CN109254408A - 用于产生激光辐射的线状的强度分布的设备 - Google Patents

用于产生激光辐射的线状的强度分布的设备 Download PDF

Info

Publication number
CN109254408A
CN109254408A CN201810766519.9A CN201810766519A CN109254408A CN 109254408 A CN109254408 A CN 109254408A CN 201810766519 A CN201810766519 A CN 201810766519A CN 109254408 A CN109254408 A CN 109254408A
Authority
CN
China
Prior art keywords
optical beam
beam transformation
equipment
equipment according
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201810766519.9A
Other languages
English (en)
Other versions
CN109254408B (zh
Inventor
M·伊万嫩科
V·格林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Torchlight Germany Co Ltd
Original Assignee
Limo LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Limo LLC filed Critical Limo LLC
Publication of CN109254408A publication Critical patent/CN109254408A/zh
Application granted granted Critical
Publication of CN109254408B publication Critical patent/CN109254408B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0738—Shaping the laser spot into a linear shape
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G02B19/0057—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode in the form of a laser diode array, e.g. laser diode bar
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0972—Prisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0911—Anamorphotic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Astronomy & Astrophysics (AREA)
  • Lenses (AREA)
  • Laser Beam Processing (AREA)
  • Semiconductor Lasers (AREA)

Abstract

本发明涉及一种用于产生激光辐射的线状的强度分布的设备，其包括：两个彼此间隔开距离的光束变换装置(2、3)；聚焦器件(5a、5b、6a、6b)，这些聚焦器件能够将穿过所述两个光束变换装置(2、3)的激光辐射聚焦成线状的强度分布，所述设备设计成，使得沿线状的强度分布的线横向方向的线宽度能够通过在所述两个光束变换装置(2、3)之间的距离的改变而发生改变。

Description

用于产生激光辐射的线状的强度分布的设备
技术领域
本发明涉及一种根据权利要求1的前序部分所述的用于产生激光辐射的线状的强度分布的设备。
背景技术
为了产生具有特别大的景深的长的、均匀的且窄的激光线可以使用折射的或反射的光束变换装置，该光束变换装置这样重新排列多模激光器(M2＞10)、例如固体激光器的模式组合，使得光束质量(或者说衍射指数或模式数量或光束发散度)对于一个横向方向(Y)而言明显降低并且对于另一个横向方向(X)而言提高。作为结果，利用设置在其后的光学系统可以非常好地使沿X方向(长线轴)的辐射均匀化。所述辐射可以沿Y方向(线横截面)非常好地聚焦并且实现大的景深。也有利的是，利用简单构造的低NA(数值孔径)聚焦光学系统可以实现大的工作距离。相应的设备在EP1896893A1中找到。
由两个透镜阵列组成的折射的光束变换器由US5,513,201已知。所述光束变换器用于将激光二极管阵列的辐射集束。由EP1006382A1已知另一种具有两个双凸柱面透镜阵列的光束变换器。
发明内容
本发明的任务是提供一种开头所述类型的设备，利用该设备可以影响沿线状的强度分布的线横向方向的线宽度。
这按照本发明通过一种开头所述类型的、具有权利要求1的特征部分特征的设备实现。从属权利要求涉及本发明优选的实施方案。
根据权利要求1规定，所述设备这样设计，使得沿线状的强度分布的线横向方向的线宽度能够通过在所述两个光束变换装置之间的距离的改变而发生改变。由此，可以以简单的方式影响沿线状的强度分布的线横向方向的线宽度。
尤其是在利用多模激光器、例如固体激光形成窄的激光线时得到线宽度的无级的且技术上能容易实现的控制。光束变换装置的制造公差以及在激光源与光束变换装置之间的光学器件的制造误差和校正误差(其影响沿X方向的发散度)以及与所述设备的设计有偏差的激光发散度能够以所述方式在光学上得到补偿。此外由此附加地可以这样减少在光束变换装置中的光强度，使得光强度低于所使用的材料的损坏阈值。
附图说明
借助以下参照附图对各优选实施例的描述清楚地得出本发明的其它特征和优点。其中：
图1a示出按照本发明的设备的一种实施形式的示意性侧视图；
图1b示出根据图1a的设备的示意性俯视图；
图2示出在两个光束变换装置中的第一光束变换装置的入射面上的激光辐射的横截面视图；
图3a、3b示出用于阐明光束变换的草图；
图4a示出在两个光束变换装置中的第一光束变换装置的入射面上的激光辐射的横截面示意图；
图4b示出在两个光束变换装置中的第二光束变换装置的出射面上的激光辐射的横截面示意图；
图5示出所述设备的一部分的示意性透视图；
图6示出光束变换装置的第一种实施形式的剖面；
图7示出光束变换装置的第二种实施形式的剖面；
图8示出通过两个光束变换装置和聚焦器件的不按比例的示例性的光路；
图9示出一图表，其示出沿线横向方向的光束束腰与两个光束变换装置彼此的距离的相关性；
图10示出所述两个光束变换装置的透视图。
具体实施方式
在附图中相同或功能相同的部件设有相同的附图标记。在此，在一些所述附图中标绘有笛卡尔坐标系，以易于定向。
激光辐射的待产生的线状的强度分布在笛卡尔坐标系中具有沿X方向延伸的线纵向方向以及沿Y方向延伸的线横向方向。
在图1中示出的设备包括仅示意性示出的激光源10、变形的望远镜1、第一和第二光束变换装置2、3以及均匀化器件4，它们尤其是作用到X方向上或者说线纵向方向上。所述设备此外包括用于X方向的傅立叶光学器件5a、5b和用于Y方向的聚焦器件6a、6b。
所述激光源10例如可以构造为由激光二极管泵浦的固体激光器。所述均匀化器件4例如可以包括两个沿激光辐射的传播方向或者说沿Z方向依次相继设置的柱面透镜阵列，其圆柱轴线沿Y方向延伸。
所述变形的望远镜1用于在第一光束变换装置2的入射面上沿长轴X构成窄的椭圆束腰7(对此参见图2)。所述光束变换装置2、3可以构造为两个折射的或反射的阵列。
在光束变换装置2、3的后面以及在均匀化器件4的前面可以设置有作用到X方向上的光学器件8。
尤其是，每个所述光束变换装置2、3都由一个折射阵列组成。在第一阵列上，所述椭圆束腰7在X方向上分解成多个、尤其是m个子光束9或分段。替代地，激光辐射可以在所述阵列之前利用附加的切分的光学系统被分解。此外，子光束9这样被变换，使得子光束在光束变换装置2、3的输出端上与在输入端上相比关于在XY平面中的45°轴线成镜像。在图3a和3b中，这通过一个子光束9的横截面的角A、B、C、D的变换示出。在图4a中示出在输入侧还毗邻的子光束9并且在图4b中示出在输出侧经变换的子光束9’。
这些子光束以确定的尺寸聚焦在阵列的中间空间中。
所述变换各向异性地改变整个光束的衍射指数M2。在此，M2尤其是对于Y方向m倍地减少并且对于X方向m倍地增大。也可以这样描述，即一方面关于X方向或椭圆束腰7的长轴的小的输入发散度θx并且另一方面关于Y方向或椭圆束腰7的短轴的大的输入发散度θy在变换后被互换。
θx→θ′y,θy→θ′x (1)
所述光束变换装置2、3的一种优选设计由两个柱面透镜阵列组成，其圆柱轴线相对于X方向以及相对于Y方向以45°的角度定向(对此参见图2、图5和图10)。在此，形成第一光束变换装置2的阵列的圆柱轴线平行于形成第二光束变换装置3的阵列的圆柱轴线定向。
所述阵列的各单个柱面透镜对为子光束形成具有放大率-1的开普勒望远镜：
k1＝k2＝-n2 (2)
等式(2)仅适用于根据图6的实施形式。根据图6的实施形式具有如下优点：在内透镜面上的能量密度小于在根据图7的实施形式中。在图6和图7中，第一和第二光束变换装置2、3的透镜面的半径用R1和R2标记。在彼此对置的透镜面之间的距离用d标记。在图6和图7中，柱面透镜的前面和后面的焦距用F1、F1’、F2和F2’标记。在图7中柱面透镜的厚度用dg标记。
具有带有凹形阶梯的交叉阶梯镜的实施形式原理上也是可能的。不过，所述凹形阶梯应该具有能够补偿像差的合适形状。
根据等式(1)的在输出端上的光束发散度在如下情况时也适用：在各透镜阵列之间的距离d选择成使得例如根据用于根据图6的配置的等式(2)的放缩条件被准确地满足。
通过所述距离d的精调可以一方面改变输出光束的发散度。另一方面可以校正半径的制造误差。此外，在激光源和光束变换装置之间的光学器件的制造误差和校正误差(其影响沿X方向的发散度)以及与所述设备的设计有偏差的激光发散度可以在光学上得以补偿。
在距离Δ＝d-d0改变时，子光束9、9’在光束变换装置2、3之后得到附加的发散度：
δθ＝-Δ*P/(2fT 2) (3)
其中，P是光束变换装置2、3的柱面透镜垂直于圆柱轴线的节距或者说中心距，并且fT是光束变换装置2、3的柱面透镜的焦距。
对于Y所造成的发散度
θ′y+δθ (4)
在所述距离减小时增大。当所述距离增大时或者说在正的Δ时所述发散度最初减小。在达到值δθ＝-θ′y之后，发散度重新开始提高(公式带有“-”标志)。
所述两个光束变换装置2、3的相对彼此运动在图10中示出。
所述线宽度wy与发散度有关。这应该借助于下面的示例阐述：
给定具有节距P＝1.06mm、fT＝7.5mm、θ′y＝0.25mrad(毫弧度)的光束变换装置；具有f1＝586mm的用作第一聚焦器件6a的聚焦透镜和具有f2＝170mm的用作第二聚焦器件6b的投影透镜，该投影透镜具有放大率V＝S’/S＝(2467-586)/187＝1/10.06(参见图8)。在图8中给出的尺寸为以mm计算的距离。
所述光束变换装置在Δ＝+0.04...-0.12mm的范围内的距离改变使线宽度wy＝HW@e-2从14μm变为38μm(参见图9)。使用配合的精密机械可以无问题地实现这种移动。精密的机电驱动器、例如压电驱动器也良好地适合于此。

Claims (10)

1.一种用于产生激光辐射的线状的强度分布的设备，该设备包括：
两个彼此间隔开距离的光束变换装置(2、3)；
聚焦器件(6a、6b)，这些聚焦器件能够将穿过所述两个光束变换装置(2、3)的激光辐射聚焦成线状的强度分布，
其特征在于，所述设备设计成，使得沿线状的强度分布的线横向方向的线宽度能够通过在所述两个光束变换装置(2、3)之间的距离的改变而发生改变。
2.根据权利要求1所述的设备，其特征在于，一个或两个所述光束变换装置(2、3)能够使激光辐射转动、尤其是围绕传播方向转动90°的角度，和/或所述一个或两个光束变换装置(2、3)能够将所述激光辐射变换成，使得激光辐射的两个彼此垂直的横向方向的发散度或衍射指数互换。
3.根据权利要求1或2所述的设备，其特征在于，一个或两个所述光束变换装置(2、3)构造为透镜阵列或反射镜阵列。
4.根据权利要求3所述的设备，其特征在于，在所述透镜阵列中透镜构造为柱面透镜，该柱面透镜的圆柱轴线尤其是以45°的角度相对于如下方向定向，透镜沿该方向并排地设置。
5.根据权利要求3所述的设备，其特征在于，在所述反射镜阵列中反射镜具有凹形的弯曲部。
6.根据权利要求1至5中任一项所述的设备，其特征在于，该设备包括激光光源(10)，该激光源例如构造为由激光二极管泵浦的固体激光器。
7.根据权利要求1至6中任一项所述的设备，其特征在于，该设备包括均匀化器件(4)，该均匀化器件尤其是设置在所述两个光束变换装置(2、3)与所述聚焦器件之间。
8.根据权利要求1至7中任一项所述的设备，其特征在于，该设备包括望远镜、尤其是变形的望远镜(1)，该望远镜优选设置在所述激光源(10)与所述两个光束变换装置(2、3)之间。
9.根据权利要求1至8中任一项所述的设备，其特征在于，该设备包括定位器件，该定位器件能够改变所述两个光束变换装置(2、3)的距离，尤其是其方式为使两个光束变换装置(2、3)中的一个光束变换装置相对于另一个光束变换装置运动。
10.根据权利要求9所述的设备，其特征在于，所述定位器件构造为精密机械或机电驱动器、例如构造为压电驱动器。
CN201810766519.9A 2017-07-14 2018-07-13 用于产生激光辐射的线状的强度分布的设备 Active CN109254408B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017115964.9 2017-07-14
DE102017115964.9A DE102017115964B4 (de) 2017-07-14 2017-07-14 Vorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung einer Laserstrahlung

Publications (2)

