TW201605635A - Adhesive layer removing apparatus and adhesive layer removing method - Google Patents

Adhesive layer removing apparatus and adhesive layer removing method Download PDF

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TW201605635A
TW201605635A TW104114280A TW104114280A TW201605635A TW 201605635 A TW201605635 A TW 201605635A TW 104114280 A TW104114280 A TW 104114280A TW 104114280 A TW104114280 A TW 104114280A TW 201605635 A TW201605635 A TW 201605635A
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adhesive layer
adherend
sheet
adhesive
substrate
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TW104114280A
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Chinese (zh)
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TWI645970B (en
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Atsushi Uemichi
Motoki Nozue
Masanori Maruyama
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Lintec Corp
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  • Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

Provided is an adhesive layer removing apparatus (10), which comprises: a stripping and eliminating means (20) for stripping and eliminating an adhesion agent layer portion (AD1) protruded from a pre-specified region (AR) of a to-be-adhered body (WF) between the to-be-adhered body (WF) and a base material (BS), wherein an adhesion sheet (AS) is formed of at least the base material (BS) and an adhesion agent layer (AD) adhered to the to-be-adhered body (WF); and a moving means (30) for relatively moving the stripping means (20) and the adhesion sheet (AS) along an outer edge of the adhesion sheet (AS).

Description

接著劑層除去裝置及接著劑層除去方法 Substrate layer removing device and adhesive layer removing method

本發明,是有關於接著劑層除去裝置及接著劑層除去方法。 The present invention relates to an adhesive layer removing device and an adhesive layer removing method.

習知,已知將被貼附在被黏附體的接著薄片的接著劑層除去的接著劑層除去裝置(例如文獻1:日本特開平9-148283號公報參照)。 It is known that an adhesive layer removing device which is attached to the adhesive layer of the adhesive sheet of the adherend is known (for example, Japanese Laid-Open Patent Publication No. Hei 9-148283).

文獻1的接著劑層除去裝置,是將由接著性樹脂(接著薄片)被接著在支撐基板的晶圓(被黏附體)磨削時,使用蝕刻液將接著性樹脂的外緣部蝕刻除去。 In the adhesive layer removing device of Document 1, when the adhesive (attached to the wafer) (attached to the adherend) of the support substrate is followed by the adhesive resin, the outer edge portion of the adhesive resin is removed by etching.

但是文獻1的習知的接著劑層除去裝置,因為是配合被黏附體和接著薄片準備蝕刻液,且必需在被黏附體進行屏蔽處理,而具有泛用性欠缺的問題。 However, the conventional adhesive layer removing device of Document 1 has a problem that the etchant is prepared by blending the adherend and the subsequent sheet, and it is necessary to perform the shielding treatment on the adherend, which has a problem of lack of generality.

本發明的目的,是提供一種可以提高泛用性的接著劑層除去裝置及接著劑層除去方法。 An object of the present invention is to provide an adhesive layer removing device and an adhesive layer removing method which can improve general versatility.

本發明的接著劑層除去裝置,其特徵為,具 備:撥除手段,是對於由被貼附在被黏附體的至少基材及接著劑層所構成的接著薄片,將從該被黏附體的規定領域超出的接著劑層部分從前述被黏附體及前述基材之間撥除;及將前述撥除手段及前述接著薄片沿著該接著薄片的外緣相對移動的移動手段。 The adhesive layer removing device of the present invention is characterized in that The means for removing is a bonding sheet composed of at least a substrate and an adhesive layer attached to the adherend, and an adhesive layer portion which is beyond the prescribed area of the adherend is from the adhered body. And removing between the substrates; and moving means for moving the dialing means and the sheet along the outer edge of the sheet.

在本發明的接著劑層除去裝置中,前述撥除手 段,是具備:與前述接著劑層的外緣抵接的抵接構件、及將前述抵接構件以該抵接構件的旋轉軸為中心轉動的轉動手段較佳。 In the adhesive layer removing device of the present invention, the aforementioned hand is removed The segment preferably includes an abutting member that abuts against an outer edge of the adhesive layer, and a rotating means that rotates the abutting member around a rotation axis of the abutting member.

且本發明的接著劑層除去裝置,是具備防止被 撥除的接著劑層再附著在前述被黏附體的再附著防止手段較佳。 Further, the adhesive layer removing device of the present invention is provided with prevention of being It is preferable that the removed adhesive layer is further adhered to the adhesion preventing means of the adherend.

且本發明的接著劑層除去裝置,是具備使從前 述被黏附體的規定領域超出的接著劑層部分硬化的硬化手段較佳。 Further, the adhesive layer removing device of the present invention is provided with the former The hardening means for partially hardening the adhesive layer which is outside the prescribed area of the adherend is preferred.

本發明的接著劑層除去方法,其特徵為,具 備:對於由被貼附在被黏附體的至少基材及接著劑層所構成的接著薄片,將從該被黏附體的規定領域超出的接著劑層部分從前述被黏附體及前述基材之間由撥除手段撥除的過程;及將前述撥除手段及前述接著薄片沿著該接著薄片的外緣相對移動的過程。 The method for removing an adhesive layer of the present invention, characterized in that For the subsequent sheet composed of at least the substrate and the adhesive layer attached to the adherend, the portion of the adhesive layer which is beyond the predetermined area of the adherend is from the adhered body and the substrate a process of being dialed by a dialing means; and a process of moving the aforementioned means and the aforementioned succeeding sheet relative to each other along the outer edge of the sheet.

依據如以上的本發明的話,因為從被黏附體及 基材之間將接著劑層撥除,所以不必要配合被黏附體和接著薄片準備蝕刻液並在被黏附體進行屏蔽處理,可以提高 泛用性。 According to the invention as above, because from the adherend The adhesive layer is removed between the substrates, so it is not necessary to mix the adhered body and then the sheet to prepare an etching solution and perform shielding treatment on the adherend, which can be improved. Generality.

且在撥除手段設置抵接構件及轉動手段的話, 因為可以將撥除的接著劑層捲附在抵接構件,所以可以將該接著劑層的除去作業簡化。 And when the dialing means is provided with the abutting member and the turning means, Since the dispensed adhesive layer can be attached to the abutting member, the removal operation of the adhesive layer can be simplified.

進一步,設置再附著防止手段的話,可以防止接著劑層再附著在被黏附體和接著薄片。 Further, when the re-adhesion preventing means is provided, it is possible to prevent the adhesive layer from reattaching to the adherend and the subsequent sheet.

且設置硬化手段的話,接著劑層即使是軟的情況,從被黏附體的規定領域超出的接著劑層部分也不會殘留在被黏附體或是基材,可以確實地從被黏附體及基材之間撥除。 When the curing means is provided, even if the adhesive layer is soft, the portion of the adhesive layer which is beyond the predetermined area of the adherend does not remain in the adherend or the substrate, and can be surely adhered to the adherend and the base. Remove between materials.

AD‧‧‧接著劑 AD‧‧‧ adhesive

AD1‧‧‧接著劑層部分 AD1‧‧‧ adhesive layer part

AR‧‧‧規定領域 AR‧‧‧ areas specified

AS‧‧‧接著薄片 AS‧‧‧ followed by thin slices

BS‧‧‧基材 BS‧‧‧Substrate

SR‧‧‧撥除物 SR‧‧‧Drops

WF‧‧‧晶圓 WF‧‧‧ wafer

WK‧‧‧一體物 WK‧‧‧ integral

10‧‧‧接著劑層除去裝置 10‧‧‧Binder layer removal device

20‧‧‧撥除手段 20‧‧‧Remove means

21‧‧‧抵接構件 21‧‧‧Abutment components

21A‧‧‧旋轉軸 21A‧‧‧Rotary axis

22‧‧‧直動馬達 22‧‧‧Directional motor

22A‧‧‧輸出軸 22A‧‧‧ Output shaft

23,32‧‧‧轉動馬達 23,32‧‧‧Rotating motor

23A‧‧‧輸出軸 23A‧‧‧ Output shaft

24‧‧‧推出手段 24‧‧‧ means of launch

30‧‧‧移動手段 30‧‧‧Mobile means

31‧‧‧線性馬達 31‧‧‧Linear motor

31A‧‧‧滑件 31A‧‧‧Sliding parts

32A‧‧‧輸出軸 32A‧‧‧ Output shaft

33‧‧‧載置台 33‧‧‧ mounting table

33A‧‧‧支撐面 33A‧‧‧Support surface

40‧‧‧再附著防止手段 40‧‧‧Reattachment prevention means

41‧‧‧第1集塵箱 41‧‧‧1st dust box

41A‧‧‧開口部 41A‧‧‧ Opening

41B‧‧‧上面部 41B‧‧‧Upper face

41C‧‧‧插入口 41C‧‧‧ insertion port

41D‧‧‧下面部 41D‧‧‧The lower part

41E‧‧‧排氣口 41E‧‧‧Exhaust port

42‧‧‧噴嘴 42‧‧‧Nozzles

43‧‧‧第2集塵箱 43‧‧‧2nd dust box

44‧‧‧逆流防止構件 44‧‧‧Backflow prevention component

45‧‧‧減壓手段 45‧‧‧Decompression

45A‧‧‧配管 45A‧‧‧Pipe

50‧‧‧硬化手段 50‧‧‧ hardening means

50A‧‧‧硬化手段 50A‧‧‧hardening means

51‧‧‧直動馬達 51‧‧‧Directional motor

51A‧‧‧輸出軸 51A‧‧‧ Output shaft

52‧‧‧托板 52‧‧‧Board

53‧‧‧冷卻手段 53‧‧‧ cooling means

60‧‧‧軟化手段 60‧‧‧softening means

第1圖,是本發明的一實施例的接著劑層除去裝置的側面圖。 Fig. 1 is a side view showing an adhesive layer removing device according to an embodiment of the present invention.

第2圖A,是第1圖的薄片接著劑層除去裝置的動作說明圖。 Fig. 2A is an operation explanatory view of the sheet adhesive layer removing device of Fig. 1.

第2圖B,是第1圖的薄片接著劑層除去裝置的動作說明圖。 Fig. 2B is an operation explanatory view of the sheet adhesive layer removing device of Fig. 1.

第3圖A,是本發明的變形例的接著劑層除去裝置的動作說明圖。 Fig. 3 is a view for explaining the operation of the adhesive layer removing device according to a modification of the present invention.

第3圖B,是本發明的變形例的接著劑層除去裝置的動作說明圖。 Fig. 3B is an operation explanatory view of the adhesive layer removing device according to a modification of the present invention.

以下,將本發明的一實施例依據圖面說明。 Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

又,以下,未舉例成為基準的圖,而是例如,顯示上、下、左、右、或是、前方、後(奧)的方向的情況時,全部以將第1圖從正規的方向(附上了的編號成為適切方向的方向)看的情況作為基準,上、下、左、右方向是與紙面平行的方向,前是與紙面垂直交叉的前方方向,後是與紙面垂直交叉的後方側方向。 In the following, in the case where the directions of the top, the bottom, the left, the right, or the front, and the back (the Austrian) are displayed, for example, the first picture is taken from the normal direction ( The attached number is the direction of the appropriate direction. The upper, lower, left, and right directions are the directions parallel to the paper surface. The front is the front direction perpendicular to the paper surface, and the rear is the rear perpendicular to the paper surface. Side direction.

在第1圖中,接著劑層除去裝置10,是具備:對於由被貼附在作為被黏附體的晶圓WF的基材BS及接著劑AD層所構成的接著薄片AS,將從該晶圓WF的規定領域AR超出的接著劑層部分AD1從晶圓WF及基材BS之間撥除的撥除手段20、及將撥除手段20及接著薄片AS沿著該接著薄片AS的外緣相對移動的移動手段30、及防止被撥除的接著劑AD層再附著在晶圓WF的再附著防止手段40、及使從晶圓WF的規定領域AR超出的接著劑層部分AD1硬化的硬化手段50。又,接著薄片AS,是具有與晶圓WF相同的平面形狀,被貼附在該晶圓WF形成一體物WK。 In the first embodiment, the adhesive layer removing device 10 is provided with the succeeding sheet AS composed of the substrate BS and the adhesive AD layer attached to the wafer WF as the adherend. The dialing means 20 for removing the adhesive layer portion AD1 from the wafer WF and the substrate BS in the prescribed area AR of the circular WF, and the outer edge of the succeeding sheet AS along the dialing means 20 and the subsequent sheet AS The relatively moving moving means 30, the re-adhesion preventing means 40 for preventing the removed AD layer from being attached to the wafer WF, and the hardening of the adhesive layer portion AD1 which is beyond the predetermined area AR of the wafer WF Means 50. Further, the sheet AS is formed to have the same planar shape as the wafer WF, and is attached to the wafer WF to form an integrated body WK.

撥除手段20,是具備:由至少外周部具有柔軟性的橡膠、樹脂、海綿、電刷等的柔軟構件所構成,與接著劑AD層的外緣抵接的抵接構件21;及被支撐於作為驅動機器的直動馬達22的輸出軸22A,並且由輸出軸23A將抵接構件21支撐,將抵接構件21以該抵接構件21 的旋轉軸21A為中心轉動的轉動手段且作為驅動機器的轉動馬達23。 The detachment means 20 includes a flexible member made of at least a flexible rubber, resin, sponge, or brush at the outer peripheral portion, and abutting member 21 that abuts against the outer edge of the adhesive AD layer; and is supported The output shaft 22A of the linear motion motor 22 as a drive machine, and the abutment member 21 is supported by the output shaft 23A, and the abutment member 21 is the abutment member 21 The rotating shaft 21A is a centrally rotating turning means and serves as a turning motor 23 for driving the machine.

移動手段30,是具備:被支撐於作為驅動機 器的線性馬達31的滑件31A的作為驅動機器的轉動馬達32;及被支撐於轉動馬達32的輸出軸32A,具有藉由減壓泵和真空噴射器等的無圖示的減壓手段可將一體物WK吸附保持的支撐面33A的載置台33。 The moving means 30 is provided with: being supported as a driving machine The rotary motor 32 as the drive device of the slider 31A of the linear motor 31 of the device; and the output shaft 32A supported by the rotary motor 32 have a decompression means (not shown) such as a pressure reducing pump and a vacuum ejector. The mounting table 33 of the support surface 33A that is held by the integrated body WK is held.

再附著防止手段40,是具備:朝向移動手段 30側形成擴開的開口部41A,並且在上面部41B設有可插入抵接構件21的插入口41C,在下面部41D設有被撥除的接著劑AD層(以下稱為撥除物SR)的排氣口41E的5面閉塞型的第1集塵箱41;及設在開口部41A的上側及下側的內面,朝向第1集塵箱41內可將氣體吹出的噴嘴42;及被支撐於下面部41D,透過排氣口41E與第1集塵箱41內連通的第2集塵箱43;及從下面部41D朝第2集塵箱43內突出地設置,從排氣口41E朝向下方使內徑漸小地形成的漏斗狀的逆流防止構件44;及透過配管45A與第2集塵箱43內連通的減壓泵和真空噴射器等的減壓手段45。 The reattachment preventing means 40 is provided with: a moving means The open side portion 41A is formed on the 30 side, and the insertion opening 41C into which the abutting member 21 can be inserted is provided in the upper surface portion 41B, and the AD layer to be removed (hereinafter referred to as the dialing object SR) is provided in the lower surface portion 41D. The first dust collecting box 41 of the five-side blocking type of the exhaust port 41E; and the inner surface of the upper side and the lower side of the opening 41A, and the nozzle 42 for blowing the gas into the first dust collecting box 41; And the second dust collecting box 43 that is supported by the lower portion 41D, communicates with the inside of the first dust collecting box 41 through the exhaust port 41E, and protrudes from the lower surface portion 41D toward the inside of the second dust collecting box 43. The funnel-shaped backflow prevention member 44 which is formed to gradually reduce the inner diameter toward the lower side, and a pressure reducing means 45 such as a vacuum pump and a vacuum ejector which communicate with the inside of the second dust collecting box 43 through the pipe 45A.

硬化手段50,是具備:被支撐於作為驅動機 器的直動馬達51的輸出軸51A的托板52、及作為設在托板52內的能量賦予手段的派耳元件和熱配管的冷卻側等的冷卻手段53。又,能量賦予手段,可以對應接著劑AD層的硬化特性適宜選擇,賦予熱風、紫外線、微波、自然 風等的硬化能量者也可以。 The hardening means 50 is provided with: being supported as a driving machine The pallet 52 of the output shaft 51A of the direct-acting motor 51 of the device, and the cooling means 53 such as the lug element of the energy supply means provided in the pallet 52 and the cooling side of the heat pipe. Further, the energy imparting means can be appropriately selected in accordance with the hardening characteristics of the adhesive AD layer, and is given to hot air, ultraviolet rays, microwaves, and natural It is also possible to harden energy such as wind.

在以上的接著劑層除去裝置10中,說明將被 貼附在晶圓WF的接著薄片AS的接著劑層部分AD1除去的步驟。 In the above adhesive layer removing device 10, the description will be The step of removing the adhesive layer portion AD1 attached to the succeeding sheet AS of the wafer WF.

首先,操作者是透過無圖示的操作盤和個人電 腦等的輸入手段將運轉開始的訊號輸入,藉由人手或是多關節機械手臂或皮帶輸送帶等的無圖示的搬運手段,將一體物WK載置在第1圖中由實線所示的初期位置中的載置台33的支撐面33A的規定位置的話,移動手段30是將無圖示的減壓手段驅動,由支撐面33A將一體物WK吸附保持。 First of all, the operator is through the operation panel and personal power without a picture. The input means of the brain or the like inputs the signal of the start of the operation, and the integrated object WK is placed on the first figure in the first figure by a non-illustrated conveyance means such as a human hand or a multi-joint robot arm or a belt conveyor belt. In the predetermined position of the support surface 33A of the mounting table 33 in the initial position, the moving means 30 is driven by a decompression means (not shown), and the integrated body WK is suction-held by the support surface 33A.

接著,硬化手段50是將直動馬達51及冷卻手 段53驅動,將托板52從第1圖中由實線所示的初期位置如同圖中由二點鎖線所示地下降與接著薄片AS抵接。 且,將該接著薄片AS冷卻將接著劑層部分AD1硬化之後,將直動馬達51驅動,將托板52復歸至初期位置,將冷卻手段53的驅動停止。 Next, the hardening means 50 is a direct acting motor 51 and a cooling hand The segment 53 is driven to lower the initial position indicated by the solid line from the first figure in the first drawing as shown by the two-point lock line in the drawing, and the subsequent sheet AS is brought into contact with each other. After the bonding sheet AS is cooled and the adhesive layer portion AD1 is cured, the linear motor 51 is driven to return the pallet 52 to the initial position, and the driving of the cooling means 53 is stopped.

接著,撥除手段20是將直動馬達22驅動,將 第1圖中由實線所示的初期位置中的抵接構件21從插入口41C下降,在同圖中由二點鎖線所示的位置停止抵接構件21。且,撥除手段20是將轉動馬達23驅動,將抵接構件21旋轉,並且移動手段30是將線性馬達31及轉動馬達32驅動,將載置台33在支撐面33A內旋轉且朝右方向移動的話,如第1圖中由二點鎖線所示,抵接構件21 是抵接在接著劑層部分AD1的外緣。其後,移動手段30也將載置台33旋轉且朝右方向移動的話,如第2圖A所示,抵接構件21是進入基材BS及晶圓WF之間,接著劑層部分AD1是藉由抵接構件21從晶圓WF及基材BS之間朝圓周方向被撥除,如同圖所示,撥除物SR是附著在抵接構件21,使接著劑層部分AD1從一體物WK被除去。 Next, the dialing means 20 drives the linear motor 22, which will In the first drawing, the contact member 21 in the initial position indicated by the solid line descends from the insertion port 41C, and the abutting member 21 is stopped at the position indicated by the two-point lock line in the same figure. Further, the dialing means 20 drives the turning motor 23 to rotate the abutting member 21, and the moving means 30 drives the linear motor 31 and the turning motor 32 to rotate the mounting table 33 in the support surface 33A and to move in the right direction. If it is shown by the two-point lock line in Fig. 1, the abutment member 21 It is abutted on the outer edge of the adhesive layer portion AD1. Then, when the moving means 30 also rotates the mounting table 33 and moves to the right direction, as shown in FIG. 2A, the contact member 21 enters between the substrate BS and the wafer WF, and the adhesive layer portion AD1 is borrowed. The abutting member 21 is removed from the wafer WF and the substrate BS in the circumferential direction. As shown in the drawing, the dial SR is attached to the abutting member 21, so that the adhesive layer portion AD1 is removed from the integral WK. Remove.

此時,再附著防止手段40是將噴嘴42及減壓 手段45驅動,從開口部41A通過排氣口41E朝向第2集塵箱43將氣體吹出。由此,未附著在抵接構件21的撥除物SR,不會再附著在晶圓WF而從排氣口41E被排出,該撥除物SR是由逆流防止構件44被防止逆流且被收集在第2集塵箱43。又,從噴嘴42被噴出的氣體,是如第1圖所示,因為藉由從由開口部41A及一體物WK形成的寬空間,朝向由上面部41B或是下面部41D及一體物WK形成的狹窄的空間,使其流速上昇,就可以使未附著在抵接構件21的撥除物SR效率佳地朝第2集塵箱43方向導引。 At this time, the reattachment prevention means 40 is to take the nozzle 42 and decompression. The means 45 is driven to blow the gas from the opening 41A toward the second dust box 43 through the exhaust port 41E. Thereby, the dial SR that has not adhered to the contact member 21 is not attached to the wafer WF and is discharged from the exhaust port 41E, and the dial SR is prevented from flowing back by the backflow prevention member 44 and is collected. In the second dust box 43. In addition, as shown in FIG. 1, the gas which is ejected from the nozzles 42 is formed by the wide space formed by the opening 41A and the integrated body WK toward the upper surface portion 41B or the lower surface portion 41D and the integral body WK. In the narrow space, the flow rate of the abutting member 21, which is not attached to the abutting member 21, can be efficiently guided toward the second dust collecting box 43 by increasing the flow rate.

且無圖示的檢出手段是檢出接著劑層部分AD1 已被全部撥除的話,撥除手段20、移動手段30、及再附著防止手段40是將線性馬達31、轉動馬達23、32、噴嘴42、及減壓手段45的驅動停止。接著,撥除手段20及移動手段30是將直動馬達22及線性馬達31驅動,將抵接構件21及載置台33復歸至初期位置。且,移動手段30 是停止無圖示的減壓手段的驅動,藉由人手或是無圖示的搬運手段將一體物WK朝次過程的裝置等搬運,之後反覆上述同樣的動作。 And the detection means not shown is to detect the adhesive layer part AD1 When all of the dialing means 20, the moving means 30, and the reattachment preventing means 40 are stopped, the driving of the linear motor 31, the turning motors 23, 32, the nozzle 42, and the decompressing means 45 is stopped. Next, the dialing means 20 and the moving means 30 drive the linear motor 22 and the linear motor 31, and return the abutting member 21 and the mounting table 33 to the initial position. And, the moving means 30 The driving of the decompression means (not shown) is stopped, and the integrated object WK is transported to the apparatus or the like of the secondary process by a hand or a transport means (not shown), and then the same operation is repeated.

依據如以上的實施例的話,因為從晶圓WF及 基材BS之間將接著劑AD層撥除,所以不必要配合晶圓WF和接著薄片AS準備蝕刻液並在晶圓WF進行屏蔽處理,所以可以提高泛用性。 According to the above embodiment, since the wafer WF and Since the adhesive AD layer is removed between the substrates BS, it is not necessary to prepare the etching liquid in the wafer WF and the subsequent sheet AS, and the shielding treatment is performed on the wafer WF, so that the versatility can be improved.

且接著劑AD層因為是縮小至晶圓WF的規定 領域AR內,所以在次過程將晶圓WF磨削時可以防止接著劑AD層與晶圓WF一起被削。 And the adhesive AD layer is because of the requirement to shrink to the wafer WF In the field AR, it is possible to prevent the adhesive AD layer from being cut together with the wafer WF when the wafer WF is ground in the secondary process.

如以上,本發明實施用的最佳的構成、方法 等,雖如前述記載揭示,但是本發明,不限定於此。即,本發明,主要是由特定的實施例特別被圖示,且被說明,但是在不脫離本發明的技術的思想及目的範圍,對於以上述及的實施例的形狀、材質、數量、其他的詳細的構成,本行業者可以加上各式各樣的變形。且,上述開示的形狀、材質等限定的記載,只是為了容易理解本發明而例示者,不是限定本發明,那些的形狀、材質等的限定的一部分或是全部的限定以外的構件的名稱的記載,皆被包含於本發明。 As described above, the best configuration and method for implementing the present invention Although the disclosure is as described above, the present invention is not limited thereto. That is, the present invention has been particularly illustrated by the specific embodiments, and is described, but without departing from the spirit and scope of the present invention, the shapes, materials, quantities, and others of the above-described embodiments are The detailed composition, the industry can add a variety of deformations. In addition, the descriptions of the shapes, materials, and the like described above are merely exemplified for easy understanding of the present invention, and are not limited to the present invention, and the names of the members other than the limited ones or all of the shapes, materials, and the like are described. Both are included in the present invention.

例如,撥除手段20,是除了上述實施例的構 成以外,如第3圖A所示,具備:將接著劑層部分AD1從晶圓WF及基材BS之間推出的棒構件、壓輥、滾子等的推出手段24,如第3圖B所示,由推出手段24將接著 劑層部分AD1層推出之後,將由抵接構件21推出的接著劑層部分AD1除去也可以。由此,可以將接著劑層部分AD1容易地撥除。此時,如第3圖A、第3圖B所示,設置:使被推出的接著劑層部分AD1軟化的軟化手段60、和使被推出的接著劑層部分AD1硬化的硬化手段50A也可以。硬化手段50A及軟化手段60,可以例示與能量賦予手段同樣的構成。 For example, the dialing means 20 is in addition to the above embodiment In addition, as shown in FIG. 3A, a push-out means 24 for a bar member, a press roll, a roller, or the like that pushes the adhesive layer portion AD1 from between the wafer WF and the substrate BS is provided, as shown in FIG. 3B. As shown, the push means 24 will follow After the layer of the layer portion AD1 is pushed out, the adhesive layer portion AD1 pushed out by the abutting member 21 may be removed. Thereby, the adhesive layer portion AD1 can be easily removed. At this time, as shown in FIG. 3A and FIG. 3B, it is also possible to provide a softening means 60 for softening the pushed-on adhesive layer portion AD1 and a hardening means 50A for hardening the pushed-back adhesive layer portion AD1. . The curing means 50A and the softening means 60 can be exemplified by the same configuration as the energy applying means.

且撥除手段20,不限定於柔軟構件,例如, 具備:可插入晶圓WF及基材BS之間作為抵接構件的吸引噴嘴、及在該吸引噴嘴賦予吸引力的減壓泵和真空噴射器等的吸引力賦予手段,將接著劑層部分AD1由吸引噴嘴一邊吸引一邊撥除也可以。 And the means for removing 20 is not limited to a flexible member, for example, A suction nozzle that can be inserted between the wafer WF and the substrate BS as an abutting member, and a suction pump such as a vacuum pump and a vacuum ejector that impart attractive force to the suction nozzle, and an adhesive layer portion AD1 It is also possible to remove the suction nozzle while sucking it.

進一步,撥除手段20,是朝接著劑AD層外緣 吹附水和氣體等的流體,採用不鬆弛地在晶圓WF的面方向伸張的抵接構件的線和鋼絲等的線構件,將該線構件及一體物WK相對移動將接著劑層部分AD1撥除也可以,將針等的先端銳角構件作為抵接構件21採用也可以。 Further, the dialing means 20 is toward the outer edge of the AD layer of the adhesive A fluid such as a water and a gas is blown, and a wire member such as a wire of abutting member that does not loosely extend in the surface direction of the wafer WF and a wire member are used, and the wire member and the integral body WK are relatively moved to the adhesive layer portion AD1. Alternatively, the distal acute-angle member such as a needle may be used as the abutting member 21.

且撥除手段20,是將抵接構件21及一體物 WK在轉動的狀態下將直動馬達22驅動,將轉動的抵接構件21上下動也可以。 And the removing means 20 is to abut the member 21 and the integral body The WK drives the linear motion motor 22 in a rotating state, and the rotating abutting member 21 may be moved up and down.

且移動手段30,是藉由庫侖力、機械挾盤、 接著劑、黏接劑等將一體物WK保持的構成也可以。 And the moving means 30 is by Coulomb force, mechanical winding, The composition in which the bulk material WK is held by the adhesive, the adhesive, or the like may be used.

進一步,移動手段30,是不將載置台33轉 動,或是一邊使載置台33轉動,一邊將撥除手段20沿著 接著薄片AS的外緣移動也可以。 Further, the moving means 30 does not turn the mounting table 33 Move, or rotate the mounting table 33 while placing the dialing means 20 along The outer edge of the sheet AS can then be moved.

且撥除手段20及移動手段30,是將抵接構件 21比一體物WK更相對慢地旋轉也可以,迅速地旋轉也可以,將一體物WK及抵接構件21由相同速度旋轉也可以,一體物WK及抵接構件21的旋轉方向為相同方向也可以,不同的方向也可以。 And the dialing means 20 and the moving means 30 are the abutting members 21 may rotate more slowly than the integrated body WK, and may be rotated rapidly. The integral object WK and the abutting member 21 may be rotated at the same speed, and the rotation direction of the integral object WK and the abutting member 21 may be the same direction. Yes, different directions are also possible.

進一步,移動手段30,是將一體物WK從接著薄片AS側保持也可以。 Further, the moving means 30 may hold the integrated body WK from the side of the succeeding sheet AS.

且再附著防止手段40和硬化手段50A,是單數也可以,沿著一體物WK的外緣複數設置也可以。 Further, the reattachment preventing means 40 and the hardening means 50A may be singular or plural, and may be provided plurally along the outer edge of the integrated object WK.

