TW385554B - Optically transparent diffusion barrier and top electrode in organic light emitting diode structures - Google Patents
Optically transparent diffusion barrier and top electrode in organic light emitting diode structures Download PDFInfo
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/828—Transparent cathodes, e.g. comprising thin metal layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/816—Multilayers, e.g. transparent multilayers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
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Description
經濟部中央標準局員工消費合作社印製 A7 -----------B7 五、發明説明(彳) 發明菔圍 本發明-般言《與有機電發光二極體有_,特別是本發 明所述之二極體有一透明頂電極。本發明係提供一種結構 可保護有機發光物質不受損#及擴散人隨後沉積之電極物 質中而保持良好之視覺、電子注射與附著持性。 發明背景 有機電發光物質正被積極選用於發射單色及全彩色顯示 器中之有效媒體。雖然多年前即發現蒽含有電發光特性, 但因使用此一元素在驅動有機發光二極體所需之高電壓而 使其並未被用為顯示器中之媒體。1987年唐先生及其同仁 在應用物理文集第5 1期(1987年9月號)913頁上發表一篇標 ,為「有機發光二極體」之文章(列此做為參考),首次揭 露較為有效之有機發光二極體結構,其接通電壓低於ι〇ν。 孩結構涉及真空沉積一系列之有機層,包括一電洞注射/附 著層、一電洞運輸層、聯氨及_3(8_氫氧基)吡啶鋁(Alq3) 發射層。此等層係沉積於塗有摻錫氧化銦(IT〇)導電膜之玻 璃基fa上。摻錫氧化銦用為透明陽極。陰極則以美國第 4,720,432及4,539,507號專利中所述之多種金屬製成,特列 此做為參考,其製作方法是將之沉積在一疊有機層頂部 上。最常用之陰椏材料為摻有少量銀之錳。錳之低功作用 可增進電子注射,從而提高裝置效能。 已有人建議使用更複雜之陰極結構,可防止黑點之形 成,黑點會減低陰極無電子運輸層間介面之性能,通常認 為是由週圍之澄氣造成。此等結構揭露於美國第5,〇47,687 4 _ 本紙張尺度適用中國ΐ家標準(CNS> M規^ 2丨〇><297公趁) (請先閲讀背面之注意事項再填'寫本莧) -訂
-m i^i m (請先閲讀背面之注意事項再填寫本頁) -裝. 訂 ^5,059,〇 有置於通常陰極上之某種反應金屬,用以氧化並防止澄氣 到達陰極下方之介面。 上述之陰極材料均不透光,光僅能經由摻錫氧化鋼玻璃 基體發射。當一.疊有機層沉積於諸如矽之半透明基體上時 即會相當複雜。沉積於矽基體或矽基電路上為積成含有高 密度有機發光二極體單色或全彩色顯示器之理想方法。在 此種裝置中’光須從頂電極透過。因此可不用厚金屬層做 為頂電極而使用透明電極。
Bulovic及其同仁曾在自然雜誌第38〇卷(^外年]月7 曰)29頁上揭露一種使用有一 Alq3發射層之鎂銀薄膜(5_ l〇nm)之特殊透明陰極,特列此做為參考。但隨後之摻錫 氧化銦噴濺步驟會使一部分薄膜氧化。若無剩餘之未氧化 鎂銀時,會造成陽極與陰極間之電短路,若有剩餘金屬 時,透明度不一致且控制不良。所需要的是更一致且控制 較佳之透明頂電極。 發明簡述 經濟部中央標準局員工消費合作社印製 本發明在提供一種新方法來解決汽化之電極物質在形成 具有頂透明電極有機發光二極體時擴散入有機膜内之嚴重 問題。現已發現將適當薄度之鈣金屬層沉積於有機薄膜之 上會形成一有效之擴散阻礙層。再者,鈣有低功作用有利 於電子注射,且為最透光金屬之一,與有機薄膜反應良好 可導致良好之附著,且在較低之溫度易於昇華。同時也發 現鈣如同錳與鋰能與其他金屬,例如鋁與/或鎵構成合金而 -5
經濟部中央標準局員工消費合作社印製 A7 . —--__B7 , 五、發明説明(3 ) ' ~ —- 增大穩定性且不影響裝置性能。此一約基之電子注射層包 括均勻鈣合金、分級鈣合金或各種鈣與鈣合金層序列。同 時一個薄的鈣基注射層連同一寬帶間隙半導體覆蓋層即可 形成用於有機發光二極體之透明陰極。若某些鈣與/或鈣合 金層在沉積寬間,隙半導體時被消耗或反應,即可製成特別 透明之電極。此種透明電極為在諸如矽之半透明 作裝置所欲有甚至必需者。 上氣 #圖簡介 參看下述實例之詳細說明及附圖對本發明將會更加瞭解 且本發明之其他優點亦更為明顯: 圖1所示為先前技術之有機發光二極體裝置,其中摻錫氧 化銦之電極圖案係沉積於玻璃上,光則是從有機發光二2 體透過摻錫氧化銦/玻璃基體。 圖2為本發明之一實例,其中之有機發光二極體係製作於 諸如矽基電路半透明基體之上。 ' 圖3所示為在200A硫化鋅沉積於Alq3上後從沉積在導電基 體上之1 〇〇A Alq3薄膜所收集一系列之先電譜。 圖4為與沉積於Aiq3上鎵相似之一系列光電譜。 圖5為一系列之光電譜,從Akl3薄膜開始,其後為中間層 40A之辦,再後為40A之硫化鋅均為沉積後兩小時所收^ 者。 圖6為一系列之光電譜,收集自一 Alq3層,該層上覆有1〇八之 鈣及20A之鎵,係在此等層沉積後不同時段收集者。 發明之詳述 圖1所示為一先前技術有機發光二極體裝置1 〇.,其中之氧 (請先閱讀背面之注意事項再填寫本頁) -an n 1« -·ϋ ·ϋ -
-裝I -1mm mKt emmt i 訂 -"—,--1-ΙΕΙ;~~-·ΕΙ*°·ΙΓΙ=Ι,*Ι::Ε____ -6- 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明U ) 化銦錫電極圖案係沉積於玻璃基體1 2上。其上沉積有一個 包含有125A之CuPc層14,600A之聯氨層16與650A之Alq3 層1 8之有機層疊。最後在Alq3之頂部表面覆上1500A之鎂 銀層2 0。光從有機發光二極體透過氧化錮錫/玻璃基體 12 ° 圖2為製作在諸如矽基電路半透明基體上本發明有機發光 二極體之實例。在矽基體2 2上沉積一氧化銦錫或鋁之底層 24,隨後再加上125八之(:11?(:層26,600八之聯氨層28及 650A之Alq3層30。在Alq3薄膜30上沉積一薄層鈣32做為擴散 阻礙層。然後沉積透明陰極材料3 4,隨後可加上硫化鋅、氮 化鎵、氧化銦錫或硒化鋅或此等材料之組合。 一種可用之透明頂電極為前述之氧化銦錫,其他可用者 為諸如氮化鎵、硫化鋅、硒化鋅等退化式摻雜或高度摻雜 寬帶間隙之半導體。在沉積硫化鋅時發現真空沉積之硫化 鋅會快速擴散入Alq3頂層。圖3所示為一系列光電譜,其中 200入之硫化鋅沉積於100入厚度之八193薄膜上。在圖3中, 鋅之第三原子心位準曾以紫外線光電譜儀於沉積硫化鋅後 以時間為函數加以監測。底部之光電譜(3 6)係收集自沉積於 一導電基體上100 A之Alq3薄膜。從底部往上再一個光電譜 (38)係於200A之硫化鋅沉積於Alq3上後所收集者,清晰可 見鋅第三心位準(40)。四十五分鐘後鋅心位準(42)之強度已 大為減小,一個半小時後同一位準信號(44)幾乎已消失, 顯示硫化鋅已擴散入Alq3薄膜之内。頂部之光電譜(46)顯 示出樣本被退火至1 00°C後,亦即在接近製造有機發光二極 體時有機物質可能遇到之溫度時之光電譜。可看出鋅心 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ---------1-- (請先k讀背面之注意事項再塌寫本頁) 訂 ❿.. 經濟部中央標準局員工消費合作社印製 A7 ----~------—____ 五、發明説明(5 ) 位準已全部不見而與Alq3分子位準相關之特徵已再度出 現0 圖4所示為在Alq3上沉積鎵來做進一步實驗。一系列之光 電譜顯示鎵在Alq3上形成島而並無化學反應,然後擴散入
Alq3。此一擴散可视為鎵第三原予心位準強度之損失。圖* 中最底邵之光電譜(48)為取自Alq3層者《在此情形下,鎵 形成島或鼓起而留下Alq3曝光之補片。可見者為鎵第三心 位準(50)。在一系列之半小時與2 4小時時間延遲後,鎵心 位準信號(52)、(54)已消失,顯示鎵已擴散入Aiq3内部。 此等實驗代表一系列之測量,顯示出沉積於蝴3上而與
Alq3不起化學反應之物質會很快擴散入有機膜内。在其他 有機膜諸如CuPc上做實驗也顯示相同之情形。金屬或半導 體物質擴散入光電有機膜内會有減能效應,諸如光之淬 熄、會使有機發光二極體失效之電短路及減少作業壽命。 本文即提出一種解決此一嚴重問題之新式方法。此—方 法是在沉積透明電極材料前,先在有機膜上沉積一適當薄 之鈣金屬層。吾人發現沉積一薄層鈣金屬會造成鈣與有機 膜起反應之介面,對隨後所沉積電極物質之擴散極為穩 定。實驗顯示首先沉積之⑹从之辟與有機膜之最上層完 全反應。進一步再沉積鈣則造成厚度漸增之未反應鈣金屬 層。 固5特別員示系列之光電得,從八叫膜(Μ)開始,隨後 為40A之鈣做為中間層(58)。隨後再為4〇a之硫化鋅層 (60)。最上面之光電譜是等候兩小時後收集者。該光電譜中 -8 - 本紙浪尺度適用中國國豕標準(CNS ) A4規格(210x297公疫) 杜衣-- (請先閲讀背面之注意事項再填寫本頁) ·. I IMB N.... i 6. I.ulf -:^^111^1.--.----^=-=^^1~· 、發明説明(6 ) 並播異樣’顯示鈣已形成有效之擴散障礙而防止硫化鋅進 入A】q3中。' 圖6所不為在AIq3層上沉積1〇Α之鈣再沉積2〇Λ鎵後立即 收集之光電譜。4 5分鐘後將鈣心位準信號(64)與鎵心位準 ^號(66)加以比較。信號(66)就信號(64)而言並無改變,再 度顯示鈣已產生有效之擴散障礙。 舞含有很多引人的特性。鈣之反應力甚高,當其被沉積 在有機膜上時即與膜起反應而非擴散入膜内。鈣有低功作 用’使其成為將電子注入有機膜之有效注射器。鈣為一種 在有機發光二極體作業之可見範圍内最透光之金屬。實驗 .<·’員示10-1 5 A為阻止硫化鋅或鎵擴散入Aiq3之最小厚度。舞 在低m時較易a化及昇華。此點顯示汽化源可接近有機膜 而不必將膜加熱至會使有機膜結晶之溫度,因結晶會使有 機發光二極體失效.。最後,經反應之鈣層亦可成為有機膜 與隨後所沉積透明電極物質間之有效附著層。 最重要的是吾人發現鈣為對隨後沉積之電極物質有效之 擴散阻礙物。 本發明已藉較佳實例加以說明,熟於此項技術者即知只 要不脫離本發明之精神與範圍,本發明仍可有其他 。
Claims (1)
- —種有機發光裝置,具有 a) —基座; 另—個用為陰 ,其中若在該 個該接觸電極 b)兩個接觸電極,其中一個用為陽極 2 —個有機區域,位於該二接觸電極間 二電極間加上一電壓即會發生電發光;及 d)—阻礙層,位於該有機區域與至 間。 2.根據申請專利範圍第1項之裝 相接觸之材料含有一有機竭二^ 3’ 請專利範圍第i項之其中接觸電極與阻礙, 罝,共T接觸電 性興阻礙J ';!!!:]<If 相接觸之材料含有一無機4¾¾ 4.根據申請專利範園第丨項之f 層金屬,其係選自由鈣、錳 中。 ’其中之阻礙層含有一 總、銘及鐘所組成之 5·根據申請專利範固第卜頁之裝置,其中之接觸電極之一為 —透明電極,位於基體之對面且含有一熱汽化之薄金屬 9 甘 » m 丹上覆有選自摻錫氧化銦(ITO)、氧化銦(ιη0)、 ^化辞(ZnS)、晒化鋅(ZnSe)、氮化鎵(GaN)或彼等之組 合之透明導體。 6.根據申請專利範圍第5項之裝置,其中之透明頂電極為陰 極而金屬則係選擇成具有低功作用者俾促進電子注入有 機下層。 A8 B8 C8 D8 申請專利範圍 7=。專利範,項之裝置,其中之阻礙層含有ι〇_ 8·根據申請專利範圍第5項之裝置,其中之透 極而阻礙層之材料則選用具有高功作用者俾促二:陽 入有機下層。. 堪%,同 >王 9.根據申請專利範圍第8項之裝置,其中之阻礙 i5A之鋁、鈦、鉻或鐵。 61 °' ι〇·根據申請專利範圍第丨項之裝置,其中之基體為矽。 11·—種有機發光裝置,具有: a) 一基體及 b) —形成透明頂電極之結構,該結構含有―聂 最後之一層為一有機下層,該有機下層之上有一熱^化 之薄金屬膜其上覆有選自摻錫氧化銦(IT〇) '氧^銦 ση〇)、硫化鋅(ZnS)、硒化鋅(ZnSe)、氮化鎵(GaN)或彼 等之組合之透明導體。 12. 根據申請專利範圍第丨丨項之裝置,其中之有機下層為選 自p比淀銘(Alq3)及CuPc之分子有機物質。 13. 根據申請專利範圍第丨丨項之裝置,其中之有機下層為聚 合物PPV。 14. 根據申請專利範圍第n項之裝置,其中之透明頂電極為 一陰極而薄金屬阻礙膜則選用有低功作用者俾促進電予 注入有機下層。 15. 根據申凊專利範圍第1 4項之裝置,其中之金屬膜含有1 〇_ 1 5A 之 #5。 ’ (請先聞讀背面之注項再填寫本頁,> .裝 、1T 經濟部中央標隼局員工消費合作社印製 -11 -ABCD 6·根據申請專利範圍第丨丨項之裝置,其中之透明+ —陽極面金屬則選用有高功作用者俾促進 下層。 门/王入有機 17. 根據申請專利範圍第16項之裝置,其中之金屬膜含有10_ 15入之鋁、鈦、鉻或鐵。 18. 根據申請專利範圍第11項之裝置,其中之基體為碎。 ----------装-- (請先閎讀背面之注意事項再填寫本頁) ,1T 經濟部中央標準局員工消費合作社印製 :.=.^:::::.^:::1:::=1:.:1^^:^.1111^^^^4^1^isgr>''tlrr£-.lg.i-l" -12- 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐)
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JP2931229B2 (ja) * | 1995-02-13 | 1999-08-09 | 出光興産株式会社 | 有機エレクトロルミネッセンス素子 |
JPH08325564A (ja) * | 1995-06-05 | 1996-12-10 | Nec Corp | 有機薄膜el素子 |
-
1996
- 1996-09-20 US US08/716,901 patent/US5714838A/en not_active Expired - Lifetime
-
1997
- 1997-07-08 KR KR1019970031453A patent/KR100315202B1/ko not_active IP Right Cessation
- 1997-09-08 JP JP24224697A patent/JPH10144957A/ja active Pending
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Cited By (2)
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US7619356B2 (en) | 2003-05-23 | 2009-11-17 | Lg Chem, Ltd. | ITO film treated by nitrogen plasma and the organic luminescent device using the same |
US8304983B2 (en) | 2003-05-23 | 2012-11-06 | Lg Chem, Ltd. | ITO film treated by nitrogen plasma and the organic luminescent device using the same |
Also Published As
Publication number | Publication date |
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US5714838A (en) | 1998-02-03 |
JPH10144957A (ja) | 1998-05-29 |
KR19980024082A (ko) | 1998-07-06 |
KR100315202B1 (ko) | 2002-01-15 |
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