TW486766B - Film carrier tape for mounting electronic parts, and method for manufacturing the same - Google Patents

Film carrier tape for mounting electronic parts, and method for manufacturing the same Download PDF

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Publication number
TW486766B
TW486766B TW088119626A TW88119626A TW486766B TW 486766 B TW486766 B TW 486766B TW 088119626 A TW088119626 A TW 088119626A TW 88119626 A TW88119626 A TW 88119626A TW 486766 B TW486766 B TW 486766B
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TW
Taiwan
Prior art keywords
tin
copper
layer
wiring pattern
steel
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TW088119626A
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Chinese (zh)
Inventor
Kosuke Watanabe
Yukihiro Ozawa
Hirokazu Kawamura
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Mitsui Mining & Amp Smelting C
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Publication of TW486766B publication Critical patent/TW486766B/en

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Abstract

A film carrier tape for mounting electronic parts has an insulating film. On which a copper foil is laminated, the copper foil being etched to form a desired circuit pattern. By plating tin over the almost entire circuit, a copper-diffused tin plating layer (a) is formed. On the desired positions of circuit pattern other than then terminal portions, a protective layer of hardened solder resist is formed. The terminal portions are provided with a tin-plating layer (b) substantially free of copper over the surface of the upper-diffused tin plating layer (a). More preferably, a copper tin-containing zone is provided between the copper-migrated tin-plating layer (a) and the pure tin plating layer (b).

Description

486766486766

經 濟 部 智 慧 財 產 局 員 工 消 費 合 社 印 製 A7 五、發明說明(1 ) 、 [發明之技術領域] 本發明係關於一種組裝1C或LSI等電子零件之膜狀 载置帶(TAB (Tape Automated Bonding,捲帶式自動接合) 捲帶、T_BGA(Tape Ball Grid Array,捲帶式球閘陣列)捲 帶、ASIC(Application Specific Integrated Circuit,特殊 應用積體電路)捲帶等)及製造此載置帶之方法。更詳言 之,本發明係關於一種在進行鍍錫時,不會因電鍍液而使 鋼箔侵姓之膜狀載置帶(TAB(Tape Automated Bonding, 捲帶式自動接合)捲帶、T-BGA(Tape Ball Grid Array,捲 ▼式球閘陣列)捲帶、ASIC(Application Specific IntegratedPrinted by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 V. Invention Description (1), [Technical Field of the Invention] The present invention relates to a film-shaped mounting tape (TAB (Tape Automated Bonding) for assembling electronic components such as 1C or LSI) , Tape and tape automatic bonding) tape, T_BGA (Tape Ball Grid Array) tape, ASIC (Application Specific Integrated Circuit, special application integrated circuit) tape and so on) and manufacture of this carrier tape Method. In more detail, the present invention relates to a tape-like mounting tape (TAB (Tape Automated Bonding)), T -BGA (Tape Ball Grid Array), tape reel, ASIC (Application Specific Integrated

Circuit,特殊應用積體電路)捲帶等)及製造此載置帶之方 法。 [發明之技術背景] 近年來筆記型電腦等電子機器越來越小型化、輕量 化。又,半導體1C之配線也更加微細化。 隨著此種電子機器之小型化,已有普遍使用TAB捲 -------------------- 帶、T-BGA捲帶及ASIC捲帶等的電子零件組裝用膜狀載 置帶之趨勢。此電子零件組裝用膜狀載置帶係以如下方式 所製造者。例如,在聚亞醯胺等的母材膜上黏貼銅箔,且 在此銅箔表面上塗佈光阻抗蝕刻,並將此光阻抗焊劑所欲 形成之配線圖案以外的部分予以曝光而除去被曝光的光阻 抗焊劑。其次.,利用蝕刻術除去光阻抗焊劑被除去部分之 鋼羯’進而除去光阻抗焊劑以形成配線圖案。如此在配線 圖案被形成之電子零件組裝用膜狀載置帶上,除了内引線 ^-----------------^ (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 1 310966 486766 A7 —-----_—____ 五、發明說明(2 ) 或錫球端子等的連接部分以外塗佈成為電路保護層的抗焊 劑(sokter resist)。如此塗佈抗焊劑之後,在露出部分之連 接部分上形成鍍錫層。 然而,如此塗佈抗焊劑,當使之乾燥硬化之後進行鍍 锡時電鍍液就會從抗焊劑之端部沿著配線圖案侵入至抗焊 劑之下面,而形成局部電池並使此部分之鋼溶解出。亦即, 如第2圖所示,在母材10上以黏著劑層12黏貼銅箔3q 且按照常規形成配線圖案3 0之後,塗佈抗焊劑2 〇,並使 之乾燥硬化,且在此配線圖案3〇上形成鍍錫層31時電鍍 液就會從抗焊劑20之端部2丄侵入至抗焊劑20之下面並 在此形成局部電池,此部分之鋼箔即形成挖開成溝狀的孔 蝕。第2圖中以3 5表示此挖開的部分(挖開部)。當如此 在形成有挖開部35之電子零件組裝用膜狀載置帶上施加 彎曲應力時’應力就會集中在挖開部3 5上,最差的情況, 會造成引線破斷。 經濟部智慧財產局員工消費合作社印製 關於防止電鍍液侵入此種抗焊劑3()之端部,在曰本 4^42—065—1公^報―中,已揭示一種「在以樹脂 當作母材的膜上形成導電圖案之可撓性電路基板中,將保 護電路為目的而塗佈的抗焊劑對圖案電鍍之後予以塗佈為 特徵的可撓性電路基板及其製造方法」。 右依據上述公報所記載之發明,該製造法由於在電鍍 後塗佈抗焊劑,且使之加熱硬化,所以就不會發生電鍍液 侵入至抗焊劑之下面的情事,又由於藉由抗焊劑硬化時之 加熱,也使鍍錫層受到加熱處理,所以沒有必要重新進行 本紙張尺度適用中國國私標準(CNS)A4規格(21〇 X 297公爱) 2 310966 310966 486766 五、發明說明(3 ) 用以防止鬚晶(whisker)之發生的加熱步驟。 然而,在實際之步驟中,要連續實施電鍍步驟和抗焊 劑之加熱硬化步驟是很困難的,而事實上係在經由電鍍步 驟而得的棬帶上,經過相當時間後,對之塗佈抗焊劑,進 而使抗焊劑加熱硬化。為了抑制鬚晶之成長,則有必要在 電鑛後馬上加熱處理此電鑛層,且鬚晶會隨著時間之經過 而成長。再且,使抗焊劑加熱硬化時的溫度條件與抑制鬚 晶成長的溫度條件並不定相同一致’當配合任何一方之條 件而進行加熱時,就會有無法充分獲得另一方之作用效果 的問題。更且,利用此種加熱處理以抑制鬚晶成長’雖秋 在短期間内其有用性很高,但是在長期間(例如2至3個、 月)後’其鬚晶防止效果就會減失。 然而’抑制鬚晶成長之方法,如上所述,已知在進行 鑛錫之後加熱(回火處理)鑛錫層以使銅在㈣層中擴散的 方法。若依據此方法’則在短期間内雖可作某程度之防止 4晶之發生’但是此方法’卻有無法在長期間⑼如2至 3個月)元全防止鬚晶成長的問題。 抑制此種鬚晶成長的方法,在曰本專利特開平5_33187 號公報令,有揭示一種「在鋼或銅合金之微細圖案上施予 鑛錫時,首先施予厚度㈢“以上之㈣,h加教 ::::該純錫層全部當作與鋼底層之㈣擴散層:’、Circuit, special application integrated circuit) tape reel, etc.) and method of manufacturing the carrier tape. [Technical Background of the Invention] In recent years, electronic devices such as notebook computers have become smaller and lighter. In addition, the wiring of the semiconductor 1C is further miniaturized. With the miniaturization of such electronic devices, TAB tapes, electronic tapes, T-BGA tapes, and ASIC tapes have been widely used. The tendency of film-like mounting tapes for part assembly. This film-shaped mounting tape for assembling electronic components was manufactured as follows. For example, a copper foil is affixed to a base material film such as polyimide, and a photoresist is etched on the surface of the copper foil, and a portion other than the wiring pattern to be formed by the photoresist is exposed and removed. Exposure Photoresistance Flux. Next, the photoresist solder is removed by etching to further remove the photoresist solder to form a wiring pattern. In this way, except for the inner leads on the film-shaped mounting tape for the assembly of electronic parts with the wiring pattern formed ^ ----------------- ^ (Please read the precautions on the back before filling (This page) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 1 310966 486766 A7 —-----_—____ V. Description of the invention (2) or connection parts such as solder ball terminals A sokter resist is applied as a circuit protective layer. After the solder resist is applied in this manner, a tin plating layer is formed on the connection portion of the exposed portion. However, when the solder resist is applied in this way, when it is dried and hardened and tin-plated, the plating solution will invade from the end of the solder resist along the wiring pattern and under the solder resist to form a local battery and dissolve the steel in this part. Out. That is, as shown in FIG. 2, after the copper foil 3q is pasted with the adhesive layer 12 on the base material 10 and the wiring pattern 30 is formed as usual, the solder resist 20 is applied and dried and hardened. When the tin plating layer 31 is formed on the wiring pattern 30, the plating solution will invade from the end 2 of the solder resist 20 to the bottom of the solder resist 20 and form a local battery here, and the steel foil in this part will be dug into a trench shape. Pitting. The cutout (cutout) is shown in FIG. 2 as 3 5. When a bending stress is applied to the film-shaped carrier tape for assembling an electronic part with the cutout 35 formed thereon, the stress is concentrated on the cutout 35, and in the worst case, the lead may be broken. The Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed on the end of the solder resist 3 () to prevent the plating solution from intruding into it. In a flexible circuit board having a conductive pattern formed on a film as a base material, a flexible circuit board characterized by coating a pattern with a solder resist applied for the purpose of protecting a circuit and then coating the pattern, and a method of manufacturing the same ". According to the invention described in the above publication, since this manufacturing method applies a solder resist after plating and heat-hardens it, the plating solution does not invade under the solder resist, and it is hardened by the solder resist. The time of heating also heats the tin plating layer, so there is no need to re-apply the Chinese paper standard (CNS) A4 specification (21〇X 297 public love) for this paper. 2 310966 310966 486766 V. Description of the invention (3) A heating step to prevent the occurrence of whiskers. However, in the actual process, it is difficult to continuously perform the plating step and the heating and hardening step of the solder resist. In fact, it is applied to the ribbon obtained through the plating step. Flux, which in turn heat-hardens the solder resist. In order to suppress the growth of whiskers, it is necessary to heat treat the power deposit immediately after the power mine, and the whiskers will grow over time. Furthermore, the temperature conditions when the solder resist is heat-hardened and the temperature conditions for suppressing the growth of whiskers are not the same. When one of the conditions is used for heating, there is a problem that the other effect cannot be fully obtained. Furthermore, using this heat treatment to suppress the growth of whiskers' Although autumn is very useful in a short period of time, after a long period (for example, 2 to 3 months), the effect of preventing whisker will be reduced. . However, as a method of suppressing the growth of whiskers, as described above, a method of heating (tempering) the ore tin layer after ore tin is performed to diffuse copper in the hafnium layer is known. If you use this method, you can prevent the occurrence of 4 crystals to a certain extent in a short period of time, but this method has the problem that you cannot prevent the growth of whiskers in a long period of time, such as 2 to 3 months. A method for suppressing the growth of such whiskers is disclosed in Japanese Patent Application Laid-Open No. 5_33187, which states that "when ore tin is applied to a fine pattern of steel or copper alloy, the thickness ㈢" is first applied, h Jiajiao :::: The pure tin layer is all used as a diffusion layer with the steel bottom layer: ',

”面施予鍍錫’以將純鍍錫厚度形成Ο。 m為其特徵的鍍錫鬚晶抑 至〇.8V 載之發明… 法」。亦即’此公報所記 」之^錫層,而加熱處理此鑛錫 t紙張尺度使銅擴"The surface is tin-plated" to form a pure tin-plated thickness of 0. The invention is characterized by tin plating whiskers whose m is characterized by 0.8V. That is, the "tin layer" described in this bulletin, and the heat treatment of this mineral tin paper scale makes copper expand

• n n 1« (請先閱讀背面之注咅?事項再填寫本頁) -H 1 H - -I I I - ----訂----- --線· 486766 經濟部智慧財產局員工消費合作社印製 4 310966 A7 五、發明說明(4 ) 散於此鍍錫層内之後’再次進行電鍍(快速電鍍),在銅被 擴散之鍍錫層表面上形成純鍍錫層以防止鬚晶形成者。 然而,此公報所揭示之方法中,在配線圖案上塗佈抗 焊劑並使之硬化之後進行鑛錫,進而加熱處理以使鋼擴散 於此鍍錫層内之》,在此㈣皮擴散之鍍錫層表面上再次形 成鍍錫層。因而,此公報所記載之發明,雖可控制鬚晶^ 形成,但是由於在塗佈抗焊劑並使之硬化之後才進行電 鍍,所以會與習知之電鍍同樣依然存在著電鍍液會侵入至 抗焊劑之下面而形成挖開部3 5的問題。 [發明之目的] 本發明之目的係在於提供一種即使進行無電解電鍍液 亦不會在配線圖案上形成挖開部,而且經過長期間亦可抑 制鬚晶成長的電子零件組裝用膜狀載置帶及製造此電子零 件組裝用膜狀載置帶之方法。 [發明之概要] 本發明之電子零件組裝用膜狀載置帶(第一電子零件 組裝用臈狀載置帶),係在絕緣膜上黏貼鋼箔,並蝕刻該 鋼箱以形成所希望的配線圖案者,其特徵為:在該配線圖 案之大致全體上鍍錫以形成有銅擴散的鍍錫層(a),並在 除了該配線圖案之端子部分以外之預定位置上形成由抗焊 劑之硬化體所形成的保護層,同時在該端子部分上之有鋼 擴散的鍍錫層(a)表面形成實質上不含有銅的錢錫層(b)。 上述本發明之電子零件組裝用膜狀載置帶(第一電子 零件組裝用膜狀載置帶),係在絕緣膜上黏貼銅箔,並蝕 氏張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) "" ---- ---_-----------------訂--------- (請先閱讀背面之注意事項再填寫本頁) 486766• nn 1 «(Please read the note on the back? Matters before filling out this page) -H 1 H--III----- Order ----- --line · 486766 Employee Property Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printed 4 310966 A7 V. Description of the invention (4) After being scattered in the tin plating layer, 'plating (rapid plating) is performed again, and a pure tin plating layer is formed on the surface of the tin plating layer where copper is diffused to prevent whisker formation. . However, in the method disclosed in this publication, a solder resist is applied to a wiring pattern and hardened, and then ore tin is further processed by heat treatment to diffuse the steel into the tin plating layer. A tin plating layer was formed on the surface of the tin layer again. Therefore, although the invention described in this publication can control the formation of whiskers ^, since the plating is performed after the solder resist is applied and hardened, the same plating solution as the conventional plating still exists and the solder will penetrate into the solder resist. The problem is that the cutout 35 is formed below. [Objective of the Invention] An object of the present invention is to provide a film-shaped mounting for electronic component assembly that does not form a cutout portion on a wiring pattern even if an electroless plating solution is formed, and can suppress the growth of whiskers over a long period of time. Tape and method for manufacturing the film-shaped mounting tape for electronic component assembly. [Summary of the Invention] The film-shaped mounting tape for electronic component assembly of the present invention (the 臈 -shaped mounting tape for the first electronic component assembly) is made by attaching a steel foil to an insulating film and etching the steel box to form a desired A wiring pattern is characterized in that tin is plated on substantially the entire wiring pattern to form a tin-plated layer (a) with copper diffusion, and a solder resist is formed at a predetermined position other than the terminal portion of the wiring pattern. The protective layer formed by the hardened body, and at the same time, a tin-plated layer (b) containing substantially no copper is formed on the surface of the tin-plated layer (a) having steel diffusion on the terminal portion. The above-mentioned film-shaped mounting tape for the assembly of electronic parts of the present invention (the first film-shaped mounting tape for the assembly of the first electronic parts) is adhered to the insulating film with copper foil, and the etched scale is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public love) " " ---- ---_----------------- Order --------- (Please read first (Notes on the back then fill out this page) 486766

經 濟 部 智 慧 財 產 局 消 費 合 作 社 印 製 A7 ______B7____ 五、發明說明(5) 刻該銅箔以形成所希望的配線圖案,且在該配線圖案全體 上形成有鋼擴散的鍍錫層(a)之後,在除了該配線圖案之 端子部分以外之預定部分上塗佈抗焊劑並使之硬化,而當 該抗焊劑硬化之後,對配線圖案之端子部分再次進行鍍錫 以形成實質上不含有銅的鍍錫層(b)而製成者。 本發明之電子零件組裝用膜狀載置帶(第二電子零件 組裝用膜狀載置帶),係在絕緣膜上黏貼銅箔,並姓刻該 銅箔以形成所希望的配線圖案者,其特徵為:藉由在該配 線圖案之大致全體上鍍錫以形成有銅擴散的鍍錫層(a), 並在除了該配線圖案之端子部分以外之預定位置上形成由 抗焊劑之硬化體所形成的保護層,同時在該端子部分上具 有銅擴散的鍍錫層(a),及銅擴散濃度從該有銅擴散的鍍 錫層(a)表面朝向實質上不含有銅之鍍錫層(b)表面逐漸降 低的銅•錫含有區域,而該區域係與實質上不含有銅之鍍 錫層(b)連續形成者。 上述本發明之電子零件組裝用膜狀載置帶(第二電子 零件組裝用膜狀載置帶),係具有在絕緣膜上黏貼銅箔, 並蝕刻該銅箔以形成所希望的配線圖案,且對該被形成之 配線圖案之大致全體鍍錫,在除了該配線圖案之端子部分 以外之預定部分上塗佈抗焊劑並使之硬化,而當該抗焊劑 硬化之後,對配線圖案之端子部分再次進行鍍錫的步驟, 其特徵為: 在該端子部分上形成有銅擴散的鍍錫層(a),及銅擴 散濃度從該有鋼擴散的鍍錫層(a)表面朝向實質上不含有 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 5 310966 ---------------------^--------- (請先間讀背面之注意事項再填寫本頁) 6 A7 _B7 五、發明說明(6 銅之錢錫層(b)表面逐漸降低的銅•錫含有區域,而該區 域係與實質上不含有鋼之鍍錫層(b)連續形成者。 本發明之電子零件組裝用臈狀載置帶,係在由塗佈有 抗焊劑之銅猪所形成t配線圖案表面上形成有鍍錫層 ⑷,而此鍍錫層⑷係利用加熱使來自配線圖案之銅擴散, 以形成錫-銅擴散層。如此在形成鍍錫層(a)之後,在此鍍 錫層⑷之表面上除了電極之接合部之外對所希望的位置 塗佈抗焊劑,並使此抗焊劑乾燥硬化。如此使抗焊劑硬化 之後’再次利用錄錫’以在鑛錫層⑷之表面上形成實質 上不含有銅的鍍錫層(b)。 如此所形成的載置帶,於進行第一次鍍錫時,由於沒 有存在抗焊劑,所以不會因局部電池之形成而在銅上形成 ^並且在進行第一次鍍錫時,由於即使電鍍液會 钕入至抗焊劑之下面,銅之表面也可形成錫·鋼擴散層, 而鋼v白不會與電鍍液接觸,所以不會形成將鋼當作電極的 局部電池,因而,就不會形成如第2圖所示之挖開部35。 更且,在進行第一次鍍錫之後,形成由抗焊劑之硬化 物所形成的保護層,其次,藉由進行第二次鍍錫,即可抑 制鬚晶之成長並可防止因鬚晶所造成的短路。 有關形成第2圖所示之挖開部35的機制尚無法說明 其全部内容,但是本發明人認為如以下所述之局部電池之 形成即可形成此挖開部35。第3圖係顯示因局部電池之 形成而產生挖開部35之機制的模型圖。 首先’當電鍍液從抗焊劑端部開始侵入至抗谭劑之下 本紙張尺度適用中國國家標準(CNS)A4規格⑽χ撕公髮) 310966 (請先閱讀背面之注意事項再填寫本頁) 再填寫太 486766 A7 ------- 五、發明說明(7 ) 面時,由於餘留於抗焊劑内的收縮力(内部應力),抗焊 劑就會浮起,且會形成電鍍液之液積留。 在此電鍍液中,錫係含有硼氟化錫等的形態,在此錫 和銅金屬之間會開始進行電性化學之置換反應,而已置換 成之銅離子會滯留成液積留·。Printed by A7 ______B7____, Consumer Cooperatives, Bureau of Intellectual Property, Ministry of Economic Affairs. 5. Description of the Invention (5) After the copper foil is engraved to form a desired wiring pattern, and a steel-plated tinned layer (a) is formed on the entire wiring pattern, A predetermined portion other than the terminal portion of the wiring pattern is coated with a solder resist and hardened, and after the solder resist is hardened, the terminal portion of the wiring pattern is tin-plated again to form tin plating that does not substantially contain copper. Layer (b). The film-shaped mounting tape for the assembly of electronic parts (the film-shaped mounting tape for the assembly of the second electronic parts) of the present invention is a copper foil adhered to an insulating film, and the copper foil is engraved to form a desired wiring pattern. It is characterized by forming a tin-plated layer (a) having a copper diffusion by tin plating on substantially the entire wiring pattern, and forming a hardened body made of a solder resist at a predetermined position other than the terminal portion of the wiring pattern. The formed protective layer also has a copper-diffused tin plating layer (a) on the terminal portion, and the copper diffusion concentration is directed from the surface of the copper-diffused tin plating layer (a) to a tin-plated layer that does not substantially contain copper. (B) A copper-tin-containing area having a gradually decreasing surface, and this area is formed continuously with the tin plating layer (b) which does not substantially contain copper. The above-mentioned film-shaped mounting tape for electronic component assembly (the second film-shaped mounting tape for electronic component assembly) of the present invention has a copper foil adhered to an insulating film, and the copper foil is etched to form a desired wiring pattern. Furthermore, the entire wiring pattern formed is tin-plated, and a solder resist is applied to a predetermined portion other than the terminal portion of the wiring pattern to harden it. After the solder resist is hardened, the terminal portion of the wiring pattern is hardened. The tin plating step is performed again, and is characterized in that a copper-diffused tin-plated layer (a) is formed on the terminal portion, and the copper diffusion concentration from the surface of the tin-plated layer (a) with steel diffusion does not substantially contain This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 5 310966 --------------------- ^ ------- -(Please read the precautions on the back before filling out this page) 6 A7 _B7 V. Description of the invention (6 Copper money tin layer (b) The copper and tin containing area on the surface gradually decreases, and this area is essentially the same as Continuous formation of a tin-free layer (b) that does not contain steel. The 臈 -shaped mounting tape for assembling electronic parts of the present invention A tin plating layer 形成 is formed on the surface of the t wiring pattern formed by a copper pig coated with a solder resist, and the tin plating layer ⑷ is used to diffuse copper from the wiring pattern by heating to form a tin-copper diffusion layer. After the tin plating layer (a) is formed in this manner, a solder resist is applied to a desired position on the surface of the tin plating layer 除了 except for the electrode joint portion, and the solder resist is dried and hardened. In this way, the solder resist is hardened. After that, the "re-use of tin" was used to form a tin-plated layer (b) that does not substantially contain copper on the surface of the tin layer ⑷. The carrier tape thus formed did not exist during the first tin plating. Solder resist, so it will not be formed on copper due to the formation of local batteries ^ And when tin plating is performed for the first time, tin / steel diffusion can be formed on the copper surface even if the plating solution will enter the solder underneath the solder resist. Layer, and steel Vb will not come into contact with the plating solution, so a local battery using steel as an electrode will not be formed, and therefore, a cutout 35 as shown in FIG. 2 will not be formed. After tinning once, hardened by solder resist The protective layer formed by the object, secondly, by performing a second tin plating, the growth of the whiskers can be suppressed and a short circuit caused by the whiskers can be prevented. Regarding the mechanism for forming the cutout 35 shown in FIG. 2 The entire content cannot be explained yet, but the present inventor believes that the excavation portion 35 can be formed as described below by forming a local battery. Fig. 3 is a model showing the mechanism of the excavation portion 35 due to the formation of the local battery. Figure. First, when the plating solution invades from the end of the solder resist to the bottom of the anti-tan agent, the paper size is subject to the Chinese National Standard (CNS) A4 specification ⑽χ tear public hair) 310966 (Please read the precautions on the back before filling this page ) Then fill in too 486766 A7 ------- 5. In the description of invention (7), due to the shrinkage force (internal stress) remaining in the solder resist, the solder resist will float and a plating solution will be formed. Liquid accumulation. In this plating solution, tin is in a form containing tin borofluoride, etc., and an electrochemical substitution reaction is started between tin and copper metal, and the copper ions that have been substituted are retained in a liquid deposit.

