TW215965B - Thick film resistor composition - Google Patents

Thick film resistor composition

Info

Publication number
TW215965B
TW215965B TW082103746A TW82103746A TW215965B TW 215965 B TW215965 B TW 215965B TW 082103746 A TW082103746 A TW 082103746A TW 82103746 A TW82103746 A TW 82103746A TW 215965 B TW215965 B TW 215965B
Authority
TW
Taiwan
Prior art keywords
glass
thick film
film resistor
resistor composition
ruthenium
Prior art date
Application number
TW082103746A
Other languages
English (en)
Inventor
Keiichiro Hayakawa
Takeshi Sato
Jerome David Smith
William Borland
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of TW215965B publication Critical patent/TW215965B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • C03C3/074—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/105—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/108—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10—Frit compositions, i.e. in a powdered or comminuted form containing lead
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
    • H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
    • H01C17/0654—Oxides of the platinum group
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06573—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder
    • H01C17/0658—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder composed of inorganic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Non-Adjustable Resistors (AREA)
  • Glass Compositions (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
TW082103746A 1992-05-11 1993-05-11 Thick film resistor composition TW215965B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4117701A JPH05335110A (ja) 1992-05-11 1992-05-11 厚膜抵抗体組成物

Publications (1)

Publication Number Publication Date
TW215965B true TW215965B (en) 1993-11-11

Family

ID=14718171

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082103746A TW215965B (en) 1992-05-11 1993-05-11 Thick film resistor composition

Country Status (7)

Country Link
EP (1) EP0594827B1 (zh)
JP (1) JPH05335110A (zh)
KR (1) KR0130831B1 (zh)
CN (1) CN1033410C (zh)
DE (1) DE69325871T2 (zh)
TW (1) TW215965B (zh)
WO (1) WO1993023855A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100365692B1 (ko) 2000-02-24 2002-12-26 삼성전자 주식회사 토너 화상 정착을 위한 직접 가열 롤러 및 그 제조 방법
US8257619B2 (en) * 2008-04-18 2012-09-04 E I Du Pont De Nemours And Company Lead-free resistive composition
CN102007080B (zh) * 2008-04-18 2014-05-07 E.I.内穆尔杜邦公司 使用含铜玻璃料的电阻器组合物
TW201227761A (en) 2010-12-28 2012-07-01 Du Pont Improved thick film resistive heater compositions comprising ag & ruo2, and methods of making same
CN103021601A (zh) * 2012-12-27 2013-04-03 青岛艾德森能源科技有限公司 一种电阻浆料
CN104464991B (zh) * 2013-09-12 2017-06-06 中国振华集团云科电子有限公司 一种线性正温度系数热敏电阻浆料的制备方法
CN104409133A (zh) * 2014-12-26 2015-03-11 常熟联茂电子科技有限公司 一种无机电阻浆料
CN104464878A (zh) * 2014-12-26 2015-03-25 常熟联茂电子科技有限公司 一种电阻浆料
CN106571170A (zh) * 2016-10-25 2017-04-19 东莞珂洛赫慕电子材料科技有限公司 一种具有低电阻重烧变化率的高温无铅钌浆及其制备方法
CN109637695A (zh) * 2018-12-12 2019-04-16 西安宏星电子浆料科技有限责任公司 一种高性能厚膜电阻浆料组合物
CN112992401B (zh) * 2021-04-25 2021-09-03 西安宏星电子浆料科技股份有限公司 一种可无损调阻的电阻浆料
CN114853448B (zh) * 2022-06-08 2023-05-16 中国振华集团云科电子有限公司 一种低温共烧用负温度系数热敏陶瓷材料制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4362656A (en) * 1981-07-24 1982-12-07 E. I. Du Pont De Nemours And Company Thick film resistor compositions
US4961999A (en) * 1988-07-21 1990-10-09 E. I. Du Pont De Nemours And Company Thermistor composition
US5096619A (en) * 1989-03-23 1992-03-17 E. I. Du Pont De Nemours And Company Thick film low-end resistor composition

Also Published As

Publication number Publication date
CN1086042A (zh) 1994-04-27
DE69325871T2 (de) 2000-01-13
CN1033410C (zh) 1996-11-27
EP0594827B1 (en) 1999-08-04
KR0130831B1 (ko) 1998-05-15
WO1993023855A1 (en) 1993-11-25
DE69325871D1 (de) 1999-09-09
JPH05335110A (ja) 1993-12-17
EP0594827A1 (en) 1994-05-04

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees