TW200507067A
(en )
2005-02-16
Method of producing a phase shift mask
TW352421B
(en )
1999-02-11
Method and process of phase shifting mask
AU6388700A
(en )
2001-04-30
Method and apparatus for determining phase shifts and trim masks for an integrated circuit
EP1241523A4
(en )
2003-01-07
PHOTOMASK, PROCESS FOR PRODUCING PHOTOMASK
WO2002101468A3
(en )
2003-11-13
Design and layout of phase shifting photolithographic masks
TW200602803A
(en )
2006-01-16
Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
AU2003223189A1
(en )
2003-09-09
Critical dimension control using full phase and trim masks
TW200710992A
(en )
2007-03-16
Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
WO2003019626A3
(en )
2005-03-17
Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
KR950021055A
(ko )
1995-07-26
하프톤형 위상반전 마스크 및 그 제조 방법
TW372283B
(en )
1999-10-21
Method for automatically generating annular phase shifting mask
KR980003804A
(ko )
1998-03-30
해프톤 위상반전 마스크
AU2003213752A8
(en )
2003-10-08
Patterning semiconductor layers using phase shifting and assist features
SG129216A1
(en )
2007-02-26
Alternating phase shift mask and method for fabricating the alignment monitor
TWI265370B
(en )
2006-11-01
Method of enhancing clear field phase shift masks with chrome border around phase 180 regions
TW324074B
(en )
1998-01-01
Manufacturing method of phase shifting mask
TW376465B
(en )
1999-12-11
Method for automatically generating assist phase shifting mask (PSM)
TW428122B
(en )
2001-04-01
The integrated phase-shift and binary photomask and the manufacturing method of the same
KR980005324A
(ko )
1998-03-30
위상반전 마스크 및 그 제조방법
TW290708B
(en )
1996-11-11
The manufacturing method of phase-shifted photo-mask
KR970048926A
(ko )
1997-07-29
마스크 및 그 제조방법
TW335506B
(en )
1998-07-01
Pattern process alignment
TWI268400B
(en )
2006-12-11
Multi-step phase shift mask and methods for fabrication thereof
TW364185B
(en )
1999-07-11
Process for dual metal damascene of single mask using phase shift mask
KR970048956A
(ko )
1997-07-29
위상 반전 패턴을 가지는 마스크 및 그 제조 방법