(請先閱讀背面之注意事項再填寫本頁) 為了將此滯留的陽性鋼離子予以電性中和,而使電鍍 層中之陰離子(例如硼氟化離子)移動。 在抗焊劑端部因陰離子之移動而會餘留陽性之錫離 子且鋼離子會從溶出部接受電子而析出金屬錫。 由連鎖發生鋼離子之溶出、陰離子之移動、電子之移 動錫之析出,即可形成以銅溶出部為陽極,以錫析出部 為陰極的局部電池。 可看作係藉由上述之機制而使由抗焊劑下面之銅箔所 形成之配線圖案局部溶出以形成挖開部者。(Please read the precautions on the back before filling out this page.) In order to electrically neutralize the retained positive steel ions, anions (such as borofluoride ions) in the plating layer are moved. At the end of the solder resist, positive tin ions remain due to the movement of the anions, and steel ions receive electrons from the dissolution part to precipitate metallic tin. By dissolution of steel ions, anions, and electrons, tin is precipitated in a chain to form a local battery with a copper elution portion as the anode and a tin precipitation portion as the cathode. It can be considered that the wiring pattern formed by the copper foil under the solder resist is partially dissolved by the above-mentioned mechanism to form a cutout.

在本發明之電子零件組裝用膜狀載置帶之端子部分 雖如上述形成有銅擴散的鑛锡層(a)、和實質上不含 有鋼的鍍錫層(b),但是本發明之第二電子零件組裝用膜 狀載,係在有鋼擴散之鍍錫層(a)(鋼擴散鍍錫層(a))、 和實質上不含有鋼之鍍錫層(b)(純鍍錫層(b))之間,形成 有^擴散濃度從該有鋼擴散的鍍錫層⑷表面朝向實質上 不含有鋼之鍍錫層(b)表面逐漸降低的鋼·錫含有區域。 亦即,本發明之電子零件組裝用膜狀載置帶,係在絕 者膜^占貼鋼落’並钱刻該鋼落以形成所希望的配線圖案 ^為··#由在該配線圖案之大致全體表面上鍍錫 ^ 張尺^^iiii?_(CNS)A4 規格⑵0 x 297 公爱 Γ 310966 486766 8 A7 B7 五、發明說明(8 ) 、 以形成有銅擴散的鍍錫層(a),並在除了該配線圖案之端 子部分以外之預定位置上形成由抗焊劑之硬化體所形成的 保護層,同時在該端子部分上形成有鋼擴散的鍍錫層(a), 及銅擴散濃度從該有銅擴散的鍍錫層(a)表面朝向實質上 不含有銅之鍍錫層(b)表面逐漸降低的銅·錫含有區域, 而該區域係與事實上不含有銅之鍍錫層(b)連續形成者。 本發明之第二電子零件組裝用膜狀載置帶,藉由具有· 在絕緣膜上黏貼銅猪,並蝕刻該鋼箔以形成所希望的配線 圖案,之後在該被形成之配線圖案之大致全體上鍍錫,且 在除了該配線圖案之端子部分以外之預定部分上塗佈抗悍 劑並使之硬化’而當該抗焊劑硬化之後,對配線圖案之端 子部分再次進行鍍錫的步驟,其特徵為: 在該端子部分上形成有銅擴散的鍍錫層(a),及銅擴 散濃度從該銅擴散的鍍錫層(a)表面朝向實質上不含有銅 之鍍錫層(b)表面逐漸降低的鋼•錫含有區域,同時該區 域係與實質上不含有鋼之鍍錫層(b)連續形成而製造者。 如此地藉由將銅濃度從鋼擴散鍍錫層(a)朝向純鍍錫 層(b)連續降低的銅•錫含有區域與純鍍錫層連續形成, 即可更不易形成如上述之挖開部,同時可既永久又大致可 完全防止鬚晶之形成。 [發明之具體說明] 其次,就本發明電子零件組裝用膜狀載置帶邊參照 圖式邊沿著其製造方法加以具體說明。另外,在以下所示 .之圖式中如為共通之構件者則附註共通的元件編號〇 I紙張尺度適用til國家標準(CNS)A4規格(210x 297公爱「 310966 -------------------訂 ---------- (請先閱讀背面之注意事項再填寫本頁)Although the terminal portion of the film-shaped mounting tape for electronic component assembly of the present invention is formed with the copper-diffused mineral tin layer (a) and the tin-plated layer (b) that does not substantially contain steel as described above, Two film-like carriers for the assembly of electronic parts are formed on a tin-plated layer (a) (steel-diffused tin-plated layer (a)) with steel diffusion and a tin-plated layer (b) (pure tin-plated layer) that does not substantially contain steel. Between (b)), a steel-tin-containing region is formed in which the diffusion concentration gradually decreases from the surface of the tin-plated layer with steel diffusion toward the surface of the tin-plated layer (b) that does not substantially contain steel. That is, the film-shaped mounting tape for assembling the electronic parts of the present invention is attached to the film of the absolute film, and the steel film is engraved to form a desired wiring pattern. Approximately the entire surface is tin plated ^ Zhang ruler ^ iiii? _ (CNS) A4 specifications ⑵0 x 297 public love Γ 310966 486766 8 A7 B7 5. Description of the invention (8) to form a tin-plated layer with copper diffusion (a ), And a protective layer made of a hardened body of a solder resist is formed at a predetermined position other than the terminal portion of the wiring pattern, and a steel-diffused tin plating layer (a) and copper diffusion are formed on the terminal portion. A copper-tin-containing area whose concentration gradually decreases from the surface of the tin-plated layer (a) with copper diffusion toward the surface of the tin-plated layer (b) that does not substantially contain copper, and this area is similar to the tin-plated layer that does not actually contain copper Layer (b) is formed continuously. The second film-shaped mounting tape for assembling electronic components of the present invention has a copper pig on an insulating film, and the steel foil is etched to form a desired wiring pattern. The whole is tin-plated, and a resist is coated and hardened on a predetermined portion other than the terminal portion of the wiring pattern. After the solder resist is hardened, the terminal portion of the wiring pattern is tin-plated again. It is characterized in that a copper-diffused tin plated layer (a) is formed on the terminal portion, and the surface of the tin-plated layer (a) with a copper diffusion concentration from the surface of the copper-diffusion layer (a) faces the tin-plated layer (b) that does not substantially contain copper. The steel-tin-containing area gradually decreasing in surface, and the area is formed continuously with the tin-plated layer (b) which does not substantially contain steel. In this way, by continuously forming a copper-tin-containing region where the copper concentration is continuously reduced from the steel diffusion tin plating layer (a) to the pure tin plating layer (b) and the pure tin plating layer, it is more difficult to form the above-mentioned excavation. At the same time, it can be both permanent and almost completely prevent the formation of whiskers. [Specific description of the invention] Next, a film-shaped mounting tape for assembling an electronic component according to the present invention will be described in detail along a manufacturing method with reference to a drawing. In addition, as shown in the figure below, if the components are common, the common component numbers are noted. The paper size applies the til national standard (CNS) A4 specification (210x 297 public love "310966 ------- ------------ Order ---------- (Please read the notes on the back before filling this page)

486766 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(9 ) 第1圖係顯示本發明之電子零件組裝用膜狀載置帶 之截面的模型截面圖。 在本發明之電子零件組裝用膜狀載置帶1中,係依 序層合絕緣膜10,及由利用例如黏著劑層12黏貼於此表 面上之電解鋼箔所形成的配線圖案30。然後,此配線圖 案30,塗設有由抗焊劑20所形成的層(硬化物)用以保護 其表面。 構成本發明之電子零件組裝用膜狀載置帶的絕緣膜 1〇,係由可撓性樹脂膜所形成。此絕緣膜10由於在蝕刻 時會與fee等接觸所以具有不被此種藥品侵餘之耐藥品性, 及即使因接合時之加熱也不會變質的耐熱性。形成此種可 撓性樹脂臈之樹脂的例子,可列舉玻璃環氧樹脂、B丁樹 脂、聚酯、聚醯胺及聚亞醯胺等。尤其是在本發明中以使 用由聚亞醯胺所形成的膜為佳。 構成絕緣膜1 〇之聚亞醯胺的例子,可列舉由苯四甲 1酸二酐和芳香族二胺基(diamine)所合成的全芳香族聚醯 胺、具有由聯苯四碳酸二酐和芳香族二胺基所合成的聯苯 骨架之全芳香族㈣胺。尤其是在本發日月巾以使用具有聯 笨月木之全芳香族聚醯胺(例如:商品名:UPLEX,宇部 興產(株)製)為佳。此種的絕緣膜10之厚度,通常係在25 至125#m之範圍内,較佳者係在5〇至75“m之範圍内。 在此種絕緣膜1〇上,以沖孔步驟形成元件孔(device hole)、傳動孔(sprocket hole)、外 線(〇uter lead)之切斷 孔等。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 9 310966486766 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the Invention (9) The first diagram is a cross-sectional view of a model showing the cross section of the film-shaped mounting tape for assembling electronic parts of the present invention. In the film-shaped mounting tape 1 for assembling an electronic part of the present invention, an insulating film 10 and a wiring pattern 30 formed of an electrolytic steel foil adhered to this surface by, for example, an adhesive layer 12 are sequentially laminated. Then, this wiring pattern 30 is coated with a layer (hardened material) formed of the solder resist 20 to protect the surface. The insulating film 10 constituting the film-shaped mounting tape for assembling an electronic component of the present invention is formed of a flexible resin film. This insulating film 10 is in contact with fee or the like during etching, and therefore has chemical resistance that is not invaded by such chemicals, and heat resistance that does not deteriorate even when heated during bonding. Examples of the resin forming such a flexible resin ray include glass epoxy resin, B-butyl resin, polyester, polyamide, and polyamide. Particularly, in the present invention, it is preferable to use a film made of polyimide. Examples of the polyimide constituting the insulating film 10 include a wholly aromatic polyamidoamine synthesized from pyromellitic acid dianhydride and an aromatic diamine, and a biphenyltetracarbonic dianhydride Fully aromatic amidine of biphenyl skeleton synthesized with aromatic diamine group. In particular, it is better to use a fully aromatic polyamidine (for example, trade name: UPLEX, manufactured by Ube Kosan Co., Ltd.) with bibenzuki wood in this sun and moon towel. The thickness of such an insulating film 10 is usually in the range of 25 to 125 # m, and preferably in the range of 50 to 75 "m. The insulating film 10 is formed in a punching step. Device hole, sprocket hole, cut-out hole for external lead, etc. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 9 310966

