CN107450275A - Workpiece exposure method, exposure equipment and workpiece setting mechanism thereof - Google Patents
Workpiece exposure method, exposure equipment and workpiece setting mechanism thereof Download PDFInfo
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- CN107450275A CN107450275A CN201610460244.7A CN201610460244A CN107450275A CN 107450275 A CN107450275 A CN 107450275A CN 201610460244 A CN201610460244 A CN 201610460244A CN 107450275 A CN107450275 A CN 107450275A
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- 238000000034 method Methods 0.000 title claims abstract description 41
- 230000007246 mechanism Effects 0.000 title claims abstract description 14
- 230000000694 effects Effects 0.000 claims description 7
- 230000000875 corresponding effect Effects 0.000 description 16
- 238000010586 diagram Methods 0.000 description 7
- 238000010276 construction Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A workpiece exposure method, exposure equipment and a workpiece placing mechanism thereof. The exposure equipment comprises a working chamber, a piece placing area, a position alignment device, an exposure device, two first table frames and two second table frames, wherein the piece placing area is positioned outside the working chamber, the position alignment device and the exposure device are arranged in the working chamber, the two first table frames are respectively arranged in the working chamber and the piece placing area, and the two second table frames are respectively arranged in the working chamber and the piece placing area. Any one of the first frames is movably position-exchanged with another one of the first frames, and any one of the second frames is movably position-exchanged with another one of the second frames. The first and second frames in the working chamber can be aligned with the exposure device by the position alignment device. Thus, an exposure apparatus with better operation efficiency is provided.
Description
Technical field
The present invention relates to a kind of semiconductor manufacturing facility, and further relate to a kind of workpiece exposure method, exposure
Equipment and its Zhi Jian mechanisms.
Background technology
Existing exposure sources are that alignment device is placed in into different regions from exposure device, are, for example,
Exposure device is arranged in work chamber, and alignment device is arranged at outside work chamber.Therefore,
Existing exposure sources are to first pass through the contraposition operation that the alignment device carries out platform frame and workpiece, then
Just platform frame and workpiece are moved in work chamber, to be exposed by the exposure device.However,
The construction and function mode of existing exposure sources virtually reduce operating efficiency.
Then, inventors believe that drawbacks described above can improve, concentrate on studies and coordinate the utilization of scientific principle,
Finally the present invention that is a kind of reasonable in design and being effectively improved drawbacks described above is proposed.
The content of the invention
The embodiment of the present invention is to provide a kind of workpiece exposure method, exposure sources and its Zhi Jian mechanisms,
Can effectively improve existing exposure sources institute there may be the problem of.
The embodiment of the present invention discloses a kind of workpiece exposure method, including：Put one first work to be exposed
Part is on a First frame；The mobile First frame, then with described in position alignment device progress
Contraposition operation between First frame and an exposure device, thereafter, the exposure device is to the First
First workpiece to be exposed on frame is exposed operation；In the First frame and to be exposed
First workpiece carries out the contraposition operation and at least one of which operation of the exposure operation
Cheng Zhong, a second workpiece to be exposed is put in one second frame；And mobile second frame,
Then the contraposition carried out with the position alignment device between second frame and the exposure device is made
Industry, thereafter, the exposure device are carried out to the second workpiece to be exposed on second frame
Exposure operation；Second frame and the second workpiece to be exposed carry out the contraposition operation with
In at least one of which operation process of the exposure operation, put another first workpiece to be exposed in
On another First frame, the then position of First frame described in mobile switch and another First frame
Put.
Preferably, during the First frame carries out the contraposition operation, put to be exposed
The second workpiece is in second frame；The exposure is carried out in first workpiece to be exposed to make
During industry, mobile second frame, so that the position alignment device carries out described second
Contraposition operation between frame and the exposure device.
Preferably, during second frame carries out the contraposition operation, put to be exposed
Another first workpiece is on another First frame；Carried out in the second workpiece to be exposed
During the exposure operation, the position of First frame described in mobile switch and another First frame
Put, so that the position alignment device carries out pair between another First frame and the exposure device
Position operation.
Preferably, the exposure device includes single exposure light source, and the exposure light source is along a straight line
Direction is moved, and the exposure light source is during movement, first to first work to be exposed
Part carries out the exposure operation, then carries out the exposure operation to the second workpiece to be exposed.
Preferably, each contraposition operation and the exposure that the position alignment device is carried out
Each exposure operation that device is carried out is implemented in same work chamber.
Preferably, after the position of First frame described in mobile switch and another First frame,
The contraposition carried out with the position alignment device between another First frame and the exposure device is made
Industry, thereafter, the exposure device is to be exposed described another first on another First frame
Workpiece is exposed operation；Enter in another First frame and another first workpiece to be exposed
The row contraposition operation is with least one of which operation process of the exposure operation, putting to be exposed
Another second workpiece in another second frame, then second frame described in mobile switch and described another
The position of second frame.
Preferably, the workpiece exposure method further comprises：There is provided provided with the First frame, institute
State another First frame, second frame, another second frame, the position alignment device,
And an exposure sources of the exposure device, and the exposure sources can be used to perform described first
Platform frame, another First frame, second frame and another second frame movement,
The contraposition operation of the position alignment device and the exposure operation of the exposure device.
The embodiment of the present invention also discloses a kind of exposure sources, including：One work chamber and positioned at the work
Make one on the outside of chamber and put part region；One position alignment device, is arranged in the work chamber；One
Exposure device, it is arranged in the work chamber；Two First frames, are respectively arranged at the work
Chamber puts part region with described, and any one described First frame can movably with described in another
First frame carries out place-exchange；And two second frames, be respectively arranged at the work chamber with
It is described to put part region, and any one described second frame can movably with second another described
Frame carries out place-exchange；Wherein, the First frame and described second in the work chamber
Platform frame can be by the position alignment device, and carries out the contraposition operation between the exposure device.
Preferably, the exposure device includes single exposure light source, and the exposure light source can be relative to
The First frame of the position in the work chamber frameed shift with described second it is dynamic so that position is described
The First frame in work chamber is located at the mobile model of the exposure light source with second frame
Enclose lower section.
Preferably, the exposure light source along a straight line move by direction, and in the work chamber
The First frame and second frame orientation parallel to the rectilinear direction, it is and described
Exposure light source can sequentially expose during movement to the First frame and second frame
Light operation.
Preferably, the exposure device includes two egative film frameworks and is respectively arranged in two bottoms
Two egative films of piece framework, and two egative film frameworks are respectively arranged at position in the work chamber
The top of the interior First frame and second frame, each egative film framework can be horizontal along one
Direction detaches from the work chamber.
Preferably, the position alignment device includes two contraposition modules of independent work, two institutes
State contraposition module and be respectively arranged at the First frame and described second of the position in the work chamber
The lower section of platform frame, and two contraposition modules are individually and independently adjusting position in the work
The position of the First frame and second frame in chamber.
Preferably, two contraposition modules adjust to difference and non-concurrently position in the working chamber
The position of the indoor First frame and second frame.
Preferably, when one of contraposition module of two contraposition modules adjusting position described
During the position of one of them of the First frame and second frame in work chamber, the exposure
Electro-optical device to align the First frame in the work chamber and second frame its
In another be exposed operation.
Preferably, the place-exchange of two First frames can be with the position of two second frames
It is exchanged for non-concurrent progress and there is a time difference, the time difference is not more than the position alignment device
Corresponding to the contraposition activity duration of the First frame or second frame.
Preferably, the place-exchange path of two First frames parallel to or crisscross described in two
The place-exchange path of second frame.
Preferably, the exposure sources further comprise a sighting device, and the sighting device is arranged at
In the work chamber and position is in the top of the exposure device and the position alignment device.
The embodiment of the present invention separately discloses a kind of Zhi Jian mechanisms of exposure sources, including：One work chamber and
One on the outside of the work chamber puts part region；Two First frames, are respectively arranged at the work
Make chamber and put part region with described, and any one described First frame can movably with another institute
State First frame and carry out place-exchange；And two second frames, it is respectively arranged at the work chamber
Part region is put with described, and any one described second frame can be movably with another described second
Platform frame carries out place-exchange.
Preferably, the place-exchange of two First frames can be with the position of two second frames
It is exchanged for non-concurrent progress and with the time difference no more than 10 seconds.
Preferably, the place-exchange path of two First frames parallel to or crisscross described in two
The place-exchange path of second frame.
In summary, the exposure sources disclosed in the embodiment of the present invention and its Zhi Jian mechanisms, by work
Make multiple frames in chamber can respectively with outside work chamber (such as：Put part region) multiple frame phases
Interchangeable position, occurred with the situation for avoiding operating personnel from leaving unused, and then lift prouctiveness.Furthermore
The exposure sources are even more all to be arranged at position alignment device and exposure device in work chamber, with
Enable in the work chamber not on the same stage frame at the same time between carry out aligning operation respectively and make with exposure
Industry, in favor of further lifting prouctiveness.Also, the workpiece exposure side disclosed in the embodiment of the present invention
Method, can make to put part operation, pickup operation, contraposition operation and exposure operation more properly mutually repeatedly and
Reach preferable prouctiveness.
For the enabled feature and technology contents for being further understood that the present invention, refer to below in connection with this hair
Bright detailed description and accompanying drawing, but these explanations are only used for illustrating the present invention with institute's accompanying drawings, rather than
Make any limitation to protection scope of the present invention.
Brief description of the drawings
Fig. 1 is the schematic side view of exposure sources of the present invention.
Fig. 2 is the schematic perspective view of exposure sources of the present invention.
Fig. 3 is the schematic top plan view of exposure sources of the present invention.
Fig. 4 is the First frame of exposure sources of the present invention and the mobile schematic diagram of second frame.
Fig. 5 is the First frame of exposure sources of the present invention and another mobile schematic diagram of second frame.
Fig. 6 is the change aspect schematic perspective view of exposure sources of the present invention.
Fig. 7 is the step S110 schematic diagrames of workpiece exposure method of the present invention.
Fig. 8 is the step S130 schematic diagrames of workpiece exposure method of the present invention.
Fig. 9 is the step S150 schematic diagrames of workpiece exposure method of the present invention.
Figure 10 is the step S170 schematic diagrames of workpiece exposure method of the present invention.
Figure 11 is the step S190 schematic diagrames of workpiece exposure method of the present invention.
Embodiment
Fig. 1 to Figure 11 is referred to, is embodiments of the invention, need to first illustrate, the present embodiment pair
The correlated measure and external form mentioned by accompanying drawing are answered, is only used for specifically describing embodiments of the present invention,
In order to understand present disclosure, rather than for limiting to protection scope of the present invention.
Refer to shown in Fig. 1 to Fig. 3, the present embodiment discloses a kind of exposure sources 100, is espespecially applicable
In simultaneously to multiple workpiece (such as：Circuit board) align the exposure sources 100 of operation and exposure operation,
But it is not only restricted to this.The exposure sources 100 include a work chamber 1, positioned at the work chamber
One two for putting part region 2, be respectively arranged at the work chamber 1 and putting part region 2 in 1 outside
First frame 3,3 ', be respectively arranged at the work chamber 1 and put part region 2 two second
Frame 4,4 ', the position alignment device 5 that is arranged in the work chamber 1 and an exposure device 6,
And the interior simultaneously position of the work chamber 1 is arranged on the exposure device 6 and position alignment device 5
One sighting device 7 of side.
Need to first it illustrate, each part practical application of the exposure sources 100 is not only restricted to this implementation
Example, such as：The work chamber 1, put 2, two, part region First frame 3,3 ' and two
Two frames 4,4 ' can be collectively referred to as a Zhi Jian mechanisms 10 (such as Fig. 4 and Fig. 5), and be suitable for application in
Different from other exposure sources of schema.The present embodiment exposure sources 100 will be introduced respectively below to be wrapped
Each part construction included, then illustrates the annexation of each part to each other, finally explains again in good time again
The start flow of the exposure sources 100.
The work chamber 1 in the present embodiment equivalent to being exposed the casing of equipment 100 (in figure not
Show) internal enclosures that are coated, that is to say, that the less exposure that can be touched of operating personnel is set
Standby 100 regions.Open the outside that part region 2 is put equivalent to exposure sources 100 in the present embodiment
Region is put, with so that operating personnel put workpiece to be exposed and take the workpiece exposed away.
Each First frame 3,3 ' is carrying a workpiece (such as：Circuit board) and can pass through suction
Subsidiary formula formula fixes workpiece, and any one First frame 3 movably enters with another First frame 3 '
Row place-exchange.Furthermore each second frame 4,4 ' is carrying a workpiece (such as：Circuit
Plate) and can by suction type fix workpiece, and any one second frame 4 movably with another
Second frame 4 ' carries out place-exchange.
Wherein, the place-exchange path of two First frames 3,3 ' is parallel in the present embodiment
In the place-exchange path (such as Fig. 4) of two second frames 4,4 ', but it is not excluded for two institutes
The place-exchange path for stating First frame 3,3 ' crisscrosses two second frames 4,4 '
Place-exchange path (such as Fig. 5).Furthermore the place-exchange energy of two First frames 3,3 '
For non-concurrent progress and there is a time difference with the place-exchange of two second frames 4,4 ', on
It is no more than 10 seconds to state that the time is worse than in the present embodiment, or can be described as the time difference and is not more than
Position alignment device 5 corresponds to pair of any 3,3 ' or any second frames 4,4 ' of First frame
The position activity duration.
It should be noted that the First frame 3,3 ' and second frame 4,4 ' are in the present embodiment
It is all identical construction and in substantially coming under " platform frame ", and above-mentioned " first " and " second "
It is to illustrate to be easy to both differences.Furthermore the start of the First frame 3,3 ' and second
The kinetic energy of making of frame 4,4 ' is implemented by being provided with corresponding mechanism, and above-mentioned " corresponding machine
Not in this to go forth for structure ".
The position alignment device 5 includes two contraposition modules of independent work in the present embodiment
51.Two contraposition modules 51 are respectively arranged at First frame 3 ' of the position in the work chamber 1
With the lower section of second frame 4 ', and two contraposition modules 51 are individually and independently adjusting
The position of the First frame 3 ' and second frame 4 ' of the position in work chamber 1.
Further say, two contraposition modules 51 are to difference and non-concurrently adjust position in work
Make the position of the First frame 3 ' and second frame 4 ' in chamber 1.Therefore, positioned at the work
First frame 3 ' in chamber 1 and second frame 4 ' can by position alignment device 5, and carry out with
Contraposition between the exposure device 6.Further say, when two contraposition modules 51 wherein
One contraposition module 51 is adjusting First frame 3 ' of the position in work chamber 1 and second frame
During the position of one of them of 4 ', the exposure device 6 is aligning in the work chamber 1
First frame 3 ' and the other in which of second frame 4 ' be exposed operation.
Wherein, each contraposition module 51 be possess longitudinally, laterally, vertically and rotation driving machine
Structure, use the adjustment that each orientation can be carried out to corresponding First frame 3 ' or second frame 4 '.
Specific configuration about each contraposition module 51 is not any limitation as in the present embodiment.It is furthermore described
Sighting device 7 can aid in each contraposition module 51 to carry out contraposition operation to pick-up image.
The exposure device 6 includes two egative film frameworks 62, is respectively arranged in two negative film frames
Two egative films 63 and single exposure light source 61 of frame 62.Wherein, above-mentioned two egative film framework 62
The top of First frame 3 ' and second frame 4 ' of the position in work chamber 1 is respectively arranged at, and
And each egative film framework 62 can detach along a horizontal direction H from work chamber 1.Further
Say, described two contraposition modules 51 are to the First frame 3 ' by position in work chamber 1 respectively
With second frame 4 ' contraposition operation is carried out relative to the egative film 63 in above-mentioned two egative film framework 62.
And above-mentioned contraposition operation refers to：The feelings of workpiece are carried on First frame 3 ' or second frame 4 '
Under condition, the contraposition module 51 to by First frame 3 ' or second frame 4 ' workpiece align
In corresponding egative film 63.
The exposure light source 61 is in elongated in the present embodiment, and the length of exposure light source 61 is not small
In the length of any 3,3 ' or any second frames 4,4 ' of First frame, and exposure light source 61
Width is then less than the width of any 3,3 ' or any second frames 4,4 ' of First frame.The exposure
Radiant 61 can be mobile relative to First frame 3 ' of the position in work chamber 1 and second frame 4 ',
So that First frame 3 ' and second frame 4 ' of the position in work chamber 1 are located at the exposure light source
Below 61 moving range.Further say, the exposure light source 61 is in the present embodiment along always
Line direction S is (such as：The width of parallel exposure light source 61) it is mobile, and in work chamber 1
First frame 3 ' and second frame 4 ' orientation parallel to above-mentioned rectilinear direction S.
Thereby, the exposure light source 61 can be sequentially aligned in work chamber 1 during movement
Interior First frame 3 ' and second frame 4 ' are exposed operation.Above-mentioned exposure operation refers to：Institute
State exposure light source 61 and made by egative film 63 corresponding First frame 3,3 ' or second frame 4,
Workpiece on 4 ' is exposed.That is, the exposure light source 61 is during movement, it is first
Operation is exposed to the first workpiece W1 to be exposed on First frame 3,3 ', then to second
Second workpiece W2 to be exposed on platform frame 4,4 ' carries out the exposure operation.
It should be noted that the exposure light source 61 of the present embodiment exposure operation order be First frame 3 ',
Second frame 4 ', 3, second frames 4 of First frame (this will be in follow-up explanation).But do not painted another
In the embodiment shown, however not excluded that the exposure operation order of exposure light source 61 is First frame 3 ', second
Platform frame 4 ', second frames 4, First frames 3, using makes all moving process of exposure light source 61 all
Operation can be exposed, reaches the effect for greatly utilizing exposure light source 61.
Though in addition, the present embodiment be with four platform frames (such as：Two First frames 3,3 ' and two
Two frames 4,4 ') explain, but the present invention is not excluded for increasing 2N platform frame, and N is positive integer.
Such as shown in Fig. 6, the exposure sources 100 can set up two the 3rd frames 8,8 ' and corresponding
Construction is (such as：Contraposition module 51, egative film 63 and egative film framework 62), the 3rd frame 8 of above-mentioned two,
8 ' construction and function as second frame 4 of above-mentioned two First frame 3,3 ' or above-mentioned two,
4’.Furthermore position is preferably disposed on the exposure light in the 3rd frame 8 ' of work chamber 1
Below the moving range in source 61, so exposure light source 61 can sequentially align during movement
3 ', second frames 4 ' of First frame and the 3rd frame 8 ' in work chamber 1 are exposed work
Industry, thus exposure light source 61 need not be expanded.
Construction for 100 each component of the present embodiment exposure sources and corresponding relation explanation above, it is following
Then introduce by above-mentioned exposure sources 100 and a kind of workpiece exposure method of implementation, including step
S110~S190 (such as Fig. 7 to Figure 11).That is, the exposure sources 100 of the present embodiment provide
Provided with following First frames 3,3 ', second frames 4 of another First frame, another second frame 4 ',
Position alignment device 5 and exposure device 6, and the exposure sources 100 of the present embodiment can be used to
Perform the First frame 3,3 ', second frames 4 of another First frame and another second frame 4 '
Movement, position alignment device 5 contraposition operation and exposure device 6 exposure operation.
But must first it illustrate, though the contained workpiece exposure method of the present embodiment is with including step
S110~S190 is explained, but the workpiece exposure method can be in above-mentioned steps S110~S190
On the basis of cyclically running and implement, rather than refer to workpiece exposure method and only include step S110~S190.
Furthermore the workpiece exposure method of the present embodiment does not limit to only to be implemented with above-mentioned exposure sources 100, and
And each step of following workpiece exposure methods can be carried out via reasonably adjusting.
In addition, the present embodiment in the description below, sums up according to practical experience now, it is artificial to put
Workpiece is about 7~8 seconds in the time of platform frame, and the time for aligning operation is about 9~10 seconds, exposure operation
Time be about 5~6 seconds, use makes the above-mentioned time more appropriate by the workpiece exposure method of the present embodiment
Mutually repeatedly reach preferable prouctiveness kindly, but be not limited with the above-mentioned time.In addition, the present embodiment
Though being described with manually picking and placeing workpiece, the present invention is when practical application, however not excluded that with unartificial
Mode is (such as：Mechanical arm) pick and place workpiece.
Step S110：As shown in fig. 7, put one first workpiece W1 to be exposed (such as：Circuit board)
In on a First frame 3.Further say, by manually by the first workpiece W1 with thick step contraposition side
Formula is seated on the First frame 3 put in part region 2.
Step S130：As shown in figure 8, the mobile First frame 3, is then filled with a position alignment
Put the contraposition operation between 5 carry out First frames 3 and exposure device 6.Further say, positioned at putting part
The First frame 3 in region 2 exchanges position with the First frame 3 ' positioned at work chamber 1, so that the
One workpiece W1 of frame 3 and first is located in work chamber 1.Thereafter, corresponding contraposition module 51
The first workpiece W1 by First frame 3 and thereon is carried out with the corresponding egative film 63 of exposure device 6
Contraposition.Furthermore during above-mentioned First frame 3 carries out contraposition operation, put to be exposed
Two workpiece W2 are (such as：Circuit board) in second frame 4.That is, by manually by the second work
Part W2 is seated in positioned at putting on second frame 4 in part region 2 with slightly walking alignment mode.
Therefore, in above-mentioned First frame 3 align the time of operation, second can be carried out with the period
Workpiece W2's puts part operation, uses the situation for avoiding operating personnel from leaving unused and occurs, and then lifts production
Efficiency.
Step S150：As shown in figure 9, mobile second frame 4, then with the position alignment
Device 5 carries out the contraposition operation between above-mentioned second frame 4 and exposure device 6, and the exposure dress
Put 6 and operation also is exposed to the first workpiece W1 to be exposed on First frame 3.That is,
During above-mentioned first workpiece W1 to be exposed carries out the exposure operation, mobile described second
Platform frame 4 is to work chamber 1, so that the position alignment device 5 carries out second frame 4 with exposing
Contraposition operation between electro-optical device 6.
In more detail, second positioned at second frame 4 for putting part region 2 and positioned at work chamber 1
Platform frame 4 ' exchanges position, so that second frame 4 and second workpiece W2 are located in work chamber 1.
Thereafter, the second workpiece W2 of corresponding contraposition module 51 by second frame 4 and thereon and exposure
The corresponding egative film 63 of device 6 is aligned.Simultaneously, the contraposition of the First frame 3 is made
Already through completing, and then with the exposure device 6 to the first work to be exposed on First frame 3
Part W1 is exposed operation.Furthermore carry out aligning operation and First frame in above-mentioned second frame 4
During 3 are exposed operation, another first workpiece W1 ' to be exposed is put (such as：Circuit board)
In another First frame 3 ', that is to say, that by manually by another first workpiece W1 ' with thick step pair
Position mode is seated in be located at and put on another First frame 3 ' in part region 2.
Therefore, the exposure operation of above-mentioned First frame 3, the contraposition operation of second frame 4 and another
The part operation of putting of First frame 3 ' is carried out equivalent to the same period, is used and is avoided exposure sources and operator
The idle situation of member occurs, and then lifts prouctiveness.
Step S170：As shown in Figure 10, after the completion of the exposure operation of the First frame 3, move
The dynamic position for exchanging another First frame 3 ' and First frame 3, then with the position alignment
Device 5 carries out the contraposition operation between another First frame 3 ' and exposure device 6, and the exposure
Device 6 is also exposed operation to the second workpiece W2 to be exposed on second frame 4.Namely
Say, during second workpiece W2 to be exposed carries out the exposure operation, movement is described another
First frame 3 ' is to work chamber 1, so that the position alignment device 5 carries out described another first
Contraposition operation between platform frame 3 ' and exposure device 6.
In more detail, positioned at put part region 2 another First frame 3 ' and be located at work chamber 1
First frame 3 exchange position so that another First frame 3 ' and another first workpiece W1 ' positions
In in work chamber 1, and operating personnel can take the first workpiece W1 exposed away.Thereafter,
Another first workpiece W1 ' of the corresponding contraposition module 51 by another First frame 3 ' and thereon with
The corresponding egative film 63 of exposure device 6 is aligned.Simultaneously, pair of second frame 4
Position operation has been completed, and then with the exposure device 6 to be exposed the on second frame 4
Two workpiece W2 are exposed operation.Furthermore carry out contraposition operation in above-mentioned another First frame 3 '
And during second frame 4 is exposed operation, put another second workpiece W2 ' to be exposed
(such as：Circuit board) in another second frame 4 ', that is to say, that by manually by another second work
Part W2 ' is seated in positioned at putting on another second frame 4 ' in part region 2 with slightly walking alignment mode.
Therefore, the exposure operation of above-mentioned second frame 4, another First frame 3 ' contraposition operation,
Another second frame 4 ' put part operation and the pickup operation of First frame 3 is entered equivalent to the same period
OK, use and avoid exposure sources from occurring with the situation that operating personnel are left unused, and then lift prouctiveness.
Step S190：As shown in figure 11, it is mobile to hand over after the completion of the exposure operation of second frame 4
The position of another second frame 4 ' and second frame 4 is changed, then with the position alignment device
5 carry out the contraposition operation between another second frame 4 ' and exposure device 6, and the exposure device 6
Also work is exposed to another first workpiece W1 ' to be exposed on another First frame 3 '
Industry.That is, carry out the process of the exposure operation in another first workpiece W1 ' to be exposed
In, mobile another second frame 4 ' is to work chamber 1, so that the position alignment device 5
Carry out the contraposition operation between another second frame 4 ' and exposure device 6.
In more detail, positioned at put part region 2 another second frame 4 ' and be located at work chamber 1
Second frame 4 exchange position so that another second frame 4 ' and another second workpiece W2 ' positions
In in work chamber 1, and operating personnel can take the second workpiece W2 exposed away.Thereafter,
Another second workpiece W2 ' of the corresponding contraposition module 51 by another second frame 4 ' and thereon with
The corresponding egative film 63 of exposure device 6 is aligned.Simultaneously, another First frame 3 '
Contraposition operation completed, and then with the exposure device 6 on another First frame 3 '
Another first workpiece W1 ' to be exposed is exposed operation.Furthermore in above-mentioned another second frame
4 ' align during operation and another First frame 3 ' be exposed operation, put to be exposed
Another second workpiece W2 " (such as：Circuit board) in First frame 3.
Therefore, the contraposition of the exposure operation of above-mentioned another First frame 3 ', another second frame 4 '
Operation, First frame 3 put part operation and the pickup operation of second frame 4 is entered equivalent to the same period
OK, use and avoid exposure sources 100 from occurring with the situation that operating personnel are left unused, and then lift production effect
Energy.
To change for an angle, above step illustrates the idiographic flow for the present embodiment, and according to above-mentioned step
Suddenly, it can reasonably deduce that workpiece exposure method of the present invention is framework in following basic conditions：In First
Frame 3 and the first workpiece W1 to be exposed carry out aligning at least one of of operation and the exposure operation
In individual operation process, second workpiece W2 to be exposed is put in second frame 4；At described second
Frame 4 and second workpiece W2 to be exposed carry out the contraposition operation and the exposure operation at least its
In in an operation process, put another first workpiece W1 ' to be exposed in another First frame 3 '
On, the then position of First frame 3 described in mobile switch and another First frame 3 '；Described another
One First frame 3 ' and another first workpiece W1 ' to be exposed carry out aligning operation and exposure
In at least one of which operation process of operation, another second workpiece W2 ' to be exposed is put in another
One second frame 4 ', the then position of second frame 4 described in mobile switch and another second frame 4 '.
Therefore, workpiece exposure method of the invention is not excluded for according to above-mentioned basic condition, to step S110~S190
Make rational change.
[technical effect of the embodiment of the present invention]
In summary, the exposure sources disclosed in the embodiment of the present invention and its Zhi Jian mechanisms, by work
Make multiple frames in chamber can respectively with outside work chamber (such as：Put part region) multiple frame phases
Interchangeable position, occurred with the situation for avoiding operating personnel from leaving unused, and then lift prouctiveness.Furthermore
The exposure sources are even more all to be arranged at position alignment device and exposure device in work chamber, with
Enable in the work chamber not on the same stage frame at the same time between carry out aligning operation respectively and make with exposure
Industry, in favor of further lifting prouctiveness.In addition, the exposure device is provided only with single exposure light source,
And operation is exposed during movement by above-mentioned exposure light source, properly utilize exposure to reach
The effect of light source, and then reduce manufacturing cost and the power consumption of exposure light source.Furthermore each egative film framework
It can be detached in the horizontal direction from work chamber, so that operating personnel carry out the replacing of egative film.
