TW457674B - Aluminum leadframes for semiconductor devices and method of fabrication - Google Patents
Aluminum leadframes for semiconductor devices and method of fabrication Download PDFInfo
- Publication number
- TW457674B TW457674B TW089102917A TW89102917A TW457674B TW 457674 B TW457674 B TW 457674B TW 089102917 A TW089102917 A TW 089102917A TW 89102917 A TW89102917 A TW 89102917A TW 457674 B TW457674 B TW 457674B
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- layer
- tripod
- nickel
- aluminum
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Description
457674 A7 Β7 經濟部智慧財產局員工消費合作社印制π 五、發明說明(1 ) 發明領域 本發明-般的相半導體裝置及處理的領域,更特 定於材料與積體電路裝置的腳架製造。 5 相關技藝的說明 半導體裝置㈣架是發日妹(美_專利編鮮遍764 號以及第4〇搬7號)同時滿足半導體裝置及其操作的幾 個需求:第一,腳架提供穩定的支撐墊來堅固的定位半導 體晶片’通常疋積體電路(1C)晶片。因為含塾的腳架是由 10導電性材料做的’此墊可加以偏壓,如果需要,到包含半 導體裝置的網路所需要的任何電位,特別是地電位。 第二,腳架提供複數個傳導性的段來將不同的電導體 放置緊靠著晶片。在(”内部的")段的尖端以及IC表面上的 導體墊之間剩餘的間隙通常由細金屬線橋接,個別的結合 15 1C接觸墊以及腳架段。明顯的,線結合的技術暗示可靠的 焊接可以形成在(内部的)-段尖端上。 第三,與1C晶片(”外部的,,尖端)相距很遠的導線段端 點需要電氣的以及機械的連接到”其他零件”或是"外面的世 界",例如到組合印刷電路板。在壓倒性多數電子應用 20中,這項連接疋以悍接來完成的。明顯的,焊接的技術暗 示可靠的淋溼及焊接接觸可以在(外部的)段尖端上完成。 從溥(大約120到250 μιη)金屬片製作單一片腳架已經 是普遍實務。為了容易製作的原因,普遍選擇的起始金屬 為銅、銅合金、鎳鐵合金以及不變鋼。由鎳鐵合金(例如
89020A 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公楚) (請先閱讀背面之注項再填寫本頁) 裝------訂--------祕· 457G74 五、發明說明(2) 所謂的”合金42”)做的腳架大約比銅腳架貴六倍。希望的 腳架的形狀以蝕刻或按模型切割而得。以此方式,腳架的 個別段採用薄金屬長條形狀,而特定的幾何形狀由設計決 定。為符合大多的需求,典型段的長度明顯的長於寬度。 5 半導體製造的降低成本壓力開始搜尋以較低成本的材 料取代銅及合金42的腳架基礎金屬。早期建議選擇的鋁 不能解決突破穩定的問題,無所不在以及幾乎即刻的銘氧 化物。在1976年1月13日發出的美國專利第3932685號 (Flowers 的”Aluminum Stabilization Process and Stabilization 10 Solution therefor") ’說明用來半導體裝置組裝期間的線結 合之鋁腳架準備處理;然而,並未陳述用在焊接附著的準 備鋁腳架的困難問題。 經濟部智慧財產局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 在1986年8月5曰發出的美國專利第4604169號不 鐘鋼的中的電鑛處理(Shiga及其他者的”Process for Metal 15 Plating a Stainless Steel”)不適用於銘及過量的氧化物層。 銀層乃在半導體產品所不希望使用的(1985年7月16曰發 出的美國專利第4529667號,Shiga以及其它者的 "Silver-Coated Electric Composite Materials")。