TW201800720A - Optical system and method of surface and internal surface profilometry using the same - Google Patents

Optical system and method of surface and internal surface profilometry using the same Download PDF

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TW201800720A
TW201800720A TW105120156A TW105120156A TW201800720A TW 201800720 A TW201800720 A TW 201800720A TW 105120156 A TW105120156 A TW 105120156A TW 105120156 A TW105120156 A TW 105120156A TW 201800720 A TW201800720 A TW 201800720A
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light
optical diffraction
optical
diffraction pattern
depth
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TW105120156A
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TWI636231B (en
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陳亮嘉
忠德 阮
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國立臺灣大學
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Abstract

The present invention provides an optical system and method for full-field high-speed object surface and internal (including bottom) surface profilometry using simultaneous multi-point optical scanning. In the optical system, at least one point light generated by an optical modulating unit is projected onto at least one position on an object surface and an object internal (including bottom) surface. The reflected light from the object surface and internal (including bottom) surface are detected by an image acquiring device, thereby generating an optical diffractive image with at least one detected optical diffractive pattern respectively corresponding to the depth of the tested surface point. The detection method is utilized to perform a vertical scanning on each calibrated depth for establishing a database having a plurality of optical diffraction patterns being corresponding to each calibrated depth, respectively. A control and calculation unit is utilized in the optical system to perform normalization calculation of cross correlation between the measured diffraction pattern and a plurality of calibrated diffraction patterns for determining the measured depth of the tested object surface and internal (including bottom) surface position in one-shot imaging manner.

Description

光學系統及使用該系統之物體表面或內部光反射介面三維形貌偵測方法Optical system and method for detecting three-dimensional shape of surface or internal light reflection interface of object using the same

本發明為一種藉由同步多點光學掃描之高速全域式光學系統與偵測技術,特別是指一種利用散射圖案影像來偵測物體表面或內部光反射介面(含物體之背面)三維形貌的一種光學系統,以及使用該系統之物體表面或內部光反射介面三維形貌偵測方法。The invention relates to a high-speed global optical system and detection technology by synchronous multi-point optical scanning, in particular to using a scattering pattern image to detect the three-dimensional shape of an object surface or an internal light reflection interface (including the back side of the object). An optical system, and a method for detecting a three-dimensional shape of an object surface or an internal light reflecting interface using the system.

彩色共焦顯微系統是量測物體表面三維形貌的方法之一,可以量測機械或半導體結構中的階高、線寬、溝槽寬度以及深度等資訊,進而作為製程改良或良率檢測的重要依據。本技術最早在1957年由馬文·閔斯基(Marvin Minsky)提出。彩色共焦的原理是將入射光色散,形成具有不同聚焦深度的多個偵測光,形成光學式垂直掃描之量測機制,應用這種方式來偵測待測物,可以獲得不同深度之光學切片影像,藉由針孔(pinhole)進行失焦訊號之過濾,將聚焦區外之反射光與散射光濾除,保留聚焦面資訊,並由電腦將不同深度所得之光學切片影像重建起來,即可求得待測物之三度空間影像資訊。The color confocal microscopy system is one of the methods for measuring the three-dimensional shape of the surface of an object. It can measure the height, line width, groove width and depth of the mechanical or semiconductor structure, and is therefore important for process improvement or yield detection. in accordance with. This technique was first proposed by Marvin Minsky in 1957. The principle of color confocal is to disperse incident light to form multiple detection lights with different depths of focus to form a measurement mechanism for optical vertical scanning. Using this method to detect the object to be tested, opticals of different depths can be obtained. The sliced image is filtered by a pinhole to remove the reflected light and the scattered light outside the focus area, and the focus surface information is retained, and the optical slice image obtained by different depths is reconstructed by the computer, that is, The three-dimensional image information of the object to be tested can be obtained.

例如美國專利US.Pat.No.6,934,019所揭露的一種共焦晶圓檢測系統,光源投射之光場經過透鏡而聚焦在不同聚焦位置。由於為點光場之故,因此透過由待測晶圓上之反射之光場只有一種顏色的光場可以經由分光鏡14的反射而通過濾波元件。透過移動待測物或者是移動光學結構,以量測待測晶圓上不同位置之表面高度。前述之習用技術雖然可以量測待測物之表面高度,但是因為聚焦之位置係為點光場,因此每一次檢測之位置僅為單點,因此要能夠量測到整個待測物的表面三維形貌不但耗時而且降低製程的生產效率。此外,由於反射之光場為單一色光,因此直接由光譜儀感測即可分析。A confocal wafer inspection system as disclosed in U.S. Patent No. 6,934,019, the light field of a light source being projected through a lens to focus at different focus positions. Because of the point light field, the light field having only one color transmitted through the reflected light field on the wafer to be tested can pass through the filter element through the reflection of the beam splitter 14. The surface height of different locations on the wafer to be tested is measured by moving the object to be tested or moving the optical structure. Although the aforementioned conventional technique can measure the surface height of the object to be tested, since the position of the focus is a point light field, the position of each detection is only a single point, so it is possible to measure the surface three-dimensionality of the entire object to be tested. The appearance is not only time consuming but also reduces the production efficiency of the process. In addition, since the reflected light field is a single color light, it can be directly analyzed by the spectrometer.

另外,又如美國專利 US.Pat.No.5,785,651所揭露的一種共焦顯微裝置。在該技術中,該共焦顯微裝置利用一光源所產生之多色光場 (polychromatic light)經過無色差準直透鏡 (achromatic collimator lens),然後形成無色差之準直光場而投射至Fresnel光學元件上。經過Fresnel光學元件後形成隨著波長不同而有不同聚焦點之分散光場,以檢測待測物之表面三維形貌。在該技術中,同樣地,亦是將光場調制成隨著不同波長而聚焦於不同位置之點,由於每一次檢測之位置僅為單點,因此要能夠量測到整個待測物的表面三維形貌不但耗時而且降低製程的生產效率。此外,由於反射之光場為單一色光,因此直接由感測元件感測即可分析。此外,又如美國公開申請案第US.Pub.No.2004/0109170所揭露的共焦檢測感測器,其亦是將光場分成不同波長而分別聚焦於不同之聚焦位置上。In addition, a confocal microscopy apparatus is disclosed in U.S. Patent No. 5,785,651. In this technique, the confocal microscopy device utilizes a polychromatic light generated by a light source through an achromatic collimator lens, and then forms a collimated light field without chromatic aberration and projects onto the Fresnel optical element. . After the Fresnel optical element, a scattered light field having different focusing points with different wavelengths is formed to detect the three-dimensional shape of the surface of the object to be tested. In this technique, similarly, the light field is modulated to a point that is focused at different positions with different wavelengths. Since each detection position is only a single point, it is necessary to be able to measure the entire object to be tested. The three-dimensional shape of the surface is not only time consuming but also reduces the production efficiency of the process. In addition, since the reflected light field is a single color light, it can be directly analyzed by the sensing element. In addition, the confocal detection sensor disclosed in U.S. Patent Application Publication No. 2004/0109170 also divides the light field into different wavelengths and respectively focuses on different focus positions.

雖然彩色共焦之偵測光因為具有不同的聚焦深度,而可以免除傳統垂直掃描時,因為垂直移動機構的運動對量測機台所造成的振動問題,但是仍然有幾個部分有待解決的部分:Although the color confocal detection light can be exempted from the traditional vertical scanning because of the different depth of focus, because the movement of the vertical moving mechanism causes vibration problems caused by the measuring machine, there are still several parts to be solved:

第一、在多點同時量測射時,緊鄰量測點之間失焦光和雜散光重疊而易生橫向干擾(cross talk)之雜訊問題,習用技術中,爲了減少光線間相互干擾的問題,多在光譜儀前面設置針孔(pinhole),然而此種方式雖可以減少干擾,但是如果是應用在量測物體二維表面形貌或者需要高解析度的量測時,則需要配合橫向移動的機制,如此一來會增加量測所需的時間以及振動對量測精度的影響,因此一般共焦三維形貌量測的方式多半還是應用在單點量測的領域。First, in the case of multi-point simultaneous measurement, the noise of stray light and stray light between adjacent measurement points overlap and the noise of cross talk is easy to occur. In the conventional technology, in order to reduce the mutual interference of light. The problem is that pinholes are often placed in front of the spectrometer. However, this method can reduce the interference, but if it is applied to measure the two-dimensional surface topography of the object or requires high-resolution measurement, it needs to cooperate with the lateral movement. The mechanism will increase the time required for measurement and the influence of vibration on measurement accuracy. Therefore, the general method of confocal three-dimensional shape measurement is still applied in the field of single-point measurement.

第二、光譜儀體積佔據空間以及解析光譜耗時的問題。習用技術中,爲了還原表面三維形貌,需要透過光譜儀偵測通過狹縫或者是針孔結構的光譜,進而找出對應偵測位置的光線波長與其光強度,而還原該位置對應的深度。利用光譜儀的方式有幾個有待克服的部分,首先是光譜儀的體積龐大,佔據空間。再者,由於光譜儀還原光譜資訊耗時不具量測效率,其主要的原因是對每一個量測位點而言,展開的光譜是一維度的光譜,如果對一個線性量測位置而言,展開的就是一個二維光譜,在量測速度與資料計算上均屬不利的情況,一般均將量測速度大幅降低。由此可知,每一個光譜儀進行一次性的解析,最多就是一個線性的量測區域,因此,如果要量測一個面,這就必須要透過橫向移動的掃描,如此一來不但增加量測的時間,更有可能因為橫向機械掃描運動對量測機台造成振動問題,而影響量測精度。Second, the spectrometer volume takes up space and the problem of analyzing the time-consuming spectrum. In the conventional technology, in order to reduce the three-dimensional shape of the surface, it is necessary to detect the spectrum of the light passing through the slit or the pinhole structure through a spectrometer, thereby finding the wavelength of the light corresponding to the detected position and its light intensity, and restoring the depth corresponding to the position. There are several ways to overcome the spectrometer. First, the spectrometer is bulky and takes up space. Furthermore, since the spectrometer reduces the spectral information time and does not have measurement efficiency, the main reason is that for each measurement site, the unfolded spectrum is a one-dimensional spectrum, if for a linear measurement position, the expansion It is a two-dimensional spectrum, which is unfavorable in both measurement speed and data calculation. Generally, the measurement speed is greatly reduced. It can be seen that each spectrometer performs one-time analysis, which is at most a linear measurement area. Therefore, if one surface is to be measured, it is necessary to scan through the lateral movement, so that not only the measurement time is increased. It is more likely that the lateral mechanical scanning motion causes vibration problems on the measuring machine, which affects the measurement accuracy.

目前光學顯微共焦量測技術上,量測訊號之擷取主要憑藉對應於量測深度之單一光強或光譜資訊,藉由機械式或光學式的軸向深度掃描方式,進行軸向之量測光強或光譜資訊之尋峰演算方法,尋找出共軛焦的深度位置。由於單一光強或光譜資訊易受光感測器之雜訊或量測系統不穩定性或量測環境變異的極大影響,以致於所量測獲得的深度資訊容易產生很大的量測誤差,其量測精準度受到影響,而無法進一步提升到更優越的等級,此為目前光學顯微共焦量測方法亟待突破的關鍵問題。At present, in optical micro-focusing measurement technology, the measurement signal is mainly obtained by mechanical or optical axial depth scanning by means of a single intensity or spectral information corresponding to the measured depth. Measure the light intensity or spectral information peak finding algorithm to find the depth position of the conjugate focal length. Since a single light intensity or spectral information is greatly affected by the noise of the photo sensor or the instability of the measurement system or the measurement environment variation, the depth information obtained by the measurement is likely to cause a large measurement error. The measurement accuracy is affected, and it cannot be further upgraded to a superior level. This is a key issue for the current optical microscopic confocal measurement method.

綜合上述,因此亟需一種光學系統及使用該系統之物體表面或內部光反射介面(含物體之背面)三維形貌偵測方法來解決習用技術所產生之問題。In summary, there is a need for an optical system and a three-dimensional topography detection method for the surface or internal light reflecting interface (including the back side of the object) using the system to solve the problems caused by the conventional technology.

本發明提供一種光學系統與物體表面或內部光反射介面三維形貌偵測方法,其係利用數位光調制單元,例如:數位微型反射鏡元件(digital mirror device, DMD) 或矽基液晶元件 (liquid crystal on silicon, LCOS),產生多個具有特定距離的點光源,投射至物體表面或內部光反射介面,進行多通道光學掃描,進而測得光學繞射圖案(或稱點分佈函數,Point Spread Function (PSF)),再藉由建立關於深度的光學繞射圖案樣本資料庫,將待測物上至少一位置的光學繞射圖案與資料庫內的光學繞射影像樣本來進行互相關運算,以得知其相應的深度。由於本發明藉由光調制單元,將入射光調制成多個點光源投射至待測物表面,因此可以大幅降低因光點重疊而產生橫向干擾 (cross talk)之雜訊,進而提高三維形貌或量測介面的深度量測之準確度。The invention provides a method for detecting a three-dimensional shape of an optical system and an object surface or an internal light reflection interface, which utilizes a digital light modulation unit, such as a digital mirror device (DMD) or a liquid crystal liquid crystal element (liquid). Crystal on silicon, LCOS), generating a plurality of point sources with a specific distance, projecting onto the surface of the object or the internal light reflection interface, performing multi-channel optical scanning, and then measuring the optical diffraction pattern (or point distribution function, Point Spread Function (PSF)), by establishing a database of optical diffraction pattern samples about the depth, performing cross-correlation calculation on the optical diffraction pattern of at least one position on the object to be tested and the optical diffraction image sample in the database, Know the corresponding depth. Since the light modulation unit modulates the incident light into a plurality of point light sources to be projected onto the surface of the object to be tested, the noise of the cross talk due to the overlap of the light points can be greatly reduced, thereby improving the three-dimensional shape. The accuracy of the depth measurement of the appearance or measurement interface.

本發明提供一種光學系統與物體表面或內部光反射介面三維形貌偵測方法,其係可以產生一維或二維的陣列式點光源,透過點光源的位置切換以及搭配影像擷取裝置的偵測率(frame detection rate),進行高速全域式(full-field)物體表面或內部光反射介面三維形貌檢測,使得本發明之光學系統不僅可以透過準單擊 (quaisi-single shot)的方式快速取得待測物之全域性 (Full field)表面輪廓資訊 ,其中準單擊量測方式為全域多點共焦量測方式,而被應用在線上(in-situ )的即時量測。此外,透過單擊的量測方式,也可以免於因為垂直或橫向移動掃描時,所產生的振動對量測結果所造成的負面影響,量測結果之精準性可獲大幅之提升。The invention provides a three-dimensional topography detecting method for an optical system and an object surface or an internal light reflecting interface, which can generate a one-dimensional or two-dimensional array point light source, position switching through a point light source and detection with an image capturing device Frame detection rate, three-dimensional topography detection of high-speed full-field object surface or internal light reflection interface, so that the optical system of the present invention can be quickly not only quaisi-single shot The full field surface contour information of the object to be tested is obtained, wherein the quasi-click measurement method is a global multi-point confocal measurement method, and is applied to an in-situ instantaneous measurement. In addition, the measurement method by clicking can also avoid the negative influence of the vibration generated by the vertical or lateral movement scanning on the measurement result, and the accuracy of the measurement result can be greatly improved.

在一實施例中,本發明提供一種光學系統,包括有一光源模組、一物鏡、一影像擷取裝置以及一控制與計算單元。該寬頻光源模組,用以產生至少一點光源。該物鏡用以將該至少一點光源投射至一物體表面或內部光反射介面的至少一位置。該影像擷取裝置,用以接收由該至少一位置反射之至少一反射物光,以產生相應的一光學繞射影像,其係具有至少一光學繞射圖案,每一光學繞射圖案可精準對應於該物體表面或內部光反射介面上之一深度位置。該控制與計算單元,將該光學繞射影像中對應每一位置的光學繞射圖案與複數個光學繞射圖案樣本進行運算,以決定每一位置的深度。In one embodiment, the present invention provides an optical system including a light source module, an objective lens, an image capturing device, and a control and calculation unit. The broadband light source module is configured to generate at least one light source. The objective lens is configured to project the at least one light source to at least one location of an object surface or an internal light reflecting interface. The image capturing device is configured to receive at least one reflector light reflected by the at least one location to generate a corresponding optical diffraction image having at least one optical diffraction pattern, each optical diffraction pattern being accurate Corresponding to a depth position of one of the surface or internal light reflecting interface of the object. The control and calculation unit calculates an optical diffraction pattern corresponding to each position in the optical diffraction image and a plurality of optical diffraction pattern samples to determine the depth of each position.

在另一實施例中,本發明提供一種物體表面或內部光反射介面三維形貌偵測方法,包括有下列步驟:首先,產生至少一點光源;接著,以一物鏡將該至少一點光源投射至一物體表面或內部光反射介面的至少一深度位置;然後,使該至少一位置反射之至少一反射物光通過該物鏡;接下來,將該至少一反射物光導引至一影像擷取裝置;之後,該影像擷取裝置感測該至少一反射物光而產生一光學繞射影像,其係具有對應該至少一深度位置的至少一光學繞射圖案。最後,從該光學繞射影像中分別擷取該至少一光學繞射圖案,並將每一光學繞射圖案與複數個光學繞射圖案樣本進行運算,以決定對應每一物體表面或內部光反射介面量測位置的深度資訊。In another embodiment, the present invention provides a method for detecting a three-dimensional shape of an object surface or an internal light reflecting interface, comprising the steps of: firstly generating at least one light source; and then projecting the at least one light source to an object by an objective lens. At least one depth position of the surface of the object or the internal light reflecting interface; then, passing the at least one reflective object reflected by the at least one position through the objective lens; and then, guiding the at least one reflected object light to an image capturing device; Thereafter, the image capturing device senses the at least one reflector light to generate an optically diffracted image having at least one optical diffraction pattern corresponding to at least one depth position. Finally, the at least one optical diffraction pattern is respectively extracted from the optical diffraction image, and each optical diffraction pattern and a plurality of optical diffraction pattern samples are calculated to determine a surface reflection or a corresponding internal light reflection of each object. The interface measures the depth information of the location.

在一實施例中,其中決定出每一位置的深度更包括有下列步驟:首先,建立一資料庫,其係具有複數個對應不同深度的光學繞射圖案樣本。接著,將每一擷取到的光學繞射圖案和資料庫中與其相對應之點光源位置之複數個對應不同深度的光學繞射圖案樣本進行運算,以產生複數個關於光學繞射圖案樣本之正規化互相關 (normalized cross correlation, NCC)數值。最後,以該複數個正規化互相關值中最大值所對應的光學繞射圖案樣本所對應的深度,以作為對應該光學繞射圖案位置的量測深度。其中,建立該資料庫更包括有下列步驟:提供一鏡面,其表面與該物鏡具有一第一距離;以至少一校正點光源經由該物鏡頭產生色散之後射至該鏡面上;從該鏡面反射的反射物光經由該物鏡後,被導引至該影像擷取裝置而產生關於該第一距離的一校正光學繞射影像(calibrated optical diffractive patterns),其係具有至少一光學繞射圖案樣本,其係分別對應一校正點光源;分別擷取關於該第一距離之該至少一光學繞射圖案樣本;將該第一距離改變至一第二距離,進一步取得關於改變後第二距離的另一校正光學繞射影像;以及分別擷取關於該第二距離之該至少一光學繞射圖案樣本。In an embodiment, wherein determining the depth of each location further comprises the following steps: First, a database is created having a plurality of optical diffraction pattern samples corresponding to different depths. Then, each of the captured optical diffraction patterns and the plurality of optical diffraction pattern samples corresponding to the position of the point source corresponding to the corresponding point source in the database are operated to generate a plurality of samples about the optical diffraction pattern. Normalized cross correlation (NCC) values. Finally, the depth corresponding to the optical diffraction pattern sample corresponding to the maximum of the plurality of normalized cross-correlation values is used as the measured depth corresponding to the position of the optical diffraction pattern. The establishing the database further comprises the steps of: providing a mirror surface having a first distance from the objective lens; and generating, by the at least one correction point light source, the dispersion through the object lens to the mirror surface; and reflecting from the specular surface After passing through the objective lens, the reflected light is guided to the image capturing device to generate a calibrated optical diffractive pattern for the first distance, which has at least one optical diffraction pattern sample. Corresponding to each of the correction point light sources; respectively extracting the at least one optical diffraction pattern sample about the first distance; changing the first distance to a second distance to further obtain another Correcting the optical diffraction image; and respectively extracting the at least one optical diffraction pattern sample for the second distance.

在下文將參考隨附圖式,可更充分地描述各種例示性實施例,在隨附圖式中展示一些例示性實施例。然而,本發明概念可能以許多不同形式來體現,且不應解釋為限於本文中所闡述之例示性實施例。確切而言,提供此等例示性實施例使得本發明將為詳盡且完整,且將向熟習此項技術者充分傳達本發明概念的範疇。在諸圖式中,可為了清楚而誇示層及區之大小及相對大小。類似數字始終指示類似元件。以下將以多種實施例配合圖式來說明所述磁性感測裝置,然而,下述實施例並非用以限制本發明。Various illustrative embodiments may be described more fully hereinafter with reference to the accompanying drawings. However, the inventive concept may be embodied in many different forms and should not be construed as being limited to the illustrative embodiments set forth herein. Rather, these exemplary embodiments are provided so that this invention will be in the In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. Similar numbers always indicate similar components. The magnetic sensing device will be described below in conjunction with various embodiments, however, the following embodiments are not intended to limit the invention.

請參閱圖1A所示,該圖為本發明之光學系統實施例示意圖。該光學系統2包括有一光源模組20、一物鏡21、一影像擷取裝置22以及一控制與計算單元23。該寬頻光源模組20,用以產生至少一點光源。該至少一點光源可以為單一點光源、呈現一維陣列的點光源或者是呈現二維陣列的點光源。在一實施例中,該光源模組20包括有一光源200、一準直鏡組201以及一光調制單元202。該光源200用以產生一入射光90,本實施例的入射光90為寬頻光,例如:白光光源,但不以此為限制,例如:雷射光也可以實施。該準直鏡組201接收該入射光90,然後將該入射光準直化,形成一準直光場91,投射至光調制單元202。該光調制單元202,可以產生針孔濾波的效果,用以將該準直光場91調制成該至少一點光源。該光調制單元202可以選擇為數位微型反射鏡元件(digital mirror device, DMD) 或矽基液晶元件 (liquid crystal on silicon, LCOS)。Please refer to FIG. 1A, which is a schematic diagram of an embodiment of an optical system of the present invention. The optical system 2 includes a light source module 20, an objective lens 21, an image capturing device 22, and a control and calculation unit 23. The broadband light source module 20 is configured to generate at least one light source. The at least one point of light source can be a single point source, a point source that presents a one-dimensional array, or a point source that presents a two-dimensional array. In an embodiment, the light source module 20 includes a light source 200, a collimating mirror set 201, and a light modulating unit 202. The light source 200 is used to generate an incident light 90. The incident light 90 of the present embodiment is a broadband light, for example, a white light source, but is not limited thereto. For example, laser light can also be implemented. The collimating lens group 201 receives the incident light 90, and then collimates the incident light to form a collimated light field 91, which is projected to the light modulating unit 202. The light modulating unit 202 can generate a pinhole filtering effect for modulating the collimated light field 91 into the at least one light source. The light modulation unit 202 can be selected as a digital mirror device (DMD) or a liquid crystal on silicon (LCOS).

前述的光調制單元202,具有複數個光控開關203,可以根據控制訊號改變光的路徑。例如:以圖2A所示的DMD元件為例,光調制單元202具有複數個成二維陣列排列的反光元件作為光控開關203,圖中僅以四個做代表。一般而言,光控開關203至少有開(on)以及關(off)狀態。光控開關203可以透過電訊的控制改變其轉動的角度,進而呈現開或關的狀態。當有光投射至複數個光控開關203時,根據其偏轉的方向會決定反射光的路徑。在一實施例中,如圖2B所示,當光控開關203a處開的狀態時,其反光元件會偏轉至一個角度,以將光反射至物鏡,而光控開關203b處於關的狀態時,其反光元件會將光反射至他處。在一實施例中,如圖2C所示,可以4個光控開關203a (2x2)為一個產生點光源的單位,而在其周圍的光控開關203b的偏轉方向和作為點光源的光控開關203a偏轉方向不同。作為點光源的光控開關203a所偏轉方向,係可將反射光導向至物鏡。此外,透過這樣的多通道光學掃描方式,當有多個點光源產生時,由於其相互橫向之空間距離D,因此,可以避免相鄰量測點間共焦量測信號之串擾問題的產生。而LCOS則是透過液晶作為光通過或不通過的開關,亦可以作為本發明的光調制單元,其為本領域技術之人所熟知的元件,在此不做贅述。The foregoing light modulation unit 202 has a plurality of light control switches 203, which can change the path of the light according to the control signal. For example, taking the DMD component shown in FIG. 2A as an example, the light modulating unit 202 has a plurality of reflective elements arranged in a two-dimensional array as the light control switch 203, and only four are represented in the figure. In general, the light control switch 203 has at least an on state and an off state. The light control switch 203 can change the angle of its rotation through the control of the telecommunication, thereby presenting an on or off state. When light is projected onto a plurality of light control switches 203, the path of the reflected light is determined according to the direction in which the light is deflected. In an embodiment, as shown in FIG. 2B, when the light control switch 203a is in the open state, the light reflecting element is deflected to an angle to reflect the light to the objective lens, and the light control switch 203b is in the off state. Its reflective elements reflect light to other places. In an embodiment, as shown in FIG. 2C, four light control switches 203a (2x2) may be used as a unit for generating a point light source, and a deflection direction of the light control switch 203b around the light control switch and a light control switch as a point light source. 203a has different deflection directions. The direction in which the light control switch 203a as the point light source is deflected can guide the reflected light to the objective lens. In addition, through such a multi-channel optical scanning method, when a plurality of point light sources are generated, due to the spatial distance D between them, the crosstalk problem of the confocal measurement signals between adjacent measurement points can be avoided. The LCOS is a light-transmitting unit that passes through the liquid crystal as light passing or failing, and can also be used as a light modulating unit of the present invention, which is well known to those skilled in the art, and will not be described herein.

再回到圖1A所示,在該物鏡21與該光調制單元202之間具有一分光元件24,用以將從該光調制單元202來的至少一點光源導引至物鏡21。該影像擷取裝置22,係配合物鏡的種類而有所不同。在一實施例中,如果該物鏡21為一般聚焦用的物鏡,則影像擷取裝置22可以為彩色或者是單色的影像擷取裝置,用以產生包括灰階或者是複數種顏色(光波長)的光學繞射影像,其中單色的影像擷取裝置可以為12位元的單色CCD。要說明的是,深度量測範圍和物鏡的聚焦深度有很大的關係,如果我們使用高數值光圈(numerical aperture, NA),雖然可以增加量測斜率(measuring slope),然而選擇具有高NA的物鏡會減少其聚焦的深度。爲了能兼顧高NA值以及不過度減少可量測深度距離的範圍,在另一實施例中,如圖1B所示,該物鏡21a可以採用軸向色散物鏡 (axial chromatic objectives),例如:折射式或繞射式色散物鏡,同時,該影像擷取裝置22a就選擇彩色的影像擷取裝置,例如:12bit彩色CCD。在一實施例中,該色散物鏡21a將入射的每一點光源分成複數種色光,本實施例以紅光R、綠光G以及藍光B來作代表。每一個色光的聚焦點之間相距一距離D。如此,可以確保在彩色影像擷取裝置上,可以擷取到具有區別性的光學繞射影像,以利後續尋找所對應的正規化互相關係數的峰值,進而可以重建物體表面或內部光反射介面(含物體之背面)的三維形貌。Returning to FIG. 1A, a light splitting element 24 is provided between the objective lens 21 and the light modulating unit 202 for guiding at least a point of light from the light modulating unit 202 to the objective lens 21. The image capturing device 22 differs depending on the type of the objective lens. In an embodiment, if the objective lens 21 is an objective lens for general focusing, the image capturing device 22 may be a color or monochrome image capturing device for generating gray scale or multiple colors (light wavelength). An optical diffraction image in which the monochrome image capturing device can be a 12-bit monochrome CCD. It should be noted that the depth measurement range has a great relationship with the depth of focus of the objective lens. If we use a numerical aperture (NA), although we can increase the measurement slope, we choose a high NA. The objective lens reduces the depth of its focus. In order to balance the high NA value and not excessively reduce the range of the measurable depth distance, in another embodiment, as shown in FIG. 1B, the objective lens 21a may employ an axial chromatic objectives, such as a refractive type. Or a diffractive dispersion objective lens, and at the same time, the image capturing device 22a selects a color image capturing device, for example, a 12-bit color CCD. In an embodiment, the dispersion objective lens 21a divides each incident point light source into a plurality of color lights, and the present embodiment is represented by red light R, green light G, and blue light B. The focus points of each color light are separated by a distance D. In this way, it is ensured that a distinctive optical diffraction image can be captured on the color image capturing device to facilitate subsequent searching for the peak value of the corresponding normalized cross-correlation coefficient, thereby reconstructing the surface of the object or the internal light reflecting interface. Three-dimensional topography (including the back of the object).

再回到圖1A所示,物鏡21用以將至少一準直光場投射至設置於乘載台25上的一待測物8,由該待測物8反射的物光93則循原光路回到物鏡21,再經過分光元件23的分光投射至影像擷取裝置22。影像擷取裝置22接收由該至少一位置反射之至少一反射物光93,以產生相對應的一光學繞射影像,其係具有相對應於該至少一位置的光學繞射圖案。Referring back to FIG. 1A, the objective lens 21 is used to project at least one collimated light field onto an object to be tested 8 disposed on the loading platform 25, and the object light 93 reflected by the object to be tested 8 follows the original light path. Returning to the objective lens 21, the light splitting by the spectroscopic element 23 is projected to the image capturing device 22. The image capturing device 22 receives the at least one reflector light 93 reflected by the at least one location to generate a corresponding optical diffraction image having an optical diffraction pattern corresponding to the at least one location.

除了圖1B之色散物鏡的架構之外,如圖1C所示,其係為軸向色散物鏡的架構另一實施例架構示意圖,與圖1B的架構不同的是本實施例中的光調制單元202產生兩次針孔濾波的效果,亦即光源200,例如:白光光源,產生入射光,然後經過分光元件24而投射至光調制單元202,此時光調制單元202扮演第一次針孔濾波的角色,將入射光調制成至少一點光源再反射至準直鏡組201。此調制的方式可以透過控制訊號控制該光調制單元202的第一區域將該準直寬頻光調制成該至少一點光源,而反射至該色散物鏡21a,並控制該光調制單元202中環繞於該第一區域外圍的第二區域將該準直入射光反射至不同於該色散物鏡21a的區域。In addition to the architecture of the dispersive objective lens of FIG. 1B, as shown in FIG. 1C, it is a schematic diagram of another embodiment of the architecture of the axial dispersive objective lens. The optical modulation unit 202 in this embodiment is different from the architecture of FIG. 1B. The effect of two pinhole filtering is generated, that is, the light source 200, for example, a white light source, generates incident light, and then is projected to the light modulating unit 202 through the beam splitting element 24, at which time the light modulating unit 202 plays the role of the first pinhole filtering. The incident light is modulated into at least one point of light source and then reflected to the collimating mirror group 201. The modulation mode can control the first region of the light modulation unit 202 to control the collimated broadband light into the at least one light source, and reflect to the dispersion objective lens 21a, and control the light modulation unit 202 to surround the light modulation unit 202. The second region around the periphery of the first region reflects the collimated incident light to a region different from the dispersive objective lens 21a.

該色散物鏡21a將點光源色散之後而投射至待測物8上。由待測物8反射的反射物光循原光路,再次投射至該光調制單元202,此時光調制單元202扮演第二次針孔濾波的角色,也就是,透過控制訊號控制該光調制單元202的第一區域將該反射物光反射至該分光元件24,並控制該光調制單元202中環繞於該第一區域外圍的第二區域將該反射物光導引至不同於該分光元件24的區域。接收反射物光的分光元件24,再將該反射物光分光導引至聚焦鏡組26,而聚焦投射至彩色的影像擷取裝置22a,例如:12bit彩色CCD上而產生光學繞射影像。圖1C中透過光調制單元202兩次針孔濾波的架構可以增加共焦效果,增加軸向解晰度。要說明的是圖1C的物鏡並不以色散物鏡21a為限制,也可以為一般的物鏡。如果使用一般的物鏡,則該影像擷取裝置22a則採用單色的影像擷取裝置。The dispersion objective lens 21a projects the spot light source and then projects it onto the object to be tested 8. The reflector light reflected by the object to be tested 8 follows the original light path and is again projected to the light modulation unit 202. At this time, the light modulation unit 202 plays the role of the second pinhole filtering, that is, the light modulation unit 202 is controlled by the control signal. The first region reflects the reflector light to the beam splitting element 24, and controls the second region of the light modulating unit 202 that surrounds the periphery of the first region to direct the reflector light to a different from the beam splitting element 24. region. The spectroscopic element 24, which receives the reflected light, is guided to the focusing mirror group 26, and is focused and projected onto a color image capturing device 22a, such as a 12-bit color CCD, to produce an optically diffracted image. The architecture of the two-pinhole filtering through the light modulating unit 202 in FIG. 1C can increase the confocal effect and increase the axial resolution. It is to be noted that the objective lens of Fig. 1C is not limited to the dispersion objective lens 21a, and may be a general objective lens. If a general objective lens is used, the image capturing device 22a uses a monochrome image capturing device.

在圖1A~1C中係為針對量測物體表面形貌深度的實施例,不過根據本發明利用繞射圖案還原待測面形貌的技術,並不限制於量測物體表面的形貌,在另一實施例中,可以進一歩利用具有穿透性的光源投射在待測物上,而量測到待測物內部光反射介面(含物體之背面)的形貌。所謂內部,可以為待測物與承載台接觸的下表面,或者是待測物內部的結構面,例如缺陷或者是中空結構等,如圖1D所示,在本實施例中係以圖1A的光學系統架構來說明,在本實施例中的光源所產生的入射光為對待測物具有穿透性的光源,在一實施例中,例如:光源選用紅外光,待測物為矽晶圓,在此架構下,穿透待測物8a,並在待測物8a的底面反射,形成測物光93a,再反射經過物鏡21而在影像擷取裝置22上形成對應該待測物底面的形貌深度的繞射影像。此外,在另一實施例中,在待測物體8a中, 如果有裂縫或者是內層的中空結構83,入射光在該裂縫表面或者是中空結構表面上會反射形成測物光93b,而在影像擷取裝置22上產生對應該裂縫表面或內層結構表面的繞射圖案。要說明的是,雖然圖1D係以圖1A的光學系統來說明,但並不以該光學系統為使用限制,圖1B和圖1C的光學系統也可以應用。1A to 1C are embodiments for measuring the depth of the surface topography of an object, but the technique for reducing the topography of the surface to be measured by using the diffraction pattern according to the present invention is not limited to measuring the topography of the surface of the object. In another embodiment, the light source that is penetrating is projected onto the object to be tested, and the topography of the light reflecting interface (including the back side of the object) inside the object to be tested is measured. The inside can be the lower surface of the object to be tested in contact with the carrier, or the structural surface inside the object to be tested, such as a defect or a hollow structure, as shown in FIG. 1D, in the present embodiment, FIG. 1A The optical system architecture is used to illustrate that the incident light generated by the light source in the embodiment is a light source having transparency to the object to be tested. In an embodiment, for example, the light source is selected from infrared light, and the object to be tested is a germanium wafer. Under this structure, the object to be tested 8a is penetrated and reflected on the bottom surface of the object to be tested 8a to form the object light 93a, and then reflected through the objective lens 21 to form a shape corresponding to the bottom surface of the object to be tested on the image capturing device 22. Depth image of depth. In addition, in another embodiment, in the object to be tested 8a, if there is a crack or an inner layer hollow structure 83, the incident light is reflected on the crack surface or the hollow structure surface to form the object light 93b, and A diffraction pattern corresponding to the surface of the crack or the surface of the inner structure is produced on the image capturing device 22. It is to be noted that although FIG. 1D is illustrated by the optical system of FIG. 1A, the optical system is not limited in use, and the optical systems of FIGS. 1B and 1C can also be applied.

接下來說明本發明光學繞射影像的原理,在光學上,夫朗和斐繞射(Fraunhofer diffraction),又稱遠場繞射,是波動繞射的一種,在電磁波通過圓孔或狹縫時發生,導致觀測到的成像大小有所改變,成因是觀測點的遠場位置,及通過圓孔向外的繞射波有漸趨平面波的性質。在本發明中由於從光調制單元202所產生的點光源至待測物8的距離,遠大於光調制單元202中產生點光源的尺寸,例如2x2的光控開關的尺寸,因此,可以適用夫朗和斐繞射的原理。Next, the principle of the optical diffraction image of the present invention will be described. In optical, Fraunhofer diffraction, also known as far-field diffraction, is a kind of wave diffraction, when electromagnetic waves pass through a circular hole or slit. Occurs, resulting in a change in the size of the observed image. The cause is the far-field position of the observation point, and the diffraction wave passing outward through the circular hole has the property of a progressive plane wave. In the present invention, since the distance from the point light source generated by the light modulating unit 202 to the object to be tested 8 is much larger than the size of the point light source generated in the light modulating unit 202, for example, the size of the 2x2 light control switch, it is applicable to The principle of Lang and Fei diffraction.

在一實施例中,由於光調制單元202中產生點光源的光控開關203陣列可視為矩形點光源,因此可用如圖3所示的架構來分析。在圖3中,S代表點光源平面,其中斜線區域代表將光反射至別處的光控開關203b,而空白區域則代表將光反射至物鏡21的光控開關203a。因此空白區域可以視為矩形的點光源。S’則代表光學繞射圖案的平面,根據上述的架構,透過該點光源在S’平面上產生的光學繞射圖案上每一個位置P的光場 u(x,y,z) 可以被表示為如式(1)所示:

Figure TW201800720AD00001
…..(1) 其中z為點光源至光學繞射圖案平面S’的距離,A為光源振幅,a, b為代表空白區域矩形點光源的尺寸。當原點改成矩形點光源的中心位置時,進行積分的結果,可以得到如式(2)所示:
Figure TW201800720AD00002
….. (2) 其中
Figure TW201800720AD00003
如下式(3)所示:
Figure TW201800720AD00004
….. (3) 其中
Figure TW201800720AD00005
如下式(4)所示:
Figure TW201800720AD00006
….. (4) 其中
Figure TW201800720AD00007
代表沿著Y方向的光學繞射角度。 根據圖1A的架構,當待測物和光源的距離改變,不同聚失焦(in and out focus) 的光學繞射圖案會被影像擷取裝置所擷取,而該光學繞射圖案上每一個位置的強度分布則如式(5)所示:
Figure TW201800720AD00008
….. (5)In an embodiment, since the array of light control switches 203 that generate point sources in the light modulating unit 202 can be regarded as a rectangular point source, it can be analyzed using the architecture shown in FIG. In Fig. 3, S represents a point source plane, wherein the hatched area represents the light control switch 203b that reflects light to another place, and the blank area represents the light control switch 203a that reflects light to the objective lens 21. Therefore, the blank area can be regarded as a rectangular point source. S' represents the plane of the optical diffraction pattern. According to the above structure, the light field u(x, y, z) of each position P on the optical diffraction pattern generated on the S' plane through the point source can be represented. As shown in equation (1):
Figure TW201800720AD00001
..... (1) where z is the distance from the point source to the optical diffraction pattern plane S', A is the source amplitude, and a, b is the size of the rectangular point source representing the blank area. When the origin is changed to the center position of the rectangular point source, the result of integration can be obtained as shown in equation (2):
Figure TW201800720AD00002
..... (2) where
Figure TW201800720AD00003
As shown in the following formula (3):
Figure TW201800720AD00004
..... (3) where
Figure TW201800720AD00005
As shown in the following formula (4):
Figure TW201800720AD00006
..... (4) where
Figure TW201800720AD00007
Represents the optical diffraction angle along the Y direction. According to the architecture of FIG. 1A, when the distance between the object to be tested and the light source changes, different in and out focus optical diffraction patterns are captured by the image capturing device, and each of the optical diffraction patterns The intensity distribution of the position is as shown in equation (5):
Figure TW201800720AD00008
..... (5)

再回到圖1A所示,控制與計算單元23則可以根據待測物8的光學繞射影像以及資料庫中的光學繞射圖案樣本,決定待測物8表面上應每一個點光源的位置的深度。亦即,與控制與計算單元23電性連接的資料庫內存放有對應複數個點光源位置的複數張光學繞射圖案樣本,而光學繞射影像中又有對應每一個點光源的光學繞射圖案,因此每一個控制與計算單元23擷取每一個光學繞射圖案,並將其與資料庫中對應相同點光源位置的複數個光學繞射圖案樣本進行正規化互相關(NCC)演算,控制與計算單元23可以根據演算的結果決定待測物表面上對應該點光源的位置所具有的深度。Returning to FIG. 1A, the control and calculation unit 23 can determine the position of each point source on the surface of the object to be tested 8 according to the optical diffraction image of the object 8 and the optical diffraction pattern sample in the database. depth. That is, the data library electrically connected to the control and calculation unit 23 stores a plurality of optical diffraction pattern samples corresponding to the positions of the plurality of point light sources, and the optical diffraction images have optical diffraction corresponding to each of the point light sources. a pattern, so each control and calculation unit 23 captures each optical diffraction pattern and normalizes cross-correlation (NCC) calculations with a plurality of optical diffraction pattern samples corresponding to the same point source position in the database. The calculation unit 23 can determine the depth of the surface of the object to be tested corresponding to the position of the point source based on the result of the calculation.

進一步地,該控制與計算單元23更改變點光源的位置,每改變一次,就得到另一張光學繞射影像,同樣具有對應不同點光源位置的光學繞射圖案,擷取出來之後,再與相應點光源位置的複數個光學繞射圖案樣本進行演算,可以得到待測物表面上相應改變位置的點光源的位置所具有的深度資訊。待收集到關於物體表面或內部光反射介面上複數個位置的光學繞射圖案,並進行演算得知其深度資訊後,即可以進而重建待測物表面三維形貌。要說明的是,是否要利用光調制單元202改變點光源位置,可以根據重建影像解析度而定,如果點光源的數量夠多,也足夠構成偵測所需的解析度,則可以單次性擷取影像即可。此外,針對多次切換點光源位置的控制方式而言,由於控制光控開關改變點光源的位置速度很快,大於影像擷取裝置擷取影像的偵測率,因此影像擷取裝置的偵測率越快,則代表可以快速的完成物體表面或內部光反射介面的掃描。透過這樣的掃描方式,可以避免習用橫向掃描的機構動作,進而降低量測中震動的干擾,提升的完成表面三維形貌偵測的速度與準確性。Further, the control and calculation unit 23 changes the position of the point light source, and each time it is changed, another optical diffraction image is obtained, and the optical diffraction pattern corresponding to the position of the different point light sources is also obtained, and after the extraction, the The plurality of optical diffraction pattern samples corresponding to the position of the point source are calculated, and the depth information of the position of the point source corresponding to the position on the surface of the object to be tested can be obtained. After the optical diffraction pattern on a plurality of positions on the surface of the object or the internal light reflection interface is collected, and the depth information is calculated, the three-dimensional shape of the surface of the object to be tested can be reconstructed. It should be noted that whether to change the position of the point source by using the light modulation unit 202 may be determined according to the resolution of the reconstructed image. If the number of the point sources is sufficient, and the resolution required for the detection is sufficient, the unimorphism may be used. Capture the image. In addition, for the control mode of switching the position of the point light source multiple times, since the position of the point light source is changed by controlling the light control switch, the detection speed of the image capturing device is larger than that of the image capturing device, so the image capturing device detects The faster the rate, the faster the scanning of the surface of the object or the internal light reflecting interface can be done. Through such a scanning method, the mechanism of the horizontal scanning can be avoided, thereby reducing the interference of the vibration in the measurement, and improving the speed and accuracy of the surface three-dimensional shape detection.

接下來說明本發明測量物體表面或內部光反射介面三維形貌的方法,首先進行步驟30提供如圖1所示的光學系統2,以及提供一具有複數張光學繞射圖案樣本的資料庫,該複數張光學繞射圖案樣本對應一光波長的樣本資訊,本實施例為白光。其中,建立該光學繞射圖案樣本的資料庫包括有下列步驟,如圖6所示,先進行步驟300將一平面鏡80放置承載台25上,再以步驟301使該光源模組20產生至少一點光源,其係為白光光源,而經由該物鏡21投射至該平面鏡80上。在步驟301的實施例中,係以複數個二維陣列排列的點光源來做說明。步驟31中,複數個經由光調制單元202反射至物鏡21的入射光,從平面鏡80反射至影像擷取裝置22上。接著進行步驟302,控制該影像擷取裝置22擷取影像,擷取下的影像如圖4A所示的光學繞射影像。要說明的是,由於本實施例具有複數個點光源,因此產生對應的光學繞射影像也是具有複數個光學繞射圖案。每一個被擷取的光學繞射圖案,如圖4B或圖4C所示,其差別在於曝光時間長度的不同。而圖5A與圖5B則是分別對應圖4B與圖4C的光學繞射圖案光強度電腦模擬影像。Next, a method for measuring the three-dimensional shape of the surface or internal light reflecting interface of the present invention will be described. First, step 30 is provided to provide the optical system 2 as shown in FIG. 1, and a database having a plurality of optical diffraction pattern samples is provided. The plurality of optical diffraction pattern samples correspond to sample information of a light wavelength, and the embodiment is white light. The database for establishing the optical diffraction pattern sample includes the following steps. As shown in FIG. 6, a step mirror 80 is first placed on the carrying platform 25, and then the light source module 20 is generated at least one point in step 301. A light source, which is a white light source, is projected onto the plane mirror 80 via the objective lens 21. In the embodiment of step 301, a point source of a plurality of two-dimensional arrays is illustrated. In step 31, a plurality of incident lights reflected by the light modulating unit 202 to the objective lens 21 are reflected from the plane mirror 80 to the image capturing device 22. Then, in step 302, the image capturing device 22 is controlled to capture the image, and the captured image is captured as shown in FIG. 4A. It should be noted that since the embodiment has a plurality of point light sources, the corresponding optical diffraction images are also generated with a plurality of optical diffraction patterns. Each of the captured optical diffraction patterns, as shown in Fig. 4B or Fig. 4C, differs in the length of the exposure time. 5A and FIG. 5B are computer simulation images of optical diffraction pattern light intensity corresponding to FIG. 4B and FIG. 4C, respectively.

再回到圖6所示,接下來進行步驟303,對該平面鏡80進行深度掃描並擷取相應深度的光學繞射影像。每一個深度h0 ~ hn 都取一張光學繞射影像,每一張影像都具有複數個相對應點光源位置的光學繞射圖案。例如,當影像擷取裝置22擷取到關於目前平面鏡位置 h0 的光學繞射影像之後,接著改變該平面鏡的位置 h0 換至 h1 ,例如,透過壓電元件(PZT)調整至下一個位置 h1 之後,繼續擷取關於改變位置的光學繞射影像。由於光學共焦之聚失焦效應,每一個點光源在每一個深度位置所產生的光學繞射圖案是唯一。經過改變該平面鏡深度位置從 h0 至 hn 之後,亦即校正的深度範圍的所有深度均被完成時,對應每一個點光源的位置可以得到複數個對應不同已知深度的光學繞射圖案,這些光學繞射圖案可以作為將來判斷待測物表面深度的比對光學繞射圖案樣本。因此,資料庫中儲存有關於複數個對應光調制單元202所產生的點光源位置所具有的複數張光學繞射圖案樣本。Returning to FIG. 6, proceeding to step 303, the plane mirror 80 is subjected to depth scanning and an optical diffraction image of a corresponding depth is captured. Each depth h 0 ~ h n takes an optical diffraction image, and each image has a plurality of optical diffraction patterns corresponding to the position of the point source. For example, after the image capturing device 22 captures the optical diffraction image about the current plane position h 0 , then changes the position h 0 of the plane mirror to h 1 , for example, through the piezoelectric element (PZT) to the next one. After position h 1 , continue to draw an optical diffraction image of the changed position. Due to the optical defocusing effect of the optical confocal, the optical diffraction pattern produced by each point source at each depth position is unique. After changing the depth position of the plane mirror from h 0 to h n , that is, when all the depths of the corrected depth range are completed, a plurality of optical diffraction patterns corresponding to different known depths can be obtained corresponding to the position of each point source. These optical diffraction patterns can be used as a comparison optical diffraction pattern sample for judging the surface depth of the object to be tested in the future. Therefore, the database stores a plurality of optical diffraction pattern samples having a position of the point light source generated by the plurality of corresponding light modulation units 202.

要說明的,爲了避免物體表面或內部光反射介面反射率不同,而造成步驟33所取得的光學繞射圖案的光強度不一的問題,在另一實施例中,更進一步可以對每一個深度所擷取到關於每一個點光源的繞射圖案樣本,進行正規化的運算,其方程式如式(6)所示:

Figure TW201800720AD00009
…..(6)It should be noted that in order to avoid the problem that the light intensity of the optical diffraction pattern obtained in step 33 is different in order to avoid the difference in the reflectance of the surface of the object or the internal light reflection interface, in another embodiment, it is further possible to A sample of the diffraction pattern for each point source is extracted and normalized. The equation is as shown in equation (6):
Figure TW201800720AD00009
.....(6)

以圖7所示的光學繞射圖案樣本為例,其係為5x5像素(pixel)的影像,其中斜線區域代表亮部,空白區域代表暗部。每一個像素(P0 ~P24 )對應有光強度 I0 (x,y) ~ I24 (x,y)。經過正規化之後的光強度 In0 (x,y)~In24 (x,y)則用方程式(6)來進行演算。其中 Imax 與 Imin 是代表爲正規化之前 I0 (x,y)~I24 (x,y)中最強的光強度值以及最弱的光強度值。在圖7的例子中,最強的是P12 像素所具有的光強度值,最弱為P0 的光強度值。因此,方程式(6)的 Imax 與 Imin 就可以得知。接著,將每一個像素所具有的光強度,代入方程式(6)進行演算,即可以得到每一個像素所具有的正規化光強度值。因此,對每一個點光源位置而言,其所具有的每一個深度的光學繞射圖案樣本都可以經過正規化的演算,使得光學繞射圖案樣本的每一個像素都具有正規化的光強度值。Taking the optical diffraction pattern sample shown in FIG. 7 as an example, it is an image of 5×5 pixels, wherein the oblique line area represents a bright part, and the blank area represents a dark part. Each pixel (P 0 ~ P 24 ) corresponds to a light intensity I 0 (x, y) ~ I 24 (x, y). The normalized light intensity In 0 (x, y) ~ In 24 (x, y) is calculated by equation (6). Where I max and I min represent the strongest light intensity values and the weakest light intensity values in I 0 (x, y) ~ I 24 (x, y) before normalization. In the example of FIG. 7, P has the strongest light intensity value of 12 pixels, the weakest light intensity value of P 0. Therefore, I max and I min of equation (6) are known. Then, by substituting the light intensity of each pixel into equation (6) for calculation, the normalized light intensity value of each pixel can be obtained. Therefore, for each point source position, each depth of the optical diffraction pattern sample can be normalized, so that each pixel of the optical diffraction pattern sample has a normalized light intensity value. .

同理,對於色散物鏡與彩色影像擷取裝置的組合而言,如圖1B所示的架構,則會建立出關於複數種對應不同顏色之光波長的光學繞射圖案樣本,在一實施例中,因為彩色影像擷取裝置具有三種顏色(RGB)的濾波元件,因此,可以建立成紅色光學繞射圖案樣本、綠色光學繞射圖案樣本以及藍色光學繞射圖案樣本,每一種顏色的光學繞射圖案樣本都可以經過方程式(6)來進行正規化演算,使得光學繞射圖案樣本的每一個像素都具有正規化的光強度值。要說明的是,建立資料庫只需要在架設量測系統完成之初進行,其所得到的深度光學繞射圖案樣本,可以作為後來決定待測物表面深度的依據。Similarly, for the combination of the dispersive objective lens and the color image capturing device, as shown in the architecture of FIG. 1B, an optical diffraction pattern sample for a plurality of wavelengths of light corresponding to different colors is established, in an embodiment. Since the color image capturing device has three color (RGB) filtering elements, it is possible to create a red optical diffraction pattern sample, a green optical diffraction pattern sample, and a blue optical diffraction pattern sample, each of which is optically wound. The shot pattern samples can all be normalized by equation (6) such that each pixel of the optical diffraction pattern sample has a normalized light intensity value. It should be noted that the establishment of the database only needs to be carried out at the beginning of the erection measurement system, and the obtained deep optical diffraction pattern sample can be used as a basis for later determining the surface depth of the object to be tested.

步驟30之後,接下來即可進行當待測物表面三維形貌的量測的步驟31,在本步驟中,可以透過複數個點光源陣列的控制以及配合影像擷取裝置的偵測率完成準單擊(quasi-single shot)的全域式(full-field)表面三維形貌掃描,以取得一張關於待測物表面之至少一個位置的光學繞射影像。例如,配合參閱圖1所示,當物鏡21將光調制單元202所產生的複數個點光源,投射至待測物8表面上的時候,影像擷取裝置22可以擷取到一張繞射影像,每一個繞射影像上有複數個光學繞射圖案,分別對應複數個點光源。每一個光學繞射圖案係由複數個像素所構成,每一個像素都有對應的光強度值,此光強度值係由影像擷取裝置22感測而得。After the step 30, the step 31 of measuring the three-dimensional shape of the surface of the object to be tested can be performed. In this step, the control of the plurality of point source arrays and the detection rate of the image capturing device can be completed. A (quasi-single shot) full-field surface three-dimensional topography scan is performed to obtain an optically diffracted image of at least one location of the surface of the object to be tested. For example, when the objective lens 21 projects a plurality of point light sources generated by the light modulating unit 202 onto the surface of the object 8 to be tested, the image capturing device 22 can capture a diffraction image. Each of the diffracted images has a plurality of optical diffraction patterns corresponding to a plurality of point light sources. Each of the optical diffraction patterns is composed of a plurality of pixels, each of which has a corresponding light intensity value, which is obtained by the image capturing device 22.

取得待測物之光學繞射影像之後,接著,再進行步驟32透過影像比對步驟,例如正規化互相關(normalized cross correlation) 比對的方式,來決定待測物上對應點光源的深度。在本步驟中,首先從資料庫中選擇對應該光學繞射影像的點光源位置所具有的複數個光學繞射圖案樣本,每一個光學繞射圖案樣本對應著一個深度值。接下來,根據方程式(7),從光學繞射影像中擷取出每一個光學繞射圖案,並計算出每一光學繞射圖案和每一個光學繞射圖案樣本的一正規化互相關值(normalized cross correlation, NCC)。

Figure TW201800720AD00010
….. (7) 如圖8所示,其中標號50代表影像擷取裝置所產生的光學繞射影像中,關於待測物表面上的特定位置被一點光源投射所反射的光學繞射圖案,而標號511至511n則代表資料庫中對應該點光源位置的多張光學繞射圖案樣本,每一光學繞射圖案樣本對應一個深度值。光學繞射影像的每一像素的亮度值I(x,y),和每一個光學繞射圖案樣本對應的像素所具有的正規化亮度值R(x,y),可透過方程式(7)進行演算,而得到一個NCC值。 因此,光學繞射圖案50在和複數張光學繞射樣本511~511n進行運算之後,可以得到複數個NCC0~NCCn值。由於每一張光學繞射樣本511至511n對應一個深度,因此每一個NCC 值同樣對應一個深度,藉由複數個NCC值NCC0~NCCn與其對應的深度,可以建構出如圖9所示的正規化互相關值與深度關係曲線。從曲線中可以看到其具有一最大值,該最大的NCC值代表待測物的光學繞射圖案和對應該NCC值的光學繞射圖案樣本兩者最接近。因此,最後一個步驟 33,即為從該複數個NCC值NCC0~NCCn中,找出最大NCC值,並以該NCC值所對應的深度值,作為待測物上對應該光學繞射圖案位置的深度。以圖9為例,在深度 250 μm的地方其NCC值最大,因此可以代表待測物表面上對應該光學繞射圖案50的位置其深度為250 μm。同理,其他點光源所對應的光學繞射圖案也是根據前述的方式找出相應的深度。最後,根據多個對應多個點光源位置的深度,即可以透過單一次的光學繞射影像擷取,進行物體表面或內部光反射介面全域式的形貌量測掃描,進而完整的重建待測物表面的二維或者是三維形貌。After obtaining the optical diffraction image of the object to be tested, then performing step 32 through the image comparison step, such as normalized cross correlation, to determine the depth of the corresponding point source on the object to be tested. In this step, a plurality of optical diffraction pattern samples corresponding to the position of the point source corresponding to the optical diffraction image are first selected from the database, and each of the optical diffraction pattern samples corresponds to a depth value. Next, according to equation (7), each optical diffraction pattern is extracted from the optical diffraction image, and a normalized cross-correlation value of each optical diffraction pattern and each optical diffraction pattern sample is calculated (normalized Cross correlation, NCC).
Figure TW201800720AD00010
..... (7) As shown in FIG. 8, wherein reference numeral 50 represents an optical diffraction pattern reflected by a point source on a specific position on the surface of the object to be tested, in the optical diffraction image produced by the image capturing device, Reference numerals 511 to 511n represent a plurality of optical diffraction pattern samples corresponding to the position of the point source in the database, and each optical diffraction pattern sample corresponds to a depth value. The luminance value I(x, y) of each pixel of the optical diffraction image and the normalized luminance value R(x, y) of the pixel corresponding to each optical diffraction pattern sample can be performed by equation (7). Calculus, and get an NCC value. Therefore, after the optical diffraction pattern 50 is operated with the plurality of optical diffraction samples 511 to 511n, a plurality of NCC0 to NCCn values can be obtained. Since each of the optical diffraction samples 511 to 511n corresponds to a depth, each NCC value also corresponds to a depth, and the normalization shown in FIG. 9 can be constructed by a plurality of NCC values NCC0 to NCCn and their corresponding depths. Cross-correlation value versus depth curve. It can be seen from the curve that it has a maximum value which represents the closest optical diffraction pattern of the object to be tested and the optical diffraction pattern sample corresponding to the NCC value. Therefore, in the last step 33, the maximum NCC value is found from the plurality of NCC values NCC0 to NCCn, and the depth value corresponding to the NCC value is used as the position corresponding to the optical diffraction pattern on the object to be tested. depth. Taking Fig. 9 as an example, the NCC value is the largest at a depth of 250 μm, so that it can represent the position of the object to be tested corresponding to the optical diffraction pattern 50 to a depth of 250 μm. Similarly, the optical diffraction pattern corresponding to other point sources also finds the corresponding depth according to the foregoing manner. Finally, according to the depths corresponding to the positions of the plurality of point light sources, the single-mode optical diffraction image capture can be performed, and the surface topographic measurement of the surface of the object or the internal light reflection interface can be performed, and then the complete reconstruction is performed. The two-dimensional or three-dimensional shape of the surface of the object.

要說明的是,對於圖1B或圖1C所示的架構而言,彩色影像擷取裝置22a可以產生對應複數種光波長的光學繞射影像,要說明的是,前述之光波長可以為單一波長或者是一連續波長段所構成。在一實施例中,為紅色光學繞射影像、綠色光學繞射影像以及藍色光學繞射影像。每一種顏色的光學繞射影像中的關於每一個位置的光學繞射圖案在和對應顏色的光學繞射圖案樣本進行演算,同樣可以得到對應不同顏色的正規化互相關值與深度關係曲線。最後,在從複數個曲線中找出最大NCC值,並以該NCC值所對應的深度值,作為待測物上對應該光學繞射圖案位置的深度。It should be noted that, for the architecture shown in FIG. 1B or FIG. 1C, the color image capturing device 22a can generate an optical diffraction image corresponding to a plurality of optical wavelengths, and the foregoing optical wavelength can be a single wavelength. Or it is composed of a continuous wavelength segment. In one embodiment, there are red optical diffracted images, green optical diffracted images, and blue optical diffracted images. The optical diffraction pattern for each position in the optical diffraction image of each color is calculated in the optical diffraction pattern sample corresponding to the corresponding color, and the normalized cross-correlation value and depth relationship curve corresponding to the different colors can also be obtained. Finally, the maximum NCC value is found from the plurality of curves, and the depth value corresponding to the NCC value is used as the depth corresponding to the position of the optical diffraction pattern on the object to be tested.

此外,要說明的是,如果要增加量測解析度,可以再一次變換點光源的位置,如圖10所示,其中在第一時間點的時候,光調制單元202所調制的點光源位置如果左區域所示,其中203a處開的狀態時亦即將光導引至物鏡,203b處關的狀態時,亦即將光導引至他處。當擷取完光學繞射影像的時候,控制與計算單元控制光調制單元202使其改變點光源的位置,形成如圖10中的右區域所述的狀態,如此即可以對待測物表不同位置進行深度量測,以提高解析度。In addition, it should be noted that if the measurement resolution is to be increased, the position of the point source may be changed again, as shown in FIG. 10, wherein at the first time point, the position of the point source modulated by the light modulation unit 202 is As shown in the left area, in the state where 203a is turned on, the light is guided to the objective lens, and when the state of 203b is off, the light is guided to other places. When the optical diffraction image is captured, the control and calculation unit controls the light modulation unit 202 to change the position of the point light source to form a state as described in the right region of FIG. 10, so that different positions of the object table can be measured. Perform depth measurements to increase resolution.

綜合上述,由於本發明之光學系統與物體表面或內部光反射介面(含物體之背面)形貌偵測方法可以利用數位光源,進行同步多點光學掃描進行高速全域式表面三維形貌偵測,以及解決習用共焦偵測物體表面或內部光反射介面(含物體之背面)三維形貌所產生的光學串擾的問題,因此可以提升偵測準確度以及效率,同時也避免習用技術需要進行橫向或垂直掃描時所產生的震動對檢測效果的影響。In summary, since the optical system of the present invention and the surface of the object or the internal light reflection interface (including the back side of the object) topography detection method can utilize the digital light source to perform synchronous multi-point optical scanning for high-speed global surface three-dimensional surface detection, And solving the problem of optical crosstalk caused by the three-dimensional shape of the surface of the confocal detection object or the internal light reflection interface (including the back side of the object), thereby improving the detection accuracy and efficiency, and also avoiding the need for the horizontal or The effect of the vibration generated during vertical scanning on the detection effect.

