TW202305050A - 粉體及其製造方法、以及樹脂組合物的製造方法 - Google Patents

粉體及其製造方法、以及樹脂組合物的製造方法 Download PDF

Info

Publication number
TW202305050A
TW202305050A TW111112560A TW111112560A TW202305050A TW 202305050 A TW202305050 A TW 202305050A TW 111112560 A TW111112560 A TW 111112560A TW 111112560 A TW111112560 A TW 111112560A TW 202305050 A TW202305050 A TW 202305050A
Authority
TW
Taiwan
Prior art keywords
particles
powder
mass
less
classification
Prior art date
Application number
TW111112560A
Other languages
English (en)
Chinese (zh)
Inventor
江上美紀
谷口正展
荒金宏忠
村口良
Original Assignee
日商日揮觸媒化成股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日揮觸媒化成股份有限公司 filed Critical 日商日揮觸媒化成股份有限公司
Publication of TW202305050A publication Critical patent/TW202305050A/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/22Expanded, porous or hollow particles
    • C08K7/24Expanded, porous or hollow particles inorganic
    • C08K7/26Silicon- containing compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Compounds (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
TW111112560A 2021-03-31 2022-03-31 粉體及其製造方法、以及樹脂組合物的製造方法 TW202305050A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-060589 2021-03-31
JP2021060589 2021-03-31

Publications (1)

Publication Number Publication Date
TW202305050A true TW202305050A (zh) 2023-02-01

Family

ID=83459556

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111112560A TW202305050A (zh) 2021-03-31 2022-03-31 粉體及其製造方法、以及樹脂組合物的製造方法

Country Status (5)

Country Link
JP (1) JP7853955B2 (https=)
KR (1) KR20230164008A (https=)
CN (1) CN116917233A (https=)
TW (1) TW202305050A (https=)
WO (1) WO2022210920A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7396735B1 (ja) 2022-11-25 2023-12-12 三水株式会社 中空粒子の製造方法
WO2026034578A1 (ja) * 2024-08-09 2026-02-12 積水化成品工業株式会社 中空樹脂粒子、およびその用途

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001288227A (ja) 2000-02-04 2001-10-16 Daikin Ind Ltd 高周波電気特性に優れたテトラフルオロエチレン系樹脂成形用材料
US7413791B2 (en) 2003-01-28 2008-08-19 Matsushita Electric Works, Ltd. Poly (phenylene ether) resin composition, prepreg, and laminated sheet
CN101454246A (zh) * 2006-06-09 2009-06-10 株式会社德山 干式二氧化硅微粒
CN101490138B (zh) * 2006-08-21 2012-07-18 株式会社日本触媒 微粒、微粒的制备方法、含有该微粒的树脂组合物及光学薄膜
WO2009040921A1 (ja) 2007-09-27 2009-04-02 Panasonic Electric Works Co., Ltd. エポキシ樹脂組成物、そのエポキシ樹脂組成物を用いたプリプレグ及び金属張積層板
TWI457282B (zh) * 2008-06-20 2014-10-21 電氣化學工業股份有限公司 非晶質矽石質粉末、其製造方法、樹脂組成物、及半導體封止材
CN102471590B (zh) * 2009-07-14 2015-05-20 花王株式会社 低介电树脂组合物
JP5822663B2 (ja) * 2011-11-11 2015-11-24 日揮触媒化成株式会社 耐湿性を備えたシリカ系粒子とその製造方法、該粒子を含む半導体封止用樹脂組成物、および該樹脂組成物により塗膜を形成された基材
WO2013121703A1 (ja) * 2012-02-13 2013-08-22 株式会社トクヤマシルテック 新規な特性プロファイルを有するシリカバルーン材料
JP2018083759A (ja) * 2015-03-24 2018-05-31 旭硝子株式会社 化粧料
JP6623640B2 (ja) 2015-09-18 2019-12-25 三菱瓦斯化学株式会社 プリプレグ
JP2017071526A (ja) * 2015-10-06 2017-04-13 株式会社トクヤマシルテック 溶媒に対して良好な懸濁プロファイルを有するシリカバルーン材料。
JP6255053B2 (ja) * 2016-04-20 2017-12-27 花王株式会社 中空シリカ粒子及びその製造方法
US11926753B2 (en) 2018-03-26 2024-03-12 Daikin Industries, Ltd. Fluororesin material, fluororesin material for high frequency transmission, and covered electric wire for high-frequency transmission

Also Published As

Publication number Publication date
JP7853955B2 (ja) 2026-04-30
CN116917233A (zh) 2023-10-20
KR20230164008A (ko) 2023-12-01
JPWO2022210920A1 (https=) 2022-10-06
WO2022210920A1 (ja) 2022-10-06

Similar Documents

Publication Publication Date Title
CN116529321B (zh) 空心颗粒及其制造方法以及树脂组合物
JP2996354B2 (ja) 中空ボロシリケート微小球及び製造方法
TW202305050A (zh) 粉體及其製造方法、以及樹脂組合物的製造方法
CN116477635A (zh) 低介电非晶质二氧化硅粉体及其制造方法、浆料、树脂组合物、预浸料、印刷布线板
US20240209210A1 (en) Spherical silica powder and method for producing spherical silica powder
TW202204486A (zh) 分散液之製造方法
TW202302744A (zh) 粉體及其製造方法、以及樹脂組合物的製造方法
TWI882929B (zh) 封裝基板用耐鹼性球形二氧化矽漿料及其製備方法
JP7001609B2 (ja) フレーク状ガラス及び樹脂組成物
US20240327644A1 (en) Filler for electronic materials and method for producing same, slurry for electronic materials, and resin composition for electronic materials
JP2023150838A (ja) 粉体及びその製造方法、並びに樹脂組成物の製造方法
JP2024146810A (ja) 中空粒子を含む粉体、及びその製造方法
JP2025153627A (ja) 粉体及びその製造方法、並びに樹脂組成物
JP2023151180A (ja) シリカ系中空粒子及びその製造方法
KR20240147553A (ko) 중공 입자를 포함하는 분체, 및 그 제조 방법
WO2025182883A1 (ja) 球状シリカ粒子粉体及び球状シリカ粒子粉体の製造方法
TWI888163B (zh) 用於增強pcb基板玻璃的塗料組成物及使用該塗料組成物製造的pcb基板玻璃
US8329806B2 (en) Method for producing flaky-glass granule, flaky-glass granule, and resin composition containing the same
US20260070795A1 (en) Spherical silica powder and method for producing spherical silica powder
CN118724005A (zh) 含有中空粒子的粉体及其制造方法
WO2025182884A1 (ja) 球状シリカ粒子粉体及び球状シリカ粒子粉体の製造方法
WO2023218949A1 (ja) シリカ粒子分散液