進一步,再附著防止手段40,是可將托板52插入開口部41A也可以。由此,可以一邊由硬化手段50將接著劑層部分AD1硬化,一邊將該接著劑層部分AD1撥除。 Further, the reattachment preventing means 40 may be such that the pallet 52 can be inserted into the opening 41A. Thereby, the adhesive layer portion AD1 can be removed while the adhesive layer portion AD1 is cured by the curing means 50.

且再附著防止手段40,是具備與將附著在抵接構件21的撥除物SR從抵接構件21除去的棒構件、壓輥、黏接滾子及抵接構件21同樣的構件等的撥除物除去手段也可以。 Further, the reattachment preventing means 40 is provided with a member similar to the rod member, the pressure roller, the bonding roller, and the abutting member 21, which removes the shampoo SR attached to the contact member 21 from the contact member 21. It is also possible to remove the means.

進一步,硬化手段50,是將接著劑AD層整體硬化也可以,只有將接著劑層部分AD1硬化也可以。 Further, in the curing means 50, the entire AD layer of the adhesive may be cured, and only the adhesive layer portion AD1 may be cured.

且本發明中的接著薄片AS及被黏附體的材質、種別、形狀等,不特別限定。例如,接著薄片AS,是圓形、橢圓形、三角形和四角形等的多角形、其他的形狀也可以,不是平面形狀也可以,感壓接著性、感熱接著 性等的接著形態者也可以。且,接著薄片AS,是例如,在基材BS及接著劑AD層之間具有中間層者,在基材BS的上面具有蓋層等3層以上者,進一步,可以將基材BS從接著劑AD層剝離的如雙面接著薄片者也可以。且,被黏附體,是例如,食品、樹脂容器、矽半導體晶圓和化合物半導體晶圓等的半導體晶圓、電路基板、光碟片等的資訊記錄基板、玻璃板、鋼板、陶器、木板或是樹脂板等,任意的形態的構件和物品等也可以作為對象。又,可以將接著薄片AS換成功能性、用途的讀取方式,例如,將資訊記載用標籤、裝飾用標籤、保護薄片、切割膠帶、晶片固定片、黏晶帶、記錄層形成樹脂薄片等的任意的形狀的任意的薄片、薄膜、帶等貼附在如前述的任意的被黏附體。 Further, the material, type, shape, and the like of the succeeding sheet AS and the adherend in the present invention are not particularly limited. For example, the sheet AS may be a polygon having a circular shape, an elliptical shape, a triangular shape, a square shape or the like, and other shapes may be used instead of a planar shape, and pressure-sensitive adhesiveness and sensible heat may be followed. It is also possible to follow the form of sex. Further, the sheet AS is, for example, an intermediate layer between the substrate BS and the adhesive AD layer, and has three or more layers of a cover layer on the upper surface of the substrate BS, and further, the substrate BS may be used as an adhesive. It is also possible to peel off the AD layer as a double-sided sheet. Further, the adherend is, for example, a semiconductor wafer such as a food, a resin container, a semiconductor wafer or a compound semiconductor wafer, a circuit board, an information recording substrate such as a disc, a glass plate, a steel plate, a pottery, a wood board, or the like. A resin plate or the like may be used as a member, an article, or the like in any form. Further, the subsequent sheet AS can be replaced with a functional or application reading method, for example, a label for information recording, a label for decoration, a protective sheet, a dicing tape, a wafer fixing sheet, a die bond tape, a recording layer to form a resin sheet, and the like. Any of the sheets, films, tapes, and the like of any shape are attached to any of the adherends as described above.

本發明中的手段及過程,只要可達成那些手段 及過程所說明的動作、功能或是過程的話沒有任何限定,更不用說,完全不限定於前述實施例所顯示的只是一實施例的構成物和過程。例如,撥除手段,是對於由被貼附在被黏附體的至少基材及接著劑層所構成的接著薄片,可將從該被黏附體的規定領域超出的接著劑層部分從被黏附體及基材之間撥除的話,比對申請當初的技術常識,在其技術範圍內的話無任何限定(省略對於其他的手段及過程的說明)。 Means and processes in the present invention, as long as those means can be achieved The actions, functions, or processes described in the process are not limited, and needless to say, the configurations and processes of one embodiment are not limited at all to the foregoing embodiments. For example, the means for removing is an adhesive sheet which is formed of at least a base material and an adhesive layer attached to the adherend, and which may extend from a predetermined area of the adherend from the adhered body. If the substrate is removed, the technical common sense of the application is compared, and there is no limitation in the technical scope (the description of other means and processes is omitted).

且前述實施例中的驅動機器,是可以採用轉動 馬達、直動馬達、線性馬達、單軸機械手臂、多關節機械 手臂等的電動機器、氣壓缸、油壓缸、無桿壓缸及旋轉壓缸等的致動器等,且採用將那些直接或是間接地組合者也可以(也有與實施例例示重複者)。 And the driving machine in the foregoing embodiment can be rotated Motor, linear motor, linear motor, single-axis robot, multi-joint machinery Actuators such as an electric motor such as an arm, a pneumatic cylinder, a hydraulic cylinder, a rodless cylinder, a rotary cylinder, etc., and the like may be used in combination of those directly or indirectly (also repeated with examples) .

AD‧‧‧接著劑 AD‧‧‧ adhesive

AD1‧‧‧接著劑層部分 AD1‧‧‧ adhesive layer part

AR‧‧‧規定領域 AR‧‧‧ areas specified

AS‧‧‧接著薄片 AS‧‧‧ followed by thin slices

BS‧‧‧基材 BS‧‧‧Substrate

WF‧‧‧晶圓 WF‧‧‧ wafer

WK‧‧‧一體物 WK‧‧‧ integral

10‧‧‧接著劑層除去裝置 10‧‧‧Binder layer removal device

20‧‧‧撥除手段 20‧‧‧Remove means

21‧‧‧抵接構件 21‧‧‧Abutment components

21A‧‧‧旋轉軸 21A‧‧‧Rotary axis

22‧‧‧直動馬達 22‧‧‧Directional motor

22A‧‧‧輸出軸 22A‧‧‧ Output shaft

23‧‧‧轉動馬達 23‧‧‧Rotating motor

23A‧‧‧輸出軸 23A‧‧‧ Output shaft

30‧‧‧移動手段 30‧‧‧Mobile means

31‧‧‧線性馬達 31‧‧‧Linear motor

31A‧‧‧滑件 31A‧‧‧Sliding parts

32‧‧‧轉動馬達 32‧‧‧Rotating motor

32A‧‧‧輸出軸 32A‧‧‧ Output shaft

33‧‧‧載置台 33‧‧‧ mounting table

33A‧‧‧支撐面 33A‧‧‧Support surface

40‧‧‧再附著防止手段 40‧‧‧Reattachment prevention means

41‧‧‧第1集塵箱 41‧‧‧1st dust box

41A‧‧‧開口部 41A‧‧‧ Opening

41B‧‧‧上面部 41B‧‧‧Upper face

41C‧‧‧插入口 41C‧‧‧ insertion port

41D‧‧‧下面部 41D‧‧‧The lower part

41E‧‧‧排氣口 41E‧‧‧Exhaust port

42‧‧‧噴嘴 42‧‧‧Nozzles

43‧‧‧第2集塵箱 43‧‧‧2nd dust box

44‧‧‧逆流防止構件 44‧‧‧Backflow prevention component

45‧‧‧減壓手段 45‧‧‧Decompression

45A‧‧‧配管 45A‧‧‧Pipe

50‧‧‧硬化手段 50‧‧‧ hardening means

51‧‧‧直動馬達 51‧‧‧Directional motor

51A‧‧‧輸出軸 51A‧‧‧ Output shaft

52‧‧‧托板 52‧‧‧Board

53‧‧‧冷卻手段 53‧‧‧ cooling means

Claims (5)

一種接著劑層除去裝置,其特徵為,具備:撥除手段,是對於由被貼附在被黏附體的至少基材及接著劑層所構成的接著薄片,將從該被黏附體的規定領域超出的接著劑層部分從前述被黏附體及前述基材之間撥除;及移動手段,是將前述撥除手段及前述接著薄片沿著該接著薄片的外緣相對移動。 An adhesive layer removing device comprising: a removing means for a predetermined sheet formed of at least a base material and an adhesive layer adhered to an adherend, and a predetermined field from the adhered body The excess adhesive layer portion is removed from between the adherend and the substrate; and the moving means is to move the dialing means and the succeeding sheet relatively along the outer edge of the succeeding sheet. 如申請專利範圍第1項的接著劑層除去裝置,其中,前述撥除手段,是具備:與前述接著劑層的外緣抵接的抵接構件、及將前述抵接構件以該抵接構件的旋轉軸為中心轉動的轉動手段。 The adhesive layer removing device according to claim 1, wherein the removing means includes: an abutting member that abuts against an outer edge of the adhesive layer; and the abutting member as the abutting member The rotating shaft is a centrally rotating means of rotation. 如申請專利範圍第1項的接著劑層除去裝置,其中,具備防止被撥除的接著劑層再附著在前述被黏附體的再附著防止手段。 The adhesive layer removing device according to claim 1, further comprising a re-adhesion preventing means for preventing the removed adhesive layer from adhering to the adherend. 如申請專利範圍第1至3項中任一項的接著劑層除去裝置,其中,具備使從前述被黏附體的規定領域超出的接著劑層部分硬化的硬化手段。 The adhesive layer removing device according to any one of claims 1 to 3, further comprising a curing means for partially curing an adhesive layer which is beyond a predetermined area of the adherend. 一種接著劑層除去方法,其特徵為,具備:對於由被貼附在被黏附體的至少基材及接著劑層所構成的接著薄片,將從該被黏附體的規定領域超出的接著劑 層部分從前述被黏附體及前述基材之間由撥除手段撥除的過程;及將前述撥除手段及前述接著薄片沿著該接著薄片的外緣相對移動的過程。 A method for removing an adhesive layer, comprising: an adhesive agent that extends from a predetermined region of the adherend to a subsequent sheet composed of at least a substrate and an adhesive layer adhered to the adherend; a process in which the layer portion is removed from the adherend and the substrate by a dialing means; and the removing means and the subsequent sheet are relatively moved along the outer edge of the succeeding sheet.
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