JP2007324347A - Aligner - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an aligner capable of performing exposure transfer precisely by performing the exposure transfer of a substrate and loading the substrate to a substrate stage simultaneously, reducing cycle time, and excluding influence to exposure precision by vibration generated when loading the substrate. <P>SOLUTION: The aligner PE comprises: a mask stage 10, a first substrate stage 11 capable of moving between an exposure position EP and a first standby position WP1, a second substrate stage 12 capable of moving between the exposure position EP and the second standby position WP2, and an irradiator 13. The first and second substrate stages 11, 12 comprise: a substrate holder 31, and a plurality of pins 32 arranged so that they can retreat freely from the upper surface of the substrate holder 31. An air spring 46 capable of elastically supporting the substrate holder 31 to a substrate stage moving mechanism 39, and an electromagnet 47 capable of fixing and supporting the substrate holder 31 to the substrate stage moving mechanism 39 are arranged between the substrate holder 31 and the substrate stage moving mechanism 39. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus, and more particularly to an exposure apparatus used when manufacturing a large flat panel display such as a semiconductor, a liquid crystal display panel, or a plasma display.

  As a conventional exposure apparatus, light (electron beam) for pattern exposure is irradiated through a mask in a state where a mask (reticle) and a substrate (wafer) are brought close to each other, thereby exposing and transferring the mask pattern onto the substrate. An apparatus is known (for example, refer to Patent Documents 1 and 2).

  The exposure apparatus described in Patent Document 1 corresponds to each of two frames on which a mask is arranged, two substrate stages on which a substrate is placed corresponding to each of the two frames, and two substrate stages. There is known a stage moving mechanism that includes two alignment mechanisms arranged in this manner, and in which the frame bodies and the substrate stage are combined and moved to an exposure position and exposed and transferred alternately. As a result, the stage moving mechanism simultaneously performs alignment and exposure on the two substrate stages to shorten the tact time.

In the exposure apparatus described in Patent Document 2, a vibration control actuator and a vibration control mass are arranged on the slider of the biaxial stage to reduce stage vibration, thereby shortening the stage settling time and positioning accuracy. We are trying to improve.
JP-A 63-87725 JP 2005-183876 A

  By the way, in the exposure apparatus described in Patent Document 1, the tact time is reduced by simultaneously performing exposure transfer of the substrate and loading and unloading of the substrate to and from the substrate stage by using two substrate stages. The vibration generated during loading / unloading is not taken into consideration, and this vibration may affect the exposure accuracy, and there is room for further improvement.

  In addition, the exposure apparatus described in Patent Document 2 reduces residual vibration in one substrate stage and shortens the settling time of the stage, but does not take into account vibration that occurs during loading and unloading of the substrate. There is no description about the use of two substrate stages.

  The present invention has been made in view of the above-described problems, and its object is to simultaneously perform exposure transfer of a substrate and loading of a substrate onto a substrate stage, thereby reducing tact time and occurring when the substrate is loaded. It is an object of the present invention to provide an exposure apparatus that can perform exposure transfer with high accuracy by eliminating the influence of vibrations on exposure accuracy.

The above object of the present invention can be achieved by the following constitution.
(1) a mask stage for holding a mask;
A first substrate stage movable between an exposure position located below the mask stage and a first standby position;
A second substrate stage movable between an exposure position and a second standby position;
An irradiation device that irradiates the substrate held by the first and second substrate stages moved to the exposure position with light for pattern exposure through a mask;
An exposure apparatus comprising:
The first and second substrate stages each include a substrate holding unit on which the substrate is placed, and a plurality of pins that are disposed so as to be able to advance and retract from the upper surface of the substrate holding unit and support the substrate.
Between the substrate holding unit and the substrate stage moving mechanism that moves the first and second substrate stages, an anti-vibration mechanism that can elastically support the substrate holding unit with respect to the substrate stage moving mechanism, and a substrate stage moving mechanism An exposure apparatus comprising a lock mechanism capable of fixing and supporting the substrate holding portion.

(2) The exposure according to (1), wherein the vibration isolation mechanism is configured by an air spring, and the lock mechanism is an electromagnet that fixes and supports the substrate holding unit with respect to the substrate stage moving mechanism by electromagnetic force. apparatus.

  According to the exposure apparatus of the present invention, the first substrate stage movable between the exposure position located below the mask stage and the first standby position, and the second substrate stage movable between the exposure position and the second standby position. The simultaneous exposure and transfer of the substrate and the loading and unloading of the substrate to and from the first and second substrate stages can be performed simultaneously to reduce the tact time.

