TW202101701A - 用於增強型異構整合的巢狀架構 - Google Patents
用於增強型異構整合的巢狀架構 Download PDFInfo
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- TW202101701A TW202101701A TW109102762A TW109102762A TW202101701A TW 202101701 A TW202101701 A TW 202101701A TW 109102762 A TW109102762 A TW 109102762A TW 109102762 A TW109102762 A TW 109102762A TW 202101701 A TW202101701 A TW 202101701A
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Abstract
本文揭露的實施例包含電子封裝和形成這種電子封裝的方法。在實施例中,所述電子封裝包含基底基板。所述基底基板可以具有複數個貫穿基板通孔。在實施例中,第一晶粒係在所述基底基板上。在實施例中,第一腔室係設置在所述基底基板中。在實施例中,所述第一腔室至少部分在所述第一晶粒的覆蓋區內。在實施例中,第一元件在所述第一腔室中。
Description
本發明的實施例關於電子封裝,並且更具體地,關於具有附接到基底基板的一或多個晶粒和嵌入所述基底基板的腔室中的一或多個元件的多晶片封裝架構。
對提高效能和降低外形尺寸的需求將封裝架構推向多晶片整合架構發展。多晶片整合允許將不同製程節點上製造的晶粒實現在單一電子封裝中。然而,當前的多晶片架構會致使不適用於一些使用狀況或終端使用者不希望的較大外形尺寸。
及
本文描述的是根據各種實施例的具有附接到基底基板的一或多個晶粒以及嵌入所述基底基板的腔室中的一或多個元件的多晶片封裝架構,以及形成這種電子封裝的方法。在以下描述中,各種態樣的說明性實現將使用本領域技術人員通常採用的用語來描述,以將其工作的實質傳達給本領域其它技術人員。然而,對於本領域技術人員顯而易見的是,本發明可以僅透過所描述的態樣中的一些來實踐。為了便於說明,闡述了具體數字、材料和配置以提供對說明性實現的透徹了解。然而,對於本領域的技術人員將顯而易見的是,可以在沒有具體細節的情況下實踐本發明。在其它情況下,省略或簡化了眾所周知的特徵,以免混淆說明性實現。
各種操作將被描述為多個離散操作,依次以最有助於理解本發明的方式,然而,描述的順序不應解釋為暗示這些操作必然取決於順序。特別是,這些操作不需要按呈現的順序被執行。
如上所述,電子封裝架構的趨勢是朝向使用多晶片架構。然而,外形尺寸不是處於目前所需程度。因此,本文揭露的實施例包含具有改進的外形尺寸的多晶片封裝架構。具體地,本文揭露的實施例允許在基底基板上的同質或異質整合。此外,基底基板可以包含一或多個腔室,以允許額外的元件配置於晶粒下方(至少部分位於其覆蓋區內)。因此,透過減少XY平面中的總覆蓋區以及減少Z高度可以改善外形尺寸。將額外的元件配置於一或多個晶粒的覆蓋區內還減少了晶粒和額外的元件之間的訊號路徑長度。因此,訊號完整性得以最佳化。
現在參考圖1A,根據實施例顯示了電子封裝100的截面圖。在實施例中,電子封裝100可以包含基底基板105。在一些實施例中,基底基板105可以是矽基板。基底基板105可以包含靠近基底基板的表面106的訊號跡線、墊等(未顯示)。表面106在本文中可被稱為一或多個重新分佈層、後端(BEOL)堆疊等。在實施例中,基底基板105是被動基板。也就是說,只有被動元件(例如,墊、跡線、通孔等)被製造在基底基板105上。在其它實施例中,基底基板105是主動基板。也就是說,主動電路(例如,電晶體等)可以被製造在基底基板上。
在實施例中,複數個貫穿基板通孔(TSV) 107(當基底基板是矽基板時,也稱為貫穿矽通孔)可以穿透基底基板105的厚度。TSV 107可以提供基底基板105的表面之間的電連接。例如,封裝側凸塊(PSB)114可以電耦接至基底基板105的表面106中的特徵。
在實施例中,晶粒130可以附接至基底基板105。例如,第一級互連(FLI)116可以將晶粒130電耦接至基底基板105的表面106。在實施例中,晶粒130可具有主動表面131(也就是說,靠近主動電路被製造的表面)。主動表面131可以定向為面向基底基板105的表面106。在實施例中,晶粒130嵌入在模具層112中。在一些實施例中,可以暴露出晶粒130與主動表面131相反的背面。在其它實施例中,晶粒130的背面被模具層112覆蓋。
在實施例中,腔室115形成在基底基板105中。腔室115可穿過基底基板105的厚度並終止於基底基板105的表面106。在實施例中,腔室115可以至少部分是在晶粒130的覆蓋區中。如本文所用,「在…覆蓋區中」是指定位在給定特徵的外圍內。例如,腔室115是在圖1A中的晶粒130的外圍內。
在實施例中,元件120可以定位在腔室115中。元件120可以是多種不同元件類型中的任何一種,如晶粒或晶粒堆疊(例如,處理器晶粒、記憶體晶粒、電源晶粒、通訊晶粒等)、被動元件(例如電橋、電容器、電感器等)、冷卻模組(例如熱電冷卻(TEC)模組)等。在元件120是晶粒或晶粒堆疊的實施例中,元件120可以在第一製程節點處製造,晶粒130可以在第二製程節點處製造。在一些實施例中,第一製程節點可以不同於第二製程節點。