Also, the workpiece exposure method disclosed in the embodiment of the present invention, can make to put part operation, pickup operation,
Contraposition operation and exposure operation more properly mutually repeatedly reach preferable prouctiveness.
The preferable possible embodiments of the present invention are the foregoing is only, are not used for the protection for limiting to the present invention
Scope, all equivalent changes and modifications done according to the claims in the present invention, it should all belong to the protection of the present invention
Scope.
Claims (20)
1. a kind of workpiece exposure method, it is characterised in that the workpiece exposure method includes：
One first workpiece to be exposed is put on a First frame；
The mobile First frame, then carries out the First frame with a position alignment device
Contraposition operation between an exposure device, thereafter, the exposure device is to the First frame
On first workpiece to be exposed be exposed operation；In the First frame and wait to expose
First workpiece progress contraposition operation of light is at least one of with the exposure operation
In individual operation process, a second workpiece to be exposed is put in one second frame；And
Mobile second frame, then carries out described second with the position alignment device
Contraposition operation between frame and the exposure device, thereafter, the exposure device is to described second
The second workpiece to be exposed on platform frame is exposed operation；In second frame and
The second workpiece to be exposed carry out the contraposition operation and the exposure operation at least its
In in an operation process, put another first workpiece to be exposed on another First frame,
Then the position of First frame described in mobile switch and another First frame.
2. workpiece exposure method as claimed in claim 1, it is characterised in that in the First frame
During carrying out the contraposition operation, the second workpiece to be exposed is put in described the
Two frames；During first workpiece to be exposed carries out the exposure operation, move
Move second frame so that the position alignment device carry out second frame with it is described
Contraposition operation between exposure device.
3. workpiece exposure method as claimed in claim 2, it is characterised in that in second frame
During carrying out the contraposition operation, another first workpiece to be exposed is put in institute
State on another First frame；The exposure operation is carried out in the second workpiece to be exposed
During, the position of First frame described in mobile switch and another First frame, so that
The position alignment device carries out the contraposition between another First frame and the exposure device
Operation.
4. workpiece exposure method as claimed in claim 3, it is characterised in that the exposure device bag
Containing single exposure light source, the exposure light source along a straight line move by direction, and the exposure
Radiant first carries out the exposure during movement to first workpiece to be exposed
Operation, the exposure operation then is carried out to the second workpiece to be exposed.
5. workpiece exposure method as claimed in claim 1, it is characterised in that the position alignment dress
Put carried out each contraposition operation and the exposure device carried out it is each described
Exposure operation is implemented in same work chamber.
6. the workpiece exposure method as described in any claim in claim 1 to 5, its feature exist
In, after the position of First frame described in mobile switch and another First frame, with
The position alignment device carries out the contraposition between another First frame and the exposure device
Operation, thereafter, the exposure device is to described in be exposed on another First frame
Another first workpiece is exposed operation；Another First frame and it is to be exposed described in
Another first workpiece carries out the contraposition operation and at least one of which of the exposure operation is made
During industry, another second workpiece to be exposed is put in another second frame, is then moved
Exchange the position of second frame and another second frame.
7. workpiece exposure method as claimed in claim 6, it is characterised in that the workpiece exposure side
Method further comprises：There is provided provided with the First frame, another First frame, described
Second frame, another second frame, the position alignment device and the exposure dress
The exposure sources put, and the exposure sources can be used to perform the First frame,
Another First frame, second frame and another second frame movement,
The contraposition operation of the position alignment device and the exposure operation of the exposure device.
8. a kind of exposure sources, it is characterised in that the exposure sources include：
One work chamber and one put part region on the outside of the work chamber；
One position alignment device, is arranged in the work chamber；
One exposure device, it is arranged in the work chamber；
Two First frames, it is respectively arranged at the work chamber and puts part region with described, and
And any one described First frame movably can carry out position with First frame another described
Exchange；And
Two second frames, it is respectively arranged at the work chamber and puts part region with described, and
And any one described second frame movably can carry out position with second frame another described
Exchange；
Wherein, the First frame in the work chamber and second frame energy
By the position alignment device, and carry out the contraposition operation between the exposure device.
9. exposure sources as claimed in claim 8, it is characterised in that the exposure device includes
Single exposure light source, the exposure light source can relative to position in the work chamber described in
First frame frameed shift with described second it is dynamic so that position in the work chamber described
One frame is located at second frame below the moving range of the exposure light source.
10. exposure sources as claimed in claim 9, it is characterised in that the exposure light source is along always
Line direction is moved, and the First frame and described second in the work chamber
The orientation of platform frame is parallel to the rectilinear direction, and the exposure light source can be mobile
During, operation sequentially is exposed to the First frame and second frame.
11. exposure sources as claimed in claim 8, it is characterised in that the exposure device includes
Two egative film frameworks and two egative films for being respectively arranged in two egative film frameworks, and two
The individual egative film framework be respectively arranged at the First frame of the position in the work chamber with
The top of second frame, each egative film framework can be along a horizontal directions from the work
Detached as chamber.
12. exposure sources as claimed in claim 8, it is characterised in that the position alignment device bag
Two contraposition modules containing independent work, two contraposition modules are respectively arranged at position and existed
The lower section of the First frame and second frame in the work chamber, and two
The contraposition module is individually and independently adjusting position described in the work chamber
The position of one frame and second frame.
13. exposure sources as claimed in claim 12, it is characterised in that two contraposition modules are used
With adjust respectively and non-concurrently the First frame of the position in the work chamber with it is described
The position of second frame.
14. exposure sources as claimed in claim 13, it is characterised in that when two contraposition modules
One of contraposition module adjusting the First frame of the position in the work chamber
During with the position of one of them of second frame, the exposure device is aligning in institute
The other in which for stating the First frame and second frame in work chamber is exposed
Light operation.
15. exposure sources as claimed in claim 8, it is characterised in that two First frames
Place-exchange can be carried out and with one with the place-exchange of two second frames to be non-concurrent
Time difference, the time difference correspond to the First frame no more than the position alignment device
Or the contraposition activity duration of second frame.
16. exposure sources as claimed in claim 15, it is characterised in that two First frames
Place-exchange path parallel to or crisscross the place-exchange paths of two second frames.
17. exposure sources as claimed in claim 8, it is characterised in that the exposure sources are further
Including a sighting device, the sighting device is arranged in the work chamber and position is described
The top of exposure device and the position alignment device.
A kind of 18. Zhi Jian mechanisms of exposure sources, it is characterised in that the Zhi Jian mechanisms of the exposure sources
Including：
One work chamber and one put part region on the outside of the work chamber；
Two First frames, it is respectively arranged at the work chamber and puts part region with described, and
And any one described First frame movably can carry out position with First frame another described
Exchange；And
Two second frames, it is respectively arranged at the work chamber and puts part region with described, and
And any one described second frame movably can carry out position with second frame another described
Exchange.
19. the Zhi Jian mechanisms of exposure sources as claimed in claim 18, it is characterised in that described in two
The place-exchange of First frame can with the place-exchanges of two second frames for it is non-concurrent enter
Go and with the time difference no more than 10 seconds.
20. the Zhi Jian mechanisms of exposure sources as claimed in claim 19, it is characterised in that described in two
The place-exchange path of First frame parallel to or crisscross the positions of two second frames
Switching path.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105116869A TWI596449B (en) | 2016-05-30 | 2016-05-30 | Method for light exposing workpiece, exposure apparatus, and placement mechanism of exposure apparatus |
| TW105116869 | 2016-05-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107450275A true CN107450275A (en) | 2017-12-08 |
| CN107450275B CN107450275B (en) | 2019-02-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610460244.7A Active CN107450275B (en) | 2016-05-30 | 2016-06-22 | Workpiece exposure method, exposure equipment and workpiece setting mechanism thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN107450275B (en) |
| TW (1) | TWI596449B (en) |
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| CN108594604A (en) * | 2018-06-12 | 2018-09-28 | 深圳市盛德鑫智能科技有限公司 | A kind of fully automatic exposure method and device |
| CN114770446A (en) * | 2022-05-30 | 2022-07-22 | 湖北源合达科技有限公司 | A workstation for cell-phone glass exposure processing |
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| JP2004260115A (en) * | 2003-02-27 | 2004-09-16 | Nikon Corp | Stage unit, exposure system, and method for manufacturing device |
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| CN105607430B (en) * | 2015-12-30 | 2017-07-07 | 深圳市鑫富宝科技有限公司 | Soft board automatic exposure machine |
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| JP2004260115A (en) * | 2003-02-27 | 2004-09-16 | Nikon Corp | Stage unit, exposure system, and method for manufacturing device |
| CN101258581A (en) * | 2005-09-09 | 2008-09-03 | 株式会社尼康 | Exposure apparatus, exposure method, and device production method |
| JP2007294594A (en) * | 2006-04-24 | 2007-11-08 | Nsk Ltd | Exposure device and exposure method |
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| CN108594604A (en) * | 2018-06-12 | 2018-09-28 | 深圳市盛德鑫智能科技有限公司 | A kind of fully automatic exposure method and device |
| CN114770446A (en) * | 2022-05-30 | 2022-07-22 | 湖北源合达科技有限公司 | A workstation for cell-phone glass exposure processing |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201741774A (en) | 2017-12-01 |
| TWI596449B (en) | 2017-08-21 |
| CN107450275B (en) | 2019-02-01 |
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