TW415977B - Plating method - Google Patents

Plating method Download PDF

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Publication number
TW415977B
TW415977B TW87105328A TW87105328A TW415977B TW 415977 B TW415977 B TW 415977B TW 87105328 A TW87105328 A TW 87105328A TW 87105328 A TW87105328 A TW 87105328A TW 415977 B TW415977 B TW 415977B
Authority
TW
Taiwan
Prior art keywords
vibration
electroplating
plating
bath
tank
Prior art date
Application number
TW87105328A
Other languages
English (en)
Chinese (zh)
Inventor
Ryushin Omasa
Original Assignee
Nippon Techno Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Techno Kk filed Critical Nippon Techno Kk
Application granted granted Critical
Publication of TW415977B publication Critical patent/TW415977B/zh

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  • Electroplating Methods And Accessories (AREA)
  • Mixers With Rotating Receptacles And Mixers With Vibration Mechanisms (AREA)
  • Chemically Coating (AREA)
TW87105328A 1997-10-21 1998-04-09 Plating method TW415977B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP30662997 1997-10-21
JP9311374A JP2988624B2 (ja) 1997-10-21 1997-10-27 めっき方法

Publications (1)

Publication Number Publication Date
TW415977B true TW415977B (en) 2000-12-21

Family

ID=26564795

Family Applications (1)

Application Number Title Priority Date Filing Date
TW87105328A TW415977B (en) 1997-10-21 1998-04-09 Plating method

Country Status (2)

Country Link
JP (1) JP2988624B2 (ja)
TW (1) TW415977B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108396363A (zh) * 2018-05-10 2018-08-14 深圳市富利特科技有限公司 一种电镀装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1237208C (zh) 2001-05-02 2006-01-18 日本科技股份有限公司 氢－氧气体发生装置和使用该装置的氢－氧气体发生方法
CA2451600C (en) 2001-06-25 2010-01-19 Japan Techno Co., Ltd. Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus
JP4599387B2 (ja) * 2001-12-03 2010-12-15 日本テクノ株式会社 水素−酸素ガス発生装置及びそれを用いた水素−酸素ガス発生方法
CN1279349C (zh) * 2002-11-06 2006-10-11 日本特殊陶业株式会社 气体传感器制造方法及气体传感器
AU2004234223A1 (en) 2003-05-02 2004-11-11 Japan Techno Co., Ltd. Active antiseptic water or active antiseptic water system fluid, and method and device for production the same
JP4889045B2 (ja) * 2005-09-15 2012-02-29 Ｊｘ日鉱日石金属株式会社 スルーホールを有するプリント配線基板への無電解めっき用触媒、及びその触媒を用いて処理されたスルーホールを有するプリント配線基板
JP4774032B2 (ja) * 2007-12-05 2011-09-14 三菱重工業株式会社 めっき方法及びめっき装置
CN104685108B (zh) * 2012-10-05 2017-09-29 古河电气工业株式会社 银反射膜、光反射构件及光反射构件的制造方法
JP6719232B2 (ja) * 2016-03-02 2020-07-08 エスアイアイ・プリンテック株式会社 めっき膜形成方法及び液体噴射ヘッドの製造方法
JP7011388B2 (ja) * 2016-12-28 2022-01-26 エスアイアイ・プリンテック株式会社 溝構造のめっき方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108396363A (zh) * 2018-05-10 2018-08-14 深圳市富利特科技有限公司 一种电镀装置

Also Published As

Publication number Publication date
JP2988624B2 (ja) 1999-12-13
JPH11189880A (ja) 1999-07-13

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