TWI619839B - Heating device for the susceptor of the CVD reactor - Google Patents

Heating device for the susceptor of the CVD reactor Download PDF

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TWI619839B
TWI619839B TW103115146A TW103115146A TWI619839B TW I619839 B TWI619839 B TW I619839B TW 103115146 A TW103115146 A TW 103115146A TW 103115146 A TW103115146 A TW 103115146A TW I619839 B TWI619839 B TW I619839B
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heating
contact
elements
heating element
contact elements
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TW201520366A (en
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Pierre-Arnaud Bodin
Keith Allen
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Aixtron Se
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586Elements in the interior of the support, e.g. electrodes, heating or cooling devices

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Resistance Heating (AREA)

Abstract

一種尤其用於CVD反應器之基座的加熱裝置,具有第一加熱元件(1.1)和第二加熱元件(1.2),其中,每個加熱元件(1.1、1.2)具有由加熱絲構成的加熱構件(2.1、2.2),其中,該加熱構件(2.1、2.2)位於共同的加熱面中或多個相互平行的加熱面(H1、H2)中,並且具有橫向於該加熱面(H1、H2)延伸的接觸元件(3.1、4.1、3.2、4.2)的該加熱構件(2.1、2.2)的端部分別與位於平行於該加熱面(H1、H2)的接觸面(K1、K2)中的接觸板(5、6)相連接,其中,該接觸元件(3.1、3.2、4.1、4.2)如此並排安置在該接觸面(K1、K2)中,使得該加熱元件(1.1、1.2)在該接觸板(5、6)之間電氣並聯。為了提高加熱裝置的使用壽命,在此建議,加熱元件(1.1、1.2)之加熱構件(2.1、2.2)是等長的並且具有相同的電阻,第二加熱元件(1.2)的接觸元件(3.2、4.2)相互間具有間距(A2),該間距(A2)小於第一加熱元件(1.1)的接觸元件(3.1、4.1)的間距(A1),並且第二加熱元件(1.2)的接觸元件(3.2、4.2)比第一加熱元件(1.1)的接觸元件(3.1、4.1)更短。 A heating device, in particular for a susceptor of a CVD reactor, having a first heating element (1.1) and a second heating element (1.2), wherein each heating element (1.1, 1.2) has a heating element consisting of a heating wire (2.1, 2.2), wherein the heating member (2.1, 2.2) located in a common plane or heating a plurality of parallel heating surface (H 1, H 2), and having a surface transverse to the heating (H 1, H 2 ) the ends of the heating elements (2.1, 2.2) of the extended contact elements (3.1, 4.1, 3.2, 4.2 ) and the contact faces (K 1 , respectively, located parallel to the heating faces (H 1 , H 2 ) The contact plates (5, 6) in K 2 ) are connected, wherein the contact elements (3.1, 3.2, 4.1, 4.2) are arranged side by side in the contact surface (K 1 , K 2 ) such that the heating element 1.1, 1.2) Electrically parallel between the contact plates (5, 6). In order to increase the service life of the heating device, it is proposed here that the heating elements (2.1, 2.2) of the heating element (1.1, 1.2) are of equal length and have the same electrical resistance, the contact elements of the second heating element (1.2) (3.2, 4.2) having a spacing (A 2 ) from each other, the spacing (A 2 ) being smaller than the spacing (A 1 ) of the contact elements (3.1, 4.1) of the first heating element (1.1), and the contact of the second heating element (1.2) The elements (3.2, 4.2) are shorter than the contact elements (3.1, 4.1) of the first heating element (1.1).

Description

用於CVD反應器之基座的加熱裝置 Heating device for the susceptor of the CVD reactor

本發明有關於一種尤其用於CVD(化學氣相沉積)反應器之基座的加熱裝置,具有至少一個第一加熱元件和至少一個第二加熱元件,其中,每個第一和第二加熱元件具有由一條或多條加熱絲構成的加熱構件,其中,該加熱構件位於一個或多個相互平行的加熱面中,並且具有橫向於該一個或多個加熱面延伸的接觸元件的加熱構件的端部與位於一個或多個相互平行和平行於加熱面的接觸面中的接觸板相連接,其中,該接觸元件如此並排安置在該一個或多個接觸面中,使得該加熱元件在該接觸板之間電氣並聯。 The invention relates to a heating device, in particular for a susceptor of a CVD (Chemical Vapor Deposition) reactor, having at least one first heating element and at least one second heating element, wherein each of the first and second heating elements Having a heating member consisting of one or more heating wires, wherein the heating member is located in one or more mutually parallel heating faces and has an end of the heating member transverse to the contact elements of the one or more heating faces a contact plate is situated in contact with one or more contact surfaces which are parallel to one another and parallel to the heating surface, wherein the contact elements are arranged side by side in the one or more contact surfaces such that the heating element is situated on the contact plate Electrically connected in parallel.

在CVD反應器中,處理室位於相對於周圍環境氣密封閉的反應器殼體內,處理氣體藉由進氣構件被導入處理室內。基座位於處理室內,該基座被加熱裝置加熱。例如由矽或第III-V族元素材料製成的待塗佈的基板位於基座的上側。在基板的上表面上,沉積半導體層、尤其第III-V族元素構成的半導體層。這在大於1000℃的溫度時實施。為了達到處理溫度所需的熱量而由加熱裝置提供。因為進氣構件被主動冷卻並且基座密封地相鄰,所以在基座和進氣構件之間形成陡峭的溫度梯度。由於該溫度梯度,從基座至進氣構件的冷卻裝置產生巨大的熱流。為了能夠達到所需的處理溫度,加熱裝置必須將溫度加熱到2000℃並且輸送足夠的熱功率。 In a CVD reactor, the processing chamber is located in a reactor housing that is hermetically sealed relative to the surrounding environment, and the process gas is introduced into the processing chamber by the intake member. The susceptor is located within the processing chamber and is heated by the heating device. For example, a substrate to be coated made of tantalum or a Group III-V element material is located on the upper side of the base. On the upper surface of the substrate, a semiconductor layer, in particular a semiconductor layer composed of a group III-V element, is deposited. This is carried out at temperatures above 1000 °C. It is provided by the heating device in order to achieve the heat required to process the temperature. Because the intake member is actively cooled and the base is sealingly adjacent, a steep temperature gradient is formed between the base and the intake member. Due to this temperature gradient, a large heat flow is generated from the susceptor to the cooling means of the intake member. In order to be able to reach the required processing temperature, the heating device must heat the temperature to 2000 ° C and deliver sufficient thermal power.

在DE 10 2009 043 960 A1、DE 103 29 107 A1、DE 10 2006 018 515 A1、DE 10 2007 009 145 A1、DE 10 2005 056 536 A1或DE 10 2007 027 704 A1中描述了一種具有加熱裝置的CVD反應器。在DE 26 30 466 A1或US 3,345,498中所描述的加熱裝置具有加熱元件,該加熱元件在加熱面中沿螺旋線延伸。US 7,573,004描述了一種在加熱面內沿圓弧線延伸的加熱元件。 A CVD with a heating device is described in DE 10 2009 043 960 A1, DE 103 29 107 A1, DE 10 2006 018 515 A1, DE 10 2007 009 145 A1, DE 10 2005 056 536 A1 or DE 10 2007 027 704 A1. reactor. The heating device described in DE 26 30 466 A1 or US Pat. No. 3,345,498 has a heating element which extends along a spiral in the heating surface. No. 7,573,004 describes a heating element extending along a circular arc in a heating surface.

在用於CVD反應器的加熱裝置中,至少兩個加熱構件並排延伸。加熱構件藉由其連接端與同一個接觸板相連接。此藉由接觸元件實現。由此,加熱元件電氣並聯。加熱元件如此緊密地並排延伸,使得它們在加熱時由於熱運動可能相觸碰。如果加熱元件在碰觸點上具有電位差,則在此會導致局部過熱或形成電弧。這會造成加熱元件的損壞。 In the heating device for the CVD reactor, at least two heating members extend side by side. The heating member is connected to the same contact plate by its connecting end. This is achieved by contact elements. Thereby, the heating elements are electrically connected in parallel. The heating elements extend so closely side by side that they may touch during heating due to thermal motion. If the heating element has a potential difference on the contact contact, this can lead to local overheating or arcing. This can cause damage to the heating element.

本發明所要解決的技術問題是,提高加熱裝置的使用壽命。 The technical problem to be solved by the present invention is to increase the service life of the heating device.

藉由本發明在申請專利範圍中之指明解決上述之問題。 The above problems are solved by the specification of the present invention in the scope of the patent application.

根據本發明,並排延伸的加熱構件被設計為等長的、相互不同的、電氣並聯的加熱元件。此外,加熱構件在電氣或機械方面也被設計為相同的。例如,加熱構件可以具有一個或多個螺旋形狀延伸的加熱絲,該加熱絲具有相同的電阻。該加熱絲安置在加熱面中。相互不同的加熱元件的接觸元件具有相互不同的間距。由此,第二加熱元件的接觸元件的相互間距比第一加熱元件的接觸元件的相互間距小。根據本發明還規定,第二加熱元件的接觸元件比 第一加熱元件的接觸元件短。該加熱絲具有比接觸元件至少大10倍的單位長度電阻,該接觸元件較佳地被設計為厚壁的接觸銷。接觸元件具有橫向於加熱面或接觸面延伸的延伸方向。一個或多個接觸板在接觸面內延伸。由一條或多條加熱絲構成的加熱構件在一個或多個相互平行延伸的加熱面內延伸。在較佳的設計方案中,具有比第一加熱元件的接觸元件更小間距的加熱構件的端部至少在加熱面和接觸面之間的空隙內延伸。可以設置一個或多個第三或第四加熱元件。第三和第四加熱元件同樣具有由一條或多條加熱絲構成的加熱構件。加熱構件的端部藉由橫向於一個或多個加熱面延伸的接觸元件(較佳為接觸銷)與一個或多個相互平行且相對加熱面平行的接觸面相連接。第三和/或第四加熱元件與第一和第二加熱元件電氣並聯。第一至第四加熱元件的所有加熱構件較佳是等長的並且也具有相同設計。尤其它們具有相同的電阻。在加熱構件上,在相同的區段上施加相同的電壓。由此,加熱元件在可能的碰觸位置上設有一致的電位,使得在加熱元件之間在碰觸位置上不會形成無效電流。第三和第四加熱元件具有接觸元件,該接觸元件具有比第二加熱元件的接觸元件更小的間距。第三加熱元件和第四加熱元件的加熱構件具有橫向於相應加熱面沿接觸面的方向突出的端部區段,該端部區段具有一長度,該長度大於第一和第二加熱元件的加熱構件的端部區段的長度。加熱構件的端部區段具有一長度,該長度實質上等於所屬接觸元件與相鄰的屬於同一個加熱元件的接觸元件的間距,該加熱元件的接觸元件也相互間隔。實質上接觸元件的長度與加熱構件的端部區段的長度和所屬加熱面的位置相關。尤其規定,實質上垂直於加熱面延伸的端部區段與所屬接觸元件的延伸方 向齊平地連接著接觸元件的端側。接觸元件的相對置的端側與接觸板相連接。接觸板可以位於統一的水平面上並且在統一的接觸面中。但是還規定,接觸板安置在平行平面中,即沿著橫向於平面延伸的方向相互間隔。 According to the invention, the side-by-side extended heating elements are designed as equal length, mutually different, electrically parallel heating elements. Furthermore, the heating elements are also designed to be identical in terms of electrical or mechanical aspects. For example, the heating member may have one or more filaments extending in a spiral shape that have the same electrical resistance. The heating wire is placed in the heating surface. The contact elements of mutually different heating elements have mutually different spacings. Thereby, the mutual spacing of the contact elements of the second heating element is smaller than the mutual spacing of the contact elements of the first heating element. According to the invention it is further provided that the contact element ratio of the second heating element The contact elements of the first heating element are short. The heating wire has a resistance per unit length which is at least 10 times larger than the contact element, which is preferably designed as a thick-walled contact pin. The contact element has an extension direction that extends transverse to the heating or contact surface. One or more contact plates extend within the contact surface. The heating member consisting of one or more heating wires extends in one or more heating faces extending parallel to each other. In a preferred embodiment, the end of the heating member having a smaller spacing than the contact element of the first heating element extends at least in the gap between the heating surface and the contact surface. One or more third or fourth heating elements may be provided. The third and fourth heating elements likewise have a heating member consisting of one or more heating wires. The end of the heating member is connected by a contact element (preferably a contact pin) extending transversely to the one or more heating faces to one or more contact faces which are parallel to each other and which are parallel to the heating surface. The third and/or fourth heating element is electrically in parallel with the first and second heating elements. All of the heating members of the first to fourth heating elements are preferably of equal length and also have the same design. In particular they have the same resistance. On the heating member, the same voltage is applied across the same section. Thereby, the heating element is provided with a uniform potential at possible contact positions such that no reactive current is formed between the heating elements at the contact position. The third and fourth heating elements have contact elements that have a smaller spacing than the contact elements of the second heating element. The heating elements of the third heating element and the fourth heating element have end sections that protrude transversely to the respective heating surface in the direction of the contact surface, the end sections having a length that is greater than the first and second heating elements The length of the end section of the heating member. The end section of the heating element has a length which is substantially equal to the distance of the associated contact element from the adjacent contact elements belonging to the same heating element, the contact elements of which are also spaced apart from each other. The length of the contact element is substantially related to the length of the end section of the heating member and the position of the associated heating surface. In particular, it is provided that the end section extending substantially perpendicular to the heating surface and the extension of the associated contact element The end side of the contact element is connected flush to the ground. The opposite end sides of the contact elements are connected to the contact plates. The contact plates can be located on a uniform horizontal surface and in a uniform contact surface. However, it is also provided that the contact plates are arranged in parallel planes, that is to say spaced apart in a direction extending transversely to the plane.

特別較佳地是,在接觸板之間電氣並聯的所有加熱構件具有相同的長度和相同設計的加熱構件,其中,加熱元件的加熱構件藉由其端部區段伸入配屬於相應加熱元件的加熱面和配屬於相應接觸元件的接觸面之間的間隙中,該加熱元件的接觸元件彼此間的間距比第一加熱元件的接觸元件的間距更小,在該端部區段上連接著接觸元件。所有加熱構件可以在不同的加熱面內延伸。尤其加熱構件在加熱面內沿圓弧線或螺旋弧線延伸。但還可行的是,相互不同的加熱元件的一個或多個加熱構件在共同的加熱面內延伸。尤其規定,所有加熱構件在共同的加熱面內延伸。但是可任選地也可以規定,所有加熱構件在彼此不同的加熱面內延伸。加熱構件的伸入間隙內的端部區段的長度較佳地等於所屬接觸元件至第一加熱元件的接觸元件的距離。相對地,所有其它加熱元件與第一加熱元件的接觸元件在最遠端相互間隔。加熱構件可以如此並排地延伸並且如此藉由其所屬的接觸元件與接觸板相連接,使得當在接觸元件上施加加熱電壓時,在最可能的碰觸位置上設有相同的電位。加熱絲可以由鎢絲製成。該加熱絲被設置為螺旋線形狀。尤其由此產生的長形的加熱構件在加熱面內沿弧線延伸。該裝置具有實質上圓形的平面圖或基礎輪廓。該裝置可以具有多個相互電氣分離的加熱裝置。由此,尤其設置有圓盤形狀的中心加熱裝置,該加熱裝置被第一環形加熱裝置環繞,該第一環形加熱裝置再次被第二環 形加熱裝置環繞。 Particularly preferably, all of the heating elements that are electrically connected in parallel between the contact plates have the same length and the same design of the heating element, wherein the heating element of the heating element projects through its end section into the respective heating element. In the gap between the heating surface and the contact surface assigned to the respective contact element, the contact elements of the heating element are spaced apart from each other by a smaller distance than the contact element of the first heating element, the contact being connected to the end section element. All heating members can extend within different heating surfaces. In particular, the heating member extends along a circular arc or a spiral arc in the heating surface. However, it is also possible for one or more heating elements of mutually different heating elements to extend within a common heating surface. In particular, it is provided that all heating elements extend in a common heating surface. However, it can optionally also be provided for all of the heating elements to extend in different heating surfaces. The length of the end section of the heating element which projects into the gap is preferably equal to the distance of the associated contact element to the contact element of the first heating element. In contrast, all other heating elements are spaced apart from the contact elements of the first heating element at the extreme distal end. The heating elements can be connected side by side and thus connected to the contact plate by their associated contact elements such that when a heating voltage is applied to the contact elements, the same potential is provided at the most likely contact position. The heating wire can be made of tungsten wire. The heating wire is set in a spiral shape. In particular, the elongate heating elements thus produced extend in an arc in the heating plane. The device has a substantially circular plan or base profile. The device can have a plurality of heating devices that are electrically separated from one another. Thereby, in particular a central heating device in the shape of a disk is provided, which is surrounded by a first annular heating device, which is again second ring The heating device surrounds.

1‧‧‧加熱元件 1‧‧‧ heating element

2‧‧‧加熱構件 2‧‧‧heating components

3‧‧‧接觸元件 3‧‧‧Contact elements

4‧‧‧接觸元件 4‧‧‧Contact elements

5‧‧‧接觸板 5‧‧‧Contact plate

6‧‧‧接觸板 6‧‧‧Contact plate

7‧‧‧端部區段 7‧‧‧End section

8‧‧‧加熱絲 8‧‧‧heat wire

9‧‧‧加熱絲支架 9‧‧‧heat wire bracket

10‧‧‧CVD反應器 10‧‧‧ CVD reactor

11‧‧‧進氣構件 11‧‧‧Intake components

12‧‧‧基座 12‧‧‧ Pedestal

13‧‧‧處理室 13‧‧‧Processing room

14‧‧‧加熱裝置 14‧‧‧ heating device

15‧‧‧加熱裝置 15‧‧‧ heating device

16‧‧‧加熱裝置 16‧‧‧ heating device

1.1‧‧‧加熱元件 1.1‧‧‧ heating element

1.2‧‧‧加熱元件 1.2‧‧‧ heating element

1.3‧‧‧加熱元件 1.3‧‧‧ heating elements

1.4‧‧‧加熱元件 1.4‧‧‧ heating element

2.1‧‧‧加熱構件 2.1‧‧‧ heating elements

2.2‧‧‧加熱構件 2.2‧‧‧ heating components

2.3‧‧‧加熱構件 2.3‧‧‧ heating elements

2.4‧‧‧加熱構件 2.4‧‧‧ heating elements

3.1‧‧‧接觸元件 3.1‧‧‧Contact elements

3.2‧‧‧接觸元件 3.2‧‧‧Contact elements

3.3‧‧‧接觸元件 3.3‧‧‧Contact elements

3.4‧‧‧接觸元件 3.4‧‧‧Contact elements

4.1‧‧‧接觸元件 4.1‧‧‧Contact elements

4.2‧‧‧接觸元件 4.2‧‧‧Contact elements

4.3‧‧‧接觸元件 4.3‧‧‧Contact elements

4.4‧‧‧接觸元件 4.4‧‧‧Contact elements

7.1‧‧‧端部區段 7.1‧‧‧End section

7.2‧‧‧端部區段 7.2‧‧‧End section

7.3‧‧‧端部區段 7.3‧‧‧End section

7.4‧‧‧端部區段 7.4‧‧‧End section

以下結合附圖對本發明的實施例進行說明。在附圖中:圖1示出CVD反應器的結構示意圖;圖2示出由三個加熱區14、15、16構成的加熱器的俯視圖,尤其該加熱器具有三個加熱裝置14、15、16;圖3示出沿箭頭III的方向觀察圖2所示加熱器所得的側視圖;圖4示出沿圖2中的箭頭IV的方向觀察圖2中的徑向最外側的加熱裝置14所得的立體圖;圖5示出加熱元件裝置的兩個接觸區的示圖,其中加熱元件1.1、1.2、1.3、1.4根據本發明的方式設計並且設有根據本發明的接觸元件3.1、3.2、3.3、3.4;圖6示出加熱元件1的第一實施例,其中接觸元件3與單螺旋線圈2的端部區段7相連接;和圖7示出加熱元件7的第二實施例,其中加熱構件2被設計為雙螺旋線圈。 Embodiments of the present invention will be described below with reference to the accompanying drawings. In the drawings: Figure 1 shows a schematic view of the structure of a CVD reactor; Figure 2 shows a top view of a heater consisting of three heating zones 14, 15, 16 which in particular have three heating means 14, 15, 16 Figure 3 shows a side view of the heater shown in Figure 2 as seen in the direction of arrow III; Figure 4 shows the radial outermost heating device 14 of Figure 2 as seen in the direction of arrow IV in Figure 2 Figure 5 shows a view of two contact areas of a heating element arrangement, wherein the heating elements 1.1, 1.2, 1.3, 1.4 are designed according to the invention and are provided with contact elements 3.1, 3.2, 3.3, 3.4 according to the invention. Figure 6 shows a first embodiment of the heating element 1 in which the contact element 3 is connected to the end section 7 of the single helical coil 2; and Figure 7 shows a second embodiment of the heating element 7, wherein the heating element 2 Designed as a double helix coil.

圖1至4首先並且基本上用於顯示這種類型的裝置。在這些附圖中,以下本發明請求項解決了該技術問題。 Figures 1 to 4 are first and basically used to display this type of device. In the drawings, the following claims of the present invention solve the technical problem.

圖1大致示意地示出CVD反應器10的一些基本的組件。CVD反應器10具有向外氣密封閉的殼體。具有以淋浴頭形式安置的排氣口的進氣構件11位於殼體內,該排氣口朝向處理室13的方向。一種或多種相互不同的處理氣體可以藉由進氣構件11的 排氣口被導入處理室13中。處理室13的底板由例如有塗層的石墨製成的基座12構成,在基座12的朝向處理室13的上側上安置有一個或多個基板,該基板應被塗佈有單晶的半導體層。由多個加熱裝置14、15、16構成的加熱器位於基座12的下面,該加熱裝置藉由被提供電能而產生熱量,基座12藉由該熱量提高處理溫度。 Figure 1 shows schematically some of the basic components of a CVD reactor 10. The CVD reactor 10 has a housing that is hermetically sealed outward. An intake member 11 having an exhaust port disposed in the form of a shower head is located inside the housing, the exhaust port being oriented in the direction of the process chamber 13. One or more mutually different process gases may be passed through the intake member 11 The exhaust port is introduced into the processing chamber 13. The bottom plate of the processing chamber 13 is constituted by a susceptor 12 made of, for example, coated graphite, on the upper side of the susceptor 12 facing the processing chamber 13, one or more substrates, which should be coated with a single crystal Semiconductor layer. A heater composed of a plurality of heating devices 14, 15, 16 is located below the susceptor 12, which generates heat by being supplied with electric energy, and the susceptor 12 raises the processing temperature by the heat.

圖2示出在圖1中僅示意由加熱裝置14、15、16構成的加熱器的俯視圖。具有多個加熱元件的圓盤形狀的加熱裝置16位於中心,這些加熱元件螺旋地被安置在單一的加熱平面內。 Fig. 2 shows a plan view of only the heater constituted by the heating means 14, 15, 16 in Fig. 1. A disc-shaped heating device 16 having a plurality of heating elements is centrally located, these heating elements being helically placed in a single heating plane.

中心加熱裝置16被在中間的加熱裝置15環繞,該加熱裝置15同樣具有多個加熱元件,該加熱元件在共同的加熱平面內在螺旋曲線上延伸。位於最外側的加熱元件僅能在更遠的加熱面上延伸。 The central heating device 16 is surrounded by an intermediate heating device 15, which likewise has a plurality of heating elements which extend over a helical curve in a common heating plane. The outermost heating element can only extend over a further heating surface.

位於徑向最外側的加熱裝置14是環形並且具有在圓形曲線上延伸的加熱元件1。該加熱元件1是電氣並聯的。分別總共設置五個加熱元件,這些加熱元件分別在約1/3的圓形弧線上延伸。加熱元件1的端部分別與彼此不同的接觸板5、6相互連接。在接觸板5、6上,加熱元件1被通電。接觸板5、6在彼此間隔的接觸面K1、K2中延伸。在圖3和4中,接觸元件3、4被顯示為接觸銷,其分別具有統一的長度。單個加熱元件1.1、1.2、1.3、1.4、1.5藉由各個相同長度的接觸元件3、4與接觸板5、6相連接。加熱元件1.1、1.2、1.3、1.4、1.5分別具有加熱構件2.1、2.2、2.3、2.4、2.5,這些加熱構件由未詳細示出的螺旋彎曲的鎢絲構成。在圖1至4中,加熱構件2.1至2.5僅藉由簡略圖未示出螺旋走向的結構,而是顯示為圓柱形結構。螺旋形狀的鎢絲在圓柱形結構中延 伸。相互不同的加熱元件1.1至1.5的單個接觸元件3、4具有彼此不同的間距。因此,在加熱構件2.1至2.5的不同的圓周位置上釋放不同的電壓。當相互不同的加熱構件2.1至2.5的各個加熱絲在加熱時出現相對的熱變形的情況下,由此可能會在此處流動局部的無效電流。因此,在觸碰部位上可能會造成局部的過熱。在觸碰部位上可能構成電弧。 The radially outermost heating device 14 is annular and has a heating element 1 extending over a circular curve. The heating elements 1 are electrically connected in parallel. A total of five heating elements are respectively provided, which each extend over a circular arc of approximately 1/3. The ends of the heating element 1 are connected to the mutually different contact plates 5, 6, respectively. On the contact plates 5, 6, the heating element 1 is energized. The contact plates 5 and 6 spaced from each other at the contact surfaces K 1, K 2 extend. In Figures 3 and 4, the contact elements 3, 4 are shown as contact pins, each having a uniform length. The individual heating elements 1.1, 1.2, 1.3, 1.4, 1.5 are connected to the contact plates 5, 6 by respective contact elements 3, 4 of the same length. The heating elements 1.1, 1.2, 1.3, 1.4, 1.5 each have heating members 2.1, 2.2, 2.3, 2.4, 2.5, which are composed of helically curved tungsten wires which are not shown in detail. In FIGS. 1 to 4, the heating members 2.1 to 2.5 are not shown by a schematic view of a spiral-like structure, but are shown as a cylindrical structure. The spiral shaped tungsten wire extends in a cylindrical structure. The individual contact elements 3, 4 of mutually different heating elements 1.1 to 1.5 have different spacing from one another. Therefore, different voltages are released at different circumferential positions of the heating members 2.1 to 2.5. In the case where the respective heating wires of the mutually different heating members 2.1 to 2.5 are relatively thermally deformed upon heating, a local ineffective current may flow therethrough. Therefore, local overheating may occur at the touched portion. An arc may be formed at the touched portion.

為了避免這種局部的溫度峰值,本發明請求項第1項建議,各個加熱構件2.1至2.5被設計為相同的。尤其加熱構件2.1、2.5是相同長度的、螺旋成型的加熱絲。它們在其長度上具有相同的電阻,使得在並聯狀態下通過它們流動相同的電流。還規定,在接觸位置上安置的接觸元件3、4具有不同的長度。接觸元件的長度與加熱元件1的接觸元件3的間距有關。加熱元件的接觸元件3、4相互間距越遠,則接觸元件3、4越長。該接觸元件能是一種圓柱形的銷,其橫向於接觸面K1、K2或橫向於加熱面H1、H2、H3、H4延伸。 In order to avoid such local temperature peaks, the first claim of the present invention suggests that the individual heating members 2.1 to 2.5 are designed to be identical. In particular, the heating members 2.1, 2.5 are spiral shaped heating wires of the same length. They have the same resistance over their length so that the same current flows through them in parallel. It is also provided that the contact elements 3, 4 arranged in the contact position have different lengths. The length of the contact element is related to the spacing of the contact elements 3 of the heating element 1. The further the distance between the contact elements 3, 4 of the heating element is, the longer the contact elements 3, 4 are. The contact element can be a cylindrical pin which extends transversely to the contact faces K 1 , K 2 or transverse to the heating faces H 1 , H 2 , H 3 , H 4 .

以下根據圖5詳細闡述本發明。圖5示出兩個接觸板5、6,在該接觸板上設置有不同的電位。在圖5中,這些接觸板配屬於兩個相互間隔的接觸面K1和K2。但還可行的是,接觸板5、6位於共同的接觸面K1中。在任何情況下,這些接觸板5、6上的電流是相互分離。 The present invention will be described in detail below based on FIG. Figure 5 shows two contact plates 5, 6 on which different potentials are placed. In FIG. 5, these contact plates are assigned to two mutually spaced contact faces K 1 and K 2 . But it is also possible that the contact plates 5 and 6 located in a common contact surface K 1. In any case, the currents on these contact plates 5, 6 are separated from each other.

圖5示出一共四個加熱元件1.1、1.2、1.3、1.4。這些加熱元件分別在加熱面H1、H2、H3、H4上延伸。加熱面H1、H2、H3、H4平行於兩個接觸面K1、K2延伸。在加熱面H1、H2、H3、H4中,加熱元件1.1至1.4的加熱構件2.1、2.2、2.3、2.4分別在 圓弧線上延伸,如圖2至4所示。根據簡化圖所示,加熱構件2.1至2.4僅在彼此不同的加熱面H1、H2、H3、H4上被示出。但是,彼此不同的加熱元件1.1至1.4的加熱構件2.1至2.4也可以在同一個加熱面中延伸。 Figure 5 shows a total of four heating elements 1.1, 1.2, 1.3, 1.4. These heating elements extend over the heating surfaces H 1 , H 2 , H 3 , H 4 , respectively. The heating surfaces H 1 , H 2 , H 3 , H 4 extend parallel to the two contact faces K 1 , K 2 . In the heating faces H 1 , H 2 , H 3 , H 4 , the heating members 2.1, 2.2, 2.3 , 2.4 of the heating elements 1.1 to 1.4 respectively extend on a circular arc line, as shown in Figs. According to the simplified diagram, the heating members 2.1 to 2.4 are only shown on the heating faces H 1 , H 2 , H 3 , H 4 which are different from each other. However, the heating members 2.1 to 2.4 of the heating elements 1.1 to 1.4 which are different from each other can also extend in the same heating surface.

加熱構件2.1至2.4藉由其端部區段7.1、7.2、7.3、7.4分別藉由圓柱銷形狀的接觸銷3.1、3.2、3.3、3.4或4.1、4.2、4.3、4.4與兩個接觸板5、6之一電氣連接。加熱構件2.1至2.4的長度是相同的。該長度分別由在所屬加熱面H1、H2、H3、H4中延伸的相應加熱構件2.1至2.4的區段和兩個端部區段7.1至7.4的長度所組成。端部區段7.1至7.4垂直於所屬加熱面H1、H2、H3、H4且沿著接觸面K1、K2的方向延伸。端部區段7.1至7.4的延伸方向與接觸銷3.1至3.4或4.1至4.4的延伸方向齊平。 The heating elements 2.1 to 2.4 have their contact sections 3.1, 3.2, 3.3, 3.4 or 4.1, 4.2, 4.3, 4.4 and the two contact plates 5, respectively, by their end sections 7.1, 7.2, 7.3, 7.4. 6 one electrical connection. The lengths of the heating members 2.1 to 2.4 are the same. This length consists respectively of the section of the respective heating elements 2.1 to 2.4 extending in the associated heating faces H 1 , H 2 , H 3 , H 4 and the length of the two end sections 7.1 to 7.4. The end sections 7.1 to 7.4 extend perpendicular to the associated heating faces H 1 , H 2 , H 3 , H 4 and in the direction of the contact faces K 1 , K 2 . The direction of extension of the end sections 7.1 to 7.4 is flush with the direction of extension of the contact pins 3.1 to 3.4 or 4.1 to 4.4.

第一加熱元件1.1的接觸銷3.1、4.1彼此間隔最遠。該間距被標記為A1。所配屬的接觸銷3.1、4.1比其餘的加熱元件1.2至1.4的接觸銷3.2至3.4或4.2至4.4更長。第一加熱元件1.1的端部區段7.1相對於其它的端部區段更短。 The contact pins 3.1, 4.1 of the first heating element 1.1 are spaced farthest from one another. This spacing is labeled A 1 . The associated contact pins 3.1, 4.1 are longer than the contact pins 3.2 to 3.4 or 4.2 to 4.4 of the remaining heating elements 1.2 to 1.4. The end section 7.1 of the first heating element 1.1 is shorter relative to the other end sections.

相對具有更短間距A2至A4的接觸元件3.2至3.4或4.2至4.4具有比接觸元件3.1、4.1更短的長度。最短的接觸元件3.4、4.4屬於加熱元件2.4,該加熱元件2.4的橫向於加熱面H4延伸的端部區段7.4是最長的,並且其間距A4小於其餘接觸元件3.1至3.3或4.1至4.3的間距A1、A2、A3The contact elements 3.2 to 3.4 or 4.2 to 4.4 having a shorter spacing A 2 to A 4 have a shorter length than the contact elements 3.1, 4.1. The shortest contact elements 3.4, 4.4 belong to the heating element 2.4, the end section 7.4 of the heating element 2.4 extending transversely to the heating surface H 4 is the longest, and the spacing A 4 is smaller than the remaining contact elements 3.1 to 3.3 or 4.1 to 4.3 The spacing A 1 , A 2 , A 3 .

加熱元件1.2至1.4的加熱螺旋線圈2.2至2.4的端部區段7.2至7.4具有一個長度,該長度等於所配屬的接觸元件3.2、3.3、3.4、4.2、4.3、4.4與具有最短端部區段7.1的加熱元件的相 應接觸元件3.1、4.1的間距,加熱元件1.2至1.4的接觸元件3.2至3.4、4.2至4.4相互間具有比加熱元件1.1的接觸元件3.1、4.1更小的間距A2、A3、A4,加熱元件1.1的加熱螺旋線圈2.1具有最短的端部區段7.1。至相應最外側的接觸元件3.1、4.1的間距差確定了端部區段7.2至7.3的長度的尺寸,並且後者連同加熱螺旋線圈2.1至2.4的高度確定了接觸元件3.1至3.4或4.1至4.4的長度。 The end sections 7.2 to 7.4 of the heating spiral coils 2.2 to 2.4 of the heating elements 1.2 to 1.4 have a length which is equal to the associated contact elements 3.2, 3.3, 3.4, 4.2, 4.3, 4.4 and has the shortest end zone. The spacing of the respective contact elements 3.1, 4.1 of the heating element of section 7.1, the contact elements 3.2 to 3.4, 4.2 to 4.4 of the heating elements 1.2 to 1.4 have a smaller spacing A 2 than the contact elements 3.1, 4.1 of the heating element 1.1, A 3 , A 4 , the heating spiral coil 2.1 of the heating element 1.1 has the shortest end section 7.1. The difference in the distance to the respective outermost contact elements 3.1, 4.1 determines the length of the length of the end sections 7.2 to 7.3, and the latter determines the contact elements 3.1 to 3.4 or 4.1 to 4.4 together with the height of the heating spiral coils 2.1 to 2.4. length.

元件符號為9的加熱絲支架由金屬製成。加熱絲支架9在相應的圓周位置上支承全部的四個加熱元件,在該圓周位置上在加熱構件2.1至2.4上分別施加相同的電壓,使得藉由加熱絲支架9不會流過無效電流。 The heating wire holder of the component symbol 9 is made of metal. The heating wire holder 9 supports all four heating elements at respective circumferential positions, in which the same voltage is applied to the heating members 2.1 to 2.4, respectively, so that no reactive current flows through the heating wire holder 9.

在圖5中依據簡略圖藉由兩條平行延伸的線示出加熱構件2.1至2.4。在圖6中以螺旋線形狀延伸的加熱絲8的形式示出加熱構件2的第一較佳設計方案。圖6示出單一的、螺旋線形狀彎曲的加熱絲8。但是還規定,整體上螺旋線形狀地設置兩條或三條加熱絲8。圖7示出具有雙股螺旋線圈的相關的特別較佳的設計方案。 In Fig. 5, the heating members 2.1 to 2.4 are shown by two parallel extending lines in accordance with the simplified diagram. A first preferred design of the heating member 2 is shown in the form of a heating wire 8 extending in a spiral shape in FIG. Figure 6 shows a single, helically shaped heating wire 8. However, it is also provided that two or three heating wires 8 are arranged in a spiral shape as a whole. Figure 7 shows a particularly particularly preferred design with a double helix coil.

加熱構件2或加熱絲8的每個單位長度的電阻比接觸元件3、4的每個單位長度的電阻大至少10倍。接觸元件3、4較佳是具有足夠大直徑的圓柱銷,使得在每個接觸銷3、4的軸向長度上僅施加微小的電壓。由此,雖然接觸銷3、4的軸向長度不同,但是在接觸銷3、4的固定有加熱構件2.1至2.4的端面上卻設置有相同的電位。在加熱構件2的空心的螺旋線圈中插入接觸銷3的直徑變小的接觸區段。 The electrical resistance per unit length of the heating member 2 or the heating wire 8 is at least 10 times greater than the electrical resistance per unit length of the contact elements 3, 4. The contact elements 3, 4 are preferably cylindrical pins having a sufficiently large diameter such that only a slight voltage is applied across the axial length of each of the contact pins 3, 4. Thus, although the axial lengths of the contact pins 3, 4 are different, the same potential is provided on the end faces of the contact pins 3, 4 to which the heating members 2.1 to 2.4 are fixed. A contact section of the contact pin 3 having a smaller diameter is inserted into the hollow spiral coil of the heating member 2.

前述實施方式用於闡述由本申請中獲得的本發明,其 至少藉由以下技術特徵組合相應獨立地改進現有技術,即:一種裝置,其特徵在於,加熱元件1.1、1.2的加熱構件2.1、2.2是等長的並且結構設計相同,第二加熱元件1.2的接觸元件3.2、4.2具有更小的間距A2並且比第一加熱元件1.1的接觸元件3.1、4.1更短。 The foregoing embodiments are intended to illustrate the invention obtained by the present application, which at least independently improve the prior art by at least the following combination of technical features, namely: a device characterized in that the heating members 2.1, 2.2 of the heating elements 1.1, 1.2 are The isometric and structurally identical design, the contact elements 3.2, 4.2 of the second heating element 1.2 have a smaller spacing A 2 and are shorter than the contact elements 3.1, 4.1 of the first heating element 1.1.

一種裝置,其特徵在於,至少一個第三和/或第四加熱元件1.3、1.4具有由一條或多條加熱絲構成的加熱構件2.3、2.4,具有橫向於一個或多個加熱面H1、H2、H3、H4延伸的接觸元件3.3、3.4、4.3、4.4的加熱構件2.3、2.4的端部與位於一個或多個相互間且相對於加熱面H1、H2、H3、H4平行的接觸面K1、K2中的接觸板5、6相連接,其中,第三和/或第四加熱元件1.3、1.4與第一和第二加熱元件1.1、1.2在接觸板5、6之間電氣並聯,其中,第三和/或第四加熱元件1.3、1.4的加熱構件2.3、2.4是等長的並且設計得與第一和第二加熱元件1.1、1.2的加熱構件2.1、2.2一樣,其中,第三和/或第四加熱元件1.3、1.4的接觸元件3.3、3.4、4.3、4.4相互間具有更小的間距A3、A4並且比第二加熱元件1.2的接觸元件3.2、4.2更短。 An apparatus, characterized in that at least a third and / or fourth heating member having a heating element 1.3, 1.4 of one or more heating wires constituted 2.3, 2.4, or having a plurality of transverse heating surface H 1, H 2 , the ends of the heating elements 2.3, 2.4 of the contact elements 3.3, 3.4, 4.3, 4.4 of the H 3 , H 4 extension are located between one or more of the mutual and relative to the heating surfaces H 1 , H 2 , H 3 , H parallel to the contact surface 4 K 1, K 2 are connected to the contact plates 5 and 6, wherein the third and / or fourth heating elements 1.3, 1.4 and 1.1, 1.2, the first and second heating element at the contact plate 5, 6 in parallel in parallel, wherein the heating elements 2.3, 2.4 of the third and/or fourth heating elements 1.3, 1.4 are of equal length and are designed with the heating elements 2.1, 2.2 of the first and second heating elements 1.1, 1.2 Likewise, wherein the contact elements 3.3, 3.4, 4.3, 4.4 of the third and/or fourth heating elements 1.3, 1.4 have a smaller spacing A 3 , A 4 than the contact elements 3.2 of the second heating element 1.2, 4.2 is shorter.

一種裝置,其特徵在於,所有在接觸板5、6之間電氣並聯的加熱構件2.1、2.2、2.3、2.4是等長的並且具有相同的設計,其中加熱元件1.2、1.3、1.4的加熱構件2.2、2.3、2.4藉由其端部區段7.2、7.3、7.4伸入配屬於相應加熱元件的加熱面H1、H2、H3、H4和配屬於相應接觸元件的接觸面K1、K2之間的間隙中,加熱元件1.2、1.3、1.4的接觸元件3.2、3.3、3.4、4.2、4.3、4.4彼此間的間距比第一加熱元件1.1的接觸元件3.1、4.1的間距更小, 在端部區段7.2、7.3、7.4上連接著接觸元件3.2、3.3、3.4、4.2、4.3、4.4。 A device, characterized in that all heating elements 2.1, 2.2, 2.3, 2.4 electrically connected in parallel between the contact plates 5, 6 are of equal length and have the same design, wherein the heating elements 2.2, 1.3, 1.4 of the heating elements 2.2 The front faces 7.2, 7.3, 7.4 extend into the heating surfaces H 1 , H 2 , H 3 , H 4 assigned to the respective heating element and the contact surfaces K 1 , K assigned to the respective contact elements. In the gap between 2 , the contact elements 3.2, 3.3, 3.4, 4.2, 4.3, 4.4 of the heating elements 1.2, 1.3, 1.4 are spaced apart from each other by a smaller distance than the contact elements 3.1, 4.1 of the first heating element 1.1, The contact elements 3.2, 3.3, 3.4, 4.2, 4.3, 4.4 are connected to the end sections 7.2, 7.3, 7.4.

一種裝置,其特徵在於,加熱構件2.2、2.3、2.4的伸入間隙中的端部區段7.2、7.3、7.4的長度等於所屬的接觸元件3.2、3.3、3.4、4.2、4.3、4.4至第一加熱元件1.1的接觸元件3.1、4.1的距離。 A device, characterized in that the length of the end sections 7.2, 7.3, 7.4 of the heating elements 2.2, 2.3, 2.4 extending into the gap is equal to the associated contact elements 3.2, 3.3, 3.4, 4.2, 4.3, 4.4 to the first The distance of the contact elements 3.1, 4.1 of the heating element 1.1.

一種裝置,其特徵在於,加熱構件2.1、2.2、2.3、2.4如此並排延伸並且如此藉由配屬於它們的接觸元件3.1、3.2、3.3、3.4、4.1、4.2、4.3、4.4與接觸板5、6相連接,使得當在接觸元件上施加加熱電壓時,並排設置的加熱構件2.1、2.2、2.3、2.4由於熱變形而相互碰觸的碰觸位置處係相同的電位。 A device, characterized in that the heating elements 2.1, 2.2, 2.3, 2.4 extend side by side and are thus connected to the contact plates 5, 6 by means of their associated contact elements 3.1, 3.2, 3.3, 3.4, 4.1, 4.2, 4.3, 4.4 The connection is such that when a heating voltage is applied to the contact elements, the heating members 2.1, 2.2, 2.3, 2.4 arranged side by side are at the same potential at the contact positions that are in contact with each other due to thermal deformation.

一種裝置,其特徵在於,加熱絲8由設置為螺旋線形狀的鎢絲構成,其中,尤其兩條或三條鎢絲相互平行延伸。 A device characterized in that the heating wire 8 consists of a tungsten wire arranged in the shape of a helix, wherein in particular two or three tungsten wires extend parallel to each other.

一種裝置,其特徵在於,加熱構件2.1、2.2、2.3、2.4在相應的加熱面H1至H4中沿弧線延伸。 An apparatus, characterized in that the heating member along an arc extending H 4 2.1,2.2,2.3,2.4 a heating surface corresponding to H.

一種裝置,其特徵在於,該裝置具有基本上圓形的平面圖或基本輪廓。 A device characterized in that it has a substantially circular plan or basic contour.

所有公開的特徵(本身及其相互組合)都有發明意義或發明價值。在本申請的公開文件中,所屬/附屬的優先權文件(在先申請文件)的公開內容也被完全包括在內,為此也將該優先權文件中的特徵納入本申請的申請專利範圍中。申請專利範圍之附屬項的特徵都是對於現有技術有獨立發明意義或價值的改進設計,尤其可以這些申請專利範圍之附屬項為基礎提出分案申請。 All of the disclosed features (as such and in combination with each other) have inventive or inventive value. In the publication of the present application, the disclosure of the attached/affiliated priority document (prior application document) is also fully included, and the features in the priority document are also included in the patent application scope of the present application. . The features of the patent application scope are all improved designs with independent invention significance or value for the prior art, and in particular, the divisional application can be filed on the basis of the subsidiary items of the patent application scope.

Claims (9)

一種用於CVD反應器之基座的加熱裝置,具有至少一個第一加熱元件(1.1)和至少一個第二加熱元件(1.2),其中,每個加熱元件(1.1、1.2)具有由一條或多條加熱絲(8)構成的加熱構件(2.1、2.2),其中,該等加熱構件(2.1、2.2)係位於共同的加熱面中或多個相互平行的加熱面(H1、H2)中,並且,具有橫向於該等加熱面(H1、H2)延伸的接觸元件(3.1、4.1、3.2、4.2)的該等加熱構件(2.1、2.2)之端部係分別與位於平行於該等加熱面(H1、H2)的接觸面(K1、K2)中之接觸板(5、6)呈導電連接,而其中,該等接觸元件(3.1、3.2、4.1、4.2)係如此並排安置在該接觸面(K1、K2)中,使得該等加熱元件(1.1、1.2)在該接觸板(5、6)之間電氣並聯,其特徵在於:該等加熱元件(1.1、1.2)的加熱構件(2.1、2.2)是等長的並且具有相同的電阻,該第二加熱元件(1.2)的接觸元件(3.2、4.2)相互間具有間距(A2),該間距(A2)小於該第一加熱元件(1.1)的接觸元件(3.1、4.1)的間距(A1),並且該第二加熱元件(1.2)的接觸元件(3.2、4.2)比該第一加熱元件(1.1)的接觸元件(3.1、4.1)更短。 A heating device for a susceptor of a CVD reactor, having at least one first heating element (1.1) and at least one second heating element (1.2), wherein each heating element (1.1, 1.2) has one or more Article heating wire (8) heating means (2.1, 2.2) consisting of, wherein such heating means (2.1, 2.2) lie in a common heating system or a plurality of mutually parallel surfaces of the heating surface (H 1, H 2) of , and having an end portion to the contact line transverse member (3.1,4.1,3.2,4.2) to (H 1, H 2) extend such heating surface of such a heating element (2.1, 2.2) are located parallel to the the like heating surface (H 1, H 2) of the contact surface (K 1, K 2) of the contact plates (5, 6) as a conductive connection, and wherein such a contact element (3.1,3.2,4.1,4.2) -based The side faces are arranged side by side in the contact surface (K 1 , K 2 ) such that the heating elements (1.1, 1.2) are electrically connected in parallel between the contact plates (5, 6), characterized in that the heating elements (1.1) , 1.2) heating means (2.1, 2.2) are of equal length and have the same resistance, the contact member (3.2,4.2) of the second heating element (1.2) are at a spacing (a 2) Pitch of the contact member (3.1,4.1) of the spacing (A 2) less than the first heating element (1.1) (A 1), and the second heating element (1.2) of the contact member (3.2,4.2) than the first The contact elements (3.1, 4.1) of a heating element (1.1) are shorter. 如申請專利範圍第1項之加熱裝置,其中,至少一個第三和/或第四加熱元件(1.3、1.4)具有由一條或多條加熱絲構成的加熱構件(2.3、2.4),而具有橫向於加熱面(H1、H2、H3、H4)延伸的接觸元件(3.3、3.4、4.3、4.4)的該等加熱構件(2.3、2.4)之端部係分別與接觸板(5、6)呈導電連接,而其中,該第三和/或第四加熱元件(1.3、1.4)與該第一和第二加熱元件(1.1、1.2)在該接觸板(5、6)之間電氣並聯,其中,該第三和/或第四加熱元件(1.3、1.4)之加熱構件(2.3、2.4)為等長,且設計得與該第一和第二加熱元件(1.1、1.2)之加熱構件 (2.1、2.2)一樣並具有相同的電阻,其中,該第三和/或第四加熱元件(1.3、1.4)之接觸元件(3.3、3.4、4.3、4.4)相互間具有更小的間距(A3、A4),並且,該第三和/或第四加熱元件(1.3、1.4)之接觸元件(3.3、3.4、4.3、4.4)比該第二加熱元件(1.2)的接觸元件(3.2、4.2)更短。 The heating device of claim 1, wherein the at least one third and/or fourth heating element (1.3, 1.4) has a heating member (2.3, 2.4) composed of one or more heating wires, and has a lateral direction The end portions of the heating members (2.3, 2.4) of the contact elements (3.3, 3.4, 4.3, 4.4) extending on the heating surfaces (H 1 , H 2 , H 3 , H 4 ) are respectively associated with the contact plates (5, 6) in an electrically conductive connection, wherein the third and / or fourth heating element (1.3, 1.4) and the first and second heating elements (1.1, 1.2) are electrically connected between the contact plates (5, 6) Parallel, wherein the heating members (2.3, 2.4) of the third and/or fourth heating elements (1.3, 1.4) are of equal length and are designed to be heated by the first and second heating elements (1.1, 1.2) The components (2.1, 2.2) are identical and have the same electrical resistance, wherein the contact elements (3.3, 3.4, 4.3, 4.4) of the third and/or fourth heating element (1.3, 1.4) have a smaller spacing from each other ( A 3 , A 4 ), and the contact elements (3.3, 3.4, 4.3, 4.4) of the third and/or fourth heating element (1.3, 1.4) are more than the contact elements of the second heating element (1.2) (3.2 , 4.2) Short. 如申請專利範圍第1項之加熱裝置,其中,所有在該等接觸板(5、6)之間電氣並聯的加熱構件(2.1、2.2、2.3、2.4)具有等長且電氣方面設計相同的加熱構件(2.1、2.2、2.3、2.4),而其中,該等加熱元件(1.2、1.3、1.4)之加熱構件(2.2、2.3、2.4)係藉由其端部區段(7.2、7.3、7.4)伸入配屬於相應加熱元件的加熱面(H1、H2、H3、H4)與配屬於相應接觸元件的接觸面(K1、K2)之間的間隙中,而該等加熱元件(1.2、1.3、1.4)之接觸元件(3.2、3.3、3.4、4.2、4.3、4.4)彼此間的間距比該第一加熱元件(1.1)之接觸元件(3.1、4.1)的間距更小,該等接觸元件(3.2、3.3、3.4、4.2、4.3、4.4)則連接在該等端部區段(7.2、7.3、7.4)上。 A heating device according to claim 1 wherein all of the heating members (2.1, 2.2, 2.3, 2.4) electrically connected in parallel between the contact plates (5, 6) have the same length and electrical design of the same heating. Components (2.1, 2.2, 2.3, 2.4), wherein the heating elements (2.2, 2.3, 2.4) of the heating elements (2.2, 1.3, 1.4) are by their end sections (7.2, 7.3, 7.4) Extending into a gap between the heating surfaces (H 1 , H 2 , H 3 , H 4 ) assigned to the respective heating element and the contact surfaces (K 1 , K 2 ) assigned to the respective contact elements, and the heating elements The contact elements (3.2, 3.3, 3.4, 4.2, 4.3, 4.4) of (1.2, 1.3, 1.4) are spaced apart from each other by a smaller distance than the contact elements (3.1, 4.1) of the first heating element (1.1), The contact elements (3.2, 3.3, 3.4, 4.2, 4.3, 4.4) are connected to the end sections (7.2, 7.3, 7.4). 如申請專利範圍第3項之加熱裝置,其中,該等加熱構件(2.2、2.3、2.4)之伸入該間隙中的端部區段(7.2、7.3、7.4)之長度,等於所屬的接觸元件(3.2、3.3、3.4、4.2、4.3、4.4)至該第一加熱元件(1.1)之接觸元件(3.1、4.1)的距離。 The heating device of claim 3, wherein the length of the end sections (7.2, 7.3, 7.4) of the heating elements (2.2, 2.3, 2.4) extending into the gap is equal to the associated contact element The distance from (3.2, 3.3, 3.4, 4.2, 4.3, 4.4) to the contact elements (3.1, 4.1) of the first heating element (1.1). 如申請專利範圍第1項之加熱裝置,其中,該等加熱構件(2.1、2.2、2.3、2.4)係如此並排延伸且藉由配屬於該等加熱構件的接觸元件(3.1、3.2、3.3、3.4、4.1、4.2、4.3、4.4)而與該等接觸板(5、6)相連接,使得,當在該等接觸元件上施加加熱電壓時,並排設置的加熱構件(2.1、2.2、2.3、2.4)由於熱變形而可能相互碰觸的觸碰位 置處係相同的電位。 The heating device of claim 1, wherein the heating members (2.1, 2.2, 2.3, 2.4) are extended side by side and by means of contact elements (3.1, 3.2, 3.3, 3.4) associated with the heating members. , 4.1, 4.2, 4.3, 4.4) are connected to the contact plates (5, 6) such that when a heating voltage is applied to the contact elements, the heating members are arranged side by side (2.1, 2.2, 2.3, 2.4) Touch positions that may touch each other due to thermal deformation Place the same potential. 如申請專利範圍第1項之加熱裝置,其中,該加熱絲(8)係由至少一條設置為螺旋線形狀的鎢絲構成。 A heating device according to claim 1, wherein the heating wire (8) is composed of at least one tungsten wire provided in a spiral shape. 如申請專利範圍第6項之加熱裝置,其中,兩條或三條鎢絲相互平行延伸。 The heating device of claim 6, wherein the two or three tungsten wires extend parallel to each other. 如申請專利範圍第1項之加熱裝置,其中,該等加熱構件(2.1、2.2、2.3、2.4)在相應的加熱面(H1至H4)中沿弧線延伸。 The patent application range of the heating means, Paragraph 1, wherein such heating means (2.1,2.2,2.3,2.4) extending in an arc (H 1 to H 4) in a respective heating surface. 如申請專利範圍第1項之加熱裝置,其中,該裝置具有實質上圓形的平面圖或基本輪廓。 A heating device according to claim 1, wherein the device has a substantially circular plan view or a basic profile.
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CN204162787U (en) 2015-02-18
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CN104674195A (en) 2015-06-03
TWM495367U (en) 2015-02-11

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