TW201536560A - Hard coat film, transparent conductive film, and capacitive touch panel - Google Patents

Hard coat film, transparent conductive film, and capacitive touch panel Download PDF

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TW201536560A
TW201536560A TW103136634A TW103136634A TW201536560A TW 201536560 A TW201536560 A TW 201536560A TW 103136634 A TW103136634 A TW 103136634A TW 103136634 A TW103136634 A TW 103136634A TW 201536560 A TW201536560 A TW 201536560A
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hard coat
film
coat layer
cerium oxide
atom
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TWI647115B (en
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Keiichi Sato
Takuzo Watanabe
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Lintec Corp
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2483/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2483/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/003Additives being defined by their diameter

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Abstract

The present invention aims to provide a hard coat film having excellent adhesiveness by preventing hard coat films from blocking each other, provide a transparent conductive film having the same, and provide a capacitive touch panel. Thus, the present invention is directed to a hard coat film having a hard coat layer on at least one surface of a substrate film, wherein the hard coat layer comprises cured products of materials forming a hard coat layer including at least (A) a energy curing resin, (B) a hydrophobic silica sol, and (C) a silicone based leveling agent, (B) a hydrophobic silica sol being distributed unevenly on the other surface of the hard coat layer opposite to the substrate film after the materials forming a hard coat layer are cured, and in a region from the outermost surface to 5 nm deep, a concentration of silicon atoms being set to a value within the range of 0.2 to 1.95 percent by atom, which is relative to the total amount of carbon atoms, oxygen atoms, and silicone atoms measured by XPS analysis in the direction of thickness.

Description

硬塗膜、透明導電性薄膜及靜電容觸控面板 Hard coating film, transparent conductive film and capacitive touch panel

本發明係關於硬塗膜、透明導電性薄膜及靜電容觸控面板,尤其關於於形成表面層(導電層等)時,具有良好接著性及耐黏連性之硬塗膜、具備此硬塗膜之透明導電性薄膜、及靜電容觸控面板。 The present invention relates to a hard coat film, a transparent conductive film, and a capacitive touch panel, and particularly relates to a hard coat film having good adhesion and blocking resistance when a surface layer (conductive layer or the like) is formed, and having such a hard coat layer A transparent conductive film of a film and a capacitive touch panel.

過去,作為具有液晶顯示器之液晶顯示裝置,係使用例如攜帶用之電子記事本或資訊終端等,但近年來,廣泛使用搭載有與顯示部直接接觸、可輸入之觸控面板之液晶顯示裝置。 In the past, as a liquid crystal display device having a liquid crystal display, for example, an electronic notebook for carrying or an information terminal has been used. However, in recent years, a liquid crystal display device equipped with a touch panel that can be directly contacted with a display unit and can be input is widely used.

作為此觸控面板列舉為靜電容方式、電阻膜方式、電磁感應方式等。其中,檢測出手指等接觸時產生之微弱電流,亦即靜電容之變化而檢測出輸入位置之靜電容方式觸控面板正普及。 The touch panel is exemplified by a static capacitance method, a resistive film method, an electromagnetic induction method, and the like. Among them, a capacitive touch panel that detects a weak current generated when a finger or the like is in contact, that is, a change in electrostatic capacitance and detects an input position, is becoming widespread.

此液晶顯示裝置中,為了提高透明導電膜等之耐擦傷性、或操作容易性,大多情況係在透明導電膜之表面具備硬塗膜。 In the liquid crystal display device, in order to improve the scratch resistance of the transparent conductive film or the like or the ease of handling, a hard coat film is often provided on the surface of the transparent conductive film.

作為此種硬塗膜已知係在基材表面具備硬塗層者。 As such a hard coat film, it is known that it has a hard coat layer on the surface of a base material.

例如,已揭示於透明聚酯薄膜之單面或兩面上依序層合易滑易接著層、硬塗層及抗反射層而成之顯示用硬塗膜(參照例如專利文獻1)。 For example, a hard coat film for display which is formed by laminating a slip-prone adhesive layer, a hard coat layer, and an antireflection layer on one surface or both surfaces of a transparent polyester film has been disclosed (see, for example, Patent Document 1).

亦即,專利文獻1中作為硬塗層係揭示具有特定表面硬度、特定厚度、表面之水接觸角為40~80°,且含有無機微粒子之顯示用硬塗膜。 In other words, Patent Document 1 discloses, as a hard coat layer, a hard coat film for display having a specific surface hardness, a specific thickness, and a water contact angle of 40 to 80° on the surface and containing inorganic fine particles.

另一方面,具有硬塗覆性之薄膜,基於生產性或操作性之觀點,於塗佈硬塗層後,係以捲成輥狀予以保管。以輥狀態長期保管時,薄膜表面彼此會貼合(黏連),而於硬塗層表面產生傷痕等,使用產生黏連之硬塗膜時見到有於表面發生斑點之問題。 On the other hand, the film having a hard coatability is stored in a roll form after application of the hard coat layer from the viewpoint of productivity or workability. When stored in a roll state for a long period of time, the surface of the film adheres to each other (adhesion), and scratches or the like are formed on the surface of the hard coat layer, and when a hard coat film which causes adhesion is used, a problem of occurrence of spots on the surface is observed.

因此,例如於製造步驟中,以輥捲取硬塗膜時,為了防止硬塗膜彼此貼附不易剝離而使生產性下降,故提案於光透過性基材之兩面具有特定硬塗層之光學層合體、透明導電性薄膜及靜電容觸控面板(參照例如專利文獻2)。 Therefore, for example, in the production step, when the hard coat film is wound by a roll, the productivity is lowered in order to prevent the hard coat films from sticking to each other and peeling off, so that it is proposed to have a specific hard coat layer on both sides of the light-transmitting substrate. A laminate, a transparent conductive film, and a capacitive touch panel (see, for example, Patent Document 2).

更具體而言,係揭示光學層合體,其硬塗層係使用含黏結劑樹脂、平坦劑及易滑劑之硬塗層用組成物形成之層,易滑劑係由二氧化矽粒子及矽氧粒子所組成之群選出之至少一種,作為平坦劑以矽氧系平坦劑較適用。 More specifically, the optical laminate is disclosed, and the hard coat layer is a layer formed of a composition for a hard coat layer containing a binder resin, a flat agent, and a slip agent, and the slip agent is composed of cerium oxide particles and cerium. At least one selected from the group consisting of oxygen particles is preferably used as a flattening agent with a rhodium-based flattening agent.

此外,以抑制因黏連造成之良率下降,且提高平坦性能為目的,而提案由特定之硬塗層用組成物所成之硬塗膜、偏光板、及圖像顯示裝置(參照例如專利文獻3)。 In addition, a hard coat film, a polarizing plate, and an image display device which are formed of a specific composition for a hard coat layer are proposed for the purpose of suppressing a decrease in yield due to adhesion and improving flatness (see, for example, a patent) Document 3).

更具體而言,揭示硬塗層用組成物,其係含有平坦劑、二氧化矽微粒子、與黏結劑樹脂之硬塗層用組成物,平坦劑係含特定之氟系平坦劑。 More specifically, a composition for a hard coat layer containing a flat agent, cerium oxide fine particles, and a composition for a hard coat layer of a binder resin, and a flat agent containing a specific fluorine-based flat agent are disclosed.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2001-109388號公報(申請專利範圍等) [Patent Document 1] Japanese Laid-Open Patent Publication No. 2001-109388 (Patent Patent Application, etc.)

[專利文獻2]日本特開2012-66409號公報(申請專利範圍等) [Patent Document 2] Japanese Laid-Open Patent Publication No. 2012-66409 (Application Patent Range, etc.)

[專利文獻3]日本特開2012-252275號公報(申請專利範圍等) [Patent Document 3] Japanese Laid-Open Patent Publication No. 2012-252275 (Application Patent No., etc.)

然而,專利文獻1中揭示之顯示器用硬塗膜由於硬塗層之表面為親水性,故雖具有特定之鉛筆硬度,但見到有易滑性不充分,無法有效地防止薄膜彼此密著之問題。 However, the hard coat film for display disclosed in Patent Document 1 is hydrophilic because of the surface of the hard coat layer. However, although it has a specific pencil hardness, it is found that the slipperiness is insufficient, and the film cannot be effectively prevented from adhering to each other. problem.

且,專利文獻2所記載之光學層合體係藉由使用較大之二氧化矽粒子作為易滑劑,而防止光學層合體相互貼附。藉此,雖可某程度地防止薄膜彼此之密著,但由於易滑劑為較大粒子,故見到光學層合體之透明性有不充分之情況之問題。 Further, the optical layering system described in Patent Document 2 prevents the optical laminates from sticking to each other by using the larger cerium oxide particles as a slipping agent. Thereby, although the films can be prevented from adhering to each other to a certain extent, since the slip agent is a large particle, there is a problem that the transparency of the optical laminate is insufficient.

又,專利文獻3所記載之硬塗層用組成物係使用較大二氧化矽粒子作為易滑劑,且必須以氟系平坦劑作為平坦劑。據此,雖見到某程度地抑制黏連或提高平滑性,但因氟系平坦劑之撥水性,在將導電層等進一步層合於硬塗膜上時見到有接著性變差之情況之問題。 Further, the composition for a hard coat layer described in Patent Document 3 uses a large ceria particle as a slip agent, and a fluorine-based flat agent is required as a flat agent. According to this, although it is seen that the adhesion is suppressed to some extent or the smoothness is improved, the water repellency of the fluorine-based flat agent is improved when the conductive layer or the like is further laminated on the hard coat film. The problem.

因此,本發明人等對該等問題積極檢討之結果,發現藉由於基材薄膜之至少一面上具備硬塗層,於形成該硬塗層之硬塗層形成材料中調配特定之疏水化二氧化矽溶膠及特定之平坦劑,且將表面之矽原子濃度設為特定範圍內之值,可有效地防止硬塗膜彼此之黏連,且形成表面層(導電層等)時,獲得具有良好接著性之硬塗膜,因而完成本發明。 Therefore, the present inventors have actively reviewed the results of the above problems and found that by providing a hard coat layer on at least one side of the base film, a specific hydrophobized dioxide is formulated in the hard coat forming material forming the hard coat layer. The ruthenium sol and the specific flat agent, and the concentration of the ruthenium atom on the surface is set to a value within a specific range, which can effectively prevent the hard coat films from sticking to each other, and obtain a good surface when forming a surface layer (conductive layer or the like). The hard coating film is thus completed.

亦即,本發明之目的係提供一種可有效地防止硬塗膜彼此之黏連(貼附)(抗黏黏性),且形成表面層(導電層等)時,與表面層之間具有良好接著性之硬塗膜、具備此硬塗膜之透明導電性薄膜、及靜電容觸控面板。 That is, the object of the present invention is to provide an effect of effectively preventing adhesion (attachment) of the hard coat films to each other (anti-adhesiveness) and forming a surface layer (conductive layer or the like) with a good surface layer. A hard coating film, a transparent conductive film having the hard coating film, and a capacitive touch panel.

依據本發明,提供下述硬塗膜,可解決上述問題,該硬塗膜係於基材薄膜之至少一面上具備硬塗層之硬塗膜,其特徵為硬塗層係由至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之硬化物所構成,(B)疏水化二氧化矽溶膠係偏向存在於使硬塗層形成材料硬化後之硬塗層 之與基材薄膜相反之表面側,硬塗膜之自最表面至5nm位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 According to the present invention, the above problem can be solved by providing a hard coat film which is a hard coat film having a hard coat layer on at least one side of a base film, and is characterized in that the hard coat layer is at least contained (A An energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a hardened coating material of a hard coat layer forming material, and (B) a hydrophobized cerium oxide sol is biased to exist Hard coating for hardening the hard coat forming material The surface side opposite to the substrate film, the area of the hard coating film from the outermost surface to the 5 nm position, and the carbon atom, oxygen atom, and ytterbium atom atomic amount measured by XPS analysis in the depth direction (100 atomic %) The value of the germanium atom concentration is in the range of 0.2 to 1.95 atomic %.

亦即,藉由使用疏水化二氧化矽溶膠作為硬塗層形成材料,於使硬塗層形成材料硬化後之與硬塗層之基材薄膜相反之表面側上相分離地存在疏水化二氧化矽溶膠,故在硬塗膜表面生成微細凹凸,可防止硬塗膜彼此之貼合。 That is, by using the hydrophobized cerium oxide sol as a hard coat forming material, hydrophobized dioxide is present in phase separation on the surface side opposite to the base film of the hard coat layer after hardening the hard coat forming material. Since the ruthenium sol is formed, fine irregularities are formed on the surface of the hard coat film, and the hard coat films can be prevented from sticking to each other.

且,藉由含有矽氧系平坦劑,該矽氧系平坦劑由於在硬塗層之最表面被覆疏水化二氧化矽溶膠而存在,故形成表面層(導電層等)時,可有效防止表面層等之剝離。 In addition, since the antimony-based flat agent contains the hydrophobized cerium oxide sol on the outermost surface of the hard coat layer, the surface layer (conductive layer or the like) can be effectively prevented from being formed. Stripping of layers, etc.

再者,藉由將硬塗膜之自最表面至5nm位置之區域中,矽原子濃度設為特定範圍內之值,可抑制塗膜之變形或彈開。 Further, by setting the concentration of the ruthenium atom in the region from the outermost surface to the position of 5 nm from the outermost surface of the hard coat film, deformation or buckling of the coating film can be suppressed.

且,構成本發明之硬塗膜時,(C)矽氧系平坦劑較好由矽氧改質丙烯酸、聚醚改質聚二甲基矽氧烷、聚醚酯改質之含羥基之聚二甲基矽氧烷、聚酯改質之含羥基之聚二甲基矽氧烷、聚醚改質之聚二甲基矽氧烷所組成之群選出之至少1種。 Further, when constituting the hard coat film of the present invention, the (C) oxime-based flat agent is preferably a hydroxy-containing polymer modified by oxime-modified acrylic acid, polyether-modified polydimethyl siloxane, or polyether ester. At least one selected from the group consisting of dimethyl methoxy alkane, a polyester-modified polyhydroxy methoxy alkane having a hydroxyl group, and a polydimethyl methoxide modified with a polyether.

藉由該構成,可容易地將硬塗膜之自最表面至5nm位置之區域中矽原子濃度調整成特定範圍內之值。 According to this configuration, the concentration of germanium atoms in the region from the outermost surface to the position of 5 nm of the hard coat film can be easily adjusted to a value within a specific range.

此外,構成本發明之硬塗膜時,(C)矽氧系平坦劑之調配量相對於(A)能量線硬化性樹脂100重量份,以固體成分換算較好為0.045~5重量份之範圍內之 值。 In addition, when the hard coat film of the present invention is used, the amount of the (C) antimony-based flat agent is preferably in the range of 0.045 to 5 parts by weight in terms of solid content per 100 parts by weight of the (A) energy ray-curable resin. Inside value.

藉由該構成,可有效提高硬塗膜之接著性。 According to this configuration, the adhesion of the hard coat film can be effectively improved.

又,構成本發明之硬塗膜時,(B)疏水化二氧化矽溶膠之平均粒徑較好為10~100nm之範圍內之值。 Further, when the hard coat film of the present invention is formed, the average particle diameter of the (B) hydrophobized cerium oxide sol is preferably in the range of 10 to 100 nm.

藉由該構成,可維持或有效地提高硬塗膜之透明性,且獲得充分之光透過性。 According to this configuration, the transparency of the hard coat film can be maintained or effectively improved, and sufficient light transmittance can be obtained.

且,構成本發明之硬塗膜時,對於使(B)疏水化二氧化矽溶膠進行塗膜時之塗膜依據JIS R 3257測定之水的接觸角較好為100°以上之值。 In the case of the hard coat film of the present invention, the contact angle of water measured in accordance with JIS R 3257 for the coating film when the (B) hydrophobized cerium oxide sol is coated is preferably 100 or more.

藉由該構成,可有效防止硬塗膜彼此之黏連。 With this configuration, adhesion of the hard coat films to each other can be effectively prevented.

且,構成本發明之硬塗膜時,(B)疏水化二氧化矽溶膠之調配量相對於(A)能量線硬化性樹脂100重量份,以固體成分換算較好為0.3~55重量份之範圍內之值。 In the case of the hard coat film of the present invention, the amount of the (B) hydrophobized cerium oxide sol is preferably from 0.3 to 55 parts by weight, based on 100 parts by weight of the (A) energy ray-curable resin. The value in the range.

藉由該構成,儘管較少量添加,仍可在硬塗層內有效偏向存在於表面側,可有效提高硬塗膜之透明性。 With this configuration, although it is added in a small amount, it can be effectively biased on the surface side in the hard coat layer, and the transparency of the hard coat film can be effectively improved.

且,構成本發明之硬塗膜時,硬塗膜之依據JIS K 7105測定之濁度值較好為1.0%以下。 Further, when the hard coat film of the present invention is formed, the haze value of the hard coat film measured in accordance with JIS K 7105 is preferably 1.0% or less.

藉由該構成,可使用於透明性優異之透明導電性薄膜,可使用於例如靜電容觸控面板等之電子機器。 According to this configuration, the transparent conductive film excellent in transparency can be used for an electronic device such as a capacitive touch panel.

且,構成本發明之硬塗膜時,硬塗層表面之依據JIS B 0601-1994測定之算術平均粗糙度(Ra)較好為1.5~5nm之範圍內之值。 Further, in the case of forming the hard coat film of the present invention, the arithmetic mean roughness (Ra) of the surface of the hard coat layer measured in accordance with JIS B 0601-1994 is preferably in the range of 1.5 to 5 nm.

藉由該構成,可於所得硬塗膜之表面獲得微細凹凸, 可較好地防止硬塗膜彼此之黏連。 With this configuration, fine irregularities can be obtained on the surface of the obtained hard coat film. The adhesion of the hard coat films to each other can be preferably prevented.

又,若硬塗層表面之算術平均粗糙度為該範圍內之值,則可獲得具有優異光學特性之硬塗膜。 Further, if the arithmetic mean roughness of the surface of the hard coat layer is a value within the range, a hard coat film having excellent optical characteristics can be obtained.

又,本發明之另一樣態係於上述硬塗膜之至少一面具備透明導電層之透明導電性薄膜。 Further, another aspect of the present invention is a transparent conductive film comprising a transparent conductive layer on at least one surface of the hard coat film.

亦即,藉由使用此種耐黏連性優異、且與透明導電層之密著性優異之硬塗膜,可不需使用保護薄膜以防止薄膜彼此之黏連,且可獲得耐久性優異之透明導電性薄膜。 In other words, by using such a hard coat film which is excellent in blocking resistance and excellent in adhesion to a transparent conductive layer, it is possible to prevent the films from sticking to each other without using a protective film, and to obtain transparency excellent in durability. Conductive film.

且,本發明之另一樣態係一種靜電容觸控面板,其係包含具備防止玻璃飛散之薄膜之覆蓋玻璃、第一透明導電性薄膜、第二透明導電性薄膜、與液晶顯示體之靜電容觸控面板,其特徵為第一透明導電性薄膜及第二透明導電性薄膜或任一者在具有硬塗層之硬塗膜之硬塗層上具備透明導電層,該硬塗膜於基材薄膜之至少一面上具備硬塗層,硬塗層係由至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之硬化物所構成,(B)疏水化二氧化矽溶膠偏向存在於使硬塗層形成材料硬化後之硬塗層之與基材薄膜相反之表面側,硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 Furthermore, another aspect of the present invention is a capacitive touch panel comprising a cover glass having a film for preventing scattering of glass, a first transparent conductive film, a second transparent conductive film, and a static capacitance of the liquid crystal display. The touch panel is characterized in that the first transparent conductive film and the second transparent conductive film or any one of the hard coating layers having a hard coating layer has a transparent conductive layer on the substrate. The hard coating layer is provided on at least one side of the film, and the hard coat layer is formed of a hard coat layer containing at least (A) energy ray-curable resin, (B) hydrophobized cerium oxide sol, and (C) argon-based flattening agent. The hardened material of the material is composed of (B) the hydrophobized cerium oxide sol is biased on the surface side opposite to the substrate film of the hard coat layer after hardening the hard coat layer forming material, and the hard coat film is from the outermost surface to 5 nm. In the region of the position, the concentration of the ruthenium atom is in the range of 0.2 to 1.95 atom% with respect to the total amount of carbon atoms, oxygen atoms, and ruthenium atoms (100 atom%) measured by XPS analysis in the depth direction.

亦即,若為於形成表面層(導電層)時具有良好接著性及耐黏連性之硬塗膜中使用具備透明導電層之透明導電 性薄膜之靜電容觸控面板,則可獲得耐久性優異之靜電容觸控面板。 That is, if a hard coating film having good adhesion and blocking resistance when forming a surface layer (conductive layer) is used, transparent conductive layer having a transparent conductive layer is used. A capacitive touch panel with a thin film can obtain a capacitive touch panel with excellent durability.

且,本發明之另一樣態係一種硬塗膜之製造方法,其係於基材薄膜之至少一面上具備硬塗層之硬塗膜之製造方法,其特徵係包含下述步驟(1)~(3): (1)準備至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之步驟, (2)於基材薄膜之至少一面上塗佈硬塗層形成材料之步驟, (3)使硬塗層形成材料硬化,形成具備硬塗層之硬塗膜之步驟,該硬塗層係(B)疏水化二氧化矽溶膠偏向存在於使硬塗層形成材料硬化後之硬塗層之與基材薄膜相反之表面側,硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 Further, another aspect of the present invention provides a method for producing a hard coat film which is a method for producing a hard coat film having a hard coat layer on at least one side of a base film, and the method comprises the following steps (1). (3): (1) a step of preparing a hard coat forming material containing at least (A) an energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a cerium-oxygen flattening agent, (2) a step of coating a hard coat forming material on at least one side of the base film, (3) a step of hardening the hard coat layer forming material to form a hard coat film having a hard coat layer, wherein the hard coat layer (B) hydrophobized cerium oxide sol is biased to be hard after hardening the hard coat layer forming material The surface side of the coating opposite to the substrate film, and the area of the hard coating film from the outermost surface to the position of 5 nm, relative to the carbon atom, oxygen atom, and ruthenium atomium measured by XPS analysis in the depth direction ( 100 atom%), the value of the germanium atom concentration in the range of 0.2 to 1.95 atom%.

亦即,藉由如此實施,可有效地製造二氧化矽粒子偏向存在於基材薄膜之相反表面側之硬塗膜。 That is, by doing so, it is possible to efficiently produce the hard coat film in which the cerium oxide particles are biased on the opposite surface side of the base film.

因此,即使以輥對輥製造硬塗膜時,仍可有效地防止硬塗膜彼此之貼合,可提高生產性。 Therefore, even when a hard coat film is produced by a roll-to-roller, the hard coat films can be effectively prevented from sticking to each other, and productivity can be improved.

10‧‧‧基材薄膜 10‧‧‧Substrate film

12、12’‧‧‧硬塗層 12, 12'‧‧‧ Hard coating

14‧‧‧平坦劑薄膜 14‧‧‧flat film

16‧‧‧疏水化二氧化矽溶膠 16‧‧‧ Hydrophobized cerium oxide sol

18‧‧‧親水性二氧化矽溶膠 18‧‧‧Hydrophilic cerium oxide sol

20、20’、20”‧‧‧硬塗膜 20, 20', 20" ‧ ‧ hard coating

30、30’、30”‧‧‧透明導電層 30, 30', 30" ‧ ‧ transparent conductive layer

40‧‧‧透明導電性薄膜 40‧‧‧Transparent conductive film

50、50’、50”‧‧‧光學用黏著劑 50, 50', 50" ‧ ‧ optical adhesives

60‧‧‧防止玻璃飛散之薄膜 60‧‧‧A film that prevents glass from scattering

70‧‧‧液晶顯示裝置 70‧‧‧Liquid crystal display device

80‧‧‧覆蓋玻璃 80‧‧‧ Covering glass

100‧‧‧靜電容觸控面板 100‧‧‧Static Capacitive Touch Panel

圖1(a)~(b)係供於說明本發明之硬塗膜之樣態之圖。 1(a) to (b) are diagrams for explaining the state of the hard coat film of the present invention.

圖2係供於概念性說明本發明之硬塗膜之圖。 Figure 2 is a diagram for conceptually illustrating the hard coat film of the present invention.

圖3係供於針對藉深度方向之XPS分析測定之硬塗層內之矽原子濃度分佈進行說明之圖。 Fig. 3 is a view for explaining a distribution of a ruthenium atom concentration in a hard coat layer measured by XPS analysis in the depth direction.

圖4(a)~(b)係供於說明本發明之透明導電性薄膜之樣態之圖。 4(a) to 4(b) are views for explaining the state of the transparent conductive film of the present invention.

圖5係供於說明本發明之靜電容用觸控面板之樣態之圖。 Fig. 5 is a view for explaining the state of the touch panel for electrostatic capacitance of the present invention.

圖6係供於說明表面含親水性二氧化矽溶膠之以往之硬塗膜之圖。 Fig. 6 is a view for explaining a conventional hard coat film containing a hydrophilic cerium oxide sol on the surface.

[第1實施形態] [First Embodiment]

第1實施形態係一種硬塗膜,其係於基材薄膜之至少一面具備硬塗層之硬塗膜,其特徵為硬塗層係由至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之硬化物所構成,(B)疏水化二氧化矽溶膠係偏向存在於使硬塗層形成材料硬化後之硬塗層之與基材薄膜相反之表面側,硬塗膜之自最表面至5nm位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子之合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍 內之值。 The first embodiment is a hard coat film comprising a hard coat film having at least one surface of a base film, wherein the hard coat layer contains at least (A) energy ray-curable resin, (B) The hydrophobized cerium oxide sol is composed of a hardened material of a hard coat layer forming material of (C) a bismuth oxide flat agent, and (B) the hydrophobized cerium oxide sol is biased to be present after hardening the hard coat forming material. The surface side of the hard coat layer opposite to the base film, and the total amount of carbon atoms, oxygen atoms, and helium atoms measured by XPS analysis in the depth direction from the outermost surface to the 5 nm position of the hard coat film (100 atom%), the concentration of germanium atoms is in the range of 0.2 to 1.95 atomic % The value inside.

以下,針對第1實施形態之硬塗膜參照適當圖式具體加以說明。 Hereinafter, the hard coat film of the first embodiment will be specifically described with reference to the appropriate drawings.

1.硬塗層形成材料 Hard coating forming material (1)(A)能量線硬化性樹脂 (1) (A) energy ray curable resin (1)-1.種類 (1)-1. Type

構成硬塗層形成材料之(A)能量線硬化性樹脂種類並無特別限制,可由過去習知者中選擇,列舉為能量線硬化性之單體、寡聚物、樹脂、或含彼等之組成物等。 The type of the energy ray-curable resin (A) constituting the hard coat layer forming material is not particularly limited, and may be selected from conventional ones, and is exemplified as an energy ray hardening monomer, an oligomer, a resin, or the like. Composition, etc.

作為具體例,列舉為多官能(甲基)丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯、矽氧(甲基)丙烯酸酯等之單獨一種或兩種以上之組合。 Specific examples are polyfunctional (meth) acrylate, urethane (meth) acrylate, polyester (meth) acrylate, polyether (meth) acrylate, and oxime (methyl) A single one or a combination of two or more of acrylates and the like.

多官能(甲基)丙烯酸酯列舉為1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、己二醇二(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、或季戊四醇四(甲基)丙烯酸酯等之季戊四醇多官能(甲基)丙烯酸酯,二季戊四醇五(甲基)丙烯酸酯或二季戊四醇六(甲基)丙烯酸酯等之二季戊四醇多官能(甲基)丙烯酸酯,丙三醇三(甲基)丙烯酸酯、三烯丙基(甲基)丙烯 酸酯等。 Polyfunctional (meth) acrylates are exemplified as 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylic acid. Ester, ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, hexanediol di(meth)acrylate, trimethylolethane tri(meth)acrylate, trishydroxyl Pentaerythritol polyfunctional (meth) acrylate such as propane tri(meth) acrylate, pentaerythritol tri(meth) acrylate, or pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate or Dipentaerythritol polyfunctional (meth) acrylate such as dipentaerythritol hexa(meth) acrylate, glycerol tri(meth) acrylate, triallyl (meth) propylene Acid esters, etc.

該等中,基於可對硬塗層賦予適度堅硬性而言,較好為季戊四醇多官能(甲基)丙烯酸酯或二季戊四醇多官能(甲基)丙烯酸酯。 Among these, pentaerythritol polyfunctional (meth) acrylate or dipentaerythritol polyfunctional (meth) acrylate is preferable in terms of imparting moderate hardness to the hard coat layer.

且,多官能(甲基)丙烯酸酯亦較好包含EO(環氧乙烷)或PO(環氧丙烷)加成型之多官能(甲基)丙烯酸酯。 Further, the polyfunctional (meth) acrylate also preferably contains an EO (ethylene oxide) or PO (propylene oxide) addition-molded polyfunctional (meth) acrylate.

所謂EO(環氧乙烷)或PO(環氧丙烷)加成型之多官能(甲基)丙烯酸酯係藉由以丙烯酸酯使EO或PO加成型之多元醇酯化獲得之化合物,更具體列舉為EO或PO改質之丙三醇三丙烯酸酯、EO或PO改質之三羥甲基丙烷丙烯酸酯、EO或PO改質之季戊四醇四丙烯酸酯、EO或PO改質之二季戊四醇六丙烯酸酯等。 The EO (ethylene oxide) or PO (propylene oxide)-added polyfunctional (meth) acrylate is a compound obtained by esterifying a EO or PO-molded polyol with an acrylate, and more specifically Glycerol triacrylate modified with EO or PO, trimethylolpropane acrylate modified with EO or PO, pentaerythritol tetraacrylate modified with EO or PO, dipentaerythritol hexaacrylate modified with EO or PO Wait.

該等中,基於對硬塗層賦予適度柔軟性而可防止硬塗層龜裂或破裂而言,較好為EO或PO改質之二季戊四醇六丙烯酸酯、EO或PO改質之三羥甲基丙烷四丙烯酸酯。 Among these, based on imparting moderate flexibility to the hard coat layer to prevent cracking or cracking of the hard coat layer, it is preferably EO or PO modified dipentaerythritol hexaacrylate, EO or PO modified tris. Propane tetraacrylate.

且,EO或PO加成型多官能(甲基)丙烯酸酯中,為了對硬塗層賦予適度柔軟性,該多官能(甲基)丙烯酸酯每1mol之EO或PO加成量較好為6~18莫耳之範圍內之值,更好為8~16莫耳。 Further, in the EO or PO addition molding polyfunctional (meth) acrylate, in order to impart moderate flexibility to the hard coat layer, the amount of EO or PO added per 1 mol of the polyfunctional (meth) acrylate is preferably 6~ The value within the range of 18 moles is preferably 8 to 16 moles.

(1)-2.調配量 (1)-2. Quantity

此外,構成硬塗層形成材料之(A)能量線硬化性樹 脂含有(a1)多官能(甲基)丙烯酸酯化合物、(a2)環氧乙烷或環氧丙烷加成型多官能(甲基)丙烯酸酯化合物,且(a1)多官能(甲基)丙烯酸酯化合物與(a2)環氧乙烷或環氧丙烷加成型之多官能(甲基)丙烯酸酯化合物之含有重量比較好為100:0~20:80之範圍內之值。 Further, (A) an energy ray hardening tree constituting a hard coat forming material The fat contains (a1) a polyfunctional (meth) acrylate compound, (a2) an ethylene oxide or a propylene oxide addition polyfunctional (meth) acrylate compound, and (a1) a polyfunctional (meth) acrylate The weight of the compound (a2) ethylene oxide or propylene oxide-added polyfunctional (meth) acrylate compound is preferably in the range of from 100:0 to 20:80.

該理由係因為硬塗層形成材料藉由以特定含量含有以能量線照射而成為較高硬度之多官能(甲基)丙烯酸酯化合物、與即使藉能量線照射仍具有較高柔軟性之環氧乙烷或環氧丙烷加成型之多官能化合物,而可容易地調整硬塗層之硬度。 The reason for this is because the hard coat forming material contains a polyfunctional (meth) acrylate compound which is higher in hardness by irradiation with an energy ray at a specific content, and an epoxy which has higher flexibility even when irradiated by an energy ray. Ethane or propylene oxide is added to form a polyfunctional compound, and the hardness of the hard coat layer can be easily adjusted.

亦即係因為(a1)多官能(甲基)丙烯酸酯化合物之含有重量比為未達20之值時,有使硬化後之硬塗層之耐擦傷性降低之情況。 In other words, when the weight ratio of the (a1) polyfunctional (meth) acrylate compound is less than 20, the scratch resistance of the hard coat layer after hardening may be lowered.

因此,(a1)多官能(甲基)丙烯酸酯化合物、與(a2)環氧乙烷或環氧丙烷加成型之多官能(甲基)丙烯酸酯化合物之含有重量比更好為95:5~30:70之範圍內之值,又更好為90:10~50:50之範圍內之值。 Therefore, the weight ratio of the (a1) polyfunctional (meth) acrylate compound to the (a2) ethylene oxide or propylene oxide-added polyfunctional (meth) acrylate compound is preferably 95:5~ The value in the range of 30:70 is more preferably in the range of 90:10 to 50:50.

(1)-3.(D)光聚合起始劑 (1)-3. (D) Photopolymerization initiator

此外,本發明之硬塗層形成材料中較好視需要含有(D)光聚合起始劑。 Further, the hard coat forming material of the present invention preferably contains (D) a photopolymerization initiator as needed.

該理由係因為藉由含有光聚合起始劑,對硬塗層形成材料照射活性能量線時,可有效形成硬塗層。 This reason is because the hard coat layer can be effectively formed by irradiating the hard coat layer forming material with an active energy ray by containing a photopolymerization initiator.

此處,所謂光聚合起始劑係指藉紫外線等活性能量線 之照射而產生自由基種之化合物。 Here, the photopolymerization initiator refers to an active energy ray such as ultraviolet rays. A compound that generates a radical species upon irradiation.

光聚合起始劑列舉為例如苯偶因、苯偶因甲基醚、苯偶因乙基醚、苯偶因異丙基醚、苯偶因正丁基醚、苯偶因異丁基醚、苯乙酮、二甲胺基苯乙銅、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、2-羥基-2-甲基-1-苯基丙-1-酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙-1-酮、4-(2-羥基乙氧基)苯基-2-(羥基-2-丙基)酮、二苯甲酮、對-苯基二苯甲酮、4,4-二乙基胺基二苯甲酮、二氯二苯甲酮、2-甲基蒽醌、2-乙基蒽醌、2-第三丁基蒽醌、2-胺基蒽醌、2-甲基噻噸酮、2-乙基噻噸酮、2-氯噻噸酮、2,4-二甲基噻噸酮、2,4-二乙基噻噸酮、苄基二甲基乙縮醛、苯乙酮二甲基乙縮醛、對-二甲胺基苯甲酸酯、寡聚[2-羥基-2-甲基-1-[4-(1-甲基乙烯基)苯基]丙烷]等,該等中可單獨一種使用,亦可組合兩種以上使用。 The photopolymerization initiator is exemplified by, for example, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, Acetophenone, dimethylaminophenethyl copper, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2-hydroxy- 2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropane- 1-ketone, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl) ketone, benzophenone, p-phenylbenzophenone, 4,4-diethyl Aminobenzophenone, dichlorobenzophenone, 2-methylindole, 2-ethylhydrazine, 2-tert-butylindole, 2-aminopurine, 2-methylthioxanthene Ketone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, benzyldimethylacetal, phenylethyl Ketodimethyl acetal, p-dimethylamino benzoate, oligo[2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propane] These may be used alone or in combination of two or more.

又,含有(D)光聚合起始劑時之含量相對於(A)能量線硬化性樹脂100重量份,較好為0.2~20重量份之範圍內之值,更好為0.5~15重量份之範圍內之值,又更好為1~13重量份之範圍內之值。 Further, the content of the (D) photopolymerization initiator is preferably in the range of 0.2 to 20 parts by weight, more preferably 0.5 to 15 parts by weight, per 100 parts by weight of the (A) energy ray-curable resin. The value within the range is more preferably in the range of 1 to 13 parts by weight.

(2)(B)疏水化二氧化矽溶膠 (2) (B) Hydrophobized cerium oxide sol (2)-1.種類 (2)-1. Type

又,硬塗層形成材料之特徵係含(B)疏水化二氧化矽溶膠。 Further, the hard coat forming material is characterized by containing (B) a hydrophobized cerium oxide sol.

此處,二氧化矽溶膠之種類列舉為以烷氧基矽烷化合物或氯矽烷化合物等作為原料之二氧化矽微粒子之溶膠。 Here, the type of the cerium oxide sol is exemplified by a cerium oxide microparticle as a raw material such as an alkoxydecane compound or a chlorosilane compound.

烷氧基矽烷化合物只要具有水解性烷氧基之矽化合物即無特別限制,可列舉為例如以通式(1)表示之化合物。 The alkoxydecane compound is not particularly limited as long as it has a hydrolyzable alkoxy group, and examples thereof include a compound represented by the formula (1).

R1 nSi(OR2)4-n (1) R 1 n Si(OR 2 ) 4-n (1)

(式中R1為氫原子、或非水解性基,具體而言表示烷基、經取代烷基(取代基:鹵原子、環氧基、(甲基)丙烯醯氧基等)、烯基、芳基、或芳烷基,R2表示低級烷基。n為0~2之整數,R1及OR2各自為複數時,複數R1可相同亦可不同,且複數OR2可相同亦可不同)。 (wherein R 1 is a hydrogen atom or a non-hydrolyzable group, specifically, an alkyl group, a substituted alkyl group (substituent: halogen atom, epoxy group, (meth) propylene decyloxy group, etc.), alkenyl group) , aryl or aralkyl, R 2 represents lower alkyl. n is an integer of 0 to 2, and when each of R 1 and OR 2 is plural, plural R 1 may be the same or different, and plural OR 2 may be the same Can be different).

且,以通式(1)表示之烷氧基矽烷化合物較好為四甲氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氧基矽烷、四正丁氧基矽烷、四異丁氧基矽烷、四第二丁氧基矽烷、四第三丁氧基矽烷、三甲氧基氫化矽烷、三乙氧基氫化矽烷、三丙氧基氫化矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三異丙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三乙氧基矽烷、丁基三甲氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、γ-丙烯醯氧基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、二甲基二甲氧基矽烷、甲基苯基二甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、二乙烯基二甲氧基矽烷、二乙烯基二乙氧基矽烷等之單獨一種或兩種以上之組合。 Further, the alkoxydecane compound represented by the formula (1) is preferably tetramethoxydecane, tetraethoxydecane, tetra-n-propoxydecane, tetraisopropoxydecane or tetra-n-butoxydecane. , tetraisobutoxy decane, tetra-butoxy decane, tetra-butoxy decane, trimethoxyhydrogen decane, triethoxyhydrogen decane, tripropoxyhydrogen decane, methyltrimethoxy decane , methyl triethoxy decane, methyl tripropoxy decane, methyl triisopropoxy decane, ethyl trimethoxy decane, ethyl triethoxy decane, propyl triethoxy decane, butyl Trimethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, γ-propylene methoxy propyl trimethoxy decane, γ-methyl propylene methoxy propyl trimethoxy decane, two Methyl dimethoxy decane, methyl phenyl dimethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, divinyl dimethoxy decane, divinyl diethoxy decane A single type or a combination of two or more types.

該情況下,作為烷氧基矽烷化合物,若使n為0或n為1~2且R1為氫原子之化合物完全水解則獲得無機二氧化矽系硬化物,若部分水解,則獲得聚有機矽氧烷系硬化物或無機二氧化矽系與聚有機矽氧烷系之混合系硬化物。 In this case, as the alkoxydecane compound, if the compound in which n is 0 or n is 1 to 2 and R 1 is a hydrogen atom is completely hydrolyzed, an inorganic ceria-based cured product is obtained, and if partially hydrolyzed, a polyorganic is obtained. A sulfoxane-based cured product or a mixed-type cured product of an inorganic cerium oxide-based or polyorganosiloxane.

另一方面,n為1~2,R1為非水解性基之化合物由於具有非水解性基,故藉部分或完全水解,可獲得聚有機矽氧烷系硬化物。 On the other hand, since the compound in which n is 1 to 2 and R 1 is a non-hydrolyzable group has a non-hydrolyzable group, a polyorganosiloxane can be obtained by partial or complete hydrolysis.

氯矽烷化合物列舉為乙基二氯矽烷、乙基三氯矽烷、二甲基二氯矽烷、三氯矽烷、三甲基氯矽烷、二甲基二氯矽烷、甲基三氯矽烷等。 The chlorodecane compound is exemplified by ethyl dichlorodecane, ethyl trichlorodecane, dimethyl dichlorodecane, trichlorodecane, trimethylchlorodecane, dimethyldichlorodecane, methyltrichlorodecane or the like.

且,二氧化矽溶膠係使二氧化矽微粒子在水或有機溶劑中,以溶膠狀態分散者。 Further, the cerium oxide sol is such that the cerium oxide fine particles are dispersed in a sol state in water or an organic solvent.

該有機溶劑並無特別限制,列舉為甲醇、乙醇、異丙醇、乙二醇、正丙基溶纖素、甲基乙基酮、甲基異丁基酮、二甲基乙醯胺、丙二醇單甲基醚、環己烷、苯、甲苯等,但尤佳為沸點較高之甲基異丁基酮、丙二醇單甲基醚。 The organic solvent is not particularly limited and is exemplified by methanol, ethanol, isopropanol, ethylene glycol, n-propyl cellosolve, methyl ethyl ketone, methyl isobutyl ketone, dimethyl acetamide, propylene glycol. Monomethyl ether, cyclohexane, benzene, toluene, etc., but particularly preferred are methyl isobutyl ketone and propylene glycol monomethyl ether having a relatively high boiling point.

此外,本發明之二氧化矽溶膠之特徵為二氧化矽粒子表面之矽烷醇基之一部分或全部以具有疏水性基之表面改質劑處理之疏水化二氧化矽溶膠。 Further, the cerium oxide sol of the present invention is characterized in that a part or all of the stanol group on the surface of the cerium oxide particle is hydrophobized cerium oxide sol treated with a surface modifying agent having a hydrophobic group.

此處,表面改質劑列舉為同時具有可對二氧化矽粒子表面上之矽烷醇基反應之官能基與疏水基之矽烷偶合劑。 Here, the surface modifier is exemplified by a decane coupling agent having both a functional group and a hydrophobic group which can react with a stanol group on the surface of the cerium oxide particle.

更具體列舉為例如CIK Nanotech公司製之SIRPGM 15WT%-E26等作為疏水化二氧化矽溶膠。 More specifically, for example, SIRPGM manufactured by CIK Nanotech Co., Ltd. 15WT%-E26 or the like as a hydrophobized cerium oxide sol.

(2)-2.疏水化度 (2)-2. Hydrophobicity

且,二氧化矽溶膠之疏水化度係將二氧化矽溶膠塗佈於PET薄膜上,去除溶劑作成二氧化矽溶膠塗膜,且測定水對該塗膜之接觸角加以判斷。 Further, the degree of hydrophobicity of the cerium oxide sol is obtained by applying a cerium oxide sol onto a PET film, removing the solvent to form a cerium oxide sol coating film, and measuring the contact angle of the coating film with water.

更具體而言,水對於將二氧化矽溶膠進行塗膜時之塗膜的接觸角較好為100°以上之值。 More specifically, the contact angle of the coating film when water is applied to the cerium oxide sol is preferably 100 or more.

亦即,依據JIS R 3257測定之水對二氧化矽溶膠之塗膜之接觸角若為100°以上之值,則可判斷二氧化矽溶膠之表面為疏水性。 That is, if the contact angle of the water to the coating film of the cerium oxide sol measured in accordance with JIS R 3257 is 100 or more, the surface of the cerium oxide sol can be judged to be hydrophobic.

此處,圖2顯示供於概念性說明本發明之硬塗膜20之圖。 Here, Fig. 2 shows a diagram for conceptually explaining the hard coat film 20 of the present invention.

更具體而言,本發明之疏水化二氧化矽溶膠16,於將硬塗層形成材料塗佈於基材表面並硬化時,認為在硬塗層12內與其他成分相分離,且較多偏向存在於與基材表面10相反之表面側,存在於基材表面附近及硬塗層內之比例變低。 More specifically, the hydrophobized cerium oxide sol 16 of the present invention is considered to be separated from other components in the hard coat layer 12 when the hard coat layer forming material is applied to the surface of the substrate and hardened, and is more biased. The surface side opposite to the surface 10 of the substrate is present, and the ratio existing in the vicinity of the surface of the substrate and in the hard coat layer becomes low.

因此,藉由添加少量疏水化二氧化矽溶膠,可對硬塗層表面賦予適度之表面粗糙度,故即使硬塗膜彼此重疊且經過一段時間時,仍可防止薄膜彼此產生黏連(壓著)。 Therefore, by adding a small amount of the hydrophobized cerium oxide sol, a moderate surface roughness can be imparted to the surface of the hard coat layer, so that even if the hard coat films overlap each other and over a period of time, the films are prevented from sticking to each other (pressing ).

亦即,可理解為由於可以較少量添加而發揮特定之耐黏連性(有時稱為抗黏連性)之效果,故可獲得透明性高之硬塗膜。 That is, it can be understood that since a specific anti-blocking property (sometimes referred to as anti-blocking property) can be exerted in a small amount, a hard coat film having high transparency can be obtained.

又,水對疏水化二氧化矽溶膠之塗膜之接觸角過高時,在進而將透明導電層等層合於硬塗膜上時會有密著性下降之虞,故更好將水對於疏水化二氧化矽溶膠之塗膜之接觸角設為100~130°之範圍內之值。 Further, when the contact angle of water to the coating film of the hydrophobized cerium oxide sol is too high, when the transparent conductive layer or the like is further laminated on the hard coating film, the adhesion is lowered, so that water is more preferable. The contact angle of the coating film of the hydrophobized cerium oxide sol is set to a value in the range of 100 to 130°.

另一方面,水對二氧化矽溶膠之塗膜之接觸角為未達100°之值時,親水性變高,則如圖6所示,確認二氧化矽溶膠18不會僅偏向存在於與基材薄膜相反之表面側,而以分散於硬塗層內部全體之狀態存在。 On the other hand, when the contact angle of water to the coating film of the cerium oxide sol is less than 100, the hydrophilicity becomes high, and as shown in Fig. 6, it is confirmed that the cerium oxide sol 18 is not biased only in existence and The base film is on the opposite surface side, and is present in a state of being dispersed throughout the entire interior of the hard coat layer.

因此,可理解為了對硬塗層賦予特定之表面粗糙度,必須調配較大量之二氧化矽溶膠。 Therefore, it is understood that in order to impart a specific surface roughness to the hard coat layer, a relatively large amount of cerium oxide sol must be formulated.

又,水對二氧化矽溶膠之塗膜之接觸角之測定方法可藉由如實施例1中具體說明般,製備二氧化矽溶膠塗膜,並測定水之接觸角而算出。 Further, the method for measuring the contact angle of water to the coating film of the cerium oxide sol can be calculated by preparing a cerium oxide sol coating film as described in the first embodiment and measuring the contact angle of water.

(2)-3.平均粒徑 (2)-3. Average particle size

又,本發明之疏水化二氧化矽溶膠之平均粒徑較好為10~100nm之範圍內之值。 Further, the average particle diameter of the hydrophobized cerium oxide sol of the present invention is preferably in the range of 10 to 100 nm.

其理由係因為疏水化二氧化矽溶膠之平均粒徑為未達10nm之值時,難以獲得特定之表面粗糙度,尤其少量調配時,有難以防止黏連產生之情況。 The reason for this is that when the average particle diameter of the hydrophobized cerium oxide sol is less than 10 nm, it is difficult to obtain a specific surface roughness, and in particular, when a small amount is blended, it is difficult to prevent the occurrence of adhesion.

另一方面,因為疏水化二氧化矽溶膠之平均粒徑為超過100nm之值時,有使硬塗膜之光學特性過低之情況。 On the other hand, when the average particle diameter of the hydrophobized cerium oxide sol is more than 100 nm, the optical characteristics of the hard coat film may be too low.

因此,疏水化二氧化矽溶膠之平均粒徑較好為10~50nm之範圍內之值,更好為15~40nm之範圍內之 值。 Therefore, the average particle diameter of the hydrophobized cerium oxide sol is preferably in the range of 10 to 50 nm, more preferably in the range of 15 to 40 nm. value.

又,二氧化矽溶膠之平均粒徑係使用雷射繞射散射式粒度分佈測定裝置求出之體積基準之粒度分佈中於累積值50%之粒徑(中值徑D50),且意指平均一次粒徑。 Further, the average particle diameter of the cerium oxide sol is a particle diameter (median diameter D50) of 50% of the cumulative value in the particle size distribution of the volume reference determined by the laser diffraction scattering type particle size distribution measuring apparatus, and means average Primary particle size.

(2)-4.調配量 (2)-4. Quantity

且,特徵為本發明之疏水化二氧化矽溶膠之調配量相對於(A)能量線硬化性樹脂100重量份,以固體成分換算為0.3~55重量份之範圍內之值。 In addition, the amount of the hydrophobized cerium oxide sol of the present invention is a value in the range of 0.3 to 55 parts by weight in terms of solid content, based on 100 parts by weight of the (A) energy ray-curable resin.

其理由係因為疏水化二氧化矽溶膠之調配量為未達0.3重量份之值時,會有難以展現防止硬塗膜彼此黏連之效果之情況。 The reason for this is that when the amount of the hydrophobized cerium oxide sol is less than 0.3 parts by weight, it may be difficult to exhibit an effect of preventing the hard coat films from sticking to each other.

另一方面,因為疏水化二氧化矽溶膠之調配量為超過55重量份之值時,會有硬塗膜之密著性或耐擦傷性過低之情況。 On the other hand, when the amount of the hydrophobized cerium oxide sol is more than 55 parts by weight, the adhesion of the hard coat film or the scratch resistance may be too low.

且,如上述般由於疏水化二氧化矽溶膠容易偏向存在於硬塗層內之與基材表面相反之表面側,故疏水化二氧化矽溶膠之調配量相對於(A)能量線硬化性樹脂100重量份以固體成分換算為0.3~25重量份之範圍內時,即使疏水化二氧化矽溶膠之調配量為較少量,不僅亦可有效地展現耐黏連之效果,且透明性亦優異,故可適當地使用作為要求透明度之透明導電薄膜用之硬塗膜。 Further, as described above, since the hydrophobized cerium oxide sol tends to be biased toward the surface side opposite to the surface of the substrate present in the hard coat layer, the amount of the hydrophobized cerium oxide sol is adjusted relative to (A) the energy ray-curable resin When 100 parts by weight of the solid content is in the range of 0.3 to 25 parts by weight, even if the amount of the hydrophobized cerium oxide sol is small, the adhesion resistance can be effectively exhibited, and the transparency is excellent. Therefore, a hard coat film for a transparent conductive film requiring transparency can be suitably used.

因此,疏水化二氧化矽溶膠之調配量相對於(A)能量線硬化性樹脂100重量份以固體成分換算更好為0.3~25 重量份之範圍內之值,又更好為0.3~10重量份之範圍內之值,最好為0.4~3.0重量份之範圍內之值。 Therefore, the amount of the hydrophobized cerium oxide sol is preferably 0.3 to 25 in terms of solid content based on 100 parts by weight of the (A) energy ray-curable resin. The value in the range of parts by weight is more preferably in the range of from 0.3 to 10 parts by weight, more preferably in the range of from 0.4 to 3.0 parts by weight.

(3)(C)平坦劑 (3) (C) flat agent (3)-1.構成 (3)-1. Composition

且,作為硬塗層形成材料之特徵係含(C)矽氧系平坦劑。 Further, the hard coat layer forming material is characterized by containing (C) a rhodium-based flattening agent.

又,特徵為硬塗膜之自最表面至5nm之位置之區域中,相對於藉深度方向之XPS分析測定之碳原子、氧原子、矽原子之合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 Further, in the region from the outermost surface to the position of 5 nm of the hard coat film, the total atomic concentration (100 atomic %) of the carbon atom, the oxygen atom, and the ruthenium atom measured by XPS analysis in the depth direction is A value in the range of 0.2 to 1.95 atomic %.

一般已知平坦劑在硬塗層形成材料內,藉由大部偏向存在於最表面側,而可抑制塗膜對基材薄膜之變形或彈開。 It is generally known that the flat agent is present on the outermost surface side in the hard coat layer forming material, and deformation or buckling of the base film by the coating film can be suppressed.

本發明中,如圖2所示,在硬塗層內如上述般,使疏水化二氧化矽溶膠偏向存在於與基材表面相反之表面側,且矽氧系平坦劑覆蓋疏水化二氧化矽溶膠以特定量之範圍偏向存在於最表面,藉此藉由疏水化二氧化矽溶膠及矽氧系平坦劑之相互作用,可獲得耐黏連性及平坦性能優異之硬塗膜。 In the present invention, as shown in Fig. 2, the hydrophobized cerium oxide sol is biased toward the surface side opposite to the surface of the substrate in the hard coat layer as described above, and the xenon-based flat agent covers the hydrophobized cerium oxide. The sol is present on the outermost surface in a specific amount range, whereby a hard coat film excellent in blocking resistance and flatness can be obtained by the interaction of the hydrophobized cerium oxide sol and the oxynium-based flat agent.

更具體而言,本發明之硬塗膜中,自最表面朝向基材之深度方向之藉XPS分析(X射線光電子分光分析)測定之結果示於圖3。 More specifically, in the hard coat film of the present invention, the results of XPS analysis (X-ray photoelectron spectroscopy) measurement from the outermost surface toward the depth direction of the substrate are shown in Fig. 3 .

此處,由圖3可理解自最表面朝向基材至5nm之區 域中,矽原子濃度為0.28原子%,至10nm之區域中為0.29原子%,至50nm之區域中為0.30原子%,至100nm之區域中為0.20原子%,於超過100nm之區域後矽濃度急遽上升且至150nm之區域中成為22.01原子%。 Here, it can be understood from Fig. 3 that the area from the outermost surface toward the substrate to 5 nm In the domain, the concentration of germanium atoms is 0.28 atom%, 0.29 atom% in the region to 10 nm, 0.30 atom% in the region to 50 nm, and 0.20 atom% in the region to 100 nm, and the concentration of germanium in the region exceeding 100 nm is imminent. It rises to become 22.01 atom% in the region of 150 nm.

亦即,可理解如上述,本發明中,硬塗層內如圖2所例示,距離基材最遠之區域中矽氧系平坦劑以覆蓋疏水化二氧化矽溶膠之方式以極薄膜之狀態14偏向存在。 That is, as can be understood from the above, in the present invention, as shown in FIG. 2, the hard coat layer in the region farthest from the substrate is in the form of a thin film in a manner of covering the hydrophobized cerium oxide sol. 14 biased to exist.

因此,藉由規定自硬塗膜之最表面至5nm之位置之區域中,相對於藉深度方向之XPS分析測定之碳原子、氧原子、矽原子之合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值,而有效地控制最表面存在之平坦劑,藉此可有效地提高平坦性能與耐黏連性。 Therefore, by specifying the area from the outermost surface of the hard coating film to the position of 5 nm, the total amount of carbon atoms, oxygen atoms, and helium atoms (100 atomic %) measured by XPS analysis in the depth direction, the atomic concentration of germanium The value is in the range of 0.2 to 1.95 atom%, and the flat agent present on the outermost surface is effectively controlled, whereby the flatness and the blocking resistance can be effectively improved.

亦即,因為矽原子濃度為未達0.2原子%之值時,塗佈硬塗層形成材料時,由於平坦劑無法形成硬塗層形成材料之塗膜之最表面之薄膜,故隨著塗膜變形、彈開,而有難以形成均勻薄膜之情況。 That is, since the concentration of the germanium atom is less than 0.2 atomic %, when the hard coat layer forming material is applied, since the flat agent cannot form the film on the outermost surface of the coating film of the hard coat layer forming material, It deforms and bounces, and it is difficult to form a uniform film.

另一方面,因為矽原子濃度為超過1.95原子%之值時,由於硬塗層表面之表面能降低,故即使進而層合導電層等,隨後亦有出現導電層脫落等情況。 On the other hand, when the concentration of the ruthenium atom is more than 1.95 atomic%, the surface energy of the surface of the hard coat layer is lowered. Therefore, even if the conductive layer or the like is laminated, the conductive layer may be peeled off or the like.

因此,更好將硬塗膜之自最表面至5nm之位置之區域中之矽原子濃度設為0.21~1.95原子%之範圍內之值,又更好為0.23~1.94原子%之範圍內之值。 Therefore, it is preferable to set the value of the germanium atom in the region from the outermost surface to the position of 5 nm from the outermost surface to the range of 0.21 to 1.95 atomic %, and more preferably in the range of 0.23 to 1.94 atomic %. .

又,藉XPS之元素分析測定之矽原子濃度意指硬塗 層全體中,藉深度方向之XPS分析測定之各深度下之矽原子濃度。 Moreover, the atomic concentration determined by elemental analysis of XPS means hard coating The concentration of germanium atoms at each depth measured by XPS analysis in the depth direction of the entire layer.

(3)-2.種類 (3)-2. Type

且,作為(C)矽氧系平坦劑較好由矽氧改質丙烯酸、聚醚改質聚二甲基矽氧烷、聚醚酯改質之含羥基之聚二甲基矽氧烷、聚酯改質之含羥基之聚二甲基矽氧烷、聚醚改質之聚二甲基矽氧烷所組成之群選出之至少1種。 Further, as the (C) oxime-based flattening agent, a hydroxyl group-containing polydimethyl siloxane having a modification of oxime-modified acrylic acid, a polyether-modified polydimethyl siloxane or a polyether ester is preferably used. At least one selected from the group consisting of an ester-modified hydroxy group-containing polydimethyl siloxane and a polyether-modified polydimethyl siloxane.

其理由為若矽氧平坦劑為該等種類,則容易使硬塗層表面之平坦劑薄膜14中之矽原子濃度落在上述範圍內之值,可均衡良好地提高平坦劑所要求之表面平滑化、與進一步層合導電層等時之接著性。 The reason for this is that if the oxygen-containing flattening agent is of such a type, the concentration of the ruthenium atom in the flattening agent film 14 on the surface of the hard coat layer is likely to fall within the above range, and the surface smoothness required for the flat agent can be improved in a balanced manner. And the subsequent adhesion of the conductive layer and the like.

因此,若為本發明之矽氧系平坦劑,則不僅是導電層,而且例如在硬塗層上形成接著劑層或印刷層時,仍可提高與該接著劑層等之密著性。 Therefore, in the case of the oxime-based flat agent of the present invention, not only the conductive layer but also the adhesive layer or the printed layer on the hard coat layer can improve the adhesion to the adhesive layer or the like.

且,上述矽氧系平坦劑中,尤其更好含具有乙烯基等之反應性矽氧系平坦劑。 Further, among the above-mentioned oxo-based flat agents, a reactive oxime-based flat agent having a vinyl group or the like is particularly preferably contained.

其理由為矽氧系平坦劑若為反應性平坦劑,則可與能量線硬化性樹脂反應,形成更堅固之平坦劑薄膜,可減輕例如組裝於圖像顯示裝置等時之源自平坦劑之污染等。 The reason for this is that if the rhodium-based flat agent is a reactive flat agent, it can react with the energy ray-curable resin to form a stronger flat film, which can be reduced, for example, from a flat agent when assembled in an image display device or the like. Pollution, etc.

又,關於一般有用之氟系平坦劑作為平坦劑,在本發明中雖確實可有效抑制彈開,但由於撥水性高,故導電層等之接著性差,確認無法展現由矽氧系平坦劑與疏水化二氧化矽溶膠所致之相乘效果。 In addition, in the present invention, the fluorine-based flattening agent is generally used as a flattening agent, and it is effective in suppressing the elastic opening. However, since the water repellency is high, the adhesion of the conductive layer or the like is poor, and it is confirmed that the silicone-based flattening agent cannot be exhibited. The synergistic effect caused by the hydrophobized cerium oxide sol.

(3)-3.調配量 (3)-3. Quantity

此外,較好進而以相對於(A)能量線硬化性樹脂100重量份為0.045~5重量份之範圍內之值調配(C)平坦劑。 Further, it is preferred to further mix (C) a flat agent with a value within a range of 0.045 to 5 parts by weight based on 100 parts by weight of the (A) energy ray-curable resin.

其理由係因為藉由使平坦劑成為此範圍內之值,而於硬塗層上形成透明導電層時,可提高與透明導電性層之密著性。 The reason for this is that when the transparent conductive layer is formed on the hard coat layer by setting the flat agent to a value within this range, the adhesion to the transparent conductive layer can be improved.

更具體而言,係因為平坦劑之調配量為未達0.045重量份之值時,平坦劑在基材之最表面之偏向存在不充分,會有隨著硬塗層形成材料之塗膜變形、彈開,而難以形成均勻塗膜之情況。 More specifically, when the amount of the flat agent is less than 0.045 parts by weight, the flatness of the flat agent on the outermost surface of the substrate is insufficient, and the coating film of the hard coat forming material is deformed. It is difficult to form a uniform coating film when it is bounced off.

另一方面,係因為平坦劑之調配量為超過5重量份之值時,超過平坦效果之平坦劑將局部化,使硬塗層表面之表面能降低,於硬塗層上層合導電層等時,隨後仍會有出現導電層脫落等之情況。 On the other hand, when the amount of the flat agent is more than 5 parts by weight, the flat agent exceeding the flat effect is localized, the surface energy of the surface of the hard coat layer is lowered, and the conductive layer or the like is laminated on the hard coat layer. Then, there will still be cases where the conductive layer falls off.

因此,更好將(C)平坦劑之調配量設為0.05~3重量份之範圍內之值,又更好設為0.05~2重量份之範圍內之值。 Therefore, it is more preferable to set the amount of the (C) leveling agent to a value in the range of 0.05 to 3 parts by weight, and more preferably in the range of 0.05 to 2 parts by weight.

(4)其他添加劑 (4) Other additives

又,在不損及本發明效果之範圍內,可適當含其他添加劑。 Further, other additives may be appropriately contained within the range not impairing the effects of the present invention.

其他添加劑列舉為例如抗氧化劑、紫外線吸收劑、抗 靜電劑、聚合促進劑、聚合抑制劑、紅外線吸收劑、可塑劑及稀釋溶劑等。 Other additives are listed, for example, as antioxidants, ultraviolet absorbers, and anti-drugs. An electrostatic agent, a polymerization accelerator, a polymerization inhibitor, an infrared ray absorbing agent, a plasticizer, a diluent solvent, and the like.

又,其他添加劑之含量一般相對於(A)能量線硬化性樹脂100重量份較好為0.01~5重量份之範圍內之值,更好為0.02~3重量份之範圍內之值,又更好為0.05~2重量份之範圍內之值。 Further, the content of the other additives is generally preferably in the range of 0.01 to 5 parts by weight, more preferably in the range of 0.02 to 3 parts by weight, based on 100 parts by weight of the (A) energy ray-curable resin, and more preferably It is preferably in the range of 0.05 to 2 parts by weight.

(5)厚度 (5) Thickness

且,較好將圖1所例示之硬塗層12之厚度設為1~10μm之範圍內之值。 Further, the thickness of the hard coat layer 12 exemplified in Fig. 1 is preferably set to a value within a range of 1 to 10 μm.

其理由係因為該硬塗層之厚度為未達1μm之值時,會有耐擦傷性顯著下降之情況。 The reason for this is that the scratch resistance is remarkably lowered when the thickness of the hard coat layer is less than 1 μm.

另一方面,因為硬塗層之厚度為超過10μm之值時,會有捲曲變大之情況。 On the other hand, since the thickness of the hard coat layer is a value exceeding 10 μm, the curl becomes large.

因此,更好將硬塗層之厚度設為1~5μm之範圍內之值,又更好設為1.5~4μm之範圍內之值。 Therefore, it is more preferable to set the thickness of the hard coat layer to a value in the range of 1 to 5 μm, and more preferably to a value in the range of 1.5 to 4 μm.

2.基材薄膜 2. Substrate film (1)種類 (1) Category

圖1(a)~(b)中例示之基材薄膜10中使用之樹脂只要是柔軟性及透明性優異者即無特別限制,可列舉為聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯膜、聚碳酸酯膜、聚乙烯膜、聚丙烯膜、玻璃紙、二乙醯基纖維素膜、三乙醯基纖維素膜、乙醯基纖維 素丁酸酯膜、聚氯乙烯膜、聚偏氯乙烯膜、聚乙烯醇膜、乙烯-乙酸乙烯酯共聚物膜、聚苯乙烯膜、聚甲基戊烯膜、聚碸膜、聚醚醚酮膜、聚醚碸膜、聚醚醯亞胺膜、聚醯亞胺膜、氟樹脂膜、聚醯胺膜、丙烯酸樹脂膜、聚胺基甲酸酯樹脂膜、降冰片烯系樹脂膜、環烯烴樹脂膜等其他塑膠膜。 The resin used in the base film 10 illustrated in (a) to (b) of FIG. 1 is not particularly limited as long as it is excellent in flexibility and transparency, and examples thereof include polyethylene terephthalate and polyparaphenylene. Polyester film such as butylene formate or polyethylene naphthalate, polycarbonate film, polyethylene film, polypropylene film, cellophane, diethyl cellulose film, triethylene glycol cellulose film, acetamidine Base fiber Butyrate film, polyvinyl chloride film, polyvinylidene chloride film, polyvinyl alcohol film, ethylene-vinyl acetate copolymer film, polystyrene film, polymethylpentene film, polyfluorene film, polyether ether a ketone film, a polyether ruthenium film, a polyether quinone film, a polyimide film, a fluororesin film, a polyamide film, an acrylic resin film, a polyurethane resin film, a norbornene resin film, Other plastic films such as cycloolefin resin film.

該等中,基於透明性優異,且具有廣用性,較好使用由聚對苯二甲酸乙二酯或聚碳酸酯所成之透明樹脂膜。 Among these, a transparent resin film made of polyethylene terephthalate or polycarbonate is preferably used because it is excellent in transparency and has wide versatility.

(2)厚度 (2) Thickness

且,圖1(a)~(b)中例示之基材薄膜10之厚度較好設為15~250μm之範圍內之值。 Further, the thickness of the base film 10 exemplified in FIGS. 1(a) to (b) is preferably set to a value within a range of 15 to 250 μm.

其理由係因為基材薄膜之厚度為未達15μm之值時,容易產生皺紋等使操作性顯著降低,另一方面,因為基材薄膜之厚度超過250μm時,操作性降低,尤其會有難以捲成輥狀之情況。 The reason for this is that when the thickness of the base film is less than 15 μm, wrinkles and the like are likely to occur, and workability is remarkably lowered. On the other hand, when the thickness of the base film exceeds 250 μm, workability is lowered, and in particular, it is difficult to roll. In the case of a roll.

因此,基於使機械強度與光透過性之間之均衡更為良好,更好將基材薄膜之厚度設為25~125μm之範圍內之值。 Therefore, the thickness of the base film is preferably set to a value within a range of 25 to 125 μm, based on a better balance between mechanical strength and light transmittance.

(3)底塗層 (3) Undercoat

又,雖未圖示,但藉由於基材薄膜之表面設置底塗層,可提高基材薄膜與硬塗層之密著性且進一步提高硬塗層之耐擦傷性。 Further, although not shown, by providing an undercoat layer on the surface of the base film, the adhesion between the base film and the hard coat layer can be improved, and the scratch resistance of the hard coat layer can be further improved.

此處,底塗層之構成材料列舉為胺基甲酸酯樹脂、丙烯酸樹脂、環氧樹脂、聚酯樹脂、矽氧樹脂等單獨一種或兩種以上之組合。 Here, the constituent material of the undercoat layer is exemplified by a urethane resin, an acrylic resin, an epoxy resin, a polyester resin, a silicone resin, or the like, alone or in combination of two or more.

此外,較好將底塗層之厚度設為0.01~20μm之範圍內之值。 Further, it is preferred to set the thickness of the undercoat layer to a value in the range of 0.01 to 20 μm.

其理由係因為底塗層之厚度為未達0.01μm之值時,會有無法展現底塗效果之情況。另一方面,因為底塗層之厚度為超過20μm之值時,構成硬塗膜時會有光透過性降低之情況。 The reason is that when the thickness of the undercoat layer is less than 0.01 μm, the undercoating effect may not be exhibited. On the other hand, when the thickness of the undercoat layer is more than 20 μm, the light transmittance may be lowered when the hard coat film is formed.

因此,為使底塗效果與光透過性間之均衡更為良好,更好將底塗層之厚度設為0.1~15μm之範圍內之值。 Therefore, in order to make the balance between the undercoating effect and the light transmittance better, it is more preferable to set the thickness of the undercoat layer to a value in the range of 0.1 to 15 μm.

3.硬塗膜之特性 3. Characteristics of hard coating film (1)硬塗層之表面粗糙度 (1) Surface roughness of hard coating

此外,圖1(a)~(b)中例示之硬塗層12、12’之表面之依據JIS B 0601-1994測定之算術平均粗糙度(Ra)較好為1.5~5nm之範圍內之值。 Further, the arithmetic mean roughness (Ra) measured on the surface of the hard coat layers 12, 12' exemplified in Figs. 1(a) to (b) in accordance with JIS B 0601-1994 is preferably in the range of 1.5 to 5 nm. .

其理由係因為該算術平均粗糙度(Ra)為未達1.5nm之值時,捲取硬塗膜並重疊時有難以防止鄰接之硬塗膜彼此貼附之所謂黏連之情況。 The reason for this is that when the arithmetic mean roughness (Ra) is less than 1.5 nm, it is difficult to prevent the so-called adhesion of the adjacent hard coat films to each other when the hard coat film is wound up and overlapped.

另一方面,因為算術平均粗糙度(Ra)為超過5nm之值時,會有光透過性顯著降低之情況。 On the other hand, when the arithmetic mean roughness (Ra) is a value exceeding 5 nm, the light transmittance may be remarkably lowered.

因此,硬塗層表面之算術平均粗糙度(Ra)較好為2.0~4nm之範圍內之值,更好為2.5~3.5nm之範圍內之 值。 Therefore, the arithmetic mean roughness (Ra) of the surface of the hard coat layer is preferably in the range of 2.0 to 4 nm, more preferably in the range of 2.5 to 3.5 nm. value.

(2)硬塗層之鉛筆硬度 (2) Hard coat pencil hardness

此外,圖1(a)~(b)中例示之硬塗層之以JIS K 5600-5-4測定之鉛筆硬度較好為HB以上。 Further, the pencil hardness of the hard coat layer illustrated in FIGS. 1(a) to (b) measured by JIS K 5600-5-4 is preferably HB or more.

其理由係因為該鉛筆硬度為未達HB之值時,使用於靜電容觸控面板時,會有耐擦傷性不足之情況。 The reason is that when the pencil hardness is less than the value of HB, when it is used for a capacitive touch panel, there is a case where the scratch resistance is insufficient.

(3)硬塗膜之濁度值 (3) turbidity value of hard coating film

此外,圖1(a)~(b)中例示之硬塗膜20、20’之依據JIS K 7105測定之濁度值較好為1.0%以下之值。 Further, the turbidity value measured by JIS K 7105 of the hard coat films 20 and 20' exemplified in Figs. 1(a) to (b) is preferably 1.0% or less.

其理由係因為濁度值為超過1.0%之值時,使用於行動電話等時,會有液晶顯示裝置之顯示看起來模糊之情況。 The reason is that when the haze value is more than 1.0%, when it is used in a mobile phone or the like, the display of the liquid crystal display device may be blurred.

[第2實施形態] [Second Embodiment]

第2實施形態係一種硬塗膜之製造方法,其係於基材薄膜之至少一面上具備硬塗層之硬塗膜之製造方法,其特徵係包含下述步驟(1)~(3):(1)準備至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之步驟,(2)於基材薄膜之至少一面上塗佈硬塗層形成材料之步驟, (3)使硬塗層形成材料硬化,形成具備硬塗層之硬塗膜之步驟,該硬塗層係(B)疏水化二氧化矽溶膠偏向存在於使硬塗層形成材料硬化後之硬塗層之與基材薄膜相反之表面側,硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 The second embodiment is a method for producing a hard coat film, which is a method for producing a hard coat film having a hard coat layer on at least one side of a base film, and the method includes the following steps (1) to (3): (1) preparing a step of forming a material containing at least (A) an energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a cerium-oxygen leveling agent, and (2) a substrate film a step of applying a hard coat forming material on at least one side, (3) a step of hardening the hard coat layer forming material to form a hard coat film having a hard coat layer, wherein the hard coat layer (B) hydrophobized cerium oxide sol is biased to be hard after hardening the hard coat layer forming material The surface side of the coating opposite to the substrate film, and the area of the hard coating film from the outermost surface to the position of 5 nm, relative to the carbon atom, oxygen atom, and ruthenium atomium measured by XPS analysis in the depth direction ( 100 atom%), the value of the germanium atom concentration in the range of 0.2 to 1.95 atom%.

以下,關於所使用之基材薄膜及硬塗層與第1實施形態為相同內容,故以硬塗膜之製造方法有關之事項為中心加以說明。 In the following, the base film and the hard coat layer to be used are the same as those in the first embodiment, and therefore, the matters relating to the method for producing the hard coat film will be mainly described.

(1)步驟1:硬塗層形成材料之準備步驟 (1) Step 1: Preparation steps of hard coat forming material

步驟(1)係準備至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之步驟。 The step (1) is a step of preparing a hard coat forming material containing at least (A) an energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a cerium-oxygen flattening agent.

更具體而言,係均勻混合前述硬塗層形成材料與稀釋溶劑之步驟。 More specifically, the step of uniformly mixing the aforementioned hard coat layer forming material with a diluent solvent.

至於溶劑列舉為例如甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、戊醇、乙基溶纖素、苯、甲苯、二甲苯、乙基苯、環己烷、乙基環己烷、乙酸乙酯、乙酸丁酯、甲基乙基酮、甲基異丁基酮、環己酮、四氫呋喃、丙烯單甲基醚及水等,亦可組合兩種以上之溶劑。 The solvent is exemplified by, for example, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, pentanol, ethyl cellosolve, benzene, toluene, xylene, ethylbenzene, cyclohexane, and B. Further, two or more solvents may be combined, such as cyclohexane, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, tetrahydrofuran, propylene monomethyl ether, and water.

尤其,基於可容易溶解丙烯酸單體等能量線硬化性樹脂,較好使用丙烯單甲基醚、甲苯、甲基乙基酮、乙酸乙 酯、乙酸正丁酯、環己酮、甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、戊醇等。 In particular, based on an energy ray-curable resin which can easily dissolve an acrylic monomer, propylene monomethyl ether, toluene, methyl ethyl ketone, and acetic acid B are preferably used. Ester, n-butyl acetate, cyclohexanone, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, pentanol, and the like.

又,關於特定硬塗層形成材料之構成由於如先前記載故省略。 Further, the configuration of the specific hard coat layer forming material is omitted as described above.

(2)步驟2:硬塗層形成材料對基材薄膜之塗佈步驟 (2) Step 2: Coating step of the hard coat forming material on the base film

步驟(2)係將硬塗層形成材料塗佈於基材薄膜之至少一面之步驟。 The step (2) is a step of applying a hard coat layer forming material to at least one side of the base film.

更具體而言,係準備基材薄膜10,且以使硬化後之硬塗層之膜厚成為1~10μm之範圍內之值之方式將步驟(1)中調整之硬塗層形成材料塗佈於其上之步驟。 More specifically, the base film 10 is prepared, and the hard coat layer-forming material adjusted in the step (1) is coated in such a manner that the film thickness of the hard coat layer after hardening is in the range of 1 to 10 μm. The steps above it.

又,關於硬塗層形成材料之塗佈方法並無特別限制,可使用習知方法,例如棒塗佈法、凹版塗佈法、刮刀塗佈法、輥塗佈法、刮板塗佈法、模嘴塗佈法等。 Further, the coating method of the hard coat layer forming material is not particularly limited, and a conventional method such as a bar coating method, a gravure coating method, a knife coating method, a roll coating method, a blade coating method, or the like can be used. Mold coating method, etc.

(3)步驟3:硬塗層形成材料之硬化及硬塗膜形成步驟 (3) Step 3: Hardening of hard coating material and hard coating film formation step

步驟(3)係使前述之硬塗層形成材料硬化,形成硬塗膜之步驟,(B)疏水化二氧化矽溶膠偏向存在於使硬塗層之與基材薄膜相反之表面側,且硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 The step (3) is a step of hardening the hard coat layer forming material to form a hard coat film, and (B) the hydrophobized cerium oxide sol is biased to exist on the surface side opposite to the base film of the hard coat layer, and is hard. In the region from the outermost surface to the 5 nm position of the coating film, the atomic concentration of germanium atoms is 0.2 to 1.95 atoms with respect to the carbon atom, oxygen atom, and helium atom (100 atom%) measured by XPS analysis in the depth direction. The value in the range of %.

