TW201639974A - Copper alloy having excellent heat resistance - Google Patents

Copper alloy having excellent heat resistance Download PDF

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TW201639974A
TW201639974A TW105102885A TW105102885A TW201639974A TW 201639974 A TW201639974 A TW 201639974A TW 105102885 A TW105102885 A TW 105102885A TW 105102885 A TW105102885 A TW 105102885A TW 201639974 A TW201639974 A TW 201639974A
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copper alloy
compound
heat resistance
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TWI593814B (en
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Hisao Shishido
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Kobe Steel Ltd
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/02Making non-ferrous alloys by melting
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon

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Abstract

The subject of the present invention is to provide a high strength, high electrical conductivity, and excellent heat resistance Cu-Fe-P based copper alloy. The solution of the present invention is a copper alloy having excellent heat resistance, which contains, in mass percentage, Fe: 1.8 ~ 2.7%, P: 0.01 ~ 0.20%, Zn: 0.01 ~ 0.30%, Sn: 0.01 ~ 0.2%, the balance of copper and unavoidable impurities. The compounds with equivalent diameter exceeding 1[mu]m per mm2 of observed field area is more than 0 and less than 5.0 x 10^3. The compounds with equivalent diameter of 100 ~ 200 nm per mm2 of observed field area is 1.0 x 10^5 ~ 1.0 × 10^7.

Description

具優異耐熱性之銅合金 Copper alloy with excellent heat resistance

本發明係關於銅合金,詳細而言係關於高強度、高導電性,且具優異耐熱性之銅合金。 The present invention relates to a copper alloy, and more particularly to a copper alloy having high strength, high electrical conductivity, and excellent heat resistance.

於半導體引線框架之原料中係可使用銅合金。作為銅合金,以往一般使用含有Fe與P之Cu-Fe-P系之銅合金。作為Cu-Fe-P系之銅合金係可例示CDA194合金,具體而言係Fe:2.1~2.6質量%、P:0.015~0.15質量%、Zn:0.05~0.20質量%,剩餘部分由Cu及不可避免之雜質所構成的銅合金。Cu-Fe-P系之銅合金係藉由使Fe或Fe-P等之金屬間化合物析出於母相中,而成為高強度,且具有良好的導電性,熱傳導性優異者。因此,作為國際標準合金而被廣泛使用。 A copper alloy can be used in the raw material of the semiconductor lead frame. As the copper alloy, a Cu-Fe-P-based copper alloy containing Fe and P has been conventionally used. The Cu-Fe-P-based copper alloy system is exemplified by a CDA194 alloy, specifically, Fe: 2.1 to 2.6 mass%, P: 0.015 to 0.15 mass%, Zn: 0.05 to 0.20 mass%, and the remainder is Cu and not A copper alloy consisting of impurities. The Cu-Fe-P-based copper alloy is high in strength by precipitation of an intermetallic compound such as Fe or Fe-P in the matrix phase, and has excellent conductivity and excellent thermal conductivity. Therefore, it is widely used as an international standard alloy.

近年來,伴隨著使用於電子機器之半導體裝置的大容量化、小型化、薄型輕量化、高功能化,而發展使用於半導體裝置之引線框架的小面積化,並要求更進一步之強度、導電性、熱傳導性。伴隨此,對於使用於此等半導體裝置之引線框架所使用的銅合金板,亦被要求更進 一步之高強度化、高導電率化、良好的熱傳導性。 In recent years, with the increase in capacity, size, thickness, and functionality of semiconductor devices used in electronic devices, the development of a lead frame for semiconductor devices has been reduced, and further strength and conductivity have been required. Sexual, thermal conductivity. Along with this, the copper alloy sheets used for the lead frames of such semiconductor devices are also required to be further advanced. High strength in one step, high conductivity, and good thermal conductivity.

例如,於專利文獻1中係揭示有提高電性電子零件用銅合金板之強度、導電性、彎曲加工性、及耐應力緩和特性的技術。依據此技術,藉由設為含有2.5~3.5質量%之相對較多的Fe,並且於Cu母相中析出有第二相粒子的二相組織,而提高銅合金板之強度及導電性。 For example, Patent Document 1 discloses a technique for improving the strength, electrical conductivity, bending workability, and stress relaxation resistance of a copper alloy sheet for an electric electronic component. According to this technique, the strength and conductivity of the copper alloy sheet are improved by providing a relatively large amount of Fe of 2.5 to 3.5% by mass and depositing a two-phase structure of the second phase particles in the Cu mother phase.

但,若Fe之含量過多,則有時導電性反而會劣化。為了改善導電性,例如,只要增加Fe或Fe-P等之析出粒子的析出量即可。但,已知若增加析出粒子的析出量,則會導致析出粒子之成長、粗大化,而降低強度或耐熱性。 However, if the content of Fe is too large, the conductivity may be deteriorated instead. In order to improve conductivity, for example, the precipitation amount of precipitated particles such as Fe or Fe-P may be increased. However, it is known that when the precipitation amount of the precipitated particles is increased, the growth and coarsening of the precipitated particles are caused, and the strength or heat resistance is lowered.

在將上述Cu-Fe-P系銅合金板加工成引線框架等時,一般而言係藉由沖壓加工(有時亦被稱為沖壓穿孔加工)成為多銷形狀。最近,為了對應如前述般使用於電子機器的半導體裝置之小型化、薄型輕量化,而發展作為原材料使用的銅合金板之薄型化、或引線框架等之多銷化。伴隨此,而存在有於上述沖壓加工後之加工品容易殘留形變應力,使銷成為不整齊的傾向。因此,於沖壓加工所得到的多銷形狀之銅合金板,通常係施加消除應力退火等之熱處理來去除形變。但,若進行這樣的熱處理則材料會容易軟化,而無法維持熱處理前之強度。又,為了提昇生產性,上述熱處理係要求以高溫、短時間進行,並強烈要求在高溫下之熱處理後亦可維持高強度的耐熱性。 When the Cu-Fe-P-based copper alloy sheet is processed into a lead frame or the like, it is generally formed into a multi-pin shape by press working (sometimes referred to as press-punching processing). Recently, in order to reduce the size and thickness of a semiconductor device used in an electronic device as described above, it has been developed to reduce the thickness of a copper alloy sheet used as a material or to increase the number of pins of a lead frame or the like. Along with this, there is a tendency that the processed product after the press working is likely to have residual deformation stress, and the pin tends to be irregular. Therefore, in the multi-pin shape copper alloy sheet obtained by press working, heat treatment such as stress relief annealing is usually applied to remove the deformation. However, if such heat treatment is performed, the material is easily softened and the strength before the heat treatment cannot be maintained. Further, in order to improve productivity, the above heat treatment is required to be carried out at a high temperature and for a short period of time, and it is strongly required to maintain high-strength heat resistance after heat treatment at a high temperature.