裝--- (請先閱讀背面之注意事項再填寫本頁) . · --線· 486766 A7 __B7 五、發明說明(10 ) 配線圖案30’係在形成有如上述之預定孔的絕緣膜⑺ 上,塗佈絕緣性之黏著劑以形成黏著劑層12,且利用此 黏著劑層12來黏接銅箔,並藉由蝕刻此銅箔而形成者。 在此的鋼箔,雖可使用電解鋼箔、壓延鋼箔中之任一種, =疋近來係以使用可達成微距(fine pitch)化之電解銅箔為 又,在如上述之絕緣獏上黏貼銅箔時,可無須使用 黏著劑予以黏貼,也可使用黏著劑予以黏貼。在此所使用 的黏著劑,係以具有耐熱性、耐藥品性、黏著力、可繞性 等特性者為佳。具有此種特性之黏著劑的例子,可例舉環 氧系黏著劑及酚系黏著劑。此種黏著劑,可為胺基甲酸乙 酉日樹脂、二聚氰胺樹脂、聚多羥乙烯樹脂等變性、或環氧 樹脂本身橡膠變性者。此種的黏著劑具加熱硬化性者。此 種黏著劑層之厚度,通常係在8至23㈣之範圍内,較 佳者係在H)至21_之範圍内。由此種黏著劑所構成的 黏著劑層12,亦可塗設在絕緣膜1〇之表面上,或塗設在 電解銅箔之表面上。在此所使用的電解鋼箔雖可使用通常 使用於電子零件組裝用膜狀載置帶之製造中之厚度的銅 箱,但是為了製造微距之電子零件組裝用膜狀載置帶,鋼 羯以通常使用在6至25/zm之範圍内,而較佳者在今至^ 之範圍内的鋼羯較為人所期望。使用此種較薄的電解 鋼箔,就可容易形成窄距的内引線。 如此在絕緣膜之表面上黏貼銅落之後,在此銅落表 .面塗佈光阻抗谭劑(以下簡稱為光阻劑),且對此光阻將所 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 10Installation --- (Please read the precautions on the back before filling in this page). · --- Line · 486766 A7 __B7 V. Description of the invention (10) The wiring pattern 30 'is on the insulating film 形成 formed with the predetermined hole as described above. An insulating adhesive is applied to form an adhesive layer 12, and a copper foil is adhered by using the adhesive layer 12, and is formed by etching the copper foil. Although the steel foil here may be any of electrolytic steel foil and rolled steel foil, it has recently been made to use electrolytic copper foil that can achieve fine pitch. When sticking copper foil, you don't need to use adhesive, or you can use adhesive. The adhesive used here is preferably one having properties such as heat resistance, chemical resistance, adhesion, and flexibility. Examples of the adhesive having such characteristics include an epoxy-based adhesive and a phenol-based adhesive. Such an adhesive may be a denatured resin such as urethane resin, melamine resin, or polyvinylidene resin, or a rubber denatured epoxy resin itself. This kind of adhesive is heat-hardening. The thickness of such an adhesive layer is usually in the range of 8 to 23 ㈣, and the more preferable range is in the range of PD to 21 mm. The adhesive layer 12 composed of such an adhesive may also be coated on the surface of the insulating film 10 or on the surface of the electrolytic copper foil. The electrolytic steel foil used here can be a copper box with a thickness generally used in the manufacture of film-shaped mounting tapes for electronic component assembly, but in order to manufacture film-shaped mounting tapes for macro electronic component assembly, steel reeds Steel reeds which are usually used in the range of 6 to 25 / zm, and more preferably in the range of today to ^ are more desirable. With such a thin electrolytic steel foil, a narrow-pitch inner lead can be easily formed. After the copper drop is pasted on the surface of the insulating film in this manner, a photoresistive tanning agent (hereinafter referred to as a photoresist) is coated on the surface of the copper drop, and the paper size applies the Chinese national standard (CNS) for this photoresist. ) A4 size (210 X 297 public love) 10

310966 486766 A7310966 486766 A7

A7 五、發明說明(U ) 路。從此情形來看1錫層_之#^ ^以上’較佳者為。1…上,更佳者為。.3 = 上’而此層31之厚度上限通常為〇 &坩。 此鑛錫層⑷31,係除去與黏著劑12接 面,而形成於配線圖案之全面上。 、、”圖案 注A7 5. Description of the invention (U). From this point of view, 1 tin layer _ of # ^ ^ or more is preferred. 1 ... on the better. .3 = upper 'and the upper limit of the thickness of this layer 31 is usually 0 & The ore tin layer ⑷31 is formed on the entire surface of the wiring pattern except that the interface with the adhesive 12 is removed. ,, "pattern Note

使銅擴散於如此所形成的鑛錫層⑷31上,就可防止 鬚晶形成。使鋼擴散於鑛錫層⑷31上的方法,可列舉同 時加熱此鍍錫層⑷31和配線圖案的方法。此時,加二 度通常為70i 200t,較佳者為1〇〇至15代,加熱時皿間 也由鑛錫厚度決定’但是通常為3〇秒至12〇分鐘,較佳 者為30分鐘至60分鐘。藉由如此地加熱,形成當初係由 錫所形成且在實質上不含有其他金屬的鍍錫層⑷31上銅 擴散,而此層(a)則成為錫-銅擴散層。 另外’用以开少成此錫-銅擴散層的加熱,並不一定要By spreading copper on the ore tin layer ⑷31 thus formed, whisker formation can be prevented. A method of diffusing steel on the ore tin layer ⑷31 includes a method of simultaneously heating the tin plating layer ⑷31 and the wiring pattern. At this time, the second degree is usually 70i 200t, preferably 100 to 15 generations, and the time between heating is also determined by the thickness of the mineral tin ', but it is usually 30 seconds to 120 minutes, and preferably 30 minutes. To 60 minutes. By heating in this way, copper diffusion is formed on the tin plating layer ⑷31 originally formed of tin and containing substantially no other metal, and this layer (a) becomes a tin-copper diffusion layer. In addition, it is not necessary to heat the tin-copper diffusion layer.

在此進行,在塗佈下一個抗焊劑之後,至使抗焊劑2〇硬 化用之加熱的時間為短時’亦可在使抗焊劑2 〇硬化時加 經濟部智慧財產局員工消費合作社印製 熱之。此情況中之鍍錫層(a)3 1,係有鋼擴散的鍍錫層 (a)31 〇 如此地在有銅擴散的鍍錫層(a)3i或是有銅擴散之鍍 錫層(a)31上塗佈抗焊劑20。此抗焊劑2〇,係以使用具有 高耐熱性之熱硬化性樹脂為佳,通常雖可使用如環氧樹 脂、聚亞醯胺、胺基曱酸乙酯的熱硬化性樹脂,但是亦可 使用紫外線感光型的抗焊劑。如此的抗浑劑,會對上述形 成之有銅擴散的(或是可擴散的)鍍錫層(a)3i及絕緣膜10 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐 12 310966 48()766 A7 五、發明說明(I3 ) 顯不良好的黏著性。如此的抗焊劑,例如係利用網版印刷 技術塗佈於鐘錫層⑷31之表面上。但是,配線圖案3〇之 電接合部及其附近,此種的抗焊劑2〇並未被塗佈。此抗 焊劑20之塗佈厚度,通常為5至5〇# m,較佳者為切至 4〇“m之範圍内。藉由將抗焊劑塗佈成如此的厚度,就可 以物理性保護配線圖案,同時可更確實配線圖案間之電絕 緣性。 如此在塗佈抗焊劑之後,若為加熱硬化性樹脂之情 形,則加熱使此抗焊劑硬化。使此抗焊劑硬化用的加熱溫 度,雖亦依所使用之抗焊劑種類而異,但是通常為1〇〇至 18〇°C,較佳者為130至16〇t,而加熱時間通常為扣分 鐘至180分鐘,較佳者為6〇分鐘至12〇分鐘。又,為了 要防止抗焊劑中之間隙發生,亦可依階段性地使加熱溫度 上升的加熱步驟(步進硬化,step cure)來加熱。又,在進 行此種乾燥時,可採用真空乾燥法、紅外線乾燥法等。如 上述在利用乾燥時之加熱,使抗焊劑2〇充分硬化,同時 鍍錫層(a)3 1也被加熱,而更進一步進行銅之擴散。 然後,在塗佈上述抗焊劑之前而未進行加熱處理時, 亦可將使此抗焊劑硬化時的加熱條件,當作使抗焊劑硬仆 之適合的加熱條件以使抗焊劑硬化之後,進而連續進行仴 進銅擴散用的加熱處理 如上述在塗佈抗焊劑20並使之硬化之後,在本發明 中係在未塗佈抗焊劑2〇部分之配線圖案表面上再次施 鍍錫。 本紙張尺度適时國1^準(CNS)A4規格咖χ观公髮) 13 310966In this process, after the next solder resist is applied, the heating time for curing the solder resist 20 is short. It can also be printed by the employee ’s consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs when the solder resist 20 is cured. Hot. In this case, the tin plating layer (a) 31 is a tin-plated layer (a) 31 having steel diffusion, and thus a tin-plated layer (a) 3 i having copper diffusion or a tin-plating layer having copper diffusion ( a) 31 is coated with solder resist 20. This solder resist 20 is preferably a thermosetting resin having a high heat resistance. Although a thermosetting resin such as an epoxy resin, a polyimide, or an amino amino acid can be used, it is also possible to use the same. Use a UV-sensitive solder resist. Such anti-turbidity agent will affect the copper-diffused (or diffusible) tin-plated layer (a) 3i and insulating film formed as described above. This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm). 1212 310966 48 () 766 A7 V. Description of the invention (I3) The adhesiveness is not good. Such a solder resist is, for example, coated on the surface of the bell tin layer ⑷31 by screen printing technology. However, the wiring pattern 3 〇Electric joint and its vicinity, such a solder resist 20 is not coated. The coating thickness of this solder resist 20 is usually 5 to 50 mm, preferably cut to 40 mm Within this range, by applying the solder resist to such a thickness, the wiring patterns can be physically protected, and the electrical insulation between the wiring patterns can be more assured. In this way, after the solder resist is applied, if it is a thermosetting resin In this case, the flux is hardened by heating. Although the heating temperature used to harden this flux varies depending on the type of flux used, it is usually 100 to 180 ° C, preferably 130. To 160t, and the heating time is usually from 180 minutes to 180 minutes, preferably It is 60 minutes to 120 minutes. In addition, in order to prevent the occurrence of gaps in the solder resist, heating may be performed in a step (step cure) in which the heating temperature is increased stepwise. Here, it is performed here. In the case of drying, a vacuum drying method, an infrared drying method, etc. can be used. As described above, the solder resist 20 is sufficiently hardened by the heating during drying, and at the same time, the tin plating layer (a) 31 is also heated, and copper is further processed. Then, when the above solder resist is applied without heat treatment, the heating conditions when the solder resist is hardened may be regarded as a suitable heating condition for the hard solder resist to harden the solder resist. Further, the heat treatment for infiltrating copper diffusion is continuously performed as described above. After the solder resist 20 is applied and hardened, tin plating is applied to the surface of the wiring pattern where the solder resist 20 is not applied in the present invention. The size of this paper is in line with China Standard 1 ^ (CNS) A4 size coffee (viewing public) 13 310966