以上所述,乃僅記載本發明為呈現解決問題所採用的技術手段之較佳實施方式或實施例而已,並非用來限定本發明專利實施之範圍。即凡與本發明專利申請範圍文義相符,或依本發明專利範圍所做的均等變化與修飾,皆為本發明專利範圍所涵蓋。The above description is only intended to describe the preferred embodiments or embodiments of the present invention, which are not intended to limit the scope of the invention. That is, the equivalent changes and modifications made in accordance with the scope of the patent application of the present invention or the scope of the invention are covered by the scope of the invention.

2‧‧‧光學系統
20‧‧‧光源模組
200‧‧‧光源
201‧‧‧準直鏡組
202‧‧‧光調制單元
203、203a­、203b‧‧‧光控開關
21、21a‧‧‧物鏡
22、22a‧‧‧影像擷取裝置
23‧‧‧控制與計算單元
24‧‧‧分光元件
25‧‧‧乘載台
26‧‧‧聚焦鏡組
50‧‧‧光學繞射圖案
511~511n‧‧‧光學繞射圖案樣本
8、8a‧‧‧待測物
80‧‧‧平面鏡
81‧‧‧底面
82‧‧‧內部平面
83‧‧‧待測物內部的裂縫或者是內部的中空結構
90‧‧‧入射光
91‧‧‧準直光場
93、93a­、93b‧‧‧物光
2‧‧‧Optical system
20‧‧‧Light source module
200‧‧‧Light source
201‧‧‧ collimating mirror
202‧‧‧Light Modulation Unit
203, 203a, 203b‧‧‧ light switch
21, 21a‧‧‧ objective lens
22, 22a‧‧‧ image capture device
23‧‧‧Control and calculation unit
24‧‧‧Spectral components
25‧‧‧Loading station
26‧‧‧ Focusing mirror
50‧‧‧ optical diffraction pattern
511~511n‧‧‧ optical diffraction pattern sample
8, 8a‧‧‧Test objects
80‧‧‧ flat mirror
81‧‧‧ bottom
82‧‧‧Internal plane
83‧‧‧ Cracks inside the object to be tested or hollow structures inside
90‧‧‧ incident light
91‧‧‧ Collimated light field
93, 93a, 93b‧‧‧ ‧ light

圖1A為本發明之光學系統第一實施例示意圖; 圖1B為本發明之光學系統第二實施例示意圖; 圖1C為本發明之光學系統第三實施例示意圖; 圖1D為本發明之光學系統第四實施例示意圖; 圖2A與圖2B 為光控開關以及改變其反射方向示意圖; 圖2C為利用光調制單元模擬點光源示意圖; 圖3為說明夫朗和斐繞射示意圖; 圖4A為影像擷取裝置所擷取關於一物體表面或內部光反射介面的繞射影像; 圖4B與圖4C為不同曝光時間的光學繞射影像; 圖5A與圖5B為關於圖4A與圖4B的光學繞射影像光強度的3D電腦模擬示意圖; 圖6為建構資料庫改並平面鏡位置示意圖; 圖7為光學繞射圖案樣本中每一個像素的光強度示意圖; 圖8為每一個光學繞射圖案和對應的複數個光學繞射圖案樣本進行演算關係示意圖; 圖9為正規化互相關與深度關係曲線示意圖;以及 圖10為光調制單元變換點光源示意圖。1A is a schematic view showing a first embodiment of an optical system according to the present invention; FIG. 1B is a schematic view showing a second embodiment of an optical system according to the present invention; FIG. 1C is a schematic view showing a third embodiment of the optical system of the present invention; FIG. 2A and FIG. 2B are diagrams showing the light control switch and changing its reflection direction; FIG. 2C is a schematic diagram of simulating a point light source by using a light modulation unit; FIG. 3 is a schematic diagram showing the diffraction of Fulang and Fei; FIG. The diffracting device captures a diffracted image of an object surface or an internal light reflecting interface; FIGS. 4B and 4C are optical diffraction images of different exposure times; FIGS. 5A and 5B are optical windings of FIGS. 4A and 4B 3D computer simulation diagram of image light intensity; Figure 6 is a schematic diagram of the construction of the database and the position of the plane mirror; Figure 7 is a schematic diagram of the light intensity of each pixel in the optical diffraction pattern sample; Figure 8 is a diagram of each optical diffraction pattern and corresponding Schematic diagram of the calculation relationship of a plurality of optical diffraction pattern samples; FIG. 9 is a schematic diagram of normalized cross-correlation and depth relationship curves; and FIG. 10 is a light modulation unit transformation point Schematic diagram of the source.

2‧‧‧光學系統 2‧‧‧Optical system

20‧‧‧光源模組 20‧‧‧Light source module

200‧‧‧光源 200‧‧‧Light source

201‧‧‧準直鏡組 201‧‧‧ collimating mirror

202‧‧‧光調制單元 202‧‧‧Light Modulation Unit

203‧‧‧光控開關 203‧‧‧Light switch

21‧‧‧物鏡 21‧‧‧ Objective lens

22‧‧‧影像擷取裝置 22‧‧‧Image capture device

23‧‧‧控制與計算單元 23‧‧‧Control and calculation unit

24‧‧‧分光元件 24‧‧‧Spectral components

25‧‧‧乘載台 25‧‧‧Loading station

8‧‧‧待測物 8‧‧‧Test object

90‧‧‧入射光 90‧‧‧ incident light

91‧‧‧準直光場 91‧‧‧ Collimated light field

93‧‧‧物光 93‧‧‧ ‧ light

Claims (24)

一種光學系統,包括有: 一光源模組,用以產生至少一點光源; 一物鏡,用以將該至少一點光源投射至一物體表面或內部光反射介面的至少一位置; 一影像擷取裝置,用以接收由該至少一位置反射之至少一反射物光,以產生相應的一光學繞射影像,其係具有至少一光學繞射圖案,每一光學繞射圖案對應該物體表面或內部光反射介面上之一形貌深度位置;以及 一控制與計算單元,將該光學繞射影像中對應每一形貌深度位置的光學繞射圖案與複數個光學繞射圖案樣本進行運算,以決定每一物體表面或內部光反射介面位置的形貌深度。An optical system includes: a light source module for generating at least one light source; an objective lens for projecting the at least one light source to at least one position of an object surface or an internal light reflecting interface; an image capturing device, Receiving at least one reflector light reflected by the at least one location to generate a corresponding optical diffraction image having at least one optical diffraction pattern, each optical diffraction pattern corresponding to an object surface or internal light reflection a topographical depth position on the interface; and a control and calculation unit for calculating an optical diffraction pattern corresponding to each depth position of the optical diffraction image and a plurality of optical diffraction pattern samples to determine each The depth of the topography of the surface of the object or the position of the internal light reflecting interface. 如申請專利範圍第1項所述之光學系統,其中該光源模組更具有: 一光源,用以產生一入射光; 一準直鏡組,用以將該入射光準直;以及 一光調制單元,用以將該準直入射光調制成該至少一點光源。The optical system of claim 1, wherein the light source module further comprises: a light source for generating an incident light; a collimating mirror group for collimating the incident light; and a light modulation And a unit for modulating the collimated incident light into the at least one light source. 如申請專利範圍第2項所述之光學系統,其係更包括有一分光元件,設置在該準直鏡組以及該光調制單元之間,該物鏡為一色散物鏡,其中,該入射光經過該分光元件投射至該光調制單元,該光調制單元將入射光調制成至少一點光源,再反射至該準直鏡組,進而將該至少一點光源準直而導引至該色散物鏡,該色散物鏡將點光源色散之後而投射至該物體表面或內部光反射介面,而產生該反射物光,該反射物光循原光路,再次投射至該光調制單元,該光調制單元再將該反射物光反射至該分光元件,該分光元件將該反射物光分光導引至該影像擷取裝置。The optical system of claim 2, further comprising a beam splitting element disposed between the collimating mirror group and the light modulating unit, wherein the objective lens is a dispersive objective lens, wherein the incident light passes through the optical lens The light splitting component is projected to the light modulating unit, and the light modulating unit modulates the incident light into at least one light source, and then reflects the light to the collimating mirror group, and then guides the at least one light source to the color objective lens, and the dispersion After the objective lens disperses the point source and then projects onto the surface of the object or the internal light reflection interface, the reflector light is generated, and the reflector light is again projected to the light modulation unit according to the original light path, and the light modulation unit further reflects the reflector Light is reflected to the spectroscopic element, and the spectroscopic element directs the spectroscopic light to the image capturing device. 如申請專利範圍第2項所述之光學系統,其中該光調制單元為數位微型反射鏡元件或矽基液晶元件。The optical system of claim 2, wherein the light modulating unit is a digital micro mirror element or a germanium based liquid crystal element. 如申請專利範圍第2項所述之光學系統,其中該入射光為寬頻光或單頻光。The optical system of claim 2, wherein the incident light is broadband light or single frequency light. 如申請專利範圍第1項所述之光學系統,該控制與計算單元將每一光學繞射圖案與該複數個光學繞射圖案樣本進行運算,使得每一光學繞射圖案產生相對於該複數個光學繞射圖案樣本之複數個正規化互相關數值,每一個正規化互相關的數值對應一個深度,該控制與計算單元以最大的正規化互相關值所對應的深度,為相對應光學繞射圖案之物體表面或內部光反射介面上位置的形貌深度。The optical system of claim 1, wherein the control and calculation unit operates each optical diffraction pattern and the plurality of optical diffraction pattern samples such that each optical diffraction pattern is generated relative to the plurality of optical diffraction patterns. a plurality of normalized cross-correlation values of the optical diffraction pattern samples, each of the normalized cross-correlation values corresponding to a depth, and the control and the calculation unit have corresponding depths corresponding to the maximum normalized cross-correlation values, corresponding to optical diffraction The depth of the topography of the surface of the patterned object or the position of the internal light reflecting interface. 如申請專利範圍第1項所述之光學系統,其中該至少一點光源構成一維或二維的點光源陣列。The optical system of claim 1, wherein the at least one light source constitutes a one-dimensional or two-dimensional array of point light sources. 如申請專利範圍第1項所述之光學系統,其中每一點光源之間相距一距離,而不產生串擾。The optical system of claim 1, wherein each point source is at a distance from each other without crosstalk. 如申請專利範圍第8項所述之光學系統,其中該控制與計算單元控制該光源模組產生複數個點光源,以完成準單擊的全域式表面三維形貌掃描,進而取得一張關於待測物表面之複數個位置的光學繞射影像。The optical system of claim 8, wherein the control and calculation unit controls the light source module to generate a plurality of point light sources to complete a three-dimensional topography scan of the quasi-click surface, thereby obtaining a An optically diffracted image of a plurality of locations on the surface of the object. 如申請專利範圍第1項所述之光學系統,其中該物鏡為一色散物鏡,該影像擷取裝置為一彩色影像擷取裝置,用以產生複數個光學繞射影像,每一光學繞射影像為對應一種波長的光在其深度聚焦位置所形成的一光學繞射影像。The optical system of claim 1, wherein the objective lens is a chromatic objective lens, and the image capturing device is a color image capturing device for generating a plurality of optical diffraction images, each of the optical diffraction images. An optical diffraction image formed by a light of a wavelength corresponding to a depth focus position thereof. 如申請專利範圍第10項所述之光學系統,其中該色散物鏡為一折射式或光學繞射式色散物鏡。The optical system of claim 10, wherein the dispersive objective lens is a refractive or optically diffractive dispersive objective lens. 一種物體表面或內部光反射介面三維形貌偵測方法,包括有下列步驟: 產生至少一點光源; 以一物鏡將該至少一點光源投射至一物體表面或內部光反射介面的至少一形貌深度位置; 使該至少一形貌深度位置反射之至少一反射物光通過該物鏡; 將該至少一反射物光導引至一影像擷取裝置; 該影像擷取裝置感測該至少一反射物光而產生一光學繞射影像,其係具有對應該至少一形貌深度位置的至少一光學繞射圖案;以及 從該光學繞射影像中分別擷取該至少一光學繞射圖案,並將每一光學繞射圖案與複數個光學繞射圖案樣本進行運算,以決定對應每一物體表面或內部光反射介面位置的形貌深度。A method for detecting a three-dimensional shape of an object surface or an internal light reflection interface, comprising the steps of: generating at least one light source; projecting the at least one light source to an at least one topography depth position of an object surface or an internal light reflection interface by an objective lens Passing at least one reflector light reflected by the at least one topography depth position through the objective lens; guiding the at least one reflector light to an image capturing device; the image capturing device sensing the at least one reflector light Generating an optical diffraction image having at least one optical diffraction pattern corresponding to a depth position of at least one topography; and extracting at least one optical diffraction pattern from the optical diffraction image, and each optical The diffraction pattern is computed with a plurality of optical diffraction pattern samples to determine the depth of the topography corresponding to the position of each object surface or internal light reflecting interface. 如申請專利範圍第12項所述之物體表面或內部光反射介面三維形貌偵測方法,其中該至少一點光源構成一維或二維的點光源陣列。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 12, wherein the at least one light source constitutes a one-dimensional or two-dimensional array of point light sources. 如申請專利範圍第12項所述之物體表面或內部光反射介面三維形貌偵測方法,其中產生該至少一點光源更包括有下列步驟: 提供一光源用以產生一入射光; 以一準直鏡組準直該入射光,並將準直的入射光導引至一光調制單元;以及 控制該光調制單元的第一區域將該準直寬頻光調制成該至少一點光源,而導引至該物鏡,並控制該光調制單元中環繞於該第一區域外圍的第二區域,將該準直入射光導引至不同於該物鏡的區域。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 12, wherein the generating the at least one light source further comprises the steps of: providing a light source for generating an incident light; The mirror group collimates the incident light and directs the collimated incident light to a light modulation unit; and controls the first region of the light modulation unit to modulate the collimated broadband light into the at least one light source, and guides To the objective lens, and controlling a second region of the light modulation unit that surrounds the periphery of the first region, directing the collimated incident light to a region different from the objective lens. 如申請專利範圍第12項所述之物體表面或內部光反射介面三維形貌偵測方法,其中產生該至少一點光源更包括有下列步驟: 提供一光源用以產生一入射光; 以一準直鏡組準直該入射光,並將準直的入射光導引至一光調制單元;以及 控制該光調制單元產生複數個點光源以完成準單擊的全域式表面三維形貌掃描。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 12, wherein the generating the at least one light source further comprises the steps of: providing a light source for generating an incident light; The mirror group collimates the incident light and directs the collimated incident light to a light modulation unit; and controls the light modulation unit to generate a plurality of point light sources to complete the quasi-click global surface three-dimensional topography scan. 如申請專利範圍第12項所述之物體表面或內部光反射介面三維形貌偵測方法,其中產生該至少一點光源更包括有下列步驟: 提供一光源用以產生一入射光; 以一準直鏡組準直該入射光,並將準直的入射光導引一分光元件; 該分光元件將該入射光分光並導引至一光調制單元;以及 控制該光調制單元的第一區域將該準直寬頻光調制成該至少一點光源,而導引至該色散物鏡,並控制該光調制單元中環繞於該第一區域外圍的第二區域,將該準直入射光導引至不同於該色散物鏡的區域。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 12, wherein the generating the at least one light source further comprises the steps of: providing a light source for generating an incident light; The mirror group collimates the incident light and directs the collimated incident light to a beam splitting element; the beam splitting element splits and directs the incident light to a light modulating unit; and controls the first region of the light modulating unit to And collimating the broadband light into the at least one light source, guiding to the dispersion objective lens, and controlling a second region of the light modulation unit surrounding the periphery of the first region, guiding the collimated incident light to be different from the The area of the dispersion objective. 如申請專利範圍第12項所述之物體表面或內部光反射介面三維形貌偵測方法,其中產生該至少一點光源更包括有下列步驟: 提供一光源用以產生一入射光; 以一準直鏡組準直該入射光,並將準直的入射光導引一分光元件; 該分光元件將該入射光分光並導引至一光調制單元;以及 控制該光調制單元產生複數個點光源以完成準單擊的全域式物體表面或內部光反射介面三維形貌掃描。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 12, wherein the generating the at least one light source further comprises the steps of: providing a light source for generating an incident light; The mirror group collimates the incident light and directs the collimated incident light to a light splitting element; the splitting element splits and directs the incident light to a light modulating unit; and controls the light modulating unit to generate a plurality of point light sources Complete the three-dimensional topography scan of the surface of the universal object or the internal light reflection interface of the quasi-click. 如申請專利範圍第16項所述之物體表面或內部光反射介面三維形貌偵測方法,其係更包括有調制該反射物光之步驟: 控制該光調制單元的第一區域將該反射物光導引至該分光元件,並控制該光調制單元中環繞於該第一區域外圍的第二區域,將該反射物光導引至不同於該分光元件的區域;以及 該分光元件將該反射物光分光,並導引至該影像擷取裝置。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 16 further comprising the step of modulating the light of the reflector: controlling the first region of the light modulation unit to reflect the reflector Light is guided to the light splitting element, and controls a second region of the light modulating unit that surrounds a periphery of the first region, directs the reflector light to a region different from the light splitting element; and the light splitting element reflects the light The object light is split and directed to the image capture device. 如申請專利範圍第15項所述之物體表面或內部光反射介面三維形貌偵測方法,其中該光調制單元為數位微型反射鏡元件或矽基液晶元件。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 15, wherein the light modulation unit is a digital micro mirror element or a germanium liquid crystal element. 如申請專利範圍第15項所述之物體表面或內部光反射介面三維形貌偵測方法,其中該入射光為寬頻光或單頻光。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 15 , wherein the incident light is broadband light or single frequency light. 如申請專利範圍第12項所述之物體表面或內部光反射介面三維形貌偵測方法,其中決定出每一物體表面或內部光反射介面位置的形貌深度更包括有下列步驟: 建立一資料庫,其係具有至少一種光波長的樣本資訊,每一樣本資訊包括有複數個對應不同深度的光學繞射圖案樣本; 將每一擷取到的光學繞射圖案,和資料庫中與其相對應之點光源位置之複數個對應不同深度的光學繞射圖案樣本進行運算,以產生複數個關於光學繞射圖案樣本之互相關數值;以及 以該複數個互相關值中最大值所對應的光學繞射圖案樣本所對應的深度作為對應該光學繞射圖案位置的形貌深度。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 12, wherein determining the depth of the surface of each object or the position of the internal light reflection interface further comprises the following steps: a library having sample information of at least one wavelength of light, each sample information comprising a plurality of optical diffraction pattern samples corresponding to different depths; each of the extracted optical diffraction patterns corresponding to the data library a plurality of optical diffraction pattern samples corresponding to different depths of the point source position are calculated to generate a plurality of cross-correlation values for the optical diffraction pattern samples; and optical windings corresponding to the maximum of the plurality of cross-correlation values The depth corresponding to the pattern sample is taken as the topography depth corresponding to the position of the optical diffraction pattern. 如申請專利範圍第20項所述之物體表面或內部光反射介面三維形貌偵測方法,其中建立該每一種光波長的樣本資訊更包括有下列步驟: 提供一鏡面,其表面與該物鏡具有一第一深度距離; 以對應特定光波長之至少一校正點光源經由該物鏡頭產生色散之後入射至該鏡面上; 從該鏡面反射的反射物光經由該物鏡後,被導引至該影像擷取裝置而產生關於該第一深度距離的一校正光學繞射影像,其係具有至少一光學繞射圖案樣本,其係分別對應一校正點光源; 分別擷取關於該第一深度距離之該至少一光學繞射圖案樣本; 將該第一距離改變至一第二深度距離,進一步取得關於改變後第二深度距離的另一校正光學繞射影像;以及 分別擷取關於該第二深度距離之該至少一光學繞射圖案樣本。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 20, wherein the establishing the sample information of each light wavelength further comprises the following steps: providing a mirror surface having a surface and the objective lens a first depth distance; at least one correction point light source corresponding to the specific light wavelength is generated by the object lens and then incident on the mirror surface; and the reflector light reflected from the specular lens is guided to the image through the objective lens. Taking a device to generate a corrected optical diffraction image about the first depth distance, which has at least one optical diffraction pattern sample respectively corresponding to a correction point light source; respectively extracting at least the first depth distance An optical diffraction pattern sample; changing the first distance to a second depth distance to further obtain another corrected optical diffraction image about the changed second depth distance; and separately extracting the second depth distance At least one optical diffraction pattern sample. 如申請專利範圍第21項所述之物體表面或內部光反射介面三維形貌偵測方法,其更包括有對分別對每一光學繞射圖案樣本進行正規化演算之步驟。The method for detecting a three-dimensional shape of an object surface or an internal light reflection interface according to claim 21, further comprising the step of performing normalization calculation on each optical diffraction pattern sample separately. 如申請專利範圍第21項所述之物體表面或內部光反射介面三維形貌偵測方法,其中該物鏡為一色散物鏡,該影像擷取裝置為一彩色影像擷取裝置,用以產生複數個對應不同光波長的校正光學繞射影像。The method for detecting a three-dimensional shape of an object surface or an internal light reflecting interface according to claim 21, wherein the objective lens is a chromatic objective lens, and the image capturing device is a color image capturing device for generating a plurality of color image capturing devices. Corrected optical diffraction images corresponding to different wavelengths of light.
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