TW283667B - - Google Patents

Info

Publication number
TW283667B
TW283667B TW084107033A TW84107033A TW283667B TW 283667 B TW283667 B TW 283667B TW 084107033 A TW084107033 A TW 084107033A TW 84107033 A TW84107033 A TW 84107033A TW 283667 B TW283667 B TW 283667B
Authority
TW
Taiwan
Application number
TW084107033A
Other languages
Chinese (zh)
Original Assignee
Noritake Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14000994A external-priority patent/JPH08965A/ja
Priority claimed from JP1176295A external-priority patent/JPH08197536A/ja
Application filed by Noritake Co Ltd filed Critical Noritake Co Ltd
Application granted granted Critical
Publication of TW283667B publication Critical patent/TW283667B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M175/00—Working-up used lubricants to recover useful products ; Cleaning
    • C10M175/0058—Working-up used lubricants to recover useful products ; Cleaning by filtration and centrifugation processes; apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D17/00—Separation of liquids, not provided for elsewhere, e.g. by thermal diffusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
    • B01D35/12—Devices for taking out of action one or more units of multi- unit filters, e.g. for regeneration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B01D37/041—Controlling the filtration by clearness or turbidity measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B01D37/043—Controlling the filtration by flow measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B01D37/046—Controlling the filtration by pressure measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/16—Feed pretreatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/22—Controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/02—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by sawing
    • B28D1/025—Use, recovery or regeneration of abrasive mediums
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Thermal Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • Mining & Mineral Resources (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
TW084107033A 1994-06-22 1995-07-07 TW283667B (forum.php)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14000994A JPH08965A (ja) 1994-06-22 1994-06-22 加工廃液再生方法および加工廃液再生装置
JP1176295A JPH08197536A (ja) 1995-01-27 1995-01-27 加工廃液再生方法および加工廃液再生装置

Publications (1)

Publication Number Publication Date
TW283667B true TW283667B (forum.php) 1996-08-21

Family

ID=26347282

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084107033A TW283667B (forum.php) 1994-06-22 1995-07-07

Country Status (5)

