TW346662B - Process for producing polybuffered spacer LOCOS isolation - Google Patents
Process for producing polybuffered spacer LOCOS isolationInfo
- Publication number
- TW346662B TW346662B TW086105081A TW86105081A TW346662B TW 346662 B TW346662 B TW 346662B TW 086105081 A TW086105081 A TW 086105081A TW 86105081 A TW86105081 A TW 86105081A TW 346662 B TW346662 B TW 346662B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- forming
- silicon nitride
- nitride layer
- silicon
- Prior art date
Links
Landscapes
- Element Separation (AREA)
- Local Oxidation Of Silicon (AREA)
Abstract
A process for producing polybuffered spacer LOCOS isolation, which at least comprising the following steps: forming a pad oxide layer on a silicon substrate; forming a first silicon nitride layer on the pad oxide layer; forming a photoresist layer on the first silicon nitride layer thereby defining an active region; dry etching the first silicon nitride layer using the photoresist layer as a mask; wet etching the pad oxide layer thereby forming a cavity; forming a silicon dioxide layer on the silicon substrate; forming a polysilicon layer on the silicon dioxide layer and the first silicon nitride layer; forming a second silicon nitride layer on the polysilicon layer; anisotropically etching the second silicon nitride layer; growing a field oxidation layer by a wet oxidation method thereby forming a polysilicon oxidation layer; and etching to remove the second silicon nitride layer, the polysilicon oxidation layer, the first silicon nitride layer, the silicon dioxide layer and the pad oxide layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW086105081A TW346662B (en) | 1997-04-18 | 1997-04-18 | Process for producing polybuffered spacer LOCOS isolation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW086105081A TW346662B (en) | 1997-04-18 | 1997-04-18 | Process for producing polybuffered spacer LOCOS isolation |
Publications (1)
Publication Number | Publication Date |
---|---|
TW346662B true TW346662B (en) | 1998-12-01 |
Family
ID=58263921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086105081A TW346662B (en) | 1997-04-18 | 1997-04-18 | Process for producing polybuffered spacer LOCOS isolation |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW346662B (en) |
-
1997
- 1997-04-18 TW TW086105081A patent/TW346662B/en not_active IP Right Cessation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |