TW365551B - Apparatus for cleaning - Google Patents

Apparatus for cleaning

Info

Publication number
TW365551B
TW365551B TW085108374A TW85108374A TW365551B TW 365551 B TW365551 B TW 365551B TW 085108374 A TW085108374 A TW 085108374A TW 85108374 A TW85108374 A TW 85108374A TW 365551 B TW365551 B TW 365551B
Authority
TW
Taiwan
Prior art keywords
cleansing
solution
cleansed
gaps
dried
Prior art date
Application number
TW085108374A
Other languages
English (en)
Inventor
Hiroshi Shimozawa
Masaru Kumagai
Mayumi Koga
Tadayuki Nakamura
Nobuhiro Saitoh
Original Assignee
Toshiba Silicone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Silicone filed Critical Toshiba Silicone
Application granted granted Critical
Publication of TW365551B publication Critical patent/TW365551B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
    • H01L21/4835—Cleaning, e.g. removing of solder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
TW085108374A 1993-05-17 1994-05-19 Apparatus for cleaning TW365551B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11507293 1993-05-17

Publications (1)

Publication Number Publication Date
TW365551B true TW365551B (en) 1999-08-01

Family

ID=14653485

Family Applications (3)

Application Number Title Priority Date Filing Date
TW085108374A TW365551B (en) 1993-05-17 1994-05-19 Apparatus for cleaning
TW083104538A TW474989B (en) 1993-05-17 1994-05-19 Detergent, method of cleaning
TW090128433A TW494135B (en) 1993-05-17 1994-05-19 Method of cleaning

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW083104538A TW474989B (en) 1993-05-17 1994-05-19 Detergent, method of cleaning
TW090128433A TW494135B (en) 1993-05-17 1994-05-19 Method of cleaning

Country Status (6)

Country Link
US (1) US5789359A (zh)
EP (1) EP0699746A4 (zh)
KR (1) KR0168486B1 (zh)
CN (1) CN1065564C (zh)
TW (3) TW365551B (zh)
WO (1) WO1994026864A1 (zh)

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US5783551A (en) * 1992-04-29 1998-07-21 Mirsky; Jeffrey Paraffinic cleaning solutions
WO1996012571A1 (fr) * 1994-10-19 1996-05-02 Kabushiki Kaisha Toshiba Agent, procede et materiel de nettoyage
US5492647A (en) * 1995-05-08 1996-02-20 Dow Corning Corporation Octamethylcyclotetrasiloxane azeotropes
AU3914797A (en) * 1996-08-13 1998-03-06 E.I. Du Pont De Nemours And Company Alkylsiloxane compositions
US6273100B1 (en) * 1998-08-27 2001-08-14 Micron Technology, Inc. Surface cleaning apparatus and method
US6551422B1 (en) * 1999-12-17 2003-04-22 Coral Chemical Company Method and apparatus for treating metal
AU2001273598A1 (en) * 2000-06-29 2002-01-14 Huntsman Petrochemical Corporation Carbonate-based photoresist stripping compositions
US20030040456A1 (en) * 2000-10-13 2003-02-27 Tetsuo Imai Method and apparatus for cleaning article
US6541435B2 (en) * 2000-12-07 2003-04-01 3M Innovative Properties Company Engine cleaner composition
US6610108B2 (en) 2001-03-21 2003-08-26 General Electric Company Vapor phase siloxane dry cleaning process
JP2003041297A (ja) * 2001-07-26 2003-02-13 Ge Toshiba Silicones Co Ltd 洗浄剤および洗浄方法
US20040253139A1 (en) * 2003-06-14 2004-12-16 Denton Robert Michael Environmental surface disinfectant
KR101056580B1 (ko) * 2004-12-22 2011-08-11 재단법인 포항산업과학연구원 석탄계 흡수유를 사용하는 열교환기의 세정제 조성물 및세정방법
JP4236198B2 (ja) * 2004-12-28 2009-03-11 東京応化工業株式会社 リソグラフィー用洗浄液及びそれを用いた半導体基材形成方法
JP2007211203A (ja) * 2006-02-13 2007-08-23 Three M Innovative Properties Co フッ素含有化合物を含む洗浄剤組成物及びその使用方法
WO2008141210A1 (en) * 2007-05-11 2008-11-20 Explorer Pressroom Solutions Printing press cleaning compositions
KR100850757B1 (ko) * 2007-06-14 2008-08-06 삼성전기주식회사 기판의 표면처리방법 및 미세배선 형성방법
CN101614970B (zh) * 2008-06-27 2012-12-19 安集微电子（上海）有限公司 一种光刻胶清洗剂组合物
KR20100029703A (ko) * 2008-09-08 2010-03-17 라이온 가부시키가이샤 액정 제거용 세제 조성물 및 액정 패널의 세정 방법
EP2788128B1 (en) * 2011-12-05 2019-05-01 Ecolab USA Inc. Low foaming solid sink detergent
US20130220159A1 (en) * 2012-02-28 2013-08-29 Sony Corporation Offset printing blanket cleaning liquid, method of cleaning offset printing blanket, method of manufacturing display unit, method of manufacturing printed material, and ink composition and printing method using the same
CN103367107B (zh) * 2012-04-09 2016-04-20 中芯国际集成电路制造(上海)有限公司 改善表面结合力的方法
DE102012217306B4 (de) * 2012-09-25 2017-01-12 Vacuumschmelze Gmbh & Co. Kg Reinigungsmittel, dessen Verwendung und Verfahren zum Entfernen von ausgehärteten Gießharzen, Klebstoffen, Montageschäumen, Lackfilmen und Lackresten
CN104454997A (zh) * 2014-11-17 2015-03-25 无锡市百顺机械厂 一种轴承清洗工艺
EP3274699B1 (en) * 2015-03-26 2023-12-20 Life Technologies Corporation Method for treating fet sensor arrays and resulting sensor devices
CN104923035B (zh) * 2015-05-25 2017-05-17 长安大学 一种三苯废气吸附液及其应用
US9719535B1 (en) * 2015-08-10 2017-08-01 Reladyne, LLC Varnish mitigation process
CN105296208A (zh) * 2015-11-25 2016-02-03 深圳市裕满实业有限公司 一种环保型洗板水及其制备方法
KR102094224B1 (ko) * 2016-03-14 2020-03-27 바스프 코팅스 게엠베하 세정 조성물
KR102209389B1 (ko) * 2016-09-26 2021-01-28 주식회사 엘지화학 포토레지스트 제거용 스트리퍼 폐액의 정제 방법
CN108787651A (zh) * 2017-04-28 2018-11-13 安徽嘉朋特环保科技服务有限公司 一种废包装桶的清洗方法
CN109351726B (zh) * 2018-11-01 2021-11-23 深圳市鑫承诺环保产业股份有限公司 用于小口径微型储罐的清洗方法
CN110184427B (zh) * 2019-06-27 2020-10-09 江苏鑫露化工新材料有限公司 一种淬火油添加剂及其制备方法
CN110802089B (zh) * 2019-10-17 2021-10-26 一汽奔腾轿车有限公司 一种水性输调漆系统建线后清洗方法
CN113818193B (zh) * 2020-06-18 2023-09-08 云米互联科技(广东)有限公司 洗涤剂投放方法及系统、存储介质、洗涤装置
KR102672421B1 (ko) * 2021-09-07 2024-06-05 이호열 Pcb 준수계 세정제 조성물
CN118060259A (zh) * 2024-04-07 2024-05-24 东莞伊豪自动化科技有限公司 一种基于高精度电气元件的连续清洗装置

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Also Published As

Publication number Publication date
CN1126488A (zh) 1996-07-10
WO1994026864A1 (en) 1994-11-24
TW474989B (en) 2002-02-01
EP0699746A4 (en) 1996-09-11
KR960702510A (ko) 1996-04-27
KR0168486B1 (ko) 1999-01-15
EP0699746A1 (en) 1996-03-06
TW494135B (en) 2002-07-11
CN1065564C (zh) 2001-05-09
US5789359A (en) 1998-08-04

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