TW201509779A - Deposition source transporting apparatus - Google Patents
Deposition source transporting apparatus Download PDFInfo
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- TW201509779A TW201509779A TW103103135A TW103103135A TW201509779A TW 201509779 A TW201509779 A TW 201509779A TW 103103135 A TW103103135 A TW 103103135A TW 103103135 A TW103103135 A TW 103103135A TW 201509779 A TW201509779 A TW 201509779A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/811—Controlling the atmosphere during processing
Abstract
Description
本發明涉及一種沉積源運送裝置，更詳細地，涉及適用於離子注入系統的沉積源運送裝置。 The present invention relates to a deposition source transport device and, more particularly, to a deposition source transport device suitable for use in an ion implantation system.
一般來講，作為平板顯示器之一的電致發光顯示裝置，根據作為發光層使用的物質區分為無機電致發光顯示裝置和有機電致發光顯示裝置，由於有機電致發光顯示裝置能夠用低電壓驅動，且為輕量薄型的同時，具備不僅視角寬而且響應速度快的優點，因此受到矚目。 In general, an electroluminescence display device which is one of flat panel displays is classified into an inorganic electroluminescence display device and an organic electroluminescence display device according to a substance used as a light-emitting layer, since the organic electroluminescence display device can use a low voltage The drive is lightweight and thin, and it has the advantages of not only a wide viewing angle but also a fast response speed.
這種有機電致發光顯示裝置的有機電致發光元件由在基板上以層壓方式形成的陽極、有機物層及陰極構成。有機物層包括通過空穴和電子的再結合而形成激子並發射光的有機發光層的有機物層，此外，為了用有機發光層順暢地傳輸空穴和電子以提高發光效率，使電子注入層和電子傳輸層的有機物層介於所述陰極和有機發光層之間的同時，使空穴注入層和電子傳輸層的有機物層介於陽極和有機發光層之間。 The organic electroluminescence device of such an organic electroluminescence display device is composed of an anode, an organic layer, and a cathode which are formed by lamination on a substrate. The organic layer includes an organic layer of an organic light-emitting layer that forms excitons and emits light by recombination of holes and electrons, and further, in order to smoothly transport holes and electrons with the organic light-emitting layer to improve luminous efficiency, the electron injecting layer and electrons are provided. The organic layer of the transport layer is interposed between the cathode and the organic light-emitting layer, and the organic layer of the hole injection layer and the electron transport layer is interposed between the anode and the organic light-emitting layer.
由上述結構形成的有機電致發光元件一般由如真空沉積法、離子鍍法及濺射法等物理氣相沉積法、或通過氣體反應進行的化學氣相沉積法制作。特別是，為了形成有機電致發光元件的有機物層，廣泛使 用將在真空中蒸發的有機物質沉積在基板上的真空沉積法，在這種真空沉積法中，使用的沉積源(effusion cell，泄流室)可將在真空腔室內蒸發的有機物質噴射到基板。沉積源包括收容有有機物質的坩堝和加熱坩堝的加熱機構。 The organic electroluminescent element formed by the above structure is generally produced by a physical vapor deposition method such as a vacuum deposition method, an ion plating method, or a sputtering method, or a chemical vapor deposition method by a gas reaction. In particular, in order to form an organic layer of an organic electroluminescence element, it is widely used. A vacuum deposition method in which an organic substance evaporated in a vacuum is deposited on a substrate, in which a deposition source (effluent cell) is used to eject an organic substance evaporated in a vacuum chamber to Substrate. The deposition source includes a crucible containing an organic substance and a heating mechanism for heating the crucible.
在基板趨於大型化的形式下，為了將具有良好的階梯覆蓋能力和均勻度的有機物層形成在基板上，沉積源在真空腔室內移動並向靜止的基板提供通過蒸發有機物質形成的有機氣相物質。 In the form in which the substrate tends to be enlarged, in order to form an organic layer having good step coverage and uniformity on the substrate, the deposition source moves inside the vacuum chamber and supplies the organic gas formed by evaporating the organic substance to the stationary substrate. Phase material.
如此，沉積源由移動的移動源形成的情況下，為了沉積源的移動而設置軌道，且沉積源在軌道上移動。此時，軌道上設置有沿軌道移動的滑動導軌，在滑動導軌上安裝有沉積源主體。 Thus, in the case where the deposition source is formed by a moving moving source, a track is provided for the movement of the deposition source, and the deposition source moves on the track. At this time, the rail is provided with a slide rail that moves along the rail, and a deposition source body is mounted on the slide rail.
在滑動導軌的內部插入設置有用於連動的多個球或軸承，並為了減少球與軌道的摩擦，對球施加潤滑油(grease)。如此，在使用設置有球的滑動導軌的情況下，當沉積源在軌道上移動時，會有振動傳遞到沉積源。 A plurality of balls or bearings for interlocking are inserted inside the slide rail, and a grease is applied to the balls in order to reduce the friction between the balls and the rails. Thus, in the case of using a slide rail provided with a ball, when the deposition source moves on the rail, vibration is transmitted to the deposition source.
這種振動對離子注入系統帶來噪音，這會帶來感測器錯誤及膜厚度不均勻等問題。特別是，在摩擦大的情況下，移動速度降低，這導致膜厚度的不均勻。此外，因摩擦而球產生熱或因腔室內的熱而潤滑油被加熱時，則由於潤滑油蒸發而氣體引發腔室內部的污染，這成為導致不良的原因。此外，由於為了潤滑油的再供給而需要中斷操作，因此發生操作時間延遲且生產率降低的問題。 This vibration introduces noise into the ion implantation system, which can cause problems such as sensor errors and uneven film thickness. In particular, in the case where the friction is large, the moving speed is lowered, which causes unevenness in film thickness. Further, when the ball generates heat due to friction or the lubricating oil is heated by the heat in the chamber, the gas causes the contamination inside the chamber due to the evaporation of the lubricating oil, which causes a defect. Further, since the operation is interrupted for the resupply of the lubricating oil, there is a problem that the operation time is delayed and the productivity is lowered.
本發明是為了解決上述問題而提出的，目的在於提供一種能 夠將振動的影響最小化並提高壽命的離子注入系統的沉積源運送裝置。 The present invention has been made to solve the above problems, and an object thereof is to provide an energy supply A deposition source transport device of an ion implantation system that minimizes the effects of vibration and improves life.
根據本發明的一方面的沉積源運送裝置包括：導軌，沿一方向延伸而形成，並具有形成磁力的第一懸浮元件；支撐元件，被配置在該導軌上，並具有與該第一懸浮元件相對的第二懸浮元件；以及沉積源框架，安裝在該支撐元件上。 A deposition source transport apparatus according to an aspect of the present invention includes: a guide rail extending in a direction and having a first suspension element that forms a magnetic force; a support member disposed on the guide rail and having the first suspension element An opposite second suspension element; and a deposition source frame mounted on the support element.
該第一懸浮元件及該第二懸浮元件由永久磁鐵形成，該第一懸浮元件及該第二懸浮元件能夠以相同的極性相互面對的方式配置，並且該導軌包括朝上突出的支撐柱和從該支撐柱彎曲的上板，該支撐元件可形成為沿沉積源框架的長度方向延伸而形成的板狀。 The first suspension element and the second suspension element are formed by permanent magnets, and the first suspension element and the second suspension element can be disposed to face each other with the same polarity, and the guide rail includes a support column protruding upward and The support member may be formed in a plate shape formed to extend in the longitudinal direction of the deposition source frame from the upper plate bent by the support column.
該第一懸浮元件固定設置在該上板的上表面，該第二懸浮元件固定設置在該支撐元件的下部，並在該支撐元件與該第二懸浮元件之間可設置有具有彈性的緩衝元件。 The first suspension element is fixedly disposed on an upper surface of the upper plate, the second suspension element is fixedly disposed at a lower portion of the support element, and a cushioning member having elasticity is disposed between the support element and the second suspension element .
該第一懸浮元件及該第二懸浮元件由永久磁鐵形成，該第一懸浮元件及該第二懸浮元件能夠以相互不同的極性相互面對的方式配置，該第一懸浮元件可由包括磁芯和纏繞在形成於磁芯上的突起的線圈的電磁鐵形成。 The first suspension element and the second suspension element are formed by permanent magnets, and the first suspension element and the second suspension element can be disposed to face each other with different polarities, and the first suspension element can include a magnetic core and An electromagnet wound around a protruding coil formed on the magnetic core is formed.
該第二懸浮元件可由強磁性體板形成，該導軌包括朝上突出的支撐柱和從該支撐柱彎曲的上板，該支撐元件可包括與沉積源框架的下表面相接觸的上部支撐部、在該上部支撐部的下側與該上板的下表面相對的下部支撐部及連接該下部支撐部與該上部支撐部的側面支撐部。 The second suspension element may be formed of a ferromagnetic body plate including a support post protruding upward and an upper plate bent from the support post, the support member may include an upper support portion in contact with a lower surface of the deposition source frame, a lower support portion that faces the lower surface of the upper plate on a lower side of the upper support portion, and a side support portion that connects the lower support portion and the upper support portion.
該第一懸浮元件固定設置在該上板的下表面，該第二懸浮元件固定設置在該下部支撐部的上表面，並在該上部支撐部的下表面與該上 板的上表面之間可設置有具有彈性的緩衝元件。 The first suspension element is fixedly disposed on a lower surface of the upper plate, and the second suspension element is fixedly disposed on an upper surface of the lower support portion, and on a lower surface of the upper support portion and the upper portion A cushioning member having elasticity may be disposed between the upper surfaces of the plates.
該緩衝元件可配置成固定在該上部支撐部的下表面並與該上板相隔，並且可進一步包括結合在該沉積源框架的繩和纏繞該繩的捲取元件。 The cushioning member may be configured to be fixed to and spaced apart from a lower surface of the upper support portion, and may further include a cord coupled to the deposition source frame and a take-up member wound around the cord.
可進一步包括：第一繩，與該沉積源框架的一側端部連接；第一捲取元件，纏繞該第一繩；第一電動機，旋轉該第一捲取元件；第二繩，與該沉積源框架的另一側端部連接；第二捲取元件，纏繞該第二繩；和第二電動機，旋轉該第二捲取元件。 The method further includes: a first rope coupled to one end of the deposition source frame; a first take-up element that wraps the first rope; a first motor that rotates the first take-up element; and a second rope The other side end of the deposition source frame is connected; the second take-up element is wound around the second rope; and the second motor rotates the second take-up element.
根據本發明的實施例，由於通過磁懸浮移送沉積源，因此使對沉積源的振動最小化，從而能夠執行精密的工序。此外，不僅減少摩擦而提高沉積源運送裝置的壽命，而且除去摩擦時飛散的顆粒及雜質而能夠減少因雜質產生的污染。 According to the embodiment of the present invention, since the deposition source is transferred by the magnetic levitation, the vibration to the deposition source is minimized, so that a precise process can be performed. Further, not only the friction is reduced, but also the life of the deposition source transport device is increased, and particles and impurities scattered during friction are removed to reduce contamination due to impurities.
101、102、103、104‧‧‧沉積源運送裝置 101, 102, 103, 104‧‧‧ deposition source transport device
10‧‧‧沉積源 10‧‧‧Sedimentary source
15‧‧‧氣缸 15‧‧‧ cylinder
15a‧‧‧導杆 15a‧‧‧guides
21‧‧‧沉積源框架 21‧‧‧Sedimentary source framework
25、35、45‧‧‧支撐元件 25, 35, 45‧‧‧ support elements
25a、45a‧‧‧上部支撐部 25a, 45a‧‧‧ upper support
25b、45b‧‧‧下部支撐部 25b, 45b‧‧‧ lower support
25c、45c‧‧‧側面支撐部 25c, 45c‧‧‧ side support
26、36、46‧‧‧導軌 26, 36, 46‧‧‧ rails
26a、36a、46a‧‧‧支撐柱 26a, 36a, 46a‧‧‧ support columns
26b、36b、46b‧‧‧上板 26b, 36b, 46b‧‧‧ boards
28、38、48‧‧‧第一懸浮元件 28, 38, 48‧‧‧ first suspension element
27、37、47‧‧‧第二懸浮元件 27, 37, 47‧‧‧Second suspension element
29、39、49‧‧‧緩衝元件 29, 39, 49‧‧‧ cushioning components
48a‧‧‧磁芯 48a‧‧‧ magnetic core
48b‧‧‧線圈 48b‧‧‧ coil
48c‧‧‧突起 48c‧‧‧ Protrusion
51‧‧‧第一繩 51‧‧‧First rope
52‧‧‧第二繩 52‧‧‧second rope
53‧‧‧第一捲取元件 53‧‧‧First take-up component
55‧‧‧第二捲取元件 55‧‧‧Second take-up component
56‧‧‧第一電動機 56‧‧‧First motor
57‧‧‧第二電動機 57‧‧‧Second motor
60‧‧‧腔室 60‧‧‧ chamber
Ⅱ-Ⅱ‧‧‧割面線 II-II‧‧‧Cutting line
圖1是圖示根據本發明的第一實施例的沉積源運送裝置的立體圖。 1 is a perspective view illustrating a deposition source conveying device according to a first embodiment of the present invention.
圖2是沿圖1中Ⅱ-Ⅱ線截取的剖視圖。 Figure 2 is a cross-sectional view taken along line II-II of Figure 1.
圖3是表示潤滑油的蒸發氣體對有機發光元件的壽命的影響的圖表。 3 is a graph showing the influence of the evaporation gas of the lubricating oil on the life of the organic light emitting element.
圖4是圖示根據本發明的第二實施例的沉積源運送裝置的剖視圖。 4 is a cross-sectional view illustrating a deposition source conveying device in accordance with a second embodiment of the present invention.
圖5是圖示根據本發明的第三實施例的沉積源運送裝置的剖視圖。 Figure 5 is a cross-sectional view illustrating a deposition source conveying device in accordance with a third embodiment of the present invention.
圖6是圖示根據本發明的第四實施例的沉積源運送裝置的立體圖。 Fig. 6 is a perspective view illustrating a deposition source conveying device according to a fourth embodiment of the present invention.
圖7是圖示根據本發明的第四實施例的沉積源運送裝置的剖視圖。 Figure 7 is a cross-sectional view illustrating a deposition source transporting apparatus according to a fourth embodiment of the present invention.
以下，參照圖式對本發明的實施例進行詳細說明，使得本發明所屬技術領域的技術人員能夠易於實施。本發明可以以多種不同的形式實現，並不限定於在此說明的實施例。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings, so that those skilled in the art can easily implement the invention. The invention may be embodied in many different forms and is not limited to the embodiments described herein.
在整個說明書中，當提到某部分“包括”某結構元件時，除非有相反的記載，這表示並不排除其他結構元件，而是可進一步包括其他結構元件。此外，在本記載中，所謂“在......上”表示位於物件元件的上側或下側，並非一定表示以重力方向為基準位於上方。 Throughout the specification, when a part is referred to as "comprises" a structural element, unless otherwise stated, this does not exclude other structural elements, but may further include other structural elements. Further, in the present description, "on" means that it is located on the upper side or the lower side of the object element, and does not necessarily mean that it is positioned above the gravity direction.
圖1是根據本發明的一實施例的沉積源運送裝置的立體圖，圖2是沿圖1中Ⅱ-Ⅱ線截取的剖視圖。 1 is a perspective view of a deposition source transport apparatus according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line II-II of FIG.
參照圖1及圖2進行說明，則根據本實施例的沉積源運送裝置101包括導軌26、通過磁力相對於導軌26懸浮的支撐元件25、及安裝在支撐元件25上的沉積源框架21。 1 and 2, the deposition source transporting apparatus 101 according to the present embodiment includes a guide rail 26, a supporting member 25 suspended by a magnetic force with respect to the guide rail 26, and a deposition source frame 21 mounted on the supporting member 25.
沉積源10可具備儲存有有機物質的坩堝、用於加熱坩堝的加熱元件、及噴射有機物質的噴嘴。但本發明並不限於此，能夠安裝在沉積源框架21上的所有種類的沉積源均可適用于本發明。 The deposition source 10 may be provided with a crucible storing an organic substance, a heating element for heating the crucible, and a nozzle for ejecting the organic substance. However, the present invention is not limited thereto, and all kinds of deposition sources that can be mounted on the deposition source frame 21 can be applied to the present invention.
沉積源運送裝置101被配置在腔室內，且腔室形成真空空間。在腔室內設置有導軌26，導軌26沿沉積源10的移動方向長長地延伸而形成，且兩個導軌26被配置成平行。 The deposition source transport device 101 is disposed inside the chamber, and the chamber forms a vacuum space. A guide rail 26 is provided in the chamber, and the guide rail 26 is formed to extend long in the moving direction of the deposition source 10, and the two guide rails 26 are arranged in parallel.
導軌26包括朝上突出的支撐柱26a和被配置成從支撐柱26a彎曲而與地面平行的上板26b。上板26b從相對置的導軌26朝向外側彎曲，並在上板26b的下部固定設置有形成磁力的第一懸浮元件28。第一懸浮元件28沿導軌26的長度方向延伸而形成。在此，第一懸浮元件28由形成磁力的 永久磁鐵形成。 The guide rail 26 includes a support post 26a that protrudes upward and an upper plate 26b that is configured to be bent from the support post 26a to be parallel to the ground. The upper plate 26b is bent outward from the opposite guide rails 26, and a first suspension member 28 that forms a magnetic force is fixedly disposed at a lower portion of the upper plate 26b. The first suspension element 28 is formed to extend along the longitudinal direction of the guide rail 26. Here, the first suspension element 28 is formed by a magnetic force A permanent magnet is formed.
沉積源框架21形成為矩形的板狀，並在沉積源框架21的下部設置有支撐元件25。在沉積源框架21設置有多個支撐元件25，且沉積源框架21安裝在支撐元件25，與支撐元件25一同移動。支撐元件25包括與沉積源框架21的下表面相接觸的上部支撐部25a、被配置在上部支撐部的下側的下部支撐部25b、及連接下部支撐部25b和上部支撐部25a的側面支撐部25c。 The deposition source frame 21 is formed in a rectangular plate shape, and a support member 25 is disposed at a lower portion of the deposition source frame 21. A plurality of support members 25 are provided in the deposition source frame 21, and the deposition source frame 21 is mounted on the support member 25 to move together with the support member 25. The support member 25 includes an upper support portion 25a that is in contact with the lower surface of the deposition source frame 21, a lower support portion 25b that is disposed on the lower side of the upper support portion, and a side support portion that connects the lower support portion 25b and the upper support portion 25a. 25c.
下部支撐部25b被配置成在上板26b的下部與上板26b的下表面相對。在下部支撐部25b固定設置有與第一懸浮元件28相對而與第一懸浮元件28相互作用磁力的第二懸浮元件27。在此，第二懸浮元件27可由永久磁鐵形成。 The lower support portion 25b is disposed to face the lower surface of the upper plate 26b at a lower portion of the upper plate 26b. A second suspension element 27, which is opposite to the first suspension element 28 and interacts with the first suspension element 28, is fixedly disposed on the lower support portion 25b. Here, the second suspension element 27 can be formed by a permanent magnet.
第一懸浮元件28與第二懸浮元件27相互作用引力，且第一懸浮元件28與第二懸浮元件27相互面對的面具有相互不同的極性。例如，在第一懸浮元件28的朝向上板26b的面為N極且朝向第二懸浮元件27的面為S極的情況下，第二懸浮元件27可形成為朝向下部支撐部25b的面為S極且朝向第一懸浮元件28的面為N極。由此，因第一懸浮元件28的S極與第二懸浮元件27的N極相互面對而能夠作用相互吸引的力。 The first suspension element 28 interacts with the second suspension element 27, and the faces of the first suspension element 28 and the second suspension element 27 face each other have mutually different polarities. For example, in a case where the surface of the first suspension element 28 facing the upper plate 26b is N pole and the surface facing the second suspension element 27 is the S pole, the second suspension element 27 may be formed to face the lower support portion 25b. The face of the S pole facing the first suspension element 28 is an N pole. Thereby, the force attracted to each other can be exerted by the S pole of the first suspension element 28 and the N pole of the second suspension element 27 facing each other.
如上所述，若在第一懸浮元件28及第二懸浮元件27之間引力產生作用，則因第一懸浮元件28吸引位於下部的第二懸浮元件27，支撐元件25及沉積源框架21懸浮而能夠移動。 As described above, if the attraction between the first suspension element 28 and the second suspension element 27 acts, the first suspension element 28 attracts the second suspension element 27 located at the lower portion, and the support element 25 and the deposition source frame 21 are suspended. Ability to move.
另外，在與上板26b對置的上部支撐部25a的下表面設置有緩衝元件29。緩衝元件29由具有彈性的材料形成，特別是可由耐摩擦的聚四氟乙烯形成。緩衝元件29被配置在上板26b與上部支撐部25a的下表面之 間，並固定在上部支撐部25a，從而被配置成從上板26b相隔的狀態。緩衝元件29起著當懸浮被中斷時使傳遞至沉積源10及沉積源框架21的衝擊最小化的作用。 Further, a cushioning member 29 is provided on the lower surface of the upper support portion 25a opposed to the upper plate 26b. The cushioning element 29 is formed of a material having elasticity, in particular, it can be formed of friction-resistant polytetrafluoroethylene. The cushioning member 29 is disposed on the lower surface of the upper plate 26b and the upper support portion 25a. The upper support portion 25a is fixed to the upper support portion 25a so as to be spaced apart from the upper plate 26b. The cushioning member 29 serves to minimize the impact transmitted to the deposition source 10 and the deposition source frame 21 when the suspension is interrupted.
