TW278223B - - Google Patents

Info

Publication number
TW278223B
TW278223B TW083111241A TW83111241A TW278223B TW 278223 B TW278223 B TW 278223B TW 083111241 A TW083111241 A TW 083111241A TW 83111241 A TW83111241 A TW 83111241A TW 278223 B TW278223 B TW 278223B
Authority
TW
Taiwan
Application number
TW083111241A
Other languages
Chinese (zh)
Original Assignee
At & T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by At & T Corp filed Critical At & T Corp
Application granted granted Critical
Publication of TW278223B publication Critical patent/TW278223B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks
    • H10W20/01—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
    • H10W70/66—
    • H10W90/00—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0315—Oxidising metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Multi-Conductor Connections (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
  • Combinations Of Printed Boards (AREA)
TW083111241A 1994-04-01 1994-12-02 TW278223B (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/221,731 US5449955A (en) 1994-04-01 1994-04-01 Film circuit metal system for use with bumped IC packages

Publications (1)

Publication Number Publication Date
TW278223B true TW278223B (enExample) 1996-06-11

Family

ID=22829115

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083111241A TW278223B (enExample) 1994-04-01 1994-12-02

Country Status (7)

Country Link
US (1) US5449955A (enExample)
EP (1) EP0675674B1 (enExample)
JP (1) JP3373324B2 (enExample)
KR (1) KR100304993B1 (enExample)
DE (1) DE69500388T2 (enExample)
HK (1) HK1000549A1 (enExample)
TW (1) TW278223B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103258809A (zh) * 2012-02-15 2013-08-21 稳懋半导体股份有限公司 三五族化合物半导体组件的铜金属连接线

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997041594A1 (en) * 1996-04-29 1997-11-06 Carl Shine Multilayer solder/barrier attach for semiconductor chip
US5989989A (en) * 1996-05-31 1999-11-23 Texas Instruments Incorporated Die and cube reroute process
DE19712219A1 (de) * 1997-03-24 1998-10-01 Bosch Gmbh Robert Verfahren zur Herstellung von Lothöckern definierter Größe
US6082610A (en) * 1997-06-23 2000-07-04 Ford Motor Company Method of forming interconnections on electronic modules
US6093966A (en) * 1998-03-20 2000-07-25 Motorola, Inc. Semiconductor device with a copper barrier layer and formation thereof
EP1110905A1 (en) * 1999-12-24 2001-06-27 SensoNor asa Micro-electromechanical device
KR100455678B1 (ko) * 2002-02-06 2004-11-06 마이크로스케일 주식회사 반도체 플립칩 패키지를 위한 솔더 범프 구조 및 그 제조방법
JP2003303842A (ja) * 2002-04-12 2003-10-24 Nec Electronics Corp 半導体装置およびその製造方法
TW550800B (en) * 2002-05-27 2003-09-01 Via Tech Inc Integrated circuit package without solder mask and method for the same
SG107600A1 (en) * 2002-06-27 2004-12-29 Agency Science Tech & Res Multilayer substrate metallization for ic interconnection
DE10238816B4 (de) * 2002-08-23 2008-01-10 Qimonda Ag Verfahren zur Herstellung von Anschlussbereichen einer integrierten Schaltung und integrierte Schaltung mit Anschlussbereichen
DE10239081B4 (de) * 2002-08-26 2007-12-20 Qimonda Ag Verfahren zur Herstellung einer Halbleitereinrichtung
DE10240921B4 (de) * 2002-09-02 2007-12-13 Qimonda Ag Verfahren und Anordnung zum selektiven Metallisieren von 3-D-Strukturen
DE10251658B4 (de) * 2002-11-01 2005-08-25 Atotech Deutschland Gmbh Verfahren zum Verbinden von zur Herstellung von Mikrostrukturbauteilen geeigneten, mikrostrukturierten Bauteillagen sowie Mikrostrukturbauteil
US7223695B2 (en) * 2004-09-30 2007-05-29 Intel Corporation Methods to deposit metal alloy barrier layers
WO2006070808A1 (ja) * 2004-12-28 2006-07-06 Rohm Co., Ltd. 半導体チップおよびその製造方法、半導体チップの電極構造およびその形成方法、ならびに半導体装置
US20080157910A1 (en) * 2006-12-29 2008-07-03 Park Chang-Min Amorphous soft magnetic layer for on-die inductively coupled wires
FR2952314B1 (fr) * 2009-11-12 2012-02-10 Sagem Defense Securite Procede de brasage, gyroscope et piece brasee
US9553063B2 (en) * 2010-11-16 2017-01-24 Mitsubishi Electric Corporation Semiconductor element, semiconductor device and method for manufacturing semiconductor element
JP2015012112A (ja) * 2013-06-28 2015-01-19 京セラサーキットソリューションズ株式会社 配線基板
CN112687556B (zh) * 2020-12-24 2023-07-18 中国电子科技集团公司第十三研究所 在基板表面集成bga焊盘的阻焊制备方法及结构
US11830806B2 (en) * 2021-04-29 2023-11-28 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure and method of manufacturing the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3451030A (en) * 1966-07-01 1969-06-17 Gen Electric Solder-bonded semiconductor strain gauges
GB1202199A (en) * 1966-11-22 1970-08-12 G V Planer Ltd Improvements in or relating to thermoelectric devices
US3622385A (en) * 1968-07-19 1971-11-23 Hughes Aircraft Co Method of providing flip-chip devices with solderable connections
US3781596A (en) * 1972-07-07 1973-12-25 R Galli Semiconductor chip carriers and strips thereof
US4016050A (en) * 1975-05-12 1977-04-05 Bell Telephone Laboratories, Incorporated Conduction system for thin film and hybrid integrated circuits
DE2554691C2 (de) * 1974-12-10 1982-11-18 Western Electric Co., Inc., 10038 New York, N.Y. Verfahren zum Herstellen elektrischer Leiter auf einem isolierenden Substrat und danach hergestellte Dünnschichtschaltung
JPS5715432A (en) * 1980-07-01 1982-01-26 Mitsubishi Electric Corp Semiconductor element
GB2176938A (en) * 1985-06-24 1987-01-07 Nat Semiconductor Corp Pad metallization structure
US5288951A (en) 1992-10-30 1994-02-22 At&T Bell Laboratories Copper-based metallizations for hybrid integrated circuits

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103258809A (zh) * 2012-02-15 2013-08-21 稳懋半导体股份有限公司 三五族化合物半导体组件的铜金属连接线

Also Published As

Publication number Publication date
DE69500388D1 (de) 1997-08-07
JPH07297540A (ja) 1995-11-10
US5449955A (en) 1995-09-12
HK1000549A1 (en) 1998-04-03
KR100304993B1 (ko) 2001-11-30
DE69500388T2 (de) 1997-10-23
EP0675674A1 (en) 1995-10-04
EP0675674B1 (en) 1997-07-02
JP3373324B2 (ja) 2003-02-04
KR950034675A (ko) 1995-12-28

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