JP2007322706A - Exposure device and exposure method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method by which exposure of a substrate for transferring an image and conveyance of the substrate onto and from a substrate stage are simultaneously carried out to reduce a cycle time, and influences of vibration caused upon conveying the substrate in and out of the stage on the exposure accuracy are eliminated to perform high accuracy exposure and transfer. <P>SOLUTION: The exposure device PE is equipped with: a mask stage 10 holding a mask M; a main bed 19 located below the mask stage 10; a first sub-bed 15 and a second sub-bed 16 disposed on the side of the main bed 19; first and second substrate stages 11, 12 movable between the main bed 19 and the first and second sub-beds 15, 16; an irradiating device 13 to irradiate a substrate W held by the first and second substrate stages 11, 12 located on the main bed 19 with light for pattern exposure through the mask M; and vibration-proofing mechanisms 50, 51 to prevent vibration caused in the first sub-bed 21 and the second sub-bed 22 from being transmitted to the main bed 19. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus and an exposure method, and more particularly, to an exposure apparatus and an exposure method used when manufacturing a large flat panel display such as a semiconductor, a liquid crystal display panel, or a plasma display.

  As a conventional exposure apparatus, light (electron beam) for pattern exposure is irradiated through a mask in a state where a mask (reticle) and a substrate (wafer) are brought close to each other, thereby exposing and transferring the mask pattern onto the substrate. An apparatus is known (for example, refer to Patent Documents 1 and 2).

  The exposure apparatus described in Patent Document 1 corresponds to each of two frames on which a mask is arranged, two substrate stages on which a substrate is placed corresponding to each of the two frames, and two substrate stages. There is known a stage moving mechanism that includes two alignment mechanisms arranged in this manner, and in which the frame bodies and the substrate stage are combined and moved to an exposure position and exposed and transferred alternately. As a result, the stage moving mechanism simultaneously performs alignment and exposure on the two substrate stages to shorten the tact time.

In the exposure apparatus described in Patent Document 2, a vibration control actuator and a vibration control mass are arranged on the slider of the biaxial stage to reduce stage vibration, thereby shortening the stage settling time and positioning accuracy. We are trying to improve.
JP-A 63-87725 JP 2005-183876 A

  By the way, in the exposure apparatus described in Patent Document 1, the tact time is reduced by simultaneously performing exposure transfer of the substrate and loading and unloading of the substrate to and from the substrate stage by using two substrate stages. The vibration generated during loading / unloading is not taken into consideration, and this vibration may affect the exposure accuracy, and there is room for further improvement.

  In addition, the exposure apparatus described in Patent Document 2 reduces residual vibration in one substrate stage and shortens the settling time of the stage, but does not take into account vibration that occurs during loading and unloading of the substrate. There is no description about the use of two substrate stages.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to simultaneously perform exposure transfer of a substrate and loading and unloading of a substrate to and from a substrate stage, thereby reducing tact time and loading of the substrate. It is an object of the present invention to provide an exposure apparatus and an exposure method that can perform exposure transfer with high accuracy by eliminating the influence of vibration generated at the time of exposure on the exposure accuracy.

The above object of the present invention can be achieved by the following constitution.
(1) a mask stage for holding a mask;
A main bed located below the mask stage;
A first sub-bed and a second sub-bed disposed on the side of the main bed;
A first substrate stage movable between the main bed and the first sub-bed;
A second substrate stage movable between the main bed and the second sub-bed;
An irradiation apparatus for irradiating the substrate held on the first and second substrate stages located on the main bed with light for pattern exposure through a mask;
An anti-vibration mechanism for preventing vibration generated in the first sub-bed and the second sub-bed from being transmitted to the main bed;
An exposure apparatus comprising:

(2) The anti-vibration mechanism is provided so as to be able to fit into a wedge space formed between the main bed and the first and second subbeds, or a wedge space formed in the first and second subbeds, The exposure apparatus according to (1), comprising: first and second bed members having inclined surfaces; and an actuator that drives the first and second bed members in the vertical direction.

(3) The exposure according to (1), wherein the vibration isolation mechanism includes an actuator that drives the main bed in the vertical direction with each opposing surface between the main bed and the first and second sub-beds being inclined surfaces. apparatus.

(4) The exposure apparatus according to any one of (1) to (3), wherein the vibration isolation mechanism includes a vibration isolation material disposed below the main bed and capable of supporting the main bed.

(5) A mask stage for holding a mask, a main bed located below the mask stage, a first subbed and a second subbed arranged on the side of the main bed, and movable between the main bed and the first subbed. Pattern exposure light onto the first substrate stage, the second substrate stage movable between the main bed and the second sub-bed, and the substrates held on the first and second substrate stages located on the main bed. An exposure method using an exposure apparatus comprising: an irradiation apparatus that irradiates through the mask; and a vibration isolation mechanism that prevents vibration generated in the first subbed and the second subbed from being transmitted to the main bed. ,
A first exposure step of exposing and transferring a mask pattern of a mask onto a substrate held on a first substrate stage located on the main bed;
A first loading / unloading step of loading and unloading the substrate with respect to the second substrate stage located on the second sub-bed during the first exposure step;
A first moving step of moving the first substrate stage on the first sub-bed and the second substrate stage on the main bed;
A first driving step of driving the vibration isolation mechanism after the first moving step;
A second exposure step of exposing and transferring a mask pattern of a mask onto a substrate held on a second substrate stage located on the main bed;
A second loading / unloading step of loading and unloading the substrate with respect to the first substrate stage located on the first sub-bed during the second exposure step;
A second moving step of moving the first substrate stage on the main bed and the second substrate stage on the second subbed;
A second driving process for driving the vibration isolation mechanism after the second moving process;
With
The first driving process prevents the vibration generated in the first subbed by the second carry-in / out process during the second exposure process from being transmitted to the main bed,
The second driving step prevents the vibration generated in the second subbed by the first carry-in / out step during the first exposure step from being transmitted to the main bed.

  According to the exposure apparatus and the exposure method of the present invention, the first substrate stage movable between the main bed positioned below the mask stage and the first sub-bed disposed on the side thereof, the main bed and the side thereof. By providing a second substrate stage movable between the arranged second sub-beds, the exposure transfer of the substrate and the loading and unloading of the substrate to and from the first and second substrate stages are performed simultaneously, and the tact time is reduced. And a vibration-proof mechanism for preventing the vibration generated in the first sub-bed and the second sub-bed from being transmitted to the main bed, so that the substrate is carried into and out of the first and second substrate stages. It is possible to prevent the vibration generated at this time from being transmitted to the main bed during exposure. Thus, the influence of vibration on the exposure accuracy can be eliminated, and the mask pattern can be exposed and transferred to the substrate with high accuracy.

  Hereinafter, embodiments of an exposure apparatus and an exposure method according to the present invention will be described in detail with reference to the drawings.

(First embodiment)
FIG. 1 is a plan view schematically showing an overall configuration of an exposure apparatus according to a first embodiment of the present invention, and FIG. 2 is a front view of a main part showing a state in which a first substrate stage can be moved from a first standby position to an exposure position. FIG. 3 is a main part front view showing a state where the first substrate stage is located at the exposure position and the second substrate stage is located at the second standby position.

  As shown in FIGS. 1 and 2, the exposure apparatus PE of the first embodiment includes a mask stage 10, a first stage 11, a second substrate stage 12, an irradiation device 13, a first substrate loader 14, and a second substrate loader 15. , And a mask loader 16, each mounted on a base 17. Further, on the base 17, a main bed 19 placed via a vibration isolating material 18 such as a vibration isolating rubber, and a side of the main bed 19 are arranged to face each other with respect to the main bed 19, First and second sub-beds 21 and 22 placed via the level block 20 are provided.

  The mask stage 10 is supported by a plurality of support columns 23 provided on the main bed 19 and is disposed above the main bed 19. The plurality of support columns 23 form a space above the main bed 19 so that the first and second substrate stages 11 and 12 can move in the Y direction (left and right direction in FIG. 1) and advance below the mask stage 10. is doing.

  The mask stage 10 has a rectangular opening 25a in the center, and includes a mask holding portion 25 supported so that the position of the mask stage 10 can be adjusted in the X, Y, and θ directions, and has a pattern to be exposed. M is held by the mask holding portion 25 so as to face the opening 25a. The mask stage 10 includes a mask alignment camera (not shown) that detects the position of the mask M with respect to the mask holding unit 25 and a gap sensor (not shown) that detects a gap between the mask M and the substrate W. ) And are provided.

  As shown in FIG. 2, the first and second substrate stages 11 and 12 have substrate holding portions 31a and 31b for holding a substrate W as an exposed material on the upper surface, respectively. A substrate stage including a Y-axis table 33, a Y-axis feed mechanism 34, an X-axis table 35, an X-axis feed mechanism 36, and a Z-tilt adjustment mechanism 37 below the first and second substrate stages 11 and 12. Movement mechanisms 32 and 32 are provided, respectively.

  The Y-axis feed mechanism 34 includes a linear guide 38 and a feed drive mechanism 39, and a slider 40 attached to the back surface of the Y-axis table 33 is connected to the main bed 19 via a rolling element (not shown). The Y-axis table 33 is extended along the guide rail 41 by a linear motor having a stator 42 and a mover 43 while straddling the two guide rails 41 extending over the first and second side beds 21 and 22. Drive.

  The X-axis feed mechanism 36 has the same configuration as the Y-axis feed mechanism 34, and the Z-tilt adjustment mechanism 37 is constituted by a movable wedge mechanism that is a combination of a wedge-shaped moving body and a feed drive mechanism. . The feed drive mechanism may be a linear motor having a stator and a mover, or may be a combination of a motor and a ball screw device.

  Thereby, the substrate stage moving mechanisms 32 and 32 feed and drive the first and second substrate stages 11 and 12 in the X direction and the Y direction, respectively, and finely adjust the gap between the mask M and the substrate W. Then, the first and second substrate stages 11 and 12 are finely moved and tilted in the Z-axis direction.

  Further, on the first and second substrate stages 11 and 12, bar mirrors 61 and 62 are respectively attached to the X direction side portion and the Y direction side portion of each substrate holding portion 31a and 31b. In addition, three laser interferometers 63, 64, and 65 are provided on both ends in the Y-axis direction of the first subbed 21 and the second subbed 22 and on one side in the X-axis direction of the main bed 19. As a result, the laser light is irradiated from the laser interferometers 63, 64, 65 to the bar mirrors 61, 62, the laser light reflected by the bar mirror 62 is received, and the laser light and the laser light reflected by the bar mirrors 61, 62 are received. And the positions of the first and second stages 11 and 12 are detected.

  As shown in FIG. 2, the illumination device 13 is disposed above the opening 25a of the mask holding unit 25 and is a light source for ultraviolet irradiation, such as a high-pressure mercury lamp, a concave mirror, an optical integrator, a plane mirror, a spherical mirror, and for exposure control. It is configured with a shutter or the like. The illumination device 13 masks pattern exposure light on the exposure position EP, that is, the substrate W held on the substrate holding portions 31a and 31b of the first and second substrate stages 11 and 12 moved on the main bed 19. Irradiate through M. As a result, the mask pattern P of the mask M is exposed and transferred onto the substrate W.

  In addition, the first substrate loader 14 and the second substrate loader 15 are provided with a substrate cassette (not shown), a first substrate stage 11 located on the first sub-bed 21 that is the first standby position WP1, and a second standby position WP2. The substrate W is carried in and out of the second substrate stage 12 positioned on the second sub-bed 22, and the mask loader 17 is connected to the mask M between the mask cassette (not shown) and the mask stage 10. Carry in / out.

  Further, between the main bed 19 and the first and second sub beds 21 and 22, a vibration isolating mechanism 50 that prevents vibration generated in the first sub bed 21 and the second sub bed 22 from being transmitted to the main bed 19. , 51 are arranged.

  As shown in FIG. 2, the vibration isolation mechanisms 50, 51 are provided between the Y-direction one end surface 19 a of the main bed 19 and the Y-direction end surface 21 a of the first sub-bed 21 facing the main bed 19. 19b and the Y-direction end face 22a of the second sub-bed 22 opposite to the Y-direction end face 22a are disposed in a wedge space, and the Y-direction end faces 52a, 52b, 53a, 53b are inclined surfaces so as to correspond to the wedge space. First and second bed members 52 and 53, and piston rods 54a and 55a attached to the lower portions of the first and second bed members 52 and 53, and the first and second bed members 52 and 53 are moved up and down. Actuators 54 and 55 made up of hydraulic or pneumatic cylinders driven in the direction.