又,於專利文獻2~4中係揭示有使銅合金之 強度、導電性、及耐熱性提昇的技術。 Further, in Patent Documents 2 to 4, it is disclosed that a copper alloy is used. Technology for improving strength, electrical conductivity, and heat resistance.

於專利文獻2中係揭示有在分散於Cu母相中之Fe析出物中,面積為20nm2以上、未達200nm2之析出物的合計之面積佔Cu母相全體的比例之面積率S1為0.4%以上,且面積為200nm2以上之析出物的合計之面積佔Cu母相全體的比例之面積率S2為滿足0.4≦S1/S2≦1.4之關係,藉此而提高強度、導電性、及耐熱性的技術。 Patent Document 2 discloses an area ratio S 1 in which the total area of precipitates having an area of 20 nm 2 or more and less than 200 nm 2 in the Fe precipitate dispersed in the Cu mother phase accounts for the ratio of the entire Cu mother phase. 0.4% or more, and the area ratio S 2 of the total area of the precipitates having an area of 200 nm 2 or more and the ratio of the total amount of the Cu mother phase is 0.4 ≦S 1 /S 2 ≦1.4, thereby improving the strength. Technology of electrical conductivity and heat resistance.

於專利文獻3中係揭示有藉由萃取殘渣法而抑制藉由孔徑尺寸0.1μm之過濾器所分離的0.1μm以上之粗大的Fe系化合物,使有效助於強度之提昇的微細之Fe系化合物的比例增多,藉此提高強度、導電性、及耐熱性的技術。 Patent Document 3 discloses a fine Fe-based compound which inhibits the coarse Fe-based compound of 0.1 μm or more separated by a filter having a pore size of 0.1 μm by an extraction residue method, thereby contributing to an improvement in strength. The ratio is increased to improve the strength, electrical conductivity, and heat resistance.

於專利文獻4中係揭示有藉由將粒徑1μm以上之Fe-P粒子的密度設為30個/mm2以下,而增大γ Fe粒子及α Fe粒子的密度,提高強度、導電性、及耐熱性的技術。 In Patent Document 4, it is disclosed that the density of Fe-P particles having a particle diameter of 1 μm or more is 30/mm 2 or less, and the density of γ Fe particles and α Fe particles is increased to improve strength and conductivity. And heat resistance technology.

另外,雖並非為使銅合金之強度、導電性、及耐熱性提昇的技術,但於專利文獻5中係揭示有於經過連續鑄造後之垂直於鑄造方向的剖面中,將結晶粒內及存在於晶界的初晶鐵粒子之長徑的平均值設為5μm以下,藉此減低於成為製品之銅合金板中的表面缺陷數或內部破裂等之技術。 Further, although it is not a technique for improving the strength, electrical conductivity, and heat resistance of the copper alloy, Patent Document 5 discloses that in the cross section perpendicular to the casting direction after continuous casting, the crystal grains are present and present. The average value of the major axis of the primary-crystal iron particles at the grain boundary is set to 5 μm or less, thereby reducing the number of surface defects or internal cracks in the copper alloy sheet to be a product.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2012-207261號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2012-207261

[專利文獻2]日本專利第5555154號公報 [Patent Document 2] Japanese Patent No. 5555154

[專利文獻3]日本專利第4950584號公報 [Patent Document 3] Japanese Patent No. 4950584

[專利文獻4]日本特開2014-55341號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2014-55341

[專利文獻5]日本特開2013-71155號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2013-71155

於上述專利文獻1之技術中,雖提高銅合金板之強度及導電性,但針對耐熱性並未被考慮在內。 In the technique of Patent Document 1, although the strength and conductivity of the copper alloy sheet are improved, heat resistance is not taken into consideration.

又,於上述專利文獻2之技術中係使直徑為數nm~數十nm之非常微細的析出物析出,於上述專利文獻3~5之技術中係著眼於0.1μm以上之Fe系化合物而控制其存在比例或大小。但,本發明者進行了探討的結果,發現於上述專利文獻2~5中,針對相當圓直徑100~200nm之化合物的個數密度與強度、導電性、及耐熱性之關係並未被探討。 Furthermore, in the technique of the above-mentioned Patent Document 2, very fine precipitates having a diameter of several nm to several tens of nm are deposited, and in the techniques of Patent Documents 3 to 5, the Fe-based compound of 0.1 μm or more is controlled to control the Fe-based compound. There is a ratio or size. However, as a result of investigations, the inventors of the present invention found that the relationship between the number density, the strength, the electrical conductivity, and the heat resistance of a compound having a substantially circular diameter of 100 to 200 nm has not been examined.

本發明係著眼於上述般的情事而發明者,其目的為提供一種高強度、高導電性,進而耐熱性亦優異的Cu-Fe-P系之銅合金。 The present invention has been made in view of the above-described circumstances, and an object of the invention is to provide a Cu-Fe-P-based copper alloy which is high in strength, high in electrical conductivity, and further excellent in heat resistance.

可解決上述課題之本發明的具優異耐熱性之 銅合金係含有以質量%計為Fe:1.8~2.7%、P:0.01~0.20%、Zn:0.01~0.30%、Sn:0.01~0.2%,剩餘部分由銅及不可避免之雜質所構成的銅合金。並且,具有以下要旨:相當圓直徑超過1μm之化合物係於觀察視野面積每1mm2中為0個以上、5.0×103個以下,相當圓直徑100~200nm之化合物係於觀察視野面積每1mm2中為1.0×105~1.0×107個。另外,以下,針對化學成分,%係意味著質量%。 The copper alloy having excellent heat resistance according to the present invention, which is capable of solving the above problems, contains Fe: 1.8 to 2.7%, P: 0.01 to 0.20%, Zn: 0.01 to 0.30%, and Sn: 0.01 to 0.2% by mass%. The remaining part is a copper alloy composed of copper and unavoidable impurities. And having the following gist: circle-equivalent diameter of 1μm of Compound over based on the observation visual field area per 1mm 2 of less than 0, 5.0 × 10 3 or less, the circle equivalent diameter of 100 ~ 200nm of the compound based on an observation visual field area per 1mm 2 The medium is 1.0 × 10 5 ~ 1.0 × 10 7 . In addition, hereinafter, % means a mass % with respect to a chemical component.

上述銅合金可進一步以質量%計,由Si、Ni、及Co所成之群中選出的一種或二種以上:合計含有0.01~0.1%。 The copper alloy may further be one or more selected from the group consisting of Si, Ni, and Co in a mass%: a total of 0.01 to 0.1%.

依據本發明,由於將成分組成及特定之大小的化合物之個數密度作適當地控制,而可提供高強度、高導電性,進而耐熱性亦優異的Cu-Fe-P系之銅合金。 According to the present invention, a Cu-Fe-P-based copper alloy having high strength, high electrical conductivity, and excellent heat resistance can be provided by appropriately controlling the number density of the component composition and the specific size of the compound.

本發明者係為了提供高強度、高導電性,且耐熱性亦優異的Cu-Fe-P系之銅合金,而反覆努力探討。其結果,發現若將銅合金之成分組成作適當地控制,並且於銅合金中所包含之化合物當中,(A)將相當圓直徑超過1μm之化合物設為於觀察視野面積每1mm2中為0個以上、5.0×103個以下,(B)將相當圓直徑100~200nm之 化合物設為於觀察視野面積每1mm2中為1.0×105~1.0×107個,則可實現強度、導電性、及耐熱性皆優異之銅合金,而完成本發明。 The inventors of the present invention have tried to provide a copper alloy of Cu-Fe-P type which is excellent in heat resistance and high in heat resistance. As a result, it has been found that, if the composition of the copper alloy is appropriately controlled, and among the compounds contained in the copper alloy, (A) a compound having a substantially circular diameter of more than 1 μm is set to 0 in the observation field area per 1 mm 2 . More than or equal to 5.0 × 10 3 or less, (B) a compound having a substantially circular diameter of 100 to 200 nm is set to 1.0 × 10 5 to 1.0 × 10 7 per 1 mm 2 of the observation visual field area, thereby achieving strength and conductivity. The present invention has been completed by a copper alloy excellent in both properties and heat resistance.

又,得知本發明之銅合金係在將成分組成調整後的銅合金進行溶解、鑄造,將所得到的鑄塊進行均熱處理之後,可進行熱壓延,尤其是為了將化合物之個數密度控制成上述範圍,只要將均熱處理條件及熱壓延條件作適當地調整即可。 Further, it is known that the copper alloy of the present invention is obtained by dissolving and casting a copper alloy having a compositional adjustment, and after the obtained ingot is subjected to a soaking treatment, hot rolling can be performed, in particular, for the number density of the compound. The control is in the above range, and the soaking conditions and the hot rolling conditions may be appropriately adjusted.

以下,針對本發明詳細地進行說明。 Hereinafter, the present invention will be described in detail.

(A)相當圓直徑超過1μm之化合物的個數密度 (A) Number density of compounds having a diameter of more than 1 μm

本發明之銅合金係相當圓直徑超過1μm之化合物於觀察視野面積每1mm2中為0個以上、5.0×103個以下。若相當圓直徑超過1μm之化合物的個數密度超過5.0×103個/mm2,則後述之相當圓直徑100~200nm之化合物及在一次退火或二次退火中生成的相當圓直徑數nm~數十nm之化合物的生成量會減低。其結果,強度、導電性、耐熱性會劣化。又,成為在沖壓穿孔加工時發生破裂的原因。因而,於本發明中係將相當圓直徑超過1μm之化合物的個數密度設為5.0×103個/mm2以下。相當圓直徑超過1μm之化合物的個數密度較佳為4.5×103個/mm2以下,更佳為4.0×103個/mm2以下。相當圓直徑超過1μm之化合物的個數密度係以盡可能地少者為佳,最佳為0個/mm2The copper alloy of the present invention has a compound having a diameter of more than 1 μm and is 0 or more and 5.0 × 10 3 or less per 1 mm 2 of the observation field of view. When the number density of the compound having a diameter of more than 1 μm exceeds 5.0 × 10 3 /mm 2 , the compound having a substantially circular diameter of 100 to 200 nm and the equivalent circle diameter generated in one annealing or second annealing are nm. The amount of tens of nm of compound produced will be reduced. As a result, strength, electrical conductivity, and heat resistance are deteriorated. Moreover, it is a cause of cracking at the time of press-punching processing. Therefore, in the present invention, the number density of the compound having a substantially circular diameter of more than 1 μm is set to 5.0 × 10 3 /mm 2 or less. The number density of the compound having a substantially circular diameter of more than 1 μm is preferably 4.5 × 10 3 /mm 2 or less, more preferably 4.0 × 10 3 /mm 2 or less. The number density of the compound having a substantially circular diameter of more than 1 μm is preferably as small as possible, and most preferably 0 / mm 2 .

(B)相當圓直徑100~200nm之化合物的個數密度 (B) Number density of compounds with a relatively round diameter of 100 to 200 nm

本發明之銅合金係相當圓直徑100~200nm之化合物於觀察視野面積每1mm2中為1.0×105個以上、1.0×107個以下。亦即,將相當圓直徑100~200nm之化合物設為0.10×106個以上、10×106個以下。相當圓直徑100~200nm之化合物雖在以往未受到特別注意,但本發明者進行了探討後,首度得知其係有助於銅合金之導電性及耐熱性提昇。為了發揮這種作用,係將相當圓直徑100~200nm之化合物的個數密度設為1.0×105個以上。相當圓直徑100~200nm之化合物的個數密度較佳為5.0×105個/mm2以上。但,若相當圓直徑100~200nm之化合物的個數密度過大,則在一次退火及二次退火所生成之數nm~數十nm之化合物量會減低,銅合金之強度降低,耐熱性也反而會劣化。因而,相當圓直徑100~200nm之化合物的個數密度必須設為1.0×107個以下。相當圓直徑100~200nm之化合物的個數密度較佳為8.0×106個/mm2以下,更佳為5.0×106個/mm2以下。 The copper alloy of the present invention has a compound having a diameter of 100 to 200 nm and is 1.0 × 10 5 or more and 1.0 × 10 7 or less per 1 mm 2 of the observation field area. In other words, the compound having a substantially circular diameter of 100 to 200 nm is made 0.10 × 10 6 or more and 10 × 10 6 or less. Although the compound having a substantially circular diameter of 100 to 200 nm has not been particularly noticed in the past, the inventors of the present invention have first discovered that it contributes to the improvement of the electrical conductivity and heat resistance of the copper alloy. In order to exert such an effect, the number density of compounds having a substantially circular diameter of 100 to 200 nm is set to 1.0 × 10 5 or more. The number density of the compound having a substantially circular diameter of 100 to 200 nm is preferably 5.0 × 10 5 /mm 2 or more. However, if the number density of a compound having a diameter of 100 to 200 nm is too large, the amount of the compound of several nm to several tens of nm generated in one annealing and second annealing is reduced, the strength of the copper alloy is lowered, and the heat resistance is reversed. Will deteriorate. Therefore, the number density of the compound having a relatively large circular diameter of 100 to 200 nm must be 1.0 × 10 7 or less. The number density of the compound having a substantially circular diameter of 100 to 200 nm is preferably 8.0 × 10 6 /mm 2 or less, more preferably 5.0 × 10 6 /mm 2 or less.

相當圓直徑超過1μm之化合物,及100~200nm之化合物的個數密度係只要按照以下程序進行測定即可。亦即,相當圓直徑超過1μm之化合物的個數密度係只要藉由於試驗片之寬方向中的橫剖面中,例如,對於板厚中心部之厚度方向90μm×剖面方向125μm的區域,以掃描型電子顯微鏡,並以倍率1000倍進行觀察,使用影像解析軟體算出各化合物之相當圓直徑,求出相當圓直 徑超過1μm之化合物的個數,並除以觀察視野面積而算出即可。 A compound having a substantially circular diameter of more than 1 μm and a number density of a compound of 100 to 200 nm may be measured by the following procedure. In other words, the number density of the compound having a diameter of more than 1 μm is a scanning type in the cross section in the width direction of the test piece, for example, in the thickness direction of the central portion of the thickness of 90 μm × the cross-sectional direction of 125 μm. An electron microscope was observed at a magnification of 1000 times, and the equivalent circle diameter of each compound was calculated using an image analysis software to obtain a fairly straight straight line. The number of compounds having a diameter of more than 1 μm may be calculated by dividing the area of the observation field of view.

相當圓直徑100~200nm之化合物的個數密度係只要藉由於上述橫剖面中,例如,對於板厚中心部之厚度方向9.0μm×剖面方向12.5μm的區域,以掃描型電子顯微鏡,並以倍率10000倍進行觀察,與上述相同地使用影像解析軟體算出各化合物之相當圓直徑,求出相當圓直徑100~200nm化合物的個數,並除以觀察視野面積而算出即可。另外,作為分析對象之化合物的種類並無特別限定。 The number density of a compound having a substantially circular diameter of 100 to 200 nm is obtained by a scanning electron microscope and a magnification in a cross-sectional view, for example, in a thickness direction of a central portion of the plate thickness of 9.0 μm × a cross-sectional direction of 12.5 μm. The observation was performed at 10,000 times, and the equivalent circle diameter of each compound was calculated using the image analysis software in the same manner as described above, and the number of compounds having a diameter of 100 to 200 nm was determined and divided by the observation field of view. Further, the type of the compound to be analyzed is not particularly limited.

作為上述影像解析軟體,例如,可使用Macromedia公司製之Image-Pro Plus。 As the image analysis software, for example, Image-Pro Plus manufactured by Macromedia Co., Ltd. can be used.

另外,於上述專利文獻3所揭示的技術中,如上述般,藉由萃取殘渣法,而抑制藉由孔徑尺寸0.1μm之過濾器所分離的0.1μm以上之粗大的Fe系化合物。但,於此技術中,並無法如本發明般地個別算出相當圓直徑超過1μm之化合物,及100~200nm之化合物的個數密度。又,於上述專利文獻5中係記載有將初晶鐵粒子之長徑的平均值抑制為5μm以下,於上述專利文獻4中係記載有將粒徑1μm以上之Fe-P粒子的密度設為30個/mm2以下。但,於專利文獻4、5中,完全未考慮到相當圓直徑100~200nm之化合物的個數密度。 Further, in the technique disclosed in Patent Document 3, as described above, the Fe-based compound having a thickness of 0.1 μm or more separated by a filter having a pore size of 0.1 μm is suppressed by the extraction residue method. However, in this technique, it is not possible to individually calculate a compound having a substantially circular diameter of more than 1 μm and a number density of a compound of 100 to 200 nm as in the present invention. In addition, in the above-mentioned Patent Document 5, the average value of the long diameter of the primary iron particles is suppressed to 5 μm or less. In the above Patent Document 4, the density of Fe-P particles having a particle diameter of 1 μm or more is described. 30 / mm 2 or less. However, in Patent Documents 4 and 5, the number density of compounds having a substantially circular diameter of 100 to 200 nm is not considered at all.

本發明之銅合金係相當圓直徑超過1μm之化合物的個數密度,與100~200nm之化合物的個數密度滿 足上述範圍一事為重要,進而,成分組成係必須滿足以質量%計為Fe:1.8~2.7%、P:0.01~0.20%、Zn:0.01~0.30%、Sn:0.01~0.2%。 The copper alloy of the present invention is a number density of a compound having a diameter of more than 1 μm, and the number density of the compound of 100 to 200 nm is full. The above range is important. Further, the component composition must satisfy Fe: 1.8 to 2.7%, P: 0.01 to 0.20%, Zn: 0.01 to 0.30%, and Sn: 0.01 to 0.2% by mass%.

Fe係為了藉由於銅合金之母相中固溶,或生成Fe系之化合物而提昇強度與耐熱性所必要的元素。於Fe量為未達1.8%中,Fe之固溶量或析出量會不足,而不能得到強度及耐熱性。因而,於本發明中,Fe量係設為1.8%以上。Fe量較佳為2.1%以上。但,若Fe量成為過剩,則會生成粗大的Fe化合物,而成為穿孔加工時發生破裂的原因。因而,於本發明中,Fe量係設為2.7%以下。Fe量較佳為2.6%以下,更佳為2.4%以下。 Fe is an element necessary for improving strength and heat resistance by solid solution in a mother phase of a copper alloy or formation of a Fe-based compound. When the amount of Fe is less than 1.8%, the amount of solid solution or precipitation of Fe may be insufficient, and strength and heat resistance may not be obtained. Therefore, in the present invention, the amount of Fe is set to 1.8% or more. The amount of Fe is preferably 2.1% or more. However, if the amount of Fe is excessive, a coarse Fe compound is formed, which causes cracking during piercing. Therefore, in the present invention, the amount of Fe is set to 2.7% or less. The amount of Fe is preferably 2.6% or less, more preferably 2.4% or less.

P係具有將混入於熔化液中之氧進行去氧之作用的元素,且為與Fe形成化合物來提昇銅合金之強度及耐熱性的元素。為了發揮這樣的作用,P量係必須設為0.01%以上。P量較佳為0.02%以上。但,若P量成為過剩,則導電率會降低。又,熱加工性會降低。因而,於本發明中,P量係設為0.20%以下。P量較佳為0.15%以下。 P is an element which functions to deoxidize oxygen mixed in the molten liquid, and is an element which forms a compound with Fe to enhance the strength and heat resistance of the copper alloy. In order to exert such an effect, the P amount must be set to 0.01% or more. The amount of P is preferably 0.02% or more. However, if the amount of P becomes excessive, the electrical conductivity will decrease. Also, hot workability is lowered. Therefore, in the present invention, the P amount is set to 0.20% or less. The amount of P is preferably 0.15% or less.

Zn係為了改善對於銅合金之焊錫的耐熱剝離性,或對於銅合金之Sn電鍍的耐熱剝離性所必要的元素。這樣的耐熱剝離性係例如當將銅合金使用於引線框架等時所要求的特性。為了發揮這樣的作用,Zn量係必須設為0.01%以上。Zn量較佳為0.05%以上。但,若Zn量成為過剩,則導電率會降低。又,對於銅合金之焊錫的濕 潤性會降低。因而,於本發明中,Zn量係設為0.30%以下。Zn量較佳為0.20%以下。 Zn is an element necessary for improving the heat-resistant peeling property of the solder of the copper alloy or the heat-resistant peeling property of the Sn-plating of the copper alloy. Such heat-resistant peeling property is, for example, a property required when a copper alloy is used for a lead frame or the like. In order to exert such an effect, the amount of Zn must be 0.01% or more. The amount of Zn is preferably 0.05% or more. However, if the amount of Zn is excessive, the electrical conductivity will decrease. Also, for the soldering of copper alloys Runability will decrease. Therefore, in the present invention, the amount of Zn is set to 0.30% or less. The amount of Zn is preferably 0.20% or less.