更具體而言,較好對於經過乾燥步驟,已蒸發溶劑之硬塗層形成材料之塗佈物,照射能量線,例如紫外線或電 子束而硬化。 More specifically, it is preferred that the coating of the hard coat forming material that has evaporated the solvent after the drying step is irradiated with an energy ray such as ultraviolet rays or electricity. The bundle is hardened.

如此實施時可迅速形成硬塗層,同時可與基材薄膜堅固密著。 In this way, the hard coat layer can be formed quickly, and at the same time, it can be firmly adhered to the substrate film.

又,可使疏水化二氧化矽溶膠有效地偏向存在於與硬塗層之基材薄膜相反之表面側。 Further, the hydrophobized cerium oxide sol can be effectively biased to exist on the surface side opposite to the base film of the hard coat layer.

再者,可使矽氧系平坦劑偏向存在於最表面,而容易將最表面之矽原子濃度調整在上述範圍。 Further, the xenon-based flat agent can be biased to the outermost surface, and the atomic concentration of the outermost surface can be easily adjusted to the above range.

因此,可提高硬塗層之機械強度,同時有效防止硬塗膜彼此之黏連,且可提高進而層合導電層等時之接著性。 Therefore, the mechanical strength of the hard coat layer can be improved, and at the same time, the adhesion of the hard coat films to each other can be effectively prevented, and the adhesion at the time of laminating the conductive layer or the like can be improved.

此外,形成硬塗層時,例如照射紫外線時,較好將對硬塗層形成材料之照射量(累積光量)設為100~1000mJ/cm2之範圍內之值。 Further, when the hard coat layer is formed, for example, when irradiated with ultraviolet rays, the amount of irradiation (accumulated light amount) of the hard coat layer forming material is preferably set to a value within a range of 100 to 1000 mJ/cm 2 .

其理由係因為該紫外線照射量為未達100mJ/cm2之值時,會有硬塗層之硬化不足之情況。 The reason for this is that when the amount of ultraviolet irradiation is less than 100 mJ/cm 2 , the hard coat layer may be insufficiently hardened.

另一方面,因為該紫外線照射量為超過1000mJ/cm2之值時,會有因紫外線使硬塗層及基材薄膜劣化之情況。 On the other hand, when the ultraviolet irradiation amount is more than 1000 mJ/cm 2 , the hard coat layer and the base film may be deteriorated by the ultraviolet rays.

又,關於所使用之能量線照射裝置之種類並無特別限制,可使用例如使用高壓水銀燈、氙氣燈、金屬鹵素燈、融合H燈等之紫外線照射裝置等。 Further, the type of the energy ray irradiation device to be used is not particularly limited, and for example, an ultraviolet ray irradiation device such as a high pressure mercury lamp, a xenon lamp, a metal halide lamp, or a fused H lamp can be used.

(4)步驟(4):於基材薄膜之另一面形成硬塗層之步驟 (4) Step (4): a step of forming a hard coat layer on the other side of the base film

步驟(4)係於基材薄膜之兩面具備硬塗層之硬塗膜製造中採用之步驟。 The step (4) is a step employed in the production of a hard coat film having a hard coat layer on both sides of the base film.

更具體而言,如圖1(a)所示,係於基材薄膜10之 一表面上形成硬塗層12後,於基材薄膜之另一面形成硬塗層12’之步驟。 More specifically, as shown in FIG. 1(a), it is attached to the base film 10 After the hard coat layer 12 is formed on one surface, the hard coat layer 12' is formed on the other side of the base film.

亦即,於前述基材薄膜之一表面上形成硬塗層後,以同樣方法,將硬塗層形成材料塗佈於基材薄膜之另一面上,並硬化而於基材薄膜之兩面形成硬塗層之步驟。 That is, after a hard coat layer is formed on one surface of the base film, the hard coat layer forming material is applied to the other surface of the base film in the same manner, and is hardened to form a hard surface on both sides of the base film. The step of coating.

又,塗佈步驟、硬化步驟由於與前述相同,故省略細節。 Further, since the coating step and the hardening step are the same as described above, the details are omitted.

[第3實施形態] [Third embodiment]

第3實施形態係前述硬塗膜之至少一面具被透明導電層之透明導電性薄膜。 The third embodiment is a transparent conductive film in which at least one of the masks of the hard coat film is a transparent conductive layer.

以下以與第1及第2實施形態中記載之內容不同之點為中心,參照圖,針對透明導電性薄膜具體加以說明。 Hereinafter, the transparent conductive film will be specifically described with reference to the drawings, focusing on differences from the contents described in the first and second embodiments.

亦即,本發明之透明導電性薄膜係如圖4(a)所示,係於硬塗膜20之至少一面上具備透明導電層30之透明導電性薄膜40。 In other words, the transparent conductive film of the present invention is a transparent conductive film 40 having a transparent conductive layer 30 on at least one surface of the hard coat film 20, as shown in Fig. 4(a).

又,使用本發明之硬塗膜之透明導電性薄膜由於耐黏連性優異,故不需使用用以防止薄膜彼此黏連之保護膜,亦不需要與保護膜貼合所用之黏著劑。 Further, since the transparent conductive film using the hard coat film of the present invention is excellent in blocking resistance, it is not necessary to use a protective film for preventing the films from sticking to each other, and an adhesive for bonding the protective film is not required.

因此,可獲得生產性高、便宜之透明導電薄膜。 Therefore, a transparent conductive film having high productivity and low cost can be obtained.

另外,由於硬塗膜與透明導電層之密著性優異,故可獲得耐久性優異之透明導電薄膜。 Further, since the hard coat film and the transparent conductive layer are excellent in adhesion, a transparent conductive film excellent in durability can be obtained.

(1)透明導電層 (1) Transparent conductive layer

構成本發明之透明導電層之材料只要透明導電層之在550nm下之可見光透過率為70%以上,則無特別限制,列舉為例如鉑、金、銀、銅等金屬;石墨烯、碳奈米管等碳材料;聚苯胺、聚乙炔、聚噻吩、聚對伸苯基伸乙烯、聚乙二氧基噻吩、聚吡咯等有機導電材料;碘化銅、硫化銅等無機導電性材料;硫族化合物(chalcogenide)、六硫化鑭、氮化鈦、碳化鈦等非參與化合物;氧化鋅、二氧化鋅、摻雜鎵之氧化鋅、摻雜鋁之氧化鋅、摻雜氧化鋅之氧化銦(IZO)、氧化錫、氧化銦、氧化鎘、摻雜錫之氧化銦(ITO)、摻雜錫及鎵之氧化銦(IGZO)、摻雜氟之氧化銦、摻雜銻之氧化錫、摻雜氟之氧化錫(FTO)等導電性金屬氧化物等。 The material constituting the transparent conductive layer of the present invention is not particularly limited as long as the visible light transmittance at 550 nm of the transparent conductive layer is 70% or more, and is exemplified by metals such as platinum, gold, silver, and copper; graphene and carbon nanotubes. Carbon materials such as tubes; organic conductive materials such as polyaniline, polyacetylene, polythiophene, polyparaphenylene extended ethylene, polyethylene dioxythiophene, polypyrrole; inorganic conductive materials such as copper iodide and copper sulfide; chalcogen compounds Non-participating compounds such as (chalcogenide), antimony hexafluoride, titanium nitride, titanium carbide, etc.; zinc oxide, zinc dioxide, gallium-doped zinc oxide, aluminum-doped zinc oxide, zinc oxide doped indium oxide (IZO) , tin oxide, indium oxide, cadmium oxide, tin-doped indium oxide (ITO), doped tin and gallium indium oxide (IGZO), fluorine-doped indium oxide, antimony-doped tin oxide, doped fluorine A conductive metal oxide such as tin oxide (FTO).

該等中,基於更簡便獲得具有優異透明導電性之透明導電性薄膜,較好為導電性金屬氧化物。 Among these, a transparent conductive film having excellent transparent conductivity is more easily obtained, and a conductive metal oxide is preferable.

(2)形成方法 (2) Forming method

透明導電層可藉過去習知方法形成。列舉為例如濺鍍法、離子電鍍法、真空蒸鍍法、化學氣相成長法、棒塗佈器或微凹版塗佈器等塗佈方法等。 The transparent conductive layer can be formed by conventional methods. For example, a sputtering method, an ion plating method, a vacuum vapor deposition method, a chemical vapor phase growth method, a coating method such as a bar coater or a micro gravure coater, and the like are exemplified.

該等中,基於可簡便形成透明導電層,以濺鍍法較佳。 Among these, it is preferable to form a transparent conductive layer by a sputtering method.

(3)厚度 (3) Thickness

透明導電層之厚度較好為5nm~500nm之範圍內之 值,更好為5~200nm之範圍內之值,又更好為10~100nm之範圍內之值。 The thickness of the transparent conductive layer is preferably in the range of 5 nm to 500 nm. The value is more preferably in the range of 5 to 200 nm, and more preferably in the range of 10 to 100 nm.

(4)圖型化 (4) Graphicalization

所形成之透明導電層亦可如圖4(b)所示般視需要進行圖型化30’。圖型化之方法列舉為藉光微影法等之化學蝕刻、使用雷射等物理蝕刻、使用遮罩之真空蒸鍍法或濺鍍法、剝離(lift off)法、印刷法等。 The formed transparent conductive layer may be patterned as shown in Fig. 4(b) as needed. The method of patterning is exemplified by chemical etching by photolithography or the like, physical etching using a laser or the like, vacuum vapor deposition using a mask, sputtering, lift off, printing, or the like.

[第4實施形態] [Fourth embodiment]

第4實施形態係一種靜電容觸控面板,其係包含具備防止玻璃飛散之薄膜之覆蓋玻璃、第一透明導電性薄膜、第二透明導電性薄膜、與液晶顯示體之靜電容觸控面板,其特徵係第一透明導電性薄膜及第二透明導電性薄膜或任一者在具有硬塗層之硬塗膜之硬塗層上具備透明導電層,該硬塗膜於基材薄膜之至少一面上具備硬塗層,硬塗層係由至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之硬化物所構成,(B)疏水化二氧化矽溶膠偏向存在於使硬塗層形成材料硬化後之硬塗層之與基材薄膜相反之表面側,硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 The fourth embodiment is a capacitive touch panel including a cover glass having a film for preventing scattering of glass, a first transparent conductive film, a second transparent conductive film, and a capacitive touch panel of a liquid crystal display. The first transparent conductive film and the second transparent conductive film are either provided with a transparent conductive layer on the hard coat layer having a hard coat film, and the hard coat film is on at least one side of the base film. A hard coat layer is provided, and the hard coat layer is a cured product of a hard coat layer containing at least (A) an energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a cerium-oxygen flattening agent. The (B) hydrophobized cerium oxide sol is biased toward the surface side of the hard coat layer which is hardened by the hard coat layer forming material, and the surface of the hard coat film from the outermost surface to the position of 5 nm. In the case of a carbon atom, an oxygen atom, or a ruthenium atom (100 atom%) measured by XPS analysis in the depth direction, the ruthenium atom concentration is in the range of 0.2 to 1.95 atom%.

以下,以與第1~3實施形態中記載之內容不同點為中心,參照圖,針對靜電容觸控面板具體加以說明。 Hereinafter, the capacitive touch panel will be specifically described with reference to the drawings, focusing on differences from the contents described in the first to third embodiments.

亦即,靜電容觸控面板之基本構成並無特別限制。例如,靜電容觸控面板100係如圖5所示,透過光學用黏著劑50,將具備硬塗層之硬塗膜20、透明導電層30(第一電極)、光學用黏著劑50、具備硬塗層之硬塗膜20、透明導電層30”(第二電極)、光學用黏著劑50”、具備光學用黏著劑層之防止玻璃飛散之薄膜60、及覆蓋玻璃80層合於液晶顯示裝置70上之靜電容觸控面板。 That is, the basic configuration of the capacitive touch panel is not particularly limited. For example, as shown in FIG. 5, the capacitive touch panel 100 is provided with a hard coat film 20 having a hard coat layer, a transparent conductive layer 30 (first electrode), and an optical adhesive 50, which are provided through the optical adhesive 50. Hard coating film 20, transparent conductive layer 30" (second electrode), optical adhesive 50", film 60 for preventing scattering of glass with optical adhesive layer, and cover glass 80 laminated to liquid crystal display A capacitive touch panel on device 70.

又,本發明除上述層以外亦可視需要設置其他層。 Further, in addition to the above layers, the present invention may be provided with other layers as needed.

又,本發明之靜電容觸控面板可為表面型靜電容方式,亦可為投影型靜電容方式。 Moreover, the capacitive touch panel of the present invention can be a surface type static capacitance type or a projection type static capacitance type.

本發明之靜電容觸控面板尤其於形成表面層(導電層等)時,由於具備具有良好接著性之硬塗膜,故可成為耐久性優異之靜電容觸控面板。 In particular, when the surface layer (conductive layer or the like) is formed, the electrostatic capacitance touch panel of the present invention has a hard coat film having excellent adhesion, and thus can be a static capacitance touch panel excellent in durability.

[實施例] [Examples]

以下,以實施例更詳細說明本發明。但,以下之說明為例示性顯示本發明,本發明並不受該等記載之限制。 Hereinafter, the present invention will be described in more detail by way of examples. However, the following description is illustrative of the invention, and the invention is not limited by the description.

[實施例1] [Example 1] 1.硬塗膜之製作 1. Production of hard coating film (1)硬塗層形成材料之準備步驟 (1) Preparation steps of hard coat forming material

如表1所示,由作為(A)成分之能量線硬化性樹脂、作為(B)成分之疏水化二氧化矽溶膠、作為(C)成分之矽氧系平坦劑、與作為(D)成分之光聚合起始劑,調整實施例1之硬塗層形成材料。 As shown in Table 1, the energy ray-curable resin as the component (A), the hydrophobized cerium oxide sol as the component (B), the oxime-based flat agent as the component (C), and the component (D) The photopolymerization initiator was adjusted to adjust the hard coat forming material of Example 1.

更具體而言,將作為(A)成分之(a1)季戊四醇三丙烯酸酯(新中村化學工業公司製NK Ester、A-TMM-3L)100重量份、(a2)二季戊四醇六丙烯酸酯(EO12莫耳加成物)(新中村化學工業公司製,A-DPH-12E)100重量份、作為(D)成分之光聚合起始劑(汽巴特用化學品公司製,Irgacure 184)10重量份、作為(B)成分之疏水化二氧化矽溶膠A(CIK Nanotech公司製,SIRPGM 15WT%-E26,平均粒徑30nm)0.8重量份、作為(C)成分之矽氧系平坦劑之矽氧改質丙烯酸a(日本BYK化學公司製,BYK-3550)0.1重量份,以作為稀釋溶劑之丙烯單甲基醚492.1重量份稀釋,調整硬塗層形成材料(固體成分濃度30重量%)。 More specifically, (a1) pentaerythritol triacrylate (NK Ester, A-TMM-3L, manufactured by Shin-Nakamura Chemical Co., Ltd.), 100 parts by weight of (a2) dipentaerythritol hexaacrylate (EO12 Mo) 10 parts by weight of a photopolymerization initiator (Irgacure 184, manufactured by Kabart Chemicals Co., Ltd.), which is a component (D), 100 parts by weight of an ear-additive (A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.) Hydrophobized cerium oxide sol A (manufactured by CIK Nanotech Co., Ltd., SIRPGM 15 WT%-E26, average particle diameter: 30 nm), 0.8 parts by weight, and oxime-based flattening agent as a component (C) 0.1 parts by weight of acrylic acid a (BYK-3550, manufactured by BYK Chemical Co., Ltd.) was diluted with 492.1 parts by weight of propylene monomethyl ether as a diluent solvent to adjust a hard coat layer forming material (solid content concentration: 30% by weight).

