TW201520365A - Support member and connector of heating member on CVD reactor - Google Patents

Support member and connector of heating member on CVD reactor Download PDF

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Publication number
TW201520365A
TW201520365A TW103115145A TW103115145A TW201520365A TW 201520365 A TW201520365 A TW 201520365A TW 103115145 A TW103115145 A TW 103115145A TW 103115145 A TW103115145 A TW 103115145A TW 201520365 A TW201520365 A TW 201520365A
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Taiwan
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support
support plate
heating element
opening
heating
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TW103115145A
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Chinese (zh)
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TWI628308B (en
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Pierre-Arnaud Bodin
Mark Edlef Oppen
Keith Allen
Fred Michael Andrew Crawley
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Aixtron Se
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586Elements in the interior of the support, e.g. electrodes, heating or cooling devices

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Chemical Vapour Deposition (AREA)
  • Connection Of Plates (AREA)

Abstract

An apparatus for heating a base (4) of a CVD reactor (1) comprises at least one heating elements (9, 19), wherein zones of the heating elements (9, 19) or the different heating elements (9, 19) are extended side by side and positioned relative to a support plate through the support members (10, 20), wherein the support members (10, 20) are respectively provided with legs (15,16,17; 25,26,27) having a shape engageable for insertion into in a fixed opening of the support plate (29), and a head portion (11,12,13; 21,22,23) connected with a shank portion (14, 24) extending transversely to the extension surface of the support plate (29); the heating elements (9,19) are fixed on the head portion (11,12,13; 21, 22,23). In order to improve the fixation of the support members and the connectors on the heating apparatus, it is recommended that the legs (15,16,17; 25,26,27) be fixed within the fixed opening (38) of the support plate (29) through the shape-engageable members (15,16,17; 25,26,27), so that the support members (10, 20) may be bound on the support plate (29) along the extension direction of the shank portion (14, 24) by the shape-engageable members (15,16,17; 25,26,27).

Description

CVD反應器之加熱構件上的支撐件及連接件 Support member and connecting member on heating member of CVD reactor

本發明有關於一種尤其用於加熱CVD(化學氣相沉積)反應器的基座的裝置,具有至少一個加熱元件,其中,該加熱元件的區段或者不同的加熱元件並排延伸並且藉由支撐件相對於支撐板而定位,其中,該支撐件分別具有形狀接合地且牢固地插入該支撐板的固定開口內的支腳,並且其中與橫向於該支撐板的延伸面所延伸的柄部相連接的頭部固定在頸部件上。 The invention relates to a device, in particular for heating a susceptor of a CVD (Chemical Vapor Deposition) reactor, having at least one heating element, wherein a section of the heating element or a different heating element extends side by side and by means of a support Positioned relative to the support plate, wherein the support members respectively have legs that are form-fittingly and securely inserted into the fixed opening of the support plate, and wherein the handles are connected to the handle extending transversely to the extension surface of the support plate The head is fixed to the neck member.

本發明還有關於一種尤其用於加熱CVD反應器的基座的裝置,具有至少一個加熱元件,該加熱元件與至少一個接觸板相連接,該接觸板藉由連接件相對於支撐板而定位。 The invention further relates to a device, in particular for heating a susceptor of a CVD reactor, having at least one heating element connected to at least one contact plate, the contact plate being positioned relative to the support plate by means of a connector.

CVD反應器具有反應器殼體,處理室處於反應器殼體內。反應器殼體將處理室氣密地與周圍環境相隔絕。進氣構件處於反應器殼體內,氣體原料藉由進氣構件被導入處理室中。待塗覆的基板安置在基座上。基座構成處理室的底板,氣體原料被輸入到處理室內。為了在基板上沉澱層,基板表面必須被加熱到處理溫度,該處理溫度在1000℃範圍內。這藉由安置在基座下面的加熱裝置實現。位於基座幾釐米之上的進氣構件常常例如藉由冷卻液被冷卻。由此,在處理室內產出了變化劇烈的垂直溫度差,其導致從基座到進氣構件被加大的放熱。因此為了達到處理溫度,需要加熱裝 置以較大的導熱率進行輸入。加熱裝置的加熱元件必須將溫度加熱到約2000℃。此外還需要大面積的加熱。 The CVD reactor has a reactor housing with a processing chamber within the reactor housing. The reactor housing hermetically isolates the process chamber from the surrounding environment. The intake member is located within the reactor housing and the gaseous feedstock is introduced into the process chamber by the intake member. The substrate to be coated is placed on the susceptor. The susceptor constitutes the bottom plate of the processing chamber, and the gaseous material is input into the processing chamber. In order to deposit a layer on the substrate, the substrate surface must be heated to a processing temperature in the range of 1000 °C. This is achieved by a heating device placed under the susceptor. The intake member located a few centimeters above the base is often cooled, for example, by a coolant. As a result, a severe vertical temperature difference is produced within the process chamber which results in an increased heat release from the susceptor to the intake member. Therefore, in order to reach the processing temperature, heating is required. Input with a large thermal conductivity. The heating element of the heating device must heat the temperature to about 2000 °C. In addition, a large area of heating is required.

US 7,645,342 B2描述了一種加熱裝置,具有圍繞中心圓弧形佈置的加熱絲。加熱絲藉由支撐件與支撐板相連接。 No. 7,645,342 B2 describes a heating device having a heating wire arranged around a central arc. The heating wire is connected to the support plate by a support member.

在DE 26 30 466 A1或US 3,345,498中描述了一種沿螺旋線延伸的加熱元件。US 7,573,004也示出一種在圓弧線上延伸的加熱元件。由US 3,567,906已知一種波紋形狀延伸的加熱元件。 A heating element extending along a helix is described in DE 26 30 466 A1 or US Pat. No. 3,345,498. US 7,573,004 also shows a heating element extending on a circular arc. A corrugated shaped extension heating element is known from US Pat. No. 3,567,906.

例如DE 10 2009 043 960 A1、DE 10 2007 009 145 A1、DE 103 29 107 A1、DE 10 2005 056 536 A1、DE 10 2006 018 515 A1或DE 10 2007 027 704 A1示出一種用於加熱CVD反應器的基座的裝置。 For example, DE 10 2009 043 960 A1, DE 10 2007 009 145 A1, DE 103 29 107 A1, DE 10 2005 056 536 A1, DE 10 2006 018 515 A1 or DE 10 2007 027 704 A1 shows a heating CVD reactor The device of the pedestal.

依據本發明的裝置的加熱元件藉由接通電流進行加熱。各個加熱構件的兩個端部與接觸板相連接。加熱元件安置在至少一個平面內。但是也可行的是,加熱元件在相互不同的平行平面內安置。加熱元件在相應的平面上沿圓弧形或螺旋形的線延伸。尤其規定,加熱元件螺旋形地安置。這使得彼此不同的加熱器或同一個加熱器的不同的區段並排地延伸。為了如此固定並排延伸的加熱器的位置,使得即便在加熱或冷卻時加熱裝置的組件在劇烈移動的情況下,它們也不會相接觸,因此設置有支撐件,其將加熱元件在多個位置、尤其在相互均勻間隔的位置上與支撐板相連接。此外還設置有連接件,一個或多個接觸板藉由連接件與支撐板相連接。該連接件還具有的作用是,避免不同的接觸板在加熱裝置加熱和冷卻時彼此接觸。 The heating element of the device according to the invention is heated by switching on the current. Both ends of the respective heating members are connected to the contact plates. The heating element is disposed in at least one plane. However, it is also possible for the heating elements to be arranged in mutually parallel planes. The heating elements extend in a corresponding plane along a circular or spiral line. In particular, it is provided that the heating element is arranged in a spiral manner. This allows different heaters or different sections of the same heater to extend side by side. In order to fix the positions of the heaters extending side by side such that the components of the heating device do not come into contact even when heated or cooled, they are provided with a support member which places the heating elements in a plurality of positions. In particular, they are connected to the support plate at locations that are evenly spaced from each other. Furthermore, a connector is provided, and the one or more contact plates are connected to the support plate by means of a connector. The connector also has the function of preventing different contact plates from contacting each other when the heating device is heated and cooled.

本發明所要解決的技術問題是,改進支撐件或連接件在加熱裝置上的固定。 The technical problem to be solved by the present invention is to improve the fixing of the support or the connecting member on the heating device.

所述技術問題藉由依據本發明的尤其用於加熱CVD反應器的基座的裝置得以解決。 The technical problem is solved by a device according to the invention, in particular for heating a susceptor of a CVD reactor.

首先並且根本上建議,支撐件具有支腳,該支腳形狀接合地且牢固地插入支撐板的固定開口中。支撐件具有柄部,該柄部橫向於支撐板的延伸平面而延伸。在柄部的端部上具有頭部,加熱元件固定在該頭部上。設置有形狀接合固定件,支腳藉由該形狀接合固定件固定在支撐板上。該形狀接合固定件將支撐件沿柄部的延伸方向束縛在支撐板上。支撐件由此沿柄部的延伸方向具有最小化的、較佳地減小到零的移動間隙。在此,設置有從上面夾持支撐板的形狀接合固定件和從下面夾持支撐板的形狀接合固定件。該形狀接合固定件可以由從柄部上橫向於柄部的延伸方向所突起的固持凸起或固定凸起構成。較佳地如此設計至少一個固持凸起,使得該固持凸起可穿過支撐板的固定開口。藉由旋轉和/或彎曲操作,至少一個固定凸起可以被置入束縛位置中。例如將支撐件在插入固定開口後旋轉90°,由此可以實現上述操作。但還可行的是,僅彎曲至少一個固持凸起,使得固持凸起的區段可以支承在支撐板的底側上。固定凸起安置在支撐板的上側上。較佳地分別設置有兩個固持凸起和兩個固定凸起。兩個凸起對可以設計為從柄部的側面凸起的接片。在固持凸起和固定凸起之間延伸有頸部,該頸部在支撐件的固定狀態下位於固定開口中。固定凸起和/或固持凸起也可以支承在插入件上。插入件可以是絕緣體。在這種情況下,支撐板可以由金屬材料製造。尤其支撐板能夠由鎢或鉬構成。但還可規定,支撐板 由陶瓷材料製成。尤其支撐板是絕緣的。至少支撐件的支腳可以被設計為平板件。固定開口可以是長孔。該長孔可以具有窄孔段,該窄孔段的寬度等於支撐件或支腳的材料厚度。支撐件可以由例如鎢或鉬構成的金屬平板件製成。在此能夠是衝壓件。此外,固定開口具有寬孔段,該寬孔段的寬度等於頸部的寬度,使得頸部可以在較寬的固定孔區段的內部旋轉90°,以便側向突出的固定凸起可以從下面扣住支撐板的底側。支撐件的頭部可以具有至少一個弧形延伸的支承面。側面的臂於側面設置在該支承面的兩側。支承面可以被設計為弧形的凹穴(Mulde)。但也可規定,支承面由四周封閉的開口的邊緣構成。開口可以具有圓形的橫截面。支承面較佳地可以具有齒紋。加熱元件接觸地抵靠在支承面上。加熱元件可以是一種螺旋盤繞的加熱線。較佳地延伸有兩條並排的且設計為雙股螺旋線的加熱線。藉由固定線,設計為加熱元件的加熱線被固定在支撐件上。為了將固定線固定,支撐件和尤其支撐件的頭部具有至少一個凹槽。但也可以設置多個凹槽,在固定狀態下固定線置於凹槽中。 First and at all, it is proposed that the support has a foot which is engageably and securely inserted into the fixed opening of the support plate. The support has a handle that extends transverse to the plane of extension of the support plate. There is a head on the end of the handle on which the heating element is attached. A shape engaging fixing member is provided, and the leg is fixed to the support plate by the shape engaging fixing member. The shape engagement fixture binds the support member to the support plate in the direction in which the handle extends. The support thus has a movement gap that is minimized, preferably reduced to zero, along the direction of extension of the handle. Here, a shape engagement fixing member that sandwiches the support plate from above and a shape engagement fixing member that clamps the support plate from below is provided. The shape engaging fixing member may be constituted by a holding projection or a fixing projection that protrudes from the handle portion transverse to the extending direction of the handle portion. Preferably, the at least one retaining projection is designed such that the retaining projection can pass through the fixed opening of the support plate. At least one of the fixing projections can be placed in the restraining position by the rotating and/or bending operation. For example, the above operation can be realized by rotating the support member by 90° after being inserted into the fixing opening. However, it is also possible to bend only at least one of the retaining projections so that the section of the retaining projection can be supported on the underside of the support plate. The fixing projection is placed on the upper side of the support plate. Preferably, two holding projections and two fixing projections are provided respectively. The two pairs of projections can be designed as tabs that project from the sides of the handle. A neck extends between the retaining projection and the fixing projection, the neck being located in the fixed opening in the fixed state of the support. The fixing projections and/or the retaining projections can also be supported on the insert. The insert can be an insulator. In this case, the support plate can be made of a metal material. In particular, the support plate can be composed of tungsten or molybdenum. But it can also be specified, the support plate Made of ceramic material. In particular, the support plate is insulated. At least the legs of the support can be designed as flat pieces. The fixed opening can be a long hole. The elongated hole may have a narrow bore segment having a width equal to the material thickness of the support or leg. The support member may be made of a metal flat member made of, for example, tungsten or molybdenum. This can be a stamped part. Furthermore, the fixed opening has a wide bore segment having a width equal to the width of the neck such that the neck can be rotated 90° inside the wider fixed bore section so that the laterally projecting retaining projection can be from below Hold the bottom side of the support plate. The head of the support may have at least one arcuately extending bearing surface. The side arms are laterally disposed on either side of the support surface. The bearing surface can be designed as a curved recess (Mulde). However, it can also be provided that the bearing surface consists of the edge of the opening which is closed at the periphery. The opening may have a circular cross section. The support surface preferably has a tooth pattern. The heating element abuts against the bearing surface in contact. The heating element can be a spirally wound heating wire. Preferably, there are two heating wires arranged side by side and designed as double helix. The heating wire designed as a heating element is fixed to the support by means of a fixing line. In order to fix the fixing line, the support and in particular the head of the support have at least one groove. However, it is also possible to provide a plurality of grooves in which the fixing wires are placed in a fixed state.

此外,本發明還有關於對連接件的改進,一個或多個接觸板藉由連接件與支撐板相連接。接觸板藉由連接件而定位。藉由連接件也可以將兩個平行平面安置的接觸板相互連接。由此,連接件也可以共同將在三個平行平面安置的板件(即支撐板和兩個接觸板)相互連接。在此也設置有形狀接合固定件,該形狀接合固定件將連接件的區段分別固持在支撐件的開口或接觸板的開口中。形狀接合固定件也可以嵌合在插入開口中的絕緣體上。當支撐板由金屬製成或者當兩個接觸板相互連接時,這尤其是有利的。形狀接合固定件如此設計,使得該形狀接合固定件將支撐板或至少一個接觸 板沿連接件的延伸方向(也就是沿橫向於接觸板或支撐板的延伸平面)束縛在連接件上。該連接件依據本發明以最小化的移動間隙被束縛在接觸板或支撐板上。為了將兩個接觸板相互連接至少設置有間隔物。在此這種間隔物能夠是一種套筒形狀的組件,其被連接件穿過。形狀接合固定件可以是支撐凸起,該支撐凸起嵌合在支撐板或接觸板上或者在插入開口內的絕緣體上。但是還可以規定,形狀接合固定件被設計為連接件的橫向開口,固定件的銷插入該橫向開口中。該固定件能夠是一種盤狀的組件,其藉由一個舌片形成插入連接件開口中的固定銷。尤其連接件的兩個端部分別具有橫向開口,該銷插入該橫向開口中。藉由插入或穿透該開口而實現連接件的裝配。該開口具有足夠的開口尺寸,使得支撐凸起可以在此穿過。然而為了可以實現支撐件的支承,支撐件可以支承在墊片上。墊片可以具有一條縫隙,使得墊片隨之可以安置在支撐凸起的下面。插入件(尤其絕緣體)可以被分為兩組件,使得該插入件同樣可以在穿過連接件之後能夠穿過開口裝配。尤其兩組件形式的絕緣體具有直徑較小的區段,該區段可以插入接觸板的開口中。插入件的直徑較大的區段支撐在接觸板的上表面上。 Furthermore, the invention relates to an improvement to the connector, the one or more contact plates being connected to the support plate by means of a connector. The contact plate is positioned by the connector. The contact plates arranged in two parallel planes can also be connected to each other by means of a connecting piece. Thereby, the connecting piece can also jointly connect the plates (ie the support plate and the two contact plates) arranged in three parallel planes to each other. Also provided here is a shape-engaging fastener that holds the sections of the connector in the opening of the support or the opening of the contact plate, respectively. The shape joint fixing member can also be fitted to the insulator inserted into the opening. This is especially advantageous when the support plate is made of metal or when the two contact plates are connected to each other. The shape engagement fixture is designed such that the shape engagement fixture will support the support plate or at least one contact The plate is bound to the connector along the direction of extension of the connector (i.e., transverse to the plane of extension of the contact plate or support plate). The connector is tied to the contact plate or support plate with minimal movement clearance in accordance with the present invention. In order to connect the two contact plates to each other, at least spacers are provided. In this case, the spacer can be a sleeve-shaped component which is passed through by the connecting piece. The shape engagement fixture may be a support protrusion that fits over the support plate or contact plate or on an insulator that is inserted into the opening. However, it can also be provided that the shape-bonding fastening element is embodied as a transverse opening of the connecting element into which the pin of the fastening element is inserted. The fastener can be a disc-shaped assembly that forms a securing pin that is inserted into the opening of the connector by a tab. In particular, the two ends of the connector each have a lateral opening into which the pin is inserted. The assembly of the connector is achieved by inserting or penetrating the opening. The opening has a sufficient opening size such that the support projections can pass therethrough. However, in order to be able to support the support, the support can be supported on the spacer. The gasket may have a slit such that the gasket can then be placed below the support projection. The insert (especially the insulator) can be divided into two components so that the insert can also be assembled through the opening after passing through the connector. In particular, the two-component form of the insulator has a section of smaller diameter which can be inserted into the opening of the contact plate. The larger diameter section of the insert is supported on the upper surface of the contact plate.

前述支撐件不僅可以由導電材料製造。還規定,支撐件或連接件由陶瓷材料製造或者該支撐件或連接件具有絕緣層,例如以30至40μm的層厚度被塗佈。即可以將絕緣的支撐件/連接件塗佈,也可以將導電的支撐件/連接件塗佈。使用絕緣的支撐件或連接件的優點是,支撐板可以由導電材料(如鉬)製成,並且為了連接接觸板而不需要設置絕緣體。 The aforementioned support member can be made not only from a conductive material. It is also provided that the support or the connection is made of a ceramic material or that the support or the connection has an insulating layer, for example coated with a layer thickness of 30 to 40 μm. That is, the insulated support/connector can be coated, or the conductive support/connector can be coated. An advantage of using an insulating support or connector is that the support plate can be made of a conductive material such as molybdenum and there is no need to provide an insulator in order to connect the contact plates.

還建議,支撐板由金屬製造並且具有30至40μm的 塗層。在前述支撐板的塗層中,支撐件或連接件可以是一種碳化矽。金屬的支撐件或連接件較佳地被塗佈有碳化矽塗層,因為這種保護層阻止了由陶瓷材料(如氮化硼(Bohrnitrit))製成的支撐板與金屬的(可由鉬構成的)支撐件或連接件之間的反應。 It is also suggested that the support plate is made of metal and has a size of 30 to 40 μm. coating. In the coating of the aforementioned support plate, the support or the connecting member may be a tantalum carbide. The metal support or connector is preferably coated with a tantalum carbide coating because this protective layer prevents the support plate made of a ceramic material (such as boron nitride) from being made of metal (which can be composed of molybdenum). The reaction between the support or the connector.

1‧‧‧CVD反應器 1‧‧‧ CVD reactor

2‧‧‧處理室 2‧‧‧Processing room

3‧‧‧進氣構件 3‧‧‧Intake components

4‧‧‧基座 4‧‧‧Base

5‧‧‧加熱裝置 5‧‧‧ heating device

6‧‧‧加熱器 6‧‧‧heater

7‧‧‧加熱器 7‧‧‧heater

8‧‧‧加熱器 8‧‧‧heater

9‧‧‧加熱元件 9‧‧‧ heating element

10‧‧‧支撐件 10‧‧‧Support

11‧‧‧臂 11‧‧‧ Arm

12‧‧‧臂 12‧‧‧ Arm

13‧‧‧支承面 13‧‧‧ support surface

14‧‧‧柄部 14‧‧‧ handle

15‧‧‧支撐凸起 15‧‧‧Support bulges

16‧‧‧固持凸起 16‧‧‧ holding bulge

17‧‧‧頸部 17‧‧‧ neck

18‧‧‧凹槽 18‧‧‧ Groove

18’‧‧‧凹槽 18’‧‧‧ Groove

19‧‧‧加熱元件 19‧‧‧ heating elements

20‧‧‧支撐件 20‧‧‧Support

21‧‧‧臂 21‧‧‧ Arm

22‧‧‧臂 22‧‧‧ Arm

23‧‧‧凹穴 23‧‧‧ recesses

24‧‧‧柄部 24‧‧‧ handle

25‧‧‧支撐凸起 25‧‧‧Support bumps

26‧‧‧固持凸起 26‧‧‧ holding bulge

27‧‧‧頸部 27‧‧‧ neck

28‧‧‧凹槽 28‧‧‧ Groove

28’‧‧‧凹槽 28’‧‧‧ Groove

29‧‧‧支撐板 29‧‧‧Support board

30‧‧‧連接件 30‧‧‧Connecting parts

31‧‧‧支撐凸起 31‧‧‧Support bulges

32‧‧‧側翼 32‧‧‧Flanking

33‧‧‧橫向開口 33‧‧‧ lateral opening

34‧‧‧橫向開口 34‧‧‧lateral opening

35‧‧‧絕緣體 35‧‧‧Insulator

36‧‧‧固定件 36‧‧‧Fixed parts

37‧‧‧間隔物 37‧‧‧ spacers

38‧‧‧插入孔、固定孔、固定開口 38‧‧‧Insert hole, fixing hole, fixed opening

38’‧‧‧窄區段 38’‧‧‧Narrow section

38”‧‧‧寬區段 38”‧‧‧ Wide section

39‧‧‧接觸板 39‧‧‧Contact plate

40‧‧‧接觸板 40‧‧‧Contact plate

41‧‧‧開口 41‧‧‧ openings

42‧‧‧開口 42‧‧‧ openings

43‧‧‧開口 43‧‧‧ openings

44‧‧‧線 44‧‧‧ line

45‧‧‧接觸銷 45‧‧‧Contact pin

46‧‧‧墊片 46‧‧‧shims

47‧‧‧蓋板 47‧‧‧ Cover

以下結合附圖對本發明的實施例進行說明。在附圖中:圖1示出CVD反應器的結構示意圖,圖2示出多區加熱器的側視圖,圖3示出多區加熱器的俯視圖,圖4示出沿剖面線IV-IV剖面支撐件的第一實施例所得的剖面圖,圖5示出在插入孔內置入的第一階段的第一支撐件的立體圖,圖6示出根據圖5的在插入孔內固定插入件的第二階段的示意圖,圖7示出根據圖5的支撐件10在支撐板29上形狀接合地束縛後的示意圖,圖8示出加熱元件9藉由固定線44在支撐件10上的固定,圖9示出支撐件10的第二實施例,圖10示出支撐件10的第三實施例,圖11示出支撐件10的第四實施例,圖12示出支撐件10的第五實施例,圖13示出在根據圖5的視圖內支撐件的固定,但是具有變化的插入孔38, 圖14示出支撐件10的第六實施例,圖15示出根據圖3的剖面線XV-XV剖面所得的視圖內,支撐件的第七實施例,圖16示出圖15所示支撐件20的立體圖,圖17示出沿圖3的剖面線XVII-XVII剖面所得的剖面圖,圖18示出圖17的剖面圖區域的立體圖,圖19示出根據圖18的視圖,但是具有完整的間隔物37、絕緣體35和固定件36,圖20示出沿圖17的剖面線XX-XX剖面所得的剖面圖,及圖21示出連接件30的第二實施例。 Embodiments of the present invention will be described below with reference to the accompanying drawings. In the drawings: FIG. 1 shows a schematic structural view of a CVD reactor, FIG. 2 shows a side view of a multi-zone heater, FIG. 3 shows a plan view of a multi-zone heater, and FIG. 4 shows a section along a section line IV-IV. A cross-sectional view of the first embodiment of the support member, FIG. 5 is a perspective view showing the first support member inserted in the first stage of the insertion hole, and FIG. 6 is a view showing the first embodiment of fixing the insert member in the insertion hole according to FIG. FIG. 7 is a schematic view showing the support member 10 according to FIG. 5 bounded on the support plate 29 in a form-fitting manner, and FIG. 8 shows the fixing of the heating element 9 on the support member 10 by the fixing wire 44. 9 shows a second embodiment of the support 10, FIG. 10 shows a third embodiment of the support 10, FIG. 11 shows a fourth embodiment of the support 10, and FIG. 12 shows a fifth embodiment of the support 10. Figure 13 shows the fixing of the support in the view according to Figure 5, but with varying insertion holes 38, Figure 14 shows a sixth embodiment of the support member 10, Figure 15 shows a seventh embodiment of the support member in the view taken along the section line XV-XV of Figure 3, and Figure 16 shows the support member shown in Figure 15. 20 is a perspective view, FIG. 17 is a cross-sectional view taken along the line XVII-XVII of FIG. 3, FIG. 18 is a perspective view of the cross-sectional area of FIG. 17, and FIG. 19 is a view according to FIG. The spacer 37, the insulator 35 and the fixing member 36, Fig. 20 shows a cross-sectional view taken along the section line XX-XX of Fig. 17, and Fig. 21 shows a second embodiment of the connecting member 30.

圖1示意性地示出CVD反應器的概略結構。該CVD反應器具有向外氣密的例如由不銹鋼製成的殼體,在殼體內接合未示出的供氣管道。供氣管道接合在進氣構件3的空腔內,進氣構件3具有排氣面,該排氣面構成處理室2的遮蓋面。處理氣體藉由排氣板內的出氣孔流入處理室2內。處理室2的底板由基座4構成,在該基座4上放置有待塗佈的基板、例如矽基板,但也能是由III和IV族元素構成的基板。由石墨製成的基座4藉由加熱裝置5從底側被加熱。 Fig. 1 schematically shows a schematic structure of a CVD reactor. The CVD reactor has a housing that is outwardly airtight, such as stainless steel, into which a gas supply conduit, not shown, is engaged. The gas supply duct is engaged in the cavity of the intake member 3, and the intake member 3 has an exhaust surface which constitutes a covering surface of the processing chamber 2. The process gas flows into the process chamber 2 through an air outlet hole in the exhaust plate. The bottom plate of the processing chamber 2 is constituted by a susceptor 4 on which a substrate to be coated, for example, a ruthenium substrate, is placed, but it can also be a substrate composed of Group III and IV elements. The susceptor 4 made of graphite is heated from the bottom side by the heating device 5.

圖2示出根據本發明的加熱裝置的側視圖。圖3示出其俯視圖。加熱裝置5由三個相互分隔的加熱器6、7、8構成。中央的加熱器6位於中心並且構成第一加熱區域。第一加熱區域被圍繞中央加熱器6的環形的加熱器7所環繞,該加熱器7構成第二加熱區域。第三加熱區域由週邊環形構成,其形成外側的加熱器8。 加熱器6、7、8中的每一個都具有佈置為螺旋曲線的加熱元件9、19。在一條螺旋曲線上相繼安置有多個加熱元件。 Figure 2 shows a side view of a heating device according to the invention. Figure 3 shows a top view thereof. The heating device 5 is composed of three heaters 6, 7, 8 which are separated from each other. The central heater 6 is central and constitutes a first heating zone. The first heating zone is surrounded by an annular heater 7 surrounding the central heater 6, which constitutes a second heating zone. The third heating zone is formed by a peripheral ring which forms the heater 8 on the outside. Each of the heaters 6, 7, 8 has heating elements 9, 19 arranged in a spiral curve. A plurality of heating elements are arranged one after the other on a spiral curve.

加熱器6、7、8的加熱元件是電氣並聯的。每個加熱元件9、19藉由連接端與接觸板39、40相連接。在兩個內側加熱器6、7內,兩個接觸板39、40安置在同一個平面內。在外側的加熱器8內,接觸板39、40安置在兩個不同的水平面上,也就是安置在兩個彼此間隔的平面內。接觸板39、40或加熱元件9、19的通電藉由向下突起的接觸銷45實現。 The heating elements of the heaters 6, 7, 8 are electrically connected in parallel. Each heating element 9, 19 is connected to the contact plates 39, 40 by a connection end. In the two inner heaters 6, 7, the two contact plates 39, 40 are placed in the same plane. In the outer heater 8, the contact plates 39, 40 are arranged on two different horizontal planes, that is to say in two mutually spaced planes. The energization of the contact plates 39, 40 or the heating elements 9, 19 is achieved by a downwardly projecting contact pin 45.

加熱元件9、19出於簡要的原因在圖2至7中被顯示為在螺旋曲線上延伸的實心圓柱體。圖8示出加熱元件的詳細視圖。每個加熱元件9、19都由螺旋盤繞的加熱絲構成。這種絲由鎢構成。在圖8中示出的加熱元件9由單一的且螺旋盤繞的鎢絲製成。但也可以由兩條或多條加熱線形成螺旋線圈。這些加熱線並排延伸。 The heating elements 9, 19 are shown in Figures 2 to 7 as solid cylinders extending on a spiral curve for the sake of brevity. Figure 8 shows a detailed view of the heating element. Each of the heating elements 9, 19 is formed by a spirally wound heating wire. This wire is composed of tungsten. The heating element 9 shown in Figure 8 is made of a single and spirally wound tungsten wire. However, it is also possible to form the spiral coil from two or more heating wires. These heater wires extend side by side.

圖4示出支撐件10的第一實施例,加熱元件9(尤其是加熱螺旋線圈)藉由該支撐件10與支撐板29保持確定的間距。支撐板29由非導熱材料(如陶瓷)製成,並且在承載加熱器6、7、8的整個表面上延伸。中央加熱器6的支撐板具有圓盤形狀。兩個外側加熱器7、8的支撐板具有圓環形狀。支撐板29也可以由多個單獨的板件組合而成。 Figure 4 shows a first embodiment of the support member 10, with the heating element 9 (especially the heating spiral coil) being held at a defined distance from the support plate 29 by the support member 10. The support plate 29 is made of a non-thermally conductive material such as ceramic and extends over the entire surface of the load bearing heaters 6, 7, 8. The support plate of the center heater 6 has a disk shape. The support plates of the two outer heaters 7, 8 have a circular ring shape. The support plate 29 can also be assembled from a plurality of individual panels.

支撐件10具有由兩個臂11、12構成的頭部,在兩個臂之間延伸著弧形的支承面13。支撐件10由平坦的金屬件(如鎢件或鉬件)製成。支承面13具有齒紋,其藉由在弧形的支承面加工的刻槽製成。支承面13的弧線延伸走向與加熱元件9的螺旋線圈的 曲率變化相一致。 The support 10 has a head formed by two arms 11, 12 with an arcuate bearing surface 13 extending between the two arms. The support member 10 is made of a flat metal member such as a tungsten member or a molybdenum member. The bearing surface 13 has a tooth pattern which is produced by a groove which is machined in an arcuate bearing surface. The arc of the bearing surface 13 extends towards the spiral coil of the heating element 9 The curvature changes are consistent.

在頭部區域內設置鉤形的凹槽18、18’。這些凹槽設置用於藉由固定絲線將加熱元件9固定在支撐件10的頭部上。 Hook-shaped recesses 18, 18' are provided in the head region. These grooves are provided for fixing the heating element 9 to the head of the support 10 by means of a fixing wire.

支撐件10具有柄部14,其一個端部延伸至頭部內,並且其另一個端部延伸至支腳內。支撐件10的支腳形狀接合地與支撐板29相固定。為此設置有形狀接合固定件。該形狀接合固定件包括兩個彼此背向的支撐凸起15。該支撐凸起15橫向於柄部14的延伸方向從支撐件10上突出,用於自身支承在支撐板29的上側面上。支撐件10的與頭部相對置的端部由兩個彼此背向的固持凸起16構成。該固持凸起16同樣是橫向於柄部14的延伸方向從支撐件10上突出的接片。在兩個固持凸起16和支撐凸起15之間延伸著頸部17,該頸部17的長度與支撐板29的材料厚度一致,使得在裝配狀態下,支撐板29被固持凸起16從下端夾持並且被支撐凸起15從上端夾住。 The support 10 has a handle 14 with one end extending into the head and the other end extending into the leg. The legs of the support member 10 are fixedly engaged with the support plate 29 in a form-fitting manner. A shaped joint fixing member is provided for this purpose. The shape engagement fixture includes two support projections 15 that face away from each other. The support protrusion 15 protrudes from the support member 10 transversely to the extending direction of the shank portion 14 for supporting itself on the upper side of the support plate 29. The end of the support 10 opposite the head is formed by two holding projections 16 facing away from each other. The retaining projections 16 are also tabs projecting from the support member 10 transversely to the direction of extension of the shank 14. A neck portion 17 is extended between the two holding projections 16 and the support projections 15, the length of the neck portion 17 being identical to the material thickness of the support plate 29, so that in the assembled state, the support plate 29 is held by the projections 16 from The lower end is clamped and clamped by the support projection 15 from the upper end.

由圖4還可以看到,支撐板29在與蓋板47和置於蓋板下的接觸板40平行的平面內延伸。 It can also be seen from Figure 4 that the support plate 29 extends in a plane parallel to the cover plate 47 and the contact plate 40 placed under the cover plate.

圖5至7示出插入孔38的第一變型方案,該插入孔38設置在支撐板29內,用於束縛支撐件10。在支撐板29內設置有多個這種插入孔38,每個插入孔相應地與一個支撐件10裝配,使得加熱元件9、19可以在多個圓周位置上被束縛在支撐板29上。 5 to 7 show a first variant of the insertion hole 38 which is provided in the support plate 29 for restraining the support 10. A plurality of such insertion holes 38 are provided in the support plate 29, each of which is correspondingly assembled with a support member 10 such that the heating elements 9, 19 can be restrained on the support plate 29 at a plurality of circumferential positions.

插入孔38具有窄區段38’和寬區段38”。窄區段38’具有大約等於支撐件10的支腳的材料厚度的縫隙寬度。插入孔38的長度被如此足夠地定尺寸,使得支撐件10的支腳連同支撐件的固持凸起16可以插進穿過插入孔38。這由圖5詳細示出。如果固 持凸起16插進穿過插入孔38,則支撐件10可以側向移入圖6所示的位置中,在該位置上頸部17位於插入孔38的較寬的且具有圓形輪廓的區段38”內。較寬的圓形區段38”的直徑等於頸部17的寬度,使得頸部17可以在孔區段38”內旋轉,直至達到圖7所示的位置,在該位置上支撐凸起15以及固持凸起16橫向於插入孔38的窄區段的延伸方向地延伸。插入孔38當前具有固定孔38的功能,因為插入孔位置固定地且橫向於柄部14的延伸方向地將支撐件10束縛在支撐板29上。支撐件10的轉動位置藉由被支撐件10支撐的加熱元件9所固定。 The insertion hole 38 has a narrow section 38' and a wide section 38". The narrow section 38' has a slit width approximately equal to the material thickness of the legs of the support 10. The length of the insertion hole 38 is sufficiently sized such that The legs of the support member 10 together with the retaining projections 16 of the support member can be inserted through the insertion holes 38. This is illustrated in detail by Figure 5. If solid With the projection 16 inserted through the insertion hole 38, the support member 10 can be moved laterally into the position shown in Figure 6, where the neck 17 is located in the wider, circularly contoured region of the insertion aperture 38. Within the segment 38", the diameter of the wider circular section 38" is equal to the width of the neck 17, such that the neck 17 can be rotated within the aperture section 38" until it reaches the position shown in Figure 7, at which position The support protrusion 15 and the retaining projection 16 extend transversely to the extension of the narrow section of the insertion hole 38. The insertion hole 38 currently has the function of the fixing hole 38 because the insertion hole is fixedly positioned and transverse to the direction of extension of the shank 14. The support member 10 is tethered to the support plate 29. The rotational position of the support member 10 is fixed by the heating member 9 supported by the support member 10.

圖8示出線44形式的束縛件,加熱螺旋線圈9藉由該線44被拴在支撐件10的頭部上。支撐件10具有兩個不同長度的臂11、12。此外,較短的臂12被設計為比較長的臂11更窄。這種被減小的橫向延伸量使得兩個相鄰延伸的加熱元件9的徑向間距被最小化。 Figure 8 shows the restraining member in the form of a wire 44 by which the heating helical coil 9 is clamped on the head of the support member 10. The support 10 has two arms 11, 12 of different lengths. Furthermore, the shorter arm 12 is designed to be narrower than the longer arm 11. This reduced lateral extent allows the radial spacing of two adjacently extending heating elements 9 to be minimized.

在圖9所示的實施例中,支承面13被設計為在支撐件10之頭部內的圓形封閉開口的環形開口邊緣表面。圖9還示出,藉由將支撐凸起15以及固持凸起16從支撐件10的延伸平面向外彎曲可以實現附加的形狀接合的束縛。 In the embodiment shown in Figure 9, the bearing surface 13 is designed as an annular opening edge surface of a circular closed opening in the head of the support 10. Figure 9 also shows that the attachment of the additional shape engagement can be achieved by bending the support projections 15 and the retention projections 16 outwardly from the plane of extension of the support member 10.

圖10示出支撐件10的第三實施例,其中兩個臂11被設計為具有相同長度。支承面13構成U型開口的底面,該支承面13在此也由被凹槽相互分割的肋板構成。 Figure 10 shows a third embodiment of the support 10 in which the two arms 11 are designed to have the same length. The bearing surface 13 forms the bottom surface of the U-shaped opening, which is also formed here by ribs which are divided by the grooves.

圖11示出支撐件的第四實施例,並且圖12示出支撐件的第五實施例。在此,支撐件也由平面組件構成,並且本質上藉由短臂12的結構設計與前述支撐件相區別。 Figure 11 shows a fourth embodiment of the support and Figure 12 shows a fifth embodiment of the support. Here, the support member is also formed by a planar assembly and is essentially distinguished from the aforementioned support member by the structural design of the short arm 12.

圖13示出固定開口或插入孔38的變型方案。固定開口38在此具有兩個窄區段38’,它們相對於寬區段38”彼此對置。在此,支撐件10也可以實現與具有插入孔38的支撐板29的插接形式的連接。但是在此,在插入支撐件10後無需側向移位。 FIG. 13 shows a variant of the fixing opening or the insertion opening 38. In this case, the fastening opening 38 has two narrow sections 38 ′ which are opposite one another with respect to the wide section 38 ′. In this case, the support 10 can also be connected to the plug-in connection of the support plate 29 with the insertion opening 38 . However, here, no lateral displacement is required after the support 10 is inserted.

圖14示出支撐件的第六實施例,其中固持凸起16由彈簧臂構成,在支撐件10的支腳插入後,該彈簧臂可以在支撐位置中彈性夾緊。在該實施例中,支撐板29由金屬製成。在插入孔38中置入絕緣體35。絕緣體35分別具有凸緣,該凸緣抵靠在支撐板29的上側或底側上。在該凸緣上支承著支撐凸起15或固持凸起16。由金屬構成的支撐件10由此相對於支撐板29被絕緣。 Figure 14 shows a sixth embodiment of the support member in which the retaining projection 16 is formed by a spring arm which can be resiliently clamped in the support position after the foot of the support member 10 is inserted. In this embodiment, the support plate 29 is made of metal. An insulator 35 is placed in the insertion hole 38. The insulators 35 each have a flange that abuts against the upper or bottom side of the support plate 29. A support protrusion 15 or a holding protrusion 16 is supported on the flange. The support 10 made of metal is thus insulated from the support plate 29.

圖15示出支撐件20的第七實施例和背景中的連接件30,支撐板29藉由連接件30與兩個接觸板39、40相連接。在圖1至14中示出的支撐件配屬於內側加熱器6、7,同時圖15所示的支撐件20配屬於外側加熱器8。加熱元件19在此也被顯示為圓柱體。然而,加熱元件實際的結構設計與圖8所示相一致。加熱元件可以是一種螺旋盤繞的鎢絲。在此,螺旋線圈也可以由鎢絲或多條相互平行延伸的加熱線構成。支撐件20在此總共支承著5個加熱元件19。加熱元件19可以相互接觸。加熱元件19位於不同的且相互間隔的平面內,這些平面平行於支撐板29的平面而延伸。由此,支撐件20的頭部被設計為多個相疊佈置的分別容納加熱元件19的凹穴23。在此,也可以藉由固定線實現加熱元件19在凹穴23內的固定。為了繫住固定線,該支撐件20具有凹槽28。 Figure 15 shows a seventh embodiment of the support member 20 and a connector member 30 in the background, the support plate 29 being connected to the two contact plates 39, 40 by means of a connector member 30. The support members shown in Figs. 1 to 14 are assigned to the inner heaters 6, 7, while the support members 20 shown in Fig. 15 are assigned to the outer heaters 8. The heating element 19 is here also shown as a cylinder. However, the actual structural design of the heating element is consistent with that shown in FIG. The heating element can be a spirally wound tungsten wire. Here, the spiral coil can also be composed of a tungsten wire or a plurality of heating wires extending parallel to each other. The support 20 here supports a total of five heating elements 19 . The heating elements 19 can be in contact with each other. The heating elements 19 are situated in different, mutually spaced planes which extend parallel to the plane of the support plate 29. Thereby, the head of the support 20 is designed as a plurality of recesses 23 arranged one above the other to accommodate the heating element 19. In this case, the fixing of the heating element 19 in the recess 23 can also be effected by means of a fastening line. In order to tie the fixing line, the support 20 has a recess 28.

支撐件20的支腳在此也固定在支撐板29的孔38內,其可以依據上述實施例進行結構設計。從支撐件20的柄部24 上突出有支撐凸起25和固持凸起26。支撐凸起25與前述實施例中的支撐凸起15相一致。固持凸起26與前述實施例中的固持凸起16相一致,從而可引用上述相關的設計方案,實施支撐件20的支腳在插入孔38內的固定。在此也藉由插接-轉動操作來實現該固定。 The legs of the support member 20 are here also fixed in the holes 38 of the support plate 29, which can be structurally designed in accordance with the above embodiments. From the handle 24 of the support member 20 A support protrusion 25 and a holding protrusion 26 are protruded from above. The support protrusions 25 coincide with the support protrusions 15 in the foregoing embodiment. The retaining projections 26 conform to the retaining projections 16 of the previous embodiment, so that the attachment of the legs of the support member 20 within the insertion aperture 38 can be implemented with reference to the above-described related design. This fixing is also achieved here by a plug-and-turn operation.

圖17至20示出連接件30的第一實施例,支撐板29藉由該連接件30與接觸板39或40相連接。設置有多個在加熱器8的基礎面上的相互不同的位置上延伸的連接件30。外側加熱器8具有安置在兩個不同的平面上的接觸板39、40。為了使兩個接觸板39、40保持恒定的間距,設置有套筒形狀的且由陶瓷材料製成的間隔物37。在套筒形狀的間隔物37的空腔內,相應延伸有連接件30。連接件30在兩個接觸板39、40上的束縛藉由形狀接合固定件實現。兩個彼此背離指向的支撐凸起31支撐在絕緣體35上,該絕緣體35在與間隔物37相對置的一側上部分地插入接觸板39的開口42內。絕緣體35可以由兩個半組件構成,它們互補成圓柱體。支撐凸起31可以支撐在墊片46上,該墊片46不是側向在連接件30上隆起就是插入穿過開口42。 17 to 20 show a first embodiment of a connector 30 by which the support plate 29 is connected to the contact plate 39 or 40. A plurality of connecting members 30 extending at mutually different positions on the base surface of the heater 8 are provided. The outer heater 8 has contact plates 39, 40 disposed on two different planes. In order to maintain a constant spacing of the two contact plates 39, 40, a spacer 37 in the shape of a sleeve and made of a ceramic material is provided. Within the cavity of the sleeve-shaped spacer 37, a connector 30 is correspondingly extended. The binding of the connector 30 to the two contact plates 39, 40 is achieved by a form-fitting fastener. Two support projections 31 pointing away from each other are supported on an insulator 35 which is partially inserted into the opening 42 of the contact plate 39 on the side opposite the spacer 37. The insulator 35 can be composed of two halves which are complementary to a cylinder. The support projection 31 can be supported on a spacer 46 that is not embossed laterally on the connector 30 or inserted through the opening 42.

套筒狀的間隔物37的軸向長度限定了兩個接觸板39、40的間距。間隔物37的端部邊緣支撐在下部接觸板40的上側上。間隔物37的上端部邊緣支承著上部接觸板39。 The axial length of the sleeve-like spacer 37 defines the spacing of the two contact plates 39,40. The end edge of the spacer 37 is supported on the upper side of the lower contact plate 40. The upper end edge of the spacer 37 supports the upper contact plate 39.

從置於間隔物37的空腔內的連接件30的區段上突出有兩個側翼32,該等側翼32使間隔物定心在相對於開口42的同心位置上。 Two side flaps 32 project from the section of the connector 30 placed in the cavity of the spacer 37, the wings 32 centering the spacers in a concentric position relative to the opening 42.

連接件30的端部區段穿過下部接觸板40的開口43。在接觸板40的開口43內插入絕緣體35。在此,該絕緣體35局部 從與間隔物37相對置的開口側突出。在絕緣體35的端側上安置有墊片46,固定件36支承在該墊片46上。固定件36具有設計為銷的舌片,其穿過連接件30的橫向開口34。藉由支撐凸起31和固定件36將連接件30軸向束縛在兩個接觸板40上。 The end section of the connector 30 passes through the opening 43 of the lower contact plate 40. An insulator 35 is inserted into the opening 43 of the contact plate 40. Here, the insulator 35 is partially It protrudes from the opening side opposed to the spacer 37. On the end side of the insulator 35, a spacer 46 is placed, on which the fixing member 36 is supported. The fastening element 36 has a tongue designed as a pin which passes through the transverse opening 34 of the connection piece 30. The connecting member 30 is axially bound to the two contact plates 40 by the supporting projection 31 and the fixing member 36.

支撐板29與上部接觸板39相間隔地延伸。支撐板29具有開口41,連接件30的端部區段穿過該開口41。在支撐板29的底側區域有連接件30的支撐凸起31,支撐板29在中間安置有墊片的情況下支承在該支撐凸起31上。 The support plate 29 extends away from the upper contact plate 39. The support plate 29 has an opening 41 through which an end section of the connector 30 passes. In the bottom side region of the support plate 29, there is a support projection 31 of the connecting member 30, on which the support plate 29 is supported with a spacer interposed therebetween.

從支撐板29的上側突起的連接件30的端部藉由固定件36被束縛在支撐板29上。該固定件36構成舌片,其穿過連接件30的橫向開口33。在支撐板29的上側和固定件36之間具有墊片46。 The end of the connecting member 30 projecting from the upper side of the support plate 29 is bound to the support plate 29 by a fixing member 36. The fixing member 36 constitutes a tongue which passes through the lateral opening 33 of the connecting member 30. A spacer 46 is provided between the upper side of the support plate 29 and the fixing member 36.

藉由將插進入開口33或34的舌片的端部彎曲,從而實現固定件36的穩定的固定。 The stable fixing of the fixing member 36 is achieved by bending the end of the tongue inserted into the opening 33 or 34.

圖21示出連接件30的剖面圖,該連接件用於兩個內側加熱器6、7。因為在該實施例中兩個接觸板39、40在一個平面內延伸,所以為了將接觸板40與支撐板29相連接而設置有連接件30。在此,支撐板29的底側也支撐在支撐凸起31上,其中在此也設置有墊片46。在此也藉由固定件36的舌片實現連接件30與支撐板29的上側的固定,該固定件穿過連接件30的橫向開口。 Figure 21 shows a cross-sectional view of the connector 30 for the two inside heaters 6, 7. Since the two contact plates 39, 40 extend in one plane in this embodiment, the connecting member 30 is provided in order to connect the contact plate 40 with the support plate 29. In this case, the underside of the support plate 29 is also supported on the support projection 31, wherein a spacer 46 is also provided here. The fastening of the connecting piece 30 to the upper side of the support plate 29 is also effected by the tongue of the fastening element 36 which passes through the transverse opening of the connecting element 30.

向下指向的支撐凸起支撐在墊片46上,該墊片46安置在絕緣體35上,該絕緣體35嵌入蓋板47的開口中。插入蓋板開口中的絕緣體35也具有間隔物的功能,因為絕緣體35使蓋板47與接觸板40保持一定間距。另一個絕緣體35從底側插入接觸板40 的開口中,該另一個絕緣體藉由固定件36固定。在此,固定件36的舌片也穿過連接件30的橫向開口。 The downwardly directed support projections are supported on a spacer 46 which is placed on an insulator 35 which is embedded in the opening of the cover plate 47. The insulator 35 inserted into the opening of the cover also functions as a spacer because the insulator 35 maintains the cover 47 at a certain distance from the contact plate 40. Another insulator 35 is inserted into the contact plate 40 from the bottom side In the opening, the other insulator is fixed by the fixing member 36. Here, the tongue of the fastening element 36 also passes through the lateral opening of the connector 30.

前述實施方式用於描述在本申請中整體包含的發明內容,其藉由以下技術特徵組合相對於現有技術相應獨立地進行改進,其特徵包括: The foregoing embodiments are used to describe the invention contained in the present application as a whole, which is independently and independently improved with respect to the prior art by the following combination of technical features, and the features include:

一種裝置,其特徵在於,支腳15、16、17;25、26、27藉由形狀接合固定件15、16、17;25、26、27固定在支撐板29的固定開口38內,該形狀接合固定件15、16、17;25、26、27將支撐件10、20沿柄部14、24的延伸方向束縛在支撐板29上。 A device, characterized in that the legs 15, 16, 17; 25, 26, 27 are fixed in a fixed opening 38 of the support plate 29 by means of a form-fitting fastener 15, 16, 17, 27, the shape The joint fixing members 15, 16, 17; 25, 26, 27 bind the support members 10, 20 to the support plate 29 in the extending direction of the shanks 14, 24.

一種裝置,其特徵在於,形狀接合固定件15、16、17;25、26、27具有至少一個橫向於柄部14、24的延伸方向延伸的固持凸起16、26,在安裝支撐件10、20時,該固持凸起16、26能夠穿過固定開口38並且在轉動支撐件10、20和/或固持凸起16、26變形後從下端扣住支撐板29或插入固定開口38內的插入件35,並且形狀接合固定件15、16、17;25、26、27還具有至少一個橫向於柄部14、24的延伸方向延伸的固定凸起15、25。 A device, characterized in that the shape-engaging fixing members 15, 16, 17; 25, 26, 27 have at least one holding projection 16, 26 extending transversely to the extending direction of the shanks 14, 24, in the mounting support 10, At 20 o'clock, the retaining projections 16, 26 can pass through the fixed opening 38 and engage the insertion plate 29 or the insertion into the fixed opening 38 from the lower end after the rotational support 10, 20 and/or the retaining projections 16, 26 are deformed. The member 35 and the shape-engaging fasteners 15, 16, 17; 25, 26, 27 also have at least one fixing projection 15, 25 extending transversely to the direction in which the shanks 14, 24 extend.

一種裝置,其特徵在於,插入件35是絕緣體,而支撐板29由金屬構成。 A device characterized in that the insert 35 is an insulator and the support plate 29 is made of metal.

一種裝置,其特徵在於,支腳15、16、17;25、26、27至少被設計為平面組件,而固定開口38至少被設計為長孔,該長孔具有窄區段38’和寬區段38”,該窄區段38’的寬度實質上等於固持凸起16的材料厚度,該寬區段38”實質上等於在支撐凸起15和固持凸起16之間延伸的頸部17的寬度。 A device, characterized in that the legs 15, 16, 17; 25, 26, 27 are at least designed as planar components, and the fixed opening 38 is at least designed as a long hole having a narrow section 38' and a wide area Segment 38", the width of the narrow section 38' is substantially equal to the material thickness of the retaining projection 16, which is substantially equal to the neck 17 extending between the support projection 15 and the retaining projection 16. width.

一種裝置,其特徵在於,頭部11、12、13;21、22、 23具有至少一個弧形走向的支承面13、23,尤其由螺旋盤繞的加熱線構成的加熱元件9、19抵靠在支承面13、23上,其中尤其規定,該支承面13被設計為凹穴23或環形封閉的孔並且尤其具有抵靠在加熱元件9、19上的齒紋表面。 A device characterized by heads 11, 12, 13; 21, 22, The bearing elements 13 , 23 , which are formed by the heating elements of the spirally wound heating lines 9 , 23 , abut on the bearing surfaces 13 , 23 , wherein the bearing surface 13 is embodied as a recess. The pocket 23 or the annular closed bore and in particular has a flank surface that abuts against the heating elements 9, 19.

一種裝置,其特徵在於,支撐件10、20具有至少一個凹槽18、18’、28、28’,線44設置在凹槽18、18’、28、28’內,加熱元件9、19藉由凹槽18、18’、28、28’固定在支撐件10、20上。 A device, characterized in that the support members 10, 20 have at least one recess 18, 18', 28, 28', the line 44 being disposed in the recess 18, 18', 28, 28', the heating elements 9, 19 borrowing It is fixed to the support members 10, 20 by grooves 18, 18', 28, 28'.

一種裝置,其特徵在於,支撐件10、20由平坦的(尤其由鎢或鉬構成的)金屬件製成,並且尤其被設計為衝壓件。 A device, characterized in that the support members 10, 20 are made of a flat metal component, in particular of tungsten or molybdenum, and are in particular designed as stampings.

一種裝置,其特徵在於,連接件30分別插入支撐板29的開口41中和接觸板39、40的開口42、43中,並且在此藉由形狀接合固定件31、32、34、36而固定。 A device characterized in that the connecting members 30 are respectively inserted into the openings 41 of the support plate 29 and into the openings 42, 43 of the contact plates 39, 40, and are here fixed by the shape-fitting fixing members 31, 32, 34, 36. .

一種裝置,其特徵在於,形狀接合固定件32、34、36固定在插入開口42、43內的絕緣體35上。 A device characterized in that the shape-engaging fasteners 32, 34, 36 are fixed to the insulator 35 inserted into the openings 42, 43.

一種裝置,其特徵在於,至少一個接觸板39、40、支撐板29和至少一個加熱元件9、19在三個彼此平行延伸的平面內延伸,並且支撐板29支撐著支撐件10、20,至少一個加熱元件9、19藉由支撐件10、20相對於支撐板29而定位。 A device, characterized in that at least one contact plate 39, 40, a support plate 29 and at least one heating element 9, 19 extend in three planes extending parallel to each other, and the support plate 29 supports the support members 10, 20, at least A heating element 9, 19 is positioned relative to the support plate 29 by the supports 10, 20.

一種裝置,其特徵在於,連接件30將兩個在平行平面內彼此間隔佈置的接觸板39、40相互連接,其中,尤其連接件30穿過由絕緣材料製成的間隔物37。 A device, characterized in that the connecting piece 30 interconnects two contact plates 39, 40 which are arranged at a distance from each other in a parallel plane, wherein in particular the connecting piece 30 passes through a spacer 37 made of an insulating material.

一種裝置,其特徵在於,連接件30是由金屬(尤其鎢或鉬)構成的扁平體,並且形狀接合件31、32被設計為凸起,該凸 起支承在支撐件29或接觸板39、40的表面上或插入開口41、42、43之一內的插入件35上,和/或形狀接合固定件由連接件30的橫向開口33、34和插入其中的固定件36的銷所構成。 A device characterized in that the connecting member 30 is a flat body composed of metal (especially tungsten or molybdenum), and the shape engaging members 31, 32 are designed as projections, the convex Supported on the surface of the support member 29 or the contact plates 39, 40 or on the insert 35 inserted into one of the openings 41, 42, 43 and/or the form-fitting fastener by the lateral openings 33, 34 of the connector 30 and The pin of the fixing member 36 inserted therein is constituted.

所有公開的特徵(本身及其相互組合)都有發明意義或發明價值。在本申請的公開文件中,所屬/附屬的優先權文件(在先申請文件)的公開內容也被完全包括在內,為此也將該優先權文件中的特徵納入本申請的申請專利範圍中。申請專利範圍之附屬項的特徵都是對於現有技術有獨立發明意義或價值的改進設計,尤其可以這些申請專利範圍之附屬項為基礎提出分案申請。 All of the disclosed features (as such and in combination with each other) have inventive or inventive value. In the publication of the present application, the disclosure of the attached/affiliated priority document (prior application document) is also fully included, and the features in the priority document are also included in the patent application scope of the present application. . The features of the patent application scope are all improved designs with independent invention significance or value for the prior art, and in particular, the divisional application can be filed on the basis of the subsidiary items of the patent application scope.

9‧‧‧加熱元件 9‧‧‧ heating element

10‧‧‧支撐件 10‧‧‧Support

11‧‧‧臂 11‧‧‧ Arm

12‧‧‧臂 12‧‧‧ Arm

13‧‧‧支承面 13‧‧‧ support surface

14‧‧‧柄部 14‧‧‧ handle

15‧‧‧支撐凸起 15‧‧‧Support bulges

16‧‧‧固持凸起 16‧‧‧ holding bulge

17‧‧‧頸部 17‧‧‧ neck

18‧‧‧凹槽 18‧‧‧ Groove

18’‧‧‧凹槽 18’‧‧‧ Groove

29‧‧‧支撐板 29‧‧‧Support board

38‧‧‧插入孔、固定孔、固定開口 38‧‧‧Insert hole, fixing hole, fixed opening

40‧‧‧接觸板 40‧‧‧Contact plate

47‧‧‧蓋板 47‧‧‧ Cover

Claims (13)

一種裝置,尤其用於加熱CVD反應器(1)的基座(4),具有至少一個加熱元件(9、19),其中,該加熱元件(9、19)的區段或者不同的加熱元件(9、19)並排延伸並且藉由支撐件(10、20)相對於支撐板而定位,其中,該支撐件(10、20)分別具有形狀接合地且牢固地插入該支撐板(29)的固定開口內的支腳(15、16、17;25、26、27)和與橫向於該支撐板(29)的延伸面延伸的柄部(14、24)相連接的頭部(11、12、13;21、22、23),該加熱元件(9、19)固定在該頭部(11、12、13;21、22、23)上,其特徵在於:該支腳(15、16、17;25、26、27)藉由形狀接合固定件(15、16、17;25、26、27)固定在該支撐板(29)的固定開口(38)內,該形狀接合固定件(15、16、17;25、26、27)將該支撐件(10、20)沿該柄部(14、24)的延伸方向束縛在該支撐板(29)上。 A device, in particular for heating a susceptor (4) of a CVD reactor (1), having at least one heating element (9, 19), wherein a section of the heating element (9, 19) or a different heating element ( 9, 19) extending side by side and being positioned relative to the support plate by the support members (10, 20), wherein the support members (10, 20) respectively have a shape-fittingly and securely inserted into the support plate (29) a leg (15, 16, 17; 25, 26, 27) in the opening and a head (11, 12) connected to the handle (14, 24) extending transversely to the extended surface of the support plate (29) 13; 21, 22, 23), the heating element (9, 19) is fixed on the head (11, 12, 13; 21, 22, 23), characterized in that: the leg (15, 16, 17) ; 25, 26, 27) is fixed in the fixing opening (38) of the support plate (29) by a shape joint fixing member (15, 16, 17, 25, 26, 27), the shape engaging the fixing member (15, 16, 17; 25, 26, 27) The support member (10, 20) is bound to the support plate (29) along the extending direction of the handle (14, 24). 如申請專利範圍第1項之裝置,其中,該形狀接合固定件(15、16、17;25、26、27)具有至少一個橫向於該柄部(14、24)的延伸方向延伸的固持凸起(16、26),在安裝該支撐件(10、20)時,該固持凸起(16、26)能夠穿過該固定開口(38)並且在轉動該支撐件(10、20)和/或該固持凸起(16、26)變形後從下端夾持該支撐板(29)或插入該固定開口(38)內的插入件(35),並且該形狀接合固定件(15、16、17;25、26、27)還具有至少一個橫向於該柄部(14、24)的延伸方向延伸的固定凸起(15、25)。 The device of claim 1, wherein the shape joint fixing member (15, 16, 17; 25, 26, 27) has at least one holding convex extending transversely to the extending direction of the shank (14, 24) Starting (16, 26), the retaining projections (16, 26) can pass through the fixing opening (38) and rotate the support member (10, 20) and/or when the support member (10, 20) is mounted. Or the retaining protrusion (16, 26) is deformed to clamp the support plate (29) or the insert (35) inserted into the fixed opening (38) from the lower end, and the shape engages the fixing member (15, 16, 17) ; 25, 26, 27) also has at least one fixing projection (15, 25) extending transversely to the extending direction of the shank (14, 24). 如申請專利範圍第2項之裝置,其中,該插入件(35)是絕緣體,而該支撐板(29)由金屬構成。 The device of claim 2, wherein the insert (35) is an insulator and the support plate (29) is made of metal. 如申請專利範圍第2項之裝置,其中,至少該支腳(15、16、 17;25、26、27)被設計為平面組件,並且至少該固定開口(38)被設計為長孔,該長孔具有窄區段(38’)和寬區段(38”),該窄區段(38’)的寬度實質上等於該固持凸起(16)的材料厚度,該寬區段(38”)實質上等於在該支撐凸起(15)和固持凸起(16)之間延伸的頸部(17)的寬度。 The device of claim 2, wherein at least the leg (15, 16, 17; 25, 26, 27) is designed as a planar component, and at least the fixed opening (38) is designed as a long hole having a narrow section (38') and a wide section (38"), which is narrow The width of the segment (38') is substantially equal to the material thickness of the retention projection (16), the wide segment (38") being substantially equal to between the support projection (15) and the retention projection (16) Extend the width of the neck (17). 如申請專利範圍第1項之裝置,其中,該頭部(11、12、13;21、22、23)具有至少一個弧形走向的支承面(13、23),尤其由螺旋盤繞的加熱線構成的該加熱元件(9、19)抵靠在該支承面(13、23)上,其中尤其規定,該支承面(13)被設計為凹穴(23)或環形封閉的孔和/或具有抵靠在該加熱元件(9、19)上的齒紋表面。 The device of claim 1 wherein the head (11, 12, 13; 21, 22, 23) has at least one arcuate running bearing surface (13, 23), in particular a spirally wound heating wire. The heating element (9, 19) is formed on the bearing surface (13, 23), wherein it is provided in particular that the bearing surface (13) is embodied as a recess (23) or an annular closed bore and/or has Abut against the scalloped surface on the heating element (9, 19). 如申請專利範圍第1項之裝置,其中,該支撐件(10、20)具有至少一個凹槽(18、18’、28、28’),線(44)設置在該凹槽(18、18’、28、28’)內,該加熱元件(9、19)藉由該線(44)固定在該支撐件(10、20)上。 The device of claim 1, wherein the support member (10, 20) has at least one groove (18, 18', 28, 28'), and the wire (44) is disposed in the groove (18, 18) Within ', 28, 28'), the heating element (9, 19) is secured to the support (10, 20) by the wire (44). 如申請專利範圍第1項之裝置,其中,尤其該支撐件(10、20)由平坦的且由鎢或鉬構成的金屬組件製成並且尤其被設計為衝壓件。 The device according to claim 1 , wherein in particular the support ( 10 , 20 ) is made of a flat metal component made of tungsten or molybdenum and is in particular designed as a stamped part. 一種裝置,尤其用於加熱CVD反應器(1)的基座(4),具有至少一個加熱元件(9、19),該加熱元件(9、19)與至少一個接觸板(39、40)相連接,該接觸板(39、40)藉由連接件(30)相對於支撐板(29)而定位,其特徵在於:該連接件(30)分別插入該支撐板(29)的開口(41)中和該接觸板(39、40)的開口(42、43)中,並且在此藉由形狀接合固定件(31、32、34、36)而固定。 A device, in particular for heating a susceptor (4) of a CVD reactor (1), having at least one heating element (9, 19), which is associated with at least one contact plate (39, 40) Connecting, the contact plate (39, 40) is positioned relative to the support plate (29) by the connecting member (30), characterized in that the connecting member (30) is respectively inserted into the opening (41) of the supporting plate (29) The openings (42, 43) of the contact plates (39, 40) are neutralized and fixed here by shape-fitting fasteners (31, 32, 34, 36). 如申請專利範圍第8項之裝置,其中,該形狀接合固定件(32、 34、36)固定在插入該開口(42、43)的絕緣體(35)中。 The device of claim 8, wherein the shape is joined to the fixing member (32, 34, 36) is fixed in the insulator (35) inserted into the opening (42, 43). 如申請專利範圍第8項之裝置,其中,該至少一個接觸板(39、40)、該支撐板(29)和該至少一個加熱元件(9、19)在三個彼此平行延伸的平面內延伸,並且該支撐板(29)支撐著支撐件(10、20),該至少一個加熱元件(9、19)藉由該支撐件(10、20)相對於該支撐板(29)而定位。 The device of claim 8, wherein the at least one contact plate (39, 40), the support plate (29) and the at least one heating element (9, 19) extend in three planes extending parallel to each other And the support plate (29) supports the support members (10, 20), the at least one heating element (9, 19) being positioned relative to the support plate (29) by the support members (10, 20). 如申請專利範圍第8項之裝置,其中,該連接件(30)將兩個在平行平面內彼此間隔佈置的接觸板(39、40)相互連接,其中,尤其該連接件(30)穿過由絕緣材料製成的間隔物(37)。 The device of claim 8 wherein the connector (30) interconnects two contact plates (39, 40) spaced apart from each other in a parallel plane, wherein the connector (30) passes in particular A spacer (37) made of an insulating material. 如申請專利範圍第8項之裝置,其中,該連接件(30)尤其是由鎢或鉬構成金屬的扁平體,並且該形狀接合件(31、32)被設計為凸起,該凸起支承在該支撐板(29)或該接觸板(39、40)的表面上或插入該開口(41、42、43)之一內的插入件(35)上,和/或該形狀接合固定件由該連接件(30)的橫向開口(33、34)和插入其中的固定件(36)的銷所構成。 The device of claim 8, wherein the connecting member (30) is in particular a flat body of metal composed of tungsten or molybdenum, and the shape engaging member (31, 32) is designed as a projection which supports the projection On the surface of the support plate (29) or the contact plate (39, 40) or on the insert (35) inserted into one of the openings (41, 42, 43), and/or the shape engagement fastener is The lateral opening (33, 34) of the connector (30) and the pin of the fixing member (36) inserted therein are formed. 一種裝置,其特徵在於,具有前述申請專利範圍中任一項的一個或多個特徵。 A device characterized by one or more of any of the preceding claims.
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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013113046A1 (en) * 2013-11-26 2015-05-28 Aixtron Se Supporting or connecting elements on a heating element of a CVD reactor
DE102014112645A1 (en) 2014-09-03 2016-03-03 Aixtron Se heater
CN104962881B (en) * 2015-06-12 2018-08-03 北京中科优唯科技有限公司 High temperature chemical vapor deposition apparatus and its heating system
DE202016103834U1 (en) * 2016-07-15 2017-10-19 Aixtron Se Device for heating a susceptor of a CVD reactor
CN109136885B (en) * 2017-06-19 2020-11-10 北京北方华创微电子装备有限公司 Coil adjusting mechanism, induction heating device and vapor deposition equipment

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3345498A (en) 1965-02-01 1967-10-03 Gen Motors Corp Infrared surface heating unit
DE1565416A1 (en) * 1966-03-22 1970-03-05 Bbc Brown Boveri & Cie Ceramic heat conductor carrier
US3567906A (en) 1969-04-14 1971-03-02 Gen Electric Planar surface heater with integral fasteners for heating element
US3991298A (en) 1975-07-28 1976-11-09 Gould Inc. Heating unit for a ceramic top electric range
US4458141A (en) * 1980-11-14 1984-07-03 Tutco, Inc. Electric heater and coil support insulator therefor
GB8625556D0 (en) * 1986-10-25 1986-11-26 Micropore International Ltd Radiant heaters
US5128515A (en) * 1990-05-21 1992-07-07 Tokyo Electron Sagami Limited Heating apparatus
JP2647799B2 (en) * 1994-02-04 1997-08-27 日本碍子株式会社 Ceramic heater and manufacturing method thereof
US6416244B1 (en) * 1997-11-07 2002-07-09 Julius Blum Gesellschaft M.B.H. Furniture fitting
US6740853B1 (en) * 1999-09-29 2004-05-25 Tokyo Electron Limited Multi-zone resistance heater
JP4009100B2 (en) * 2000-12-28 2007-11-14 東京エレクトロン株式会社 Substrate heating apparatus and substrate heating method
CN2578590Y (en) * 2001-05-08 2003-10-08 雷永健 Fastener between plate and pipe
DE10329107B4 (en) 2002-12-23 2015-05-28 Mattson Thermal Products Gmbh Method for determining at least one state variable from a model of an RTP system
US7645342B2 (en) 2004-11-15 2010-01-12 Cree, Inc. Restricted radiated heating assembly for high temperature processing
DE102005056536A1 (en) 2005-11-28 2007-05-31 Aixtron Ag Chemical vapor deposition reactor for production of semiconductor devices has encapsulated electrical resistance heater
US7573004B1 (en) 2006-02-21 2009-08-11 Structured Materials Inc. Filament support arrangement for substrate heating apparatus
DE102006018515A1 (en) 2006-04-21 2007-10-25 Aixtron Ag CVD reactor with lowerable process chamber ceiling
DE102007009145A1 (en) 2007-02-24 2008-08-28 Aixtron Ag Device for depositing crystalline layers optionally by means of MOCVD or HVPE
DE102007027704A1 (en) 2007-06-15 2008-12-18 Aixtron Ag Device for coating substrates arranged on a susceptor
JP4913695B2 (en) * 2007-09-20 2012-04-11 東京エレクトロン株式会社 Substrate processing apparatus and substrate mounting table used therefor
DE102009043960A1 (en) 2009-09-08 2011-03-10 Aixtron Ag CVD reactor
CN202144514U (en) * 2011-07-04 2012-02-15 中芯国际集成电路制造(上海)有限公司 Heater positioning and adjusting device
CN202881385U (en) * 2012-09-07 2013-04-17 富强半导体有限公司 Wafer heating device
DE102013113046A1 (en) * 2013-11-26 2015-05-28 Aixtron Se Supporting or connecting elements on a heating element of a CVD reactor

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