TW432451B - Component heater for use in semiconductor manufacturing equipment - Google Patents

Component heater for use in semiconductor manufacturing equipment Download PDF

Info

Publication number
TW432451B
TW432451B TW088115459A TW88115459A TW432451B TW 432451 B TW432451 B TW 432451B TW 088115459 A TW088115459 A TW 088115459A TW 88115459 A TW88115459 A TW 88115459A TW 432451 B TW432451 B TW 432451B
Authority
TW
Taiwan
Prior art keywords
heater element
heater
patent application
controller
cavity
Prior art date
Application number
TW088115459A
Other languages
English (en)
Chinese (zh)
Inventor
Roger A Moon
Original Assignee
Millipore Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Millipore Corp filed Critical Millipore Corp
Application granted granted Critical
Publication of TW432451B publication Critical patent/TW432451B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Measuring Volume Flow (AREA)
  • Control Of Resistance Heating (AREA)
  • Control Of Temperature (AREA)
TW088115459A 1998-09-09 1999-09-08 Component heater for use in semiconductor manufacturing equipment TW432451B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/150,458 US6078030A (en) 1998-09-09 1998-09-09 Component heater for use in semiconductor manufacturing equipment

Publications (1)

Publication Number Publication Date
TW432451B true TW432451B (en) 2001-05-01

Family

ID=22534624

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088115459A TW432451B (en) 1998-09-09 1999-09-08 Component heater for use in semiconductor manufacturing equipment

Country Status (5)

Country Link
US (1) US6078030A (https=)
EP (1) EP1118051B1 (https=)
JP (1) JP2002524864A (https=)
TW (1) TW432451B (https=)
WO (1) WO2000014616A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7575616B2 (en) * 2006-02-10 2009-08-18 Entegris, Inc. Low-profile surface mount filter

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4436674A (en) * 1981-07-30 1984-03-13 J.C. Schumacher Co. Vapor mass flow control system
US4484472A (en) * 1983-02-16 1984-11-27 Emerson Electric Co. Concentric rod and tube sensor for thermal mass flow controller and flow meter
US4778559A (en) * 1986-10-15 1988-10-18 Advantage Production Technology Semiconductor substrate heater and reactor process and apparatus
US4794947A (en) * 1986-11-29 1989-01-03 Kabushiki Kaisha Nippon IC (also trading as Nippon IC, Inc.) Mass flow controller
US5138973A (en) * 1987-07-16 1992-08-18 Texas Instruments Incorporated Wafer processing apparatus having independently controllable energy sources
US5646334A (en) * 1995-09-12 1997-07-08 Seagate Technology, Inc. Multisample dynamic headspace sampler
JPH0244211A (ja) * 1988-08-04 1990-02-14 Sharp Corp フローセンサ
US5231291A (en) * 1989-08-01 1993-07-27 Canon Kabushiki Kaisha Wafer table and exposure apparatus with the same
JPH03156509A (ja) * 1989-11-14 1991-07-04 Stec Kk マスフローコントローラ
DE69111493T2 (de) * 1990-03-12 1996-03-21 Ngk Insulators Ltd Wafer-Heizgeräte für Apparate, zur Halbleiterherstellung Heizanlage mit diesen Heizgeräten und Herstellung von Heizgeräten.
WO1991019959A1 (en) * 1990-06-14 1991-12-26 Unit Instruments, Inc. Thermal mass flow sensor
US5062446A (en) * 1991-01-07 1991-11-05 Sematech, Inc. Intelligent mass flow controller
US5436172A (en) * 1991-05-20 1995-07-25 Texas Instruments Incorporated Real-time multi-zone semiconductor wafer temperature and process uniformity control system
KR940011791B1 (ko) * 1992-04-15 1994-12-26 금성일렉트론주식회사 온도안정화 매스 플로우 컨트롤러 센서
US5439026A (en) * 1992-12-11 1995-08-08 Tokyo Electron Limited Processing apparatus and flow control arrangement therefor
US5441076A (en) * 1992-12-11 1995-08-15 Tokyo Electron Limited Processing apparatus using gas
US5455014A (en) * 1993-07-20 1995-10-03 Hughes Aircraft Company Liquid deposition source gas delivery system
JP2794081B2 (ja) * 1994-03-15 1998-09-03 工業技術院長 燃料電池発電システム
US5601366A (en) * 1994-10-25 1997-02-11 Texas Instruments Incorporated Method for temperature measurement in rapid thermal process systems
US5660207A (en) * 1994-12-29 1997-08-26 Tylan General, Inc. Flow controller, parts of flow controller, and related method
US5811762A (en) * 1996-09-25 1998-09-22 Taiwan Semiconductor Manufacturing Company, Ltd. Heater assembly with dual temperature control for use in PVD/CVD system
US5911238A (en) * 1996-10-04 1999-06-15 Emerson Electric Co. Thermal mass flowmeter and mass flow controller, flowmetering system and method

Also Published As

Publication number Publication date
EP1118051A1 (en) 2001-07-25
WO2000014616A1 (en) 2000-03-16
US6078030A (en) 2000-06-20
EP1118051B1 (en) 2004-03-17
JP2002524864A (ja) 2002-08-06

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees