TW202440667A - 組成物、聚合性組成物、離子交換樹脂、離子交換膜、膜電極接合體、氫製造裝置及離子交換膜之製造方法 - Google Patents

組成物、聚合性組成物、離子交換樹脂、離子交換膜、膜電極接合體、氫製造裝置及離子交換膜之製造方法 Download PDF

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Publication number
TW202440667A
TW202440667A TW113103360A TW113103360A TW202440667A TW 202440667 A TW202440667 A TW 202440667A TW 113103360 A TW113103360 A TW 113103360A TW 113103360 A TW113103360 A TW 113103360A TW 202440667 A TW202440667 A TW 202440667A
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TW
Taiwan
Prior art keywords
ammonium salt
ion exchange
composition
quaternary ammonium
carbon atoms
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TW113103360A
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English (en)
Chinese (zh)
Inventor
上森理弘
浅田陽亮
磯村武範
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日商德山股份有限公司
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Publication of TW202440667A publication Critical patent/TW202440667A/zh

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/06—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/20—Manufacture of shaped structures of ion-exchange resins

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
TW113103360A 2023-01-31 2024-01-29 組成物、聚合性組成物、離子交換樹脂、離子交換膜、膜電極接合體、氫製造裝置及離子交換膜之製造方法 TW202440667A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2023013651 2023-01-31
JP2023-013651 2023-01-31
JP2023-013650 2023-01-31
JP2023013650 2023-01-31

Publications (1)

Publication Number Publication Date
TW202440667A true TW202440667A (zh) 2024-10-16

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TW113103360A TW202440667A (zh) 2023-01-31 2024-01-29 組成物、聚合性組成物、離子交換樹脂、離子交換膜、膜電極接合體、氫製造裝置及離子交換膜之製造方法

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JP (1) JPWO2024162071A1 (https=)
TW (1) TW202440667A (https=)
WO (1) WO2024162071A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4621120A (en) * 1985-04-01 1986-11-04 Eastman Kodak Company Polymeric antibacterial compositions
US4794067A (en) * 1987-11-23 1988-12-27 Polaroid Corporation, Patent Dept. Copolymeric mordants and photographic products and processes containing same
US5705357A (en) * 1994-08-29 1998-01-06 Johnson & Johnson Clinical Diagnostics, Inc. Chemiluminescent reagent and assay using a substituted acetanilide for light generation
JP3948504B2 (ja) * 1998-10-06 2007-07-25 富士フイルム株式会社 感光性平版印刷版
JP2003001963A (ja) * 2001-06-22 2003-01-08 Fuji Photo Film Co Ltd 平版印刷原版およびその製造方法
JP5770163B2 (ja) * 2010-03-31 2015-08-26 株式会社トクヤマ 固体高分子型燃料電池用隔膜の製造方法
JP2015047537A (ja) * 2013-08-30 2015-03-16 富士フイルム株式会社 高分子機能性膜及びその製造方法

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WO2024162071A1 (ja) 2024-08-08

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