  In addition, the substrate holding unit can be elastically supported by the substrate stage moving mechanism between the substrate holding unit of the first and second substrate stages and the substrate stage moving mechanism that moves the first and second substrate stages. Since the anti-vibration mechanism and the lock mechanism capable of fixing and supporting the substrate holding portion with respect to the substrate stage moving mechanism are arranged, vibration generated in the substrate stage on the side where the substrate is carried in / out is exposed by the anti-vibration mechanism. Transmission to the stage can be prevented. Thus, the influence of vibration on the exposure accuracy can be eliminated and the mask pattern of the mask can be exposed and transferred to the substrate with high accuracy.

  Furthermore, when exposing the substrate held on the substrate stage, the substrate holding unit is fixedly supported by the lock mechanism with respect to the substrate stage moving mechanism, so that the substrate holding unit is not displaced and the exposure transfer is performed with high accuracy. It can be performed.

  Hereinafter, an embodiment of an exposure apparatus according to the present invention will be described in detail with reference to the drawings.

  FIG. 1 is a plan view schematically showing the overall configuration of an exposure apparatus according to an embodiment of the present invention, FIG. 2 is a front view of the main part of the exposure apparatus of FIG. 1, and FIG. 3 is a side view of first and second substrate loaders. is there.

  As shown in FIGS. 1 and 2, the exposure apparatus PE of the first embodiment includes a mask stage 10, a first stage 11, a second substrate stage 12, an irradiation device 13, a first substrate loader 14, and a second substrate loader 15. , And a mask loader 16, each mounted on a base 17. Further, on the base 17, a main bed 19 disposed below the mask stage 10, and first and second subbeds 21 disposed on the side of the main bed 19 so as to face each other with respect to the main bed 19. The first substrate stage 11 moves between the main bed 19 and the first sub-bed 21, and the second substrate stage 12 moves between the main bed 19 and the second sub-bed 22, respectively.

  The mask stage 10 is supported on the main bed by a plurality of columns 23 provided on the main bed 19. The plurality of support columns 23 form a space above the main bed 19 so that the first and second substrate stages 11 and 12 can move in the Y direction (left and right direction in FIG. 1) and advance below the mask stage 10. is doing.

  The mask stage 10 has a rectangular opening 25a in the center, and includes a mask holding portion 25 supported so that the position of the mask stage 10 can be adjusted in the X, Y, and θ directions, and has a pattern to be exposed. M is held by the mask holding portion 25 so as to face the opening 25a. The mask stage 10 includes a mask alignment camera (not shown) that detects the position of the mask M with respect to the mask holding unit 25 and a gap sensor (not shown) that detects a gap between the mask M and the substrate W. ) And are provided.

  As shown in FIG. 2, the first and second substrate stages 11 and 12 have a substrate holding part 31 on which a substrate W as an exposed material is placed on the upper surface, and can be moved forward and backward from the upper surface of the substrate holding part 31. And a plurality of pins 32 arranged and supporting the substrate W. Further, below the first and second substrate stages 11 and 12, a Y-axis table 33, a Y-axis feed mechanism 34, an X-axis table 35, an X-axis feed mechanism 36, a Z-tilt adjustment mechanism 37, and a Z-axis table. Substrate stage moving mechanisms 39 and 39 having 38 are respectively provided.

  The Y-axis feed mechanism 34 includes a linear guide 40 and a feed drive mechanism 41, and a slider 42 attached to the back surface of the Y-axis table 33 is connected to the main bed 19 via a rolling element (not shown). The Y-axis table 33 is moved along the guide rail 43 by a linear motor having a stator 44 and a mover 45 while being straddled by two guide rails 43 extending over the first and second side beds 21 and 22. Drive.

  The X-axis feed mechanism 36 has the same configuration as the Y-axis feed mechanism 34, and the Z-tilt adjustment mechanism 37 is constituted by a movable wedge mechanism that is a combination of a wedge-shaped moving body and a feed drive mechanism. . The feed drive mechanism may be a linear motor having a stator and a mover, or may be a combination of a motor and a ball screw device.

  Thereby, the substrate stage moving mechanisms 32 and 32 feed and drive the first and second substrate stages 11 and 12 in the X direction and the Y direction, respectively, and finely adjust the gap between the mask M and the substrate W. Then, the first and second substrate stages 11 and 12 are finely moved and tilted in the Z-axis direction.

  Further, between the substrate holding unit 31 and the Z-axis table 38 of the substrate stage moving mechanism 39 that moves the first and second substrate stages 11, 12, the substrate holding unit 31 is placed with respect to the substrate stage moving mechanism 39. A plurality of air springs 46, which are elastic vibration-proof mechanisms, and electromagnets 47 (47a, 47b), which are lock mechanisms capable of fixing and supporting the substrate holding unit 31 with respect to the substrate stage moving mechanism 39, are arranged. The air spring 46 and the electromagnet 47 are arranged so as not to interfere with the positions where the plurality of pins 32 are arranged, and may be provided on a column (not shown) standing on the Z-axis table 38. .

  The air spring 46 is a spring that utilizes the elasticity of air by enclosing compressed air in a rubber film, and a bellows type, a diaphragm type, a rolling seal type, and the like are known. The air spring 46 has a flexible structure and can insulate vibrations in the lateral direction and the rotational direction as well as in the axial direction.

  In a state where the electromagnet 47 is not activated, the substrate holding portion 31 is elastically supported by the Z-axis table 38 by the air spring 46, and vibrations on the substrate holding portion 31 are prevented from being transmitted to the Z-axis table 38. To do. On the other hand, in a state in which the electromagnet 47 is activated, the substrate holder 31 is firmly fixed and supported on the Z-axis table 38 by the electromagnet 47.

  Further, on the first and second substrate stages 11 and 12, bar mirrors 61 and 62 are respectively attached to the X direction side portion and the Y direction side portion of each substrate holding portion 31a and 31b. In addition, three laser interferometers 63, 64, and 65 are provided on both ends in the Y-axis direction of the first subbed 21 and the second subbed 22 and on one side in the X-axis direction of the main bed 19. As a result, the laser light is irradiated from the laser interferometers 63, 64, 65 to the bar mirrors 61, 62, the laser light reflected by the bar mirror 62 is received, and the laser light and the laser light reflected by the bar mirrors 61, 62 are received. And the positions of the first and second stages 11 and 12 are detected.

  As shown in FIG. 2, the illumination device 13 is disposed above the opening 25a of the mask holding unit 25 and is a light source for ultraviolet irradiation, such as a high-pressure mercury lamp, a concave mirror, an optical integrator, a plane mirror, a spherical mirror, and for exposure control. It is configured with a shutter or the like. The illumination device 13 masks pattern exposure light on the exposure position EP, that is, the substrate W held on the substrate holding portions 31a and 31b of the first and second substrate stages 11 and 12 moved on the main bed 19. Irradiate through M. As a result, the mask pattern P of the mask M is exposed and transferred onto the substrate W.

  The first substrate loader 14 and the second substrate loader 15 include a substrate cassette (not shown), a first substrate stage 11 located on the first subbed 21, and a second substrate stage 12 located on the second subbed 22. The mask loader 17 carries in and out the mask M between a mask cassette (not shown) and the mask stage 10.

  Here, in the exposure apparatus PE of this embodiment, the first substrate stage 11 is moved between the exposure position EP and the first standby position WP1 by the substrate stage moving mechanism 32 of the first and second substrate stages 11 and 12. The second substrate stage 12 is interlocked between the exposure position EP and the second standby position WP2. When the first substrate stage 11 is positioned at the exposure position EP (chain line position in FIG. 2) and the second substrate stage 12 is positioned at the second standby position WP2 (solid line position in FIG. 2), the first substrate stage 11 The mask pattern P of the mask M is exposed and transferred onto the held substrate W, and the second substrate stage 12 replaces the substrate W by the second substrate loader 15, that is, the substrate W after the exposure is carried out to the substrate cassette. Loading of the substrate W from the substrate cassette to the substrate holder 31b is performed simultaneously.

  In the replacement work on the second substrate stage 12, first, the plurality of pins 32 are raised, and the exposed substrate W on the substrate holding unit 31 is supported by the tips of the pins 32 protruding from the upper surface of the substrate holding unit 31. Then, the substrate W is received by the transport unit (not shown) of the second substrate loader 15. In addition, when a new substrate W is carried in, the plurality of pins 32 are raised, the transport unit of the second substrate loader 15 mounts the substrate W on the tip of the pins 32, and the pins 32 are lowered to remove the substrate W. It is placed on the upper surface of the substrate holder 31.

  During such replacement work, the substrate holding portion 31 is elastically supported by the air spring 46, and the vibration of the second substrate stage 12 generated during the work is transmitted to the Z-axis table 38 of the substrate stage moving mechanism 39. It is not transmitted to the first substrate stage 11 during exposure.

  On the other hand, in the first substrate stage 11 being exposed, since the substrate holder 31 is firmly fixed and supported by the substrate stage moving mechanism 39 by the operation of the electromagnet 47, the substrate holder 31 is not displaced and the mask is not displaced. The M mask pattern P is exposed and transferred onto the substrate W with high accuracy.

  Further, when the second substrate stage 12 is located at the exposure position EP (chain line position in FIG. 2) and the first substrate stage 11 is located at the first standby position WP1 (solid line position in FIG. 2), the second substrate stage 12 The mask pattern P of the mask M is exposed and transferred to the held substrate W, and in the first substrate stage 11, the substrate W is replaced by the first substrate loader 14, that is, the substrate W after exposure is carried out to the substrate cassette. The loading of the substrate W from the substrate cassette to the substrate holder 31a is performed simultaneously.

  Also in this case, in the first substrate stage 11 being replaced, the substrate holding unit 31 is elastically supported on the Z-axis table 38 by the air spring 46 by deactivating the electromagnet 47, and the second substrate being exposed is exposed. In the substrate stage 12, the substrate holding unit 31 is fixedly supported on the Z-axis table 38 by operating the electromagnet 47. Thereby, the vibration of the first substrate stage 11 generated during the replacement work is not transmitted to the second substrate stage 12 being exposed, and the mask pattern P of the mask M is not transmitted to the second substrate stage 12. Is transferred to the substrate W with high accuracy.

  During the movement between the exposure position EP of the first and second substrate stages 11 and 12 and the first and second standby positions WP1 and WP2, the electromagnet 47 is operated, and the substrate holder 31 is fixed to the Z-axis table 38. Since it is supported, the substrate holding part 31 does not shake and the substrate W is not displaced.

  As described above, according to the exposure apparatus PE of the present embodiment, the first substrate stage 11 movable between the exposure position EP located below the mask stage and the first standby position EP1, the exposure position EP, and the second position. And a second substrate stage 12 movable between the standby positions WP2, so that the exposure transfer of the substrate W and the loading and unloading of the substrate W to and from the first and second substrate stages 11 and 12 are performed simultaneously. Time can be shortened.

  Further, a substrate stage moving mechanism 39 is provided between the substrate holding unit 31 of the first and second substrate stages 11 and 12 and the substrate stage moving mechanisms 39 and 39 that move the first and second substrate stages 11 and 12. Since the air spring 46 capable of elastically supporting the substrate holding portion 31 with respect to the substrate and the electromagnet 47 capable of fixing and supporting the substrate holding portion 31 with respect to the substrate stage moving mechanism 39 are disposed, the substrate W is loaded and unloaded. The vibration generated in the substrate stage can be prevented from being transmitted to the substrate stage being exposed by the air spring 46. Thus, the influence of vibration on the exposure accuracy can be eliminated and the mask pattern P of the mask M can be exposed and transferred onto the substrate W with high accuracy.

  Further, when the substrate W held on the first and second substrate stages 11 and 12 is exposed, the substrate holding unit 31 is fixedly supported by the electromagnet 47 with respect to the substrate stage moving mechanism 39. It is possible to perform exposure transfer with high accuracy without being displaced.

  Further, since the air spring 46 and the electromagnet 47 are disposed between the substrate holding part 31 and the Z-axis table 38, the mass supported by the air spring 46 and the electromagnet 47 can be reduced to improve the responsiveness. In addition, the air spring 46 and the electromagnet 47 can be downsized.

In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably.
The anti-vibration mechanism of the present invention only needs to be able to elastically support the substrate holding portion with respect to the substrate stage moving mechanism, and may have a configuration other than the air spring. In addition, the lock mechanism may be configured other than the electromagnet as long as it can switch the elastic support by the vibration isolation mechanism and can fix and support the substrate holding unit with respect to the substrate stage moving mechanism.

1 is a plan view schematically showing the overall configuration of an exposure apparatus that is an embodiment of the present invention. It is a principal part front view of the exposure apparatus of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Mask stage 11 1st board | substrate stage 12 2nd board | substrate stage 13 Irradiation apparatus 31 Board | substrate holding | maintenance part 32 Pin 39 Board | substrate stage moving mechanism 46 Air spring (anti-vibration mechanism)
47 Electromagnet (Lock mechanism)
M Mask PE Exposure apparatus W Substrate EP Exposure position WP1 First standby position WP2 Second standby position

Claims (2)

A mask stage for holding the mask;
A first substrate stage movable between an exposure position below the mask stage and a first standby position;
A second substrate stage movable between the exposure position and a second standby position;
An irradiation device that irradiates the substrate held by the first and second substrate stages moved to the exposure position with light for pattern exposure through the mask;
An exposure apparatus comprising:
The first and second substrate stages have a substrate holding portion on which the substrate is placed, and a plurality of pins that are arranged to be able to advance and retract from the upper surface of the substrate holding portion and support the substrate,
An anti-vibration mechanism capable of elastically supporting the substrate holding part with respect to the substrate stage moving mechanism, between the substrate holding part and a substrate stage moving mechanism that moves the first and second substrate stages, An exposure apparatus comprising: a lock mechanism capable of fixing and supporting the substrate holding unit with respect to a substrate stage moving mechanism.   The anti-vibration mechanism is configured by an air spring, and the lock mechanism is an electromagnet that fixes and supports the substrate holding unit with respect to the substrate stage moving mechanism by electromagnetic force. Exposure device.

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