TW201909502A - 用於產生線狀的強度分佈的雷射輻射的裝置 - Google Patents
用於產生線狀的強度分佈的雷射輻射的裝置 Download PDFInfo
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Abstract
一種用於產生線狀的強度分佈的雷射輻射的裝置,其包括:彼此間隔開的兩個光束變換裝置(2、3);聚焦裝置(5a、5b、6a、6b),這些聚焦裝置能夠將穿過所述兩個光束變換裝置(2、3)的雷射輻射聚焦成線狀的強度分佈,所述裝置設計成以使得沿線狀的強度分佈的線橫向方向的線寬度能夠通過在所述兩個光束變換裝置(2、3)之間的距離的改變而發生改變。
Description
本發明涉及根據請求項1的前言的用於產生線狀的強度分佈的雷射輻射的裝置。
本申請案在35 U.S.C.§119(a)-(d)下主張於2017年7月14日申請的德國申請案序號DE102017115964.9的國外優先權,其整體內容被納入作為參考。
為了產生具有特別大的景深的長的、均勻的且窄的雷射線可以使用折射的或反射的光束變換裝置,該光束變換裝置將例如固態雷射的多模雷射(M2>10)的模式組合重新排列,使得光束品質(或更具體而言繞射指數或模式數量或光束發散度)對於一個橫向方向(Y)而言明顯降低並且對於另一個橫向方向(X)而言提高。因此,利用設置在光束變換裝置之後的光學件可以非常好地使沿X方向(長線軸)上的輻射均勻化。所述輻射可以沿Y方向(線橫截面)非常好地聚焦並且實現大的景深。也有利的是,利用簡單設計的低數值孔徑(NA)聚焦光學件可以實現大的工作距離。相應的裝置可在EP1896893A1中找到。
由兩個透鏡陣列組成的折射的光束變換器從US5,513,201中可得 知。所述折射的光束變換器用於將雷射二極體陣列的輻射集束。EP1006382A1揭示另一種具有兩個雙凸柱面透鏡陣列的光束變換器。
本發明的目的是提供一種在介紹中所述類型的裝置,利用該裝置可以影響沿線狀的強度分佈的線橫向方向的線寬度。
此目的是按照本發明通過一種前面所述類型的、具有請求項1的特徵的裝置來實現。依附請求項涉及本發明較佳實施方式。
根據請求項1,所述裝置經設計以使得沿線狀的強度分佈的線橫向方向的線寬度能夠通過在所述兩個光束變換裝置之間的距離的改變而發生改變。由此,可以以簡單的方式影響沿線狀的強度分佈的線橫向方向的線寬度。
特別是在利用多模雷射、例如固態雷射形成窄的雷射線時得到連續且技術上能容易實現控制的線寬度。光束變換裝置的製造公差以及在雷射光源與光束變換裝置之間的光學裝置的製造誤差和校正誤差(其影響沿X方向的發散度)以及與所述裝置的設計有偏差的雷射發散度能夠以所述方式在光學上得到補償。此外,也可以以簡單的方式減少在光束變換裝置中的光強度,使得光強度低於所使用的材料的損壞閥值。
1‧‧‧望遠鏡
2‧‧‧光束變換裝置
3‧‧‧光束變換裝置
4‧‧‧均勻器裝置
5a‧‧‧傅立葉光學裝置
5b‧‧‧傅立葉光學裝置
6a‧‧‧聚焦裝置
6b‧‧‧聚焦裝置
7‧‧‧橢圓束腰
8‧‧‧光學裝置
9‧‧‧子光束
9’‧‧‧子光束
10‧‧‧雷射光源
借助以下參照附圖對各較佳實施例的描述清楚地得出本發明的其它特徵和優點。
圖1中的(a)示出按照本發明的裝置的一種實施例的示意性側視圖。
圖1中的(b)示出根據圖1中的(a)的裝置的示意性俯視圖。
圖2示出在兩個光束變換裝置中的第一光束變換裝置的入射面上的雷射輻射的橫截面視圖。
圖3a、3b示詳述光束變換。
圖4a示出在兩個光束變換裝置中的第一光束變換裝置的入射面上的雷射輻射的示意性截面圖。
圖4b示出在兩個光束變換裝置中的第二光束變換裝置的出射面上的雷射輻射的示意性截面圖。
圖5示出所述裝置的一部分的示意性透視圖。
圖6示出光束變換裝置的第一種實施例的剖面。
圖7示出光束變換裝置的第二種實施例的剖面。
圖8示出通過兩個光束變換裝置和聚焦裝置的光路,其中所述光路不按照比例繪制且僅示出以作為範例。
圖9示出一圖表,其示出沿線橫向方向的光束束腰與兩個光束變換裝置彼此的距離的相關性。
圖10示出所述兩個光束變換裝置的立體圖。
在附圖中相同或功能相同的部件有相同的附圖標記。在此,在一些附圖中標繪有笛卡爾坐標系,以易於定向。
雷射輻射的待產生的線狀的強度分佈在笛卡爾坐標系中具有沿X方向延伸的線縱向方向以及沿Y方向延伸的線橫向方向。
在圖1中示出的裝置包括雷射光源10(僅示意性地示出)、變形的望遠鏡1、第一和第二光束變換裝置2、3以及均勻器裝置4,它們特別是作用到X方向上,或更具體而言線縱向方向上。此外,所述裝置包括用於X方向的傅 立葉光學裝置5a、5b和用於Y方向的聚焦裝置6a、6b。
所述雷射光源10例如可以設計為由雷射二極體幫浦的固態雷射。所述均勻器裝置4例如可以包括兩個柱面透鏡陣列,其圓柱軸線沿Y方向延伸,所述陣列沿雷射輻射的傳播方向或更具體而言沿Z方向依次相繼設置。
所述變形的望遠鏡1用於在第一光束變換裝置2的入射面上沿長軸X構成窄的橢圓束腰7(對此參見圖2)。所述光束變換裝置2、3可以設計為兩個折射的或反射的陣列。
在光束變換裝置2、3的後面以及在均勻器裝置4的前面可以設置有作用到X方向上的光學裝置8。
特別是,每個所述光束變換裝置2、3都由一個折射陣列組成。在第一陣列上,所述橢圓束腰7在X方向上分解成多個、特別是m個子光束9或分段。替代地,雷射輻射可以在所述陣列之前利用附加的分段的光學件被分解。此外,子光束9被變換以使得子光束在光束變換裝置2、3的輸出端上與在輸入端上相比關於在XY平面中的45°軸線成鏡像。在圖3a和3b中,這通過一個子光束9的橫截面的角A、B、C、D的變換示出。圖4a中示出在輸入端還相鄰的子光束9;並且圖4b中示出在輸出端經變換的子光束9’。
這些子光束以特定的尺寸聚焦在陣列的空間中。
所述變換各向異性地改變整個光束(light bundle)的繞射指數M2。在此,M2特別是對於Y方向m倍地減少並且對於X方向m倍地增大。也可以這樣描述,即一方面關於X方向或更具體而言橢圓束腰7的長軸的小的輸入發散度θx並且另一方面關於Y方向或橢圓束腰7的短軸的大的輸入發散度θy在變換後被互換。
θx→θ' y ,θy→θ' x (1)
所述光束變換裝置2、3的一種較佳實施方式是由兩個柱面透鏡 陣列所組成,其圓柱軸線相對於X方向以及相對於Y方向以45°的角度定向(對此參見圖2、圖5和圖10)。在此,形成第一光束變換裝置2的陣列的圓柱軸線平行於形成第二光束變換裝置3的陣列的圓柱軸線定向。
所述陣列的個別柱面透鏡對為子光束形成具有放大率-1的開普勒望遠鏡:
等式(2)僅適用於根據圖6的實施例。根據圖6的實施例具有如下優點:內透鏡面上的能量密度小於在根據圖7的實施例中的內透鏡面上的能量密度。在圖6和圖7中,第一和第二光束變換裝置2、3的透鏡面的半徑用R1和R2標記。在彼此對置的透鏡面之間的距離用d標記。在圖6和圖7中,柱面透鏡的前面和後面的焦距用F1、F1’、F2和F2’標記。在圖7中柱面透鏡的厚度用dg標記。
具有帶有凹狀階梯的交叉階梯反射鏡的實施例原理上也是可能的。不過,所述凹狀階梯應該具有能夠補償像差的合適形狀。
根據等式(1)的在輸出端上的光束發散度在如下情況時也適用:在各透鏡陣列之間的距離d選擇成使得例如根據用於根據圖6的配置的等式(2)的縮放條件被準確地滿足。