Publication Number Publication Date
CN109254408A true CN109254408A (zh) 2019-01-22
CN109254408B CN109254408B (zh) 2022-04-19

Family

ID=62750830

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810766519.9A Active CN109254408B (zh) 2017-07-14 2018-07-13 用于产生激光辐射的线状的强度分布的设备

Country Status (7)

Country Link
US (1) US11105961B2 (zh)
EP (1) EP3428713A1 (zh)
JP (1) JP2019020731A (zh)
KR (1) KR102524153B1 (zh)
CN (1) CN109254408B (zh)
DE (1) DE102017115964B4 (zh)
TW (1) TWI697162B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018216940A1 (de) 2018-10-02 2020-04-02 3D-Micromac Ag Laserbearbeitungssystem

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5331466A (en) * 1991-04-23 1994-07-19 Lions Eye Institute Of Western Australia Inc. Method and apparatus for homogenizing a collimated light beam
US5461473A (en) * 1990-12-31 1995-10-24 Spatial Positioning Systems, Inc. Transmitter and receiver units for spatial position measurement system
US5721416A (en) * 1995-06-01 1998-02-24 Microlas Lasersystem Gmbh Optics for forming a sharp illuminating line of a laser beam
JP2002025933A (ja) * 2001-04-04 2002-01-25 Sumitomo Heavy Ind Ltd ビームホモジナイザ及び半導体薄膜作製方法
US20060291020A1 (en) * 2000-12-20 2006-12-28 Riake Corporation Illumination device and method using adaptable source and output format
US20070109784A1 (en) * 2005-05-06 2007-05-17 Kosnik William D Extended source laser illuminator
DE102008033358A1 (de) * 2007-07-19 2009-02-26 Coherent Gmbh Vorrichtung und Verfahren zur Umverteilung des Strahlparameter-Produktes eines Laserstrahls
US7559671B2 (en) * 2007-04-04 2009-07-14 Young Optics Inc. Illumination system
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
US20120013880A1 (en) * 2010-07-13 2012-01-19 Jin Choi Optical device and exposure apparatus including the same
WO2015138476A2 (en) * 2014-03-10 2015-09-17 Robe Lighting, Inc. Collimated effect luminaire
CN105189017A (zh) * 2013-04-05 2015-12-23 Limo专利管理有限及两合公司 用于产生具有线状强度分布的激光射线的设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5513201A (en) 1993-04-30 1996-04-30 Nippon Steel Corporation Optical path rotating device used with linear array laser diode and laser apparatus applied therewith
EP1006382B1 (de) 1998-10-30 2002-09-18 Lissotschenko, Vitalij Anordnung und Vorrichtung zur optischen Strahltransformation
TW528879B (en) * 2001-02-22 2003-04-21 Ishikawajima Harima Heavy Ind Illumination optical system and laser processor having the same
SG143981A1 (en) * 2001-08-31 2008-07-29 Semiconductor Energy Lab Laser irradiation method, laser irradiation apparatus, and method of manufacturing a semiconductor device
US6773142B2 (en) * 2002-01-07 2004-08-10 Coherent, Inc. Apparatus for projecting a line of light from a diode-laser array
WO2007048506A1 (en) * 2005-10-28 2007-05-03 Carl Zeiss Laser Optics Gmbh Optical device for generating a line focus on a surface
KR100951370B1 (ko) 2006-06-02 2010-04-08 리모 파텐트페어발퉁 게엠베하 운트 코. 카게 빔 형성 장치
DE102007044298B3 (de) * 2007-09-17 2009-02-26 Coherent Gmbh Verfahren und Anordnung zum Erzeugen eines Laserstrahls mit einem linienhaften Strahlquerschnitt
DE102007057868B4 (de) * 2007-11-29 2020-02-20 LIMO GmbH Vorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung
DE102013225310B3 (de) * 2013-12-09 2015-05-07 Trumpf Laser Gmbh Optikanordnung zur Strahlformung eines Laserstrahls für eine Laserbearbeitungsmaschine
GB2518794B (en) * 2015-01-23 2016-01-13 Rofin Sinar Uk Ltd Laser beam amplification by homogenous pumping of an amplification medium
JPWO2017029874A1 (ja) * 2015-08-18 2018-03-01 アルプス電気株式会社 発光装置

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5461473A (en) * 1990-12-31 1995-10-24 Spatial Positioning Systems, Inc. Transmitter and receiver units for spatial position measurement system
US5331466A (en) * 1991-04-23 1994-07-19 Lions Eye Institute Of Western Australia Inc. Method and apparatus for homogenizing a collimated light beam
US5721416A (en) * 1995-06-01 1998-02-24 Microlas Lasersystem Gmbh Optics for forming a sharp illuminating line of a laser beam
US20060291020A1 (en) * 2000-12-20 2006-12-28 Riake Corporation Illumination device and method using adaptable source and output format
JP2002025933A (ja) * 2001-04-04 2002-01-25 Sumitomo Heavy Ind Ltd ビームホモジナイザ及び半導体薄膜作製方法
US20070109784A1 (en) * 2005-05-06 2007-05-17 Kosnik William D Extended source laser illuminator
US7559671B2 (en) * 2007-04-04 2009-07-14 Young Optics Inc. Illumination system
DE102008033358A1 (de) * 2007-07-19 2009-02-26 Coherent Gmbh Vorrichtung und Verfahren zur Umverteilung des Strahlparameter-Produktes eines Laserstrahls
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
US20120013880A1 (en) * 2010-07-13 2012-01-19 Jin Choi Optical device and exposure apparatus including the same
CN105189017A (zh) * 2013-04-05 2015-12-23 Limo专利管理有限及两合公司 用于产生具有线状强度分布的激光射线的设备
WO2015138476A2 (en) * 2014-03-10 2015-09-17 Robe Lighting, Inc. Collimated effect luminaire

Also Published As

Publication number Publication date
KR102524153B1 (ko) 2023-04-24
JP2019020731A (ja) 2019-02-07
US11105961B2 (en) 2021-08-31
DE102017115964B4 (de) 2020-04-02
TW201909502A (zh) 2019-03-01
US20190018168A1 (en) 2019-01-17
TWI697162B (zh) 2020-06-21
DE102017115964A1 (de) 2019-01-17
CN109254408B (zh) 2022-04-19
EP3428713A1 (de) 2019-01-16
KR20190008136A (ko) 2019-01-23

Similar Documents

Publication Publication Date Title
US7400457B1 (en) Rectangular flat-top beam shaper
JP6977609B2 (ja) 光照射装置、光照射装置を用いた光加工装置、光照射方法、及び光加工方法
JP5525136B2 (ja) シート光を発生するための光学装置
US8107168B2 (en) Beam splitter apparatus and system
US6504650B1 (en) Optical transformer and system using same
KR20110041437A (ko) 빔 형성 장치 및 방법
JP4401410B2 (ja) レーザ加工装置
US20080297912A1 (en) Vario-astigmatic beam expander
US20080083886A1 (en) Optical system suitable for processing multiphoton curable photoreactive compositions
US20100309559A1 (en) Device for Beam Shaping
EP3032312A1 (en) Confocal scanner and confocal microscope
JP6165366B1 (ja) 平行光発生装置
TW201723458A (zh) 用於平頂強度的雷射薄片光束的產生的系統
CN104102002B (zh) 一种提高变形镜校正能力的方法
CN108845409B (zh) 一种基于多面体棱镜产生阵列多焦点的装置及方法
US10814423B2 (en) Optical processing apparatus, method for optical processed object
JP2009543143A (ja) 光を均質化するための装置、および作業面において線状強度分布を発生させるためのレーザ装置
CN105189017A (zh) 用于产生具有线状强度分布的激光射线的设备
CN109254408A (zh) 用于产生激光辐射的线状的强度分布的设备
KR20080039449A (ko) 선 초점을 생성하기 위한 광학 시스템, 그러한 광학시스템을 이용하는 스캐닝 시스템, 및 기판의 레이저 공정방법
US20160033774A1 (en) Device for homogenizing a laser beam
US9964857B2 (en) Beam exposure device
TW202043849A (zh) 在工作平面上產生線性強度分佈的裝置
US20060114572A1 (en) Optical radiation generation apparatus and method
JP2022539424A (ja) レーザ放射用の変換装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20200327

Address after: Borussia Dortmund

Applicant after: Torchlight Germany Co., Ltd

Address before: Borussia Dortmund

Applicant before: LIMO PATENTVERWALTUNG GmbH & Co.KG

CB02 Change of applicant information
CB02 Change of applicant information

Address after: Borussia Dortmund

Applicant after: Limo display Limited

Address before: Borussia Dortmund

Applicant before: Torchlight Germany Co.,Ltd.

GR01 Patent grant
GR01 Patent grant