TW201935602A - System, apparatus and method for contactless transportation of a carrier in a deposition system - Google Patents

System, apparatus and method for contactless transportation of a carrier in a deposition system Download PDF

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TW201935602A
TW201935602A TW107137732A TW107137732A TW201935602A TW 201935602 A TW201935602 A TW 201935602A TW 107137732 A TW107137732 A TW 107137732A TW 107137732 A TW107137732 A TW 107137732A TW 201935602 A TW201935602 A TW 201935602A
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carrier
sensors
item
patent application
substrate
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TW107137732A
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Chinese (zh)
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克里斯蒂安沃爾夫岡 埃曼
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美商應用材料股份有限公司
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
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Abstract

The present disclosure provides an apparatus for contactless transportation of a carrier (220) in a deposition system. The carrier (220) includes a guiding structure (210) having one or more active magnet units (112) configured to face a magnet structure (222) of the carrier (220), and one or more sensors (230) configured to detect a presence of the carrier (220), wherein the one or more active magnet units (112) and the one or more sensors (230) are arranged to define a guiding space (S) for the magnet structure (222) therebetween.

Description

用於在沉積系統中非接觸地傳輸載體的系統、及非接觸地傳輸載體的方法System for non-contact transfer of carrier in deposition system and method for non-contact transfer of carrier

本揭露的實施例是有關於一種用於在沉積系統中非接觸地傳輸載體的裝置、一種用於非接觸地傳輸載體的系統、及一種用於在沉積系統中非接觸地傳輸載體的方法。本揭露的實施例特別是有關於用於固持基材及/或遮罩的靜電吸座(E-chuck),其用於製造有機發光二極體(OLED)裝置。Embodiments of the present disclosure relate to a device for non-contact transfer of a carrier in a deposition system, a system for non-contact transfer of a carrier, and a method for non-contact transfer of a carrier in a deposition system. The embodiments disclosed in this disclosure are particularly related to an electrostatic chuck (E-chuck) for holding a substrate and / or a mask, which is used for manufacturing an organic light emitting diode (OLED) device.

在基材上沉積層的技術包括,例如是熱蒸發、物理氣相沉積(PVD)、及化學氣相沉積(CVD)。已塗佈的基材可用於多種應用及多個技術領域中。舉例來說,已塗佈的基材可用於有機發光二極體裝置的領域中。有機發光二極體可用於電視螢幕、電腦顯示器、行動電話、其他手持裝置、及用於顯示資訊的類似物的製造中。有機發光二極體裝置,像是有機發光二極體顯示器,可包括位於兩個電極之間的一或多層有機材料,此兩個電極都沉積於基材上。Techniques for depositing a layer on a substrate include, for example, thermal evaporation, physical vapor deposition (PVD), and chemical vapor deposition (CVD). Coated substrates can be used in a variety of applications and in various technical fields. For example, coated substrates can be used in the field of organic light emitting diode devices. Organic light emitting diodes are used in the manufacture of television screens, computer monitors, mobile phones, other handheld devices, and the like for displaying information. Organic light emitting diode devices, such as organic light emitting diode displays, can include one or more layers of organic material between two electrodes, both electrodes being deposited on a substrate.

在處理期間,基材可被支撐載體上,載體係配置成用以固持基材及可選擇的遮罩。可在沉積系統(像是真空沉積系統)中利用磁力非接觸地傳輸此載體。對於像是有機發光二極體的應用,沉積在基材上的有機層應該具有高純度及均勻度。進一步來說,利用非接觸的傳輸傳送及傳輸支撐基材及遮罩的載體,但不因基材的破損而犧牲產量,是具有挑戰性的。During processing, the substrate may be supported on a carrier configured to hold the substrate and an optional mask. This carrier can be transported non-contact in a deposition system, such as a vacuum deposition system, using magnetic force. For applications like organic light emitting diodes, the organic layer deposited on the substrate should have high purity and uniformity. Furthermore, it is challenging to use non-contact transmission to transport and transport the carrier supporting the substrate and the mask, but without sacrificing yield due to the damage of the substrate.

綜上所述,克服本領域的至少一些問題的新的用於在沉積系統中非接觸地傳輸載體的的裝置、用於非接觸地傳輸載體的系統、及用於在沉積系統中非接觸地傳輸載體的方法是有利的。本揭露特別針對提供載體,其在沉積系統(像是真空沉積系統)中可被有效率地且平滑地傳輸。In summary, a new device for non-contact transport of a carrier in a deposition system, a system for non-contact transport of a carrier, and a non-contact transport of a carrier in a deposition system that overcome at least some of the problems in the art The method of transporting the carrier is advantageous. This disclosure is specifically directed to providing a carrier that can be efficiently and smoothly transported in a deposition system, such as a vacuum deposition system.

有鑑於此,提供一種用於在沉積系統中非接觸地傳輸載體的裝置、一種用於非接觸地傳輸載體的系統、及一種用於在沉積系統中非接觸地傳輸載體的方法。根據申請專利範圍、說明書、及附圖,本揭露的進一步的方面、益處、及特徵是顯而易見的。In view of this, a device for non-contact transport of a carrier in a deposition system, a system for non-contact transport of a carrier, and a method for non-contact transport of a carrier in a deposition system are provided. Further aspects, benefits, and features of the present disclosure will be apparent from the scope of the patent application, the description, and the drawings.

根據本揭露的一方面,提供一種用於在沉積系統中非接觸地傳輸載體的裝置。此裝置包括一引導結構,具有一或多個主動磁鐵單元,配置成用以面向此載體的一磁鐵結構,及一或多個感測器,配置成用以偵測此載體的存在,其中此一或多個主動磁鐵單元及此一或多個感測器係配置成用以定義其二者之間的此磁鐵結構的一引導空間。According to an aspect of this disclosure, an apparatus is provided for contactlessly transporting a carrier in a deposition system. The device includes a guiding structure with one or more active magnet units, a magnet structure configured to face the carrier, and one or more sensors configured to detect the presence of the carrier. One or more active magnet units and the one or more sensors are configured to define a guiding space of the magnet structure therebetween.

根據本揭露的另一方面,提供一種用於在沉積系統中非接觸地傳輸載體的裝置。此裝置包括一或多個感測器,配置成用以偵測該載體的存在,其中該一或多個感測器的各該感測器在該載體的一傳輸方向上具有一感測器擴展,其中該感測器擴展是在該傳輸方向上的一載體擴展的1%或更多。According to another aspect of the present disclosure, an apparatus is provided for contactlessly transporting a carrier in a deposition system. The device includes one or more sensors configured to detect the presence of the carrier, wherein each of the one or more sensors has a sensor in a transmission direction of the carrier Expansion, where the sensor expansion is 1% or more of a carrier expansion in the transmission direction.

根據本揭露的其他方面,提供一種用於非接觸地傳輸載體的系統。此系統包括用於非接觸地傳輸根據本揭露的載體及載體的裝置。According to other aspects of this disclosure, a system is provided for contactless transport of a carrier. This system includes a device for non-contact transport of a carrier and a carrier according to the present disclosure.

根據本揭露的又其他方面,提供一種在沉積系統中非接觸地傳輸載體的方法。此方法包括偵測該載體的一可偵測裝置的一第一側,及控制至少一主動磁鐵單元,此主動磁鐵單元係配置在此可偵測裝置的一第二側,此第一側與此第二側相對。According to still other aspects of the present disclosure, a method of non-contact transporting a carrier in a deposition system is provided. The method includes detecting a first side of a detectable device of the carrier and controlling at least one active magnet unit. The active magnet unit is disposed on a second side of the detectable device, and the first side and This second side is opposite.

實施例係亦有關於用以執行所揭露之方法之裝置,且包括用以執行各所述之方法方面之裝置部件。此些方法方面可藉由硬體元件、由合適軟體程式化之電腦、兩者之任何結合或任何其他方式執行。再者,根據本揭露之實施例係亦有關於用以操作所述之裝置的方法。用以操作所述之裝置的此些方法包括用以執行裝置之每一功能的方法方面。The embodiments are also related to a device for performing the disclosed method, and include device components for performing each of the described method aspects. These method aspects may be implemented by hardware components, a computer programmed with suitable software, any combination of the two, or any other means. Furthermore, the embodiments according to the present disclosure also relate to a method for operating the device. Such methods for operating the described device include method aspects for performing each function of the device.

現在將對於本揭露的各種實施例進行詳細說明,本揭露的一或多個例子係繪示於圖中。在以下對於圖式的敘述中,係使用相同的元件符號來指示相同的元件。只會對於各個實施例的不同處進行敘述。各個例子的提供只是用以解釋本揭露,而非欲用以限制本揭露。另外,作為一個實施例的一部分而被繪示或敘述的特徵,可用於或結合其他實施例,以產生又一實施例。所述內容意欲包含這樣的調整及變化。Various embodiments of the present disclosure will now be described in detail. One or more examples of the present disclosure are shown in the drawings. In the following description of the drawings, the same components are designated by the same component symbols. Only the differences between the embodiments will be described. Each example is provided to explain the present disclosure and is not intended to limit the present disclosure. In addition, features illustrated or described as part of one embodiment can be used in or combined with other embodiments to produce yet another embodiment. The content is intended to include such adjustments and changes.

載體可被用於沉積系統中,像是真空沉積系統中,以在沉積系統的沉積腔室中固持及傳輸基材及/或遮罩。舉例來說,當基材被支撐於載體上時,一或多個材料層可被沉積至基材上。對於像是有機發光裝置的應用,將高純度及高均勻度的有機層沉積於基材上可以是有利的。進一步來說,在沉積系統中平滑地傳輸載體是有利的,例如是用以減少基材的破損。The carrier may be used in a deposition system, such as a vacuum deposition system, to hold and transport a substrate and / or a mask in a deposition chamber of the deposition system. For example, when the substrate is supported on a carrier, one or more layers of material may be deposited on the substrate. For applications like organic light emitting devices, it may be advantageous to deposit a high purity and high uniformity organic layer on a substrate. Further, it is advantageous to transport the carrier smoothly in the deposition system, for example, to reduce damage to the substrate.

根據本揭露的實施例,一或多個主動磁鐵單元及一或多個感測器係配置於引導空間的對側。特別是,此一或多個主動磁鐵單元及此一或多個感測器係配置於載體的磁鐵結構的對側。可以有效率地使用施行磁引導的空間。進一步來說,可避免磁引導及此一或多個感測器之間的干擾,且可達成載體在傳輸方向上的平滑的傳輸。可減少或甚至避免因載體的不穩定傳輸及/或粒子的產生而造成的基材破損。According to the embodiment of the present disclosure, one or more active magnet units and one or more sensors are disposed on opposite sides of the guide space. In particular, the one or more active magnet units and the one or more sensors are disposed on opposite sides of the magnet structure of the carrier. The space for magnetic guidance can be used efficiently. Further, interference between the magnetic guidance and the one or more sensors can be avoided, and smooth transmission in the transmission direction of the carrier can be achieved. Damage to the substrate due to unstable transport of the carrier and / or generation of particles can be reduced or even avoided.

第1圖繪示載體100及一部分的傳輸裝置,配置成用於在傳輸方向1上非接觸地傳輸載體100的示意圖,此傳輸方向1可以是水平方向。FIG. 1 shows a schematic diagram of the carrier 100 and a part of the transmission device configured for non-contact transmission of the carrier 100 in the transmission direction 1. The transmission direction 1 may be a horizontal direction.

此傳輸裝置包括引導結構110,其可以是主動引導結構。此引導結構110包括多個引導單元111,其係沿著傳輸方向配置。各個引導單元111包括致動器(例如是磁性致動器),致動器像是主動磁鐵單元112,控制器114配置成用以控制致動器,及距離感測器(未繪示)配置成用以測量至載體100的間隙。引導結構110可配置成用以利用磁力非接觸地磁懸浮載體100。This transmission device includes a guiding structure 110, which may be an active guiding structure. The guiding structure 110 includes a plurality of guiding units 111, which are arranged along a transmission direction. Each guide unit 111 includes an actuator (such as a magnetic actuator). The actuator is like an active magnet unit 112. The controller 114 is configured to control the actuator, and a distance sensor (not shown) is configured. It is used to measure the gap to the carrier 100. The guide structure 110 may be configured to contact the magnetically levitated carrier 100 using a magnetic force.

當載體100接近或遠離引導單元111時,可影響磁懸浮的精準度及/或磁懸浮的穩定度。特別是,當載體100接近或遠離引導單元111時,可產生大量及/或脈衝狀的力,其可導致載體100突然的加速或減速。此力可取決於引導結構110,特別是多個引導單元111(例如是磁性致動器及距離感測器)的幾何配置及組件的配置。此力可導致載體100的不需要的及突然的移動,且甚至可導致載體100及引導結構110之間意外的機械接觸。可導致載體100、基材、及/或引導結構110的破損。進一步來說,可產生使沉積處理的品質惡化的粒子。When the carrier 100 approaches or moves away from the guide unit 111, the accuracy of the magnetic levitation and / or the stability of the magnetic levitation may be affected. In particular, when the carrier 100 approaches or moves away from the guide unit 111, a large and / or pulse-like force may be generated, which may cause the carrier 100 to accelerate or decelerate suddenly. This force may depend on the geometric configuration and the configuration of the components of the guiding structure 110, in particular a plurality of guiding units 111 (such as magnetic actuators and distance sensors). This force may cause unwanted and sudden movements of the carrier 100, and may even cause accidental mechanical contact between the carrier 100 and the guide structure 110. Damage to the carrier 100, the substrate, and / or the guide structure 110 may result. Further, particles that deteriorate the quality of the deposition process can be generated.

當載體100突然消失時(例如是從距離感測器下方消失),可能發生脈衝狀的力或是磁懸浮力的方向上的力的改變,特別是由致動器提供的磁力的方向(例如是垂直方向3)上改變。這可能致使距離感測器的信號值,與載體在距離的方向(像是垂直方向3)上施行快速移動遠離距離感測器時的信號值相同。換句話說,距離感測器表示出間隙擴大。信號的改變可使控制器強烈的改變致動器的力,以使「移動中的」載體100回到引導結構110及載體100之間的預設距離上。When the carrier 100 disappears suddenly (such as disappearing from below the distance sensor), a pulsed force or a change in the direction of the magnetic levitation force may occur, especially the direction of the magnetic force provided by the actuator (such as 3) vertical direction. This may cause the signal value of the distance sensor to be the same as the signal value when the carrier moves rapidly away from the distance sensor in the direction of the distance (such as vertical direction 3). In other words, the distance sensor shows an enlarged gap. The change of the signal can cause the controller to strongly change the force of the actuator, so that the “moving” carrier 100 returns to the preset distance between the guide structure 110 and the carrier 100.

此外,當載體100接近或遠離引導單元111時,可產生沿著傳輸方向1的力量。此力量甚至可以是足夠強到以阻礙載體100的其他傳輸。沿著傳輸方向1的力量可以是源自致動器的磁阻(reluctance),此磁阻作用於載體的正面及/或背面(例如是前緣或後緣)。這在第1圖中由載體100背面的磁場線示例性地示出。In addition, when the carrier 100 approaches or moves away from the guide unit 111, a force in the transmission direction 1 may be generated. This force may even be strong enough to impede other transmissions of the carrier 100. The force along the transmission direction 1 may be a reluctance from the actuator, which acts on the front and / or the back of the carrier (for example, the leading edge or the trailing edge). This is exemplarily shown in FIG. 1 by the magnetic field lines on the back of the carrier 100.

第2圖示出根據此處所述的實施例,用於在沉積系統中非接觸地傳輸載體220的裝置的示意圖。FIG. 2 shows a schematic diagram of an apparatus for contactlessly transporting a carrier 220 in a deposition system according to an embodiment described herein.

此裝置包括引導結構210,此引導結構210具有一或多個主動磁鐵單元112配置以面向載體220的磁鐵結構222,及一或多個感測器230配置成用以偵測載體220的存在。此一或多個主動磁鐵單元112及一或多個感測器230係配置成用以定義其之間的磁鐵結構222的引導空間S。載體220的磁鐵結構222沿著載體220的傳輸方向1延伸。同樣地,此一或多個主動磁鐵單元112係沿著載體220的傳輸方向1配置。磁鐵結構222可以是鐵磁材料(ferromagnetic material),磁鐵結構222沿著載體220的長度延伸。The device includes a guide structure 210 having a magnet structure 222 configured with one or more active magnet units 112 to face the carrier 220, and one or more sensors 230 configured to detect the presence of the carrier 220. The one or more active magnet units 112 and the one or more sensors 230 are configured to define a guiding space S of the magnet structure 222 therebetween. The magnet structure 222 of the carrier 220 extends along the transmission direction 1 of the carrier 220. Similarly, the one or more active magnet units 112 are arranged along the transmission direction 1 of the carrier 220. The magnet structure 222 may be a ferromagnetic material, and the magnet structure 222 extends along the length of the carrier 220.

在一些實施例中,磁鐵結構222可為一或多個感測器230提供感測器追蹤(sensor trail)。在其他實施例中,由單獨元件提供感測器追蹤,此單獨元件可被依附至磁鐵結構222上。可由單獨元件提供的感測器追蹤的例子,在第3A圖中以可偵測裝置的形式(像是傾斜)示出。In some embodiments, the magnet structure 222 may provide a sensor trail for one or more sensors 230. In other embodiments, the sensor tracking is provided by a separate element, which may be attached to the magnet structure 222. An example of sensor tracking that can be provided by a separate component is shown in Figure 3A as a detectable device (like tilt).

根據可與此處所述的其他實施例結合的一些實施例,相對於垂直方向3,此一或多個主動磁鐵單元112係配置在引導空間S上方,且此一或多個感測器230係配置在引導空間S下方。定義引導空間S的此一或多個主動磁鐵單元112及此一或多個感測器230之間的距離,例如是在垂直方向3上的距離,可以是大於磁鐵結構222在同一方向上的擴展(extension)。特別是,例如是在垂直方向3上,可提供第一間隙G1於此一或多個主動磁鐵單元112及此磁鐵結構222之間。同樣地,例如是在垂直方向3上,可提供第二間隙G2於此一或多個感測器230及此磁鐵結構222之間。第一間隙G1及第二間隙G2可以是實質上相等或可以是不相等的。此些間隙可避免例如是由於載體220在其傳輸期間的微小的垂直及/或水平移動,造成的載體220及傳輸裝置之間的干擾或接觸。According to some embodiments that can be combined with other embodiments described herein, with respect to the vertical direction 3, the one or more active magnet units 112 are disposed above the guide space S, and the one or more sensors 230 It is arranged below the guide space S. The distance between the one or more active magnet units 112 and the one or more sensors 230 defining the guidance space S, for example, the distance in the vertical direction 3, may be greater than the magnet structure 222 in the same direction. Extension. In particular, for example, in the vertical direction 3, a first gap G1 may be provided between the one or more active magnet units 112 and the magnet structure 222. Similarly, for example, in the vertical direction 3, a second gap G2 may be provided between the one or more sensors 230 and the magnet structure 222. The first gap G1 and the second gap G2 may be substantially equal or may be unequal. Such gaps can avoid, for example, interference or contact between the carrier 220 and the transmission device due to a slight vertical and / or horizontal movement of the carrier 220 during its transmission.

載體220係配置成用於沿著傳輸路徑(像是線性傳輸路徑),非接觸地傳輸通過沉積系統的一或多個腔室(像是真空腔室),且特別是通過至少一沉積區域。載體220可配置成用於在傳輸方向1上非接觸地傳輸,傳輸方向1可以是水平方向。The carrier 220 is configured for non-contact transport through one or more chambers (such as a vacuum chamber) of a deposition system along a transport path (such as a linear transport path), and in particular through at least one deposition area. The carrier 220 may be configured for non-contact transmission in the transmission direction 1, which may be a horizontal direction.

根據可與此處所述的其他實施例結合的一些實施例,沉積系統可包括傳輸裝置,配置成用於在沉積系統中非接觸地磁懸浮及/或非接觸地傳輸載體220。傳輸管理(transport management)可包括引導結構210及驅動結構,引導結構210用於提供用於懸浮載體220的磁懸浮力,驅動結構用於在傳輸方向1上移動載體220。載體220的磁鐵結構222可包括一或多個第一磁鐵單元,配置成用以與引導結構磁性地相互作用。在一些實施方式中,此一或多個第一磁鐵單元可以是被動磁鐵單元,像是永久磁鐵單元及/或鐵磁部件。According to some embodiments that may be combined with other embodiments described herein, the deposition system may include a transfer device configured for non-contact geomagnetic levitation and / or non-contact transfer of the carrier 220 in the deposition system. Transport management may include a guiding structure 210 and a driving structure. The guiding structure 210 is used to provide a magnetic levitation force for suspending the carrier 220. The driving structure is used to move the carrier 220 in the transmission direction 1. The magnet structure 222 of the carrier 220 may include one or more first magnet units configured to magnetically interact with the guide structure. In some embodiments, the one or more first magnet units may be passive magnet units, such as permanent magnet units and / or ferromagnetic components.

根據可與此處所述的其他實施例結合的一些實施例,載體220包括另一磁鐵結構,其包括一或多個第二磁鐵單元(未繪示),配置成用以與驅動結構磁性地相互作用,以在傳輸方向1上移動載體220。在一些實施方式中,此一或多個第二磁鐵單元可以是被動磁鐵單元,像是鐵磁。可將此引導結構210及驅動結構配置在載體220的相對的末端或是末端部分。特別是,可將此一或多個第一磁鐵單元及此一或多個第二磁鐵單元配置在載體220的相對的末端或是末端部分。According to some embodiments that can be combined with other embodiments described herein, the carrier 220 includes another magnet structure including one or more second magnet units (not shown) configured to magnetically couple with the driving structure. Interact to move the carrier 220 in the transmission direction 1. In some embodiments, the one or more second magnet units may be passive magnet units, such as ferromagnetic. The guide structure 210 and the driving structure may be disposed at opposite ends or end portions of the carrier 220. In particular, the one or more first magnet units and the one or more second magnet units may be disposed at opposite ends or end portions of the carrier 220.

沉積系統及特別是傳輸裝置,可包括具有多個引導單元111的引導結構。各個引導單元111可包括致動器像是主動磁鐵單元112,控制器114配置成用以控制致動器,及個別的感測器230配置成用以感測或測量磁鐵結構(特別是其中之一或多個第一磁鐵單元)及致動器之間的間隙。可在垂直於傳輸方向1的方向(像是垂直方向3)上測量此間隙,像是第一間隙G1。特別是,例如是當載體220位於感測器230處以感測或測量一或多個第一磁鐵單元及主動磁鐵單元112之間的間隙時,感測器230可配置以面向一或多個第一磁鐵單元。感測器230可以是距離感測器。The deposition system and particularly the transfer device may include a guiding structure having a plurality of guiding units 111. Each guide unit 111 may include an actuator such as an active magnet unit 112, the controller 114 is configured to control the actuator, and an individual sensor 230 is configured to sense or measure a magnet structure (especially among them) Gap between one or more first magnet units) and the actuator. This gap can be measured in a direction perpendicular to the transmission direction 1 (like vertical direction 3), like the first gap G1. Particularly, for example, when the carrier 220 is located at the sensor 230 to sense or measure the gap between the one or more first magnet units and the active magnet unit 112, the sensor 230 may be configured to face one or more first magnet units. A magnet unit. The sensor 230 may be a distance sensor.

控制器114可配置成用以控制主動磁鐵單元112,以調整致動器基於感測器230測量的間隙所提供的磁力。特別是,控制器114可配置成用以控制主動磁鐵單元112,使得當載體220被傳輸通過沉積系統時,第一磁鐵單元及主動磁鐵單元112之間的距離實質上是恆定的。即使第2圖示例性地示出各個引導單元111具有自己的控制器,可理解的是本揭露並不限於此,且一控制器可被分配給二或多個引導單元。舉例來說,一個單獨的控制器可被提供給所有引導單元。The controller 114 may be configured to control the active magnet unit 112 to adjust a magnetic force provided by the actuator based on the gap measured by the sensor 230. In particular, the controller 114 may be configured to control the active magnet unit 112 such that when the carrier 220 is transported through the deposition system, the distance between the first magnet unit and the active magnet unit 112 is substantially constant. Even if FIG. 2 exemplarily shows that each guide unit 111 has its own controller, it can be understood that the present disclosure is not limited thereto, and one controller may be assigned to two or more guide units. For example, a single controller may be provided to all guidance units.

載體220可配置成用以固持基材處理(像是真空處理)期間所利用的基材及/或遮罩(未繪示)。在一些實施方式中,載體220可配置成用以支撐基材及遮罩二者。在其他實施方式中,載體220可配置成用以支撐基材或遮罩其中一者。在此情況下,載體220可分別稱為「基板載體」及「遮罩載體」。The carrier 220 may be configured to hold a substrate and / or a mask (not shown) utilized during substrate processing, such as vacuum processing. In some embodiments, the carrier 220 may be configured to support both the substrate and the mask. In other embodiments, the carrier 220 may be configured to support one of a substrate or a mask. In this case, the carrier 220 may be referred to as a "substrate carrier" and a "mask carrier", respectively.

載體220可包括提供支撐表面的支撐結構或主體225,支撐表面可以是實質上平坦的表面,其配置成用於接觸例如是基材的後表面。特別是,基材可具有與後表面相對的前表面(亦稱為「處理表面」),且在處理(像是真空沉積處理)期間,一層被沉積至此前表面上。磁鐵結構222可提供至主體225處。The carrier 220 may include a support structure or body 225 that provides a support surface, which may be a substantially flat surface configured to contact a rear surface, such as a substrate. In particular, the substrate may have a front surface (also referred to as a "treated surface") opposite the rear surface, and during a process such as a vacuum deposition process, a layer is deposited on the previous surface. The magnet structure 222 may be provided at the main body 225.

如在整個本揭露所使用的「真空」一詞可理解為具有小於例如是10豪巴(mbar)的真空壓力的技術真空。真空腔室中的壓力可在大約10-5 mbar至大約10-8 mbar之間,特別是在10-5 mbar至10-7 mbar之間,更特別是在大約10-6 mbar至大約10-7 mbar之間。可提供連接至真空腔室的一或多個真空泵,像是渦輪泵(turbo pumps)及/或低溫泵(cryo-pumps),用於在真空腔室內產生真空。The term "vacuum" as used throughout this disclosure can be understood as a technical vacuum having a vacuum pressure less than, for example, 10 mbar. Pressure in the vacuum chamber may be between about 10 -5 mbar to about 10 -8 mbar, in particular between 10 -5 mbar to 10 -7 mbar, and more particularly between about 10 -6 mbar to about 10 - Between 7 mbar. One or more vacuum pumps, such as turbo pumps and / or cryo-pumps, connected to the vacuum chamber may be provided for generating a vacuum in the vacuum chamber.

本揭露的載體220可以是靜電吸座(electrostatic chuck),其提供靜電力以固持基材及/或遮罩於載體220上。舉例來說,載體220包括電極裝置,其配置成用以提供作用於基材及遮罩上其中一者之吸引力。可將電極裝置嵌入主體225,或是提供給主體225,例如是放置在主體225上。根據可與此處所述的其他實施例結合的一些實施例,主體225是介電主體,像是介電板。介電主體可由介電材料製成,介電材料優選的是高導熱率介電材料,像是熱解氮化硼(pyrolytic boron nitride)、氮化鋁(aluminum nitride)、氮化矽(silicon nitride)、氧化鋁(alumina)、或是等效材料,但也可由聚醯亞胺(polyimide)等材料製成。在一些實施例中,電極裝置包括多個電極(像是一塊細金屬條),放置在介電板上且由薄介電層所覆蓋。The carrier 220 disclosed herein may be an electrostatic chuck, which provides an electrostatic force to hold the substrate and / or cover the carrier 220. For example, the carrier 220 includes an electrode device configured to provide an attractive force acting on one of the substrate and the mask. The electrode device may be embedded in the main body 225 or provided to the main body 225, for example, placed on the main body 225. According to some embodiments that may be combined with other embodiments described herein, the body 225 is a dielectric body, such as a dielectric plate. The dielectric body may be made of a dielectric material. The dielectric material is preferably a high thermal conductivity dielectric material, such as pyrolytic boron nitride, aluminum nitride, and silicon nitride. ), Alumina, or equivalent materials, but can also be made of materials such as polyimide. In some embodiments, the electrode device includes a plurality of electrodes (such as a thin metal strip) placed on a dielectric plate and covered by a thin dielectric layer.

電極裝置及特別是多個電極,可配置成用以提供吸引力,像是吸附力。吸引力可以是在多個電極(或支撐表面)及基材及/或遮罩之間的特定相對距離處,作用於基材及/或遮罩上的力。吸引力可以是由施加到多個電極裝置的電壓所提供的靜電力。The electrode device and, in particular, the plurality of electrodes may be configured to provide an attractive force, such as an attractive force. The attractive force may be a force acting on the substrate and / or the mask at a specific relative distance between the plurality of electrodes (or supporting surfaces) and the substrate and / or the mask. The attractive force may be an electrostatic force provided by a voltage applied to the plurality of electrode devices.

基材可被載體220提供的朝向支撐表面(例如是在垂直於傳輸方向的方向上)的吸引力吸引,載體可以是靜電吸座。吸引力可以強到足以固持基材,例如是藉由摩擦力將基材固持在垂直位置上。特別是,吸引力可配置成用以將基材固定至實質上無法移動的支撐表面上。舉例來說,為了利用摩擦力將0.5毫米(mm)的玻璃基材固持在垂直位置上,可利用大約50至100帕(N/m2 ,Pa)的吸引壓力,此取決於摩擦係數。The substrate may be attracted by the attractive force provided by the carrier 220 toward the support surface (for example, in a direction perpendicular to the transmission direction), and the carrier may be an electrostatic suction seat. The attractive force can be strong enough to hold the substrate, for example, to hold the substrate in a vertical position by friction. In particular, the attractive force may be configured to secure the substrate to a support surface that is substantially immovable. For example, in order to hold a glass substrate of 0.5 millimeters (mm) in a vertical position using friction, a suction pressure of about 50 to 100 Pa (N / m 2 , Pa) may be used, depending on the coefficient of friction.

根據可與此處所述的其他實施例結合的一些實施例,載體220配置成用於將基材及/或遮罩固持或支撐在實質上垂直的定向或實質上水平的定向。特別是,載體可配置成用於在垂直定向上傳輸。如在整個本揭露所使用的,特別是當涉及基板定向時,「實質上垂直」應理解為允許由垂直方向或定向偏差±20度或更少,例如是±10度或更少。可提供此偏差,例如是因為與垂直定向具有一些偏差的基材支撐可致使更穩定的基材位置。進一步來說,當基材被向前傾斜時,較少的粒子會到達基材表面。然而,例如是在沉積處理期間,基材定向被認為是實質上垂直,垂直被認為是與水平基材定向不同,水平基材定向被認為是水平±20度或更少。According to some embodiments that may be combined with other embodiments described herein, the carrier 220 is configured to hold or support the substrate and / or the mask in a substantially vertical orientation or a substantially horizontal orientation. In particular, the carrier may be configured for transmission in a vertical orientation. As used throughout this disclosure, and especially when referring to substrate orientation, "substantially vertical" is understood to allow deviations from the vertical direction or orientation by ± 20 degrees or less, such as ± 10 degrees or less. This deviation may be provided, for example, because a substrate support with some deviation from the vertical orientation may result in a more stable substrate position. Furthermore, when the substrate is tilted forward, fewer particles reach the surface of the substrate. However, for example, during the deposition process, the substrate orientation is considered to be substantially vertical, vertical is considered to be different from horizontal substrate orientation, and horizontal substrate orientation is considered to be horizontal ± 20 degrees or less.

「垂直方向」或「垂直定向」一詞應理解為與「水平方向」或「水平定向」區別。也就是說,「垂直方向」或「垂直定向」與例如是載體及基材的實質上垂直定向相關,其中由精確的垂直方向或垂直定向偏差一些角度,例如是上至10度或甚至上至15度,仍被認為是「實質上垂直方向」或「實質上垂直定向」。此垂直定向可以是實質上平行於重力。The term "vertical orientation" or "vertical orientation" should be understood as distinguishing from "horizontal orientation" or "horizontal orientation". That is, "vertical direction" or "vertical orientation" is related to, for example, the substantially vertical orientation of the carrier and the substrate, in which the precise vertical direction or vertical orientation deviates from some angles, such as up to 10 degrees or even up to 15 degrees is still considered "substantially vertical" or "substantially vertical". This vertical orientation may be substantially parallel to gravity.

此處所述的實施例可被用於在大面積基材上蒸發,例如是有機發光二極體顯示器的製造。特別是,根據此處所述的實施例的結構及方法所提供的基材是大面積基材。舉例來說,大面積基材或載體可以是對應於大約0.67m²(0.73m x 0.92m)表面積的第4.5代,對應於大約1.4m²(1.1m x 1.3m)表面積的第5代,對應於大約4.29 m²(1.95 m x 2.2 m)表面積的第7.5代,對應於大約5.7m²(2.2 m x 2.5 m)表面積的第8.5代,或甚至是對應於大約8.7 m²(2.85 m x 3.05 m)表面積的第10代。可類似地實施於甚至更高世代,像是第11代及第12代基材,與對應的基材面積。也可提供各世代的一半大小的基材於有機發光二極體顯示器的製造中。The embodiments described herein can be used for evaporation on large-area substrates, such as the manufacture of organic light emitting diode displays. In particular, the substrates provided by the structures and methods of the embodiments described herein are large-area substrates. For example, a large-area substrate or carrier may be the 4.5th generation corresponding to a surface area of approximately 0.67m² (0.73mx 0.92m), the 5th generation corresponding to a surface area of approximately 1.4m² (1.1mx 1.3m), and approximately 4.29 Generation 7.5 of m² (1.95 mx 2.2 m) surface area corresponds to generation 8.5 of surface area of approximately 5.7m² (2.2 mx 2.5 m), or even generation 10 of surface area of approximately 8.7 m² (2.85 mx 3.05 m). It can be similarly implemented in even higher generations, such as 11th and 12th generation substrates, and corresponding substrate areas. A half-size substrate of each generation can also be provided in the manufacture of organic light emitting diode displays.

根據可與此處所述的其他實施例結合的一些實施例,基材厚度可以是0.1至1.8mm。基材厚度可以是大約0.9mm或更少,像是0.5mm。此處使用的「基材」一詞可特別是包括實質上不可彎曲的基材,例如是晶片、透明晶體的切片像是藍寶石或其類似物、或玻璃板。然而,本揭露不限於此,且「基材」一詞可更包括可彎曲的基材,像是網(web)或箔(foil)。「不可彎曲的」一詞應理解為與「可彎曲的」區分。特別是,實質上不可彎曲的基材可以具有特定角度的可撓性,例如,玻璃板具有0.9mm或更小的厚度,像是0.5mm或更小,其中與可彎曲的基材相比,實質上不可彎曲的基材的可撓性較小。According to some embodiments that may be combined with other embodiments described herein, the substrate thickness may be 0.1 to 1.8 mm. The substrate thickness may be about 0.9 mm or less, such as 0.5 mm. The term "substrate" as used herein may particularly include a substrate that is substantially inflexible, such as a wafer, a slice of transparent crystal like sapphire or the like, or a glass plate. However, this disclosure is not limited to this, and the term "substrate" may further include a flexible substrate such as a web or foil. The term "inflexible" should be understood as distinguishing from "flexible". In particular, a substantially inflexible substrate may have flexibility at a specific angle, for example, a glass plate has a thickness of 0.9 mm or less, such as 0.5 mm or less, where compared to a bendable substrate, The substantially inflexible substrate has less flexibility.

根據此處所述的實施例,基材可以是由任何適合於材料沉積的材料製成。舉例來說,基材可以是由以下群組中選擇的材料所製成:玻璃(例如是鈉鈣玻璃(soda-lime glass)、硼矽玻璃(borosilicate glass)、及其類似物)、金屬、聚合物(polymer)、陶瓷(ceramic)、化合物材料(compound)、碳纖維材料(carbon fiber material)、或任何其他材料、或是可藉由沉積處理塗佈的材料的結合。According to the embodiments described herein, the substrate may be made of any material suitable for material deposition. For example, the substrate may be made of a material selected from the group: glass (such as soda-lime glass, borosilicate glass, and the like), metal, A polymer, ceramic, compound, carbon fiber material, or any other material, or a combination of materials that can be coated by a deposition process.