在實施例中,元件120可以具有主動表面121。主動表面121可以透過一或多個TSV 127電耦接至背面。在實施例中,主動表面121可以定向成與晶粒130面對面配置。也就是說,元件120的主動表面121可以面對晶粒130的主動表面131。在實施例中,元件120可以利用FLI 118耦接至基底基板105的表面106。
在實施例中,元件120可以被嵌入在模具層126中。模具層126可以實質填充腔室115中未被元件120、FLI 118和圍繞FLI 118的任何底部填充材料(未顯示)占據的其餘部分。在實施例中,所述元件120的背面可以被暴露出(也就是說,未被模具層126覆蓋)。在其它實施例中,模具層126可以覆蓋元件120的背面。
現在參考圖1B,根據實施例顯示了具有第一晶粒130和第二晶粒140的電子封裝100的截面圖。在實施例中,除了添加第二晶粒並移動腔室115的位置之外,圖1B中的電子封裝100可以是實質類似於圖1A中的電子封裝100。
如圖1B所示,第二晶粒140可以定位在基底基板105的表面106上。也就是說,第二晶粒140可以在橫向鄰近於第一晶粒130。在實施例中,第二晶粒140具有面對基底基板105的表面106的主動表面141。在實施例中,第一晶粒130與第二晶粒140不同。例如,第一晶粒130可以在第一製程節點處被製造,而第二晶粒140可以在第二(不同的)製程節點處被製造。在其它實施例中,第一晶粒130可以與第二晶粒140實質相似。例如,第一晶粒130和第二晶粒140可以是透過電橋(或任何其它互連)電耦接在一起以用作單片晶粒的處理器晶粒。
在實施例中,腔室115可以至少部分定位在第一晶粒130的覆蓋區內並且至少部分在第二晶粒的覆蓋區內。也就是說,腔室115可以跨越將第一晶粒130與第二晶粒140分開的間隙。當元件120被耦接至第一晶粒130和第二晶粒140兩者時,這樣的實施例可以是特別有益的。例如,元件120可以是將第一晶粒130電耦接至第二晶粒140的電橋(例如,嵌入式多晶粒互連電橋(EMIB))。替代實施例可以包含作為可由第一晶粒130和第二晶粒140兩者存取的記憶體裝置(或任何其它元件)的元件120。
現在參考圖1C,顯示根據額外實施例的具有第一晶粒130和第二晶粒140的電子封裝100的截面圖。除了腔室115的位置之外,圖1C中的電子封裝100實質相似於圖1B中的電子封裝100。如圖所示,腔室115完全在第一晶粒130的覆蓋區內。當元件120僅由多個晶粒中的單一晶粒(例如,第一晶粒130)存取時,這種實施例可以是特別有益的。
在實施例中,圖1C中的電子封裝100也可以與圖1B中的電子封裝100不同,其中跡線152被製造在基底基板105的表面106,以提供第一晶粒130和第二晶粒140之間的連接。在基底基板105是矽基板的實施例中,可以將具有細線間距(FLS)的跡線直接圖案化到基底基板105上,並且可以不需要專用的橋接晶粒來將第一晶粒130耦接至第二晶粒140。
現在參考圖1D,根據實施例顯示了具有第一元件120和第二元件160的電子封裝100的截面圖。除了第二腔室115B
和第二元件160被定位在基底基板105中,圖1D中的電子封裝100可以是實質類似於圖1B中的電子封裝100。在實施例中,第一腔室115A
和第一元件120可以是至少部分在第一晶粒130的覆蓋區內並且至少部分在第二晶粒140的覆蓋區內,而第二腔室115B
和第二元件160可以是完全在第一晶粒130的覆蓋區內。
在實施例中,第二元件160可以是多種不同元件類型中的任何一種,如晶粒或晶粒堆疊(例如,處理器晶粒、記憶體晶粒、電源晶粒、通訊晶粒等)、被動元件(例如電橋、電容器、電感器等)、冷卻模組(例如TEC模組)等。在第二元件160是晶粒或晶粒堆疊的實施例中,第二元件160可以在第一製程節點處被製造,而晶粒130可以在第二製程節點處被製造。在一些實施例中,第一製程節點可以不同於第二製程節點。在實施例中,第一元件120和第二元件160可以是相同的元件。在其它實施例中,第一元件120和第二元件160可以是不同的元件。
在實施例中,第二元件160可以包含主動表面161。主動表面161可以被定位成與第一晶粒130面對面配置。第二元件160可以利用FLI 118電耦接至基底基板105的表面106。在實施例中,TSV 167可以穿透第二元件160以提供從第二元件160的背面到第二元件160的主動表面161的電連接。在實施例中,第二元件160可以被嵌入在模具層166中。如圖1D所示,模具層166並未覆蓋第二元件160的背面。其它實施例可以包含覆蓋第二元件160的背面的模具層166。
現在參考圖1E,根據實施例顯示了具有第一元件120和第二元件160的電子封裝100的截面圖。除了第二元件160被定向在不同的方向上,圖1E中的電子封裝100實質類似於圖1D中的電子封裝100。如圖所示,第二元件160被定向成使主動表面161背向第一晶粒130的主動表面131(也就是說,面對背配置)。因此,第一元件120和第二元件160沿相反方向定向。然而,應當理解,在一些實施例中,第一元件120和第二元件160兩者皆可以與第一晶粒130和第二晶粒140面對背配置。
現在參考圖1F,根據實施例顯示了具有第一元件120和第二元件160的電子封裝100的截面圖。除了第一元件120不包含TSV之外,圖1F中的電子封裝100可以實質類似於圖1D中的電子封裝100。在實施例中,虛設PSB 114’可以被定位在第一元件120的背面上,以提供結構堅固性。「虛設PSB」114’是指未被電耦接至電子封裝100的其它電路的PSB。雖然第二元件160被顯示為具有TSV 167,但應當理解,在一些實施例中,第二元件160也可以省略TSV 167。
現在參考圖1G,根據實施例顯示了具有第一元件120和第二元件160的電子封裝100的截面圖。除了沒有在第一元件120下方的虛設PSB 114’之外,圖1G中的電子封裝100實質類似於圖1F中的電子封裝100。此外,模具層126完全嵌入第一元件120(也就是說,第一元件120的背面被模具層126覆蓋)。
現在參考圖1H,根據額外實施例顯示了電子封裝100的截面圖。在實施例中,除了在腔室115中包含複數個元件120A-C
之外,電子封裝100可以實質類似於電子封裝1C。例如,複數個元件120A-C
可以包含晶粒的堆疊(例如,記憶體晶粒堆疊)。
現在參考圖1I,根據實施例顯示了電子封裝100的平面圖。在實施例中,電子封裝100可以包含放置在基底基板105上的第一晶粒130和第二晶粒140。第一晶粒130可以透過複數個元件120(例如,電橋)電耦接至第二晶粒140。在實施例中,複數個元件120可以設置在單一腔室115中。在其它實施例中,每個元件120可以設置在各自的腔室115中。如圖1I所示,額外的元件120和腔室115可以完全形成在第一晶粒130和/或第二晶粒140中之一者下方。
現在參考圖1J,根據額外實施例顯示了電子封裝100的平面圖。在實施例中,第一晶粒130、第二晶粒140A
和第三晶粒140B
可被放置在基底基板105上。在實施例中,嵌入基底基板105中的腔室115中的元件120可以將第一晶粒130電耦接至第二晶粒140A
,和/或將第一晶粒130電耦接至第三晶粒140B
。
現在參考圖1K,顯示了根據額外實施例的電子封裝100的平面圖。除了在第一晶粒下方的腔室115容納一對元件120和一對腔室115位於第二晶粒140的下方之外,圖1K中的電子封裝100可以實質相似於圖1I中的電子封裝100。腔室115中的每一個可以包含一或多個元件120。
儘管圖1A-1G顯示具有一個、兩個或三個晶粒和嵌入基底基板中的腔室中的一或多個元件的電子封裝100,但應當理解,實施例不限於這種配置。例如,電子封裝可以包含複數個晶粒(例如,兩個或多個晶粒)和/或複數個元件(例如,兩個或多個元件)。此外,基底基板中的每個腔室可以容納一或多個元件。
現在參考圖2A-2J,一系列截面圖描述了根據實施例的用於製造電子封裝的程序。在圖2A至圖2J中,為簡單起見,僅顯示單一腔室、元件和晶粒。然而,應當理解,額外的腔室和元件和/或晶粒也可以使用那些描述的類似處理操作將其包含在電子封裝中。
現在參考圖2A,根據實施例顯示了基底基板205的截面圖。在實施例中,基底基板205可以是矽基板。基底基板205可以具有厚度T1
。例如,厚度T1
可以是標準晶圓厚度(例如800μm)。
在實施例中,基底基板205的表面206可以包含導電特徵(例如,跡線、墊等)。在一些實施例中,基底基板205是被動基板。其它實施例包含主動基底基板205。例如,基底基板205可以包含電晶體等。在實施例中,複數個TSV 207可以位於基底基板205中。如圖2A所示,複數個TSV 207可以不完全延伸穿過基底基板205。可以從需要腔室的區域中省略TSV 207。例如,在圖2A所示的基底基板205的中心區域中沒有TSV 207。
現在參考圖2B,根據實施例顯示了在薄化基底基板之後的基底基板205的截面圖。例如,基底基板205可以被薄化,以具有大約為100µm或更小的厚度T2
。基底基板205可用研磨或拋光程序被薄化。如圖所示,薄化的基底基板205仍可具有完全嵌入的TSV 207。也就是說,此時TSV 207並未完全穿過基底基板205。
現在參考圖2C,根據實施例顯示了在附接了載體280之後的基底基板205的截面圖。在實施例中,載體280可以透過接合膜282被固定到基底基板205的表面206上。
現在參考圖2D,根據實施例顯示了在形成腔室215之後的基底基板205的截面圖。在實施例中,腔室215可以透過移除了基底基板205的一部分的蝕刻程序形成。所述蝕刻程序可以是濕式蝕刻或乾式蝕刻,其在基底基板205上利用光阻(未顯示),以限定腔室215的邊界。腔室215可延伸穿過基底基板205並終止於表面206。在實施例中,複數個墊229可以被腔室215暴露出。在形成腔室215之前,墊229可以被製造為表面206的一部分。
現在參考圖2E,根據實施例顯示了在將元件220安裝在腔室215中之後的基底基板205的截面圖。所述元件220可以被附接至透過FLI 218由腔室215暴露出的墊229。在實施例中,附接可以是熱壓接合(TCB)附接程序。在一些實施例中,助焊劑(例如,環氧助焊劑)可以在附接程序中使用。FLI 218可以包含在墊之間回流的焊料。在其它實施例中,FLI 218可以包含銅對銅附接。在元件220附接至墊229之後,底部填充材料225可以在FLI 218周圍分配。
在實施例中,元件220可以包含多種不同的元件類型中的任何一種,如晶粒或晶粒堆疊(例如,處理器晶粒、記憶體晶粒、電源晶片、通訊晶粒等)、被動元件(例如電橋、電容器、電感器等)、冷卻模組(例如TEC模組)等。在實施例中,元件220可以包含主動表面221。主動表面221可以是定向為面向表面206。然而,在其它實施例中,主動表面221可以背對表面206(例如,類似於圖1E所示的元件160)。在一些實施例中,元件220的背面可以透過一或多個TSV 227電耦接至主動表面221。在其它實施例中,可以省略TSV 227(例如,類似於圖1F所示的元件120)。
元件220可以完全位於腔室215中。也就是說,腔室215的深度可以大於元件220和FLI 218的組合厚度。因此,元件220的背面可以凹入基底基板205的背面下方。
現在參考圖2F,根據實施例顯示了在腔室215中填充有模具層226之後的基底基板205的截面圖。模具層226可實質填充剩餘的腔室215。在實施例中,模具層226可以是環氧樹脂或類似物。在一些實施例中,模具層226也可以圍繞FLI 218,而在這種情況下,可以省略底部填充材料225。模具層226也可以嵌入元件220。例如,模具層226可以覆蓋元件220的側壁和背面。
現在參考圖2G,根據實施例顯示了已經被平面化以暴露出TSV 207和TSV 227之後的基底基板205的截面圖。在實施例中,基底基板205可以透過研磨程序(例如,化學機械研磨(CMP)等)被平面化。研磨程序還可以使模具層226凹陷以暴露出元件220的背面和TSV 227(如果存在)。
現在參考圖2H,根據實施例顯示了在將PSB 214佈置在TSV 207和227上方之後的基底基板205的截面圖。在實施例中,PSB 214可以包含墊或凸塊(例如,銅凸塊)和/或焊球。在實施例中,TSV 207上方的PSB 214可實質類似於元件220的TSV 227上方的PSB 214。
現在參考圖2I,根據實施例顯示了在載體280被移除之後的截面圖。在實施例中,可以透過機械地分離載體280來移除載體280。在實施例中,在基底基板205上的接合膜282的任何殘留部分可以使用適當的清潔程序來進行清潔。
現在參考圖2J,根據實施例顯示了在晶粒230被附接至基底基板205之後的截面圖。在實施例中,晶粒230可以透過FLI 216附接至基底基板205。例如,附接程序可以是TCB程序等。模具層212可以接著透過適當的程序(例如,模具底部填充(MUF)程序)形成在晶粒230上。在實施例中,模具層212可以覆蓋晶粒230的側面,並且晶粒230的背面可以保持暴露出。在其它實施例中,晶粒230的背面可以被模具層212覆蓋。
在實施例中,晶粒230可以具有主動表面231。主動表面231可被定向為面向基底基板205的表面206。因此,晶粒230可以被稱為具有與基底基板205以及元件220的面對面配置。在元件被定向為使主動表面221背對表面206的實施例中,晶粒230和元件220可以被稱為具有面對背的定向。
現在參考圖3A-3D,根據實施例顯示了描繪了利用後通孔程序流程形成電子封裝的程序的一系列截面圖。
現在參考圖3A,根據實施例顯示了基底基板305的截面圖。在一些實施例中,基底基板305可以是矽基板。在實施例中,基底基板305可以包含表面306。表面306可以包含導電特徵(例如,墊、跡線等)。在基底基板305是主動基板的一些實施例中,表面306還可包含主動電路(例如,電晶體等)。在實施例中,基底基板305可以具有厚度T1
。例如,厚度T1
可以為大約100μm或更小。應當理解,縮小的厚度T1
(與800μm的一般矽晶片厚度相比)可以透過將基底基板305研磨到所需的厚度來提供。與在圖2B中所示的基底基板205相比,在程序流程中,基底基板305在此不具有TSV。
現在參考圖3B,根據實施例顯示了在附接了載體380之後的基底基板305的截面圖。在實施例中,載體380可以透過接合膜382被固定到基底基板305的表面306。
現在參考圖3C,根據實施例顯示了在形成TSV 307之後的基底基板305的截面圖。在實施例中,可以透過建立穿過基底基板305的開口,並用導電材料填充所述開口來形成TSV 307。所述開口可以是透過使用光阻(未顯示)作為掩模的蝕刻程序來形成。TSV 307可以具有在基底基板305的背面露出的表面。
現在參考圖3D,根據實施例顯示了在形成腔室之後的基底基板的截面圖。在實施例中,腔室315可以透過移除了基底基板305的一部分的蝕刻程序形成。所述蝕刻程序可以是濕式蝕刻或乾式蝕刻程序,其在基底基板305上利用光阻(未顯示)以便限定腔室315的邊界。腔室315可延伸穿過基底基板305並終止於表面306。在實施例中,複數個墊329可以由腔室315暴露出。在形成腔室315之前,襯墊329可以被製造為表面306的一部分。
為了提供根據實施例的電子封裝,在形成腔室315之後,可以繼續進行與圖2E-2J中詳細描述的處理操作實質相同的處理。
現在參考圖4A-4D,根據實施例更詳細地顯示了描繪了用於形成腔室並將元件佈置在腔室中的程序的一系列截面圖。
現在參考圖4A,根據實施例顯示了在載體480上的基底基板405的截面圖。基底基板405可以透過接合膜482附接至載體480。接合膜可以覆蓋基底基板405的表面406和表面406上的任何墊453。在一些實施例中,表面406可以包含導電特徵452,如將為元件和電子封裝的晶粒提供互連的跡線、墊、通孔等。
在實施例中,複數個墊429可以沿著表面406形成,並嵌入基底基板405的主體中。墊429位於元件將在後續處理操作中附接的位置。在一些實施例中,墊429可以透過絕緣襯裡(例如,SiN等)與表面406分開。在實施例中,基底基板405也可以包含墊409上方的TSV 407。在程序流程中的這一點上,TSV 407可能不會完全延伸穿過基底基板405。
現在參考圖4B,根據實施例顯示了在形成腔室415之後的基底基板405的截面圖。在實施例中,腔室415可以穿過背面形成在基底基板405中。腔室415可以定位在TSV 207之間並且暴露出墊429。在一些實施例中,腔室415可以襯有襯裡(未顯示),如氮化物。暴露出的墊429也可以鍍有導電阻擋層等。
現在參考圖4C,根據實施例顯示了在元件420附接至墊429之後的截面圖。在實施例中,元件420可以包含在主動表面421上的墊433。墊433可以透過FLI 418耦接至墊429。FLI 418可以包含焊料。在其它實施例中,FLI 418可包含墊433和墊429之間的銅對銅互連。
現在參考圖4D,根據實施例顯示了將模具層426設置到腔室415中之後的截面圖。在實施例中,模具層426可以是環氧樹脂等。在圖示的實施例中,模具層426還可以用作圍繞FLI 418的底部填充材料。然而,其它實施例可以包含圍繞FLI 418並且與模具層不同的專用底部填充材料(例如,類似於圖2F所示的)。在模具層426填充腔室415之後,基底基板405(和模具層426)可以被平坦化,以便在基底基板405的背面處暴露出TSV 407。雖然在圖4D中未顯示,但是應當理解,當TSV存在時,平坦化程序還可以暴露出元件420中的TSV。
現在參考圖5A-5D,根據實施例更詳細地顯示了描繪了用於利用後通孔程序形成腔室並將元件佈置在腔室中的程序的一系列截面圖。
現在參考圖5A,根據實施例顯示了在載體580上的基底基板505的截面圖。基底基板505可以透過接合膜582附接至載體580。接合膜可以覆蓋基底基板505的表面506和表面506上的任何墊553。在一些實施例中,表面506可包含導電特徵552,如將提供與元件和電子封裝的晶粒的互連的跡線、墊、通孔等。
在實施例中,複數個墊529可以沿著表面506形成,並嵌入基底基板505的主體中。墊529位於元件將在後續處理操作中附接的位置。在一些實施例中,墊529可以透過絕緣襯裡(例如,SiN等)與表面506分開。與圖4A所示的實施例相比,基底基板505可以在程序流程中的這一點上省略TSV。
現在參考圖5B,根據實施例顯示了在通孔開口504形成在基底基板505中之後的截面圖。在實施例中,開口504可以透過利用光阻掩模(未顯示)來限定開口的蝕刻程序來形成。在一些實施例中,開口504可以襯有絕緣襯裡(例如,SiN等)。開口504可以暴露出嵌入基底基板505中的墊509的部分。
現在參考圖5C,根據實施例顯示了TSV 507佈置在開口504中之後的截面圖。在實施例中,可以透過任何合適的程序(如化學鍍等)來鍍覆TSV 507。
現在參考圖5D,根據實施例顯示了在形成腔室515並且將元件設置在腔室515中之後的基底基板505的截面圖。在實施例中,腔室515可以穿過背面形成在基底基板505上。腔室515可以位於TSV 507之間並暴露出墊529。在一些實施例中,腔室515可以襯有諸如SiN(未顯示)的襯裡。暴露出的墊529還可以鍍有導電阻擋層等。
在實施例中,元件520可以包含位於主動表面521上方的墊533。墊533可以透過FLI 518耦接至墊529。FLI 518可以包含焊料。在其它實施例中,FLI 518可以包含墊533和墊529之間的銅對銅互連。在元件520附接至墊529之後,處理流程可以依實質與上面關於圖4D描述的相同方式繼續。
現在參考圖6,根據實施例顯示了電子系統680的截面圖。在實施例中,電子系統680可以包含附接至板690(如印刷電路板(PCB)等)的電子封裝600。在實施例中,電子封裝600可以透過PSB 614或任何其它合適的互連架構耦接至板690。
在實施例中,電子封裝600可以是任何封裝,如上面更詳細描述的那些。例如,電子封裝600可以包含基底基板605。在實施例中,基底基板605可以是主動或被動基板。基底基板605可包含含有導電佈線或其它導電特徵(未顯示)的表面606。基底基板605可以包含矽。在實施例中,複數個晶粒(例如,晶粒630和640)可以耦接至基底基板。例如,可以透過FLI 616將晶粒630和640的主動表面631和641附接到表面606。在實施例中,基底基板605可以包含TSV 607。在實施例中,複數個晶粒630、640可以被嵌入模具層612中。
在實施例中,基底基板605可以包含複數個腔室(例如,腔室615A
和615B
)。在實施例中,一或多個腔室615完全位於晶粒630、640之一的覆蓋區內。在其它實施例中,一或多個腔室615至少部分在第一晶粒630的覆蓋區內並且至少部分在第二晶粒640的覆蓋區內。
在實施例中,每個腔室615可以填充有元件(例如,元件620或元件660)。元件620、660可以是多種不同元件類型中的任何一種,如晶粒或晶粒堆疊(例如,處理器晶粒、記憶體晶粒、電源晶粒、通訊晶粒等)、被動元件(例如電橋、電容器、電感器等)、冷卻模組(例如TEC模組)等。在元件620和/或660是晶粒或晶粒堆疊的實施例中,元件620、660可以被製造在第一製程節點,而晶粒630、640中的一個或兩個可以在第二製程節點處被製造。在一些實施例中,第一製程節點可以不同於第二製程節點。在實施例中,元件620、660可以包含主動表面621、661。主動表面621、661可以定向為與晶片630、640面對面配置或背對面配置。在實施例中,元件620、660中的一個或兩個可包含TSV 627、667。元件620、660可以透過互連618電耦接至基底晶粒605的表面606。
圖7顯示根據本發明的一種實現的計算裝置700。計算裝置700容納板702。板702可以包含多個元件,包含但不限於處理器704和至少一個通訊晶片706。處理器704實體地電耦接至板702。在一些實現中,至少一個通訊晶片706也實體地電耦接至板702。在其它實現中,通訊晶片706是處理器704的一部分。
這些其它元件包含但不限於揮發性記憶體(例如DRAM)、非揮發性記憶體(例如ROM)、快閃記憶體、圖形處理器、數位訊號處理器、加密處理器、晶片組、天線、顯示器、觸控螢幕顯示器、觸控螢幕控制器、電池、音訊編解碼器、視訊編解碼器、電源放大器、全球定位系統(GPS)裝置、羅盤、加速度計、陀螺儀、揚聲器、相機和大容量儲存裝置(例如硬碟、光碟(CD)、數位多功能光碟(DVD)等)。
通訊晶片706致使往來計算裝置700之間的資料傳輸進行無線通訊。用語「無線」及其衍生詞用於描述電路、裝置、系統、方法、技術、通訊頻道等,其可藉由非固態媒體、藉由使用調變的電磁輻射來傳送資料。該用語不暗示相關的裝置不包含任何導線,儘管在一些實施例中它們可能沒有。通訊晶片706可以實現任何數目的無線標準或協議,其包括但不限於Wi-Fi(IEEE 802.11系列)、WiMAX(IEEE 802.16系列)、IEEE 802.20、長期演進(LTE)、Ev-DO、HSPA+、HSDPA+、HSUPA+、EDGE、GSM、GPRS、CDMA、TDMA、DECT、藍芽,其衍生物以及那些被指定為3G、4G、5G和之後的任何其它無線協定。計算裝置700可以包括複數個通訊晶片706。例如,第一通訊晶片706可專用於短範圍無線通訊,如Wi-Fi和藍芽,而第二通訊晶片706可專用於長範圍無線通訊,如GPS、EDGE、GPRS、CDMA、WiMAX、LTE、Ev-DO和其它。
計算裝置700的處理器704包含封裝在處理器704內的積體電路晶粒。在本發明的一些實現中,處理器的積體電路晶粒可以封裝在包含具有含有容納根據本文描述的實施例的元件的腔室的基底基板的多晶片封裝的電子系統中。用語“處理器”可以指處理來自暫存器和/或記憶體的電子資料,以將該電子資料轉換成可儲存在暫存器和/或記憶體中的其它電子資料的任何裝置或裝置的部分。
通訊晶片706也可以包括封裝在通訊晶片706內的積體電路晶粒。根據本發明的其它實現,通訊晶片的積體電路晶粒可以封裝在包含具有含有容納根據本文描述的實施例的元件的腔室的基底基板的多晶片封裝的電子系統中。
以上對本發明的圖示實現的描述(包含摘要中描述的內容)並不意於窮舉或限制本發明在所揭露的精確形式。雖然為了說明的目的,本發明在此描述為範例的具體實現,如本領域技術人員應當理解的,在本發明的範圍內可以進行各種等同的修改。
鑑於以上詳細描述,可以對本發明進行這些修改。所附申請專利範圍中使用的用語不應解釋為將本發明限制為說明書和申請專利範圍中揭露的具體實現。相對地,本發明的範圍將完全由所附申請專利範圍來確定,其應根據申請專利範圍詮釋的既定原則來解釋。
範例1:一種電子封裝,包含:基底基板,所述基底基板具有複數個貫穿基板通孔;所述基底基板上的第一晶粒;進入所述基底基板的第一腔室,其中所述第一腔室至少部分在所述第一晶粒的覆蓋區內;以及所述第一腔室中的第一元件。
範例2:如範例1的電子封裝,其中所述第一元件是第二晶粒。
範例3:如範例1或範例2的電子封裝,其中所述第二晶粒包含貫穿基板通孔。
範例4:如範例1至3的電子封裝,其中所述第二晶粒的主動表面面對所述第一晶粒的主動表面。
範例5:如範例1至4的電子封裝,其中所述第二晶粒的主動表面背對所述第一晶粒的主動表面。
範例6:如範例1至5的電子封裝,其中所述第一元件是被動電子元件。
範例7:如範例1至6的電子封裝,其中所述第一元件是熱電冷卻(TEC)模組。
範例8:如範例1至7的電子封裝,其中所述第一腔室完全在所述第一晶粒的所述覆蓋區內。
範例9:如範例1至8的電子封裝,還包含所述基底基板上的第二晶粒。
範例10:如範例1至9的電子封裝,其中所述第一腔室至少部分在所述第二晶粒的覆蓋區內。
範例11:如範例1至10的電子封裝,其中所述第一元件將所述第一晶粒電耦接至所述第二晶粒。
範例12:如範例1至11的電子封裝,還包含:進入所述基底基板的第二腔室,其中所述第二腔室完全在所述第一晶粒的所述覆蓋區內。
範例13:如範例1至12的電子封裝,還包含:所述第二腔室中的第二元件。
範例14:如範例1至13的電子封裝,其中所述第一晶粒透過所述基底基板上的一或多個跡線電耦接至所述第二晶粒。
範例15:如範例1至14的電子封裝,其中所述基底基板是被動基板。
範例16:如範例1至15的電子封裝,其中所述基底基板是主動基板。
範例17:一種形成電子封裝的方法,包含:形成部分穿過基底基板的貫穿基板通孔(TSV);薄化所述基底基板,其中所述TSV不被暴露出;將載體附接至所述基底基板;在所述基底基板中形成腔室,其中所述腔室暴露出複數個墊;將元件附接至所述複數個墊;將所述元件嵌入模具層中;將所述基底基板平坦化,其中所述平坦化暴露出所述TSV;移除所述載體;以及將晶粒附接至所述基底基板。
範例18:如範例17的方法,其中所述元件的主動表面面向所述晶粒的主動表面。
範例19:如範例17或範例18的方法,其中所述腔室至少部分位於所述晶粒的覆蓋區內。
範例20:如範例17至19的方法,其中所述元件是第二晶粒。
範例21:如範例17至20的方法,其中所述第二晶粒包含貫穿基板通孔。
範例22:一種電子系統,包含:板;耦接至所述板的電子封裝,其中所述電子封裝包含:基底基板,其中所述基底基板包含貫穿基板通孔(TSV),以及其中所述基底基板包含矽;所述基底基板上的第一晶粒;所述基底基板上的第二晶粒;進入所述基底基板的第一腔室,其中所述第一腔室至少部分在所述第一晶粒的覆蓋區內並且至少部分在所述第二晶粒的覆蓋區內;所述第一腔室中的第一元件;進入所述基底基板的第二腔室;以及所述第二腔室中的第二元件。
範例23:如範例22的電子系統,其中所述第一元件將所述第一晶粒電耦接至所述第二晶粒。
範例24:如範例22或範例23的電子系統,其中所述第一元件和所述第二元件中之至少一者包含貫穿基板通孔。
範例25:如範例22至24的電子系統,其中所述第一晶粒的主動表面面向所述第一元件的主動表面。
100:電子封裝
105:基底基板
106:表面
107:貫穿基板通孔(TSV)
112:模具層
114:封裝側凸塊(PSB)
114’:虛設PSB
115:腔室
116:第一級互連(FLI)
118:FLI
120:元件
121:主動表面
126:模具層
127:TSV
130:晶粒
131:主動表面
140:晶粒
141:主動表面
152:跡線
160:元件
161:主動表面
166:模具層
167:TSV
205:基底基板
206:表面
207:TSV
212:模具層
214:PSB
215:腔室
216:FLI
218:FLI
220:元件
221:主動表面
225:底部填充材料
226:模具層
227:TSV
229:墊
230:晶粒
231:主動表面
280:載體
282:接合膜
305:基底基板
306:表面
307:TSV
315:腔室
329:墊
380:載體
382:接合膜
405:基底基板
406:表面
407:TSV
409:墊
415:腔室
418:FLI
420:元件
421:主動表面
426:模具層
429:墊
433:墊
452:導電特徵
453:墊
480:載體
482:接合膜
504:通孔開口
505:基底基板
506:表面
507:TSV
509:墊
515:腔室
518:FLI
520:元件
521:主動表面
529:墊
533:墊
552:導電特徵
553:墊
580:載體
582:接合膜
600:電子封裝
605:基底基板
606:表面
607:TSV
612:模具層
614:PSB
615:腔室
616:FLI
618:互連
620:元件
621:主動表面
627:TSV
630:晶粒
631:主動表面
640:晶粒
641:主動表面
660:元件
661:主動表面
667:TSV
680:電子系統
690:板
700:計算裝置
702:板
704:處理器
706:通訊晶片
[圖1A] 是根據實施例的具有包含第一晶粒的基底基板和嵌入所述第一晶粒下方的基底基板的腔室中的第一元件的電子封裝的截面圖。
[圖1B] 是根據實施例的具有包含第一晶粒、第二晶粒的基底基板和嵌入所述第一晶粒和第二晶粒下方的基底基板的腔室中的元件的電子封裝的截面圖。
[圖1C] 是根據實施例的具有包含第一晶粒、第二晶粒的基底基板和嵌入所述第一晶粒下方的基底基板的腔室中的元件的電子封裝的截面圖。
[圖1D] 是根據實施例的具有包含第一晶粒、第二晶粒的基底基板、嵌入所述基底基板的第一腔室中的第一元件和嵌入所述基底基板的第二腔室中的第二元件的電子封裝的截面圖。
[圖1E] 是根據實施例的具有包含第一晶粒、第二晶粒的基底基板、與第一晶粒和第二晶粒具有面對面配置的第一元件,以及與第一晶粒和第二晶粒具有背對面配置的第二元件的電子封裝的截面圖。
[圖1F] 是根據實施例的具有包含第一晶粒、第二晶粒的基底基板、不具有貫穿基板通孔的第一元件,以及具有貫穿基板通孔的第二元件的電子封裝的截面圖。
[圖1G] 是根據實施例的具有包含第一晶粒、第二晶粒的基底基板、第一元件,以及第二元件的電子封裝的截面圖。
[圖1H] 是根據實施例的具有包含晶粒堆疊的基底基板的電子封裝的截面圖。
[圖1I] 是根據實施例的包含將第一晶粒連接到第二晶粒的在基底基板中的複數個電橋的電子封裝的平面圖。
[圖1J] 是根據實施例的包含將第一晶粒連接到第二晶粒、將第一晶粒連接到第三晶粒的在基底基板中的複數個電橋的電子封裝的平面圖。
[圖1K] 是根據實施例的包含將第一晶粒連接到第二晶粒的在基底晶粒中的複數個電橋,以及嵌入第一晶粒和第二晶粒下方的基底晶粒中的複數個晶粒的電子封裝的平面圖。
[圖2A] 是根據實施例的具有進入基底基板的穿透基板通孔(TSV)的基底基板的截面圖。
[圖2B] 是根據實施例的在薄化基底基板之後的基底基板的截面圖。