通過微調所述距離d可以一方面改變輸出光束的發散度。另一方面可以校正半徑的製造誤差。此外,在雷射光源和光束變換裝置之間的光學裝置的製造誤差和校正誤差(其影響沿X方向的發散度)以及與所述裝置的設計有偏差的雷射發散度可以在光學上得以補償。
在距離△=d-d0改變時,子光束9、9’在光束變換裝置2、3之後得到附加的發散度:δθ=-△*P/(2f T 2) (3)
其中,P是光束變換裝置2、3的柱面透鏡垂直於圓柱軸線的節距或更具體而言平均距離,並且fT是光束變換裝置2、3的柱面透鏡的焦距。
對於Y所造成的發散度θ' y+δθ (4)
在所述距離減小時增大。當所述距離增大時或更具體而言在正的△,時所述發散度最初減小。在達到值δθ=-θ' y之後,發散度重新開始提高(公式帶有“-”標誌)。
所述兩個光束變換裝置2、3的相對彼此運動在圖10中示出。
所述線寬度wy與發散度有關。這應該借助於下麵的示例闡述:
給定具有節距P=1.06mm、fT=7.5mm、θ' y=0.25mrad(毫弧度)的光束變換裝置;具有f1=586mm的用作第一聚焦裝置6a的聚焦透鏡和具有f2=170mm的用作第二聚焦裝置6b的投影透鏡,該投影透鏡具有放大率V=S’/S=(2467-586)/187=1/10.06(參見圖8)。在圖8中給出的尺寸為以mm計算的距離。
所述光束變換裝置在△=+0.04...-0.12mm的範圍內的距離改變使線寬度wy=HW@e-2從14μm變為38μm(參見圖9)。使用配合的精密機械可以無問題地實現這種移動。精密的機電驅動器、例如壓電驅動器也良好地適合於此。
Claims (10)
- 一種用於產生線狀的強度分佈的雷射輻射的裝置,所述裝置包括:彼此間隔開的兩個光束變換裝置(2、3);聚焦裝置(6a、6b),所述聚焦裝置能夠將穿過兩個所述光束變換裝置(2、3)的雷射輻射聚焦成線狀的強度分佈,其中,所述裝置經設計以使得沿所述線狀的強度分佈的線橫向方向的線寬度能夠通過在兩個所述光束變換裝置(2、3)之間的距離的改變而發生改變。
- 根據請求項1所述的裝置,其中,一個或兩個所述光束變換裝置(2、3)能夠使所述雷射輻射轉動、特別是繞著傳播方向以90°的角度轉動,和/或一個或兩個所述光束變換裝置(2、3)能夠將所述雷射輻射變換成以使得所述雷射輻射的兩個彼此垂直的橫向方向的發散度或繞射指數互換。
- 根據請求項1或2所述的裝置,其中,一個或兩個所述光束變換裝置(2、3)設計為透鏡陣列或反射鏡陣列。
- 根據請求項3所述的裝置,其中,在所述透鏡陣列中的透鏡設計為柱面透鏡,所述柱面透鏡的圓柱軸線特別是相對於所述透鏡並排地設置的方向以45°的角度對準。
- 根據請求項3所述的裝置,其中,在所述反射鏡陣列中的反射鏡具有凹狀的彎曲部。
- 根據請求項1至5中任一項所述的裝置,其中,所述裝置包括雷射光源(10),所述雷射光源例如設計為由雷射二極體幫浦的固態雷射。
- 根據請求項1至6中任一項所述的裝置,其中,所述裝置包括均勻器裝置(4),所述均勻器裝置特別是設置在兩個所述光束變換裝置(2、3)與所述聚焦裝置之間。
- 根據請求項1至7中任一項所述的裝置,其中,所述裝置包括望遠鏡、特別是變形的望遠鏡(1),所述望遠鏡較佳地設置在所述雷射光源(10)與兩個所述光束變換裝置(2、3)之間。
- 根據請求項1至8中任一項所述的裝置,其中,所述裝置包括定位裝置,所述定位裝置能夠改變兩個所述光束變換裝置(2、3)的距離,特別是使兩個所述光束變換裝置(2、3)中的一個光束變換裝置相對於另一個光束變換裝置移動。
- 根據請求項9所述的裝置,其中,所述定位裝置設計為精密機械或機電驅動器、例如設計為壓電驅動器。
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