由電鍵方法 達成的抗腐蝕-在1986年7月22日發出的美國專利編號 20 第 4601958(Levine 的"Plated Parts and their Production")以 及1989年5月30日發出的美國專利第4835067(Levine的 "Corrosion Resistant Electroplating Process, and Plated Article")並不能轉換到鋁,因為所建議保護層無法附著至 鋁;那些專利的以鐵為基礎的合金(合金42及Kovar)為昂 -4- 本紙張尺度適用中國國家標準(CNS>A4規格(2】0 X 297公釐) 經濟部智慧財產局員工消費合作社印製 457674 A7 _ B7 五、發明說明(3) 貴的腳架材料。 在1986年8月5曰發出的美國專利第4604291號中 的產生鋁被覆腳架方法(Huang及其他者的”Method for
Manufacture of Aluminum-Coated Leadframe”)需要有高真 5空並因而對大量生產而言是不實際的;也並未陳述焊接附 著的問題。 在1998年8月18日發出的美國專利第5795619號 (Lin 及其他者的"Solder Bump Fabricated Method Incorporate with Electroless Deposit and Dip Solder")中所說 10明在矽晶片的鋁墊上製造焊接突塊的方法採用由利用新置 換溶液在鋁上形成鋅層開始的處理流程。接著浸泡在含鎳 及銅的酸性亞硫酸鹽溶液產生鎳銅燐層在此鋅層上。利用 焊劑’接下來浸泡在焊接物溶液中形成焊接合金做為矽晶 片上的焊接突塊。用此方法產生的鎳層富含銅(最高到 15 74%權重的銅)而易碎;如果此層應用在腳架上,將不適 用’因為腳架必須承受在焊接到印刷電路板的附著前的贊 曲及形成接腳的要求處理步驟。這個形成步驟需要具延展 性的接腳。再者,所說明的技術,如果應用在腳架上,將 不提供接腳腐蝕的保護而也不建議在用在腳架囊封在需要 20金屬對塑膠附著,低機械應力及腐蝕保護的鑄造混合物中 的半導體產品。 對以低成本、可靠大量生產且具鋁基底,延展性接腳 及同時可焊接與結合表面的腳架的方法產生緊急的需求。 此腳架與其製作方法應有足夠彈性來應用在不同的半導體 表紙張尺度適用中國國豕標準(CNS)A4規格(210 X 297公爱) ί請先閱讀背面之注意事項再填寫本頁) -— — — —I — I I I I — I — I 1 ^ '457674 A7 B7 五、發明說明(4 ) 產品家族及廣泛的設計及組裝變異性,並應玎達成改善處 理產量與裝置可靠性之目的改善。最好,這些創新玎利用 已女裝設備基礎來完成,這樣就不需要投資新的生產機 器。 5 發明概要 根據本發明對於一半導體積體電路(ic)腳架,銘以及 鋁合金用來做為起始材料,接著連續的沈積層包含鋅(提 供對鋁及對鎳的附著),電解鎳(隔離鋅鹽酸與電鍍溶液)’ 10選項的鎳合金(提供防止腐蝕),電鍍鎳(提供延展性即可焊 接性)’以及最外面的,惰性金屬(隔離鎳表面與氧化物)。 本發明相關於高密度ICs,特別是有大量數目輸入/輸 出’或接觸墊的那些,以及需要表面附著在印刷電路板組 件的封裝内裝置。這些ICs可以在許多的半導體裝置家族 15中找到,例如標準的線性及邏輯產品、處理器、數位及類 比裝置,高頻及高功率裝置,以及大型及小型面積的晶片 種類。本發明表示半導體封裝的明顯成本下降,特別是塑 膠鑄模封裝,相較於傳統的銅或鎳鐵合金腳架。 本發明之一觀點在提供技術來修改以銘為基礎腳架的 20表面以同時提供延展性及可焊接性,而不需要昂貴的製作 處理。這個觀點藉由以捲轴對捲軸至做為基礎的大量生產 處理而達成。 本發明的另一個觀點是不花費設備改變及新資金投資 而且利用已安裝的製造設備基礎來達成這些目標。 (請先閲讀背面之注意事項再填寫本頁) 裝 ----ί — 訂---!1- 經濟部智慧財產局員工消費合作社印製 本紙張尺度適財咖家標準(CNS)A4 297公爱) A7 B7 '457 6 7 4 五、發明說明(5) 本發明的另一個觀點是提供鋁腳架,如此以彎曲包裝 接腳及不需if·劑的焊接附著接腳部份(或只要非常輕微的 焊劑不需要沖洗步驟)為基礎成功的表面附著技術可以繼 續。半導體的最終使用者可以繼續採用已安裝的組裝設備 5 基礎。 本發明的另一個觀點是在微細間距結合定義的情形下 提供容易的可結合性。 本發明的另一個觀點是提供鋁腳架,所以可展現對使 用在塑膠封裝中的鑄模合成物的良好附著,因而防止溼氣 10 的進入與腐蝕,並也提供接腳的防止腐蝕。 這些觀點已由本發明敘示有關適於大量生產的材料選 擇及方法達成。不同的修改已被成功的採用。 在本發明的第一個具體實例令,鋁接腳是以藉由鎳與 連結電解鎳與電鍍鎳的貴金屬間的中間層所產生。 15 在本發明的第二具體實例中,鋁腳架的生產不需這個 中間層。 本發明代表的技術進步,以及其觀點,將從本發明的 較佳具體實例的下面說明變得明顯,在一併考慮到隨附圖 示及在後附申請專利範圍中描述的創新特色。 20 圖示簡述 圖I為根據本發明第一具體實例由鋁及連續的沈積層 做的腳架部份的概要橫切面圖。 圖2為根據本發明第二具體實例由鋁及連續的沈積層 本紙張尺度適用中_國家標準(CNS) Α4規格(21〇 X 297公釐) (請先閱讀背面之注意事項再填寫本頁)
i — II I I 訂.I I I I ί I 經濟部智慧財產局員工消費合作社印製 457674 A7 B7 10 15 五、發明說明(6) 做的腳架部份的概要橫切面圖。 圖3為根據本發明焊接組裝在基質上的具有腳架的半 導體裝置的概要及簡化橫切面圖。 較佳具體實例的詳細說明 本發明相關於將半導體ICs組裝在腳架上,這些腳架 的基礎材料以及製造這些腳架的處理以使得它們適合於半 導體組裝的需求。在今天的技術中,半導體的腳架是用銅 合金或鎳鐵合金做的。這些材料密度高(且昂貴p例如, 銅的密度9.1 g/cm3而Young’s模數為120 X 103 N /mm2 ’而熱膨脹速率17·6 ppm/°C。這些特性促成兩個問 題: ♦腳架基底材料高質量及成本; *矽晶片上的高熱機械應力位準以及焊接點在附著板 之中的高熱機械應力位準。 本發明將這些問題減到最少,藉由用銘取代銅做為半 導體腳架的基底材料。表1收集銅的重要特性並將之與銘 的特性比較。 -ϋ I— at ϋ · ϋ _^i I 訂---------丨 (請先閱讀背面之1意事項再填寫本頁> 經濟部智慧財產局員工消費合作杜印製 本紙張尺度適用中囤國家標準(CNS)A4規格(210 χ 297公釐) 467674 A7 Β7 五、發明說明(7) 表-1 屬 性 銅合金 鋁合金/ 密度(g/cm3) 9.1 ------- 2.8 〆 原始材料成本($/kg) 1.65 一---------- 1.32 〆 Young’s 模數 xlO (N/mm2) 120 72.5 / 最大張力(N/mm2) 550 410 _ 熱傳導(calcm/cm2s〇C) •625 ------------ .542 / 熱膨脹係數(ppm/°C) 17.6 24.7 _ 電化學電位(V) +0.52 — ---- -0.40」 經濟部智慧財產局員工消費合作社印製 ---— II !灯--- --- - - 如表1指示,密度及成本的優點額外的’而銘的較# 5 Young's模數有助於補償熱機械應力的較高的熱膨脈孫 數。在表1中銅及鋁的屬性比較顯示出鋁合金不只疋比銅 合金有效,並還有清楚的優點,特別有關成本(原始讨 料、重量、可鍛性等等)。粗略的,鋁的密度為銅的1/3, 並將減輕腳架基底材料的質量(重量)及成本。應力位乘在 10 鋁合金將會降低,因為熱膨脹係數乘以Young's模數小於 銅合金的。鋁的熱傳導近似於銅的熱傳導。假設典型的聊 架大小,鋁的較低電傳導擔任次級的角色,相較於不町避 免的傳導損失在薄的結合線。 本發明腳架的基底材料為鋁或鋁合金薄月,典塑的 15 100到250 厚度。這些薄片已經有量產的,例如,
Kaiser Aluminum 公司的"TennalunT部門,Jackson,TN, 美國。本發明的較佳材料是紹與猛的合金(3XXX系列,例 如3004,其中合金指定的位數指示出合金的調整)。其他 本紙張尺度適用中國國家標準(CNS)A4規格(210x297公楚〉 A7 B7
10 15 20 457674 五、發明說明(8 ) 的合金與例如,銅、石夕、猛及辞一起製作。這些銘及銘合 金薄片以不同的熱歷程做調節,例如回火、退火或拉緊硬 化,結果會有不同的硬度。很重要的本發明目的為銘與銘 ΐ金少5到10%的延長以便滿足外部段形成的需 求,,'為製造流程的最後處理步驟。 鋁做的腳架遵循銅腳架的相同設計觀念:通常,晶片 墊用來支援由有内部尖端接近晶片塾及遠 外部 尖端的1C晶片。 再者,銘腳架,類似於銅腳架,必須滿 的五項需求: 1) 腳架必須包含外段线來焊接畴到其他零件; 2) 腳架必須包含内段尖端來結合附著到拉線; 3) 腳架必觀含外段延展性來形纽彎曲此段; 4) 腳架表面必須包含附著到鑄模合成物;以及 5) 腳架段必須包含對腐蝕的不敏感性。 根據本發明的教示,需求υ藉由沈積一層的錄以及最 ㈣的貴金屬在IS表面上來加以滿足。纽貴金屬在焊接 操作中溶解,此焊接接合處是用錄表面做的而不是基底的 銘。穩固时制馳基底㈣理是本發 (參閲下面)。 本發明藉由選擇採用來滿足需求υ的責金屬來滿足需 求2) ◊ 本發明藉域求丨)的料 來滿足3)。本發明的一烟重要部份,如下面所見到的、:需籌 本紙張尺度適用f國國家標準 J —II 1---I H ^---!1# (請先閱讀背面之注意事項再填寫本頁) -10- 4 5 7 6*4 經濟部智慧財產局員工消費合作社印制农 A7 B7 五、發明說明(9) 的,需要以選擇性的合金中間層分隔成為兩個鎳層,來 確保延展性。 本發明藉選擇採用來滿足需求1)的貴金屬層來滿足 需求4)。 5 本發明藉由在鋁基底上的沈積層順序滿足需求5)。 在圖1中,根據本發明腳架部份的概要橫切面圖一 般的標示為100。鋁合金基底薄片101的較佳厚度範圍從 100到250μιη ;更薄的片是可以的。這個厚度範圍的延展 性提供段彎曲及形成操作所需要的5%到15%延長。此鋁 10 合金薄片首先浸入20t到90°C的鹼性預清洗溶液幾秒鐘 到最多3分鐘。藉之移除油及其他的污染物。 在清洗後,此薄片接著浸入室溫的酸性催化溶液幾 秒鐘到最多5分鐘。此溶液包含硝酸溶液或硝/硫酸溶 液,最好是大約30 g/Ι到60 g/Ι的濃度。這個溶液移除鋁 15 氧化物而留下金屬的鋁表面在活化的狀態下,準備好接 受金屬鋅的沈積。 在鋅的沈積,活性的銘或紹合金薄片浸入在鋅酸 鹽,例如”Bondal"溶液,CanningGumm 公司,Kearny, NJ, USA所量產的。此鋅鹽酸最好為大約15°C到50°C ;此浸 20 入持續幾秒鐘到大約5分鐘,並可以重複在分別的暴露 中》此鋅層(圖1的102)可以只是薄膜,但應該無中斷的 覆蓋鋁表面。它的功能只是建立下面的鎳層到鋁的可靠 附著。 第一錄層103的沈積是重要的,如此沈積溶液才不 11- 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) -----I--訂---------^ 457674 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明( 電化學的侵害鋅層^因此,第一鎳層必須以無電極電鍍法 鍍上,利用(更受控制及一致的)電鍍處理將損壞此鋅層。 大體上,此溶液介於-25及+60 °C而沈積持續從大約i到 10分鐘。以無電極電鍍法鍍上之鎳的厚度l〇3a最好在大 5約I25及750 nm之間,但非關鍵性。替代的,可以使用 驗性的有電極電鍍鎳製程。 在顯不在圖1中的本發明具體實例中,下一個沈積層 104為在鎳與從包含鈀、铑、金、銀及白金的群組所選出 的貴金屬間的合金,。此合金層以電鍍沈積並介於大約b 10到75 nm的厚度。其應該是附著的,因為它的主要目的是 防止腐蝕。以鎳/白金為基礎的合金層在1995年6月14 日發出的歐洲專利編號第0335608m號(Abb〇tt, "Leadframe with Reduced Corrosion”)中說明。 重要的105層是電鍍鎳,最好沈積厚度1〇5a大約在 15 〇·5到3 Mm。此鎳層必須有延展性以便可以適應腳架段彎 曲以及形成處理。再者,此錄表面必須在焊接處理中可以 弄溼的’如此焊接的合金或傳導性附著可以成功的使用。 兩鎳層以及薄鎳合金層的整個厚度106是在650到 4000 nm的範圍。 20 圖1中具體實例的最外層是107層,包含一從包含 把、姥、金及銀的群組所選出貴金屬電鍍層。如果希望其 與焊接物有最小的擴散,107層也可以包含白金。107層 的厚度最好在10及75nm之間;其主要目的在保護鎳表面 不致氧化。 -12- 泰紙張尺度適用中國國家標準(CNS)A4規格(2〗〇χ297公釐) -------------裝--------訂. (請先閱讀背面之注意事項再填寫本頁> 457674 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明(n) 在顯示在圖2概要橫切面圖中的本發明具體實例中, 腳架的鋁基底合金101再次由鋅層1〇2所保護,然而,電 解鎳層103’緊接著電鍍鎳層1〇5;此鎳合金層被忽略。 鎳層103及105的結合厚度1〇8可以在600到4000 nm之 5間的範圍。貴金屬的薄層107再次形成最外層。 在圖3的概要橫切面圖,本發明的鋁或鋁合金腳架 301顯示應用在一般標示為300的半導體封裝的組裝中。 腳架301有一晶片附著墊302,在其上IC晶片3〇3利用黏 性材料304附著(通常是環氧基樹脂或聚硫亞氨,其必須 10承受聚合化學程序)。腳架301還有複數個接線段305。這 些接腳段有第一端點305a接近晶片附著墊302及第二端 點305b遠離附著墊302。 如圖3圖解的顯示,腳架3〇1包含用鋁或鋁合金做的 基底306。在這個鋁表面上的是一連續的層,在圖i及圖 I5 2中詳述的。最接近紹的是鋅層307。這個層接著第一層 的鎳,用鎳與惰性金屬做的合金層,以及第二層的鎳。圖 3中,這些三層被組合並一般標示為3〇8。最外層由 貴金屬做的。如圖1及2中強調的,這個層順序的優點為 段端點305b以及腳架被保護不致腐蝕。 20 如上述,這個順序的層提供可靠的線結合,用來連接 晶片接觸墊與腳架段,圖3中,接合拉線31〇有球3ΐι接 合到晶片接觸墊以及焊接到腳架段305的責金屬表面3〇9 的細線312。替代的,球結合或焊接結合可以用做此段的 接觸點。此結合拉線係從包含金、銅、紹及其之合金的群 -13- 本紙張尺度適用中國國表標準(CNSXA4規格do x 297公愛) II 丨丨丨丨! II · I I I I I I 訂 — —— — — — I 1入 I (請先閱讀背面之注意事項再填寫本I> 467674 A? 五、發明說明
、,且中選出的。這些金屬的任_個均提供可靠㈣合接觸到 本發明的β鋁為基礎的腳架β 、如圖3中所不的,段3〇5的第二端點3〇%適合寶曲 以及成形’目為基底與電魏層的延祕。彻這個可 延展的特性,段305可以表面附著或任何半導體裝置的電 路板附著的其他技術所需要的任何形狀形成 。此段的彎曲 不會減弱第二段端點305b的腐蝕保護。例如,圖3指示 所'•胃的1¾翼形狀”的段305。廣泛的使用在IC封裝,以所 謂的”小外樞"組態’如圖3中說明的。 請 先 閱 讀 背 面 之
I I裝 頁I
I 訂 457 6 74 A7 _B7__ 五、發明說明(13) 明並不是架構在限制的意圖上。此說明性具體實例以及本 發明其他具體實例的不同修改及組合,對熟習本技藝的人 在參考此說明後將是很明顯的。如一範例,半導體晶片的 材料可以包含矽、矽鍺、鍺砷化物或任何其他用在製造的 5 半導體材料。另外一個範例,鋁或鋁合金腳架的製造方法 可加以修改,藉由沖洗步驟,重複沈積步驟或不同的材料 選擇來達成附著。因此企圖包含任何這種修改或隨附申請 專利範圍或具體實例。 ----------- -t--------訂. <請先閱1».背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210x297公釐)
Claims (1)
- AS B8 C8 m 經濟部智慧財產局員工消費合作社印製 457674 六、申請專利範圍 專利申請案第89102917號 ROC Patent Appln. No. 89102917 修正之申請專0範圍中文本-附件二 Amended Claims in Chinese - Enel. II 5 ^{90 Ψ5 W iS — (Submitted on May (5 , 2001) 1. 一種與積體電路晶片一起使用的腳架,其包含: 一有著修改表面來提供對鎳的附著的鋁或鋁合金 10 基底;以及 一有著適合附著至鋁的第一表面以及適合提供可 烊接性的第二表面的延展性鎳層。 2. 如申請專利範圍第1項的腳架,其中該修改的鋁或鋁 合金表面還適合於拉線結合。 15 3.如申請專利範圍第1項的腳架,其中該鋁或合金基底 的厚度在大約100到250 μιη之間。 4. 如申請專利範圍第1項的腳架,其令該鎳層的厚度介 於 500 及 3000 rnn。 5. —種與積體電路晶片一起使用的腳架,其包含: 20 用有辞表面層的鋁或鋁合金做的一腳架基底; 在該鋅層上的第一層鎳,該第一鎳層沈積來與鋁 及鋅相容; 一層的鎳與貴金屬的合金在該第一鎳層上; 在該合金層上的第二層鎳,該第二鎳層沈積來適 25 合接線彎曲及焊接附著;以及 最外層的貴金屬,藉之該腳架適合焊接附著至其 他零件,適合拉線結合,以及適合防止腐蝕。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) --I---- ----- ί;衣'-------訂---------'^ (請先閱讀背面之注意事項再填寫本頁) A8 B8 C8 Π8 457874 六、申請專利範圍 6. 如申請專利範圍第5項的腳架,其中該貴金屬層的厚 度介於10到250 nm之間。 7. 如申請專利範圍第5項的腳架,其中該合金層的厚度 介於25到75 nm之間。 5 8.如申請專利範圍第5項的腳架,其中該貴金屬從包含 金、銀、纪、鍵及白金的群組中選出。 9.如申請專利範圍第5項的腳架,其中該焊接附著包含 從包含錫/鉛混合物,錫/銦,錫/銀以及傳導性的附著 合成物之群組中選出的焊接材料。 10 10. —種與積體電路晶片一起使用的腳架,其包含: 用有鋅表面層的鋁或鋁合金做的一腳架基底; 在該鋅層上的第一層鎳,該第一鎳層沈積來與鋁 及辞相容; 在該第一層鎳上的第二層鎳,該第二鎳層沈積來 15 適合接線彎曲及焊接附著;以及 最外層的貴金屬,藉之該腳架適合悍接附著至其 他零件,適合拉線結合,以及適合防止腐蝕。 11. 一種半導體裝置,其包含: 一腳架,包含供積體電路晶片用的晶片附著墊以 20 及複數個接線段,其第一端點接近附著墊而其第二端 點遠離該附著墊; 用有鋅表面層的铭或紹合金做的,第一層的鎮、 鎳與貴金屬的合金層,第二層的鎳與最外層的貴金 屬; -17 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------------ 奸衣-------1訂---------'^ (請先闓讀背面之;i-意事項再填寫本頁) 經濟部智慧財產局員工消費合作杜印*''衣 A8 B8 C8 D8 457674 六、申請專利範圍 一附著至該附著墊的積體電路晶片; 互相連接該晶片與該接線段的該第一端點的結合 拉線;以及 該接線段的該第二端點適合於彎曲,適合焊接附 5 著於其他零件,以及適合防止腐蝕。 12. 如申請專利範圍第11項的裝置,其中該結合拉線是從 包含金、銀、銅、鋁與其之合金的群組中選出的。 13. 如申請專利範圍第11項的裝置,其中接觸到該接線段 的該近距離端點的此結合拉線包含以球結合、細線結 10 合或楔形結合的焊接。 14. 如申請專利範圍第11項的裝置,還有包圍該附著晶片 的囊封材料,結合拉線及該接線段的近距端點,讓該 接線段的遠方端點暴露。 15. 如申請專利範圍第14項的裝置,其中該囊封材料是從 15 包含適合用來附著該腳架的以環氧基樹脂為基礎的鑄 模合成物群組中選出的。 16. 如申請專利範圍第14項的裝置,還包含該第二端點彎 曲的接線段,藉之該接線段取得適合用來焊接附著至 其他部份的形式。 20 17.如申請專利範圍第16項的裝置,其中該線段彎曲並不 會減弱該第二段端點的防止腐蝕。 18. —種製造腳架的方法,包含步驟: 提供有給積體電路晶片用的附著墊之鋁腳架以及 複數個接線段; -18 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ----------- 裝·-------訂·--------^ ** (請先閱讀背面之注音?事項再填寫本頁) 經濟部智慧財產局員工消費合作杜印制衣 KW 經濟部智慧財產局員工消費合作杜印製 4 A8 BS 67 4_S_ 六、申請專利範圍 以鹼性溶液清潔該腳架; 將該腳架浸入酸溶液中,以活化該腳架表面; 將活化的腳架浸入鋅鹽酸電鍍溶液中,藉之溶解 任何的鋁氧化物並形成鋅層; 5 將該腳架浸入無電極電鍍法的鎳電鍍溶液中並沈 積第一層的錄在該鋅層上; 電鍍一包含鎳與貴金屬之合金的層; 電鍍第二層的鎳,藉之使該接線段適合機械的彎 曲;以及 10 電鍍一層貴金屬,藉之使該接線段適合用來焊接 附著到其他部份以及適合腐蝕。 19.如申請專利範圍第18項的方法,其中該第二鎳層的電 鍵是在選擇可產生具機械延展性錦層的電流密度中執 行的。 15 20.如申請專利範圍第18項的方法,其中處理步驟沒有時 間延遲的連續執行,還包含中間的清洗步驟。 21. —種製造腳架的方法,包含步驟: 提供有供積體電路晶片用的附著墊的一鋁腳架以 及複數個接線段; 20 以鹼性溶液清潔該腳架; 藉由浸入該腳架至酸溶液中活化該腳架表面; 將活化的腳架浸入到鋅鹽酸電鍍溶液中,藉之溶 解任何的鋁氧化物並形成鋅層; 將該腳架浸入無電極電鍍法的鎳電鍍溶液令並沈 -19 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) ------------^衣--------訂---------轉 *· (請先閱讀背面之注意事項再填寫本頁) 457674 韻 C8 * D8 六、申請專利範圍 積第一層的鎳在該鋅層上; 電鍍第二層的鎳,藉之使該接線段適合機械的彎 曲;以及 電鍍一層貴金屬,藉之使該接線段適合用來焊接 5 附著到其他部份以及防止腐蝕。 ------------^衣--------訂---------#1 Μ* <請先閱讀背面之注意事項再填寫本頁) 經濟即智慧財產局員工消費合作社印製 ο 2 本紙張尺度適用令國國家標準(CNS)A4規格(210 X 297公釐)
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TW089102917A TW457674B (en) | 1999-03-15 | 2000-02-21 | Aluminum leadframes for semiconductor devices and method of fabrication |
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US (1) | US6518647B1 (zh) |
EP (1) | EP1037277B1 (zh) |
JP (1) | JP2000269398A (zh) |
KR (1) | KR100710090B1 (zh) |
AT (1) | ATE519225T1 (zh) |
TW (1) | TW457674B (zh) |
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US6747343B2 (en) * | 2000-03-08 | 2004-06-08 | Texas Instruments Incorporated | Aluminum leadframes with two nickel layers |
WO2002056378A1 (en) * | 2001-01-11 | 2002-07-18 | Matsushita Electric Industrial Co., Ltd. | Circuit board and production method therefor |
US6703069B1 (en) * | 2002-09-30 | 2004-03-09 | Intel Corporation | Under bump metallurgy for lead-tin bump over copper pad |
US7134197B2 (en) * | 2003-12-18 | 2006-11-14 | Honeywell International Inc. | Plastic lead frames utilizing reel-to-reel processing |
US7608916B2 (en) * | 2006-02-02 | 2009-10-27 | Texas Instruments Incorporated | Aluminum leadframes for semiconductor QFN/SON devices |
US20070197922A1 (en) * | 2006-02-17 | 2007-08-23 | Honeywell International Inc. | Disposable pressure sensor systems and packages therefor |
US20070216033A1 (en) * | 2006-03-20 | 2007-09-20 | Corisis David J | Carrierless chip package for integrated circuit devices, and methods of making same |
WO2010085319A1 (en) * | 2009-01-22 | 2010-07-29 | Aculon, Inc. | Lead frames with improved adhesion to plastic encapsulant |
JP5637965B2 (ja) * | 2011-10-20 | 2014-12-10 | 株式会社神戸製鋼所 | リードフレーム用アルミニウム板条及びリードフレーム板条 |
JP5930680B2 (ja) * | 2011-11-30 | 2016-06-08 | 株式会社日立製作所 | 半導体装置およびその製造方法 |
CN104851867B (zh) * | 2011-12-27 | 2017-10-10 | 万国半导体(开曼)股份有限公司 | 应用在功率半导体元器件中的铝合金引线框架 |
US8753924B2 (en) | 2012-03-08 | 2014-06-17 | Texas Instruments Incorporated | Grown carbon nanotube die attach structures, articles, devices, and processes for making them |
CN104112730A (zh) * | 2013-06-09 | 2014-10-22 | 广东美的制冷设备有限公司 | 智能功率模块及其制造方法 |
CN109473513A (zh) * | 2018-10-20 | 2019-03-15 | 木林森股份有限公司 | Led支架及led封装结构及led支架中铝材框架的表面处理方法 |
