TW201741774A - Method for light exposing workpiece, exposure apparatus, and placement mechanism of exposure apparatus - Google Patents

Abstract

An exposure apparatus includes an operation chamber, a displacement area arranged outside the operation chamber, an aligning device and an exposure device both disposed in the operation chamber, two first frames respectively arranged in the operation chamber and the displacement area, and two second frames respectively arranged in the operation chamber and the displacement area. The positions of the two first frames are interchangeable, and the positions of the two second frames are interchangeable. Each one of the first frame and the second frame in the operation chamber is aligned with the exposure device by the aligning device. Thus, the exposure apparatus of the instant disclosure is provided with better operation efficiency. In addition, the instant disclosure also provides a method for light exposing a workpiece and a placement mechanism of an exposure apparatus.

Description

Workpiece exposure method, exposure apparatus and its setting mechanism

The present invention relates to a semiconductor manufacturing apparatus, and to a workpiece exposure method, an exposure apparatus, and a mounting mechanism thereof.

In the prior art, the alignment device is disposed in a different area from the exposure device, for example, the exposure device is disposed in the working chamber, and the alignment device is disposed outside the working chamber. Therefore, in the conventional exposure apparatus, the alignment operation of the frame and the workpiece is performed by the alignment device, and then the frame and the workpiece are moved into the working chamber to be exposed by the exposure device. However, the construction and operation of existing exposure devices have virtually reduced operational efficiency.

Accordingly, the inventors believe that the above-mentioned defects can be improved, and that the invention has been studied with great interest and with the use of scientific principles, and finally proposes a present invention which is rational in design and effective in improving the above-mentioned defects.

Embodiments of the present invention provide a workpiece exposure method, an exposure apparatus, and a mounting mechanism thereof, which can effectively improve problems that may occur in existing exposure apparatuses.

The embodiment of the invention discloses a workpiece exposure method, comprising: placing a first workpiece to be exposed on a first frame; moving the first frame, and then performing the first frame with a position aligning device An alignment operation between the frame and an exposure device, wherein the exposure device performs an exposure operation on the first workpiece to be exposed on the first frame; in the first frame and the object to be exposed The first workpiece performs the alignment During at least one of the operation and the exposure operation, placing a second workpiece to be exposed in a second frame; and moving the second frame, and then performing the positioning with the position aligning device An alignment operation between the second frame and the exposure device, after which the exposure device performs an exposure operation on the second workpiece to be exposed on the second frame; in the second frame And performing, during the at least one operation of the alignment work and the exposure operation, the second workpiece to be exposed, placing another first workpiece to be exposed on another first frame, and then moving the exchange The position of the first frame and the other first frame.

The embodiment of the invention also discloses an exposure apparatus, comprising: a working chamber and a component area on the outdoor side of the working chamber; a position aligning device disposed in the working chamber; and an exposure device disposed on the Inside the working chamber; two first frames are respectively disposed in the working chamber and the set region, and any one of the first frames is movably coupled to the other of the first frames Position exchange; and two second frames respectively disposed in the working chamber and the set region, and any one of the second frames is movably movable with another of the second frames Position exchange; wherein the first frame and the second frame located in the working chamber can perform alignment work with the exposure device through the position aligning device.

The embodiment of the invention further discloses a device for mounting an exposure device, comprising: a working chamber and a component area on an outdoor side of the working chamber; two first frame frames respectively disposed in the working chamber and a placement area, and any one of the first frames is movably exchangeable with another one of the first frames; and two second frames are respectively disposed in the working chamber and The component area is described, and any of the second frames can be movably exchanged with another of the second frames.

In summary, the exposure apparatus and the mounting mechanism thereof disclosed in the embodiments of the present invention can exchange positions with a plurality of frames outside the working chamber (ie, the mounting area) through a plurality of frames in the working chamber. To avoid the situation where the operator is idle, And improve production efficiency. Furthermore, the exposure device furtherly positions the alignment device and the exposure device in the working chamber, so that different frames located in the working chamber can perform the alignment work and the exposure operation at the same time, thereby facilitating further operations. Improve production efficiency. Moreover, the workpiece exposure method disclosed in the embodiments of the present invention can better combine the workpiece operation, the pickup operation, the alignment operation, and the exposure operation to achieve better production performance.

For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings limits.

100‧‧‧Exposure equipment

10‧‧‧Placement agency

1‧‧‧Working room

2‧‧‧Place area

3, 3’‧‧‧ first frame

4, 4’‧‧‧ second frame

5‧‧‧ Position Alignment Device

51‧‧‧ alignment module

6‧‧‧Exposure device

61‧‧‧Exposure source

62‧‧‧ film frame

63‧‧‧ negatives

7‧‧‧Visual device

8, 8'‧‧‧ third frame

S‧‧‧Line direction

H‧‧‧ horizontal direction

W1‧‧‧ first workpiece

W1’‧‧‧ another first artifact

W1”‧‧‧ another first workpiece

W2‧‧‧ second workpiece

W2’‧‧‧ another second workpiece

Figure 1 is a side elevational view of the exposure apparatus of the present invention.

2 is a perspective view of the exposure apparatus of the present invention.

Figure 3 is a top plan view of the exposure apparatus of the present invention.

4 is a schematic view showing the movement of the first frame and the second frame of the exposure apparatus of the present invention.

FIG. 5 is another schematic diagram of movement of the first frame and the second frame of the exposure apparatus of the present invention.

Fig. 6 is a perspective view showing a variation of the exposure apparatus of the present invention.

Figure 7 is a schematic view showing the step S110 of the workpiece exposure method of the present invention.

Figure 8 is a schematic view showing the step S130 of the workpiece exposure method of the present invention.

Figure 9 is a schematic view showing the step S150 of the workpiece exposure method of the present invention.

Figure 10 is a schematic view showing the step S170 of the workpiece exposure method of the present invention.

Figure 11 is a schematic view showing the step S190 of the workpiece exposure method of the present invention.

Please refer to FIG. 1 to FIG. 11 for an embodiment of the present invention. It should be noted that the related embodiments of the present invention are only used to specifically describe the embodiments of the present invention, so that It is to be understood that the scope of the invention is not intended to limit the scope of the invention.

Referring to FIG. 1 to FIG. 3 , the embodiment discloses an exposure apparatus 100, in particular It refers to an exposure apparatus 100 suitable for performing alignment work and exposure work on a plurality of workpieces (eg, a circuit board) at the same time, but is not limited thereto. The exposure apparatus 100 includes a working chamber 1 , a placement area 2 on the outside of the working chamber 1 , and two first frames 3 respectively disposed in the working chamber 1 and the mounting area 2 . 3', two second frames 4, 4' respectively disposed in the working chamber 1 and the mounting region 2, a position aligning device 5 disposed in the working chamber 1, and an exposure device 6 And a visual device 7 disposed in the working chamber 1 and positioned above the exposure device 6 and the alignment device 5.

It should be noted that the actual application of the components of the exposure apparatus 100 is not limited to the embodiment, for example, the working chamber 1, the mounting area 2, the two first frames 3, 3', and The two second frames 4, 4' may be collectively referred to as a placement mechanism 10 (as in Figures 4 and 5) and are adapted for use in other exposure devices than the drawings. Hereinafter, the configuration of each component included in the exposure apparatus 100 of the present embodiment will be separately described, and then the connection relationship between the components will be described in time, and finally the operation flow of the exposure apparatus 100 will be explained.

In the present embodiment, the working chamber 1 corresponds to an inner closed area covered by a casing (not shown) of the exposure apparatus 100, that is, an area of the exposure apparatus 100 that the operator has less access to. . In the present embodiment, the placement area 2 corresponds to an external open area of the exposure apparatus 100 for the operator to place the workpiece to be exposed and to remove the exposed workpiece.

Each of the first frames 3, 3' is for carrying a workpiece (such as a circuit board) and can fix the workpiece by suction, and any one of the first frames 3 is movably coupled to the other first frame 3 'Location exchange. Furthermore, each of the second frames 4, 4' is for carrying a workpiece (such as a circuit board) and can fix the workpiece by suction, and any one of the second frames 4 is movably coupled with another second The frame 4' performs position exchange.

The position exchange path of the two first frames 3, 3' is in this embodiment. Is a position exchange path parallel to the two second frames 4, 4' (as shown in Figure 4), but does not exclude that the position exchange paths of the two first frames 3, 3' are staggered in two The position exchange path of the second frame 4, 4' is as shown in Fig. 5. Furthermore, the position exchange between the two first frames 3, 3' and the positions of the two second frames 4, 4' are exchanged non-simultaneously and have a time difference, the time difference being the same as in the embodiment. The middle is no more than 10 seconds, or it can be said that the time difference is not greater than the alignment work time of the position alignment device 5 corresponding to any of the first frames 3, 3' or any of the second frames 4, 4'.

It should be noted that the first frame 3, 3' and the second frame 4, 4' are all of the same structure in this embodiment and are essentially "frames", and the above "The second" is for the sake of illustration to facilitate the distinction between the two. Furthermore, the actuation of the first frame 3, 3' and the actuation of the second frame 4, 4' can be performed by providing a corresponding mechanism, and the above "corresponding mechanism" will not be described herein. .

The position aligning device 5 includes two aligning modules 51 that operate independently in this embodiment. The two alignment modules 51 are respectively disposed under the first frame 3 ′ and the second frame 4 ′ in the working chamber 1 , and the two alignment modules 51 are used for The positions of the first frame 3' and the second frame 4' located in the working chamber 1 are individually and independently adjusted.

Further, the two alignment modules 51 are used to adjust the positions of the first frame 3' and the second frame 4' located in the working chamber 1 respectively and non-simultaneously. Therefore, the first frame 3' and the second frame 4' located in the working chamber 1 can be aligned with the exposure device 6 by the alignment device 5. Further, when one of the two alignment modules 51 of the alignment module 51 is used to adjust one of the first frame 3' and the second frame 4' located in the working chamber 1 In the position of the exposure device 6, the exposure device 6 is used to perform an exposure operation on the other of the first frame 3' and the second frame 4' in the working chamber 1.

Each of the alignment modules 51 is provided with a longitudinal, lateral, vertical, and rotational driving mechanism, so that each of the corresponding first frame 3' or second frame 4' can be Orientation adjustment. The specific configuration of each of the alignment modules 51 is not limited in this embodiment. Moreover, the visual device 7 can be used to capture images to assist each of the alignment modules 51 in performing alignment operations.

The exposure device 6 includes two film frames 62, two negative films 63 respectively mounted to the two negative film frames 62, and a single exposure light source 61. Wherein, the two film frames 62 are respectively disposed above the first frame 3' and the second frame 4' located in the working chamber 1, and each of the film frames 62 can substantially along a horizontal direction H Pull away from the working chamber 1. Further, the two alignment modules 51 are used to respectively respectively position the first frame 3' and the second frame 4' located in the working chamber 1 with the negatives in the two negative frames 62. 63 performs the alignment work. The above-mentioned alignment operation refers to: when the workpiece is carried on the first frame 3' or the second frame 4', the alignment module 51 is used to set the first frame 3' or the second frame. The pair of workpieces on the frame 4' are located on the corresponding backsheet 63.

The exposure light source 61 is elongated in this embodiment, and the length of the exposure light source 61 is not less than the length of any of the first frames 3, 3' or any of the second frames 4, 4', and the exposure light source 61 The width is smaller than the width of any of the first frames 3, 3' or any of the second frames 4, 4'. The exposure light source 61 can be moved relative to the first frame 3' and the second frame 4' located in the working chamber 1 to make the first frame 3' and the second position in the working chamber 1 The stage 4' is located below the range of movement of the exposure light source 61. Further, the exposure light source 61 is moved substantially in the straight line direction S (eg, the width of the parallel exposure light source 61) in the present embodiment, and is located in the first frame 3' and the second frame in the working chamber 1. The arrangement direction of 4' is parallel to the above-described linear direction S.

Thereby, the exposure light source 61 can sequentially perform the exposure operation of the first frame 3' and the second frame 4' in the working chamber 1 during the movement. The exposure operation described above means that the exposure light source 61 exposes the workpieces on the corresponding first frame 3, 3' or the second frame 4, 4' through the film 63. That is, the exposure light source 61 first moves the first workpiece to be exposed on the first frame 3, 3' during the moving process. The exposure operation is performed by W1, and then the exposure operation is performed on the second workpiece W2 to be exposed on the second frame 4, 4'.

It should be noted that the exposure operation sequence of the exposure light source 61 of the present embodiment is the first frame 3', the second frame 4', the first frame 3, and the second frame 4 (this will be described later). However, in another embodiment not shown, the exposure operation sequence of the exposure light source 61 is not excluded: the first frame 3', the second frame 4', the second frame 4, and the first frame 3, thereby All the moving processes of the exposure light source 61 can perform an exposure operation, and the effect of using the exposure light source 61 can be achieved.

In addition, although the present embodiment is described by four frame frames (ie, two first frame frames 3, 3' and two second frame frames 4, 4'), the present invention does not exclude the addition of 2N frame frames. N is a positive integer. For example, as shown in FIG. 6, the exposure apparatus 100 can add two third frames 8, 8' and corresponding structures (such as the alignment module 51, the negative film 63, and the negative frame 62), the above two The structure and function of the three frames 8, 8' correspond to the two first frames 3, 3' or the two second frames 4, 4'. Furthermore, the third frame 8' located in the working chamber 1 is preferably disposed below the moving range of the exposure light source 61, so that the exposure light source 61 can be sequentially aligned in the working cavity during the moving process. The first frame 3', the second frame 4', and the third frame 8' in the chamber 1 perform an exposure operation, so that it is not necessary to amplify the exposure light source 61.

The above is a description of the configuration and corresponding relationship of the components of the exposure apparatus 100 of the present embodiment. Next, a workpiece exposure method implemented by the exposure apparatus 100 described above will be described, including steps S110 to S190 (FIG. 7 to FIG. 11). That is, the exposure apparatus 100 of the present embodiment provides the first frame 3, the other first frame 3', the second frame 4, the other second frame 4', and the position alignment device. 5. An exposure device 6, and the exposure apparatus 100 of the present embodiment can be used to execute the first frame 3, another first frame 3', second frame 4, and another second frame The movement of 4', the alignment operation of the position aligning device 5, and the exposure operation of the exposure device 6.

However, it should be noted that the workpiece exposure method described in this embodiment is included. Steps S110 to S190 are described. However, the workpiece exposure method is capable of cyclic operation and implementation based on the above steps S110 to S190, and does not mean that the workpiece exposure method includes only steps S110 to S190. Furthermore, the workpiece exposure method of the present embodiment is not limited to being implemented only by the above-described exposure apparatus 100, and each step of the following workpiece exposure method can be implemented by rational adjustment.

In addition, in the following description, according to the current practical experience, the time for manually placing the workpiece in the frame is about 7-8 seconds, and the time for the alignment operation is about 9-10 seconds. The time is about 5-6 seconds, so that the above-mentioned time is better overlapped by the workpiece exposure method of the embodiment to achieve better production performance, but not limited to the above time. In addition, although the present embodiment is described by manually picking up and placing a workpiece, the present invention does not exclude the use of a non-manual method (such as a robot arm) for picking up and placing a workpiece.

Step S110: As shown in FIG. 7, a first workpiece W1 (such as a circuit board) to be exposed is placed on a first frame 3. Further, the first workpiece W1 is manually placed on the first frame 3 located in the placement area 2 in a coarse step alignment manner.

Step S130: As shown in FIG. 8, the first frame 3 is moved, and then the alignment operation between the first frame 3 and the exposure device 6 is performed by a position aligning device 5. Further, the first frame 3 located in the set region 2 is exchanged with the first frame 3' located in the working chamber 1 such that the first frame 3 and the first workpiece W1 are located in the working chamber 1. Thereafter, the corresponding alignment module 51 aligns the first frame 3 and the first workpiece W1 thereon with the corresponding film 63 of the exposure device 6. Furthermore, in the process of performing the alignment operation on the first frame 3, the second workpiece W2 (eg, a circuit board) to be exposed is placed in the second frame 4. That is, the second workpiece W2 is manually placed on the second frame 4 located in the placement area 2 by the coarse step alignment.

Therefore, in the above-mentioned first frame 3, the time of the alignment work can be simultaneously performed. The placing operation of the second workpiece W2 is performed to avoid the occurrence of idleness of the operator, thereby improving production efficiency.

Step S150: moving the second frame 4 as shown in FIG. 9, and then performing the alignment operation between the second frame 4 and the exposure device 6 by the position aligning device 5, and the exposure device 6 An exposure operation is also performed on the first workpiece W1 to be exposed on the first frame 3. That is, during the exposure operation of the first workpiece W1 to be exposed, the second frame 4 is moved to the working chamber 1 to cause the position aligning device 5 to perform the second The alignment operation between the frame 4 and the exposure device 6.

In more detail, the second frame 4 located in the set area 2 is exchanged with the second frame 4' located in the working chamber 1 such that the second frame 4 and the second workpiece W2 are located in the working chamber 1. . Thereafter, the corresponding alignment module 51 aligns the second frame 4 and the second workpiece W2 thereon with the corresponding film 63 of the exposure device 6. At the same time, the alignment operation of the first frame 3 has been completed, and then the exposure operation is performed by the exposure device 6 on the first workpiece W1 to be exposed on the first frame 3. Furthermore, during the alignment operation of the second frame 4 and the exposure operation of the first frame 3, another first workpiece W1' (eg, a circuit board) to be exposed is placed on the other first The frame 3' is placed on the other first frame 3' of the placement area 2 by manually placing another first workpiece W1' in a coarse step alignment manner.

Therefore, the exposure operation of the first frame 3, the alignment operation of the second frame 4, and the placement operation of the other first frame 3' are performed in the same period to avoid the exposure device and the operator being idle. The situation occurs, which in turn increases production efficiency.

Step S170: as shown in FIG. 10, after the exposure job of the first frame 3 is completed, the position of the other first frame 3' and the first frame 3 is exchanged, and then the position is The alignment device 5 performs an alignment operation between the other first frame 3' and the exposure device 6, and the exposure device 6 also applies to the second work on the second frame 4 to be exposed. The piece W2 performs an exposure job. That is, during the exposure operation of the second workpiece W2 to be exposed, the other first frame 3' is moved to the working chamber 1 to cause the position aligning device 5 to perform the The alignment operation between the other first frame 3' and the exposure device 6.

In more detail, the other first frame 3' located in the set area 2 is exchanged with the first frame 3 located in the working chamber 1 to make the other first frame 3' and the other first workpiece W1' is located in the working chamber 1 and the operator can remove the exposed first workpiece W1. Thereafter, the corresponding registration module 51 aligns the other first frame 3' and the other first workpiece W1' thereon with the corresponding film 63 of the exposure device 6. At the same time, the alignment operation of the second frame 4 has been completed, and then the exposure operation is performed by the exposure device 6 on the second workpiece W2 to be exposed on the second frame 4. Furthermore, during the other first frame 3' performing the alignment operation and the second frame 4 performing the exposure operation, another second workpiece W2' (eg, a circuit board) to be exposed is placed in another A second frame 4' is placed on the other second frame 4' of the placement area 2 by manually placing another second workpiece W2' in a coarse step alignment manner.

Therefore, the exposure operation of the second frame 4, the alignment operation of the other first frame 3', the placement of the other second frame 4', and the pickup operation of the first frame 3 are equivalent to At the same time, it is carried out to avoid the situation that the exposure equipment and the operator are idle, thereby improving the production efficiency.

Step S190: as shown in FIG. 11, after the exposure operation of the second frame 4 is completed, the position of the other second frame 4' and the second frame 4 is exchanged, and then the position aligning device is used. 5 performing an alignment operation between the other second frame 4' and the exposure device 6, and the exposure device 6 also faces another first workpiece W1' to be exposed on the other first frame 3' Perform an exposure job. That is, during the exposure operation of the other first workpiece W1' to be exposed, the other second frame 4' is moved to the working chamber 1 so that the position aligning device 5 The alignment operation between the other second frame 4' and the exposure device 6 is performed.

In more detail, the other second frame 4' located in the set area 2 is exchanged with the second frame 4 located in the working chamber 1 to make the other second frame 4' and the other second workpiece W2' is located in the working chamber 1 and the operator can remove the exposed second workpiece W2. Thereafter, the corresponding registration module 51 aligns the other second frame 4' and the other second workpiece W2' thereon with the corresponding film 63 of the exposure device 6. At the same time, the alignment work of the other first frame 3' has been completed, and then the other first workpiece W1' to be exposed on the other first frame 3' is next to the exposure device 6. Perform an exposure job. Furthermore, in the process of performing the alignment operation of the other second frame 4' and the exposure operation of the other first frame 3', another second workpiece W2 to be exposed is placed (eg, a circuit board). ) in the first frame 3.

Therefore, the exposure operation of the other first frame 3', the alignment operation of the other second frame 4', the placement operation of the first frame 3, and the pickup operation of the second frame 4 are equivalent to At the same time, it is carried out to avoid the occurrence of the exposure device 100 and the idleness of the operator, thereby improving the production efficiency.

In other words, the above steps are described as the specific flow of the embodiment, and according to the above steps, it can be reasonably inferred that the workpiece exposure method of the present invention is based on the following basic conditions: in the first frame 3 and the first to be exposed During at least one of the alignment operation of the workpiece W1 and the exposure operation, the second workpiece W2 to be exposed is placed in the second frame 4; the second frame 4 and the second workpiece to be exposed are W2 performing at least one of the alignment operation and the exposure operation, placing another first workpiece W1' to be exposed on the other first frame 3', and then moving the first a position of the frame 3 and the other first frame 3'; at least one of the alignment work and the exposure operation is performed on the other first frame 3' and the other first workpiece W1' to be exposed During the operation, another second workpiece W2' to be exposed is placed in the other second frame 4', and then the position of the second frame 4 and the other second frame 4' is moved and exchanged. Therefore, the workpiece exposure method of the present invention does not exclude a reasonable change of steps S110 to S190 in accordance with the above basic conditions.

[Technical effect of the embodiment of the present invention]

In summary, the exposure apparatus and the mounting mechanism thereof disclosed in the embodiments of the present invention can exchange positions with a plurality of frames outside the working chamber (ie, the mounting area) through a plurality of frames in the working chamber. In order to avoid the operator's idle situation, thereby improving production efficiency. Furthermore, the exposure device furtherly positions the alignment device and the exposure device in the working chamber, so that different frames located in the working chamber can perform the alignment work and the exposure operation at the same time, thereby facilitating further operations. Improve production efficiency. In addition, the exposure device is provided with only a single exposure light source, and performs an exposure operation during the movement by the exposure light source to achieve the effect of properly utilizing the exposure light source, thereby reducing the manufacturing cost and energy consumption of the exposure light source. Furthermore, each of the film frames can be pulled away from the working chamber substantially in a horizontal direction to facilitate operator replacement of the film.

Moreover, the workpiece exposure method disclosed in the embodiments of the present invention can better combine the workpiece operation, the pickup operation, the alignment operation, and the exposure operation to achieve better production performance.

The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the present invention, and all equivalent changes and modifications made by the scope of the present invention should be included in the scope of the present invention.

100‧‧‧Exposure equipment

1‧‧‧Working room

2‧‧‧Place area

4, 4’‧‧‧ second frame

5‧‧‧ Position Alignment Device

51‧‧‧ alignment module

6‧‧‧Exposure device

61‧‧‧Exposure source

62‧‧‧ film frame

63‧‧‧ negatives

7‧‧‧Visual device

H‧‧‧ horizontal direction

Claims (20)

A workpiece exposure method includes: placing a first workpiece to be exposed on a first frame; moving the first frame, and then performing the first frame and an exposure device with a position aligning device Alignment operation, after which the exposure device performs an exposure operation on the first workpiece to be exposed on the first frame; in the first frame and the first workpiece to be exposed During at least one of the aligning operation and the exposing operation, placing a second workpiece to be exposed in a second frame; and moving the second frame, and then in the position The alignment device performs an alignment operation between the second frame and the exposure device, and thereafter, the exposure device performs an exposure operation on the second workpiece to be exposed on the second frame; During the second frame and the second workpiece to be exposed, during at least one of the alignment operation and the exposure operation, placing another first workpiece to be exposed in another first frame Up, then moving the first frame and the other Position of a frame. The workpiece exposure method according to claim 1, wherein, in the process of performing the alignment operation in the first frame, the second workpiece to be exposed is placed in the second frame; During the exposure process of the first workpiece, the second frame is moved to cause the position aligning device to perform an alignment operation between the second frame and the exposure device. The workpiece exposure method of claim 2, wherein the another first workpiece to be exposed is placed on the other first stage during the second frame performing the alignment operation Blocking the position of the first frame and the other first frame during the exposure operation of the second workpiece to be exposed, so that the position aligning device performs The alignment operation between the other first frame and the exposure device. The workpiece exposure method of claim 3, wherein the exposure device comprises a single exposure light source, the exposure light source moves substantially in a straight line direction, and during the moving of the exposure light source, the first workpiece to be exposed is subjected to the exposure operation, and then the second workpiece to be exposed is subjected to The exposure job. The workpiece exposure method according to claim 1, wherein each of the alignment operations performed by the alignment device and each of the exposure operations performed by the exposure device are performed in the same working chamber. The workpiece exposure method of any one of claims 1 to 5, wherein after the position of the first frame and the other first frame is moved and exchanged, the position aligning device performs An alignment operation between the other first frame and the exposure device, and thereafter, the exposure device performs an exposure operation on the other first workpiece to be exposed on the other first frame Placing another second workpiece to be exposed during at least one of the alignment operation and the exposure operation of the another first frame and the other first workpiece to be exposed In another second frame, the position of the second frame and the other second frame is then moved and exchanged. The workpiece exposure method of claim 6, further comprising: providing the first frame, the another first frame, the second frame, the other second frame, The position aligning device, and an exposure device of the exposure device, and the exposure device can be used to execute the first frame, the other first frame, the second frame, And movement of the other second frame, alignment operation of the alignment device, and exposure operation of the exposure device. An exposure apparatus comprising: a working chamber and a component area on an outdoor side of the working chamber; a position aligning device disposed in the working chamber; and an exposure device disposed in the working chamber; Two first frames are respectively disposed in the working chamber and the set region, and any one of the first frames is movably coupled to the other of the first frames Position exchange; and two second frames respectively disposed in the working chamber and the set region, and any one of the second frames is movably movable with another of the second frames Position exchange; wherein the first frame and the second frame located in the working chamber can perform alignment work with the exposure device through the position aligning device. The exposure apparatus of claim 8, wherein the exposure device comprises a single exposure light source, the exposure light source being responsive to the first frame and the second frame positioned in the working chamber Moving so that the first frame and the second frame positioned in the working chamber are located below the moving range of the exposure light source. The exposure apparatus of claim 9, wherein the exposure light source moves substantially in a straight line direction, and an arrangement direction of the first frame and the second frame located in the working chamber is parallel to the In a linear direction, the exposure light source can sequentially perform an exposure operation on the first frame and the second frame during the moving process. The exposure apparatus of claim 8, wherein the exposure device comprises two negative film frames and two negative films respectively mounted to the two negative film frames, and the two negative film frames are respectively disposed at the position Above the first frame and the second frame in the working chamber, each of the film frames can be withdrawn from the working chamber substantially in a horizontal direction. The exposure apparatus of claim 8, wherein the position aligning device comprises two aligning modules that are independently operated, and the two aligning modules are respectively disposed in the working chamber. Between the first frame and the second frame, and the two alignment modules are configured to separately and independently adjust the first frame and the second position in the working chamber The position of the frame. The exposure apparatus of claim 12, wherein the two of the alignment modules are used Positioning the first frame and the second frame in the working chamber separately and non-simultaneously. The exposure apparatus of claim 13, wherein one of the two alignment modules of the alignment module is configured to adjust the first frame and the second position in the working chamber When the position of one of the frames is at least one position, the exposure device is configured to perform an exposure operation on the other of the first frame and the second frame in the working chamber. The exposure apparatus of claim 8, wherein the position exchange of the two first frames is interchangeable with the positions of the two second frames and is non-simultaneous and has a time difference, the time difference being not greater than The position aligning device corresponds to an alignment work time of the first frame or the second frame. The exposure apparatus of claim 15, wherein the position exchange paths of the two first frames are parallel or interleaved with the position exchange paths of the two second frames. The exposure apparatus of claim 8, further comprising a visual device disposed within the working chamber and positioned above the exposure device and the position aligning device. A mounting mechanism for an exposure apparatus includes: a working chamber and a component area on an outdoor side of the working chamber; and two first frame frames respectively disposed in the working chamber and the component area, And any one of the first frames is movably exchangeable with another one of the first frames; and two second frames are respectively disposed in the working chamber and the mounting area, and Any one of the second frames can be movably exchanged with another of the second frames. The device of claim 18, wherein the position exchange of the two first frames is interchangeable with the positions of the two second frames and is not more than 10 seconds. A time difference. The arrangement mechanism of the exposure apparatus according to claim 19, wherein the position exchange paths of the two first frames are parallel or interleaved with the position exchange paths of the two second frames.