TW202405883A - 基板處理系統、基板處理方法及元件構造 - Google Patents

基板處理系統、基板處理方法及元件構造 Download PDF

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Publication number
TW202405883A
TW202405883A TW112120516A TW112120516A TW202405883A TW 202405883 A TW202405883 A TW 202405883A TW 112120516 A TW112120516 A TW 112120516A TW 112120516 A TW112120516 A TW 112120516A TW 202405883 A TW202405883 A TW 202405883A
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TW
Taiwan
Prior art keywords
laser
layer
wafer
substrate
interface
Prior art date
Application number
TW112120516A
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English (en)
Chinese (zh)
Inventor
山下陽平
Original Assignee
日商東京威力科創股份有限公司
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Publication date
Application filed by 日商東京威力科創股份有限公司 filed Critical 日商東京威力科創股份有限公司
Publication of TW202405883A publication Critical patent/TW202405883A/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/18Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • B23K26/57Working by transmitting the laser beam through or within the workpiece the laser beam entering a face of the workpiece from which it is transmitted through the workpiece material to work on a different workpiece face, e.g. for effecting removal, fusion splicing, modifying or reforming
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Element Separation (AREA)
TW112120516A 2022-07-27 2023-06-01 基板處理系統、基板處理方法及元件構造 TW202405883A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-119975 2022-07-27
JP2022119975 2022-07-27

Publications (1)

Publication Number Publication Date
TW202405883A true TW202405883A (zh) 2024-02-01

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ID=89705935

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112120516A TW202405883A (zh) 2022-07-27 2023-06-01 基板處理系統、基板處理方法及元件構造

Country Status (3)

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JP (1) JP7815447B2 (https=)
TW (1) TW202405883A (https=)
WO (1) WO2024024191A1 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007220749A (ja) * 2006-02-14 2007-08-30 Seiko Epson Corp 半導体装置の製造方法
US12512336B2 (en) 2020-03-24 2025-12-30 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
CN115335965B (zh) 2020-03-24 2025-10-14 东京毅力科创株式会社 基板处理方法和基板处理装置
JP2022091504A (ja) 2020-12-09 2022-06-21 東京エレクトロン株式会社 レーザ照射システム、基板処理装置及び基板処理方法

Also Published As

Publication number Publication date
WO2024024191A1 (ja) 2024-02-01
JP7815447B2 (ja) 2026-02-17
JPWO2024024191A1 (https=) 2024-02-01

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