在沉積源框架21可設置有移送沉積源框架21的通過液壓或氣壓驅動的氣缸15，氣缸15的導杆15a與沉積源框架21連接而能夠推或拉沉積源框架21。通過這種氣缸15，沉積源框架21從導軌26懸浮並能夠沿導軌26的長度方向移動。 The deposition source frame 21 may be provided with a hydraulically or pneumatically driven cylinder 15 that transports the deposition source frame 21, and the guide rod 15a of the cylinder 15 is connected to the deposition source frame 21 to push or pull the deposition source frame 21. With such a cylinder 15, the deposition source frame 21 is suspended from the guide rail 26 and is movable along the length of the guide rail 26.
如上所述，根據本實施例，由於沉積源10通過磁懸浮相對於導軌26移動，因此不僅能夠減少對沉積源10的振動，而且通過不使用潤滑油(grease)能夠防止由潤滑油等潤滑液的蒸發氣體而發生的不良影響。 As described above, according to the present embodiment, since the deposition source 10 is moved relative to the guide rail 26 by the magnetic levitation, not only the vibration of the deposition source 10 but also the lubricating fluid such as lubricating oil can be prevented by not using a grease. Adverse effects of evaporation of gases.
圖3是表示潤滑油的蒸發氣體對有機發光元件的壽命的影響的圖表。 3 is a graph showing the influence of the evaporation gas of the lubricating oil on the life of the organic light emitting element.
如圖3所示，可知不間斷地在腔室內沉積有機物質的的情況下，隨著時間的推移，有機發光元件亮度的以平緩的傾斜度線性地減少。但是，在低於50℃加熱30分鐘的腔室內沉積有機物質的情況下，有機發光元件的亮度急劇減少。 As shown in FIG. 3, it can be seen that in the case where an organic substance is deposited in the chamber without interruption, the brightness of the organic light-emitting element linearly decreases with a gentle inclination with time. However, in the case where an organic substance is deposited in a chamber heated at 50 ° C for 30 minutes, the luminance of the organic light-emitting element is drastically reduced.
由於不間斷地沉積有機物質係能在幾乎沒有潤滑油蒸發的狀態下來沉積有機物質，因此有機發光元件的壽命優異。但是，若在低於50℃加熱30分鐘的腔室，潤滑油蒸發將使腔室內大量存在潤滑油氣體；在這種情況下，沉積出的有機發光元件的壽命將惡化。 Since the organic substance is deposited uninterruptedly, an organic substance can be deposited in a state where almost no lubricating oil is evaporated, and the life of the organic light-emitting element is excellent. However, if the chamber is heated at 50 ° C for 30 minutes, the evaporation of the lubricating oil will cause a large amount of lubricating oil to be present in the chamber; in this case, the life of the deposited organic light-emitting element will deteriorate.
如上所述，根據圖3明確可知潤滑油的蒸發氣體嚴重影響壽命。 As described above, it is clear from Fig. 3 that the evaporation gas of the lubricating oil seriously affects the life.
根據本實施例，由於通過磁懸浮移送沉積源10，因此完全沒有必要使用潤滑油，由此能夠提高製造的有機發光元件的壽命特性。 According to the present embodiment, since the deposition source 10 is transferred by magnetic levitation, it is not necessary to use the lubricating oil at all, whereby the life characteristics of the manufactured organic light-emitting element can be improved.
圖4是圖示根據本發明的第二實施例的沉積源運送裝置的剖視圖。 4 is a cross-sectional view illustrating a deposition source conveying device in accordance with a second embodiment of the present invention.
參照圖4進行說明，則根據本第二實施例的沉積源運送裝置102包括導軌36、通過磁力相對於導軌36懸浮的支撐元件35、及安裝在支撐元件35上的沉積源框架21。 Referring to FIG. 4, the deposition source transporting apparatus 102 according to the present second embodiment includes a guide rail 36, a supporting member 35 suspended by a magnetic force with respect to the guide rail 36, and a deposition source frame 21 mounted on the supporting member 35.
沉積源10可具備存儲有有機物質的坩堝、用於加熱坩堝的加熱元件、及噴射有機物質的噴嘴。但本實施例並不限於此，能夠安裝在沉積源框架21上的所有種類的沉積源均可適用于本發明。 The deposition source 10 may be provided with a crucible storing an organic substance, a heating element for heating the crucible, and a nozzle for ejecting the organic substance. However, the embodiment is not limited thereto, and all kinds of deposition sources that can be mounted on the deposition source frame 21 can be applied to the present invention.
導軌36沿沉積源10的移動方向長長地延伸而形成，且兩個導軌36被配置成平行。 The guide rail 36 is formed to extend long along the moving direction of the deposition source 10, and the two guide rails 36 are arranged in parallel.
導軌36包括朝上突出的支撐柱36a和被配置成從支撐柱36a彎曲而與地面平行的上板36b。上板36b從相對的導軌36朝向外側彎曲，且在上板36b的下部固定設置有形成磁力的第一懸浮元件38。第一懸浮元件38沿導軌36的長度方向延伸而形成。在此，第一懸浮元件38由形成磁力的永久磁鐵形成。 The guide rail 36 includes a support post 36a that protrudes upward and an upper plate 36b that is configured to be bent from the support post 36a to be parallel to the ground. The upper plate 36b is bent outward from the opposite guide rail 36, and a first suspension member 38 that forms a magnetic force is fixedly disposed at a lower portion of the upper plate 36b. The first suspension element 38 is formed to extend along the longitudinal direction of the guide rail 36. Here, the first suspension element 38 is formed by a permanent magnet that forms a magnetic force.
