TW335506B - Pattern process alignment - Google Patents

Pattern process alignment

Info

Publication number
TW335506B
TW335506B TW086114713A TW86114713A TW335506B TW 335506 B TW335506 B TW 335506B TW 086114713 A TW086114713 A TW 086114713A TW 86114713 A TW86114713 A TW 86114713A TW 335506 B TW335506 B TW 335506B
Authority
TW
Taiwan
Prior art keywords
pattern process
process alignment
alignment
pattern
layer
Prior art date
Application number
TW086114713A
Other languages
Chinese (zh)
Inventor
Tzyh-Jyh Moh
Shiang-Jing Jeng
Chinn-Yi Jou
Charng-Mou Yang
Original Assignee
Microjet Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microjet Technology Co Ltd filed Critical Microjet Technology Co Ltd
Priority to TW086114713A priority Critical patent/TW335506B/en
Application granted granted Critical
Publication of TW335506B publication Critical patent/TW335506B/en

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Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The first layer has a circuit pattern on wafer. Then, to form a related pattern for process at second layer. It is used for alignment process with transparent film.
TW086114713A 1997-10-07 1997-10-07 Pattern process alignment TW335506B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086114713A TW335506B (en) 1997-10-07 1997-10-07 Pattern process alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086114713A TW335506B (en) 1997-10-07 1997-10-07 Pattern process alignment

Publications (1)

Publication Number Publication Date
TW335506B true TW335506B (en) 1998-07-01

Family

ID=58263063

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086114713A TW335506B (en) 1997-10-07 1997-10-07 Pattern process alignment

Country Status (1)

Country Link
TW (1) TW335506B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6245248B1 (en) * 1998-11-02 2001-06-12 Dbtel Incorporated Method of aligning a nozzle plate with a mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6245248B1 (en) * 1998-11-02 2001-06-12 Dbtel Incorporated Method of aligning a nozzle plate with a mask

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees