metal thin film can be improved. ‘FIG. 11 is an expanded plan view of a laminated body formed on the outer peripheral surface of the container roll 111. The moving direction of the outer peripheral surface of the container roller 111 is indicated by an arrow 111b in FIG. The metal thin film 31a and the metal thin film 31b that are patterned into a substantially lattice shape are alternately laminated through a resin film. The substantially grid-like edge portion pattern of the metal thin film 31a is almost the same as the substantially grid-like edge portion pattern of the metal thin film 31b. The two patterns are such that the metal thin film 31a and the metal thin film 31b have a predetermined overlapping portion in the lamination direction. Staggered to form. The overlapped portion of the metal thin film 31a and the metal thin film 31b forms a capacitance forming area when used as a capacitor. The through-hole 33a in the lamination direction is formed at a position penetrating the metal thin film 31a but not penetrating the metal thin film 31b. In addition, the through-hole 33b in the lamination direction is formed at a position penetrating the metal thin film 31b but not through the metal thin film 31a. The laminated body is peeled from the container roll 111, and the plate is pressed, and then the through-holes 33a, 33b are filled with a conductive material. (For example, the well-known 40 paper sizes containing metal particles are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm): " ------------- · ----- -1 ^ --------- ^ ----------------- (Please read the notes on the back before filling in this page) 505933 A7 B7 Ministry of Economy Wisdom The property bureau employee consumer cooperative prints the conductive resin of the invention description (? 丨) to obtain the laminated body component. Next, a cutting and separation process is performed. It cuts along the edge portions where the metal thin films 3la, 31b are not formed, that is, on the cutting surfaces 71a, 71b in the direction of lamination. Thereby, the laminated body shown in Embodiment A-1 · 1 (Fig. 18 to Fig. 1) can be obtained. As described above, according to this embodiment, the cut surfaces 71a and 71b do not include the formation regions of the metal thin films 31a and 31b. That is, since the metal thin films 31a and 31b are not cut, burrs or chips that occur when the metal thin film is cut are not generated. Further, since the metal thin film is not cut, only a small cutting force is required, and deformation of the laminated body and cracking of the metal thin film are unlikely to occur during cutting. Also, since the metal thin film is not exposed on the cut surface, the metal thin film does not easily corrode even if it is not packaged. In addition, since the formation of the through holes 33a and 33b is performed by the laser processing device I25, no mechanical external force is applied to the metal thin film or the resin film during processing. Therefore, deformation of the laminated body or cracking of the metal thin film does not occur. As necessary, of course, the outer surface of the laminated body obtained as described above may be packaged or colored. · In the above process, the opening 121 may also be closed at the initial stage and the final stage of the cross-lamination process to form a protective layer of a predetermined thickness where only the resin film is continuously laminated. In the above process, if instead of the cutting surface 71a, a surface parallel to the cutting surface 71a 'and a surface approximately passing through the respective centers of the through-hole 33a and the through-hole 33b is taken as the cutting surface, Embodiment A_4 can be obtained (Fig. 5A ~ Figure 5E) 41 (Please read the precautions on the back before filling out this page) · Order i-line 丨 · 丨 This paper size applies to China National Standard (CNS) A4 (21〇X 297 mm) 505933 A7 B7 5. The laminated body shown in the description of the invention (M). At this time, although the metal thin films 31a and 31b are cut on this cut surface, since the cut surfaces include notches 53a, 53b and edge portions, the actual cut area of the metal thin films 3a, 3lb is reduced. In addition, the cut surface 71b on the other side does not cut the metal thin films 31a, 3lb. Therefore, compared with the conventional separating and cutting process of the capacitor manufacturing method, the cutting area of the metal thin film can be reduced. Therefore, it is possible to reduce the occurrence of burrs or chips when the metal film is cut. Moreover, only a small cutting force is required, and deformation of the laminated body and cracking of the metal thin film are less likely to occur during cutting. In addition, since the metal thin film is not exposed on the peripheral surfaces other than the formation surfaces of the cutout portions 53a and 53b, the metal thin film is less likely to be corroded. Furthermore, to obtain the capacitor array shown in Embodiment A-3 (FIG. 4A) (the embodiment in which the capacitor element 36 is used as the capacitor in Embodiment A-1), it is sufficient to adopt the following method. That is, in the above, a through-hole (the first through-hole) is formed at a predetermined position in the edge portion area where the metal thin film 31a and 3lb are not formed, and the second through-hole is similarly filled with conductive electricity. Material to form a through electrode. After that, the edge regions are cut so as not to cut the metal thin films 31a, 31b. Also in this case, since the metal thin films 31a and 31b are not cut, burrs or chips that occur when the metal thin films are cut are not generated. Further, since the metal thin film is not cut, only a small cutting force is required, and deformation of the laminated body and cracking of the metal thin film are less likely to occur during cutting. In addition, since the metal thin film is not exposed on the cut surface, the uranium decay of the metal thin film is unlikely to occur even without packaging. _ (Embodiment B-2) In this embodiment, the following are different from the above-mentioned Embodiment B-1. 42 The paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm). (Notes to fill out this page). · Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs — — — — — — — — — — — — — — — — — — — — — — — — — — 505933 A7 B7 ). That is, in the embodiment B-1, the laser processing device 125 is irradiated with laser light to form a through-hole in the layered body after the end of the layering process. However, in the embodiment B-1, the layering is performed in the layering process. Laser light is radiated during the process. Specifically, the resin film and metal film newly laminated by one rotation of the container roller 111 are irradiated with laser light by the laser processing device 125 to remove the resin film and metal film at a predetermined position. By synchronously scanning the laser light with the rotation of the container roller Π1, the irradiation positions of the laser light in the lamination direction can be made uniform. In this way, continuous holes can be formed in the stacking direction, and through holes can be formed in the stacking direction. When forming the through-holes, it is only necessary to irradiate the area where the metal thin film is not formed on the resin film with laser light, and process the through-holes (second through-holes) for through electrodes. Also in this embodiment, the plasma treatment of the inner wall surface of the through hole by the plasma irradiation device 127 is desired. The plasma treatment can be performed at any time during the cross-lamination process, or after the cross-lamination process. . In this embodiment, the discontinuity can be easily formed by stopping the hole processing performed by the laser processing device 125 during a predetermined period in the interactive lamination process. hole. For example, if a protective layer obtained by laminating a resin film on the upper layer and / or the lower layer of the laminated body is formed continuously, if the upper and lower protective layer portions are not subjected to hole processing, the extraction electrode can be obtained only in the upper and lower layers. Capacitors formed on one side. Except for the above, the rest are the same as those of the embodiment B-1. (Implementation Form B-3) 43 This paper size is applicable to China National Standard (CNS) A4 (210 x 297 public love) (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs n 1 ϋ 1 nn I ^ OJi nn I nm ϋ n I n 1 nnnnn · ϋ n ϋ I nnnn · ϋ ϋ ϋ ϋ n ϋ n I-505933 A7 B7 Printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs (W) In the present embodiment, the points described below are the same as those in the embodiments B to 2. That is, 'in this embodiment B-3', a laser processing device® is used which has the characteristics of being able to remove the resin film but not the metal film.丨 At first glance The laser light source with the above characteristics depends on the resin film material and the metal film material M. For example, a long wavelength M can be used, such as a co2 laser. In the interactive lamination process, a metal thin film formed by the metal thin film forming device II4 and a resin thin film formed by the resin thin film forming device 112 are sequentially laminated, and then a laser processing device 125 is used to irradiate laser light to a predetermined position. The laser light provided by the laser processing device 125 removes the resin film and forms a through hole through the resin film at the irradiation position. When a metal film exists under the resin film, as long as the laser power is controlled below a predetermined threshold, the laser light has no effect on the metal film. After that, if a metal thin film is formed in the area containing the through hole formed in the resin film, the metal thin film above and below the resin film can be connected through the through hole. 0- Same as in the embodiments B-1 and B-2, each rotation The position of the grid-like edge portion pattern of the metal thin film is changed when the container roller 111 is used once. The shape is appropriately set by the position of the grid-like pattern of the metal thin film that changes with each layer. Formed at the position of the through hole of the resin film, a laminated body mother element can be obtained through a metal film formed through the through hole of the resin film. The laminated body mother element and the embodiments B-1, B- 2 Also cut from the cutting surfaces 71a, 71b of FIG. 11. Thereby, the laminated body shown in embodiment A-2 (FIG. 3A ~ 3E) can be obtained. In addition, if you replace the cut surface 71a, change it to 44 (please read the precautions on the back before filling this page) · ---- Order 丨-线 丨 # 丨 丨 This paper standard applies to China National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 Printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (0) A surface parallel to the cut surface 71a and passing through the through holes 33a and the respective approximately center of the through holes 33b is By cutting the surface, a laminated body as shown in Embodiment A-5 (FIG. 7A to FIG. 7E) can be obtained. In this embodiment, after the through-hole is formed in the resin film in the cross-lamination process, a metal film is formed to fill the through-hole with a metal film material. Therefore, the metal thin films are sequentially connected through the through-holes formed in the resin thin film, but it is not necessary to fill the through-holes with a conductive material as in Embodiments B-1 and B-2. However, when a hole is formed in the resin film on the upper surface layer of the multilayer mother component, and a metal film is exposed at the bottom of the hole, it is preferable to fill the hole with a conductive material by connecting the metal film. Thereby, the electrode can be easily taken out through the filled conductive material. In the cross-lamination process, laser light is irradiated to the area where the metal thin film is not formed to form a through-hole (second through-hole), and the through-hole is continuous in the lamination direction. Thereby, a multilayer body mother element (having a through-hole that does not penetrate the metal film) can be obtained. Once the conductive holes are filled with a conductive material in the same manner as in the embodiments B-1_ and B-2, and then cut from the edge region, a capacitor array having the through-electrodes shown in the embodiment A-3 can be obtained. (An embodiment of the capacitor using the capacitor element 36 as the embodiment A-2). In this embodiment as well, it is preferable to perform plasma treatment on the inner wall surface of the through hole using the plasma irradiation apparatus 127 in the cross-stacking process. In this embodiment, as in Embodiment B-4, the hole processing by the laser processing device 125 may be stopped at a predetermined time in the cross-lamination process. For example, the upper layer and / or the lower layer of the laminated body only have 45 consecutive layers. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) ~ (Please read the precautions on the back before filling this page) . · Order- · Line 丨 # 505933 A7 B7 V. Description of the invention (When the protective layer obtained by laminating the resin film is used, if the upper and lower protective layer parts are not subjected to hole processing, the electrode surface can only be taken out of the upper and lower surfaces. One-side capacitor. Except for the above, it is the same as Embodiment B-2. (Embodiment B-4) This embodiment B-4 uses the laser patterning method of laser light to pattern metal thin films. It is different from the above-mentioned embodiments B-1 to B-3 performed by the oil patterning method. As shown in FIG. 12, the manufacturing method used to implement the method for manufacturing the laminated body related to the embodiment B-4 of the present invention is shown. A schematic cross-sectional view of an example of the device. Parts having the same components as those in FIG. 8 are given the same reference numerals and descriptions thereof are omitted. In this embodiment, they are used for metal thin films instead of Embodiments B-1 to B-3. The patterning material used for patterning. The material 'applying means 130a, 130b- and the patterning material removing means 117 (see Fig. 8) are replaced with a laser patterning means 140. The laser patterning device 140 is provided in gold, and belongs to the downstream side of the thin film forming device 114 and the upstream side of the resin thin film forming device 112. . After the metal thin film is formed, a laser patterning device 140 is used to irradiate the surface of the metal thin film with laser light, and the metal thin film where it is irradiated is heated and melted (in some cases, even evaporation) is removed to form an edge portion. -The laser light emitted from the laser patterning device 140 is different from the laser light from the laser processing device 125, and has the following functions: only for thin metal films, 46 This paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-II nn ϋ nn 一 δν I ϋ n ϋ II ϋ n III nn I nnnn I ϋ ϋ nnnn III ϋ nnn '505933 A7 B7 V. Description of the invention (time) It has no effect on resin film. As a laser light source with related characteristics, it depends on the resin film material and the metal film material. For example, a YAG (Yttrium Aluminum Garnet) laser, a green laser, an excimer laser, and the like have a shorter wavelength. Long-wavelength laser light is reflected on the surface and surface of the metal thin film. The output of the laser light source can be appropriately selected depending on the type and thickness of the metal thin film to be removed. . The laser light may be radiated in accordance with a desired shape pattern of the edge portion. Depending on the shape and pattern of the edge portion, a plurality of laser light sources may be used. For example, 'if the metal thin film is patterned to have a grid-like edge portion, the following method can be adopted. The light from the first laser light source is divided into a plurality of directions parallel to the rotation axis of the container roller 111 by 稜鏡, and is irradiated toward the outer peripheral surface of the container roller 111 to form a plurality of continuous directions in the traveling direction of the outer peripheral surface of the container roller 111. Strip edge. The light from the second laser light source intersects with the strip-shaped edge portion formed by the first laser light source and is scanned by a known method. If the metal thin film is patterned by the laser patterning method as in this embodiment, a pattern of any shape can be easily made. In the oil patterning method of the embodiments B-1 to B-3, the edge direction of the surface is formed to be inclined with respect to the outer periphery of the container roll 111. However, the laser patterning method of this embodiment may The edge portion is formed in a direction parallel to the traveling direction of the outer peripheral surface of the container roller 111 and in a right-angle direction. Along with the rotation of the container roller 111, the laser film patterning device 140 is used to cool the grid into a grid-like metal film. The resin film forming device 112 is used to laminate the resin film, and the metal film forming device 114 is further borrowed thereon. Standards are applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) (Please read the notes on the back before filling this page) · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-5J · n 1 1 n ϋ 1 I ϋ nninnnn ϋ I n I n ϋ ϋ n ϋ nn nn 505933 A7 B7 V. Description of the invention (w) Laminate a metal thin film. After that, although the metal thin film on the surface layer was patterned into a grid pattern again by the laser patterning device 140, the formation position of the grid pattern at this time was shifted from the formation position of the previous grid pattern by a predetermined amount. form. Then, the container roller 111 is rotated again, so that the position of the grid pattern formed with respect to the metal thin film is shifted from the position of the previous grid pattern by a predetermined amount, and the position of the grid pattern from the previous grid position is Same location. Thereby, it is possible to alternately laminate two kinds of metal thin films of a predetermined pattern position with a resin film through a resin thin film. Thereby, a laminated body similar to that shown in Fig. 11 can be obtained on the outer surface of the container roll 111. In this embodiment, as described above, the relative relationship between the traveling direction 111b of the outer peripheral surface of the container roller 111 and the direction of the grid pattern is not limited to that shown in FIG. 11. Except for the above, the rest is the same as any of Embodiments B-1 to B-3, and a multilayer body (or a capacitor) shown in Embodiments A-1, A-2, A-4, and A-5 can be obtained. Or the capacitor array shown in Embodiment A-3. (Embodiment B-5) This embodiment B-5 simultaneously uses the oil patterning method and the laser patterning method to pattern the metal thin film. On the one hand, it is different from the above-mentioned embodiments B-1 to B-3 by the oil patterning method and the embodiment B-4 by the laser patterning method. The implementation shown in FIG. 13 is different. A schematic cross-sectional view of an example of a manufacturing apparatus used in a method for manufacturing a laminated body according to Embodiment B-5 of the present invention. Parts having the same constituent elements as those in FIGS. 8 and 12 are given the same reference numerals and descriptions thereof are omitted. 48 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling out this page) ·· Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ------ --- ^ 1 # ----------------------- 505933 A7 B7 Intellectual Property of the Ministry of Economic Affairs Printed by employee consumer cooperatives 5. Description of the invention (π) In this embodiment, the patterning material applying device 142 is provided downstream of the resin film forming device 112 and upstream of the metal film forming device 114. The patterning material providing device 142 is an oil recovery patterning method to form a plurality of strip-shaped edge portions. The laser patterning device 140 is provided downstream of the metal thin film forming device 114 and upstream of the resin film forming device 112. The laser patterning device 140 is an edge portion formed by a laser patterning method, and the edge portion intersects a band-shaped edge portion formed by the patterning material applying device 142. " The outer peripheral surface of the patterning material applying device 142 facing the container roller 111 The formed micropores are arranged at a predetermined interval at right angles to the direction of travel of the outer peripheral surface of the container roll 111. The patterned material vaporized in the patterned material applying device 142 is released from the micropores and adhered. A plurality of strip-shaped liquid films are formed on the resin film laminated on the container roll ill in parallel with the traveling direction of the outer peripheral surface of the container roll 111. 'After that, if the metal thin film is laminated by the metal thin film forming device 114, a band-shaped edge portion corresponding to the liquid film portion of the patterned material is formed. Next, the laser patterning device 140 is used to allow the laser light to cross the above The strip-shaped edge portion is scanned to irradiate the metal thin film to form an edge. unit. Thereby, a metal film patterned into a predetermined grid shape can be formed. In the same manner as in this embodiment, the formation position of the grid pattern of the metal film of a certain layer is formed relative to the position of the resin film formed through the resin film below it. The formation position of the grid pattern of the metal thin film is shifted by a certain amount, and the formation of the grid pattern of the metal thin film formed through the resin film below is formed. 297 mm) '~~ (Please read the notes on the back before filling this page). · -Ϋ -ϋ n n n n-OJI n I ϋ I ϋ in • Line 丨 505933 A7 B7 V. Description of the invention (M) The positions are the same. In other words, the two types of metal thin films whose grid patterns are shifted from the predetermined amount are alternately laminated with a resin thin film interposed therebetween. In order to achieve this layering, the following methods can be adopted. As the first method, when the container roller 111 rotates once, the patterning material imparting device 142 is moved along the rotation axis direction of the container roller lu, and then it returns to the original position after one rotation, that is, the so-called reciprocating motion is performed. . Alternatively, as the second method, when the container roller 111 rotates once, the irradiation position of the laser light generated by the laser patterning device 14 may be shifted by a predetermined amount at a right angle to the scanning direction. Return to the original position after the next rotation. Thereby, the same laminated body as that shown in Fig. 11 can be obtained on the outer surface of the container roll 111. However, in this embodiment, the direction of the edge portion of one of the vertical and horizontal directions of the grid-like pattern of the metal thin film is the same as the scanning direction 111b of the outer peripheral surface of the container roller 111. In addition, by moving the patterning material imparting device I42 to a direction that is flat with respect to the rotation axis direction of the container roller 111, or adjusting the scanning conditions of the laser light generated by the laser patterning device 140, the metal can also be The direction of the edge portion of the grid pattern of the film is set to intersect the traveling direction 111b of the outer peripheral surface of the container roll 111 at an arbitrary angle. The setting of the edge direction is determined by considering the size of the device and the laser / scanning speed used. Except for the above, the rest is the same as any one of the embodiments B-1 to B-3, and the multilayer body (or capacitor) shown in the embodiments A-1, A-2, A-4, and A-5 can be obtained. Or the capacitor array shown in Embodiment A-3. (Embodiment B-6) In this embodiment B-6, it replaces Embodiment B-1 ~ B-5. The paper size of this paper applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --- ---------- Φ (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs
一一 · n n ϋ· ϋ n ·ϋ ϋ I n n n 1 I n ϋ n n in n in n in n I n 11 n n — I I 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(w) 使用之圓柱狀之容器輥I11而改用正多角柱狀之支撐體’ 將其間斷地旋轉,於外周形成積層體。 圖14所示係實施與本發明之實施形態B—6相關之積 層體之製造方法所用之製造裝置之一例的主要構成要素之 槪略截面圖、。於圖14中,與圖8,12,13爲同一構成要素之 部分係賦予同一符號而省略其說明。 在本實施形態,係於正8角柱形狀之支撐體211之外 周面形成積層體。支撐體211係朝旋轉方向2111a以一次 45度來間斷地旋轉。 金屬薄膜之圖案化係以圖案化材料賦予裝置220,230 藉油式圖案化法來進行。 第1圖案化材料賦予裝置220之微細孔222係面向支 撐體211之外周面,沿紙面垂直方向(支撐體211之外周面 的寬方向)以既定之間距來複數形成。當支撐體211之旋轉 停止時,在裝置內氣化之圖案化材料乃自微細孔222放出 ,同時圖案化材料賦予裝置220往移動方向224之方向移 .動。結果,於支撐體211之外周面上形成了與外周面之移 動方向呈平行之複數帶狀的圖案化材料之液膜。 之後,藉由讓支撐體211旋轉45度,則經由第1圖 ^化材料賦予裝置220賦予了圖案化材料之支撐體211的 外周面會與第2圖案化材料賦予裝置230對向。 第2圖案化材料賦予裝置230之微細孔232係面向支 撐體211之外周面,沿支撐體211之外周面的移動方向以 既定之間距來複數形成。當支撐體211之旋轉停止時,在 51 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公f ' (請先閱讀背面之注意事項再填寫本頁) - -I n ϋ I n n n n n I I I ϋ n I ϋ n ϋ I n n 1 I I— I n I n ϋ ϋ 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(θ ) 裝置內氣化之圖案化材料乃自微細孔232放出,同時圖案 化材料賦予裝置230往垂直於紙面的方向(支撐體211之外 周面的寬方向)移動。結果,於支撐體211之外周面上,沿 支撐體之寬方向形成了複數帶狀的圖案化材料之液膜。 就支撐體211之藉第1與第2圖案化材料賦予裝置 220,230形成大致格子狀圖案的液膜的外周面而言,會因爲 支撐體211進一步旋轉45度而與金屬薄膜形成裝置114對 向,可形成圖案化成大致矩形狀之金屬薄膜。 之後,形成有金屬薄膜之面係與樹脂薄膜形成裝置 24〇對向。樹脂薄膜形成裝置240具有傾斜之加熱板 243a,243b。液狀之樹脂薄膜材料241係經過供給管242而 滴到加熱板243a上,一邊順沿加熱板243a,243b流動一邊 被蒸發。又,未蒸發完之樹脂薄膜材料係被回收到盤244 。蒸發之樹脂薄膜材料會通過遮蔽板245a*與遮蔽板 245b,245c-之間而附著於支撐體211之外周面、形成樹脂薄 膜。 如上所述,藉由讓正8角柱狀之支撐體211在旋轉方 向2lla上每次45度來間斷地旋轉,可於支撐體211之外 周.面上形成矩形狀圖案之金屬薄膜與樹脂薄膜的交互積層 體。 於本實施形態也同樣地,藉由讓格子狀圖案位置錯開 既定量之2種類之金屬薄膜隔著樹脂薄膜來交互地積層, 可得到電容器用之積層體。爲了讓金屬薄膜之格子狀圖案 錯開,例如可讓第1圖案化材料賦予裝置220或第2圖案 52 (請先閱讀背面之注意事項再填寫本頁) · 訂-丨 線丨#! 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公爱) 經濟部智慧財產局員工消費合作社印製 505933 A7 ____ B7 五、發明說明(h ) 化材料賦予裝置230在支撐體211每旋轉1次時往垂直於 該移動方向的方向移動既宽量來實現。 圖14雖未予圖不,但上述裝置係收容在一維持著既定 真空度的真空裝置中。又,也可如圖8,12,13所示,以對 向於支撐體,211之外周面的方式來配置圖案化材料去除裝 置117、樹脂硬化裝置118、表面處理裝置119、遮蔽板 123、等離子體照射裝置127。 於積層體形成後、支撐體211之外周面上積層著積層 體之狀態下,與實施形態B—1同樣地以雷射加工裝置125 在積層體之既定位置形成貫通積層體全體之貫通孔。或是 ,在交互積層製程中,每當支撐體211之旋轉停止時,與 實施形態B—2同樣地以雷射加工裝置125對新積層之既 定位置的樹脂薄膜以及金屬薄膜形成貫通孔。於交互積層 製程結束後,自支撐體211剝離積層體,對貫通孔塡充導 電性材料_。之後,在既定位置進行切斷,可得到實施形態 A—1(圖1A〜圖IE)、A—4(圖5A〜圖5E)所示之積層體,以 .及實施形態A—3(圖4A)所示之電容器列(以電容器要素36 爲實施形態A-1之電容器的實施形態)。 又,使用可僅對樹脂薄膜進行去除加工之雷射加工裝 置125,於交互積層製程中,每當支撐體211之旋轉停止 時,與實施形態B—3同樣地,在新積層之既定位置的樹脂 薄膜形成貫通孔。之後,自支撐體211剝離積層體在既定 位置切斷,可得到實施形態A—2(圖3A〜圖3E)、A— 5(圖 7A〜圖7E)所示之積層體。又,在未形成金屬薄膜之區域形 53 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 訂ί •線丨-- 505933 A7 五、發明說明(/ , 成=通電極用之第2貫通孔、對其塡充導電性材料,接著 進’可得到實施形態A—3(圖4A)所示之電容器列( 以電合益要素36爲實施形態A—2之電容器的實讎態)。 ^圖14之例子,金屬薄膜之格子狀圖案化係以採用第 t與弟2圖案化材料賦予裝置22〇,23〇之油式圖案化法來進 行,惟本發明並不限定於此。例如,也可取代第丨與第2 圖案化材料賦予裝置22〇,23〇而改用實施形態B—4所示之 雷射圖案化裝置的雷射圖案化法,來進行金屬薄膜的圖案 化。或者’將第1與第2圖案化材料賦予裝置22〇,23〇中 之一者以雷射圖案化裝置取代,成爲與實施形態B__5同樣 之兼用油式圖案化法與雷射圖案化法,來進行金屬薄膜之 圖案化。 又,支撐體211並不侷限於正8角柱、也可爲正6角 柱、正10角柱等之其他的形狀。 ’ 如以上所述,依據本實施形態,由於積層體係於支撐 體211之各外周面形成爲平板狀,相較於使用輥狀支撐體 的情況,可省略或簡易化自支撐體211剝離後之平板加壓 製程等。又,由於可防止在該平板加壓製程所發生之積層 體.的裂開、金屬薄膜的破裂等,提昇良率。 ; .. (實施形態B — 7) 本實施形態B—7 ’作爲支撐體係使用既定尺寸之平板 狀支撐體。一邊連續搬運複數個該支撐體一邊在其下面形 成樹脂薄膜與金屬薄膜。 具體而言,係形成讓複數之支撐體巡迴之搬送路徑’ 54 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製11 · nn ϋ · ϋ n · ϋ ϋ I nnn 1 I n ϋ nn in n in n in n I n 11 nn — II 505933 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (w) The cylindrical container roller I11 used was replaced with a regular polygonal column-shaped support body, which was intermittently rotated to form a laminated body on the outer periphery. Fig. 14 is a schematic cross-sectional view of main components of an example of a manufacturing apparatus used for implementing a method for manufacturing a laminated body according to Embodiment B-6 of the present invention. In Fig. 14, the same components as those in Figs. 8, 12, and 13 are given the same reference numerals, and descriptions thereof are omitted. In this embodiment, a laminated body is formed on the peripheral surface of the support body 211 in the shape of a regular octagonal pillar. The support body 211 is intermittently rotated in a rotation direction of 45 degrees in a direction of 2111a. The patterning of the metal thin film is performed by a patterning material imparting device 220, 230 by an oil-type patterning method. The fine holes 222 of the first patterning material applying device 220 face the outer peripheral surface of the support body 211, and are formed plurally at a predetermined interval along the vertical direction of the paper surface (the width direction of the outer peripheral surface of the support body 211). When the rotation of the support body 211 is stopped, the patterned material vaporized in the device is released from the micro holes 222, and at the same time, the patterned material is given to the device 220 to move in the direction of the movement direction 224. As a result, a liquid film of a plurality of band-shaped patterned materials is formed on the outer peripheral surface of the support 211 in parallel with the moving direction of the outer peripheral surface. Thereafter, by rotating the support body 211 by 45 degrees, the outer peripheral surface of the support body 211 to which the patterning material has been applied via the first patterning material applying device 220 is opposed to the second patterning material applying device 230. The minute holes 232 of the second patterning material applying device 230 face the outer peripheral surface of the support body 211, and are formed plurally at predetermined intervals along the moving direction of the outer peripheral surface of the support body 211. When the rotation of the support body 211 is stopped, the Chinese national standard (CNS) A4 specification (210 X 297 male f 'is applied to 51 paper sizes (please read the precautions on the back before filling this page)--I n ϋ I nnnnn III ϋ n I ϋ n ϋ I nn 1 II— I n I n ϋ ϋ 505933 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (θ) The patterned material vaporized in the device is made of micropores. 232 is released, and at the same time, the patterning material imparting device 230 is moved in a direction perpendicular to the paper surface (the width direction of the outer peripheral surface of the support body 211). As a result, a plurality of bands are formed along the width of the support body on the outer peripheral surface of the support body 211. The liquid film of the patterned material in the shape of a support. As for the outer peripheral surface of the liquid film of the support 211 that forms a substantially lattice-like pattern by the first and second patterning material applying devices 220 and 230, the support 211 is further rotated by 45 degrees. Opposite the metal thin film forming device 114, a metal thin film patterned into a substantially rectangular shape can be formed. Thereafter, the surface on which the metal thin film is formed is opposed to the resin thin film forming device 240. There are 240 resin thin film forming devices Inclined heating plates 243a, 243b. The liquid resin film material 241 drips onto the heating plate 243a through the supply tube 242, and is evaporated while flowing along the heating plates 243a, 243b. In addition, the unevaporated resin film material The system is recovered to the tray 244. The evaporated resin film material passes between the shielding plates 245a * and the shielding plates 245b, 245c- and adheres to the outer peripheral surface of the support 211 to form a resin film. As described above, by letting the positive 8 The angular pillar-shaped support 211 rotates intermittently at 45 degrees in the rotation direction 21a, and can form an interactive laminate of a metal film and a resin film with a rectangular pattern on the outer periphery of the support 211. In this embodiment, too, Similarly, two types of metal films with a predetermined amount of grid pattern staggered are alternately laminated through a resin film to obtain a laminated body for a capacitor. In order to shift the grid pattern of the metal film, for example, the first 1 Patterned material imparting device 220 or 2nd pattern 52 (Please read the precautions on the back before filling in this page) · Order-丨 线 丨 #! This paper size applies to Chinese national standards ( CNS) A4 specification (21〇X 297 public love) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Employee Co-operative Society 505933 A7 ____ B7 V. Description of the invention (h) The chemical material giving device 230 goes perpendicular to the support body 211 every time the support 211 rotates The movement in the moving direction can be realized by a wide amount of movement. Although not shown in FIG. 14, the above device is housed in a vacuum device that maintains a predetermined vacuum degree. Alternatively, it can also be shown in FIGS. 8, 12, and 13 The patterning material removing device 117, the resin hardening device 118, the surface treatment device 119, the shielding plate 123, and the plasma irradiation device 127 are arranged so as to face the outer peripheral surface of the support 211. After the laminated body is formed and the laminated body is laminated on the outer peripheral surface of the support body 211, a laser processing device 125 is used to form a through-hole through the entire laminated body at a predetermined position in the same manner as in Embodiment B-1. Or, in the interactive lamination process, whenever the rotation of the support body 211 is stopped, the laser processing device 125 is used to form a through hole for the resin film and the metal film at a predetermined position of the new laminate in the same manner as in Embodiment B-2. After the cross-lamination process is completed, the laminated body is peeled from the support 211 to fill the through hole 塡 with a conductive material. After that, cutting is performed at a predetermined position to obtain a laminated body shown in Embodiments A-1 (Fig. 1A to Fig. IE) and A-4 (Fig. 5A to Fig. 5E), and Embodiment A-3 (Fig. The capacitor array shown in 4A) (capacitor element 36 is an embodiment of the capacitor of embodiment A-1). In addition, the laser processing device 125 capable of removing only the resin film is used. In the alternate lamination process, whenever the rotation of the support body 211 is stopped, it is the same as in the embodiment B-3. The resin film forms a through hole. Thereafter, the laminated body is peeled off from the support body 211 and cut at a predetermined position to obtain the laminated bodies shown in Embodiments A-2 (Figs. 3A to 3E) and A-5 (Figs. 7A to 7E). In addition, in the area shape where no metal thin film is formed, this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the precautions on the back before filling this page). 505933 A7 V. Description of the invention (/, Cheng = the second through hole for the through electrode, filled with conductive material, and then the capacitor column shown in Embodiment A-3 (Figure 4A) can be obtained. The benefit element 36 is the actual state of the capacitor of the embodiment A-2). ^ In the example of FIG. 14, the grid-like patterning of the metal thin film is performed by using the t-th and the second-patterned patterning material imparting device 22,23. The oil patterning method is performed, but the present invention is not limited to this. For example, instead of the second and second patterning material providing devices 22, 23, the laser shown in Embodiment B-4 may be used instead The laser patterning method of the patterning device is used to pattern the metal thin film. Or, one of the first and second patterning materials is applied to the device 22, 23, and the laser patterning device is replaced with the laser patterning device. In the embodiment B__5, both the oil patterning method and the laser patterning method are used in combination. The metal thin film is patterned. In addition, the support 211 is not limited to the shape of a regular 8-corner post, a regular 6-corner post, a regular 10-corner post, and the like. As described above, according to this embodiment, due to the laminated system Each of the outer peripheral surfaces of the support 211 is formed into a flat plate shape. Compared with the case of using a roll-shaped support body, the pressing process of the flat plate after the support body 211 is peeled off can be omitted or simplified. Furthermore, it can be prevented from being formed on the flat plate. Cracking of the laminated body, cracking of the metal film, etc., which occurs during the pressing process, improves the yield. (Embodiment B-7) This embodiment B-7 'uses a flat-shaped support of a predetermined size as a support system. A resin film and a metal film are formed under the support while continuously carrying a plurality of the supports. Specifically, a conveying path is formed for a plurality of supports to circulate. 54 This paper standard is in accordance with China National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling out this page)
-« n ϋ ϋ n ϋ n n 一-0*· I n n n n n ϋ ϋ I n n -ϋ n n ϋ n ·ϋ n ϋ ϋ n n n ϋ n n n n ϋ ϋ ϋ I 505933 經濟部智慧財產局員工消費合作社印製 A7 ----§1-^- 五、發明說明(β) 於其途中配置樹脂薄膜形成裝置與金屬薄膜形成裝置。一 旦支撐體通過樹脂薄膜形成裝置與金屬薄膜形成裝置之上 ,支撐體之下面即分別形成樹脂薄膜與金屬薄膜。 以油式圖案化法進行金屬薄膜之圖案化的情況,在構 成上,係讓支撐體於通過樹脂薄膜形成裝置上之後、到達 金屬薄膜形成裝置之前來通過圖案化材料賦予裝置上。又 ,使用雷射圖案化法進行金屬薄膜之圖案化的情況,在構 成上,係讓支撐體於通過金屬薄膜形成裝置上之後、到達 薄膜形成裝置之前來通過雷射圖案化裝置上。 又,於形成貫通孔之時,可依據加工對向薄膜,以實 施形態B— 1〜B — 6之配置爲準,於支撐體之巡迴路徑內設 置雷射加工裝置。 藉由以上之方式,可得到在支撐體上圖案化所成之金 屬薄膜與樹脂薄膜之交互積層體。之後,依必荽性對貫通 孔塡充導電性材料之後,進行切斷,可得到實施形態A— 1,A— 2,A—4,A—5之積層體或實施形態A—3之電容器列 〇 於本發明中,金屬薄膜之圖案化方法並不限於上述之 例,例如,若採用油式圖案化法之情況,可使用後述之實 施形態C一2所記載之圖案化材料賦予裝置540。 《實施例》 (實施例I 一 1) „ 說明使用實施形態B—1(圖8)所示之製造裝置來製造 實施形態A —1(圖1A〜圖1E)所示之積層體以及晶片電容器 55 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 丨· 訂i 線丨-- 505933 A7 ____B7 五、發明說明(饵) 的例子。 以真空栗116將真空槽ι15內抽到2χ l(T2Pa,又將容 器輥111之外周面冷卻到l〇°C。容器輥111之直徑爲 500mm、外周面之移動速度爲100m/分。 作爲樹^旨薄膜材料係使用二環戊二烯二甲醇二丙烯酸 酯。作爲金屬薄膜材料係使用鋁,其由蒸鍍所形成。作爲 圖案化材料係使用氟系油劑。 在進行積層之前,先於容器輥1U之外周面噴塗氟系 脫模劑(大金工業(股份有限)製造”代服利”),之後以不織布 薄薄地延伸。 首先,積層出僅連續積層有樹脂薄膜之保護膜。將上 述樹脂薄膜材料氣化藉樹脂薄膜形成裝置112堆積於容器 輥Π1之外周面上。每丨層之積層厚度爲〇.6 。接著使 用紫外線硬化裝置作爲樹脂硬化裝置118,將上述所堆積 之樹脂薄膜材料加以聚合,使其硬化成爲硬化度70%。此 操作係藉由旋轉容器輥111來反覆進行,而於容器輥111 之外周面形成厚度15//m之保護層。這期間,開口 121係 以遮蔽板123所遮蔽。 其次’積層作爲電容器之容量產生部分的元件層。使 用上述樹脂薄膜材料,使得每一層之積層厚度爲0.1/zm。 接著藉由樹脂硬化裝置118,使樹脂薄膜之硬化度成爲 7〇%。之後,藉由表面處理裝置119對表面進行氧等離子 體處理。接著,自圖案化材料賦予裝置130a,130b之微細 孔放射出上述圖案化材料之蒸氣。讓圖案化材料赋予裝置 56 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) · 經濟部智慧財產局員工消費合作社印製 一5JI H ϋ 1« n I I I I I ϋ n n n n n n ϋ ϋ n ϋ I n n I- ϋ ϋ l 505933 A7 B7 五、發明說明(π ) 130a,130b以大致相同於容器輥ill之外周面之移動速度的 速度來往返移動,於容器輥111之外周面上之樹脂薄膜表 面形成由圖案化材料所得之格子狀之液膜圖案。接著,自 金屬薄膜形成裝置114進行鋁之金屬蒸鍍。積層厚度爲 30nm。之後V以圖案化材料去除裝置117進行遠紅外線加 熱與等離子體放電處理,去除殘存之圖案化材料。 圖案化材料所形成之格子狀圖案位置每當容器輥111 旋轉1次時乃進行變化,讓格子狀圖案位置相異之2種類 的金屬薄膜隔著樹脂薄膜來交互積層。 以上之操作係藉由旋轉容器輥111約3000次來形成 總厚度390 /Z m之元件層。 之後,關閉開口 121,以相同於形成上述保護層的方 式來積層保護層。 於保護層之形成結束後,停止樹脂薄膜形成裝置,一 邊旋轉容器輥111 一邊以雷射加工裝置125在既定位置形 成貫通積層體全體之貫通孔。作爲雷射加工裝置125,係 使用C02(輸出20W)雷射。此時,藉由等離子體照射裝置 127對所形成之貫通孔內進行氧等離子體處理。 .其次,自容器輥111剝離積層體,進行平板加壓,於 貫通孔內塡充導電性樹脂,乃得到積層體母元件。 之後,在不致切斷金屬薄膜之位置(邊緣部)進行切斷 ,得到圖1A〜圖1E所示之積層體。 . 所得之積層體之外形尺寸爲縱0.5mm、寬LOmm、厚( 積層方向之高度)0.42mm,貫通孔直徑爲0.2mm。又,作 57 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 x 297公釐〉 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 — 1 i n n -n n n 一 δ,· IM· a·· · ϋ n n n n n n «ϋ n n ϋ n Hi n flu n —>i n n in n n I— 505933 A7 B7 五、發明說明(Η ) 爲電容器作用之金屬薄膜之對向區域的面積爲縱〇.4mmX 寬0.3mm。於一對之貫通孔內之導電性樹脂表面形成電極 端子,評價作爲電容器之特性,結果容量爲40nF。 (實施例.I 一 2) 除了挾蒂著樹脂薄膜之上下金屬薄膜的格子狀圖案之 錯開量變更以外,其餘與實施例I一1同樣,得到積層體 母元件。接著,變更與實施例I一1之切斷面之位置,以 得到實施形態A—4(圖5A〜圖5E)所示之積層體。 所得之積層體之外形尺寸爲縱〇.5mm、寬1.0mm、厚( 積層方向之高度)〇.42mm,半圓形之缺口部之半徑爲 0.1mm。又,作爲電容器作用之金屬薄膜之對向區域的面 積爲縱0.4mmX寬0.65mm。於一對之缺口部內之導電性樹 脂表面形成電極端子,評價作爲電容器之特性,結果容量 爲87nF。本實施例之電容器,相較於實施例.1二1之電容 器,雖爲大致相同尺寸,但可增加金屬薄膜之對向區域之 面積,於是,可增加容量。 於本第I發明中,上述實施例充其量不過爲一例,本 發明並不侷限於上述之實施例。例如,積層體之積層數可 取據積層體之用途、要求之規格(例如使用於電容器時所要 求之靜電容量)等來適宜決定,由上述實施例所記載之1層 厚度與全體厚度所算出之積層數不過爲一例。惟,從形成 之積層體之使用觀點來看,極薄之積層體容易發生裂痕等 。依據本發明者所做的檢討,一般只要積層體之厚度在 100/zm以上即幾乎不會發生裂痕等,惟20//m左右以下 58 尺度適用中國國家標準(CNS)A4規格(210 X 297公釐Γ ' (請先閱讀背面之注意事項再填寫本頁) 訂·丨 -線丨#! 經濟部智慧財產局員工消費合作社印製 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(θ) 則在使用上需特別留意。從而,若1層之樹脂薄膜與1層 之金屬薄膜之合計厚度的上限爲,則樹脂薄膜之積層 數爲20層以上即爲有關積層體之積層數的實際之下限値。 樹脂薄膜之積層數在100層以上乃爲更佳。另一方面,積 層體之上限第所受之限制因子較下限値爲少。其中,在高 密度組裝電路基板中,由於零件高度較半導體晶片爲高, 厚度1mm以上之電子零件變得較少,若1層之樹脂薄膜與 1層之金屬薄膜之合計厚度的下限爲.0.1/z.m,則樹脂薄膜 之積層數爲10000層以下即成爲有關積層體之積層數的上 限値之標準。 [關於第Π發明] 本第Π發明之積層體之製造方法,其特徵在於,在支 撐體上形成積層體(含有樹脂薄膜以及分割成大致矩形狀之 金屬薄吴)。 以下參照圖式說明具體方法。 (實施形態C一 1) 圖15所示係實施與本發明之實施形態C一1相關之積 層體之製造方法所用之積層體之製造裝置之一例的槪略截 面圖。 於圖15中,500係本實施形態之積層體之製造裝置, 515係真空槽,516係用以將真空槽515之內部維持在既定 之真空度的真空泵,511係設置在真空槽515內、往圖中 之箭頭方向旋轉之圓筒形狀的容器輥,512係樹脂薄膜形 成裝置,513係圖案化材料賦予裝置,514係金凰薄膜形成 59 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) (請先閱讀背面之注意事項再填寫本頁) -11!1111 ^ ·11111111 — — — — — — — — — — — I II — — — — — — — — . 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(技) 裝置(金屬材料供給源),517係圖案化材料去除裝置,518 係樹脂硬化裝置,519係表面處理裝置,52〇係用以將金屬 薄膜形成區域與其他區域做區隔的隔壁,521係設於隔壁 520之開口,523係除非必要時否則爲了防止金屬薄膜之形 成而往移動方向523a移動來關閉開口 521所用之遮蔽板, 530係朝向容器輥511之外周面照射雷射光之雷射光照射 裝置,531係自雷射光照射裝置所發出之雷射光。 分割成矩形狀之金屬薄膜的形成‘,可藉由圖案化材料 賦予裝置513、金屬薄膜形成裝置514、以及雷射光照射裝 置530來實現。 圖案化材料賦予裝置513係自朝向容器輥511開口之 微細孔噴射出經加熱而氣化之圖案化材料,於容器輥511 上之樹脂薄膜表面附著帶狀之液膜。附著有圖案化材料之 部分並不形成金屬薄膜,成爲第1非金屬帶X邊緣部)。微 細孔在容器輥511之旋轉軸方向的配置(間隔、數目)係依 據所欲形成之非金屬帶的配置來決定。又’非金屬帶之寬 度係藉由變化微細孔之大小與噴氣量來調整。此時’與容 器輥511之旋轉同步,讓圖案化材料賦予裝置513沿與容 器輥511之旋轉軸成平行之方向移動,可形成與非金屬帶 / 之形成位置相異之金屬薄膜。 又,作爲圖案化材料之賦予方法,除了上述方法之外 ,雖有藉由反向塗(reverse coat)、模塗(die coat)#之塗佈 來直接賦予的方法,但此會對樹脂薄膜表面賦予外力,爲 了防止樹脂薄膜與其下之金屬薄膜的變形、破裂、表面粗 60 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公i ) . (請先閱讀背面之注意事項再填寫本頁) .· 訂·一 -線丨擎丨丨 505933 A7 B7 五、發明說明(对) 糙等之發生,以採用非接觸之賦予方法爲佳。 作爲所使用之圖案化材料’以擇自醋系油劑、二元醇 系油劑、氟系油劑、以及烴系油劑所構成群中之至少一種 的油劑爲佳。更佳爲酯系油劑、二元醇系油劑、氟系油劑 ,特佳爲氟寧油劑。若使用上述以外之圖案化材料,有時 會發生積層表面之粗糙、樹脂薄膜與金屬薄膜之針孔、金 屬薄膜之形成交界部分之不安定化等之問題。 賦予圖案化材料之後,藉由金屬薄膜形成裝置514來 形成金屬薄膜。作爲金屬薄膜之形成方法,可使用蒸鍍、 濺鍍、離子植入等眾知的真空程序方法,在本發明中,基 於以高生產性來獲致耐濕性優之膜的觀點,以採用蒸鍍、 尤其是電子束蒸鍍爲佳。作爲金屬薄膜之材料,可使用銘 、銅、鋅、鎮、鐵、銘、砂、嫁或是該等之化合物、或是 該等之氧化物、或是該等之化合物的氧化物等:其中,從 接著性與經濟性的觀點來看以鋁爲佳。又,在金屬薄膜中 亦可含有上述以外之其他成分。又,金屬薄膜也可非限於 •—種,例如可藉由混入A1層與Cu層來補強特性,有時也 依據使用條件來謀求高性能化。 .金屬薄膜之厚度係依據所得之積層體之用途來適宜決 / 定,當使用於電子零件用途時,係l〇〇nm以下、較佳爲 10〜50nm、更佳爲20〜40nm。又,膜電阻上限以20Ω/□以 下爲佳、較佳爲15Ω/□以下、更佳爲10Ω/□以下,又下 限以1Ω/□以上爲佳、較佳爲2Ω/□以上、更佳爲3Ω/〇 以上。 61 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製-«N ϋ ϋ n ϋ nn a-0 * · I nnnnn ϋ ϋ I nn -ϋ nn ϋ n · ϋ n ϋ ϋ nnn ϋ nnnn ϋ ϋ ϋ I 505933 Printed by the Consumers’ Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs A7- --§1-^-V. Description of the invention (β) A resin thin film forming device and a metal thin film forming device are arranged on the way. Once the support passes through the resin film forming device and the metal film forming device, the resin film and the metal film are formed under the support, respectively. In the case of patterning a metal thin film by an oil patterning method, the support is structured by applying a patterning material to the device after passing through the resin film forming device and before reaching the metal film forming device. In the case of patterning a metal thin film using a laser patterning method, the support is configured to pass through the laser patterning device after passing through the metal film forming device and before reaching the film forming device. In addition, when forming the through hole, a laser processing device may be installed in the roving path of the support body according to the configuration of the facing film according to the processing configuration B-1 to B-6. In the above manner, an interlayer of a metal film and a resin film patterned on a support can be obtained. After that, the through-holes are filled with a conductive material according to the required properties, and then cut to obtain the multilayer body of Embodiment A-1, A-2, A-4, A-5 or the capacitor of Embodiment A-3. In the present invention, the patterning method of the metal thin film is not limited to the above example. For example, if an oil patterning method is used, the patterning material applying device 540 described in Embodiment C-2 described later can be used. . << Example >> (Example I-1) «Describes that the multilayer device and chip capacitor shown in Embodiment A-1 (Figure 1A to Figure 1E) are manufactured using the manufacturing apparatus shown in Embodiment B-1 (Figure 8). 55 This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) 丨 Order i line 丨-505933 A7 ____B7 V. Description of the invention (bait The vacuum tank 116 is used to draw the inside of the vacuum tank ι15 to 2 × l (T2Pa, and the outer peripheral surface of the container roller 111 is cooled to 10 ° C. The diameter of the container roller 111 is 500 mm, and the moving speed of the outer peripheral surface is 100 m. As the tree film material, dicyclopentadiene dimethanol diacrylate is used. As the metal film material, aluminum is used, which is formed by vapor deposition. As the patterning material, a fluorine-based oil agent is used. Before lamination, firstly spray a fluorine-based mold release agent (Daikin Industries ("Daifuri") manufactured by Daikin Industries (Stock Co., Ltd.)) on the outer surface of the container roll, and then extend it thinly with a non-woven fabric. Protective film. The above resin film The gasification of the material is accumulated on the outer peripheral surface of the container roller Π1 by the resin film forming device 112. The thickness of each layer is 0.6. Then, a UV curing device is used as the resin curing device 118, and the above-mentioned stacked resin film material is applied. Polymerize to harden to a hardening degree of 70%. This operation is repeated by rotating the container roll 111, and a protective layer with a thickness of 15 // m is formed on the outer peripheral surface of the container roll 111. During this period, the opening 121 is shielded It is covered by the board 123. Secondly, the laminated layer is used as the element layer of the capacitor capacity generating portion. The above resin film material is used so that the laminated thickness of each layer is 0.1 / zm. Then, the resin hardening device 118 is used to make the resin film hardening degree 70%. After that, the surface is subjected to oxygen plasma treatment by the surface treatment device 119. Then, the vapor of the patterning material is emitted from the fine holes of the patterning material applying device 130a, 130b. The patterning material applying device 56 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) Printed by 5JI H ϋ 1 «n IIIII ϋ nnnnnn ϋ ϋ n ϋ I nn I- ϋ ϋ l 505933 A7 B7 5. Description of the invention (π) 130a, 130b are roughly the same as the container The speed of the moving speed of the outer peripheral surface of the roller ill is reciprocated, and a grid-shaped liquid film pattern obtained from the patterned material is formed on the resin film surface of the outer peripheral surface of the container roller 111. Next, aluminum is formed from the metal thin film forming device 114. Metal evaporation. The thickness of the laminate was 30 nm. Thereafter, V performs far-infrared heating and plasma discharge treatment with a patterned material removing device 117 to remove the remaining patterned material. The position of the grid-like pattern formed by the patterning material is changed each time the container roll 111 rotates, and two types of metal films having different grid-like pattern positions are alternately laminated through a resin film. The above operation is performed by rotating the container roll 111 about 3000 times to form an element layer having a total thickness of 390 / Z m. After that, the opening 121 is closed, and the protective layer is laminated in the same manner as in forming the protective layer. After the formation of the protective layer is completed, the resin film forming apparatus is stopped, and while the container roll 111 is rotated, a laser processing apparatus 125 is used to form a through hole penetrating the entire laminated body at a predetermined position. As the laser processing device 125, a C02 (output 20W) laser was used. At this time, the plasma irradiation device 127 performs an oxygen plasma treatment on the formed through-holes. Next, the laminated body was peeled from the container roll 111, and the plate was pressurized, and a conductive resin was filled in the through hole to obtain a laminated body mother element. Thereafter, cutting is performed at a position (edge portion) where the metal thin film is not to be cut, to obtain a laminated body shown in FIGS. 1A to 1E. The dimensions of the obtained laminated body were 0.5 mm in length, LOmm in width, 0.42 mm in thickness (height in the lamination direction), and the diameter of the through hole was 0.2 mm. In addition, 57 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (21 × 297 mm) (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs — 1 inn -nnn-δ, · IM · a ·· · ϋ nnnnnn «ϋ nn ϋ n Hi n flu n — > inn in nn I— 505933 A7 B7 V. Description of the invention (Η) is the opposite of the metal film acting as a capacitor The area of the area was 0.4 mm in length and 0.3 mm in width. An electrode terminal was formed on the surface of a conductive resin in a pair of through-holes, and the characteristics as a capacitor were evaluated. As a result, the capacity was 40 nF. (Example. I-12) Except for the pedicle Except for the variation in the grid pattern of the resin film above and below the metal film, the rest is the same as in Example 1-1 to obtain a laminated body element. Then, the position of the cut surface of Example 1-1 is changed to obtain The laminated body shown in Embodiment A-4 (FIG. 5A to FIG. 5E). The obtained laminated body has an outer dimension of 0.5 mm in length, 1.0 mm in width, and a thickness (height in the direction of the lamination) of 0.42 mm. The radius of the notch is 0.1mm. The area of the facing area of the metal thin film acting as a capacitor is 0.4 mm in length × 0.65 mm in width. An electrode terminal was formed on the surface of the conductive resin in the notch of the pair, and the characteristics as a capacitor were evaluated, and the capacity was 87 nF. The capacitor of this example Compared with the capacitor of Example 1.21, although the capacitors are approximately the same size, the area of the facing area of the metal thin film can be increased, so that the capacity can be increased. In the first invention, the above embodiments are merely at best For example, the present invention is not limited to the above-mentioned embodiments. For example, the number of layers of the multilayer body may be appropriately determined according to the application of the multilayer body, the required specifications (such as the capacitance required when used in a capacitor), and the like. The number of laminated layers calculated from the thickness of one layer and the total thickness described in the example is just one example. However, from the viewpoint of the use of the formed laminated body, extremely thin laminated bodies are prone to cracks, etc. According to the review made by the inventors Generally, as long as the thickness of the laminated body is more than 100 / zm, cracks will not occur, etc., but the 58 scale below 20 // m applies the Chinese national standard. (CNS) A4 specifications (210 X 297 mm Γ '(Please read the precautions on the back before filling this page) Order · 丨 线 丨 #! Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives 505933 Intellectual Property Bureau of the Ministry of Economic Affairs Printed by employees' consumer cooperatives A7 B7 V. The description of the invention (θ) requires special attention in use. Therefore, if the upper limit of the total thickness of one layer of resin film and one layer of metal film is, the number of layers of resin film is More than 20 layers is the actual lower limit of the number of layers of the laminated body. It is more preferable that the number of laminated resin films is 100 or more. On the other hand, the upper limit of the laminate is less limited than the lower limit 値. Among them, in a high-density assembled circuit board, since the height of parts is higher than that of a semiconductor wafer, electronic parts having a thickness of 1 mm or more become fewer. If the total thickness of a layer of a resin film and a layer of a metal film is lower than .0.1 / zm, the number of laminated layers of the resin film is 10,000 or less, which becomes the standard for the upper limit of the number of laminated layers. [About the Πth invention] The method for manufacturing a laminated body according to the Πth invention is characterized in that a laminated body (containing a resin film and a thin metal sheet divided into a substantially rectangular shape) is formed on a support. The specific method is described below with reference to the drawings. (Embodiment C-1) Fig. 15 is a schematic cross-sectional view showing an example of a manufacturing apparatus for a laminated body used for carrying out a method for manufacturing a laminated body related to Embodiment C-1 of the present invention. In FIG. 15, 500 is a manufacturing device of the laminated body of this embodiment, 515 is a vacuum tank, 516 is a vacuum pump for maintaining the inside of the vacuum tank 515 at a predetermined vacuum degree, and 511 is installed in the vacuum tank 515. A cylindrical container roller rotating in the direction of the arrow in the figure, a 512 series resin film forming device, a 513 series patterning material imparting device, and a 514 series golden phoenix film formation 59 This paper size applies to China National Standard (CNS) A4 specifications ( 210 X 297 public love) (Please read the precautions on the back before filling out this page) -11! 1111 ^ · 11111111 — — — — — — — — — — II — — — — — — — — 505933 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Inventive (technical) device (metal material supply source), 517 series patterned material removal device, 518 series resin hardening device, 519 series surface treatment device, and 52 series A partition wall that separates the metal film forming area from other areas. 521 is provided in the opening of the partition wall 520, and 523 is in the moving direction 523a in order to prevent the formation of the metal thin film unless necessary. The shielding plate used for moving to close the opening 521, 530 is a laser light irradiation device that radiates laser light toward the outer peripheral surface of the container roller 511, and 531 is laser light emitted from the laser light irradiation device. The formation of the divided thin metal film ′ can be realized by the patterning material applying device 513, the metal thin film forming device 514, and the laser light irradiation device 530. The patterning material applying device 513 ejects the heated and vaporized patterning material from the fine holes opened toward the container roller 511, and a band-shaped liquid film is adhered to the surface of the resin film on the container roller 511. The portion where the patterning material is adhered does not form a metal thin film, and becomes the first non-metallic strip X edge portion). The arrangement (interval, number) of the fine holes in the rotation axis direction of the container roller 511 is determined according to the arrangement of the non-metallic belt to be formed. The width of the non-metallic belt is adjusted by changing the size of the micropores and the amount of air jets. At this time, 'in synchronization with the rotation of the container roller 511, the patterning material imparting device 513 is moved in a direction parallel to the rotation axis of the container roller 511, and a metal thin film different from the formation position of the non-metallic belt / can be formed. In addition, as a method of applying a patterning material, in addition to the above-mentioned methods, although there is a method of directly applying by reverse coating or die coating # coating, this method is applied to a resin film. The surface is given an external force. In order to prevent the resin film and the metal film from being deformed, cracked, and the surface is rough. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 male i). (Please read the precautions on the back first. (Fill in this page) .. · Order · One-line 丨 engine 丨 505933 A7 B7 5. Description of the invention (pair) Roughness, etc., it is better to use non-contact method of giving. The patterning material used is preferably an oil agent selected from the group consisting of an vinegar-based oil agent, a glycol-based oil agent, a fluorine-based oil agent, and a hydrocarbon-based oil agent. More preferred are ester-based oil agents, glycol-based oil agents, and fluorine-based oil agents, and particularly preferred are fluorinated oil agents. When patterning materials other than the above are used, problems such as rough surface of the laminate, pinholes of the resin film and the metal film, and instability of the boundary portion of the metal film may occur. After the patterning material is applied, a metal thin film is formed by a metal thin film forming device 514. As a method for forming a metal thin film, a known vacuum process method such as vapor deposition, sputtering, and ion implantation can be used. In the present invention, from the viewpoint of obtaining a film having excellent moisture resistance with high productivity, vapor deposition is adopted. Plating, especially electron beam evaporation is preferred. As the material of the metal film, you can use Ming, copper, zinc, town, iron, Ming, sand, marry or these compounds, or their oxides, or their compounds, etc .: From the standpoint of adhesiveness and economy, aluminum is preferred. In addition, the metal thin film may contain other components than those described above. In addition, the metal thin film may not be limited to one type. For example, the A1 layer and the Cu layer may be mixed to enhance the characteristics, and high performance may be achieved depending on the use conditions. The thickness of the metal thin film is appropriately determined / determined according to the use of the obtained laminated body. When used for electronic parts, the thickness is 100 nm or less, preferably 10 to 50 nm, and more preferably 20 to 40 nm. The upper limit of the film resistance is preferably 20 Ω / □ or less, more preferably 15 Ω / □ or less, more preferably 10 Ω / □ or less, and the lower limit is preferably 1 Ω / □ or more, more preferably 2 Ω / □ or more, and more preferably 3Ω / 〇 or more. 61 This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling out this page) Printed by the Employees ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs
ϋ ϋ n n n n n^tfJ· n n an n I 1 >^1 I 1 ·ϋ n n n ϋ ϋ n n ϋ ϋ ·-1 n n n ϋ n n -ϋ ϋ I 505933 A7 ___ B7 五、發明說明(p) 由於藉由圖案化材料賦予裝置513在容器輥511之外 周面的移動方向賦予了帶狀之圖案化材料,賦予該圖案化 材料之位置並不形成金屬薄膜,而形成了該部分空出之帶 狀金屬薄膜。 雷射光領射裝置530係藉由照射雷射光將形成之金屬 薄膜加熱蒸發以去除。 使用之雷射光,係依據所欲去除之金屬薄膜之材料來 選擇,一般以 YAG(Yttrium Aluminum Garnet)雷射等之波 長較短的雷射光爲佳。長波長雷射光會在金屬薄膜表面受 到反射。又,若照射到樹脂薄膜,樹脂薄膜將會燃燒消失 〇 雷射光之軌跡係以與第1非金屬帶(藉由圖案化材料賦 予裝置513形成爲與容器輥511之外周面的移動方向呈平 行)大致直角掃描的方式來進行照射。亦即,由於金屬薄膜 係藉由容器輥511之旋轉而移動,乃相對於該移動方向斜 向地掃描同時進行照射。金屬薄膜之移動方向與掃描方向 •所成之角度係由形成於容器輥511上之最表層的金屬薄膜 之移動速度來決定。 由雷射光之照射所形成之非金屬帶相較於由圖案化材 料之賦予所形成之非金屬帶在絕緣特性上來得確實,又可 得到交界部明顯之非金屬帶。又’由於係未接觸到積層體 來形成,不會對積層體賦予外力’可防止樹脂薄膜與金屬 薄膜的變形、破裂、表面粗糙等之發生。 非金屬帶之寬度可藉由調整雷射光源之輸出與掃描方 62 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -0 n an n n n n n^eJa n i ϋ ϋ ϋ ϋ ϋ I 1 n n n n 1 n ·ϋ ϋ ϋ βϋ n n ϋ ϋ ϋ ϋ ϋ n ϋ n n _ 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(w) 法來變更。 , 藉由以上的方式,以圖案化材料賦予裝置513所形成 之第1非金屬帶(與容器輥511之外周面的移動方向呈平行 )、以雷射光照射裝置530所形成第2非金屬帶(與容器輥 511之外周頭的移動方向呈大致直角)可將金屬薄膜分割成 大致矩形狀(正方形或長方形)。ϋ nn nnnnn ^ tfJ · nn an n I 1 > ^ 1 I 1 · ϋ nnn ϋ ϋ nn ϋ ϋ · -1 nnn ϋ nn -ϋ ϋ I 505933 A7 ___ B7 V. Description of the invention (p) The patterning material applying device 513 imparts a strip-shaped patterned material to the moving direction of the outer peripheral surface of the container roller 511. The position where the patterned material is provided does not form a metal thin film, but forms a partially vacant strip-shaped metal thin film. The laser light emitting device 530 removes the formed metal film by heating and evaporating the laser light. The laser light used is selected based on the material of the metal thin film to be removed. Generally, laser light with a short wavelength such as YAG (Yttrium Aluminum Garnet) laser is preferred. Long-wavelength laser light is reflected on the surface of the metal thin film. In addition, if the resin film is irradiated, the resin film will burn and disappear. The trajectory of the laser light is formed in parallel with the first non-metallic belt (the patterning material applying device 513 is formed parallel to the moving direction of the outer peripheral surface of the container roller 511). ) Irradiation is performed by scanning at a substantially right angle. That is, since the metal thin film is moved by the rotation of the container roller 511, scanning is performed obliquely with respect to the moving direction and irradiation is performed. Moving direction and scanning direction of the metal film • The angle formed is determined by the moving speed of the metal film formed on the outermost surface of the container roller 511. The non-metallic band formed by the irradiation of laser light is more reliable in insulation properties than the non-metallic band formed by the imparting of a patterned material, and a non-metallic band with obvious junctions can be obtained. In addition, since it is formed without contacting the laminated body, no external force is applied to the laminated body, and it is possible to prevent the resin film and the metal film from being deformed, cracked, and roughened. The width of the non-metallic strip can be adjusted by the output and scanning of the laser light source. 62 The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 public love) (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economics-0 n an nnnnn ^ eJa ni ϋ ϋ ϋ ϋ ϋ ϋ I 1 nnnn 1 n Cooperative prints 505933 A7 B7 V. Description of Invention (w) method to change. In the above manner, the first non-metallic belt formed by the patterning material applying device 513 (parallel to the moving direction of the outer peripheral surface of the container roller 511), and the second non-metallic belt formed by the laser light irradiation device 530 (At a substantially right angle to the direction of movement of the outer periphery of the container roller 511) The metal thin film can be divided into a substantially rectangular shape (square or rectangular).
其次,說明圖15之製造裝置之上述以外的構成。 真空槽515之內部係藉由真空泵、16保持在既定之真 空度。真空槽515內之較佳的真空度爲0.027Pa(2Xl〇_ 4Τοιτ)左右。又,將由隔壁520所區隔出之含有金屬薄膜形 成裝置514之空間維持成較其他空間略爲低壓乃爲所希望 的。藉此,可防止來自金屬薄膜形成裝置514之金屬蒸氣 流或金屬粒子流無意中漏到含有金屬薄膜形成裝置514之 空間以外的空間。 .V 容器輥511之外周面係加工成平滑狀、較佳爲加工成 鏡面狀,又最好冷卻到-20〜4〇°C(特佳爲-10〜10°C)。旋轉速 •度可自由設定,通常爲15〜lOOrpm左右,周速較佳爲 20〜30000m/min 〇 樹脂薄膜形成裝置512係將形成樹脂薄膜之樹脂材料 蒸發氣化或霧化,朝向容器輥511之表面放出。樹脂材料 係附著於容器輥511之外周面形成樹脂薄膜。依據此方法 ,可得到厚度極薄且均一之沒有針孔等缺點的良好樹脂薄 膜。作爲樹脂材料,只要能以上述方式蒸發氣化或霧化後 堆積形成薄膜者即可,並無特別限定,可依據所得之積層 63 尺度適用中國國家標準(CNS)A4規格(210 X 297公璧) (請先閱讀背面之注意事項再填寫本頁)Next, configurations other than the above in the manufacturing apparatus of FIG. 15 will be described. The inside of the vacuum tank 515 is maintained at a predetermined vacuum degree by the vacuum pump 16. The preferred vacuum degree in the vacuum tank 515 is about 0.027Pa (2Xl0_4Tοιτ). In addition, it is desirable to maintain the space containing the metal thin film forming device 514 separated by the partition wall 520 to be slightly lower than other spaces. This prevents the metal vapor flow or metal particle flow from the metal thin film forming device 514 from inadvertently leaking into a space other than the space containing the metal thin film forming device 514. The outer peripheral surface of the .V container roller 511 is processed into a smooth shape, preferably a mirror shape, and is preferably cooled to -20 to 40 ° C (particularly -10 to 10 ° C). The rotation speed and degree can be freely set, usually about 15 to 100 rpm, and the peripheral speed is preferably 20 to 30,000 m / min. The resin film forming device 512 is a device for vaporizing or atomizing the resin material forming the resin film, and faces the container roller 511 The surface is released. The resin material is adhered to the outer peripheral surface of the container roll 511 to form a resin film. According to this method, an extremely thin and uniform resin film having no disadvantages such as pinholes can be obtained. As the resin material, there is no particular limitation as long as it can be formed into a thin film by evaporation, vaporization, or atomization in the manner described above, and it is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 cm) according to the 63 layers of the obtained laminate. ) (Please read the notes on the back before filling this page)
-· -I H ϋ n ϋ n n n 1 n n n ϋ 1 I I ϋ n n ϋ n ! ϋ ϋ n n n n ϋ n n n ϋ n 1· I I 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(石>) 體的用途來適宜選擇,而以反應性單體樹脂爲佳。例如, 使用在電子零件材料用途之情形下,以丙烯酸酯樹脂或是 乙烯基樹脂爲主成分者爲佳,具體上以多官能(甲基)丙烯 酸酯單體、多官能乙烯基酯單體爲佳,其中,環戊二烯二 甲醇二丙烯筆酯、環己烷二甲醇二乙烯基醚單體等或是將 該等取代烴基所成之單體,從電氣特性、耐熱性、安定性 等之觀點來看乃爲所希望者。作爲讓樹脂材料飛散之手段 ,可使用加熱器等之加熱手段、由超吾波或噴霧器所進行 之氣化或霧化的方法。尤其,基於所形成之樹脂薄膜的厚 度及其均一性、防止缺點發生、裝置之簡單化的觀點,藉 由加熱器等之加熱手段使樹脂材料蒸發氣化之方法乃爲所 希望的。 堆積的樹脂材料可依必要性藉由樹脂硬化裝置518進 行硬化處理以達到所需之硬化度。在硬化處理方面,可舉 出讓樹脂材料聚合以及/或是交聯的處理。作爲樹脂硬化裝 置’可使用例如電子束照射裝置、紫外線照射裝置、或是 熱硬化裝置等。硬化處理之程度可依據製造之積層體的特 性而適宜變更,例如製造電容器等之電子零件用之積層體 ,:.則進行硬化處理使得硬化度到達50〜95%爲佳、又以 50〜75%爲更佳。若硬化度低於上述範圍,一旦於後續製程 中施加外力等則容易發生變形,產生金屬薄膜之破裂或短 路等。另一方面,若硬化度超過上述範圍,一旦於後續製 程中施加外力等,有時會出現龜裂等之情形。又,本發明 之硬化度之定義,係以紅外線分光光度計求出〇〇基之吸 64 本^張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) " --- (請先閱讀背面之注意事項再填寫本頁) -n n n an ϋ n n 一:0*· I n n ϋ n ϋ ϋ ϋ I h ϋ n n ϋ n ϋ I I ϋ ϋ n ϋ n 505933 A7 B7 五、發明說明(e) 光度與C=C基(MOOOcnT1)之比,來求出各個單體與硬化物 之比値,以1減掉減少量吸光度所得者。 於本發明中,樹脂薄膜之厚度並無特別之限制,以1 /zm以下爲佳,較佳爲〇.7//m以下、更佳爲0.4/zm以下 。爲了符合以本發明之方法所得之積層體之小型化•高性 能化的要求,樹脂薄膜之厚度以薄者爲佳。例如,將藉由 本發明之製造方法所得之積層體使用於電容器之情形,成 爲電介質層之樹脂薄膜愈薄則電容器之靜電容量愈大。 所形成之樹脂薄膜,可依必要性藉由表面處理裝置 519進行表面處理。例如,在氧環境氣氛下進行放電處理 或紫外線照射處理等,可使得樹脂薄膜表面活性化來提昇 與金屬薄膜之接著性。 於如此所形成之樹脂薄膜上,藉由上述方法形成金屬 薄膜。之後,在積層樹脂薄膜之前,去除殘存之圖案化材 料乃爲所希望的。殘存之圖案化材料會發生積層表面之粗 糙、樹脂薄膜與金屬薄膜之針孔(積層鬆動)、金屬薄膜之 形成交界部分之不安定化等之問題。圖案化材料之去除係 藉由圖案化材料去除裝置517來進行。作爲圖案化材料之 去,.除手段並無特別之限定,只要依據圖案化材料之種類來 適宜選擇即可,例如能以加熱以及/或是分解來去除。作爲 加熱去除的方法,可舉出例如藉光照射或電熱加熱器之方 法,其中以光照射之方法在裝置上簡單、且去除性能高。 又,此處所說的光,係包含遠紅外線與紅外線。另一方面 ,作爲分解去除的方法,可使用等離子體照射、離子照射 65 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 I « I n n n _1 n n 一 δτ I n I n BB1 I* ϋ ϋ I n ϋ ϋ in n 1— n· n n ϋ ^1· n n HI ϋ ϋ -^1 n n 505933 A7 B7 五、發明說明(妗) 、電子照射等。此時,等離子體照射,可使用氧等離子體 、氬等離子體、氮等離子體等,其中又以氧等離子體爲佳 〇 圖案化材料去除裝置517與雷射光照射裝置530之配 置可如圖15般將圖案化材料去除裝置517配置於上游側, 也可將雷射光照射裝置530配置在上游側。 依據以上裝置,在開口 521成開放之狀態下,於進行 旋轉之容器輥511的外周面上會交互積層出由樹脂薄膜形 成裝置512所形成之樹脂薄膜與由金屬薄膜形成裝置514 所形成之金屬薄膜,製造出積層體,又,當開口 521成關 .閉之狀態下,於進行旋轉之容器輥511的外周面上,由樹 脂薄膜形成裝置512所形成之樹脂薄膜會連續地積層,而 製造出積層體。 其次,針對使用上述裝置得到圖16A〜圖Γ6Ε所示之 積層體母元件600之後,製造圖17所示之晶片電容器610 之方法來說明(圖16A〜圖16D、圖17的詳細內容將容後說 明)。 一邊旋轉容器輥511、一邊於容器輥511上連續地依 序積層出層604a、層603a、層602、層603b、層604b。 最初係積層出層604a。層604a係僅連續積層樹脂薄 膜所得之層(保護層)。保護層604a雖無法提供作爲電容器 之容量,但在防止容量產生部分之層(元件層)6〇2因熱負荷 或外力所受損傷方面係有效地作用著。 當積層了保護層604a的情況,乃以遮蔽板523來遮蔽 66 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -- I I I I I I I «ΙΙΙΙΙΙΙ — — — Ι1ΙΙΙΙΙ1ΙΙΙΙΙΙΙΙΙΙ1Ι. 505933 A7 B7 五、發明說明(w) 開口 521,在此狀態下旋轉容器輥5u,讓樹脂薄膜連續積 層出既定數量。 其次,積層出層603a。層603a係樹脂薄膜與金屬薄 膜交互積層所得之層(補強層)。補強層603a在防止容量產 生部分之層C元件層)602因熱負荷或外力所受損傷方面係有 效地作用著。又,由於存在著與外部電極連接之金屬薄膜 ,也可對外部電極之附著強度的提昇做出貢獻。 在補強層6〇3a的積層中,係自崮案化材料賦予裝置 513對樹脂薄膜表面賦予帶狀的圖案化材料。又,移動遮 蔽板523開放開口 521,進行金屬薄膜之積層。此時金屬 薄膜係由賦予成帶狀之圖案化材料之第1非金屬帶來分割 成帶狀所形成者。其次,一邊自雷射光照射裝置530掃描 雷射光一邊照射來形成第2非金屬帶。此诗,雷射光之掃 描方向相對於第1非金屬帶係以大致直角方.向來掃描。在 此狀態下1讓容器輥511旋轉既定次數,藉以形成分割成 大致矩形狀之金屬薄膜與樹脂薄膜之交互積層所得之層 603a 〇 其次,積層出層602。層602係樹脂薄膜與金屬薄膜 $互積層之作爲電容器的容量產生部分之層(元件層)。 在元件層602之積層中,每當容器輥511旋轉1次, 即讓圖案化材料賦予裝置513在容器輥511之旋轉軸方向 往返移動既定寬度。如此,可形成第1非金屬帶之位置隨 每一鄰接之層而不同之金屬薄膜。藉雷射光照射裝置530 形成第2非金屬帶之方面與上述補強層603a之積層係同樣 67 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) .· 經濟部智慧財產局員工消費合作社印製 一:°JI n 1 I n n ϋ ϋ I ϋ n ϋ 1 n n ϋ ϋ n ϋ n I n ϋ ϋ ϋ ϋ ϋ n ϋ n ' 505933 A7 B7 五、發明說明(Μ ) 的。 其次,進行補強層603b之積層。將圖案化材料賦予 裝置513固定在與補強層603a積層時相同的位置,以相同 於補強層603a之積層時之積層條件來進行既定層數之積層 。 Λ 最後,進行保護層6〇4之積層。此時’移動遮蔽板 523來遮蔽開口 521。又,停止圖案化材料之賦予以及雷射 光之照射。在此狀態下旋轉容器輥5Ϊ1,僅連續積層既定 數目之樹脂薄膜。 於上述中,照射雷射光形成第2非金屬帶之情形中, 讓雷射光之掃描與容器輥511之旋轉同步,藉以使得第2 非金屬帶之積層方向的位置在積層體全體大致一致乃特別 所希望的。藉由此種構成,沿著第2非金屬帶將積層體自 積層方向切斷,將不致切斷金屬薄膜,又金屬薄膜不會露 出於切斷面。 藉此,可得到於容器輥511之外周面上由樹脂薄膜與 •分割成大致矩形狀之金屬薄膜所構成之圓筒狀之多層積層 體。接著,將積層體往半徑方向切斷進行分割,自容器輥 511取出。此時之切斷係在第2非金屬帶進行。由於該部 / 分未存在金屬薄膜,切斷乃容易進行,也不會發生金屬薄 膜之毛邊與切屑。又,於切斷面也沒有露出金屬薄膜。 將分割取出之積層體進行平板加壓,得到例如圖16Α〜 圖16D所示之積層體母元件600。圖16Α爲自切斷面方向 來看積層體母元件之前視圖,圖16Β係俯視圖,圖16C係 68 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 —··!!訂------!線-·---------------------- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(Μ) 在圖16Α之I 一 I線自箭頭方向所見之截面圖,圖16D係 在圖16Α之Π — Π線自箭頭方向所見之截面圖。於圖 16Α〜圖16D中,箭頭601係一致於容器輥511之外周面之 行進方向。又,605係分割上述圓筒狀之積層體之際的切 斷面,606谭金屬薄膜,6〇7係樹脂薄膜,608a係第1非 金屬帶,608b係第2非金屬帶。圖16A〜圖16D係以容易 理解的方式來示意地顯示積層狀態,實際之積層數則遠多 於此。又,金屬薄膜606與樹脂薄膜607之厚度、第1,第 2非金屬帶608a,608b之寬度等係描繪成較實際之物誇張甚 多。 於圖16A中,在積層體母元件600之下面係容器輥 511側,由下開始依序積層保護層604a、補強層603a、元 件層602、補強層603b、保護層604b。如上所示,層 6(Ma,6〇4b係開口 Ml關閉時僅連續地積層樹脂薄膜所得之 層,層602與層603a,603b係開口 521打開時交互地積層 金屬薄膜與樹脂薄膜所得之層。又,層602係與容器輥 911之旋轉同步,每當容器輥911旋轉一次時乃變更第1 非金屬帶608a之位置來積層。 經濟部智慧財產局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) .由圖16A〜圖16D可明顯地看出,就本實施形態之積 層體母元件而言,在切斷面605並未露出金屬薄膜606。 是以,到下一製程之前,金屬薄膜606不會在切斷面605 .發生氧化或生鏽等之腐蝕。 _ 將上述所得之積層體母元件600自切斷面609a切斷。 切斷面609a係通過第1非金屬帶608a之大致中央部。接 69 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(β) 著,藉噴鍍等於切斷面609a形成外部電極。 -------------· (請先閱讀背面之注意事項再填寫本頁) 在相當於切斷面609b之位置進行切斷。切斷面609b 係通過第2非金屬帶608b之大致中央部。由於在切斷面 609b不存在金屬薄膜,切斷乃變得容易,也不會發生金屬 薄膜之毛邊寧切屑。又,於切斷面也不會露出金屬薄膜。 從而,到下一製程之前,金屬薄膜606不會在切斷面609b 發生氧化或生鏽等之腐蝕。 之後,依所需情形進行包裝塗佈Μ得到多數之圖17所 示之晶片電容器610。於圖17中,611a,611b係與金屬薄 膜606做電氣連接而形成之外部電極。 如圖17所示,本實施形態所得之晶片電容器610之 未形成外部電極611a,611b的對向側面(上述之切斷面 609b)並無金屬薄膜606之露出。從而,即使未於切斷面 609b形成特別的絕緣層等,仍可對外部電極6fla,611b進 行焊接直接於電路基板進行面組裝。從而,組裝製程可簡 略化,對於電路基板全體之小型化也有貢獻# •(實施形態C一2) 經濟部智慧財產局員工消費合作社印製 圖18所示係實施與本發明之實施形態C—2相關之積 層.體之製造方法所用之製造裝置之一例的槪略截面圖。於 圖18中,與圖8爲同一構成要素之部分係賦予同一符號而 省略其說明。 圖18之積層體之製造裝置500’與實施形態/一丨所說 明之圖15的製造裝置500相異之處在於,取代圖15的製 造裝置500之圖案化材料賦予裝置513改用圖案北材料賦 70 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(θ) 予裝置54〇,且去除圖15的製造裝置500之雷射光照射裝 置 530。 本實施形態之圖案化材料賦予裝置540,係讓液體狀 態之圖案化材料以液滴的型態自微細孔噴射,此與讓圖案 .化材料氣化p自微細孔噴射之實施形態C—1之圖案化材料 賦予裝置513不同。 圖19係圖案化材料賦予裝置540之自容器輥511側 所見之前視圖。圖案化材料賦予裝置540 .係設置成在箭頭 601之方向與容器輥511之外周面的行進方向呈一致。於 圖案化材料賦予裝置540之正面,噴嘴頭541係配置成與 箭頭001呈直角。 圖20係自正面來看圖19之圖案化材料賦予裝置之噴 嘴頭的部分放大圖。圖中,箭頭602係與圖19之箭頭601 之方向一致。於噴嘴頭541之表面係設有微細扎542。在 圖20的例子當中,以三個微細孔542爲一組,其與箭頭 602呈接近45°之角度並以既定間隔來配置,而此微細孔 •組係在噴嘴頭內以既定間隔配置著既定數量。再者,該等 之微細孔542係配置成:對垂直於箭頭602之面進行投影 來看會成爲等間隔。 f 圖21係在圖20之瓜一瓜線之自箭頭方向所見之微細 孔542的部分截面圖。 底板543之相當於微細孔542之位置的部分係加工成 圓筒548,於該圓筒548中依序插入壓電元件544與活塞 頭545。於底板543之前面配置著銳孔板(orifice .plate)546 71 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 297公釐) (請先閱讀背面之注意事項再填寫本頁)-· -IH ϋ n ϋ nnn 1 nnn ϋ 1 II ϋ nn ϋ n! Ϋ ϋ nnnn ϋ nnn ϋ n 1 · II Printed by the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economic Affairs 505933 A7 B7 V. Description of the Invention (Stone >) The use of the polymer is appropriately selected, and a reactive monomer resin is preferred. For example, in the case of electronic component materials, it is better to use acrylate resin or vinyl resin as the main component. Specifically, polyfunctional (meth) acrylate monomers and polyfunctional vinyl ester monomers are used. Among them, cyclopentadiene dimethanol dipropenyl ester, cyclohexane dimethanol divinyl ether monomer, or the monomer formed by replacing these hydrocarbon groups, from electrical characteristics, heat resistance, stability, etc. From the point of view, it is the hope. As a means for scattering the resin material, a heating means such as a heater, a method of vaporization or atomization by a super wave or a sprayer can be used. In particular, from the viewpoints of the thickness and uniformity of the formed resin film, prevention of defects, and simplification of the device, a method of evaporating and vaporizing the resin material by heating means such as a heater is desirable. The accumulated resin material may be hardened by a resin hardening device 518 as necessary to achieve a desired degree of hardening. As for the hardening treatment, a treatment for polymerizing and / or crosslinking the resin material may be mentioned. As the resin curing device ', for example, an electron beam irradiation device, an ultraviolet irradiation device, or a thermosetting device can be used. The degree of hardening treatment can be appropriately changed according to the characteristics of the laminated body to be manufactured. For example, the laminated body used for the manufacture of electronic parts such as capacitors, etc .: The hardening treatment is preferably performed so that the degree of hardening reaches 50 to 95%. % Is better. If the degree of hardening is lower than the above range, once external force is applied in the subsequent process, it is easy to deform, and cracks or short circuits of the metal film may occur. On the other hand, if the degree of hardening exceeds the above range, cracks and the like may occur when an external force is applied in a subsequent process. In addition, the definition of the degree of hardening in the present invention is based on the infrared spectrophotometer to obtain the absorption of 64 bases. This standard is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) " --- ( Please read the notes on the back before filling this page) -nnn an ϋ nn 1: 0 * · I nn ϋ n ϋ ϋ ϋ I h ϋ nn ϋ n ϋ II ϋ ϋ n ϋ n 505933 A7 B7 V. Description of the invention ( e) The ratio of luminosity to C = C group (MOOOcnT1), to obtain the ratio 各个 of each monomer to the hardened material, and subtract 1 to decrease the absorbance. In the present invention, the thickness of the resin film is not particularly limited, and is preferably 1 / zm or less, more preferably 0.7 / m or less, and more preferably 0.4 / zm or less. In order to meet the requirements of miniaturization and high performance of the laminated body obtained by the method of the present invention, the thickness of the resin film is preferably thin. For example, when the laminated body obtained by the manufacturing method of the present invention is used for a capacitor, the thinner the resin film that becomes the dielectric layer, the larger the capacitance of the capacitor. The formed resin film can be subjected to surface treatment by a surface treatment device 519 as necessary. For example, discharge treatment or ultraviolet irradiation treatment in an oxygen atmosphere can activate the surface of a resin film to improve adhesion to a metal film. On the resin film thus formed, a metal film is formed by the above-mentioned method. After that, it is desirable to remove the remaining patterned material before laminating the resin film. Residual patterned materials may cause problems such as rough surface of the laminated layer, pinholes of the resin film and metal film (laminated layer is loose), and instability of the boundary portion of the metal film. The patterning material is removed by a patterning material removing device 517. As the patterning material, there is no particular limitation on the removal method, as long as it is appropriately selected according to the type of the patterning material, and it can be removed by heating and / or decomposition, for example. Examples of the method of heating removal include a method of irradiating with light or an electric heater. The method of irradiating with light is simple on a device and has high removal performance. The light referred to here includes far infrared rays and infrared rays. On the other hand, as a method of decomposition and removal, plasma irradiation and ion irradiation can be used. This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm). (Please read the precautions on the back before filling this page. ) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs I «I nnn _1 nn a δτ I n I n BB1 I * ϋ ϋ I n ϋ ϋ in n 1— n · nn ϋ ^ 1 · nn HI ϋ ϋ-^ 1 nn 505933 A7 B7 V. Description of invention (妗), electron irradiation, etc. At this time, the plasma irradiation may use oxygen plasma, argon plasma, nitrogen plasma, etc. Among them, oxygen plasma is preferred. The configuration of the patterned material removing device 517 and the laser light irradiation device 530 may be as shown in FIG. 15. The patterning material removing device 517 is disposed on the upstream side, and the laser light irradiation device 530 may be disposed on the upstream side. According to the above device, when the opening 521 is opened, the resin film formed by the resin film forming device 512 and the metal formed by the metal film forming device 514 are alternately laminated on the outer peripheral surface of the rotating container roller 511. Laminated film is manufactured, and when the opening 521 is closed and closed, the resin film formed by the resin film forming device 512 is continuously laminated on the outer peripheral surface of the rotating container roller 511 to produce Out of the laminated body. Next, the method for manufacturing the chip capacitor 610 shown in FIG. 17 after obtaining the multilayer body mother component 600 shown in FIGS. 16A to Γ6E using the above device will be described (the details of FIGS. 16A to 16D and FIG. 17 will be described later) Description). While rotating the container roll 511, the layer 604a, the layer 603a, the layer 602, the layer 603b, and the layer 604b are successively laminated on the container roll 511 in this order. The layer 604a is initially layered. The layer 604a is a layer (protective layer) obtained by continuously laminating only a resin film. Although the protective layer 604a cannot provide the capacity as a capacitor, it effectively functions to prevent damage to the layer (element layer) 602 due to the heat load or external force. When the protective layer 604a is laminated, the shielding sheet 523 is used to cover 66 sheets of paper. The Chinese standard (CNS) A4 specification (21 × 297 mm) is applicable. (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-IIIIIII «ΙΙΙΙΙΙΙΙ — — — ΙΙΙΙΙΙΙΙΙΙΙΙΙΙΙΙΙΙΙΙ1Ι. 505933 A7 B7 V. Description of the invention (w) The opening 521, in this state, rotates the container roller 5u to allow the resin film to continuously build up a predetermined number . Next, a layer 603a is laminated. The layer 603a is a layer (reinforcing layer) obtained by laminating a resin film and a metal film alternately. The reinforcing layer 603a functions effectively to prevent damage to the layer C element layer) 602 due to heat load or external force. In addition, the presence of a metal thin film connected to the external electrode can also contribute to the improvement of the adhesion strength of the external electrode. In the build-up of the reinforcing layer 603a, a self-patterning material applying device 513 applies a band-shaped patterning material to the surface of the resin film. Further, the moving shield plate 523 opens the opening 521, and a metal thin film is laminated. In this case, the metal thin film is formed by dividing a first non-metallic belt provided with a patterned material in a band shape into a band shape. Next, the laser beam is irradiated while scanning the laser beam from the laser beam irradiation device 530 to form a second non-metallic band. In this poem, the scanning direction of the laser light is scanned at a substantially right angle with respect to the first non-metallic belt system. In this state, 1 the container roller 511 is rotated a predetermined number of times to form a layer 603a obtained by dividing and laminating an approximately rectangular metal film and a resin film. Next, a layer 602 is laminated. The layer 602 is a layer (element layer) of a capacitor film generating part of a resin film and a metal film. In the stack of the element layer 602, each time the container roller 511 rotates, the patterning material applying device 513 is caused to reciprocate a predetermined width in the direction of the rotation axis of the container roller 511. In this way, it is possible to form a metal thin film in which the position of the first non-metallic belt is different for each adjacent layer. The formation of the second non-metallic band by the laser light irradiation device 530 is the same as that of the above-mentioned reinforcing layer 603a. 67 This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the note on the back first) Please fill in this page for further information). · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs: ° JI n 1 I nn ϋ ϋ I ϋ n ϋ 1 nn ϋ ϋ n ϋ n I n ϋ ϋ ϋ ϋ ϋ n ϋ n ' 505933 A7 B7 5. Description of the invention (M). Next, the reinforcement layer 603b is laminated. The patterning material applying device 513 is fixed at the same position as when the reinforcing layer 603a is laminated, and laminated with a predetermined number of layers under the same conditions as those used when the reinforcing layer 603a is laminated. Λ Finally, a protective layer 604 is laminated. At this time ', the shielding plate 523 is moved to cover the opening 521. The application of the patterning material and the irradiation of the laser light are stopped. In this state, the container roller 5Ϊ1 is rotated to continuously laminate only a predetermined number of resin films. In the above, in the case where the laser beam is irradiated to form the second non-metallic belt, the scanning of the laser light is synchronized with the rotation of the container roller 511, so that the position of the second non-metallic belt in the lamination direction is substantially uniform throughout the laminated body. As expected. With this configuration, the laminated body is cut along the second non-metallic tape from the laminated direction, so that the metal thin film is not cut, and the metal thin film is not exposed on the cut surface. As a result, a cylindrical multilayer body composed of a resin film and a metal film divided into a substantially rectangular shape on the outer peripheral surface of the container roll 511 can be obtained. Next, the laminated body is cut in a radial direction to be divided, and taken out from the container roll 511. The cutting at this time is performed on the second non-metallic belt. Since there is no metal film in this part, cutting is easy, and no burrs or chipping of the metal film occurs. Also, no metal thin film was exposed on the cut surface. The laminated body taken out is divided into a flat plate and pressed to obtain, for example, a laminated body mother element 600 shown in FIGS. 16A to 16D. Figure 16A is a front view of the multilayer mother component viewed from the direction of the cut surface, Figure 16B is a top view, and Figure 16C is 68 (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs— · !!!! Order ------! Line-· ---------------------- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 V. Invention Explanation (M) is a cross-sectional view seen from the direction of the arrow along the line I-I in FIG. 16A, and FIG. 16D is a cross-sectional view seen from the direction of the arrow along line Π-Π of FIG. 16A. In FIGS. 16A to 16D, the arrow 601 corresponds to the traveling direction of the outer peripheral surface of the container roller 511. Further, 605 is a cut surface when the cylindrical laminated body is divided, 606 Tan metal film, 607 resin film, 608a is a first non-metallic belt, and 608b is a second non-metallic belt. Figs. 16A to 16D show the laminated states in an easy-to-understand manner, and the actual number of laminated layers is much more than that. In addition, the thicknesses of the metal thin film 606 and the resin thin film 607, and the widths of the first and second non-metallic strips 608a, 608b are drawn more exaggerated than the actual thing. In FIG. 16A, the protective roller 511 is positioned below the laminated body mother element 600, and the protective layer 604a, the reinforcing layer 603a, the element layer 602, the reinforcing layer 603b, and the protective layer 604b are sequentially laminated from the bottom. As shown above, layer 6 (Ma, 604b is the layer obtained by continuously laminating the resin film only when the opening M1 is closed, and layer 602 and layer 603a, 603b is the layer obtained by alternately laminating the metal film and the resin film when the opening 521 is open. In addition, the layer 602 is synchronized with the rotation of the container roller 911. When the container roller 911 rotates once, the position of the first non-metallic belt 608a is changed and laminated. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (please read the back first) (Notes for filling in this page, please fill in this page again). As can be clearly seen from FIG. 16A to FIG. 16D, in the multilayer mother component of this embodiment, the metal film 606 is not exposed on the cut surface 605. Before the first process, the metal thin film 606 will not be corroded on the cutting surface 605. Oxidation or rusting will occur. _ The multilayer body mother component 600 obtained above is cut from the cutting surface 609a. The cutting surface 609a passes through the first The approximate center of the non-metallic strip 608a. The 69 paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 505933 A7 B7 V. Description of the invention (β) By spraying, it is equal to the cut surface 609a Form external electrodes. ----------- --- (Please read the precautions on the back before filling in this page) Cut at a position corresponding to the cut surface 609b. The cut surface 609b passes through the approximately central portion of the second non-metal strip 608b. There is no metal thin film on the surface 609b, and cutting is easy, and no burr chipping of the metal thin film will occur. Also, the metal thin film will not be exposed on the cut surface. Therefore, the metal thin film 606 does not exist until the next process. Corrosion, such as oxidation or rust, may occur on the cut surface 609b. After that, packaging and coating are performed as needed to obtain most of the chip capacitors 610 shown in FIG. 17. In FIG. 17, 611a and 611b are connected to the metal film. 606 is an external electrode formed by electrical connection. As shown in FIG. 17, the opposite side of the chip capacitor 610 obtained in this embodiment without the external electrodes 611a, 611b (the cut surface 609b described above) has no metal thin film 606. Therefore, even if a special insulating layer is not formed on the cutting surface 609b, the external electrodes 6fla and 611b can be directly soldered to the circuit substrate for surface assembly. Therefore, the assembly process can be simplified and the circuit can be simplified. The miniaturization of the entire board also contributes # • (Implementation Form C-2) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, as shown in FIG. 18, is used to implement the layers related to Embodiment C-2 of the present invention. A schematic cross-sectional view of an example of a manufacturing apparatus. In FIG. 18, parts that are the same as those in FIG. 8 are given the same reference numerals and descriptions thereof are omitted. The manufacturing apparatus 500 'of the laminated body in FIG. The illustrated manufacturing device 500 of FIG. 15 is different in that the patterned material imparting device 513 which replaces the manufacturing device 500 of FIG. 15 is replaced with a patterned northern material and 70. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 Public love) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 505933 A7 B7 V. Description of the invention (θ) to the device 54 and the laser light irradiation device 530 of the manufacturing device 500 in FIG. 15 is removed. The patterning material imparting device 540 of this embodiment is a mode C-1 in which a liquid-state patterning material is ejected from a fine hole in the form of a droplet. The patterning material imparting device 513 is different. Fig. 19 is a front view of the patterning material applying device 540 as seen from the container roller 511 side. The patterning material applying device 540 is arranged so that the direction of the arrow 601 coincides with the traveling direction of the outer peripheral surface of the container roller 511. On the front side of the patterning material applying device 540, the nozzle head 541 is disposed at a right angle to the arrow 001. Fig. 20 is an enlarged view of a part of the nozzle head of the patterning material applying device of Fig. 19 when viewed from the front. In the figure, the arrow 602 corresponds to the direction of the arrow 601 in FIG. 19. A fine tie 542 is provided on the surface of the nozzle head 541. In the example of FIG. 20, three micro holes 542 are set as a group, which are arranged at a predetermined interval at an angle of approximately 45 ° with the arrow 602. The micro holes are arranged at a predetermined interval in the nozzle head. Established quantity. In addition, these fine holes 542 are arranged so that the projections on the surface perpendicular to the arrow 602 will be equally spaced. f FIG. 21 is a partial cross-sectional view of the fine holes 542 seen from the direction of the arrow on the melons-melons line in FIG. 20. The portion of the bottom plate 543 corresponding to the position of the minute hole 542 is processed into a cylinder 548, and the piezoelectric element 544 and the piston head 545 are sequentially inserted into the cylinder 548. An orifice plate 546 71 is arranged in front of the bottom plate 543. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 χ 297 mm) (Please read the precautions on the back before filling this page)
Φ--------訂-I 線丨· 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 ___ 五、發明說明(V) ,兩者之間係塡充著液體狀態之圖案化材料547。微細孔 542之直徑可適宜設計成例如70// m左右。 來自微細孔542之液體狀態的圖案化材料之噴射係採 以下的方式來進行。藉由壓電元件544之壓電效果,讓壓 電元件544A'取縮使得活塞頭545往圖中左邊方向後退。藉 此,活塞頭545之前面會成爲負壓,圖案化材料547會被 吸入底板之圓筒548內。之後,令壓電元件回到原來的狀 態,積存於圓筒548之圖案化材料便|通過微細孔542放 出。在本方式中,圖案化材料係以液滴的方式來不連續放 出。從而,經由一次的放出,圖案化材料會在被附著面(樹 脂薄膜表面)以一小點來附著。藉由調整一次之圖案化材料 之放出量(液滴大小)以及間隔,圖案化材料能以連續之液 膜來附著之。 依據上述圖案化材料賦予裝置540 ,可輕易地獨立控 制多數之微細孔。從而,不僅可如實施形態C一 1之圖案化 材料賦予裝置513般賦予帶狀之圖案化材料,且可賦予棋 盤狀(格子狀)之圖案化材料。 從而,在本實施形態,利用圖案化材料賦予裝置540 ,:,·可在容器輥511之外周面的行進方向賦予帶狀之圖案化 材料,且在相對之直角方向以既定間隔賦予帶狀之圖案化 材料。之後,只要藉由金屬薄膜形成裝置514形成金屬薄 膜’被賦予成棋盤狀之圖案化材料部分即成爲非金屬帶, 金屬薄膜被分割成大致矩形狀。於是,在本實施形態乃無 須實施形態C一 1之雷射光照射裝置530。 72 本^張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) " (請先閱讀背面之注意事項再填寫本頁) ·· 一一δ,I n HI ϋ 1 n n 11 I I HI n 1 n m n n I n in I n ϋ— n in n m m II n m . 505933 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(V ) 此時,與實施形態C一 1相同地,讓與容器輥511之 外周面的行進方向呈大致直角方向所賦予成帶狀之圖案化 材料’其附著位置隨著容器輥511之旋轉而同步移動,使 得第2非金屬帶之積層方向的位置橫跨積層體之全體皆維 持大致一致办爲所希望的。 又’依據圖案化材料賦予裝置540,也可如實施形態 C一 1之元件層602之積層時同樣,即使不讓圖案化材料賦 予裝置540在容器輥511之旋轉軸方1向往返移動,也可變 更吐出圖案化材料之微細孔,來變更第1非金屬帶之位置 〇 再者’相較於放出已氣化之圖案化材料而在被附著面 液化之實施形態C一 1,所放出之圖案化材料的方向性較敏 銳,可如預期般正確地來輕易地附著圖案化材料。再者, 由於可調大微細孔與被附著面之間的距離(例如左 右),裝置之設計的自由度乃提昇。 於本貫施形態較佳之圖案化材料,雖可考量使用環境 下之黏度等來適宜選擇,惟基本上可直接使用實施形態 C一1所§兌明過之圖案化材料。 在本實施形態也如實施形態C一1般,可製造出圖17 所示之晶片電容器。 第1與第2非金屬帶之形成並不限於上述實施形態 C—^C—2之方法。例如,也可在形成連續之金屬薄膜後 ,藉由雷射光之照射來形成第1與第2非金屬帶。或者是 設置一圖案化材料賦予裝置,其具有狹縫狀之開口(係以與 73 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) -· n n n n ϋ n n^eJa n n 1· n ϋ ϋ ϋ I n n n n n n n ϋ ·ϋ ϋ ϋ ϋ n ϋ βϋ n ϋ ^1 -ϋ · 505933 A7 _B7__ 五、發明說明(P ) 容器輥之外周面的移動方向呈大致直角方向來作爲長邊方 向)以及開閉該狹縫狀開口之擋板(shutter);自該狹縫狀之 開口吐出氣化後之圖案化材料,使得第2非金屬帶形成用 之圖案化材料附著於樹脂薄膜之表面上。 在上述它實施形態B—1〜B — 7、C—1,C—2中,作爲 支撐體雖舉出圓筒形狀之容器輥等,惟本發明並不限定於 此。例如,也可爲周旋於2個或以上之輥之間的皮帶狀之 支撐體、或是旋轉之圓盤狀支撐體等。 又,在積層開始之前,若於支撐體面上賦予脫模劑, 於積層結束後取下積層體之作業變得容易,故爲所希望的 。作爲脫模劑,可使用例如氟系脫模劑(例如,商品名”代 服利”,大金工業(股份有限)製造)等。脫模劑之賦予方法, 除了噴霧法以外,尙可選擇濺鍍法或蒸鍍法等之對於脫模 劑材料與程序之條件而言爲適合者。 . 《實施例》 (貫施例Π — 1) 使用圖15所示之製造裝置來製造圖17所示之構成之 晶片電容器。 以真空泵516將真空槽515內抽到0.027Pa(2Xl0_ 4T〇rr),又將容器輥511之外周面冷卻到5°C。容器輥511 之直徑爲500mm、外周面之移動速度爲50m/分。 在進行積層之前,先於容器輥511之外周面噴塗氟系 脫模劑(大金工業(股份有限)製造”代服利”),之後以不織布 薄薄地延伸。 74 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) .· 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印製 505933 A7 — —___B7__ 五、發明說明(V ) 首先,積層出僅連續積層有樹脂薄膜之保護層604a。 作爲保護層604a之材料,係使用二環戊二烯二甲醇二丙烯 酸酯,使其氣化藉樹脂薄膜形成裝置512堆積於容器輥 511之外周面上。每1層之積層厚度爲0.6//m。接著使用 紫外線硬化攀置作爲樹脂硬化裝置518,將上述所堆積之 樹脂薄膜材料加以聚合,使其硬化成爲硬化度70%。此操 作係藉由旋轉容器輥511來反覆進行,而於容器輥511之 外周面形成厚度15# m之保護層604a。這期間,開口 521 係以遮蔽板523所遮蔽。 其次,積層出由樹脂薄膜與金屬薄膜所交互積層之補 強層603a之部分。補強層603a之樹脂薄膜材料係使用與 上述之保護層604a之材料爲相同者。每一層樹脂薄膜之積 層厚度爲〇.6#m。接著藉由樹脂硬化裝置‘ 518,使樹脂薄 膜硬化而硬化度成爲70%。之後,藉由表面處理裝置519 對表面進行氧等離子體處理。接著,藉圖案化材料賦予裝 置513讓氣化之圖案化材料自微細孔噴出,呈帶狀地附著 於樹脂薄膜表面上。作爲圖案化材料,係使用氟系油劑。 使得此圖案化材料之蒸氣壓成爲O.ltoir之溫度爲100°C。 油:劑之平均分子量爲1500。帶狀之圖案化材料之附著寬度 爲150//m。其次,移動遮蔽板523開放開口 521。接著, 自金屬薄膜形成裝置514進行鋁之金屬蒸鑛。積層厚度爲 300埃。之後,以圖案化材料去除裝置517進行遠紅外線 之加熱與等離子體放電處理,去除殘存之圖案化材料。接 著’自雷射光照射裝置530照射雷射光來形成第.2非金屬 75 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 一5J n n ϋ I n .1 ϋ I ϋ ϋ n I I n -ϋ n n ϋ ϋ ί ·1 n n ϋ n 1 ϋ ϋ n - 505933 A7 B7 五、發明說明(7十) 帶。作爲雷射光,係使用輸出20W之YAG雷射。此時, 雷射光之掃描軌跡係以相對於圖案化材料賦予裝置513所 形成之第1金屬帶呈大致直角的方向來掃描。以上之操作 係藉由旋轉容器輥511約500次來形成總厚度315/zm之 層603a部分/ 之後,積層出作爲電容器之容量產生部分的元件層 6〇2部分。樹脂薄膜材料係使用與上述相同者,每一層之 積層厚度爲〇.4/zm。接著藉由樹脂硬化裝置518,使樹脂 薄膜硬化而硬化度成爲70%。之後,藉由表面處理裝置 519對表面進行氧等離子體處理。接著,藉圖案化材料賦 予裝置513讓相同於上述之圖案化材料與上述同一寬度呈 帶狀地附著之。接著,自金屬薄膜形成裝置514進行鋁之 金屬蒸鍍。積層厚度爲300埃。之後,以圖案化材料去除 裝置5Π去除殘存之圖案化材料。接著,自霄射光照射裝 置530照射雷射光來形成第2非金屬帶。此時,與補強層 6〇3a之積層時同樣,雷射光之掃描軌跡係以相對於圖案化 材料賦予裝置513所形成之第1金屬帶呈大致直角的方向 來掃描。以上之操作係藉由旋轉容器輥511約2000次來形 成/總厚度860 //m之層602部分。又,這期間圖案化材料 賦予裝置513係與容器輥511之旋轉同步,每當容器輥 511旋轉1次時乃往旋轉軸方向往返移動1000//m。 其次,停止圖案化材料賦予裝置513之移動,形成厚 度315//m之補強層603b部分。形成方法係與上述層603a 部分完全相同。 76 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------------# (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 訂---------線--------- 505933 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(γ) 最後,形成厚度15/zm之保護層604b部分。此時, 移動遮蔽板523來遮蔽開口 521。從604b部分之形成方法 係與上述層604a部分完全相同。 於上述過程中,補強層603a、603b、以及元件層602 部分之積層中,係讓雷射光照射裝置530之雷射光的掃描 與容器輥511之旋轉同步,以使得第2非金屬帶之積層方 向之位置在積層體全體上大致一致。 接著,將在容器輥511之外周面土所形成之圓筒狀積 層體沿著第2非金屬帶在周向上分割爲8而取下,於加熱 下進行加壓而得到圖16A〜圖16D所示之平板狀之積層體 母元件600。此時,於切斷面605完全沒有金屬薄膜之露 出。對其自切斷面609a切斷,然後對切斷面進行黃銅之金 屬噴鎪,形成外部電極。再者,對金屬噴鍍表面塗佈導電 性膠(於熱硬化性酚醛樹脂中分散著銅、鎳、.鈑之合金等) ,進行加熱硬化,進一步對樹脂表面鍍上熔融焊料。之後 ,自相當於切斷面609b之部分切斷。此時,於切斷面 •609b完全沒有露出金屬薄膜。之後,浸漬於矽烷偶合劑溶 液中將表面塗層,得到圖17所示之晶片電容器。 ,所得之晶片電容器在積層方向厚度爲約1.5mm、進深 爲1.6mm、寬(兩外部電極間方向)約3.2mm,雖爲小型之 物但容量達0.33 // F。耐電壓爲50V。又,在直流施加電壓 16V下之絕緣電阻値爲2Χ1012Ω,並未發現金屬薄膜彼此 間之短路、金屬薄膜之破裂等。 元件層602、補強層603a,603b、以及保護層 77 (請先閱讀背面之注意事項再填寫本頁) 0 訂--- n 1 n n I ί ϋ ϋ n ί I n n n I 1 n I i.— ϋ I n . 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(扑) 6〇4a,6(Mb之樹脂薄膜之硬化度分別爲95%、95%、90%。 元件層602與補強層603a,603b之金屬薄膜之厚度爲 300埃,膜電阻爲6Ω/Ε]。 又,將上述積層體母元件600之一部分分解,結果發 現元件層6%部分之金屬薄膜的第1與第2非金屬帶之寬 度依序爲150/zm、50/zm,補強層603a,603b部分之金屬 薄膜之第1與第2非金屬帶之寬度依序爲150/zm、50/zm 〇 (比較例Π —1) 除了未藉由雷射光照射裝置530進行雷射光之照射以 外,其餘與實施例Π —1同樣,得到圖10所示之晶片電容 器。 所得之晶片電容器在積層方向厚度爲約1.5mm、進深 爲1.6mm、寬(兩外部電極間方向)約3.2mm,#量爲0.35 //F。耐電壓爲50V。又,在直流施加電壓16V下之絕緣 電阻値爲5 X 1011 Q。 元件層602、補強層603a,603b、以及保護層 604a,604b之樹脂薄膜之硬化度分別爲95%、95%、90%。 元件層602與補強層603a,603b.之金屬薄膜之厚度爲 300埃,膜電阻爲6Ω/Ε]。 又,將上述積層體母元件600之一部分分解,結果發 現元件層部分之金屬薄膜的非金屬帶之寬度爲150//m,補 強層部分之金屬薄膜之非金屬帶之寬度爲150/zm。 實施例Π—1相較於比較例Π—1在絕緣電阻値優異, 78 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) # 經濟部智慧財產局員工消費合作社印製 一 -OT ( aaaa a··· <· ·ϋ I n ϋ n ί ^1 ϋ ϋ ϋ 經濟部智慧財產局員工消費合作社印製 505933 A7 B7 五、發明說明(ri) 一般認爲此乃由於在切斷面充分地形成了非金屬帶之故。 於本第π發明中,上述之實施例充其量不過爲〜例, 本發明並不限定於上述之實施例。例如,積層體之積層數 ,可依據積層體之用途或所需規格(例如使用在電容器 形,所需之零電容量等)來適宜決定,由上述實施例所記載 之1層厚度與全體厚度所求出之積層數不過爲〜例。Μ , 從形成之積層體的使用觀點來看,極薄之積層體容易 破裂等情事。依據本發明者所做的檢Ιί,一般只要 之厚度在100 z/m以上即幾乎不會發生裂痕等,惟2〇//2 左右以下則在使用上需特別留意。從而,若1層之樹^旨胃 膜與1層之金屬薄膜之合計厚度的上限爲l#m,則樹目旨胃 膜之積層數爲2〇層以上即爲有關積層體之積層數的實 下限値。樹脂薄膜之積層數在1〇〇層以上乃爲更佳。另_ 方面,積層體之上限値所受之限制因子較下限値爲少。其 中,在高密度組裝電路基板中,由於零件高度較半導體晶 片爲高,厚度1mm以上之電子零件變得較少,若1層之樹 脂薄膜與1層之金屬薄膜之合計厚度的下限爲%.1/zm,則 樹脂薄膜之積層數爲10000層以下即成爲有關積層體之積 層.數的上限値之標準。 f 以上所說明之實施形態,不過是爲了彰明本發明之技 術內容之物,本發明並不因爲這些具體例而在解釋上受到 限制,可在該發明之精神與申請專利範圍所記載之範圍內 做各種的變更,本發明應做廣義的解釋。 79 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) C請先閱讀背面之注音?事項再填寫本頁) -·--------訂---------線丨· 505933 A7 __B7 五、發明說明(7尤) 經濟部智慧財產局員工消費合作社印製 10 積層體 lla,llb 金屬薄膜 12 樹脂薄膜 13a,13b 貫通孔 14a,14b 導電性材料 15 V 電極端子 17 電路基板 19 電極端子 20 積層體 21a,21b 金屬薄膜 22 樹脂薄膜 23a,23b 貫通孔 24a,24b 導電性材料 30 電容器(電容器列) 31a,31b 金屬薄膜 33a,33b 貫通孔 35a,35b 取出電極 35, 電極端子 36 電容器要素 37 貫通電極 37, 電極端子 38 貫通孔 39 導電性材料 40 半導體集積電路 41 電路基板 42 電極端子 45 半導體晶片 46 載件 80 (請先閱讀背面之注意事項再填寫本頁) 訂i 線丨— 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(竹) 47 50 51a,51b 52 53a,53b 54a,54b 55 57 58 59 60 61a,61b 62 63a,63b 64a,64b 71a,71b 100 111 112 114 115 116 117 118 119 120 121 123 電極端子 積層體 金屬薄膜 樹脂薄膜 缺口部 導電性材料 電極端子 電路基板 導電性材料 電極端子 積層體 金屬薄膜 樹脂薄膜 缺口部 導電性材料 切斷面 積層體之製造裝置 容器輥 樹脂薄膜形成裝置 金屬薄膜形成裝置 真空槽 真空泵 圖案化材料去除裝置 樹脂硬化裝置 表面處理裝置 隔壁 開口 遮蔽板 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 ϋ n ·ϋ n ϋ n n 一-口、 n n n ϋ n n I I I n n n n HI n an n n n -- - - n ϊ n n ϋ 81 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(抑) 經濟部智慧財產局員工消費合作社印製 125 雷射加工裝置 127 等離子體照射裝置 130a,130b 圖案化材料賦予裝置 131 微細孔 132 對向面 133 % 模穴 134 儲存槽 135 連結路 137 圖案化材料· 138a,138b 圖案化材料之條紋圖案 140 雷射圖案化裝置 142 圖案化材料賦予裝置 211 支撐體 220 圖案化材料賦予裝置 222 微細孔 230 圖案化材料賦予裝置 232 微細孔 240 ' 樹脂薄膜形成裝置 241 樹脂薄膜材料 242 供給管 243a,243b 加熱板 244 盤 245a,245b,2 45c 遮蔽板 500,5005 積層體之製造裝置 511 容器輥 511a 容器輥之旋轉方向 512 樹脂薄膜形成裝置 82 (請先閱讀背面之注意事項再填寫本頁) · 訂i 線丨-- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933 A7 B7 五、發明說明(Η ) 經濟部智慧財產局員工消費合作社印製 513 圖案化材料賦予裝置 514 金屬薄_形成裝置(金屬材料供給源) 515 真空槽 516 真空泵 517 圖案化材料去除裝置 518 樹脂硬化裝置 519 表面處理裝置 520 隔壁 521 開口 ‘ 523 遮蔽板 . 523a 遮蔽板之移動方向 530 雷射光照射裝置 531 雷射光 540 圖案化材料賦予裝置 541 噴嘴頭 542 微細孔 · 543 底板 544 壓電元件 545 活塞頭 546 銳孔板 547 圖案化材料 548 圓筒 600 積層體母元件 601 容器輥之外周面之行進方向 602 元件層 603a,603b 補強層 604a,604b 保護層 605 切斷面 83 (請先閱讀背面之注意事項再填寫本頁) 0 訂·1 線丨^--- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 505933Φ -------- Order-I line 丨 · 505933 Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 ___ V. Description of the Invention (V), the pattern between them is filled with liquid. Material 547. The diameter of the micropores 542 can be appropriately designed to be, for example, about 70 // m. The spraying of the patterned material in a liquid state from the micropores 542 is performed in the following manner. By virtue of the piezoelectric effect of the piezoelectric element 544, the piezoelectric element 544A 'is retracted so that the piston head 545 moves backward in the left direction in the figure. As a result, the front face of the piston head 545 becomes negative pressure, and the patterning material 547 is sucked into the cylinder 548 of the bottom plate. After that, the piezoelectric element is returned to the original state, and the patterned material accumulated in the cylinder 548 is discharged through the micro hole 542. In this mode, the patterned material is discontinuously discharged as a droplet. Therefore, the patterned material is adhered to the adhered surface (the surface of the resin film) by a small dot after a single release. By adjusting the discharge amount (droplet size) and interval of the patterning material once, the patterning material can be attached as a continuous liquid film. According to the above-mentioned patterning material imparting device 540, it is possible to easily control most of the fine holes independently. Therefore, not only the belt-shaped patterned material can be imparted to the patterned material applying device 513 of Embodiment C-1, but also a checkerboard-shaped (lattice) patterned material. Therefore, in this embodiment, the patterned material imparting device 540 can be used to provide a belt-shaped patterned material in the traveling direction of the outer peripheral surface of the container roller 511, and the belt-shaped patterned material can be provided at a predetermined interval in the opposite orthogonal direction. Patterned material. Thereafter, as long as the metal thin film 'is formed by the metal thin film forming device 514 and the portion of the patterned material provided with a checkerboard shape becomes a non-metallic strip, the metal thin film is divided into a substantially rectangular shape. Therefore, in this embodiment, it is not necessary to implement the laser light irradiation device 530 of the mode C-1. 72 This standard is applicable to China National Standard (CNS) A4 (210 X 297 mm) " (Please read the precautions on the back before filling in this page) ·· δ, I n HI ϋ 1 nn 11 II HI n 1 nmnn I n in I n ϋ — n in nmm II nm. 505933 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (V) At this time, the same as the implementation form C-1, let The patterned material, which is provided in a band shape, which is substantially orthogonal to the traveling direction of the outer peripheral surface of the container roller 511, moves in synchronization with the rotation of the container roller 511, so that the position of the second non-metallic belt in the laminated direction is horizontal It is desirable to maintain a general consistency across the stratified body. According to the patterning material applying device 540, the same can be done as when the element layer 602 of Embodiment C-1 is laminated, even if the patterning material applying device 540 is not allowed to move back and forth on the rotation axis side of the container roller 511, The micropores of the patterned material can be changed to change the position of the first non-metallic belt. Furthermore, compared with the embodiment C-1 in which the vaporized patterned material is released and liquefied on the adhered surface, the released The patterning material has a sharper directivity, and the patterning material can be easily and accurately attached as expected. Furthermore, since the distance between the micro-pores and the surface to be attached can be increased (for example, left to right), the degree of freedom in device design is improved. Although the patterning material with a better shape in this embodiment can be appropriately selected in consideration of the viscosity under the use environment, etc., basically, the patterning material described in § 1-1 of the embodiment C can be directly used. In this embodiment, as in Embodiment C-1, a chip capacitor shown in FIG. 17 can be manufactured. The formation of the first and second non-metallic belts is not limited to the method of the above embodiment C- ^ C-2. For example, after forming a continuous metal thin film, the first and second non-metallic strips may be formed by irradiation with laser light. Or set up a patterned material imparting device with slit-shaped openings (applicable to the Chinese paper standard (CNS) A4 size (210 X 297 mm) with 73 paper sizes) (Please read the precautions on the back before (Fill in this page)-· nnnn ϋ nn ^ eJa nn 1 · n ϋ ϋ ϋ I nnnnnnn ϋ · ϋ ϋ ϋ ϋ n ϋ βϋ n ϋ ^ 1 -ϋ · 505933 A7 _B7__ 5. Description of the invention (P) Outside the container roller The direction of movement of the surface is a substantially right angle direction as the long side direction) and a shutter that opens and closes the slit-like opening; the vaporized patterned material is discharged from the slit-like opening to make the second non-metallic strip The patterning material for formation is attached to the surface of the resin film. In the above-mentioned embodiments B-1 to B-7, C-1, and C-2, although a cylindrical container roller or the like is used as a support, the present invention is not limited to this. For example, it may be a belt-shaped support or a disc-shaped support that rotates between two or more rollers. In addition, if a release agent is applied to the support surface before the lamination is started, the operation of removing the lamination body after the lamination is completed becomes easy, which is desirable. As the mold release agent, for example, a fluorine-based mold release agent (e.g., a trade name of "agent", manufactured by Daikin Industries, Ltd.) can be used. In addition to the spraying method, the method of applying the mold release agent may be selected from sputtering method and vapor deposition method, which are suitable for the conditions of the release agent material and the procedure. «Embodiment» (Exemplary Embodiment Π-1) A chip capacitor having a structure shown in Fig. 17 was manufactured using a manufacturing apparatus shown in Fig. 15. The vacuum pump 516 was used to draw the inside of the vacuum tank 515 to 0.027 Pa (2 × 10_4 Torr), and the outer peripheral surface of the container roller 511 was cooled to 5 ° C. The diameter of the container roller 511 is 500 mm, and the moving speed of the outer peripheral surface is 50 m / min. Prior to lamination, a fluorine-based mold release agent (Daikin Industries, Ltd. ("Daifuri") manufactured by Daikin Industries (Limited)) was sprayed on the outer surface of the container roll 511, and then thinly stretched with a non-woven fabric. 74 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling out this page). · Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperative, Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by Employee Consumer Cooperative 505933 A7 — — _B7__ 5. Description of the Invention (V) First, a protective layer 604 a with only a resin film continuously laminated is laminated. As the material of the protective layer 604a, dicyclopentadiene dimethanol diacrylate is used, and its vaporization is deposited on the outer peripheral surface of the container roll 511 by a resin film forming device 512. The laminated thickness of each layer was 0.6 // m. Next, using ultraviolet curing as the resin curing device 518, the resin film material deposited as described above was polymerized and cured to a curing degree of 70%. This operation is performed repeatedly by rotating the container roller 511, and a protective layer 604a having a thickness of 15 m is formed on the outer peripheral surface of the container roller 511. During this period, the opening 521 is shielded by a shield plate 523. Next, a portion of the reinforcing layer 603a laminated alternately with the resin film and the metal film is laminated. The resin film material of the reinforcing layer 603a is the same as the material of the protective layer 604a described above. The laminated thickness of each resin film was 0.6 # m. Then, the resin hardening device ‘518 was used to harden the resin film to a hardening degree of 70%. After that, the surface is subjected to an oxygen plasma treatment by a surface treatment device 519. Next, the patterned material applying device 513 is used to allow the vaporized patterned material to be ejected from the fine holes and adhere to the surface of the resin film in a band shape. As the patterning material, a fluorine-based oil agent is used. The temperature at which the vapor pressure of this patterned material becomes 0.1 ltoir is 100 ° C. Oil: The average molecular weight of the agent is 1500. The adhesion width of the band-shaped patterned material is 150 // m. Next, the moving shielding plate 523 opens the opening 521. Next, metal metal deposition of aluminum is performed from the metal thin film forming apparatus 514. The thickness of the laminate is 300 angstroms. After that, the patterned material removing device 517 performs far-infrared heating and plasma discharge processing to remove the remaining patterned material. Then 'from the laser light irradiation device 530 to irradiate the laser light to form the .2 non-metal 75 This paper size applies Chinese National Standard (CNS) A4 specifications (210 X 297 mm) (Please read the precautions on the back before filling this page ) One 5J nn ϋ I n .1 ϋ I ϋ ϋ n II n -ϋ nn ϋ ϋ ί · 1 nn ϋ n 1 ϋ ϋ n-505933 A7 B7 V. Description of the invention (70) Band. As the laser light, a YAG laser with an output of 20 W was used. At this time, the scanning trace of the laser light is scanned in a direction substantially at right angles to the first metal strip formed by the patterning material applying device 513. The above operation is performed by rotating the container roller 511 about 500 times to form a layer 603a portion / of a total thickness of 315 / zm, and then stacking a component layer 602 as a capacitor capacity generating portion. The resin film material was the same as described above, and the laminated thickness of each layer was 0.4 / zm. Then, the resin film was hardened by the resin hardening device 518, and the degree of hardening was 70%. After that, the surface is subjected to an oxygen plasma treatment by a surface treatment device 519. Next, the patterning material applying device 513 is used to attach the same patterning material as described above in a band shape with the same width as the above. Next, metal deposition of aluminum is performed from the metal thin film forming apparatus 514. The build-up thickness is 300 angstroms. Thereafter, the remaining patterned material is removed by the patterned material removing device 5II. Next, laser light is radiated from the low-light irradiation device 530 to form a second non-metallic band. At this time, as in the case where the reinforcing layer 603a is laminated, the scanning trajectory of the laser light is scanned in a direction substantially perpendicular to the first metal strip formed by the patterning material applying device 513. The above operation is performed by rotating the container roller 511 about 2000 times to form / layer 602 of a total thickness of 860 // m. During this period, the patterning material applying device 513 is synchronized with the rotation of the container roller 511, and each time the container roller 511 rotates, it moves back and forth 1000 // m in the direction of the rotation axis. Next, the movement of the patterning material applying device 513 is stopped to form a portion of the reinforcing layer 603b having a thickness of 315 // m. The formation method is exactly the same as that of the layer 603a. 76 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ------------ # (Please read the notes on the back before filling this page) Intellectual Property of the Ministry of Economic Affairs Bureau of the Consumer Cooperatives of the Ministry of Economic Affairs of the People's Republic of China --------- Line --------- 505933 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the Invention (γ) Finally, the thickness is 15 / zm portion of the protective layer 604b. At this time, the shielding plate 523 is moved to cover the opening 521. The formation method from the portion 604b is exactly the same as that of the layer 604a. In the above process, in the stacking of the reinforcing layers 603a, 603b, and the element layer 602, the scanning of the laser light of the laser light irradiating device 530 and the rotation of the container roller 511 are synchronized so that the stacking direction of the second non-metallic belt The positions are approximately the same in the entire laminated body. Next, the cylindrical layered body formed by the soil on the outer surface of the container roll 511 is divided into eight along the second non-metallic belt in the circumferential direction and removed, and then pressed under heating to obtain the locations shown in FIGS. 16A to 16D. The plate-shaped laminated body mother component 600 is shown. At this time, no metal film was exposed on the cut surface 605 at all. This was cut from the cut surface 609a, and then the cut surface was sprayed with brass metal to form an external electrode. Furthermore, a conductive paste (copper, nickel, alloy of sheet metal, etc. is dispersed in a thermosetting phenol resin) is applied to the metal spray-coated surface, followed by heat curing, and the surface of the resin is further coated with molten solder. Thereafter, it is cut from a portion corresponding to the cut surface 609b. At this time, no metal film was exposed on the cut surface • 609b. Thereafter, the surface was coated by dipping in a silane coupling agent solution to obtain a chip capacitor as shown in FIG. The obtained chip capacitor has a thickness of about 1.5 mm in the lamination direction, a depth of 1.6 mm, and a width (in the direction between the two external electrodes) of about 3.2 mm. Although it is a small object, its capacity is 0.33 // F. The withstand voltage is 50V. In addition, the insulation resistance 値 at a DC applied voltage of 16V was 2 × 1012Ω, and no short circuit between the metal thin films or cracking of the metal thin films was found. Element layer 602, reinforcement layers 603a, 603b, and protective layer 77 (Please read the precautions on the back before filling in this page) 0 Order --- n 1 nn I ί ϋ ϋ n ί I nnn I 1 n I i.— ϋ I n. This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 V. Description of the invention (puff) 604a, 6 (Mb of resin film with 95% hardening degree , 95%, 90%. The thickness of the metal thin film of the element layer 602 and the reinforcing layers 603a, 603b is 300 angstroms, and the film resistance is 6 Ω / E]. Furthermore, a part of the above-mentioned laminated body element 600 was decomposed, and as a result, the element layer was found The width of the first and second non-metallic strips of 6% of the metal film is 150 / zm, 50 / zm in order, and the widths of the first and second non-metallic strips of the metal film of the reinforcing layer 603a, 603b are in order. 150 / zm, 50 / zm (Comparative Example Π-1) Except that laser light irradiation was not performed by the laser light irradiating device 530, the chip capacitor shown in FIG. 10 was obtained in the same manner as in Example Π-1. The obtained chip capacitor had a thickness of about 1.5 mm in the lamination direction, a depth of 1.6 mm, and a width (in the direction between the two external electrodes) of about 3. 2mm, ## is 0.35 // F. The withstand voltage is 50V. In addition, the insulation resistance at a DC applied voltage of 16V is 5 X 1011 Q. Among the element layer 602, the reinforcing layers 603a, 603b, and the protective layers 604a, 604b The hardening degree of the resin film is 95%, 95%, and 90% respectively. The thickness of the metal thin film of the element layer 602 and the reinforcing layers 603a and 603b. Is 300 angstroms, and the film resistance is 6Ω / E]. Furthermore, the above-mentioned laminated body A part of the element 600 was partially decomposed, and as a result, it was found that the width of the non-metallic strip of the metal thin film of the element layer portion was 150 // m, and the width of the non-metallic strip of the metal thin film of the reinforcing layer portion was 150 / zm. In Comparative Example Π-1, it has excellent insulation resistance, 78 paper sizes are applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling out this page) # Ministry of Economic Affairs Intellectual Property Printed by the Bureau ’s Consumer Cooperatives-OT (aaaa a ·· < · ϋ ϋ I n ϋ n ί ^ 1 ϋ ϋ ϋ Printed by the Employees ’Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 505933 A7 B7 V. Description of the Invention (ri) It is generally believed that this is due to the sufficient formation of non-metallic bands on the cut surface. Therefore, in the present π invention, the above-mentioned embodiments are at best only ~ examples, and the present invention is not limited to the above-mentioned embodiments. For example, the number of layers of the laminated body may be based on the purpose of the laminated body or the required specifications (such as It is appropriately determined by using a capacitor shape, a required zero capacitance, and the like. The number of layers obtained from the one-layer thickness and the entire thickness described in the above embodiment is merely an example. M, From the viewpoint of using the formed laminated body, the extremely thin laminated body is prone to breakage and the like. According to the inspection done by the inventors, as long as the thickness is generally 100 z / m or more, cracks and the like will hardly occur. However, special attention should be paid to the use of the thickness below 20 // 2. Therefore, if the upper limit of the total thickness of the 1-layer tree ^ gastric membrane and the 1-layer metal film is l # m, then the number of layers of the tree-layer gastric membrane is 20 or more. Real lower limit 値. It is more preferable that the number of laminated resin films is 100 or more. On the other hand, the upper limit of the multilayer body is subject to less limiting factors than the lower limit. Among them, in a high-density assembled circuit board, since the height of the part is higher than that of a semiconductor wafer, electronic parts having a thickness of 1 mm or more become fewer. If the total thickness of the 1-layer resin film and the 1-layer metal film is lower than%. 1 / zm, the number of laminated layers of the resin film is 10,000 or less, which becomes the standard of the upper limit of the number of laminated layers. f The embodiments described above are only for the purpose of clarifying the technical content of the present invention. The present invention is not limited in interpretation due to these specific examples. It can be within the scope of the spirit of the invention and the scope of patent application Various changes are made, and the present invention should be interpreted broadly. 79 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) C Please read the note on the back first? Please fill in this page again for matters)---------- Order --------- Line 丨 · 505933 A7 __B7 V. Description of Invention (7you) Printed by the Employees' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 10 Laminates 11a, 11b Metal films 12 Resin films 13a, 13b Through holes 14a, 14b Conductive material 15 V Electrode terminals 17 Circuit boards 19 Electrode terminals 20 Laminates 21a, 21b Metal films 22 Resin films 23a, 23b Through holes 24a, 24b conductive material 30 capacitor (capacitor row) 31a, 31b metal thin film 33a, 33b through hole 35a, 35b take out electrode 35, electrode terminal 36 capacitor element 37 through electrode 37, electrode terminal 38 through hole 39 conductive material 40 semiconductor integrated circuit 41 Circuit board 42 Electrode terminal 45 Semiconductor wafer 46 Carrier 80 (Please read the precautions on the back before filling this page) Order i line 丨 — This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 V. Description of invention (bamboo) 47 50 51a, 51b 52 53a, 53b 54a, 54b 55 57 58 59 60 61a, 61b 62 63a, 63b 64a, 64b 71a, 71b 100 111 112 114 115 116 117 118 119 120 121 123 Electrode terminal laminate metal film resin film notch conductive material electrode terminal circuit board conductive material electrode terminal laminate metal film resin film notch conductive material cutting area layer manufacturing device Container roll resin film forming device, metal film forming device, vacuum tank, vacuum pump, patterned material removal device, resin hardening device, surface treatment device, next door opening shielding plate (please read the precautions on the back before filling this page) Ϋ n · ϋ n ϋ nn one-port, nnn ϋ nn III nnnn HI n an nnn---n ϊ nn ϋ 81 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 V. Description of the invention (Suppressed) Printed by the Intellectual Property Bureau of the Ministry of Economy, Employees' Cooperatives, 125 Laser processing device 127 Plasma irradiation device 130a, 130b Patterning material imparting device 131 Micropores 132 Opposite side 133% Mold cavity 134 Storage Groove 135 Link Road 137 Patterning material · 138a, 138 b Stripe pattern of patterning material 140 Laser patterning device 142 Patterning material imparting device 211 Support body 220 Patterning material imparting device 222 Micropore 230 Patterning material imparting device 232 Micropore 240 'Resin film forming device 241 Resin film material 242 Supply tube 243a, 243b Heating plate 244 Plates 245a, 245b, 2 45c Shielding plate 500, 5005 Laminate manufacturing device 511 Container roller 511a Container roller rotation direction 512 Resin film forming device 82 (Please read the precautions on the back first (Fill in this page) · Order i line 丨-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 505933 A7 B7 V. Description of invention (Η) Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 513 Patterned material applying device 514 Metal thin_forming device (metal material supply source) 515 Vacuum tank 516 Vacuum pump 517 Patterned material removal device 518 Resin hardening device 519 Surface treatment device 520 Partition 521 Opening '523 Masking plate. 523a Moving direction 530 laser light irradiation device 531 laser light 540 Patterning material applying device 541 Nozzle head 542 Fine hole · 543 Base plate 544 Piezo element 545 Piston head 546 Sharp hole plate 547 Patterning material 548 Cylinder 600 Laminated body element 601 Direction of travel of outer peripheral surface of container roller 602 Element layer 603a, 603b Reinforcing layers 604a, 604b Protective layer 605 Cut surface 83 (Please read the precautions on the back before filling this page) 0 Order · 1 line 丨 ^ --- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 505933
經濟部智慧財產局員工消費合作社印製 五、發明說明(心) 606 金屬薄膜 607 樹脂薄膜 608a 第1非金屬帶 608b 第2非金屬帶 609a,609b 切斷面 610 Ί 晶片電容器 611a,611b 外部電極 900 積層體之製造裝置 911 容器輥 i 912 樹脂薄膜形成裝置 913 圖案化材料賦予裝置 914 金屬薄膜形成裝置 915 真空槽 916 真空泵 917 圖案化材料去除裝置 918 樹脂硬化裝置 919 表面處理裝置 920a,920b 隔壁 922 開口 923 遮蔽板 930 積層體母元件 931 金屬薄膜 932 樹脂薄膜 933 邊緣部(非金屬帶) 938 容器輥之外周面之行進方向 939a,939b 切斷面 940 晶片電容器 941a,941b 外部電極 λ 84 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 1 11 n n n n n 一一一 ov f 1 n ϋ ϋ n ϋ n I 線1·-----------------------Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (heart) 606 Metal film 607 Resin film 608a First non-metallic tape 608b Second non-metallic tape 609a, 609b Section 610 Ί Chip capacitors 611a, 611b External electrodes 900 Laminate manufacturing equipment 911 Container roll i 912 Resin film forming device 913 Patterning material applying device 914 Metal film forming device 915 Vacuum tank 916 Vacuum pump 917 Patterning material removing device 918 Resin hardening device 919 Surface treatment device 920a, 920b Partition wall 922 Opening 923 Blocking plate 930 Laminated body element 931 Metal film 932 Resin film 933 Edge portion (non-metallic tape) 938 Travel direction of outer peripheral surface of container roller 939a, 939b Cut-off surface 940 Chip capacitor 941a, 941b External electrode λ 84 sheets Standards are applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling out this page) 1 11 nnnnn one by one ov f 1 n ϋ ϋ n ϋ n I line 1 ·- ----------------------
Claims (1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000113368A JP3853565B2 (en) | 2000-04-14 | 2000-04-14 | Thin film laminate, capacitor and manufacturing method and manufacturing apparatus thereof |
JP2000131579A JP4533504B2 (en) | 2000-04-28 | 2000-04-28 | Manufacturing method of electronic parts |
Publications (1)
Publication Number | Publication Date |
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TW505933B true TW505933B (en) | 2002-10-11 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW090108375A TW505933B (en) | 2000-04-14 | 2001-04-09 | Laminated body, capacitor, electronic part, and method and device for manufacturing the laminated body, capacitor, and electronic part |
Country Status (7)
Country | Link |
---|---|
US (1) | US6829135B2 (en) |
EP (1) | EP1195784A4 (en) |
KR (1) | KR100483944B1 (en) |
CN (1) | CN100492560C (en) |
MY (1) | MY123557A (en) |
TW (1) | TW505933B (en) |
WO (1) | WO2001080256A1 (en) |
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-
2001
- 2001-04-09 US US09/979,873 patent/US6829135B2/en not_active Expired - Lifetime
- 2001-04-09 EP EP01919847A patent/EP1195784A4/en not_active Withdrawn
- 2001-04-09 WO PCT/JP2001/003060 patent/WO2001080256A1/en active IP Right Grant
- 2001-04-09 TW TW090108375A patent/TW505933B/en not_active IP Right Cessation
- 2001-04-09 KR KR10-2001-7016088A patent/KR100483944B1/en not_active IP Right Cessation
- 2001-04-09 CN CNB018009379A patent/CN100492560C/en not_active Expired - Fee Related
- 2001-04-10 MY MYPI20011721A patent/MY123557A/en unknown
Also Published As
Publication number | Publication date |
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EP1195784A4 (en) | 2006-12-27 |
EP1195784A1 (en) | 2002-04-10 |
US20020158307A1 (en) | 2002-10-31 |
WO2001080256A1 (en) | 2001-10-25 |
US6829135B2 (en) | 2004-12-07 |
CN100492560C (en) | 2009-05-27 |
KR20020026879A (en) | 2002-04-12 |
MY123557A (en) | 2006-05-31 |
CN1366686A (en) | 2002-08-28 |
KR100483944B1 (en) | 2005-04-15 |
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