TW247297B - - Google Patents

Info

Publication number
TW247297B
TW247297B TW083104766A TW83104766A TW247297B TW 247297 B TW247297 B TW 247297B TW 083104766 A TW083104766 A TW 083104766A TW 83104766 A TW83104766 A TW 83104766A TW 247297 B TW247297 B TW 247297B
Authority
TW
Taiwan
Application number
TW083104766A
Other languages
Chinese (zh)
Original Assignee
Grace W R & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R & Co filed Critical Grace W R & Co
Application granted granted Critical
Publication of TW247297B publication Critical patent/TW247297B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Materials For Photolithography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
TW083104766A 1993-06-25 1994-05-25 TW247297B (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8268993A 1993-06-25 1993-06-25

Publications (1)

Publication Number Publication Date
TW247297B true TW247297B (cg-RX-API-DMAC10.html) 1995-05-11

Family

ID=22172784

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083104766A TW247297B (cg-RX-API-DMAC10.html) 1993-06-25 1994-05-25

Country Status (12)

Country Link
US (1) US5925500A (cg-RX-API-DMAC10.html)
EP (1) EP0634695B1 (cg-RX-API-DMAC10.html)
JP (1) JP3463953B2 (cg-RX-API-DMAC10.html)
KR (1) KR950000412A (cg-RX-API-DMAC10.html)
CN (1) CN1111761A (cg-RX-API-DMAC10.html)
AU (1) AU665147B2 (cg-RX-API-DMAC10.html)
BR (1) BR9402431A (cg-RX-API-DMAC10.html)
CA (1) CA2121865C (cg-RX-API-DMAC10.html)
DE (1) DE4339010C2 (cg-RX-API-DMAC10.html)
ES (1) ES2138646T3 (cg-RX-API-DMAC10.html)
NZ (1) NZ260292A (cg-RX-API-DMAC10.html)
TW (1) TW247297B (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10108087B2 (en) 2016-03-11 2018-10-23 Macdermid Graphics Solutions Llc Method of improving light stability of flexographic printing plates featuring flat top dots

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TWI645986B (zh) * 2016-03-11 2019-01-01 美商麥克達米德圖像對策公司 光硬化性印刷胚料及由其製造柔版立體像印刷元件之方法

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KR950000412A (ko) 1995-01-03
JP3463953B2 (ja) 2003-11-05
JPH0717151A (ja) 1995-01-20
EP0634695A1 (en) 1995-01-18
BR9402431A (pt) 1995-01-24
CA2121865C (en) 2006-08-15
US5925500A (en) 1999-07-20
CN1111761A (zh) 1995-11-15
ES2138646T3 (es) 2000-01-16
NZ260292A (en) 1995-12-21
DE4339010C2 (de) 2000-05-18
AU5945294A (en) 1995-01-05
EP0634695B1 (en) 1999-09-08
DE4339010A1 (de) 1995-01-05
CA2121865A1 (en) 1994-12-26
AU665147B2 (en) 1995-12-14

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