第3A圖示出根據此處所述的實施例,用於在沉積系統中非接觸地傳輸載體320的裝置的示意圖。第3A圖的裝置及載體320是類似於第2圖示出的裝置及載體,且不再重複描述類似或相同的元件。FIG. 3A shows a schematic diagram of an apparatus for contactlessly transporting a carrier 320 in a deposition system according to an embodiment described herein. The device and the carrier 320 in FIG. 3A are similar to the device and the carrier shown in FIG. 2, and similar or identical elements are not described repeatedly.

根據可與此處所述的其他實施例結合的一些實施例,載體320包括可偵測裝置340,其可被一或多個感測器230偵測以偵測載體320的存在。在一些實施方式中,例如是當可偵測裝置340位於個別的感測器的例如是上方,可偵測裝置340係配置以面向一或多個感測器230。根據一些實施例,一或多個感測器230面向可偵測裝置340提供的感測器追蹤,且致動器(像是一或多個主動磁鐵單元112)面向磁鐵結構222(特別是一或多個第一磁鐵單元)提供的致動器追蹤。可偵測裝置340可以具有第一側及相對於第一側的第二側。舉例來說,第一側可以是可偵測裝置340的較低側,且第二側可以是可偵測裝置340的較高側。一或多個感測器230可面向第一側。一或多個主動磁鐵單元112可面向第二側。According to some embodiments that can be combined with other embodiments described herein, the carrier 320 includes a detectable device 340 that can be detected by one or more sensors 230 to detect the presence of the carrier 320. In some embodiments, for example, when the detectable device 340 is located above an individual sensor, for example, the detectable device 340 is configured to face one or more sensors 230. According to some embodiments, one or more sensors 230 face the sensor tracking provided by the detectable device 340, and an actuator (such as one or more active magnet units 112) faces the magnet structure 222 (particularly one Or multiple first magnet units) provided by the actuator tracking. The detectable device 340 may have a first side and a second side opposite to the first side. For example, the first side may be the lower side of the detectable device 340, and the second side may be the higher side of the detectable device 340. One or more sensors 230 may face the first side. One or more active magnet units 112 may face the second side.

可偵測裝置340及磁鐵結構222可以是整體形成,或可被提供為單獨元件。根據可與此處所述的其他實施例結合的一些實施例,可偵測裝置340及磁鐵結構222(特別是一或多個第一磁鐵單元)可配置成相鄰於彼此,例如是在與傳輸方向1水平的平面上,像是實質上水平的平面上。舉例來說,可將可偵測裝置340附接至載體320的磁鐵結構222上,此載體320具有一或多個第一磁鐵單元。The detectable device 340 and the magnet structure 222 may be integrally formed, or may be provided as separate components. According to some embodiments that can be combined with other embodiments described herein, the detectable device 340 and the magnet structure 222 (especially one or more first magnet units) may be configured to be adjacent to each other, such as The transmission direction 1 is on a horizontal plane, like a substantially horizontal plane. For example, the detectable device 340 can be attached to the magnet structure 222 of the carrier 320, which has one or more first magnet units.

可偵測裝置340可配置在載體320的末端部分,且沿著傳輸方向1延伸。可偵測裝置340可由沉積系統的傳輸裝置的一或多個感測器230偵測,以決定載體320或載體320的末端相對於引導結構210的多個引導單元111中的至少一引導單元的位置。在此方面,可偵測裝置340也可稱為「感測器追蹤」。The detectable device 340 may be disposed at an end portion of the carrier 320 and extends along the transmission direction 1. The detectable device 340 may be detected by one or more sensors 230 of the transport device of the deposition system to determine the carrier 320 or the end of the carrier 320 relative to at least one of the plurality of guide units 111 of the guide structure 210. position. In this regard, the detectable device 340 may also be referred to as "sensor tracking".

載體具有末端部分,像是第一末端部分及相對於第一末端部分的第二末端部分。基材可位於第一末端部分及第二模端部分之間。第一末端部分可以是頂(或較上)末端部分,且第二末端部分可以是底(或較低)末端部分。第一末端部分及第二末端部分可實質上平行的延伸,舉例來說,在實質上水平方向上延伸。可提供可偵測裝置340於第一末端部分及/或第二末端部分。第3A圖的例子示例性地示出可偵測裝置340及第一末端部分處的磁鐵結構222,第一末端部分是載體320的頂或較上末端部分。可偵測裝置340及磁鐵結構222,特別是一或多個第一磁鐵單元,可面向傳輸裝置的引導結構210。一或多個第二磁鐵單元可位於第二末端部分,第二末端部分可以是載體320的底或較低末端部分。一或多個第二磁鐵單元可面向傳輸裝置的驅動結構。The carrier has a terminal portion, such as a first terminal portion and a second terminal portion opposite the first terminal portion. The substrate may be located between the first end portion and the second die end portion. The first end portion may be a top (or upper) end portion, and the second end portion may be a bottom (or lower) end portion. The first end portion and the second end portion may extend substantially in parallel, for example, in a substantially horizontal direction. A detectable device 340 may be provided at the first end portion and / or the second end portion. The example in FIG. 3A exemplarily shows the detectable device 340 and the magnet structure 222 at the first end portion, and the first end portion is the top or upper end portion of the carrier 320. The detectable device 340 and the magnet structure 222, particularly one or more first magnet units, can face the guide structure 210 of the transmission device. One or more second magnet units may be located at the second end portion, and the second end portion may be a bottom or lower end portion of the carrier 320. One or more second magnet units may face the driving structure of the transmission device.

根據可與此處所述的其他實施例結合的一些實施例,可偵測裝置340例如是在傳輸方向1上,在載體320的整體長度L上延伸的元件。載體320的長度L可沿傳輸方向1定義,例如是在沿傳輸方向1上的載體320的第一末端201及第二末端202之間。According to some embodiments that can be combined with other embodiments described herein, the detectable device 340 is, for example, an element extending in the transmission direction 1 over the entire length L of the carrier 320. The length L of the carrier 320 may be defined along the transmission direction 1, for example, between the first end 201 and the second end 202 of the carrier 320 in the transmission direction 1.

在一些實施方式中,可偵測裝置340包括或者是沿傳輸方向1改變的幾何輪廓,且可由一或多個感測器230偵測。一或多個感測器230可以是距離感測器,配置成用以偵測個別的感測器及幾何輪廓之間的距離,特別是個別的感測器及幾何輪廓面向感測器的表面之間的距離。此距離可由垂直於傳輸方向1的方向上測量,此方向像是垂直方向3或水平方向2。在一些實施例中,各個引導單元111包括個別的感測器,以偵測幾何輪廓。In some embodiments, the detectable device 340 includes or is a geometric profile that changes along the transmission direction 1 and can be detected by one or more sensors 230. The one or more sensors 230 may be distance sensors configured to detect the distance between the individual sensors and the geometric contour, especially the surface of the individual sensors and the geometric contour facing the sensor the distance between. This distance can be measured in a direction perpendicular to the transmission direction 1, which is like the vertical direction 3 or the horizontal direction 2. In some embodiments, each guide unit 111 includes an individual sensor to detect a geometric contour.

幾何輪廓可在載體320的第一末端201及第二末端202之間,沿傳輸方向1改變。幾何輪廓可提供第一末端201及第二末端202之間的感測器追蹤的延伸。如在整個本揭露所使用的「幾何輪廓」一詞是指具有在傳輸方向1上延伸的輪廓的一種輪廓或一種元素,且在傳輸方向1及垂直於傳輸方向1的至少一方向(像是垂直方向3)定義的平面上具有不連續(或改變)的橫截面形狀。當在傳輸方向1上看時,幾何輪廓可以是定義於載體320的第一末端201(例如是前緣的正面,其可定義傳輸方向1上載體320的最外邊界)及第二末端202(例如是後緣的背面,其可定義與傳輸方向1相反的方向上載體320的最外邊緣)之間。換句話說,改變的幾何輪廓不是指載體320的第一末端201或第二末端202的邊緣,而是指第一末端201及第二末端202之間的其他結構變化,其可由一或多個感測器230偵測。The geometric contour can be changed between the first end 201 and the second end 202 of the carrier 320 in the transmission direction 1. The geometric profile may provide an extension of the sensor tracking between the first end 201 and the second end 202. The term "geometric profile" as used throughout this disclosure refers to a profile or an element that has a profile extending in the transmission direction 1, and is in the transmission direction 1 and at least one direction perpendicular to the transmission direction 1 (like The vertical direction 3) has a discontinuous (or changed) cross-sectional shape on a defined plane. When viewed in the transmission direction 1, the geometric profile can be defined at the first end 201 of the carrier 320 (for example, the front side of the leading edge, which can define the outermost boundary of the carrier 320 in the transmission direction 1) and the second end 202 ( For example, the back surface of the trailing edge may define the outermost edge of the carrier 320 in a direction opposite to the transmission direction 1). In other words, the changed geometric profile does not refer to the edge of the first end 201 or the second end 202 of the carrier 320, but refers to other structural changes between the first end 201 and the second end 202, which can be changed by one or more Detected by the sensor 230.

根據可與此處所述的其他實施例結合的一些實施例,幾何輪廓包括一或多個形狀元素(shape element)。在一些實施方式中,可由以下群組中選擇出一或多個形狀元素:不連續(discontinuity)、傾斜(inclination)、弧形(arc shape)、或任何其之組合。舉例來說,幾何輪廓可以是沿載體220的長度延伸的一種元件,且具有一或多個形狀元素,像是傾斜342。According to some embodiments that may be combined with other embodiments described herein, the geometrical contour includes one or more shape elements. In some embodiments, one or more shape elements may be selected from the following group: discontinuity, inclination, arc shape, or any combination thereof. For example, the geometric profile may be an element that extends along the length of the carrier 220 and has one or more shape elements, such as an inclination 342.

在一些實施例中,一或多個形狀元素,像是傾斜,係配置在載體320的第一末端201及/或第二末端202上。舉例來說,至少一第一形狀元素可配置在第一末端201及/或至少一第二形狀元素可配置在第二末端202。此至少一第一形狀元素及此至少一第二形狀元素可以是實質上相同或可以是不同。在第3A圖的例子中,此至少一第一形狀元素及此至少一第二形狀元素二者在提供幾何輪廓的元素中都是傾斜。In some embodiments, one or more shape elements, such as inclined, are disposed on the first end 201 and / or the second end 202 of the carrier 320. For example, at least one first shape element may be disposed at the first end 201 and / or at least one second shape element may be disposed at the second end 202. The at least one first shape element and the at least one second shape element may be substantially the same or may be different. In the example of FIG. 3A, both the at least one first shape element and the at least one second shape element are inclined in the element providing the geometric outline.

此一或多個形狀元素可配置在載體320的末端,使得可決定載體的末端相對於引導結構210的位置。可控制引導單元111的一或多個主動磁鐵單元112以提供載體320在傳輸方向1上的平滑傳輸。特別是,可控制位於載體邊緣及/或和接近邊緣的致動器。舉例來說,致動器提供的磁力可以是連續增加或減少,以提供相鄰致動器/磁鐵單元之間的載體320的末端的平滑運輸。舉例來說,可減少致動器的操作,使得載體320「遠離」致動器時,致動器實質上不施加力於載體320上。The one or more shape elements may be arranged at the end of the carrier 320 so that the position of the end of the carrier relative to the guide structure 210 may be determined. The one or more active magnet units 112 of the guide unit 111 may be controlled to provide smooth transmission of the carrier 320 in the transmission direction 1. In particular, actuators located at and / or near the edges of the carrier can be controlled. For example, the magnetic force provided by the actuators may be continuously increased or decreased to provide smooth transport of the ends of the carrier 320 between adjacent actuator / magnet units. For example, the operation of the actuator may be reduced so that when the carrier 320 is “away” from the actuator, the actuator does not substantially exert a force on the carrier 320.

根據一些實施例,一或多個形狀元素中的獨立形狀元素可具有在傳輸方向1上,延著幾何輪廓及/或載體320的長度的一長度擴展。此獨立形狀元素的長度擴展可對應至幾何輪廓及/或載體320的長度的至少1%,特別是長度的至少4%,特別是長度的至少8%。According to some embodiments, the independent shape element of the one or more shape elements may have a length extension in the transmission direction 1 along the geometric contour and / or the length of the carrier 320. The length extension of this independent shape element may correspond to at least 1% of the length of the geometric contour and / or the carrier 320, in particular at least 4% of the length, and in particular at least 8% of the length.

第3A圖示例性地示出傾斜342作為一或多個形狀元素。然而,本揭露並不限於此,且可提供其他形狀元素,像是切口(cutout)或連續改變的形狀。在一些實施方式中,傾斜342可以是載體320相對於傳輸方向1被傾斜的表面。舉例來說,傾斜342可以是相對於水平平面傾斜。在一些實施例中,傾斜342係配置在載體320的第一末端201及/或第二末端202。舉例來說,至少一第一傾斜可配置在載體320的第一末端201,及/或至少一第二傾斜可配置在載體320的第二末端202。可在相反方向上傾斜此至少一第一傾斜及此至少一第二傾斜。特別是,此至少一第一傾斜及此至少一第二傾斜可以是鏡像對稱(mirror symmetrical)。FIG. 3A exemplarily illustrates the tilt 342 as one or more shape elements. However, the disclosure is not limited to this, and other shape elements may be provided, such as a cutout or a continuously changing shape. In some embodiments, the tilt 342 may be a surface on which the carrier 320 is tilted with respect to the transmission direction 1. For example, the tilt 342 may be tilted relative to a horizontal plane. In some embodiments, the tilt 342 is disposed on the first end 201 and / or the second end 202 of the carrier 320. For example, at least one first tilt may be configured at the first end 201 of the carrier 320, and / or at least one second tilt may be configured at the second end 202 of the carrier 320. The at least one first inclination and the at least one second inclination may be inclined in opposite directions. In particular, the at least one first tilt and the at least one second tilt may be mirror symmetrical.

感測器230可配置成用以面對傾斜342。特別是,當載體320在傳輸方向1上移動時,感測器230可配置成用以偵測傾斜342。感測器及傾斜之間偵測到的距離的增加或減少是取決於傳輸方向1及/或傾斜方向。可控制引導單元111的一或多個主動磁鐵單元以提供載體320在傳輸方向上的平滑傳輸。特別是,可控制位於傾斜處的致動器。舉例來說,基於傾斜提供的距離改變,以提供相鄰致動器/磁鐵單元之間的載體的末端的平滑運輸,可連續增加或減少致動器提供的磁力。特別是,在第3A圖中,載體左側的傾斜可致使感測器的偵測信號與載體向上移動時的信號相同。控制器可減少致動器的力,例如是藉由減少致動器的電流減少致動器的力,使得當載體「遠離」致動器時,左側的致動器不在載體上施加磁懸浮力。The sensor 230 may be configured to face the tilt 342. In particular, when the carrier 320 moves in the transmission direction 1, the sensor 230 may be configured to detect the tilt 342. The increase or decrease in the distance detected between the sensor and the tilt depends on the transmission direction 1 and / or the tilt direction. One or more active magnet units of the guide unit 111 may be controlled to provide smooth transmission of the carrier 320 in the transmission direction. In particular, the actuator located at the tilt can be controlled. For example, changing the distance provided based on tilt to provide smooth transportation of the end of the carrier between adjacent actuator / magnet units can continuously increase or decrease the magnetic force provided by the actuator. In particular, in FIG. 3A, the tilt on the left side of the carrier can cause the detection signal of the sensor to be the same as the signal when the carrier moves upward. The controller can reduce the force of the actuator, for example, by reducing the current of the actuator, so that when the carrier is "away" from the actuator, the left actuator does not apply a magnetic levitation force on the carrier.

第3B圖示出根據此處所述的實施例,用於在沉積系統中非接觸地傳輸載體320’的裝置的示意圖。第3B圖的裝置及載體320’是類似於第3A圖示出的裝置及載體,且不再重複描述類似或相同的元件。Figure 3B shows a schematic diagram of an apparatus for non-contact transport of a carrier 320 'in a deposition system according to an embodiment described herein. The device and the carrier 320 'of FIG. 3B are similar to the device and the carrier shown in FIG. 3A, and similar or identical elements are not described repeatedly.

根據本揭露的方面,用於在沉積系統中非接觸地傳輸載體320’的裝置,包括一或多個感測器330,配置成用以偵測載體320’的存在。一或多個感測器330中的各個感測器在載體320’的傳輸方向1上具有一感測器擴展d,其中此感測器擴展d可以是傳輸方向1上的載體擴展(也就是載體的長度L)的至少1%,特別是至少2%,特別是至少4%,特別是至少8%,且更特別是至少10%。感測器擴展d可以是載體320’的長度L的甚至10%或更多,特別是15%或更多,特別是20%或更多,且更特別是25%或更多。According to an aspect of the present disclosure, a device for contactlessly transporting a carrier 320 'in a deposition system includes one or more sensors 330 configured to detect the presence of the carrier 320'. Each of the one or more sensors 330 has a sensor extension d in the transmission direction 1 of the carrier 320 ′, where the sensor extension d may be a carrier extension in the transmission direction 1 (that is, The length L) of the carrier is at least 1%, especially at least 2%, especially at least 4%, especially at least 8%, and more particularly at least 10%. The sensor extension d may be even 10% or more of the length L of the carrier 320 ', especially 15% or more, especially 20% or more, and more particularly 25% or more.

一或多個感測器330在傳輸方向1上延伸。當載體320’(或是載體320’的感測器追蹤)遠離感測器330時,感測器330的信號或信號值以一種方式逐漸改變,就如同載體320’(緩慢)向上移動。主動磁鐵單元112提供的力可以是根據信號的改變(逐漸)減少至0,使得可達成載體320’的平滑傳輸。可由延伸的感測器達成逐漸(或斜向)的信號改變。相反的,例如是第2圖所示出的短感測器,當感測器到達載體的邊緣時,提供突然的信號改變。本實施例可減少或甚至避免脈衝狀的力的發生,脈衝狀的力可能導致載體突然地加速或減速。One or more sensors 330 extend in the transmission direction 1. When the carrier 320 ' (or the sensor tracking of the carrier 320 ') moves away from the sensor 330, the signal or signal value of the sensor 330 is gradually changed in a manner, just as the carrier 320 ' The force provided by the active magnet unit 112 may be (gradually) reduced to 0 according to a change in the signal, so that a smooth transmission of the carrier 320 'may be achieved. Gradual (or oblique) signal changes can be achieved by extended sensors. In contrast, for example, the short sensor shown in Figure 2 provides a sudden signal change when the sensor reaches the edge of the carrier. This embodiment can reduce or even avoid the occurrence of pulse-like forces, which may cause the carrier to suddenly accelerate or decelerate.

第4A及4B圖示出根據此處所述的實施例,用於非接觸地傳輸載體410的裝置400的示意圖。可根據此處所述的實施例配置裝置及載體410。4A and 4B illustrate schematic diagrams of an apparatus 400 for contactlessly transporting a carrier 410 according to the embodiments described herein. The device and the carrier 410 may be configured according to the embodiments described herein.

裝置400包括具有引導結構470傳輸裝置,根據本揭露,此引導結構470包括多個主動磁性單元475、用於偵測載體410的存在的一或多個感測器(未繪示)、及載體410。此一或多個感測器可配置成用以偵測此一或多個感測器及載體410的可偵測裝置之間的距離。裝置400可進一步包括控制器,配置成用以基於一或多個感測器所提供的偵測資料,選擇性地控制多個主動磁鐵單元475中的至少一主動磁鐵單元。根據此處所述的一些實施例,傳輸裝置可配置在真空系統的真空腔室中。真空腔室可以是真空沉積腔室。然而,本揭露並不限於真空系統,且此處所述的載體及傳輸裝置可被實施於大氣環境中。The device 400 includes a transmission device with a guiding structure 470. According to the present disclosure, the guiding structure 470 includes a plurality of active magnetic units 475, one or more sensors (not shown) for detecting the presence of the carrier 410, and the carrier. 410. The one or more sensors may be configured to detect a distance between the one or more sensors and a detectable device of the carrier 410. The device 400 may further include a controller configured to selectively control at least one active magnet unit of the plurality of active magnet units 475 based on detection data provided by one or more sensors. According to some embodiments described herein, the transfer device may be configured in a vacuum chamber of a vacuum system. The vacuum chamber may be a vacuum deposition chamber. However, this disclosure is not limited to a vacuum system, and the carriers and transport devices described herein may be implemented in an atmospheric environment.

載體410可包括具有一或多個第一磁鐵單元的磁鐵結構,此一或多個第一磁鐵單元配置成用以與真空系統的引導結構470磁性地相互作用,以提供用於磁懸浮載體410的磁懸浮力。一或多個第一磁鐵單元可以是第一被動磁性單元450。引導結構470可在載體410的傳輸方向1上延伸,此傳輸方向1可以是水平方向。引導結構470可包括多個主動磁性單元475。載體410可以是沿著引導結構470可移動的。第一被動磁性單元450(例如是一塊鐵磁材料)及引導結構470的多個主動磁性單元475,可配置成用於提供用於磁懸浮載體410的第一磁懸浮力。此處所述的用於磁懸浮的裝置,是用於提供非接觸的力以磁懸浮(例如是載體410)的裝置。The carrier 410 may include a magnet structure having one or more first magnet units configured to magnetically interact with the guide structure 470 of the vacuum system to provide a magnetic suspension carrier 410. Magnetic levitation force. The one or more first magnet units may be a first passive magnetic unit 450. The guide structure 470 may extend in a transmission direction 1 of the carrier 410, and the transmission direction 1 may be a horizontal direction. The guide structure 470 may include a plurality of active magnetic units 475. The carrier 410 may be movable along the guide structure 470. The first passive magnetic unit 450 (for example, a piece of ferromagnetic material) and the plurality of active magnetic units 475 of the guiding structure 470 may be configured to provide a first magnetic levitation force for the magnetic levitation carrier 410. The device for magnetic levitation described herein is a device for providing a non-contact force to magnetic levitation (for example, the carrier 410).

根據一些實施例,傳輸裝置可進一步包括驅動結構480。此驅動結構480可包括多個其他磁鐵單元,像是其他主動磁性單元。載體410可包括一或多個第二磁鐵單元,配置成用以與驅動結構480磁性地相互作用。特別是,此一或多個第二磁性單元可以是第二被動磁性單元460,例如是一塊鐵磁材料,以與驅動結構480的其他主動磁性單元485相互作用。According to some embodiments, the transmission device may further include a driving structure 480. The driving structure 480 may include a plurality of other magnet units, such as other active magnetic units. The carrier 410 may include one or more second magnet units configured to magnetically interact with the driving structure 480. In particular, the one or more second magnetic units may be a second passive magnetic unit 460, such as a piece of ferromagnetic material, to interact with other active magnetic units 485 of the driving structure 480.

第4B圖示出傳輸裝置的另一側視圖。第4B圖中,示出多個主動磁性單元475中的一主動磁性單元。主動磁性單元提供與載體410的第一被動磁性單元450相互作用的磁力。舉例來說,第一被動磁性單元450可以是鐵磁材料桿件(rod)。一桿件可以是載體410連接至支撐結構412的一部分。可由載體410的主體提供支撐結構412。此桿件或此第一被動磁性單元亦可分別與支撐結構412一體成形,以支撐基材10。可偵測裝置可被附接至第一被動磁性單元450,或可以是由第一被動磁性單元450提供。載體410可進一步包括第二被動磁性單元460,例如是其他桿件。此其他桿件可被連接至載體410。此桿件或第二被動磁性單元亦可分別與支撐結構412一體成形。Fig. 4B shows another side view of the transmission device. FIG. 4B illustrates an active magnetic unit of the plurality of active magnetic units 475. The active magnetic unit provides a magnetic force that interacts with the first passive magnetic unit 450 of the carrier 410. For example, the first passive magnetic unit 450 may be a rod of a ferromagnetic material. A rod may be part of the carrier 410 connected to the support structure 412. The support structure 412 may be provided by the body of the carrier 410. The rod member or the first passive magnetic unit may also be integrally formed with the supporting structure 412 to support the substrate 10. The detectable device may be attached to the first passive magnetic unit 450 or may be provided by the first passive magnetic unit 450. The carrier 410 may further include a second passive magnetic unit 460, such as other rods. This other rod may be connected to the carrier 410. This rod or the second passive magnetic unit may also be integrally formed with the support structure 412, respectively.

此處使用的「被動」磁性單元一詞是用以區分「主動」磁性單元的概念。被動磁性單元可以是指具有磁性性質的元件,此被動磁性單元至少在傳輸裝置的操作期間沒有受到主動控制或調整。舉例來說,一般來說,在載體移動通過真空腔室或真空系統的期間,被動磁性單元(例如是載體的桿件或其他桿件)的磁性性質沒有受到主動控制。根據可與此處所述的其他實施例結合的一些實施例,傳輸裝置的控制器不是配置成用以控制被動磁性單元。被動磁性單元可適於產生磁場,例如是靜態磁場。被動磁性單元可以不是配置成用於產生可調整磁場。被動磁性單元可以是磁性材料,像是鐵磁材料、永久磁鐵,或是可具有永久磁性性質。The term "passive" magnetic unit is used here to distinguish the concept of "active" magnetic unit. A passive magnetic unit may refer to an element having magnetic properties, and this passive magnetic unit is not actively controlled or adjusted at least during operation of the transmission device. For example, in general, the magnetic properties of a passive magnetic unit (such as a rod or other rod of the carrier) are not actively controlled during the movement of the carrier through a vacuum chamber or vacuum system. According to some embodiments that can be combined with other embodiments described herein, the controller of the transmission device is not configured to control the passive magnetic unit. The passive magnetic unit may be adapted to generate a magnetic field, such as a static magnetic field. The passive magnetic unit may not be configured to generate an adjustable magnetic field. The passive magnetic unit may be a magnetic material, such as a ferromagnetic material, a permanent magnet, or may have permanent magnetic properties.

根據此處所述的實施例,多個主動磁性單元475在第一被動磁性單元450上提供磁力,從而在載體410上提供磁力。多個主動磁性單元475磁懸浮載體410。其他主動磁性單元485可在真空腔室中驅動載體410,例如是沿著傳輸方向1驅動載體410。當載體410被位於其上方的多個主動磁性單元475磁懸浮時,多個其他主動磁性單元485形成用於在傳輸方向1上移動載體410的驅動結構。其他主動磁性單元485可與第二被動磁性單元460相互作用,以提供沿著傳輸方向1的力。舉例來說,第二被動磁性單元460可包括多個永久磁鐵,其係以交替的極性配置。所產生的第二被動磁性單元460的磁場可與多個其他主動磁性單元485相互作用,以在載體410被磁懸浮時移動載體410。According to the embodiments described herein, the plurality of active magnetic units 475 provide a magnetic force on the first passive magnetic unit 450, thereby providing a magnetic force on the carrier 410. A plurality of active magnetic units 475 magnetically levitate the carrier 410. The other active magnetic unit 485 can drive the carrier 410 in the vacuum chamber, for example, the carrier 410 is driven along the transmission direction 1. When the carrier 410 is magnetically levitated by a plurality of active magnetic units 475 located above it, a plurality of other active magnetic units 485 form a driving structure for moving the carrier 410 in the transmission direction 1. The other active magnetic unit 485 may interact with the second passive magnetic unit 460 to provide a force in the transmission direction 1. For example, the second passive magnetic unit 460 may include a plurality of permanent magnets configured with alternating polarities. The generated magnetic field of the second passive magnetic unit 460 may interact with a plurality of other active magnetic units 485 to move the carrier 410 when the carrier 410 is magnetically levitated.

為了利用多個主動磁性單元475磁懸浮載體410,及/或為了利用多個其他主動磁性單元485移動載體410,可控制主動磁性單元以提供可調整磁場。可調整磁場可以是靜態或動態磁場。根據可與此處所述的其他實施例結合的實施例,主動磁性單元係配置成用於產生磁場,以提供沿著垂直方向3延伸的磁懸浮力。根據可與此處所述的進一步的實施例結合的其他實施例,主動磁性單元可配置成用於提供沿著橫向方向延伸的磁力。如此處所述的主動磁性單元,可以是、或包括由以下群組中選擇出的元件:磁性裝置、螺線管(solenoid)、線圈(coil)、超導磁鐵(superconducting)、或任何上述之組合。In order to utilize multiple active magnetic units 475 magnetically levitating the carrier 410, and / or to use multiple other active magnetic units 485 to move the carrier 410, the active magnetic units may be controlled to provide an adjustable magnetic field. The adjustable magnetic field can be a static or dynamic magnetic field. According to embodiments that can be combined with other embodiments described herein, the active magnetic unit is configured to generate a magnetic field to provide a magnetic levitation force extending in the vertical direction 3. According to other embodiments that may be combined with further embodiments described herein, the active magnetic unit may be configured to provide a magnetic force extending in a lateral direction. An active magnetic unit as described herein may be or include components selected from the group consisting of a magnetic device, a solenoid, a coil, a superconducting magnet, or any of the above combination.

此處所述的實施例係有關於非接觸地磁懸浮、載體、基材及/或遮罩的傳輸及/或對準。本揭露是有關於一種載體,其可包括以下群組中的一或多個元件:支撐基材的載體、沒有基材的載體、基材、或由支撐件支撐的基材。如在整個本揭露所使用的「非接觸」一詞可理解為,例如是載體及基材的重量,並非由機械接觸或機械力固持,而是由磁力固持。特別是,載體是利用磁力而非機械力,被固持在磁懸浮或漂浮狀態中。舉例來說,此處所述的傳輸裝置可以沒有支撐載體重量的機械裝置,像是機械軌道。在一些實施方式中,在載體在真空系統中的磁懸浮、及例如是移動期間,載體及其他裝置之間可以完全沒有機械接觸。The embodiments described herein relate to the transmission and / or alignment of non-contact geomagnetic levitation, carriers, substrates and / or masks. The disclosure relates to a carrier, which may include one or more elements in the following group: a carrier supporting a substrate, a carrier without a substrate, a substrate, or a substrate supported by a support. As used throughout this disclosure, the term "non-contact" can be understood as, for example, the weight of the carrier and the substrate, not held by mechanical contact or mechanical force, but by magnetic force. In particular, the carrier is held in a magnetically levitated or floating state using magnetic force rather than mechanical force. For example, the transfer device described herein may not have a mechanical device that supports the weight of the carrier, such as a mechanical track. In some embodiments, there may be no mechanical contact between the carrier and other devices during magnetic levitation of the carrier in a vacuum system, and for example during movement.

根據本揭露的實施例,磁懸浮(levitating or levitation)是指物體的狀態,其中此物體漂浮而沒有機械接觸或支撐。進一步來說,移動物體是指提供驅動力,例如是在不同於磁懸浮力的方向的力,其中此物體從一個位置被移動至另一不同的位置。舉例來說,可將物體像是載體磁懸浮,也就是藉由抵銷重力的力磁懸浮,且當載體被磁懸浮時,其可在不同於平行於重力的方向上被移動。According to an embodiment of the present disclosure, magnetic levitation (levitating or levitation) refers to a state of an object, wherein the object floats without mechanical contact or support. Further, moving an object refers to providing a driving force, for example, a force in a direction different from the magnetic levitation force, where the object is moved from one position to another different position. For example, an object can be magnetically suspended from a carrier, that is, magnetically suspended by a force that cancels gravity, and when the carrier is magnetically suspended, it can be moved in a direction different from the direction parallel to gravity.

根據此處所述的實施例,載體的非接觸磁懸浮及傳輸是有利的,使得在載體的傳輸或對準期間,沒有因載體及部分傳輸裝置(像是機械軌道)之間的機械接觸而產生粒子。據此,此處所述的實施例提供沉積於基材上的層改善的純度及均勻度,特別是由於當利用非接觸磁懸浮、傳輸、及/或對準時,粒子的產生被最小化。According to the embodiments described herein, non-contact magnetic levitation and transfer of the carrier is advantageous, so that during the transfer or alignment of the carrier, there is no mechanical contact between the carrier and part of the transfer device (such as a mechanical track) particle. Accordingly, the embodiments described herein provide improved purity and uniformity of a layer deposited on a substrate, particularly since particle generation is minimized when utilizing non-contact magnetic levitation, transport, and / or alignment.

第5圖示出根據此處所述的實施例,用於處理基材的系統500。此系統500可以是真空系統,此系統500可配置成用於沉積一或多層(例如是一或多層的有機材料)於基材10上。FIG. 5 illustrates a system 500 for processing a substrate according to an embodiment described herein. The system 500 may be a vacuum system, and the system 500 may be configured to deposit one or more layers (eg, one or more organic materials) on the substrate 10.

系統500包括沉積腔室(像是真空腔室502)、根據此處所述的實施例的載體520、及傳輸裝置510配置成用於在沉積腔室中傳輸載體520。在一些實施方式中,系統500包括沉積腔室中的一或多個材料沉積源580。在沉積處理(像是真空沉積處理)期間,載體520可配置成用以固持基材10。系統500可配置成用於,例如是有機材料的蒸發,以製造有機發光二極體裝置。在另一例子中,系統500可配置成用於化學氣相沉積或物理氣相沉積,像是濺射沉積。The system 500 includes a deposition chamber (such as a vacuum chamber 502), a carrier 520 according to embodiments described herein, and a transfer device 510 configured to transport the carrier 520 in the deposition chamber. In some embodiments, the system 500 includes one or more material deposition sources 580 in a deposition chamber. During a deposition process, such as a vacuum deposition process, the carrier 520 may be configured to hold the substrate 10. The system 500 may be configured for, for example, evaporation of organic materials to manufacture organic light emitting diode devices. In another example, the system 500 may be configured for chemical vapor deposition or physical vapor deposition, such as sputtering deposition.

在一些實施方式中,一或多個材料沉積源580可以是蒸發源,特別是用於沉積一或多種有機材料至基材上,以形成有機發光二極體裝置層的蒸發源。例如是在層沉積的處理期間,用於支撐基材10的載體520可被傳輸至沉積腔室中,並通過沉積腔室,且特別是沿傳輸路徑(像是線性傳輸路徑)通過沉積區域。In some embodiments, the one or more material deposition sources 580 may be evaporation sources, in particular evaporation sources for depositing one or more organic materials onto a substrate to form an organic light emitting diode device layer. For example, during the process of layer deposition, the carrier 520 used to support the substrate 10 may be transferred into and through the deposition chamber, and especially along a transfer path (like a linear transfer path) through the deposition area.

可由一或多個材料沉積源580在朝向沉積區域的發射方向上發射材料,其中待塗佈的基材10位於此沉積區域中。舉例來說,此一或多個材料沉積源580可提供具有多個開口(openings)及/或管口(nozzles)的線源(line source),此線源係配置在沿著一或多個材料沉積源580的長度的至少一線中。可經由多個開口及/或管口射出材料。Material may be emitted by one or more material deposition sources 580 in an emission direction toward a deposition area, where the substrate 10 to be coated is located in this deposition area. For example, the one or more material deposition sources 580 may provide a line source having a plurality of openings and / or nozzles. The line source is configured along one or more The material deposition source 580 is in at least one line in length. Material may be ejected through multiple openings and / or nozzles.

如第5圖所示出,可提供相鄰於真空腔室502的其他腔室。真空腔室502可藉由具有閥門外殼504及閥門單元506的閥門,與相鄰腔室分離。其上有基材10的載體520被置入真空腔室502(如箭頭所示)之後,可將閥門單元506關閉。藉由產生技術真空,例如是利用連接至真空腔室502的真空泵,可獨立地控制真空腔室502中的大氣。As shown in FIG. 5, other chambers adjacent to the vacuum chamber 502 may be provided. The vacuum chamber 502 can be separated from an adjacent chamber by a valve having a valve housing 504 and a valve unit 506. After the carrier 520 with the substrate 10 thereon is placed in the vacuum chamber 502 (as shown by the arrow), the valve unit 506 can be closed. By generating a technical vacuum, for example, using a vacuum pump connected to the vacuum chamber 502, the atmosphere in the vacuum chamber 502 can be independently controlled.

根據一些實施例,在沉積材料的沉積期間,載體520、基材10、及可選擇的遮罩20是靜態或動態。根據此處所述的一些實施例,可提供動態沉積處理,例如是用於製造有機發光二極體裝置。According to some embodiments, during the deposition of the deposition material, the carrier 520, the substrate 10, and the optional mask 20 are static or dynamic. According to some embodiments described herein, a dynamic deposition process may be provided, such as for manufacturing an organic light emitting diode device.

在一些實施方式中,系統500可包括一或多個傳輸路徑,其延伸通過真空腔室502。載體520可配置成用於沿一或多個傳輸路徑傳輸,例如是傳輸通過一或多個材料沉積源580。即使第5圖中由箭頭示例性地示出一個傳輸路徑,應理解的是本揭露並不限於此,且可提供二或多個傳輸路徑。舉例來說,可配置實質上彼此互相平行的至少兩個傳輸路徑,用於傳輸個別的載體。可將此一或多個材料沉積源580配置在兩個傳輸路徑之間。In some embodiments, the system 500 may include one or more transmission paths that extend through the vacuum chamber 502. The carrier 520 may be configured for transmission along one or more transmission paths, such as transmission through one or more material deposition sources 580. Even though one transmission path is exemplarily shown by an arrow in FIG. 5, it should be understood that the present disclosure is not limited thereto, and two or more transmission paths may be provided. For example, at least two transmission paths substantially parallel to each other may be configured for transmitting individual carriers. This one or more material deposition sources 580 may be configured between two transmission paths.

第6圖示出根據此處所述的進一步的實施例,用於處理(像是真空處理)基材10的系統600的示意圖。FIG. 6 shows a schematic diagram of a system 600 for processing (such as vacuum processing) a substrate 10 according to a further embodiment described herein.

根據本揭露,系統600包括二或多個處理區域及一傳輸裝置660,配置成用於依序傳輸支撐基材10及可選擇的遮罩的載體601至二或多個處理區域。舉例來說,傳輸裝置660可配置成用於沿傳輸方向1傳輸載體601,通過二或多個處理區域以進行基材處理。換句話說,利用相同的載體傳輸基材10通過多個處理區域。特別是,在處理區域中的基材處理及後續的處理區域中的基材處理之間,沒有將基材10從載體601上移除,也就是說,基材停留在相同的載體上以進行二或多個基材處理程序。根據一些實施例,可根據此處所述的實施例配置載體601。可選擇地或替代地,傳輸裝置660可配置成如關於,例如是第4A及4B圖所述。According to the present disclosure, the system 600 includes two or more processing regions and a transfer device 660 configured to sequentially transfer the carrier substrate 601 to the two or more processing regions supporting the support substrate 10 and an optional mask. For example, the transporting device 660 may be configured to transport the carrier 601 in the transporting direction 1 through two or more processing areas for substrate processing. In other words, the same carrier is used to transport the substrate 10 through a plurality of processing regions. In particular, between the substrate processing in the processing region and the substrate processing in the subsequent processing region, the substrate 10 is not removed from the carrier 601, that is, the substrate stays on the same carrier to perform Two or more substrate processing procedures. According to some embodiments, the carrier 601 may be configured according to the embodiments described herein. Alternatively or alternatively, the transmission device 660 may be configured as described with respect to, for example, Figures 4A and 4B.

如第6圖所示例性的示出,二或多個處理區域可包括第一沉積區域608及第二沉積區域612。可選擇地,第一沉積區域608及第二沉積區域612之間可提供傳輸區域610。可在一個真空腔室中提供多個區域,像是二或多個處理區域及傳輸區域。可選擇地,彼此連接的不同的真空腔室中可提供多個區域。舉例來說,各個真空腔室可提供一個區域。特別是,第一真空腔室可提供第一沉積區域608,第二真空腔室可提供傳輸區域610,且第三真空腔室可提供第二沉積區域612。在一些實施方式中,第一真空腔室及第三真空腔室可以是指「沉積腔室」。第二真空腔室可以是指「處理腔室」。可提供其他真空腔室或區域相鄰於例如是第6圖所示出的區域。As exemplarily shown in FIG. 6, the two or more processing regions may include a first deposition region 608 and a second deposition region 612. Alternatively, a transmission region 610 may be provided between the first deposition region 608 and the second deposition region 612. Multiple areas can be provided in one vacuum chamber, such as two or more processing areas and transfer areas. Alternatively, multiple regions may be provided in different vacuum chambers connected to each other. For example, each vacuum chamber may provide one area. In particular, the first vacuum chamber may provide a first deposition region 608, the second vacuum chamber may provide a transfer region 610, and the third vacuum chamber may provide a second deposition region 612. In some embodiments, the first vacuum chamber and the third vacuum chamber may be referred to as "deposition chambers". The second vacuum chamber may be referred to as a "processing chamber". Other vacuum chambers or areas may be provided adjacent to the area shown in FIG. 6, for example.

真空腔室或區域可藉由具有閥門外殼604及閥門單元605的閥門,與相鄰區域分離。其上有基材10的載體601被置入一區域(像是第二沉積區域612)之後,可將閥門單元605關閉。藉由產生技術真空(例如是利用連接至區域的真空泵)及/或藉由置入一或多個處理氣體,至例如是第一沉積區域608及/或第二沉積區域612中,可獨立地控制區域中的大氣。可提供傳輸路徑,像是線性傳輸路徑,以傳輸其上有基材10的載體601進入、通過、及離開區域。傳輸路徑可延伸,其至少部分通過二或多個處理區域(像是第一沉積區域608及第二沉積區域612)及可選擇地通過傳輸區域610。The vacuum chamber or area can be separated from the adjacent area by a valve having a valve housing 604 and a valve unit 605. After the carrier 601 with the substrate 10 thereon is placed in an area (such as the second deposition area 612), the valve unit 605 can be closed. Independently by generating a technical vacuum (e.g., using a vacuum pump connected to the area) and / or by placing one or more process gases into, e.g., the first deposition area 608 and / or the second deposition area 612 Controls the atmosphere in the area. A transmission path, such as a linear transmission path, can be provided to transport the carrier 601 with the substrate 10 on it to enter, pass through, and leave the area. The transfer path may extend at least partially through two or more processing regions (such as the first deposition region 608 and the second deposition region 612) and optionally through the transfer region 610.

系統600可包括傳輸區域610。在一些實施例中,可省略傳輸區域610。可藉由旋轉模組、傳輸模組、或其之組合提供傳輸區域610。第6圖示出旋轉模組及傳輸模組的組合。在旋轉模組中,配置於旋轉模組上的軌道裝置及載體可繞著旋轉軸(像是垂直旋轉軸)旋轉。舉例來說,可將載體由系統600的左側傳輸至系統600的右側,或反之亦然。傳輸模組可包括交叉軌道,使得可將載體傳輸通過不同方向上(例如是互相垂直的方向上)的傳輸模組。The system 600 may include a transmission area 610. In some embodiments, the transmission area 610 may be omitted. The transmission area 610 may be provided by a rotation module, a transmission module, or a combination thereof. FIG. 6 shows a combination of a rotation module and a transmission module. In the rotation module, the track device and the carrier arranged on the rotation module can rotate around a rotation axis (such as a vertical rotation axis). For example, the carrier may be transferred from the left side of the system 600 to the right side of the system 600, or vice versa. The transmission module may include a cross track, so that the carrier can be transmitted through the transmission modules in different directions (for example, directions perpendicular to each other).

在沉積區域中,像是第一沉積區域608及第二沉積區域612中,可提供一或多個沉積源。舉例來說,可提供第一沉積源630於第一沉積區域608中。可提供第二沉積源650於第二沉積區域612中。此一或多個沉積源可以是蒸發源,配置成用於沉積一或多個有機層於基材10上以形成有機層疊,此有機層疊用於有機發光二極體裝置中。In the deposition area, such as the first deposition area 608 and the second deposition area 612, one or more deposition sources may be provided. For example, a first deposition source 630 may be provided in the first deposition region 608. A second deposition source 650 may be provided in the second deposition region 612. The one or more deposition sources may be evaporation sources configured to deposit one or more organic layers on the substrate 10 to form an organic stack, and the organic stack is used in an organic light emitting diode device.

第7圖示出根據此處所述的實施例,在沉積系統(像是真空系統)中非接觸地傳輸載體的方法700的流程圖。方法700可利用根據本揭露的載體、裝置、及系統。FIG. 7 shows a flowchart of a method 700 for non-contact transport of a carrier in a deposition system, such as a vacuum system, according to an embodiment described herein. The method 700 may utilize carriers, devices, and systems according to the present disclosure.

方法700包括方塊710及方塊720,方塊710包括偵測載體的可偵測裝置的第一側,方塊720包括控制配置在可偵測裝置的第二側的至少一主動磁鐵單元,其中第一側與第二側相對。在一些實施方式中,當偵測到的信號示出(例如是距離上的)改變,方法700可決定(例如是沉積系統中的載體的末端的)位置。根據一些實施例,二或多個感測器可形成一組,基於此組控制個別的主動磁鐵單元。舉例來說,若由主動磁鐵單元之感測器所提供的信號及由感測器的一或多個相鄰感測器所提供的信號彼此不同,則可控制主動磁鐵單元。The method 700 includes a block 710 and a block 720. The block 710 includes a first side of a detectable device that detects a carrier. The block 720 includes at least one active magnet unit configured to be disposed on a second side of the detectable device, wherein the first side Opposite the second side. In some embodiments, when the detected signal shows a change (eg, in distance), the method 700 may determine a position (eg, at the end of the carrier in the deposition system). According to some embodiments, two or more sensors may form a group based on which individual active magnet units are controlled. For example, if the signals provided by the sensors of the active magnet unit and the signals provided by one or more adjacent sensors of the sensor are different from each other, the active magnet unit may be controlled.

在一實施例中,根據偵測信號,可改變流動經至少一主動磁鐵單元的電流。舉例來說,載體「遠離」時,主動磁鐵單元的電流可以是漸漸或連續地減少至0。進一步來說,載體「接近」或「進入」時,主動磁鐵單元的電流可以是漸漸或連續地從0增加至設定值。In one embodiment, the current flowing through the at least one active magnet unit can be changed according to the detection signal. For example, when the carrier is “away”, the current of the active magnet unit may be gradually or continuously reduced to zero. Further, when the carrier is "close" or "entering", the current of the active magnet unit may gradually or continuously increase from 0 to a set value.

根據此處所述的實施例,利用電腦程式、軟體、電腦軟體產品、及相關的控制器,可執行用於在沉積系統中非接觸地傳輸載體的方法,此控制器具有中央處理器(CPU)、記憶體、使用者介面、及輸入及輸出裝置,此輸入及輸入裝置可與載體、裝置、及/或系統的相應的組件通信。According to the embodiments described herein, a computer program, software, computer software products, and related controllers can be used to perform a method for non-contact transfer of a carrier in a deposition system, the controller having a central processing unit (CPU ), Memory, user interface, and input and output devices, the input and input devices can communicate with the corresponding components of the carrier, device, and / or system.

根據本揭露的實施例,一或多個主動磁鐵單元及一或多個感測器係配置在引導空間的相對側。特別是,此一或多個主動磁鐵單元及此一或多個感測器係配置在載體的磁鐵結構的相對側。空間中可有效地施行磁引導。進一步來說,可避免磁引導及一或多個感測器之間的干擾,且可達成載體在傳輸方向上的平滑傳輸。可減少或甚至避免因載體不穩定的傳輸而造成的基材破損及/或粒子的產生。According to the embodiment of the present disclosure, one or more active magnet units and one or more sensors are disposed on opposite sides of the guide space. In particular, the one or more active magnet units and the one or more sensors are disposed on opposite sides of the magnet structure of the carrier. Magnetic guidance can be effectively implemented in space. Further, interference between magnetic guidance and one or more sensors can be avoided, and smooth transmission in the transmission direction of the carrier can be achieved. It is possible to reduce or even avoid substrate damage and / or particle generation due to unstable transport of the carrier.

雖然上述內容是關於本揭露的實施例,但可在不背離基本範圍的情況下,設計出本揭露的其他和更進一步的實施例,範圍係由下列的申請專利範圍而定。Although the above contents are related to the embodiments of the present disclosure, other and further embodiments of the present disclosure can be designed without departing from the basic scope. The scope is determined by the scope of the following patent applications.

