TW202512289A - 基板處理方法及基板處理系統 - Google Patents

基板處理方法及基板處理系統 Download PDF

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Publication number
TW202512289A
TW202512289A TW113116259A TW113116259A TW202512289A TW 202512289 A TW202512289 A TW 202512289A TW 113116259 A TW113116259 A TW 113116259A TW 113116259 A TW113116259 A TW 113116259A TW 202512289 A TW202512289 A TW 202512289A
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TW
Taiwan
Prior art keywords
peripheral
substrate
peripheral modified
wafer
zone
Prior art date
Application number
TW113116259A
Other languages
English (en)
Chinese (zh)
Inventor
山下陽平
溝本康隆
中尾淳一
Original Assignee
日商東京威力科創股份有限公司
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Publication date
Application filed by 日商東京威力科創股份有限公司 filed Critical 日商東京威力科創股份有限公司
Publication of TW202512289A publication Critical patent/TW202512289A/zh

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00Cutting or separating of wafers, substrates or parts of devices
    • H10P54/30Cutting or separating of wafers, substrates or parts of devices by forming weakened zones for subsequent cutting or separating, e.g. by laser treatment or by ion implantation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • B23K26/53Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0428Apparatus for mechanical treatment or grinding or cutting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Photovoltaic Devices (AREA)
TW113116259A 2023-05-23 2024-05-01 基板處理方法及基板處理系統 TW202512289A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023-084865 2023-05-23
JP2023084865 2023-05-23

Publications (1)

Publication Number Publication Date
TW202512289A true TW202512289A (zh) 2025-03-16

Family

ID=93590080

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113116259A TW202512289A (zh) 2023-05-23 2024-05-01 基板處理方法及基板處理系統

Country Status (5)

Country Link
JP (1) JPWO2024241699A1 (https=)
KR (1) KR20260014587A (https=)
CN (1) CN121100394A (https=)
TW (1) TW202512289A (https=)
WO (1) WO2024241699A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118263105A (zh) 2018-03-14 2024-06-28 东京毅力科创株式会社 基板处理系统、基板处理方法以及计算机存储介质
KR102760744B1 (ko) 2018-04-27 2025-02-03 도쿄엘렉트론가부시키가이샤 기판 처리 시스템 및 기판 처리 방법
KR102903523B1 (ko) 2018-04-27 2025-12-23 도쿄엘렉트론가부시키가이샤 기판 처리 시스템 및 기판 처리 방법
JP7221076B2 (ja) * 2019-02-18 2023-02-13 東京エレクトロン株式会社 レーザー加工装置の設定方法、レーザー加工方法、レーザー加工装置、薄化システム、および基板処理方法
CN115398599A (zh) * 2020-04-20 2022-11-25 东京毅力科创株式会社 基板处理装置和基板处理方法
JP7549551B2 (ja) * 2021-03-08 2024-09-11 キオクシア株式会社 半導体製造装置および半導体装置の製造方法
JP7724137B2 (ja) * 2021-11-04 2025-08-15 浜松ホトニクス株式会社 レーザ加工装置、及び、レーザ加工方法

Also Published As

Publication number Publication date
JPWO2024241699A1 (https=) 2024-11-28
WO2024241699A1 (ja) 2024-11-28
KR20260014587A (ko) 2026-01-30
CN121100394A (zh) 2025-12-09

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