  The first and second bed members 52 and 53 have the same height as the main bed 19 and the first and second sub-beds 21 and 22, and the first and second bed members 52 and 53 are lowered. In this case, the Y-direction end faces 52a, 52b, 53a, 53b of the bed members 52, 53 are respectively in contact with the main bed 19 and the Y-direction end faces 19a, 21a, 19b, 22a of the first and second sub-beds 21, 22. These upper surfaces are substantially flush with the main bed 19 and the first and second sub-beds 21 and 22. When the first and second bed members 52 and 53 are in the raised position, the Y-direction end faces 52a, 52b, 53a and 53b of the first and second bed members 52 and 53, the main bed 19, and the first A predetermined gap is formed between the Y-direction end faces 19a, 21a, 19b, and 22a of the first and second subbeds 21 and 22. The actuators 54 and 55 are driven while detecting the positions of the first and second bed members 52 and 53 by a sensor (not shown).

  The guide rails 41 extending between the main bed 19 and the first and second beds 21 and 22 are on the main bed 19, the first and second sub-beds 21 and 22, and the first and second bed members 52 and 53, respectively. When the first and second bed members 52 and 53 are lowered, these rail pieces 41a to 41e are substantially formed as one guide rail 41. Form. The stator 42 of the feed drive mechanism 39 is also disposed on the main bed 19, the first and second sub-beds 21 and 22, and the first and second bed members 52 and 53, respectively.

  Next, the operation of the image stabilization mechanisms 50 and 51 during exposure by the exposure apparatus PE of this embodiment will be described.

  As shown in FIG. 2, when the first substrate stage 11 holding the substrate W is moved from the first standby position WP1 on the first subbed 21 to the exposure position EP on the main bed 19, the first bed member 52 is moved. Is positioned below and is fitted into the wedge space between the main bed 19 and the first sub-bed 21 without a gap, and the rail piece 41d on the first bed member 52 is connected to the main bed 19 and the first sub-bed 21. It becomes continuous with the rail pieces 41a and 41b. In this state, the first substrate stage 11 is moved from the first standby position WP1 to the exposure position EP by the feed drive mechanism 39 of the Y-axis feed mechanism 34.

  Then, as shown in FIG. 3, after moving the first substrate stage 11 to the exposure position EP, the actuator 55 on the second bed member 53 side is driven (second driving step), and the second bed member 53 is moved upward. And a gap is formed between the Y-direction end faces 53a and 53b of the second bed member 53 and the Y-direction end faces 19b and 22a of the main bed 19 and the second subbed 22.

  Thereafter, the gap adjustment and alignment adjustment between the mask M and the substrate W are performed, and the mask pattern P of the mask M is exposed and transferred to the substrate W while the first substrate stage 11 is moved stepwise (first exposure step). .

  Here, during the exposure transfer, the second substrate loader 15 is used to replace the substrate W on the second substrate stage 12 positioned at the second standby position WP2, that is, the exposed substrate W is transferred to the substrate cassette. Although the unloading and loading of the substrate W from the substrate cassette to the substrate holding portion 31b is performed (first loading / unloading step), the main bed 19 and the second sub-bed 22 are discontinuous by the second bed member 53 and replaced. The vibration generated in the second sub-bed 22 due to the work is prevented from being transmitted to the main bed 19, the influence of the vibration on the exposure accuracy during the exposure operation on the first substrate stage 11 can be eliminated, and the mask pattern P can be increased. The substrate W can be exposed with accuracy.

  When the exposure transfer on the first substrate stage 11 and the replacement operation on the second substrate stage 12 are completed, the actuator 55 on the second bed member 53 side is driven, the second bed member 53 is positioned downward, The two bed members 53 are brought into contact with both Y-direction end faces 53a, 53b and the Y-direction end faces 19b, 22a of the main bed 19 and the second sub-bed 22.

  As a result, the main bed 19, the first and second sub-beds 21 and 22, and the rail pieces 41 a to 41 e on the first and second bed members 52 and 53 are continuous to form one guide rail 41, The first substrate stage 11 moves to the first standby position WP1, and the second substrate stage 12 moves to the exposure position EP (first moving step). Thereafter, the actuator 54 on the first bed member 52 side is driven (first driving step), the first bed member 52 is positioned upward, and between the first bed member 52 and the main bed 19 and the first sub-bed 21. A gap is formed in

  In this state, the mask pattern of the mask M is exposed and transferred onto the substrate W held on the second substrate stage 12 at the exposure position EP (second exposure step). Further, during exposure transfer, the substrate W is replaced on the first substrate stage 11 using the first substrate loader 14, that is, the substrate W after exposure is carried out to the substrate cassette and the substrate from the substrate cassette to the substrate holding portion 31a. Although the loading of W (second loading / unloading step) is performed, the main bed 19 and the first sub-bed 21 are discontinuous by the first bed member 52, and therefore vibrations generated in the first sub-bed when the substrate W is replaced. Can be prevented from being transmitted to the main bed 19, the influence of vibration on the exposure accuracy during the exposure operation on the second substrate stage 12 can be eliminated, and the mask pattern P can be exposed onto the substrate W with high accuracy. it can.

  Similarly, the actuator 54 on the first bed member 52 side is driven to position the first bed member 52 downward to form a single guide rail 41, and the first substrate stage 11 is set to the exposure position EP. After each of the two substrate stages is moved to the second standby position WP2 (second movement step), the second driving step described above is performed so that the main bed 19 and the second sub-bed 22 are discontinuous by the first bed member 52. The first exposure process and the first carry-in / out process described above are repeated.

  In the present embodiment, the vibration isolating material 18 disposed below the main bed 19 also prevents the vibration generated in the first sub bed 21 and the second sub bed 22 from being transmitted to the main bed 19. Acts as That is, the vibration isolator 18 is transmitted through the base 21 during exposure transfer on the main bed 19, the first and second sub-beds 21 and 22, the first and second substrate loaders 14 and 15, and the mask loader. 16 or the like can absorb vibration from the device on the base 21.

  As described above, according to the exposure apparatus PE of the present embodiment, the mask stage 10 that holds the mask M, the main bed 19 that is positioned below the mask stage 10, and the first that is disposed beside the main bed 19. A first sub-bed 21 and a second sub-bed 22, a first substrate stage 11 movable between the main bed 19 and the first sub-bed 21, a second substrate stage 12 movable between the main bed 19 and the second sub-bed 22, An irradiation device 13 that irradiates the substrate W held on the first and second substrate stages 21 and 22 located on the main bed 19 with light for pattern exposure through the mask M, the first subbed 21 and the second subbed 21. Since the vibration control mechanism 50 and 51 which prevent the vibration which arose in the subbed 22 was transmitted to the main bed 19 are provided, the 1st and 2nd subbed 2 22, the vibration generated when the substrate W is replaced with the first and second substrate stages 11 and 12 is prevented from being transmitted to the main bed 19 during exposure, and the influence of the vibration on the exposure accuracy is eliminated. Can do. Thereby, the mask pattern P of the mask M can be exposed and transferred to the substrate W with high accuracy.

  The anti-vibration mechanisms 50 and 51 are respectively provided so as to be able to fit into wedge spaces formed between the main bed 19 and the first and second sub-beds 21 and 22 and have first and second beds having inclined surfaces. Since the members 52 and 53 and the actuators 54 and 55 for driving the first and second bed members 52 and 53 in the vertical direction are provided, the relatively lightweight bed members 52 and 53 may be driven, and the size is small and the number is small. The main beds 19 can be isolated by the actuators 54 and 55.

  Further, since the vibration isolating mechanism is provided below the main bed 19 and has the vibration isolating material 18 capable of supporting the main bed 19, it is transmitted via the base 21 during exposure transfer on the main bed 19. The vibration from the device on the base 21 can be absorbed. This also eliminates the influence of vibration on the exposure accuracy, and the mask pattern P of the mask M can be exposed and transferred onto the substrate W with high accuracy.

  Note that the first and second bed members 52 and 53 have at least one Y direction between the main bed 19 and the first and second sub-beds 21 and 22 when the bed members 52 and 53 are positioned above. What is necessary is just to form a clearance gap between end surface 19a, 21a, 19b, 22a, for example, as shown to Fig.4 (a), one of the Y direction end surfaces 52a, 52b of the 1st bed member 52 is made into an inclined surface, The other may be a vertical surface. Further, the first and second bed members 52 and 53 may be disposed in a wedge space formed in the first and second sub-beds 21 and 22 in the vicinity of the main bed 19, for example, as shown in FIG. As described above, even when the first bed member 52 is disposed in the first subbed 21 in the vicinity of the main bed 19, the vibration generated in the first subbed 21 is prevented from being transmitted to the main bed 19. Can do.

(Second Embodiment)
Next, an exposure apparatus and an exposure method according to the second embodiment of the present invention will be described with reference to FIGS. FIG. 5 is a plan view schematically showing the overall configuration of an exposure apparatus according to the second embodiment of the present invention, and FIG. 6 is a front view of a principal part showing a state in which the first substrate stage is movable from the first standby position to the exposure position. FIG. 7 is a main part front view showing a state in which the first substrate stage is located at the exposure position and the second substrate stage is located at the second standby position. The exposure apparatus of the second embodiment is different from that of the first embodiment only in the structure of the image stabilization mechanism, and the same parts as those in the first embodiment are denoted by the same reference numerals and the description thereof is omitted or simplified. Turn into.

  As shown in FIG. 6, in the exposure apparatus PE of the second embodiment, the main bed 19 is a wedge having an inclined surface so that the Y-direction end surfaces 19 a and 19 b gradually increase in the Y-direction width as it goes from the upper side to the lower side. It is formed into a shape. The first and second sub-beds 21 and 22 have Y-direction end surfaces 21a and 22a that face the Y-direction end surfaces 19a and 19b of the main bed 19, and these Y-direction end surfaces 21a and 22a are respectively connected to the Y-direction end surfaces 19a and 19a. An inclined surface having an angle equal to 19b is formed.

  Further, as shown in FIGS. 5 and 6, a plurality of vibration isolating materials 18 such as anti-vibration rubber are provided between the main bed 19 and the base 21 with a predetermined gap between the main bed 19 and the main bed 19. A plurality of actuators 70 including a hydraulic or pneumatic cylinder that is disposed and has a piston rod 70a attached to the lower surface of the main bed 19 and drives the main bed 19 in the vertical direction. That is, the vibration isolating mechanism of the present embodiment includes a configuration including an actuator 70 that drives the main bed 19 in the vertical direction, with the opposed surface between the main bed 19 and the first and second sub-beds 21 and 22 being inclined surfaces. And a vibration isolator 18 disposed below the bed 19.

  The guide rail 41 extending between the main bed 19 and the first and second beds 21 and 22 includes three rail pieces 41 a to 41 c provided on the main bed 19 and the first and second sub-beds 21 and 22, respectively. When the main bed 19 is positioned above, the rail pieces 41a to 41c substantially form one guide rail 41. The stator 42 of the feed drive mechanism 39 is also disposed on the main bed 19 and the first and second sub-beds 21 and 22, respectively.

  In the present embodiment, as shown in FIG. 6, when the first substrate stage 11 holding the substrate W is moved from the first standby position WP1 on the first subbed 21 to the exposure position EP on the main bed 19, The main bed 19 is positioned upward by the actuator 70, the Y-direction end faces 19 a and 19 b of the main bed 19 are brought into contact with the Y-direction end faces 21 a and 22 a of the first and second sub-beds 21 and 22, The rail pieces 41a to 41c of the first and second subbeds 21 and 22 are continuous. In this state, the first substrate stage 11 is moved from the first standby position WP1 to the exposure position EP by the feed drive mechanism 39 of the Y-axis feed mechanism 34.

  Then, as shown in FIG. 7, after the first substrate stage 11 is moved to the exposure position EP, the actuator 70 is driven, the main bed 19 is moved downward, and the main bed 19 is placed on the vibration isolator 18. While being supported, gaps are formed between the Y-direction end faces 19a, 19b of the main bed 19 and the Y-direction end faces 21a, 22a of the first and second sub-beds 21, 22.

  In this state, as in the first embodiment, exposure transfer is performed on the substrate W held on the first substrate stage 11, and the replacement operation of the substrate W is performed on the second substrate stage 12 located at the second standby position WP2. However, the main bed 19 and the second sub-bed 22 are discontinuous, and the vibration generated in the second sub-bed 22 due to the replacement work is prevented from being transmitted to the main bed 19. The influence of vibration on the exposure accuracy during the exposure operation can be eliminated, and the mask pattern P can be exposed onto the substrate W with high accuracy.

  Note that the movement of the first substrate stage 11 from the exposure position EP to the first standby position WP1, and the movement of the second substrate stage 12 between the exposure position EP and the second standby position WP2, as shown in FIG. 19 is performed in an upper position, and the exposure operation at the exposure position EP of the second substrate stage 12 is also performed on the vibration isolator 18 with the main bed 19 positioned below as shown in FIG. It is done in the state.

