JP7815447B2 - 基板処理システム、基板処理方法及びデバイス構造 - Google Patents
基板処理システム、基板処理方法及びデバイス構造Info
- Publication number
- JP7815447B2 JP7815447B2 JP2024536783A JP2024536783A JP7815447B2 JP 7815447 B2 JP7815447 B2 JP 7815447B2 JP 2024536783 A JP2024536783 A JP 2024536783A JP 2024536783 A JP2024536783 A JP 2024536783A JP 7815447 B2 JP7815447 B2 JP 7815447B2
- Authority
- JP
- Japan
- Prior art keywords
- interface
- absorption layer
- substrate
- laser
- laser absorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/57—Working by transmitting the laser beam through or within the workpiece the laser beam entering a face of the workpiece from which it is transmitted through the workpiece material to work on a different workpiece face, e.g. for effecting removal, fusion splicing, modifying or reforming
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Element Separation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022119975 | 2022-07-27 | ||
| JP2022119975 | 2022-07-27 | ||
| PCT/JP2023/016356 WO2024024191A1 (ja) | 2022-07-27 | 2023-04-25 | 基板処理システム、基板処理方法及びデバイス構造 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024024191A1 JPWO2024024191A1 (https=) | 2024-02-01 |
| JP7815447B2 true JP7815447B2 (ja) | 2026-02-17 |
Family
ID=89705935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024536783A Active JP7815447B2 (ja) | 2022-07-27 | 2023-04-25 | 基板処理システム、基板処理方法及びデバイス構造 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7815447B2 (https=) |
| TW (1) | TW202405883A (https=) |
| WO (1) | WO2024024191A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007220749A (ja) | 2006-02-14 | 2007-08-30 | Seiko Epson Corp | 半導体装置の製造方法 |
| WO2021192853A1 (ja) | 2020-03-24 | 2021-09-30 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| WO2021192854A1 (ja) | 2020-03-24 | 2021-09-30 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| JP2022091504A (ja) | 2020-12-09 | 2022-06-21 | 東京エレクトロン株式会社 | レーザ照射システム、基板処理装置及び基板処理方法 |
-
2023
- 2023-04-25 WO PCT/JP2023/016356 patent/WO2024024191A1/ja not_active Ceased
- 2023-04-25 JP JP2024536783A patent/JP7815447B2/ja active Active
- 2023-06-01 TW TW112120516A patent/TW202405883A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007220749A (ja) | 2006-02-14 | 2007-08-30 | Seiko Epson Corp | 半導体装置の製造方法 |
| WO2021192853A1 (ja) | 2020-03-24 | 2021-09-30 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| WO2021192854A1 (ja) | 2020-03-24 | 2021-09-30 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| JP2022091504A (ja) | 2020-12-09 | 2022-06-21 | 東京エレクトロン株式会社 | レーザ照射システム、基板処理装置及び基板処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202405883A (zh) | 2024-02-01 |
| WO2024024191A1 (ja) | 2024-02-01 |
| JPWO2024024191A1 (https=) | 2024-02-01 |
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Legal Events
| Date | Code | Title | Description |
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