TW358969B - Coating method and apparatus - Google Patents

Coating method and apparatus

Info

Publication number
TW358969B
TW358969B TW086112394A TW86112394A TW358969B TW 358969 B TW358969 B TW 358969B TW 086112394 A TW086112394 A TW 086112394A TW 86112394 A TW86112394 A TW 86112394A TW 358969 B TW358969 B TW 358969B
Authority
TW
Taiwan
Prior art keywords
injector
standby
processing liquid
sliding piece
application
Prior art date
Application number
TW086112394A
Other languages
English (en)
Inventor
Kiyohisa Tateyama
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW358969B publication Critical patent/TW358969B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/52—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter for removal of clogging particles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
TW086112394A 1996-08-30 1997-08-28 Coating method and apparatus TW358969B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24922896A JP3245812B2 (ja) 1996-08-30 1996-08-30 液処理方法及びその装置

Publications (1)

Publication Number Publication Date
TW358969B true TW358969B (en) 1999-05-21

Family

ID=17189834

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086112394A TW358969B (en) 1996-08-30 1997-08-28 Coating method and apparatus

Country Status (5)

Country Link
US (1) US5912054A (zh)
JP (1) JP3245812B2 (zh)
KR (1) KR100365078B1 (zh)
SG (1) SG54553A1 (zh)
TW (1) TW358969B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI496625B (zh) * 2012-06-29 2015-08-21 Univ Nat Taiwan 塗佈模組

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KR100475731B1 (ko) * 1997-09-13 2005-07-05 삼성전자주식회사 포토레지스트분사제어시스템
US6642155B1 (en) * 1998-06-05 2003-11-04 Micron Technology, Inc. Method for applying a fluid to a rotating silicon wafer surface
JP4301596B2 (ja) * 1998-06-12 2009-07-22 三菱電機株式会社 電子デバイスの製造方法および該製造方法に用いるスリット滴下ノズル
DE19851775A1 (de) 1998-11-10 2000-05-11 Focke & Co Verpackungsmaschine für Zigaretten
US6796517B1 (en) 2000-03-09 2004-09-28 Advanced Micro Devices, Inc. Apparatus for the application of developing solution to a semiconductor wafer
US7323212B2 (en) * 2003-10-29 2008-01-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system of controlling dummy dispense
KR100987674B1 (ko) * 2003-11-27 2010-10-13 엘지디스플레이 주식회사 노즐 세정장치 및 방법
KR100987676B1 (ko) 2003-12-08 2010-10-13 엘지디스플레이 주식회사 노즐 세정장치
JP4554303B2 (ja) * 2004-09-03 2010-09-29 東京エレクトロン株式会社 塗布装置及び塗布方法
US7255747B2 (en) 2004-12-22 2007-08-14 Sokudo Co., Ltd. Coat/develop module with independent stations
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
KR100756811B1 (ko) * 2005-11-24 2007-09-10 쥬가이로 고교 가부시키가이샤 토출 노즐의 세정장치
KR100772844B1 (ko) * 2005-11-30 2007-11-02 삼성전자주식회사 반도체 제조설비의 감광액 공급장치
KR101184069B1 (ko) * 2006-03-29 2012-09-19 엘지디스플레이 주식회사 폴리이미드막 도포 장치 및 그 방법
JP5025219B2 (ja) * 2006-10-04 2012-09-12 Ｎｔｎ株式会社 液体材料塗布ユニットおよび微細パターン欠陥修正装置
JP5305331B2 (ja) * 2008-06-17 2013-10-02 東京エレクトロン株式会社 現像処理方法及び現像処理装置
KR101955592B1 (ko) * 2015-12-17 2019-03-08 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
CN107303546A (zh) * 2016-04-20 2017-10-31 丁芳英 自动喷漆机基于安全漆污清洁处理装置
JP6981032B2 (ja) * 2017-04-18 2021-12-15 凸版印刷株式会社 ノズルの待機方法、及び塗布装置

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US3656200A (en) * 1969-11-14 1972-04-18 Xerox Corp Cleaning apparatus
US3874394A (en) * 1972-07-21 1975-04-01 James F Robertson Back roll cleaning apparatus and method
US4042415A (en) * 1974-05-28 1977-08-16 Xerox Corporation Method for scraping liquids from a moving surface
US3977898A (en) * 1974-06-24 1976-08-31 Xerox Corporation Method for cleaning a support surface
US4259372A (en) * 1978-07-13 1981-03-31 Phillips Petroleum Company Method and apparatus for applying sealant to a seam in a container
JPS57135066A (en) * 1981-02-14 1982-08-20 Tatsumo Kk Rotary applying machine
US4482391A (en) * 1982-12-06 1984-11-13 Foam Cutting Engineers, Inc. Cleaning method and apparatus for parabolic cellular louvers for lighting fixtures
GB8331152D0 (en) * 1983-11-22 1983-12-29 Henderson & Co Ltd John M Vessel nozzle cleaning apparatus
US5002008A (en) * 1988-05-27 1991-03-26 Tokyo Electron Limited Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state
DE3915549A1 (de) * 1989-05-12 1990-11-22 Sprimag Spritzmaschbau Gmbh Verfahren und vorrichtung zur reinigung von in eine spritzstellung ausfahrbaren spritzduesen eines spritzautomaten
JP2816510B2 (ja) * 1991-01-23 1998-10-27 東京エレクトロン株式会社 液体供給ノズル
JPH0780386A (ja) * 1993-09-10 1995-03-28 Hirata Corp 塗布ヘッドのクリーニング方法及び塗布ヘッドクリーニング装置
JPH0780385A (ja) * 1993-09-10 1995-03-28 Hirata Corp 塗布ヘッド洗浄装置及び塗布ヘッドの洗浄方法
JP3120168B2 (ja) * 1994-05-30 2000-12-25 東京エレクトロン株式会社 処理方法及び処理装置
US5695817A (en) * 1994-08-08 1997-12-09 Tokyo Electron Limited Method of forming a coating film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI496625B (zh) * 2012-06-29 2015-08-21 Univ Nat Taiwan 塗佈模組

Also Published As

Publication number Publication date
KR100365078B1 (ko) 2003-02-19
JP3245812B2 (ja) 2002-01-15
JPH1076203A (ja) 1998-03-24
SG54553A1 (en) 1998-11-16
US5912054A (en) 1999-06-15
KR19980019114A (ko) 1998-06-05

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