TW202109489A - Pixel array substrate - Google Patents
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- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
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- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
- G09G3/3611—Control of matrices with row and column drivers
- G09G3/3622—Control of matrices with row and column drivers using a passive matrix
- G09G3/3629—Control of matrices with row and column drivers using a passive matrix using liquid crystals having memory effects, e.g. ferroelectric liquid crystals
- G09G3/3637—Control of matrices with row and column drivers using a passive matrix using liquid crystals having memory effects, e.g. ferroelectric liquid crystals with intermediate tones displayed by domain size control
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/04—Structural and physical details of display devices
- G09G2300/0421—Structural details of the set of electrodes
- G09G2300/043—Compensation electrodes or other additional electrodes in matrix displays related to distortions or compensation signals, e.g. for modifying TFT threshold voltage in column driver
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- G—PHYSICS
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- G09G2320/00—Control of display operating conditions
- G09G2320/02—Improving the quality of display appearance
- G09G2320/0219—Reducing feedthrough effects in active matrix panels, i.e. voltage changes on the scan electrode influencing the pixel voltage due to capacitive coupling
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Abstract
Description
本發明是有關於一種畫素陣列基板,且特別是有關於一種包含掃描線以及資料線的畫素陣列基板。The present invention relates to a pixel array substrate, and more particularly to a pixel array substrate including scan lines and data lines.
由於顯示面板具有體積小、輻射低等優點,顯示面板已經普遍地被應用在各式各樣的電子產品中。在現有的顯示面板中,通常會於顯示區的外圍保留大面積的驅動電路區來設置驅動電路,並藉由驅動電路來控制子畫素。然而,位於顯示區外側的驅動電路區使顯示面板具有很寬的邊框,並限縮了產品的屏佔比。隨著科技的進步,消費者對顯示面板外觀的要求越來越高,為了要提高消費者的購買意願,如何增加顯示面板之屏佔比已經成為目前各家廠商欲解決的問題之一。Since the display panel has the advantages of small size and low radiation, the display panel has been widely used in various electronic products. In the existing display panel, a large area of the driving circuit area is usually reserved at the periphery of the display area to install the driving circuit, and the sub-pixels are controlled by the driving circuit. However, the driving circuit area located outside the display area makes the display panel have a very wide frame and limits the screen-to-body ratio of the product. With the advancement of technology, consumers have higher and higher requirements for the appearance of display panels. In order to increase consumers' willingness to buy, how to increase the screen ratio of display panels has become one of the problems that manufacturers want to solve.
一些廠商將顯示面板中的驅動電路集中於顯示區的同一側,藉此縮小驅動電路區的面積。然而,前述方法需要於顯示區中設置轉線結構來調整訊號的傳遞路徑。這些轉線結構容易使子畫素的電壓分布不均勻,導致畫面產生亮度不均勻的問題。Some manufacturers concentrate the driving circuits in the display panel on the same side of the display area, thereby reducing the area of the driving circuit area. However, the aforementioned method requires a wire transfer structure in the display area to adjust the signal transmission path. These line transfer structures easily make the voltage distribution of the sub-pixels uneven, leading to the problem of uneven brightness of the picture.
本發明提供一種畫素陣列基板,能解決顯示畫面亮度不均勻的問題。The present invention provides a pixel array substrate, which can solve the problem of uneven brightness of a display screen.
本發明的至少一實施例提供一種畫素陣列基板,包括多條掃描線、多條傳輸線、多條資料線以及多個子畫素。掃描線、傳輸線以及資料線位於基板上。第1級掃描線至第n級掃描線沿著第一方向延伸,其中n為大於3的整數。第1級傳輸線至第n級傳輸線,沿著第二方向延伸,且分別電性連接至第1級掃描線至第n級掃描線。資料線沿著第二方向延伸。各子畫素電性連接至對應的一條掃描線以及對應的一條資料線。第一子畫素重疊於第3級傳輸線。第一子畫素的第一開關元件電性連接至第3級掃描線,且第一開關元件的汲極與第一開關元件的閘極之間的電容為Cgd1。第二子畫素重疊於第3+x級傳輸線,其中x為小於3的整數。第二子畫素的第二開關元件電性連接至第3級掃描線,且第二開關元件的汲極與第二開關元件的閘極之間的電容為Cgd2。第三子畫素重疊於第3-x級傳輸線。第三子畫素的第三開關元件電性連接至第3級掃描線。第三開關元件的汲極與第三開關元件的閘極之間的電容為Cgd3。Cgd2大於Cgd3大於Cgd1。At least one embodiment of the present invention provides a pixel array substrate including multiple scan lines, multiple transmission lines, multiple data lines, and multiple sub-pixels. The scan line, the transmission line and the data line are located on the substrate. The scan lines of
本發明的至少一實施例提供一種畫素陣列基板,包括基板、驅動電路、多條掃描線、多條傳輸線、多條資料線、第一子畫素以及第二子畫素。掃描線位於基板上,且包括第1級掃描線至第n級掃描線。第1級掃描線至第n級掃描線沿著第一方向延伸,其中n為大於3的整數。傳輸線位於基板上,且包括第1級傳輸線至第n級傳輸線。第1級傳輸線至第n級傳輸線沿著第二方向延伸,且第1級傳輸線至第n級傳輸線分別電性連接驅動電路至第1級掃描線至第n級掃描線。第1級傳輸線至第n級傳輸線中的其中一者電性連接至第1級掃描線至第n級掃描線中的其中一者,且驅動電路與第1級掃描線至第n級掃描線中的其中一者之間的第1級傳輸線至第n級傳輸線中的其中一者的長度為Y1。第1級傳輸線至第n級傳輸線中的其中另一者電性連接至第1級掃描線至第n級掃描線中的其中另一者,且驅動電路與第1級掃描線至第n級掃描線中的其中另一者之間的第1級傳輸線至第n級傳輸線中的其中另一者的長度為Y2,其中長度Y2大於長度Y1。資料線位於基板上,且沿著第二方向延伸。第一子畫素包括第一開關元件以及電性連接至第一開關元件的第一畫素電極。第一開關元件電性連接至第1級傳輸線至第n級傳輸線中的其中一者,且第一開關元件的汲極與閘極的重疊面積為A1,第一開關元件的閘極與第一畫素電極的重疊面積為B1。第二子畫素包括一第二開關元件以及電性連接至第二開關元件的第二畫素電極。第二開關元件電性連接至第1級傳輸線至第n級傳輸線中的該其中另一者,且第二開關元件的汲極與閘極的重疊面積為A2,第二開關元件的閘極與第二畫素電極的重疊面積為B2。面積A1>面積A2,及/或面積B1>面積B2。At least one embodiment of the present invention provides a pixel array substrate, including a substrate, a driving circuit, a plurality of scan lines, a plurality of transmission lines, a plurality of data lines, a first sub-pixel, and a second sub-pixel. The scan lines are located on the substrate and include the first level scan lines to the nth level scan lines. The scan lines of
在整個說明書中,相同的附圖標記表示相同或類似的元件。在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。應當理解,當諸如層、膜、區域或基板的元件被稱為「在另一元件上」或「連接另一元件」時,其可以直接在另一元件上或與另一元件連接,或者所述元件與所述另一元件中間可以也存在其他元件。相反,當元件被稱為「直接在另一元件上」或「直接連接另一元件」時,所述元件與所述另一元件中間不存在其他元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,二元件互相「電性連接」或「耦合」可為二元件間存在其它元件。Throughout the specification, the same reference numerals indicate the same or similar elements. In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to another element," it can be directly on or connected to another element, or There may be other elements between the element and the other element. In contrast, when an element is referred to as being "directly on another element" or "directly connected to another element", there are no other elements between the element and the other element. As used herein, "connection" can refer to physical and/or electrical connection. Furthermore, two elements are "electrically connected" or "coupled" to each other because there are other elements between the two elements.
應當理解,儘管術語「第一」與「第二」等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。It should be understood that although the terms "first" and "second" etc. may be used herein to describe various elements, components, regions, layers and/or parts, these elements, components, regions, and/or parts should not be affected by Limitations of these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section.
圖1是依照本發明的一實施例的一種畫素陣列基板的上視示意圖。圖1繪示了畫素陣列基板的基板、掃描線、資料線、傳輸線以及驅動電路,並省略了其他構件。FIG. 1 is a schematic top view of a pixel array substrate according to an embodiment of the invention. FIG. 1 illustrates the substrate, scan lines, data lines, transmission lines, and driving circuits of the pixel array substrate, and other components are omitted.
請參考圖1,畫素陣列基板10包括基板SB、掃描線SL、資料線DL、傳輸線TL以及驅動電路DC。掃描線SL、資料線DL、傳輸線TL以及驅動電路DC位於基板SB上。Please refer to FIG. 1, the
基板SB上具有顯示區AA以及位於顯示區AA外側的周邊區BA。驅動電路DC設置於周邊區BA。掃描線SL位於顯示區AA中,且沿著第一方向DR1延伸。資料線DL以及傳輸線TL沿著第二方向DR2延伸,且自驅動電路DC延伸至顯示區AA中。每條傳輸線TL電性連接至對應的一條掃描線SL。在本實施例中,傳輸線TL透過轉接結構CS而電性連接至對應的掃描線SL。The substrate SB has a display area AA and a peripheral area BA located outside the display area AA. The driving circuit DC is provided in the peripheral area BA. The scan line SL is located in the display area AA and extends along the first direction DR1. The data line DL and the transmission line TL extend along the second direction DR2, and extend from the driving circuit DC into the display area AA. Each transmission line TL is electrically connected to a corresponding scan line SL. In this embodiment, the transmission line TL is electrically connected to the corresponding scan line SL through the switching structure CS.
圖2是依照本發明的一實施例的一種畫素陣列基板的顯示區上視示意圖。舉例來說,圖2例如為圖1之畫素陣列基板10的顯示區AA的局部放大示意圖。2 is a schematic top view of a display area of a pixel array substrate according to an embodiment of the invention. For example, FIG. 2 is a partial enlarged schematic diagram of the display area AA of the
請參考圖2,畫素陣列基板包括多條掃描線、多條傳輸線、多條資料線以及多個子畫素。在本實施例中,畫素陣列基板還包括沿著第一方向DR1延伸的共用訊號線CL1、CL2以及沿著第二方向DR2延伸的共用訊號線CL3。Please refer to FIG. 2, the pixel array substrate includes multiple scan lines, multiple transmission lines, multiple data lines, and multiple sub-pixels. In this embodiment, the pixel array substrate further includes common signal lines CL1 and CL2 extending along the first direction DR1 and common signal lines CL3 extending along the second direction DR2.
掃描線包括第1級掃描線SL1至第n級掃描線SLn,其中n為大於3的整數。在圖2僅繪出了第1級掃描線SL1至第5級掃描線SL5,但本發明不以此為限。掃描線的數量可以依照需求而進行調整。在本實施例中,第1級掃描線SL1至第n級掃描線SLn以及共用訊號線CL1、CL2屬於相同導電層(例如第一導電層)。The scan lines include the first level scan line SL1 to the nth level scan line SLn, where n is an integer greater than 3. In FIG. 2, only the first level scan line SL1 to the fifth level scan line SL5 are drawn, but the present invention is not limited to this. The number of scan lines can be adjusted according to requirements. In this embodiment, the first level scan line SL1 to the nth level scan line SLn and the common signal lines CL1 and CL2 belong to the same conductive layer (for example, the first conductive layer).
傳輸線包括第1級傳輸線TL1至第n級傳輸線TLn。在圖2僅繪出了第1級傳輸線TL1至第5級傳輸線TL5,但本發明不以此為限。傳輸線的數量可以依照需求而進行調整。第1級傳輸線TL1至第n級傳輸線TLn分別電性連接至第1級掃描線SL1至第n級掃描線SLn。舉例來說,第1級傳輸線TL1電性連接至第1級掃描線SL1,第2級傳輸線TL2電性連接至第2級掃描線SL2,第3級傳輸線TL3電性連接至第3級掃描線SL3,其他的傳輸線與掃描線以類似的方式電性連接。在本實施例中,第1級傳輸線TL1至第n級傳輸線TLn、資料線DL以及共用訊號線CL3屬於相同導電層(例如第二導電層)。第一導電層與第二導電層之間夾有絕緣層,而轉接結構CS貫穿前述絕緣層。The transmission line includes a first-level transmission line TL1 to an n-th level transmission line TLn. In FIG. 2, only the first-level transmission line TL1 to the fifth-level transmission line TL5 are drawn, but the present invention is not limited to this. The number of transmission lines can be adjusted according to requirements. The first level transmission line TL1 to the nth level transmission line TLn are electrically connected to the first level scan line SL1 to the nth level scan line SLn, respectively. For example, the first-level transmission line TL1 is electrically connected to the first-level scan line SL1, the second-level transmission line TL2 is electrically connected to the second-level scan line SL2, and the third-level transmission line TL3 is electrically connected to the third-level scan line SL3, other transmission lines and scan lines are electrically connected in a similar manner. In this embodiment, the first level transmission line TL1 to the nth level transmission line TLn, the data line DL, and the common signal line CL3 belong to the same conductive layer (for example, the second conductive layer). An insulating layer is sandwiched between the first conductive layer and the second conductive layer, and the switching structure CS penetrates the aforementioned insulating layer.
各子畫素電性連接至對應的一條掃描線以及對應的一條資料線。圖2用於說明不同子畫素的位置關係,子畫素的結構可以參考圖4A至圖4F的實施例。Each sub-pixel is electrically connected to a corresponding scan line and a corresponding data line. FIG. 2 is used to illustrate the positional relationship of different sub-pixels, and the structure of the sub-pixels can refer to the embodiments in FIG. 4A to FIG. 4F.
請繼續參考圖2,在本實施例中,元件符號A標記了重疊於對應階級之傳輸線的子畫素。舉例來說,電性連接至第3級掃描線SL3且重疊於第3級傳輸線TL3的子畫素被元件符號A所標記,電性連接至第4級掃描線SL4且重疊於第4級傳輸線TL4的子畫素被元件符號A所標記,其他元件符號A所標記的子畫素以此類推。Please continue to refer to FIG. 2. In this embodiment, the component symbol A marks the sub-pixels overlapping the transmission line of the corresponding class. For example, the sub-pixels that are electrically connected to the third level scan line SL3 and overlap the third level transmission line TL3 are marked by the component symbol A, and are electrically connected to the fourth level scan line SL4 and overlap the fourth level transmission line The sub-pixels of TL4 are marked by component symbol A, and the sub-pixels marked by other component symbols A can be deduced by analogy.
在本實施例中,元件符號B標記了重疊於後一階級(post-stage)之傳輸線的子畫素。舉例來說,電性連接至第3級掃描線SL3且重疊於第4級傳輸線TL4的子畫素被元件符號B所標記,電性連接至第4級掃描線SL4且重疊於第5級傳輸線TL4的子畫素被元件符號B所標記,其他元件符號B所標記的子畫素以此類推。In this embodiment, the component symbol B marks the sub-pixels superimposed on the post-stage transmission line. For example, the sub-pixels that are electrically connected to the third level scan line SL3 and overlap the fourth level transmission line TL4 are marked by the component symbol B, and are electrically connected to the fourth level scan line SL4 and overlap the fifth level transmission line The sub-pixels of TL4 are marked by component symbol B, and the sub-pixels marked by other component symbols B can be deduced by analogy.
在本實施例中,元件符號C標記了重疊於後兩階級之傳輸線的子畫素。舉例來說,電性連接至第3級掃描線SL3且重疊於第5級傳輸線TL5的子畫素被元件符號C所標記,電性連接至第4級掃描線SL4且重疊於第6級傳輸線TL6的子畫素被元件符號C所標記,其他元件符號C所標記的子畫素以此類推。In this embodiment, the component symbol C marks the sub-pixels overlapping the transmission lines of the latter two stages. For example, the sub-pixels that are electrically connected to the level 3 scan line SL3 and overlap the level 5 transmission line TL5 are marked by the component symbol C, and are electrically connected to the level 4 scan line SL4 and overlap the level 6 transmission line The sub-pixels of TL6 are marked by component symbol C, and the sub-pixels marked by other component symbols C can be deduced by analogy.
在本實施例中,元件符號D標記了重疊於前一階級(pre-stage)之傳輸線的子畫素。舉例來說,電性連接至第3級掃描線SL3且重疊於第2級傳輸線TL2的子畫素被元件符號D所標記,電性連接至第4級掃描線SL4且重疊於第3級傳輸線TL3的子畫素被元件符號D所標記,其他元件符號D所標記的子畫素以此類推。In this embodiment, the component symbol D marks the sub-pixels superimposed on the pre-stage transmission line. For example, the sub-pixels that are electrically connected to the third-level scan line SL3 and overlap the second-level transmission line TL2 are marked by the component symbol D, and are electrically connected to the fourth-level scan line SL4 and overlap the third-level transmission line The sub-pixels of TL3 are marked by the component symbol D, and the sub-pixels marked by other component symbols D can be deduced by analogy.
在本實施例中,元件符號E標記了重疊於前兩階級之傳輸線的子畫素。舉例來說,電性連接至第3級掃描線SL3且重疊於第1級傳輸線TL1的子畫素被元件符號E所標記,電性連接至第4級掃描線SL4且重疊於第2級傳輸線TL2的子畫素被元件符號E所標記,其他元件符號E所標記的子畫素以此類推。In this embodiment, the component symbol E marks the sub-pixels overlapping the transmission lines of the first two levels. For example, the sub-pixels that are electrically connected to the third level scan line SL3 and overlap the first level transmission line TL1 are marked by the element symbol E, are electrically connected to the fourth level scan line SL4 and overlap the second level transmission line The sub-pixels of TL2 are marked by the component symbol E, and the sub-pixels marked by other component symbols E are deduced by analogy.
圖3是依照本發明的一實施例的一種畫素陣列基板的掃描線訊號波形圖。3 is a waveform diagram of scan line signals of a pixel array substrate according to an embodiment of the present invention.
請參考圖2與圖3,在本實施例中,對子畫素進行預充電以使子畫素能即時達到預定的電壓。每級掃描線的充電時間會部分重疊於前級掃描線的充電時間以及後級掃描線的充電時間。舉例來說,第3級掃描線SL3的充電時間t3部分重疊於第3+x級掃描線SL3+x的充電時間以及第3-x級掃描線SL3-x的充電時間,其中x為小於3的整數。在本實施例中,第3級掃描線SL3的充電時間t3部分重疊於第1級掃描線SL1的充電時間t1、第2級掃描線SL2的充電時間t2、第4級掃描線SL4的充電時間t4以及第5級掃描線SL5的充電時間t5。在本時實施例中,各級掃描線的充電時間不重疊於超過其3級以上的掃描線的充電時間。舉例來說,第3級掃描線SL3的充電時間t3不重疊於第6級掃描線SL6的充電時間t6。2 and 3, in this embodiment, the sub-pixels are precharged so that the sub-pixels can reach a predetermined voltage instantly. The charging time of each scan line will partially overlap the charging time of the previous scan line and the charging time of the subsequent scan line. For example, the charging time t3 of the third level scan line SL3 partially overlaps the charging time of the 3+x level scan line SL3+x and the charge time of the 3-x level scan line SL3-x, where x is less than 3. Integer. In this embodiment, the charging time t3 of the third-level scan line SL3 partially overlaps the charging time t1 of the first-level scan line SL1, the charging time t2 of the second-level scan line SL2, and the charging time of the fourth-level scan line SL4. t4 and the charging time t5 of the fifth-level scan line SL5. In this embodiment, the charging time of the scan lines of each level does not overlap with the charging time of the scan lines of more than 3 levels. For example, the charging time t3 of the scan line SL3 at the third level does not overlap with the charging time t6 of the scan line SL6 at the sixth level.
每條掃描線的預充電的時間可以依照需求而進行調整,換句話說,有多少條掃描線之充電時間彼此重疊可以依照需求而進行調整。The pre-charging time of each scan line can be adjusted according to requirements. In other words, how many scan lines overlap each other with the charging time can be adjusted according to requirements.
在本實施例中,同一條掃描線所電性連接之多個子畫素會重疊於不同條傳輸線,而不同條傳輸線上的訊號彼此不同,因此,不同個子畫素上可能會有亮度分布不均勻的問題。在一些實施例中,子畫素A、子畫素B、子畫素C、子畫素D以及子畫素E具有補償設計,藉此消減亮度分布不均勻的問題,相關設計請參考後續實施例的說明。In this embodiment, multiple sub-pixels electrically connected to the same scan line overlap different transmission lines, and the signals on different transmission lines are different from each other. Therefore, different sub-pixels may have uneven brightness distribution. The problem. In some embodiments, sub-pixel A, sub-pixel B, sub-pixel C, sub-pixel D, and sub-pixel E have a compensation design, thereby reducing the problem of uneven brightness distribution. For related designs, please refer to subsequent implementations. Example description.
在本實施例中,不具有補償設計的子畫素被元件符號N所標記。在一些實施例中,標準子畫素N所重疊之傳輸線的階級與對應階級之傳輸線相差較大。舉例來說,電性連接至第1級掃描線SL1且重疊於第4級掃描線SL4的子畫素可以被元件符號N所標記。在一些實施例中,標準子畫素N重疊於共用訊號線CL3而非傳輸線。In this embodiment, the sub-pixels that do not have a compensation design are marked by the component symbol N. In some embodiments, the level of the transmission line overlapped by the standard sub-pixel N is quite different from the transmission line of the corresponding level. For example, the sub-pixels that are electrically connected to the first-level scan line SL1 and overlap the fourth-level scan line SL4 can be marked by the element symbol N. In some embodiments, the standard sub-pixel N overlaps the common signal line CL3 instead of the transmission line.
圖4A至圖4F分別是依照本發明的一實施例的不同個子畫素上視示意圖。圖5是沿著圖4A的線aa’的剖面示意圖。4A to 4F are schematic top views of different sub-pixels according to an embodiment of the present invention. Fig. 5 is a schematic cross-sectional view taken along the line aa' of Fig. 4A.
請參考圖2、圖4A與圖5,標準子畫素N包括標準開關元件T以及畫素電極PE,標準開關元件T包括閘極GE、通道層CH、源極SE以及汲極DE。2, 4A and 5, the standard sub-pixel N includes a standard switching element T and a pixel electrode PE, and the standard switching element T includes a gate GE, a channel layer CH, a source SE, and a drain DE.
閘極GE位於基板SB上,且電性連接至對應的掃描線。在本實施例中,以閘極GE電性連接至第3級掃描線SL3為例。通道層CH重疊於閘極GE,且通道層CH與閘極GE之間夾有閘極絕緣層GI。The gate electrode GE is located on the substrate SB and is electrically connected to the corresponding scan line. In this embodiment, it is taken as an example that the gate electrode GE is electrically connected to the third-level scan line SL3. The channel layer CH overlaps the gate electrode GE, and a gate insulating layer GI is sandwiched between the channel layer CH and the gate electrode GE.
源極SE以及汲極DE電性連接至通道層CH,源極SE電性連接至資料線DL。標準開關元件T的汲極DE與標準開關元件T的閘極GE(或第3級掃描線SL1)之間的電容為Cgd0。絕緣層PL設置於源極SE以及汲極DE上。在一些實施例中,絕緣層PL為彩色濾光層,並構成彩色濾光層於畫素陣列上(color filter on array, COA)之結構,但本發明不以此為限。在其他實施例中,彩色濾光層設置於其他基板上。The source SE and the drain DE are electrically connected to the channel layer CH, and the source SE is electrically connected to the data line DL. The capacitance between the drain DE of the standard switching element T and the gate GE of the standard switching element T (or the third-level scan line SL1) is Cgd0. The insulating layer PL is disposed on the source SE and the drain DE. In some embodiments, the insulating layer PL is a color filter layer and constitutes a color filter on array (COA) structure, but the invention is not limited to this. In other embodiments, the color filter layer is disposed on other substrates.
絕緣層U設置於絕緣層PL上,絕緣層U例如為有機材料或無機材料。畫素電極PE設置於絕緣層U上,且透過貫穿絕緣層U以及絕緣層PL的開口O而電性連接至汲極DE。The insulating layer U is disposed on the insulating layer PL, and the insulating layer U is, for example, an organic material or an inorganic material. The pixel electrode PE is disposed on the insulating layer U, and is electrically connected to the drain electrode DE through the opening O penetrating the insulating layer U and the insulating layer PL.
雖然在本實施例中,在上視示意圖中,每個子畫素的開口區位於對應之掃描線的上方,但本發明不以此為限。在其他實施例中,藉由調整畫素電極PE的延伸方向,使各子畫素的開口區位於對應之掃描線的下方。Although in this embodiment, in the schematic top view, the opening area of each sub-pixel is located above the corresponding scan line, the present invention is not limited to this. In other embodiments, by adjusting the extension direction of the pixel electrode PE, the opening area of each sub-pixel is located below the corresponding scan line.
標準子畫素N重疊於共用訊號線CL3及/或第m級傳輸線TLm,且標準子畫素N中的第3級掃描線SL3亦重疊於共用訊號線CL3及/或第m級傳輸線TLm其中1<m<n。在本實施例中,第m級傳輸線TLm(或第m級掃描線)的充電時間不與第3級掃描線SL3的充電時間重疊。The standard sub-pixel N overlaps the common signal line CL3 and/or the m-th level transmission line TLm, and the third-level scan line SL3 in the standard sub-pixel N also overlaps the common signal line CL3 and/or the m-th level transmission line TLm. 1<m<n. In this embodiment, the charging time of the m-th level transmission line TLm (or the m-th level scan line) does not overlap with the charging time of the third level scan line SL3.
請參考圖4A與圖4B,圖4B的子畫素A與圖4A的標準子畫素N有類似的結構,差異在於子畫素A重疊於第3級傳輸線TL3,且子畫素A的汲極DE重疊於閘極GE的長度L1小於標準子畫素N的標準開關元件T的汲極DE重疊於閘極GE的長度L。Please refer to FIGS. 4A and 4B. The sub-pixel A in FIG. 4B has a similar structure to the standard sub-pixel N in FIG. 4A. The difference is that the sub-pixel A overlaps the third-level transmission line TL3, and the drain of the sub-pixel A is The length L1 of the pole DE overlapping the gate GE is smaller than the length L of the drain DE of the standard switching element T of the standard sub-pixel N overlapping the gate GE.
在本實施例中,子畫素A的開關元件T1的閘極GE電性連接至第3級掃描線SL3,且開關元件T1的汲極DE與開關元件T1的閘極GE(或第3級掃描線SL3)之間的電容為Cgd1。In this embodiment, the gate GE of the switching element T1 of the sub-pixel A is electrically connected to the third level scan line SL3, and the drain DE of the switching element T1 and the gate GE of the switching element T1 (or the third level The capacitance between the scan lines SL3) is Cgd1.
在本實施例中,開關元件T1的汲極DE重疊於閘極GE的長度L1小於標準開關元件T的汲極DE重疊於閘極GE的長度L,使開關元件T1的汲極DE與閘極GE之間的重疊面積小於標準開關元件T的汲極DE與閘極GE之間的重疊面積。因此,開關元件T1的電容Cgd1小於標準開關元件T的電容Cgd0。In this embodiment, the length L1 that the drain DE of the switching element T1 overlaps the gate GE is smaller than the length L that the drain DE of the standard switching element T overlaps the gate GE, so that the drain DE of the switching element T1 and the gate GE The overlap area between GE is smaller than the overlap area between the drain DE and the gate GE of the standard switching element T. Therefore, the capacitance Cgd1 of the switching element T1 is smaller than the capacitance Cgd0 of the standard switching element T.
子畫素A除了開關元件T1的汲極DE會與閘極GE產生電容Cgd1之外,子畫素A的畫素電極PE也會與第3級傳輸線TL3之間產生電容Cvg1。然而,標準子畫素N的畫素電極PE並非重疊於第3級傳輸線TL3,導致子畫素A與標準子畫素N容易出現亮度不一致的問題。在本實施例中,藉由使開關元件T1的電容Cgd1小於標準開關元件T的電容Cgd0能夠改善前述亮度不一致的問題。In addition to the capacitance Cgd1 between the drain DE of the switching element T1 and the gate GE of the sub-pixel A, a capacitance Cvg1 is also generated between the pixel electrode PE of the sub-pixel A and the third-level transmission line TL3. However, the pixel electrode PE of the standard sub-pixel N is not overlapped with the third-level transmission line TL3, which causes the problem of brightness inconsistency between the sub-pixel A and the standard sub-pixel N. In this embodiment, by making the capacitance Cgd1 of the switching element T1 smaller than the capacitance Cgd0 of the standard switching element T, the aforementioned problem of inconsistency in brightness can be improved.
圖6是依照本發明的一實施例的一種畫素陣列基板的掃描線訊號以及畫素電極訊號波形圖。6 is a waveform diagram of scan line signals and pixel electrode signals of a pixel array substrate according to an embodiment of the present invention.
請參考圖4A、圖4B以及圖6,子畫素A以及標準子畫素N電性連接至第3級掃描線SL3。在本實施例中,子畫素A重疊於第3級傳輸線TL3,而標準子畫素N重疊於第m級傳輸線TLm,其中1<m<n。Please refer to FIG. 4A, FIG. 4B and FIG. 6, the sub-pixel A and the standard sub-pixel N are electrically connected to the third-level scan line SL3. In this embodiment, the sub-pixel A overlaps the third-level transmission line TL3, and the standard sub-pixel N overlaps the m-th level transmission line TLm, where 1<m<n.
第m級傳輸線TLm電性連接至第m級掃描線SLm,且第m級掃描線SLm的充電時間不重疊於第3級傳輸線TL3的充電時間。The m-th level transmission line TLm is electrically connected to the m-th level scan line SLm, and the charging time of the m-th level scan line SLm does not overlap the charging time of the third level transmission line TL3.
在圖6中,子畫素A的畫素電極PE上具有電壓P(A),標準子畫素N的畫素電極PE上具有電壓P(N)。當啟動第3級掃描線SL3時,子畫素A的畫素電極PE以及標準子畫素N的畫素電極PE開始充電。在關閉第3級掃描線SL3時(在時間範圍x之中),子畫素A的畫素電極PE上的電壓以及標準子畫素N的畫素電極PE上的電壓會下降。In FIG. 6, the pixel electrode PE of the sub-pixel A has a voltage P(A), and the pixel electrode PE of the standard sub-pixel N has a voltage P(N). When the third-level scan line SL3 is activated, the pixel electrode PE of the sub-pixel A and the pixel electrode PE of the standard sub-pixel N start to be charged. When the third level scanning line SL3 is turned off (in the time range x), the voltage on the pixel electrode PE of the sub-pixel A and the voltage on the pixel electrode PE of the standard sub-pixel N will drop.
當未對子畫素A加上補償設計時(即補償前),子畫素A的畫素電極PE的電壓下降的幅度會不同於標準子畫素N的畫素電極PE的電壓下降的幅度,使得電壓P(A)與電壓P(N)在後續的電壓保持階段(holding time)時彼此不同,這容易導致顯示面板亮度分佈不均的問題。When the compensation design is not applied to the sub-pixel A (that is, before compensation), the voltage drop of the pixel electrode PE of the sub-pixel A will be different from the voltage drop of the pixel electrode PE of the standard sub-pixel N , So that the voltage P(A) and the voltage P(N) are different from each other in the subsequent voltage holding time (holding time), which easily leads to the problem of uneven brightness distribution of the display panel.
當對子畫素A加上補償設計時(即補償後),由於子畫素A的電容Cgd1小於標準子畫素N的電容Cgd0,子畫素A之畫素電極PE在關閉第3級掃描線SL3時(在時間範圍x之中)電壓下降的程度能夠接近標準子畫素N之畫素電極PE在電壓下降的程度,使得電壓P(A)與電壓P(N)在後續的電壓保持階段(holding time)時彼此相近,藉此改善顯示面板亮度分佈不均的問題。When the compensation design is applied to the sub-pixel A (that is, after compensation), since the capacitance Cgd1 of the sub-pixel A is smaller than the capacitance Cgd0 of the standard sub-pixel N, the pixel electrode PE of the sub-pixel A is turning off the third level scanning When line SL3 (in the time range x), the voltage drop can be close to the voltage drop of the pixel electrode PE of the standard sub-pixel N, so that the voltage P(A) and the voltage P(N) remain at the subsequent voltages The holding time is similar to each other, thereby improving the problem of uneven brightness distribution of the display panel.
請參考圖4A與圖4C,圖4C的子畫素D與圖4A的標準子畫素N有類似的結構,差異在於子畫素D重疊於第3-y級傳輸線TL3-y,且子畫素D的汲極DE重疊於閘極GE的長度L5小於標準子畫素N的汲極DE重疊於閘極GE長度L。在本實施例中,y等於1,且子畫素D重疊於第2級傳輸線TL2。Please refer to FIGS. 4A and 4C. The sub-pixel D in FIG. 4C has a similar structure to the standard sub-pixel N in FIG. 4A. The difference is that the sub-pixel D overlaps the 3-y-level transmission line TL3-y, and the sub-pixel D overlaps the transmission line TL3-y. The length L5 of the drain DE of the element D overlapping the gate GE is less than the length L of the drain DE of the standard sub-pixel N overlapping the gate GE. In this embodiment, y is equal to 1, and the sub-pixel D overlaps the second-level transmission line TL2.
在本實施例中,子畫素D的開關元件T5的閘極GE電性連接至第3級掃描線SL3,且開關元件T5的汲極DE與開關元件T5的閘極GE(或第3級掃描線SL3)之間的電容為Cgd5。In this embodiment, the gate GE of the switching element T5 of the sub-pixel D is electrically connected to the third level scan line SL3, and the drain DE of the switching element T5 and the gate GE of the switching element T5 (or the third level The capacitance between the scan lines SL3) is Cgd5.
開關元件T5的汲極DE重疊於閘極GE的長度L5小於標準開關元件T的汲極DE重疊於閘極GE的長度L,使開關元件T5的汲極DE與閘極GE之間的重疊面積小於標準開關元件T的汲極DE與閘極GE之間的重疊面積。因此,開關元件T5的電容Cgd5小於標準開關元件T的電容Cgd0。The length L5 of the drain DE of the switching element T5 that overlaps the gate GE is smaller than the length L of the drain DE of the standard switching element T that overlaps the gate GE, so that the overlap area between the drain DE of the switching element T5 and the gate GE is It is smaller than the overlap area between the drain DE and the gate GE of the standard switching element T. Therefore, the capacitance Cgd5 of the switching element T5 is smaller than the capacitance Cgd0 of the standard switching element T.
子畫素D除了開關元件T5的汲極DE會與閘極GE產生電容Cgd5之外,子畫素D的畫素電極PE也會與第2級傳輸線TL2之間產生電容Cvg2。然而,標準子畫素N的畫素電極PE並非重疊於第2級傳輸線TL2,導致子畫素D與標準子畫素N容易出現亮度不一致的問題。在本實施例中,藉由使開關元件T5的電容Cgd5小於標準開關元件T的電容Cgd0能夠改善前述亮度不一致的問題。In addition to the capacitance Cgd5 between the drain DE of the switching element T5 and the gate GE of the sub-pixel D, a capacitance Cvg2 is also generated between the pixel electrode PE of the sub-pixel D and the second-level transmission line TL2. However, the pixel electrode PE of the standard sub-pixel N is not overlapped with the second-level transmission line TL2, resulting in the problem of brightness inconsistency between the sub-pixel D and the standard sub-pixel N. In this embodiment, by making the capacitance Cgd5 of the switching element T5 smaller than the capacitance Cgd0 of the standard switching element T, the aforementioned problem of inconsistency in brightness can be improved.
請參考圖4B與圖4C,開關元件T1的汲極DE重疊於閘極GE的長度L1小於開關元件T5的汲極DE重疊於閘極GE的長度L5,使開關元件T1的汲極DE與閘極GE之間的重疊面積小於開關元件T5的汲極DE與閘極GE之間的重疊面積。因此,開關元件T1的電容Cgd1小於開關元件T5的電容Cgd5。4B and 4C, the length L1 of the drain DE of the switching element T1 overlapping the gate GE is smaller than the length L5 of the drain DE of the switching element T5 overlapping the gate GE, so that the drain DE of the switching element T1 and the gate GE The overlap area between the poles GE is smaller than the overlap area between the drain DE and the gate GE of the switching element T5. Therefore, the capacitance Cgd1 of the switching element T1 is smaller than the capacitance Cgd5 of the switching element T5.
請參考圖4A與圖4D,圖4D的子畫素E與圖4A的標準子畫素N有類似的結構,差異在於子畫素E重疊於第3-x級傳輸線TL3-x,且子畫素E的汲極DE重疊於閘極GE的長度L3小於標準子畫素N的汲極DE重疊於閘極GE的長度L。在本實施例中,x等於2,且子畫素E重疊於第1級傳輸線TL1。Please refer to FIGS. 4A and 4D. The sub-pixel E in FIG. 4D has a similar structure to the standard sub-pixel N in FIG. 4A. The difference is that the sub-pixel E overlaps the 3-x-level transmission line TL3-x, and the sub-pixel E overlaps the transmission line TL3-x. The length L3 of the drain DE of the element E overlapping the gate GE is smaller than the length L of the drain DE of the standard sub-pixel N overlapping the gate GE. In this embodiment, x is equal to 2, and the sub-pixel E overlaps the first-level transmission line TL1.
在本實施例中,子畫素E的開關元件T3的閘極GE電性連接至第3級掃描線SL3,且開關元件T3的汲極DE與開關元件T3的閘極GE(或第3級掃描線SL3)之間的電容為Cgd3。In this embodiment, the gate GE of the switching element T3 of the sub-pixel E is electrically connected to the third level scan line SL3, and the drain DE of the switching element T3 and the gate GE of the switching element T3 (or the third level The capacitance between the scan lines SL3) is Cgd3.
開關元件T3的汲極DE重疊於閘極GE的長度L3小於標準開關元件T的汲極DE重疊於閘極GE的長度L,使開關元件T3的汲極DE與閘極GE之間的重疊面積小於標準開關元件T的汲極DE與閘極GE之間的重疊面積。因此,開關元件T3的電容Cgd3小於標準開關元件T的電容Cgd0。The length L3 of the drain DE of the switching element T3 that overlaps the gate GE is smaller than the length L of the drain DE of the standard switching element T that overlaps the gate GE, so that the overlap area between the drain DE of the switching element T3 and the gate GE is It is smaller than the overlap area between the drain DE and the gate GE of the standard switching element T. Therefore, the capacitance Cgd3 of the switching element T3 is smaller than the capacitance Cgd0 of the standard switching element T.
子畫素E除了開關元件T3的汲極DE會與閘極GE產生電容Cgd3之外,子畫素E的畫素電極PE也會與第1級傳輸線TL1之間產生電容Cvg3。然而,標準子畫素N的畫素電極PE並非重疊於第1級傳輸線TL1,導致子畫素E與標準子畫素N容易出現亮度不一致的問題。在本實施例中,藉由使開關元件T3的電容Cgd3小於標準開關元件T的電容Cgd0能夠改善前述亮度不一致的問題。In addition to the capacitance Cgd3 between the drain DE of the switching element T3 and the gate GE of the sub-pixel E, a capacitance Cvg3 is also generated between the pixel electrode PE of the sub-pixel E and the first-level transmission line TL1. However, the pixel electrode PE of the standard sub-pixel N is not overlapped with the first-level transmission line TL1, which leads to the problem of brightness inconsistency between the sub-pixel E and the standard sub-pixel N. In this embodiment, by making the capacitance Cgd3 of the switching element T3 smaller than the capacitance Cgd0 of the standard switching element T, the aforementioned problem of inconsistent brightness can be improved.
請參考圖4C與圖4D,開關元件T5的汲極DE重疊於閘極GE的長度L5小於開關元件T3的汲極DE重疊於閘極GE的長度L3,使開關元件T5的汲極DE與閘極GE之間的重疊面積小於開關元件T3的汲極DE與閘極GE之間的重疊面積。因此,開關元件T5的電容Cgd5小於開關元件T3的電容Cgd3。4C and 4D, the length L5 of the drain DE of the switching element T5 overlapping the gate GE is less than the length L3 of the drain DE of the switching element T3 overlapping the gate GE, so that the drain DE of the switching element T5 and the gate The overlap area between the poles GE is smaller than the overlap area between the drain DE and the gate GE of the switching element T3. Therefore, the capacitance Cgd5 of the switching element T5 is smaller than the capacitance Cgd3 of the switching element T3.
請參考圖4A與圖4E,圖4E的子畫素B與圖4A的標準子畫素N有類似的結構,差異在於子畫素B重疊於第3+y級傳輸線TL3+y,且子畫素B的開關元件T6的汲極DE重疊於閘極GE的長度L6小於標準子畫素N的標準開關元件T的汲極DE重疊於閘極GE的長度L。在本實施例中,y等於1,且子畫素B重疊於第4級傳輸線TL4。Please refer to FIGS. 4A and 4E. The sub-pixel B in FIG. 4E has a similar structure to the standard sub-pixel N in FIG. 4A. The difference is that the sub-pixel B overlaps the 3+y-level transmission line TL3+y, and the sub-pixel The length L6 of the drain DE of the switching element T6 of the element B overlapping the gate GE is smaller than the length L of the drain DE of the standard switching element T of the standard sub-pixel N overlapping the gate GE. In this embodiment, y is equal to 1, and the sub-pixel B overlaps the fourth-level transmission line TL4.
在本實施例中,子畫素B的開關元件T6的閘極GE電性連接至第3級掃描線SL3,且開關元件T6的汲極DE與開關元件T6的閘極GE(或第3級掃描線SL3)之間的電容為Cgd6。In this embodiment, the gate GE of the switching element T6 of the sub-pixel B is electrically connected to the third level scan line SL3, and the drain DE of the switching element T6 and the gate GE of the switching element T6 (or the third level The capacitance between the scan lines SL3) is Cgd6.
開關元件T6的汲極DE重疊於閘極GE的長度L6小於標準開關元件T的汲極DE重疊於閘極GE的長度L,使開關元件T6的汲極DE與閘極GE之間的重疊面積小於標準開關元件T的汲極DE與閘極GE之間的重疊面積。因此,開關元件T6的電容Cgd6小於標準開關元件T的電容Cgd0。The length L6 of the drain DE of the switching element T6 that overlaps the gate GE is smaller than the length L of the drain DE of the standard switching element T that overlaps the gate GE, so that the overlap area between the drain DE of the switching element T6 and the gate GE is It is smaller than the overlap area between the drain DE and the gate GE of the standard switching element T. Therefore, the capacitance Cgd6 of the switching element T6 is smaller than the capacitance Cgd0 of the standard switching element T.
子畫素B除了開關元件T6的汲極DE會與閘極GE產生電容Cgd6之外,子畫素B的畫素電極PE也會與第4級傳輸線TL4之間產生電容Cvg4。然而,標準子畫素N的畫素電極PE並非重疊於第4級傳輸線TL4,導致子畫素B與標準子畫素N容易出現亮度不一致的問題。在本實施例中,藉由使開關元件T6的電容Cgd6小於標準開關元件T的電容Cgd0能夠改善前述亮度不一致的問題。In addition to the capacitance Cgd6 between the drain DE of the switching element T6 and the gate GE of the sub-pixel B, a capacitance Cvg4 is also generated between the pixel electrode PE of the sub-pixel B and the fourth-level transmission line TL4. However, the pixel electrode PE of the standard sub-pixel N does not overlap the fourth-level transmission line TL4, which causes the problem of brightness inconsistency between the sub-pixel B and the standard sub-pixel N. In this embodiment, by making the capacitance Cgd6 of the switching element T6 smaller than the capacitance Cgd0 of the standard switching element T, the aforementioned problem of inconsistent brightness can be improved.
請參考圖4D與圖4E,開關元件T3的汲極DE的長度L3小於開關元件T6的汲極DE長度L6,使開關元件T3的汲極DE與閘極GE之間的重疊面積小於開關元件T6的汲極DE與閘極GE之間的重疊面積。因此,開關元件T3的電容Cgd3小於開關元件T6的電容Cgd6。4D and 4E, the length L3 of the drain DE of the switching element T3 is less than the length L6 of the drain DE of the switching element T6, so that the overlap area between the drain DE of the switching element T3 and the gate GE is smaller than that of the switching element T6 The overlap area between the drain DE and the gate GE. Therefore, the capacitance Cgd3 of the switching element T3 is smaller than the capacitance Cgd6 of the switching element T6.
請參考圖4A與圖4F,圖4F的子畫素C與圖4A的標準子畫素N有類似的結構,差異在於子畫素C重疊於第3+x級傳輸線TL3+x,且子畫素C的開關元件T2的汲極DE重疊於閘極GE的長度L2小於標準子畫素N的標準開關元件T的汲極DE重疊於閘極GE的長度L。在本實施例中,x等於2,且子畫素C重疊於第5級傳輸線TL5。Please refer to FIGS. 4A and 4F. The sub-pixel C in FIG. 4F has a similar structure to the standard sub-pixel N in FIG. 4A. The difference is that the sub-pixel C overlaps the 3+x-level transmission line TL3+x, and the sub-pixel C overlaps the transmission line TL3+x. The length L2 of the drain DE of the switching element T2 of the element C overlapping the gate GE is smaller than the length L of the drain DE of the standard switching element T of the standard sub-pixel N overlapping the gate GE. In this embodiment, x is equal to 2, and the sub-pixel C overlaps the fifth-level transmission line TL5.
在本實施例中,子畫素C的開關元件T2的閘極GE電性連接至第3級掃描線SL3,且開關元件T2的汲極DE與開關元件T2的閘極GE(或第3級掃描線SL3)之間的電容為Cgd2。In this embodiment, the gate GE of the switching element T2 of the sub-pixel C is electrically connected to the third level scan line SL3, and the drain DE of the switching element T2 and the gate GE of the switching element T2 (or the third level The capacitance between the scan lines SL3) is Cgd2.
開關元件T2的汲極DE重疊於閘極GE的長度L2小於標準開關元件T的汲極DE重疊於閘極GE的長度L,使開關元件T2的汲極DE與閘極GE之間的重疊面積小於標準開關元件T的汲極DE與閘極GE之間的重疊面積。因此,開關元件T2的電容Cgd2小於標準開關元件T的電容Cgd0。The length L2 that the drain DE of the switching element T2 overlaps the gate GE is smaller than the length L that the drain DE of the standard switching element T overlaps the gate GE, so that the overlap area between the drain DE and the gate GE of the switching element T2 It is smaller than the overlap area between the drain DE and the gate GE of the standard switching element T. Therefore, the capacitance Cgd2 of the switching element T2 is smaller than the capacitance Cgd0 of the standard switching element T.
子畫素C除了開關元件T2的汲極DE會與閘極GE產生電容Cgd2之外,子畫素C的畫素電極PE也會與第5級傳輸線TL5之間產生電容Cvg2。然而,標準子畫素N的畫素電極PE並非重疊於第5級傳輸線TL5,導致子畫素C與標準子畫素N容易出現亮度不一致的問題。在本實施例中,藉由使開關元件T2的電容Cgd2小於標準開關元件T的電容Cgd0能夠改善前述亮度不一致的問題。In addition to the capacitance Cgd2 between the drain DE of the switching element T2 and the gate GE of the sub-pixel C, a capacitance Cvg2 is also generated between the pixel electrode PE of the sub-pixel C and the fifth-level transmission line TL5. However, the pixel electrode PE of the standard sub-pixel N does not overlap the fifth-level transmission line TL5, which causes the problem of brightness inconsistency between the sub-pixel C and the standard sub-pixel N. In this embodiment, by making the capacitance Cgd2 of the switching element T2 smaller than the capacitance Cgd0 of the standard switching element T, the aforementioned problem of inconsistent brightness can be improved.
請參考圖4E與圖4F,開關元件T6的汲極DE重疊於閘極GE的長度L6小於開關元件T2的汲極DE重疊於閘極GE的長度L2,使開關元件T6的汲極DE與閘極GE之間的重疊面積小於開關元件T2的汲極DE與閘極GE之間的重疊面積。因此,開關元件T6的電容Cgd3小於開關元件T2的電容Cgd2。4E and 4F, the length L6 of the drain DE of the switching element T6 overlapping the gate GE is less than the length L2 of the drain DE of the switching element T2 overlapping the gate GE, so that the drain DE of the switching element T6 and the gate The overlap area between the poles GE is smaller than the overlap area between the drain DE and the gate GE of the switching element T2. Therefore, the capacitance Cgd3 of the switching element T6 is smaller than the capacitance Cgd2 of the switching element T2.
在本實施例中,長度L1小於長度L5小於長度L3小於長度L6小於長度L2小於長度L。長度L1與長度L的差值介於0.5微米至1微米。長度L1與長度L2的差值介於0.5微米至1微米。In this embodiment, the length L1 is less than the length L5, and the length L3 is less than the length L6, and the length L2 is less than the length L. The difference between the length L1 and the length L is between 0.5 μm and 1 μm. The difference between the length L1 and the length L2 is between 0.5 μm and 1 μm.
子畫素A的電容Cgd1小於子畫素D的電容Cgd5小於子畫素E的電容Cgd3小於子畫素B的電容Cgd6小於子畫素C的電容Cgd2,藉此,降低畫素陣列基板電容分布不均勻的問題。The capacitance Cgd1 of the sub-pixel A is smaller than the capacitance Cgd5 of the sub-pixel D and the capacitance Cgd3 of the sub-pixel E is smaller than the capacitance Cgd6 of the sub-pixel B is smaller than the capacitance Cgd2 of the sub-pixel C, thereby reducing the capacitance distribution of the pixel array substrate The problem of unevenness.
在一些實施例中,子畫素的畫素電極與其所重疊之傳輸線之間的重疊面積相同,因此電容Cvg1、電容Cvg2、電容Cvg3、電容Cvg4以及電容Cvg5大約彼此相同。In some embodiments, the overlapping area between the pixel electrode of the sub-pixel and the overlapping transmission line is the same, so the capacitor Cvg1, the capacitor Cvg2, the capacitor Cvg3, the capacitor Cvg4, and the capacitor Cvg5 are approximately the same as each other.
圖7A與圖7B分別是依照本發明的一實施例的不同個子畫素上視示意圖。在此必須說明的是,圖7A和圖7B的實施例沿用圖4A至圖4F的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。7A and 7B are schematic top views of different sub-pixels according to an embodiment of the present invention. It must be noted here that the embodiments of FIGS. 7A and 7B follow the element numbers and part of the content of the embodiments of FIGS. 4A to 4F, wherein the same or similar numbers are used to denote the same or similar elements, and the same elements are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiment, which will not be repeated here.
請參考圖7A和圖7B,在本實施例中,標準子畫素N的標準開關元件T與第一子畫素A的第一開關元件T1電性連接至第3級掃描線SL3。第一子畫素A重疊於第3級傳輸線TL3,標準子畫素N重疊於第m級傳輸線TLm,其中1<m<n。第m級掃描線SLm的充電時間不重疊於第3級掃描線SL3的充電時間。Referring to FIGS. 7A and 7B, in this embodiment, the standard switching element T of the standard sub-pixel N and the first switching element T1 of the first sub-pixel A are electrically connected to the third-level scan line SL3. The first sub-pixel A overlaps the third-level transmission line TL3, and the standard sub-pixel N overlaps the m-th level transmission line TLm, where 1<m<n. The charging time of the scan line SLm of the mth level does not overlap the charging time of the scan line SL3 of the third level.
在本實施例中,標準開關元件T的汲極DE的寬度W1大於第一開關元件T1的汲極DE的寬度W2。藉此使開關元件T1的電容Cgd1小於標準開關元件T的電容Cgd0,並改善顯示面板亮度不一致的問題。In this embodiment, the width W1 of the drain DE of the standard switching element T is greater than the width W2 of the drain DE of the first switching element T1. In this way, the capacitance Cgd1 of the switching element T1 is smaller than the capacitance Cgd0 of the standard switching element T, and the problem of inconsistent brightness of the display panel is improved.
圖8A與圖8B分別是依照本發明的一實施例的不同個子畫素上視示意圖。在此必須說明的是,圖8A和圖8B的實施例沿用圖4A至圖4F的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。8A and 8B are schematic top views of different sub-pixels according to an embodiment of the present invention. It must be noted here that the embodiments of FIGS. 8A and 8B follow the element numbers and part of the content of the embodiments of FIGS. 4A to 4F, wherein the same or similar numbers are used to denote the same or similar elements, and the same elements are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiment, which will not be repeated here.
請參考圖8A和圖8B,在本實施例中,標準子畫素N的標準開關元件T與第一子畫素A的第一開關元件T1電性連接至第3級掃描線SL3。第一子畫素A重疊於第3級傳輸線TL3,標準子畫素N重疊於第m級傳輸線TLm,其中1<m<n。第m級掃描線SLm的充電時間不重疊於第3級掃描線SL3的充電時間。8A and 8B, in this embodiment, the standard switching element T of the standard sub-pixel N and the first switching element T1 of the first sub-pixel A are electrically connected to the third-level scan line SL3. The first sub-pixel A overlaps the third-level transmission line TL3, and the standard sub-pixel N overlaps the m-th level transmission line TLm, where 1<m<n. The charging time of the scan line SLm of the mth level does not overlap the charging time of the scan line SL3 of the third level.
在本實施例中,第一子畫素A的畫素電極PE重疊於第一開關元件T1的閘極GE的面積小於標準子畫素N的畫素電極PE重疊於標準開關元件T的閘極GE的面積。舉例來說,畫素電極PE具有重疊於閘極GE的延伸部EP,而標準子畫素N的延伸部EP的面積大於第一子畫素A的延伸部EP的面積。In this embodiment, the area where the pixel electrode PE of the first sub-pixel A overlaps the gate GE of the first switching element T1 is smaller than the pixel electrode PE of the standard sub-pixel N overlaps the gate of the standard switching element T The area of GE. For example, the pixel electrode PE has an extension EP overlapping the gate GE, and the area of the extension EP of the standard sub-pixel N is larger than the area of the extension EP of the first sub-pixel A.