  According to the exposure apparatus PE of the present embodiment, as in the first embodiment, the vibration generated when the substrate W is replaced with the first and second substrate stages 11 and 12 in the first and second subbeds 21 and 22 is exposed. Can be prevented from being transmitted to the main bed 19 at the time, and the influence of vibration on the exposure accuracy can be eliminated. In particular, the anti-vibration mechanism is provided between the main bed 19 and the first and second sub-beds 21 and 22. Each opposing surface 19a, 19b, 21a, 22a is an inclined surface and includes an actuator 70 that drives the main bed 19 in the vertical direction. Therefore, the main bed 19 can be isolated from vibration only by moving the main bed 19 relatively. It becomes.

  In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably.

1 is a plan view schematically showing the overall configuration of an exposure apparatus that is a first embodiment of the present invention. It is a principal part front view which shows the state which the 1st board | substrate stage can move to the exposure position from a 1st standby position. It is a principal part front view which shows the state which the 1st board | substrate stage was located in the exposure position, and the 2nd board | substrate stage was located in the 2nd standby position. It is a principal part enlarged front view which shows the modification of the vibration proof mechanism of the exposure apparatus of 1st Embodiment. It is a top view which shows schematically the whole structure of the exposure apparatus which is 2nd Embodiment of this invention. It is a principal part front view which shows the state which the 1st board | substrate stage can move to the exposure position from a 1st standby position. It is a principal part front view which shows the state which the 1st board | substrate stage was located in the exposure position, and the 2nd board | substrate stage was located in the 2nd standby position.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Mask stage 11 1st board | substrate stage 12 2nd board | substrate stage 13 Irradiation apparatus 18 Anti-vibration material (anti-vibration mechanism)
19 Main bed 21 First subbed 22 Second subbed 50, 51 Anti-vibration mechanism 52 First bed member 53 Second bed members 54, 55, 70 Actuator M Mask PE Exposure device W Substrate

Claims (5)

A mask stage for holding the mask;
A main bed located below the mask stage;
A first subbed and a second subbed disposed on a side of the main bed;
A first substrate stage movable between the main bed and the first sub-bed;
A second substrate stage movable between the main bed and the second sub-bed;
An irradiation device for irradiating the substrate held on the first and second substrate stages located on the main bed with light for pattern exposure through the mask;
An anti-vibration mechanism for preventing vibration generated in the first sub-bed and the second sub-bed from being transmitted to the main bed;
An exposure apparatus comprising:   The anti-vibration mechanism is provided so as to be able to fit into a wedge space formed between the main bed and the first and second sub-beds or a wedge space formed in the first and second sub-beds. The exposure apparatus according to claim 1, further comprising: first and second bed members having inclined surfaces; and an actuator that drives the first and second bed members in the vertical direction.   The anti-vibration mechanism includes an actuator that drives each main bed in an up-down direction with each opposing surface between the main bed and the first and second sub-beds being inclined surfaces. Item 4. The exposure apparatus according to Item 1.   The exposure apparatus according to claim 1, wherein the vibration isolating mechanism includes a vibration isolating material that is disposed below the main bed and can support the main bed. A mask stage for holding a mask, a main bed positioned below the mask stage, a first sub-bed and a second sub-bed disposed on the side of the main bed, and movement between the main bed and the first sub-bed A pattern on a first substrate stage, a second substrate stage movable between the main bed and the second sub-bed, and a substrate held on the first and second substrate stages located on the main bed; An irradiation device for irradiating exposure light through the mask, and a vibration isolation mechanism for preventing vibration generated in the first subbed and the second subbed from being transmitted to the main bed,
An exposure method using an exposure apparatus comprising:
A first exposure step of exposing and transferring a mask pattern of the mask onto the substrate held on the first substrate stage located on the main bed;
A first loading / unloading step of loading and unloading the substrate with respect to the second substrate stage located on the second sub-bed during the first exposure step;
A first moving step of moving the first substrate stage on the first subbed and the second substrate stage on the main bed;
A first driving step of driving the vibration isolation mechanism after the first moving step;
A second exposure step of exposing and transferring a mask pattern of the mask onto the substrate held on the second substrate stage located on the main bed;
A second loading / unloading step of loading and unloading the substrate with respect to the first substrate stage located on the first sub-bed during the second exposure step;
A second moving step of moving the first substrate stage on the main bed and the second substrate stage on the second subbed;
A second driving step of driving the vibration isolation mechanism after the second moving step;
With
The first driving step prevents the vibration generated in the first subbed by the second carry-in / out step during the second exposure step from being transmitted to the main bed,
The exposure method characterized in that the second driving step prevents vibration generated in the second sub-bed by the first carry-in / out step during the first exposure step from being transmitted to the main bed.

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