Sn係為了提昇銅合金之強度及耐熱性所必要的元素。為了發揮這樣的作用,Sn量係必須設為0.01%以上。Sn量較佳為0.02%以上。但,若Sn量成為過剩,則導電率會降低。又,熱加工性亦會降低。因而,於本發明中,Sn量係設為0.2%以下。Sn量較佳為0.10%以下,更佳為0.05%以下。 Sn is an element necessary for improving the strength and heat resistance of the copper alloy. In order to exert such an effect, the amount of Sn must be set to 0.01% or more. The amount of Sn is preferably 0.02% or more. However, if the amount of Sn becomes excessive, the electrical conductivity is lowered. Also, the hot workability is also lowered. Therefore, in the present invention, the amount of Sn is set to 0.2% or less. The amount of Sn is preferably 0.10% or less, more preferably 0.05% or less.

本發明之銅合金的剩餘部分係銅及不可避免之雜質。 The remainder of the copper alloy of the present invention is copper and unavoidable impurities.

本發明之銅合金可進一步含有以質量%計合計為0.01~0.1%之由Si、Ni、及Co所成之群中選出的一種或二種以上。 The copper alloy of the present invention may further contain one or more selected from the group consisting of Si, Ni, and Co in a total amount of 0.01% to 0.1% by mass.

Si、Ni、及Co係與Fe或P形成化合物,而提昇銅合金之強度及耐熱性的元素。為了有效地發揮這樣的作用,較佳係將Si、Ni、及Co中之一種或任意選出的二種以上設為合計0.01%以上,更佳為0.03%以上。但,若過剩地含有Si等之元素,則化合物會粗大化,而成為沖壓穿孔加工時發生破裂的原因。因而,於本發明中,較佳係將Si、Ni、及Co中之一種或任意選出的二種以上設為合計0.1%以下,更佳為0.08%以下。 Si, Ni, and Co are elements which form a compound with Fe or P to enhance the strength and heat resistance of the copper alloy. In order to effectively exhibit such an effect, it is preferable to set one or more selected from Si, Ni, and Co to 0.01% or more in total, and more preferably 0.03% or more. However, if an element such as Si is excessively contained, the compound is coarsened, which causes cracking during punching and punching. Therefore, in the present invention, one or more selected from the group consisting of Si, Ni, and Co are preferably 0.1% or less in total, and more preferably 0.08% or less.

本發明之銅合金係成為拉伸強度為530MPa以上,導電率為60% IACS以上,維氏硬度係成為155Hv以上。又,以475℃退火1分鐘後之維氏硬度係成為140Hv 以上,而成為具優異耐熱性之銅合金。 The copper alloy of the present invention has a tensile strength of 530 MPa or more, a conductivity of 60% IACS or more, and a Vickers hardness of 155 Hv or more. Moreover, the Vickers hardness after annealing at 475 ° C for 1 minute becomes 140 Hv. The above is a copper alloy having excellent heat resistance.

接著,針對本發明之銅合金的較佳製造條件進行說明。 Next, preferred manufacturing conditions of the copper alloy of the present invention will be described.

首先,在將成分組成調整後的銅合金進行溶解、鑄造,將所得到的鑄塊進行均熱處理之後,進行熱壓延。為了將化合物的個數密度控制成上述範圍,只要適當調整均熱處理條件及熱壓延條件即可。銅合金之溶解、鑄造係只要按造常法進行即可。 First, the copper alloy having the compositional composition adjusted is dissolved and cast, and the obtained ingot is subjected to a soaking treatment, followed by hot rolling. In order to control the number density of the compound to the above range, the soaking conditions and the hot rolling conditions may be appropriately adjusted. The dissolution and casting of the copper alloy may be carried out according to the usual method.

均熱處理係只要將上述鑄塊加熱至800℃以上、未達950℃,因應需要而保持一定時間即可。保持時間係例如10~120分鐘。若均熱處理之溫度低於800℃,則相當圓直徑100~200nm之化合物會多量生成,個數密度容易變高。因而,於本發明中,均熱處理之溫度較佳係設為800℃以上。均熱處理之溫度更佳為830℃以上,再更佳為850℃以上。但,若均熱處理之溫度成為950℃以上,則相當圓直徑超過1μm之化合物會多量生成,個數密度容易變高。因而,於本發明中,均熱處理之溫度較佳係設為未達950℃。均熱處理之溫度更佳為940℃以下,再更佳為920℃以下。例如,可推測於上述專利文獻4中係由於將鑄塊加熱至1020~1080℃並保持2小時以上,因此相當圓直徑超過1μm之化合物會過度多量生成。因而,可推測於上述專利文獻4中係強度會變得過低。 In the soaking treatment, the ingot may be heated to 800 ° C or higher and less than 950 ° C, and may be kept for a certain period of time as needed. The holding time is, for example, 10 to 120 minutes. When the temperature of the soaking treatment is lower than 800 ° C, a compound having a relatively large diameter of 100 to 200 nm is formed in a large amount, and the number density tends to be high. Therefore, in the present invention, the temperature of the soaking treatment is preferably set to 800 ° C or higher. The temperature of the soaking treatment is more preferably 830 ° C or more, and still more preferably 850 ° C or more. However, when the temperature of the soaking treatment is 950 ° C or more, a compound having a substantially circular diameter of more than 1 μm is formed in a large amount, and the number density tends to be high. Therefore, in the present invention, the temperature of the soaking treatment is preferably set to less than 950 °C. The temperature of the soaking treatment is more preferably 940 ° C or less, still more preferably 920 ° C or less. For example, it is presumed that in Patent Document 4, since the ingot is heated to 1020 to 1080 ° C and held for 2 hours or more, a compound having a substantially circular diameter of more than 1 μm is excessively formed. Therefore, it is presumed that the strength of the above-described Patent Document 4 is too low.

在均熱處理之後係進行熱壓延。熱壓延之壓下率並無特別限定,只要以與成為目的之板厚及後步驟之 冷壓延中的冷壓延率之關係來決定即可。另外,熱壓延係可進行1次或複數次。 After the soaking treatment, hot rolling is performed. The reduction ratio of the hot rolling is not particularly limited as long as it is the thickness of the board to be used and the subsequent steps. The relationship between the cold rolling ratio in cold rolling can be determined. In addition, the hot rolling system can be carried out once or in multiple times.