在一些實施例中,標準子畫素N的畫素電極PE重疊於標準開關元件T的閘極,而第一子畫素A的畫素電極PE未重疊於第一開關元件T1的閘極GE。舉例來說,第一子畫素A的畫素電極PE不具有延伸部EP。In some embodiments, the pixel electrode PE of the standard sub-pixel N overlaps the gate of the standard switching element T, and the pixel electrode PE of the first sub-pixel A does not overlap the gate GE of the first switching element T1 . For example, the pixel electrode PE of the first sub-pixel A does not have the extension EP.
藉由調整畫素電極PE的面積使開關元件T1的電容Cgd1小於標準開關元件T的電容Cgd0,並改善顯示面板亮度不一致的問題。By adjusting the area of the pixel electrode PE, the capacitance Cgd1 of the switching element T1 is smaller than the capacitance Cgd0 of the standard switching element T, and the problem of inconsistent brightness of the display panel is improved.
圖9是依照本發明的一實施例的一種畫素陣列基板的顯示區上視示意圖。在此必須說明的是,圖9的實施例沿用圖4A至圖4F的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 9 is a schematic top view of a display area of a pixel array substrate according to an embodiment of the present invention. It must be noted here that the embodiment of FIG. 9 uses the element numbers and part of the content of the embodiment of FIGS. 4A to 4F, wherein the same or similar reference numbers are used to represent the same or similar elements, and the same technical content is omitted. Description. For the description of the omitted parts, reference may be made to the foregoing embodiment, which will not be repeated here.
請參考圖9,在本實施例中,畫素陣列基板20更包括子畫素F。子畫素F重疊於傳輸線中的兩者。舉例來說,在本實施例中,電性連接至第3級掃描線SL3的部份子畫素F重疊於第3級傳輸線SL3以及第2傳輸線SL2,電性連接至第3級掃描線SL3的另一部份子畫素F重疊於第4級傳輸線SL4以及第5傳輸線SL5。Please refer to FIG. 9, in this embodiment, the
以電性連接至第3級掃描線SL3的子畫素為例,子畫素F的開關元件的汲極與閘極之間的電容為Cgd4,而標準子畫素N的開關元件的汲極與閘極之間的電容為Cgd0。藉由前述任一實施例的補償設計來調整電容Cgd4,使電容Cgd4小於電容Cgd0,藉此改善顯示畫面亮度分佈不均的問題。Taking the sub-pixel electrically connected to the third-level scan line SL3 as an example, the capacitance between the drain and the gate of the switching element of the sub-pixel F is Cgd4, and the drain of the switching element of the standard sub-pixel N The capacitance between the gate and the gate is Cgd0. The capacitor Cgd4 is adjusted by the compensation design of any of the foregoing embodiments so that the capacitor Cgd4 is smaller than the capacitor Cgd0, thereby improving the problem of uneven brightness distribution of the display screen.
在一些實施例中,以電性連接至第3級掃描線SL3的子畫素為例,子畫素A的電容Cgd1大於子畫素F的電容Cgd4,藉此進一步改善顯示畫面亮度分佈不均的問題。In some embodiments, taking the sub-pixels electrically connected to the third-level scan line SL3 as an example, the capacitance Cgd1 of the sub-pixel A is greater than the capacitance Cgd4 of the sub-pixel F, thereby further improving the uneven brightness distribution of the display screen. The problem.
圖10是依照本發明的一實施例的一種畫素陣列基板的上視示意圖。在此必須說明的是,圖10的實施例沿用圖1的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 10 is a schematic top view of a pixel array substrate according to an embodiment of the invention. It must be noted here that the embodiment of FIG. 10 uses the element numbers and part of the content of the embodiment of FIG. 1, wherein the same or similar reference numbers are used to represent the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiment, which will not be repeated here.
請參考圖10,在畫素陣列基板30中,每條掃描線SL電性連接至多條傳輸線TL。舉例來說,第一級掃描線電性連接至三條第一級傳輸線,三條第一級傳輸線分別電性連接至不同個驅動電路DR。Referring to FIG. 10, in the
利用多條傳輸線提供訊號給同一條掃描線,藉此能改善掃描線電阻過大造成的問題。Using multiple transmission lines to provide signals to the same scan line can improve the problem caused by excessive scan line resistance.
雖然在本實施例中,每條掃描線電性連接至三條傳輸線,但本發明不以此為限。在其他實施例中,每條掃描線電性連接至四條以上的傳輸線。Although in this embodiment, each scan line is electrically connected to three transmission lines, the invention is not limited to this. In other embodiments, each scan line is electrically connected to more than four transmission lines.
圖11A和圖11B分別是依照本發明的一實施例的不同個子畫素上視示意圖。在此必須說明的是,圖11A和圖11B的實施例沿用圖4A至圖4F的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。11A and 11B are schematic top views of different sub-pixels according to an embodiment of the present invention. It must be noted here that the embodiments of FIGS. 11A and 11B follow the element numbers and part of the content of the embodiments of FIGS. 4A to 4F, wherein the same or similar numbers are used to denote the same or similar elements, and the same elements are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiment, which will not be repeated here.
為了方便說明,圖11A和圖11B繪示了開關元件、掃描線以及資料線,並省略繪示其他構件,關於其他構件的描述可參考前述實施例,在此不贅述。For the convenience of description, FIGS. 11A and 11B illustrate switching elements, scan lines, and data lines, and omit other components. For the description of other components, refer to the foregoing embodiment, which will not be repeated here.
圖11B的子畫素A與圖11A的標準子畫素N有類似的結構,差異在於子畫素A的汲極DE重疊於閘極GE的長度L1小於標準子畫素N的標準開關元件T的汲極DE重疊於閘極GE的長度L。The sub-pixel A in FIG. 11B has a similar structure to the standard sub-pixel N in FIG. 11A. The difference is that the drain DE of the sub-pixel A overlaps the gate GE and the length L1 is smaller than the standard switching element T of the standard sub-pixel N. The drain electrode DE overlaps the length L of the gate electrode GE.
在本實施例中,子畫素A的閘極GE的寬度X1小於標準子畫素N的標準開關元件T的閘極GE的寬度X。藉由調整閘極GE的寬度X1來改變汲極DE重疊於閘極GE的長度L1。In this embodiment, the width X1 of the gate GE of the sub-pixel A is smaller than the width X of the gate GE of the standard switching element T of the standard sub-pixel N. By adjusting the width X1 of the gate GE, the length L1 of the drain DE overlapping with the gate GE is changed.
在本實施例中,開關元件T1的汲極DE重疊於閘極GE的長度L1小於標準開關元件T的汲極DE重疊於閘極GE的長度L,使開關元件T1的汲極DE與閘極GE之間的重疊面積小於標準開關元件T的汲極DE與閘極GE之間的重疊面積。因此,開關元件T1的電容Cgd1小於標準開關元件T的電容Cgd0。In this embodiment, the length L1 that the drain DE of the switching element T1 overlaps the gate GE is smaller than the length L that the drain DE of the standard switching element T overlaps the gate GE, so that the drain DE of the switching element T1 and the gate GE The overlap area between GE is smaller than the overlap area between the drain DE and the gate GE of the standard switching element T. Therefore, the capacitance Cgd1 of the switching element T1 is smaller than the capacitance Cgd0 of the standard switching element T.
在本實施例中,藉由使開關元件T1的電容Cgd1小於標準開關元件T的電容Cgd0能夠改善顯示裝置亮度不一致的問題。In this embodiment, by making the capacitance Cgd1 of the switching element T1 smaller than the capacitance Cgd0 of the standard switching element T, the problem of inconsistent brightness of the display device can be improved.
圖12是依照本發明的一實施例的一種畫素陣列基板的上視示意圖。在此必須說明的是,圖12的實施例沿用圖10的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。FIG. 12 is a schematic top view of a pixel array substrate according to an embodiment of the invention. It must be noted here that the embodiment of FIG. 12 uses the element numbers and part of the content of the embodiment of FIG. 10, wherein the same or similar reference numbers are used to represent the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiment, which will not be repeated here.
為了方便說明,圖12繪示了傳輸線、掃描線以及資料線,並省略繪示其他構件,關於其他構件的描述可參考前述實施例,在此不贅述。For the convenience of description, FIG. 12 shows transmission lines, scan lines, and data lines, and other components are omitted. For the description of other components, reference may be made to the foregoing embodiment, which will not be repeated here.
請參考圖12,在本實施例中,畫素陣列基板40的傳輸線Tla電性連接驅動電路DR至對應的掃描線SL,且驅動電路DR與對應的掃描線SL之間的傳輸線Tla的長度為Y1。在本實施例中,傳輸線Tlb電性連接驅動電路DR至對應的掃描線SL,且驅動電路DR與對應的掃描線SL之間的傳輸線Tlb的長度為Y2。在本實施例中,傳輸線Tlc電性連接驅動電路DR至對應的掃描線SL,且驅動電路DR與對應的掃描線SL之間的傳輸線Tlc的長度為Y3。在本實施例中,長度Y3大於長度Y2大於長度Y1。12, in this embodiment, the transmission line T1a of the
由於長度Y3、長度Y2以及長度Y1彼此不同,因此,電性連接至傳輸線Tla的子畫素、電性連接至傳輸線Tlb的子畫素以及電性連接至傳輸線Tlc的子畫素具有不同程度的補償設計。在一些實施例中,電性連接至傳輸線Tlc的子畫素的補償設計的程度大於電性連接至傳輸線Tlb的子畫素的補償設計的程度,電性連接至傳輸線Tlb的子畫素的補償設計的程度大於電性連接至傳輸線Tlc的子畫素的補償設計的程度。舉例來說,電性連接至傳輸線Tla的第一開關元件的汲極與閘極的重疊面積為A1,電性連接至傳輸線Tlb的第二開關元件的汲極與閘極的重疊面積為A2,電性連接至傳輸線Tlc的第三開關元件的汲極與閘極的重疊面積為A3,藉由調整汲極的長度、汲極的寬度及/或閘極的寬度,使面積A1>面積A2>面積A3。換句話說,子畫素的補償設計的補償值越大,汲極與閘極的重疊面積越小。舉例來說,第一開關元件的汲極的長度大於第二開關元件的汲極的長度大於第三開關元件的汲極的長度。舉例來說,第一開關元件的汲極的寬度大於第二開關元件的汲極的寬度大於第三開關元件的汲極的寬度。Since the length Y3, the length Y2, and the length Y1 are different from each other, the sub-pixels that are electrically connected to the transmission line T1a, the sub-pixels that are electrically connected to the transmission line Tlb, and the sub-pixels that are electrically connected to the transmission line Tlc have different degrees of Compensation design. In some embodiments, the degree of compensation design of the sub-pixels electrically connected to the transmission line Tlc is greater than the degree of compensation design of the sub-pixels electrically connected to the transmission line Tlb, and the compensation of the sub-pixels electrically connected to the transmission line Tlb The degree of design is greater than the degree of compensation design of the sub-pixels electrically connected to the transmission line Tlc. For example, the overlap area of the drain and gate of the first switching element electrically connected to the transmission line T1a is A1, and the overlap area of the drain and gate of the second switching element electrically connected to the transmission line Tlb is A2, The overlap area of the drain and the gate of the third switching element electrically connected to the transmission line Tlc is A3. By adjusting the length of the drain, the width of the drain and/or the width of the gate, the area A1>A2> Area A3. In other words, the larger the compensation value of the sub-pixel compensation design, the smaller the overlap area of the drain and the gate. For example, the length of the drain of the first switching element is greater than the length of the drain of the second switching element than the length of the drain of the third switching element. For example, the width of the drain of the first switching element is greater than the width of the drain of the second switching element than the width of the drain of the third switching element.
舉例來說,電性連接至傳輸線Tla的第一開關元件的汲極與閘極之間的電容為Cgda,電性連接至傳輸線Tlb的第二開關元件的汲極與閘極之間的電容為Cgdb,電性連接至傳輸線Tlb的第二開關元件的汲極與閘極之間的電容為Cgdc,其中Cgda>Cgdb>Cgdc。For example, the capacitance between the drain and the gate of the first switching element electrically connected to the transmission line T1a is Cgda, and the capacitance between the drain and the gate of the second switching element electrically connected to the transmission line Tlb is Cgdb, the capacitance between the drain and the gate of the second switching element electrically connected to the transmission line Tlb is Cgdc, where Cgda>Cgdb>Cgdc.
在其他實施例中,也可以藉由調整畫素電極重疊於開關元件的閘極的面積來改變子畫素的補償設計的程度(如圖8A與圖8B)。舉例來說,電性連接至傳輸線Tla的第一開關元件的閘極與第一畫素電極的重疊面積為B1,電性連接至傳輸線Tlb的第二開關元件的閘極與第二畫素電極的重疊面積為B2,電性連接至傳輸線Tlc的第三開關元件的閘極與第三畫素電極的重疊面積為B3,面積B1>面積B2>面積B3。換句話說,子畫素的補償設計的補償值越大,畫素電極與閘極的重疊面積越小。In other embodiments, the extent of the compensation design of the sub-pixels can also be changed by adjusting the area of the pixel electrode overlapping the gate of the switching element (as shown in FIG. 8A and FIG. 8B). For example, the overlap area of the gate electrode of the first switching element and the first pixel electrode electrically connected to the transmission line T1 is B1, and the gate electrode and the second pixel electrode of the second switching element electrically connected to the transmission line Tlb are The overlap area of is B2, the overlap area of the gate of the third switching element electrically connected to the transmission line Tlc and the third pixel electrode is B3, area B1>area B2>area B3. In other words, the larger the compensation value of the sub-pixel compensation design, the smaller the overlap area of the pixel electrode and the gate electrode.
10、20、30、40:畫素陣列基板 A、C、D、E:子畫素 AA:顯示區 BA:周邊區 CL1、CL2、CL3:共用訊號線 CH:通道層 CS:轉接結構 DL:資料線 DE:汲極 DC、DR:驅動電路 DR1、DR2:方向 EP:延伸部 GE:閘極 GI:閘極絕緣層 L、L1~L3、L5、L6、Y1、Y2、Y3:長度 N:標準子畫素 O:開口 PE:畫素電極 PL:絕緣層 SB:基板 SE:源極 SL、SL1~SL5:掃描線 T:標準開關元件 TL、TL1~TL9、TLm、TLa、TLb、TLc:傳輸線 T1~T3、T5、T6:開關元件 U:絕緣層 W1、W2、X、X1:寬度10, 20, 30, 40: pixel array substrate A, C, D, E: sub-pixels AA: Display area BA: Surrounding area CL1, CL2, CL3: Shared signal line CH: Channel layer CS: transfer structure DL: Data line DE: Dip pole DC, DR: drive circuit DR1, DR2: direction EP: Extension GE: Gate GI: Gate insulation layer L, L1~L3, L5, L6, Y1, Y2, Y3: length N: Standard sub-pixel O: opening PE: pixel electrode PL: insulating layer SB: Substrate SE: Source SL, SL1~SL5: scan line T: Standard switching element TL, TL1~TL9, TLm, TLa, TLb, TLc: transmission line T1~T3, T5, T6: switching elements U: Insulation layer W1, W2, X, X1: width
圖1是依照本發明的一實施例的一種畫素陣列基板的上視示意圖。 圖2是依照本發明的一實施例的一種畫素陣列基板的顯示區上視示意圖。 圖3是依照本發明的一實施例的一種畫素陣列基板的掃描線訊號波形圖。 圖4A至圖4F分別是依照本發明的一實施例的不同個子畫素上視示意圖。 圖5是沿著圖4A的線aa’的剖面示意圖。 圖6是依照本發明的一實施例的一種畫素陣列基板的掃描線訊號以及畫素電極訊號波形圖。 圖7A和圖7B分別是依照本發明的一實施例的不同個子畫素上視示意圖。 圖8A和圖8B分別是依照本發明的一實施例的不同個子畫素上視示意圖。 圖9是依照本發明的一實施例的一種畫素陣列基板的顯示區上視示意圖。 圖10是依照本發明的一實施例的一種畫素陣列基板的上視示意圖。 圖11A和圖11B分別是依照本發明的一實施例的不同個子畫素上視示意圖。 圖12是依照本發明的一實施例的一種畫素陣列基板的上視示意圖。FIG. 1 is a schematic top view of a pixel array substrate according to an embodiment of the invention. 2 is a schematic top view of a display area of a pixel array substrate according to an embodiment of the invention. 3 is a waveform diagram of scan line signals of a pixel array substrate according to an embodiment of the present invention. 4A to 4F are schematic top views of different sub-pixels according to an embodiment of the present invention. Fig. 5 is a schematic cross-sectional view taken along the line aa' of Fig. 4A. 6 is a waveform diagram of scan line signals and pixel electrode signals of a pixel array substrate according to an embodiment of the present invention. 7A and 7B are schematic top views of different sub-pixels according to an embodiment of the present invention. 8A and 8B are schematic top views of different sub-pixels according to an embodiment of the present invention. FIG. 9 is a schematic top view of a display area of a pixel array substrate according to an embodiment of the present invention. FIG. 10 is a schematic top view of a pixel array substrate according to an embodiment of the invention. 11A and 11B are schematic top views of different sub-pixels according to an embodiment of the present invention. FIG. 12 is a schematic top view of a pixel array substrate according to an embodiment of the invention.
A:子畫素 A: Sub-pixel
CL1、CL3:共用訊號線 CL1, CL3: Shared signal line
CH:通道層 CH: Channel layer
CS:轉接結構 CS: transfer structure
DE:汲極 DE: Dip pole
GE:閘極 GE: Gate
L1:長度 L1: length
PE:畫素電極 PE: pixel electrode
SE:源極 SE: Source
SL3:掃描線 SL3: scan line
TL3:傳輸線 TL3: Transmission line
T1:開關元件 T1: switching element
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