(2)硬塗層形成材料之塗佈步驟 (2) Coating step of hard coat forming material

接著,於作為基材薄膜之於兩面施以易接著處理之附易接著層之PET薄膜(Toray公司製,LUMIRROR U48,膜厚100μm)之單面上,使用馬亞棒(Mayer bar),以使乾燥後之膜厚成為3μm之方式塗佈硬塗層形成材料。 Next, a Mayer bar was used on one side of a PET film (LUMIROR U48, film thickness: 100 μm, manufactured by Toray Co., Ltd.) which was applied as an adhesive film on both sides of the substrate film. The hard coat layer forming material was applied so that the film thickness after drying became 3 μm.

(3)乾燥步驟 (3) Drying step

接著,去除塗佈於基材薄膜上之硬塗層形成材料中所含之稀釋溶劑。 Next, the dilution solvent contained in the hard coat layer forming material coated on the base film is removed.

亦即,使用熱風乾燥裝置,在70℃、1分鐘之條件下加熱乾燥,充分去除稀釋溶劑。 That is, it was dried by heating at 70 ° C for 1 minute using a hot air drying device to sufficiently remove the dilution solvent.

(4)硬化步驟 (4) Hardening step

接著,使用高壓水銀燈,以300mJ/cm2照射紫外線,使硬塗層形成材料光硬化獲得硬塗膜。 Next, ultraviolet rays were irradiated at 300 mJ/cm 2 using a high pressure mercury lamp to photoharden the hard coat layer forming material to obtain a hard coat film.

又,雖未圖示,但使用掃描型電子顯微鏡(SEM)(日立製作所公司製,S-4700型),以加速電壓10kV、倍率20,000倍之條件拍攝實施例1中製造之硬塗膜之剖面後,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, a section of the hard coat film produced in Example 1 was imaged under the conditions of an acceleration voltage of 10 kV and a magnification of 20,000 times using a scanning electron microscope (SEM) (manufactured by Hitachi, Ltd., Model S-4700). Thereafter, it was confirmed that the hydrophobized cerium oxide sol was present on the surface side of the hard coat layer opposite to the substrate film.

2.硬塗膜之評價 2. Evaluation of hard coating film (1)矽原子濃度分析 (1) Analysis of germanium atom concentration

使用XPS測定分析裝置(Ulvac-Phi公司製,Quantum 2000),進行所得硬塗膜中之硬塗層之藉深度方向之XPS分析測定之碳原子、氧原子、矽原子之元素分析。所得之藉XPS測定所得之矽原子濃度分佈示於圖3。 Elemental analysis of carbon atoms, oxygen atoms, and ruthenium atoms measured by XPS analysis in the depth direction of the hard coat layer in the obtained hard coat film was carried out using an XPS measurement analyzer (Quantum 2000, manufactured by Ulvac-Phi Co., Ltd.). The obtained atomic concentration distribution obtained by XPS measurement is shown in Fig. 3.

又,由該測定,計算出自最表面至5nm位置之區域中相對於碳原子、氧原子、矽原子之合計量(100原子%)之矽原子濃度。所得結果示於表1。 Further, from this measurement, the concentration of germanium atoms in the total amount (100 atom%) of the carbon atoms, oxygen atoms, and germanium atoms in the region from the outermost surface to the 5 nm position was calculated. The results obtained are shown in Table 1.

(2)疏水化度測定 (2) Determination of hydrophobization degree

以馬亞棒#8將分散於甲基異丁基酮之疏水化二氧化矽溶膠A(固體成分濃度15%)塗佈於PET薄膜(Toray公司製,LUMIRROR U48,膜厚100μm)上。 Hydrophobized cerium oxide sol A (solid content concentration: 15%) dispersed in methyl isobutyl ketone was applied to a PET film (manufactured by Toray Co., Ltd., LUMIRROR U48, film thickness: 100 μm).

接著,以90℃之烘箱乾燥1分鐘,獲得乾燥後之厚度為1μm之二氧化矽溶膠塗膜。 Subsequently, it was dried in an oven at 90 ° C for 1 minute to obtain a cerium oxide sol coating film having a thickness of 1 μm after drying.

接著,測定依據JIS R 3257測定之水對該二氧化矽溶膠塗膜之接觸角,且評價疏水化度。 Next, the contact angle of the water measured on the cerium oxide sol coating film measured in accordance with JIS R 3257 was measured, and the degree of hydrophobization was evaluated.

亦即,將該形成有二氧化矽溶膠塗膜之PET薄膜靜置於平坦之玻璃基板上,將玻璃基板傾斜設為0度時滴加水滴2μL,在液滴靜止後以Young之式求出水接觸角。所得結果示於表1。 That is, the PET film on which the cerium oxide sol-coated film is formed is placed on a flat glass substrate, and when the glass substrate is tilted to 0 degrees, 2 μL of water droplets are dropped, and after the droplets are still, the Young formula is obtained. Water contact angle. The results obtained are shown in Table 1.

(3)硬塗層之接著性評價 (3) Adhesion evaluation of hard coating

將紫外線硬化型油墨(帝國油墨製造(股)製,UVPAL911墨)塗佈於所得硬塗膜之表面,且照射紫外線使油墨硬化,形成膜厚1μm之印刷層。於印刷層表面施以棋盤格狀之1mm寬之十字切割,於其棋盤格狀之經十字切割之印刷層表面貼合黏著膠帶(Nichiban公司製,Cellotape(註冊商標)),依據JIS K 5600-5-6(十字切割法)之棋盤格膠帶法進行Cellotape(註冊商標)剝離試驗,根據下述基準評價硬化性樹脂層之印刷密著性。所得結果示於表1。 An ultraviolet curable ink (UVPAL911 ink manufactured by Imperial Ink Co., Ltd.) was applied onto the surface of the obtained hard coat film, and the ink was cured by irradiation with ultraviolet rays to form a printed layer having a film thickness of 1 μm. A 1 mm-wide cross cut is applied to the surface of the printed layer, and an adhesive tape (Cellotape (registered trademark), manufactured by Nichiban Co., Ltd.) is attached to the surface of the cross-cut printed layer of the checkerboard pattern, according to JIS K 5600- The Cellotape (registered trademark) peeling test was carried out by the checkerboard tape method of 5-6 (cross cutting method), and the printing adhesiveness of the curable resin layer was evaluated based on the following criteria. The results obtained are shown in Table 1.

○:自硬塗膜剝離而轉印到黏著膠帶之印刷層一片也沒有。 ○: There was no print layer peeled off from the hard coat film and transferred to the adhesive tape.

△:轉印到黏著膠帶之印刷層之數未達5成。 △: The number of printed layers transferred to the adhesive tape was less than 50%.

×:轉印到黏著膠帶之印刷層之數為5成以上。 ×: The number of printed layers transferred to the adhesive tape was 50% or more.

(4)塗佈性(彈開)之評價方法 (4) Evaluation method of coating property (bounce)

使用馬亞棒,以使乾燥後之膜厚成為3μm之方式將硬塗層形成材料塗佈於附易接著層之PET薄膜之單面上而成之硬塗膜,在硬化前於螢光燈下進行目視檢驗,確認有無彈開,且根據下述基準評價塗佈性。所得結果示於表1。又,進行目視檢驗之面積為0.5m2A hard coat film was applied to a single surface of a PET film having an adhesion layer by using a Maa bar so that the film thickness after drying became 3 μm, and the fluorescent lamp was cured before curing. The visual inspection was carried out to confirm the presence or absence of bounce, and the coatability was evaluated according to the following criteria. The results obtained are shown in Table 1. Further, the area for visual inspection was 0.5 m 2 .

○:並無彈開 ○: There is no bounce

×:彈開為1個以上 ×: The bounce is one or more

(5)鉛筆硬度評價 (5) Pencil hardness evaluation

依據JIS K 5600-5-4,使用鉛筆牽引硬度試驗機(安田精機製作所製,No.553-M)測定所得硬塗膜之鉛筆硬度。又,牽引速度為1mm/秒。所得結果示於表1。 The pencil hardness of the obtained hard coat film was measured by a pencil drawing hardness tester (manufactured by Yasuda Seiki Seisakusho Co., Ltd., No. 553-M) in accordance with JIS K 5600-5-4. Also, the pulling speed is 1 mm/sec. The results obtained are shown in Table 1.

(6)耐黏連性評價 (6) Evaluation of adhesion resistance

將所得硬塗膜切成100×100mm之大小,使2片硬塗膜重疊(將該狀態設為初期)。 The obtained hard coat film was cut into a size of 100 × 100 mm, and two hard coat films were superposed (this state was made into an initial stage).

接著,在施加10kg/m2荷重之狀態下,剝離初期及在23℃ 50%RH之保管環境下經過5天後(該狀態設為經時 後)分別重疊之薄膜,以螢光燈下目視觀察其狀態,根據下述基準評價有無黏連。所得結果示於表1。 Next, in a state where a load of 10 kg/m 2 was applied, the film which was superposed at the initial stage of peeling and after 5 days in a storage environment of 23° C. and 50% RH (this state was set as the elapsed time) was visually observed under a fluorescent lamp. The state was observed, and adhesion was evaluated according to the following criteria. The results obtained are shown in Table 1.

○:初期及經時後,完全未發生黏連,未產生薄膜面彼此之貼合 ○: No adhesion occurred at the beginning and after the passage, and no film surface was attached to each other.

△:初期雖未發生黏連,但經時後發生黏連(薄膜面彼此之貼合面積未達3成)。 △: Although adhesion did not occur in the initial stage, adhesion occurred after the passage of time (the bonding area of the film faces did not reach 30%).

×:自初期即發生黏連(薄膜面彼此之貼合面積為3成以上)。 X: Adhesion occurred from the initial stage (the bonding area of the film faces was 30% or more).

(7)濁度值 (7) Turbidity value

依據JIS K7105,使用濁度計(日本電色工業公司製,NDH-2000)測定所得硬塗膜之濁度值。所得結果示於表1。 The haze value of the obtained hard coat film was measured using a turbidimeter (Nippon Denshoku Industries Co., Ltd., NDH-2000) in accordance with JIS K7105. The results obtained are shown in Table 1.

[實施例2] [Embodiment 2]

實施例2中,除了將(C)矽氧系平坦劑a之調配量自0.1重量份改變成0.16重量份以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In the second embodiment, a hard coat film was prepared and evaluated in the same manner as in Example 1 except that the amount of the (C) oxime-based flat agent a was changed from 0.1 part by weight to 0.16 part by weight. The results obtained are shown in Table 1.

[實施例3] [Example 3]

實施例3中,除了將(C)矽氧系平坦劑a之調配量自0.1重量份改變成0.2重量份以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Example 3, a hard coat film was prepared and evaluated in the same manner as in Example 1 except that the amount of (C) the oxygen-based flat agent a was changed from 0.1 part by weight to 0.2 part by weight. The results obtained are shown in Table 1.

[實施例4] [Example 4]

實施例4中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚改質聚二甲基矽氧烷b(日本BYK化學公司製,BYK-300)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Example 4, except that the (C) oxime-based flattening agent was changed to the oxime-modified acrylic acid a, 0.1 part by weight of the polyether-modified polydimethyl siloxane (b) was prepared by BYK Chemical Co., Ltd., BYK- A hard coat film was prepared and evaluated in the same manner as in Example 1 except for 300). The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝實施例4中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Example 4 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[實施例5] [Example 5]

實施例5中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚酯改質之含羥基之聚二甲基矽氧烷c(日本BYK化學公司製,BYK-375)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Example 5, in addition to changing (C) the oxygen-modified acrylic acid a of the xenon-based flat agent, 0.1 part by weight of the polyether ester-modified hydroxyl group-containing polydimethyloxane c (Japanese BYK Chemical) was formulated. A hard coat film was prepared and evaluated in the same manner as in Example 1 except for BYK-375. The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝實施例5中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Example 5 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[實施例6] [Embodiment 6]

實施例6中,除了改變(C)矽氧系平坦劑之矽氧改 質丙烯酸a,而調配0.1重量份之聚酯改質之含羥基之聚二甲基矽氧烷d(日本BYK化學公司製,BYK-370)以外,餘以與實施例1相同之方法,製備硬塗膜並經評價。所得結果示於表1。 In Example 6, except that the (C) oxime-based flat agent was changed. The acrylic acid a was prepared in the same manner as in Example 1 except that 0.1 part by weight of a polyester-modified hydroxy group-containing polydimethyl siloxane d (manufactured by BYK Chemical Co., Ltd., BYK-370) was blended. Hard film was evaluated and evaluated. The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝實施例6中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Example 6 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[實施例7] [Embodiment 7]

實施例7中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚改質之聚二甲基矽氧烷e(日本BYK化學公司製,BYK-331)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Example 7, except that the (C) oxime-based flattening agent was changed to the oxime-modified acrylic acid a, 0.1 part by weight of the polyether-modified polydimethyl siloxane (e.g., BYK Chemical Co., Ltd., BYK) was blended. A hard coat film was prepared and evaluated in the same manner as in Example 1 except for -331). The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝實施例7中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Example 7 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[比較例1] [Comparative Example 1]

比較例1中,除將(C)矽氧系平坦劑a之調配量自0.1重量份改變成0.08重量份以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 1, a hard coat film was prepared and evaluated in the same manner as in Example 1 except that the amount of the (C) oxime-based flat agent a was changed from 0.1 part by weight to 0.08 part by weight. The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝比較例1中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Comparative Example 1 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[比較例2] [Comparative Example 2]

比較例2中,除了將(C)矽氧系平坦劑a之調配量自0.1重量份改變成0.04重量份以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 2, a hard coat film was prepared and evaluated in the same manner as in Example 1 except that the amount of the (C) antimony-based flat agent a was changed from 0.1 part by weight to 0.04 part by weight. The results obtained are shown in Table 1.

[比較例3] [Comparative Example 3]

比較例3中,除改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚改質之聚甲基烷基矽氧烷f(日本BYK化學公司製,BYK-325)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 3, except that the (C) oxime-based flattening agent was changed to oxime-modified acrylic acid a, 0.1 part by weight of a polyether-modified polymethylalkyl decane f (manufactured by BYK Chemical Co., Ltd., A hard coat film was prepared and evaluated in the same manner as in Example 1 except for BYK-325). The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝比較例3中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Comparative Example 3 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[比較例4] [Comparative Example 4]

比較例4中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚改質之聚二甲基矽 氧烷g(日本BYK化學公司製,BYK-378)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 4, in addition to changing (C) the oxygen-modified acrylic acid a of the oxime-based flat agent, 0.1 part by weight of the polyether-modified polydimethyl hydrazine was formulated. A hard coat film was prepared and evaluated in the same manner as in Example 1 except that oxyalkylene g (manufactured by BYK Chemical Co., Ltd., BYK-378) was used. The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝比較例4中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Comparative Example 4 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[比較例5] [Comparative Example 5]

比較例5中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚改質之聚二甲基矽氧烷h(日本BYK化學公司製,BYK-UV3510)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 5, except that the (C) oxime-based flattening agent was changed to the oxime-modified acrylic acid a, 0.1 part by weight of the polyether-modified polydimethyl methoxy hydride h (manufactured by BYK Chemical Co., Ltd., BYK) was blended. A hard coat film was prepared and evaluated in the same manner as in Example 1 except for -UV3510. The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝比較例5中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Comparative Example 5 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[比較例6] [Comparative Example 6]

比較例6中,除了使用二氧化矽溶膠I(CIK Nanotech公司製,SIRMIBK15WT%-K18,平均粒徑100nm)作為(B)成分以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 6, a hard coat film was prepared in the same manner as in Example 1 except that cerium oxide sol I (SIRMIBK 15 WT%-K18, manufactured by CIK Nanotech Co., Ltd., average particle diameter: 100 nm) was used as the component (B). Evaluation. The results obtained are shown in Table 1.

[比較例7] [Comparative Example 7]

比較例7中,除了使用二氧化矽溶膠J(日揮觸媒公司製,OSCAL-1632,平均粒徑30nm)作為(B)成分以外,餘以與比較例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 7, a hard coat film was prepared in the same manner as in Comparative Example 1, except that cerium oxide sol J (OSCAL-1632, manufactured by Nippon Chemical Co., Ltd., average particle diameter: 30 nm) was used as the component (B). Evaluation. The results obtained are shown in Table 1.

[比較例8] [Comparative Example 8]

比較例8中,除了使用二氧化矽溶膠K(日產化學工業公司製,MIBK-ST,平均粒徑15nm)作為(B)成分以外,餘以與比較例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 8, a hard coat film was prepared in the same manner as in Comparative Example 1, except that cerium oxide sol K (MIBK-ST, manufactured by Nissan Chemical Industries, Ltd., average particle diameter: 15 nm) was used as the component (B). Evaluation. The results obtained are shown in Table 1.

[比較例9] [Comparative Example 9]

比較例9中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之含全氟改質丙烯酸樹脂(DIC公司製,MEGAFAC RS75)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 9, except that the (C) oxime-based flattening agent was changed to the oxime-modified acrylic acid a, and 0.1 part by weight of the perfluoro-modified acrylic resin (MEGAFAC RS75, manufactured by DIC Corporation) was blended, the remainder and the implementation were carried out. In the same manner as in Example 1, a hard coat film was prepared and evaluated. The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝比較例9中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Comparative Example 9 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

[比較例10] [Comparative Example 10]

比較例10中,除了改變(C)矽氧系平坦劑之矽氧改質丙烯酸a,而調配0.1重量份之聚醚改質之聚二甲基矽氧烷j(Dow Corning Toray公司製,SH-28)以外,餘以與實施例1相同之方法,製備硬塗膜並評價。所得結果示於表1。 In Comparative Example 10, in addition to changing (C) the oxygen-modified acrylic acid a of the xenon-based flattening agent, 0.1 part by weight of the polyether-modified polydimethyloxane j (manufactured by Dow Corning Toray Co., Ltd., SH) was blended. A hard coat film was prepared and evaluated in the same manner as in Example 1 except for -28). The results obtained are shown in Table 1.

又,雖未圖示,但與實施例1同樣,使用掃描型電子顯微鏡(SEM)拍攝比較例10中製造之硬塗膜之剖面,可確認疏水化二氧化矽溶膠偏向存在於硬塗層之與基材薄膜相反之表面側。 Further, although not shown, the cross section of the hard coat film produced in Comparative Example 10 was imaged by a scanning electron microscope (SEM) in the same manner as in Example 1, and it was confirmed that the hydrophobized cerium oxide sol was present in the hard coat layer. The surface side opposite to the substrate film.

平坦劑之種類: Type of flattening agent:

a:矽氧改質丙烯酸 a: 矽 oxygen modified acrylic

b:聚醚改質之聚二甲基矽氧烷 b: polyether modified polydimethyl methoxy oxane

c:聚醚酯改質之含有羥基之聚二甲基矽氧烷 c: polyether ester modified hydroxyl-containing polydimethyloxane

d:聚酯改質之含羥基之聚二甲基矽氧烷 d: polyester modified hydroxyl-containing polydimethyloxane

e:聚醚改質之聚二甲基矽氧烷 e: polyether modified polydimethyl methoxy oxane

f:聚醚改質之聚甲基烷基矽氧烷 f: polyether modified polymethylalkyl sulfoxane

g:聚醚改質之聚二甲基矽氧烷 g: polyether modified polydimethyl methoxy oxane

h:聚醚改質之聚二甲基矽氧烷 h: polyether modified polydimethyl methoxy oxane

i:含全氟改質丙烯酸樹脂 i: containing perfluoro-modified acrylic resin

j:聚醚改質之聚二甲基矽氧烷 j: polyether modified polydimethyl methoxy oxane

使用特定之疏水化二氧化矽溶膠,且硬塗膜之自最表面至5nm位置之區域中,藉深度方向之XPS分析所測定之矽原子濃度為特定範圍內之值之實施例1~7之耐黏連性優異,且塗佈性及接著性亦優異。 In the specific hydrophobized cerium oxide sol, and in the region from the outermost surface to the 5 nm position of the hard coat film, the concentration of the ruthenium atom determined by XPS analysis in the depth direction is a value within a specific range, and Examples 1 to 7 are used. It is excellent in blocking resistance and excellent in coatability and adhesion.

然而,表面之矽原子濃度低於特定範圍之比較例1~2雖具有耐黏連性,但塗佈性差,難以平滑地塗佈硬塗層形成材料。 However, in Comparative Examples 1 to 2 in which the atomic concentration of germanium on the surface was lower than the specific range, the adhesion resistance was poor, but the coating property was poor, and it was difficult to apply the hard coat layer forming material smoothly.

另外,矽原子濃度高於特定範圍之比較例3、4、5、10雖具有耐黏連性,但進而將表面層層合於硬塗膜上時之接著性差。 Further, in Comparative Examples 3, 4, 5, and 10 in which the concentration of germanium atoms was higher than the specific range, the adhesion resistance was poor, but the adhesion of the surface layer to the hard coat film was inferior.

此外,未使用特定之疏水化二氧化矽溶膠之比較例6~8,塗佈性等雖良好,但無法獲得耐黏連性。 Further, in Comparative Examples 6 to 8 in which the specific hydrophobized cerium oxide sol was not used, the coating property and the like were good, but the blocking resistance could not be obtained.

且,使用氟系平坦劑之比較例9由於表面變平滑,而 且撥水性高,故耐黏連性及接著性均差。 Further, in Comparative Example 9 using a fluorine-based flat agent, since the surface became smooth, And the water repellency is high, so the adhesion resistance and adhesion are poor.

[產業上之可利用性] [Industrial availability]

以上,如詳述,依據本發明之硬塗膜,係於基材薄膜之至少一面具備硬塗層之硬塗膜,該硬塗層係由含特定之疏水化二氧化矽溶膠及特定之矽氧系平坦劑等之硬塗層形成材料之硬化物所構成,該疏水化二氧化矽溶膠在硬塗層內偏向存在於與基材薄膜相反之表面側,且藉由使硬塗膜最表面之矽原子濃度具有特定範圍內之值,而可防止薄膜彼此之黏連,且獲得塗佈性優異之硬塗膜。 As described in detail above, the hard coat film according to the present invention is a hard coat film having a hard coat layer on at least one side of the base film, and the hard coat layer is composed of a specific hydrophobized cerium oxide sol and a specific hydrazine. A hardened coating material such as an oxygen-based flat agent is formed by a hardened cerium oxide sol which is present on the surface side opposite to the substrate film in the hard coat layer, and is formed on the surface of the hard coat film. Since the atomic concentration has a value within a specific range, it is possible to prevent the films from sticking to each other and to obtain a hard coat film excellent in coatability.

另外,本發明之硬塗膜上進一步層合表面層等時,獲得接著性優異之硬塗膜。 Further, when the surface layer or the like is further laminated on the hard coat film of the present invention, a hard coat film excellent in adhesion is obtained.

再者,藉由具有該硬塗膜,而有效地獲得透明性優異,密著性亦優異之透明導電性薄膜。 In addition, by having such a hard coat film, a transparent conductive film which is excellent in transparency and excellent in adhesion is effectively obtained.

因此,本發明之硬塗膜由於可有效地使用於靜電容觸控面板等,故可期待可有效地搭載於特別要求機械強度等之行動電話等之行動資訊機器中。 Therefore, since the hard coat film of the present invention can be effectively used for a capacitive touch panel or the like, it can be expected to be efficiently mounted in an action information device such as a mobile phone that particularly requires mechanical strength or the like.

Claims (11)

一種硬塗膜,其係於基材薄膜之至少一面上具備硬塗層之硬塗膜,前述硬塗層係由至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之硬化物所構成,前述(B)疏水化二氧化矽溶膠係偏向存在於使前述硬塗層形成材料硬化後之前述硬塗層之與前述基材薄膜相反之表面側,前述硬塗膜之自最表面至5nm位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 A hard coat film comprising a hard coat film having a hard coat layer on at least one side of a base film, wherein the hard coat layer contains at least (A) an energy ray-curable resin, and (B) a hydrophobized cerium oxide sol And (C) the hydrophobized cerium oxide sol is biased toward the hard coat layer after curing the hard coat layer forming material. The surface side opposite to the base film, the carbon atom, oxygen atom, and ruthenium atomium measured by XPS analysis in the depth direction from the outermost surface to the 5 nm position of the hard coat film (100) Atomic %), a value in which the concentration of germanium atoms is in the range of 0.2 to 1.95 atomic %. 如請求項1之硬塗膜,其中前述(C)矽氧系平坦劑係由矽氧改質丙烯酸、聚醚改質聚二甲基矽氧烷、聚醚酯改質之含羥基之聚二甲基矽氧烷、聚酯改質之含羥基之聚二甲基矽氧烷、聚醚改質之聚二甲基矽氧烷所組成之群選出之至少1種。 The hard coating film of claim 1, wherein the (C) oxime-based flat agent is a hydroxy-containing poly(ethylene) modified by oxime-modified acrylic acid, polyether modified polydimethyl siloxane, or polyether ester. At least one selected from the group consisting of methyl siloxane, polyester-modified polydimethyl methoxy oxane, and polyether modified polydimethyl methoxy hydride. 如請求項1之硬塗膜,其中前述(C)矽氧系平坦劑之調配量相對於前述(A)能量線硬化性樹脂100重量份,以固體成分換算為0.045~5重量份之範圍內之值。 The hard coat film of claim 1, wherein the amount of the (C) oxygen-based flattening agent is in the range of 0.045 to 5 parts by weight based on 100 parts by weight of the energy ray-curable resin (A) The value. 如請求項1之硬塗膜,其中前述(B)疏水化二氧化矽溶膠之平均粒徑為10~100nm之範圍內之值。 The hard coat film of claim 1, wherein the (B) hydrophobized cerium oxide sol has an average particle diameter in a range of from 10 to 100 nm. 如請求項1之硬塗膜,其中對於使前述(B)疏水 化二氧化矽溶膠進行塗膜時之塗膜依據JIS R 3257測定之水的接觸角為100°以上之值。 A hard coat film according to claim 1, wherein the (B) is hydrophobic The coating film when the cerium oxide sol is coated is a value in which the contact angle of water measured according to JIS R 3257 is 100 or more. 如請求項1之硬塗膜,其中前述(B)疏水化二氧化矽溶膠之調配量相對於前述(A)能量線硬化性樹脂100重量份,以固體成分換算為0.3~55重量份之範圍內之值。 The hard coat film of claim 1, wherein the amount of the (B) hydrophobized cerium oxide sol is from 0.3 to 55 parts by weight in terms of solid content based on 100 parts by weight of the energy ray-curable resin (A). The value inside. 如請求項1之硬塗膜,其中前述硬塗膜之依據JIS K 7105測定之濁度值為1.0%以下。 The hard coat film of claim 1, wherein the hard coat film has a haze value of 1.0% or less as measured according to JIS K 7105. 如請求項1之硬塗膜,其中前述硬塗層表面之依據JIS B 0601-1994測定之算術平均粗糙度Ra為1.5~5nm之範圍內之值。 The hard coat film of claim 1, wherein the surface of the hard coat layer has an arithmetic mean roughness Ra measured in accordance with JIS B 0601-1994 of a range of 1.5 to 5 nm. 一種透明導電性薄膜,其特徵係於如請求項1之硬塗膜之至少一面具備透明導電層。 A transparent conductive film characterized in that a transparent conductive layer is provided on at least one side of the hard coat film of claim 1. 一種靜電容觸控面板,其係包含具備防止玻璃飛散之薄膜之覆蓋玻璃、第一透明導電性薄膜、第二透明導電性薄膜、與液晶顯示體之靜電容觸控面板,其特徵為:前述第一透明導電性薄膜及前述第二透明導電性薄膜或任一者在具有硬塗層之硬塗膜之前述硬塗層上具備透明導電層,該硬塗膜於基材薄膜之至少一面上具備前述硬塗層,前述硬塗層係由至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之硬化物所構成,前述(B)疏水化二氧化矽溶膠偏向存在於使前述硬 塗層形成材料硬化後之前述硬塗層之與前述基材薄膜相反之表面側,前述硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 A capacitive touch panel comprising: a cover glass having a film for preventing scattering of glass, a first transparent conductive film, a second transparent conductive film, and a capacitive touch panel of a liquid crystal display, wherein: The first transparent conductive film and the second transparent conductive film or any one of the hard coat layers having a hard coat layer is provided with a transparent conductive layer on at least one side of the base film. The hard coat layer is provided, and the hard coat layer is hardened by a hard coat layer containing at least (A) an energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a cerium-oxygen flattening agent. The composition of the above (B) hydrophobized cerium oxide sol is present in the above-mentioned hard a surface side of the hard coat layer which is hardened by the coating forming material opposite to the base film, and a region of the hard coat film from the outermost surface to a position of 5 nm with respect to XPS analysis by depth direction A carbon atom, an oxygen atom, a helium atom (100 atom%), and a germanium atom concentration of 0.2 to 1.95 atom%. 一種硬塗膜之製造方法,其係於基材薄膜之至少一面上具備硬塗層之硬塗膜之製造方法,其特徵係包含下述步驟(1)~(3):(1)準備至少含(A)能量線硬化性樹脂、(B)疏水化二氧化矽溶膠、與(C)矽氧系平坦劑之硬塗層形成材料之步驟,(2)於前述基材薄膜之至少一面上塗佈前述硬塗層形成材料之步驟,(3)使前述硬塗層形成材料硬化,形成具備硬塗層之硬塗膜之步驟,該硬塗層係前述(B)疏水化二氧化矽溶膠偏向存在於使前述硬塗層形成材料硬化後之前述硬塗層之與前述基材薄膜相反之表面側,前述硬塗膜之自最表面至5nm之位置之區域中,相對於藉由深度方向之XPS分析所測定之碳原子、氧原子、矽原子合計量(100原子%),矽原子濃度為0.2~1.95原子%之範圍內之值。 A method for producing a hard coat film, which is a method for producing a hard coat film having a hard coat layer on at least one side of a base film, and the method comprises the following steps (1) to (3): (1) preparing at least a step of forming a material comprising a (A) energy ray-curable resin, (B) a hydrophobized cerium oxide sol, and (C) a cerium-oxygen flattening agent, and (2) on at least one side of the base film a step of applying the hard coat layer forming material, (3) a step of hardening the hard coat layer forming material to form a hard coat film having a hard coat layer, the hard coat layer being the (B) hydrophobized cerium oxide sol The surface side opposite to the base film of the hard coat layer after the hard coat layer forming material is hardened, and the depth of the hard coat film from the outermost surface to a position of 5 nm with respect to the depth direction The carbon atom, oxygen atom, and ruthenium atom (100 atom%) measured by XPS analysis, and the ytterbium atom concentration is in the range of 0.2 to 1.95 atom%.
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