CN108594604A - A kind of fully automatic exposure method and device - Google Patents

A kind of fully automatic exposure method and device Download PDF

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Publication number
CN108594604A
CN108594604A CN201810598439.7A CN201810598439A CN108594604A CN 108594604 A CN108594604 A CN 108594604A CN 201810598439 A CN201810598439 A CN 201810598439A CN 108594604 A CN108594604 A CN 108594604A
Authority
CN
China
Prior art keywords
exposed
platform
film
product
fully automatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810598439.7A
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Chinese (zh)
Inventor
杨明杰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Sheng Dexin Intelligent Technology Co Ltd
Original Assignee
Shenzhen Sheng Dexin Intelligent Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Sheng Dexin Intelligent Technology Co Ltd filed Critical Shenzhen Sheng Dexin Intelligent Technology Co Ltd
Priority to CN201810598439.7A priority Critical patent/CN108594604A/en
Publication of CN108594604A publication Critical patent/CN108594604A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/7005Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages

Abstract

A kind of fully automatic exposure method and device, wherein device includes N number of Exposing Lamp, it is set to the film platform of 2N adjoining below Exposing Lamp, wherein N is greater than the integer being equal to, each film platform corresponds to a product carrying platform to be exposed respectively, the product carrying platform to be exposed is located at the side of film platform, and each product carrying platform to be exposed can do the linear reciprocating motion perpendicular to film platform relative to corresponding film platform;The Exposing Lamp can move back and forth exposure in the top of two film platforms 2.The present invention has the advantages that work efficiency is high.

Description

A kind of fully automatic exposure method and device
Technical field
The present invention relates to exposure machine technical field, it is especially a kind of for mobile phone backboard or mobile phone screen expose it is complete from Dynamic exposure method and device.
Background technology
It exposes, generally comprises the steps to mobile phone backboard or mobile phone screen, the first step is pre-determined bit, will be exactly exposed Product by the method for machinery by the location of the core of product, so that manipulator captures;Second step is being exposed of will being pre-positioned Light product is moved on turntable and waits for material position;Third step, which is rotary turnplate, will wait for being exposed product in material position, be moved to photograph Position, to be exposed product carry out photograph determine be exposed product X Y coordinate;4th step is that turntable continues to rotate and will take a picture on position Be exposed product, be moved to contraposition station, contraposition station will third walk acquired X Y coordinate and scheduled X Y sit Mark is compared, and adjust be exposed product X Y coordinate, make to be exposed product X Y coordinate and scheduled X Y coordinate phase Together;5th step is that turntable continues to rotate to align on station and is exposed product, exposure position is moved to, to being exposed product into exposure Light.After the completion of exposure, the product of exposure on exposure position is removed, completes entire exposure.This Exposure mode, due to each work Taking for position is inconsistent, and the rotation steps time of turntable is determined with the time-consuming of longest station when designing exposure machine, this Mode limits the further promotion of the efficiency of exposure machine, because within the unit interval, the maximal efficiency of existing exposure machine is single Position time divided by taking for longest station add rotation spent time of the turntable from a station to next station, i.e., existing exposure Ray machine rotates the time of a quarter quadrant.
In order to improve the efficiency of exposure machine, on the one hand people are exposed using the time-consuming and shortening for the longest station for shortening exposure machine Rotation spent time of the turntable of ray machine from a station to next station, to improve the efficiency of exposure machine.But it is existing Exposure machine, the time-consuming of longest station is exposure position, and people have designed a lot of ways, and shorten the time for exposure, by technical conditions Limitation, it is current relatively difficult to exposing the further shortening of time of station;For exposure machine turntable from a station to The rotation spent time of next station, people use two measures, and one is to try to reduce the diameter of turntable, still, at one Four work are at least set on turntable, if too small, the device at four stations can not be installed, and therefore, define the big of turntable It is small to further reduce;Second is that improving the rotating speed of turntable, reality is the generated centrifugation if the rotating speed of turntable is too fast Power, can use to be exposed product unstable on station, or even the station that flies out causes exposure machine can not work normally.
Invention content
In order to overcome the above problem, the present invention provides a kind of the full-automatic of the working efficiency that can further increase exposure machine Exposure method and device.
The technical scheme is that:A kind of fully automatic exposure method is provided, 2N adjoining is corresponded to using N number of Exposing Lamp Film platform, wherein N are greater than the integer equal to 1, and each film platform corresponds to a product carrying platform to be exposed respectively, often A product carrying platform to be exposed can do the linear reciprocating motion perpendicular to film platform relative to corresponding film platform; When the Exposing Lamp is exposed the product to be exposed below one of film platform, another product carrying to be exposed Another product to be exposed is moved to below corresponding film platform etc. to be exposed by platform;After the completion of exposure, Exposing Lamp moves It moves above another film platform, another product to be exposed is exposed;Meanwhile it exposing product and having been waited exposing accordingly Light product carrying platform removes, and unloads and exposed product, loads onto new product to be exposed, and new product to be exposed is moved It is to be exposed below to corresponding film platform etc.;In cycles, it is exposed.
As improvement of the present invention, the invention also includes product precorrection step to be exposed, the precorrection step pair The central point of product to be exposed carries out basic correction.
As improvement of the present invention, the invention also includes photograph aligning step, the photograph aligning step passes through camera The image for shooting the product to be exposed on product carrying platform to be exposed, to obtain practical X, the Y value of product to be exposed, in control The practical X of acquisition, Y value are compared by the heart with standard x, the Y value to prestore, and it is flat to control product carrying to be exposed according to comparison result θ motors rotation on platform, is corrected product space to be exposed.
As improvement of the present invention, the invention also includes films to align step, and film contraposition step passes through the film The Z-direction driving device of platform adjusts the vertical height of film platform, makes pattern or/and word on film that most clear effect be presented Fruit.
The present invention also provides a kind of fully automatic exposure device, including N number of Exposing Lamp, 2N be set to below Exposing Lamp is adjacent The film platform connect, wherein N are greater than the integer being equal to, and it is flat that each film platform corresponds to a product carrying to be exposed respectively Platform, the product carrying platform to be exposed are located at the side of film platform, and each product carrying platform to be exposed can be opposite The linear reciprocating motion perpendicular to film platform is done in corresponding film platform;The Exposing Lamp can be in two film platforms 2 Top moves back and forth exposure;When the Exposing Lamp is exposed the product to be exposed below one of film platform, separately Another product to be exposed is moved to below corresponding film platform etc. to be exposed by one product carrying platform to be exposed;It exposes After the completion of light, Exposing Lamp is moved to above another film platform, is exposed to another product to be exposed;Meanwhile it exposing Light product is removed by corresponding product carrying platform to be exposed, and is unloaded and exposed product, loads onto new product to be exposed, and will It is to be exposed that new product to be exposed is moved to corresponding film platform lower section etc.;In cycles, it is exposed.
As improvement of the present invention, the invention also includes product precorrection platform to be exposed, the precorrection platform is set Before the product carrying platform to be exposed, basic correction is carried out to the central point of product to be exposed.
As improvement of the present invention, the invention also includes photograph to correct component, and the photograph correction component passes through camera The image for shooting the product to be exposed on product carrying platform to be exposed, to obtain practical X, the Y value of product to be exposed, in control The practical X of acquisition, Y value are compared by the heart with standard x, the Y value to prestore, and it is flat to control product carrying to be exposed according to comparison result θ motors rotation on platform, is corrected product space to be exposed.
As improvement of the present invention, the invention also includes films to bit platform, and film passes through the film to bit platform The Z-direction driving device of platform adjusts the vertical height of film platform, makes pattern or/and word on film that most clear effect be presented Fruit.
The present invention matches two adjacent film platforms as a result of an Exposing Lamp, and the Exposing Lamp can be in two films Move back and forth exposure above platform, and the product carrying platform to be exposed is located at the side of film platform, it is each described to wait for Exposure product carrying platform can do the structure of the linear reciprocating motion perpendicular to film platform relative to corresponding film platform, this The rotary speed that sample overcomes rotating disc type exposure device in the prior art is limited, and Exposing Lamp can only be arranged in a turntable Limitation, the present invention can be arranged multiple Exposing Lamps on same machine and work at the same time, and more times can be improved in the unit interval Production efficiency;In addition, since film platform is adjacent, one film platform of Exposing Lamp is moved to another film platform, institute Take time extremely short, than the turntable of rotating disc type exposure machine from a station go to needed for next station into than much shorter, to only For tool is there are one the exposure machine of Exposing Lamp, working efficiency of the invention is also more efficient than rotating disc type exposure machine.
Description of the drawings
Fig. 1 is the frame structure schematic diagram of an embodiment of the present invention.
Fig. 2 is the dimensional structure diagram of embodiment illustrated in fig. 1.
Fig. 3 is the partial structural diagram of Fig. 2.
Fig. 4 is the dimensional structure diagram of exposure stage in Fig. 2.
Fig. 5 is the structural schematic diagram of the product carrying platform to be exposed in Fig. 2.
Fig. 6 is the complete product appearance structural schematic diagram of embodiment illustrated in fig. 2.
Specific implementation mode
The specific implementation mode of the present invention is described in further detail below in conjunction with the accompanying drawings.
It please join Fig. 1, what Fig. 1 was disclosed is a kind of a kind of embodiment of fully automatic exposure method, specifically, being to use one Exposing Lamp corresponds to two adjacent film platforms, and each film platform corresponds to a product carrying platform to be exposed respectively(This reality It applies in example, is the first product carrying platform to be exposed and the second product carrying platform to be exposed respectively, being abbreviated as first in Fig. 1 holds Microscope carrier and the second plummer), each product carrying platform to be exposed can do relative to corresponding film platform perpendicular to phenanthrene The linear reciprocating motion of woods platform;When the Exposing Lamp is exposed the product to be exposed below one of film platform When, another product to be exposed is moved to wait for below corresponding film platform by another product carrying platform to be exposed to expose Light;After the completion of exposure, Exposing Lamp is moved to above another film platform, is exposed to another product to be exposed;Meanwhile It has exposed product to be removed by corresponding product carrying platform to be exposed, and has unloaded and exposed product(It is moved down by discharging mechanism Expose product), new product to be exposed is loaded onto, and new product to be exposed is moved to wait for below corresponding film platform and is exposed Light;In cycles, it is exposed.
Obviously, the Exposing Lamp 1 in the present invention may be used using film platform that is N number of, and corresponding to 2N adjoining, wherein N It is greater than the structure of the integer equal to 1, is illustrated in figure 2 two Exposing Lamps, 4 film platforms, 4 product carryings to be exposed are put down Platform;Certainly, N can also be 3,4 ....The case where N is equal to 2, the present invention will be illustrated in conjunction with Fig. 2 and Fig. 3, remaining , N is equal to 3 or more situation, and reader can analogize, and the present invention does not repeat.
The present invention can greatly improve the working efficiency of exposure machine, for having the exposure device there are one Exposing Lamp, Far smaller than station rotary time of conventional rotary exposure machine when due to mobile between film platform of Exposing Lamp, so can Improving production efficiency;The present invention there are one bigger the advantages of, an exactly exposure device can install multiple Exposing Lamps and Its more corresponding mechanism of set, in this way, the exposure device of the present invention can increase exponentially production efficiency, and its space hold amount is also It is not very big.For example, can be with original production more than twice when filling 2 Exposing Lamps, it can be with the three of original production when filling 3 Exposing Lamps It is more again, it is similar with this.
Preferably, the invention also includes product precorrection steps to be exposed, and the precorrection step is to product to be exposed Central point carries out basic correction.In the present invention, product to be exposed can be mobile phone dorsal shield or mobile phone screen, when in use, can be with Product to be exposed is first grabbed into precorrection platform by feeding mechanism hand(Precorrection is write a Chinese character in simplified form in Fig. 1), then, then pass through feeding Manipulator is sent to the first product carrying platform to be exposed or the second product carrying platform to be exposed.
Preferably, the invention also includes photograph aligning step, the photograph aligning step shoots production to be exposed by camera The image of product to be exposed on product carrying platform, to obtain practical X, the Y value of product to be exposed, control centre is by the reality of acquisition Border X, Y value are compared with standard x, the Y value to prestore, and the θ motors on product carrying platform to be exposed are controlled according to comparison result Rotation, is corrected product space to be exposed.This action is completed by the first photograph correction and the second photograph correction , certainly, the of the invention first photograph correction and the second photograph correction can be completed only with camera, i.e., first according to first Then a product to be exposed, then according to second product to be exposed, can save the quantity of camera, reduce exposure device in this way Cost(Referring to Fig. 2).
Preferably, the invention also includes films to align step, and film aligns step and driven by the Z-direction of film platform Device adjusts the vertical height of film platform, makes pattern or/and word on film that most clear effect be presented.Specific Z-direction is driven Dynamic device will be in Figure 5 in advance to be described in detail.
Fig. 2, Fig. 3 and Fig. 6 are referred to, Fig. 2, Fig. 3 and Fig. 6 announcement are a kind of a kind of embodiments of fully automatic exposure device, Including 2 Exposing Lamps 1,4 adjacent film platforms 2 of 1 lower section of Exposing Lamp are set to, each film platform 2 corresponds to one respectively A product carrying platform 3 to be exposed, the product carrying platform 3 to be exposed are located at the side of film platform 2, each described to wait exposing Light product carrying platform 3 can do the linear reciprocating motion perpendicular to film platform 2 relative to corresponding film platform 2;The exposure Light lamp 1 can move back and forth exposure in the top of two film platforms 2;When the Exposing Lamp 1 is to below one of film platform Product to be exposed when being exposed, another product to be exposed is moved to accordingly by another product carrying platform to be exposed Film platform below etc. it is to be exposed;After the completion of exposure, Exposing Lamp is moved to above another film platform, waits exposing to another Light product is exposed;Meanwhile having exposed product and having been removed by corresponding product carrying platform to be exposed, and pass through outfeed belt 103 unload and have exposed product;New product to be exposed is loaded onto by feeding mechanical hand 102, and new product to be exposed is moved It is to be exposed below to corresponding film platform etc.;In cycles, it is exposed.
Obviously, the present invention in Exposing Lamp 1 except it may be used 2 in addition to, can also use 1,3 ... it is N number of, and correspondence The case where film platform of 2N adjoining, wherein N are greater than the structure of the integer equal to 1, and N is equal to 1, reader can from Fig. 2 and Find out in Fig. 3, about the situation equal to 3 or more, reader can analogize, and the present invention does not repeat.
Preferably, the invention also includes product precorrection platform 4 to be exposed, the precorrection platform 4, which is located at, described to be waited exposing Before light product carrying platform 3, basic correction is carried out to the central point of product to be exposed.Before the precorrection platform 4 also If there are one manipulator 101 is fed, for 4 feeding of precorrection platform, the precorrection platform 4 to be the applicant elder generation Shen A patented technology please, then repeat no more inner.
Preferably, the invention also includes photograph to correct component 5, and the photograph correction component 5 is shot to be exposed by camera The image of product to be exposed on product carrying platform 3, to obtain practical X, the Y value of product to be exposed, control centre will obtain Practical X, Y value be compared with standard x, the Y value to prestore, the θ on product carrying platform to be exposed is controlled according to comparison result Motor rotates, and is corrected to product space to be exposed.It is described photograph correction component 5 structure, be the prior art, then it is inner not It repeats again.
Fig. 4 is referred to, Fig. 4 is a dimensional structure diagram when Exposing Lamp 1 is with two film platforms in Fig. 2.From Fig. 4 As can be seen that Exposing Lamp 1 is one in figure, film platform 2 is two, and film platform 2 is in lateral fixed arrangement, and the film is flat Platform 2 longitudinally fixed can also be arranged, and driving mechanism 31 is straight line driving mechanism 311, the Exposing Lamp 1 and the straight line driving The moving member of structure 311 is fixedly connected, and under the drive of driving source, the Exposing Lamp 1 is moved relative to the film platform 2.This Straight line driving mechanism 311 in embodiment is nut-screw rod structure, and driving source is motor, and motor rotation drives nut to be moved in lead screw It is dynamic, to drive the Exposing Lamp 1 laterally or longitudinally to move linearly back and forth, realize Exposing Lamp 1 from a film platform 21 to another The purpose of one film platform, 22 top.
Preferably, a film Z-direction driving mechanism 41 is respectively equipped with below each film platform 2, for adjusting The spacing for saving the film platform 2 and the Exposing Lamp 1 makes pattern and word become most clear state;The film Z-direction driving Mechanism 41 includes feed screw nut's structure and motor, and the film platform 2 is located on nut, and is moved up and down along guide rail.
Preferably, the invention also includes films to bit platform 6, and the film passes through the Z of film platform to bit platform 6 To driving device, the vertical height of film platform is adjusted, makes pattern or/and word on film that most clear effect be presented.
Fig. 5 is referred to, Fig. 5 announcements are the product carrying platforms 3 to be exposed in Fig. 2, including are exposed the to be exposed of object Object microscope carrier plate 301, backlight 401 and completely black extinction plate 501, the object microscope carrier plate 301 to be exposed and extinction plate 501 are arranged on In one U-shaped frame 503, the U-shaped frame 503 is connect with the first mover 541 of first straight line motor 504, when the U-shaped frame 503 By the driving of first straight line motor 504 to described in face when backlight 401, the object microscope carrier plate 301 to be exposed of the U-shaped frame 503 In the top of the backlight 401, the extinction of the U-shaped frame 503 onboard 501 and extinction plate 501 are located at the backlight The lower section in source 401.
Preferably, the invention also includes straight line driving mechanism 601, the Exposing Lamp 1 and the straight line driving mechanisms 601 Moving member is fixedly connected, and under the drive of driving source, the Exposing Lamp 1 is moved relative to the film platform 2.
Preferably, the straight line driving mechanism 601 is nut-screw rod structure, and the driving source is motor, when motor rotates Drive nut when being moved on lead screw, the nut drives the Exposing Lamp 1 to move.
Preferably, further include second straight line motor 701, the second straight line motor 701 connects with first mover 541 It connects, and is moved described second in the second straight line motor 701 equipped with the second mover 71 with 503 synchronizing moving of the U-shaped frame Son 71 is equipped with the θ axis 72 for correcting the angle for being exposed object 3011 on object microscope carrier plate 301 to be exposed.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in that art God and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies Within, then the present invention is also intended to including these modification and variations.

Claims (10)

1. a kind of fully automatic exposure method, it is characterised in that:The film platform of 2N adjoining, wherein N are corresponded to using N number of Exposing Lamp It is greater than the integer equal to 1, each film platform corresponds to a product carrying platform to be exposed, each production to be exposed respectively Product carrying platform can do the linear reciprocating motion perpendicular to film platform relative to corresponding film platform;When the Exposing Lamp pair When product to be exposed below one of film platform is exposed, another product carrying platform to be exposed by another It is to be exposed that product to be exposed is moved to corresponding film platform lower section etc.;After the completion of exposure, Exposing Lamp is moved to another film Above platform, another product to be exposed is exposed;Meanwhile product has been exposed by corresponding product carrying platform to be exposed It removes, and unloads and exposed product, load onto new product to be exposed, and new product to be exposed is moved to the corresponding film and is put down It is to be exposed below platform etc.;In cycles, it is exposed.
2. according to the fully automatic exposure method described in claim 1, it is characterised in that:It further include product precorrection step to be exposed Suddenly, the precorrection step carries out basic correction to the central point of product to be exposed.
3. the fully automatic exposure method according to claims 1 or 2, it is characterised in that:Further include photograph aligning step, institute The image that photograph aligning step shoots the product to be exposed on product carrying platform to be exposed by camera is stated, it is to be exposed to obtain The practical X of acquisition, Y value are compared by the practical X of product, Y value, control centre with standard x, the Y value to prestore, are tied according to comparing Fruit controls the rotation of the θ motors on product carrying platform to be exposed, is corrected to product space to be exposed.
4. the fully automatic exposure method according to claims 1 or 2, it is characterised in that:Further include film contraposition step, Film aligns Z-direction driving device of the step by film platform, adjusts the vertical height of film platform, makes pattern on film Or/and most clear effect is presented in word.
5. fully automatic exposure method according to claim 3, it is characterised in that:Further include film contraposition step, the film Piece aligns Z-direction driving device of the step by film platform, adjusts the vertical height of film platform, make on film pattern or/ Most clear effect is presented with word.
6. a kind of fully automatic exposure device, it is characterised in that:Including N number of Exposing Lamp(1), it is set to Exposing Lamp(1)The 2N of lower section The film platform of a adjoining(2), wherein N is greater than the integer equal to 1, each film platform(2)Respectively correspond to one it is to be exposed Product carrying platform(3), the product carrying platform to be exposed(3)It is located at film platform(2)Side, it is each described to be exposed Product carrying platform(3)It can be relative to corresponding film platform(2)It does perpendicular to film platform(2)Linear reciprocating motion;Institute State Exposing Lamp(1)It can be in two film platforms(2)Top move back and forth exposure.
7. fully automatic exposure device according to claim 6, it is characterised in that:It further include product precorrection platform to be exposed (4), the precorrection platform(4)It is located at the product carrying platform to be exposed(3)Before, the center of product to be exposed is clicked through Row basic correction.
8. the fully automatic exposure device described according to claim 6 or 7, it is characterised in that:It further include photograph correction component(5), The photograph corrects component(5)Product carrying platform to be exposed is shot by camera(3)On product to be exposed image, to obtain Practical X, the Y value of product to be exposed, control centre is taken to be compared the practical X of acquisition, Y value with standard x, the Y value to prestore, root The rotation of the θ motors on product carrying platform to be exposed is controlled according to comparison result, product space to be exposed is corrected.
9. the fully automatic exposure device described according to claim 6 or 7, it is characterised in that:Further include film to bit platform (6), film is to bit platform(6)By being located at film platform(2)Following Z-direction driving device adjusts the vertical of film platform Highly.
10. fully automatic exposure device according to claim 8, it is characterised in that:Further include film to bit platform(6), Film is to bit platform(6)By being located at film platform(2)Following Z-direction driving device adjusts the vertical height of film platform.
CN201810598439.7A 2018-06-12 2018-06-12 A kind of fully automatic exposure method and device Pending CN108594604A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810598439.7A CN108594604A (en) 2018-06-12 2018-06-12 A kind of fully automatic exposure method and device

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Application Number Priority Date Filing Date Title
CN201810598439.7A CN108594604A (en) 2018-06-12 2018-06-12 A kind of fully automatic exposure method and device

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CN108594604A true CN108594604A (en) 2018-09-28

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112882350A (en) * 2021-01-14 2021-06-01 广东华恒智能科技有限公司 Vertical exposure and detection device
CN114770446A (en) * 2022-05-30 2022-07-22 湖北源合达科技有限公司 A workstation for cell-phone glass exposure processing

Citations (4)

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Publication number Priority date Publication date Assignee Title
US20140368748A1 (en) * 2013-06-18 2014-12-18 Innolux Corporation Light exposure system and light exposure process
CN206282076U (en) * 2016-10-24 2017-06-27 东莞市友辉光电科技有限公司 3D cover plate multistation exposure machines
CN107450275A (en) * 2016-05-30 2017-12-08 志圣工业股份有限公司 Workpiece exposure method, exposure equipment and workpiece setting mechanism thereof
CN208270945U (en) * 2018-06-12 2018-12-21 深圳市盛德鑫智能科技有限公司 A kind of fully automatic exposure device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140368748A1 (en) * 2013-06-18 2014-12-18 Innolux Corporation Light exposure system and light exposure process
CN107450275A (en) * 2016-05-30 2017-12-08 志圣工业股份有限公司 Workpiece exposure method, exposure equipment and workpiece setting mechanism thereof
CN206282076U (en) * 2016-10-24 2017-06-27 东莞市友辉光电科技有限公司 3D cover plate multistation exposure machines
CN208270945U (en) * 2018-06-12 2018-12-21 深圳市盛德鑫智能科技有限公司 A kind of fully automatic exposure device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112882350A (en) * 2021-01-14 2021-06-01 广东华恒智能科技有限公司 Vertical exposure and detection device
CN114770446A (en) * 2022-05-30 2022-07-22 湖北源合达科技有限公司 A workstation for cell-phone glass exposure processing

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