沉積源框架21形成為矩形的板狀外型，且在沉積源框架21的下部設置有支撐元件35。在沉積源框架21設置有多個支撐元件35，且沉積源框架21安裝在支撐元件35，與支撐元件35一同移動。支撐元件35形成為固定在沉積源框架21的下表面的板狀，並沿沉積源框架的長度方向長長地延伸而形成。 The deposition source frame 21 is formed into a rectangular plate-like shape, and a support member 35 is disposed at a lower portion of the deposition source frame 21. A plurality of support members 35 are disposed in the deposition source frame 21, and the deposition source frame 21 is mounted on the support member 35 to move together with the support member 35. The support member 35 is formed in a plate shape fixed to the lower surface of the deposition source frame 21, and is formed to extend long along the longitudinal direction of the deposition source frame.
在支撐元件35的下表面固定設置有與第一懸浮元件38相對而與第一懸浮元件38相互作用磁力的第二懸浮元件37。在此，第二懸浮元件37可由永久磁鐵形成。 A second suspension element 37 opposite the first suspension element 38 and interacting with the first suspension element 38 is fixedly disposed on the lower surface of the support member 35. Here, the second suspension element 37 can be formed by a permanent magnet.
第一懸浮元件38與第二懸浮元件37相互作用斥力，且第一懸浮元件38與第二懸浮元件37相互面對的面具有相互相同的極性。例如，在第一懸浮元件38的朝向上板36b的面為N極且朝向第二懸浮元件37的面為S極的情況下，第二懸浮元件37可形成為朝向支撐元件35的面為N極且朝向第一懸浮元件38的面為S極。由此，第一懸浮元件38的S極與第二懸浮元件37的S極相互面對而可作用相互排斥的力。 The first suspension element 38 interacts with the second suspension element 37 to repulsively, and the faces of the first suspension element 38 and the second suspension element 37 facing each other have the same polarity. For example, in the case where the face of the first suspension member 38 facing the upper plate 36b is the N pole and the face facing the second suspension member 37 is the S pole, the second suspension member 37 may be formed to face the face of the support member 35. The face that faces the first suspension element 38 is S pole. Thereby, the S pole of the first suspension element 38 and the S pole of the second suspension element 37 face each other to act on mutually exclusive forces.
如上所述，若在第一懸浮元件38與第二懸浮元件37之間斥力產生作用，則因第一懸浮元件38推升位於上方的第二懸浮元件37，支撐元件35及沉積源框架21懸浮而能夠移動。 As described above, if the repulsive force acts between the first suspension element 38 and the second suspension element 37, the first suspension element 38 pushes up the second suspension element 37 located above, and the support element 35 and the deposition source frame 21 are suspended. And can move.
另外，在支撐元件35與第二懸浮元件37之間設置有緩衝元件39。緩衝元件39由具有彈性的材料形成，特別是可由耐摩擦的聚四氟乙烯形成。緩衝元件39起著在懸浮被中斷時使傳遞至沉積源10及沉積源框架21的衝擊最小化的作用。 In addition, a cushioning element 39 is provided between the support element 35 and the second suspension element 37. The cushioning element 39 is formed of a material having elasticity, in particular, it can be formed of friction-resistant polytetrafluoroethylene. The cushioning member 39 serves to minimize the impact transmitted to the deposition source 10 and the deposition source frame 21 when the suspension is interrupted.
如上所述，根據本實施例，由於沉積源10通過磁懸浮相對於導軌36移動，因此不僅能夠減少對沉積源10的振動，而且通過不使用潤滑油(grease)能夠防止由潤滑油等潤滑劑的蒸發氣體而發生的不良影響。 As described above, according to the present embodiment, since the deposition source 10 is moved relative to the guide rail 36 by the magnetic levitation, not only the vibration of the deposition source 10 but also the lubricant such as the lubricating oil can be prevented by not using the grease. Adverse effects of evaporation of gases.
圖5是圖示根據本發明的第三實施例的沉積源運送裝置的剖視圖。 Figure 5 is a cross-sectional view illustrating a deposition source conveying device in accordance with a third embodiment of the present invention.
參照圖5進行說明，則根據本第三實施例的沉積源運送裝置 103包括導軌46、通過磁力相對於導軌46懸浮的支撐元件45、及安裝在支撐元件45上的沉積源框架21。 Referring to FIG. 5, the deposition source transport device according to the third embodiment is described. 103 includes a guide rail 46, a support member 45 suspended by a magnetic force relative to the guide rail 46, and a deposition source frame 21 mounted on the support member 45.
沉積源10可具備存儲有有機物質的坩堝、用於加熱坩堝的加熱元件、及噴射有機物質的噴嘴。但本實施例並不限於此，能夠安裝在沉積源框架21上的所有種類的沉積源均可適用于本發明。 The deposition source 10 may be provided with a crucible storing an organic substance, a heating element for heating the crucible, and a nozzle for ejecting the organic substance. However, the embodiment is not limited thereto, and all kinds of deposition sources that can be mounted on the deposition source frame 21 can be applied to the present invention.
導軌46沿沉積源10的移動方向長長地延伸而形成，且兩個導軌46被配置成平行。導軌46包括朝上突出的支撐柱46a和被配置成從支撐柱46a彎曲而與地面平行的上板46b。上板46b從相對的導軌46朝向外側彎曲，且在上板46b的下部固定設置有形成磁力的第一懸浮元件48。第一懸浮元件48沿導軌46的長度方向延伸而形成。 The guide rails 46 are formed to extend long along the moving direction of the deposition source 10, and the two guide rails 46 are arranged in parallel. The guide rail 46 includes a support post 46a that protrudes upward and an upper plate 46b that is configured to be bent from the support post 46a to be parallel to the ground. The upper plate 46b is bent outward from the opposite guide rails 46, and a first suspension member 48 that forms a magnetic force is fixedly disposed at a lower portion of the upper plate 46b. The first suspension element 48 is formed to extend along the longitudinal direction of the guide rail 46.
