TW355220B - Reflective overcoat for replicated diffraction gratings - Google Patents
Reflective overcoat for replicated diffraction gratingsInfo
- Publication number
- TW355220B TW355220B TW087100066A TW87100066A TW355220B TW 355220 B TW355220 B TW 355220B TW 087100066 A TW087100066 A TW 087100066A TW 87100066 A TW87100066 A TW 87100066A TW 355220 B TW355220 B TW 355220B
- Authority
- TW
- Taiwan
- Prior art keywords
- overcoat
- adhesion layer
- diffraction gratings
- aluminum
- aluminum overcoat
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
- G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78562897A | 1997-01-17 | 1997-01-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW355220B true TW355220B (en) | 1999-04-01 |
Family
ID=25136109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087100066A TW355220B (en) | 1997-01-17 | 1999-02-24 | Reflective overcoat for replicated diffraction gratings |
Country Status (7)
Country | Link |
---|---|
US (1) | US5999318A (zh) |
EP (1) | EP0953161B1 (zh) |
JP (1) | JP2920164B2 (zh) |
AU (1) | AU5913698A (zh) |
DE (1) | DE69827604T2 (zh) |
TW (1) | TW355220B (zh) |
WO (1) | WO1998032036A1 (zh) |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19603637C1 (de) | 1996-02-01 | 1997-07-31 | Lambda Physik Gmbh | Laser zur Erzeugung schmalbandiger Strahlung |
US6162495A (en) * | 1997-09-29 | 2000-12-19 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
US6511703B2 (en) * | 1997-09-29 | 2003-01-28 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
US6424666B1 (en) | 1999-06-23 | 2002-07-23 | Lambda Physik Ag | Line-narrowing module for high power laser |
US6476987B1 (en) | 1999-08-04 | 2002-11-05 | Lambda Physik Ag | Excimer laser with line narrowing |
US6381256B1 (en) | 1999-02-10 | 2002-04-30 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
US6490307B1 (en) | 1999-03-17 | 2002-12-03 | Lambda Physik Ag | Method and procedure to automatically stabilize excimer laser output parameters |
US6795473B1 (en) | 1999-06-23 | 2004-09-21 | Lambda Physik Ag | Narrow band excimer laser with a prism-grating as line-narrowing optical element |
US6546037B2 (en) | 1999-02-10 | 2003-04-08 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
US6463086B1 (en) | 1999-02-10 | 2002-10-08 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
US6421365B1 (en) | 1999-11-18 | 2002-07-16 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser having an output coupling interferometer |
US6678291B2 (en) | 1999-12-15 | 2004-01-13 | Lambda Physik Ag | Molecular fluorine laser |
US6389052B2 (en) | 1999-03-17 | 2002-05-14 | Lambda Physik Ag | Laser gas replenishment method |
US6393040B1 (en) | 1999-02-24 | 2002-05-21 | Lambda Physik Ag | Molecular fluorine (F2) excimer laser with reduced coherence length |
US6727731B1 (en) | 1999-03-12 | 2004-04-27 | Lambda Physik Ag | Energy control for an excimer or molecular fluorine laser |
US6700915B2 (en) | 1999-03-12 | 2004-03-02 | Lambda Physik Ag | Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
US6298080B1 (en) | 1999-03-12 | 2001-10-02 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
DE29907349U1 (de) | 1999-04-26 | 2000-07-06 | Lambda Physik Gesellschaft zur Herstellung von Lasern mbH, 37079 Göttingen | Laser zur Erzeugung schmalbandiger Strahlung |
US6785316B1 (en) | 1999-08-17 | 2004-08-31 | Lambda Physik Ag | Excimer or molecular laser with optimized spectral purity |
US6553050B1 (en) | 1999-11-18 | 2003-04-22 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser having an output coupling interferometer |
US6603788B1 (en) | 1999-11-23 | 2003-08-05 | Lambda Physik Ag | Resonator for single line selection |
US6907058B2 (en) | 2000-01-25 | 2005-06-14 | Lambda Physik Ag | Energy monitor for molecular fluorine laser |
US6735232B2 (en) | 2000-01-27 | 2004-05-11 | Lambda Physik Ag | Laser with versatile output energy |
US7075963B2 (en) | 2000-01-27 | 2006-07-11 | Lambda Physik Ag | Tunable laser with stabilized grating |
US6941259B2 (en) * | 2000-03-01 | 2005-09-06 | Lamda Physik Ag | Laser software control system |
US20010049618A1 (en) * | 2000-03-23 | 2001-12-06 | Rainer Patzel | Method for allocating predictable costs for consumable items |
US6834066B2 (en) | 2000-04-18 | 2004-12-21 | Lambda Physik Ag | Stabilization technique for high repetition rate gas discharge lasers |
US6862307B2 (en) | 2000-05-15 | 2005-03-01 | Lambda Physik Ag | Electrical excitation circuit for a pulsed gas laser |
US6577663B2 (en) | 2000-06-19 | 2003-06-10 | Lambda Physik Ag | Narrow bandwidth oscillator-amplifier system |
US6603789B1 (en) | 2000-07-05 | 2003-08-05 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser with improved beam parameters |
US6807205B1 (en) | 2000-07-14 | 2004-10-19 | Lambda Physik Ag | Precise monitor etalon calibration technique |
US6721345B2 (en) | 2000-07-14 | 2004-04-13 | Lambda Physik Ag | Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers |
US6801561B2 (en) | 2000-09-25 | 2004-10-05 | Lambda Physik Ag | Laser system and method for spectral narrowing through wavefront correction |
US6747741B1 (en) | 2000-10-12 | 2004-06-08 | Lambda Physik Ag | Multiple-pass interferometric device |
JP2002169010A (ja) * | 2000-12-04 | 2002-06-14 | Minolta Co Ltd | 回折光学素子 |
GB0106050D0 (en) * | 2001-03-12 | 2001-05-02 | Suisse Electronique Microtech | Polarisers and mass-production method and apparatus for polarisers |
US6998620B2 (en) | 2001-08-13 | 2006-02-14 | Lambda Physik Ag | Stable energy detector for extreme ultraviolet radiation detection |
WO2003025633A1 (fr) * | 2001-09-13 | 2003-03-27 | Asahi Glass Company, Limited | Dispositif de diffraction |
US7376305B2 (en) * | 2001-11-26 | 2008-05-20 | Enablence Inc. | Echelle gratings with low Polarization Dependent Loss (PDL) using metal coating on the reflecting facets only |
DE10200293B4 (de) * | 2002-01-07 | 2007-12-20 | Carl Zeiss Laser Optics Gmbh | Optische Anordnung sowie Verfahren zur Herstellung einer solchen |
JP2003302514A (ja) * | 2002-04-09 | 2003-10-24 | Ricoh Co Ltd | 回折光学素子およびその製造方法および光ピックアップ装置および光ディスクドライブ装置 |
EP1588196A1 (en) * | 2003-01-06 | 2005-10-26 | Polychromix Corporation | Diffraction grating having high throughput effiency |
US20040183220A1 (en) * | 2003-03-18 | 2004-09-23 | Avinash Dalmia | Ultra thin layer coating using self-assembled molecules as a separating layer for diffraction grating application |
US7561611B2 (en) * | 2005-02-03 | 2009-07-14 | Corning Incorporated | Extended-lifetime elements for excimer lasers |
US8958070B2 (en) * | 2007-05-29 | 2015-02-17 | OptoTrace (SuZhou) Technologies, Inc. | Multi-layer variable micro structure for sensing substance |
FR2945159B1 (fr) * | 2009-04-29 | 2016-04-01 | Horiba Jobin Yvon Sas | Reseau de diffraction metallique en reflexion a haute tenue au flux en regime femtoseconde, systeme comprenant un tel reseau et procede d'amelioration du seuil d'endommagement d'un reseau de diffraction metallique |
JP5059079B2 (ja) | 2009-10-21 | 2012-10-24 | キヤノン株式会社 | 積層型回折光学素子および光学系 |
JP5731811B2 (ja) | 2010-12-15 | 2015-06-10 | キヤノン株式会社 | ブレーズ型回折格子の製造方法及びそのための型の製造方法 |
WO2012157697A1 (ja) * | 2011-05-19 | 2012-11-22 | 株式会社日立製作所 | 回折格子製造方法、分光光度計、および半導体装置の製造方法 |
JP6153305B2 (ja) * | 2011-10-06 | 2017-06-28 | キヤノン株式会社 | エシェル型回折格子の製造方法 |
JP6234667B2 (ja) * | 2012-08-06 | 2017-11-22 | 浜松ホトニクス株式会社 | 光学素子及びその製造方法 |
JP6188743B2 (ja) | 2014-06-19 | 2017-08-30 | キヤノン株式会社 | 複数の光学機能面を有する光学素子、分光装置およびその製造方法 |
WO2016098237A1 (ja) * | 2014-12-18 | 2016-06-23 | ギガフォトン株式会社 | グレーティング、グレーティングの製造方法及びグレーティングの再生方法 |
WO2020053950A1 (ja) * | 2018-09-11 | 2020-03-19 | 株式会社島津製作所 | ブレーズド回折格子 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2464738A (en) * | 1947-07-08 | 1949-03-15 | Perkin Elmer Corp | Method of making optical elements |
JPS4828336A (zh) * | 1971-08-18 | 1973-04-14 | ||
JPS5092148A (zh) * | 1973-12-14 | 1975-07-23 | ||
US3875026A (en) * | 1974-05-22 | 1975-04-01 | Rca Corp | Method for producing aluminum holographic masters |
US4616237A (en) * | 1982-09-27 | 1986-10-07 | Pa Management Consultants, Ltd. | Data storage medium |
GB8420182D0 (en) * | 1984-08-08 | 1984-09-12 | Pa Consulting Services | Diffraction gratings |
DE3883638T2 (de) * | 1987-06-27 | 1994-04-21 | Shimadzu Corp | Flexibles Replika-Gitter und optischer Multiplexer/Demultiplexer mit Anwendung eines solchen Gitters. |
DE3852296T2 (de) * | 1988-03-18 | 1995-04-13 | Instruments Sa | Beugungsgitter und Herstellungsverfahren dafür. |
US5493393A (en) * | 1989-03-17 | 1996-02-20 | The Boeing Company | Planar waveguide spectrograph |
JPH02278203A (ja) * | 1989-04-19 | 1990-11-14 | Adachi Shin Sangyo Kk | 光学反射板 |
JPH04211202A (ja) * | 1990-03-19 | 1992-08-03 | Canon Inc | 反射型回折格子および該回折格子を用いた装置 |
DE4201374A1 (de) * | 1992-01-20 | 1993-07-22 | Trw Repa Gmbh | Antriebseinheit in einem rueckhaltesystem fuer fahrzeuginsassen |
JP3147481B2 (ja) * | 1992-04-21 | 2001-03-19 | 松下電器産業株式会社 | ガラス製回折格子の成形用金型及びその製造方法及びガラス製回折格子の製造方法 |
US5384571A (en) * | 1992-05-18 | 1995-01-24 | Battelle Memorial Institute | Method of forming relief surfaces |
US5457573A (en) * | 1993-03-10 | 1995-10-10 | Matsushita Electric Industrial Co., Ltd. | Diffraction element and an optical multiplexing/demultiplexing device incorporating the same |
JP3307031B2 (ja) * | 1993-11-18 | 2002-07-24 | 株式会社島津製作所 | レプリカ回折格子 |
JPH07239407A (ja) * | 1994-02-28 | 1995-09-12 | Shimadzu Corp | レプリカ回折格子 |
-
1998
- 1998-01-12 AU AU59136/98A patent/AU5913698A/en not_active Abandoned
- 1998-01-12 JP JP10016380A patent/JP2920164B2/ja not_active Expired - Lifetime
- 1998-01-12 WO PCT/US1998/000525 patent/WO1998032036A1/en active IP Right Grant
- 1998-01-12 EP EP98902491A patent/EP0953161B1/en not_active Expired - Lifetime
- 1998-01-12 DE DE69827604T patent/DE69827604T2/de not_active Expired - Lifetime
-
1999
- 1999-02-24 TW TW087100066A patent/TW355220B/zh not_active IP Right Cessation
- 1999-03-09 US US09/265,288 patent/US5999318A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0953161B1 (en) | 2004-11-17 |
JP2920164B2 (ja) | 1999-07-19 |
AU5913698A (en) | 1998-08-07 |
DE69827604T2 (de) | 2005-04-28 |
WO1998032036A1 (en) | 1998-07-23 |
DE69827604D1 (de) | 2004-12-23 |
JPH10209533A (ja) | 1998-08-07 |
EP0953161A4 (en) | 2000-05-24 |
EP0953161A1 (en) | 1999-11-03 |
US5999318A (en) | 1999-12-07 |
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Legal Events
Date | Code | Title | Description |
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MK4A | Expiration of patent term of an invention patent |