TW283667B - - Google Patents

Info

Publication number
TW283667B
TW283667B TW084107033A TW84107033A TW283667B TW 283667 B TW283667 B TW 283667B TW 084107033 A TW084107033 A TW 084107033A TW 84107033 A TW84107033 A TW 84107033A TW 283667 B TW283667 B TW 283667B
Authority
TW
Taiwan
Application number
TW084107033A
Original Assignee
Noritake Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14000994A external-priority patent/JPH08965A/ja
Priority claimed from JP1176295A external-priority patent/JPH08197536A/ja
Application filed by Noritake Co Ltd filed Critical Noritake Co Ltd
Application granted granted Critical
Publication of TW283667B publication Critical patent/TW283667B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M175/00—Working-up used lubricants to recover useful products ; Cleaning
    • C10M175/0058—Working-up used lubricants to recover useful products ; Cleaning by filtration and centrifugation processes; apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D17/00—Separation of liquids, not provided for elsewhere, e.g. by thermal diffusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
    • B01D35/12—Devices for taking out of action one or more units of multi- unit filters, e.g. for regeneration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B01D37/041—Controlling the filtration by clearness or turbidity measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B01D37/043—Controlling the filtration by flow measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B01D37/046—Controlling the filtration by pressure measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/16—Feed pretreatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/22—Controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/02—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by sawing
    • B28D1/025—Use, recovery or regeneration of abrasive mediums
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mining & Mineral Resources (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
TW084107033A 1994-06-22 1995-07-07 TW283667B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14000994A JPH08965A (ja) 1994-06-22 1994-06-22 加工廃液再生方法および加工廃液再生装置
JP1176295A JPH08197536A (ja) 1995-01-27 1995-01-27 加工廃液再生方法および加工廃液再生装置

Publications (1)

Publication Number Publication Date
TW283667B true TW283667B (zh) 1996-08-21

Family

ID=26347282

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084107033A TW283667B (zh) 1994-06-22 1995-07-07

Country Status (5)

Country Link
US (1) US5772900A (zh)
KR (1) KR100229989B1 (zh)
DE (1) DE19580845T1 (zh)
TW (1) TW283667B (zh)
WO (1) WO1995035261A1 (zh)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998049102A1 (de) * 1997-04-28 1998-11-05 Siemens Aktiengesellschaft Verfahren und vorrichtung zur behandlung von abwasser aus einem chemisch-mechanischen polierprozess in der chipfertigung
US6379538B1 (en) 1997-06-05 2002-04-30 Lucid Treatment Systems, Inc. Apparatus for separation and recovery of liquid and slurry abrasives used for polishing
US6099398A (en) * 1998-08-20 2000-08-08 C.D.S. Inc. Media assist gaseous nitrogen distribution system for deflashing machine
US6280300B1 (en) * 1998-11-25 2001-08-28 Ebara Corporation Filter apparatus
JP3426149B2 (ja) * 1998-12-25 2003-07-14 富士通株式会社 半導体製造における研磨廃液再利用方法及び再利用装置
DE19912252A1 (de) * 1999-03-18 2000-09-28 Wacker Siltronic Halbleitermat Verfahren zum Wiederaufarbeiten einer Suspension
US6746309B2 (en) * 1999-05-27 2004-06-08 Sanyo Electric Co., Ltd. Method of fabricating a semiconductor device
DE10008023A1 (de) * 2000-02-22 2001-08-23 Qiagen Gmbh Vorrichtung zum Filtern und Beseitigen von Flüssigkeiten
JP2001287163A (ja) * 2000-04-06 2001-10-16 Nec Corp 研磨用スラリー再生装置
DE10120608B4 (de) * 2000-05-03 2007-10-04 Karl-Heinz Pfaff Verfahren zur Filtration einer Flüssigkeit und Filtereinrichtung dafür
WO2004002605A1 (en) * 2002-06-26 2004-01-08 Den Kongelige Veterinær-Og Landbohøjskole Dual porosity filter
US20040014403A1 (en) * 2002-07-16 2004-01-22 Oberkampf Brandon L. CMP point of use filtration
JP2004146041A (ja) * 2002-10-04 2004-05-20 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法
EP1559469B1 (en) * 2004-01-30 2011-10-12 P.M.P.O. S.R.L. Plant and method for the treatment of the recovery cooling fluid in mechanical processing plants
US20090274596A1 (en) * 2006-02-24 2009-11-05 Ihi Compressor And Machinery Co., Ltd. Method and apparatus for processing silicon particles
EP2016992B1 (de) * 2007-07-16 2012-05-30 KRONES Aktiengesellschaft Vorrichtung und Verfahren zum Aufbereiten von in Brauereien anfallenden Reinigungsflüssigkeiten
WO2009056152A1 (en) * 2007-10-30 2009-05-07 Pall Corporation Method for treating spent abrasive slurry
EP2205387A1 (en) * 2007-10-30 2010-07-14 Pall Corporation Method and system for manufacturing wafer-like slices from a substrate material
RU2011110378A (ru) * 2008-08-19 2012-09-27 ДАУ ГЛОБАЛ ТЕКНОЛОДЖИЗ ЭлЭлСи (US) Классифицированная каталитическая композиция, устройство и способ
KR100985861B1 (ko) * 2008-09-24 2010-10-08 씨앤지하이테크 주식회사 반도체용 슬러리 공급장치 및 슬러리 공급방법
JP2010167551A (ja) * 2008-12-26 2010-08-05 Nomura Micro Sci Co Ltd 使用済みスラリーの再生方法
DE102009044204A1 (de) 2009-10-08 2011-04-28 Fab Service Gmbh Wiederaufbereitungsverfahren und Wiederaufbereitungsvorrichtung zur Wiederaufbereitung von Slurry-Abwasser aus einem Halbleiterbearbeitungs-prozess, insbesondere aus einem chemisch-mechanischen Polierprozess
US20120042575A1 (en) * 2010-08-18 2012-02-23 Cabot Microelectronics Corporation Cmp slurry recycling system and methods
US8696404B2 (en) * 2011-12-21 2014-04-15 WD Media, LLC Systems for recycling slurry materials during polishing processes
US10112136B2 (en) * 2012-02-03 2018-10-30 Enviro-Fab Llc Fluid lubricant and material shavings recapture system for a cutting operation
MY175053A (en) * 2012-02-17 2020-06-03 Konica Minolta Inc Abrasive regeneration method
JP5940224B2 (ja) * 2012-09-14 2016-06-29 エルジー・ケム・リミテッド セリア含有廃研磨材の再生方法
JP5580388B2 (ja) * 2012-11-02 2014-08-27 ファナック株式会社 フィルタ洗浄装置を備えた工作機械
JP6000119B2 (ja) * 2012-12-27 2016-09-28 株式会社ディスコ 加工廃液処理装置
DE102013211252A1 (de) * 2013-06-17 2014-12-31 Robert Bosch Gmbh Anlage und Verfahren zur Behandlung von verunreinigtem Abwasser
CN105235083B (zh) * 2015-09-30 2017-02-01 浙江辉弘光电能源有限公司 一种硅片切割机用切削液去水结构
US11628183B2 (en) 2018-07-27 2023-04-18 ARC Medical Ine. Highly purified fucans for the treatment of fibrous adhesions
US20200047299A1 (en) * 2018-08-07 2020-02-13 Illinois Tool Works Inc. Coolant recapture and recirculation in material removal systems
CA3106478A1 (en) * 2019-03-05 2020-09-10 Arc Medical Devices Inc. Systems and methods for tangential flow filtration of viscous compositions
CN109897723A (zh) * 2019-03-22 2019-06-18 江苏赛瑞迈科新材料有限公司 一种废润滑油再生生产的预处理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56152781A (en) * 1980-04-30 1981-11-26 Toyota Motor Corp Purifying and reproducing method for oil-containing waste fluid
US4538644A (en) * 1983-06-09 1985-09-03 Applied Power Inc. Pressure regulator
JPS601403U (ja) * 1983-06-16 1985-01-08 日東電工株式会社 膜分離装置
JPH0741535B2 (ja) * 1991-04-10 1995-05-10 中小企業事業団 ラップ加工装置の砥粒液再生・循環装置

Also Published As

Publication number Publication date
KR100229989B1 (ko) 1999-11-15
WO1995035261A1 (fr) 1995-12-28
DE19580845T1 (de) 1996-10-31
KR960703809A (ko) 1996-08-31
US5772900A (en) 1998-06-30

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