在此，第一懸浮元件48由形成磁力的電磁鐵形成。第一懸浮元件48包括由強磁性體形成的磁芯48a和包圍磁芯48a的線圈48b。在磁芯48a的寬度方向的兩側端部形成有向下突出的突起48c，且線圈48b以包圍突起48c的方式設置。 Here, the first suspension element 48 is formed by an electromagnet that forms a magnetic force. The first suspension element 48 includes a magnetic core 48a formed of a ferromagnetic body and a coil 48b surrounding the magnetic core 48a. Protrusions 48c projecting downward are formed at both end portions in the width direction of the magnetic core 48a, and the coils 48b are provided to surround the projections 48c.
沉積源框架21形成為矩形的板狀，且在沉積源框架21的下部設置有支撐元件45。在沉積源框架21設置有多個支撐元件45，且沉積源框架21安裝在支撐元件45，與支撐元件45一同移動。支撐元件45包括與沉積源框架21的下表面相接觸的上部支撐部45a、被配置在上部支撐部的下側的下部支撐部45b、及連接下部支撐部45b和上部支撐部45a的側面支撐部45c。 The deposition source frame 21 is formed in a rectangular plate shape, and a support member 45 is disposed at a lower portion of the deposition source frame 21. A plurality of support members 45 are disposed in the deposition source frame 21, and the deposition source frame 21 is mounted on the support member 45 to move together with the support member 45. The support member 45 includes an upper support portion 45a that is in contact with the lower surface of the deposition source frame 21, a lower support portion 45b that is disposed on the lower side of the upper support portion, and a side support portion that connects the lower support portion 45b and the upper support portion 45a. 45c.
下部支撐部45b被配置成在上板46b的下部與上板46b相對。在下部支撐部45b固定設置有與第一懸浮元件48相對而與第一懸浮元件48相互作用磁力的第二懸浮元件47。在此，第二懸浮元件47可由強磁性體板 形成。在第二懸浮元件47形成有向上部突出的突起47a，因第一懸浮元件48的突起48c吸引位於下部的第二懸浮元件47的突起47a而發生懸浮力。 The lower support portion 45b is disposed to face the upper plate 46b at a lower portion of the upper plate 46b. A second suspension element 47 that is opposite to the first suspension element 48 and that interacts with the first suspension element 48 is fixedly disposed on the lower support portion 45b. Here, the second suspension element 47 can be made of a ferromagnetic plate form. The second suspension member 47 is formed with a projection 47a that protrudes upward, and the suspension force is generated by the projection 48c of the first suspension member 48 attracting the projection 47a of the second suspension member 47 located at the lower portion.
另外，在上部支撐部45a與上板46b對置的下表面設置有緩衝元件49。緩衝元件49由具有彈性的材料形成，並起著使傳遞至沉積源10及沉積源框架21的衝擊最小化的作用。 Further, a cushioning member 49 is provided on the lower surface of the upper support portion 45a opposed to the upper plate 46b. The cushioning member 49 is formed of a material having elasticity and serves to minimize the impact transmitted to the deposition source 10 and the deposition source frame 21.
如上所述，根據本實施例，由於沉積源10通過磁懸浮相對於導軌46移動，因此不僅能夠減少對沉積源10的振動，而且通過不使用潤滑油(grease)能夠防止由潤滑油等潤滑劑的蒸發氣體而發生的不良影響。 As described above, according to the present embodiment, since the deposition source 10 is moved relative to the guide rail 46 by the magnetic levitation, not only the vibration of the deposition source 10 but also the lubricant such as the lubricating oil can be prevented by not using the grease. Adverse effects of evaporation of gases.
圖6是圖示根據本發明的第四實施例的沉積源運送裝置的立體圖，圖7是圖示根據本發明的第四實施例的沉積源運送裝置的側視圖。 6 is a perspective view illustrating a deposition source conveying device according to a fourth embodiment of the present invention, and FIG. 7 is a side view illustrating a deposition source conveying device according to a fourth embodiment of the present invention.
參照圖6及圖7進行說明，則根據本實施例的沉積源運送裝置104除了使力作用於沉積源框架21來移送的移送機構外，由與根據上述的第一實施例的沉積源運送裝置相同的結構形成，因此省略對相同結構的重複說明。 6 and 7, the deposition source transport device 104 according to the present embodiment is provided with the deposition source transport device according to the first embodiment described above, except for the transfer mechanism that forces the transfer source frame 21 to be transferred. The same structure is formed, and thus repeated explanation of the same structure is omitted.
根據本實施例的沉積源運送裝置104包括：第一繩51，結合在沉積源框架21的一側端部；第二繩52，結合在沉積源框架21的另一側端部；第一捲取元件53，纏繞第一繩51；第二捲取元件55，纏繞第二繩52；第一電動機56，旋轉第一捲取元件53；和第二電動機57，旋轉第二捲取元件55。 The deposition source conveying device 104 according to the present embodiment includes: a first rope 51 coupled to one end portion of the deposition source frame 21; and a second rope 52 coupled to the other side end of the deposition source frame 21; The element 53 is taken up, the first rope 51 is wound, the second take-up element 55 is wound around the second rope 52, the first motor 56 rotates the first take-up element 53, and the second motor 57 rotates the second take-up element 55.
第一繩51沿沉積源框架21移動的方向固定在一側端部，並纏繞在第一捲取元件53。第一捲取元件53形成為棒狀，並設置成能夠旋轉的結構。第一捲取元件53支撐第一繩51，纏繞或解繞第一繩51以移送沉積源 框架21。在第一捲取元件53連接設置有第一電動機56，第一電動機56通過正轉或反轉，能夠纏繞或解繞第一繩51。第一電動機56連接設置在第一捲取元件53的下部，並與腔室60的底面相比設置在更下側。 The first string 51 is fixed at one end end in the direction in which the deposition source frame 21 moves, and is wound around the first take-up element 53. The first take-up element 53 is formed in a rod shape and is provided in a rotatable structure. The first take-up element 53 supports the first rope 51, winding or unwinding the first rope 51 to transfer the deposition source Frame 21. A first electric motor 56 is connected to the first take-up element 53 and the first electric motor 56 can be wound or unwound by the forward or reverse rotation. The first motor 56 is connected to the lower portion of the first take-up element 53 and disposed on the lower side of the bottom surface of the chamber 60.
第二繩52沿沉積源框架21移動的方向固定在另一側端部，並纏繞在第二捲取元件55。第二捲取元件55形成為棒狀，並設置成能夠旋轉的結構。第二捲取元件55支撐第二繩52，纏繞或解繞第二繩52以移送沉積源框架21。在第二捲取元件55連接設置有第二電動機57，第二電動機57通過正轉或反轉，能夠纏繞或解繞第二繩52。第二電動機57連接並設置在第二捲取元件55的下部，並與腔室60的底面相比設置在更下側。 The second string 52 is fixed to the other side end in the direction in which the deposition source frame 21 moves, and is wound around the second take-up element 55. The second take-up element 55 is formed in a rod shape and is provided in a rotatable structure. The second take-up element 55 supports the second rope 52, winding or unwinding the second rope 52 to transfer the deposition source frame 21. A second electric motor 57 is connected to the second take-up element 55, and the second electric motor 57 can be wound or unwound by the forward or reverse rotation. The second motor 57 is connected and disposed at a lower portion of the second take-up element 55, and is disposed on the lower side than the bottom surface of the chamber 60.
在沉積源框架21向第一捲取元件53側移動的情況下，第一繩51被纏繞在第一捲取元件53，第二繩52從第二捲取元件55解繞。此時，第一電動機56沿纏繞第一繩51的方向旋轉，第二電動機57沿解繞第二繩52的方向旋轉。 In the case where the deposition source frame 21 is moved toward the first take-up element 53 side, the first rope 51 is wound around the first take-up element 53, and the second rope 52 is unwound from the second take-up element 55. At this time, the first motor 56 rotates in the direction in which the first rope 51 is wound, and the second motor 57 rotates in the direction in which the second rope 52 is unwound.
此外，在沉積源框架21向第二捲取元件55側移動的情況下，第一繩51從第一捲取元件53解繞，第二繩52被纏繞在第二捲取元件55。此時，第一電動機56沿解繞第一繩51的方向旋轉，第二電動機57沿纏繞第二繩52的方向旋轉。 Further, in the case where the deposition source frame 21 is moved toward the second take-up element 55 side, the first rope 51 is unwound from the first take-up element 53, and the second rope 52 is wound around the second take-up element 55. At this time, the first motor 56 rotates in the direction in which the first rope 51 is unwound, and the second motor 57 rotates in the direction in which the second rope 52 is wound.
如上所述，根據本實施例，由於以磁懸浮方式移動沉積源，因此用很小的力也能夠使沉積源移動，並利用繩和電動機能夠容易且穩定地移動沉積源。 As described above, according to the present embodiment, since the deposition source is moved in a magnetic levitation manner, the deposition source can be moved with a small force, and the deposition source can be easily and stably moved by the rope and the motor.
以上對本發明的優選實施例進行了說明，但本發明並不限定於此，在申請權利範圍、發明說明及圖式範圍內，可變形為多種方式而實 施，且這屬於本發明的範圍內也是理所當然的。 The preferred embodiments of the present invention have been described above, but the present invention is not limited thereto, and may be modified into various modes within the scope of the claims, the description of the invention, and the drawings. It is a matter of course that this is within the scope of the invention.
101‧‧‧沉積源運送裝置 101‧‧‧Sediment source transport device
10‧‧‧沉積源 10‧‧‧Sedimentary source
15‧‧‧氣缸 15‧‧‧ cylinder
15a‧‧‧導杆 15a‧‧‧guides
21‧‧‧沉積源框架 21‧‧‧Sedimentary source framework
25‧‧‧支撐元件 25‧‧‧Support components
26‧‧‧導軌 26‧‧‧rails
26a‧‧‧支撐柱 26a‧‧‧Support column
26b‧‧‧上板 26b‧‧‧Upper board
28‧‧‧第一懸浮元件 28‧‧‧First suspension element
Ⅱ-Ⅱ‧‧‧割面線 II-II‧‧‧Cutting line
Claims (14)
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| KR1020130109960A KR102175820B1 (en) | 2013-09-12 | 2013-09-12 | Deposition source transporting apparatus |
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| CN104451585A (en) | 2015-03-25 |
| KR102175820B1 (en) | 2020-11-09 |
| TWI615344B (en) | 2018-02-21 |
| CN104451585B (en) | 2018-08-10 |
| KR20150030547A (en) | 2015-03-20 |
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