Μ.------ (請先閱讀背面之注意事項再填寫本頁) 訂·- •線- 486766 A7 五、發明說明(l4 ) 此鍍錫層(b)3 3實質上並不含有錫以外之金屬成分, 此點與上述有銅擴散之鍍錫層(a)3 1不同。 如此所形成之鍍錫層(b)33的厚度,通常為〇 〇1至〇 5 #111’較佳者為0.1至〇5//m,更佳者為〇1至 之範圍内。在本發明中係將利用無電解電鍍法形成如此薄 層的鍍錫層(b)33記載為快速電鍍(flash plating)。藉由將 此鍍錫層(b)33之厚度設在上述範圍内,就可進行確實的 接合’同時不會發生電鍍不良,且不易發生短路。 另外’當抗焊劑為紫外線感光型之光抗焊劑時,在利 用網版印刷技術於鍍錫層表面塗佈抗焊劑之後,進行 暫時乾燥,對被覆部分和電鍍部分之圖案曝光並進行顯 影,進而加熱以提高鍍錫層和光抗焊劑之密接性。此 時,加熱溫度,通常為100至18(rc,較佳者為13〇至16〇 。(:,而加熱時間通常為40分鐘至12〇分鐘,較佳者為6〇 分鐘至90分鐘。 鍍錫層(b)33為上述有銅擴散的鍍錫層(a)之表面,係 形成於未被覆抗焊劑20之表面上。亦即,在本發明之電 子零件組裝用膜狀載置帶中配線圖案未塗佈抗焊劑的部 分’尤其疋引線部分,係在由銅箔所形成之配線圖案3 〇 表面,形成有銅擴散的鍍錫層(a)3l,進而在此有鋼擴散 的鍍錫層(a)31表面,形成實質上不含有鋼的鍍錫層 (b)33 。 形成於由上述鋼所形成之配線圖案之一表面上的有鋼 擴散的鍍錫層(a)和實質上不含有銅的鍍錫層(…之合計厚 本紙張尺度適用中國國家標準(CNS)A4規格(21Q X 297公餐)" '' ---— —- 一 14 310966 (請先閱讀背面之注意事項再^寫本頁) 111111. #· 經濟部智慧財產局員工消費合作社印製 486766 經濟部智慧財產局員工消費合作社印製 A7 _ B7__ 五、發明說明(15 ) 度[(a)+(b)] ’通常為還之範〜圍」5,較佳者為 〇·2至〇.6/zm之範圍内,更佳為〇4至〇5/ζιη之範圍内。 如上述藉由利用快速電鍍以形成薄層的鍍錫層 (b)33 ’即可大致上完全防止來自配線圖案之鬚晶成長。 此鍍錫層(b)3 3實質上係由錫所形成,在組裝具有金凸塊 電極(gold bump electrode)的元件時,此時錫和金係形成 共晶化合物而凸塊電極和配線圖案30(引線),則可既強固 又確實地接合。 而且,在利用快速電鍍術形成鍍錫層(b)時,由於抗 焊劑,會與有銅擴•散的鍍錫層(a)強固接合,且鍍錫層(a)31 和抗焊劑20會強固黏著,所以大致不會發生電鍍液侵入 至抗焊劑20下面與鍍錫層(a)上面之間,而且即使電鍍液 暫時知入此間’由於配線圖案30之表面,係由鍍錫層(api 所被覆而銅沒有露出,所以不會因已侵入的電鍍液而形成 局4包池,因而,右依據本發明,則在習知之電子零件組 裝用膜狀載置帶上不會發生鍍錫時的挖開部(孔蝕)35,且 不易發生引線破斷等情事。 如此地利用快速電鍍術以形成鍍錫層(b)33,大致上 就可永久地防止錫鬚晶之產生。 此時與鍍錫層(a)31不同,在此鍍錫層(b)33上沒有必 要進行加熱處理,由於在配線圖案上,形成有鍍錫層 (a)31,且在此鍍錫層(a)31上有鋼擴散,所以若為短時間, 則利用此鍍錫層(a)31就可控制鬚晶之成長,且即使在塗 佈其後之抗焊劑及利用快速電鍍術以形成鍍錫層(b)33之 國家標準(CNS)A4 規格(2Κ) X 297 公ϋ-~ -- 15 310966 ^--------^---------線 (請先閱讀背面之注意事項再填寫本頁) 486766 A7 經 濟 部 智 慧 財 產 局 消 費 合 作 社 印 製 五、發明說明(16 ) 前有某程度的時間亦不會使電子零件組裝用膜狀載置帶之 性能降低。因而,若依據本發明,則製造步驟之管理就會 變得容易。 另外,此純鍍錫層(b)3 3通常雖可以一次之電鍍處理 步驟製造,但是為了形成此鍍錫層(b)33亦可將電鍍處理 步驟分成數次來進行。因而,在此情況時鍍錫層(b)33就 會成為複數個鍍錫層之複合體。 由如此所形成之有銅擴散的鍍錫層(a)和實質上不含 有銅的鍍錫層(b)所構成的本發明之電鍍層,與習知之鍍 錫層’就可利用X線折射法、AES分析法第予以區別。 例如’當利用X線折射法,測定層中之Cu3Sn和Cu6Sn5 之X線折射強度時,本發明之電子零件組裝用膜狀載置 ▼中的電鍍層通常在1: 〇·3至〇·5之範圍内,相對於此, 習知之電鍍層在1: 1至15之範圍内。若依據AES分析 法,則可確認在本發明之電鍍層表面附近,為純鍍錫層, 相對於此,在習知之電鍍層中,鋼係擴散至表面附近。 本發明之電子零件組裝用膜狀載置帶,較佳者係利用 上述方法所形成,係在絕緣膜上黏貼銅箔,並蝕刻此銅箔 而可形成所希望之配線圖案的電子零件組裝用膜狀載置 帶,在此配線圖案之大致全體上形成有銅擴散的鍍錫層 (a),即可在除了此配線圖案之端子部分以外之預定位置 上形成由抗焊劑之硬化體所形成的保護層,同時可在此端 子部分上有銅擴散的鍍錫層(a)表面形成實質上不含有銅 的鑛錫層(b),進而可在不損其特性之範圍内進行各種改 本紙張尺度適用中關家標準(CNS)A4規格⑵〇 x 297公餐)----------- 1^ ί 1 (請先閱讀背面之注音?事項寫本頁} %裝 寫太 ·1111111«Μ .------ (Please read the notes on the back before filling this page) Order ·-• Wire-486766 A7 V. Description of the invention (l4) This tin plating (b) 3 3 does not contain The metal component other than tin is different from the above-mentioned tin-plated layer (a) 31 having copper diffusion. The thickness of the tin-plated layer (b) 33 formed in this manner is usually from 0.001 to 0.05 # 111 ', preferably from 0.1 to 0.05 // m, and more preferably from 0.001 to. In the present invention, the tin plating layer (b) 33 formed by such an electroless plating method is described as flash plating. By setting the thickness of the tin-plated layer (b) 33 within the above-mentioned range, it is possible to perform reliable bonding ', and at the same time, there is no occurrence of poor plating and short-circuiting is unlikely to occur. In addition, when the solder resist is an ultraviolet light-sensitive photo solder resist, after applying the solder resist on the surface of the tin plating layer by screen printing technology, temporarily drying it, exposing and developing the pattern of the covered portion and the plated portion, and further developing Heating to improve the adhesion between the tin plating layer and the photoresist. At this time, the heating temperature is usually 100 to 18 (rc, preferably 13 to 16). (:, And the heating time is usually 40 minutes to 120 minutes, preferably 60 minutes to 90 minutes. The tin plating layer (b) 33 is the surface of the above-mentioned copper-plated tin plating layer (a), and is formed on the surface not covered with the solder resist 20. That is, the film-shaped mounting tape for electronic component assembly of the present invention The portion of the wiring pattern that is not coated with solder resist, especially the lead wire portion, is formed on the surface of the wiring pattern 30 formed of copper foil, and a copper-diffused tin plating layer (a) 3l is formed. On the surface of the tin plating layer (a) 31, a tin plating layer (b) 33 which does not substantially contain steel is formed. A tin-plated layer (a) having a steel diffusion formed on one surface of a wiring pattern formed of the above-mentioned steel and Tin plating that does not contain copper (the total thickness of this paper is applicable to the Chinese National Standard (CNS) A4 specification (21Q X 297)) " '' ----- ----14 310966 (Please read first (Notes on the back ^ write this page again) 111111. # · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy 486766 Economy Printed by A7 _ B7__ of the Intellectual Property Bureau's Consumer Cooperative Fifth, the description of the invention (15) degrees [(a) + (b)] 'usually the range of return ~ Wai'5, the better is 0.2 to 0.6 Within the range of / zm, more preferably in the range of 〇4 to 〇5 / ζιη. As described above, by using rapid plating to form a thin layer of tin plating layer (b) 33 ', it is possible to substantially completely prevent the Whiskers grow. This tin-plated layer (b) 3 3 is essentially formed of tin. When assembling a component with a gold bump electrode, the tin and gold system form a eutectic compound and bumps. The electrode and the wiring pattern 30 (lead wire) can be firmly and surely bonded. In addition, when the tin plating layer (b) is formed by the rapid plating technique, the tin plating layer with copper diffusion and dispersion due to the solder resist ( a) Strong bonding, and the tin plating layer (a) 31 and the solder resist 20 will be strongly adhered, so that the plating solution will not invade between the solder resist 20 and the tin plating layer (a), and even if the plating solution is temporarily Knowing this, 'Because the surface of the wiring pattern 30 is covered with a tin plating layer (api and the copper is not exposed, it is not Since a 4-pack cell is formed due to the invading plating solution, according to the present invention, the cut-out portion (pitting corrosion) at the time of tin plating does not occur on the conventional film-shaped mounting tape for electronic component assembly 35 In addition, it is difficult to cause lead breakage, etc. By using the rapid electroplating technique to form the tin plating layer (b) 33, the generation of tin whisker crystals can be substantially prevented permanently. At this time, it is different from the tin plating layer (a) 31. It is not necessary to perform a heat treatment on the tin plating layer (b) 33. Since the tin plating layer (a) 31 is formed on the wiring pattern, and steel is diffused on the tin plating layer (a) 31, if For a short time, the use of this tin plating layer (a) 31 can control the growth of whiskers, and even after coating the subsequent solder resist and using rapid plating to form the national standard of tin plating layer (b) 33 ( CNS) A4 size (2K) X 297 male ϋ- ~-15 310966 ^ -------- ^ --------- line (please read the precautions on the back before filling this page) 486766 A7 Printed by Consumer Cooperatives, Bureau of Intellectual Property, Ministry of Economic Affairs V. Invention Description (16) There will be a certain period of time before the film-like loading of electronic parts is carried out The performance with reduced. Therefore, according to the present invention, management of manufacturing steps becomes easy. In addition, although the pure tin plating layer (b) 3 3 can usually be produced by one electroplating process step, in order to form the tin plating layer (b) 33, the electroplating process step can be divided into several times. Therefore, in this case, the tin plating layer (b) 33 becomes a composite of a plurality of tin plating layers. The electroplated layer of the present invention consisting of the tin-plated layer (a) with copper diffusion and the tin-plated layer (b) which does not substantially contain copper, and the conventional tin-plated layer can be used for X-ray refraction. Distinguish between method and AES analysis. For example, when the X-ray refraction intensity of Cu3Sn and Cu6Sn5 in the layer is measured by the X-ray refraction method, the plating layer in the film-like placement ▼ of the electronic component assembly of the present invention is usually 1: 0.3 to 0.5 Within this range, in contrast, the conventional plating layer is in the range of 1: 1 to 15. According to the AES analysis method, it can be confirmed that the vicinity of the surface of the plating layer of the present invention is a pure tin plating layer. In contrast, in the conventional plating layer, the steel system diffuses to the vicinity of the surface. The film-shaped mounting tape for electronic component assembly of the present invention is preferably formed by the above-mentioned method, and is used for electronic component assembly for forming a desired wiring pattern by attaching a copper foil to an insulating film and etching the copper foil. A film-shaped carrier tape is formed with a copper-diffused tin plating layer (a) on substantially the entire wiring pattern, and a hardened body of a solder resist can be formed at a predetermined position other than the terminal portion of the wiring pattern. At the same time, the tin-plated layer (a) with copper diffusion on the terminal part can form a mineral tin layer (b) that does not contain copper, and various modifications can be made within the range that does not impair its characteristics. Paper size is applicable to Zhongguanjia Standard (CNS) A4 size ⑵〇x 297 meals) ----------- 1 ^ ί 1 (Please read the note on the back first? Matters written on this page}% Package Too1111111 «

486766 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(Π ) 變。 ' 例如,以銅vl而言,不僅可使用銅箔,亦可使用銅合 金箔,而鍍錫則雖以純鍍錫為佳,但是該等之鍍錫層中, 以不損其特性之範圍内含有其他的金屬。 在本發明之第一電子零件組裝用膜狀載置帶上,雖係 形成有如上述在配線圖案之大致全面上有銅擴散的鍍錫層 (a)(本發明有時只記載為「銅擴散鑛錫層⑷」)和在此銅 擴散鍍錫層⑷之端子部分表面上實質上不含有銅的鍍錫 層(b)(本發明有時只記載為「純鍍錫層(b)」,但是在本發 明之第二電子零件組裝用膜狀載置帶形成有在配線圖案之 大致全面上銅含有率從銅擴散鍍錫層(a)朝向純鍍錫層 逐漸降低的銅•錫含有區域。 此銅•錫含有區域’係以銅濃度逐漸朝純鍍錫層(b) 降低的方式含有銅。此銅•錫含有區域,係在被銅擴散鍛 錫層⑷電鑛的純鍵錫層(b),使銅從此銅擴散鍍錫層⑷遷 移至純鍍錫層(b)之方式,與純鍍錫層(b)連續形成。 在此第二電子零件組裝用膜狀載置帶中,絕緣膜、黏 著劑層、抗焊劑、配線圖案,係與第!圖中所示者相同。 形成於此配線圖案上之銅擴散鍍錫層(&),也與上述 第1圖所示者相同’在塗佈抗焊劑之前,藉由在利用蝕刻 術所形成之配線圖案表面進行鍍錫而形成者。如此銅擴散 鍍錫層(a),在鍍錫之後其形成成分雖幾乎為錫,但是利 用塗佈抗焊劑並使之硬化時的加熱等,以形成端子的銅就 會擴散至此鍍錫層(a)上,而此層就成為鋼擴散鍍錫層(&)。 卜紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -----486766 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of Invention (Π). '' For example, in terms of copper vl, not only copper foil but also copper alloy foil can be used, while tin plating is preferably pure tin plating, but in the range of such tin plating layers, the characteristics are not impaired. Contains other metals. The film-shaped mounting tape for assembling the first electronic component of the present invention is formed with a tin-plated layer (a) having copper diffusion over substantially the entire surface of the wiring pattern as described above (the present invention may be described only as "copper diffusion"). Mineral tin layer ⑷ ") and a tin plating layer (b) which does not substantially contain copper on the surface of the terminal portion of this copper diffusion tin plating layer ((the present invention is sometimes only described as" pure tin plating layer (b) ", However, the second film-shaped mounting tape for electronic component assembly of the present invention has a copper-tin-containing area where the copper content rate gradually decreases from the copper diffusion tin plating layer (a) toward the pure tin plating layer over substantially the entire wiring pattern. This copper-tin-containing area 'contains copper in such a way that the copper concentration gradually decreases toward the pure tin-plated layer (b). This copper-tin-containing area is located in the pure bond tin layer of the electric ore, which is a tin layer that is diffused by copper. (B) The method of transferring copper from the copper diffusion tin plating layer ⑷ to the pure tin plating layer (b) is formed continuously with the pure tin plating layer (b). In this second film-shaped mounting tape for electronic component assembly, The insulating film, adhesive layer, solder resist, and wiring pattern are the same as those shown in the figure! The copper diffusion tin plating layer (&) on this wiring pattern is also the same as that shown in the above-mentioned figure 1. 'Before applying the solder resist, tin plating is performed on the surface of the wiring pattern formed by etching. Former. Although the copper diffusion tin plating layer (a) has almost a tin composition after tin plating, the copper used to form the terminals is diffused to this plating by heating when a solder resist is applied and hardened. On the tin layer (a), and this layer becomes the steel diffusion tin plating layer. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -----

