TW372283B - Method for automatically generating annular phase shifting mask - Google Patents

Method for automatically generating annular phase shifting mask

Info

Publication number
TW372283B
TW372283B TW087114769A TW87114769A TW372283B TW 372283 B TW372283 B TW 372283B TW 087114769 A TW087114769 A TW 087114769A TW 87114769 A TW87114769 A TW 87114769A TW 372283 B TW372283 B TW 372283B
Authority
TW
Taiwan
Prior art keywords
pattern
layer
assisted
automatically generating
phase shifting
Prior art date
Application number
TW087114769A
Other languages
English (en)
Inventor
Jin-Long Lin
yao-jin Gu
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW087114769A priority Critical patent/TW372283B/zh
Application granted granted Critical
Publication of TW372283B publication Critical patent/TW372283B/zh

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW087114769A 1998-09-05 1998-09-05 Method for automatically generating annular phase shifting mask TW372283B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW087114769A TW372283B (en) 1998-09-05 1998-09-05 Method for automatically generating annular phase shifting mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW087114769A TW372283B (en) 1998-09-05 1998-09-05 Method for automatically generating annular phase shifting mask

Publications (1)

Publication Number Publication Date
TW372283B true TW372283B (en) 1999-10-21

Family

ID=57941616

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087114769A TW372283B (en) 1998-09-05 1998-09-05 Method for automatically generating annular phase shifting mask

Country Status (1)

Country Link
TW (1) TW372283B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6493865B2 (en) 2000-04-10 2002-12-10 Infineon Technologies Ag Method of producing masks for fabricating semiconductor structures
CN1325994C (zh) * 2003-12-08 2007-07-11 台湾积体电路制造股份有限公司 无铬膜层相位移光罩及其制造方法与制造半导体装置方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6493865B2 (en) 2000-04-10 2002-12-10 Infineon Technologies Ag Method of producing masks for fabricating semiconductor structures
CN1325994C (zh) * 2003-12-08 2007-07-11 台湾积体电路制造股份有限公司 无铬膜层相位移光罩及其制造方法与制造半导体装置方法

Similar Documents

Publication Publication Date Title
TW200507067A (en) Method of producing a phase shift mask
TW352421B (en) Method and process of phase shifting mask
AU6388700A (en) Method and apparatus for determining phase shifts and trim masks for an integrated circuit
EP1241523A4 (en) PHOTOMASK, PROCESS FOR PRODUCING PHOTOMASK
WO2002101468A3 (en) Design and layout of phase shifting photolithographic masks
TW200602803A (en) Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
AU2003223189A1 (en) Critical dimension control using full phase and trim masks
TW200710992A (en) Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
WO2003019626A3 (en) Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
KR950021055A (ko) 하프톤형 위상반전 마스크 및 그 제조 방법
TW372283B (en) Method for automatically generating annular phase shifting mask
KR980003804A (ko) 해프톤 위상반전 마스크
AU2003213752A8 (en) Patterning semiconductor layers using phase shifting and assist features
SG129216A1 (en) Alternating phase shift mask and method for fabricating the alignment monitor
TWI265370B (en) Method of enhancing clear field phase shift masks with chrome border around phase 180 regions
TW324074B (en) Manufacturing method of phase shifting mask
TW376465B (en) Method for automatically generating assist phase shifting mask (PSM)
TW428122B (en) The integrated phase-shift and binary photomask and the manufacturing method of the same
KR980005324A (ko) 위상반전 마스크 및 그 제조방법
TW290708B (en) The manufacturing method of phase-shifted photo-mask
KR970048926A (ko) 마스크 및 그 제조방법
TW335506B (en) Pattern process alignment
TWI268400B (en) Multi-step phase shift mask and methods for fabrication thereof
TW364185B (en) Process for dual metal damascene of single mask using phase shift mask
KR970048956A (ko) 위상 반전 패턴을 가지는 마스크 및 그 제조 방법

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees