TW343395B - Gas laser device - Google Patents

Gas laser device

Info

Publication number
TW343395B
TW343395B TW086100816A TW86100816A TW343395B TW 343395 B TW343395 B TW 343395B TW 086100816 A TW086100816 A TW 086100816A TW 86100816 A TW86100816 A TW 86100816A TW 343395 B TW343395 B TW 343395B
Authority
TW
Taiwan
Prior art keywords
laser
gas
laser device
gas laser
laser gas
Prior art date
Application number
TW086100816A
Other languages
English (en)
Inventor
Hiroshi Komori
Satoru Wakabayashi
Yoshiho Amada
Original Assignee
Komatsu Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Mfg Co Ltd filed Critical Komatsu Mfg Co Ltd
Application granted granted Critical
Publication of TW343395B publication Critical patent/TW343395B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
TW086100816A 1996-03-22 1997-01-23 Gas laser device TW343395B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8093179A JPH09260749A (ja) 1996-03-22 1996-03-22 ガスレーザ装置

Publications (1)

Publication Number Publication Date
TW343395B true TW343395B (en) 1998-10-21

Family

ID=14075361

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086100816A TW343395B (en) 1996-03-22 1997-01-23 Gas laser device

Country Status (5)

Country Link
US (1) US6151350A (zh)
JP (1) JPH09260749A (zh)
KR (1) KR100289097B1 (zh)
TW (1) TW343395B (zh)
WO (1) WO1997036352A1 (zh)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6778584B1 (en) * 1999-11-30 2004-08-17 Cymer, Inc. High power gas discharge laser with helium purged line narrowing unit
DE19842413C1 (de) * 1998-09-16 1999-10-28 Linde Ag Gasversorgung mit Gasen aus Gasbehältern
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
US6609540B1 (en) * 1999-06-24 2003-08-26 Showa Denko Kabushiki Kaisha Method and apparatus for supplying fluorine gas
JP2001024265A (ja) * 1999-07-05 2001-01-26 Komatsu Ltd 超狭帯域化フッ素レーザ装置
US6504860B2 (en) * 2001-01-29 2003-01-07 Cymer, Inc. Purge monitoring system for gas discharge laser
JP3985416B2 (ja) * 2000-03-02 2007-10-03 松下電器産業株式会社 ガスレーザ発振装置
KR100434850B1 (ko) * 2001-02-16 2004-06-07 (주)우리랑월드 머드 게임을 위한 전자 상거래 서비스 방법 및 장치
US6768765B1 (en) * 2001-06-07 2004-07-27 Lambda Physik Ag High power excimer or molecular fluorine laser system
JP2003042967A (ja) * 2001-07-27 2003-02-13 Hitachi Ltd パターン欠陥検査装置
US7830934B2 (en) 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US6973112B2 (en) * 2003-07-31 2005-12-06 Visx, Incorporated Passive gas flow management and filtration device for use in an excimer or transverse discharge laser
JP4650881B2 (ja) * 2005-04-20 2011-03-16 株式会社小松製作所 エキシマレーザ装置とレーザガス交換方法と部分ガス交換量演算方法
US20070030876A1 (en) * 2005-08-05 2007-02-08 Levatter Jeffrey I Apparatus and method for purging and recharging excimer laser gases
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
KR100696180B1 (ko) * 2006-05-24 2007-03-20 박영순 미닫이창문용 걸림장치
US20080130701A1 (en) * 2006-12-05 2008-06-05 Asml Netherlands B.V. Gas laser apparatus and method
US20080219317A1 (en) * 2007-03-06 2008-09-11 Pettit George H Gas-purged laser system and method thereof
US20080240197A1 (en) * 2007-03-27 2008-10-02 Photomedex Method and apparatus for efficiently operating a gas discharge excimer laser
KR100936251B1 (ko) * 2007-12-20 2010-01-12 주식회사 동부하이텍 레이저 가스 공급 시스템
US8873600B2 (en) * 2011-06-30 2014-10-28 Cymer, Llc System and method for high accuracy gas refill in a two chamber gas discharge laser system
JP6205603B2 (ja) * 2012-11-26 2017-10-04 精電舎電子工業株式会社 炭酸ガスレーザ装置
CN104006294B (zh) * 2013-02-27 2017-10-17 北京开天科技有限公司 一种轴快流激光器自混气供气系统
JP6322801B2 (ja) * 2017-03-14 2018-05-16 精電舎電子工業株式会社 炭酸ガスレーザの励起媒質ガス、炭酸ガスレーザを用いたマーキング装置、炭酸ガスレーザ発生方法、炭酸ガスレーザを用いたマーキング方法、及び炭酸ガスレーザ光源

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62118587A (ja) * 1985-11-19 1987-05-29 Mitsubishi Electric Corp 容器内の封入ガスの交換方法
JP2535960B2 (ja) * 1987-10-14 1996-09-18 日新電機株式会社 エキシマレ―ザ装置のガス充填方法
GB8927209D0 (en) * 1989-12-01 1990-01-31 British Aerospace Apparatus for controlling the composition of a laser gas or gas mixture
JPH04100285A (ja) * 1990-08-20 1992-04-02 Kawasaki Steel Corp ガスレーザ装置のレーザ媒質ガス交換方法
US5450436A (en) * 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
JPH06218587A (ja) * 1993-01-25 1994-08-09 Hitachi Tool Eng Ltd 粉末成形用被覆金型
US5440578B1 (en) * 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers
JP2816813B2 (ja) * 1994-04-12 1998-10-27 株式会社小松製作所 エキシマレーザ装置

Also Published As

Publication number Publication date
US6151350A (en) 2000-11-21
KR100289097B1 (ko) 2001-09-22
WO1997036352A1 (fr) 1997-10-02
JPH09260749A (ja) 1997-10-03
KR20000004940A (ko) 2000-01-25

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