TW280928B - - Google Patents
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- Publication number
- TW280928B TW280928B TW084110778A TW84110778A TW280928B TW 280928 B TW280928 B TW 280928B TW 084110778 A TW084110778 A TW 084110778A TW 84110778 A TW84110778 A TW 84110778A TW 280928 B TW280928 B TW 280928B
- Authority
- TW
- Taiwan
- Prior art keywords
- probe
- optical
- microscope
- scanning
- patent application
- Prior art date
Links
- 239000000523 sample Substances 0.000 claims description 175
- 230000003287 optical effect Effects 0.000 claims description 75
- 230000005855 radiation Effects 0.000 claims description 35
- 239000013307 optical fiber Substances 0.000 claims description 28
- 239000000835 fiber Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 13
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 230000007246 mechanism Effects 0.000 claims description 3
- 238000011161 development Methods 0.000 claims 2
- 238000012856 packing Methods 0.000 claims 1
- 238000012546 transfer Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 238000001514 detection method Methods 0.000 description 11
- 239000004020 conductor Substances 0.000 description 10
- 230000008901 benefit Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000010408 sweeping Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- 241000282326 Felis catus Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
- G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Engineering & Computer Science (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Optics & Photonics (AREA)
- Analytical Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32829794A | 1994-10-24 | 1994-10-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW280928B true TW280928B (enExample) | 1996-07-11 |
Family
ID=23280384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW084110778A TW280928B (enExample) | 1994-10-24 | 1995-10-13 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5693938A (enExample) |
| EP (1) | EP0709704A1 (enExample) |
| JP (1) | JPH08240599A (enExample) |
| KR (1) | KR960014991A (enExample) |
| TW (1) | TW280928B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2903211B2 (ja) * | 1996-04-09 | 1999-06-07 | セイコーインスツルメンツ株式会社 | プローブとプローブ製造方法及び走査型プローブ顕微鏡 |
| US5811796A (en) * | 1996-06-03 | 1998-09-22 | Lucent Technologies Inc. | Optical probe microscope having a fiber optic tip that receives both a dither motion and a scanning motion, for nondestructive metrology of large sample surfaces |
| DE19631498A1 (de) * | 1996-08-03 | 1998-02-05 | Huels Chemische Werke Ag | Verfahren und Vorrichtung zur optischen Rasternahfeldmikroskopie an Probekörpern in Flüssigkeiten |
| JP3249419B2 (ja) * | 1997-03-12 | 2002-01-21 | セイコーインスツルメンツ株式会社 | 走査型近接場光学顕微鏡 |
| JPH10288618A (ja) * | 1997-04-16 | 1998-10-27 | Seiko Instr Inc | 表面分析装置 |
| US6043485A (en) * | 1997-10-30 | 2000-03-28 | Fuji Photo Film Co., Ltd. | Sample analyzer |
| US6504618B2 (en) * | 2001-03-21 | 2003-01-07 | Rudolph Technologies, Inc. | Method and apparatus for decreasing thermal loading and roughness sensitivity in a photoacoustic film thickness measurement system |
| CN100565099C (zh) * | 2001-07-13 | 2009-12-02 | 鲁道夫科技公司 | 用于提高光声膜厚度测量系统中的信噪比的方法和设备 |
| US7372584B2 (en) * | 2005-04-11 | 2008-05-13 | Rudolph Technologies, Inc. | Dual photo-acoustic and resistivity measurement system |
| US11506877B2 (en) | 2016-11-10 | 2022-11-22 | The Trustees Of Columbia University In The City Of New York | Imaging instrument having objective axis and light sheet or light beam projector axis intersecting at less than 90 degrees |
| US10234670B2 (en) * | 2017-03-29 | 2019-03-19 | Hikari Instruments, Llc | Microscope focusing device |
| CN117849399B (zh) * | 2023-11-10 | 2025-07-15 | 北京航空航天大学 | 开放式模块化的扫描探针显微镜控制系统 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4758065A (en) * | 1985-03-08 | 1988-07-19 | Mechanical Technology Incorporated | Fiber optic sensor probe |
| DE69026780T2 (de) * | 1989-09-22 | 1996-11-07 | Fuji Photo Film Co Ltd | Rastermikroskop und Rastermechanismus dafür |
| US5198715A (en) * | 1990-05-23 | 1993-03-30 | Digital Instruments, Inc. | Scanner for scanning probe microscopes having reduced Z-axis non-linearity |
| JPH0527177A (ja) * | 1991-07-25 | 1993-02-05 | Fuji Photo Film Co Ltd | 走査型顕微鏡 |
| US5196713A (en) * | 1991-08-22 | 1993-03-23 | Wyko Corporation | Optical position sensor with corner-cube and servo-feedback for scanning microscopes |
| US5254854A (en) | 1991-11-04 | 1993-10-19 | At&T Bell Laboratories | Scanning microscope comprising force-sensing means and position-sensitive photodetector |
| US5308974B1 (en) * | 1992-11-30 | 1998-01-06 | Digital Instr Inc | Scanning probe microscope using stored data for vertical probe positioning |
-
1995
- 1995-10-13 TW TW084110778A patent/TW280928B/zh not_active IP Right Cessation
- 1995-10-18 EP EP95307429A patent/EP0709704A1/en not_active Withdrawn
- 1995-10-23 KR KR1019950036594A patent/KR960014991A/ko not_active Abandoned
- 1995-10-24 JP JP7274618A patent/JPH08240599A/ja not_active Withdrawn
-
1996
- 1996-06-03 US US08/657,390 patent/US5693938A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US5693938A (en) | 1997-12-02 |
| EP0709704A1 (en) | 1996-05-01 |
| KR960014991A (ko) | 1996-05-22 |
| JPH08240599A (ja) | 1996-09-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |