TW202102557A - Polymer composition and single-layer retardation material - Google Patents
Polymer composition and single-layer retardation material Download PDFInfo
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Abstract
Description
本發明關於含有聚合物之組成物及單層相位差材。詳細而言,係關於在顯示裝置、記錄材料等用途具有理想的光學特性之材料,尤其關於可理想地利用於液晶顯示器用之偏光板及相位差板等光學補償薄膜之液晶性聚合物、含有該聚合物之組成物、及得自於該組成物之單層相位差材。The present invention relates to a polymer-containing composition and a single-layer retardation material. In detail, it relates to materials with ideal optical properties for applications such as display devices and recording materials, and in particular, it relates to liquid crystal polymers that can be ideally used in optical compensation films such as polarizers and retardation plates for liquid crystal displays. The composition of the polymer and the single-layer retardation material obtained from the composition.
由於液晶顯示裝置的顯示品質之改善、輕量化等之要求,就偏光板、相位差板等光學補償薄膜而言,內部的分子配向結構受到控制之高分子薄膜的要求提高。為了因應該要求,利用了聚合性液晶化合物所具有的光學各向異性之薄膜的開發正在進行。在此使用的聚合性液晶化合物通常為具有聚合性基與液晶結構部位(具有間隔部與液晶元(mesogen)部之結構部位)的液晶化合物,且廣泛使用丙烯酸基作為該聚合性基。Due to the requirements for improvement of display quality and weight reduction of liquid crystal display devices, for optical compensation films such as polarizers and retardation plates, the requirements for polymer films whose internal molecular alignment structure is controlled have increased. In order to meet the requirements, the development of films that utilize the optical anisotropy possessed by polymerizable liquid crystal compounds is underway. The polymerizable liquid crystal compound used here is generally a liquid crystal compound having a polymerizable group and a liquid crystal structure portion (a structure portion having a spacer portion and a mesogen portion), and an acrylic group is widely used as the polymerizable group.
如此的聚合性液晶化合物,一般而言係以照射紫外線等放射線來進行聚合之方法製成聚合物(薄膜)。例如已知有將具有丙烯酸基之特定聚合性液晶化合物載持於支持體間,將該化合物保持於液晶狀態同時照射放射線來獲得聚合物之方法(專利文獻1)、或將光聚合起始劑添加於具有丙烯酸基之2種聚合性液晶化合物的混合物或於該混合物中混合有不對稱液晶而成的組成物中,並照射紫外線來獲得聚合物之方法(專利文獻2)。Such a polymerizable liquid crystal compound is generally formed into a polymer (film) by a method of irradiating radiation such as ultraviolet rays to perform polymerization. For example, there is known a method for obtaining a polymer by supporting a specific polymerizable liquid crystal compound having an acrylic group between supports, maintaining the compound in a liquid crystal state while irradiating radiation to obtain a polymer (Patent Document 1), or using a photopolymerization initiator A method of adding to a mixture of two polymerizable liquid crystal compounds having an acrylic group or a composition obtained by mixing an asymmetric liquid crystal in the mixture, and irradiating ultraviolet rays to obtain a polymer (Patent Document 2).
又,已有報告不需要液晶配向膜之使用了聚合性液晶化合物或聚合物的配向薄膜(專利文獻3、4)、使用了含有光交聯部位之聚合物的配向薄膜(專利文獻5、6)等各種的單層塗佈型配向薄膜。但是,會有上述薄膜製作製程困難、必須使用NMP、氯仿、氯苯等溶解力優良的溶劑作為所使用的聚合物之溶劑等聚合物之溶解性低等的問題,且迄今仍未發現解決如此的問題的材料。 [先前技術文獻] [專利文獻]In addition, there have been reports of alignment films using polymerizable liquid crystal compounds or polymers that do not require liquid crystal alignment films (Patent Documents 3 and 4), and alignment films using polymers containing photo-crosslinked sites (Patent Documents 5 and 6). ) And other single-layer coating type alignment films. However, the above-mentioned film production process is difficult, and it is necessary to use solvents with excellent solubility such as NMP, chloroform, and chlorobenzene as the solvent of the polymer used. The solubility of the polymer is low, and so far, no solution has been found to solve this problem. The material of the question. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開昭62-70407號公報 [專利文獻2]日本特開平9-208957號公報 [專利文獻3]歐洲專利申請案公開第1090325號說明書 [專利文獻4]國際公開第2008/031243號 [專利文獻5]日本特開2008-164925號公報 [專利文獻6]日本特開平11-189665號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 62-70407 [Patent Document 2] Japanese Patent Application Laid-Open No. 9-208957 [Patent Document 3] European Patent Application Publication No. 1090325 Specification [Patent Document 4] International Publication No. 2008/031243 [Patent Document 5] JP 2008-164925 A [Patent Document 6] Japanese Patent Laid-Open No. 11-189665
[發明所欲解決之課題][The problem to be solved by the invention]
本發明係鑑於上述問題而成,目的為提供可利用更簡單的製程來製作相位差值高的單層相位差材之新穎聚合物、含有該聚合物之組成物、及得自於該組成物之單層相位差材。 [解決課題之手段]The present invention is made in view of the above problems, and its object is to provide a novel polymer, a composition containing the polymer, and a composition derived from the single-layer retardation material that can be produced by a simpler process. The single-layer phase difference material. [Means to solve the problem]
本案發明人為了解決上述課題反覆進行深入探討後之結果發現,藉由使用含有特定聚合物及特定添加劑之組成物,即可不使用液晶配向膜而獲得具有高折射率各向異性(Δn)之單層相位差材,更可製得相位差值高且無混濁之單層相位差材,乃至完成本發明。In order to solve the above-mentioned problems, the inventors of the present case have conducted in-depth investigations and found that by using a composition containing a specific polymer and specific additives, a liquid crystal alignment film can be used without the use of a liquid crystal alignment film to obtain a monomer with high refractive index anisotropy (Δn). The layer retardation material can also produce a single-layer retardation material with high retardation value and no turbidity, and even complete the present invention.
因此,本發明提供下述聚合物組成物及單層相位差材。 1. 一種聚合物組成物,含有: (A)側鏈型聚合物,具有具下式(a)表示之光反應性部位之側鏈及具下式(b)表示之部位之側鏈,及 (B)有機溶劑。 [化1] 式中,R1 為碳數1~30之伸烷基,且該伸烷基中之1個或多個氫原子也可被取代為氟原子或有機基。又,R1 中之-CH2 CH2 -也可被取代為-CH=CH-,R1 中之-CH2 -也可被取代為選自於由-O-、-NH-C(=O)-、-C(=O)-NH-、-C(=O)-O-、-O-C(=O)-、-NH-、-NH-C(=O)-NH-及-C(=O)-構成之群組中之基。惟,相鄰的-CH2 -不會同時取代為這些基。又,-CH2 -也可為R1 中之末端的-CH2 -。 R2 為2價芳香族基、2價脂環族基、2價雜環族基或2價縮合環族基。 R3 為單鍵、-O-、-C(=O)-O-、-O-C(=O)-或-CH=CH-C(=O)-O-。 R4 為1,4-伸苯基或反式-1,4-伸環己基。 R為碳數1~6之烷基、碳數1~6之鹵烷基、碳數1~6之烷氧基、碳數1~6之鹵烷氧基、氰基或硝基,且c≧2時,各個R可互為相同,也可相異。 式(b)中的苯環也可經選自於碳數1~6之烷基、碳數1~6之鹵烷基、碳數1~6之烷氧基、碳數1~6之鹵烷氧基、氰基及硝基中之取代基取代。 a為0、1或2。 b為0或1。 c為符合0≦c≦2b+4之整數。 破折線為原子鍵。 2. 如1.之聚合物組成物,其中,上述具有光反應性部位之側鏈為下式(a1)表示者。 [化2] 式中,R1 、R2 及a同上所述。 R3A 為單鍵、-O-、-C(=O)-O-或-O-C(=O)-。 式(a1)中的苯環也可經選自於碳數1~6之烷基、碳數1~6之鹵烷基、碳數1~6之烷氧基、碳數1~6之鹵烷氧基、氰基及硝基中之取代基取代。 破折線為原子鍵。 3. 如1.或2.之聚合物組成物,其中,(A)側鏈型聚合物更具有僅展現液晶性之側鏈。 4. 如3.之聚合物組成物,其中,上述僅展現液晶性之側鏈為下式(1)~(12)中之任一者表示之液晶性側鏈。 [化3] [化4] 式中,A1 、A2 分別獨立地為單鍵、-O-、-CH2 -、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-、-NH-C(=O)-、-CH=CH-C(=O)-O-或-O-C(=O)-CH=CH-。 R11 為-NO2 、-CN、鹵素原子、苯基、萘基、聯苯基、呋喃基、1價含氮雜環基、碳數5~8之1價脂環族烴基、碳數1~12之烷基或碳數1~12之烷氧基。 R12 為選自於由苯基、萘基、聯苯基、呋喃基、1價含氮雜環基、碳數5~8之1價脂環族烴基、及它們所組合而得的基構成之群組中之基,且鍵結於這些基的氫原子也可被取代為-NO2 、-CN、鹵素原子、碳數1~5之烷基或碳數1~5之烷氧基。 R13 為氫原子、-NO2 、-CN、-CH=C(CN)2 、-CH=CH-CN、鹵素原子、苯基、萘基、聯苯基、呋喃基、1價含氮雜環基、碳數5~8之1價脂環族烴基、碳數1~12之烷基或碳數1~12之烷氧基。 E為-C(=O)-O-或-O-C(=O)-。 d為1~12之整數。 k1~k5分別獨立地為0~2之整數,惟,k1~k5之合計為2以上。 k6及k7分別獨立地為0~2之整數,惟,k6及k7之合計為1以上。 m1、m2及m3分別獨立地為1~3之整數。 n為0或1。 Z1 及Z2 分別獨立地為單鍵、-C(=O)-、-CH2 O-、-CH=N-或-CF2 -。 破折線為原子鍵。 5. 如4.之聚合物組成物,其中,上述僅展現液晶性之側鏈為式(1)~(11)中之任一者表示之液晶性側鏈。 6. 一種單層相位差材之製造方法,包含下列步驟: (I)將如1.~5.中任一項之聚合物組成物塗佈於基板上來形成塗膜, (II)對上述塗膜照射經偏光之紫外線,及 (III)將上述已照射紫外線之塗膜進行加熱來獲得相位差材。 7. 一種單層相位差材,得自於如1.~5.中任一項之聚合物組成物。 [發明之效果]Therefore, the present invention provides the following polymer composition and single-layer retardation material. 1. A polymer composition comprising: (A) a side chain type polymer having a side chain having a photoreactive site represented by the following formula (a) and a side chain having a site represented by the following formula (b), and (B) Organic solvents. [化1] In the formula, R 1 is an alkylene group having 1 to 30 carbon atoms, and one or more hydrogen atoms in the alkylene group may be substituted with a fluorine atom or an organic group. In addition, -CH 2 CH 2 -in R 1 can also be substituted with -CH=CH-, and -CH 2 -in R 1 can also be substituted with selected from -O-, -NH-C(= O)-, -C(=O)-NH-, -C(=O)-O-, -OC(=O)-, -NH-, -NH-C(=O)-NH- and -C (=O)-The base of the group formed. However, adjacent -CH 2 -will not be substituted with these groups at the same time. And, -CH 2 - may be, R 1 is -CH end of the 2 -. R 2 is a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent condensed cyclic group. R 3 is a single bond, -O-, -C(=O)-O-, -OC(=O)- or -CH=CH-C(=O)-O-. R 4 is 1,4-phenylene or trans-1,4-cyclohexylene. R is alkyl with 1 to 6 carbons, haloalkyl with 1 to 6 carbons, alkoxy with 1 to 6 carbons, haloalkoxy with 1 to 6 carbons, cyano or nitro, and c When ≧2, each R can be the same or different from each other. The benzene ring in formula (b) can also be selected from alkyl groups with 1 to 6 carbons, haloalkyl groups with 1 to 6 carbons, alkoxy groups with 1 to 6 carbons, and halogens with 1 to 6 carbons. Substituents in alkoxy, cyano and nitro are substituted. a is 0, 1, or 2. b is 0 or 1. c is an integer conforming to 0≦c≦2b+4. The dashed line is the atomic bond. 2. The polymer composition according to 1., wherein the side chain having the photoreactive site is represented by the following formula (a1). [化2] In the formula, R 1 , R 2 and a are the same as described above. R 3A is a single bond, -O-, -C(=O)-O- or -OC(=O)-. The benzene ring in formula (a1) can also be selected from alkyl groups with 1 to 6 carbons, haloalkyl groups with 1 to 6 carbons, alkoxy groups with 1 to 6 carbons, and halogens with 1 to 6 carbons. Substituents in alkoxy, cyano and nitro are substituted. The dashed line is the atomic bond. 3. The polymer composition of 1. or 2., wherein the (A) side chain type polymer further has side chains that only exhibit liquid crystallinity. 4. The polymer composition of 3., wherein the side chain that only exhibits liquid crystallinity is a liquid crystal side chain represented by any one of the following formulas (1) to (12). [化3] [化4] In the formula, A 1 and A 2 are each independently a single bond, -O-, -CH 2 -, -C(=O)-O-, -OC(=O)-, -C(=O)-NH -, -NH-C(=O)-, -CH=CH-C(=O)-O- or -OC(=O)-CH=CH-. R 11 is -NO 2 , -CN, halogen atom, phenyl, naphthyl, biphenyl, furyl, monovalent nitrogen-containing heterocyclic group, monovalent alicyclic hydrocarbon group with 5 to 8 carbon atoms, carbon number 1 ~12 alkyl group or alkoxy group with carbon number 1-12. R 12 is selected from the group consisting of a phenyl group, a naphthyl group, a biphenyl group, a furyl group, a monovalent nitrogen-containing heterocyclic group, a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and a combination thereof The groups in the group, and the hydrogen atoms bonded to these groups can also be substituted with -NO 2 , -CN, halogen atoms, alkyl groups with 1 to 5 carbons, or alkoxy groups with 1 to 5 carbons. R 13 is a hydrogen atom, -NO 2 , -CN, -CH=C(CN) 2 , -CH=CH-CN, halogen atom, phenyl, naphthyl, biphenyl, furanyl, monovalent nitrogen-containing hetero Cyclic group, monovalent alicyclic hydrocarbon group with carbon number 5-8, alkyl group with carbon number 1-12 or alkoxy group with carbon number 1-12. E is -C(=O)-O- or -OC(=O)-. d is an integer of 1-12. k1~k5 are each independently an integer of 0~2, but the total of k1~k5 is 2 or more. k6 and k7 are each independently an integer of 0-2, but the total of k6 and k7 is 1 or more. m1, m2, and m3 are each independently an integer of 1 to 3. n is 0 or 1. Z 1 and Z 2 are each independently a single bond, -C(=O)-, -CH 2 O-, -CH=N- or -CF 2 -. The dashed line is the atomic bond. 5. The polymer composition of 4., wherein the side chain that only exhibits liquid crystallinity is a liquid crystal side chain represented by any one of formulas (1) to (11). 6. A manufacturing method of a single-layer retardation material, comprising the following steps: (I) coating the polymer composition of any one of 1. to 5. on a substrate to form a coating film, (II) coating the above The film is irradiated with polarized ultraviolet rays, and (III) the above-mentioned coating film irradiated with ultraviolet rays is heated to obtain a retardation material. 7. A single-layer retardation material, obtained from the polymer composition of any one of 1.~5. [Effects of Invention]
根據本發明可提供即使為薄膜其相位差值仍高的單層相位差材及製作該單層相位差材之聚合物。According to the present invention, it is possible to provide a single-layer retardation material having a high retardation value even if it is a film, and a polymer for producing the single-layer retardation material.
本案發明人進行深入研究後之結果獲得如下見解,乃至完成本發明。 本發明之聚合物組成物具有可展現液晶性之感光性側鏈型聚合物(以下也簡稱側鏈型聚合物),使用上述聚合物組成物而得的塗膜為具有可展現液晶性之感光性側鏈型聚合物的膜。該塗膜不實施摩擦(rubbing)處理,而係利用照射偏光來實施配向處理。而且,在照射偏光之後,經過將該側鏈型聚合物膜進行加熱之步驟,而成為賦予了光學各向異性之薄膜(以下也稱單層相位差材)。此時,因照射偏光而展現的些微之各向異性會成為驅動力,液晶性側鏈型聚合物本身會因為自我組織化而有效率地進行再配向。其結果,就單層相位差材而言可實現高效率的配向處理,並獲得賦予了高光學各向異性之單層相位差材。The inventors of this case obtained the following insights as a result of in-depth research, and even completed the present invention. The polymer composition of the present invention has a photosensitive side chain type polymer (hereinafter also referred to as a side chain type polymer) that can exhibit liquid crystallinity, and the coating film obtained by using the above polymer composition is a photosensitive side chain polymer that can exhibit liquid crystallinity. Side chain polymer film. The coating film is not subjected to rubbing treatment, but is irradiated with polarized light to perform alignment treatment. Then, after irradiating with polarized light, the side chain type polymer film undergoes a step of heating, and it becomes a film to which optical anisotropy is imparted (hereinafter also referred to as a single-layer retardation material). At this time, the slight anisotropy exhibited by the irradiation of polarized light becomes the driving force, and the liquid crystalline side chain polymer itself is self-organized and realigned efficiently. As a result, it is possible to realize highly efficient alignment processing for the single-layer retardation material, and obtain a single-layer retardation material imparted with high optical anisotropy.
又,本發明中的聚合物組成物中,(A)成分即側鏈型聚合物藉由包含具有上述式(a)表示之光配向性部位之側鏈,同時包含上述式(b)表示之側鏈,而會抑制聚合物的凝聚。藉此,得自本發明之聚合物組成物的相位差材即使為薄膜仍可表現高相位延遲。另外,它們係包含有關本發明的機制之發明者的見解者,且非用以限制本發明。In addition, in the polymer composition of the present invention, the component (A), which is a side chain type polymer, includes the side chain having the photo-alignment site represented by the above formula (a) and the side chain represented by the above formula (b) at the same time. Side chain, and will inhibit the aggregation of the polymer. Thereby, the retardation material obtained from the polymer composition of the present invention can express high retardation even if it is a film. In addition, they are those who include the inventor's insights about the mechanism of the present invention, and are not intended to limit the present invention.
以下,針對本發明之實施形態詳細地說明。Hereinafter, the embodiments of the present invention will be described in detail.
[聚合物組成物] 本發明之聚合物組成物之特徵為含有: (A)在預定的溫度範圍內會展現液晶性之感光性側鏈型聚合物,及 (B)有機溶劑。[Polymer composition] The polymer composition of the present invention is characterized by containing: (A) A photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, and (B) Organic solvents.
[(A)側鏈型聚合物] (A)成分為在預定的溫度範圍內會展現液晶性之感光性側鏈型聚合物,係具有具下式(a)表示之光反應性部位之側鏈(以下也稱側鏈a)及具下式(b)表示之部位之側鏈(以下也稱側鏈b)的側鏈型聚合物。 [化5] [(A) Side chain polymer] The component (A) is a photosensitive side chain polymer that exhibits liquid crystallinity in a predetermined temperature range, and has a side having a photoreactive site represented by the following formula (a) A side chain type polymer having a chain (hereinafter also referred to as side chain a) and a side chain (hereinafter also referred to as side chain b) at the position represented by the following formula (b). [化5]
式(a)中,R1 為碳數1~30之伸烷基,且該伸烷基中之1個或多個氫原子也可被取代為氟原子或有機基。又,R1 中之-CH2 CH2 -也可被取代為-CH=CH-,R1 中之-CH2 -也可被取代為選自於由-O-、-NH-C(=O)-、-C(=O)-NH-、-C(=O)-O-、-O-C(=O)-、-NH-、-NH-C(=O)-NH-及-C(=O)-構成之群組中之基。惟,相鄰的-CH2 -不會同時取代為這些基。又,-CH2 -也可為R1 中之末端的-CH2 -。R2 為2價芳香族基、2價脂環族基、2價雜環族基或2價縮合環族基。R3 為單鍵、-O-、-C(=O)-O-、-O-C(=O)-或-CH=CH-C(=O)-O-。R為碳數1~6之烷基、碳數1~6之鹵烷基、碳數1~6之烷氧基、碳數1~6之鹵烷氧基、氰基或硝基,且c≧2時,各個R可互為相同,也可相異。a為0、1或2。b為0或1。c為符合0≦c≦2b+4之整數。破折線為原子鍵。In formula (a), R 1 is an alkylene group having 1 to 30 carbon atoms, and one or more hydrogen atoms in the alkylene group may be substituted with a fluorine atom or an organic group. In addition, -CH 2 CH 2 -in R 1 can also be substituted with -CH=CH-, and -CH 2 -in R 1 can also be substituted with selected from -O-, -NH-C(= O)-, -C(=O)-NH-, -C(=O)-O-, -OC(=O)-, -NH-, -NH-C(=O)-NH- and -C (=O)-The base of the group formed. However, adjacent -CH 2 -will not be substituted with these groups at the same time. And, -CH 2 - may be, R 1 is -CH end of the 2 -. R 2 is a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent condensed cyclic group. R 3 is a single bond, -O-, -C(=O)-O-, -OC(=O)- or -CH=CH-C(=O)-O-. R is alkyl with 1 to 6 carbons, haloalkyl with 1 to 6 carbons, alkoxy with 1 to 6 carbons, haloalkoxy with 1 to 6 carbons, cyano or nitro, and c When ≧2, each R can be the same or different from each other. a is 0, 1, or 2. b is 0 or 1. c is an integer conforming to 0≦c≦2b+4. The dashed line is the atomic bond.
式(b)中,R1 、R2 、R3 及a同上所述。R4 為1,4-伸苯基或反式-1,4-伸環己基。式(b)中的苯環也可經選自於碳數1~6之烷基、碳數1~6之鹵烷基、碳數1~6之烷氧基、碳數1~6之鹵烷氧基、氰基及硝基中之取代基取代。破折線為原子鍵。In the formula (b), R 1 , R 2 , R 3 and a are the same as described above. R 4 is 1,4-phenylene or trans-1,4-cyclohexylene. The benzene ring in formula (b) can also be selected from alkyl groups with 1 to 6 carbons, haloalkyl groups with 1 to 6 carbons, alkoxy groups with 1 to 6 carbons, and halogens with 1 to 6 carbons. Substituents in alkoxy, cyano and nitro are substituted. The dashed line is the atomic bond.
R1 表示之碳數1~30之伸烷基為直鏈狀、分支狀、環狀中之任一皆可,其具體例可列舉:亞甲基、伸乙基、丙烷-1,3-二基、丁烷-1,4-二基、戊烷-1,5-二基、己烷-1,6-二基、庚烷-1,7-二基、辛烷-1,8-二基、壬烷-1,9-二基、癸烷-1,10-二基等。The alkylene having 1 to 30 carbon atoms represented by R 1 may be linear, branched, or cyclic. Specific examples include: methylene, ethylene, and propane-1,3- Diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8- Diyl, nonane-1,9-diyl, decane-1,10-diyl, etc.
R2 表示之2價芳香族基可列舉:伸苯基、伸聯苯基等。R2 表示之2價脂環族基可列舉:環己烷二基等。R2 表示之2價雜環族基可列舉:呋喃二基等。R2 表示之2價縮合環族基可列舉:伸萘基等。Examples of the divalent aromatic group represented by R 2 include phenylene and biphenylene. The divalent alicyclic group represented by R 2 includes cyclohexanediyl and the like. Examples of the divalent heterocyclic group represented by R 2 include furandiyl groups. The divalent condensed ring group represented by R 2 includes naphthylene and the like.
側鏈a宜為下式(a1)表示者(以下也稱側鏈a1)。 [化6] The side chain a is preferably represented by the following formula (a1) (hereinafter also referred to as side chain a1). [化6]
式(a1)中,R1 、R2 及a同上所述。R3A 為單鍵、-O-、-C(=O)-O-或-O-C(=O)-。式(a1)中的苯環也可經選自於碳數1~6之烷基、碳數1~6之鹵烷基、碳數1~6之烷氧基、碳數1~6之鹵烷氧基、氰基及硝基中之取代基取代。破折線為原子鍵。In the formula (a1), R 1 , R 2 and a are the same as described above. R 3A is a single bond, -O-, -C(=O)-O- or -OC(=O)-. The benzene ring in formula (a1) can also be selected from alkyl groups with 1 to 6 carbons, haloalkyl groups with 1 to 6 carbons, alkoxy groups with 1 to 6 carbons, and halogens with 1 to 6 carbons. Substituents in alkoxy, cyano and nitro are substituted. The dashed line is the atomic bond.
側鏈a1宜為例如:下式(a1-1)表示者。 [化7] The side chain a1 is preferably represented by the following formula (a1-1), for example. [化7]
式(a1-1)中,L為直鏈狀或分支狀之碳數1~16之伸烷基。X為單鍵、-O-、-C(=O)-O-或-O-C(=O)-。In the formula (a1-1), L is a linear or branched alkylene group having 1 to 16 carbon atoms. X is a single bond, -O-, -C(=O)-O- or -O-C(=O)-.
(A)側鏈型聚合物宜為於250~400nm之波長範圍的光會進行反應,且於100~300℃之溫度範圍會展現液晶性者。(A)側鏈型聚合物宜具有對250~400nm之波長範圍的光會反應之感光性側鏈。(A) The side chain type polymer is preferably one that reacts with light in the wavelength range of 250 to 400 nm and exhibits liquid crystallinity in the temperature range of 100 to 300°C. (A) The side chain type polymer preferably has a photosensitive side chain that reacts to light in the wavelength range of 250 to 400 nm.
(A)側鏈型聚合物在主鏈鍵結有具有感光性之側鏈,可和光感應並引起交聯反應或異構化反應。可展現液晶性之感光性側鏈型聚合物的結構若為符合如此特性者,則無特別限制,但宜於側鏈結構具有剛硬的液晶元成分。將上述側鏈型聚合物製成單層相位差材時,可獲得安定的光學各向異性。(A) The side chain type polymer has a photosensitive side chain bonded to the main chain, which can be sensitive to light and cause a crosslinking reaction or an isomerization reaction. The structure of the photosensitive side chain type polymer that can exhibit liquid crystallinity is not particularly limited as long as it meets such characteristics, but it is preferable that the side chain structure has a rigid mesogen component. When the above-mentioned side chain type polymer is used as a single-layer retardation material, stable optical anisotropy can be obtained.
可展現液晶性之感光性側鏈型聚合物的結構之更具體的例子宜為具有主鏈與側鏈a的結構;該主鏈係由選自於由(甲基)丙烯酸酯、伊康酸酯、富馬酸酯、馬來酸酯、α-亞甲基-γ-丁內酯、苯乙烯、乙烯基、馬來醯亞胺、降莰烯等之自由基聚合性基及矽氧烷構成之群組中之至少1種所構成。A more specific example of the structure of the photosensitive side chain polymer that can exhibit liquid crystallinity is preferably a structure having a main chain and a side chain a; the main chain is selected from the group consisting of (meth)acrylate and itaconic acid. Free radical polymerizable groups such as esters, fumarates, maleates, α-methylene-γ-butyrolactone, styrene, vinyl, maleimine, norbornene, etc. and silicones Consists of at least one of the constituent groups.
又,(A)側鏈型聚合物為了於100~300℃之溫度範圍展現液晶性,宜更具有僅展現液晶性之側鏈(以下也稱側鏈c)。另外,在此「僅展現液晶性」係指僅具有側鏈c之聚合物在本發明之相位差材的製作製程(亦即後述步驟(I)~(III))中,不會展現光配向性而僅展現液晶性之含意。In addition, in order to exhibit liquid crystallinity in the temperature range of 100 to 300°C, the (A) side chain type polymer preferably further has a side chain that exhibits only liquid crystallinity (hereinafter also referred to as side chain c). In addition, here "only exhibiting liquid crystallinity" means that the polymer with only side chain c will not exhibit optical alignment in the production process of the retardation material of the present invention (that is, steps (I) to (III) described later) It only shows the meaning of liquid crystallinity.
側鏈c宜為選自於由下式(1)~(12)構成之群組中之任一種液晶性側鏈。 [化8] The side chain c is preferably any liquid crystal side chain selected from the group consisting of the following formulas (1) to (12). [化8]
[化9] [化9]
式(1)~(12)中,A1 、A2 分別獨立地為單鍵、-O-、-CH2 -、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-、-NH-C(=O)-、-CH=CH-C(=O)-O-或-O-C(=O)-CH=CH-。R11 為-NO2 、-CN、鹵素原子、苯基、萘基、聯苯基、呋喃基、1價含氮雜環基、碳數5~8之1價脂環族烴基、碳數1~12之烷基或碳數1~12之烷氧基。R12 為選自於由苯基、萘基、聯苯基、呋喃基、1價含氮雜環基、碳數5~8之1價脂環族烴基、及它們所組合而得的基構成之群組中之基,且鍵結於這些基的氫原子也可被取代為-NO2 、-CN、鹵素原子、碳數1~5之烷基或碳數1~5之烷氧基。R13 為氫原子、-NO2 、-CN、-CH=C(CN)2 、-CH=CH-CN、鹵素原子、苯基、萘基、聯苯基、呋喃基、1價含氮雜環基、碳數5~8之1價脂環族烴基、碳數1~12之烷基或碳數1~12之烷氧基。E為-C(=O)-O-或-O-C(=O)-。d為1~12之整數。k1~k5分別獨立地為0~2之整數,惟,k1~k5之合計為2以上。k6及k7分別獨立地為0~2之整數,惟,k6及k7之合計為1以上。m1、m2及m3分別獨立地為1~3之整數。n為0或1。Z1 及Z2 分別獨立地為單鍵、-C(=O)-、-CH2 O-、-CH=N-或-CF2 -。破折線為原子鍵。In formulas (1)~(12), A 1 and A 2 are independently a single bond, -O-, -CH 2 -, -C(=O)-O-, -OC(=O)-,- C(=O)-NH-, -NH-C(=O)-, -CH=CH-C(=O)-O- or -OC(=O)-CH=CH-. R 11 is -NO 2 , -CN, halogen atom, phenyl, naphthyl, biphenyl, furyl, monovalent nitrogen-containing heterocyclic group, monovalent alicyclic hydrocarbon group with 5 to 8 carbon atoms, carbon number 1 ~12 alkyl group or alkoxy group with carbon number 1-12. R 12 is selected from the group consisting of a phenyl group, a naphthyl group, a biphenyl group, a furyl group, a monovalent nitrogen-containing heterocyclic group, a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and a combination thereof The groups in the group, and the hydrogen atoms bonded to these groups can also be substituted with -NO 2 , -CN, halogen atoms, alkyl groups with 1 to 5 carbons, or alkoxy groups with 1 to 5 carbons. R 13 is a hydrogen atom, -NO 2 , -CN, -CH=C(CN) 2 , -CH=CH-CN, halogen atom, phenyl, naphthyl, biphenyl, furanyl, monovalent nitrogen-containing hetero Cyclic group, monovalent alicyclic hydrocarbon group with carbon number 5-8, alkyl group with carbon number 1-12 or alkoxy group with carbon number 1-12. E is -C(=O)-O- or -OC(=O)-. d is an integer of 1-12. k1~k5 are each independently an integer of 0~2, but the total of k1~k5 is 2 or more. k6 and k7 are each independently an integer of 0-2, but the total of k6 and k7 is 1 or more. m1, m2, and m3 are each independently an integer of 1 to 3. n is 0 or 1. Z 1 and Z 2 are each independently a single bond, -C(=O)-, -CH 2 O-, -CH=N- or -CF 2 -. The dashed line is the atomic bond.
它們之中,側鏈c宜為式(1)~(11)中之任一者表示者。Among them, the side chain c is preferably represented by any one of formulas (1) to (11).
(A)成分之側鏈型聚合物可藉由將具有式(a)表示之結構的單體、具有式(b)表示之結構的單體、及依期望之具有僅展現液晶性之結構的單體進行聚合而得。The side chain type polymer of the component (A) can be obtained by combining a monomer having a structure represented by formula (a), a monomer having a structure represented by formula (b), and a structure exhibiting only liquid crystallinity as desired The monomer is obtained by polymerization.
具有式(a)表示之結構的單體(以下也稱單體M1)可列舉下式(M1)表示之化合物。 [化10] 式中,R1 、R2 、R3 、R、a、m及n同上所述。The monomer having a structure represented by the formula (a) (hereinafter also referred to as monomer M1) may be a compound represented by the following formula (M1). [化10] In the formula, R 1 , R 2 , R 3 , R, a, m and n are the same as described above.
單體M1宜為下式(M1A)表示者。 [化11] 式中,R1 、R2 、R3A 、R及a同上所述。The monomer M1 is preferably represented by the following formula (M1A). [化11] In the formula, R 1 , R 2 , R 3A , R and a are the same as described above.
單體M1A之中,為下式(M1B)表示者更佳。 [化12] 式中,L及X同上所述。Among the monomers M1A, those represented by the following formula (M1B) are more preferable. [化12] In the formula, L and X are the same as described above.
式(M1)、(M1A)及(M1B)中,PL為下式(PL-1)~(PL-5)中之任一者表示之聚合性基。 [化13] In the formulas (M1), (M1A), and (M1B), PL is a polymerizable group represented by any of the following formulas (PL-1) to (PL-5). [化13]
式(PL-1)~(PL-5)中,Q1 、Q2 及Q3 為氫原子、直鏈狀或分支狀之碳數1~10之烷基、或經鹵素取代之直鏈狀或分支狀之碳數1~10之烷基。破折線為和R1 或和L之原子鍵。這些單體之中,某些為市售,某些可由公知物質利用公知之製造方法來製造。In formulas (PL-1)~(PL-5), Q 1 , Q 2 and Q 3 are hydrogen atoms, linear or branched alkyl with 1 to 10 carbons, or linear substituted by halogen Or branched alkyl with 1 to 10 carbons. The dashed line is the atomic bond with R 1 or with L. Among these monomers, some are commercially available, and some can be manufactured from known materials using known manufacturing methods.
單體M1之理想例可列舉下式(M1-1)~(M1-5)表示者。 [化14] 式中,PL同上所述。p為2~9之整數。Examples of ideal examples of monomer M1 include those represented by the following formulas (M1-1) to (M1-5). [化14] In the formula, PL is the same as described above. p is an integer of 2-9.
具有式(b)表示之結構的單體(以下也稱單體M2)可列舉下式(M2)表示之化合物。 [化15] 式中,PL、R1 ~R4 及a同上所述。The monomer having a structure represented by the formula (b) (hereinafter also referred to as monomer M2) may be a compound represented by the following formula (M2). [化15] In the formula, PL, R 1 to R 4 and a are the same as described above.
單體M2宜為下式(M2A)表示者。 [化16] 式中,R4 、PL、L及X同上所述。The monomer M2 is preferably represented by the following formula (M2A). [化16] In the formula, R 4 , PL, L and X are the same as described above.
這些單體之中,某些為市售,某些可由公知物質利用公知之製造方法來製造。Among these monomers, some are commercially available, and some can be manufactured from known materials using known manufacturing methods.
具有僅展現液晶性之結構的單體(以下也稱單體M3)係指來自該單體的聚合物會展現液晶性,且該聚合物可在側鏈部位形成液晶元基團之單體。A monomer having a structure that only exhibits liquid crystallinity (hereinafter also referred to as monomer M3) refers to a monomer in which a polymer derived from the monomer exhibits liquid crystallinity, and the polymer can form a mesogen group at a side chain portion.
側鏈具有的液晶元基團可為聯苯、苯甲酸苯酯等單獨即為液晶元結構的基團,也可為如苯甲酸等般側鏈彼此藉由氫鍵鍵結而成為液晶元結構的基團。側鏈具有的液晶元基團宜為下述結構。 [化17] The mesogen group in the side chain can be biphenyl, phenyl benzoate, etc. alone, which is a mesogen structure group, or it can be a mesogen structure such as benzoic acid and the like that the side chains are bonded to each other by hydrogen bonding.的组。 The group. The mesogen group possessed by the side chain preferably has the following structure. [化17]
單體M3之更具體的例宜為具有來自選自於由烴、(甲基)丙烯酸酯、伊康酸酯、富馬酸酯、馬來酸酯、α-亞甲基-γ-丁內酯、苯乙烯、乙烯基、馬來醯亞胺、降莰烯等之自由基聚合性基及矽氧烷構成之群組中之至少1種之聚合性基,以及由式(1)~(12)中之至少1種構成的結構之結構。單體M3為具有(甲基)丙烯酸酯作為聚合性基者特佳,且側鏈的末端宜為-COOH。A more specific example of the monomer M3 is preferably a monomer selected from the group consisting of hydrocarbons, (meth)acrylates, itaconic acid esters, fumaric acid esters, maleic acid esters, α-methylene-γ-butyric acid Free radical polymerizable groups such as ester, styrene, vinyl, maleimide, norbornene, etc. and at least one polymerizable group from the group consisting of silicones, and are composed of formulas (1)~( 12) The structure of at least one of the structures. The monomer M3 is particularly preferably one having (meth)acrylate as the polymerizable group, and the end of the side chain is preferably -COOH.
單體M3之理想例可列舉下式(M3-1)~(M3-9)表示者。 [化18] The ideal example of the monomer M3 can be represented by the following formulas (M3-1) to (M3-9). [化18]
[化19] 式中,PL及p同上所述。[化19] In the formula, PL and p are the same as described above.
又,可在不損及光反應性及/或液晶性之展現能力的範圍內將其它單體予以共聚合。其它單體可列舉例如工業上可取得之能自由基聚合反應之單體。其它單體之具體例可列舉:不飽和羧酸、丙烯酸酯化合物、甲基丙烯酸酯化合物、馬來醯亞胺化合物、丙烯腈、馬來酸酐、苯乙烯化合物、乙烯系化合物等。In addition, other monomers can be copolymerized within a range that does not impair the ability to exhibit photoreactivity and/or liquid crystallinity. Other monomers include, for example, commercially available monomers capable of radical polymerization. Specific examples of other monomers include unsaturated carboxylic acids, acrylate compounds, methacrylate compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, and vinyl compounds.
不飽和羧酸之具體例可列舉:丙烯酸、甲基丙烯酸、伊康酸、馬來酸、富馬酸等。Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid.
丙烯酸酯化合物可列舉例如:丙烯酸甲酯、丙烯酸乙酯、丙烯酸異丙酯、丙烯酸苄酯、丙烯酸萘酯、丙烯酸蒽酯、丙烯酸蒽甲酯、丙烯酸苯酯、丙烯酸-2,2,2-三氟乙酯、丙烯酸三級丁酯、丙烯酸環己酯、丙烯酸異莰酯、丙烯酸-2-甲氧基乙酯、丙烯酸甲氧基三乙二醇酯、丙烯酸-2-乙氧基乙酯、丙烯酸四氫糠酯、丙烯酸-3-甲氧基丁酯、丙烯酸-2-甲基-2-金剛烷酯、丙烯酸-2-丙基-2-金剛烷酯、丙烯酸-8-甲基-8-三環癸酯、丙烯酸-8-乙基-8-三環癸酯等。Examples of acrylate compounds include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthracene acrylate, methyl anthracene acrylate, phenyl acrylate, 2,2,2-triacrylate Fluoroethyl, tertiary butyl acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, Tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, 2-methyl-2-adamantyl acrylate, 2-propyl-2-adamantyl acrylate, 8-methyl-8-methyl acrylate -Tricyclodecyl, 8-ethyl-8-tricyclodecyl acrylate, etc.
甲基丙烯酸酯化合物可列舉例如:甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸異丙酯、甲基丙烯酸苄酯、甲基丙烯酸萘酯、甲基丙烯酸蒽酯、甲基丙烯酸蒽基甲酯、甲基丙烯酸苯酯、甲基丙烯酸-2,2,2-三氟乙酯、甲基丙烯酸三級丁酯、甲基丙烯酸環己酯、甲基丙烯酸異莰酯、甲基丙烯酸-2-甲氧基乙酯、甲基丙烯酸甲氧基三乙二醇酯、甲基丙烯酸-2-乙氧基乙酯、甲基丙烯酸四氫糠酯、甲基丙烯酸-3-甲氧基丁酯、甲基丙烯酸-2-甲基-2-金剛烷酯、甲基丙烯酸-2-丙基-2-金剛烷酯、甲基丙烯酸-8-甲基-8-三環癸酯、甲基丙烯酸-8-乙基-8-三環癸酯等。Examples of the methacrylate compound include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthracene methacrylate, and anthracene methacrylate. Methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tertiary butyl methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, methacrylic acid -2-methoxyethyl, methoxytriethylene glycol methacrylate, 2-ethoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxy methacrylate Butyl ester, 2-methyl-2-adamantyl methacrylate, 2-propyl-2-adamantyl methacrylate, 8-methyl-8-tricyclodecyl methacrylate, methyl methacrylate 8-ethyl-8-tricyclodecyl acrylate and the like.
乙烯系化合物可列舉例如:乙烯基醚、甲基乙烯基醚、苄基乙烯基醚、2-羥基乙基乙烯基醚、苯基乙烯基醚、丙基乙烯基醚等。苯乙烯化合物可列舉例如:苯乙烯、4-甲基苯乙烯、4-氯苯乙烯、4-溴苯乙烯等。馬來醯亞胺化合物可列舉例如:馬來醯亞胺、N-甲基馬來醯亞胺、N-苯基馬來醯亞胺、N-環己基馬來醯亞胺等。Examples of the vinyl compound include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether. Examples of the styrene compound include styrene, 4-methylstyrene, 4-chlorostyrene, 4-bromostyrene, and the like. Examples of the maleimide compound include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
本發明之側鏈型聚合物中的側鏈a的含量,考慮光反應性之觀點,宜為20~99.9莫耳%,為30~95莫耳%更佳,為40~90莫耳%再更佳。The content of the side chain a in the side chain type polymer of the present invention, considering the viewpoint of photoreactivity, is preferably 20 to 99.9 mol%, more preferably 30 to 95 mol%, and 40 to 90 mol%. Better.
本發明之側鏈型聚合物中的側鏈b的含量,考慮相位差值之觀點,宜為0.1~80莫耳%,為5~70莫耳%更佳,為10~60莫耳%再更佳。The content of the side chain b in the side chain type polymer of the present invention, considering the retardation value, is preferably 0.1 to 80 mol%, more preferably 5 to 70 mol%, and 10 to 60 mol%. Better.
本發明之側鏈型聚合物中的側鏈c的含量考慮光反應性之觀點,宜為80莫耳%以下,為10~70莫耳%更佳,為20~60莫耳%再更佳。The content of the side chain c in the side chain type polymer of the present invention is preferably 80 mol% or less from the viewpoint of photoreactivity, preferably 10 to 70 mol%, and even more preferably 20 to 60 mol% .
本發明之側鏈型聚合物如上所述也可含有其它側鏈。其它側鏈的含量在側鏈a~c的含量之合計未滿100莫耳%時,為其剩餘之部分。The side chain type polymer of the present invention may contain other side chains as described above. When the content of other side chains is less than 100 mol% of the total content of side chains a to c, it is the remainder.
(A)成分之側鏈型聚合物之製造方法並無特別限制,可利用工業上操作的通用方法。具體而言,可藉由利用了上述單體M1、單體M2、依期望之單體M3及依期望之其它單體中的乙烯基之自由基聚合、陽離子聚合或陰離子聚合來製造。它們之中,考慮反應控制容易度等之觀點,為自由基聚合特佳。(A) The production method of the side chain type polymer of the component is not particularly limited, and general industrially operated methods can be used. Specifically, it can be produced by radical polymerization, cationic polymerization, or anionic polymerization using the above-mentioned monomer M1, monomer M2, monomer M3 as desired, and vinyl groups in other monomers as desired. Among them, in view of the ease of reaction control, etc., radical polymerization is particularly preferred.
自由基聚合的聚合起始劑可使用:自由基聚合起始劑(自由基熱聚合起始劑、自由基光聚合起始劑)、或可逆性加成-裂解型鏈轉移(RAFT)聚合試藥等公知的化合物。The polymerization initiator for radical polymerization can be used: radical polymerization initiator (free radical thermal polymerization initiator, radical photopolymerization initiator), or reversible addition-fragmentation type chain transfer (RAFT) polymerization test Well-known compounds such as drugs.
自由基熱聚合起始劑係藉由加熱至分解溫度以上來使自由基產生之化合物。如此的自由基熱聚合起始劑可列舉例如:過氧化酮類(過氧化甲乙酮、過氧化環己酮等)、過氧化二醯類(過氧化乙醯、過氧化苯甲醯等)、過氧化氫類(過氧化氫、三級丁基過氧化氫、異丙苯過氧化氫等)、過氧化二烷基類(二(三級丁基)過氧化物、過氧化二異丙苯、過氧化二月桂醯等)、過氧化縮酮類(過氧化二丁基環己烷等)、過氧化烷基酯類(過氧化新癸酸三級丁酯、過氧化三甲基乙酸三級丁酯、過氧化2-乙基環己烷酸三級戊酯等)、過硫酸鹽類(過硫酸鉀、過硫酸鈉、過硫酸銨等)、偶氮系化合物(偶氮雙異丁腈、2,2’-二(2-羥基乙基)偶氮雙異丁腈等)等。自由基熱聚合起始劑可單獨使用1種,也可將2種以上組合使用。The radical thermal polymerization initiator is a compound that generates free radicals by heating above the decomposition temperature. Such radical thermal polymerization initiators include, for example, ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), dioxygen peroxides (acetyl peroxide, benzyl peroxide, etc.), peroxides Hydrogen oxides (hydrogen peroxide, tertiary butyl hydroperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (di(tertiary butyl) peroxide, dicumyl peroxide, etc.) Dilaurin peroxide, etc.), peroxide ketals (dibutyl cyclohexane peroxide, etc.), alkyl peroxides (tertiary butyl peroxide neodecanoate, tertiary trimethyl acetic acid peroxide) Butyl ester, 2-ethylcyclohexane acid tertiary pentyl peroxide, etc.), persulfates (potassium persulfate, sodium persulfate, ammonium persulfate, etc.), azo compounds (azobisisobutyronitrile, etc.) , 2,2'-bis(2-hydroxyethyl)azobisisobutyronitrile, etc.) and so on. A radical thermal polymerization initiator may be used individually by 1 type, and may be used in combination of 2 or more types.
自由基光聚合起始劑若為將自由基聚合藉由照光而開始之化合物,則無特別限制。如此的自由基光聚合起始劑可列舉:二苯甲酮、米其勒酮(Michler’s ketone)、4,4’-雙(二乙基胺基)二苯甲酮、𠮿酮、9-氧硫代𠮿、異丙基𠮿酮、2,4-二乙基-9-氧硫代𠮿、2-乙基蒽醌、苯乙酮、2-羥基-2-甲基苯丙酮、2-羥基-2-甲基-4’-異丙苯丙酮、1-羥基環己基苯基酮、異丙苯偶姻醚、異丁苯偶姻醚、2,2-二乙氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、樟腦醌、苯并蒽酮、2-甲基-1-[4-(甲基硫代)苯基]-2-𠰌啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-𠰌啉基苯基)-丁酮-1、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸異戊酯、4,4’-二(三級丁基過氧化羰基)二苯甲酮、3,4,4’-三(三級丁基過氧化羰基)二苯甲酮、2,4,6-三甲基苯甲醯基二苯基氧化膦、2-(4’-甲氧基苯乙烯)-4,6-雙(三氯甲基)均三𠯤、2-(3’,4’-二甲氧基苯乙烯)-4,6-雙(三氯甲基)均三𠯤、2-(2’,4’-二甲氧基苯乙烯)-4,6-雙(三氯甲基)均三𠯤、2-(2’-甲氧基苯乙烯)-4,6-雙(三氯甲基)均三𠯤、2-(4’-戊基氧基苯乙烯)-4,6-雙(三氯甲基)均三𠯤、4-[對N,N-二(乙氧基羰基甲基)]-2,6-二(三氯甲基)均三𠯤、1,3-雙(三氯甲基)-5-(2’-氯苯基)均三𠯤、1,3-雙(三氯甲基)-5-(4’-甲氧基苯基)均三𠯤、2-(對二甲基胺基苯乙烯)苯并雙㗁唑、2-(對二甲基胺基苯乙烯)苯并噻唑、2-巰基苯并噻唑、3,3’-羰基雙(7-二乙基胺基香豆素)、2-(鄰氯苯基)-4,4’,5,5’-四苯基-1,2’-聯咪唑、2,2’-雙(2-氯苯基)-4,4’,5,5’-肆(4-乙氧基羰基苯基)-1,2’-聯咪唑、2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基-1,2’-聯咪唑、2,2’雙(2,4-二溴苯基)-4,4’,5,5’-四苯基-1,2’-聯咪唑、2,2’-雙(2,4,6-三氯苯基)-4,4’,5,5’-四苯基-1,2’-聯咪唑、3-(2-甲基-2-二甲基胺基丙醯基)咔唑、3,6-雙(2-甲基-2-𠰌啉基丙醯基)-9-正十二烷基咔唑、雙(5-2,4-環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)-苯基)鈦、3,3’,4,4’-四(三級丁基過氧化羰基)二苯甲酮、3,3’,4,4’-四(三級己基過氧化羰基)二苯甲酮、3,3’-二(甲氧基羰基)-4,4’-二(三級丁基過氧化羰基)二苯甲酮、3,4’-二(甲氧基羰基)-4,3’-二(三級丁基過氧化羰基)二苯甲酮、4,4’-二(甲氧基羰基)-3,3’-二(三級丁基過氧化羰基)二苯甲酮、2-(3-甲基-3H-苯并噻唑-2-亞基)-1-萘-2-基-乙酮、2-(3-甲基-1,3-苯并噻唑-2(3H)-亞基)-1-(2-苯甲醯基)乙酮等。自由基光聚合起始劑可單獨使用1種,也可將2種以上混合使用。The radical photopolymerization initiator is not particularly limited as long as it is a compound that initiates radical polymerization by irradiation. Such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, ketone, 9-oxygen Thio𠮿 , Isopropyl ketone, 2,4-diethyl-9-oxothio , 2-Ethylanthraquinone, acetophenone, 2-hydroxy-2-methylpropiophenone, 2-hydroxy-2-methyl-4'-cuminone, 1-hydroxycyclohexylphenylketone, iso Propionyl benzoin ether, isobutyl benzoin ether, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, camphorquinone, benzoanthrone, 2-Methyl-1-[4-(methylthio)phenyl]-2-𠰌linylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-𠰌 Alkylphenyl)-butanone-1, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4,4'-bis(tertiary butylperoxycarbonyl) ) Benzophenone, 3,4,4'-tris(tertiary butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzyl diphenyl phosphine oxide, 2-( 4'-Methoxystyrene)-4,6-bis(trichloromethyl)s-trichloromethane, 2-(3',4'-dimethoxystyrene)-4,6-bis(trichloromethyl) Methyl)same tris, 2-(2',4'-dimethoxystyrene)-4,6-bis(trichloromethyl)sstris, 2-(2'-methoxystyrene )-4,6-bis(trichloromethyl)s-tris, 2-(4'-pentyloxystyrene)-4,6-bis(trichloromethyl)ss-tris, 4-(pair N,N-bis(ethoxycarbonylmethyl))-2,6-bis(trichloromethyl)-trichloromethyl, 1,3-bis(trichloromethyl)-5-(2'-chlorobenzene Serotonin), 1,3-bis(trichloromethyl)-5-(4'-methoxyphenyl) serotrimonium, 2-(p-dimethylaminostyrene) benzobis㗁Azole, 2-(p-dimethylaminostyrene)benzothiazole, 2-mercaptobenzothiazole, 3,3'-carbonylbis(7-diethylaminocoumarin), 2-(o-chloro Phenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'- Si (4-ethoxycarbonylphenyl)-1,2'-biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl -1,2'-biimidazole, 2,2'bis(2,4-dibromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2 '-Bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 3-(2-methyl-2-dimethyl Propylaminopropionyl)carbazole, 3,6-bis(2-methyl-2-pyrolinylpropionyl)-9-n-dodecylcarbazole, bis(5-2,4-ring Pentadien-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium, 3,3',4,4'-tetra(tertiary) Peroxycarbonyl)benzophenone, 3,3',4,4'-tetra(tertiary hexylperoxycarbonyl)benzophenone, 3,3'-bis(methoxycarbonyl)-4,4 '-Bis(tertiary butylperoxycarbonyl)benzophenone, 3,4'-bis(methoxycarbonyl)-4,3'-bis(tertiary butylperoxycarbonyl)benzophenone, 4,4'-Bis(methoxycarbonyl)-3,3'-bis(tertiary butylperoxycarbonyl)benzophenone, 2-(3-methyl-3H-benzothiazol-2-ylidene)-1 -Naphth-2-yl-ethanone, 2-(3-methyl-1,3-benzothiazole-2(3H)-ylidene)-1-(2-benzyl)ethanone, etc. A radical photopolymerization initiator may be used individually by 1 type, and may mix and use 2 or more types.
自由基聚合法並無特別限制,可使用乳化聚合法、懸浮聚合法、分散聚合法、沉澱聚合法、塊狀聚合法、溶液聚合法等。The radical polymerization method is not particularly limited, and an emulsion polymerization method, a suspension polymerization method, a dispersion polymerization method, a precipitation polymerization method, a bulk polymerization method, a solution polymerization method, etc. can be used.
聚合反應所使用的有機溶劑若為會溶解生成的聚合物者,則無特別限制。其具體例可列舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮、N-乙基-2-吡咯啶酮、N-甲基-ε-己內醯胺、二甲基亞碸、四甲基脲、吡啶、二甲基碸、六甲基亞碸、γ-丁內酯、異丙醇、甲氧基甲基戊醇、二戊烯、乙基戊基酮、甲基壬基酮、甲基乙基酮、甲基異戊基酮、甲基異丙基酮、甲基賽璐蘇、乙基賽璐蘇、乙酸甲基賽璐蘇、乙酸乙基賽璐蘇、二乙二醇單丁醚、乙基二乙二醇單乙醚、乙二醇、乙二醇單乙酸酯、乙二醇單異丙醚、乙二醇單丁醚、丙二醇、丙二醇單乙酸酯、丙二醇單甲醚、丙二醇三級丁醚、二丙二醇單甲醚、二乙二醇、二乙二醇單乙酸酯、二乙二醇二甲醚、二丙二醇單乙酸酯單甲醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單乙酸酯單乙醚、二丙二醇單丙醚、二丙二醇單乙酸酯單丙醚、乙酸-3-甲基-3-甲氧基丁酯、三丙二醇甲醚、3-甲基-3-甲氧基丁醇、二異丙醚、乙基異丁醚、二異丁烯、乙酸戊酯、丁酸丁酯、丁醚、二異丁基酮、甲基環己烯、丙醚、二己醚、1,4-二㗁烷、正己烷、正戊烷、正辛烷、二乙醚、環己酮、碳酸伸乙酯、碳酸伸丙酯、乳酸甲酯、乳酸乙酯、乙酸甲酯、乙酸乙酯、乙酸正丁酯、乙酸丙二醇單乙醚、丙酮酸甲酯、丙酮酸乙酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸、3-甲氧基丙酸、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、二乙二醇二甲醚、4-羥基-4-甲基-2-戊酮、3-甲氧基-N,N-二甲基丙烷醯胺、3-乙氧基-N,N-二甲基丙烷醯胺、3-丁氧基-N,N-二甲基丙烷醯胺等。The organic solvent used in the polymerization reaction is not particularly limited as long as it dissolves the produced polymer. Specific examples thereof include: N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-methyl-ε-caprolactone, dimethyl sulfide, tetramethyl urea, pyridine, dimethyl sulfide, hexamethyl sulfide, γ-butyrolactone, isopropanol, methoxymethyl Methylpentyl alcohol, dipentene, ethyl amyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl celluloid, ethyl celluloid Threon, methyl cellulose acetate, ethyl cellulose acetate, diethylene glycol monobutyl ether, ethyl diethylene glycol monoethyl ether, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoiso Propyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol tertiary butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethylene glycol monoacetate, two Ethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate mono Propyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, Amyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, dihexyl ether, 1,4-dioxane, n-hexane, n-pentane, n-octane, Diethyl ether, cyclohexanone, ethylene carbonate, propylene carbonate, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl ether, methyl pyruvate, pyruvic acid Ethyl ester, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionic acid, 3 -Propyl methoxypropionate, butyl 3-methoxypropionate, diethylene glycol dimethyl ether, 4-hydroxy-4-methyl-2-pentanone, 3-methoxy-N,N -Dimethylpropaneamide, 3-ethoxy-N,N-dimethylpropaneamide, 3-butoxy-N,N-dimethylpropaneamide, etc.
上述有機溶劑可單獨使用1種,也可將2種以上混合使用。此外,即使是無法使生成的聚合物溶解之溶劑,在不使生成的聚合物析出之範圍內,也可混合於上述有機溶劑中來使用。又,在自由基聚合時,有機溶劑中的氧會成為妨礙聚合反應的原因,故有機溶劑宜使用已在可能的程度下予以脫氣者。The above-mentioned organic solvent may be used singly or in combination of two or more kinds. In addition, even if it is a solvent that cannot dissolve the produced polymer, it can be mixed and used in the above-mentioned organic solvent within a range that does not precipitate the produced polymer. In addition, during radical polymerization, oxygen in the organic solvent may hinder the polymerization reaction. Therefore, it is preferable to use an organic solvent that has been degassed to the extent possible.
自由基聚合時的聚合溫度可選擇30~150℃中之任意溫度,宜為50~100℃之範圍。又,反應可在任意濃度實施,惟,濃度過低的話,獲得高分子量之聚合物會變得困難,濃度過高的話,反應液的黏性會變得過高,而均勻地攪拌會變得困難,故單體濃度宜為1~50質量%,為5~30質量%更佳。反應初始可在高濃度實施,並於其後追加有機溶劑。The polymerization temperature during radical polymerization can be selected from any temperature of 30~150℃, preferably in the range of 50~100℃. In addition, the reaction can be carried out at any concentration. However, if the concentration is too low, it will be difficult to obtain a high molecular weight polymer. If the concentration is too high, the viscosity of the reaction solution will become too high and uniform stirring will become It is difficult, so the monomer concentration is preferably 1-50% by mass, more preferably 5-30% by mass. The reaction can be carried out at a high concentration at the beginning, and an organic solvent can be added thereafter.
上述自由基聚合反應中,自由基聚合起始劑的比率相對於單體較多的話,得到的高分子之分子量會變小,較少的話,得到的高分子之分子量會變大,故自由基起始劑的比率相對於待聚合之單體,宜為0.1~10莫耳%。又,聚合時也可追加各種單體成分、或溶劑、起始劑等。In the above-mentioned radical polymerization reaction, if the ratio of the radical polymerization initiator to the monomer is large, the molecular weight of the obtained polymer will become smaller, and if it is smaller, the molecular weight of the obtained polymer will become larger. The ratio of the initiator relative to the monomer to be polymerized is preferably 0.1-10 mol%. In addition, various monomer components, solvents, initiators, etc. may be added during polymerization.
為了從上述反應得到的反應溶液將生成的聚合物回收,將反應溶液投入不良溶劑中,並使這些聚合物沉澱即可。沉澱所使用的不良溶劑可列舉:甲醇、丙酮、己烷、庚烷、丁基賽璐蘇、甲基乙基酮、甲基異丁基酮、乙醇、甲苯、苯、二乙醚、甲基乙醚、水等。投入到不良溶劑中使其沉澱之聚合物可經過濾而回收後,於常壓或減壓下,以常溫或進行加熱使其乾燥。又,使回收的聚合物再溶解於有機溶劑中,並重複2~10次再沉澱回收之操作的話,可將聚合物中的雜質減少。此時的不良溶劑可列舉例如:醇類、酮類、烴等,使用選自於它們之中的3種以上之不良溶劑的話,會更進一步提高純化的效率,故較理想。In order to recover the polymer produced from the reaction solution obtained by the above reaction, the reaction solution may be poured into a poor solvent, and these polymers may be precipitated. Examples of poor solvents used for precipitation include: methanol, acetone, hexane, heptane, butyl cellophane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether , Water, etc. The polymer deposited in the poor solvent can be recovered by filtration, and dried under normal pressure or reduced pressure at normal temperature or by heating. In addition, by re-dissolving the recovered polymer in an organic solvent and repeating the operation of reprecipitation and recovery 2 to 10 times, the impurities in the polymer can be reduced. Examples of the poor solvent at this time include alcohols, ketones, hydrocarbons, and the like. If three or more poor solvents selected from these are used, the purification efficiency is further improved, so it is preferable.
本發明之(A)側鏈型聚合物考慮得到的塗膜之強度、塗膜形成時之作業性及塗膜之均勻性的話,以GPC(Gel Permeation Chromatography)法測得的重量平均分子量宜為2,000~2,000,000,為2,000~1,000,000更佳,為5,000~200,000再更佳。The (A) side chain polymer of the present invention considers the strength of the coating film obtained, the workability during coating film formation and the uniformity of the coating film, the weight average molecular weight measured by the GPC (Gel Permeation Chromatography) method is preferably 2,000~2,000,000, more preferably 2,000~1,000,000, and even more preferably 5,000~200,000.
[(B)有機溶劑] (B)成分之有機溶劑若為會使聚合物成分溶解之有機溶劑,則無特別限制。其具體例可列舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮、N-甲基-ε-己內醯胺、2-吡咯啶酮、N-乙基-2-吡咯啶酮、N-乙烯基-2-吡咯啶酮、二甲基亞碸、四甲基脲、吡啶、二甲基碸、六甲基亞碸、γ-丁內酯、3-甲氧基-N,N-二甲基丙烷醯胺、3-乙氧基-N,N-二甲基丙烷醯胺、3-丁氧基-N,N-二甲基丙烷醯胺、1,3-二甲基-2-咪唑啶酮、乙基戊基酮、甲基壬基酮、甲基乙基酮、甲基異戊基酮、甲基異丙基酮、環己酮、碳酸伸乙酯、碳酸伸丙酯、二乙二醇二甲醚、4-羥基-4-甲基-2-戊酮、丙二醇單乙酸酯、丙二醇單甲醚、丙二醇三級丁醚、二丙二醇單甲醚、二乙二醇、二乙二醇單乙酸酯、二乙二醇二甲醚、二丙二醇單乙酸酯單甲醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單乙酸酯單乙醚、二丙二醇單丙醚、二丙二醇單乙酸酯單丙醚、乙酸-3-甲基-3-甲氧基丁酯、三丙二醇甲醚等。它們可單獨使用1種,也可將2種以上混合使用。[(B) Organic solvent] (B) If the organic solvent of the component is an organic solvent that dissolves the polymer component, there is no particular limitation. Specific examples thereof include: N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-methyl-ε-caprolactone , 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, dimethyl sulfide, tetramethylurea, pyridine, dimethyl sulfide, hexamethyl Sulfene, γ-butyrolactone, 3-methoxy-N,N-dimethylpropaneamide, 3-ethoxy-N,N-dimethylpropaneamide, 3-butoxy-N , N-dimethyl propane amide, 1,3-dimethyl-2-imidazolidinone, ethyl amyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl Methyl isopropyl ketone, cyclohexanone, ethylene carbonate, propylene carbonate, diethylene glycol dimethyl ether, 4-hydroxy-4-methyl-2-pentanone, propylene glycol monoacetate, propylene glycol mono Methyl ether, propylene glycol tertiary butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol mono Methyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol Methyl ether and so on. These can be used individually by 1 type, and can also mix and use 2 or more types.
[其它成分] 本發明之聚合物組成物也可含有(A)及(B)成分以外的成分。其例可列舉使在塗佈聚合物組成物時之膜厚均勻性、表面平滑性改善之溶劑、或化合物、使相位差材和基板之密接性改善的化合物等,但不限於此。[Other ingredients] The polymer composition of the present invention may contain components other than the (A) and (B) components. Examples thereof include solvents or compounds that improve film thickness uniformity and surface smoothness at the time of coating the polymer composition, and compounds that improve the adhesion between the retardation material and the substrate, but are not limited to these.
使膜厚之均勻性、表面平滑性改善之溶劑(不良溶劑)的具體例可列舉:異丙醇、甲氧基甲基戊醇、甲基賽璐蘇、乙基賽璐蘇、丁基賽璐蘇、乙酸甲基賽璐蘇、乙酸乙基賽璐蘇、二乙二醇單丁醚、乙基二乙二醇單乙醚、乙基二乙二醇單乙醚乙酸酯、乙二醇、乙二醇單乙酸酯、乙二醇單異丙醚、乙二醇單丁醚、丙二醇、丙二醇單乙酸酯、丙二醇單甲醚、丙二醇三級丁醚、二丙二醇單甲醚、二乙二醇、二乙二醇單乙酸酯、二乙二醇二甲醚、二丙二醇單乙酸酯單甲醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單乙酸酯單乙醚、二丙二醇單丙醚、二丙二醇單乙酸酯單丙醚、乙酸-3-甲基-3-甲氧基丁酯、三丙二醇甲醚、3-甲基-3-甲氧基丁醇、二異丙醚、乙基異丁醚、二異丁烯、乙酸戊酯、丁酸丁酯、丁醚、二異丁基酮、甲基環己烯、丙醚、二己醚、1-己醇、正己烷、正戊烷、正辛烷、二乙醚、乳酸甲酯、乳酸乙酯、乳酸正丙酯、乳酸正丁酯、乳酸異戊酯、乙酸甲酯、乙酸乙酯、乙酸正丁酯、乙酸丙二醇單乙醚、丙酮酸甲酯、丙酮酸乙酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸、3-甲氧基丙酸、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇、1-丁氧基-2-丙醇、1-苯氧基-2-丙醇、丙二醇單乙酸酯、丙二醇二乙酸酯、丙二醇-1-單甲醚-2-乙酸酯、丙二醇-1-單乙醚-2-乙酸酯、二丙二醇、2-(2-乙氧基丙氧基)丙醇等具有低表面張力之溶劑等。Specific examples of solvents (poor solvents) that improve the uniformity of film thickness and surface smoothness include: isopropanol, methoxymethylpentanol, methyl cellulose, ethyl cellulose, and butyl cellophane Luce, methyl celluate acetate, ethyl celluite acetate, diethylene glycol monobutyl ether, ethyl diethylene glycol monoethyl ether, ethyl diethylene glycol monoethyl ether acetate, ethylene glycol, Ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol tertiary butyl ether, dipropylene glycol monomethyl ether, diethyl Glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, Dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, two Isopropyl ether, ethyl isobutyl ether, diisobutylene, amyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, dihexyl ether, 1-hexanol, n-hexyl Alkane, n-pentane, n-octane, diethyl ether, methyl lactate, ethyl lactate, n-propyl lactate, n-butyl lactate, isoamyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, acetic acid Propylene glycol monoethyl ether, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionate Acid, 3-methoxypropionic acid, 3-methoxypropionic acid propyl ester, 3-methoxypropionic acid butyl ester, 1-methoxy-2-propanol, 1-ethoxy-2-propanol Alcohol, 1-butoxy-2-propanol, 1-phenoxy-2-propanol, propylene glycol monoacetate, propylene glycol diacetate, propylene glycol-1-monomethyl ether-2-acetate, Solvents with low surface tension such as propylene glycol-1-monoethyl ether-2-acetate, dipropylene glycol, 2-(2-ethoxypropoxy)propanol, etc.
這些不良溶劑可單獨使用1種,也可將2種以上混合使用。使用上述不良溶劑時,為了不使聚合物組成物所含的溶劑整體之溶解性顯著降低,其含量在溶劑中宜為5~80質量%,為20~60質量%更佳。These poor solvents may be used individually by 1 type, and may mix and use 2 or more types. When the above-mentioned poor solvent is used, in order not to significantly reduce the solubility of the entire solvent contained in the polymer composition, its content in the solvent is preferably 5 to 80% by mass, and more preferably 20 to 60% by mass.
使膜厚均勻性、表面平滑性改善之化合物可列舉:氟系界面活性劑、聚矽氧系界面活性劑、非離子系界面活性劑等。它們的具體例可列舉:F-top(註冊商標)301、EF303、EF352(Tochem Product公司製)、MEGAFACE(註冊商標)F171、F173、R-30(DIC公司製)、FLUORAD FC430、FC431(3M公司製)、AsahiGuard(註冊商標)AG710(AGC公司製)、SURFLON(註冊商標)S-382、SC101、SC102、SC103、SC104、SC105、SC106(AGC SEIMI CHEMICAL公司製)等。這些界面活性劑的含量相對於(A)成分100質量份,宜為0.01~2質量份,為0.01~1質量份更佳。Examples of compounds that improve film thickness uniformity and surface smoothness include fluorine-based surfactants, silicone-based surfactants, and non-ionic surfactants. Specific examples of these include: F-top (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products), MEGAFACE (registered trademark) F171, F173, R-30 (manufactured by DIC), FLUORAD FC430, FC431 (3M Company system), AsahiGuard (registered trademark) AG710 (AGC company system), SURFLON (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105, SC106 (AGC SEIMI CHEMICAL company system), etc. The content of these surfactants is preferably 0.01 to 2 parts by mass relative to 100 parts by mass of the component (A), and more preferably 0.01 to 1 part by mass.
使相位差材與基板之密接性改善的化合物之具體例可列舉含官能性矽烷之化合物等,其具體例可列舉:3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、2-胺基丙基三甲氧基矽烷、2-胺基丙基三乙氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、3-脲基丙基三甲氧基矽烷、3-脲基丙基三乙氧基矽烷、N-乙氧基羰基-3-胺基丙基三甲氧基矽烷、N-乙氧基羰基-3-胺基丙基三乙氧基矽烷、N-三乙氧基矽丙基三伸乙三胺、N-三甲氧基矽丙基三伸乙三胺、10-三甲氧基矽基-1,4,7-三氮雜癸烷、10-三乙氧基矽基-1,4,7-三氮雜癸烷、乙酸-9-三甲氧基矽基-3,6-二氮雜壬酯、乙酸-9-三乙氧基矽基-3,6-二氮雜壬酯、N-苄基-3-胺基丙基三甲氧基矽烷、N-苄基-3-胺基丙基三乙氧基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、N-苯基-3-胺基丙基三乙氧基矽烷、N-雙(氧伸乙基)-3-胺基丙基三甲氧基矽烷、N-雙(氧伸乙基)-3-胺基丙基三乙氧基矽烷等。Specific examples of compounds that improve the adhesion between the retardation material and the substrate include functional silane-containing compounds. Specific examples include 3-aminopropyltrimethoxysilane, 3-aminopropyltriethyl Oxysilane, 2-aminopropyltrimethoxysilane, 2-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, N -(2-Aminoethyl)-3-aminopropylmethyldimethoxysilane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, N-ethyl Oxycarbonyl-3-aminopropyltrimethoxysilane, N-ethoxycarbonyl-3-aminopropyltriethoxysilane, N-triethoxysilylpropyl triethylenetriamine, N -Trimethoxysilyl propyl triethylenetriamine, 10-trimethoxysilyl-1,4,7-triazadecane, 10-triethoxysilyl-1,4,7-triazide Heterodecane, Acetate-9-trimethoxysilyl-3,6-diazepanonate, Acetate-9-triethoxysilyl-3,6-diazepanonyl, N-benzyl- 3-aminopropyltrimethoxysilane, N-benzyl-3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, N-phenyl-3 -Aminopropyltriethoxysilane, N-bis(oxyethylene)-3-aminopropyltrimethoxysilane, N-bis(oxyethylene)-3-aminopropyltriethyl Oxysilane and so on.
此外,除了基板和相位差材之密接性的改善之外,為了防止構成偏光板時之背光源所導致之特性的降低等,也可將酚塑(phenoplast)系化合物、含環氧基之化合物添加於聚合物組成物中。In addition, in addition to the improvement of the adhesion between the substrate and the retardation material, in order to prevent the degradation of the characteristics caused by the backlight when the polarizing plate is formed, phenoplast-based compounds and epoxy-containing compounds can also be used. Add to polymer composition.
酚塑系添加劑之具體例如下所示,但不限於此。 [化20] Specific examples of phenol plastic additives are shown below, but are not limited thereto. [化20]
含環氧基之化合物的具體例可列舉:乙二醇二環氧丙醚、聚乙二醇二環氧丙醚、丙二醇二環氧丙醚、三丙二醇二環氧丙醚、聚丙二醇二環氧丙醚、新戊二醇二環氧丙醚、1,6-己烷二醇二環氧丙醚、甘油二環氧丙醚、2,2-二溴新戊二醇二環氧丙醚、1,3,5,6-四環氧丙基-2,4-己烷二醇、N,N,N’,N’-四環氧丙基-間二甲苯二胺、1,3-雙(N,N-二環氧丙基胺基甲基)環己烷、N,N,N’,N’-四環氧丙基-4,4’-二胺基二苯基甲烷等。Specific examples of epoxy group-containing compounds include: ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, and polypropylene glycol diglycidyl ether. Propylene oxide, neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerol diglycidyl ether, 2,2-dibromoneopentyl glycol diglycidyl ether , 1,3,5,6-tetraepoxypropyl-2,4-hexanediol, N,N,N',N'-tetraepoxypropyl-m-xylene diamine, 1,3- Bis(N,N-diglycidylaminomethyl)cyclohexane, N,N,N',N'-tetraepoxypropyl-4,4'-diaminodiphenylmethane, etc.
使用改善和基板之密接性的化合物時,其含量相對於聚合物組成物所含的聚合物成分100質量份,宜為0.1~30質量份,為1~20質量份更佳。含量未達0.1質量份的話,無法期待密接性改善的效果,多於30質量份的話,有時會有液晶之配向性變差的情況。When using a compound that improves the adhesion to the substrate, its content is preferably 0.1-30 parts by mass, and more preferably 1-20 parts by mass relative to 100 parts by mass of the polymer components contained in the polymer composition. If the content is less than 0.1 parts by mass, the effect of improving the adhesion cannot be expected, and if it is more than 30 parts by mass, the alignment of the liquid crystal may deteriorate.
可使用光敏劑作為添加劑。光敏劑宜為無色增感劑及三重態增感劑。A photosensitizer can be used as an additive. The photosensitizer is preferably a colorless sensitizer and a triplet sensitizer.
光敏劑可列舉:芳香族硝基化合物、香豆素(7-二乙基胺基-4-甲基香豆素、7-羥基-4-甲基香豆素)、香豆素酮(keto coumarin)、羰基雙香豆素、芳香族2-羥基酮、芳香族2-羥基酮(2-羥基二苯甲酮、單-或二-對(二甲基胺基)-2-羥基二苯甲酮等)、苯乙酮、蒽醌、𠮿酮、9-氧硫代𠮿、苯并蒽酮、噻唑啉(2-苯甲醯基亞甲基-3-甲基-β-萘并噻唑啉、2-(β-萘甲醯基亞甲基)-3-甲基苯并噻唑啉、2-(α-萘甲醯基亞甲基)-3-甲基苯并噻唑啉、2-(4-聯苯甲醯基亞甲基)-3-甲基苯并噻唑啉、2-(β-萘甲醯基亞甲基)-3-甲基-β-萘并噻唑啉、2-(4-聯苯甲醯基亞甲基)-3-甲基-β-萘并噻唑啉、2-(對氟苯甲醯基亞甲基)-3-甲基-β-萘并噻唑啉等)、㗁唑啉(2-苯甲醯基亞甲基-3-甲基-β-萘并㗁唑啉、2-(β-萘甲醯基亞甲基)-3-甲基苯并㗁唑啉、2-(α-萘甲醯基亞甲基)-3-甲基苯并㗁唑啉、2-(4-聯苯甲醯基亞甲基)-3-甲基苯并㗁唑啉、2-(β-萘甲醯基亞甲基)-3-甲基-β-萘并㗁唑啉、2-(4-聯苯甲醯基亞甲基)-3-甲基-β-萘并㗁唑啉、2-(對氟苯甲醯基亞甲基)-3-甲基-β-萘并㗁唑啉等)、苯并噻唑、硝基苯胺(間或對硝基苯胺、2,4,6-三硝基苯胺等)、硝基乙烷合萘(5-硝基乙烷合萘等)、2-[(間羥基對甲氧基)苯乙烯]苯并噻唑、苯偶姻烷基醚、N-烷基化酞酮(N-alkylated phthalone)、苯乙酮縮酮(2,2-二甲氧基苯基乙酮等)、萘(2-萘甲醇、2-萘甲酸等)、蒽(9-蒽甲醇、9-蒽甲酸等)、苯並吡喃、偶氮吲、部香豆素(mero-coumarin)等。它們之中,宜為芳香族2-羥基酮(二苯甲酮)、香豆素、香豆素酮、羰基雙香豆素、苯乙酮、蒽醌、𠮿酮、9-氧硫代𠮿及苯乙酮縮酮。The photosensitizers include: aromatic nitro compounds, coumarin (7-diethylamino-4-methylcoumarin, 7-hydroxy-4-methylcoumarin), coumarin ketone (keto coumarin), carbonyl dicoumarin, aromatic 2-hydroxy ketone, aromatic 2-hydroxy ketone (2-hydroxybenzophenone, mono- or di-p-(dimethylamino)-2-hydroxy diphenyl Ketone, etc.), acetophenone, anthraquinone, ketone, 9-oxothio , Benzoanthrone, thiazoline (2-benzylmethylene-3-methyl-β-naphthazoline, 2-(β-naphthylmethylene)-3-methylbenzene And thiazoline, 2-(α-naphthylmethylene)-3-methylbenzothiazoline, 2-(4-bibenzylmethylene)-3-methylbenzothiazoline , 2-(β-naphthyl methylene)-3-methyl-β-naphthazoline, 2-(4-bibenzyl methylene)-3-methyl-β-naphthalene Thiazoline, 2-(p-fluorobenzylmethylene)-3-methyl-β-naphthazoline, etc.), azazoline (2-benzylmethylene-3-methyl -β-Naphthoxazoline, 2-(β-naphthoxymethylene)-3-methylbenzoxazoline, 2-(α-naphthoxymethylene)-3-methan Benzoxazoline, 2-(4-Bibenzamethylene)-3-methylbenzoxazoline, 2-(β-Naphthoxymethylene)-3-methyl -β-Naphthoxazoline, 2-(4-Bibenzylmethylene)-3-methyl-β-naphthazoline, 2-(p-fluorobenzylmethylene) -3-methyl-β-naphthazoline, etc.), benzothiazole, nitroaniline (meta or p-nitroaniline, 2,4,6-trinitroaniline, etc.), nitroethane and naphthalene (5-nitroethane and naphthalene, etc.), 2-[(m-hydroxyp-methoxy)styrene]benzothiazole, benzoin alkyl ether, N-alkylated phthalone (N-alkylated phthalone) , Acetophenone ketal (2,2-dimethoxyphenyl ethyl ketone, etc.), naphthalene (2-naphthyl alcohol, 2-naphthoic acid, etc.), anthracene (9-anthracene methanol, 9-anthracene acid, etc.), Benzopyran, azoindole , Mero-coumarin and so on. Among them, preferred are aromatic 2-hydroxy ketones (benzophenone), coumarin, coumarin ketone, carbonyl dicoumarin, acetophenone, anthraquinone, ketone, 9-oxothio𠮿 And acetophenone ketal.
本發明之聚合物組成物中除了添加上述成分之外,若在不損及本發明之效果的範圍內,為了使相位差材的介電常數、導電性等電特性變化,也可添加介電體、導電物質,此外,為了提高製成相位差材時之膜的硬度、緻密度,也可添加交聯性化合物。In addition to the above-mentioned components, the polymer composition of the present invention may also be added with a dielectric material in order to change the electrical properties such as the dielectric constant and conductivity of the retardation material within a range that does not impair the effects of the present invention. In addition, in order to increase the hardness and density of the film when the phase difference material is made, a cross-linking compound may be added.
[聚合物組成物之製備] 本發明之聚合物組成物為了適於單層相位差材之形成,宜製備成為塗佈液。亦即,本發明所使用的聚合物組成物宜製備成為(A)成分及上述使膜厚均勻性、表面平滑性改善之溶劑、化合物、使液晶配向膜和基板之密接性改善之化合物等溶解於(B)成分之有機溶劑而成之溶液。在此,(A)成分的含量宜為本發明之組成物中之1~20質量%,為3~15質量%更佳,為3~10質量%特佳。[Preparation of polymer composition] In order that the polymer composition of the present invention is suitable for the formation of a single-layer retardation material, it is preferably prepared as a coating liquid. That is, the polymer composition used in the present invention is preferably prepared to dissolve the component (A) and the above-mentioned solvents and compounds that improve film thickness uniformity and surface smoothness, and compounds that improve the adhesion between the liquid crystal alignment film and the substrate. It is a solution made from the organic solvent of component (B). Here, the content of the component (A) is preferably 1-20% by mass in the composition of the present invention, more preferably 3-15% by mass, particularly preferably 3-10% by mass.
本發明之聚合物組成物除了含有(A)成分之聚合物以外,在不損及液晶展現能力及感光性能之範圍內,也可含有其它聚合物。此時,聚合物成分中之其它聚合物的含量宜為0.5~80質量%,為1~50質量%更佳。其它聚合物可列舉例如:聚(甲基)丙烯酸酯、聚醯胺酸、聚醯亞胺等並非可展現液晶性之感光性側鏈型聚合物之聚合物等。In addition to the polymer of component (A), the polymer composition of the present invention may also contain other polymers within a range that does not impair the liquid crystal display ability and photosensitive performance. At this time, the content of other polymers in the polymer component is preferably 0.5 to 80% by mass, and more preferably 1 to 50% by mass. Other polymers include, for example, poly(meth)acrylate, polyamide acid, polyimide, and other polymers that are not photosensitive side chain type polymers that can exhibit liquid crystallinity.
[單層相位差材] 本發明之單層相位差材可利用包含下述步驟(I)~(III)之方法來製造。 (I)將本發明之組成物塗佈於基板上來形成塗膜之步驟, (II)對上述塗膜照射經偏光之紫外線之步驟,及 (III)將上述已照射紫外線之塗膜進行加熱來獲得相位差材之步驟。[Single layer retardation material] The single-layer retardation material of the present invention can be manufactured by a method including the following steps (I) to (III). (I) The step of coating the composition of the present invention on a substrate to form a coating film, (II) The step of irradiating the above-mentioned coating film with polarized ultraviolet rays, and (III) The step of heating the coating film irradiated with ultraviolet rays to obtain a retardation material.
[步驟(I)] 步驟(I)係將本發明之組成物塗佈於基板上來形成塗膜之步驟。更具體而言,將本發明之組成物利用棒塗、旋塗、流塗、輥塗、縫塗、縫塗接續旋塗、噴墨法、印刷法等方法塗佈於基板(例如被覆有矽/二氧化矽之基板、氮化矽基板、被覆有金屬(例如鋁、鉬、鉻等)之基板、玻璃基板、石英基板、ITO基板等)或薄膜(例如三乙醯纖維素(TAC)薄膜、環烯烴聚合物薄膜、聚對苯二甲酸乙二酯薄膜、丙烯酸系薄膜等樹脂薄膜)等之上。塗佈後,可利用加熱板、熱循環式烘箱、IR(紅外線)式烘箱等加熱方法,於50~200℃,宜於50~150℃使溶劑蒸發來獲得塗膜。[Step (I)] Step (I) is a step of applying the composition of the present invention on a substrate to form a coating film. More specifically, the composition of the present invention is coated on a substrate (for example, coated with silicon) by bar coating, spin coating, flow coating, roll coating, slit coating, slit coating followed by spin coating, inkjet method, printing method, etc. /Silicon dioxide substrates, silicon nitride substrates, substrates coated with metals (such as aluminum, molybdenum, chromium, etc.), glass substrates, quartz substrates, ITO substrates, etc.) or thin films (such as triacetyl cellulose (TAC) thin films) , Cycloolefin polymer film, polyethylene terephthalate film, acrylic film and other resin films). After coating, you can use heating methods such as hot plate, thermal cycle oven, IR (infrared) oven, etc., to evaporate the solvent at 50~200℃, preferably at 50~150℃, to obtain the coating film.
[步驟(II)] 在步驟(II)係對步驟(I)得到的塗膜照射經偏光之紫外線。對塗膜之膜面照射經偏光之紫外線時,係對基板從一定方向照射藉由偏光板而偏光之紫外線。上述紫外線可使用波長100~400nm之範圍的紫外線。宜取決於使用的塗膜之種類,藉由濾波器等選擇最適的波長。而且,例如俾使可選擇性地誘發光交聯反應,可選擇使用波長290~400nm之範圍的紫外線。紫外線可使用例如從高壓水銀燈發射的光。[Step (II)] In step (II), the coating film obtained in step (I) is irradiated with polarized ultraviolet rays. When irradiating the film surface of the coating film with polarized ultraviolet rays, the substrate is irradiated with the ultraviolet rays polarized by the polarizing plate from a certain direction. As the above-mentioned ultraviolet rays, ultraviolet rays having a wavelength of 100 to 400 nm can be used. Depending on the type of coating film used, the most suitable wavelength should be selected through filters, etc. Moreover, for example, in order to selectively induce a photo-crosslinking reaction, ultraviolet rays with a wavelength of 290 to 400 nm can be selected and used. The ultraviolet rays can use, for example, light emitted from a high-pressure mercury lamp.
經偏光之紫外線的照射量取決於使用的塗膜。照射量宜設定在實現該塗膜中之經偏光之紫外線之和偏光方向平行的方向之紫外線吸光度與和偏光方向垂直的方向之紫外線吸光度的差即ΔA的最大值之偏光紫外線的量之1~70%的範圍內,設定在1~50%的範圍內更佳。The amount of polarized ultraviolet radiation depends on the coating film used. The amount of exposure should be set to achieve the difference between the ultraviolet absorbance of the polarized ultraviolet light and the direction parallel to the polarization direction in the coating film and the ultraviolet absorbance of the direction perpendicular to the polarization direction, that is, the maximum value of ΔA, which is 1 to the amount of polarized ultraviolet light. In the range of 70%, it is better to set it in the range of 1~50%.
[步驟(III)] 在步驟(III)係將於步驟(II)已照射經偏光之紫外線之塗膜進行加熱。可利用加熱對塗膜賦予配向控制能力。[Step (III)] In step (III), the coating film that has been irradiated with polarized ultraviolet rays in step (II) is heated. Heating can be used to impart alignment control ability to the coating film.
加熱可使用加熱板、熱循環式烘箱、IR(紅外線)式烘箱等加熱手段。加熱溫度可考慮使所用的塗膜之液晶性展現之溫度而決定。Heating can use heating means such as heating plate, thermal circulation oven, IR (infrared) oven and so on. The heating temperature can be determined in consideration of the temperature at which the liquid crystallinity of the coating film used is exhibited.
加熱溫度宜落在本發明之組成物所含的(A)成分之聚合物會展現液晶性之溫度(以下稱液晶展現溫度)的溫度範圍內。在如塗膜之類的薄膜表面之情況下,塗膜表面的液晶展現溫度預期會比將(A)成分之聚合物以大體積觀察時的液晶展現溫度低。因此,加熱溫度落在塗膜表面之液晶展現溫度的溫度範圍內更佳。亦即,偏光紫外線照射後之加熱溫度的溫度範圍,宜為以比起(A)成分之聚合物的液晶展現溫度之溫度範圍的下限低10℃之溫度為下限,且比起該液晶溫度範圍的上限低10℃之溫度為上限的範圍溫度。加熱溫度比起上述溫度範圍低的話,會有塗膜中的熱所致之各向異性的增幅效果變得不足之傾向,又,加熱溫度比起上述溫度範圍過於高的話,會有塗膜的狀態變得近似於等向性的液體狀態(各向同性相)之傾向,此時,有時會有利用自我組織化再配向成單一方向變得困難的情況。The heating temperature preferably falls within the temperature range at which the polymer of the component (A) contained in the composition of the present invention exhibits liquid crystallinity (hereinafter referred to as the liquid crystal development temperature). In the case of a film surface such as a coating film, the liquid crystal development temperature of the coating film surface is expected to be lower than the liquid crystal development temperature when the polymer of the component (A) is observed in a large volume. Therefore, it is better that the heating temperature falls within the temperature range of the liquid crystal display temperature on the surface of the coating film. That is, the temperature range of the heating temperature after the polarized ultraviolet ray is irradiated is preferably a temperature that is 10°C lower than the lower limit of the temperature range of the liquid crystal display temperature of the polymer of the component (A) as the lower limit, and is higher than the liquid crystal temperature range The temperature 10°C lower than the upper limit is the upper limit range temperature. If the heating temperature is lower than the above temperature range, the anisotropy enhancement effect caused by the heat in the coating film tends to become insufficient. Also, if the heating temperature is too high compared to the above temperature range, the coating film may be damaged. The state tends to be similar to an isotropic liquid state (isotropic phase). At this time, it may become difficult to realign it into a single direction by self-organization.
另外,液晶展現溫度係指引起聚合物或塗膜表面從固體相相轉移至液晶相的液晶轉移溫度以上,且引起液晶相相轉移至各向同性相(isotropic phase)的各向同性相轉移溫度(Tiso)以下之溫度。例如,在130℃以下展現液晶性係指引起固體相相轉移至液晶相的液晶轉移溫度為130℃以下之含意。In addition, the liquid crystal development temperature refers to the isotropic phase transition temperature that causes the polymer or coating film surface to transition from the solid phase to the liquid crystal phase and above the liquid crystal transition temperature, and causes the liquid crystal phase to transition to the isotropic phase. (Tiso) The temperature below. For example, exhibiting liquid crystallinity below 130°C means that the liquid crystal transition temperature that causes the solid phase to transition to the liquid crystal phase is 130°C or less.
加熱後所形成之塗膜的厚度可考慮所使用之基板的高低差、光學性質、電氣性質而適當地選擇,例如0.5~3μm為理想。The thickness of the coating film formed after heating can be appropriately selected in consideration of the height difference, optical properties, and electrical properties of the substrate used, for example, 0.5 to 3 μm is ideal.
以此方式得到的本發明之單層相位差材係具有適於顯示裝置、記錄材料等用途之光學特性的材料,尤其適合製成液晶顯示器用之偏光板及相位差板等光學補償薄膜。 [實施例]The single-layer retardation material of the present invention obtained in this way is a material having optical characteristics suitable for use in display devices, recording materials, etc., and is particularly suitable for making optical compensation films such as polarizers and retardation plates for liquid crystal displays. [Example]
以下,舉合成例、實施例及比較例更具體地說明本發明,但本發明不限於下述實施例。Hereinafter, the present invention will be explained more specifically with synthesis examples, examples, and comparative examples, but the present invention is not limited to the following examples.
作為實施例所使用之具有光反應性基的單體之M1如下所示,作為具有液晶性基的單體之M2如下所示。M1係依循國際公開第2011/084546號所記載之合成法來合成。M2係依循日本特開平9-118717號公報所記載之合成法來合成。M3使用市售品(M6BC,Midori Kagaku公司製)。M4係以4-苯基環己酮作為原料並利用公知的方法來合成。另外,來自M1之側鏈會展現光反應性及液晶性,來自M2~M4之側鏈僅展現液晶性。 [化21] The M1 of the monomer having a photoreactive group used as an example is shown below, and the M2 of the monomer having a liquid crystal group is shown below. M1 is synthesized according to the synthesis method described in International Publication No. 2011/084546. M2 is synthesized according to the synthesis method described in Japanese Patent Application Laid-Open No. 9-118717. A commercially available product (M6BC, manufactured by Midori Kagaku Co., Ltd.) was used for M3. The M4 system uses 4-phenylcyclohexanone as a raw material and is synthesized by a known method. In addition, the side chain from M1 exhibits photoreactivity and liquid crystallinity, and the side chain from M2 to M4 exhibits only liquid crystallinity. [化21]
其它,本實施例使用的試藥之縮寫如下所示。 (有機溶劑) THF:四氫呋喃 NMP:N-甲基-2-吡咯啶酮 BCS:丁基賽璐蘇 BCA:乙酸丁基賽璐蘇 PGME:丙二醇單甲醚In addition, the abbreviations of reagents used in this example are as follows. (Organic solvents) THF: Tetrahydrofuran NMP: N-methyl-2-pyrrolidone BCS: Butyl Cellulose BCA: Butyl Cellulose Acetate PGME: Propylene Glycol Monomethyl Ether
(聚合起始劑) AIBN:2,2’-偶氮雙異丁腈(Polymerization initiator) AIBN: 2,2’-Azobisisobutyronitrile
[1]甲基丙烯酸酯聚合物粉末之合成 [合成例1] 使M1(6.6g,0.02mol)、M2(18.4g,0.06mol)及M3(7.7g,0.02mol)溶解於THF(132.7g)中,以隔膜泵(diaphragm pump)實施脫氣後,添加AIBN(0.49g),再實施脫氣。之後,於60℃使其反應8小時,獲得甲基丙烯酸酯聚合物溶液。將該聚合物溶液滴加到甲醇(1,000mL)中,並將得到的沉澱物進行過濾。以甲醇清洗該沉澱物並進行減壓乾燥,藉此獲得甲基丙烯酸酯聚合物粉末P1。[1] Synthesis of methacrylate polymer powder [Synthesis Example 1] Dissolve M1 (6.6g, 0.02mol), M2 (18.4g, 0.06mol) and M3 (7.7g, 0.02mol) in THF (132.7g). After degassing with a diaphragm pump, add AIBN (0.49g), and then degas. Then, it was made to react at 60 degreeC for 8 hours, and the methacrylate polymer solution was obtained. This polymer solution was dropped into methanol (1,000 mL), and the obtained precipitate was filtered. The precipitate was washed with methanol and dried under reduced pressure, thereby obtaining methacrylate polymer powder P1.
[合成例2] 使M1(6.6g,0.02mol)、M2(19.9g,0.065mol)及M3(5.7g,0.015mol)溶解於THF(131.2g)中,以隔膜泵實施脫氣後,添加AIBN(0.49g),再實施脫氣。之後,於60℃使其反應8小時,獲得甲基丙烯酸酯聚合物溶液。將該聚合物溶液滴加到甲醇(1,000mL)中,並將得到的沉澱物進行過濾。以甲醇清洗該沉澱物並進行減壓乾燥,藉此獲得甲基丙烯酸酯聚合物粉末P2。[Synthesis Example 2] Dissolve M1 (6.6g, 0.02mol), M2 (19.9g, 0.065mol) and M3 (5.7g, 0.015mol) in THF (131.2g). After degassing with a diaphragm pump, add AIBN (0.49g) , And then implement degassing. Then, it was made to react at 60 degreeC for 8 hours, and the methacrylate polymer solution was obtained. This polymer solution was dropped into methanol (1,000 mL), and the obtained precipitate was filtered. The precipitate was washed with methanol and dried under reduced pressure, thereby obtaining methacrylate polymer powder P2.
[合成例3] 使M1(6.6g,0.02mol)、M2(12.3g,0.04mol)及M4(15.5g,0.04mol)溶解於THF(139.7g)中,以隔膜泵實施脫氣後,添加AIBN(0.49g),再實施脫氣。之後,於60℃使其反應8小時,獲得甲基丙烯酸酯聚合物溶液。將該聚合物溶液滴加到甲醇(1,000mL)中,並將得到的沉澱物進行過濾。以甲醇清洗該沉澱物並進行減壓乾燥,藉此獲得甲基丙烯酸酯聚合物粉末P3。[Synthesis Example 3] Dissolve M1 (6.6g, 0.02mol), M2 (12.3g, 0.04mol) and M4 (15.5g, 0.04mol) in THF (139.7g). After degassing with a diaphragm pump, add AIBN (0.49g) , And then implement degassing. Then, it was made to react at 60 degreeC for 8 hours, and the methacrylate polymer solution was obtained. This polymer solution was dropped into methanol (1,000 mL), and the obtained precipitate was filtered. The precipitate was washed with methanol and dried under reduced pressure, thereby obtaining methacrylate polymer powder P3.
[合成例4] 使M1(6.6g,0.02mol)及M2(24.5g,0.08mol)溶解於THF(131.2g)中,以隔膜泵實施脫氣後,添加AIBN(0.49g),再實施脫氣。之後,於60℃使其反應8小時,獲得甲基丙烯酸酯聚合物溶液。將該聚合物溶液滴加到甲醇(1,000mL)中,並將得到的沉澱物進行過濾。以甲醇清洗該沉澱物並進行減壓乾燥,藉此獲得甲基丙烯酸酯聚合物粉末P4。[Synthesis Example 4] M1 (6.6 g, 0.02 mol) and M2 (24.5 g, 0.08 mol) were dissolved in THF (131.2 g), and after degassing with a diaphragm pump, AIBN (0.49 g) was added, and then degassing was performed. Then, it was made to react at 60 degreeC for 8 hours, and the methacrylate polymer solution was obtained. This polymer solution was dropped into methanol (1,000 mL), and the obtained precipitate was filtered. The precipitate was washed with methanol and dried under reduced pressure, thereby obtaining methacrylate polymer powder P4.
[2]聚合物溶液之製備 [實施例1-1] 於NMP(3.25g)中添加甲基丙烯酸酯聚合物粉末P1(1.5g),並在室溫攪拌1小時使其溶解。於該溶液中添加PGME(1.5g)、BCS(3.0g)及BCA(0.75g)並進行攪拌,藉此獲得聚合物溶液T1。該聚合物溶液T1直接作為用以形成相位差膜的相位差材。[2] Preparation of polymer solution [Example 1-1] The methacrylate polymer powder P1 (1.5 g) was added to NMP (3.25 g), and the mixture was stirred at room temperature for 1 hour to dissolve it. PGME (1.5 g), BCS (3.0 g), and BCA (0.75 g) were added to this solution and stirred, thereby obtaining a polymer solution T1. This polymer solution T1 is directly used as a retardation material for forming a retardation film.
[實施例1-2] 於NMP(3.25g)中添加甲基丙烯酸酯聚合物粉末P2(1.5g),並在室溫攪拌1小時使其溶解。於該溶液中添加PGME(1.5g)、BCS(3.0g)及BCA(0.75g)並進行攪拌,藉此獲得聚合物溶液T2。該聚合物溶液T2直接作為用以形成相位差膜的相位差材。[Example 1-2] The methacrylate polymer powder P2 (1.5 g) was added to NMP (3.25 g), and the mixture was stirred at room temperature for 1 hour to dissolve it. PGME (1.5 g), BCS (3.0 g), and BCA (0.75 g) were added to this solution and stirred to obtain polymer solution T2. This polymer solution T2 is directly used as a retardation material for forming a retardation film.
[實施例1-3] 於NMP(3.25g)中添加甲基丙烯酸酯聚合物粉末P3(1.5g),並在室溫攪拌1小時使其溶解。於該溶液中添加PGME(1.5g)、BCS(3.0g)及BCA(0.75g)並進行攪拌,藉此獲得聚合物溶液T3。該聚合物溶液T3直接作為用以形成相位差膜的相位差材。[Example 1-3] The methacrylate polymer powder P3 (1.5 g) was added to NMP (3.25 g), and the mixture was stirred at room temperature for 1 hour to dissolve it. PGME (1.5 g), BCS (3.0 g), and BCA (0.75 g) were added to this solution and stirred to obtain polymer solution T3. This polymer solution T3 is directly used as a retardation material for forming a retardation film.
[比較例1] 於NMP(3.25g)中添加甲基丙烯酸酯聚合物粉末P4(1.5g),並在室溫攪拌1小時使其溶解。於該溶液中添加PGME(1.5g)、BCS(3.0g)及BCA(0.75g)並進行攪拌,藉此獲得聚合物溶液CT1。該聚合物溶液CT1直接作為用以形成相位差膜的相位差材。[Comparative Example 1] Methacrylate polymer powder P4 (1.5 g) was added to NMP (3.25 g), and the mixture was stirred at room temperature for 1 hour to dissolve it. PGME (1.5 g), BCS (3.0 g), and BCA (0.75 g) were added to this solution and stirred, thereby obtaining a polymer solution CT1. This polymer solution CT1 is directly used as a retardation material for forming a retardation film.
[3]聚合物溶液之評價 [實施例2-1~2-3、比較例2-1~2-3] (1)評價基板之製作 將聚合物溶液T1以0.45μm之過濾器進行過濾後,旋塗於設有透明電極之玻璃基板上,在70℃之加熱板上乾燥90秒,形成膜厚1.0μm之相位差膜。然後,對塗膜面介隔偏光板照射313nm之紫外線10mJ/cm2 後,以180℃之加熱板加熱20分鐘,製得設有相位差膜之基板S1。 同樣地使用聚合物溶液T2、T3及CT1,分別以表1所示之煅燒溫度製得預定膜厚之設有相位差膜之基板S2、S3及CS1~CS3。[3] Evaluation of polymer solution [Examples 2-1 to 2-3, Comparative Examples 2-1 to 2-3] (1) Preparation of evaluation substrate After filtering the polymer solution T1 with a 0.45 μm filter , Spin-coated on a glass substrate with transparent electrodes, dried on a hot plate at 70°C for 90 seconds to form a retardation film with a thickness of 1.0μm. Then, after irradiating a 313nm ultraviolet 10mJ/cm 2 on the coating film surface via a polarizing plate, it was heated on a hot plate at 180° C. for 20 minutes to obtain a substrate S1 provided with a retardation film. Similarly, polymer solutions T2, T3, and CT1 were used to prepare substrates S2, S3, and CS1 to CS3 with retardation film with predetermined film thickness at the calcination temperature shown in Table 1, respectively.
(2)相位差評價 使用Axometrics公司製之AxoScan,評價基板S1~S3及CS1~CS3在550nm之相位差值。結果如表1所示。(2) Phase difference evaluation The AxoScan manufactured by Axometrics was used to evaluate the phase difference of the substrates S1~S3 and CS1~CS3 at 550nm. The results are shown in Table 1.
(3)霧度評價 使用Suga Test Instruments公司製之HAZE Meter HZ-V3,評價基板S1~S3及CS1~CS3在550nm之相位差值。結果如表1所示。(3) Haze evaluation The HAZE Meter HZ-V3 manufactured by Suga Test Instruments was used to evaluate the phase difference of the substrates S1~S3 and CS1~CS3 at 550nm. The results are shown in Table 1.
[表1]
如表1所示,由實施例與比較例之對比可得到如下結果:實施例之聚合物溶液即使為薄膜仍會展現高相位差值。又,由比較例2-3之探討觀察到高溫煅燒所導致相位差值大幅地降低,故可謂薄膜的高相位差值並非起因於煅燒溫度。As shown in Table 1, the following results can be obtained from the comparison between the examples and the comparative examples: the polymer solutions of the examples still exhibit high retardation values even if they are thin films. In addition, from the investigation of Comparative Example 2-3, it was observed that the retardation value was greatly reduced due to high-temperature firing. Therefore, it can be said that the high retardation value of the thin film is not caused by the firing temperature.
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