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US3716462A (en) * | 1970-10-05 | 1973-02-13 | D Jensen | Copper plating on zinc and its alloys |
US4612167A (en) * | 1984-03-02 | 1986-09-16 | Hitachi Metals, Ltd. | Copper-base alloys for leadframes |
JPH0674479B2 (ja) * | 1986-10-09 | 1994-09-21 | スカイアルミニウム株式会社 | リードフレーム、コネクタもしくはスイッチ用導電圧延材料 |
JPH07105164B2 (ja) * | 1989-02-10 | 1995-11-13 | スカイアルミニウム株式会社 | アルミニウム合金製電子電気機器導電部品 |
JPH04231432A (ja) * | 1990-12-27 | 1992-08-20 | Nikko Kyodo Co Ltd | 通電材料 |
US5343073A (en) * | 1992-01-17 | 1994-08-30 | Olin Corporation | Lead frames having a chromium and zinc alloy coating |
JPH06184680A (ja) * | 1992-12-21 | 1994-07-05 | Kobe Steel Ltd | 曲げ加工性が優れた銅合金 |
US5409996A (en) * | 1993-02-23 | 1995-04-25 | Japan Synthetic Rubber Co., Ltd. | Thermoplastic resin composition |
JP2858196B2 (ja) * | 1993-04-17 | 1999-02-17 | 株式会社三井ハイテック | 半導体装置用リードフレーム |
US5459103A (en) * | 1994-04-18 | 1995-10-17 | Texas Instruments Incorporated | Method of forming lead frame with strengthened encapsulation adhesion |
DE4431847C5 (de) * | 1994-09-07 | 2011-01-27 | Atotech Deutschland Gmbh | Substrat mit bondfähiger Beschichtung |
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- 2000-02-21 TW TW089102917A patent/TW457674B/zh not_active IP Right Cessation
- 2000-03-08 US US09/520,556 patent/US6518647B1/en not_active Expired - Lifetime
- 2000-03-14 JP JP2000070565A patent/JP2000269398A/ja not_active Abandoned
- 2000-03-14 KR KR1020000012634A patent/KR100710090B1/ko active IP Right Grant
- 2000-03-15 AT AT00200936T patent/ATE519225T1/de not_active IP Right Cessation
- 2000-03-15 EP EP00200936A patent/EP1037277B1/en not_active Expired - Lifetime
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US6518647B1 (en) | 2003-02-11 |
EP1037277B1 (en) | 2011-08-03 |
EP1037277A2 (en) | 2000-09-20 |
EP1037277A3 (en) | 2004-09-22 |
ATE519225T1 (de) | 2011-08-15 |
JP2000269398A (ja) | 2000-09-29 |
KR100710090B1 (ko) | 2007-04-25 |
KR20000062856A (ko) | 2000-10-25 |
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