TW201626865A - Shield film, shield printed wiring board, and methods for manufacturing shield film and shield printed wiring board - Google Patents

Shield film, shield printed wiring board, and methods for manufacturing shield film and shield printed wiring board Download PDF

Info

Publication number
TW201626865A
TW201626865A TW104132441A TW104132441A TW201626865A TW 201626865 A TW201626865 A TW 201626865A TW 104132441 A TW104132441 A TW 104132441A TW 104132441 A TW104132441 A TW 104132441A TW 201626865 A TW201626865 A TW 201626865A
Authority
TW
Taiwan
Prior art keywords
layer
group
opening
printed circuit
circuit board
Prior art date
Application number
TW104132441A
Other languages
Chinese (zh)
Inventor
Jun Shirakami
Akira Murakawa
Wataru Fujikawa
Original Assignee
Dainippon Ink & Chemicals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink & Chemicals filed Critical Dainippon Ink & Chemicals
Publication of TW201626865A publication Critical patent/TW201626865A/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Structure Of Printed Boards (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention provides: a shield film for a printed wiring board in which signal wiring, ground wiring, and a first insulation protection layer are provided on a base insulation substrate, wherein the shield film has an electroconductive adhesive layer laminated on the entire surface of the first insulation protection layer, a copper-plating layer patterned on the electroconductive adhesive layer at a film thickness of 0.5-20 [mu]m and an opening ratio of 40-95%, a layer (A-1) formed on the copper-plating layer using electroconductive ink, a layer (A-2) formed on the inside of the openings in the copper plating layer on the electroconductive adhesive layer by using electroconductive ink, and a second insulation protection layer on the electroconductive adhesive layer, the copper-plating layer, the layer (A-1), and the layer (A-2); and a shield printed wiring board in which the shield film is used. The shield film has high electromagnetic shield performance and a thin profile. In the shield printed wiring board, exceptional reliability of connection with the ground wiring of the printed wiring board is achieved, and a high degree of freedom of design is provided in relation to impedance control.

Description

屏蔽膜、屏蔽印刷電路板及其等之製造方法 Shielding film, shielded printed circuit board, and the like

本發明係關於一種用於印刷電路板之屏蔽膜、使用該屏蔽膜之屏蔽印刷電路板及其等之製造方法。 The present invention relates to a shielding film for a printed circuit board, a shielded printed circuit board using the same, and the like.

[近年來,關於電子機器,業界對USB3.0、IEEE1394、HDMI(註冊商標)等所需之高速傳送規格之制定日新月異,多採用高速串列通信。又,於多數機器中,機器內之傳送方式亦採用作為主動傳送之一的LVDS(Low Voltage Differential Signal,低壓差分信號)傳送,機器間接口之阻抗匹配變得重要。最近,業界要求信號傳送更高速化,若機器間之接口處阻抗失配,則有於傳送路端發生反射,因信號波與反射波之重疊而產生波形失真,信號傳送損失變大之問題。尤其若所使用之頻率變高,則因阻抗失配所產生之反射波之影響變大,因此對於在高頻率下使用之印刷電路板,必須控制阻抗而與所連接之其他基板或零件於阻抗匹配之狀態下使用。 [In recent years, regarding the electronic equipment, the high-speed transmission specifications required for USB 3.0, IEEE 1394, and HDMI (registered trademark) are rapidly changing, and high-speed serial communication is often used. Moreover, in most machines, the transmission mode in the machine is also transmitted as one of the active transmissions (LVDS (Low Voltage Differential Signal)), and impedance matching between the interfaces of the machine becomes important. Recently, the industry has demanded higher signal transmission. If the impedance at the interface between the devices is mismatched, there is a problem that reflection occurs at the transmission path, and waveform distortion occurs due to the overlap of the signal wave and the reflected wave, and the signal transmission loss becomes large. In particular, if the frequency used is high, the influence of the reflected wave due to the impedance mismatch becomes large. Therefore, for a printed circuit board used at a high frequency, it is necessary to control the impedance and the other substrate or component to be connected to the impedance. Used in the state of matching.

[又,隨著電子機器之小型化,對印刷電路板之薄型化要求變高。若印刷電路板薄型化,則信號線與接地層之距離變近,信號線之容量成分增加,為了保持同一阻抗,必須使信號線之線寬(圖案寬度)變細而減少容量成分。然而,若信號線之圖案寬度變細,則有電阻損失增大、直流電阻增大等問題,因此要求於保持一定圖案寬度之狀態下控制阻抗。 [Also, with the miniaturization of electronic equipment, the demand for thinning of printed circuit boards has become high. When the printed circuit board is made thinner, the distance between the signal line and the ground layer becomes closer, and the capacity component of the signal line increases. In order to maintain the same impedance, the line width (pattern width) of the signal line must be made thinner to reduce the capacitance component. However, if the pattern width of the signal line is thinned, there is a problem that the resistance loss increases and the DC resistance increases. Therefore, it is required to control the impedance while maintaining a constant pattern width.

另一方面,隨著電子機器之高性能化,機器內部之雜訊對策亦 變得重要。為了減輕由印刷電路板之信號傳達路徑及自身所產生之雜訊對其他零件之影響,並免受由其他零件所產生之雜訊之影響,對屏蔽化展開研究。作為該屏蔽化之方法,例如提出有如下構造之屏蔽印刷電路板,其係於絕緣基板上具有信號電路與接地電路之印刷電路板中,於信號電路之覆蓋層上設置導電性較高且電磁波屏蔽效果較高之金屬薄膜層作為屏蔽材,印刷電路板之接地電路與金屬薄膜層經由導電性接著劑而導通(例如參照專利文獻1)。 On the other hand, with the high performance of electronic devices, the noise countermeasures inside the machine are also Become important. In order to reduce the influence of the signal transmission path of the printed circuit board and the noise generated by itself on other parts, and from the noise generated by other parts, the shielding is studied. As a method of shielding, for example, a shield printed circuit board having a structure in which a conductive circuit having a high conductivity and electromagnetic waves is provided on a cover layer of a signal circuit is provided in a printed circuit board having a signal circuit and a ground circuit on an insulating substrate. The metal thin film layer having a high shielding effect is used as a shielding material, and the grounding circuit of the printed circuit board and the metal thin film layer are electrically connected via a conductive adhesive (see, for example, Patent Document 1).

然而,上述屏蔽印刷電路板儘管能夠解決機器內部之雜訊對策之課題,但關於控制印刷電路板之阻抗而使之與所連接之其他機器之阻抗相匹配的方法,僅藉由使信號電路之圖案寬度變細無法解決問題,存在信號電路之圖案之自由度受限之問題。 However, although the above-mentioned shielded printed circuit board can solve the problem of noise countermeasures inside the machine, the method of controlling the impedance of the printed circuit board to match the impedance of other connected devices is only by making the signal circuit Thinning of the pattern width does not solve the problem, and there is a problem that the degree of freedom of the pattern of the signal circuit is limited.

又,作為具有信號電路之電路板所使用之電磁波屏蔽片材,提出有如下電磁波屏蔽片材,其具有接合層與導電層,該接合層含有玻璃轉移溫度為0~150℃之熱硬化性樹脂組合物,於溫度150℃且壓力1kg/cm2之條件下可流動且具備絕緣性,該導電層係設置於上述接合層之一面且具備複數個開口部(例如參照專利文獻2)。該電磁波屏蔽片材中,於上述導電層設置開口部,通過印刷電路板上所設置之貫通孔而與印刷電路板之接地電路直接連接,藉此調整印刷電路板之阻抗。 Moreover, as an electromagnetic wave shielding sheet used for a circuit board having a signal circuit, there has been proposed an electromagnetic wave shielding sheet having a bonding layer and a conductive layer containing a thermosetting resin having a glass transition temperature of 0 to 150 ° C. The composition is flowable and insulating under the conditions of a temperature of 150 ° C and a pressure of 1 kg/cm 2 , and the conductive layer is provided on one surface of the bonding layer and has a plurality of openings (see, for example, Patent Document 2). In the electromagnetic wave shielding sheet, an opening is provided in the conductive layer, and is directly connected to a ground circuit of the printed circuit board through a through hole provided in the printed circuit board, thereby adjusting the impedance of the printed circuit board.

然而,關於使用上述電磁波屏蔽片材之印刷電路板,儘管藉由適當設定電磁波屏蔽片材之開口部之形狀及開口率可調整阻抗,但於開口率之設定高至40%以上之情形時,存在電磁波屏蔽性能大幅降低之問題。 However, in the printed circuit board using the above-described electromagnetic wave shielding sheet, although the impedance can be adjusted by appropriately setting the shape and the aperture ratio of the opening portion of the electromagnetic wave shielding sheet, when the aperture ratio is set to be higher than 40%, There is a problem that the electromagnetic wave shielding performance is greatly reduced.

進而,使用上述電磁波屏蔽片材之印刷電路板中,由於電磁波屏蔽片材之導電層與印刷電路板之接地電路係直接連接,故而使得導電層之硬度及圖案之線寬、印刷電路板上所設置之貫通孔之大小等受到限制,進而存在連接可靠性不充分之問題。例如,於將電磁波屏蔽 片材之導電層之圖案之線寬設為粗於印刷電路板之接地電路之情形時,導電層與接地電路變得難以連接,即便可直接連接,亦由於熱硬化性樹脂層之接著面積非常小而存在連接可靠性不充分之問題。又,於印刷電路板之接地電路上所設置之貫通孔較小之情形時,連接可靠性亦同樣地不充分。進而,若印刷電路板之絕緣保護層較厚,則接地電路上所設置之貫通孔之高度亦變高,於電磁波屏蔽片材之導電層缺乏柔軟性之情形時,亦存在因貫通孔之段差而導致導電層斷線之問題。 Further, in the printed circuit board using the electromagnetic wave shielding sheet, since the conductive layer of the electromagnetic wave shielding sheet is directly connected to the ground circuit of the printed circuit board, the hardness of the conductive layer and the line width of the pattern are made on the printed circuit board. The size of the through holes to be provided is limited, and the connection reliability is insufficient. For example, shielding electromagnetic waves When the line width of the pattern of the conductive layer of the sheet is set to be thicker than the ground circuit of the printed circuit board, the conductive layer and the ground circuit become difficult to connect, even if it is directly connectable, since the bonding area of the thermosetting resin layer is very large. Small and there is a problem that the connection reliability is insufficient. Further, in the case where the through hole provided in the ground circuit of the printed circuit board is small, the connection reliability is also insufficient. Further, if the insulating protective layer of the printed circuit board is thick, the height of the through hole provided on the grounding circuit is also high, and when the conductive layer of the electromagnetic wave shielding sheet lacks flexibility, there is also a difference in the through hole. And the problem that the conductive layer is broken.

另一方面,作為阻抗控制屏蔽膜,提出有包含具有開口金屬層之阻抗控制膜、且於與開口金屬層相反之面具有屏蔽層的阻抗控制屏蔽膜(例如參照專利文獻3)。該阻抗控制屏蔽膜中,利用開口金屬層而調整印刷電路板之阻抗,利用作為非開口金屬層之屏蔽層而屏蔽無法由開口金屬層屏蔽之無用輻射,因而可同時實現阻抗調整與電磁波屏蔽。 On the other hand, as the impedance control shielding film, an impedance control film including an impedance control film having an open metal layer and having a shielding layer on the surface opposite to the opening metal layer has been proposed (for example, see Patent Document 3). In the impedance control shielding film, the impedance of the printed circuit board is adjusted by the opening metal layer, and the unnecessary radiation which cannot be shielded by the opening metal layer is shielded by the shielding layer which is a non-opening metal layer, so that impedance adjustment and electromagnetic wave shielding can be simultaneously achieved.

然而,關於使用上述阻抗控制屏蔽膜之印刷電路板,由於必須為開口金屬層與非開口金屬層(屏蔽層)之雙層而屏蔽膜整體變厚,故而存在難以應對伴隨電子機器小型化之印刷電路板薄型化要求之問題。 However, in the printed circuit board using the above-described impedance control shielding film, since the shielding film must be thickened as a whole in the double layer of the open metal layer and the non-opening metal layer (shield layer), it is difficult to cope with the miniaturization of the electronic device. The problem of thin board requirements.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平7-122882號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 7-122882

[專利文獻2]日本專利特開2013-168643號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2013-168643

[專利文獻3]日本專利特開2006-24824號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2006-24824

本發明所欲解決之問題在於提供一種可用於印刷電路板、即便 未使信號電路之圖案寬度變細而亦可控制印刷電路板之阻抗、且具有作為雜訊對策之較高電磁波屏蔽性、進而可使印刷電路板薄型化的薄型屏蔽膜。又,提供一種上述屏蔽膜與印刷電路板之接地電路之連接可靠性優異、阻抗控制之設計之自由度較高的屏蔽印刷電路板。進而,提供一種上述屏蔽膜及屏蔽印刷電路板之製造方法。 The problem to be solved by the present invention is to provide a printed circuit board that can be used even if A thin shielding film which can control the impedance of the printed circuit board without changing the pattern width of the signal circuit, has high electromagnetic wave shielding properties as a countermeasure against noise, and can further reduce the thickness of the printed circuit board. Further, a shield printed circuit board having excellent connection reliability between the above-mentioned shielding film and a ground circuit of a printed circuit board and a high degree of freedom in design of impedance control is provided. Further, a method of manufacturing the above-described shielding film and shield printed circuit board is provided.

本發明者等人為了解決上述課題,經過努力研究,結果發現:藉由對配設有信號電路、接地電路及絕緣保護層之印刷電路板設置由導電性接著劑層、經圖案化之鍍銅層、經圖案化之導電性油墨層、絕緣保護層所構成之屏蔽膜,可獲得即便未使信號電路之圖案寬度變細而亦可控制印刷電路板之阻抗、且具有作為雜訊對策之較高電磁波屏蔽性、進而可使印刷電路板薄型化的薄型屏蔽膜,可獲得上述屏蔽膜與印刷電路板之接地電路之連接可靠性優異、阻抗控制之設計之自由度較高的屏蔽印刷電路板,從而完成本發明。 In order to solve the above problems, the inventors of the present invention have diligently studied and found that a conductive adhesive layer and a patterned copper plating are provided on a printed circuit board provided with a signal circuit, a ground circuit, and an insulating protective layer. The shielding film composed of the layer, the patterned conductive ink layer, and the insulating protective layer can control the impedance of the printed circuit board without making the pattern width of the signal circuit thin, and has a countermeasure as a noise countermeasure. A thin shielding film which is highly shielded from electromagnetic waves and which can reduce the thickness of a printed circuit board, and can obtain a shield printed circuit board having excellent connection reliability between the shielding film and the ground circuit of the printed circuit board, and having a high degree of freedom in design of impedance control. Thus, the present invention has been completed.

即,本發明係關於一種屏蔽膜及具有該屏蔽膜之屏蔽印刷電路板,該屏蔽膜之特徵在於:其係於基底絕緣基材上設置有信號電路、接地電路及第一絕緣保護層之印刷電路板用之屏蔽膜,具有積層於上述第一絕緣保護層整個面上之導電性接著劑層、上述導電性接著劑層上之以膜厚0.5~20μm、開口率40~95%進行圖案化之鍍銅層、於上述鍍銅層上使用導電性油墨所形成之層(A-1)、於上述導電性接著劑層上之上述鍍銅層之開口內部使用導電性油墨所形成之層(A-2)、以及上述導電性接著劑層、上述鍍銅層、上述層(A-1)及上述層(A-2)上之第二絕緣保護層。又,關於一種上述屏蔽膜及屏蔽印刷電路板之製造方法。 That is, the present invention relates to a shielding film and a shield printed circuit board having the same, the shielding film characterized in that it is provided with a signal circuit, a ground circuit, and a first insulating protective layer printed on the base insulating substrate. The shielding film for a circuit board has a conductive adhesive layer laminated on the entire surface of the first insulating protective layer, and the conductive adhesive layer is patterned by a film thickness of 0.5 to 20 μm and an aperture ratio of 40 to 95%. a copper plating layer, a layer (A-1) formed of a conductive ink on the copper plating layer, and a layer formed of a conductive ink inside the opening of the copper plating layer on the conductive adhesive layer ( A-2), and the conductive adhesive layer, the copper plating layer, the layer (A-1), and the second insulating protective layer on the layer (A-2). Further, a method of manufacturing the above-described shielding film and shield printed circuit board.

本發明之屏蔽膜及屏蔽印刷電路板針對於高頻率下使用之印刷電路板所要求之阻抗控制,不僅利用信號電路之圖案寬度進行控制,且亦將屏蔽膜側之鍍銅層圖案之開口率作為阻抗控制之一因素,藉此可於維持信號電路之線寬之自由度的同時實現阻抗匹配。因此,可較佳地用作例如於行動電話、筆記型電腦、智慧型手機、平板終端、可佩帶裝置、數位靜態相機、數位攝錄影機等電子機器之內部所使用之屏蔽印刷電路板。 The shielding film and the shield printed circuit board of the present invention are required for the impedance control of the printed circuit board used at a high frequency, not only by the pattern width of the signal circuit, but also by the aperture ratio of the copper plating layer pattern on the shielding film side. As a factor of impedance control, impedance matching can be achieved while maintaining the degree of freedom of the line width of the signal circuit. Therefore, it can be preferably used as a shielded printed circuit board used inside an electronic device such as a mobile phone, a notebook computer, a smart phone, a tablet terminal, a wearable device, a digital still camera, a digital video camera, or the like.

進而,本發明之屏蔽膜由於能夠製成薄型,故而亦可應對近年來不斷推進之智慧型手機、平板終端之薄型化。 Further, since the shielding film of the present invention can be made thin, it is possible to cope with the thinning of smart phones and tablet terminals that have been advanced in recent years.

1‧‧‧屏蔽膜 1‧‧‧Shielding film

2‧‧‧第二絕緣保護層 2‧‧‧Second insulation protection layer

2'‧‧‧高分子層 2'‧‧‧ polymer layer

3‧‧‧使用導電性油墨所形成之層 3‧‧‧Layer formed using conductive ink

3'‧‧‧形成於使用導電性油墨所形成之層上之鍍銅層 3'‧‧‧ A copper plating layer formed on a layer formed using a conductive ink

4‧‧‧具有開口部之鍍銅層 4‧‧‧Copper plating with openings

5‧‧‧導電性接著劑層 5‧‧‧ Conductive adhesive layer

6‧‧‧第一絕緣保護層 6‧‧‧First insulation protection layer

7‧‧‧印刷電路板基材 7‧‧‧Printed circuit board substrate

8‧‧‧信號電路 8‧‧‧Signal circuit

9‧‧‧接地電路 9‧‧‧ Grounding circuit

10‧‧‧第一絕緣保護層去除部(接地電路與具有開口部之鍍銅層之導通部) 10‧‧‧First insulation protective layer removal part (grounding circuit and conduction part of copper plating layer having an opening)

11‧‧‧印刷電路板 11‧‧‧Printed circuit board

12‧‧‧屏蔽印刷電路板 12‧‧‧Shielded printed circuit board

圖1係本發明之屏蔽印刷電路板之剖視圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing a shielded printed circuit board of the present invention.

圖2係本發明之屏蔽印刷電路板之剖視圖,即,於第二絕緣保護層與使用導電性油墨所形成之層之間設置有高分子層者。 2 is a cross-sectional view showing a shield printed circuit board of the present invention, in which a polymer layer is provided between a second insulating protective layer and a layer formed using a conductive ink.

圖3係本發明之屏蔽印刷電路板之剖視圖,即,於第二絕緣保護層與使用導電性油墨所形成之層之間設置有高分子層、且於使用導電性油墨所形成之層的與接觸高分子層之面相反之面設置有無電解鍍銅層者。 3 is a cross-sectional view showing a shield printed circuit board of the present invention, in which a polymer layer is provided between a second insulating protective layer and a layer formed using a conductive ink, and a layer formed using a conductive ink is used. The surface opposite to the surface of the polymer layer is provided with an electroless copper plating layer.

圖4係自本發明之屏蔽印刷電路板之導電性接著劑層側觀察所得之鍍銅層之圖案與導電性油墨層或無電解鍍銅層之圖案之俯視圖。 Fig. 4 is a plan view showing a pattern of a copper plating layer and a pattern of a conductive ink layer or an electroless copper plating layer observed from the side of the conductive adhesive layer of the shield printed circuit board of the present invention.

圖5係自本發明之屏蔽印刷電路板之導電性接著劑層側觀察所得之鍍銅層之圖案與導電性油墨層或無電解鍍銅層之圖案之立體圖。 Fig. 5 is a perspective view showing a pattern of a copper plating layer and a pattern of a conductive ink layer or an electroless copper plating layer as viewed from the side of the conductive adhesive layer of the shield printed circuit board of the present invention.

圖6係於實施例1中製作本發明之屏蔽印刷電路板時使用導電性油墨所印刷之圖案之俯視圖。 Fig. 6 is a plan view showing a pattern printed using a conductive ink when the shield printed circuit board of the present invention is produced in the first embodiment.

本發明之屏蔽膜係於基底絕緣基材上設置有信號電路、接地電 路及第一絕緣保護層之印刷電路板用之屏蔽膜,具有積層於上述第一絕緣保護層整個面上之導電性接著劑層、上述導電性接著劑層上之以膜厚0.5~20μm、開口率40~95%進行圖案化之鍍銅層、於上述鍍銅層上使用導電性油墨所形成之層(A-1)、於上述導電性接著劑層上之上述鍍銅層之開口內部使用導電性油墨所形成之層(A-2)、以及上述導電性接著劑層、上述鍍銅層、上述層(A-1)及上述層(A-2)上之第二絕緣保護層。 The shielding film of the invention is provided with a signal circuit and a grounding electricity on the base insulating substrate. The shielding film for the printed circuit board of the first insulating protective layer and the conductive adhesive layer laminated on the entire surface of the first insulating protective layer and the conductive adhesive layer have a film thickness of 0.5 to 20 μm. a copper plating layer having a patterning ratio of 40 to 95%, a layer (A-1) formed of a conductive ink on the copper plating layer, and an opening inside the copper plating layer on the conductive adhesive layer The layer (A-2) formed of the conductive ink, and the conductive adhesive layer, the copper plating layer, the layer (A-1), and the second insulating protective layer on the layer (A-2) are used.

上述基底絕緣基材係成為印刷電路板之基材者。作為上述基底絕緣基材之材質,例如可列舉:聚醯亞胺、聚醯胺醯亞胺、聚醯胺、聚對苯二甲酸乙二酯等聚酯樹脂、聚萘二甲酸乙二酯、聚碳酸酯、ABS(丙烯腈-丁二烯-苯乙烯)樹脂、聚甲基丙烯酸甲酯等丙烯酸系樹脂、酚系樹脂、聚偏二氟乙烯等氟樹脂、聚氯乙烯、聚偏二氯乙烯、聚乙烯醇、聚乙烯、聚丙烯、聚胺基甲酸酯、LCP(液晶聚合物)、PEEK(聚醚醚酮)樹脂、PEI(聚醚醯亞胺)樹脂、PPS(聚苯硫醚)樹脂、PSF(聚碸)樹脂、PES(聚醚碸)樹脂、聚芳酯樹脂、PBT(聚對苯二甲酸丁二酯)樹脂、聚矽氧樹脂、不飽和聚酯樹脂、聚縮醛、尼龍、陶瓷、氧化鋁、高鋁紅柱石、塊滑石、矽酸鎂石、氧化鋯、玻璃、玻璃環氧樹脂、玻璃聚醯亞胺、酚醛紙、纖維素奈米纖維等。 The base insulating substrate is a substrate of a printed circuit board. Examples of the material of the base insulating base material include a polyester resin such as polyimine, polyamidimide, polyamine or polyethylene terephthalate, and polyethylene naphthalate. Acrylic resin such as polycarbonate, ABS (acrylonitrile-butadiene-styrene) resin or polymethyl methacrylate, fluororesin such as phenol resin or polyvinylidene fluoride, polyvinyl chloride or polyvinylidene chloride Ethylene, polyvinyl alcohol, polyethylene, polypropylene, polyurethane, LCP (liquid crystal polymer), PEEK (polyether ether ketone) resin, PEI (polyether sulfimine) resin, PPS (polyphenyl sulphide) Ether) resin, PSF (polyfluorene) resin, PES (polyether oxime) resin, polyarylate resin, PBT (polybutylene terephthalate) resin, polyoxyn epoxide resin, unsaturated polyester resin, polycondensation Aldehyde, nylon, ceramic, alumina, mullite, talc, magnesium silicate, zirconia, glass, glass epoxy, glass polyimide, phenolic paper, cellulose nanofiber, and the like.

又,作為上述基底絕緣基材,亦可使用例如包含聚酯纖維、聚醯胺纖維、芳族聚醯胺纖維等合成纖維,棉、麻等天然纖維等之基材。亦可預先對上述纖維實施加工。 Further, as the base insulating base material, for example, a synthetic fiber including a polyester fiber, a polyamide fiber, an aromatic polyamide fiber, or a natural fiber such as cotton or hemp may be used. The above fibers may also be processed in advance.

作為上述基底絕緣基材,於下述本發明之屏蔽印刷電路板用於要求可彎折之柔軟性之用途之情形時,較佳為使用柔軟之撓性支持體。具體而言,較佳為使用膜或片狀支持體。 As the above-mentioned base insulating base material, in the case where the shield printed wiring board of the present invention described below is used for applications requiring flexibility to bend, it is preferable to use a flexible flexible support. Specifically, it is preferred to use a film or a sheet-like support.

作為膜或片狀基底絕緣基材,例如可列舉:聚對苯二甲酸乙二酯膜、聚醯亞胺膜、聚萘二甲酸乙二酯膜、液晶聚合物(LCP)膜等。 Examples of the film or sheet-shaped base insulating substrate include a polyethylene terephthalate film, a polyimide film, a polyethylene naphthalate film, and a liquid crystal polymer (LCP) film.

又,為了提高與下述信號電路或接地電路之密接性,上述基底絕緣基材視需要可使用對其表面藉由利用噴砂法、溶劑處理法等之表面凹凸化處理、電性處理(電暈放電處理、大氣壓電漿處理)、鉻酸處理、火焰處理、熱風處理、臭氧-紫外線-電子束照射處理、氧化處理等進行過處理者。 Moreover, in order to improve the adhesion to the signal circuit or the ground circuit described below, the base insulating substrate may be subjected to surface unevenness treatment or electrical treatment (corona) by a sandblasting method, a solvent treatment method or the like as needed. Treatment by discharge treatment, atmospheric piezoelectric slurry treatment, chromic acid treatment, flame treatment, hot air treatment, ozone-ultraviolet-electron beam irradiation treatment, oxidation treatment, etc.

於上述基底絕緣基材之形狀為膜狀或片狀之情形時,膜狀或片狀支持體之厚度通常較佳為1~5,000μm左右,更佳為1~300μm左右之厚度。又,於將本發明之導電性圖案用於撓性印刷基板等要求彎曲性者之情形時,作為上述基底絕緣基材,較佳為使用1~200μm左右之厚度之膜狀者。 In the case where the shape of the base insulating substrate is a film or a sheet, the thickness of the film-like or sheet-like support is usually preferably from about 1 to 5,000 μm, more preferably from about 1 to about 300 μm. In the case where the conductive pattern of the present invention is used for a flexible printed circuit board or the like, it is preferable to use a film having a thickness of about 1 to 200 μm as the insulating base material.

作為上述基底絕緣基材,為了形成下述信號電路或接地電路,可使用市售之覆銅基材。於使用覆銅基材之情形時,可於覆銅基材上設置抗蝕材,利用光罩對圖案進行曝光後,藉由蝕刻處理將電路部以外之銅去除而形成電路圖案。 As the base insulating base material, a commercially available copper clad base material can be used in order to form a signal circuit or a ground circuit described below. When a copper-clad substrate is used, a resist material may be provided on the copper-clad substrate, and after the pattern is exposed by the photomask, the copper other than the circuit portion is removed by etching to form a circuit pattern.

又,信號電路或接地電路可使用上述以銅作為主成分之電路,除此以外亦可由其他導電性物質構成,例如,亦可使用印刷以銀作為主體之導電性油墨所形成之電路圖案。又,亦可於該導電性油墨之圖案上以鍍銅或鍍鎳等方式進行厚膜化而製成電路。 Further, as the signal circuit or the ground circuit, the above-described circuit mainly composed of copper may be used, and other conductive materials may be used. For example, a circuit pattern formed by printing a conductive ink mainly composed of silver may be used. Further, it is also possible to form a circuit by thickening a pattern of the conductive ink by copper plating or nickel plating.

本發明之屏蔽印刷電路板係於信號電路與接地電路上設置第一絕緣保護層。作為該第一絕緣保護層,可為於聚醯亞胺膜等之單面塗佈有接著劑者、或感光性覆蓋膜等具有感光性而藉由曝光顯影可形成圖案者,或者亦可塗佈液狀覆蓋層、感光性液狀液狀覆蓋層、阻焊劑等液狀材料而形成絕緣保護層。 The shield printed circuit board of the present invention is provided with a first insulating protective layer on the signal circuit and the ground circuit. The first insulating protective layer may be one in which an adhesive is applied to one surface of a polyimide film or the like, or a photosensitive cover film or the like, and may be formed by exposure and development, or may be coated. A liquid material such as a liquid coating layer, a photosensitive liquid liquid coating layer, or a solder resist is formed to form an insulating protective layer.

其次,本發明之屏蔽膜之特徵在於具有:積層於第一絕緣保護 層整個面上之導電性接著劑層,上述導電性接著劑層上之以膜厚0.5~20μm、開口率40~95%進行圖案化之鍍銅層,於上述鍍銅層上使用導電性油墨所形成之層(A-1),於上述導電性接著劑層上之上述鍍銅層之開口內部使用導電性油墨所形成之層(A-2),及第二絕緣保護層。 Secondly, the shielding film of the present invention is characterized by having: laminating on the first insulation protection a conductive adhesive layer on the entire surface of the layer, a copper plating layer patterned on the conductive adhesive layer with a film thickness of 0.5 to 20 μm and an aperture ratio of 40 to 95%, and a conductive ink is used on the copper plating layer. In the layer (A-1) to be formed, a layer (A-2) formed of a conductive ink and a second insulating protective layer are used inside the opening of the copper plating layer on the conductive adhesive layer.

上述導電性接著劑層包含含有導電性物質之接著性樹脂,作為導電性物質,例如可列舉:銅、銀、鎳、鋁等之金屬粉或金屬晶須、對銅粉實施鍍銀所獲得之覆銀銅粉、對鎳粉實施鍍銀所獲得之覆銀鎳粉、對鎳粉實施鍍金所獲得之覆金鎳粉、碳、對樹脂粒子或玻璃珠粒實施金屬鍍敷所獲得之填料等。該等導電性物質可使用1種,亦可將2種以上併用。 The conductive adhesive layer includes an adhesive resin containing a conductive material, and examples of the conductive material include metal powders such as copper, silver, nickel, and aluminum, and metal whiskers, and silver plating of copper powder. Silver-coated copper powder, silver-coated nickel powder obtained by silver plating nickel powder, gold-coated nickel powder obtained by gold plating nickel powder, carbon, filler obtained by metal plating of resin particles or glass beads, etc. . These conductive materials may be used alone or in combination of two or more.

作為上述接著性樹脂,可列舉:苯乙烯樹脂、乙酸乙烯酯樹脂、聚酯樹脂、聚乙烯或聚丙烯等聚烯烴樹脂、醯胺樹脂、醯胺醯亞胺樹脂、苯乙烯-丁二烯樹脂、丙烯腈-丁二烯樹脂、(甲基)丙烯酸-丁二烯樹脂、(甲基)丙烯酸系樹脂、胺基甲酸酯樹脂等熱塑性樹脂;酚系樹脂、環氧樹脂、三聚氰胺樹脂、醇酸樹脂等熱硬化性樹脂;丙烯酸胺基甲酸酯、環氧丙烯酸酯、丙烯醯基丙烯酸酯等紫外線硬化型樹脂等。該等接著性樹脂可使用1種,亦可將2種以上併用。 Examples of the above-mentioned adhesive resin include a styrene resin, a vinyl acetate resin, a polyester resin, a polyolefin resin such as polyethylene or polypropylene, a guanamine resin, an amidoxime resin, and a styrene-butadiene resin. , thermoplastic resins such as acrylonitrile-butadiene resin, (meth)acrylic acid-butadiene resin, (meth)acrylic resin, urethane resin; phenolic resin, epoxy resin, melamine resin, alcohol A thermosetting resin such as an acid resin; an ultraviolet curable resin such as acrylamide, epoxy acrylate or acryl acrylate. These adhesive resins may be used alone or in combination of two or more.

本發明之屏蔽膜中,於上述導電性接著劑層上具有以膜厚0.5~20μm、開口率40~95%進行圖案化之鍍銅層。作為上述鍍銅層之圖案,其形狀並無特別限制,可根據所要求之屏蔽性、所控制之阻抗等適當選擇。作為上述鍍銅層之具體圖案,較佳為網狀圖案,作為開口部之形狀,可列舉:正三角形、等腰三角形、直角三角形等三角形;正方形、長方形、菱形、平行四邊形、梯形等四角形;(正)五角形、(正)六角形、(正)八角形、(正)十二角形等(正)n角形(n為5以上之整數);圓、楕圓、星形等幾何學圖形。開口部較佳為等間隔配置,其 原因在於如此會使電磁波之屏蔽性優異。又,圖案之開口率較佳為設為40~95%之範圍。開口率乃控制屏蔽印刷電路板之阻抗之重要因素,於開口率未達40%之情形時,不調整屏蔽印刷電路板之信號電路之線寬之情況下之阻抗可控制範圍變小,藉由將開口率設為95%以下,可使屏蔽印刷電路板之信號線之阻抗成為所需值,且可減小電容而防止波形鈍化。再者,本發明中之所謂開口率,係於上述鍍銅層中,將無鍍銅層之部分設為開口部時之開口率。又,位於鍍銅層之開口內部之使用導電性油墨所形成之層(A-2)係稱為開口內部之非開口部,有時亦稱為開口內部圖案。 In the shielding film of the present invention, the conductive adhesive layer has a copper plating layer patterned by a film thickness of 0.5 to 20 μm and an aperture ratio of 40 to 95%. The shape of the copper plating layer is not particularly limited, and may be appropriately selected depending on the required shielding property, the impedance to be controlled, and the like. The specific pattern of the copper plating layer is preferably a mesh pattern, and examples of the shape of the opening include a triangle such as an equilateral triangle, an isosceles triangle, and a right triangle; a square shape such as a square, a rectangle, a diamond, a parallelogram, or a trapezoid; (Positive) pentagon, (positive) hexagonal, (positive) octagonal, (positive) dodecagonal (positive) n-angle (n is an integer of 5 or more); geometric figures such as circles, circles, and stars. The openings are preferably arranged at equal intervals, The reason is that the electromagnetic wave shielding property is excellent. Further, the aperture ratio of the pattern is preferably in the range of 40 to 95%. The aperture ratio is an important factor in controlling the impedance of the shielded printed circuit board. When the aperture ratio is less than 40%, the impedance control range becomes small without adjusting the line width of the signal circuit of the shielded printed circuit board. By setting the aperture ratio to 95% or less, the impedance of the signal line of the shield printed circuit board can be made to a desired value, and the capacitance can be reduced to prevent waveform passivation. Further, the aperture ratio in the present invention is an aperture ratio in the case where the portion having no copper plating layer is the opening portion in the copper plating layer. Further, the layer (A-2) formed by using the conductive ink inside the opening of the copper plating layer is referred to as a non-opening portion inside the opening, and may be referred to as an opening internal pattern.

上述鍍銅層之膜厚為0.5~20μm之範圍。藉由將上述鍍銅層之膜厚設為0.2μm以上,可使屏蔽印刷電路板之信號線之阻抗成為所需值,且可減小電容而防止波形鈍化。若上述鍍銅層之膜厚超過20μm,則難以滿足使屏蔽印刷電路板本身實現薄型化之要求,且於用作撓性印刷電路板之情形時存在彎曲性大幅下降之問題。進而,鍍銅層之膜厚較佳為設為0.5~8μm之範圍。 The film thickness of the copper plating layer is in the range of 0.5 to 20 μm. By setting the film thickness of the copper plating layer to 0.2 μm or more, the impedance of the signal line of the shield printed circuit board can be set to a desired value, and the capacitance can be reduced to prevent waveform passivation. When the film thickness of the copper plating layer exceeds 20 μm, it is difficult to satisfy the requirement that the shield printed wiring board itself is made thinner, and when it is used as a flexible printed circuit board, there is a problem that the flexibility is largely lowered. Further, the film thickness of the copper plating layer is preferably in the range of 0.5 to 8 μm.

作為上述鍍銅層之形成方法,可列舉自銅箔將開口部之圖案藉由蝕刻處理而去除之方法,但該方法存在製造方法複雜、或鍍銅層難以實現薄膜化之問題。因此,本發明中,就容易將上述鍍銅層根據所需開口率進行圖案化、阻抗控制之設計之自由度變高之方面而言,利用下述使用導電性油墨所形成之層(A-1)製作圖案後,於其上形成上述鍍銅層。 The method for forming the copper plating layer is a method in which the pattern of the opening portion is removed by etching treatment from a copper foil. However, this method has a problem that the manufacturing method is complicated or the copper plating layer is difficult to be thinned. Therefore, in the present invention, it is easy to pattern the layer of the copper plating layer according to the required aperture ratio and to increase the degree of freedom in the design of the impedance control, and to use the layer formed using the conductive ink described below (A- 1) After the pattern is formed, the copper plating layer is formed thereon.

如上所述,上述導電性油墨係為了製作圖案而用作鍍銅層之基底,就與其上所形成之鍍銅層之密接性、或鍍銅時之鍍敷析出性優異之方面而言,較佳為含有金屬奈米粒子作為導電性物質(a2)者。進而,就與下述第二絕緣保護層之密接性優異之方面而言,上述金屬奈米粒子較佳為經高分子分散劑分散之金屬奈米粒子。 As described above, the conductive ink is used as a base of a copper plating layer for patterning, and is excellent in adhesion to a copper plating layer formed thereon or plating deposition property at the time of copper plating. It is preferred that the metal nanoparticles are contained as the conductive material (a2). Further, the metal nanoparticle is preferably a metal nanoparticle dispersed by a polymer dispersant in terms of excellent adhesion to the second insulating protective layer described below.

上述高分子分散劑較佳為具有配位於金屬奈米粒子之官能基之高分子。作為上述官能基,例如可列舉:羧基、胺基、氰基、乙醯乙醯氧基、含磷原子之基、硫醇基、硫氰酸基、甘胺酸基等。 The polymer dispersant is preferably a polymer having a functional group coordinated to the metal nanoparticles. Examples of the functional group include a carboxyl group, an amine group, a cyano group, an ethyl ethoxycarbonyl group, a phosphorus atom-containing group, a thiol group, a thiocyanate group, and a glycine group.

作為上述金屬奈米粒子,可列舉過渡金屬或其化合物,上述過渡金屬之中,較佳為離子性之過渡金屬。作為上述離子性之過渡金屬,例如可列舉:銅、銀、金、鎳、鈀、鉑、鈷等金屬或該等金屬之複合體。該等金屬奈米粒子可使用1種,亦可將2種以上併用。又,該等金屬奈米粒子之中,尤其就氧化劣化等操作上之問題點較少或成本方面而言,較佳為銀奈米粒子。 The metal nanoparticles include a transition metal or a compound thereof, and among the transition metals, an ionic transition metal is preferred. Examples of the ionic transition metal include metals such as copper, silver, gold, nickel, palladium, platinum, and cobalt, or a composite of these metals. These metal nanoparticles may be used alone or in combination of two or more. Further, among the metal nanoparticles, in particular, silver nano particles are preferable in terms of operational problems such as oxidative degradation and cost.

又,上述導電性油墨所含之導電性物質(a2)亦可使用鍍敷核劑代替金屬奈米粒子。於該情形時,可使用上述過渡金屬之氧化物、表面經有機物被覆之金屬等。該等鍍敷核劑可使用1種,亦可將2種以上併用。 Further, the conductive material (a2) contained in the conductive ink may be a plating nucleating agent instead of the metal nanoparticles. In this case, an oxide of the above transition metal, a metal whose surface is coated with an organic substance, or the like can be used. These plating agents may be used alone or in combination of two or more.

上述過渡金屬之氧化物通常為惰性(絕緣)狀態,但例如可藉由使用二甲胺基硼烷等還原劑進行處理而使金屬露出從而賦予活性(導電性)。 The oxide of the above transition metal is usually in an inert (insulating) state. However, for example, it can be treated by using a reducing agent such as dimethylamine borane to expose the metal to impart activity (electric conductivity).

又,作為上述表面經有機物被覆之金屬,可列舉藉由乳化聚合法等所形成之樹脂粒子(有機物)中內含有金屬者。該等通常為惰性(絕緣)狀態,但例如可藉由使用雷射等去除上述有機物而使金屬露出從而賦予活性(導電性)。 In addition, as the metal whose surface is coated with an organic material, a resin particle (organic material) formed by an emulsion polymerization method or the like may be contained in the metal. These are generally in an inert (insulating) state. For example, the organic substance may be removed by using a laser or the like to expose the metal to impart activity (electrical conductivity).

作為上述導電性物質(a2),較佳為使用具有1~100nm左右之平均粒徑之粒子狀者,若使用具有1~50nm之平均粒徑者,則與使用具有微米級平均粒徑之導電性物質之情形相比,可形成微細之導電性圖案,可進一步降低下述焙燒後之電阻值,因而更佳。再者,本發明中,平均粒徑係利用分散良溶劑稀釋上述導電性物質(a2),藉由動態光散射法所測得之體積平均值。該測定時可使用Microtrac公司製造之 「Nanotrac UPA」。 As the conductive material (a2), those having a particle diameter of about 1 to 100 nm are preferably used. When an average particle diameter of 1 to 50 nm is used, conductivity with a micron-sized average particle diameter is used. In comparison with the case of a substance, a fine conductive pattern can be formed, and the resistance value after baking as described below can be further reduced, and thus it is more preferable. Further, in the present invention, the average particle diameter is a volume average value measured by a dynamic light scattering method by diluting the above-mentioned conductive substance (a2) with a dispersion good solvent. This measurement can be made by Microtrac. "Nanotrac UPA".

本發明之屏蔽膜中,於上述經圖案化之鍍銅層之開口內部具有使用導電性油墨所形成之層(A-2)。上述層(A-2)嵌於鍍銅層之開口內部而發揮提高電磁波之屏蔽性之功能。作為上述層(A-2)之圖案,其形狀並無特別限制,可根據所要求之電磁波屏蔽效果而適當選擇,為了提高電磁波之屏蔽性能,較佳為於上述鍍銅層之開口面積之15~95%之範圍內形成上述層(A-2),更佳為40~95%之範圍。上述層(A-2)可與上述鍍銅層接觸,但於利用下述電解鍍銅法製造上述鍍銅層之情形時,上述層(A-2)較佳為不與鍍銅層接觸。 In the shielding film of the present invention, a layer (A-2) formed using a conductive ink is provided inside the opening of the patterned copper plating layer. The layer (A-2) is embedded in the opening of the copper plating layer and functions to improve the shielding property of electromagnetic waves. The shape of the layer (A-2) is not particularly limited, and may be appropriately selected according to the required electromagnetic wave shielding effect. In order to improve the shielding performance of the electromagnetic wave, it is preferable that the opening area of the copper plating layer is 15 The above layer (A-2) is formed in a range of ~95%, more preferably in the range of 40 to 95%. The layer (A-2) may be in contact with the copper plating layer. However, when the copper plating layer is produced by the following electrolytic copper plating method, the layer (A-2) is preferably not in contact with the copper plating layer.

作為上述層(A-2)之具體圖案形狀,例如可列舉:正三角形、等腰三角形、直角三角形等三角形;正方形、長方形、菱形、平行四邊形、梯形等四角形;(正)五角形、(正)六角形、(正)八角形、(正)十二角形等(正)n角形(n為5以上之整數);圓、楕圓、星形等幾何學圖形;漩渦形、環形、線圈形、螺旋形等形狀。 Examples of the specific pattern shape of the layer (A-2) include a triangle such as an equilateral triangle, an isosceles triangle, and a right triangle; a square shape such as a square, a rectangle, a rhombus, a parallelogram, and a trapezoid; (positive) pentagon, (positive) Hexagon, (positive) octagon, (positive) dodecagonal (positive) n-angle (n is an integer of 5 or more); geometric figures such as circles, circles, stars, etc.; swirl, ring, coil, Spiral and other shapes.

上述層(A-2)之膜厚較佳為0.02~2μm之範圍。若將上述層(A-2)之膜厚設為0.02μm以上,則可提高屏蔽印刷電路板之電磁波屏蔽效果。藉由將上述層(A-2)之膜厚設為未達2μm,可與上述鍍銅層之間形成膜厚之差值,若使上述層(A-2)之膜厚薄於上述鍍銅層之膜厚,則容易將屏蔽印刷電路板之阻抗調整為所需值,故而較佳。 The film thickness of the layer (A-2) is preferably in the range of 0.02 to 2 μm. When the film thickness of the layer (A-2) is 0.02 μm or more, the electromagnetic wave shielding effect of the shield printed circuit board can be improved. By setting the film thickness of the layer (A-2) to less than 2 μm, a difference in film thickness can be formed with the copper plating layer, and if the film thickness of the layer (A-2) is thinner than the copper plating described above Since the film thickness of the layer is easy to adjust the impedance of the shield printed circuit board to a desired value, it is preferable.

上述鍍銅層之膜厚較佳為設為上述層(A-2)之膜厚之3~100倍。即,藉由將開口內部之金屬層之膜厚設為較薄、將開口圖案部之鍍銅層設為較厚,可使阻抗成為所需值,且可減小電容而防止波形鈍化,進而亦可實現電磁波之屏蔽。 The film thickness of the copper plating layer is preferably set to be 3 to 100 times the film thickness of the layer (A-2). That is, by making the thickness of the metal layer inside the opening thin, and making the copper plating layer of the opening pattern portion thick, the impedance can be made to a desired value, and the capacitance can be reduced to prevent the waveform from being passivated. It can also shield electromagnetic waves.

作為構成上述層(A-2)之導電性油墨,可使用與上述層(A-1)相同者。 As the conductive ink constituting the layer (A-2), the same layer as the above layer (A-1) can be used.

上述層(A-2)可僅由導電性油墨所形成,亦可於導電性油墨上形 成金屬鍍敷層。作為金屬鍍敷層,並無特別限制,可列舉:銅、鎳、金、銀、鉑、鈀、鉻、錫等。作為於上述層(A-2)上實施鍍敷之方法,可利用無電解鍍敷法實施。 The above layer (A-2) may be formed only of a conductive ink or may be formed on a conductive ink. Formed as a metal plating layer. The metal plating layer is not particularly limited, and examples thereof include copper, nickel, gold, silver, platinum, palladium, chromium, and tin. The method of performing plating on the layer (A-2) can be carried out by electroless plating.

上述無電解鍍敷法係如下方法,例如使構成上述層(A-2)之圖案之導電性物質與無電解鍍敷液接觸,藉此使無電解鍍敷液中所含之金屬析出而形成包含金屬皮膜之無電解鍍敷層(被膜)。 The electroless plating method is a method in which, for example, a conductive material constituting the pattern of the layer (A-2) is brought into contact with an electroless plating solution to precipitate a metal contained in the electroless plating solution. An electroless plating layer (film) containing a metal film.

作為上述無電解鍍敷液,例如可列舉含有金屬、還原劑、水性介質、有機溶劑等溶劑者。 Examples of the electroless plating solution include those containing a metal, a reducing agent, an aqueous medium, and an organic solvent.

作為上述還原劑,例如可列舉:二甲胺基硼烷、次磷酸、次磷酸鈉、二甲胺硼烷、肼、甲醛、硼氫化鈉、苯酚等。 Examples of the reducing agent include dimethylaminoborane, hypophosphorous acid, sodium hypophosphite, dimethylamine borane, hydrazine, formaldehyde, sodium borohydride, and phenol.

又,作為上述無電解鍍敷液,視需要可使用含有錯合劑者等,該錯合劑係乙酸、甲酸等單羧酸;丙二酸、琥珀酸、己二酸、順丁烯二酸、反丁烯二酸等二羧酸化合物;蘋果酸、乳酸、乙醇酸、葡萄糖酸、檸檬酸等羥基羧酸化合物;甘胺酸、丙胺酸、亞胺基二乙酸、精胺酸、天冬胺酸、麩胺酸等胺基酸化合物;亞胺基二乙酸、氮基三乙酸、乙二胺二乙酸、乙二胺四乙酸、二伸乙基三胺五乙酸等胺基聚羧酸化合物等有機酸、或該等有機酸之可溶性鹽(鈉鹽、鉀鹽、銨鹽等);乙二胺、二伸乙基三胺、三伸乙基四胺等胺化合物等。 Further, as the electroless plating solution, a dye containing a compounding agent such as acetic acid or formic acid; malonic acid, succinic acid, adipic acid, maleic acid, or the like may be used as needed. a dicarboxylic acid compound such as butenedioic acid; a hydroxycarboxylic acid compound such as malic acid, lactic acid, glycolic acid, gluconic acid or citric acid; glycine acid, alanine, iminodiacetic acid, arginine, aspartic acid An amino acid compound such as glutamic acid; an amine-based polycarboxylic acid compound such as iminodiacetic acid, nitrogen triacetic acid, ethylenediamine diacetic acid, ethylenediaminetetraacetic acid or diamethylenetriaminepentaacetic acid; An acid, or a soluble salt of such an organic acid (sodium salt, potassium salt, ammonium salt, etc.); an amine compound such as ethylenediamine, di-ethyltriamine or tri-ethyltetramine.

上述無電解鍍敷液較佳為於20~98℃之範圍內使用。 The above electroless plating solution is preferably used in the range of 20 to 98 °C.

關於使用上述導電性油墨所形成之上述層(A-1)及上述層(A-2),於本發明之製造方法中係形成於下述第二絕緣保護層上,為了進一步提高下述第二絕緣保護層之表面與上述層(A-1)及上述層(A-2)之密接性,形成該第二絕緣保護層之高分子較佳為具有下述反應性官能基[Y]者。 The layer (A-1) and the layer (A-2) formed by using the conductive ink are formed on the second insulating protective layer described below in the production method of the present invention, in order to further improve the following The surface of the second insulating protective layer is in close contact with the layer (A-1) and the layer (A-2), and the polymer forming the second insulating protective layer preferably has the following reactive functional group [Y] .

又,即便於形成下述第二絕緣保護層之高分子不具有下述反應性官能基[Y]之情形時,藉由於第二絕緣保護層之表面塗佈高分子並 使之乾燥而設置高分子層(B)後,於其上形成上述層(A-1)及上述層(A-2),亦可進一步提高下述第二絕緣保護層之表面與上述層(A-1)及上述層(A-2)之密接性。又,形成上述高分子層(B)之高分子較佳為具有下述反應性官能基[Y]者。 Further, even when the polymer forming the second insulating protective layer described below does not have the following reactive functional group [Y], the surface of the second insulating protective layer is coated with a polymer. After the polymer layer (B) is dried and the polymer layer (B) is formed thereon, the layer (A-1) and the layer (A-2) are formed thereon, and the surface of the second insulating protective layer described below and the layer may be further improved ( A-1) and the adhesion of the above layer (A-2). Further, the polymer forming the polymer layer (B) preferably has the following reactive functional group [Y].

於設置具有下述反應性官能基[Y]之高分子層(B)之情形時,作為上述導電性油墨,為了進一步提高上述鍍銅層與下述第二絕緣保護層之密接性,較佳為含有具有反應性官能基[X]之化合物(a1)及上述導電性物質(a2)者。 In the case where the polymer layer (B) having the following reactive functional group [Y] is provided, it is preferred to use the conductive ink as the conductive ink to further improve the adhesion between the copper plating layer and the second insulating protective layer described below. It is a compound (a1) containing a reactive functional group [X] and the above-mentioned electrically conductive substance (a2).

上述化合物(a1)所具有之反應性官能基[X]係與下述反應性官能基[Y]進行鍵結者,作為具體例,可列舉具有胺基、醯胺基、羥烷基醯胺基、羧基、酸酐基、羰基、乙醯乙醯氧基、環氧基、脂環環氧基、氧雜環丁烷環、乙烯基、烯丙基、(甲基)丙烯醯基、(封端化)異氰酸酯基、(烷氧基)矽烷基等之化合物、倍半矽氧烷化合物等。 The reactive functional group [X] of the above compound (a1) is bonded to the following reactive functional group [Y], and specific examples thereof include an amine group, a guanamine group, and a hydroxyalkylguanamine. Base, carboxyl group, acid anhydride group, carbonyl group, acetamethylene oxide, epoxy group, alicyclic epoxy group, oxetane ring, vinyl group, allyl group, (meth) acrylonitrile group, A compound such as an isocyanate group or an (alkoxy)decyl group, a sesquioxane compound or the like is used.

尤其為了進一步提高與下述第二絕緣保護層之密接性,上述反應性官能基[X]較佳為含鹼性氮原子之基。 In particular, in order to further improve the adhesion to the second insulating protective layer described below, the reactive functional group [X] is preferably a group containing a basic nitrogen atom.

作為具有上述含鹼性氮原子之基之化合物中之含鹼性氮原子之基,例如可列舉:亞胺基、一級胺基、二級胺基等。 Examples of the group having a basic nitrogen atom in the compound having a basic nitrogen atom-containing group include an imido group, a primary amino group, and a secondary amino group.

又,藉由使用1分子中具有複數個含鹼性氮原子之基之化合物(a1),上述含鹼性氮原子之基中之一於形成上述層(A-1)及上述層(A-2)之圖案時,與形成下述第二絕緣保護層之高分子、或形成上述高分子層(B)之高分子所具有之反應性官能基[Y]參與鍵結,其他則有助於與上述層(A-1)及上述層(A-2)中所含之銀等導電性物質(a2)相互作用,可進一步提高最終所獲得之上述鍍銅層與第二絕緣保護層之密接性,故而較佳。 Further, by using a compound (a1) having a plurality of basic nitrogen-containing groups in one molecule, one of the basic nitrogen-containing groups is formed in the above layer (A-1) and the above layer (A-) 2) the pattern, the reactive functional group [Y] of the polymer forming the second insulating protective layer described below or the polymer forming the polymer layer (B) is involved in bonding, and the others contribute Interacting with the conductive material (a2) such as silver contained in the layer (A-1) and the layer (A-2), the adhesion between the copper plating layer and the second insulating protective layer finally obtained can be further improved. Sex, so it is better.

具有上述含鹼性氮原子之基之化合物(a1)就可進一步提高上述導電性物質(a2)之分散穩定性、及與下述第二絕緣保護層之密接性之方 面而言,較佳為聚伸烷基亞胺、或具有包含氧基伸乙基單元之聚氧伸烷基結構之聚伸烷基亞胺。 The compound (a1) having the above-mentioned basic nitrogen atom-containing group can further improve the dispersion stability of the above-mentioned conductive material (a2) and the adhesion to the second insulating protective layer described below. In the surface, it is preferably a polyalkyleneimine or a polyalkyleneimine having a polyoxyalkylene structure containing an oxyalkyl group.

作為具有上述結構之聚伸烷基亞胺,可為聚伸乙基亞胺與聚氧伸烷基以直鏈狀鍵結而成者,亦可為相對於包含上述聚伸乙基亞胺之主鏈,於其側鏈上接枝有上述聚氧伸烷基者。 As the polyalkyleneimine having the above structure, the polyethylenimine and the polyoxyalkylene group may be linearly bonded, or may be the same as the above-mentioned polyethylenimine. The main chain is grafted with the above polyoxyalkylene group on its side chain.

作為上述具有聚氧伸烷基結構之聚伸烷基亞胺之具體例,可列舉:聚伸乙基亞胺與聚氧乙烯之嵌段共聚物、使聚伸乙基亞胺之主鏈中所存在之亞胺基之一部分與環氧乙烷進行加成反應而導入有聚氧乙烯結構者、使聚伸烷基亞胺所具有之胺基與聚氧乙二醇所具有之羥基及環氧樹脂所具有之環氧基進行反應所獲得者等。 Specific examples of the polyalkyleneimine having a polyoxyalkylene group structure include a block copolymer of a polyethylenimine and a polyoxyethylene, and a main chain of the polyethylenimine. a part of an imine group present in an addition reaction with ethylene oxide to introduce a polyoxyethylene structure, and an amine group having a polyalkylene glycol and a hydroxyl group and a ring of polyoxyethylene glycol The epoxy group obtained by the oxygen resin is obtained by a reaction or the like.

作為上述聚伸烷基亞胺之市售品,可列舉:日本觸媒股份有限公司製造之「EPOMIN(註冊商標)PAO系列」之「PAO2006W」、「PAO306」、「PAO318」、「PAO718」等。 As a commercial item of the above-mentioned polyalkyleneimine, "PAO2006W", "PAO306", "PAO318", "PAO718", etc. of "EPOMIN (registered trademark) PAO series manufactured by Nippon Shokubai Co., Ltd." .

上述聚伸烷基亞胺之數量平均分子量較佳為3,000~30,000之範圍。 The number average molecular weight of the above polyalkyleneimine is preferably in the range of 3,000 to 30,000.

於上述化合物(a1)所具有之反應性官能基[X]為羧基、胺基、氰基、乙醯乙醯氧基、含磷原子之基、硫醇基、硫氰酸基、甘胺酸基等之情形時,該等官能基亦發揮作為與金屬奈米粒子進行配位之官能基的功能,因此上述化合物(a1)亦可用作金屬奈米粒子之高分子分散劑。 The reactive functional group [X] possessed by the above compound (a1) is a carboxyl group, an amine group, a cyano group, an ethyl ethoxy group, a phosphorus atom-containing group, a thiol group, a thiocyanate group, or a glycine acid. In the case of a base or the like, since these functional groups also function as a functional group for coordination with the metal nanoparticles, the above compound (a1) can also be used as a polymer dispersant for metal nanoparticles.

關於上述導電性油墨,為了對其賦予於下述各種印刷方式中之印刷適應性,較佳為使用溶劑而使之成為適宜黏度。作為上述溶劑,例如可列舉:蒸餾水、離子交換水、純水、超純水等水性介質;醇溶劑、醚溶劑、酮溶劑、酯溶劑等有機溶劑。 In order to impart printing suitability to the above-described various types of printing methods, it is preferred to use a solvent to obtain a suitable viscosity. Examples of the solvent include an aqueous medium such as distilled water, ion-exchanged water, pure water, and ultrapure water; and an organic solvent such as an alcohol solvent, an ether solvent, a ketone solvent, or an ester solvent.

作為上述醇溶劑或醚溶劑,例如可列舉:甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、第二丁醇、第三丁醇、庚醇、己醇、 辛醇、壬醇、癸醇、十一烷醇、十二烷醇、十三烷醇、十四烷醇、十五烷醇、硬脂醇、烯丙醇、環己醇、松油醇、二氫松油醇、2-乙基-1,3-己二醇、乙二醇、二乙二醇、三乙二醇、聚乙二醇、丙二醇、二丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、2,3-丁二醇、甘油、乙二醇單甲醚、乙二醇單乙醚、乙二醇單丁醚、二乙二醇單乙醚、二乙二醇單甲醚、二乙二醇單丁醚、四乙二醇單丁醚、丙二醇單甲醚、二丙二醇單甲醚、三丙二醇單甲醚、丙二醇單丙醚、二丙二醇單丙醚、丙二醇單丁醚、二丙二醇單丁醚、三丙二醇單丁醚等。 Examples of the above alcohol solvent or ether solvent include methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, second butanol, third butanol, heptanol, and hexanol. Octanol, decyl alcohol, decyl alcohol, undecyl alcohol, dodecanol, tridecyl alcohol, tetradecanol, pentadecyl alcohol, stearyl alcohol, allyl alcohol, cyclohexanol, terpineol, Dihydroterpineol, 2-ethyl-1,3-hexanediol, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, 1,2-butanediol , 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, glycerin, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol Alcohol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, propylene glycol monopropyl ether, Dipropylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monobutyl ether, and the like.

作為上述酮溶劑,例如可列舉:丙酮、環己酮、甲基乙基酮等。又,作為上述酯溶劑,例如可列舉:乙酸乙酯、乙酸丁酯、乙酸3-甲氧基丁酯、乙酸3-甲氧基-3-甲基丁酯等。進而,作為其他有機溶劑,可列舉:環己烷、甲苯、辛烷、壬烷、癸烷、十二烷、十三烷、十四烷、環辛烷、二甲苯、均三甲苯、乙基苯、十二烷基苯、萘滿、三甲基苯等非極性溶劑,可視需要與其他溶劑組合使用。進而,亦可併用作為混合溶劑之礦油精、溶劑石腦油等溶劑。 Examples of the ketone solvent include acetone, cyclohexanone, and methyl ethyl ketone. Further, examples of the ester solvent include ethyl acetate, butyl acetate, 3-methoxybutyl acetate, and 3-methoxy-3-methylbutyl acetate. Further, examples of the other organic solvent include cyclohexane, toluene, octane, decane, decane, dodecane, tridecane, tetradecane, cyclooctane, xylene, mesitylene, and ethyl. Non-polar solvents such as benzene, dodecylbenzene, tetralin, and trimethylbenzene may be used in combination with other solvents as needed. Further, a solvent such as mineral spirits or solvent naphtha as a mixed solvent may be used in combination.

上述導電性油墨例如可藉由將上述高分子分散劑、上述導電性物質、及視需要之上述溶劑進行混合而製造。具體而言可藉由如下方式製造:於分散有具有聚伸烷基亞胺鏈、親水性鏈段及疏水性鏈段之化合物之介質中,添加預先製備之上述導電性物質之離子溶液,將該金屬離子還原。 The conductive ink can be produced, for example, by mixing the polymer dispersant, the conductive material, and optionally the solvent. Specifically, it can be produced by adding an ion solution of the above-mentioned conductive substance prepared in advance to a medium in which a compound having a polyalkyleneimine chain, a hydrophilic segment and a hydrophobic segment is dispersed. The metal ion is reduced.

又,於上述導電性油墨中,為了提高導電性物質於水性介質、有機溶劑等溶劑中之分散穩定性、對被塗佈面之潤濕性,視需要亦可添加界面活性劑、消泡劑、流變調整劑等。 Further, in the conductive ink, in order to improve the dispersion stability of the conductive material in a solvent such as an aqueous medium or an organic solvent, and the wettability to the surface to be coated, a surfactant or an antifoaming agent may be added as needed. , rheology modifiers, etc.

本發明中,於下述第二絕緣保護層上印刷上述導電性油墨而形成包含上述層(A-1)及上述層(A-2)之圖案,作為印刷上述導電性油墨之方法,例如可列舉:噴墨印刷法、反轉印刷法、軟版印刷法、網版 印刷法、凹版印刷法、凹版膠印法等。該等印刷法之中,較佳為噴墨印刷法,其原因在於:於為了控制屏蔽印刷電路板之阻抗而變更鍍銅層之圖案之情形時,無需根據圖案而製作相應之印刷版,從而可容易地應對圖案之變更。 In the present invention, the conductive ink is printed on the second insulating protective layer to form a pattern including the layer (A-1) and the layer (A-2), and as a method of printing the conductive ink, for example, List: inkjet printing, reverse printing, soft printing, screen Printing method, gravure printing method, gravure offset printing method, and the like. Among these printing methods, the ink jet printing method is preferred because when the pattern of the copper plating layer is changed in order to control the impedance of the shield printed circuit board, it is not necessary to produce a corresponding printing plate according to the pattern, thereby The pattern change can be easily dealt with.

作為上述噴墨印刷法,通常可使用稱為噴墨印表機者。具體而言,可列舉:「Konica Minolta EB100、XY100」(Konica Minolta IJ股份有限公司製造)、「Dimatix Materials Printer DMP-3000、DMP-2831」(Fuji Film股份有限公司製造)等。 As the above inkjet printing method, a person called an inkjet printer can be generally used. Specifically, "Konica Minolta EB100, XY100" (manufactured by Konica Minolta IJ Co., Ltd.), "Dimatix Materials Printer DMP-3000, DMP-2831" (manufactured by Fuji Film Co., Ltd.), and the like are exemplified.

又,於製作高精細之金屬層圖案之情形時,較佳為細線之印刷精度優異之反轉印刷法。 Further, in the case of producing a high-definition metal layer pattern, it is preferable to use a reverse printing method in which the printing precision of fine lines is excellent.

作為反轉印刷法,已知凸版反轉印刷法、凹版反轉印刷法,例如可列舉如下方法:於各種印刷布之表面塗佈上述導電性油墨,使之與非畫線部突出之版接觸,而將對應於上述非畫線部之導電性油墨選擇性地轉印至上述版之表面,藉此於上述印刷布等之表面形成上述圖案,繼而將上述圖案轉印至上述第二絕緣保護層上(表面)。 As a reverse printing method, a letterpress reverse printing method and a gravure reverse printing method are known, and for example, a method in which the conductive ink is applied to the surface of each of the printing cloths to be in contact with a non-drawing portion is disclosed. And selectively transferring the conductive ink corresponding to the non-line portion to the surface of the plate, thereby forming the pattern on the surface of the printing cloth or the like, and then transferring the pattern to the second insulation protection On the layer (surface).

又,於如上所述般為了進一步提高下述第二絕緣保護層之表面與上述層(A-1)及上述層(A-2)之密接性而設置高分子層(B)之情形時,作為形成上述高分子層(B)之高分子,例如可列舉含有胺基甲酸酯樹脂、乙烯基樹脂、胺基甲酸酯-乙烯基複合樹脂、環氧樹脂、醯亞胺樹脂、醯胺樹脂、三聚氰胺樹脂、酚系樹脂、聚乙烯醇、聚乙烯基吡咯啶酮等各種樹脂與溶劑者。 Further, in the case where the polymer layer (B) is provided in order to further improve the adhesion between the surface of the second insulating protective layer and the layer (A-1) and the layer (A-2) as described above, Examples of the polymer forming the polymer layer (B) include a urethane resin, a vinyl resin, a urethane-vinyl composite resin, an epoxy resin, a quinone imine resin, and a guanamine. Various resins and solvents such as resins, melamine resins, phenol resins, polyvinyl alcohol, and polyvinylpyrrolidone.

用作上述高分子(B)之樹脂之中,較佳為胺基甲酸酯樹脂、乙烯基樹脂、胺基甲酸酯-乙烯基複合樹脂,更佳為選自由具有聚醚結構之胺基甲酸酯樹脂、具有聚碳酸酯結構之胺基甲酸酯樹脂、具有聚酯結構之胺基甲酸酯樹脂、丙烯酸系樹脂、及胺基甲酸酯-丙烯酸複合樹脂所組成之群中之1種以上之樹脂。又,胺基甲酸酯-丙烯酸複合樹 脂由於可獲得密接性、導電性優異之導電性圖案,故而更佳。 Among the resins used as the polymer (B), a urethane resin, a vinyl resin, a urethane-vinyl composite resin is preferred, and an amine group having a polyether structure is more preferably selected. a group consisting of a formate resin, a urethane resin having a polycarbonate structure, a urethane resin having a polyester structure, an acrylic resin, and a urethane-acrylic composite resin More than one type of resin. Further, a urethane-acrylic composite tree The grease is more preferable because it can obtain a conductive pattern having excellent adhesion and conductivity.

於上述導電性油墨中含有具有上述反應性官能基[X]之化合物(a1)之情形時,形成上述高分子層(B)之高分子較佳為具有與反應性官能基[X]具有反應性之官能基[Y]之化合物(b1)。作為上述具有反應性官能基[Y]之化合物(b1),例如可列舉具有胺基、醯胺基、羥烷基醯胺基、羧基、酸酐基、羰基、乙醯乙醯氧基、環氧基、脂環環氧基、氧雜環丁烷環、乙烯基、烯丙基、(甲基)丙烯醯基、(封端化)異氰酸酯基、(烷氧基)矽烷基等之化合物、倍半矽氧烷化合物等。 When the conductive ink contains the compound (a1) having the reactive functional group [X], the polymer forming the polymer layer (B) preferably has a reaction with the reactive functional group [X]. Compound (b1) of functional group [Y]. The compound (b1) having a reactive functional group [Y] may, for example, be an amine group, a guanamine group, a hydroxyalkylguanamine group, a carboxyl group, an acid anhydride group, a carbonyl group, an ethyl acetoxy group, or an epoxy group. a compound such as an alicyclic epoxy group, an oxetane ring, a vinyl group, an allyl group, a (meth) acrylonitrile group, a (blocked) isocyanate group, or an (alkoxy) decyl group, Semi-oxane compounds and the like.

尤其於上述導電性油墨中之具有上述反應性官能基[X]之化合物(a1)為具有上述含鹼性氮原子之基之化合物(a1)之情形時,形成上述高分子層(B)之高分子中之反應性官能基[Y]較佳為羧基、羰基、乙醯乙醯氧基、環氧基、脂環環氧基、羥烷基醯胺基、異氰酸酯基、乙烯基、(甲基)丙烯醯基、烯丙基,其原因在於可提高最終所獲得之上述金屬層與上述第二絕緣保護層之密接性。 Particularly, in the case where the compound (a1) having the reactive functional group [X] in the conductive ink is the compound (a1) having the above-mentioned basic nitrogen atom-containing group, the polymer layer (B) is formed. The reactive functional group [Y] in the polymer is preferably a carboxyl group, a carbonyl group, an ethyl oxime oxime group, an epoxy group, an alicyclic epoxy group, a hydroxyalkyl guanylamino group, an isocyanate group, a vinyl group, (a) The reason is that the acrylonitrile group and the allyl group are improved in adhesion between the metal layer finally obtained and the second insulating protective layer.

作為於下述第二絕緣保護層之表面塗佈形成上述高分子層(B)之高分子之方法,例如可列舉:凹版印刷方式、塗佈方式、網版印刷方式、輥式塗佈方式、旋轉塗佈方式、噴塗方式等。 The method of applying the polymer of the polymer layer (B) to the surface of the second insulating protective layer described below may, for example, be a gravure printing method, a coating method, a screen printing method, a roll coating method, or the like. Rotary coating method, spray method, etc.

又,為了進一步提高與上述高分子層(B)之密接性,亦可對下述第二絕緣保護層之表面藉由例如電暈放電處理法等電漿放電處理法,紫外線處理法等乾式處理法,使用水、酸性或鹼性藥液、有機溶劑等之濕式處理法而進行表面處理。 Further, in order to further improve the adhesion to the polymer layer (B), the surface of the second insulating protective layer described below may be subjected to a dry discharge treatment such as a corona discharge treatment method or a dry treatment such as an ultraviolet treatment method. The surface treatment is carried out by a wet treatment method using water, an acidic or alkaline chemical solution, an organic solvent or the like.

作為於下述第二絕緣保護層之表面塗佈形成上述高分子層(B)之高分子後去除該塗佈層所含之溶劑的方法,通常之方法例如為使用乾燥機進行乾燥而使上述溶劑揮發。作為乾燥溫度,較佳為設定為能夠使上述溶劑揮發、且不會對支持體造成不良影響之範圍之溫度。 The method of applying the polymer of the polymer layer (B) to the surface of the second insulating protective layer and removing the solvent contained in the coating layer, and the usual method is, for example, drying using a dryer to make the above The solvent evaporates. The drying temperature is preferably set to a temperature within a range in which the solvent can be volatilized without adversely affecting the support.

關於使用上述高分子(B)所形成之高分子(B)層之厚度,就可進一 步提高上述第二絕緣保護層與上述金屬層之密接性之方面而言,較佳為5~5,000nm之範圍,更佳為10~500nm之範圍。 Regarding the thickness of the polymer (B) layer formed by using the above polymer (B), it is possible to further The step of improving the adhesion between the second insulating protective layer and the metal layer is preferably in the range of 5 to 5,000 nm, more preferably in the range of 10 to 500 nm.

又,可將上述高分子(B)直接用作上述第二絕緣保護層,進而,亦可對上述第二絕緣保護層混合使用上述高分子(B),於該情形時,上述高分子(B)必須存在於上述第二絕緣保護層之與上述導電性油墨接觸之部分。 Further, the polymer (B) may be used as the second insulating protective layer as it is, or the polymer (B) may be used in combination with the second insulating protective layer. In this case, the polymer (B) It must be present in the portion of the second insulating protective layer that is in contact with the conductive ink.

其次,為了利用上述導電性油墨形成作為鍍敷基底之圖案,而於塗佈上述導電性油墨後進行焙燒步驟,該焙燒步驟之目的在於藉由使上述導電性油墨中所含之導電性物質彼此密接、接合而形成具有導電性之鍍敷基底圖案。上述焙燒較佳為於80~300℃之溫度範圍內進行1~200分鐘左右。此處,為了獲得與上述第二絕緣保護層之密接性優異之鍍敷基底圖案,更佳為將上述焙燒之溫度設為100~200℃之範圍。 Next, in order to form a pattern as a plating base by using the conductive ink, a baking step is performed after applying the conductive ink, and the baking step is performed by causing conductive substances contained in the conductive ink to be mutually The plating substrate pattern having conductivity is formed by bonding and bonding. The calcination is preferably carried out in a temperature range of 80 to 300 ° C for about 1 to 200 minutes. Here, in order to obtain a plating base pattern excellent in adhesion to the second insulating protective layer, it is more preferable to set the baking temperature to a range of 100 to 200 °C.

上述焙燒可於大氣中進行,但為了防止導電性物質氧化,可將焙燒步驟之一部分或全部於還原性氣氛下進行。 The calcination can be carried out in the atmosphere, but in order to prevent oxidation of the electroconductive substance, part or all of the calcination step can be carried out under a reducing atmosphere.

又,上述焙燒步驟例如可使用烘箱、熱風式乾燥爐、紅外線乾燥爐、雷射照射、微波、光照射(閃光照射裝置)等進行。 Further, the baking step can be carried out, for example, using an oven, a hot air drying oven, an infrared drying oven, laser irradiation, microwave, light irradiation (flash irradiation apparatus), or the like.

藉由如上所述之方法使用上述導電性油墨所形成之包含上述層(A-1)及上述層(A-2)之圖案較佳為於上述圖案中含有80~99.9質量%之範圍之導電性物質、含有0.1~20質量%之範圍之高分子分散劑者。 The pattern comprising the layer (A-1) and the layer (A-2) formed by using the conductive ink as described above is preferably a conductive layer having a range of 80 to 99.9% by mass in the pattern. A substance, a polymer dispersant containing 0.1 to 20% by mass.

關於使用上述導電性油墨所形成之上述層(A-1)及上述層(A-2)之膜厚,就可形成低電阻且導電性優異之導電性圖案之方面而言,較佳為0.05~1μm之範圍。 The film thickness of the layer (A-1) and the layer (A-2) formed by using the conductive ink can be preferably 0.05 in terms of forming a conductive pattern having low electrical resistance and excellent electrical conductivity. ~1μm range.

其次,於本發明之屏蔽膜及屏蔽印刷電路板中,關於屏蔽膜側之主導電層,以使用上述導電性油墨所形成之上述層(A-1)作為鍍敷基底圖案,於其上具有以膜厚0.5~20μm、開口率40~95%進行圖案 化之鍍銅層。另一方面,上述專利文獻2中,作為導電層,揭示有藉由於基材膜上按照特定圖案印刷導電性油墨或導電性漿料之方法、藉由對金屬箔進行蝕刻處理而形成開口部之方法、藉由蒸鍍或濺鍍金屬而形成特定圖案之金屬層之方法所製作者,進而,作為上述導電層,揭示使用金屬線網。又,上述專利文獻2中揭示作為導電層之素材,較佳為使用金、銀或銅等金屬及其合金、或含導電性填料之樹脂、導電性高分子等。然而,已知於使用含導電性填料之樹脂作為導電層之素材、作為導電性油墨或導電性漿料之情形時,導電層本身缺乏導電性,使印刷電路板之信號線之傳送損失加劇。又,若為藉由對金屬箔進行蝕刻處理而形成開口部之方法,則製造步驟複雜,屏蔽印刷電路板價格高昂,或難以對導電層之膜厚進行任意調整(薄膜化)。又,若為藉由蒸鍍或濺鍍金屬而形成特定圖案之金屬層之方法,則僅可形成膜厚較薄之導電層,進而,關於形成開口部圖案之方法亦有問題。又,若為使用金屬線網之方法,則難以實現導電層圖案之細線化,於減小開口部面積之方面受到制約。本發明中,以使用上述導電性油墨形成圖案而成之上述層(A-1)作為鍍敷基底,於其上進行鍍銅而獲得鍍銅層,藉由使用該鍍銅層作為屏蔽膜側之導電層,可解決上述所有問題點。 Next, in the shielding film and the shield printed circuit board of the present invention, the main conductive layer on the side of the shielding film is formed by using the layer (A-1) formed of the conductive ink as a plating base pattern thereon. Pattern with a film thickness of 0.5 to 20 μm and an aperture ratio of 40 to 95% Copper plated layer. On the other hand, in the above-mentioned Patent Document 2, as a conductive layer, a method of forming a conductive portion by etching a metal foil by a method of printing a conductive ink or a conductive paste on a substrate film in a specific pattern is disclosed. In the method, a method of forming a metal layer of a specific pattern by vapor deposition or sputtering of a metal, and further, as the conductive layer, a metal wire mesh is disclosed. Moreover, in the above-mentioned Patent Document 2, as a material of the conductive layer, a metal such as gold, silver or copper or an alloy thereof, a resin containing a conductive filler, a conductive polymer or the like is preferably used. However, it is known that when a resin containing a conductive filler is used as a material of a conductive layer or as a conductive ink or a conductive paste, the conductive layer itself lacks conductivity, and the transmission loss of a signal line of a printed circuit board is intensified. Moreover, if the opening is formed by etching the metal foil, the manufacturing process is complicated, the price of the shielded printed circuit board is high, or it is difficult to arbitrarily adjust the thickness of the conductive layer (thin film). Further, in the case of a method of forming a metal layer of a specific pattern by vapor deposition or sputtering of a metal, only a conductive layer having a small thickness can be formed, and further, there is a problem in a method of forming an opening pattern. Further, in the case of using a metal wire mesh, it is difficult to achieve thinning of the conductive layer pattern, and it is restricted in terms of reducing the area of the opening. In the present invention, the layer (A-1) formed by patterning using the conductive ink is used as a plating substrate, and copper plating is performed thereon to obtain a copper plating layer, and the copper plating layer is used as a shielding film side. The conductive layer can solve all the above problems.

作為上述鍍銅層之形成方法,例如可列舉電解鍍敷法、無電解鍍敷法等濕式鍍敷法,亦可將2種以上之該等鍍敷法加以組合而形成上述鍍銅層。 Examples of the method for forming the copper plating layer include a wet plating method such as an electrolytic plating method and an electroless plating method, and two or more of these plating methods may be combined to form the copper plating layer.

上述鍍敷法之中,就上述層(A-1)之圖案與藉由上述鍍敷法所形成之鍍銅層之密接性進一步提高,又,獲得導電性優異之圖案之方面而言,較佳為電解鍍敷法、無電解鍍敷法等濕式鍍敷法,就生產性或所獲得之金屬膜之力學特性優異之方面而言,更佳為電解鍍敷法。又,於僅於具有開口部之圖案即上述層(A-1)上實施鍍銅之情形時, 較佳為以電解鍍敷法實施。 In the plating method, the adhesion between the pattern of the layer (A-1) and the copper plating layer formed by the plating method is further improved, and in terms of obtaining a pattern having excellent conductivity, The wet plating method such as electrolytic plating or electroless plating is more preferably an electrolytic plating method in terms of productivity or excellent mechanical properties of the obtained metal film. Further, when copper plating is performed on the layer (A-1) which is a pattern having an opening portion, It is preferably carried out by electrolytic plating.

上述電解鍍敷法係如下方法:例如於使構成上述層(A-1)之金屬、或藉由上述無電解處理所形成之無電解鍍敷層(被膜)之表面與電解鍍敷液接觸的狀態下通電,藉此使上述電解鍍敷液中所含之銅等金屬析出至構成設置於陰極之上述層(A-1)的導電性物質之表面,形成電解鍍敷層(金屬被膜)。 The electrolytic plating method is a method of, for example, contacting a surface of the metal constituting the layer (A-1) or the surface of the electroless plating layer (film) formed by the electroless treatment with an electrolytic plating solution. In the state of being energized, a metal such as copper contained in the electrolytic plating solution is deposited on the surface of the conductive material constituting the layer (A-1) provided on the cathode to form an electrolytic plating layer (metal film).

作為上述電解鍍敷液,例如可列舉含有銅之硫化物、硫酸及水性介質者等。具體而言,可列舉含有硫酸銅、硫酸及水性介質者。 Examples of the electrolytic plating solution include a sulfide containing copper, sulfuric acid, and an aqueous medium. Specific examples include those containing copper sulfate, sulfuric acid, and an aqueous medium.

上述電解鍍敷液較佳為於20~98℃之範圍內使用。 The electrolytic plating solution is preferably used in the range of 20 to 98 °C.

與無電解鍍敷法相比,上述電解鍍敷處理方法不使用高毒性物質,作業性優異,故而較佳。又,與無電解鍍銅相比,電解鍍銅可縮短鍍敷時間,易於控制鍍膜厚度,故而較佳。進而,藉由電解鍍銅所獲得之鍍銅層之力學特性優異,即便彎折亦不易破斷,具有優異之柔韌性,因此於用於撓性印刷電路板之情形時,較佳為使用藉由電解鍍銅法所形成之鍍銅層。 Compared with the electroless plating method, the electrolytic plating treatment method is preferred because it does not use a highly toxic substance and is excellent in workability. Further, electrolytic copper plating is preferable to electroless copper plating because it can shorten the plating time and easily control the thickness of the plating film. Further, the copper plating layer obtained by electrolytic copper plating is excellent in mechanical properties, is not easily broken even when bent, and has excellent flexibility. Therefore, when it is used for a flexible printed circuit board, it is preferably used. A copper plating layer formed by electrolytic copper plating.

關於上述鍍銅層,亦可於鍍銅層上進而積層其他金屬之鍍敷層,若設置鍍鎳層或鍍金層、鍍錫層,則可防止鍍銅層表面發生氧化劣化或腐蝕。 In the copper plating layer, a plating layer of another metal may be laminated on the copper plating layer. If a nickel plating layer, a gold plating layer, or a tin plating layer is provided, oxidative degradation or corrosion of the surface of the copper plating layer can be prevented.

關於利用上述鍍敷法所形成之鍍銅層之厚度,就作為導電層之導電性優異、可應對針對屏蔽印刷電路板之薄膜化要求之方面而言,較佳為0.5~20μm之範圍。又,於利用電解鍍敷法形成鍍銅層之情形時,該層之厚度可藉由控制鍍銅處理步驟中之處理時間、電流密度、鍍敷用添加劑之使用量等而進行調整。 The thickness of the copper plating layer formed by the above plating method is preferably in the range of 0.5 to 20 μm as long as the conductive layer is excellent in electrical conductivity and can be used for the film formation of the shield printed wiring board. Further, in the case where the copper plating layer is formed by electrolytic plating, the thickness of the layer can be adjusted by controlling the processing time in the copper plating treatment step, the current density, the amount of the additive for plating, and the like.

本發明之屏蔽印刷電路板中,於上述鍍銅層、上述層(A-1)及上述層(A-2)之圖案上設置有第二絕緣保護層。作為第二絕緣保護層,包含絕緣樹脂之片材或膜、或絕緣樹脂之塗佈層。作為絕緣樹脂之片 材或膜,可列舉:聚酯膜、聚烯烴膜、聚醯亞胺膜、聚醯胺醯亞胺膜、聚苯硫醚膜、聚萘二甲酸乙二酯膜、液晶聚合物(LCP)膜、聚環烯烴膜等。作為絕緣樹脂之塗佈層,可單獨或以2種以上之組合之形式使用苯乙烯樹脂、乙酸乙烯酯樹脂、聚酯樹脂、聚乙烯或聚丙烯等聚烯烴樹脂,醯胺樹脂、醯胺醯亞胺樹脂、苯乙烯-丁二烯樹脂、丙烯腈-丁二烯樹脂、(甲基)丙烯酸-丁二烯樹脂、(甲基)丙烯酸系樹脂、胺基甲酸酯樹脂等熱塑性樹脂,或酚系樹脂、環氧樹脂、三聚氰胺樹脂、醇酸樹脂等熱硬化性樹脂,或包含胺基甲酸酯-丙烯酸酯、環氧-丙烯酸酯、丙烯醯基丙烯酸酯等之紫外線硬化型樹脂等。該等之中,若考慮到搭載印刷電路板之電子機器於製造時之嚴酷之熱條件(例如回流焊時),較佳為熱硬化性樹脂或紫外線硬化性樹脂,較佳為將環氧樹脂、胺基甲酸酯樹脂、聚酯樹脂、三聚氰胺樹脂、丙烯酸系樹脂、胺基甲酸酯-丙烯酸酯、環氧丙烯酸酯、丙烯醯基丙烯酸酯等單獨或以2種以上之組合之形式、或與交聯劑等組合使用。又,於用作撓性之屏蔽印刷電路板之情形時,較佳為包含胺基甲酸酯樹脂。 In the shield printed wiring board of the present invention, a second insulating protective layer is provided on the copper plating layer, the layer (A-1), and the layer (A-2). As the second insulating protective layer, a sheet or film of an insulating resin or a coating layer of an insulating resin is contained. Sheet as insulating resin The material or film may, for example, be a polyester film, a polyolefin film, a polyimide film, a polyimide film, a polyphenylene sulfide film, a polyethylene naphthalate film, or a liquid crystal polymer (LCP). Membrane, polycycloolefin film, and the like. As the coating layer of the insulating resin, a polyolefin resin such as a styrene resin, a vinyl acetate resin, a polyester resin, a polyethylene or a polypropylene, a guanamine resin or an amidoxime may be used singly or in combination of two or more kinds. a thermoplastic resin such as an imide resin, a styrene-butadiene resin, an acrylonitrile-butadiene resin, a (meth)acrylic-butadiene resin, a (meth)acrylic resin, or a urethane resin, or A thermosetting resin such as a phenol resin, an epoxy resin, a melamine resin or an alkyd resin, or an ultraviolet curable resin such as a urethane-acrylate, an epoxy-acrylate or an acrylic acrylate. Among these, it is preferable to use a thermosetting resin or an ultraviolet curable resin, preferably an epoxy resin, in consideration of the severe thermal conditions (for example, during reflow) of an electronic device on which a printed circuit board is mounted. a urethane resin, a polyester resin, a melamine resin, an acrylic resin, a urethane-acrylate, an epoxy acrylate, an acryl methacrylate, or the like, alone or in combination of two or more kinds, Or used in combination with a crosslinking agent or the like. Further, in the case of being used as a flexible shield printed circuit board, it is preferred to contain a urethane resin.

作為本發明之屏蔽膜之製造方法,例如可列舉如下方法:直接於上述第二絕緣保護層上、或於上述第二絕緣保護層上形成上述高分子層(B)後,利用導電性油墨形成開口率40~95%之開口圖案,於上述開口圖案之開口內部形成開口面積之15~95%之開口內部圖案,僅於上述開口圖案上實施電解鍍銅而形成鍍銅層,於其上形成導電性接著劑層。 The method for producing a barrier film of the present invention includes, for example, a method in which the polymer layer (B) is formed directly on the second insulating protective layer or on the second insulating protective layer, and then formed of a conductive ink. An opening pattern having an opening ratio of 40 to 95%, forming an opening internal pattern of 15 to 95% of an opening area inside the opening of the opening pattern, and performing electrolytic copper plating on the opening pattern to form a copper plating layer, and forming a copper plating layer thereon A conductive adhesive layer.

又,亦可列舉如下方法:於第二絕緣保護層上或設置於第二絕緣保護層上之高分子層(B)上,利用導電性油墨形成開口率40~90%之開口圖案,於上述開口圖案之開口內部形成開口面積之15~95%之圖案,於上述開口圖案上及其開口內部所形成之圖案上實施無電解鍍敷而形成鍍銅層,繼而,僅於上述開口圖案上實施電解鍍銅而形成鍍 銅層,於其上形成導電性接著劑層。 Moreover, a method of forming an opening pattern having an aperture ratio of 40 to 90% by using a conductive ink on the second insulating protective layer or the polymer layer (B) provided on the second insulating protective layer may be mentioned. a pattern of 15 to 95% of the opening area is formed inside the opening of the opening pattern, and electroless plating is performed on the opening pattern and the pattern formed inside the opening to form a copper plating layer, and then only the opening pattern is implemented Electroplating copper to form plating A copper layer on which a conductive adhesive layer is formed.

作為形成上述開口率40~95%之開口圖案、與於上述開口圖案之開口內部形成開口面積之15~95%之圖案的方法,方法(1):利用導電性油墨形成開口圖案後,對開口圖案實施電解鍍銅而形成鍍銅層,繼而,於上述開口圖案之內部利用導電性油墨形成開口面積之15~95%之開口內部圖案;方法(2):使用導電性油墨同時形成開口圖案與開口內部圖案,僅對開口圖案實施電解鍍銅而形成鍍銅層;尤其上述(2)之同時形成開口圖案與開口內部圖案之方法之生產效率優異,故而較佳。於上述(2)之方法之情形時,由於必須僅對開口圖案實施電解鍍銅,故而為了僅使用開口圖案作為電解鍍銅之導電層,較佳為開口圖案與開口內部圖案非接觸。又,關於上述(2)之方法,亦可以如下方法實施:形成開口圖案與開口內部圖案後,利用無電解鍍敷法將開口圖案與開口內部圖案兩者厚膜化後,僅對開口圖案部實施電解鍍銅而形成鍍銅層。於該情形時亦較佳為開口圖案與開口內部圖案非接觸。再者,上述高分子層(B)及上述層(A-1)及上述層(A-2)之形成方法如上所述。 As a method of forming an opening pattern having an opening ratio of 40 to 95% and forming a pattern of 15 to 95% of an opening area inside the opening of the opening pattern, the method (1): forming an opening pattern by using a conductive ink, and opening the opening The pattern is subjected to electrolytic copper plating to form a copper plating layer, and then an open internal pattern of 15 to 95% of the opening area is formed by the conductive ink inside the opening pattern; and the method (2): using the conductive ink to simultaneously form the opening pattern and In the internal pattern of the opening, electrolytic copper plating is performed only on the opening pattern to form a copper plating layer; in particular, the method of forming the opening pattern and the internal pattern of the opening at the same time as (2) is excellent in productivity, and thus is preferable. In the case of the method of the above (2), since it is necessary to perform electrolytic copper plating only on the opening pattern, in order to use only the opening pattern as the conductive layer of electrolytic copper plating, it is preferable that the opening pattern is not in contact with the internal pattern of the opening. Moreover, the method of the above (2) may be carried out by forming an opening pattern and an internal pattern of the opening, and then thickening both the opening pattern and the internal pattern of the opening by electroless plating, and only the opening pattern portion Electrolytic copper plating is performed to form a copper plating layer. In this case, it is also preferred that the opening pattern is not in contact with the internal pattern of the opening. Further, the method for forming the polymer layer (B), the layer (A-1), and the layer (A-2) described above is as described above.

上述第二絕緣保護層如上所述可使用絕緣樹脂之片材或膜、或絕緣樹脂之塗佈層,於塗佈絕緣樹脂而製造第二絕緣保護層之情形時,可使用剝離膜作為支持基材。 As described above, the second insulating protective layer may be a sheet or a film of an insulating resin or a coating layer of an insulating resin. When a second insulating protective layer is formed by applying an insulating resin, a release film may be used as a supporting base. material.

作為上述剝離膜,可使用塑膠膜或剝離紙。作為上述塑膠膜,例如可列舉:聚酯膜、聚烯烴膜、聚醯亞胺膜等,亦可列舉於該等膜上進而設置有聚矽氧系脫模層、氟系脫模層、烯烴系脫模層等之膜。作為上述剝離紙,例如可列舉於紙基材上設置填縫層後,於其上設置聚矽氧系脫模層、氟系脫模層、烯烴系脫模層而成者。 As the release film, a plastic film or a release paper can be used. Examples of the plastic film include a polyester film, a polyolefin film, and a polyimide film. The film may be further provided with a polyfluorene-based release layer, a fluorine-based release layer, and an olefin. It is a film of a release layer or the like. For example, the release paper is provided with a caulking layer on a paper substrate, and a polyfluorene-based release layer, a fluorine-based release layer, and an olefin-based release layer are provided thereon.

作為藉由塗佈所形成之上述第二絕緣保護層,可使用例如塗佈上述所例示之樹脂等而成者,於上述剝離膜上塗佈絕緣樹脂,加以乾 燥,視需要藉由加熱硬化、紫外線硬化使樹脂硬化,而可製造第二絕緣保護層。 As the second insulating protective layer formed by coating, for example, a resin such as the above-exemplified resin may be applied, and an insulating resin may be applied to the release film to be dried. Drying, if necessary, the resin is cured by heat hardening or ultraviolet curing, and a second insulating protective layer can be produced.

本發明之屏蔽膜之製造方法中,於上述鍍銅層上形成導電性接著劑層。作為導電性接著劑層,具體而言可使用上述者,可於鍍銅層圖案上塗佈導電性接著劑,視需要加以乾燥而形成。如此所獲得之屏蔽膜可用作貼附於本發明之屏蔽印刷電路板之最表面之屏蔽膜。 In the method for producing a shielding film of the present invention, a conductive adhesive layer is formed on the copper plating layer. Specifically, as the conductive adhesive layer, the above-mentioned one can be used, and a conductive adhesive can be applied to the copper plating layer pattern and dried as necessary. The shielding film thus obtained can be used as a shielding film attached to the outermost surface of the shielded printed circuit board of the present invention.

對本發明之屏蔽印刷電路板之製造方法進行說明。對於構成本發明之屏蔽印刷電路板之印刷電路板,於印刷電路板基材上形成信號電路及接地電路,於其上設置第一絕緣保護層,上述第一絕緣保護層係使用具有使上述接地電路一部分露出之通孔者。又,於將本發明之屏蔽印刷電路板製成撓性印刷電路板(FPC)之情形時,可適當採用僅基底膜之一面具有印刷電路之單面型FPC、於基底膜之兩面具有印刷電路之兩面型FPC、積層有複數層上述FPC之多層型FPC、具有多層零件搭載部與線纜部之Flex Board(註冊商標)、將構成多層部之構件設為硬質者之軟硬結合(Flex-Rigid)基板、或者用於帶載封裝(tape carrier package)之TAB膠帶等而實施。 A method of manufacturing the shield printed circuit board of the present invention will be described. For the printed circuit board constituting the shield printed circuit board of the present invention, a signal circuit and a ground circuit are formed on the printed circuit board substrate, and a first insulating protective layer is disposed thereon, and the first insulating protective layer is used to have the grounding A part of the circuit is exposed through the hole. Further, in the case where the shield printed circuit board of the present invention is formed into a flexible printed circuit board (FPC), a single-sided FPC having a printed circuit on only one side of the base film and a printed circuit on both sides of the base film can be suitably used. A two-face type FPC, a multi-layer FPC in which a plurality of layers of the FPC are laminated, a Flex Board (registered trademark) having a multi-layer component mounting portion and a cable portion, and a hard-soft combination of a member constituting the multi-layer portion (Flex- Rigid) substrate, or TAB tape for tape carrier package, etc.

以於上述印刷電路板之第一絕緣保護層之上接觸以本發明之屏蔽膜之導電性接著劑層之方式進行配置,藉由將印刷電路板與屏蔽膜沿著相互接近之方向加壓,而使屏蔽膜之導電性接著劑層流動,從而與印刷電路板之接地層連接,藉此可製造本發明之屏蔽印刷電路板。對上述印刷電路板與上述屏蔽膜加壓,使導電性接著劑層流動,而與印刷電路板之接地層實現接合時亦可進行加熱,於上述導電性接著劑含有能夠熱硬化之樹脂之情形時,可根據該樹脂之硬化條件而調整加熱條件。加熱時之溫度通常較佳為50~250℃之範圍。 Arranging on the first insulating protective layer of the printed circuit board in contact with the conductive adhesive layer of the shielding film of the present invention, by pressing the printed circuit board and the shielding film in a direction close to each other, The conductive adhesive layer of the shielding film is flowed to be connected to the ground layer of the printed circuit board, whereby the shield printed circuit board of the present invention can be manufactured. The printed circuit board and the shielding film are pressed to flow the conductive adhesive layer, and may be heated when bonding to the ground layer of the printed circuit board, and the conductive adhesive contains a resin capable of thermally hardening. At the time, the heating conditions can be adjusted according to the curing conditions of the resin. The temperature at the time of heating is usually preferably in the range of 50 to 250 °C.

再者,本發明之屏蔽印刷電路板可為於印刷電路板之單面貼附有屏蔽膜之構成、或於兩面貼附有屏蔽膜之構成。 Furthermore, the shield printed circuit board of the present invention may have a configuration in which a shielding film is attached to one surface of the printed circuit board, or a shielding film is attached to both surfaces.

[實施例] [Examples]

以下,藉由實施例而詳細地說明本發明。 Hereinafter, the present invention will be described in detail by way of examples.

[導電性油墨(1)之製備] [Preparation of Conductive Ink (1)]

於乙二醇35質量份與離子交換水65質量份之混合溶劑中,使用對聚伸乙基亞胺加成聚氧乙烯所獲得之化合物作為分散劑而使平均粒徑20nm之銀粒子分散,藉此製備含有金屬奈米粒子、與具有含鹼性氮原子之基作為反應性官能基之高分子分散劑的金屬奈米粒子分散液。繼而,於所獲得之金屬奈米粒子分散液中添加離子交換水及界面活性劑而將其黏度調整為11mPa.s,藉此製備噴墨印刷用之導電性油墨(1)。 In a mixed solvent of 35 parts by mass of ethylene glycol and 65 parts by mass of ion-exchanged water, a silver compound having an average particle diameter of 20 nm is dispersed by using a compound obtained by adding polyoxyethylene to polyethylenimine as a dispersing agent. Thus, a metal nanoparticle dispersion liquid containing metal nanoparticles and a polymer dispersant having a basic nitrogen atom-containing group as a reactive functional group was prepared. Then, the ion exchange water and the surfactant were added to the obtained metal nanoparticle dispersion to adjust the viscosity to 11 mPa. s, thereby preparing a conductive ink (1) for inkjet printing.

[第二絕緣保護層用樹脂之製造] [Manufacture of resin for second insulating protective layer]

於具備溫度計、氮氣導入管及攪拌器之經氮氣置換之容器中,使聚酯多元醇100質量份(使1,4-環己烷二甲醇、新戊二醇及己二酸進行反應所獲得之聚酯多元醇,羥基當量1,000g/當量)、2,2-二羥甲基丙酸17.4質量份、1,4-環己烷二甲醇21.7質量份及二環己基甲烷二異氰酸酯106.2質量份於甲基乙基酮178質量份中進行混合而使之反應,藉此獲得於分子末端具有異氰酸酯基之胺基甲酸酯預聚物之有機溶劑溶液。 100 parts by mass of a polyester polyol (reaction of 1,4-cyclohexanedimethanol, neopentyl glycol, and adipic acid) in a nitrogen-substituted vessel equipped with a thermometer, a nitrogen gas introduction tube, and a stirrer Polyester polyol, hydroxyl equivalent weight: 1,000 g/eq), 17.2 parts by weight of 2,2-dimethylolpropionic acid, 21.7 parts by mass of 1,4-cyclohexanedimethanol, and 106.2 parts by mass of dicyclohexylmethane diisocyanate The mixture was mixed with 178 parts by mass of methyl ethyl ketone to cause a reaction, thereby obtaining an organic solvent solution of a urethane prepolymer having an isocyanate group at the molecular terminal.

繼而,藉由向上述所獲得之胺基甲酸酯預聚物之有機溶劑溶液中添加三乙基胺13.3質量份,而將上述胺基甲酸酯樹脂所具有之羧基之一部分或全部中和,進而添加水277質量份,充分攪拌,藉此獲得具有羧基之胺基甲酸酯樹脂之水分散液。 Then, by adding 13.3 parts by mass of triethylamine to the organic solvent solution of the urethane prepolymer obtained above, part or all of the carboxyl group of the above urethane resin is partially or completely neutralized. Further, 277 parts by mass of water was added and stirred sufficiently to obtain an aqueous dispersion of a urethane resin having a carboxyl group.

藉由向上述所獲得之胺基甲酸酯樹脂之水分散液中添加25質量%之乙二胺水溶液8質量份並攪拌,而使胺基甲酸酯樹脂鏈伸長,繼而進行老化、脫溶劑,藉此獲得固形物成分30質量%之胺基甲酸酯樹脂之水分散液。繼而,於所獲得之胺基甲酸酯樹脂之水分散液333質量 份中添加山梨糖醇聚縮水甘油醚(環氧當量170)30質量份,加以混合而獲得第二絕緣保護層用樹脂溶液。 By adding 8 parts by mass of a 25% by mass aqueous solution of ethylenediamine to the aqueous dispersion of the urethane resin obtained above and stirring, the urethane resin chain is elongated, followed by aging and solvent removal. Thus, an aqueous dispersion of a urethane resin having a solid content of 30% by mass was obtained. Then, the quality of the aqueous dispersion 333 of the obtained urethane resin To the mixture, 30 parts by mass of sorbitol polyglycidyl ether (epoxy equivalent 170) was added and mixed to obtain a resin solution for a second insulating protective layer.

[高分子層(B-1)用樹脂之製造] [Manufacture of Resin for Polymer Layer (B-1)]

於具備攪拌機、回流冷卻管、氮氣導入管、溫度計、單體混合物滴下用滴液漏斗及聚合觸媒滴下用滴液漏斗之反應容器中添加乙酸乙酯180質量份,一面吹送氮氣一面升溫至80℃。於升溫至80℃之反應容器內,於攪拌下,一面將反應容器內溫度保持於80±1℃,一面分別自不同之滴液漏斗歷時240分鐘滴下含有甲基丙烯酸甲酯60質量份、丙烯酸正丁酯10質量份及甲基丙烯酸縮水甘油酯30質量份之乙烯基單體混合物、與含有偶氮異丁腈1質量份及乙酸乙酯20質量份之聚合起始劑溶液而進行聚合。滴下結束後,於同溫度下攪拌120分鐘後,將上述反應容器內之溫度冷卻至30℃,繼而,以不揮發成分成為10質量%之方式添加乙酸乙酯,而獲得含有環氧基作為反應性官能基之高分子層(B-1)用樹脂。 180 parts by mass of ethyl acetate was added to a reaction vessel equipped with a mixer, a reflux cooling tube, a nitrogen gas introduction tube, a thermometer, a monomer mixture, a dropping funnel, and a dropping funnel for dropping a polymerization catalyst, and the temperature was raised to 80 while blowing nitrogen gas. °C. In a reaction vessel heated to 80 ° C, while maintaining the temperature in the reaction vessel at 80 ± 1 ° C while stirring, 60 parts by mass of methyl methacrylate and acrylic acid were dropped from different dropping funnels over 240 minutes. The mixture of 10 parts by mass of n-butyl ester and 30 parts by mass of glycidyl methacrylate was polymerized with a polymerization initiator solution containing 1 part by mass of azoisobutyronitrile and 20 parts by mass of ethyl acetate. After the completion of the dropwise addition, the mixture was stirred at the same temperature for 120 minutes, and then the temperature in the reaction vessel was cooled to 30 ° C. Then, ethyl acetate was added so that the nonvolatile content was 10% by mass, and an epoxy group was obtained as a reaction. A resin for the polymer layer (B-1) having a functional group.

[高分子層(B-2)用樹脂之製造] [Manufacture of Resin for Polymer Layer (B-2)]

於具備攪拌機、回流冷卻管、氮氣導入管、溫度計之反應容器中,使聚碳酸酯多元醇(使1,4-環己烷二甲醇與碳酸酯進行反應所獲得之酸基當量1000g/當量之聚碳酸酯二醇)100質量份、2,2-二羥甲基丙酸9.7質量份、1,4-環己烷二甲醇5.5質量份及二環己基甲烷二異氰酸酯51.4質量份於甲基乙基酮111質量份之混合溶劑中進行反應,藉此獲得於分子末端具有異氰酸酯基之胺基甲酸酯預聚物之有機溶劑溶液。 In a reaction vessel equipped with a stirrer, a reflux cooling tube, a nitrogen introduction tube, and a thermometer, the polycarbonate polyol (the acid group equivalent obtained by reacting 1,4-cyclohexanedimethanol with a carbonate is 1000 g/eq. 100 parts by mass of polycarbonate diol), 9.7 parts by mass of 2,2-dimethylolpropionic acid, 5.5 parts by mass of 1,4-cyclohexanedimethanol, and 51.4 parts by mass of dicyclohexylmethane diisocyanate in methyl ethyl The reaction is carried out in 111 parts by mass of a ketone in a mixed solvent, whereby an organic solvent solution of a urethane prepolymer having an isocyanate group at a molecular terminal is obtained.

繼而,藉由於上述胺基甲酸酯樹脂之有機溶劑溶液中添加三乙基胺7.3質量份而將上述胺基甲酸酯樹脂所具有之羧基之一部分或全部中和,進而添加水355質量份,充分攪拌,藉此獲得胺基甲酸酯樹脂之水性分散液。 Then, by adding 7.3 parts by mass of triethylamine to the organic solvent solution of the urethane resin, one or all of the carboxyl groups of the urethane resin are partially or completely neutralized, and 355 parts by mass of water is further added. Stir well, thereby obtaining an aqueous dispersion of the urethane resin.

繼而,藉由向上述水性分散液中添加25質量%之乙二胺水溶液4.3質量份並攪拌,而使粒子狀之聚胺基甲酸酯樹脂鏈伸長,繼而進行老化、脫溶劑,藉此獲得固形物成分濃度30質量%之胺基甲酸酯樹脂之水性分散液。 Then, by adding 4.3 parts by mass of a 25% by mass aqueous solution of ethylenediamine to the aqueous dispersion and stirring, the particulate polyurethane resin chain is elongated, followed by aging and solvent removal, thereby obtaining An aqueous dispersion of a urethane resin having a solid content concentration of 30% by mass.

於具備攪拌機、回流冷卻管、氮氣導入管、溫度計、單體混合物滴下用滴液漏斗及聚合觸媒滴下用滴液漏斗之反應容器中添加去離子水140質量份、上述所獲得之胺基甲酸酯樹脂之水分散液100質量份,一面吹送氮氣一面升溫至80℃。於升溫至80℃之反應容器內,於攪拌下,一面將反應容器內溫度保持於80±2℃,一面分別自不同之滴液漏斗歷時120分鐘滴下含有甲基丙烯酸甲酯60質量份、丙烯酸正丁酯30質量份、N-正丁氧基甲基丙烯醯胺10質量份之單體混合物、與過硫酸銨水溶液(濃度:0.5質量%)20質量份而進行聚合。 140 parts by mass of deionized water was added to a reaction vessel equipped with a mixer, a reflux cooling tube, a nitrogen gas introduction tube, a thermometer, a monomer mixture, a dropping funnel, and a dropping funnel for dropping a polymerization catalyst, and the obtained amine group A was obtained. 100 parts by mass of the aqueous dispersion of the acid ester resin was heated to 80 ° C while blowing nitrogen gas. In a reaction vessel heated to 80 ° C, while maintaining the temperature in the reaction vessel at 80 ± 2 ° C while stirring, 60 parts by mass of methyl methacrylate and acrylic acid were dropped from different dropping funnels over a period of 120 minutes. The monomer mixture of 30 parts by mass of n-butyl ester and 10 parts by mass of N-n-butoxymethyl acrylamide was polymerized with 20 parts by mass of an aqueous solution of ammonium persulfate (concentration: 0.5% by mass).

滴下結束後,於同溫度下攪拌60分鐘,其後將上述反應容器內之溫度冷卻至40℃,繼而,以不揮發成分成為20質量%之方式添加去離子水後,利用200網眼濾布進行過濾,藉此獲得含有羧基與N-正丁氧基甲基丙烯醯胺基作為反應性官能基之高分子層(B-2)用樹脂。 After the completion of the dropwise addition, the mixture was stirred at the same temperature for 60 minutes, and then the temperature in the reaction vessel was cooled to 40 ° C. Then, deionized water was added so that the nonvolatile content became 20% by mass, and then 200 mesh filter cloth was used. Filtration was carried out to obtain a resin for a polymer layer (B-2) containing a carboxyl group and an N-n-butoxymethyl acrylamide group as a reactive functional group.

[導電性接著劑用樹脂之製造] [Manufacture of Resin for Conductive Adhesive]

於具備溫度計、氮氣導入管及攪拌器之經氮氣置換之容器中,使聚酯多元醇100質量份(使1,4-環己烷二甲醇、新戊二醇及己二酸進行反應所獲得之聚酯多元醇,羥基當量1000g/當量)、2,2-二羥甲基丙酸17.4質量份、1,4-環己烷二甲醇21.7質量份及二環己基甲烷二異氰酸酯106.2質量份於甲基乙基酮178質量份中進行混合而使之反應,藉此獲得於分子末端具有異氰酸酯基之胺基甲酸酯樹脂。繼而,於所獲得之胺基甲酸酯樹脂中添加甲基乙基酮,而獲得固形物成分50質量%之胺基甲酸酯樹脂之有機溶劑溶液。 100 parts by mass of a polyester polyol (reaction of 1,4-cyclohexanedimethanol, neopentyl glycol, and adipic acid) in a nitrogen-substituted vessel equipped with a thermometer, a nitrogen gas introduction tube, and a stirrer a polyester polyol having a hydroxyl group equivalent of 1000 g/eq.), 17.4 parts by mass of 2,2-dimethylolpropionic acid, 21.7 parts by mass of 1,4-cyclohexanedimethanol, and 106.2 parts by mass of dicyclohexylmethane diisocyanate. The 178 parts by mass of methyl ethyl ketone was mixed and reacted, whereby a urethane resin having an isocyanate group at the molecular terminal was obtained. Then, methyl ethyl ketone was added to the obtained urethane resin to obtain an organic solvent solution of a urethane resin having a solid content of 50% by mass.

[導電性接著劑之製備] [Preparation of Conductive Adhesive]

於上述所獲得之胺基甲酸酯樹脂之有機溶劑溶液200質量份中添加雙酚A型環氧樹脂(環氧當量180)20質量份進行混合,進而添加銀填料(大研化學工業股份有限公司製造之「S-201」)80質量份進行混合,而製備導電性接著劑。 To 200 parts by mass of the organic solvent solution of the urethane resin obtained above, 20 parts by mass of a bisphenol A type epoxy resin (epoxy equivalent weight 180) is added and mixed, and then a silver filler is added (Dayan Chemical Industry Co., Ltd.) 80 parts by mass of "S-201" manufactured by the company was mixed to prepare a conductive adhesive.

(實施例1) (Example 1)

使用如下印刷電路板:於作為印刷電路基板之聚醯亞胺製基底膜上形成包含銅厚12μm、線寬500μm之接地用銅電路圖案、與銅厚12μm、線寬150μm之信號用銅電路圖案的電路,將信號電路與接地電路之線間距分別設為100μm,將電路長設為100mm,進而由膜厚15μm之接著劑層與膜厚12.5μm之聚醯亞胺製膜層形成膜厚27.5μm之第一絕緣保護層,並於接地電路部設置400μm見方之開口部。 A printed circuit board is used in which a copper circuit pattern having a thickness of 12 μm and a line width of 500 μm and a copper circuit pattern having a thickness of 12 μm and a line width of 150 μm are formed on a base film made of a polyimide substrate. In the circuit, the line spacing between the signal circuit and the ground circuit is set to 100 μm, the circuit length is set to 100 mm, and the film thickness of the adhesive layer of 15 μm and the film thickness of 12.5 μm is formed into a film thickness of 27.5. The first insulating protective layer of μm is provided with an opening of 400 μm square in the grounding circuit portion.

作為屏蔽膜,於經脫模處理之聚酯膜上以乾燥後膜厚成為5μm之方式塗佈上述所製造之第二絕緣保護層用樹脂,加以乾燥而形成第二絕緣保護層。繼而,以乾燥後膜厚成為0.2μm之方式塗佈上述所製造之高分子層(B-1)用樹脂,加以乾燥而形成高分子層(B-1)。 As the shielding film, the resin for the second insulating protective layer produced as described above was applied onto the polyester film which had been subjected to the release treatment so as to have a film thickness of 5 μm after drying, and dried to form a second insulating protective layer. Then, the resin for the polymer layer (B-1) produced as described above was applied so as to have a film thickness after drying of 0.2 μm, and dried to form a polymer layer (B-1).

繼而,於利用上述方法所形成之積層有高分子層(B-1)之第二絕緣保護層上,使用噴墨印表機(Konica Minolta股份有限公司製造之噴墨試驗機「EB100」,評價用列印頭KM512L,噴出量14pL),為了使屏蔽印刷電路板之特性阻抗成為80Ω而以如下方式印刷上述所獲得之導電性油墨(1),即,印刷線寬90μm、開口率82%之格子圖案,並於其開口內部以不與格子圖案部接觸之方式印刷面積相對於開口部面積為68%之四角形之非開口部。將所印刷之圖案之俯視圖示於圖5。繼而,於120℃下進行20分鐘之焙燒,藉此形成具有開口率82%之格子圖案並於其開口內部具有四角形之非開口部的包含導電性油墨(1)之層(膜厚0.2μm)。 Then, on the second insulating protective layer in which the polymer layer (B-1) was laminated by the above method, an ink jet printer ("100100" manufactured by Konica Minolta Co., Ltd.) was used for evaluation. With the print head KM512L, the discharge amount is 14 pL), the conductive ink (1) obtained above is printed in such a manner that the characteristic impedance of the shield printed circuit board is 80 Ω, that is, the print line width is 90 μm and the aperture ratio is 82%. In the lattice pattern, a non-opening portion having a square shape of 68% with respect to the opening portion area is printed in the opening without contacting the lattice pattern portion. A top view of the printed pattern is shown in FIG. Then, baking was performed at 120 ° C for 20 minutes to form a layer containing a conductive ink (1) having a square pattern having an opening ratio of 82% and having a square-shaped non-opening inside the opening (film thickness: 0.2 μm) .

繼而,將上述所獲得之包含導電性油墨(1)之層之格子圖案部設 定為陰極,將含磷銅設定為陽極,使用含有硫酸銅之電解鍍敷液,以電流密度2A/dm2進行10分鐘之電解鍍銅,藉此於包含導電性油墨之層之表面之僅格子圖案部積層厚度5μm之鍍銅層。作為上述電解鍍銅液,使用硫酸銅70g/L、硫酸200g/L、氯離子50mg/L、添加劑(奧野製藥工業股份有限公司製造之「Top Lucina SF-M」)5ml/L。電解鍍銅後之格子圖案部之線寬為100μm,開口率為80%,開口內部之包含導電性油墨之層(開口內部圖案)之面積為開口面積之71%。 Then, the lattice pattern portion of the layer containing the conductive ink (1) obtained above was set as a cathode, phosphorus-containing copper was set as an anode, and an electrolytic plating solution containing copper sulfate was used at a current density of 2 A/dm 2 . Electrolytic copper plating was carried out for 10 minutes to form a copper plating layer having a thickness of 5 μm in a lattice pattern only portion of the surface of the layer containing the conductive ink. As the electrolytic copper plating solution, 70 g/L of copper sulfate, 200 g/L of sulfuric acid, 50 mg/L of chloride ion, and 5 ml/L of an additive ("Top Lucina SF-M" manufactured by Okuno Pharmaceutical Co., Ltd.) were used. The grid pattern portion after electrolytic copper plating had a line width of 100 μm and an aperture ratio of 80%, and the area of the layer containing the conductive ink (opening inner pattern) inside the opening was 71% of the opening area.

繼而,於包括上述所獲得之形成於第二絕緣保護層上之開口率80%之格子圖案之鍍銅層及開口內部之非開口部之導電性油墨圖案的整個面上,以乾燥後膜厚成為5μm之方式塗佈上述所製造之導電性接著劑,加以乾燥而製作屏蔽膜。 Then, the film thickness after drying is included on the entire surface of the conductive ink pattern including the copper plating layer of the lattice pattern of 80% of the opening ratio formed on the second insulating protective layer and the non-opening portion inside the opening. The conductive adhesive prepared above was applied to a thickness of 5 μm, and dried to prepare a shielding film.

繼而,將上述所獲得之於接地電路部設置有開口部之印刷電路板與上述所獲得之屏蔽膜以於印刷電路板之絕緣保護層之上接觸屏蔽膜之導電性接著劑層之方式進行配置,對印刷電路板與屏蔽膜沿使之相互接近之方向加壓(壓力:1.96MPa,加熱溫度:150℃,處理時間:30分鐘)而進行壓接,使屏蔽膜之導電性接著劑層流動而與印刷電路板之接地層連接,製作屏蔽印刷電路板。 Then, the printed circuit board provided with the opening portion of the ground circuit portion and the obtained shielding film are disposed so as to contact the conductive adhesive layer of the shielding film over the insulating protective layer of the printed circuit board. And pressing the printed circuit board and the shielding film in a direction in which they are close to each other (pressure: 1.96 MPa, heating temperature: 150 ° C, processing time: 30 minutes), and crimping the conductive adhesive layer of the shielding film And connected to the ground plane of the printed circuit board to make a shield printed circuit board.

(實施例2~4) (Examples 2 to 4)

代替實施例1中所使用之印刷電路板,使用表1所示之信號用銅電路之圖案寬度者。又,代替實施例1中所使用之屏蔽膜,使用表1所示之高分子層(B)用樹脂,進而,為了使屏蔽印刷電路板之特性阻抗成為80Ω,將鍍銅層之開口率、相對於鍍銅層之開口面積的開口內部之導電性油墨層(開口內部圖案)之面積比率設為如表1所示,除此以外,藉由與實施例1相同之方式製作屏蔽印刷電路板。 Instead of the printed circuit board used in the embodiment 1, the pattern width of the copper circuit for signal shown in Table 1 was used. In addition, in place of the shielding film used in the first embodiment, the resin for the polymer layer (B) shown in Table 1 is used, and in order to make the characteristic impedance of the shield printed wiring board 80 Ω, the aperture ratio of the copper plating layer is A shield printed circuit board was produced in the same manner as in Example 1 except that the area ratio of the conductive ink layer (opening internal pattern) inside the opening of the opening area of the copper plating layer was as shown in Table 1. .

(實施例5) (Example 5)

代替實施例1中所使用之印刷電路板,使用表1所示之信號用銅 電路之圖案寬度者。作為屏蔽膜,於經脫模處理之聚酯膜上以乾燥後膜厚成為5μm之方式塗佈上述所製造之第二絕緣保護層用樹脂,加以乾燥而形成第二絕緣保護層。繼而,於利用上述方法所形成之第二絕緣保護層上,使用與實施例1相同之裝置,為了使屏蔽印刷電路板之特性阻抗成為80Ω而以如下方式印刷導電性油墨(1),即,印刷線寬90μm、開口率58%之格子圖案,並於其開口內部以不與格子圖案部接觸之方式印刷面積相對於開口部面積為40%之四角形之非開口部。繼而,於120℃下進行20分鐘之焙燒,藉此形成具有開口率58%之格子圖案並於其開口內部具有四角形之非開口部的包含導電性油墨(1)之層(膜厚0.2μm)。 Instead of the printed circuit board used in Example 1, the signal copper shown in Table 1 was used. The pattern width of the circuit. As the shielding film, the resin for the second insulating protective layer produced as described above was applied onto the polyester film which had been subjected to the release treatment so as to have a film thickness of 5 μm after drying, and dried to form a second insulating protective layer. Then, on the second insulating protective layer formed by the above method, using the same apparatus as in the first embodiment, the conductive ink (1) is printed in such a manner that the characteristic impedance of the shield printed circuit board is 80 Ω, that is, A grid pattern having a line width of 90 μm and an aperture ratio of 58% was printed, and a non-opening portion having a quadrangular shape with an area of 40% with respect to the area of the opening was printed so as not to be in contact with the lattice pattern portion. Then, baking was performed at 120 ° C for 20 minutes to form a layer containing a conductive ink (1) having a square pattern having an opening ratio of 58% and having a square-shaped non-opening inside the opening (film thickness: 0.2 μm) .

繼而,將上述所獲得之包含導電性油墨(1)之層之格子圖案部設定為陰極,將含磷銅設定為陽極,藉由與實施例1相同之方式於包含導電性油墨之層之表面之僅格子圖案部積層厚度5μm之鍍銅層。電解鍍銅後之格子圖案部之線寬為100μm,開口率為56%,開口內部之包含導電性油墨之層(開口內部圖案)之面積為開口面積之43%。 Then, the lattice pattern portion of the layer containing the conductive ink (1) obtained above was set as a cathode, and phosphorus-containing copper was set as an anode, and the surface of the layer containing the conductive ink was applied in the same manner as in Example 1. Only the lattice pattern portion was laminated with a copper plating layer having a thickness of 5 μm. The grid pattern portion after electrolytic copper plating had a line width of 100 μm and an aperture ratio of 56%, and the area of the layer containing the conductive ink (opening inner pattern) inside the opening was 43% of the opening area.

繼而,於包括上述所獲得之形成於第二絕緣保護層上之開口率56%之格子圖案之鍍銅層及開口內部之非開口部之導電性油墨圖案的整個面上,以乾燥後膜厚成為5μm之方式塗佈上述所製造之導電性接著劑,加以乾燥而製作屏蔽膜。 Then, the film thickness after drying is included on the entire surface of the conductive ink pattern including the copper plating layer of the lattice pattern having the opening ratio of 56% formed on the second insulating protective layer and the non-opening portion inside the opening. The conductive adhesive prepared above was applied to a thickness of 5 μm, and dried to prepare a shielding film.

繼而,將於接地電路部設置有開口部之印刷電路板與上述所獲得之屏蔽膜藉由與實施例1相同之方式壓接於印刷電路板之絕緣保護層之上,使屏蔽膜之導電性接著劑層流動而與印刷電路板之接地層連接,製作屏蔽印刷電路板。 Then, the printed circuit board provided with the opening portion in the ground circuit portion and the obtained shielding film are crimped onto the insulating protective layer of the printed circuit board in the same manner as in the first embodiment, so that the conductivity of the shielding film is made. The layer is then flowed and connected to the ground plane of the printed circuit board to form a shield printed circuit board.

(實施例6) (Example 6)

代替實施例1中所使用之印刷電路板,使用表1所示之信號用銅電路之圖案寬度者。又,代替實施例1中所使用之屏蔽膜,使用表1所 示之高分子層(B)用樹脂。繼而,於利用上述方法所形成之積層有高分子層(B-1)之第二絕緣保護層上,使用與實施例1相同之裝置,為了使屏蔽印刷電路板之特性阻抗成為80Ω而以如下方式印刷導電性油墨(1),即,印刷線寬90μm、開口率74%之格子圖案,並於其開口內部以不與格子圖案部接觸之方式印刷面積相對於開口部面積為69%之四角形之非開口部。繼而,於120℃下進行20分鐘之焙燒,藉此形成具有開口率74%之格子圖案並於其開口內部具有四角形之非開口部的包含導電性油墨(1)之層(膜厚0.05μm)。 Instead of the printed circuit board used in the embodiment 1, the pattern width of the copper circuit for signal shown in Table 1 was used. Further, instead of the shielding film used in Example 1, Table 1 was used. A resin for the polymer layer (B) is shown. Then, on the second insulating protective layer in which the polymer layer (B-1) was laminated by the above method, the same apparatus as in Example 1 was used, and the characteristic impedance of the shield printed wiring board was 80 Ω as follows. The printed conductive ink (1), that is, a grid pattern having a line width of 90 μm and an aperture ratio of 74%, and a square shape in which the printing area is 69% with respect to the opening area without contacting the lattice pattern portion. Non-opening. Then, baking was performed at 120 ° C for 20 minutes to form a layer containing a conductive ink (1) having a lattice pattern having an opening ratio of 74% and having a square-shaped non-opening inside the opening (film thickness: 0.05 μm) .

繼而,於上述所獲得之具有格子圖案並於其開口內部之具有四角形之非開口部的包含導電性油墨(1)之層(膜厚0.05μm)上實施無電解鍍銅,而形成厚度0.2μm之無電解鍍銅膜。再者,無電解鍍銅係藉由如下方式進行:將ARG(arginine,精胺酸)銅(奧野製藥工業股份有限公司製造)於標準推薦條件(ARG銅1:30ml/L,ARG銅2:15ml/L,ARG銅3:200ml/L)下建浴,浴溫保持於45℃,將上述被鍍敷物(導電性油墨層)於其中浸漬15分鐘而使鍍銅膜析出。 Then, electroless copper plating was performed on the layer (thickness: 0.05 μm) containing the conductive ink (1) having a square pattern and having a non-opening portion having a square shape inside the opening, and the thickness was 0.2 μm. Electroless copper plating film. Further, electroless copper plating is carried out by using ARG (arginine, arginine) copper (manufactured by Okuno Pharmaceutical Co., Ltd.) under standard recommended conditions (ARG copper 1:30 ml/L, ARG copper 2: 15 ml/L, ARG copper 3: 200 ml/L) was bathed, the bath temperature was maintained at 45 ° C, and the plated material (conductive ink layer) was immersed therein for 15 minutes to precipitate a copper plating film.

繼而,將上述所獲得之於包含導電性油墨(1)之層上形成有無電解鍍銅膜之格子圖案部設定為陰極,將含磷銅設定為陽極,藉由與實施例1相同之方式於包含無電解鍍銅膜之層之表面之僅格子圖案部積層厚度3μm之鍍銅膜。電解鍍銅後之格子圖案部之線寬為97μm,開口率為72%,開口內部之包含無電解鍍銅膜之層(開口內部圖案)之面積為開口面積之70%,膜厚為0.2μm。 Then, the lattice pattern portion in which the electroless copper plating film was formed on the layer containing the conductive ink (1) was set as a cathode, and the phosphorus-containing copper was set as an anode, and the same manner as in Example 1 was carried out. A copper plating film having a lattice pattern layer thickness of only 3 μm on the surface of the layer of the electroless copper plating film. The grid pattern portion after electrolytic copper plating has a line width of 97 μm and an aperture ratio of 72%. The area of the layer containing the electroless copper plating film (opening internal pattern) inside the opening is 70% of the opening area, and the film thickness is 0.2 μm. .

繼而,於包括上述所獲得之形成於第二絕緣保護層上之開口率72%之格子圖案之鍍銅層及開口內部之非開口部之包含無電解鍍銅膜之層的整個面上,以乾燥後膜厚成為5μm之方式塗佈上述所製造之導電性接著劑,加以乾燥而製作屏蔽膜。 Then, the copper plating layer including the lattice pattern of 72% of the aperture ratio formed on the second insulating protective layer obtained above and the non-opening portion of the interior of the opening including the layer of the electroless copper plating film are The conductive adhesive prepared above was applied so as to have a film thickness of 5 μm after drying, and dried to prepare a barrier film.

繼而,將於接地電路部設置有開口部之印刷電路板與上述所獲 得之屏蔽膜藉由與實施例1相同之方式壓接於印刷電路板之絕緣保護層上,使屏蔽膜之導電性接著劑層流動而與印刷電路板之接地層連接,製作屏蔽印刷電路板。 Then, the printed circuit board provided with the opening portion in the ground circuit portion and the above obtained The obtained shielding film is pressure-bonded to the insulating protective layer of the printed circuit board in the same manner as in the first embodiment, and the conductive adhesive layer of the shielding film is flowed to be connected to the ground layer of the printed circuit board to form a shield printed circuit board. .

(比較例1) (Comparative Example 1)

代替實施例1中所使用之印刷電路板,使用將信號用銅電路圖案之線寬設為表1中記載之線寬的印刷電路板。又,代替實施例1中所使用之屏蔽膜,為了使開口率成為0%,於膜厚5μm之壓延銅箔上以乾燥後膜厚成為5μm之方式塗佈上述所獲得之第二絕緣保護層用樹脂,加以乾燥而形成第二絕緣保護層。繼而,於壓延銅箔之與形成有第二絕緣保護層之面相反之面上,以乾燥後膜厚成為5μm之方式塗佈上述所獲得之導電性接著劑,加以乾燥而製作具有開口率0%之銅層之屏蔽膜。 Instead of the printed circuit board used in the first embodiment, a printed circuit board in which the line width of the signal copper circuit pattern is set to the line width described in Table 1 is used. Further, in place of the shielding film used in Example 1, the second insulating protective layer obtained was applied to the rolled copper foil having a thickness of 5 μm so as to have a film thickness after drying of 5 μm in order to have an aperture ratio of 0%. The second insulating protective layer is formed by drying with a resin. Then, the conductive adhesive obtained above was applied to the surface of the rolled copper foil opposite to the surface on which the second insulating protective layer was formed so as to have a film thickness after drying of 5 μm, and dried to have an aperture ratio of 0. Shielding film of % copper layer.

繼而,將設為表1中記載之信號用銅電路圖案之線寬且於接地電路部設置有400μm見方之開口部的印刷電路板、與上述所獲得之屏蔽膜以於印刷電路板之絕緣保護層之上接觸屏蔽膜之導電性接著劑層之方式進行配置,對印刷電路板與屏蔽膜沿使之相互接近之方向加壓(壓力:1.96MPa,加熱溫度:150℃,處理時間:30分鐘)而進行壓接,使屏蔽膜之導電性接著劑層流動而與印刷電路板之接地層連接,製作屏蔽印刷電路板。 Then, a printed circuit board having a line width of a signal copper circuit pattern described in Table 1 and having an opening portion of 400 μm square in the ground circuit portion, and the above-obtained shielding film for insulation protection of the printed circuit board are provided. The layer is placed on the layer in contact with the conductive adhesive layer of the shielding film, and the printed circuit board and the shielding film are pressed in a direction close to each other (pressure: 1.96 MPa, heating temperature: 150 ° C, processing time: 30 minutes) The pressure-sensitive adhesive layer is connected to the ground layer of the printed circuit board to form a shield printed circuit board.

(比較例2) (Comparative Example 2)

代替比較例1中所使用之印刷電路板,將信號用銅電路圖案之線寬設為表1中記載之線寬,除此以外,以與上述比較例1相同之方式製作開口率0%之比較用屏蔽印刷電路板。 An aperture ratio of 0% was produced in the same manner as in Comparative Example 1, except that the printed circuit board used in Comparative Example 1 was set to have the line width of the copper circuit pattern for the signal as shown in Table 1. Compare shielded printed circuit boards.

[比較用之導電性油墨(R1)用樹脂之製造] [Manufacture of Resin for Conductive Ink (R1) for Comparison]

於具備攪拌機、溫度計、回流冷卻器、滴下裝置及氮氣導入管之反應容器中,添加由己二酸、對苯二甲酸及3-甲基-1,5-戊二醇所獲 得之數量平均分子量為1006之二醇414質量份、二羥甲基丁酸8質量份、異佛爾酮二異氰酸酯145質量份、及甲苯40質量份,於氮氣氛圍中90℃下反應3小時。繼而,於該反應溶液中進而添加甲苯300質量份,而獲得末端具有異氰酸酯基之胺基甲酸酯預聚物之溶液。 Adding adipic acid, terephthalic acid and 3-methyl-1,5-pentanediol to a reaction vessel equipped with a stirrer, a thermometer, a reflux cooler, a dropping device and a nitrogen inlet tube 414 parts by mass of a diol having a number average molecular weight of 1006, 8 parts by mass of dimethylolbutanoic acid, 145 parts by mass of isophorone diisocyanate, and 40 parts by mass of toluene, and reacted at 90 ° C for 3 hours in a nitrogen atmosphere. . Then, 300 parts by mass of toluene was further added to the reaction solution to obtain a solution of a urethane prepolymer having an isocyanate group at the end.

繼而,於將異佛爾酮二胺27質量份、二正丁基胺3質量份、2-丙醇342質量份及甲苯576質量份加以混合所獲得之混合物中,添加上述所獲得之胺基甲酸酯預聚物之溶液816質量份,於70℃下反應3小時而獲得聚胺基甲酸酯聚脲樹脂之溶液。於其中添加甲苯144質量份及2-丙醇72質量份,獲得聚胺基甲酸酯聚脲樹脂之固形物成分30質量%之比較用之導電性油墨(R1)用樹脂溶液。 Then, in the mixture obtained by mixing 27 parts by mass of isophoronediamine, 3 parts by mass of di-n-butylamine, 342 parts by mass of 2-propanol, and 576 parts by mass of toluene, the amine group obtained above is added. A solution of the formate prepolymer of 816 parts by mass was reacted at 70 ° C for 3 hours to obtain a solution of a polyurethane urethane resin. 144 parts by mass of toluene and 72 parts by mass of 2-propanol were added thereto to obtain a resin solution for a conductive ink (R1) for comparison of 30% by mass of the solid content of the polyurethane urethane resin.

[比較用之導電性油墨(R1)之製備] [Preparation of Conductive Ink (R1) for Comparison]

將上述所獲得之比較用之導電性油墨用樹脂溶液333質量份、及雙酚A型環氧樹脂(三菱化學股份有限公司製造之「JER828」)20質量份進行攪拌混合,獲得樹脂組合物溶液。於該樹脂組合物溶液353質量份中添加導電填料(福田金屬箔粉工業股份有限公司製造之「AgXF-301」)180質量份並攪拌混合,獲得含有相對於聚胺基甲酸酯聚脲樹脂與環氧樹脂之合計100質量份為300質量份之導電填料的比較用之導電性油墨(R1)。 333 parts by mass of the resin solution for the conductive ink for comparison and 20 parts by mass of the bisphenol A type epoxy resin ("JER828" manufactured by Mitsubishi Chemical Corporation) were stirred and mixed to obtain a resin composition solution. . 180 parts by mass of a conductive filler ("AgXF-301" manufactured by Fukuda Metal Foil Co., Ltd.) was added to 353 parts by mass of the resin composition solution, and the mixture was stirred and mixed to obtain a polyurea resin with respect to the polyurethane. A conductive ink (R1) for comparison of 100 parts by mass of the conductive filler in an amount of 100 parts by mass based on the total amount of the epoxy resin.

[接合層用樹脂之製造] [Manufacture of resin for bonding layer]

相對於以與上述導電性油墨(R1)用樹脂相同之方式所製造之聚胺基甲酸酯聚脲樹脂溶液333質量份,添加雙酚A型環氧樹脂20質量份,獲得接合層用樹脂。 20 parts by mass of a bisphenol A type epoxy resin was added to 333 parts by mass of a polyurethane urea resin solution prepared in the same manner as the above-mentioned conductive ink (R1) resin to obtain a resin for a bonding layer. .

(比較例3) (Comparative Example 3)

關於屏蔽膜之製作,於經脫模處理之聚酯膜上,以形成線寬100μm、開口率65%、乾燥後膜厚5μm之格子圖案之方式網版印刷上述所獲得之比較用之導電性油墨(R1),加以乾燥而形成導電層。繼而, 於經脫模處理之聚酯膜上,以乾燥後膜厚成為15μm之方式塗佈上述所獲得之接合層用樹脂,加以乾燥。繼而,將脫模性膜上所形成之導電層、與脫模性膜上所形成之接合層進行貼合而製作屏蔽膜。 Regarding the production of the shielding film, the above-mentioned comparative conductivity is obtained by screen printing on a polyester film which has been subjected to release treatment to form a lattice pattern having a line width of 100 μm, an aperture ratio of 65%, and a film thickness of 5 μm after drying. The ink (R1) is dried to form a conductive layer. Then, The resin for the bonding layer obtained above was applied to the polyester film which had been subjected to the release treatment so that the film thickness after drying was 15 μm, and dried. Then, the conductive layer formed on the release film and the bonding layer formed on the release film were bonded to each other to form a shielding film.

繼而,代替實施例1中所使用之印刷電路板,將信號用銅電路圖案之線寬設為100μm且於其接地電路部設置有400μm見方之開口部的印刷電路板、與上述所獲得之屏蔽膜以於印刷電路板之絕緣保護層之上接觸屏蔽膜之導電層之方式進行配置,對印刷電路板與屏蔽膜沿使之相互接近之方向加壓(壓力:1.96MPa,加熱溫度:150℃,處理時間:30分鐘)而進行壓接,使屏蔽膜之接合層流動而與印刷電路板之接地層連接,製作無導電性接著劑層之比較用屏蔽印刷電路板。 Then, in place of the printed circuit board used in the first embodiment, a printed circuit board having a line width of a signal copper circuit pattern of 100 μm and an opening portion of 400 μm square in the ground circuit portion thereof, and the shield obtained as described above were used. The film is disposed in such a manner as to contact the conductive layer of the shielding film over the insulating protective layer of the printed circuit board, and pressurizes the printed circuit board and the shielding film in a direction close to each other (pressure: 1.96 MPa, heating temperature: 150 ° C) The treatment time: 30 minutes) was pressure-bonded, and the bonding layer of the shielding film was flowed to be connected to the ground layer of the printed circuit board, and a comparative shield printed circuit board having no conductive adhesive layer was produced.

[電磁波屏蔽性(透過衰減率)之測定] [Measurement of electromagnetic wave shielding (transmission attenuation rate)]

針對上述實施例、比較例中所獲得之屏蔽印刷電路板,依據ASTM D4935,使用KEYCOM公司之同軸管型之屏蔽效果測定系統,於100MHz~6GHz條件下進行電磁波照射,測定電磁波因屏蔽膜而衰減之衰減量,依據以下基準而評價電磁波屏蔽性。再者,衰減量之測定值係以分貝(單位dB)表示。再者,一般而言,電磁波屏蔽性若為40dB(99%以上之電磁波經截止)以上則為良好。 With respect to the shield printed circuit board obtained in the above embodiments and comparative examples, according to ASTM D4935, the shielding effect measurement system of the coaxial tube type of KEYCOM is used to perform electromagnetic wave irradiation at 100 MHz to 6 GHz, and the electromagnetic wave is attenuated by the shielding film. The amount of attenuation was evaluated based on the following criteria. Furthermore, the measured value of the attenuation amount is expressed in decibels (in dB). Further, in general, it is good if the electromagnetic wave shielding property is 40 dB or more (99% or more of electromagnetic waves are cut off).

A:於照射微波區域之6GHz之電磁波時,顯示45dB以上。 A: When the electromagnetic wave of 6 GHz in the microwave region is irradiated, it is displayed at 45 dB or more.

B:於照射6GHz之電磁波時,顯示40dB以上且未達45dB。 B: When an electromagnetic wave of 6 GHz is irradiated, it is displayed at 40 dB or more and less than 45 dB.

C:於照射6GHz之電磁波時,顯示35dB以上且未達40dB。 C: When an electromagnetic wave of 6 GHz is irradiated, it is displayed at 35 dB or more and less than 40 dB.

D:於照射6GHz之電磁波時,顯示未達35dB。 D: When the electromagnetic wave of 6 GHz is irradiated, the display is less than 35 dB.

[特性阻抗之測定] [Measurement of characteristic impedance]

針對上述實施例、比較例中所獲得之屏蔽印刷電路板,使用網路分析儀E5071C(Agilent Technologies公司製造)進行特性阻抗之測定。 With respect to the shield printed circuit board obtained in the above examples and comparative examples, the characteristic impedance was measured using a network analyzer E5071C (manufactured by Agilent Technologies, Inc.).

[屏蔽膜與印刷電路板之接地電路之連接可靠性之評價] [Evaluation of connection reliability of shielding film and grounding circuit of printed circuit board]

針對上述實施例、比較例中所獲得之屏蔽印刷電路板,假定於零件連接時進行如下回流焊步驟:以240℃、25秒之條件通過回流焊爐,其後將屏蔽印刷電路板冷卻至25℃,反覆進行5次該回流焊操作,測定其前後之屏蔽膜與印刷電路板之接地電路間之體積電阻值,使用下述數式算出體積電阻值之變化率,依據以下基準而評價屏蔽膜與印刷電路板之接地電路之連接可靠性。 With respect to the shield printed circuit boards obtained in the above embodiments and comparative examples, it is assumed that the reflow soldering step is performed when the parts are connected: the reflow oven is passed at 240 ° C for 25 seconds, and then the shield printed circuit board is cooled to 25 °C, the reflow operation was repeated five times, and the volume resistance value between the shielding film before and after the shielding film and the ground circuit of the printed circuit board was measured, and the rate of change of the volume resistance value was calculated using the following formula, and the shielding film was evaluated based on the following criteria. Reliability of connection to ground circuits of printed circuit boards.

[評價基準] [evaluation benchmark]

A:體積電阻值之變化率未達20%。 A: The rate of change of the volume resistance value is less than 20%.

B:體積電阻值之變化率為20%以上且未達50%。 B: The rate of change of the volume resistance value is 20% or more and less than 50%.

C:體積電阻值之變化率為50%以上且未達80%。 C: The rate of change of the volume resistance value is 50% or more and less than 80%.

D:體積電阻值之變化率為80%以上。 D: The rate of change of the volume resistance value is 80% or more.

將上述評價結果一併示於表1。 The above evaluation results are shown together in Table 1.

根據上述表1所示之結果可確認:使用本發明之屏蔽膜之實施例1~5之屏蔽印刷電路板即便於使印刷電路板之信號用銅電路之圖案寬度於50~150μm間變化之情形時,亦可藉由調整屏蔽膜之金屬層(鍍銅層)之開口率而將屏蔽印刷電路板之特性阻抗控制於80Ω。又,電磁波屏蔽性亦顯示45dB以上,電磁波之屏蔽性亦優異。 According to the results shown in the above Table 1, it was confirmed that the shield printed circuit boards of Examples 1 to 5 using the shielding film of the present invention were changed even when the pattern width of the signal copper circuit for the printed circuit board was changed between 50 and 150 μm. At the same time, the characteristic impedance of the shield printed circuit board can be controlled to 80 Ω by adjusting the aperture ratio of the metal layer (copper plating layer) of the shielding film. Further, the electromagnetic wave shielding property is also 45 dB or more, and the electromagnetic wave shielding property is also excellent.

又,關於本發明之屏蔽膜即實施例1~6之屏蔽膜部之膜厚,第二絕緣層、鍍銅層及導電性接著劑層之合計膜厚為13~16μm而較薄,與專利文獻3中記載之需要開口金屬層與非開口金屬層(屏蔽層)兩層之屏蔽膜相比,具有可使屏蔽膜之膜厚進一步變薄之優點。 Further, the shielding film of the present invention, that is, the film thickness of the shielding film portions of Examples 1 to 6, the total thickness of the second insulating layer, the copper plating layer, and the conductive adhesive layer is 13 to 16 μm and is thin, and the patent The film thickness of the shielding film is further reduced as compared with the shielding film which requires two layers of the opening metal layer and the non-opening metal layer (shielding layer) described in Document 3.

另一方面,比較例1之屏蔽印刷電路板係將印刷電路板之信號用銅電路之圖案寬度設為150μm,將屏蔽膜之金屬層(鍍銅層)之開口率設為0%(全面鍍銅層)的例。該屏蔽印刷電路板之特性阻抗為20Ω,無法控制於80Ω。 On the other hand, in the shield printed circuit board of Comparative Example 1, the pattern width of the signal copper circuit for the printed circuit board was set to 150 μm, and the aperture ratio of the metal layer (copper plating layer) of the shielding film was set to 0% (full plating) An example of a copper layer). The shielded printed circuit board has a characteristic impedance of 20 Ω and cannot be controlled to 80 Ω.

比較例2之屏蔽印刷電路板係與比較例1同樣地將屏蔽膜之金屬層(鍍銅層)之開口率設為0%(全面鍍銅層),將印刷電路板之信號用銅電路之圖案寬度設為20μm,即便於該情形時,特性阻抗亦為50Ω。進而,該屏蔽印刷電路板由於將印刷電路板之信號用銅電路之圖案寬度縮細至20μm,故而與實施例之屏蔽印刷電路板相比,存在隨著通信速度變快而傳送損失增大之問題。 In the same manner as in Comparative Example 1, the shield printed circuit board of Comparative Example 2 was such that the opening ratio of the metal layer (copper plating layer) of the shielding film was 0% (total copper plating layer), and the signal for the printed circuit board was made of copper circuit. The pattern width was set to 20 μm, and even in this case, the characteristic impedance was 50 Ω. Further, since the shield printed circuit board has a pattern width of the copper circuit for signal of the printed circuit board to 20 μm, the transmission loss increases as the communication speed becomes faster as compared with the shield printed circuit board of the embodiment. problem.

根據上述結果可確認:本發明之屏蔽印刷電路板即便於改變印刷電路板之信號用銅電路之圖案寬度之情形時,亦可藉由調整屏蔽膜之金屬層之開口率而將特性阻抗調整為所需,且電磁波屏蔽性較高。 According to the above results, it can be confirmed that the shield printed circuit board of the present invention can adjust the characteristic impedance by adjusting the aperture ratio of the metal layer of the shielding film even when the pattern width of the signal copper circuit of the printed circuit board is changed. Required and electromagnetic shielding is high.

又,比較例3之屏蔽印刷電路板係構成中無本發明之屏蔽印刷電路板所必須之導電性接著劑層之例。該屏蔽印刷電路板之電磁波屏蔽性不充分,進而,屏蔽膜側之導電層與印刷電路側之接地電路之連接可靠性存在問題。 Further, the shield printed circuit board of Comparative Example 3 is an example in which the conductive adhesive layer necessary for the shield printed circuit board of the present invention is not provided. The shielded printed circuit board has insufficient electromagnetic wave shielding properties, and further, there is a problem in connection reliability between the conductive layer on the shield film side and the ground circuit on the printed circuit side.

1‧‧‧屏蔽膜 1‧‧‧Shielding film

2‧‧‧第二絕緣保護層 2‧‧‧Second insulation protection layer

3‧‧‧使用導電性油墨所形成之層 3‧‧‧Layer formed using conductive ink

4‧‧‧具有開口部之鍍銅層 4‧‧‧Copper plating with openings

5‧‧‧導電性接著劑層 5‧‧‧ Conductive adhesive layer

6‧‧‧第一絕緣保護層 6‧‧‧First insulation protection layer

7‧‧‧印刷電路板基材 7‧‧‧Printed circuit board substrate

8‧‧‧信號電路 8‧‧‧Signal circuit

9‧‧‧接地電路 9‧‧‧ Grounding circuit

10‧‧‧第一絕緣保護層去除部(接地電路與具有開口部之鍍銅層之導通部) 10‧‧‧First insulation protective layer removal part (grounding circuit and conduction part of copper plating layer having an opening)

11‧‧‧印刷電路板 11‧‧‧Printed circuit board

12‧‧‧屏蔽印刷電路板 12‧‧‧Shielded printed circuit board

Claims (15)

一種屏蔽膜,其特徵在於:其係於基底絕緣基材上設置有信號電路、接地電路及第一絕緣保護層的印刷電路板用之屏蔽膜,並且具有積層於上述第一絕緣保護層整個面上之導電性接著劑層、上述導電性接著劑層上之以膜厚0.5~20μm、開口率40~95%進行圖案化之鍍銅層、於上述鍍銅層上使用導電性油墨所形成之層(A-1)、於上述導電性接著劑層上之上述鍍銅層之開口內部使用導電性油墨所形成之層(A-2)、以及上述導電性接著劑層、上述鍍銅層、上述層(A-1)及上述層(A-2)上之第二絕緣保護層。 A shielding film for shielding a printed circuit board provided with a signal circuit, a grounding circuit and a first insulating protective layer on a base insulating substrate, and having a laminated layer on the entire surface of the first insulating protective layer a conductive adhesive layer on the conductive adhesive layer, a copper plating layer patterned by a film thickness of 0.5 to 20 μm, an aperture ratio of 40 to 95%, and a conductive ink formed on the copper plating layer. a layer (A-1) and a layer (A-2) formed of a conductive ink on the opening of the copper plating layer on the conductive adhesive layer, and the conductive adhesive layer and the copper plating layer. a second insulating protective layer on the layer (A-1) and the layer (A-2). 如請求項1之屏蔽膜,其中於上述導電性接著劑層與上述層(A-2)之間進而具有鍍銅層。 The shielding film of claim 1, further comprising a copper plating layer between the conductive adhesive layer and the layer (A-2). 如請求項1或2之屏蔽膜,其中上述層(A-2)之面積為上述鍍銅層之開口面積之15~95%,膜厚為0.02~2μm。 The shielding film of claim 1 or 2, wherein the area of the layer (A-2) is 15 to 95% of the opening area of the copper plating layer, and the film thickness is 0.02 to 2 μm. 如請求項1至3中任一項之屏蔽膜,其中上述導電性油墨係以作為導電性物質(a2)之金屬奈米粒子作為主成分之油墨。 The shielding film according to any one of claims 1 to 3, wherein the conductive ink is an ink containing, as a main component, metal nanoparticles as the conductive material (a2). 如請求項4之屏蔽膜,其中上述金屬奈米粒子係利用高分子分散劑進行分散者。 The shielding film of claim 4, wherein the metal nanoparticle is dispersed by a polymer dispersant. 如請求項1至5中任一項之屏蔽膜,其係於上述第二絕緣保護層與上述使用導電性油墨所形成之層(A-1)及層(A-2)之間具有高分子層(B)者。 The shielding film according to any one of claims 1 to 5, wherein the second insulating protective layer has a polymer between the layer (A-1) and the layer (A-2) formed by using the conductive ink. Layer (B). 如請求項6之屏蔽膜,其中上述導電性油墨係含有化合物(a1)及導電性物質(a2)者,該化合物(a1)具有反應性官能基[X],且 上述高分子層(B)係包含含有化合物(b1)之高分子之層,該化合物(b1)具有反應性官能基[Y],藉由使上述導電性油墨所含之上述化合物(a1)所具有之反應性官能基[X]、與上述高分子層(B)所含之上述化合物(b1)所具有之反應性官能基[Y]進行反應而形成鍵。 The shielding film of claim 6, wherein the conductive ink contains the compound (a1) and the conductive substance (a2), the compound (a1) having a reactive functional group [X], and The polymer layer (B) includes a layer containing a polymer of the compound (b1), and the compound (b1) has a reactive functional group [Y], and the compound (a1) contained in the conductive ink is used. The reactive functional group [X] having a reactivity with the reactive functional group [Y] of the above compound (b1) contained in the polymer layer (B) forms a bond. 如請求項7之屏蔽膜,其中上述導電性油墨係含有化合物(a1)及導電性物質(a2)者,該化合物(a1)具有含鹼性氮原子之基作為反應性官能基[X]。 The shielding film according to claim 7, wherein the conductive ink contains the compound (a1) and the conductive substance (a2), and the compound (a1) has a group containing a basic nitrogen atom as a reactive functional group [X]. 如請求項8之屏蔽膜,其中上述具有含鹼性氮原子之基之化合物(a1)為聚伸烷基亞胺、或具有包含氧基伸乙基單元之聚氧伸烷基結構之聚伸烷基亞胺。 The shielding film of claim 8, wherein the compound (a1) having a basic nitrogen atom-containing group is a polyalkyleneimine or a polyalkylene having a polyoxyalkylene group having an oxy-ethyl group Imine. 如請求項7至9中任一項之屏蔽膜,其中上述反應性官能基[Y]為選自由酮基、環氧基、羧基、N-羥烷基、異氰酸酯基、乙烯基、(甲基)丙烯醯基、烯丙基所組成之群中之1種以上。 The shielding film according to any one of claims 7 to 9, wherein the above reactive functional group [Y] is selected from the group consisting of a ketone group, an epoxy group, a carboxyl group, an N-hydroxyalkyl group, an isocyanate group, a vinyl group, (methyl group) One or more of the group consisting of an acryloyl group and an allyl group. 一種屏蔽印刷電路板,其特徵在於:具有如請求項1至10中任一項之屏蔽膜。 A shield printed circuit board characterized by having the shielding film according to any one of claims 1 to 10. 一種屏蔽膜之製造方法,其特徵在於:於第二絕緣保護層上或設置於第二絕緣保護層上之高分子層(B)上,利用導電性油墨形成開口率40~90%之開口圖案,及於上述開口圖案之開口內部形成開口面積之15~95%之圖案,於上述開口圖案上實施電解鍍銅而形成鍍銅層,於其上形成導電性接著劑層。 A method for manufacturing a shielding film, characterized in that an opening pattern having an opening ratio of 40 to 90% is formed on a second insulating protective layer or a polymer layer (B) provided on a second insulating protective layer by using a conductive ink. And forming a pattern of 15 to 95% of the opening area inside the opening of the opening pattern, performing electrolytic copper plating on the opening pattern to form a copper plating layer, and forming a conductive adhesive layer thereon. 一種屏蔽膜之製造方法,其特徵在於:於第二絕緣保護層上或設置於第二絕緣保護層上之高分子層(B)上,利用導電性油墨形成開口率40~90%之開口圖案,及於上述開口圖案之開口內部形成開口面積之15~95%之圖案, 於上述開口圖案及其開口內部所形成之圖案上實施無電解鍍敷而形成鍍銅層,繼而,僅於上述開口圖案上實施電解鍍銅而形成鍍銅層,於其上形成導電性接著劑層。 A method for manufacturing a shielding film, characterized in that an opening pattern having an opening ratio of 40 to 90% is formed on a second insulating protective layer or a polymer layer (B) provided on a second insulating protective layer by using a conductive ink. And forming a pattern of 15 to 95% of the opening area inside the opening of the opening pattern, Electroless plating is performed on the opening pattern and the pattern formed inside the opening to form a copper plating layer, and then copper plating is performed on the opening pattern to form a copper plating layer, and a conductive adhesive is formed thereon. Floor. 如請求項12或13之屏蔽膜之製造方法,其中使用以金屬奈米粒子作為主成分之油墨作為上述導電性油墨(A),藉由噴墨印刷而形成開口率40~90%之開口圖案,於上述開口圖案之開口內部形成開口面積之15~95%之圖案。 The method for producing a shielding film according to claim 12 or 13, wherein an ink having metal nanoparticles as a main component is used as the conductive ink (A), and an opening pattern having an aperture ratio of 40 to 90% is formed by inkjet printing. A pattern of 15 to 95% of the opening area is formed inside the opening of the opening pattern. 一種屏蔽印刷電路板之製造方法,其特徵在於:於設置有信號電路、接地電路及絕緣保護層,且上述絕緣保護層具有使接地電路之一部分露出之通孔的印刷電路板中,於印刷電路板之絕緣保護層上以導電性接著劑層接觸上述印刷電路板之絕緣保護層之方式配置如請求項1至10中任一項之屏蔽膜,並對印刷電路板與屏蔽膜沿使之相互接近之方向加壓,藉此使屏蔽膜之導電性接著劑層流動而與印刷電路板之接地層連接。 A manufacturing method of a shielded printed circuit board, characterized in that: a signal circuit, a grounding circuit and an insulating protective layer are provided, and the insulating protective layer has a through hole in which a part of the grounding circuit is exposed, in the printed circuit board The shielding film of any one of claims 1 to 10 is disposed on the insulating protective layer of the board with the conductive adhesive layer contacting the insulating protective layer of the printed circuit board, and the printed circuit board and the shielding film are mutually Pressurization is performed in the approach direction, whereby the conductive adhesive layer of the shielding film flows to be connected to the ground layer of the printed circuit board.
TW104132441A 2014-10-03 2015-10-01 Shield film, shield printed wiring board, and methods for manufacturing shield film and shield printed wiring board TW201626865A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014204796 2014-10-03

Publications (1)

Publication Number Publication Date
TW201626865A true TW201626865A (en) 2016-07-16

Family

ID=55630265

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104132441A TW201626865A (en) 2014-10-03 2015-10-01 Shield film, shield printed wiring board, and methods for manufacturing shield film and shield printed wiring board

Country Status (3)

Country Link
JP (1) JP5975195B1 (en)
TW (1) TW201626865A (en)
WO (1) WO2016052225A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI713845B (en) * 2017-08-07 2020-12-21 日商拓自達電線股份有限公司 Conductive adhesive
CN112332190A (en) * 2020-07-27 2021-02-05 深圳市卓汉材料技术有限公司 Method for manufacturing composite grounding film, method for manufacturing high-temperature-resistant grounding elastic piece and structure
US11284505B2 (en) 2019-05-24 2022-03-22 Asustek Computer Inc. Printed circuit board and motherboard with the same
WO2022104933A1 (en) * 2020-11-23 2022-05-27 南昌联能科技有限公司 Shielding film, method for preparing shielding film, and cable
TWI812913B (en) * 2020-03-02 2023-08-21 日商拓自達電線股份有限公司 Metal foil and electromagnetic wave shielding film

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6780554B2 (en) * 2017-03-17 2020-11-04 セメダイン株式会社 Aqueous conductive paste and products
JP6839669B2 (en) * 2018-01-09 2021-03-10 タツタ電線株式会社 Electromagnetic wave shield film
JP7001187B1 (en) 2021-03-19 2022-01-19 東洋インキScホールディングス株式会社 Electromagnetic wave shield sheet and its manufacturing method, shielded wiring board, and electronic equipment
JP7232995B2 (en) * 2021-03-19 2023-03-06 東洋インキScホールディングス株式会社 Electromagnetic wave shielding sheet, manufacturing method thereof, shielding wiring board, and electronic device
WO2022210631A1 (en) * 2021-03-29 2022-10-06 タツタ電線株式会社 Electromagnetic wave shielding film and shielded printed wiring board
WO2023033007A1 (en) * 2021-09-02 2023-03-09 富士フイルム株式会社 Electronic device and manufacturing method therefor
CN117255495A (en) * 2022-06-09 2023-12-19 庆鼎精密电子(淮安)有限公司 Method for reducing ion content on surface of solder mask layer, backlight module and manufacturing method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11307989A (en) * 1998-04-17 1999-11-05 Lintec Corp Radio wave shield material having frequency selective surface and manufacture thereof
JP2006024824A (en) * 2004-07-09 2006-01-26 Tatsuta System Electronics Kk Impedance control film, impedance control shield film, and wiring board using them
JP2008263036A (en) * 2007-04-11 2008-10-30 Tatsuta System Electronics Kk Rigid wiring board with shield layer and its manufacturing method
WO2010103722A1 (en) * 2009-03-10 2010-09-16 住友ベークライト株式会社 Circuit board
JP2011204775A (en) * 2010-03-24 2011-10-13 Dainippon Printing Co Ltd Electromagnetic-wave shielding member
JP2013168643A (en) * 2012-01-17 2013-08-29 Toyo Ink Sc Holdings Co Ltd Electromagnetic wave shield sheet and manufacturing method of wiring board with electromagnetic wave shield layer
WO2013146195A1 (en) * 2012-03-28 2013-10-03 Dic株式会社 Electroconductive pattern, electric circuit, electromagnetic wave shield, and method for manufacturing electroconductive pattern

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI713845B (en) * 2017-08-07 2020-12-21 日商拓自達電線股份有限公司 Conductive adhesive
US11284505B2 (en) 2019-05-24 2022-03-22 Asustek Computer Inc. Printed circuit board and motherboard with the same
TWI812913B (en) * 2020-03-02 2023-08-21 日商拓自達電線股份有限公司 Metal foil and electromagnetic wave shielding film
CN112332190A (en) * 2020-07-27 2021-02-05 深圳市卓汉材料技术有限公司 Method for manufacturing composite grounding film, method for manufacturing high-temperature-resistant grounding elastic piece and structure
WO2022104933A1 (en) * 2020-11-23 2022-05-27 南昌联能科技有限公司 Shielding film, method for preparing shielding film, and cable

Also Published As

Publication number Publication date
JP5975195B1 (en) 2016-08-23
JPWO2016052225A1 (en) 2017-04-27
WO2016052225A1 (en) 2016-04-07

Similar Documents

Publication Publication Date Title
TW201626865A (en) Shield film, shield printed wiring board, and methods for manufacturing shield film and shield printed wiring board
JP6575738B1 (en) Manufacturing method of electronic component package
JP4913663B2 (en) Circuit board manufacturing method
WO2015137132A1 (en) Shield film, shield printed wiring board, and methods for producing same
JP6460383B2 (en) Conductive laminate and method for producing the same
JP5201433B1 (en) RECEPTION LAYER FORMING RESIN COMPOSITION AND RECEPTION SUBSTRATE, PRINTED MATERIAL, CONDUCTIVE PATTERN AND ELECTRIC CIRCUIT OBTAINED USING THE SAME
KR101489206B1 (en) Double side flexible printed circuit board having plating layer and method for manufacturing the same
KR20210023828A (en) Manufacturing method of printed wiring board
KR101563302B1 (en) Double side type nfc antenna printed by roll to roll printing and method for manufacturing thereof
JP6466110B2 (en) Printed wiring board substrate, printed wiring board, and printed wiring board manufacturing method
JP6296290B2 (en) Metal-based printed wiring board and manufacturing method thereof
JP5569662B1 (en) Laminate, conductive pattern and electrical circuit
JP6237098B2 (en) Dispersant, metal particle dispersion for conductive substrate, and method for producing conductive substrate
TW201515016A (en) Conductive pattern, and electrical circuit
TW202233414A (en) Laminate for semi-additive manufacturing and printed wiring board using same
TW202233415A (en) Laminate for semi-additive manufacturing and printed wiring board using same
TW202234954A (en) Laminate for semi-additive construction method and printed wiring board
KR20090093295A (en) Film for antenna and electro-magnetic wave shield containing conductive micro pattern
KR20240037879A (en) Laminates and electronic devices having laminates
TW202234959A (en) Laminate for semi-additive manufacturing and printed wiring board using same
TW202236916A (en) Laminate for semi-additive manufacturing and printed wiring board using same
TW202234963A (en) Multilayer body for semi-additive process and printed wiring board using same
KR20150027478A (en) Nfc antenna printed by roll to roll printing and method for manufacturing thereof
JP2017117931A (en) Laminate, conducting pattern, electronic circuit, transparent electrode and method for manufacturing electromagnetic wave shield material
JP2014075455A (en) Method for manufacturing conductive substrate