TW297147B - Multi-level circuit structure including fluorinated parylene polymer dielectric interlayers - Google Patents

Multi-level circuit structure including fluorinated parylene polymer dielectric interlayers Download PDF

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TW297147B
TW297147B TW084111936A TW84111936A TW297147B TW 297147 B TW297147 B TW 297147B TW 084111936 A TW084111936 A TW 084111936A TW 84111936 A TW84111936 A TW 84111936A TW 297147 B TW297147 B TW 297147B
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circuit structure
level circuit
conductor layers
base
dielectric
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TW084111936A
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English (en)
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William F Beach
John Wary
Roger A Olson
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Specialty Coating Systems Inc
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/025Polyxylylenes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329Insulating materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/34Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain
    • C08G2261/342Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing only carbon atoms
    • C08G2261/3424Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing only carbon atoms non-conjugated, e.g. paracyclophanes or xylenes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Description

A7 B7 五、發明説明(1 ) 本發明之背景和概要 通常本發明係關於多層次電路結構’較特別者係關於 使用氟化之聚對苯二甲撐聚合物作爲介電中間層材料在此 類電路結構內。 聚對苯二甲撐是使用來敘述一類的聚對_苯二甲撐的 一個屬性術語,此類聚對一苯二甲撐係由具有下式之二聚 物所衍生出: (請先閲讀背面之注意事項再填寫本頁) -裝.
'訂
本紙張尺度適用中國國家標準(CNS ) A4規格(210'〆297公釐) 一 4 - 經濟部中央標準局員工消費合作杜印製 A7 B7 五、發明説明(2 ) 聚對苯二甲撐塗料係藉一種眾所周知之蒸汽澱積方法 自聚對苯二甲撐二聚物予以獲得,在此蒸汽澱積方法中將 二聚物汽.化,熱解,即分裂成一種單體蒸汽形式並餵供至 一個真空室中,單體分子在其中澱積並聚合成爲一片薄膜 在經配置在真空室內之一個基體上。該過程係根據下列反 應而產生: H^C—/"〇V^z , 由於其產生薄膜之能力及與各種各樣之幾何學形狀的 基體相一致,聚對苯二甲撐物料是理想地適合供使用作爲 廣泛領域中之一個貼合之外部塗層,舉例而言例如在電子 ,自動車和藥物等工業中》 八氟—〔2 ’ 2〕對環玢(AF4二聚物)是上述二 聚物之氟化之經體並具有下式:
所熟悉者,經由蒸汽澱積方法自A F 4二聚物所衍生 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) 1: :-----^ 威-- (請先閱讀背面之注意事項再填寫本莧)
、1T 207147 A7 B7 五、發明説明(3 ) 之聚對苯二甲撐塗料(聚對苯二甲撐A F 4 )具有極高之 熔化溫度(大約500 °C)及極低介電常數(大約2. 3 )。此等特性使聚對苯二甲撐AF4理想適合於許多應用 包括經使用於高溫和濕潤環境中之電子電路的外部塗料β 本發明提供一種多層次電路結構它利用氟化之聚對苯 二甲撐聚合物作爲該多層次電路結構的金屬導體層間之介 電中間層而非作爲一個外部塗層,咸信高熔化溫度和低介 電常數將使氟化之對苯二甲撐物料極適合於半導體晶片構 造以及印刷電路板構造,彎曲電路,多片模組( MCM< s )及其他積體電路結構。 該多層次電路結構宜包括形成至少部份的一條積體多 層次電路之至少兩個金屬導體層及經配置在兩接鄰之金屬 導體層間之一個介電中間層,其中該介電中間層包括一種 氟化之聚對苯二甲撐聚合物。該氟化之對苯二甲撐聚合物 宜具有下列構造:
其中G是由氯,氟和具有式CnF2n + 1(n=l ,2 ,3 .........)之全氟烷基基團所組成之該團中所選出之一 個芳族核取代基基團且另外其中m = 0至4而X是大於1 〇 因此,在本發明的目的中者是:供應一種多層次電路 本紙張尺度逋用中國國家標準(CNS > A4規格(210X297公釐) I.^---^-----{袭-- (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部中央標準局貝工消費合作社印裳 -6 - 經濟部中央標準局員工消費合作社印製 A7 ______B7_ 五、發明説明(4 ) 結構包括形成至少部份之一條多層次電路之至少兩個金屬 導體層及經配置在兩接鄰金靥導體層間之一個介電中間層 ,其中該介電中間層包括一個氟化之聚對苯二甲撐聚合物 0 本發明的其他目的,特徵和優點,當關於附隨之舉例 說明之圖式予以考慮時當其敘述進行時將變得顯然可見。 圖式之敘述: 在該圖式中,此圖式舉例說明爲了實行本發明目前所 計劃之最佳模式,該圖是依照本發明之一種半導體多層次 電路結構之截面圖》 較佳具體啻施例之敘述 現在述及該圖式,舉例說明本發明之多層次電路結構 ,通常在圖式上以數字1 〇予以指示。應了解者,爲了舉 例說明之目的,各種電路層之厚度在圖式中已予大爲增大 而實際上,可變更其相對厚度。如經使用於此說明書中及 附隨之申請專利範圍中的術語$多層次電路結構〃 1 0意 欲包括任何型式的多層次電路結構包括但並非受限爲:半 導體晶片,印刷電路板,鸳曲電路,半導體晶片包及多片 模組。僅爲了實例之目的,較佳具體實施例之敘述將特別 指向一種半導體晶片結構,唯應了解者,該敘 述不應限 制附隨之申請專利範圍之範圍。 本紙張尺度逋用中國國家標準(CNS ) A4規格(210X297公釐) " ' ' (請先閲讀背面之注意事項再填寫本頁) 裝. 1 經濟部中央標隼局貝工消費合作社印製 A7 B7 五、發明説明(5 ) 該多層次電路結構1 0,即半導體構造包括一個矽晶 片基體1 2 ,此基體業經經由眾所周知之技術予以化學處 理而形成電晶體在其上且另外包括經配置在晶片12之頂 上之一個s i 02 (氧化物)層1 3以及許多金靥導體層 1 4 »在另種方式中,例如在印刷電路板之情況中,該基 體12可由一種塑膠或玻璃纖維背板所構成。 保護層1 3是半導體技藝方面一種眾所周知之組件而 其功能是保護矽晶片基體1 2,即電晶體免受上部金靥導 體層1 4之影響。此等金靥導體層1 4包括根據眾所周知 之照相石版印刷和蝕刻等技術所形成之金靥導體線。在另 種多層次電路結構中,例如晶片包和多片模組中,該等金 屬層14可交替式包括功率平面及/或接地平面以及金靥 互連痕跡層。 該電路結構10更另外包括許多的介電中間層16此 等中間層分隔每一個金屬導體層14並提供介電障壁在其 中間。將各個敷金屬之層1 4互連於必須時藉小徑或通過 經由傳統設備和方法予以形成在各介電層16中之各孔( 圖中未示)而通過各個介電中間層1 6 ,因此可見,在許 多方面,該多層次電路結構具有該項技藝方面之相對地傳 統性,當然除去使用以形成此等介電層1 6之材料,將在 下文中予以敘述。 該介電中間層16宜包括具有下列構造之一種氟化之 聚對苯二甲撐聚合物: 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 裝 訂 8 經濟部中夬橾準局負工消費合作社印製 A7 _____B7 五、發明説明(6 )
其中G是由氯,氟和具有式CnF2n+1(n = l ,2,3 .........)之全氟烷基基團所組成之該團中所選出之一個芳 族核取代基基團且另外其中m=〇至4而X是大於1。 可將上述之氟化之聚對苯二甲撐聚合物藉如先前所述 之一種眾所周知之化學蒸汽澱積方法有效地澱積至金屬導 體層上或至其他基體表面上。該項蒸汽澱積方法對於精於 聚對苯二甲撐技藝之人士係眾所周知而因此不再敘述。 如在此說明書的背景中先前所述,知道氟化之聚對苯 二甲撐聚合物,尤其AF 4具有極低之介電常數(大約 2. 2至2. 3)。該技藝之目前狀態,特別關於半導體 工業技術利用中間層材料例如S i 02,S i 02具有 3. 0或3. 0以上之介電常數。因此咸信上述之氟化之 聚對苯二甲撐聚合物提供優於各種較早技藝材料之優良介 電常數。此外,澱積聚對苯二甲撐聚合物薄膜的方法在該 項技藝方面係眾所周知且咸信與現行之製造晶片之工業技 術極爲可相容。 因此可見,本發明提供一種獨特且新穎之多層次電路 結構其中合併了提供獨特且極所意欲之化學和電性質之氟 化之聚對苯二甲撐聚合物介電中間層。爲了此等原因咸信 本發明的主題代表該項技藝方面之一個甚大改進^ 本紙張尺度適用中國國家橾準(CNS ) A4規格(210X 297公釐) ' —9 - I.^--II-----f -裝-- (請先閲讀背面之注意事項再填寫本頁) 訂 A7 B7 五、發明説明(7 ) 雖然本文中顯示有並記述具體表現本發明之某些特殊 結構,但是精於此項技藝之人士將顯示只要不遠離基礎之 本發明概念的要旨和範圍,可以作成各部份之變型和重配 置以及除去在經由附隨之申請專利範圍的範圍所指示之限 度以外,本發明並不受限爲本文中所示之特殊形式。 1^---:-----^ 袭------tr------rf (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標隼局員工消費合作社印製 本紙張尺度逋用中國國家標隼(CNS ) A4規格(210X 297公釐) 10 -

Claims (1)

  1. 2妁U7 翩 C8 D8 六、申請專利範圍 1. 一種多層次電路結構具有至少兩個金靥導體層和 經配置在該兩個金屬導體層間的一個介電中間層,其中該 聚 撐 甲 二 苯 對 聚 tlmll 種 1 之 造 構 列 下 有 具 含 包 構 結 路 電 次·· 層物 多合
    η (請先閱讀背面之注意事項再填寫本!) 裝· 之於 出大 選是 所 X 中而 /IV 1 團 4 +C該至 2之ο FC 成 || C 組m 式所中 有團其 具基外 和基另 氯烷且 , 氟團 氟全基 由之基 是彡代 G ; 取 中:核 其 一 族 2 3 芳 個 訂 經濟部中央標準局貝工消費合作社印製 本紙張尺度逋用中國國家梂準(CNS ) A4規格(210X297公釐) 11
TW084111936A 1995-10-27 1995-11-10 Multi-level circuit structure including fluorinated parylene polymer dielectric interlayers TW297147B (en)

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