TW202028303A - 聚醯胺酸酯樹脂組成物 - Google Patents

聚醯胺酸酯樹脂組成物 Download PDF

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Publication number
TW202028303A
TW202028303A TW108136532A TW108136532A TW202028303A TW 202028303 A TW202028303 A TW 202028303A TW 108136532 A TW108136532 A TW 108136532A TW 108136532 A TW108136532 A TW 108136532A TW 202028303 A TW202028303 A TW 202028303A
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TW
Taiwan
Prior art keywords
group
resin composition
polyimide precursor
carbon atoms
mass
Prior art date
Application number
TW108136532A
Other languages
English (en)
Chinese (zh)
Inventor
臼井友輝
大橋拓矢
服部隼人
澤田和宏
遠藤雅久
坂口崇洋
平佐田一樹
Original Assignee
日商日產化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日產化學股份有限公司 filed Critical 日商日產化學股份有限公司
Publication of TW202028303A publication Critical patent/TW202028303A/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/10Esters; Ether-esters
    • C08K5/12Esters; Ether-esters of cyclic polycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW108136532A 2018-10-15 2019-10-09 聚醯胺酸酯樹脂組成物 TW202028303A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-194129 2018-10-15
JP2018194129 2018-10-15

Publications (1)

Publication Number Publication Date
TW202028303A true TW202028303A (zh) 2020-08-01

Family

ID=70284628

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108136532A TW202028303A (zh) 2018-10-15 2019-10-09 聚醯胺酸酯樹脂組成物

Country Status (3)

Country Link
JP (1) JP7327410B2 (https=)
TW (1) TW202028303A (https=)
WO (1) WO2020080206A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024033021A (ja) * 2021-01-14 2024-03-13 日産化学株式会社 感光性樹脂組成物中の金属不純物を除去する金属除去フィルターを用いた金属除去方法
CN117120512A (zh) * 2021-03-30 2023-11-24 富士胶片株式会社 树脂组合物、固化物、层叠体、固化物的制造方法及半导体器件、以及聚酰亚胺前驱体
WO2022210532A1 (ja) 2021-03-30 2022-10-06 富士フイルム株式会社 樹脂組成物、硬化物、積層体、硬化物の製造方法、及び、半導体デバイス、並びに、ポリイミド前駆体及びその製造方法
JPWO2025013140A1 (https=) * 2023-07-07 2025-01-16

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0920865A (ja) * 1995-07-06 1997-01-21 Toray Ind Inc カラーペースト、樹脂ブラック・マトリクス用ペーストおよびカラーフィルタ
JPH09184912A (ja) * 1995-12-28 1997-07-15 Toray Ind Inc 樹脂ブラック・マトリクスおよび樹脂ブラック・マトリクス用ペースト
JP5092426B2 (ja) * 2006-07-21 2012-12-05 東レ株式会社 位相差薄膜用樹脂組成物、液晶表示装置用カラーフィルター基板、および液晶表示装置、並びに位相差薄膜付き液晶表示装置用カラーフィルター基板の製造方法
JP6151475B2 (ja) 2010-09-30 2017-06-21 大日本印刷株式会社 感光性樹脂組成物、パターン形成用材料及びパターン形成方法
CN106255714A (zh) 2014-04-18 2016-12-21 长濑化成株式会社 抗蚀剂树脂及其制造方法
EP3000837B1 (en) 2014-09-23 2017-06-07 Lotte Advanced Materials Co., Ltd. Polyamide ester resin, method for preparing the same, and molded article including the same
CN108604029B (zh) 2015-12-03 2021-11-26 日产化学工业株式会社 液晶取向剂、液晶取向膜及使用其的液晶表示元件

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Publication number Publication date
WO2020080206A1 (ja) 2020-04-23
JP7327410B2 (ja) 2023-08-16
JPWO2020080206A1 (ja) 2021-10-07

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