1‧‧‧傳輸方向1‧‧‧ transmission direction

2‧‧‧水平方向2‧‧‧horizontal

3‧‧‧垂直方向3‧‧‧ vertical

10‧‧‧基材10‧‧‧ Substrate

20‧‧‧遮罩20‧‧‧Mask

100‧‧‧載體100‧‧‧ carrier

110‧‧‧引導結構110‧‧‧Guide Structure

111‧‧‧引導單元111‧‧‧ boot unit

112‧‧‧主動磁鐵單元112‧‧‧Active Magnet Unit

114‧‧‧控制器114‧‧‧controller

201‧‧‧第一末端201‧‧‧ first end

202‧‧‧第二末端202‧‧‧ second end

210‧‧‧引導結構210‧‧‧Guide Structure

220‧‧‧載體220‧‧‧ Carrier

222‧‧‧磁鐵結構222‧‧‧Magnet structure

225‧‧‧主體225‧‧‧Subject

230‧‧‧感測器230‧‧‧Sensor

320‧‧‧載體320‧‧‧ carrier

320’‧‧‧載體320’‧‧‧ carrier

330‧‧‧感測器330‧‧‧Sensor

340‧‧‧可偵測裝置340‧‧‧ detectable device

342‧‧‧傾斜342‧‧‧tilt

400‧‧‧裝置400‧‧‧ device

410‧‧‧載體410‧‧‧ carrier

412‧‧‧支撐結構412‧‧‧ support structure

450‧‧‧第一被動磁性單元450‧‧‧The first passive magnetic unit

460‧‧‧第二被動磁性單元460‧‧‧Second Passive Magnetic Unit

470‧‧‧引導結構470‧‧‧Guide Structure

475‧‧‧主動磁性單元475‧‧‧active magnetic unit

480‧‧‧驅動結構480‧‧‧Drive Structure

485‧‧‧其他主動磁性單元485‧‧‧Other Active Magnetic Unit

500‧‧‧系統500‧‧‧ system

502‧‧‧真空腔室502‧‧‧vacuum chamber

504‧‧‧閥門外殼504‧‧‧valve housing

506‧‧‧閥門單元506‧‧‧valve unit

510‧‧‧傳輸裝置510‧‧‧Transmission device

520‧‧‧載體520‧‧‧ carrier

580‧‧‧材料沉積源580‧‧‧ material deposition source

600‧‧‧系統600‧‧‧ system

601‧‧‧載體601‧‧‧ carrier

604‧‧‧閥門外殼604‧‧‧valve housing

605‧‧‧閥門單元605‧‧‧valve unit

608‧‧‧第一沉積區域608‧‧‧First deposition area

610‧‧‧傳輸區域610‧‧‧Transmission area

612‧‧‧第二沉積區域612‧‧‧Second deposition area

630‧‧‧第一沉積源630‧‧‧First sedimentary source

650‧‧‧第二沉積源650‧‧‧Second sedimentary source

660‧‧‧傳輸裝置660‧‧‧Transmission device

700‧‧‧方法700‧‧‧ Method

710‧‧‧方塊710‧‧‧block

720‧‧‧方塊720‧‧‧box

S‧‧‧引導空間S‧‧‧Guide Space

G1‧‧‧第一間隙G1‧‧‧First clearance

G2‧‧‧第二間隙G2‧‧‧Second Gap

L‧‧‧長度L‧‧‧ length

d‧‧‧感測器擴展d‧‧‧sensor extension

為了能夠理解本揭露上述特徵的細節,可參照實施例,得到對於簡單總括於上之本發明更詳細的敘述。所附之圖式是關於本發明的實施例,並敘述如下: 第1圖繪示載體及引導結構的示意圖; 第2圖繪示根據此處所述的實施例,用於非接觸地傳輸的裝置及載體的示意圖; 第3A及3B圖繪示根據此處所述的其他實施例,用於非接觸地傳輸的裝置及載體的示意圖; 第4A及4B圖繪示根據此處所述的實施例,用於非接觸地傳輸的裝置及載體的示意圖; 第5圖繪示根據此處所述的實施例,用於處理基材的系統的示意圖; 第6圖繪示根據此處所述的其他實施例,用於處理基材的系統的示意圖;及 第7圖繪示根據此處所述的實施例,用於在沉積系統中非接觸地傳輸載體的方法的流程圖。In order to be able to understand the details of the above-mentioned features of this disclosure, reference may be made to the embodiments to obtain a more detailed description of the present invention simply summarized above. The attached drawings are related to the embodiments of the present invention and are described as follows: Fig. 1 shows a schematic diagram of a carrier and a guide structure; Fig. 2 shows an embodiment for non-contact transmission according to the embodiment described herein Schematic diagram of device and carrier; Figures 3A and 3B illustrate schematic diagrams of a device and a carrier for non-contact transmission according to other embodiments described herein; Figures 4A and 4B illustrate implementations according to this For example, a schematic diagram of a device and a carrier for non-contact transfer; FIG. 5 shows a schematic diagram of a system for processing a substrate according to the embodiment described herein; FIG. 6 shows a Other embodiments are schematic diagrams of a system for processing a substrate; and FIG. 7 illustrates a flowchart of a method for non-contact transport of a carrier in a deposition system according to embodiments described herein.

Claims (20)

一種用於在沉積系統中非接觸地傳輸一載體的系統,包括: 一載體; 一引導結構,具有一或多個主動磁鐵單元,配置成用以面向該載體的一磁鐵結構;及 一或多個感測器,配置成用以偵測該載體的存在,其中該一或多個主動磁鐵單元及該一或多個感測器係配置成用以定義該一或多個主動磁鐵單元及該一或多個感測器之間的該磁鐵結構的一引導空間; 其中該載體包括一可偵測裝置,該可偵測裝置包括一幾何輪廓,該幾何輪廓沿該載體的一傳輸方向改變,且可由該一或多個感測器偵測。A system for contactlessly transporting a carrier in a deposition system, comprising: a carrier; a guide structure having one or more active magnet units configured to face a magnet structure of the carrier; and one or more A sensor configured to detect the presence of the carrier, wherein the one or more active magnet units and the one or more sensors are configured to define the one or more active magnet units and the A guiding space of the magnet structure between one or more sensors; wherein the carrier includes a detectable device, the detectable device includes a geometric profile, and the geometric profile changes along a transmission direction of the carrier, It can be detected by the one or more sensors. 如申請專利範圍第1項所述之系統,其中該一或多個感測器是距離感測器,配置成用以測量至該載體的距離。The system according to item 1 of the patent application scope, wherein the one or more sensors are distance sensors configured to measure a distance to the carrier. 如申請專利範圍第1或2項所述的系統,其中該一或多個主動磁鐵單元係配置在該引導空間的一側,且該一或多個感測器係配置在該引導空間的相對於一垂直方向或一水平方向的另一側。The system according to item 1 or 2 of the patent application scope, wherein the one or more active magnet units are disposed on one side of the guide space, and the one or more sensors are disposed on the opposite side of the guide space On the other side in a vertical direction or a horizontal direction. 如申請專利範圍第1或2項所述之系統,其中該一或多個感測器的各該感測器在該載體的一傳輸方向上具有一感測器擴展(sensor extension),其中該感測器擴展是在該傳輸方向上的一載體擴展(carrier extension)的1%或更多。The system according to item 1 or 2 of the patent application scope, wherein each of the one or more sensors has a sensor extension in a transmission direction of the carrier, wherein the The sensor extension is 1% or more of a carrier extension in the transmission direction. 如申請專利範圍第3項所述之系統,其中該一或多個感測器的各該感測器在該載體的一傳輸方向上具有一感測器擴展,其中該感測器擴展是在該傳輸方向上的一載體擴展的1%或更多。The system according to item 3 of the scope of patent application, wherein each of the one or more sensors has a sensor extension in a transmission direction of the carrier, wherein the sensor extension is at A carrier in the transmission direction is expanded by 1% or more. 如申請專利範圍第1或2項所述之系統,更包括一驅動結構,具有複數個其他主動磁鐵單元。The system described in item 1 or 2 of the patent application scope further includes a driving structure with a plurality of other active magnet units. 如申請專利範圍第3項所述之系統,更包括一驅動結構,具有複數個其他主動磁鐵單元。The system described in item 3 of the patent application scope further includes a driving structure with a plurality of other active magnet units. 一種用於在沉積系統中非接觸地傳輸一載體的裝置,包括: 一或多個感測器,配置成用以偵測該載體的存在,其中該一或多個感測器的各該感測器在該載體的一傳輸方向上具有一感測器擴展,且其中該感測器擴展是在該傳輸方向上的一載體擴展的1%或更多。A device for contactlessly transporting a carrier in a deposition system includes: one or more sensors configured to detect the presence of the carrier, wherein each of the one or more sensors senses the The sensor has a sensor extension in a transmission direction of the carrier, and wherein the sensor extension is 1% or more of a carrier extension in the transmission direction. 如申請專利範圍第8項所述之裝置,其中該感測器擴展是該載體擴展的至少2%,或是該載體擴展的至少4%。The device according to item 8 of the patent application scope, wherein the sensor expansion is at least 2% of the carrier expansion or at least 4% of the carrier expansion. 如申請專利範圍第8或9項所述之裝置,其中該一或多個感測器是距離感測器,配置成用以測量至該載體的一距離。The device according to item 8 or 9 of the scope of patent application, wherein the one or more sensors are distance sensors configured to measure a distance to the carrier. 如申請專利範圍第1或2項所述之系統,其中該可偵測裝置係配置成面向該一或多個感測器。The system according to item 1 or 2 of the patent application scope, wherein the detectable device is configured to face the one or more sensors. 如申請專利範圍第3項所述之系統,其中該可偵測裝置係配置成面向該一或多個感測器。The system as described in claim 3, wherein the detectable device is configured to face the one or more sensors. 如申請專利範圍第1或2項所述之系統,其中該可偵測裝置係配置在該載體的一末端部分。The system according to item 1 or 2 of the patent application scope, wherein the detectable device is disposed at an end portion of the carrier. 如申請專利範圍第3項所述之系統,其中該可偵測裝置係配置在該載體的一末端部分。The system according to item 3 of the patent application scope, wherein the detectable device is disposed at an end portion of the carrier. 如申請專利範圍第1或2項所述之系統,其中該幾何輪廓具有由以下群組中選擇出的一或多個形狀元素:一傾斜、一不連續、一弧形、及任何其之組合。The system as described in claim 1 or 2, wherein the geometric contour has one or more shape elements selected from the following group: an oblique, a discontinuous, an arc, and any combination thereof . 如申請專利範圍第3項所述之系統,其中該幾何輪廓具有由以下群組中選擇出的一或多個形狀元素:一傾斜、一不連續、一弧形、及任何其之組合。The system of claim 3, wherein the geometric profile has one or more shape elements selected from the following group: an oblique, a discontinuous, an arc, and any combination thereof. 如申請專利範圍第1或2項所述之系統,其中該一或多個感測器係配置成用以偵測該一或多個感測器及該幾何輪廓之間的距離。The system according to item 1 or 2 of the patent application scope, wherein the one or more sensors are configured to detect a distance between the one or more sensors and the geometric contour. 如申請專利範圍第3項所述之系統,其中該一或多個感測器係配置成用以偵測該一或多個感測器及該幾何輪廓之間的距離。The system according to item 3 of the patent application scope, wherein the one or more sensors are configured to detect a distance between the one or more sensors and the geometric contour. 一種用於在沉積系統中非接觸地傳輸一載體的方法,包括: 偵測該載體的一可偵測裝置的一第一側,該可偵測裝置包括沿該載體的一傳輸方向改變的一幾何輪廓;及 控制至少一主動磁鐵單元,該至少一主動磁鐵單元係配置在該可偵測裝置的一第二側,該第一側與該第二側相對。A method for non-contact transporting a carrier in a deposition system, comprising: detecting a first side of a detectable device of the carrier, the detectable device including a change in a transport direction of the carrier; A geometric profile; and controlling at least one active magnet unit, the at least one active magnet unit is disposed on a second side of the detectable device, and the first side is opposite to the second side. 如申請專利範圍第19項所述之方法,其中該至少一主動磁鐵單元面向該載體的一磁鐵結構。The method according to item 19 of the application, wherein the at least one active magnet unit faces a magnet structure of the carrier.
TW107137732A 2017-10-27 2018-10-25 System, apparatus and method for contactless transportation of a carrier in a deposition system TW201935602A (en)

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