[圖2C] 是根據實施例的在附接了載體之後的基底基板的截面圖。
[圖2D] 是根據實施例的在形成進入基底基板的腔室之後的截面圖。
[圖2E] 是根據實施例的在將元件附接到由腔室暴露出的墊之後的截面圖。
[圖2F] 是根據實施例的在將元件嵌入模具層之後的截面圖。
[圖2G] 是根據實施例的在基底基板被平面化以暴露出TSV之後的截面圖。
[圖2H] 是根據實施例的在封裝側凸塊(PSB)被附接至TSV之後的截面圖。
[圖2I] 是根據實施例的移除載體之後的截面圖。
[圖2J] 是根據實施例的在晶粒被附接至基底基板並且被包覆成型之後的截面圖。
[圖3A] 是根據實施例的不具有TSV的基底基板的截面圖。
[圖3B] 是根據實施例的在將載體附接至基底基板之後的截面圖。
[圖3C] 是根據實施例的在基底基板中形成TSV之後的截面圖。
[圖3D] 是根據實施例的在基底基板中形成腔室之後的截面圖。
[圖4A] 是根據實施例的具有仍然完全嵌入的TSV的基底基板的截面圖。
[圖4B] 是根據實施例的形成在基底基板中以暴露出墊的腔室的截面圖。
[圖4C] 是根據實施例的附接至腔室中的襯墊的元件的截面圖。
[圖4D] 是根據實施例的在腔室填充有模具層並且基底基板被平坦化以暴露出TSV之後的截面圖。
[圖5A] 是根據實施例的不具有TSV的基底基板的截面圖。
[圖5B] 是根據實施例的在形成進入基底基板的通孔開口之後的截面圖。
[圖5C] 是根據實施例的在將TSV佈置在通孔開口中之後的截面圖。
[圖5D] 是根據實施例的在基底基板中形成腔室並且元件被附接至腔室中的墊之後的截面圖。
[圖6] 是根據實施例的包含多晶片封裝的電子系統的截面圖。
[圖7] 是根據實施例構建的計算裝置的示意圖。
100:電子封裝
105:基底基板
106:表面
107:貫穿基板通孔(TSV)
112:模具層
114:封裝側凸塊(PSB)
115:腔室
116:第一級互連(FLI)
118:FLI
120:元件
121:主動表面
126:模具層
127:TSV
130:晶粒
131:主動表面
Claims (25)
- 一種電子封裝,包含: 基底基板,所述基底基板具有複數個貫穿基板通孔; 所述基底基板上的第一晶粒; 進入所述基底基板的第一腔室,其中所述第一腔室至少部分在所述第一晶粒的覆蓋區內;以及 所述第一腔室中的第一元件。
- 如請求項1的電子封裝,其中所述第一元件是第二晶粒。
- 如請求項2的電子封裝,其中所述第二晶粒包含貫穿基板通孔。
- 如請求項2的電子封裝,其中所述第二晶粒的主動表面面對所述第一晶粒的主動表面。
- 如請求項2的電子封裝,其中所述第二晶粒的主動表面背對所述第一晶粒的主動表面。
- 如請求項1的電子封裝,其中所述第一元件是被動電子元件。
- 如請求項1的電子封裝,其中所述第一元件是熱電冷卻(TEC)模組。
- 如請求項1的電子封裝,其中所述第一腔室完全在所述第一晶粒的所述覆蓋區內。
- 如請求項1的電子封裝,還包含所述基底基板上的第二晶粒。
- 如請求項9的電子封裝,其中所述第一腔室至少部分在所述第二晶粒的覆蓋區內。
- 如請求項9的電子封裝,其中所述第一元件將所述第一晶粒電耦接至所述第二晶粒。
- 如請求項9的電子封裝,還包含: 進入所述基底基板的第二腔室,其中所述第二腔室完全在所述第一晶粒的所述覆蓋區內。
- 如請求項12的電子封裝,還包含: 所述第二腔室中的第二元件。
- 如請求項9的電子封裝,其中所述第一晶粒透過所述基底基板上的一或多個跡線電耦接至所述第二晶粒。
- 如請求項1的電子封裝,其中所述基底基板是被動基板。
- 如請求項1的電子封裝,其中所述基底基板是主動基板。
- 一種形成電子封裝的方法,包含: 形成部分穿過基底基板的貫穿基板通孔(TSV); 薄化所述基底基板,其中所述TSV不被暴露出; 將載體附接至所述基底基板; 在所述基底基板中形成腔室,其中所述腔室暴露出複數個墊; 將元件附接至所述複數個墊; 將所述元件嵌入模具層中; 將所述基底基板平坦化,其中所述平坦化暴露出所述TSV; 移除所述載體;以及 將晶粒附接至所述基底基板。
- 如請求項17的方法,其中所述元件的主動表面面向所述晶粒的主動表面。
- 如請求項17的方法,其中所述腔室至少部分位於所述晶粒的覆蓋區內。
- 如請求項17的方法,其中所述元件是第二晶粒。
- 如請求項20的方法,其中所述第二晶粒包含貫穿基板通孔。
- 一種電子系統,包含: 板; 耦接至所述板的電子封裝,其中所述電子封裝包含: 基底基板,其中所述基底基板包含貫穿基板通孔(TSV),以及其中所述基底基板包含矽; 所述基底基板上的第一晶粒; 所述基底基板上的第二晶粒; 進入所述基底基板的第一腔室,其中所述第一腔室至少部分在所述第一晶粒的覆蓋區內並且至少部分在所述第二晶粒的覆蓋區內; 所述第一腔室中的第一元件; 進入所述基底基板的第二腔室;以及 所述第二腔室中的第二元件。
- 如請求項22的電子系統,其中所述第一元件將所述第一晶粒電耦接至所述第二晶粒。
- 如請求項22的電子系統,其中所述第一元件和所述第二元件中之至少一者包含貫穿基板通孔。
- 如請求項22的電子系統,其中所述第一晶粒的主動表面面向所述第一元件的主動表面。
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