在製造本發明之銅合金時,特別推薦將熱壓延之結束溫度設為700℃以上、未達850℃。若熱壓延之結束溫度低於700℃,則相當圓直徑100~200nm之化合物會多量生成,個數密度容易變高。因而,於本發明中,熱壓延之結束溫度較佳係設為700℃以上。熱壓延之結束溫度更佳為730℃以上,再更佳為750℃以上。但,若熱壓延之結束溫度成為850℃以上,則相當圓直徑超過1μm之化合物會多量生成,個數密度容易變高。因而,於本發明中,熱壓延之結束溫度較佳係設為未達850℃。熱壓延之結束溫度更佳為840℃以下,再更佳為830℃以下。 In the production of the copper alloy of the present invention, it is particularly preferable to set the end temperature of hot rolling to 700 ° C or higher and less than 850 ° C. When the end temperature of the hot rolling is less than 700 ° C, a compound having a substantially circular diameter of 100 to 200 nm is formed in a large amount, and the number density is likely to be high. Therefore, in the present invention, the end temperature of the hot rolling is preferably set to 700 ° C or higher. The end temperature of the hot calendering is more preferably 730 ° C or more, and still more preferably 750 ° C or more. However, when the end temperature of the hot rolling is 850 ° C or more, a compound having a diameter of more than 1 μm is formed in a large amount, and the number density tends to be high. Therefore, in the present invention, the end temperature of the hot rolling is preferably set to less than 850 °C. The end temperature of the hot rolling is more preferably 840 ° C or less, and still more preferably 830 ° C or less.

熱壓延後係只要急速冷卻至室溫即可。若熱壓延後之冷卻速度小,則在冷卻過程中相當圓直徑超過1μm之粗大的化合物會多量析出,而變得難以生成特定量之相當圓直徑100~200nm之微細的化合物。於本發明中,急速冷卻係指以超過氣冷之平均冷卻速度的冷卻,較佳為20℃/秒以上。平均冷卻速度之上限雖無特別限定,但若考慮實際投入生產等,則較佳為大約500℃/秒以下。 After hot rolling, it is only necessary to rapidly cool to room temperature. When the cooling rate after the hot rolling is small, a large amount of a compound having a relatively large diameter of more than 1 μm during the cooling process is precipitated in a large amount, and it becomes difficult to form a specific amount of a fine compound having a diameter of 100 to 200 nm. In the present invention, rapid cooling means cooling at an average cooling rate exceeding air cooling, and is preferably 20 ° C /sec or more. Although the upper limit of the average cooling rate is not particularly limited, it is preferably about 500 ° C / sec or less in consideration of actual production or the like.

急速冷卻手段並無特別限定,例如,可採用水冷等周知之冷卻手段。 The rapid cooling means is not particularly limited, and for example, a known cooling means such as water cooling can be used.

急速冷卻之後係只要於施加第1次冷壓延(以下,稱為1次冷壓延)後的板材施加以1次退火所致之熱處理,之後,藉由第2次冷壓延(以下,稱為2次冷 壓延),成形為特定形狀,其後,藉由施加以2次退火所致之熱處理,而去除銅合金組織內之形變即可。 After the rapid cooling, the heat treatment by the first annealing is applied to the sheet material after the first cold rolling (hereinafter referred to as primary cold rolling), and then the second cold rolling (hereinafter referred to as 2) Secondary cold The calendering is formed into a specific shape, and thereafter, the deformation in the copper alloy structure can be removed by applying heat treatment by annealing twice.

於1次冷壓延之壓延加工率雖為任意,但只要配合最終的板材之板厚及後述之2次冷壓延之壓延加工率來調節即可。 Although the calendering rate of the cold rolling is arbitrary, it may be adjusted by blending the thickness of the final sheet and the calendering rate of the second cold rolling to be described later.

1次冷壓延後,例如,藉由以450~650℃施加30分鐘~24小時之1次退火,而可將相當圓直徑100~200nm之化合物的個數密度控制在適當的範圍。於1次退火溫度為未達450℃或者1次退火時間為未達30分鐘,會因加熱處理不足,而使相當圓直徑100~200nm之化合物的個數密度容易降低,而導電率會容易降低。另一方面,若1次退火溫度超過650℃,則相當圓直徑100~200nm之化合物的個數密度容易變高,而強度會容易降低。又,若1次退火時間超過24小時,則會造成能量損失,於經濟方面並非有效率。 After the primary cold rolling, for example, by applying annealing at 450 to 650 ° C for 30 minutes to 24 hours, the number density of the compound having a substantially circular diameter of 100 to 200 nm can be controlled to an appropriate range. When the annealing temperature is less than 450 ° C or the annealing time is less than 30 minutes, the number of compounds having a relatively round diameter of 100 to 200 nm is easily lowered due to insufficient heat treatment, and the conductivity is easily lowered. . On the other hand, when the primary annealing temperature exceeds 650 ° C, the number density of the compound having a substantially circular diameter of 100 to 200 nm tends to be high, and the strength is likely to be lowered. Moreover, if the annealing time exceeds 24 hours, energy loss is caused, and it is not economically efficient.

接著,1次退火後係施加2次冷壓延。藉由2次冷壓延,而於金屬組織內導入加工形變,可提昇銅合金板之強度。2次冷壓延之壓延加工率係只要設為例如25~70%即可。於2次冷壓延之壓延加工率為未達25%,藉由壓延而積存於金屬組織內的形變量會降低,而難以得到充分的強度。另一方面,若2次冷壓延之壓延加工率超過70%,則積存於金屬組織內的形變量會飽和,而難以得到強度之提昇。 Next, after one annealing, cold rolling was applied twice. The strength of the copper alloy sheet can be improved by introducing cold deformation into the metal structure by two cold rolling. The rolling reduction ratio of the second cold rolling may be, for example, 25 to 70%. The rolling reduction rate in the second cold rolling is less than 25%, and the deformation amount accumulated in the metal structure by rolling is lowered, and it is difficult to obtain sufficient strength. On the other hand, if the rolling reduction ratio of the secondary cold rolling exceeds 70%, the shape variable accumulated in the metal structure is saturated, and it is difficult to obtain an improvement in strength.

接著,2次冷壓延後較佳係以250~450℃進 行20~1000秒鐘之2次退火。2次退火係用以取得在2次冷壓延中被導入之形變的退火,只要進行在250~450℃之低溫區域為可動之形變的去除即可。於2次退火溫度為未達250℃或2次退火時間為未達20秒鐘,可動形變之去除會變得不充分,而導電率容易降低。另一方面,若2次退火溫度超過450℃或2次退火時間超過1000秒鐘,則形變之去除成為過剩,而強度容易降低。 Then, after 2 cold rolling, it is better to enter 250~450 °C. The annealing is performed twice in 20 to 1000 seconds. The secondary annealing is an annealing for obtaining deformation which is introduced in the second cold rolling, and may be removed by a movable deformation in a low temperature region of 250 to 450 °C. When the annealing temperature is less than 250 ° C or the annealing time is less than 20 seconds, the removal of the movable deformation becomes insufficient, and the electrical conductivity is liable to lower. On the other hand, if the secondary annealing temperature exceeds 450 ° C or the secondary annealing time exceeds 1000 seconds, the deformation is excessively removed, and the strength is liable to lower.

[實施例] [Examples]

以下,雖列舉實施例來更具體地說明本發明,但本發明並不因下述實施例而受到限制,當然可在適於前述及後述之要旨的範圍內添加變更來實施,該等任一者皆包含於本發明之技術性範圍中。 In the following, the present invention will be more specifically described by the following examples, but the present invention is not limited by the following examples, and of course, it may be implemented by adding or modifying the modifications within the scope of the above-mentioned and the following description. All of them are included in the technical scope of the present invention.

將具有下述表1所示之成分組成且剩餘部分由銅及不可避免之雜質所構成的銅合金在無芯爐中進行鑄錠(ingot)之後,以半連續鑄造法進行造塊,而製造厚度70mm×寬200mm×長度500mm之鑄塊。另外,於下述表1中亦一併顯示算出Si、Ni、及Co之合計量的結果。 A copper alloy having the composition shown in Table 1 below and having the remainder consisting of copper and unavoidable impurities is ingots in a coreless furnace, and then agglomerated by a semi-continuous casting method to produce An ingot having a thickness of 70 mm × a width of 200 mm and a length of 500 mm. Further, the results of calculating the total amount of Si, Ni, and Co are also shown in Table 1 below.

在將所得到的鑄塊之表面進行表面切削之後,進行以750~1050℃之溫度保持1小時之均熱處理後進行熱壓延,而得到厚度15mm之熱壓延板。於下述表2顯示均熱處理之溫度。熱壓延開始溫度係以使熱壓延結束溫度成為600~800℃的方式進行調整,熱壓延結束後立刻藉由水冷進行急速冷卻。於下述表2顯示熱壓延結束溫 度。 After the surface of the obtained ingot was subjected to surface cutting, it was subjected to a soaking treatment at a temperature of 750 to 1050 ° C for 1 hour, and then hot rolling was carried out to obtain a hot rolled sheet having a thickness of 15 mm. The temperature of the soaking treatment is shown in Table 2 below. The hot rolling start temperature is adjusted such that the hot rolling end temperature is 600 to 800 ° C, and immediately after the hot rolling is finished, the cooling is rapidly performed by water cooling. Table 2 below shows the hot rolling end temperature degree.

接著,去除氧化皮之後,進行1次冷壓延、1次退火、2次冷壓延、及2次退火,而得到厚度0.25mm之冷壓延板。1次退火係加熱至550℃,在此溫度保持4小時來進行。2次退火係加熱至350℃,在此溫度保持60秒來進行。 Next, after the scale was removed, cold rolling, primary annealing, secondary cold rolling, and secondary annealing were performed once to obtain a cold rolled sheet having a thickness of 0.25 mm. The primary annealing was carried out by heating to 550 ° C and maintaining the temperature at this temperature for 4 hours. The secondary annealing was carried out by heating to 350 ° C and maintaining the temperature for 60 seconds.

針對所得到的冷壓延板,測定化合物的個數密度、拉伸強度、導電率、硬度、及耐熱性。 The number density, tensile strength, electrical conductivity, hardness, and heat resistance of the compound were measured for the obtained cold rolled sheet.

化合物的個數密度,係針對相當圓直徑超過1μm之化合物,及相當圓直徑為100~200nm之化合物進行測定。 The number density of the compounds is determined for a compound having a substantially circular diameter of more than 1 μm and a compound having a substantially circular diameter of 100 to 200 nm.

相當圓直徑超過1μm之化合物的個數密度係於上述冷壓延板之寬方向的橫剖面中,對於板厚中心部之厚度方向90μm×剖面方向125μm的區域,以掃描型電子顯微鏡,並以觀察倍率1000倍進行觀察,使用影像解析軟體(Macromedica公司製之Image-Pro Plus)來測定觀察視野內之化合物之相當圓直徑。將測定結果顯示於下述表2。 The number density of a compound having a substantially circular diameter of more than 1 μm is in the transverse cross section of the cold rolled sheet in the width direction, and is observed by a scanning electron microscope in a region of a thickness of 90 μm in the central portion of the thickness and a cross section of 125 μm in the cross section. The magnification was observed at 1000 times, and the image-analytical software (Image-Pro Plus manufactured by Macromeda) was used to measure the considerable circle diameter of the compound in the observation field. The measurement results are shown in Table 2 below.

相當圓直徑為100~200nm之化合物的個數密度係於上述冷壓延板之寬方向的橫剖面中,對於板厚中心部之厚度方向9.0μm×剖面方向12.5μm的區域,以掃描型電子顯微鏡,並以觀察倍率10000倍進行觀察,使用上述影像解析軟體來測定觀察視野內之化合物之相當圓直徑。將測定結果顯示於下述表2。 The number density of a compound having a substantially circular diameter of 100 to 200 nm is in a transverse cross section of the cold rolled sheet in the width direction, and a scanning electron microscope is applied to a region having a thickness of 9.0 μm in the central portion of the thickness and 12.5 μm in the cross section. The observation magnification was observed at 10,000 times, and the above-mentioned image analysis software was used to measure the considerable circle diameter of the compound in the observation field. The measurement results are shown in Table 2 below.

拉伸強度係使用從上述冷壓延板切出之JIS 13號B試驗片,並以5882型Instron公司製萬能試驗機進行測定。拉伸強度係在室溫,並將試驗速度設為10.0mm/分,將標線間距離GL設為50mm來進行測定。將測定結果顯示於下述表2。於本實施例中係將拉伸強度為530MPa以上視為合格。 The tensile strength was measured using a JIS No. 13 B test piece cut out from the above-mentioned cold rolled sheet, and a universal tester manufactured by Model 5882 Instron. The tensile strength was measured at room temperature, and the test speed was set to 10.0 mm/min, and the distance GL between the lines was set to 50 mm. The measurement results are shown in Table 2 below. In the present embodiment, the tensile strength of 530 MPa or more was regarded as acceptable.

導電率係使用將上述冷壓延板藉由研磨加工成寬10mm×長度300mm之長條狀的試驗片,並藉由雙電橋式電阻測定裝置測定電阻,藉由平均剖面積法來算出。將算出結果顯示於下述表2。於本發明中係將60% IACS以上視為合格,而評估為導電性良好。 In the electrical conductivity, a test piece having a length of 10 mm and a length of 300 mm was polished by the above-described cold rolled sheet, and the electric resistance was measured by a double bridge type resistance measuring device, and was calculated by an average sectional area method. The calculation results are shown in Table 2 below. In the present invention, 60% IACS or more was regarded as acceptable, and it was evaluated that the conductivity was good.

硬度係使用松澤精機製作所製之Micro Vickers硬度計(商品名「微小硬度計」),施加0.5kg之荷重在3個部位進行測定,而求出平均值。將算出結果顯示於下述表2。於本實施例中係將硬度為155Hv視為合格。 For the hardness, a Micro Vickers hardness tester (trade name "micro hardness tester") manufactured by Matsuzaka Seiki Co., Ltd. was used, and a load of 0.5 kg was applied to measure at three places, and an average value was obtained. The calculation results are shown in Table 2 below. In the present embodiment, a hardness of 155 Hv was regarded as acceptable.

將拉伸強度為530MPa以上,且硬度為155Hv以上的情況評估為高強度,並設為發明例。另一方面,將拉伸強度或硬度之至少一方沒達到合格基準的情況設為比較例。 When the tensile strength was 530 MPa or more and the hardness was 155 Hv or more, it was evaluated as high strength, and it was set as the invention example. On the other hand, a case where at least one of the tensile strength and the hardness did not reach the pass criteria was used as a comparative example.

耐熱性係在將上述冷壓延板模擬退火而以475℃加熱保持1分鐘之後,使用松澤精機製作所製之Micro Vickers硬度計(商品名「微小硬度計」),施加0.5kg之荷重來測定硬度。將測定結果顯示於下述表2。於本發 明中係將140Hv以上視為合格,而評估為具優異耐熱性。 The heat resistance was obtained by simulated annealing of the cold rolled sheet and heating at 475 ° C for 1 minute, and then using a Micro Vickers hardness meter (trade name "micro hardness meter") manufactured by Matsuzaka Seiki Co., Ltd., and applying a load of 0.5 kg to measure the hardness. The measurement results are shown in Table 2 below. Yu Benfa In the Ming Dynasty, 140 Hv or more was regarded as qualified, and it was evaluated as having excellent heat resistance.

由下述表2可如下述般地進行考察。 The following Table 2 can be examined as follows.

No.1~8係滿足本發明所規定之要件的例子,由於成分組成被適當地控制,並且相當圓直徑超過1μm之化合物及相當圓直徑100~200nm之化合物的個數密度滿足特定的條件,因此可得到高強度,並且導電性為良好,耐熱性亦優異之銅合金。 No. 1 to 8 are examples in which the requirements specified in the present invention are satisfied, and since the composition of the component is appropriately controlled, and the number of compounds having a substantially circular diameter of more than 1 μm and the number of compounds having a substantially circular diameter of 100 to 200 nm satisfy a specific condition, Therefore, a copper alloy having high strength and excellent electrical conductivity and excellent heat resistance can be obtained.

No.11~18係不滿足本發明所規定之任一要件的例子。 No. 11 to 18 are examples in which any of the requirements specified in the present invention are not satisfied.

詳細而言,No.11係Fe量為過剩,且相當圓直徑超過1μm之化合物的個數密度過高的例子。其結果,導電率會降低。 Specifically, No. 11 is an example in which the amount of Fe is excessive and the number density of compounds having a diameter of more than 1 μm is too high. As a result, the electrical conductivity is lowered.

No.12係Fe量過少的例子,拉伸強度及硬度低,且耐熱性亦無法改善。 No. 12 is an example in which the amount of Fe is too small, the tensile strength and hardness are low, and the heat resistance cannot be improved.

No.13係P量為過剩的例子,相當圓直徑超過1μm之化合物的個數密度過高。其結果,拉伸強度、硬度、導電率低,耐熱性亦無法改善。 No. 13 is an example in which the amount of P is excessive, and the number density of a compound having a diameter of more than 1 μm is too high. As a result, tensile strength, hardness, and electrical conductivity are low, and heat resistance cannot be improved.

No.14係Sn量過剩的例子,導電率降低。 No. 14 is an example in which the amount of Sn is excessive, and the electrical conductivity is lowered.

No.15係以比本發明所推薦之溫度區域更高的980℃進行均熱處理。其結果,相當圓直徑超過1μm之化合物的個數密度過高,無法改善耐熱性。 No. 15 was subjected to soaking treatment at a temperature higher than the temperature range recommended by the present invention at 980 °C. As a result, the number density of the compound having a substantially circular diameter of more than 1 μm is too high, and heat resistance cannot be improved.

No.16係以比本發明所推薦之溫度區域更高的1050℃進行均熱處理,且以比本發明所推薦之溫度區域更低的600℃結束熱壓延。其結果,相當圓直徑100~ 200nm的個數密度過高,拉伸強度及硬度變低。 No. 16 was subjected to a soaking treatment at a temperature of 1050 ° C higher than the temperature range recommended by the present invention, and the hot rolling was terminated at a lower temperature of 600 ° C than the temperature range recommended by the present invention. The result is quite round diameter 100~ The number density of 200 nm is too high, and the tensile strength and hardness are lowered.

No.17係以比本發明所推薦之溫度區域更低的670℃結束熱壓延。其結果,相當圓直徑100~200nm的個數密度過高,拉伸強度及硬度變低。 No. 17 ends the hot rolling at 670 ° C lower than the temperature range recommended by the present invention. As a result, the number density of a relatively large circular diameter of 100 to 200 nm is too high, and the tensile strength and hardness are lowered.

No.18係以比本發明所推薦之溫度區域更低的750℃進行均熱處理,且以比本發明所推薦之溫度區域更低的650℃結束熱壓延。其結果,相當圓直徑100~200nm的個數密度過高,拉伸強度及硬度變低,耐熱性亦無法改善。 No. 18 was subjected to soaking treatment at a temperature lower than the temperature range recommended by the present invention at 750 ° C, and the hot rolling was terminated at a lower temperature of 650 ° C than the temperature range recommended by the present invention. As a result, the number density of a relatively large circular diameter of 100 to 200 nm is too high, the tensile strength and hardness are lowered, and heat resistance cannot be improved.

Claims (2)

一種具優異耐熱性之銅合金,其係以質量%計含有Fe:1.8~2.7%、P:0.01~0.20%、Zn:0.01~0.30%、Sn:0.01~0.2%,且剩餘部分由銅及不可避免之雜質所構成的銅合金,其特徵為,相當圓直徑超過1μm之化合物係於觀察視野面積每1mm2中為0個以上、5.0×103個以下,相當圓直徑100~200nm之化合物係於觀察視野面積每1mm2中為1.0×105~1.0×107個。 A copper alloy having excellent heat resistance, which contains Fe: 1.8 to 2.7%, P: 0.01 to 0.20%, Zn: 0.01 to 0.30%, Sn: 0.01 to 0.2% by mass%, and the balance is copper and A copper alloy composed of an unavoidable impurity is characterized in that a compound having a diameter of more than 1 μm is a compound having 0 or more and 5.0 × 10 3 or less per 1 mm 2 of the observed field of view, and a compound having a diameter of 100 to 200 nm. The area of the observation field of view is 1.0 × 10 5 to 1.0 × 10 7 per 1 mm 2 . 如請求項1之銅合金,其係進一步以質量%計,由Si、Ni、及Co所成之群中選出的一種或二種以上:合計含有0.01~0.1%。 The copper alloy of claim 1, which is further selected from the group consisting of Si, Ni, and Co in mass%, and contains 0.01 to 0.1% in total.
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