TW360910B - Method of surface image formation for deep sub-micron semiconductor - Google Patents

Method of surface image formation for deep sub-micron semiconductor

Info

Publication number
TW360910B
TW360910B TW087103983A TW87103983A TW360910B TW 360910 B TW360910 B TW 360910B TW 087103983 A TW087103983 A TW 087103983A TW 87103983 A TW87103983 A TW 87103983A TW 360910 B TW360910 B TW 360910B
Authority
TW
Taiwan
Prior art keywords
photoresist
image formation
surface image
deep sub
silicon
Prior art date
Application number
TW087103983A
Other languages
Chinese (zh)
Inventor
Jing-Shiun Huang
Dung-Yuan Kuang
Guei-Wu Huang
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW087103983A priority Critical patent/TW360910B/en
Application granted granted Critical
Publication of TW360910B publication Critical patent/TW360910B/en

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  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

A method of surface image formation for a deep sub-micron semiconductor, comprises the following steps: coating a photoresist layer on the surface of a substrate, forming an exposure photoresist on the surface of the photoresist, forming a silicon-containing photoresist layer on the surface of the photoresist, forming a pattern on the photoresist by etching the silicon-containing photoresist, removing the photoresist material not underneath the silicon-containing photoresist by etching the photoresist layer, and removing the photoresist material residual on the substrate and not underneath the silicon-containing photoresist.
TW087103983A 1998-03-17 1998-03-17 Method of surface image formation for deep sub-micron semiconductor TW360910B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW087103983A TW360910B (en) 1998-03-17 1998-03-17 Method of surface image formation for deep sub-micron semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW087103983A TW360910B (en) 1998-03-17 1998-03-17 Method of surface image formation for deep sub-micron semiconductor

Publications (1)

Publication Number Publication Date
TW360910B true TW360910B (en) 1999-06-11

Family

ID=57940712

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087103983A TW360910B (en) 1998-03-17 1998-03-17 Method of surface image formation for deep sub-micron semiconductor

Country Status (1)

Country Link
TW (1) TW360910B (en)

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