Country Link
US (1) US5772900A (forum.php)
KR (1) KR100229989B1 (forum.php)
DE (1) DE19580845T1 (forum.php)
TW (1) TW283667B (forum.php)
WO (1) WO1995035261A1 (forum.php)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998049102A1 (de) * 1997-04-28 1998-11-05 Siemens Aktiengesellschaft Verfahren und vorrichtung zur behandlung von abwasser aus einem chemisch-mechanischen polierprozess in der chipfertigung
US6379538B1 (en) 1997-06-05 2002-04-30 Lucid Treatment Systems, Inc. Apparatus for separation and recovery of liquid and slurry abrasives used for polishing
US6099398A (en) * 1998-08-20 2000-08-08 C.D.S. Inc. Media assist gaseous nitrogen distribution system for deflashing machine
US6280300B1 (en) * 1998-11-25 2001-08-28 Ebara Corporation Filter apparatus
JP3426149B2 (ja) * 1998-12-25 2003-07-14 富士通株式会社 半導体製造における研磨廃液再利用方法及び再利用装置
DE19912252A1 (de) * 1999-03-18 2000-09-28 Wacker Siltronic Halbleitermat Verfahren zum Wiederaufarbeiten einer Suspension
US6746309B2 (en) * 1999-05-27 2004-06-08 Sanyo Electric Co., Ltd. Method of fabricating a semiconductor device
DE10008023A1 (de) * 2000-02-22 2001-08-23 Qiagen Gmbh Vorrichtung zum Filtern und Beseitigen von Flüssigkeiten
JP2001287163A (ja) * 2000-04-06 2001-10-16 Nec Corp 研磨用スラリー再生装置
DE10120608B4 (de) * 2000-05-03 2007-10-04 Karl-Heinz Pfaff Verfahren zur Filtration einer Flüssigkeit und Filtereinrichtung dafür
JP2005537121A (ja) * 2002-06-26 2005-12-08 デン・コンゲリエ・ヴェテリネー−オ・ランボホイスコレ 二重多孔フィルタ
US20040014403A1 (en) * 2002-07-16 2004-01-22 Oberkampf Brandon L. CMP point of use filtration
JP2004146041A (ja) * 2002-10-04 2004-05-20 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法
ATE528054T1 (de) * 2004-01-30 2011-10-15 P M P O S R L Anlage und verfahren zur behandlung eines kühlfluids in mechanischen bearbeitungsanlagen
US20090274596A1 (en) * 2006-02-24 2009-11-05 Ihi Compressor And Machinery Co., Ltd. Method and apparatus for processing silicon particles
PL2016992T3 (pl) * 2007-07-16 2012-10-31 Krones Ag Urządzenie i sposób uzdatniania cieczy czyszczących zbierających się w browarach
EP2207869B1 (en) * 2007-10-30 2019-01-09 Pall Corporation Method for treating spent abrasive slurry
WO2009056153A1 (en) * 2007-10-30 2009-05-07 Pall Corporation Method and system for manufacturing wafer-like slices from a substrate material
CN102176958A (zh) * 2008-08-19 2011-09-07 陶氏环球技术有限责任公司 分级催化剂组合物、设备、和方法
KR100985861B1 (ko) * 2008-09-24 2010-10-08 씨앤지하이테크 주식회사 반도체용 슬러리 공급장치 및 슬러리 공급방법
JP2010167551A (ja) * 2008-12-26 2010-08-05 Nomura Micro Sci Co Ltd 使用済みスラリーの再生方法
DE102009044204A1 (de) 2009-10-08 2011-04-28 Fab Service Gmbh Wiederaufbereitungsverfahren und Wiederaufbereitungsvorrichtung zur Wiederaufbereitung von Slurry-Abwasser aus einem Halbleiterbearbeitungs-prozess, insbesondere aus einem chemisch-mechanischen Polierprozess
US20120042575A1 (en) * 2010-08-18 2012-02-23 Cabot Microelectronics Corporation Cmp slurry recycling system and methods
US8696404B2 (en) * 2011-12-21 2014-04-15 WD Media, LLC Systems for recycling slurry materials during polishing processes
US10112136B2 (en) * 2012-02-03 2018-10-30 Enviro-Fab Llc Fluid lubricant and material shavings recapture system for a cutting operation
SG11201404444TA (en) 2012-02-17 2014-10-30 Konica Minolta Inc Abrasive regeneration method
CN104619462B (zh) * 2012-09-14 2017-08-01 株式会社Lg化学 含氧化铈废磨料的再生方法
JP5580388B2 (ja) * 2012-11-02 2014-08-27 ファナック株式会社 フィルタ洗浄装置を備えた工作機械
JP6000119B2 (ja) * 2012-12-27 2016-09-28 株式会社ディスコ 加工廃液処理装置
DE102013211252A1 (de) * 2013-06-17 2014-12-31 Robert Bosch Gmbh Anlage und Verfahren zur Behandlung von verunreinigtem Abwasser
CN105235083B (zh) * 2015-09-30 2017-02-01 浙江辉弘光电能源有限公司 一种硅片切割机用切削液去水结构
MX2021000860A (es) 2018-07-27 2021-07-15 Arc Medical Devices Inc Composiciones de fucano con bajo contenido de endotoxina y métodos para obtenerlas.
US12186334B2 (en) 2018-07-27 2025-01-07 ARC Medical Inc. High-molecular-weight fucans for treating fibrous adhesions and other diseases and conditions
US12179299B2 (en) * 2018-08-07 2024-12-31 Illinois Tool Works Inc. Machine tool with recirculating coolant filtration system
BR112021000625A2 (pt) 2019-03-05 2021-09-21 Arc Medical Devices Inc. Sistemas e métodos para filtração de fluxo tangencial de composições viscosas
CN109897723A (zh) * 2019-03-22 2019-06-18 江苏赛瑞迈科新材料有限公司 一种废润滑油再生生产的预处理方法
WO2022056723A1 (en) * 2020-09-16 2022-03-24 Illinois Tool Works Inc. Standpipe recirculation systems for material removal machines
CN116036713A (zh) * 2023-01-10 2023-05-02 深圳市奥科宝特种油剂有限公司 适用于铝合金抛光铝粉和失效抛光砂分离的装置及方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56152781A (en) * 1980-04-30 1981-11-26 Toyota Motor Corp Purifying and reproducing method for oil-containing waste fluid
US4538644A (en) * 1983-06-09 1985-09-03 Applied Power Inc. Pressure regulator
JPS601403U (ja) * 1983-06-16 1985-01-08 日東電工株式会社 膜分離装置
JPH0741535B2 (ja) * 1991-04-10 1995-05-10 中小企業事業団 ラップ加工装置の砥粒液再生・循環装置

Also Published As

Publication number Publication date
WO1995035261A1 (fr) 1995-12-28
DE19580845T1 (de) 1996-10-31
KR100229989B1 (ko) 1999-11-15
KR960703809A (ko) 1996-08-31
US5772900A (en) 1998-06-30

Similar Documents

Publication Publication Date Title
TW283667B (forum.php)
TW278151B (forum.php)
FR2724843B1 (forum.php)
TW279838B (forum.php)
TW279189B (forum.php)
TW267946B (forum.php)
ITTO950976A0 (forum.php)
FR2727632B1 (forum.php)
IN184816B (forum.php)
ECSDI940184S (forum.php)
ITTO940094A0 (forum.php)
IN187531B (forum.php)
ECSMU940034U (forum.php)
IN184333B (forum.php)
IN183914B (forum.php)
IN178778B (forum.php)
CU22453A3 (forum.php)
DK40195A (forum.php)
ECSDI940185S (forum.php)
ECSDI940192S (forum.php)
ECSDI940194S (forum.php)
ECSDI940198S (forum.php)
ECSDI940203S (forum.php)
ECSMU940030U (forum.php)
CU22450A3 (forum.php)