17 310966 (請先閱讀背面之注意事項再填寫本頁) 486766 A717 310966 (Please read the notes on the back before filling this page) 486766 A7

•螬 (再太 --------訂-------- (請先閱讀背面之注意事項再^本頁) 18 310966 4〇6766 五、發明說明(19) 挖開部,同時可抑制鬚晶之發生。 、雨a ^、屯鍍錫層(b)之厚度,係與上述第!圖所示者相同 =…0·01至05/" m ’較佳者為01至0·5/ζ m,更佳者 # 至〇·3# m之範圍内。將此純鍍錫層(b)之厚度設在 ^範圍内,即可進行確實的接合,同時不會發生電鍍7 大致可疋全防止鬚晶之發生,且不易發生短路。 本發明之電子零件組裝用膜狀載置帶,係如上所述, ,、有鋼擴散鍍錫層⑷、鋼·錫含有區域及純鍍錫層(b), 而其各層的厚度則可者廢甘 考慮〃作用效果而在上述範圍内適當 吞又疋之。 鋼擴散漠度逐漸降低之銅•錫含有區域的平均厚度, =為°.01至05…較佳者為〇.…々m,更佳者 為〇.1至0.3/Z m之範圍内。 在本發明如此之第二電子零件組裝用膜狀載置帶中, :擴散鍍錫層⑷、銅·錫含有區域、純鍍錫層(b)之合計 度’通常為〇·02至〇 一之範圍内,較佳者為0.03 範圍内,更佳者為〇2至〇—之範圍内, 再更佳為 0 · 4 至 al 之靶圍内。如此藉由形成鍍錫層, =使在^間距(flnepitch)之電子零件組裝用膜狀載置 ^亦可^接合之可靠度’而且藉由形成如此的鍵錫層 就可提高^線之機械強度,同時可完全防止鬚晶之發生, 而短路之發生率就可顯著降低。 [發明之效果] ^ *依據本發明之電子零件組裝用膜㈣則大 本紙張尺度適用中國國家標準(CNS)A4規格⑵〇 χ 297公爱) 486766 A7 五、發明說明(2〇 ) 可完全防止來自配線圖案之鬚晶成長,同時凸塊電極和配 線圖案可既強固又確實地接合。更且,若依據本發明,則 電鍍液幾乎不會侵入至抗焊劑下面與鍍錫層(a)之間,且 即使電鍍液暫時侵入至此間,由於配線圖案之表面,係為 鍍錫層(a)所被覆而銅沒有露出,所以不會發生習知之 捲帶中進行鍍錫之的挖開部(孔蝕)35,而本發明之電子零 件組裝用膜狀載置帶引線不容易發生破斷等現象。 在本發明之電子零件組裝用膜狀載置帶中,不易成長 鬚晶。 尤其是形成銅•錫含有區域之本發明的第二電子零件 組裝用膜狀載置帶大致可完全防止挖開部之發生,同時亦 可永久性地防止鬚晶之發生。 而且,若依據本發明之製造方法,則由於在製造中鬚 晶不會成長,所以製造步驟之管理就變得容易。 [實施例] 以下雖係顯示本發明之實施例且更進一步詳細說明本 發明’但是本發明並非依該等而被限定。 實施例1 在聚亞醯胺膜上形成由厚度18//111之銅箔所形成的 配線圖案。在此載置帶之配線圖案全面上形成厚度〇 4以 m之鍍錫層,且在125t下加熱處理6〇分鐘。其次,餘 留此配圖案之引線部分並對之塗佈抗焊劑,在8〇。〇下加 熱45分鐘,進而曝光8秒鐘,顯影4〇秒鐘之後,在15〇 °C下加熱60分鐘以使抗焊劑完全硬化。 310966 頁• 螬 (Fairy -------- Order -------- (Please read the notes on the back before ^ this page) 18 310966 4〇6766 V. Description of the invention (19) Excavation section At the same time, the occurrence of whiskers can be suppressed. The thickness of the rain a ^, the tin plating layer (b) is the same as the one shown in the figure above! ... 0 · 01 to 05 / " m 'The better is 01 to 0 · 5 / ζ m, more preferably # to 〇 · 3 # m. The thickness of this pure tin plating layer (b) can be set within the range of ^, and the actual bonding can be performed without The occurrence of electroplating 7 can almost completely prevent the occurrence of whiskers, and it is not easy to short-circuit. The film-shaped mounting tape for electronic component assembly of the present invention is as described above, and has a steel diffusion tin plating layer, steel and tin containing Area and pure tin-plated layer (b), and the thickness of each layer can be appropriately swallowed within the above range considering the effect of tritium. The average thickness of the copper-tin-containing area where the steel diffusion degree gradually decreases. , = Is from .01 to 05 ... preferably in the range of .0 ... m, and more preferably in the range of 0.1 to 0.3 / Z m. In the second embodiment of the present invention, the film-like mounting for the assembly of electronic parts In the belt,: Diffusion plating The total degree of the tin layer ⑷, the copper-tin-containing area, and the pure tin plating layer (b) is usually in the range of 0.02 to 〇1, preferably in the range of 0.03, and more preferably in the range of 0.02 to 〇- Within the range, it is more preferably within the target range of 0.4 to al. By forming a tin plated layer, the film-shaped mounting for electronic component assembly at a flnepitch is also reliable. Moreover, by forming such a bond tin layer, the mechanical strength of the wire can be improved, while the occurrence of whiskers can be completely prevented, and the incidence of short circuits can be significantly reduced. [Effects of the Invention] ^ * According to the invention The film for electronic component assembly is large in size. The paper size is applicable to the Chinese National Standard (CNS) A4 specification. 〇χ 297 公 爱 486766 A7 V. Description of the invention (2) It can completely prevent the growth of whiskers from wiring patterns, and simultaneously The bulk electrode and the wiring pattern can be firmly and surely bonded. Furthermore, according to the present invention, the plating solution hardly penetrates between the underside of the solder resist and the tin plating layer (a), and even if the plating solution temporarily penetrates there, the surface of the wiring pattern is a tin plating layer ( a) The covered copper is not exposed, so there is no digging (hole erosion) 35 of tinning in conventional coils, and the film-shaped mounting tape leads for electronic component assembly of the present invention are not easily broken. Off and other phenomena. In the film-shaped mounting tape for assembling electronic parts of the present invention, it is difficult to grow whiskers. In particular, the film-shaped carrier tape for assembling the second electronic component assembly of the present invention that forms a copper-tin-containing region can almost completely prevent the occurrence of a cutout, and can also prevent the occurrence of whiskers permanently. Furthermore, according to the manufacturing method of the present invention, since whiskers do not grow during manufacturing, management of manufacturing steps becomes easy. [Examples] Although the examples of the present invention are shown below and the present invention will be described in further detail, the present invention is not limited by these. Example 1 A wiring pattern made of a copper foil having a thickness of 18 // 111 was formed on a polyurethane film. A tin plating layer having a thickness of 4 μm was formed on the entire wiring pattern of the mounting tape, and heat treatment was performed at 125 t for 60 minutes. Next, the lead portion of this pattern is left and coated with solder resist at 80. It was heated at 0 ° C for 45 minutes and then exposed for 8 seconds. After 40 seconds of development, it was heated at 15 ° C for 60 minutes to completely harden the solder resist. 310966 pages

本紙張尺度適用中國國家標準(CNS)A4規格(21G x 297公爱) 486766This paper size applies to China National Standard (CNS) A4 specification (21G x 297 public love) 486766

A7 五、發明說明(η ) 如此使抗焊劑硬化之後,對露出0 2 # m厚度的引線 部分進行鍍錫,且在120°C下加熱處理60分鐘。 使用電子顯微鏡以觀察所得之電子零件組裝用膜狀載 置帶,結果在引線部分上沒有形成挖開部。並且,亦看不 到電鍍潛入抗焊劑下面的現象。 再者,看不到鬚晶在如此所形成的引線部中成長。 實施例2 在與實施例1同樣形成的載置帶之配線圖案全面上形 成厚度0.4/zm之鍍錫層,且在125t下加熱處理6〇分鐘。 其次’餘留此配線圖案之引線部分並對之塗佈抗焊劑,在 80°C下加熱45分鐘,進而曝光8秒鐘,顯彰4〇秒鐘之後, 在150°C下加熱60分鐘以使抗焊劑完全硬化。 如此使抗焊劑硬化之後,在露出0·2//ιη厚度的引線 部分上形成鍍錫層。 使用電子顯微鏡以觀察所得之電子零件組裝用膜狀載 置帶’結果在引線部分上並沒有形成挖開部。亦看不到電 鍍潛入抗焊劑下面的現象。 再者’經過長期間看不到鬚晶在如此所形成的引線部 中成長。 實施例 在與實施例1同樣形成的載置帶之配線圖案全面上形 成厚度0.2/zm之鍍錫層,且在125 °C下加熱處理60分鐘。 其次,餘留此配線圖案之引線部分並對之塗佈抗焊劑,在 80°C下加熱45分鐘,進而曝光8秒鐘,顯影40秒鐘之後, (請先閱讀背面之注意事項再填寫本頁)A7 V. Description of the Invention (η) After the solder resist is hardened in this way, the lead portion exposed to a thickness of 0 2 # m is tin-plated and heat-treated at 120 ° C for 60 minutes. Observation of the obtained film-shaped mounting tape for electronic component assembly using an electron microscope revealed that no cutout was formed in the lead portion. Also, the phenomenon that the plating sneaks under the solder resist is not seen. Furthermore, no whiskers were seen growing in the lead portions thus formed. Example 2 A tin plating layer having a thickness of 0.4 / zm was formed on the entire wiring pattern of the mounting tape formed in the same manner as in Example 1, and heat-treated at 125 t for 60 minutes. Next, 'lead the wiring part of the wiring pattern and apply solder resist, heat it at 80 ° C for 45 minutes, and then expose for 8 seconds, highlight 40 seconds, and then heat it at 150 ° C for 60 minutes to Allow the solder resist to harden completely. After the solder resist is hardened in this way, a tin plating layer is formed on the portion of the lead which is exposed to a thickness of 0.2 // m. Observation of the obtained film-shaped mounting tape for electronic component assembly using an electron microscope revealed that no cutout was formed in the lead portion. There was also no sign that the plating had penetrated under the solder resist. Furthermore, no whisker growth was observed in the lead portions thus formed over a long period of time. Example A tin plated layer with a thickness of 0.2 / zm was formed on the entire wiring pattern of the mounting tape formed in the same manner as in Example 1, and it was heat-treated at 125 ° C for 60 minutes. Secondly, leave the lead portion of this wiring pattern and apply solder resist, heat it at 80 ° C for 45 minutes, and then expose it for 8 seconds and develop it for 40 seconds. (Please read the precautions on the back before filling in this page)

經濟部智慧財產局員工消費合作社印製 本紙張尺度過用中國國家標準(CNS)A4規格(21〇 χ 297公釐 21 310966 經濟部智慧財產局員工消費合作社印製 M氏張尺度適用家標準(CNS)A4規格(210 X 297公¥" 22 ίου/υο 五、發明說明(22 在〇 C下加熱60分鐘以使抗焊劑完全硬化。 如此使抗焊劑硬化之後,對露出〇 4 A m厚度的弓I線 部分。 *使用電子顯微鏡以觀察所得之電子零件組裝用臈狀載 置帶,結果在引線部分上沒有形成挖開部。亦看不到電錢 潛入抗焊劑下面的現象。 再者,經過長期間看不到鬚晶在如此所形成的引線部 中成長。 實施例4 在與實施例1同樣形成的載置帶之配線圖案全面上形 ^厚度〇·2# m之鍍錫層。其次,餘留此配線圖案之引線 一刀並對之塗佈抗知劑,在8〇它下加熱分鐘,進而曝 光8矜鐘,顯影4〇秒鐘之後,在15(rc下加熱6〇分鐘以 使抗焊劑完全硬化, 如此使抗焊劑硬化之後,對露出〇 4 # m厚度的引線 部分進行鍍錫之後,在125t下加熱處理6〇秒鐘。 使用電子顯微鏡以觀察所得之電子零件組裝用膜狀載 置帶,結果在引線部分上並沒有形成挖開部。亦看不到電 鍍潛入抗焊劑下面的現象。 再者’經過長期間看不到鬚晶在如此所形成的引線部 中成長。 實施例5至1 〇 在與實施例1同樣形成的載置帶之配線圖案全面上以 ^記載之條件形成表1記載之厚度的鍍錫層(a), 310966Printed on paper by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The paper has been printed in accordance with the Chinese National Standard (CNS) A4 specification (21 × χ 297 mm 21 310966). CNS) A4 specification (210 X 297 cm ¥ 22) ίου / υο 5. Description of the invention (22 Heating at 0 ° C for 60 minutes to completely harden the solder resist. After hardening the solder resist in this way, the thickness of 0 4 A m is exposed. Part of the bow I line. * Using an electron microscope to observe the obtained 臈 -shaped mounting tape for assembling electronic parts, as a result, no cutout was formed on the lead portion. No phenomenon of electric money infiltrating the solder resist was observed. After a long period of time, no whisker grows in the lead portion thus formed. Example 4 The entire wiring pattern of the mounting tape formed in the same manner as in Example 1 is formed with a tin plating layer having a thickness of · 2 # m. Secondly, the lead of this wiring pattern was left one-knife and coated with an anti-knowledge agent, and heated at 80 ° C for a minute, and then exposed for 8 minutes, and after developing for 40 seconds, it was heated at 15 ° C for 60 minutes. So that the solder resist is finished After hardening, the solder resist is hardened in this manner, and then the exposed lead portion having a thickness of 0.4 m is tin-plated, and then heat-treated at 125 t for 60 seconds. The obtained film-shaped mounting tape for electronic component assembly was observed using an electron microscope. As a result, no cutout was formed on the lead portion. The phenomenon of plating infiltrating under the solder resist was not seen. Furthermore, 'whisker whiskers were not seen growing in the lead portion thus formed. Examples 5 to 1 〇 On the entire wiring pattern of the mounting tape formed in the same manner as in Example 1, a tin plating layer (a) having a thickness described in Table 1 was formed under the conditions described in ^, 310966

486766 A7 五、發明說明(23 ) 且在125C下加熱處理60分鐘。其次,與實施例1相同, 餘留此配線圖案之引線部分並對之塗佈抗焊劑且使之硬 化。 如此使抗焊劑硬化之後,在露出之引線部分上形成鍍 錫層(b)。如此在形成鍍錫層(b)之後,使用螢光X線,測 定鍍錫層(a)和鍍錫層(b)之合計厚度,並將結果顯示於表 1中。 使用電子顯微鏡以觀察所得之電子零件組裝用膜狀載 置帶,結果看不到鬚晶成長。亦看不到電鍍潛入抗焊劑下 面的現象。 [表1] 裝--- (請先閱讀背面之注意事項再填寫本頁) 訂.486766 A7 5. Description of the invention (23) and heat treatment at 125C for 60 minutes. Next, as in Example 1, the lead portion of this wiring pattern was left, and a solder resist was applied and hardened. After the solder resist is hardened in this way, a tin plating layer (b) is formed on the exposed lead portion. After the tin-plated layer (b) was formed in this manner, the total thickness of the tin-plated layer (a) and the tin-plated layer (b) was measured using fluorescent X-rays, and the results are shown in Table 1. Using an electron microscope to observe the obtained film-shaped mounting tape for assembling electronic parts, no whisker growth was observed. Nor did the plating sneak into the underside of the solder resist. [Table 1] Loading --- (Please read the precautions on the back before filling this page) Order.

經濟部智慧財產局員工消費合作社印製 表1 電鍍, 層⑷ 電鍍層厚 電鍍時間 電鍍溫度 電鍍層(a) 電錢層[(a)+(b)l (秒) (°C) m) (Am) 實施例5 1 30 0.023 0.542 ~ 實施例6 3 30 0.033 0.525 實施例7 1 45 0.041 0.543 ~ 飞施例8 3 45 0.044 0.543 實施例9 1 70 0.040 0.581 — 實施例10 3 70 0.043 0.598 •線. 在聚亞酿胺膜上形成由厚度18//m之鋼箔所形成的配 線圖案。在此載置f之配線圖案全面上形成厚度 之鍍錫層,其次,餘留此配線圖案之引線部分並對之塗佈 抗焊劑,在80°C下加熱45分鐘,進而曝光8秒鐘,顯影 40秒鐘之後’在150°C下加熱60分鐘以使抗焊劑完全硬 『氏張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐 310966 486766 A7 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 Γ-21---五、發明說明(24 ) 化’在進行此幹熱硬化時配線圖案中之銅會擴散至此鍍錫 層上而形成銅擴散鍍錫層(a)。 如此使抗焊劑硬化之後,在彳丨線部分上形成〇 4〇 # m 厚度鍍錫層’並藉由使之感熱,使鋼擴散鍍錫層(a)中之 銅的一部分及配線圖案中之銅移至由此所形成的鍍錫層 上,以形成厚度0.19//m的銅•錫含有區域。因而,此 電子零件組裝用膜狀載置帶中之純鍍錫層的厚度就為〇21 # m 〇此電子零件組裝用膜狀載置帶中之鋼擴散鍍錫層 (a)、銅•錫含有區域及純鍍錫層(1))的合計厚度則為〇 44 /z m 〇 另外,本發明之鍍錫層的合計厚度係使用螢光χ線 膜厚測定裝置加以測定。 使用電子顯微鏡以觀察所得之電子零件組裝用膜狀載 置帶,結果在引線部分上沒有形成挖開部。亦看不到電鍍 潛入抗焊劑下面的現象。 也看不到鬚晶在如此所形成的引線部中成長。 使用柯格爾膜厚測定裝置測定的純鍍錫層之厚度,為 〇 · 2 1 # m,使用螢光χ線膜厚測定裝置測定的鋼擴散鍍錫 層(a)、鋼•錫含有區域及純鍍錫層(b)的合計厚度,為〇料 //m’又如上述銅擴散鍍錫層之厚度由於為〇44 “瓜,所 以銅·錫含有擴散區域之厚度則為〇19仏^。 另外,此柯格爾臈厚測定裝置,係在鍍錫層之預定面 |積上滴下電解液予以進行電解,在電位上升的時點會停止 本紙張尺度適用中國國家標準(CNS)A4規格(2ig χ 297公爱)-—--__ 24 310966 請 先- 閱 讀· 背 面 之 注卜 意! 事| 項1Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Table 1 Plating, layer Plating layer thickness Plating time Plating temperature Plating layer (a) Electric money layer [(a) + (b) l (sec) (° C) m) ( Am) Example 5 1 30 0.023 0.542 ~ Example 6 3 30 0.033 0.525 Example 7 1 45 0.041 0.543 ~ Fly Example 8 3 45 0.044 0.543 Example 9 1 70 0.040 0.581 — Example 10 3 70 0.043 0.598 • Wire . Form a wiring pattern made of steel foil with a thickness of 18 // m on a polyurethane film. A tin plating layer having a thickness is formed on the entire wiring pattern on which f is placed. Secondly, the lead portion of the wiring pattern is left and a solder resist is coated thereon, and heated at 80 ° C for 45 minutes, and then exposed for 8 seconds. After 40 seconds of development ', heating at 150 ° C for 60 minutes to completely harden the solder resist. “The tensile scale is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm 310966 486766 A7. Employee Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs) Printed Γ-21 --- 5. Description of the invention (24) In the dry heat curing process, copper in the wiring pattern will diffuse onto this tin plating layer to form a copper diffusion tin plating layer (a). After the solder is hardened, a 0- 4 # m-thick tin plating layer is formed on the wire portion, and a portion of the copper in the steel diffusion tin plating layer (a) and the copper in the wiring pattern are moved to the heat by making it heat sensitive. The thickness of the pure tin-plated layer in the film-shaped carrier tape for this electronic component assembly is 〇21 # m on the tin-plated layer thus formed to form a copper-tin-containing area having a thickness of 0.19 // m. 〇Steel diffusion in the film-shaped carrier tape for electronic component assembly The total thickness of the tin layer (a), the copper-tin-containing area, and the pure tin-plated layer (1)) is 044 / zm. The total thickness of the tin-plated layer of the present invention is measured using a fluorescent X-ray film thickness. Device for determination. Observation of the obtained film-shaped mounting tape for electronic component assembly using an electron microscope revealed that no cutout was formed in the lead portion. Nor did the plating sink into the solder mask. It is also not seen that whiskers grow in the lead portions thus formed. The thickness of the pure tin-plated layer measured with a Kegel film thickness measuring device was 0.21 # m, and the steel diffusion tin-plated layer (a) and steel-tin-containing areas measured with a fluorescent x-ray film thickness measuring device The total thickness of the pure tin plating layer (b) is 0 material / m ', and the thickness of the above-mentioned copper diffusion tin plating layer is 〇44 ", so the thickness of the copper-tin-containing diffusion region is 019 mm. ^. In addition, this Kogel thickness measurement device is based on the electrolytic solution dripping on the predetermined surface of the tin plating layer to perform electrolysis. When the potential rises, it will stop. This paper scale applies the Chinese National Standard (CNS) A4 standard. (2ig χ 297 public love) ---__ 24 310966 Please read first-Note on the back! Matter | Item 1

訂 IOrder I

A7 五、發明說明(25 ) 電解動作,而從此時之每一單 、 资 母 面積的通電量中推筲你 :裝:從已測定之面積和錫之—錫層::度 在如上述所得的電子零件組裝 嫌 4^ „ ^ 衣用胰狀栽置帶不會發生 挖開邛,且在此電子零件組裝用 晶。 狀戰置帶上不會發生鬚 [圖式之簡單說明] 第1圖顯示本發明之電子零件組裝用膜狀載置帶中之 弓I線部分之截面例的截面圖。 第2圖顯示習知之電子零件組裝用膜狀載置帶中之引 線部分之截面例的截面圖。 第3圖為形成有挖開部之機制的說明圖。 [元件編號說明] 10絕緣臈 12黏著劑層 20抗焊劑 30配線圖案(銅箱) 31有鋼擴散之鍍錫層(a)(銅擴散鍍錫層(a)) 32 實質上不含有鋼之鍍錫層(b)(純鍍錫層(b)) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中_家標準(CNS)A4規格(21Q χ 297公爱) 25 310966A7 V. Description of the invention (25) Electrolytic action, and push you from the current of each order and the area of the mother's area at this time: install: from the measured area and the tin-tin layer: the degree is obtained as above 4 ^ „^ The pancreas-shaped mounting belt for clothing does not dig, and crystals are not used for the assembly of electronic components. No need to occur on the belt-shaped mounting belt [Simplified description of the drawing] Section 1 Fig. 2 is a cross-sectional view showing an example of a cross section of a bow I-line portion in a film-shaped mounting tape for electronic component assembly of the present invention. Sectional view. Figure 3 is an explanatory diagram of the mechanism with a cutout. [Element number description] 10 Insulation 臈 12 Adhesive layer 20 Solder resist 30 Wiring pattern (copper box) 31 Tin-plated layer with steel diffusion (a ) (Copper diffusion tin plating (a)) 32 Tin plating that does not substantially contain steel (b) (Pure tin plating (b)) (Please read the precautions on the back before filling this page) Intellectual Property of the Ministry of Economic Affairs Bureau of the Consumer Cooperatives printed this paper standard applicable _ house standard (CNS) A4 specifications (21Q χ 297 public love) 25 310966

Claims (1)

public I修正 '·、'·、、 第88119626號專^ 申請專利範圍修正本 (90年12月13曰) —種電子零件組裝用膜狀載置帶,係在絕緣膜上黏貝占銅 箱,並蝕刻該銅猪以形成所希望的配線圖案者;其特徵 為:在該配線圖案之大致全體上鍍錫以形成有銅擴散的 鍍錫層(a) ’該鍍錫層(a)平均厚度係在〇 〇1至〇 5以瓜 之範圍内;並在除了該配線圖案之端子部分以外之預定 位置上形成由抗焊劑之硬化體所形成的保護層,同時在 該端子部分有銅擴散的鍍錫層(a)表面形成實質上不含 有銅的鍍錫層(b),該鍍錫層(13)之平均厚度係在〇〇1至 〇,5/zm之範圍内。 Ί 如申清專利範圍第1項之電子零件組裝用獏狀載置帶, 其中形成於由上述銅所形成之配線圖案表面上之有銅 擴散的鍍錫層(a)和實質上不含有銅的鍍錫層(b)之合計 厚度’係在0.02至0·6 # m之範圍内。 經濟部中央標準局D貝工福利委:貝會印製 種電子零件組裝用膜狀載置帶,係在絕緣膜上黏貼鋼 箔,並蝕刻該銅箔以形成所希望的配線圖案者;其特徵 為:在該配線圖案之大致全體上鍍錫以形成有銅擴散的 錢錫層(a),並在除了該配線圖案之端子部分以外之預 定位置上形成由抗焊劑之硬化體所形成的保護層,同時 在該端子部分上具有有銅擴散的鍍錫層(a)及銅擴散濃 度從該有鋼擴散的鐘錫層(a)表面朝向實質上不含有銅 的鍍錫層(b)表面逐漸降低的鋼•錫含有區域,而該區 與事實上不含有銅之鍍錫層(b)連績形杰本; 艮尺ibf Ι3Π on rPr / ^ T ^. \ . \ ^ 7 ^ , ^ . . ^ 7 ^ v 1 310966 中,該鍍錫層⑷平均厚度係在至之範圍 内,該鍍錫層⑻之平均厚度係在〇 〇1至〇 5心之範擇 内。 4·如申請專利範圍第3項之電子零件組裝用膜狀載置帶 其中形成於由上述鋼所形成之配線圖案表面上之有銅 擴散的鑛錫層⑷、鋼•錫含有區域和實f上不含有銅 的錢錫層(b)之合計厚度,係在G.G2至G"m之範圍 内。 •一種電子零件组裝用膜狀載置帶之製造方法,其特徵 為:在絕緣膜上黏貼銅箔,並蝕刻該鋼箔以形成所希望 的配線圖案,且在該配線圖案全體上形成有銅擴散的平 均厚度在0·01至0.5/zm之範圍内之鍍錫層⑷之後,在 除了該配線圖案之端子部分以外之預定位置上塗佈抗 焊劑並使之硬化,而當該抗焊劑硬化之後,在配線圖案 之端子部分上再次進行鍍錫以形成實質上不含有銅的 平均厚度在0·01至G.5#m之範圍内之錢錫層(b),且在 塗佈抗焊劑之前,對配線圖案加熱8〇至i5〇t:。 6’如申清專利範圍第5項之電子零件組裝用膜狀載置帶之 製這方法,其中形成於由上述鋼所形成之配線圖案表面 上之有鋼擴散的鍍錫層(a)和實質上不含有鋼的鍍錫層 (b)之合計厚度,係在0.02至0‘6 # m之範圍内。 7· 一種電子零件組裝用膜狀載置帶之製造方法,係具有在 絕緣膜上黏貼銅箔,並蝕刻該銅箔以形成所希望的配線 圖案’之後在該被形成之配線圖案之大致全體上鍍錫, _ 且在除了該配線圖案之端子部分以外之預定部分上塗 本紙張;適用中國國緖準(CNS )A4規格(21〇χ 297公營) 2 310966 ΓΓ劑並使 子再次進行鑛錫的步驟,其特徵為: :子部分±形成有有鋼擴散的平均厚度在 r:m之範圍内之鐘錫層⑷,且在塗佈抗谭劑之 2配線圖案加熱80至150t;及銅 厂 =散的鑛錫層⑷表面朝向實質上不含有鋼的= 二:01至°·5㈣之範圍内之鑛錫層(b)表面逐漸降 2的銅•錫含有區域,而該區域係與事實上不含有= 鏡錫層(b)連續形成者。 8.ΠΠ,Γ7項之電子零件組裝用膜狀载置帶之 〜中上述銅擴散濃度逐漸降低 區,平均厚度’係在。·。….5…範圍:有 專利範圍第7項之電子零件兔裝用膜狀載置帶之 t二法,其中形成於由上述銅所形成之配線圖案表面 之有銅擴散的鐘錫層⑷和實質上不含有鋼的鍍錫声 (b)之合計厚度係在G.G2至0.6心之範圍内。 經濟部中央標準局員工福利委員會印製 10.如申請專利範圍第7項之電子零件組裝用臈狀載置帶 製k方法’其中上述銅擴散濃度逐漸降低的鋼•錫含 有區域鋼中之平均銅濃度,係低於有銅擴散的鑛錫層⑷ 中之平均鋼濃度者。I amended '·,' ,,, and No. 88119626 Patent Application Amendment (December 13, 1990) — a film-shaped mounting tape for electronic component assembly, which is attached to an insulating film to occupy a copper box. And etching the copper pig to form a desired wiring pattern; characterized in that tin plating is performed on substantially the entire wiring pattern to form a copper-diffused tin-plated layer (a) 'the average thickness of the tin-plated layer (a) It is within the range of 001 to 005; and a protective layer made of a hardened body of a solder resist is formed at a predetermined position other than the terminal portion of the wiring pattern, and at the same time there is copper diffusion in the terminal portion A tin-plated layer (b) containing substantially no copper is formed on the surface of the tin-plated layer (a), and the average thickness of the tin-plated layer (13) is in the range of 0.001 to 0.5 / zm. Ί For example, the 貘 -shaped mounting tape for assembling electronic parts according to item 1 of the patent scope, wherein the tin-plated layer (a) with copper diffusion formed on the surface of the wiring pattern formed of the above copper and substantially no copper The total thickness of the tinned layer (b) is in the range of 0.02 to 0.6 m. D. Baker Welfare Committee of the Central Standards Bureau of the Ministry of Economic Affairs: BEI will print film-shaped carrier tapes for assembling electronic components. Those who stick a steel foil on an insulating film and etch the copper foil to form a desired wiring pattern; It is characterized in that the entire wiring pattern is plated with tin to form a copper-diffused coin tin layer (a), and a hardened body made of a solder resist is formed at a predetermined position other than the terminal portion of the wiring pattern. The protective layer also has a tin-plated layer (a) having copper diffusion on the terminal portion and a copper-diffusion layer (a) having a copper diffusion concentration from the surface of the steel-plated bell tin layer (a) facing the tin-plated layer (b) not substantially containing copper. Steel and tin containing areas with gradually decreasing surface, and this area and the tin-plated layer that does not actually contain copper (b) are successively shaped gems; Genb ibf Ι3Π on rPr / ^ T ^. \. \ ^ 7 ^, ^.. ^ 7 ^ v 1 310966, the average thickness of the tin plated layer ⑷ is within the range of to, and the average thickness of the tin plated layer 系 is within the range of 0.001 to 0.05. 4. The film-shaped mounting tape for electronic component assembly as described in the scope of patent application No. 3, in which a copper-diffused mineral tin layer formed on the surface of a wiring pattern formed of the above-mentioned steel, steel, tin-containing areas, and solid f The total thickness of the copper-tin-free tin layer (b) is in the range of G.G2 to G " m. A method for manufacturing a film-shaped carrier tape for assembling electronic parts, characterized in that a copper foil is adhered to an insulating film, and the steel foil is etched to form a desired wiring pattern, and the entire wiring pattern is formed After the tin-plated layer 平均 having an average thickness of copper diffusion in the range of 0.01 to 0.5 / zm, a solder resist is applied and hardened at a predetermined position other than the terminal portion of the wiring pattern, and when the solder resist After hardening, tin plating is performed again on the terminal portion of the wiring pattern to form a tin layer (b) having an average thickness that does not substantially contain copper in the range of 0.01 to G.5 # m. Before soldering, the wiring pattern is heated at 80 to 50 ° :. 6 'The method of manufacturing a film-shaped carrier tape for assembling electronic parts according to item 5 of the patent application, wherein a tin-plated layer (a) having a steel diffusion formed on a surface of a wiring pattern formed of the above-mentioned steel is formed. The total thickness of the tin-plated layer (b) which does not substantially contain steel is in the range of 0.02 to 0'6 # m. 7. · A method for manufacturing a film-shaped carrier tape for assembling electronic parts, comprising attaching a copper foil to an insulating film and etching the copper foil to form a desired wiring pattern. Tin plated, and coated with paper on a predetermined portion other than the terminal portion of the wiring pattern; applicable to China National Standards (CNS) A4 specification (21〇χ 297 public) 2 310966 ΓΓ agent and make the child mine tin again Step, characterized in that: the sub-section ± is formed with a bell tin layer 钢 having an average thickness of steel diffusion within a range of r: m, and heating the wiring pattern 2 coated with anti-tanning agent 80 to 150t; and copper The surface of the ore tin layer that is scattered loosely does not substantially contain steel = 2: The surface of the ore tin layer in the range of 01 to ° · 5 ° (b) gradually decreases to 2 copper and tin containing areas, and this area is related to In fact does not contain = mirror tin layer (b) continuous formation. 8. The above-mentioned copper diffusion concentrations in the film-shaped mounting tapes for electronic component assembly of item ΠΠ, Γ7 are gradually reduced, and the average thickness is ′. ·. … .5… Scope: The t-two method of the film-shaped carrier tape for rabbit parts for electronic parts with the scope of patent No. 7, wherein a copper-diffusion bell tin layer formed on the surface of the wiring pattern formed by the copper The total thickness of the tin plating sound (b) which does not substantially contain steel is in the range of G.G2 to 0.6 center. Printed by the Staff Welfare Committee of the Central Bureau of Standards of the Ministry of Economic Affairs 10. Method for making k-shaped mounting tapes for assembling electronic parts such as in the scope of patent application No. 7 'Method in which the above-mentioned copper diffusion concentration gradually decreases in the steel containing tin area The copper concentration is lower than the average steel concentration in the tin ore layer with copper diffusion. 310966310966
TW088119626A 1998-05-11 1999-11-10 Film carrier tape for mounting electronic parts, and method for manufacturing the same TW486766B (en)

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JP12746298 1998-05-11
JP11056839A JP3061613B2 (en) 1998-05-11 1999-03-04 Film carrier tape for mounting electronic components and method of manufacturing the same

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JP2003037353A (en) * 2001-07-24 2003-02-07 Shindo Denshi Kogyo Kk Flexible circuit board and its manufacturing method
KR20010106298A (en) * 2001-08-28 2001-11-29 스템코 주식회사 A process of electroless Tin Double Plating at TAPE AUTOMATED BONDING and CHIP on Film
KR100448265B1 (en) * 2002-04-24 2004-09-10 스템코 주식회사 A process of Tin Double Plating at TAPE AUTOMATED BONDING and CHIP on Film
CN100338748C (en) * 2002-06-25 2007-09-19 晶强电子股份有限公司 Tape coiling and process for making it
US7425683B2 (en) 2002-07-03 2008-09-16 Mitsui Mining & Smelting Co., Ltd. Flexible wiring base material and process for producing the same
JP4618006B2 (en) * 2005-05-31 2011-01-26 凸版印刷株式会社 Manufacturing method of tape carrier tape for semiconductor mounting
JP4903723B2 (en) 2006-01-30 2012-03-28 京セラ株式会社 Wiring board and electronic device
JP4316627B2 (en) * 2007-03-07 2009-08-19 三井金属鉱業株式会社 Flexible wiring substrate, semiconductor device and manufacturing method thereof
US8168890B2 (en) * 2008-01-15 2012-05-01 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and component package having the same
JP5897637B2 (en) * 2014-04-30 2016-03-30 ファナック株式会社 Printed circuit board with improved corrosion resistance and manufacturing method thereof
JP2016023347A (en) * 2014-07-23 2016-02-08 イビデン株式会社 Printed-wiring board
JP2019521503A (en) * 2017-06-20 2019-07-25 ステムコ カンパニー リミテッド Flexible printed circuit board, electronic device including the same, and method of manufacturing flexible printed circuit board
JP2019075503A (en) * 2017-10-18 2019-05-16 住友電気工業株式会社 Printed wiring board and method of manufacturing the same
JP2020127054A (en) * 2020-05-14 2020-08-20 ステムコ カンパニー リミテッド Flexible printed circuit board, electronic device including the same, and method for manufacturing flexible printed circuit board

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